Ecr ion source resistance furnace

Abstract

The present application relates to the technical field of melting furnace, and provides an ECR ion source resistance furnace, which comprises a ceramic crucible, has a furnace mouth, and the inside of the ceramic crucible is provided with refractory metal; a heating coil is located at the periphery of the ceramic crucible, and a gap is formed between the heating coil and the ceramic crucible; and the heating coil is used to form a current loop to heat the ceramic crucible. The ECR ion source resistance furnace provided by the present application is characterized in that the heating coil is located at the periphery of the ceramic crucible and is connected with electric current, the heating coil is used to form a current loop to heat the ceramic crucible, and the refractory metal vapor is obtained; the resistance of the heating coil is relatively large compared with the tantalum crucible; therefore, the ECR ion source resistance furnace provided by the present application can greatly reduce the operating current of the resistance furnace, not only can reduce the influence of the strong magnetic field of the ECR ion source on the resistance furnace, avoid deformation, and improve the service life of the resistance furnace, but also can simplify the power supply and other auxiliary equipment.

Description

Technical Field

[0001] This invention relates to the field of melting furnace technology, and more particularly to an ECR ion source resistance furnace. Background Technology

[0002] A heavy-ion accelerator is an accelerator used to accelerate ions heavier than alpha ions, and sometimes it can also be used to accelerate protons. Heavy-ion accelerators can accelerate large numbers of heavy ions to very high speeds, even approaching the speed of light. These high-speed heavy ions form heavy-ion beams, which are used for research in heavy-ion physics.

[0003] ECR (Electron Cyclotron Resonance) ion sources, as the most efficient injectors in heavy ion accelerators, offer advantages such as high beam current and high charge states. They can provide gaseous ions and metal ions, with charge states ranging from low to high, and beam current ranging from microamps to milliamps. Metal ion generation typically involves three methods: MIVOC, sputtering, and metal furnace methods. The metal furnace method is one of the most effective methods for generating high-current, high-charge-state metal ions. Depending on the heating method, ECR ion source metal furnaces can be classified as resistance furnaces, induction furnaces, and electron beam furnaces.

[0004] Currently, the resistance furnace used in ECR ion sources typically includes a tantalum crucible with a lid. Electricity is directly applied through the top and bottom of the crucible, forming a direct circuit. To achieve the maximum operating temperature of 1800℃, the common approach is to increase the resistance in the current circuit. Increasing the resistance can be achieved by increasing the length or decreasing the cross-sectional area. In existing structures, within a limited space, increasing the resistance in the current circuit requires reducing the cross-sectional area of ​​the tantalum crucible, i.e., reducing its wall thickness.

[0005] However, since the tantalum crucible is in the strong magnetic field environment (2-3T) of the ECR ion source, there will be Lorentz force. The tantalum crucible with reduced wall thickness is easily deformed by the Lorentz force, resulting in a shorter service life of the resistance furnace. Summary of the Invention

[0006] This invention provides an ECR ion source resistance furnace to solve the defect of existing resistance furnaces that are easily deformed by Lorentz force. It can significantly reduce the operating current, reduce the impact of Lorentz force on the resistance furnace, and avoid the compatibility problem of materials at high temperatures.

[0007] This invention provides an ECR ion source resistance furnace, comprising:

[0008] A ceramic crucible having a furnace opening, and the interior of the ceramic crucible being filled with a refractory metal;

[0009] A heating coil is located on the outer periphery of the ceramic crucible, and there is a gap between the heating coil and the ceramic crucible; the heating coil is used to form a current loop to heat the ceramic crucible.

[0010] According to the present invention, an ECR ion source resistance furnace is provided, wherein the heating coil has a first extended portion and a second extended portion respectively provided at both ends, and further includes:

[0011] First metal support;

[0012] The second metal support and the first metal support are both disposed on the same side of the ceramic crucible;

[0013] The first metal support is connected to the first extension, and the second metal support is connected to the second extension to form the current loop.

[0014] An ECR ion source resistance furnace provided by the present invention further includes:

[0015] An insulating support is provided between the first metal support and the second metal support to prevent the current loop from being short-circuited.

[0016] According to the present invention, an ECR ion source resistance furnace is provided in which cooling water channels are provided inside both the first metal support and the second metal support.

[0017] An ECR ion source resistance furnace provided by the present invention further includes:

[0018] A tantalum base is disposed at the bottom of the ceramic crucible; one end of the tantalum base is connected to the second extension portion, and the other end is connected to the second metal support.

