Method for manufacturing an anti-glare cover sheet and anti-glare cover sheet

Abstract

This invention discloses a method for preparing an anti-glare cover plate and the anti-glare cover plate itself, relating to the technical field of sheet metal processing. The method includes a preparation step, a surface treatment step, a feeding step, a sintering step, and a cleaning step. The preparation step provides a substrate, which includes a processing surface. The surface treatment step applies surface energy to the processing surface to form multiple processing areas. The feeding step lays sintering powder on the processing surface, ensuring that the sintering powder covers at least each processing area. The sintering step uses a laser to scan the sintering powder and the processing surface, causing the sintering powder covering the processing areas to adhere to the processing areas, thereby forming an uneven anti-glare structure on the processing surface, resulting in an anti-glare cover plate. This invention solves the technical problem of the anti-glare structure on existing anti-glare cover plates easily detaching.

Description

Technical Field

[0001] This invention relates to the technical field of sheet metal processing, and more particularly to a method for preparing an anti-glare cover plate and the anti-glare cover plate itself. Background Technology

[0002] Currently, the common methods for preparing AG anti-glare cover plates are additive manufacturing and subtractive manufacturing. Additive manufacturing generally achieves the anti-glare effect of AG by coating the surface with micron-sized particles or by using phase separation. However, additive manufacturing has certain drawbacks: it generally uses organic glue or other adhesives to achieve micron-sized particles and structures, but these adhesives are prone to aging, causing micron-sized particles to fall off and the anti-glare structure to be damaged, thus limiting reliability. Summary of the Invention

[0003] In view of this, the present invention provides a method for preparing an anti-glare cover plate and an anti-glare cover plate, which solves the technical problem that the anti-glare structure on existing anti-glare cover plates is easy to fall off.

[0004] To solve the above-mentioned technical problems, the first technical solution adopted by the present invention is as follows:

[0005] A method for preparing an anti-glare cover plate, comprising:

[0006] Preparation process: Provide a substrate, the substrate including a processed surface;

[0007] Surface treatment process: The surface of the processed surface is subjected to surface energy treatment to form multiple processed areas on the surface of the processed surface;

[0008] Material feeding process: Sintering powder is laid on the processing surface, and the sintering powder covers at least each processing area;

[0009] Sintering process: The sintering powder and the processing surface are scanned by laser so that the sintering powder covering the processing area adheres to the processing area, thereby forming an uneven anti-glare structure on the processing surface to obtain an anti-glare cover plate.

[0010] In some embodiments of the method for preparing the anti-glare cover, prior to the surface treatment step, the method further includes:

[0011] Preset patterns are provided;

[0012] The surface treatment process uses a single-pulse laser to process the surface point by point according to the preset pattern to form each processing area.

[0013] In some embodiments of the method for preparing the anti-glare cover, the processing parameters of the single-pulse laser are: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 1000mm / s-20000mm / s, repetition frequency of not less than 200kHz, and laser power of 1W-2W; the product of the repetition frequency and the spot diameter of the single-pulse laser is not greater than its scanning speed.

[0014] In some embodiments of the method for preparing the anti-glare cover, the laser processing parameters used in the sintering process are as follows: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 100mm / s-10000mm / s, repetition frequency of not less than 200kHz, and laser power of 3W-5W.

[0015] In some embodiments of the method for preparing the anti-glare cover, after the sintering process, the method further includes a strengthening process for further strengthening the anti-glare cover obtained by the sintering process.

[0016] In some embodiments of the method for preparing the anti-glare cover, the strengthening process uses at least one or a combination of laser strengthening, heating and cooling processes, and ion strengthening processes.

[0017] In some embodiments of the method for preparing the anti-glare cover, the parameters of the laser strengthening process in the strengthening step are: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 100mm / s-10000mm / s, repetition frequency of more than 200kHz, and laser power of 1W-3W.

[0018] In some embodiments of the method for preparing the anti-glare cover, the strengthening process includes the following steps:

[0019] The anti-glare cover plate is strengthened using the laser strengthening process described above;

[0020] After the laser strengthening process, the material is further strengthened by the heating and cooling process or the ion strengthening process.

