A thin film, a preparation method thereof, a display device, and a protection device

Abstract

The embodiment of the present disclosure provides a film, a preparation method thereof, a display device and a protective equipment. The film comprises a main film layer, the main film layer comprises a metal oxide and a second metal, the metal element contained in the metal oxide is a first metal, the first metal and the second metal are both transition elements, the molar ratio of the first metal to the second metal is 1:(0.05-0.1), the atomic numbers of the first metal and the second metal are different, and the metal oxide is in a crystalline state. The film in the embodiment of the present disclosure has a high absorption rate for specific wavelength blue light, prevents blue light damage, and can ensure the high transmittance requirement of other visible light remaining wavelength light.

Description

Technical Field

[0001] This disclosure relates to the field of thin film technology, and in particular to a thin film and its preparation method, a display device, and a protective device. Background Technology

[0002] With the development of display and lighting technologies, people are spending increasingly more time in front of artificial light sources such as electronic screens. Most white light lighting used in the industry employs blue light chips in conjunction with yellow phosphors to produce white light, and blue light (wavelength range of 400-500nm), as one of the three primary colors, is indispensable in full-color displays and in regulating human biological rhythms.

[0003] However, blue light poses many health risks. It can cause photoaging and hyperpigmentation of the skin, damage the retina and other eye structures leading to refractive errors, macular degeneration, and other diseases, and disrupt the body's circadian rhythm. Given the dangers of blue light, it is necessary to protect against its harmful effects in daily life. Summary of the Invention

[0004] This disclosure provides a thin film and its preparation method, a display device, and a protective device to solve or alleviate one or more technical problems in the prior art.

[0005] As a first aspect of the present disclosure, the present disclosure provides a thin film including a main film layer, the main film layer including a metal oxide and a second metal, the metal oxide including a first metal, both the first metal and the second metal being transition elements, the molar ratio of the first metal to the second metal being 1:(0.05~0.1), the first metal and the second metal having different atomic numbers, and the metal oxide being in a crystalline state.

[0006] In some embodiments, the atomic number of the first metal is greater than the atomic number of the second metal, the first metal includes at least one of zinc, titanium, and copper, and the second metal includes at least one of silver, gold, and platinum group metals.

[0007] In some embodiments, the average surface roughness of the main film layer is between Ra0.1 μm and Ra0.3 μm.

[0008] In some embodiments, the thin film has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%; the main film layer has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm.

[0009] In some embodiments, the thin film further includes an antireflective film stacked with the main film layer, the antireflective film being made of silicon oxide.

[0010] As a second aspect of the present disclosure, the present disclosure provides a method for preparing a thin film as described in any embodiment of the present disclosure, the thin film comprising a main film layer, the main film layer comprising a metal oxide and a second metal, wherein the metal oxide comprises a first metal, and the method for preparing the main film layer comprises:

[0011] Precursor liquid for preparing the metal oxide;

[0012] The second metal is added to the precursor liquid of the metal oxide to obtain a mixed solution, wherein the molar ratio of the first metal to the second metal in the mixed solution is 1:(0.05-0.1);

[0013] The mixed solution is coated onto the substrate;

[0014] The main film layer is obtained by drying and annealing the mixed solution on the substrate.

[0015] In some embodiments, when annealing the mixed solution on the substrate, the annealing temperature is 400°C to 600°C.

[0016] In some embodiments, the pH value of the mixed solution is 2 to 4.

[0017] In some embodiments, the preparation of the precursor liquid of the metal oxide includes:

[0018] A precursor liquid of the metal oxide is prepared by mixing the first metal's ester metal salt, diethanolamine, concentrated nitric acid, and anhydrous ethanol, wherein the volume ratio of the first metal's ester metal salt, diethanolamine, and anhydrous ethanol is (1-8):1:(8-16).

[0019] As a third aspect of the present disclosure, the present disclosure provides a display device including a display panel and a thin film as described in any embodiment of the present disclosure, wherein the thin film is located on the light-emitting side of the display panel.

