Oxygen treatment system and method of controlling the same

Abstract

The application provides an oxygen treatment system and a control method thereof, wherein the oxygen treatment system comprises an oxygen treatment device for treating oxygen through an electrochemical reaction and a liquid supplementing device for supplementing liquid to the oxygen treatment device, and the control method comprises: detecting a liquid level drop rate of the liquid supplementing device; judging whether the liquid level drop rate of the liquid supplementing device is greater than a preset drop rate threshold; if yes, locating a leakage point of the oxygen treatment system; and performing an alarm measure corresponding to the leakage point. By using the method, the oxygen treatment system has the liquid leakage self-monitoring capability and the leakage point locating capability, so that the user can take targeted remedial measures. According to the scheme of the application, the oxygen regulation function of the oxygen treatment device can be reduced or avoided from being disabled due to liquid leakage, and the surrounding environment is protected from being eroded by electrolyte.

Description

Technical Field

[0001] This invention relates to modified atmosphere storage technology, and in particular to an oxygen processing system and its control method. Background Technology

[0002] Modified atmosphere packaging (MAP) technology extends the shelf life of food by adjusting the composition of ambient gases. Oxygen treatment devices use electrochemical reactions at electrodes to process oxygen, creating either a low-oxygen or high-oxygen preservation atmosphere. Since the electrochemical reactions typically take place in an electrolyte and produce gases, these gases must be released into the external environment.

[0003] During the reaction, a large amount of heat is generated, causing the electrolyte to evaporate. This means that trace amounts of electrolyte may be carried in the gas emitted by the oxygen treatment device. Therefore, a replenishment device is needed in the oxygen treatment system to replenish the electrolyte. The inventors recognized that if the oxygen treatment system leaks, it will not only affect the normal functioning of oxygen regulation but may also cause the surrounding environment to be corroded by the electrolyte.

[0004] The information disclosed in this background section is only intended to enhance the understanding of the background technology of this application, and therefore may include prior art that is not known to those skilled in the art. Summary of the Invention

[0005] One object of the present invention is to overcome at least one technical defect in the prior art and to provide an oxygen treatment system and its control method.

[0006] A further objective of this invention is to enable the oxygen treatment system to have self-monitoring capability for leaks and leak location capability, so as to assist users in taking targeted remedial measures.

[0007] Another further objective of this invention is to simplify the means of locating leaks while ensuring the accuracy of the location results.

[0008] In particular, according to one aspect of the present invention, a control method for an oxygen treatment system is provided, the oxygen treatment system comprising an oxygen treatment device for treating oxygen by an electrochemical reaction and a replenishment device for replenishing the oxygen treatment device with liquid, and the control method comprising:

[0009] Detect the rate of drop in the liquid level of the replenishment device;

[0010] Determine whether the rate of liquid level drop in the replenishment device is greater than a preset drop rate threshold;

[0011] If so, locate the leak in the oxygen treatment system;

[0012] Implement warning measures corresponding to the leak.

[0013] Optionally, the step of locating a leak in the oxygen treatment system includes:

[0014] Acquire information on the liquid state changes of the oxygen treatment device;

[0015] The leak point of the oxygen treatment system is located based on the liquid state change information of the oxygen treatment device.

[0016] Optionally, the step of obtaining information on the liquid state change of the oxygen treatment device includes:

[0017] The real-time values ​​of electrical parameters of the oxygen treatment device during the electrochemical reaction are obtained.

[0018] The liquid state change information of the oxygen treatment device is determined based on the real-time values ​​of the electrical parameters of the oxygen treatment device.

[0019] Optionally, the step of determining the liquid state change information of the oxygen treatment device based on the real-time values ​​of the electrical parameters of the oxygen treatment device includes:

[0020] To obtain the expected values ​​of electrical parameters of the oxygen treatment device during the electrochemical reaction;

[0021] The real-time value of the electrical parameter is compared with the expected value of the electrical parameter, and the liquid state change information of the oxygen treatment device is determined based on the comparison result.

[0022] Optionally, the step of obtaining the expected values ​​of the electrical parameters during the electrochemical reaction of the oxygen treatment device includes:

[0023] The sampling temperature for obtaining real-time values ​​of the electrical parameters of the oxygen treatment device;

[0024] The expected value of the electrical parameter is determined based on the sampling temperature of the real-time value of the electrical parameter.

[0025] Optionally, the liquid state change information includes liquid concentration change information used to indicate the liquid concentration change value of the oxygen treatment device; and

[0026] The step of comparing the real-time value of the electrical parameter with the expected value of the electrical parameter, and determining the liquid state change information of the oxygen treatment device based on the comparison result, includes:

[0027] Determine whether the difference between the real-time value of the electrical parameter and the expected value of the electrical parameter is less than a preset deviation threshold;

[0028] If so, then the change in liquid concentration of the oxygen treatment device is determined to be negative;

[0029] If not, then the change in liquid concentration of the oxygen treatment device is determined to be positive.