[0021] In some embodiments of the method for preparing the anti-glare cover, the laser strengthening process employs at least one of surface scanning and line scanning.

[0022] To solve the above-mentioned technical problems, the second technical solution adopted by the present invention is as follows:

[0023] An anti-glare cover is prepared using the method described in the above embodiments.

[0024] Implementing the embodiments of the present invention will have the following beneficial effects:

[0025] The above-described method for preparing an anti-glare cover plate and the anti-glare cover plate obtained by this method involves first performing surface treatment on a portion of the substrate's processing surface to create multiple processing areas with increased surface energy. Then, in the subsequent sintering process, the processing areas with increased surface energy achieve a sintering effect, while the areas without surface energy treatment do not. Under the action of laser scanning during the sintering process, sintering powder adheres to the processing areas, resulting in an uneven anti-glare structure on the processing surface, thus obtaining an anti-glare cover plate. This achieves the anti-glare effect, and because the anti-glare structure is formed in the surface-enhanced processing areas, it is less prone to detachment, thereby solving the technical problem of easy detachment of anti-glare structures in existing technologies. Attached Figure Description

[0026] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0027] Figure 1 Here is a flowchart of a method for preparing a cover plate in one embodiment;

[0028] Figure 2 This is a schematic diagram of the sintering process in one embodiment;

[0029] Figure 3 This is a schematic diagram of the strengthening process in one embodiment;

[0030] Figure 4 This is a schematic diagram of a laser line scan.

[0031] Figure 5 A schematic diagram of a periodic anti-glare structure;

[0032] Figure 6 This is a schematic diagram of a non-periodic anti-glare structure.

[0033] Among them: 1. substrate; 2. sintering powder; 3. laser processing equipment; 31. laser line scan; 4. anti-glare structure. Detailed Implementation

[0034] To facilitate understanding of the present invention, a more complete description will be given below with reference to the accompanying drawings. Preferred embodiments of the invention are shown in the drawings. However, the invention can be implemented in many other different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of the invention.

[0035] It should be noted that when a component is said to be "fixed to" another component, it can be directly attached to the other component or there may be an intervening component. When a component is said to be "connected to" another component, it can be directly connected to the other component or there may be an intervening component. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0036] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0037] Existing additive manufacturing methods for forming anti-glare structures have certain drawbacks: they generally use organic adhesives or other bonding agents to achieve micron-level particles and structures, but these adhesives are prone to aging, causing micron-level particles to fall off and the anti-glare structure to be damaged, thus limiting reliability.

[0038] Combination Figure 1-4 As shown, in one embodiment of a method for preparing an anti-glare cover, the method includes:

[0039] Preparation process: Provide substrate 1, which includes a processed surface;

[0040] Surface treatment process: Applying surface energy to the processed surface to form multiple processed areas on the processed surface;

[0041] Feeding process: Spread sintered powder 2 on the processing surface, and ensure that the sintered powder 2 covers at least each processing area;

[0042] Sintering process: The sintering powder 2 and the processing surface are scanned by laser so that the sintering powder 2 covering the processing area is bonded to the processing area, thereby forming an uneven anti-glare structure 4 on the processing surface, and obtaining an anti-glare cover plate.

[0043] In this embodiment, by first performing surface treatment on a portion of the processing surface of one side of the substrate 1, multiple processing areas with increased surface energy can be formed on the processing surface. Then, in the subsequent sintering process, the processing areas with increased surface energy can produce a sintering effect, while the areas without surface energy treatment cannot produce a sintering effect. Thus, under the action of laser scanning in the sintering process, a sintering effect can be formed where the sintering powder 2 adheres to the processing area, thereby forming an uneven anti-glare structure 4 on the processing surface, resulting in an anti-glare cover plate, achieving the anti-glare effect. Furthermore, the location where the anti-glare structure 4 is formed is a processing area with enhanced surface energy, making it less prone to falling off, thus solving the technical problem of easy detachment of the anti-glare structure 4 in the prior art.

[0044] Preferably, the sintered powder 2 is evenly spread on the processing surface. It is understood that the anti-glare structure 4 is a microstructure, that is, the size of the processing area is small. Therefore, in actual processing, it is difficult to spread the sintered powder 2 only on the processing area. By spreading the sintered powder 2 on the entire processing surface, all processing areas can be covered with the sintered powder 2, avoiding omissions.