[0019] An ECR ion source resistance furnace provided by the present invention further includes:

[0020] A first tantalum connecting block is disposed at the top end of the second extension, and the first tantalum connecting block, the second extension, and the tantalum base are connected by a first fastener.

[0021] According to the present invention, an ECR ion source resistance furnace further includes a second tantalum connecting block connected to the end of the first extended portion, and the second tantalum connecting block, the first extended portion and the first metal support are connected by a second fastener.

[0022] According to the present invention, an ECR ion source resistance furnace is provided, wherein a guide tube is connected at the furnace opening.

[0023] According to the present invention, an ECR ion source resistance furnace further includes a heat shielding device disposed on the outside of the ceramic crucible, wherein the first extended portion and the second extended portion penetrate the heat shielding device and extend to the outside of the heat shielding device.

[0024] According to an ECR ion source resistance furnace provided by the present invention, the top of the ceramic crucible is provided with a crucible cover, and the top of the crucible cover is provided with a protruding structure; the bottom of the ceramic crucible is provided with a groove for the second extension portion to pass through.

[0025] The ECR ion source resistance furnace provided by this invention features a ceramic crucible with a furnace opening, containing refractory metal. A heating coil is located on the outer periphery of the ceramic crucible and current flows through it. The heating coil forms a current loop to heat the ceramic crucible, thereby obtaining refractory metal vapor. The resistance of the heating coil is relatively large compared to that of the tantalum crucible. Therefore, using the ECR ion source resistance furnace provided by this invention significantly reduces the operating current of the resistance furnace. This not only reduces the impact of the strong magnetic field of the ECR ion source on the resistance furnace, preventing deformation and improving the service life of the resistance furnace, but also simplifies auxiliary equipment such as power supplies.

[0026] In addition, the gap between the heating coil and the ceramic crucible effectively reduces the direct contact area between the ceramic crucible and the heating coil, thus largely avoiding compatibility issues at high temperatures. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in this invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0028] Figure 1 This is a cross-sectional view of the ECR ion source resistance furnace according to an embodiment of the present invention;

[0029] Figure 2 This is a schematic diagram of the structure of the ECR ion source resistance furnace according to an embodiment of the present invention;

[0030] Figure 3 This is a schematic diagram of the structure of the ECR ion source resistance furnace according to an embodiment of the present invention (with the heat shielding device removed);

[0031] Figure label:

[0032] 1. Ceramic crucible; 2. Heating coil; 21. First extension; 22. Second extension; 3. First metal support; 4. Second metal support; 5. Insulating support; 6. Cooling water channel; 7. Tantalum base; 8. First tantalum connecting block; 9. First fastener; 10. Second tantalum connecting block; 11. Guide tube; 12. Heat shielding device; 13. Crucible lid; 14. Protruding structure; 15. Groove; 16. Second fastener. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0034] In the description of the embodiments of the present invention, it should be noted that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the embodiments of the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the embodiments of the present invention. In addition, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0035] The following is combined Figures 1 to 3 This invention describes an embodiment of an ECR ion source resistance furnace.

[0036] See Figure 1 and Figure 2 As shown, this embodiment of the invention provides an ECR ion source resistance furnace, including a ceramic crucible 1 and a heating coil 2. The ceramic crucible 1 has a furnace opening on its side wall, and the interior of the ceramic crucible 1 is filled with refractory metal. The furnace opening is used for the discharge of refractory metal vapor. The heating coil 2 is located on the outer periphery of the ceramic crucible 1, and there is a gap between the heating coil 2 and the ceramic crucible 1. The heating coil 2 is used to form a current loop to heat the ceramic crucible 1 to obtain refractory metal vapor. The resistance of the heating coil 2 is relatively large compared to that of the tantalum crucible. Therefore, by using the ECR ion source resistance furnace of this embodiment of the invention, the operating current of the resistance furnace is significantly reduced. This not only reduces the influence of the strong magnetic field of the ECR ion source on the resistance furnace, avoids deformation, and improves the service life of the resistance furnace, but also simplifies auxiliary equipment such as power supplies.

[0037] Meanwhile, a gap is provided between the heating coil 2 and the ceramic crucible 1, which can effectively reduce the direct contact area between the ceramic crucible 1 and the heating coil 2, and largely avoid compatibility problems at high temperatures; current is passed through the heating coil 2 to generate heat and heat the ceramic crucible 1 through thermal radiation.

