Hot chamfering device and method

Abstract

A method of thermal chamfering a glass panel, the method comprising: bringing a heater into contact with an edge of a glass panel by bringing the heater proximate to a chamfer start point; thermal chamfering the edge by moving the heater along a chamfer line from the chamfer start point to a chamfer end point; and bringing the heater out of contact with the glass panel by moving the heater away from the chamfer end point. The thermal chamfering can comprise maintaining a contact pressure between the heater moving along the chamfer line and the glass panel within a predetermined variation. At the bringing, an angle defined by a chamfer start point approach line and the chamfer line at the chamfer start point is in a range of 155° to 175°. At the moving away, an angle defined by the chamfer line and a chamfer end point departure line is in a range of 155° to 175°.

Description

Background Technology

[0001] Cross-reference to related applications

[0002] This application claims priority to Korean Patent Application Serial No. 10-2021-0048573, filed on April 14, 2021, the contents of which are the basis of this application and are incorporated herein by reference in their entirety. Technical Field

[0003] This disclosure relates to a hot chamfering apparatus and method, and more specifically, to a hot chamfering apparatus for hot chamfering the edge of a glass panel by moving the hot body along a chamfering line while keeping the hot body in contact with the edge of the glass panel, and a hot chamfering method using said apparatus.

[0004] Related technical descriptions

[0005] Edge defects in glass panels are a major cause of glass panel damage and reduce their reliability. Specifically, flexible devices, including thin glass panels, require reliable bending performance. In such flexible devices, the importance of eliminating edge defects is increasing.

[0006] Edge finishing is performed to improve the edge strength of glass panels. Among such edge finishing techniques, hot chamfering is known. Hot chamfering is suitable for thin glass panels that are susceptible to external mechanical forces. Furthermore, hot chamfering provides excellent edge strength without producing grain, thus offering satisfactory bending performance. Summary of the Invention

[0007] Various aspects of this disclosure provide a hot chamfering process that can achieve high yield while being reliable and accurate.

[0008] According to one aspect, a method for thermally chamfering a glass panel is provided. The method may include: bringing a heater into contact with an edge of the glass panel by causing a heater to move towards a chamfering starting point through relative movement between the heater and the glass panel; thermally chamfering the edge of the glass panel by applying thermal shock to it as the heater moves along a chamfering line from the chamfering starting point to the chamfering ending point through relative movement between the heater and the glass panel; and preventing the heater from contacting the glass panel by moving the heater away from the chamfering ending point through relative movement between the heater and the glass panel. The thermal chamfering may include controlling the relative position between the glass panel and the heater such that contact pressure is maintained between the glass panel and the heater during the relative movement between the heater and the glass panel along the chamfering line.

[0009] According to another aspect, a method for thermally chamfering a glass panel is provided. The method may include: bringing a heater into contact with an edge of the glass panel by causing a heater to approach a chamfering starting point through relative movement between the heater and the glass panel; thermally chamfering the edge of the glass panel by applying thermal shock to it as the heater moves along a chamfering line from the chamfering starting point to a chamfering ending point through relative movement between the heater and the glass panel; and preventing the heater from contacting the glass panel by moving the heater away from the chamfering ending point through relative movement between the heater and the glass panel. The heater may approach the chamfering starting point such that the angle defined by the heater along an approach line approaching the chamfering starting point and the chamfering line at the chamfering starting point is in the range of 155° to 175°. The heater may leave the chamfering ending point such that the angle defined by the chamfering line and the heater along a departure line leaving the chamfering ending point is in the range of 155° to 175°.

[0010] According to another aspect, a method for thermally chamfering a glass panel is provided. The method may include: bringing a heater into contact with the edge of the glass panel by causing a heater to approach a chamfering starting point through relative movement between the heater and the glass panel; thermally chamfering the edge of the glass panel by applying thermal shock to it as the heater moves along a chamfering line from the chamfering starting point to the chamfering ending point through relative movement between the heater and the glass panel; and preventing the heater from contacting the glass panel by moving the heater away from the chamfering ending point through relative movement between the heater and the glass panel before the heater returns to the chamfering starting point. The distance between the chamfering ending point and the chamfering starting point may be in the range of 1 mm to 3 mm.

[0011] According to another aspect, a hot chamfering device is provided, comprising: a support unit configured to support a glass panel; a heater configured to hot chamfer the edge of the glass panel by contacting the edge of the glass panel; and a control unit. The control unit is operable to: move the heater and the glass panel relative to each other such that the heater approaches a chamfering initiation point to contact the edge of the glass panel; move the heater and the glass panel relative to each other such that the heater hot chamfers the edge of the glass panel by applying thermal shock to it as it moves along a chamfering line from the chamfering initiation point to the chamfering end point; and move the heater and the glass panel relative to each other such that the heater moves away from the chamfering end point, thereby not contacting the glass panel. The control unit is controllable to maintain the relative position between the glass panel and the heater such that contact pressure is maintained between the heater and the glass panel as the heater moves along the chamfering line from the chamfering initiation point to the chamfering end point.