[0030] Optionally, the step of locating the leak point of the oxygen treatment system based on the liquid state change information of the oxygen treatment device includes:

[0031] If the liquid concentration change value of the oxygen treatment device is negative, then the leak point of the oxygen treatment system is located in the oxygen treatment device.

[0032] If the change in liquid concentration of the oxygen treatment device is positive, then the leak point of the oxygen treatment system is located as the liquid replenishment device and / or the liquid replenishment channel connecting the liquid replenishment device and the oxygen treatment device.

[0033] Optionally, the steps of implementing warning measures corresponding to the leak include:

[0034] If the leak is located in the oxygen treatment device, a first warning signal is output.

[0035] If the leak point is located in the replenishment device and / or the replenishment channel connecting the replenishment device and the oxygen treatment device, a second prompt signal is output.

[0036] Optionally, if it is determined that the rate of liquid level drop in the replenishment device is greater than a preset rate of drop threshold, and before performing the step of locating the leak in the oxygen treatment system, the method further includes:

[0037] Determine that the oxygen treatment device is in a shutdown state, and record the current liquid level of the liquid replenishment device as the initial liquid level;

[0038] Calculate the theoretical value of the time interval for replenishment caused by the non-electrochemical reaction of the oxygen treatment device;

[0039] The real-time value of the time interval between the initial liquid level and the preset safe liquid level of the replenishment device is obtained.

[0040] Determine whether the real-time value of the time interval is less than the theoretical value of the time interval;

[0041] If so, it is verified as a leak, and the leak point of the oxygen treatment system is located.

[0042] According to another aspect of the present invention, an oxygen treatment system is also provided, the oxygen treatment system comprising an oxygen treatment device for treating oxygen by an electrochemical reaction and a replenishment device for replenishing the oxygen treatment device with liquid, and further comprising:

[0043] A processor and a memory, wherein the memory stores a machine-executable program, which, when executed by the processor, is used to implement the control method according to any one of the above.

[0044] The oxygen treatment system and control method of the present invention detect the rate of liquid level drop in the replenishment device. When an excessively high rate of liquid level drop is detected, the system locates the leak in the oxygen treatment system and executes corresponding alarm measures. This enables the oxygen treatment system to possess leak self-monitoring and leak location capabilities, assisting users in taking targeted remedial measures. Based on the solution of the present invention, the failure of the oxygen regulation function of the oxygen treatment device due to leakage can be reduced or avoided, and the surrounding environment can be protected from electrolyte corrosion.

[0045] Furthermore, the oxygen treatment system and control method of the present invention can accurately locate the leak point of the oxygen treatment system by acquiring the liquid state change information of the oxygen treatment device, since the liquid state change information of the oxygen treatment device can reflect the effect of the previous liquid replenishment device to the oxygen treatment device and the liquid loss of the oxygen treatment device itself. This eliminates the need to sample and analyze data for each part of the oxygen treatment system separately, which simplifies the means of locating the leak point.

[0046] Furthermore, the oxygen treatment system and control method of the present invention obtain the real-time values ​​of electrical parameters when the oxygen treatment device undergoes an electrochemical reaction, and determine the liquid state change information of the oxygen treatment device based on the real-time values ​​of the electrical parameters. This has the advantages of simple sampling, simple analysis method, and high accuracy of analysis results. It eliminates the need to set up an additional liquid state monitoring mechanism inside the oxygen treatment device, which helps to simplify the means of locating leaks in the oxygen treatment system and reduces the manufacturing and operating costs of the system.

[0047] The above and other objects, advantages and features of the present invention will become more apparent to those skilled in the art from the following detailed description of specific embodiments of the invention in conjunction with the accompanying drawings. Attached Figure Description

[0048] The following sections will describe some specific embodiments of the invention in detail by way of example and not limitation, with reference to the accompanying drawings. The same reference numerals in the drawings denote the same or similar parts or portions. Those skilled in the art should understand that these drawings are not necessarily drawn to scale. In the drawings:

[0049] Figure 1 This is a schematic block diagram of an oxygen treatment system according to an embodiment of the present invention;

[0050] Figure 2This is a schematic structural diagram of an oxygen treatment system according to an embodiment of the present invention;

[0051] Figure 3 This is a schematic structural diagram of a fluid replenishment device according to an embodiment of the present invention;

[0052] Figure 4 This is a schematic diagram of a control method for an oxygen treatment system according to an embodiment of the present invention;

[0053] Figure 5 This is a control flowchart of an oxygen treatment system according to an embodiment of the present invention. Detailed Implementation

[0054] Reference will now be made in detail to embodiments of the invention, one or more of which are illustrated in the accompanying drawings. The various embodiments provided are intended to explain the invention and not to limit it. In fact, various modifications and variations to the invention will be apparent to those skilled in the art without departing from the scope or spirit of the invention. For example, a feature illustrated or described as part of one embodiment may be used with another embodiment to produce yet another embodiment. Therefore, the invention is intended to cover such modifications and variations within the scope of the appended claims and their equivalents.

