Water preparation system for daily chemical production and preparation method

Abstract

The application belongs to the field of daily chemical equipment, and particularly relates to a water preparation system and method for daily chemical production. The water treatment area comprises a ventilation device, a plasma generating element, a high-frequency alternating power supply, a ventilation device, a liquid transmission track, a secondary treatment device and a treated water output device. The plasma generating element comprises a transmission device, a volume flow controller, a coil, a metal tube and a metal probe. The secondary treatment device comprises an insulating tube, a metal electrode and a copper mesh. The plasma generating element is connected with the water storage area and the water treatment area, and performs treatment when water flows. The application uses plasma to prepare water for daily chemicals, produces active substances, realizes sterilization of production water and reduces the use of preservatives. Meanwhile, the active substances can reduce the concentration of harmful components in daily chemicals, promote the absorption of effective components in daily chemicals by human bodies and improve product quality.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of daily chemical equipment, and in particular to a water preparation system for daily chemical production and a preparation method. BACKGROUND

[0002] With the continuous improvement of living standards, people's demand for daily chemicals is rising. Water, as an important raw material for daily chemicals, affects the quality of products. For example, the water content in sunscreen is about 60%-70%, the water content in daily skin care cosmetics and shower gel is about 70%-80%, the water content in laundry detergent and shampoo is about 80%, and the water content in perfume with water as solvent is 60%-95%. Therefore, using high-quality water is crucial for producing high-quality daily chemicals. However, it is difficult to ensure a sterile environment in the daily chemical preparation workshop, equipment and packaging materials at present, and products are inevitably contaminated by microorganisms during production, storage, transportation and use. Light may change the quality and efficacy of daily chemicals, and serious contamination may affect the health of users. Therefore, it is necessary to add preservatives / bacteriostatic agents or use high-temperature sterilization to inhibit the reproduction of microorganisms. However, the former may cause skin allergies or affect the health of users, and the latter may cause some components in daily chemicals to deteriorate, affecting product quality and stability.

[0003] In addition to microorganisms, hazardous substances may be generated during the production, preparation, storage and transportation of daily chemicals. For example, bromonitropentanol is a common preservative and bactericide in cosmetics, with a content of 0.04%-0.1% in cosmetics. It decomposes at pH=8-12, releasing Br - , NO2 - and formaldehyde, and is easy to generate carcinogen N-nitrosodi-methylamine with nitrogen-containing substances. Surfactants, pH regulators, emulsifiers and antibacterial preservatives containing secondary amine components may generate nitrosamines at a storage temperature above 35°C or in acidic conditions. Therefore, how to effectively degrade the content of these risk substances is also a key problem for producing high-quality daily chemicals.

[0004] Plasma is the fourth state of matter, containing a large number of active particles such as electrons, ions, atoms and free radicals, with high energy density and reactivity. It contains active oxygen species (such as H2O2, O3, O2 - ·, HO2·, RO·, ROO·, O2 and ·OH) and active nitrogen (such as ·NO, ·NO2, ONOO -, OONOH, ROONO), charged particles, ultraviolet radiation and electric field and other substances. These active substances can cause damage to the biological structure of microorganisms, so as to achieve the effect of inhibiting bacteria. At the same time, these active substances have high reactivity, and can effectively degrade the risk substances in daily chemicals. In summary, the water for daily chemical production prepared by using plasma has the effects of inhibiting bacteria, degrading risk substances in daily chemicals and promoting the absorption of active ingredients. However, there is no research on this aspect at home and abroad, and there is no plasma device for preparing water for daily chemical production. With the development of daily chemical industry, it is of great significance to develop a device and a preparation method for preparing water for daily chemical production based on plasma technology. SUMMARY

[0005] The present applicant provides a water preparation system and a preparation method for daily chemical production with reasonable structure.