[0012] According to another aspect, a thermal chamfering device for a glass panel is provided. The thermal chamfering device may include: a support unit configured to support a glass panel; a heater configured to thermally chamfer the edge of the glass panel by contacting the edge of the glass panel; and a control unit. The control unit is capable of: relatively moving the heater and the glass panel such that the heater approaches a chamfering start point along an approach line to contact the edge of the glass panel; relatively moving the heater and the glass panel such that the heater thermally chamfers the edge of the glass panel by applying thermal shock to it as it moves along a chamfering line from the chamfering start point to the chamfering end point; and relatively moving the heater and the glass panel such that the heater moves away from the chamfering end point along a departure line, thereby not contacting the glass panel. The control unit can control the heater to approach the chamfer start point such that the angle defined by the approach line and the chamfer line at the chamfer start point is in the range of 155° to 175°, and the heater to move away from the chamfer end point such that the angle defined by the chamfer line and the departure line is in the range of 155° to 175°.

[0013] According to another aspect, a hot chamfering device for a glass panel is provided. The hot chamfering device may include: a support unit configured to support the glass panel; a heater configured to hot chamfer the edge of the glass panel by contacting the edge of the glass panel; and a control unit. The control unit can control: the heater and the glass panel to move relative to each other such that the heater approaches a chamfering start point to contact the edge of the glass panel; the heater and the glass panel to move relative to each other such that the heater hot chamfers the edge of the glass panel by applying thermal shock to it as it moves along a chamfering line from the chamfering start point to the chamfering end point; and the heater and the glass panel to move relative to each other such that the heater leaves the chamfering end point before returning to the chamfering start point, thereby avoiding contact with the glass panel. The distance between the chamfering end point and the chamfering start point may be in the range of 1 mm to 3 mm.

[0014] As described above, this disclosure provides a reliable and accurate hot chamfering process.

[0015] Therefore, hot chamfering can improve processing efficiency and reduce processing time, thereby achieving a high yield.

[0016] The methods and apparatus of this disclosure have other features and advantages, which will be apparent from or set forth in more detail in the accompanying drawings, the disclosure of which is incorporated herein by reference and in the following detailed description. Figure 1 This is used to explain certain principles of the contents of this disclosure. Attached Figure Description

[0017] Figure 1 This is a schematic view illustrating a glass panel hot chamfering device according to some embodiments of the present disclosure;

[0018] Figure 2 This is a schematic view illustrating a glass panel hot chamfering method according to some embodiments of the present disclosure;

[0019] Figure 3 This is a view showing the approach angle of the heater to the glass panel and the departure angle of the heater from the glass panel;

[0020] Figure 4 and Figure 5 This is a view showing the gap between the end point and the beginning point of the chamfer; and

[0021] Figure 6 This is a view showing the effect of the size of the gap between the end point and the beginning point of the chamfer. Detailed Implementation

[0022] The embodiments of this disclosure will be described in detail with reference to the accompanying drawings.

[0023] Figure 1 This is a schematic view illustrating a glass panel hot chamfering apparatus according to some embodiments of the present disclosure.

[0024] In some embodiments, the hot chamfering device may include a head unit 200, a support unit 300, and a control unit 400.

[0025] The head unit 200 may include a heater capable of applying thermal shock to the edge of the glass panel 100 by heating the edge of the glass panel 100. In some embodiments, the heater may include a heating element 210 and an induction coil 220, the induction coil heating the heating element 210 by high-frequency induction heating.

[0026] In some embodiments, the head unit 200 may include an insulation 230. The insulation 230 may prevent heat generated by the heater from being transferred to the remainder of the head unit 200. Additionally, the head unit 200 may include a cooler (not shown) for rapidly dissipating heat generated by the heater through heat exchange.

[0027] In some embodiments, the head unit 200 may include a pressure sensor 240. The pressure sensor 240 can detect the contact pressure between the heater and the glass panel 100. In some embodiments, when the glass panel 100 is moved to contact the heater while being movably supported, the heater is pushed, and the pressure sensor 240 can measure the distance the heater has moved, convert the distance into a pressure value, and display the numerical value of the pressure. The pressure sensor 240 may be a digital sensor. Unlike analog pressure sensors, digital pressure sensors are capable of active control to compensate for changes in the contact pressure between the heater and the glass panel 100 in real time during the hot chamfering process.

[0028] In some embodiments, the head unit 200 may include a driver 250. The driver 250 is a component of at least one of the moving heater and the support unit 300.