[0055] The following reference Figures 1 to 5 The present invention describes an oxygen treatment system 50 and its control method according to an embodiment of the present invention. The terms "inner," "outer," "upper," "lower," "top," "bottom," and "lateral," etc., indicate the orientation or positional relationship based on the orientation or positional relationship of the various components of the oxygen treatment system 50 in its operational state. These terms are used only for the convenience of describing the present invention and for simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0056] In the description of this embodiment, it should be understood that the term "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified. When a feature "includes or contains" one or more of the features it covers, unless otherwise specifically described, this indicates that other features are not excluded and may be further included.

[0057] In the description of this embodiment, the terms "one embodiment," "some embodiments," "example," "a case," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0058] The present invention first provides an oxygen processing system 50. Figure 1 This is a schematic block diagram of an oxygen treatment system 50 according to an embodiment of the present invention. The oxygen treatment system 50 generally includes an oxygen treatment device 20, a liquid replenishment device 10, a processor 110, and a memory 120. Figure 2 This is a schematic structural diagram of an oxygen treatment system 50 according to an embodiment of the present invention, wherein the processor 110 and the memory 120 are omitted. The oxygen treatment system 50 of this embodiment is used to be installed in a refrigerator to treat the oxygen in the storage space of the refrigerator using the oxygen treatment device 20.

[0059] The oxygen treatment device 20 is used to treat oxygen through an electrochemical reaction, such as consuming oxygen and / or generating oxygen, thereby reducing and / or increasing the oxygen content of the space. The liquid replenishment device 10 is used to replenish the oxygen treatment device 20 with liquid.

[0060] The oxygen treatment device 20 generally includes a housing 210, an anode plate (not shown), and a cathode plate 220. The cathode plate 220 is used to consume oxygen through an electrochemical reaction under the action of an electrolysis voltage. The anode plate is used to provide reactants (e.g., electrons) to the cathode plate 220 and generate oxygen through an electrochemical reaction under the action of an electrolysis voltage.

[0061] When an electric current is applied, for example, oxygen in the air can undergo a reduction reaction at the cathode plate 220, namely: O2 + 2H2O + 4e - →4OH - OH generated by cathode plate 220 - An oxidation reaction can occur at the anode plate, producing oxygen, i.e., 4OH⁻. - →O2 + 2H2O + 4e - .

[0062] In this embodiment, the electrochemical reaction of the oxygen treatment device 20 leads to the loss of water in the electrolyte. Therefore, it is only necessary to replenish water to the oxygen treatment device 20, and the liquid in the replenishment device 10 can be water. Of course, in other embodiments, the replenishment device 10 can also replenish the oxygen treatment device 20 with an electrolyte of appropriate concentration.

[0063] The above examples of electrochemical reactions of the anode plate and cathode plate 220 are merely illustrative. Based on the understanding of the above embodiments, those skilled in the art should be able to easily change the type of electrochemical reaction or extend the structure of the oxygen treatment device 20 to be applicable to other types of electrochemical reactions. All such changes and extensions should fall within the protection scope of this invention.

[0064] An opening is provided on the side wall of the housing 210, and the cathode plate 220 can be disposed at the opening and together with the housing 210 define an electrolysis chamber for holding electrolyte. The anode plate can be disposed in the electrolysis chamber at intervals from the cathode plate 220.

[0065] The replenishment device 10 may generally include a housing 410. Figure 3 This is a schematic structural diagram of a fluid replenishment device 10 according to an embodiment of the present invention.

[0066] The interior of the housing 410 defines a liquid storage space 411 that is connected to the gas path and blocked by the liquid path, and a gas collection space 412. Figure 3 The dashed line in the diagram shows the boundary between the liquid storage space 411 and the gas collection space 412. The liquid storage space 411 is used to filter oxygen from the oxygen treatment device 20. The liquid storage space 411 is used to hold liquids, such as water or other solutions. The type of liquid can be set according to the solubility characteristics of oxygen and the solubility characteristics of impurities contained in oxygen, as long as the impurities contained in oxygen can dissolve in the liquid while the oxygen itself hardly dissolves in the liquid. A liquid outlet 413 is formed on the housing 410, communicating with the liquid storage space 411, to allow the liquid in the liquid storage space 411 to flow out of the liquid storage space 411 and into the electrolysis chamber of the oxygen treatment device 20. For example, a liquid replenishment pipe 510 can be connected between the liquid outlet 413 and the liquid replenishment port 212 described below, which is used to guide the liquid flowing out of the liquid storage space 411 to the electrolysis chamber.

[0067] The housing 410 also has an injection port 416 that communicates with the liquid storage space 411, allowing liquid from outside the housing 410 to be injected into the liquid storage space 411 to replenish the liquid storage space 411. The highest point of the injection port 416 is lower than the lowest point of the gas collection space 412, so that the gas collection space 412 is physically confined above the liquid storage space 411 and is blocked from the liquid path of the liquid storage space 411.