[0020] As a fourth aspect of the present disclosure, the present disclosure provides a protective device including a sheet-like light-transmitting body and a film as described in any embodiment of the present disclosure, the film being disposed on one side surface of the light-transmitting body.

[0021] The technical solution of this disclosure, by doping a second metal into the crystalline metal oxide corresponding to the first metal, can reduce the band gap of the metal oxide and broaden the spectral response range. When the second metal is doped, the appearance of an intermediate energy level is equivalent to providing a springboard for photoelectrons to transition, allowing even lower-energy photons to excite electrons and generate energy transfer. In the spectrum, this manifests as a redshift of the light cutoff wavelength, thereby ensuring the absorption rate of blue light in a specific wavelength range (e.g., 415nm–455nm), achieving a blue light protection effect, and ensuring high transmittance requirements for other remaining visible light wavelengths.

[0022] The above overview is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features of this disclosure will become readily apparent from the accompanying drawings and the following detailed description. Attached Figure Description

[0023] In the accompanying drawings, unless otherwise specified, the same reference numerals throughout the various drawings denote the same or similar parts or elements. These drawings are not necessarily drawn to scale. It should be understood that these drawings depict only some embodiments according to this disclosure and should not be construed as limiting the scope of this disclosure.

[0024] Figure 1 This is a schematic diagram of a thin film in one embodiment of the present disclosure;

[0025] Figure 2 This is a schematic diagram of the thin film in another embodiment of the present disclosure;

[0026] Figure 3 A schematic diagram of the preparation process of the main film layer;

[0027] Figure 4 The UV-Vis transmittance spectra of the main film layers ATO1, ATO2, and ATO3;

[0028] Figure 5 The UV-Vis transmission spectra of the main film layers ATO2 and ATO4;

[0029] Figure 6 The UV-Vis transmission spectra of the main film layers ATO2 and ATO5 are shown. Detailed Implementation

[0030] In the following description, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments can be modified in various ways without departing from the spirit or scope of this disclosure, and different embodiments can be combined arbitrarily without conflict. Therefore, the drawings and description are considered to be exemplary in nature and not restrictive. Numerical ranges defined in this disclosure by “about” refer to a range of ±20%, ±10%, ±5% of a given specific value.

[0031] Figure 1 This is a schematic diagram of a thin film in one embodiment of the present disclosure. To reduce the harmful effects of blue light on humans, embodiments of the present disclosure provide a thin film, such as... Figure 1 As shown, the thin film 2 can be disposed on the substrate 1. This thin film can be used in display devices or in glass. When used in a display device, the thin film 2 can be disposed on the light-emitting side of the display panel to absorb at least a portion of the blue light emitted by the display panel, reducing the harm of blue light to the human eye. When used in glass, the thin film 2 can be disposed on one side of the glass body to reduce the harm of blue light to humans.

[0032] Thin film 2 may include a main film layer 21, which comprises a metal oxide and a second metal. The metal oxide contains a first metal. Both the first metal and the second metal are transition elements, and they have different atomic numbers. The content of the first metal in the thin film is greater than the content of the second metal. The metal oxide is in a crystalline state.

[0033] The content of the first metal and the content of the second metal in the thin film can refer to mass fraction, atomic percentage, or molar ratio. Transition elements are chemical elements from Group IB to Group VIII of the periodic table. The aforementioned "atomic number" refers to the element's position in the periodic table, numerically equal to the nuclear charge (i.e., the number of protons) of the atomic nucleus or the number of electrons outside the nucleus of a neutral atom. The phrase "metal oxide in a crystalline state" in this disclosure can mean that the metal oxide is in a microcrystalline state, a partially crystalline state, a fully crystalline state, or a combination of multiple different crystalline states.

[0034] In some embodiments, the metal oxide in the main film layer is mixed with the second metal, and the molar ratio of the first metal to the second metal in the main film layer is 1:(0.05 to 0.1). For example, the molar ratio of the first metal to the second metal in the main film layer can be 1:0.05, 1:0.06, or 1:0.1.