[0029] In some embodiments, the head unit 200 may include a distance measurement sensor (not shown), such as a laser distance measurement sensor.

[0030] The support unit 300 is a component that holds the glass panel 100 in place while performing hot chamfering. In embodiments where the glass panel 100 is held in a fixed position during hot chamfering, the support unit 300 holds the glass panel 100 in a fixed position by holding it in place. In contrast, in embodiments where the glass panel 100 is moved during hot chamfering, the support unit 300 can move the glass panel 100 while holding it in place.

[0031] The control unit 400 can receive values ​​read by the pressure sensor 240, distance measurement sensor, etc., and control the drive 250 based on these values.

[0032] Figure 2 This is a schematic view illustrating a glass panel hot chamfering method according to some embodiments of the present disclosure.

[0033] The glass panel 100 can be hot-beveled by applying a thermal shock to its edge. The thermal shock may be caused by the temperature difference between the edge of the glass panel 100, which is heated by a heater, and the rest of the glass panel 100.

[0034] In some embodiments, the glass panel 100 may include a glass substrate and devices disposed on the glass substrate. For example, the glass panel 100 may be a glass panel on which transparent electrodes, an organic light-emitting layer, a metal electrode, and an encapsulation layer are disposed on the glass substrate.

[0035] In some embodiments, the edge of the glass panel 100 can be peeled off by moving the heater relative to the edge of the glass panel 100 while keeping the heater in contact with the edge of the glass panel 100. Due to this chamfer, the strip 100a can be peeled off from the edge of the glass panel 100. Due to this chamfer, the strip 100a can be peeled off from the glass panel 100 without generating particles, thereby removing defects at the edge of the glass panel 100 and increasing the strength of the glass panel 100.

[0036] For relative movement, there is a movable glass panel 100, a movable heater, or both a movable glass panel 100 and a heater. Figure 2 An embodiment of the movable glass panel 100 is shown (arrows indicate the direction of movement of the glass panel 100), while Figures 3 to 6 An embodiment of the moving heat body 210 is shown (arrows indicate the direction of movement of the heat body 210).

[0037] The relative moving speed can vary depending on temperature conditions, the composition and shape of the glass panel 100 to be chamfered, etc. In some embodiments, the relative moving speed can be in the range of 5 mm / s to 20 mm / s (specifically, 10 mm / s to 15 mm / s) for linear edge portions, in the range of 10 mm / s to 30 mm / s (specifically, 15 mm / s to 20 mm / s) for concave edge portions, and in the range of 5 mm / s to 15 mm / s (specifically, 7 mm / s to 10 mm / s) for convex edge portions.

[0038] The glass panel 100 according to this disclosure may include a panel formed of any glass material (e.g., borosilicate glass). The main plane of the glass panel 100 may have a rectangular shape, but the glass panel 100 is not limited to a particular shape, such as a polygon, circle, or ellipse. In this disclosure, the glass panel 100 may be a sheet material with a thickness (e.g., measured in the Z-axis direction) smaller than the lateral length (e.g., measured in the X-axis direction) and longitudinal length (e.g., measured in the Y-axis direction) of the main plane. However, this disclosure is not limited to this, and the glass panel 100 may have various shapes, such as a block.

[0039] For example, when the main plane of the glass panel 100 has a rectangular shape and the main plane of the glass panel is referred to as the XY plane, the heater can perform chamfering by moving relative to each other in the X and Y directions while in contact with the four edges of the glass panel 100.

[0040] In some embodiments, the heater may perform chamfering while continuously contacting the four edges of the glass panel 100. For example, when the four edges of the glass panel 100 are referred to as the first edge, second edge, third edge, and fourth edge in a clockwise direction, the heater may chamfer all four edges of the glass panel 100 by: moving relative to each other in the X-axis direction until contacting the corner between the first and second edges upon contact with the first edge; moving relative to each other in the Y-axis direction until contacting the corner between the second and third edges upon contact with the second edge; moving relative to each other in the opposite direction to the X-axis direction until contacting the corner between the third and fourth edges upon contact with the third edge; and then moving relative to each other in the opposite direction to the Y-axis direction until contacting the corner between the fourth and first edges upon contact with the fourth edge.

[0041] The hot chamfering method may include: bringing the heater into contact with the glass panel 100 by moving the heater toward the chamfering start point through relative movement between the heater and the glass panel 100; chamfering the edge of the glass panel 100 by moving the heater along a chamfering line from the chamfering start point to the chamfering end point through relative movement between the heater and the glass panel 100; and separating the heater from the glass panel 100 by moving the heater away from the chamfering end point through relative movement between the heater and the glass panel 100. The chamfering line may be substantially parallel to the edge of the glass panel 100, and the start point of the chamfering line is the chamfering start point, and the end point of the chamfering line is the chamfering end point.