[0006] The technical solutions adopted by the present application are as follows:

[0007] A water preparation system for daily chemical production, comprising a treatment box, a water conveying assembly arranged in the treatment box, a water treatment device arranged on the water conveying assembly,

[0008] The water conveying assembly comprises a water conveying pipeline and a water valve, and a water storage tank is separated in the treatment box, and a water level monitoring member is installed in the water storage tank,

[0009] The water treatment device comprises:

[0010] A liquid conveying track in communication with the water conveying assembly for water guiding,

[0011] A plurality of plasma generating elements are arranged along the liquid conveying track,

[0012] A secondary treatment device is arranged at the discharging end of the liquid conveying track, and the output end of the secondary treatment device is connected with a gas conveying pipeline and a water outlet pipeline; and a water accumulation section is reserved in the liquid conveying track near the region where the secondary treatment device is arranged,

[0013] The plasma generating element generates a magnetic field by rotating a metal pipe with a coil, and a plasma vortex is formed by discharging at the magnetic field,

[0014] The secondary treatment device blocks the discharge to form a second plasma region.

[0015] As a further improvement of the above technical solutions:

[0016] The plasma generating element comprises a water inlet pipeline, the output end of the water inlet pipeline is provided with an atomizing head, a metal pipe is arranged on one side of the water outlet direction of the atomizing head, a coil is arranged outside the metal pipe, and a transmission device is connected; and a probe is arranged at the metal pipe.

[0017] The metal pipe is arranged outside the atomizing head, and a filter screen is connected to one end of the metal pipe away from the atomizing head.

[0018] The water inlet pipeline is connected with a water inlet valve and a flow controller.

[0019] The filter screen is connected with a liquid collecting track below, and the liquid collecting track is inclined to the secondary treatment device.

[0020] The liquid transmission track is divided into several sections, and one section of the liquid transmission track near the secondary treatment device is inclined downward from the inner wall of the treatment box to the secondary treatment device, and is concave near the secondary treatment device to form a water accumulation section on the top of the secondary treatment device.

[0021] The secondary treatment device comprises an outer metal screen and a metal electrode connected with the outer metal screen, and an insulating pipe is arranged in the outer metal screen.

[0022] The working medium in the treatment box is air, and an exhaust device for exhausting reaction exhaust gas is arranged on the top of the inner wall of the treatment box.

[0023] The treatment box is provided with a control power supply and a high-frequency alternating current power supply, the control power supply is used for controlling the on-off of components, and the high-frequency alternating current power supply is used for supplying power to two plasma forming regions; another circuit for forming the plasma region is grounded.

[0024] A preparation method of a preparation system for producing water by using daily chemicals, comprising the following steps:

[0025] Open the water inlet valve, and inject water into the water storage tank through the water inlet pipeline;

[0026] Use the water level monitoring member to control the water inlet pipeline to adjust the water level, so that the water level remains relatively static;

[0027] Open the exhaust device, and let the air enter the water treatment area from below the device to make the air in the treatment box flow;

[0028] Open the control power supply, start the transmission device, and supply power to the coil to make the metal pipe of the plasma generating device rotate around the shaft, and generate a magnetic field inside the coil;

[0029] Open the high-frequency alternating current power supply, and supply power to the probe, so that the probe tip starts to discharge, and forms a plasma vortex under the action of the magnetic field;

[0030] The secondary treatment device starts dielectric barrier discharge, and forms a plasma region in the region arranged by the outer metal screen;

[0031] Open the water inlet valve, adjust the flow controller, make the water flow into the plasma generating element, and adjust the flow to a predetermined flow, and then spray out through the atomizing head to improve the water mist disinfection treatment efficiency; at this time, the first disinfection is completed;

[0032] The sterilized water mist passes through the filter screen, condenses into a water flow, and then flows to the liquid transmission track, is guided by the liquid transmission track to the secondary treatment device, and after passing through the plasma generated by the dielectric barrier discharge, completes the second sterilization, obtains the preparation water, and flows to the production line;

[0033] The working gas is discharged from the exhaust device as reaction exhaust gas;

[0034] After the preparation is completed, the water inlet valve, the water delivery valve, the high-frequency alternating power supply, and the control power supply are closed, the residual water in the liquid transmission track is cleaned, the output of the preparation water is stopped, the air is stopped from being delivered to the gas delivery pipeline, the exhaust device is closed, and the water storage tank is drained according to the expected demand.

[0035] The beneficial effects of the present application are as follows:

[0036] The present application uses a new type of efficient plasma equipment to prepare water for daily chemicals, and the generated plasma directly sterilizes the production water, reducing or avoiding the use of preservatives. At the same time, the active substances dissolved into the liquid phase not only have a persistent bacteriostatic effect, but also can degrade harmful ingredients in daily chemicals, reducing safety hazards. In addition, these active substances can promote the absorption of effective ingredients in daily chemicals by the human body, improving product quality.