[0035] In this embodiment, by doping the crystalline metal oxide corresponding to the first metal with a second metal (both the first and second metals are transition elements), the band gap of the metal oxide can be reduced, thus broadening the spectral response range. When the second metal is doped, the appearance of an intermediate energy level provides a springboard for photoelectrons to transition, allowing even lower-energy photons to excite electrons and generate energy transfer. This is manifested in the spectrum as a redshift of the light cutoff wavelength, thereby ensuring the absorption rate of blue light in a specific wavelength range (e.g., 415 nm to 455 nm), achieving a blue light protection effect, and ensuring high transmittance requirements for other remaining visible light wavelengths. By setting the molar ratio of the first metal to the second metal in the main film layer to 1:(0.05 to 0.1), the flatness of the film can be further improved, ensuring the absorption rate of blue light in a specific wavelength range. Furthermore, this facilitates the preparation of the main film layer 21 using the sol-gel method, simplifying the preparation process and reducing production costs.

[0036] In one embodiment, the atomic number of the first metal is greater than the atomic number of the second metal, the first metal includes at least one of zinc (Zn), titanium (Ti), and copper (Cu), and the second metal includes at least one of silver (Ag), gold (Au), and platinum group metals.

[0037] For example, the first metal may include titanium, the metal oxide may include titanium dioxide, and the second metal may include silver. The main film layer 21 is a titanium dioxide (TiO2) film layer containing silver nanoparticles. When titanium dioxide crystallizes in the anatase phase, it can block ultraviolet light. After introducing silver nanoparticles, there are freely moving electrons around the nano-metal particles. Under normal conditions, these electrons are in a state of random motion. When light enters the main film layer 21, these electrons will be deflected by the electric field, and the electrons themselves are also subject to the Coulomb force. These two opposing forces together make the electrons reciprocate. When the frequencies of light and electrons are equal, resonance occurs, and at this time, the particles absorb the incident light and generate energy transfer. This light absorption mode is selective; if the frequencies of the two are not equal, resonance absorption will not occur. Studies have shown that silver nanoparticles have strong absorption in the blue light band. In this disclosure, the molar ratio of the first metal to the second metal is set to 1:(0.05~0.1), which can enhance the blue light blocking effect of the main film layer 21 and improve the transmittance of the film in bands other than blue light.

[0038] In some embodiments, the average surface roughness of the main film layer is between Ra 0.1 μm and Ra 0.3 μm. For example, a roughness detection device, such as a white light interferometer, can be used to detect the surface roughness of the main film layer to obtain an average surface roughness between Ra 0.1 μm and Ra 0.3 μm.

[0039] The average surface roughness refers to the absolute value of the height difference between the highest and lowest points of a thin film observed at a microscopic scale using equipment such as scanning electron microscope (SEM), transmission electron microscope (TEM), atomic force microscope (AFM), and white light interferometer.

[0040] In the embodiments of this disclosure, the average surface roughness of the main film layer is between Ra0.1μm and Ra0.3μm, which can ensure the smoothness of subsequent film layer preparation. Furthermore, when the film is applied to a display device, this range of roughness will not affect the display effect of the display device.

[0041] In some embodiments, the main film layer 21 comprises multiple sub-film layers stacked sequentially, and at least one sub-film layer is made of the aforementioned metal oxide and the aforementioned second metal. Each sub-film layer can be formed by spin coating and annealing processes, thereby allowing for better control over the thickness and thickness uniformity of the main film layer.

[0042] In some embodiments, the film of this disclosure exhibits the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%; the film also has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm. The film's high absorption rate for blue light in the 415nm to 455nm range, with an average cutoff rate of 50% to 56%, allows it to absorb most of the blue light, reducing blue light damage. Furthermore, the film's average transmittance of 90% to 96% for light in the 500nm to 800nm ​​range ensures that the film prevents blue light damage without affecting the transmission of light in the 500nm to 800nm ​​range, thus not impacting the display effect of the display device or the light transmittance of the glass.