[0042] Here, the chamfering start point, chamfering end point, and chamfering line can be defined by the trajectory drawn from a specific point on the heater. For example, if the center point of the heater at the moment when the heater contacts the glass panel 100 is called the chamfering start point, then the center point of the heater at the moment when the heater separates from the glass panel 100 can be called the chamfering end point. Furthermore, the trajectory along which the center point of the heater moves during the chamfering process can be called the chamfering line.

[0043] The contact pressure between the heater and the edge of the glass panel 100 during hot chamfering is a very important factor affecting the quality of the hot chamfering. Therefore, it is necessary to monitor and actively control this pressure to achieve a suitable value. In this way, hot chamfering can be performed reliably with a high yield.

[0044] To achieve the predetermined peel width, the relative position between the glass panel 100 and the heated body 210 can be controlled during the relative movement of the heated body 210 and the glass panel 100 along the chamfer line, such that the variation in contact pressure between the heated body 210 and the glass panel 100 remains within a predetermined range. Here, the range refers to the difference between the maximum allowable pressure and the minimum allowable pressure. For example, when the contact pressure is maintained at 0.1 kgf / cm²... 2 Up to 1 kgf / cm 2 When within the range, the variation range is: 1 kgf / cm 2 -0.1kgf / cm 2 =0.9kgf / cm 2 That is, ±0.45 kgf / cm 2 When the contact pressure is too low, hot chamfering cannot be performed. Therefore, the hot chamfering may be discontinuous in this case. Conversely, when the contact pressure is too high, the thickness of the 100a strip peeled by chamfering may be too thick, thus increasing the dimensional loss of the final product. In some embodiments, the contact pressure can vary from 0.9 kgf / cm². 2 That is, ±0.45 kgf / cm 2 .

[0045] In some embodiments, the movable heater is positioned close to the chamfering start point such that the contact pressure between the heater and the glass panel 100, which has a thickness of 0.5 mm or less (e.g., 0.1 mm), is 0.1 kgf / cm at the chamfering start point. 2 Up to 1.0 kgf / cm 2 Within a certain range. In some such embodiments, the movable heater is brought close to the edge of the glass panel 100 until it reaches the chamfering start point, such that the contact pressure is within 0.2 kgf / cm². 2 Up to 0.5 kgf / cm 2 Within this range. In some such embodiments, the movable heater is brought close to the edge of the glass panel 100 until it reaches the chamfering start point, such that the contact pressure is 0.2 kgf / cm. 2 .

[0046] First, it is necessary to sense the contact pressure in order to set an initial value for the hot chamfering and to maintain optimal contact pressure throughout the hot chamfering process. In some embodiments, the contact pressure can be kept constant by using a digital pressure sensor to measure the value of the contact pressure in real time and by adjusting the relative position of the heater with respect to the glass panel 100 based on the measured value of the contact pressure through feedback control.

[0047] The relative position between the glass panel 100 and the heated element 210 can be adjusted according to the radius of the heated element 210. When using a heated element 210 with a larger radius, the relative position between the glass panel 100 and the heated element 210 (the central axis of the heated element) can be increased, thereby keeping the contact pressure constant. When using a heated element 210 with a smaller radius, the relative position between the glass panel 100 and the heated element 210 (the central axis of the heated element) can be decreased, thereby keeping the contact pressure constant.

[0048] In some embodiments, in a glass panel 100 with a thickness of 0.5 mm or less (e.g., 0.1 mm), the peel width can be in the range of 100 μm to 400 μm. That is, the edge of the glass panel 100 after chamfering can be formed to be 100 μm to 400 μm inside the edge of the glass panel 100 before chamfering. In some embodiments, the peel width can be 200 μm. A peel width in the range of 100 μm to 400 μm can be obtained by performing hot chamfering by contacting a heater with an optimal temperature with the glass panel 100 with an optimal contact pressure. The optimal temperature and optimal contact pressure can be controlled to be continuously maintained during hot chamfering. Therefore, hot chamfering can be performed with a predetermined peel width. The peel width can vary depending on whether a portion of the edge of the glass panel 100 is in a linear or angular portion. In some embodiments, when hot chamfering is performed on a glass panel 100 formed of EXG, Lotus, or IRIS glass available from Corning, the temperature of the heat source 210 can be a value obtained by adding the glass transition temperature of the glass panel 100 to 300°C to 700°C (specifically, 500°C to 600°C).

[0049] Figure 3 This is a view showing the approach angle of the heater to the glass panel and the departure angle of the heater from the glass panel.