[0037] The device uses air as the working gas, and the raw materials are cheap and easy to obtain, rich in high-concentration oxygen and nitrogen, and can generate a large amount of oxygen-containing and nitrogen-containing active substances beneficial to the human body. The deionized water is atomized, increasing the contact area of the reaction and improving the reaction rate. The plasma vortex generated in the magnetic field expands the coverage of the plasma, so that the water mist passing through the metal pipe can be fully treated.

[0038] Multiple plasma generating elements simultaneously perform water treatment, ensuring the complete treatment of production water while ensuring production capacity. The secondary treatment adopts a dielectric barrier discharge device, and the area covered by the copper mesh can adjust the range of plasma generation, allowing a large amount of production water to be treated twice to ensure sterilization effect.

[0039] The present application also provides a water accumulation section, which is provided at the secondary treatment area to prevent the upstream water flow from directly impacting the metal electrode, thereby buffering the water flow and prolonging the service life of the equipment and reducing the impact on the stable operation of the plasma. BRIEF DESCRIPTION OF DRAWINGS

[0040] Figure 1 It is a front view of the system of the present application.

[0041] Figure 2 It is a side view of the system of the present application.

[0042] Figure 3The side view of the plasma generating element of the present application.

[0043] Figure 4 The front view of the plasma generating element of the present application.

[0044] Figure 5 The bacterial population produced by incubating the conventional laundry liquid configured with the water prepared by plasma of Example 1 through the culture medium.

[0045] Figure 6 The bacterial population produced by incubating the conventional laundry liquid configured with the ordinary deionized water of Example 1 through the culture medium.

[0046] Figure 7 The bacterial population produced by incubating the conventional laundry liquid configured with the water prepared by plasma of Example 2 through the culture medium.

[0047] Figure 8 The bacterial population produced by incubating the conventional laundry liquid configured with the ordinary deionized water of Example 2 through the culture medium.

[0048] Figure 9 The improvement of the facial skin of the volunteers by the moisturizing essence configured with the ordinary deionized water of Example 3 for four days.

[0049] Figure 10 The improvement of the facial skin of the volunteers by the moisturizing essence configured with the water prepared by plasma of Example 3 for four days.

[0050] 1, treatment tank; 2, water delivery pipeline; 3, water delivery valve; 4, water storage tank; 5, water level monitoring element; 6, liquid delivery track; 7, plasma generating element; 8, secondary treatment device; 9, gas delivery pipeline; 10, water outlet pipeline; 11, control power supply; 12, high-frequency alternating current power supply;

[0051] 601, water accumulation section; 602, liquid collection track;

[0052] 701, atomizing head; 702, metal pipe; 703, coil; 704, transmission device; 705, probe; 706, filter screen; 707, water inlet valve; 708, flow controller;

[0053] 801, outer metal mesh; 802, metal electrode; 803, insulating pipe. DETAILED DESCRIPTION

[0054] The specific embodiments of the present application will be described below in conjunction with the accompanying drawings.

[0055] As Figures 1-8As shown, the daily chemical production water preparation system of the embodiment comprises a treatment box 1, the treatment box 1 is internally provided with a water conveying assembly, a water treatment device arranged on the water conveying assembly,

[0056] The water conveying assembly comprises a water conveying pipeline 2 and a water valve 3, and the treatment box 1 is divided into a water storage tank 4, and a water level monitoring member 5 is installed in the water storage tank 4,

[0057] The water treatment device comprises:

[0058] A liquid conveying track 6 is in communication with the water conveying assembly and guides water,

[0059] A plurality of plasma generating elements 7 are arranged along the liquid conveying track 6,

[0060] A secondary treatment device 8 is located at a discharging end of the liquid conveying track 6, and the secondary treatment device 8 is connected with a gas conveying pipeline 9 and a water outlet pipeline 10 at an output end; the liquid conveying track 6 is provided with a water accumulation section 601 near the region where the secondary treatment device 8 is located,

[0061] The plasma generating element 7 generates a magnetic field through rotation of a metal pipe 702 with a coil 703, and a plasma vortex is formed by discharge at the magnetic field,

[0062] The secondary treatment device 8 blocks the discharge to form a second plasma region.