[0045] Preferably, after the sintering process is completed, a cleaning process can be added to remove the sintering powder 2 that has not adhered to the processing surface.

[0046] In one embodiment of a method for preparing an anti-glare cover, prior to the surface treatment step, the method further includes:

[0047] Preset patterns are provided;

[0048] The surface treatment process uses a single-pulse laser to process the surface point by point according to the preset pattern to form each processing area.

[0049] In this embodiment, the substrate 1 can be made of glass. The cover plate after forming the anti-glare structure 4 is also often called an AG cover plate. The surface energy of the glass surface is easy to change. The processing area can be freely processed on the processing surface according to the preset pattern by a single pulse laser. That is, the position of each processing area on the substrate 1 can be matched with the preset pattern to achieve precise alignment. The laser has a fast processing speed and easy energy density control. It has the advantages of fast processing speed, high precision and easy control when improving the surface energy of the glass.

[0050] It is understandable that the preset pattern can be a variety of patterns, such as a periodic matrix pattern. By adjusting the processing parameters of the single-pulse laser, the single-pulse laser can process a matrix pattern on the processing surface. It should be noted that the position of each processing area corresponds one-to-one with each matrix point on the preset pattern.

[0051] Specifically, the processing parameters for single-pulse lasers are: spot diameter of 5µm-100µm, pulse width of 0.1 picoseconds-1000 picoseconds, scanning speed of 1000mm / s-20000mm / s, repetition frequency of not less than 200kHz, and laser power of 1W-2W. The product of the repetition frequency and the spot diameter of a single-pulse laser is not greater than its scanning speed.

[0052] The size of the light spot diameter corresponds to the size of each processing area. One processing area corresponds to one AG structural unit. When the light spot diameter is 5um-100um, a processing area with a size of 0.1um-100um can be processed. In the subsequent sintering process, after each processing area is bonded with sintering powder 2, it can form an AG structural unit. The size of the AG structural unit is also 0.1um-100um. Preferably, the preferred size range of the AG structural unit is 5um-20um. Within this range, the anti-glare effect, clarity and flash point are well controlled, and it has better optical performance.

[0053] Substrate 1 can be glass. Unless otherwise described in the following embodiments, substrate 1 is described as glass. It can be understood that since the surface energy of the glass surface is easy to change, the required laser energy is low. A low laser power of 1W-2W can meet the processing needs and reduce energy consumption.

[0054] Furthermore, in the sintering process, the laser scanning method used is at least one of surface scanning and line scanning. The laser processing parameters used in the sintering process are: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 100mm / s-10000mm / s, repetition frequency of not less than 200kHz, and laser power of 3W-5W.

[0055] It should be noted that the sintering powder 2 can be glass powder, metal powder, ceramic powder, etc. Different sintering powders 2 can be selected according to different substrate materials 1. For example, the sintering powder 2 for glass substrate 1 can be glass powder. By using laser line scanning 31 and laser surface scanning, the entire substrate 1 can be sintered quickly to form an anti-glare structure 4, thereby improving production efficiency.

[0056] In one embodiment of a method for preparing an anti-glare cover plate, after the sintering process, the method further includes a strengthening process to further strengthen the anti-glare cover plate obtained in the sintering process. Further, in the strengthening process, the strengthening method used is at least one or a combination of laser strengthening, heating / cooling, and ion strengthening processes.

[0057] In this embodiment, specifically, the laser strengthening process involves readjusting the laser energy after the sintering process and performing another line or surface scan. The purpose of this laser surface scan is to increase the structural strength of the anti-glare cover. The heating and cooling process involves sending the sintered substrate 1 into a high-temperature furnace for annealing, thereby strengthening the substrate 1. This is the glass annealing process, which is fully mature in the glass industry and will not be described in detail here. The ion strengthening process involves strengthening the glass of the substrate 1 by ion implantation. This process is also a mature existing technology and will not be described in detail here. Through these strengthening processes, the substrate 1 and the anti-glare structure 4 can be strengthened, reducing surface micro-cracks in the anti-glare cover and improving the overall structural strength of the anti-glare cover.