[0050] In some embodiments, the heater (i.e., the heating element 210) may approach the chamfering start point P1 such that an angle in the range of 155° to 175° (specifically, 160° to 170°) is defined by the heater's approach line L1 and chamfering line L2. In some embodiments, the heater may exit the chamfering end point P3 such that an angle in the range of 155° to 175° (specifically, 160° to 170°) is defined by the heater's chamfering line L2 and exit line L3. The approach angle Θ1 and exit angle Θ3 within these ranges help to obtain the desired final shape of the chamfered glass panel at the chamfering start point P1 and the chamfering end point P3.

[0051] As described above, when the chamfering start point P1, chamfering end point P3, and chamfering line L2 are defined relative to any specific point of the heater, the approach angle Θ1 and the departure angle Θ3 can also be defined relative to the specific point of the heater. For example, the angle between the direction of travel of the center point of the heater immediately before the heater reaches the chamfering start point P1 and the direction of travel of the center point of the heater immediately after the heater reaches the chamfering start point P1 can be defined as the approach angle Θ1. Furthermore, the angle between the direction of travel of the center point of the heater immediately before the heater reaches the chamfering end point P3 and the direction of travel of the center point of the heater immediately after the heater reaches the chamfering end point P3 can be defined as the departure angle Θ3.

[0052] Figure 4 and Figure 5 This is a view showing the gap between the end point and the beginning point of the chamfer, and... Figure 6 This is a view showing the effect of the size of the gap between the end point and the beginning point of the chamfer.

[0053] Before the heater (i.e., the heating element 210) returns to the chamfering start point P1, the heater may move away from the chamfering end point P3, thus separating it from the glass panel 100. In some embodiments, the distance between the chamfering end point P3 and the chamfering start point P1 may be in the range of 1 mm to 3 mm (specifically, 1.5 mm to 2.5 mm). In some such embodiments, the distance between the chamfering end point P3 and the chamfering start point P1 may be 2 mm. By adjusting the distance and parameters such as temperature and pressure, hot chamfering can be performed without causing defects. In some such embodiments, the distance between the chamfering end point P3 and the chamfering start point P1 may be 2 mm. When the size of the gap 112 between the chamfering end point P3 and the chamfering start point P1 is too small, an overly sharp portion of the edge 111 of the chamfered glass panel may be produced. When the size of the gap 112 is too large, the un-chamfered edge portion may be increased.

[0054] Aspect (1) of this disclosure relates to a method for hot chamfering a glass panel, the method comprising: bringing a heater into contact with an edge of a glass panel by moving a heater toward a chamfering origin by relative movement between the heater and the glass panel; hot chamfering the edge of the glass panel by applying a thermal shock to the edge of the glass panel as the heater moves along a chamfering line from the chamfering origin to the chamfering end point by relative movement between the heater and the glass panel; and removing the heater from contact with the glass panel by moving the heater away from the chamfering end point by relative movement between the heater and the glass panel, wherein hot chamfering includes controlling the relative position between the glass panel and the heater such that contact pressure between the glass panel and the heater is maintained during relative movement between the heater and the glass panel along the chamfering line.

[0055] Aspect (2) of this disclosure relates to the hot chamfering method of aspect (1), wherein during relative movement between the heater and the glass panel along the chamfer line, the change in contact pressure between the heater and the glass panel remains within a predetermined range.

[0056] Aspect (3) of this disclosure relates to the hot chamfering method described in aspect (2), wherein the predetermined range is ±0.45 kgf / cm 2 .

[0057] Aspect (4) of this disclosure relates to the hot chamfering method described in aspect (2) or aspect (3), wherein the contact pressure between the heater and the glass panel is maintained at 0.1 kgf / cm. 2 Up to 1.0 kgf / cm2 Within a certain range, the variation in contact pressure between the heater and the glass panel is kept within a predetermined range.

[0058] Aspect (5) of this disclosure relates to the hot chamfering method described in aspect (4), wherein the contact pressure between the heater and the glass panel is maintained at 0.2 kgf / cm. 2 Up to 0.5 kgf / cm 2 Within a certain range, the variation in contact pressure between the heater and the glass panel is kept within a predetermined range.

[0059] Aspect (6) of this disclosure relates to the hot chamfering method of any one of aspects (1) to (5), wherein the relative position of the heater with respect to the glass panel is controlled by using a sensor to measure the value of the contact pressure in real time and by feeding back the measured value of the contact pressure to maintain the change of the contact pressure between the heater and the glass panel within a predetermined range.