[0068] The gas collection space 412 is connected to the external environment of the housing 410 to discharge oxygen filtered by the liquid storage space 411 from the housing 410. The liquid storage space 411 and the gas collection space 412 are connected by an airflow path but have a blocked liquid path. This means that while there is an airflow path between the liquid storage space 411 and the gas collection space 412, allowing for gas exchange, the liquid path between them is blocked, preventing liquid in the liquid storage space 411 from entering the gas collection space 412. The gas collection space 412 is not used to hold liquids; it is only used to collect and discharge oxygen filtered by the liquid storage space 411.

[0069] The housing 410 may have an air inlet 414 communicating with the liquid storage space 411 and an air outlet 415 communicating with the gas collection space 412. An air supply pipe 310 may be connected between the air inlet 414 and the exhaust port 211 described below, the air supply pipe 310 being used to guide the gas flowing out of the exhaust port 211 to the liquid storage space 411. The liquid replenishment device 10 may further include a filter pipe 420 and an air outlet pipe 430.

[0070] The filter pipe 420 is inserted into the gas collection space 412 from the air inlet 414 and extends into the liquid storage space 411 to guide the gas into the liquid storage space 411, so that soluble substances in the gas dissolve in the liquid storage space 411. The outlet pipe 430 is inserted into the gas collection space 412 from the air outlet 415 and extends above the lowest point of the gas collection space 412 to guide the filtered gas out of the housing 410.

[0071] The replenishment device 10 may further include a gas-blocking mechanism 440, which divides the liquid storage space 411 into a filtration zone and a non-filtration zone, where the gas path is blocked but the liquid path is connected. A filter pipe 420 extends into the filtration zone. The gas-blocking mechanism 440 may be a partition extending downwards from the inner surface of the top wall of the housing 410 to above the inner surface of the bottom wall of the housing 410, with a gap between it and the inner surface of the bottom wall of the housing 410, which allows the liquid path between the filtration zone and the non-filtration zone to communicate. The gas-blocking mechanism 440 blocks the gas path between the filtration zone and the non-filtration zone to prevent gas flowing into the filtration zone from entering the non-filtration zone. The liquid inlet 416 may connect to the non-filtration zone.

[0072] The housing 210 may have an exhaust port 211 for discharging oxygen produced by the electrochemical reaction of the anode plate. This exhaust port 211 can be connected to the liquid storage space 411 via a gas supply pipe 310. The housing 210 may also have a replenishment port 212 connected to the electrolysis chamber. This replenishment port 212 can be connected to the injection port 416 to allow liquid contained in the replenishment device 10 to flow into the electrolysis chamber of the housing 210. A liquid storage chamber communicating with the electrolysis chamber may be formed on one side of the electrolysis chamber of the housing 210; for example, a connection port may be formed between the electrolysis chamber and the liquid storage chamber. The replenishment port 212 connects to the liquid storage chamber to supply liquid to the liquid storage chamber, thereby indirectly replenishing the electrolysis chamber. A level switch may be installed in the liquid storage chamber to open and close the liquid passage between the replenishment port 212 and the liquid storage chamber based on the liquid level in the liquid storage chamber. In this way, the liquid volume in the oxygen treatment device 20 is in a dynamic equilibrium state. The amount of liquid supplied by the replenishment device 10 to the oxygen treatment device 20 can be indirectly determined.

[0073] There can be multiple openings, and each opening can be equipped with a cathode plate 220, with each cathode plate 220 facing an anode plate.

[0074] The memory 120 and processor 110 may form part of the main control board of the oxygen treatment system 50. Alternatively, the memory 120 and processor 110 may be at least part of the main control board of a refrigerator. The memory 120 stores a machine-executable program 121, which, when executed by the processor 110, is used to implement the control method of the oxygen treatment system 50 according to any of the following embodiments. The processor 110 may be a central processing unit (CPU), a digital processing unit (DSP), etc. The memory 120 is used to store the program executed by the processor 110. The memory 120 may be any medium capable of carrying or storing desired program code in the form of instructions or data structures and accessible by a computer, but is not limited thereto. The memory 120 may also be a combination of various types of memory 120. Since the machine-executable program 121, when executed by the processor 110, implements the various processes of the following method embodiments and achieves the same technical effects, it will not be described again here to avoid repetition.

[0075] Figure 4 This is a schematic diagram of a control method for an oxygen treatment system 50 according to an embodiment of the present invention. The control method generally includes the following steps:

[0076] Step S402: Detect the rate of liquid level drop in the replenishment device 10. The rate of liquid level drop in the replenishment device 10 reflects how quickly the liquid level in the replenishment device 10 decreases. For example, a liquid level sensor (not shown) can be installed inside the replenishment device 10 to detect the liquid level and thus determine the rate of liquid level drop. The liquid level sensor can be installed inside the liquid storage space 411.

[0077] Step S404: Determine whether the liquid level drop rate of the replenishment device 10 is greater than a preset drop rate threshold. If so, proceed to step S406. When the liquid level drop rate of the replenishment device 10 is greater than the preset drop rate threshold, it indicates that the liquid level drop rate of the replenishment device 10 is too fast, and the oxygen treatment system 50 is leaking. If it is determined that the oxygen treatment system 50 is leaking, proceed to step S406.