[0038] Among them, the ceramic crucible 1 can be made of BeO (beryllium oxide), Al2O3 (aluminum oxide), or SiC (silicon carbide) based on its thermal conductivity, high temperature resistance, and compatibility with metallic materials.

[0039] It should be noted that this invention requires designing the ECR ion source to obtain the desired refractory metal vapor within the confined space of the ECR ion source. Furthermore, in practical applications, it is necessary to use ANSYS (finite element analysis) simulations to calculate and determine suitable heating coil materials and specifications based on the required maximum crucible temperature. Refractory metals such as tungsten or tantalum can be selected as the heating coil material. The heating wire diameter is 1-2 mm, and the coil dimensions are determined based on the space of the ECR ion source injection components. The outer diameter of the coil is 13-16 mm, the inner diameter is approximately 10-13 mm, and the height is 10-13 mm. The heating coil has approximately 3-6 turns. Using tungsten or tantalum as the material for the heating coil 2 can effectively reduce the maintenance costs of the resistance furnace.

[0040] In one embodiment of the present invention, the heating coil 2 is provided with a first extended portion 21 and a second extended portion 22 at both ends, and also includes a first metal support 3 and a second metal support 4, both of which are disposed on the same side of the ceramic crucible 1; the first metal support 3 is connected to the first extended portion 21, and the second metal support 4 is connected to the second extended portion 22 to form a current loop. Through the above structural configuration, the resistance of the current loop can be further increased, thereby reducing the current while achieving the same operating temperature. Under the condition that the background magnetic field remains unchanged, the Lorentz force experienced by the resistance furnace is significantly reduced, preventing furnace deformation.

[0041] The first metal support 3 and the second metal support 4 can typically be made of copper, which has excellent electrical conductivity and corrosion resistance, enabling better heating of the ceramic crucible 1. Furthermore, the first metal support 3 and the second metal support 4 can also be configured as polygonal structures. Specifically, the width of the top surface of the first metal support 3 is smaller than the width of its bottom surface, and the width of the bottom surface of the second metal support 4 is smaller than the width of its top surface. This is to further reduce the size and space required.

[0042] In one embodiment of the present invention, an insulating support 5 is further included. The insulating support 5 is disposed between the first metal support 3 and the second metal support 4 to prevent short circuits in the current loop, thereby providing support and isolation for the first metal support 3 and the second metal support 4. That is, the first metal support 3 and the second metal support 4 are stacked vertically. To avoid direct short circuits in the current loop, an insulating support 5 needs to be provided between the first metal support 3 and the second metal support 4. The insulating support 5 may include a ceramic support, which may be alumina (Al2O3), zirconium dioxide (ZrO2), or aluminum nitride (AlN).

[0043] In one embodiment of the present invention, both the first metal support 3 and the second metal support 4 are provided with cooling water channels 6, which can cool the first metal support 3 and the second metal support 4.

[0044] In one embodiment of the present invention, a tantalum base 7 is also included. The tantalum base 7 is disposed at the bottom of the ceramic crucible 1. One end of the tantalum base 7 is connected to the second extension 22, and the other end is connected to the second metal support 4. This not only facilitates the installation of the ceramic crucible 1 and fixes the ceramic crucible 1 on the tantalum base 7, but also increases the resistance of the current circuit.

[0045] In one embodiment of the present invention, a first tantalum connecting block 8 is further included. The first tantalum connecting block 8 is disposed on the top of the end of the second extension 22, and the first tantalum connecting block 8, the second extension 22 and the tantalum base 7 are connected by a first fastener 9 to facilitate the fixation of the second extension 22.

[0046] In one embodiment of the present invention, a second tantalum connecting block 10 is further included. The second tantalum connecting block 10 is disposed at the top of the end of the first extension 21, and the second tantalum connecting block 10, the first extension 21 and the first metal support 3 are connected by a second fastener 16 to facilitate the fixing of the first extension 21.

[0047] In one embodiment of the present invention, a guide tube 11 is connected to the furnace opening. The guide tube 11 allows refractory metal vapor to directly enter the ECR plasma at an optimal angle, thereby increasing the ionization rate of the metal and reducing the consumption per unit time, i.e., reducing the consumption rate. The guide tube 11 can be fixed by crimping.

[0048] In one embodiment of the present invention, a heat shielding device 12 is further included. The heat shielding device 12 is disposed on the outer side of the ceramic crucible 1, and the first extended portion 21 and the second extended portion 22 penetrate through the heat shielding device 12 and extend to the outer side of the heat shielding device 12. The heat shielding device 12 can lock heat to the outer periphery of the ceramic crucible 1, thereby improving heating efficiency.