[0060] Aspect (7) of this disclosure relates to a method for thermal chamfering a glass panel, the method comprising: bringing a heater into contact with an edge of a glass panel by bringing a heater into contact with an edge of a glass panel by moving the heater into contact with an edge of a glass panel by moving the heater into contact with an edge of a glass panel by moving the heater into contact with an edge of a glass panel by moving the heater into contact with an edge of a glass panel along a chamfer line by moving the heater into contact with an edge of a glass panel by moving the heater away from the edge of a glass panel by moving the heater away from the edge of a glass panel by moving the heater away from the edge of a glass panel by moving the heater away from the edge of a glass panel by moving the heater away from the edge of a glass panel, wherein the heater approaches the chamfering starting point such that the angle defined by the heater along an approach line to the chamfering starting point and the chamfer line at the chamfering starting point is in the range of 155° to 175°, and the heater moves away from the chamfering ending point such that the angle defined by the chamfer line and the heater along a departure line from the edge of a glass panel is in the range of 155° to 175°.

[0061] Aspect (8) of this disclosure relates to the hot chamfering method of aspect (7), wherein the heater approaches the chamfering start point such that the angle defined by the approach line and the chamfering line at the chamfering start point is in the range of 160° to 170°, and the heater moves away from the chamfering end point such that the angle defined by the chamfering line and the departure line is in the range of 160° to 170°.

[0062] Aspect (9) of this disclosure relates to a method for hot chamfering a glass panel, the method comprising: bringing a heater into contact with an edge of the glass panel by moving a heater toward a chamfering start point by relative movement between the heater and the glass panel; hot chamfering the edge of the glass panel by applying a thermal shock to the edge of the glass panel as the heater moves along a chamfering line from the chamfering start point to the chamfering end point by relative movement between the heater and the glass panel; and preventing the heater from contacting the glass panel by moving the heater away from the chamfering end point by relative movement between the heater and the glass panel before the heater returns to the chamfering start point, wherein the distance between the chamfering end point and the chamfering start point is in the range of 1 mm to 3 mm.

[0063] Aspect (10) of this disclosure relates to the hot chamfering method described in aspect (9), wherein the distance between the end point of the chamfer and the start point of the chamfer is in the range of 1.5 mm to 2.5 mm.

[0064] Aspect (11) of this disclosure relates to the hot chamfering method of any one of aspects (1) to (10), wherein the thickness of the glass panel is 0.5 mm or less.

[0065] Aspect (12) of this disclosure relates to a thermal chamfering method according to any one of aspects (1) to (10), wherein the heater comprises: a hot body configured to chamfer an edge of a glass panel by applying thermal shock to the edge of the glass panel when in contact with the edge of the glass panel; and an induction coil configured to heat the hot body by induction heating.

[0066] Aspect (13) of this disclosure relates to a hot chamfering apparatus for a glass panel, the hot chamfering apparatus comprising: a support unit configured to support a glass panel; a heater configured to hot chamfer the edge of the glass panel by contacting the edge of the glass panel; and a control unit wherein the control unit performs: relative movement of the heater and the glass panel such that the heater approaches a chamfering start point to contact the edge of the glass panel; relative movement of the heater and the glass panel such that the heater hot chamfers the edge of the glass panel by applying thermal shock to it as it moves along a chamfering line from the chamfering start point to the chamfering end point; and relative movement of the heater and the glass panel such that the heater moves away from the chamfering end point to avoid contact with the glass panel, and the control unit controls the relative position between the glass panel and the heater such that contact pressure between the heater and the glass panel is maintained as the heater moves along a chamfering line from the chamfering start point to the chamfering end point.

[0067] Aspect (14) of this disclosure relates to a hot chamfering apparatus for a glass panel, the hot chamfering apparatus comprising: a support unit configured to support a glass panel; a heater configured to hot chamfer the edge of the glass panel by contacting the edge of the glass panel; and a control unit wherein the control unit performs: relative movement of the heater and the glass panel such that the heater approaches the chamfering start point along an approach line to contact the edge of the glass panel; relative movement of the heater and the glass panel such that the heater hot chamfers the edge of the glass panel by applying thermal shock to it as it moves along a chamfering line from the chamfering start point to the chamfering end point; and relative movement of the heater and the glass panel such that the heater moves away from the chamfering end point along a departure line to avoid contact with the glass panel, and wherein the control unit controls: the heater to approach the chamfering start point such that the angle defined by the approach line and the chamfering line at the chamfering start point is in the range of 155° to 175°, and the heater to move away from the chamfering end point such that the angle defined by the chamfering line and the departure line is in the range of 155° to 175°.

[0068] Aspect (15) of this disclosure relates to a hot chamfering apparatus for a glass panel, the hot chamfering apparatus comprising: a support unit configured to support a glass panel; a heater configured to hot chamfer the edge of the glass panel by contacting the edge of the glass panel; and a control unit wherein the control unit controls: the heater and the glass panel to move relative to each other such that the heater approaches the chamfering start point to contact the edge of the glass panel; the heater and the glass panel to move relative to each other such that the heater hot chamfers the edge of the glass panel by applying thermal shock to it as it moves along the chamfering line from the chamfering start point to the chamfering end point; and the heater and the glass panel to move relative to each other such that the heater leaves the chamfering end point before returning to the chamfering start point, thereby not contacting the glass panel, and wherein the distance between the chamfering end point and the chamfering start point may be in the range of 1 mm to 3 mm.

