Method, device, electronic device and storage medium for generating embroidery maps
By training the embroidery generation model and using the embroidery basic sub-model and Lora sub-model to generate the target embroidery map, the problems of low efficiency, inconsistent quality and difficulty in automation in the existing technology of embroidery map production are solved, and efficient and unified embroidery map production is achieved.
Patent Information
- Application Number
- CN202311091707.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-08-28
- Publication Date
- 2025-09-30
- Estimated Expiration
- 2043-08-28
AI Technical Summary
The existing technology of embroidery patch production has low efficiency, inconsistent quality, high technical requirements for designers, and is difficult to automate and mass-produce.
Through the pre-trained embroidery generation model, including the embroidery basic sub-model and the embroidery Lora sub-model, the target embroidery map corresponding to the target embroidery type is generated based on the original embroidery image. The model is trained using a large number of real embroidery high-definition images to generate embroidery maps with consistent quality.
It significantly improves the efficiency of embroidery patch production, generates embroidery patches of consistent quality, reduces the technical requirements of designers, and realizes the automation and mass production of embroidery patches.
Smart Images

Figure CN119107373B_ABST
Abstract
Citation Information
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