[0078] Step S406: Locate the leak in the oxygen treatment system 50. Since the oxygen treatment system 50 includes an oxygen treatment device 20 and a replenishment device 10, and a replenishment channel may be provided between the replenishment device 10 and the oxygen treatment device 20, there can be multiple reasons for a leak in the oxygen treatment system 50, such as damage to the oxygen treatment device 20, damage to the replenishment device 10, or a pipe rupture. Locating the leak in the oxygen treatment system 50 means analyzing the causes of the excessively rapid drop in the liquid level of the replenishment device 10 and determining the actual leak point.

[0079] Step S408: Execute alarm measures corresponding to the leak point. That is, if a leak point is determined in the oxygen treatment system 50, a corresponding fault warning signal can be output to prompt the user and / or manufacturer to perform timely maintenance. By locating the leak point in the oxygen treatment system 50 and taking corresponding alarm measures, users can be assisted in taking appropriate measures in a targeted manner.

[0080] For example, a fault indication signal may be sent to a user terminal that is data-connected to the main control board of the oxygen processing unit 20, and / or to a designated fault handling station, but is not limited to this. The form of the fault indication signal may include, but is not limited to, text, sound, or voice.

[0081] Using the above method, by detecting the rate of liquid level drop in the replenishment device 10, and when an excessively high rate of liquid level drop is detected, the leak point in the oxygen treatment system 50 is located, and corresponding alarm measures are executed. This enables the oxygen treatment system 50 to possess leak self-monitoring and leak location capabilities, assisting users in taking targeted remedial measures. Based on the solution of this invention, the failure of the oxygen regulation function of the oxygen treatment device 20 due to leakage can be reduced or avoided, and the surrounding environment can be protected from electrolyte corrosion.

[0082] In some optional embodiments, the step of locating a leak in the oxygen treatment system 50 includes: acquiring liquid state change information of the oxygen treatment device 20, and locating the leak in the oxygen treatment system 50 based on the liquid state change information of the oxygen treatment device 20. The liquid state change information of the oxygen treatment device 20 is used to describe the state changes of the electrolyte in the oxygen treatment device 20. For example, the liquid state change information may include any one or a combination of the following parameters of the oxygen treatment device 20: electrolyte concentration change value, density change value, liquid level change value, and liquid volume change value, etc.

[0083] For example, if the oxygen treatment device 20 leaks, the electrolyte concentration in the oxygen treatment device 20 will decrease, resulting in a negative concentration change; in this case, the electrolyte level in the oxygen treatment device 20 will not change significantly. If the replenishment device 10 or the replenishment channel leaks, the electrolyte concentration in the oxygen treatment device 20 may increase, resulting in a positive concentration change, or it may cause a significant drop in the electrolyte level in the oxygen treatment device 20. When the replenishment device 10 or the replenishment channel leaks, the replenishment device 10 will supply less liquid to the oxygen treatment device 20. As the electrochemical reaction proceeds, the water content in the electrolyte of the oxygen treatment device 20 will decrease, which may cause the electrolyte concentration in the oxygen treatment device 20 to increase.

[0084] Since the liquid state change information of the oxygen treatment device 20 can reflect the effect of the previous replenishment of liquid by the replenishment device 10 to the oxygen treatment device 20, as well as the liquid loss of the oxygen treatment device 20 itself, by obtaining the liquid state change information of the oxygen treatment device 20, the leak point of the oxygen treatment system 50 can be accurately located based on the liquid state change information of the oxygen treatment device 20, without the need to sample and analyze data for each part of the oxygen treatment system 50, which helps to simplify the means of locating the leak point.

[0085] There are several methods to obtain information on the liquid state changes of the oxygen treatment device 20. For example, a liquid level sensor for detecting the liquid level or a liquid concentration sensor for detecting the liquid concentration can be installed in the oxygen treatment device 20. By analyzing the liquid level detection results or the liquid concentration detection results, the information on the liquid state changes of the oxygen treatment device 20 can be determined.

[0086] In some further examples, the step of obtaining information on the liquid state change of the oxygen treatment device 20 includes: obtaining real-time values ​​of electrical parameters of the oxygen treatment device 20 during the electrochemical reaction, and determining the liquid state change information of the oxygen treatment device 20 based on the real-time values ​​of the electrical parameters of the oxygen treatment device 20. The electrical parameters of the oxygen treatment device 20 during the electrochemical reaction may include any one or a combination of the following parameters: operating current, operating voltage, operating resistance, and power, etc.

[0087] The electrical parameters of the oxygen treatment device 20 during the electrochemical reaction can reflect whether the electrochemical reaction is proceeding normally. For example, during the electrochemical reaction, the oxygen treatment device 20 can be energized according to a preset electrolysis voltage value. When the electrochemical reaction is normal, the operating current of the oxygen treatment device 20 can remain constant. Furthermore, when the oxygen treatment device 20 is in a normal state (no leakage in the oxygen treatment system 50, and no damage or aging of any components), the concentration and / or level of its electrolyte, and other liquid state parameters, are at preset values. When the liquid state parameters change, the electrochemical reaction deviates from the normal state, which in turn causes changes in the electrical parameters of the electrochemical reaction. Therefore, the liquid state change information of the oxygen treatment device 20 can be accurately determined based on the real-time values ​​of the electrical parameters during the electrochemical reaction.