[0069] This disclosure is not limited to the embodiments described above and shown in the accompanying drawings. Rather, those skilled in the art will understand that various modifications and alterations are possible without departing from the scope of the appended claims. Unless expressly stated otherwise, features described in the various claims may be combined. For example, even when two dependent claims relate only to the independent claim, a hot chamfering apparatus or hot chamfering method according to a particular embodiment of this disclosure may include all the features of both dependent claims.

Claims

1. A method for hot chamfering a glass panel, the method comprising: The heater is brought into contact with the edge of the glass panel by moving the heater closer to the chamfering origin through relative movement between the heater and the glass panel; Thermal chamfering is performed by applying thermal shock to the edge of the glass panel as the heater moves along the chamfer line from the chamfering start point to the chamfering end point through relative movement between the heater and the glass panel. as well as The heater is prevented from contacting the glass panel by moving away from the chamfer endpoint through relative movement between the heater and the glass panel. The hot chamfering includes controlling the relative position between the glass panel and the heater such that contact pressure between the glass panel and the heater is maintained during the relative movement between the heater and the glass panel along the chamfer line. The heater is located near the chamfering start point such that the angle defined by the heater along its approach line to the chamfering start point and the chamfering line at the chamfering start point is in the range of 155° to 175°. The heater is positioned away from the end of the chamfer such that the angle defined by the chamfer line and the heater along its departure line from the end of the chamfer is in the range of 155° to 175°.

2. The hot chamfering method of claim 1, wherein during the relative movement between the heater and the glass panel along the chamfer line, the change in the contact pressure between the heater and the glass panel remains within a predetermined range.

3. The hot chamfering method as described in claim 2, wherein the predetermined range is ±0.45 kgf / cm. 2 .

4. The hot chamfering method of claim 2, wherein the contact pressure between the heater and the glass panel is maintained at 0.1 kgf / cm. 2 Up to 1.0 kgf / cm 2 Within a certain range, the variation in the contact pressure between the heater and the glass panel is maintained within the predetermined range.

5. The hot chamfering method of claim 4, wherein the contact pressure between the heater and the glass panel is maintained at 0.2 kgf / cm. 2 Up to 0.5 kgf / cm 2 Within a certain range, the variation in the contact pressure between the heater and the glass panel is maintained within the predetermined range.

6. The hot chamfering method of claim 2, wherein the change in the contact pressure between the heater and the glass panel is maintained within the predetermined range by using a sensor to measure the value of the contact pressure in real time and by feeding back the measured value of the contact pressure to control the relative position of the heater with respect to the glass panel.

7. The hot chamfering method according to any one of claims 1 to 6, wherein the thickness of the glass panel is 0.5 mm or less.

8. The hot chamfering method according to any one of claims 1 to 6, wherein the heater comprises: A heating element configured to chamfer the edge of the glass panel by applying thermal shock to the edge of the glass panel when in contact with the edge; as well as An induction coil configured to heat the hot body by induction heating.

9. A method for hot chamfering a glass panel, the method comprising: The heater is brought into contact with the edge of the glass panel by moving the heater closer to the chamfering origin through relative movement between the heater and the glass panel; Thermal chamfering is performed by applying thermal shock to the edge of the glass panel as the heater moves along the chamfer line from the chamfering start point to the chamfering end point through relative movement between the heater and the glass panel. as well as The heater is prevented from contacting the glass panel by moving away from the chamfer endpoint through relative movement between the heater and the glass panel. The heater is located near the chamfering start point such that the angle defined by the heater along its approach line near the chamfering start point and the chamfering line at the chamfering start point is in the range of 155° to 175°. The heater is positioned away from the end of the chamfer, such that the angle defined by the chamfer line and the heater along its departure line from the end of the chamfer is in the range of 155° to 175°.

10. The hot chamfering method of claim 9, wherein the heater is close to the chamfering origin such that the angle defined by the approach line and the chamfering line at the chamfering origin is in the range of 160° to 170°, and The heater is positioned away from the end of the chamfer, such that the angle defined by the chamfer line and the departure line is in the range of 160° to 170°.

11. The hot chamfering method according to any one of claims 9 to 10, wherein the thickness of the glass panel is 0.5 mm or less.

12. The hot chamfering method according to any one of claims 9 to 10, wherein the heater comprises: A heating element configured to chamfer the edge of the glass panel by applying thermal shock to the edge of the glass panel when in contact with the edge; as well as An induction coil configured to heat the hot body by induction heating.