[0058] Specifically, the strengthening process is performed after the cleaning process.

[0059] In a preferred embodiment of a method for preparing an anti-glare cover plate, the strengthening process includes the following steps:

[0060] The anti-glare cover plate is reinforced using laser strengthening technology;

[0061] After laser strengthening, the process is further strengthened by heating and cooling or ion strengthening.

[0062] In this embodiment, after modifying the anti-glare cover plate through laser processing, an additional heating and cooling process or ion strengthening process is added. The resulting anti-glare cover plate has a structural strength superior to that obtained by using only one processing method: laser strengthening, heating and cooling, or ion strengthening.

[0063] Specifically, the parameters of the laser enhancement process are: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 100mm / s-10000mm / s, repetition frequency of more than 200kHz, and laser power of 1W-3W.

[0064] In conjunction with the previous embodiments, the laser strengthening process, sintering process and surface treatment process are completed by the same laser processing device 3. It can be understood that the spot diameter of the laser processing device is generally constant during the processing. The appropriate laser spot diameter can be selected according to the size of the AG structural unit required by the preset pattern.

[0065] In one embodiment of a method for preparing an anti-glare cover plate, the laser strengthening process employs at least one of surface scanning and line scanning. Using line scanning or surface scanning with the laser in the laser strengthening process and sintering step can accelerate processing efficiency, improve processing uniformity, and enhance the anti-glare effect.

[0066] This invention also provides an anti-glare cover plate, which is prepared using the method described in the above embodiments. The anti-glare cover plate prepared by the method described in the above embodiments balances anti-glare effect, clarity, and flash point. Furthermore, the anti-glare structure 4 is less likely to detach from the processed surface, and the overall structural strength of the anti-glare cover plate is further improved through the strengthening process. In addition, the anti-glare structure 4 can be a periodic structure or a non-periodic structure, as long as it achieves the anti-glare effect. Specifically, this can be achieved by adjusting the parameters of the single-pulse laser, i.e., the laser parameters used to form the processing area.

[0067] Specifically, see Figure 5 The schematic diagram of the periodic structure shows that the parameters of the AG structural units in the periodic anti-glare structure 4 include size, repetition period, and height. Preferably, the size ranges from 0.1µm to 100µm; the repetition period is from 0.11µm to 200µm. When the repetition period is less than 0.11µm, the structures of the AG structural units in each processing area repeat each other, reducing the optical effect of the substrate 1. When the repetition period is greater than 200µm, the proportion of the anti-glare structure 4 is small, resulting in poor anti-glare effect. More preferably, the range around the repetition is 5µm to 30µm. Within this range, the formed anti-glare structure 4 balances anti-glare, clarity, and flicker point, and has better applicability. In addition, the number of periods is no more than 4. A number of periods not exceeding 4 can reduce processing difficulty. The height preferably ranges from 0.1µm to 5µm.

[0068] Similarly, refer to Figure 6 The non-periodic schematic diagram shows that the parameters of the AG structural unit of the non-periodic anti-glare structure 4 do not include the repetition period. The reasons and purposes for setting the other parameters are the same as those for periodicity. The size range is 0.1um-100um, and the height range is 0.1um-5um. Within this range, the formed anti-glare structure 4 balances anti-glare, clarity, and flicker point, and has better applicability.

[0069] It is understandable that the periodic and non-periodic anti-glare structure 4 is obtained by forming the processing area of ​​the substrate 1 by single-pulse laser processing. The periodic and non-periodic structure is formed according to the preset pattern. It should be noted that the non-periodic AG structure units are randomly distributed, and their sizes can be the same or different on the same substrate 1.

[0070] Preferably, the period of the AG structural unit is greater than its size.

[0071] Example 1

[0072] Preparation process: Provide a glass substrate 1;

[0073] Surface treatment process: The single-pulse laser emitted by the laser processing device 3 processes the processing surface of the substrate 1 point by point according to the preset pattern to form multiple processing areas. The parameters of the single-pulse laser are set as follows: spot diameter 70um, pulse width 800 picoseconds, scanning speed 16000mm / s, repetition frequency 200kHz, and laser power 1W.