[0088] By acquiring the real-time values ​​of electrical parameters during the electrochemical reaction in the oxygen treatment device 20, and determining the liquid state change information of the oxygen treatment device 20 based on these real-time values, the method has advantages such as convenient sampling, simple analysis method, and high accuracy of analysis results. It eliminates the need for an additional liquid state monitoring mechanism inside the oxygen treatment device 20, which helps to simplify the leak location method of the oxygen treatment system 50 and reduce the manufacturing and operating costs of the system.

[0089] In some optional embodiments, the step of determining the liquid state change information of the oxygen treatment device 20 based on the real-time values ​​of its electrical parameters includes: obtaining the expected values ​​of the electrical parameters of the oxygen treatment device 20 during the electrochemical reaction, comparing the real-time values ​​of the electrical parameters with the expected values, and determining the liquid state change information of the oxygen treatment device 20 based on the comparison results. Here, the expected values ​​of the electrical parameters refer to the measured values ​​of the electrical parameters of the electrochemical reaction when the oxygen treatment device 20 is in a normal state. The expected values ​​of the electrical parameters of the electrochemical reaction when the oxygen treatment device 20 is in a normal state can be determined through multiple experimental tests and preset based on the test results.

[0090] By comparing the real-time values ​​of electrical parameters with their expected values, for example, when the real-time values ​​of electrical parameters deviate from their expected values, the degree of deviation can be analyzed to determine the liquid state change information of the oxygen treatment device 20.

[0091] In some optional embodiments, the step of obtaining the expected values ​​of electrical parameters of the oxygen treatment device 20 during the electrochemical reaction includes: obtaining the sampling temperature of the real-time values ​​of the electrical parameters of the oxygen treatment device 20, and determining the expected values ​​of the electrical parameters based on the sampling temperature of the real-time values ​​of the electrical parameters.

[0092] In this embodiment, the expected values ​​of the electrical parameters of the electrochemical reaction in the oxygen treatment device 20 under normal conditions can be multiple, and can be obtained through multiple experiments within multiple temperature ranges, and preset based on the test results. The temperature range to be tested can be set according to the temperature variation of the working environment of the oxygen treatment device 20, for example, it can be set to below 0℃, 0~10℃, 10~20℃, and above 20℃. Taking the case where the electrical parameter is the working current as an example, the expected values ​​of the electrical parameters corresponding to the above temperature ranges can be 1A, 1.5A, 2.5A, and 4A, respectively. When the sampling temperature of the real-time value of the electrical parameter is 15℃, the expected value of the electrical parameter is 2.5A.

[0093] Using the above method, since the expected value of the electrical parameter can accurately reflect the actual working condition of the oxygen treatment device 20 under normal conditions, the comparison result can be more accurate when comparing the real-time value of the electrical parameter with the expected value of the electrical parameter, which helps to reduce or avoid errors in the positioning process.

[0094] In an optional example, the liquid state change information includes liquid concentration change information used to indicate the liquid concentration change value of the oxygen treatment device 20. The step of comparing the real-time value of the electrical parameter with the expected value of the electrical parameter, and determining the liquid state change information of the oxygen treatment device 20 based on the comparison result, includes: determining whether the difference between the real-time value and the expected value of the electrical parameter is less than a preset deviation threshold; if so, determining that the liquid concentration change value of the oxygen treatment device 20 is negative; if not, determining that the liquid concentration change value of the oxygen treatment device 20 is positive.

[0095] The deviation threshold can be preset to 0. In other examples, the deviation threshold can be set according to the expected value, for example, it can be preset to 5% to 20% of the expected value.

[0096] In some optional embodiments, the step of locating the leak point of the oxygen treatment system 50 based on the liquid state change information of the oxygen treatment device 20 includes: if the liquid concentration change value of the oxygen treatment device 20 is negative, then the leak point of the oxygen treatment system 50 is located as the oxygen treatment device 20; if the liquid concentration change value of the oxygen treatment device 20 is positive, then the leak point of the oxygen treatment system 50 is located as the replenishment device 10 and / or the replenishment channel connecting the replenishment device 10 and the oxygen treatment device 20.

[0097] In some optional embodiments, the step of performing warning measures corresponding to the leak includes: if the leak is located in the oxygen treatment device 20, then outputting a first warning signal; if the leak is located in the replenishment device 10 and / or the replenishment channel connecting the replenishment device 10 and the oxygen treatment device 20, then outputting a second warning signal.

[0098] Using the above method, the oxygen treatment system 50 not only has the ability to self-monitor leaks and locate leak points, but also can take remedial measures in a timely manner to prevent the problems caused by leaks from escalating.