[0049] like Figure 3As shown, in one embodiment of the present invention, a crucible lid 13 is provided on the top of the ceramic crucible 1, and a protruding structure 14 is provided on the top of the crucible lid 13 to minimize the contact area between the heating shielding device 12 and the crucible lid 13, thereby reducing heat conduction loss. Furthermore, a gap exists between the protruding structure 14 and the heating shielding device 12, preventing direct contact between the crucible lid 13 and the heating shielding device 12 in the high-temperature zone, thus avoiding a reaction between the two at high temperatures (above 1600°C) and improving the service life and reliability of the resistance furnace. The gap between the crucible lid 13 and the heating shielding device 12 can be approximately 1 mm.

[0050] In one embodiment of the present invention, a groove 15 is provided at the bottom of the ceramic crucible 1, and the groove 15 is for the second extension 22 to pass through, so as to ensure that the heating coil 2 does not directly contact the ceramic crucible 1 and avoid the heating coil 2 and the ceramic crucible 1 from reacting at high temperature.

[0051] In summary, in the ECR ion source resistance furnace of this embodiment, the ceramic crucible 1 and the heating coil 2 do not directly contact each other in the high-temperature zone, avoiding reactions at high temperatures that could reduce the lifespan and performance of the resistance furnace. The heating method using the heating coil 2, compared to the existing tantalum crucible heating method, significantly reduces the current and greatly minimizes deformation caused by Lorentz forces. The addition of a guide tube 11 at the furnace opening further reduces the metal sample consumption rate and improves the ionization rate.

[0052] In the description of the embodiments of the present invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "connected" and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of the present invention according to the specific circumstances.

[0053] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "method," "specific method," or "some methods," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or method is included in at least one embodiment or method of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or method. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or methods. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or methods described in this specification, as well as the features of different embodiments or methods.

[0054] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. An ECR ion source resistance furnace, characterized in that, include: A ceramic crucible (1) has a furnace opening, and the interior of the ceramic crucible (1) is filled with refractory metal; A heating coil (2) is located on the outer periphery of the ceramic crucible (1), and there is a gap between the heating coil (2) and the ceramic crucible (1); the heating coil (2) is used to form a current loop to heat the ceramic crucible (1), and a first extension (21) and a second extension (22) are respectively provided at both ends of the heating coil (2). First metal support (3); The second metal support (4) and the first metal support (3) are both disposed on the same side of the ceramic crucible (1); The first metal support (3) is connected to the first extension (21), and the second metal support (4) is connected to the second extension (22) to form the current loop.

2. The ECR ion source resistance furnace according to claim 1, characterized in that, Also includes: An insulating support (5) is disposed between the first metal support (3) and the second metal support (4) to prevent the current loop from being short-circuited.

3. The ECR ion source resistance furnace according to claim 1, characterized in that, Both the first metal support (3) and the second metal support (4) are provided with cooling water channels (6).

4. The ECR ion source resistance furnace according to claim 1, characterized in that, Also includes: A tantalum base (7) is disposed at the bottom of the ceramic crucible (1); Furthermore, one end of the tantalum base (7) is connected to the second extension (22), and the other end is connected to the second metal support (4).

5. The ECR ion source resistance furnace according to claim 4, characterized in that, Also includes: The first tantalum connecting block (8) is disposed at the top end of the second extension (22), and the first tantalum connecting block (8), the second extension (22) and the tantalum base (7) are connected by the first fastener (9).

6. The ECR ion source resistance furnace according to claim 4, characterized in that, It also includes a second tantalum connecting block (10) connected to the end of the first extension (21), and the second tantalum connecting block (10), the first extension (21) and the first metal support (3) are connected by a second fastener (16).

7. The ECR ion source resistance furnace according to claim 1, characterized in that, A guide tube (11) is connected to the furnace opening.

8. The ECR ion source resistance furnace according to claim 1, characterized in that, It also includes a heat shielding device (12), which is disposed on the outside of the ceramic crucible (1), and the first extension (21) and the second extension (22) penetrate the heat shielding device (12) and extend to the outside of the heat shielding device (12).

9. The ECR ion source resistance furnace according to claim 1, characterized in that, The ceramic crucible (1) is provided with a crucible lid (13) on the top, and the top of the crucible lid (13) is provided with a protruding structure (14); the bottom of the ceramic crucible (1) is provided with a groove (15), and the groove (15) is used for the second extension (22) to pass through.

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