[0074] Material feeding process: Spread the glass powder evenly on the processing surface, and ensure that the glass powder covers at least each processing area;

[0075] Sintering process: The sintering powder 2 and the processing surface are scanned by laser line scanning 31 or surface scanning so that the glass powder covering the processing area adheres to the processing area, thereby forming an uneven anti-glare structure 4 on the processing surface. The laser processing parameters are: spot diameter 70um, pulse width 800 picoseconds, scanning speed 500mm / s, repetition frequency 200kHz, and laser power 5W.

[0076] Cleaning process: After the sintering process is completed, clean the glass powder that has not adhered to the processed surface;

[0077] Strengthening process: The anti-glare cover is strengthened by laser strengthening process, and after the laser strengthening process is completed, the anti-glare cover is further strengthened by heating and cooling process or solid strengthening process; the parameters of laser strengthening process are: spot diameter 70um, pulse width 800 picosecond, scanning speed 2000mm / s, repetition frequency 500kHz, laser power 1.5W.

[0078] The dimensions of each AG structural unit in the anti-glare structure 4 on the anti-glare cover plate obtained in this embodiment are 50um-80um, and the height is 1.5um-2um. The anti-glare effect is good; the clarity is good; and the flash point is good.

[0079] Example 2

[0080] Preparation process: Provide a glass substrate 1;

[0081] Surface treatment process: The single-pulse laser emitted by the laser processing device 3 processes the processing surface of the substrate 1 point by point according to the preset pattern to form multiple processing areas. The parameters of the single-pulse laser are set as follows: spot diameter 10um, pulse width 400 picoseconds, scanning speed 1000mm / s, repetition frequency 500kHz, and laser power 1.5W.

[0082] Material feeding process: Spread the glass powder evenly on the processing surface, and ensure that the glass powder covers at least each processing area;

[0083] Sintering process: The sintering powder 2 and the processing surface are scanned by laser line scanning 31 or surface scanning so that the glass powder covering the processing area adheres to the processing area, thereby forming an uneven anti-glare structure 4 on the processing surface. The laser processing parameters are: spot size 10um, pulse width 400 picoseconds, scanning speed 200mm / s, repetition frequency 500kHz, and laser power 3W.

[0084] Cleaning process: After the sintering process is completed, clean the glass powder that has not adhered to the processed surface;

[0085] Strengthening process: The anti-glare cover is strengthened by laser strengthening process, and after the laser strengthening process is completed, the anti-glare cover is further strengthened by heating and cooling process or solid strengthening process; the parameters of laser strengthening process are: spot diameter 10um, pulse width 400 picosecond, scanning speed 500mm / s, repetition frequency 1000kHz, laser power 1.5W.

[0086] In this embodiment, the dimensions of each AG structural unit in the anti-glare structure 4 on the cover plate are 0.5um-2um, and the height is 0.2um-0.6um. The anti-glare effect is poor; the clarity is excellent; and the flash point is excellent.

[0087] Example 3

[0088] Preparation process: Provide a glass substrate 1;

[0089] Surface treatment process: The single-pulse laser emitted by the laser processing device 3 processes the processing surface of the substrate 1 point by point according to the preset pattern to form multiple processing areas. The parameters of the single-pulse laser are set as follows: spot diameter 20um, pulse width 400 picoseconds, scanning speed 2000mm / s, repetition frequency 200kHz, and laser power 2W.

[0090] Material feeding process: Spread the glass powder evenly on the processing surface, and ensure that the glass powder covers at least each processing area;

[0091] Sintering process: The sintering powder 2 and the processing surface are scanned by laser line scanning 31 or surface scanning so that the glass powder covering the processing area adheres to the processing area, thereby forming an uneven anti-glare structure 4 on the processing surface. The laser processing parameters are: spot diameter 20um, pulse width 400 picoseconds, scanning speed 100mm / s, repetition frequency 200kHz, and laser power 4W.

[0092] Cleaning process: After the sintering process is completed, clean the glass powder that has not adhered to the processed surface;

[0093] Strengthening process: The anti-glare cover is strengthened by laser strengthening process, and after the laser strengthening process is completed, the anti-glare cover is further strengthened by heating and cooling process or solid strengthening process; the parameters of laser strengthening process are: spot diameter 20um, pulse width 400 picosecond, scanning speed 200mm / s, repetition frequency 500kHz, laser power 2W.