[0063] The plasma generating element 7 comprises a water inlet pipeline, the output end of the water inlet pipeline is provided with an atomizing head 701, a metal pipe 702 is installed on one side of a water outlet direction of the atomizing head 701, the metal pipe 702 is externally provided with a coil 703 and is connected with a transmission device 704; a probe 705 is arranged at the metal pipe 702.

[0064] The metal pipe 702 is sleeved outside the atomizing head 701, and one end of the metal pipe 702, which is away from the atomizing head 701, is connected with a filter screen 706.

[0065] The water inlet pipeline is connected with a water inlet valve 707 and a flow controller 708.

[0066] The filter screen 706 is below a liquid collecting track 602, and the liquid collecting track 602 is inclined to the secondary treatment device 8.

[0067] The liquid conveying track 6 is divided into several sections, one section of the liquid conveying track 6 near the secondary treatment device 8 is inclined downward from the inner wall of the treatment box 1 to the secondary treatment device 8, and is concave near the secondary treatment device 8 to form the water accumulation section 601 located at the top of the secondary treatment device 8.

[0068] The secondary treatment device 8 comprises an outer metal screen 801, a metal electrode 802 connected with the outer metal screen 801, and an insulating pipe 803 arranged in the outer metal screen 801.

[0069] The working medium in the processing box 1 is air, and an exhaust device for exhausting reaction exhaust gas is arranged on the top of the inner wall of the processing box 1.

[0070] The processing box 1 is provided with a control power supply 11 for controlling the on-off of components and a high-frequency alternating power supply 12 for supplying power to two plasma forming regions; the other circuit of the plasma forming region is grounded.

[0071] The preparation method of the system for preparing water for daily chemical production in the embodiment comprises the following steps:

[0072] The water inlet valve 3 is opened to inject water into the water storage tank 4 through the water inlet pipeline 2;

[0073] The water level is adjusted by the water level monitoring member 5 to control the water inlet pipeline 2, so that the water level is kept relatively static;

[0074] The exhaust device is opened, air enters the water treatment area from below the device, and the air in the processing box 1 flows;

[0075] The control power supply 11 is opened, the transmission device 704 is started, the coil 703 is powered on, the metal pipe 702 of the plasma generating device rotates around the shaft, and a magnetic field is generated inside the coil 703;

[0076] The high-frequency alternating power supply 12 is opened, the probe 705 is powered on, the tip of the probe 705 starts to discharge, and a plasma vortex is formed under the action of the magnetic field;

[0077] The secondary processing device 8 starts the dielectric barrier discharge, and forms a plasma region in the area covered by the outer metal mesh 801;

[0078] The water inlet valve 707 is opened, the flow controller 708 is adjusted, the water flow flows into the plasma generating element 7, and is adjusted to a predetermined flow rate, is atomized and sprayed out through the atomizing head 701, and the water mist disinfection treatment efficiency is improved; at this time, the first disinfection is completed;

[0079] The disinfected water mist passes through the filter screen 706, condenses into a water flow, and then flows to the liquid conveying track 6, is guided by the liquid conveying track 6 to the secondary processing device 8, passes through the plasma generated by the dielectric barrier discharge, and completes the second disinfection to obtain prepared water, and then flows to the production line;

[0080] The working gas exhausts the reaction exhaust gas through the exhaust device;

[0081] After the preparation is finished, the water inlet valve 707 door, the water delivery valve 3, the high-frequency alternating current power supply 12, the control power supply 11 are closed, the residual water in the liquid delivery track 6 is cleaned, the output of the prepared water is stopped, the air delivery to the air delivery pipeline 9 is stopped, the air exhaust device is closed, and the water storage tank 4 is drained according to the expected demand.

[0082] The specific structure and working principle of the application are as follows:

[0083] The water delivery valve 3 of the preparation device is connected with the control power supply 11 and the water level monitoring member 5 and is controlled by the two at the same time; the water level monitoring member 5 is installed in the inside of the water storage tank 4.

[0084] The plasma generating elements 7 are inlaid on the partition plate between the water storage tank 4 and the water treatment area, and 22 are installed in the embodiment. In working, all the plasma generating elements 7 simultaneously perform water treatment.

