A passivated contact recombination layer for a solar cell and a method of making and using the same
By employing a layered design with multiple tunneling oxide layers and doped polycrystalline silicon layers, the problem of metal electrode sintering penetration was solved, improving the conversion efficiency and current conversion efficiency of TOPCon cells and simplifying the fabrication process.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ZHONGHUAN XINNENG (ANHUI) ADVANCED BATTERY MFG CO LTD
- Filing Date
- 2023-08-16
- Publication Date
- 2026-05-29
AI Technical Summary
In the existing passivation contact structure of TOPCon cells, the problem of metal electrode sintering through the doped polycrystalline silicon layer leads to an excessively thick doped polycrystalline silicon layer, which affects the cell efficiency. Furthermore, the light absorption effect of doped polycrystalline silicon is severe, making it difficult to balance passivation effect and current conversion efficiency.
A layered design of multilayer tunneling oxide layer and doped polysilicon layer is adopted. By adjusting the doping concentration and thickness of different layers, a first doped polysilicon layer with high doping and low thickness and a second doped polysilicon layer with low doping and high thickness are formed, which avoids metal electrode sintering through and omits silicon nitride layer to form ohmic contact.
This improved the open-circuit voltage and short-circuit current of the solar cell, reduced the light absorption of the doped polycrystalline silicon layer, enhanced the cell's conversion efficiency, and simplified the fabrication process.
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Figure CN117059679B_ABST