13. A method for hot chamfering a glass panel, the method comprising: The heater is brought into contact with the edge of the glass panel by moving the heater closer to the chamfering origin through relative movement between the heater and the glass panel; Thermal chamfering is performed by applying thermal shock to the edge of the glass panel as the heater moves along the chamfer line from the chamfering start point to the chamfering end point through relative movement between the heater and the glass panel. as well as The heater is prevented from contacting the glass panel by moving away from the chamfer endpoint through relative movement between the heater and the glass panel before the heater returns to the chamfer starting point. The distance between the end point and the start point of the chamfer is in the range of 1 mm to 3 mm. The heater is located near the chamfering start point such that the angle defined by the heater along its approach line to the chamfering start point and the chamfering line at the chamfering start point is in the range of 155° to 175°. The heater is positioned away from the end of the chamfer such that the angle defined by the chamfer line and the heater along its departure line from the end of the chamfer is in the range of 155° to 175°.

14. The hot chamfering method of claim 13, wherein the distance between the chamfering endpoint and the chamfering starting point is in the range of 1.5 mm to 2.5 mm.

15. The hot chamfering method according to any one of claims 13 to 14, wherein the thickness of the glass panel is 0.5 mm or less.

16. The hot chamfering method according to any one of claims 13 to 14, wherein the heater comprises: A heating element configured to chamfer the edge of the glass panel by applying thermal shock to the edge of the glass panel when in contact with the edge; as well as An induction coil configured to heat the hot body by induction heating.

17. A hot beveling device for a glass panel, the hot beveling device comprising: Support unit, the support unit being configured to support the glass panel; A heater configured to perform a thermal chamfer on the edge of the glass panel by contacting the edge of the glass panel; as well as Control unit The control unit performs the following: The heater and the glass panel are moved relative to each other such that the heater approaches the chamfering start point to contact the edge of the glass panel, wherein the heater approaches the chamfering start point such that the angle defined by the heater along its approach line to the chamfering start point and the chamfering line at the chamfering start point is in the range of 155° to 175°. The heater and the glass panel are moved relative to each other, such that the heater performs thermal chamfering on the edge of the glass panel by applying thermal shock along the chamfer line from the chamfer start point to the chamfer end point; as well as The heater and the glass panel are moved relative to each other such that the heater moves away from the end of the chamfer, thus avoiding contact with the glass panel, wherein the heater moves away from the end of the chamfer such that the angle defined by the chamfer line and the heater along its departure line from the end of the chamfer is in the range of 155° to 175°. The control unit controls the relative position between the glass panel and the heater, such that the contact pressure between the heater and the glass panel is maintained as the heater moves along the chamfer line from the chamfer start point to the chamfer end point.

18. A hot beveling device for a glass panel, the hot beveling device comprising: Support unit, the support unit being configured to support the glass panel; A heater configured to perform a thermal chamfer on the edge of the glass panel by contacting the edge of the glass panel; as well as Control unit The control unit performs the following: The heater and the glass panel are moved relative to each other such that the heater approaches the chamfer start point along the approach line to contact the edge of the glass panel; The heater and the glass panel are moved relative to each other, such that the heater performs thermal chamfering on the edge of the glass panel by applying thermal shock along the chamfer line from the chamfer start point to the chamfer end point; as well as The heater and the glass panel are moved relative to each other, such that the heater moves away from the chamfer endpoint along the departure line, thereby avoiding contact with the glass panel. The control unit controls: The heater is positioned close to the chamfering start point such that the angle defined by the approach line and the chamfering line at the chamfering start point is within the range of 155° to 175°. The heater is positioned away from the end of the chamfer, such that the angle defined by the chamfer line and the departure line is in the range of 155° to 175°.

19. A hot beveling device for a glass panel, the hot beveling device comprising: Support unit, the support unit being configured to support the glass panel; A heater configured to perform a thermal chamfer on the edge of the glass panel by contacting the edge of the glass panel; as well as Control unit The control unit controls: The heater and the glass panel move relative to each other such that the heater approaches the chamfering start point to contact the edge of the glass panel, wherein the heater approaches the chamfering start point such that the angle defined by the heater along its approach line to the chamfering start point and the chamfering line at the chamfering start point is in the range of 155° to 175°. The heater and the glass panel move relative to each other, such that the heater performs thermal chamfering on the edge of the glass panel by applying thermal shock along the chamfer line from the chamfer start point to the chamfer end point; The heater and the glass panel move relative to each other, such that the heater leaves the chamfer end point before the heater returns to the chamfer start point, thereby not contacting the glass panel; The heater is positioned away from the end of the chamfer such that the angle defined by the chamfer line and the heater along its departure line from the end of the chamfer is in the range of 155° to 175°. The distance between the end point of the chamfer and the beginning point of the chamfer is in the range of 1 mm to 3 mm.

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