[0094] The dimensions of each AG structural unit in the anti-glare structure 4 on the cover plate obtained in this embodiment are 5um-20um, and the height is 0.8um-1.2um. Compared with Embodiment 1 and Embodiment 2, the anti-glare effect, clarity and flash point can all reach the excellent level.

[0095] Comparative Example 1: This comparative example uses the processing method of the above embodiment, except that the spot diameter, processing power and scanning speed of the single pulse laser are adjusted so that this comparative example can obtain an anti-glare structure 4 with an AG structural unit size of less than 0.1 μm. Compared with an anti-glare structure 4 with an AG structural unit size of 0.1 μm-100 μm, the anti-glare effect of the anti-glare structure 4 in this comparative example is poor.

[0096] Comparative Example 2: This comparative example uses the processing method of the above embodiments, but with the difference that the spot diameter, processing power and scanning speed of the single-pulse laser are adjusted, so that this comparative example obtains an anti-glare structure 4 with an AG structural unit size greater than 100um. Compared with the anti-glare structure 4 with an AG structural unit size of 0.1um-100um, when it is greater than 100um, the clarity and flash point problems of the anti-glare structure 4 in this comparative example are serious.

[0097] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0098] The above embodiments merely illustrate several implementation methods of the present invention, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this patent should be determined by the appended claims.

Claims

1. A method for preparing an anti-glare cover plate, characterized in that, include: Preparation process: Provide a substrate, the substrate including a processed surface; Surface treatment process: The surface of the processed surface is subjected to surface energy treatment to form multiple processed areas on the surface of the processed surface; Material feeding process: Sintering powder is laid on the processing surface, and the sintering powder covers at least each processing area; Sintering process: The sintering powder and the processing surface are scanned by laser so that the sintering powder covering the processing area adheres to the processing area, thereby forming an uneven anti-glare structure on the processing surface to obtain an anti-glare cover plate.

2. The method for preparing an anti-glare cover plate as described in claim 1, characterized in that, Prior to the surface treatment step, the method further includes: Preset patterns are provided; The surface treatment process uses a single-pulse laser to process the surface point by point according to the preset pattern to form each processing area.

3. The method for preparing an anti-glare cover plate as described in claim 2, characterized in that, The processing parameters of the single-pulse laser are as follows: spot diameter is 5um-100um, pulse width is 0.1 picosecond-1000 picosecond, scanning speed is 1000mm / s-20000mm / s, repetition frequency is not less than 200kHz, and laser power is 1W-2W; the product of the repetition frequency and the spot diameter of the single-pulse laser is not greater than its scanning speed.

4. The method for preparing an anti-glare cover plate as described in claim 1, characterized in that, The laser processing parameters used in the sintering process are as follows: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 100mm / s-10000mm / s, repetition frequency of not less than 200kHz, and laser power of 3W-5W.

5. The method for preparing an anti-glare cover plate as described in claim 1, characterized in that, After the sintering process, the method further includes a strengthening process, which is used to further strengthen the anti-glare cover plate obtained by the sintering process.

6. The method for preparing an anti-glare cover plate as described in claim 5, characterized in that, The strengthening process uses at least one or a combination of laser strengthening, heating and cooling processes, and ion strengthening processes.

7. The method for preparing an anti-glare cover plate as described in claim 6, characterized in that, In the strengthening process, the parameters of the laser strengthening process are: spot diameter of 5um-100um, pulse width of 0.1 picosecond-1000 picosecond, scanning speed of 100mm / s-10000mm / s, repetition frequency of more than 200kHz, and laser power of 1W-3W.

8. The method for preparing an anti-glare cover plate as described in claim 6 or 7, characterized in that, The strengthening process includes the following steps: The anti-glare cover plate is strengthened using the laser strengthening process described above; After the laser strengthening process, the material is further strengthened by the heating and cooling process or the ion strengthening process.

9. The method for preparing an anti-glare cover plate as described in claim 6 or 7, characterized in that, The laser strengthening process employs at least one of the laser scanning methods: area scanning and line scanning.

10. An anti-glare cover, characterized in that, It is prepared by the method described in any one of claims 1-9.

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