[0099] If the rate of drop in the liquid level of the replenishing device 10 is determined to be greater than a preset rate of drop threshold, and before performing the step of locating the leak in the oxygen treatment system 50, the control method may further include: determining that the oxygen treatment device 20 is in a stopped state and recording the current liquid level of the replenishing device 10 as the initial liquid level; calculating the theoretical value of the time interval for replenishment caused by the non-electrochemical reaction of the oxygen treatment device 20; obtaining the real-time value of the time interval for the liquid level of the replenishing device 10 to reach the preset safe liquid level from the initial liquid level; determining whether the real-time value of the time interval is less than the theoretical value of the time interval; if so, verifying a leak and performing the step of locating the leak in the oxygen treatment system 50. The initial liquid level is higher than the safe liquid level. The safe liquid level is not necessarily the lowest liquid level of the replenishing device 10. The liquid level difference between the safe liquid level and the initial liquid level can be a preset setpoint.

[0100] For example, when the above method is used to initially determine that the oxygen treatment system 50 is leaking, the amount of liquid in the replenishing device 10 above the safe level can be determined based on the initial liquid level of the replenishing device 10, and the liquid loss rate caused by non-electrochemical reaction can be obtained. The theoretical value of the time interval can be determined based on the ratio between the amount of liquid in the replenishing device 10 above the safe level and the liquid loss rate. When the liquid level monitoring device detects that the liquid level of the replenishing device 10 has dropped to the safe level again, the real-time value of the time interval for the replenishing device 10 to replenish the oxygen treatment device 20 can be determined based on this. If the real-time value of the time interval is less than the theoretical value of the time interval, the oxygen treatment system 50 can be verified as leaking.

[0101] The liquid loss rate due to non-electrochemical reactions refers to the amount of liquid lost per unit time due to volatilization when the oxygen treatment device 20 is not undergoing an electrochemical reaction. The liquid loss rate due to non-electrochemical reactions can be determined through multiple experimental tests and preset based on the test results.

[0102] Using the above method, when it is initially determined that the oxygen treatment system 50 is leaking, the steps of verifying whether the oxygen treatment system 50 is leaking and locating the leak point of the oxygen treatment system 50 are performed if the verification is successful. This helps to improve the reliability of the operation of the oxygen treatment system 50 and reduce the false alarm rate of the oxygen treatment system 50 leaking.

[0103] If the oxygen treatment system 50 is found to be leaking, the replenishment channel between the replenishment device 10 and the oxygen treatment device 20 can be cut off first, and the power supply to the oxygen treatment device 20 can be cut off before proceeding with the steps to locate the leak in the oxygen treatment system 50.

[0104] In some alternative embodiments, the oxygen treatment system 50 can achieve higher technical effects through further optimization and configuration of the above steps. The control method of the oxygen treatment system 50 in this embodiment will be described in detail below with reference to the two optional execution processes of this embodiment. This embodiment is only an example of the execution process. In specific implementation, the execution order and operating conditions of some steps can be modified according to specific implementation requirements.

[0105] Figure 5 This is a control flow diagram of an oxygen treatment system 50 according to an embodiment of the present invention. The control flow generally includes the following steps:

[0106] Step S502: Detect the rate of drop in liquid level of the replenishment device 10.

[0107] Step S504: Determine whether the liquid level drop rate of the replenishment device 10 is greater than the preset drop rate threshold. If yes, proceed to step S506; otherwise, proceed to step S502.

[0108] Step S506: Determine that the oxygen treatment device 20 is in a shutdown state, and record the current liquid level of the liquid replenishment device 10 as the initial liquid level.

[0109] Step S508: Calculate the theoretical value of the time interval for replenishment caused by the non-electrochemical reaction of the oxygen treatment device 20.

[0110] Step S510: Obtain the real-time value of the time interval between the liquid level of the replenishment device 10 reaching the preset safe liquid level from the initial liquid level.

[0111] Step S512: Determine whether the real-time value of the time interval is less than the theoretical value of the time interval. If yes, proceed to step S514; otherwise, proceed to step S502.

[0112] Step S514: Obtain the real-time values ​​of electrical parameters of the oxygen treatment device 20 during the electrochemical reaction.

[0113] Step S516: Obtain the sampling temperature of the real-time values ​​of the electrical parameters of the oxygen processing device 20.

[0114] Step S518: Determine the expected value of the electrical parameter based on the sampling temperature of the real-time value of the electrical parameter.

[0115] Step S520: Determine whether the difference between the real-time value of the electrical parameter and the expected value of the electrical parameter is less than a preset deviation threshold. If yes, proceed to step S522; otherwise, proceed to step S526.

[0116] Step S522: Determine that the liquid concentration change value of the oxygen treatment device 20 is negative.

[0117] Step S524: Locate the leak in the oxygen treatment system 50 as the oxygen treatment device 20 and output a first warning signal.

[0118] Step S526: Determine that the change in liquid concentration of the oxygen treatment device 20 is positive.

[0119] Step S528: Locate the leak point of the oxygen treatment system 50 as the replenishment device 10 and / or the replenishment channel connecting the replenishment device 10 and the oxygen treatment device 20, and output a second prompt signal.