[0085] The air flows into the inside of the device through the air delivery pipeline 9 to become working gas and is finally exhausted through the air exhaust device. The air delivery pipeline 9 is controlled by the control power supply 11.

[0086] The transmission device 704 is controlled by the control power supply 11, the transmission device 704 drives the metal pipe 702 to rotate, prevents local overheating, and promotes the water mist outlet to move; the water inlet valve 707 door and the flow controller 708 are controlled by the control power supply 11. The water inlet valve 707 door controls whether the water flows into the plasma generating element 7; the flow controller 708 controls the flow rate of the water flowing into the plasma generating element 7, and the appropriate flow rate ensures that the deionized water is treated while the highest yield is achieved; the atomizing head 701 changes the untreated water into water mist, pushes forward in the form of filling the metal pipe 702 while the plasma is not destroyed, and ensures that the water is fully treated by the plasma.

[0087] The coil 703 is electrified by using the principle of electromagnetism, and a magnetic field is generated around the metal pipe 702; the metal pipe 702 is grounded, the plasma generated at the tip of the probe 705 forms a plasma vortex under the action of the magnetic field, and the water mist in the cross section of the metal pipe 702 can be treated; the filter screen 706 recondenses the treated water mist into water flow, flows to the liquid delivery pipeline through the liquid collection track 602, and finally converges to the secondary treatment area.

[0088] The metal electrode 802 of the secondary treatment area is connected with the high-voltage electrode and is fixed at the axial position of the insulating pipe 803; the outer wall area of the insulating pipe 803 at the same height as the metal electrode 802 is wrapped with the outer wrapping metal mesh 801, and in the embodiment, the outer wrapping metal mesh 801 adopts a copper mesh, the copper mesh is grounded, dielectric barrier discharge is used, and the area covered by the copper mesh can form plasma to perform secondary treatment on the water.

[0089] The secondary treatment device 8 is directly connected to the prepared water output pipeline, and the treated water can flow directly to the production line.

[0090] In the above structure, the outer metal mesh 801 and the metal tube 702 are both connected to the ground wire, and the metal electrode 802 and the probe 705 are both connected to the high voltage electrode.

[0091] A method for preparing water for the production of daily chemical products using the above-mentioned apparatus, the specific steps of which are as follows:

[0092] S1: Open the water supply valve 3 and inject water into the water storage tank 4 through the water supply pipe 2; use the water level monitoring device 5 to control the water supply pipe 2 to adjust the water level and ensure that the water level remains relatively still.

[0093] S2: Open the exhaust device, and air enters the water treatment area from the ventilation duct below the device, causing airflow inside the device. Turn on the control power supply 11 connecting the transmission device 704 and the coil 703, causing the metal tube 702 of the plasma generating element 7 to rotate around the axis and generate a magnetic field inside the coil 703.

[0094] S3: Turn on the high-frequency AC power supply 12, the tip of probe 705 begins to discharge, and a plasma vortex is formed under the action of the magnetic field; the secondary processing device 8 discharges through dielectric barrier, forming a plasma region in the area covered by the copper mesh.

[0095] S4: Open the inlet valve 707, adjust the volumetric flow controller 708 to allow water to flow into the plasma generating element 7 and adjust it to the predetermined flow rate. Then, it is converted into water mist through the atomizing head 701 to improve the processing efficiency and continuously treat the water. Finally, the water is condensed into a stream through the outlet filter 706 and flows to the liquid transfer track 6.

[0096] S5: The water treated in the first stage is collected in the secondary treatment area via the liquid transport track 6. After being treated by plasma generated by dielectric barrier discharge, it flows to the production line through the outlet pipe 10. The working gas is discharged as waste gas generated during the reaction through the exhaust device.

[0097] S6: End water preparation, close the inlet valve 707; close the water supply valve 3, stop water injection into the water storage tank 4; turn off the high-frequency AC power supply 12; turn off the control power supply 11 connecting the transmission device 704 and the coil 703; clean the residual water in the liquid transmission track 6 and close the prepared water output pipe; stop supplying air to the air supply pipe 9 and turn off the exhaust device; drain water from the water storage tank 4 as needed.

[0098] The specific parameters for the above steps are as follows:

[0099] The flow velocity in gas pipeline 9 is 0.5-1.25 m. 3 / min.

[0100] The processing power of the plasma generating element 7 is 30-40 W.

[0101] The processing power of the secondary processing device 8 is 40-50 W.

[0102] The liquid flow controlled by the flow controller 708 in the plasma generating element 7 and the amount of liquid atomized by the atomizing head 701 is 60-80 mL / min.

[0103] The rotating speed of the metal pipe 702 driven by the transmission device 704 in the plasma generating element 7 is 6 rad / min.

[0104] The insulating pipes 803 of the liquid transmission track 6 and the secondary processing device 8 are made of high-temperature-resistant inorganic materials such as quartz or ceramic or high-molecular insulating materials such as PTFE, PBS, PEEK, PPOB, and PPO.

[0105] The filter screen 7065-5 is made of high-molecular insulating material.

[0106] The working current of the coil 703 is 80 mA-200 mA.

[0107] In order to prove that the sterilization water preparation system provided by the present application has obvious sterilization effect, the following examples are provided for proof:

[0108] Examples 1, 2 and 3 all use the structure designed by the above-mentioned application device; the gas flow is set to 0.75 m 3 / min; the current in the coil 5-4 is 100 mA; the rotating speed of the metal pipe 5-8 is 6 rad / min, the power of the plasma generating element 5 is 35 W; the power of the secondary processing device 8 is 45 W; the flow of the flow controller is set to 65 mL / min.

[0109] Example 1

[0110] The same kind of conventional laundry detergent is prepared by using the deionized water prepared by plasma and the ordinary deionized water respectively. Two portions of the laundry detergent are inoculated on the culture medium with the same formula, and incubated at the appropriate temperature for one week. The effect is observed by taking out, and the specific formula is shown in Table 1:

[0111]

[0112] Example 2

[0113] The same kind of conventional laundry detergent is prepared by using the deionized water prepared by plasma and the ordinary deionized water respectively. Two portions of the laundry detergent are inoculated on the culture medium with the same formula, and incubated at the appropriate temperature for one week. The effect is observed by taking out, and the specific formula is shown in Table 2:

[0114]

[0115] Example 3

[0116] The same standard moisturizing serum was prepared using plasma-processed deionized water and ordinary deionized water, respectively. The product was applied to the volunteers' faces at regular intervals and in measured quantities, and the volunteers' facial skin condition was assessed. The specific formulation is shown in Table 3.

[0117]

[0118] Example 4

[0119] Using the same liquid flow rate but different power, water for the production of daily chemical products was prepared. A 400 mg / kg formaldehyde solution and a 2.5 g / kg hydroquinone solution were prepared with the prepared water. After standing for three minutes, the concentrations of formaldehyde and hydroquinone in the solutions were determined using a UV-Vis spectrophotometer.

[0120] Table 4 shows the concentrations of formaldehyde and hydroquinone in the solutions prepared using the same liquid flow rate but with different power in Example 4, along with the same equipment.

[0121]

[0122] Will Figures 5-8 In comparison, the reduction in bacterial colonies is visible to the naked eye, proving that plasma-prepared water does indeed have a bactericidal effect, and the effect is outstanding.

[0123] Will Figure 9 and Figure 10 In a comparative study, both volunteers initially had poor facial skin conditions. After four days of application, the moisturizing essence prepared with plasma-generated water showed a more significant improvement in their skin.

[0124] As shown in Table 4, water used in the production of daily chemical products prepared using plasma can reduce the content of harmful substances in the products, thereby reducing the harm to users' health.

[0125] The above description is an explanation of the present invention and not a limitation thereof. The scope of the present invention is defined by the claims. Within the scope of protection of the present invention, any form of modification may be made.