[0120] The oxygen treatment system 50 and its control method of the present invention detect the rate of drop in the liquid level of the replenishment device 10. When the rate of drop in the liquid level of the replenishment device 10 is detected to be too high, the system locates the leak point in the oxygen treatment system 50 and executes alarm measures corresponding to the leak point. This enables the oxygen treatment system 50 to have self-monitoring capability for leaks and leak point location capability, thereby assisting users in taking targeted remedial measures. Based on the solution of the present invention, the failure of the oxygen regulation function of the oxygen treatment device 20 due to leaks can be reduced or avoided, and the surrounding environment can be protected from the corrosion of electrolyte.

[0121] Therefore, those skilled in the art should recognize that although numerous exemplary embodiments of the present invention have been shown and described in detail herein, many other variations or modifications conforming to the principles of the present invention can be directly determined or derived from the disclosure of the present invention without departing from the spirit and scope of the invention. Thus, the scope of the present invention should be understood and construed as covering all such other variations or modifications.

Claims

1. A control method for an oxygen treatment system, the oxygen treatment system comprising an oxygen treatment device for treating oxygen by an electrochemical reaction and a replenishment device for replenishing liquid to the oxygen treatment device, and the control method comprising: Detect the rate of drop in the liquid level of the replenishment device; Determine whether the rate of liquid level drop in the replenishment device is greater than a preset drop rate threshold; If so, locate the leak in the oxygen treatment system; Implement warning measures corresponding to the leak points; The steps for locating leaks in the oxygen treatment system include: Acquire information on the liquid state changes of the oxygen treatment device; Locate the leak point in the oxygen treatment system based on the liquid state change information of the oxygen treatment device; The liquid state change information includes liquid concentration change information used to indicate the liquid concentration change value of the oxygen treatment device; and The steps for locating leaks in the oxygen treatment system based on liquid state change information of the oxygen treatment device include: If the liquid concentration change value of the oxygen treatment device is negative, then the leak point of the oxygen treatment system is located in the oxygen treatment device. If the change in liquid concentration of the oxygen treatment device is positive, then the leak point of the oxygen treatment system is located as the liquid replenishment device and / or the liquid replenishment channel connecting the liquid replenishment device and the oxygen treatment device.

2. The control method according to claim 1, wherein, The steps for obtaining information on liquid state changes in the oxygen treatment device include: The real-time values ​​of electrical parameters of the oxygen treatment device during the electrochemical reaction are obtained. The liquid state change information of the oxygen treatment device is determined based on the real-time values ​​of the electrical parameters of the oxygen treatment device.

3. The control method according to claim 2, wherein, The steps for determining the liquid state change information of the oxygen treatment device based on the real-time values ​​of its electrical parameters include: To obtain the expected values ​​of electrical parameters of the oxygen treatment device during the electrochemical reaction; The real-time value of the electrical parameter is compared with the expected value of the electrical parameter, and the liquid state change information of the oxygen treatment device is determined based on the comparison result.

4. The control method according to claim 3, wherein, The steps for obtaining the expected values ​​of electrical parameters during the electrochemical reaction of the oxygen treatment device include: The sampling temperature for obtaining real-time values ​​of the electrical parameters of the oxygen treatment device; The expected value of the electrical parameter is determined based on the sampling temperature of the real-time value of the electrical parameter.

5. The control method according to claim 3, wherein, The step of comparing the real-time value of the electrical parameter with the expected value of the electrical parameter, and determining the liquid state change information of the oxygen treatment device based on the comparison result, includes: Determine whether the difference between the real-time value of the electrical parameter and the expected value of the electrical parameter is less than a preset deviation threshold; If so, then the change in liquid concentration of the oxygen treatment device is determined to be negative; If not, then the change in liquid concentration of the oxygen treatment device is determined to be positive.

6. The control method according to claim 5, wherein, The steps for implementing the warning measures corresponding to the leak include: If the leak is located in the oxygen treatment device, a first warning signal is output. If the leak point is located in the replenishment device and / or the replenishment channel connecting the replenishment device and the oxygen treatment device, a second prompt signal is output.

7. The control method according to claim 1, further comprising, when determining that the liquid level drop rate of the replenishment device is greater than a preset drop rate threshold, and before performing the step of locating the leak in the oxygen treatment system: Determine that the oxygen treatment device is in a shutdown state, and record the current liquid level of the liquid replenishment device as the initial liquid level; Calculate the theoretical value of the time interval for replenishment caused by the non-electrochemical reaction of the oxygen treatment device; The real-time value of the time interval between the initial liquid level and the preset safe liquid level of the replenishment device is obtained. Determine whether the real-time value of the time interval is less than the theoretical value of the time interval; If so, it is verified as a leak, and the steps to locate the leak in the oxygen treatment system are performed.

8. An oxygen treatment system, the oxygen treatment system comprising an oxygen treatment device for treating oxygen by an electrochemical reaction and a replenishment device for replenishing the oxygen treatment device with liquid, further comprising: A processor and a memory, wherein the memory stores a machine-executable program, which, when executed by the processor, is used to implement the control method according to any one of claims 1-7.

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