Claims

1. A system for the preparation of water for the production of household chemicals, comprising a treatment tank (1), characterized by the fact that: The water conveying assembly is provided with a water treatment device, The water conveying assembly comprises a water conveying pipeline (2) and a water valve (3), and a water storage tank (4) is separated in the processing box (1), and a water level monitoring member (5) is installed in the water storage tank (4), The water treatment device comprises: A liquid conveying track (6) is in communication with the water conveying assembly and guides water, A plurality of plasma generating elements (7) are arranged along the liquid conveying track (6), A secondary treatment device (8) is located at the discharging end of the liquid conveying track (6), and the output end of the secondary treatment device (8) is connected with a gas conveying pipeline (9) and a water outlet pipeline (10); the liquid conveying track (6) is provided with a water accumulation section (601) near the region where the secondary treatment device (8) is located, The plasma generating element (7) generates a magnetic field through the rotation of a metal pipe (702) provided with a coil (703), and a plasma vortex is formed by discharge at the magnetic field, The secondary treatment device (8) blocks discharge to form a second plasma region, The plasma generating element (7) comprises a water inlet pipeline, the output end of the water inlet pipeline is provided with an atomizing head (701), a metal pipe (702) is installed on one side of the water outlet direction of the atomizing head (701), the metal pipe (702) is externally provided with a coil (703) and is connected with a transmission device (704); a probe (705) is arranged at the metal pipe (702), The secondary treatment device (8) comprises an outer metal mesh (801) and a metal electrode (802) connected with the outer metal mesh (801), and an insulating pipe (803) is arranged in the outer metal mesh (801), The working medium in the processing box (1) is air, and an exhaust device for discharging reaction exhaust gas is installed at the top of the inner wall of the processing box (1).

2. The water preparation system for daily chemical production according to claim 1, characterized in that: The metal pipe (702) is sleeved outside the atomizing head (701), and one end of the metal pipe (702) away from the atomizing head (701) is connected with a filter screen (706).

3. The water preparation system for daily chemical production according to claim 2, characterized in that: The water inlet pipeline is connected with a water inlet valve (707) and a flow controller (708).

4. The water preparation system for daily chemical production according to claim 3, characterized in that: The lower side of the filter screen (706) is connected with a liquid collecting track (602), and the liquid collecting track (602) is inclined to the secondary treatment device (8).

5. The water preparation system for daily chemical production according to claim 4, characterized in that: The liquid conveying track (6) is divided into several sections, one section of the liquid conveying track (6) near the secondary treatment device (8) is inclined downward from the inner wall of the processing box (1) to the secondary treatment device (8), and is concave near the secondary treatment device (8), thereby forming the water accumulation section (601) located at the top of the secondary treatment device (8).

6. The water preparation system for daily chemical production according to claim 5, characterized in that: The processing box (1) is provided with a control power supply (11) and a high-frequency alternating current power supply (12), the control power supply (11) is used for controlling the on-off of components, the high-frequency alternating current power supply (12) supplies power to two plasma forming regions, and another circuit of the plasma forming region is grounded.

7. A production method using the water preparation system for daily chemicals production according to claim 6, characterized by, The method comprises the following steps: The water valve (3) is opened, and water is injected into the water storage tank (4) through the water conveying pipeline (2); The water level monitoring member (5) is used to control the water conveying pipeline (2) to adjust the water level, so that the water level remains relatively static; The exhaust device is opened, air enters the water treatment region from below the device, and air flows in the processing box (1); The control power (11) is turned on, the transmission device (704) is started, the coil (703) is energized, the metal tube (702) of the plasma generating device is rotated around the shaft, and a magnetic field is generated inside the coil (703); The high-frequency alternating current power (12) is turned on, the probe (705) is energized, the probe (705) tip starts to discharge, and a plasma vortex is formed under the action of the magnetic field; The secondary treatment device (8) starts the dielectric barrier discharge, and forms a plasma region in the area covered by the outer metal mesh (801); The water inlet valve (707) door is opened, the flow controller (708) is adjusted, the water flow is made to flow into the plasma generating element (7), and is adjusted to a predetermined flow rate, is atomized and sprayed through the atomizing head (701), and the water mist disinfection treatment efficiency is improved; At this time, the first disinfection is completed; The disinfected water mist passes through the filter screen (706), is condensed into a water flow, and then flows to the liquid conveying track (6), is guided by the liquid conveying track (6) to the secondary treatment device (8), is passed through the plasma generated by the dielectric barrier discharge, and then the second disinfection is completed, the prepared water is obtained, and flows to the production line; The working gas is discharged from the exhaust device to the reaction exhaust gas; After the preparation is completed, the water inlet valve (707) door, the water conveying valve (3), the high-frequency alternating current power (12), and the control power (11) are closed, the residual water in the liquid conveying track (6) is cleaned, the output of the prepared water is stopped, the air is stopped from being conveyed to the air conveying pipeline (9), the exhaust device is closed, and the water in the water storage tank (4) is drained according to the expected demand.

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