[0043] Figure 2 This is a schematic diagram of the thin film in another embodiment of this disclosure. Figure 2 As shown, in one embodiment, the thin film may further include an antireflective film 22 stacked with the main film layer 21. Exemplarily, the antireflective film 22 may be disposed on the side of the main film layer 21 away from the substrate 1. By providing the antireflective film, the transmittance of the thin film to other visible light can be improved.

[0044] In some embodiments, the antireflective film material includes silicon oxide (SiOx), such as silicon dioxide (SiO2). Silica films have advantages such as strong film adhesion, high hardness, high light transmittance, and strong corrosion resistance. Using silica as the material for an antireflective film can give the film overall higher transmittance and improve its service life.

[0045] The thickness of the antireflective coating is between 50 nm and 1000 nm, thus ensuring the antireflective effect while maintaining a relatively small overall film thickness. In one example, the antireflective coating may be 50 nm, 100 nm, 200 nm, 400 nm, 500 nm, 700 nm, or 1000 nm.

[0046] This disclosure also provides a method for preparing a thin film as described above, the thin film comprising a main film layer, the main film layer comprising a metal oxide and a second metal, the metal oxide comprising a first metal, and the method for preparing the main film layer comprising steps S10 to S40.

[0047] In step S10, a precursor liquid of the metal oxide is prepared.

[0048] In step S20, the second metal is added to the precursor liquid of the metal oxide to obtain a mixed solution, wherein the molar ratio of the first metal to the second metal in the mixed solution is 1:(0.05~0.1).

[0049] In step S30, the mixed solution is coated onto the substrate.

[0050] In step S40, the mixed solution on the substrate is dried and annealed to obtain the main film layer.

[0051] In one embodiment, when annealing the mixed solution on the substrate, the annealing temperature is 400°C to 600°C. For example, the annealing temperature is approximately 400°C, 500°C, or 600°C.

[0052] In one embodiment, the pH of the mixed solution is 2 to 4. For example, the pH of the mixed solution is approximately 2, 3, or 4.

[0053] In one embodiment, the preparation of the precursor solution of the metal oxide includes: mixing an aliphatic metal salt of the first metal, diethanolamine, concentrated nitric acid, and anhydrous ethanol to prepare the precursor solution of the metal oxide, wherein the volume ratio of the aliphatic metal salt of the first metal, diethanolamine, and anhydrous ethanol is (1-8):1:(8-16). For example, the volume ratio of the aliphatic metal salt of the first metal, diethanolamine, and anhydrous ethanol is 4:1:16.

[0054] The preparation method of the thin film disclosed herein will be described below with specific examples. Figure 3 A schematic diagram of the preparation process for the main film layer. (See diagram below.) Figure 3 As shown, in some embodiments, the method for preparing the thin film may further include the following steps S01 to S02.

[0055] S01. Clean the substrate. The substrate can be made of ultra-white glass, that is, ultra-transparent low-iron glass.

[0056] Cleaning the substrate can improve the uniformity of the distribution of the subsequently formed thin film and enhance the adhesion of the film.

[0057] In some embodiments, step S01 may include S01a to S01c:

[0058] S01a. Immerse the substrate in deionized water containing a cleaning agent and perform continuous ultrasonic cleaning. For example, the cleaning time is approximately 40 minutes, and the cleaning agent is a glass cleaner.

[0059] S01b: The substrate, after being cleaned with the cleaning agent, is placed in an acetone solution and subjected to continuous ultrasonic cleaning to remove the organic solvent from the substrate. For example, the mass fraction of the acetone solution is approximately 99.9%, and the ultrasonic cleaning time is approximately 20 minutes.

[0060] S01c. Place the acetone-cleaned substrate into anhydrous ethanol and perform continuous ultrasonic cleaning to remove residual acetone solution from the substrate. For example, the ultrasonic cleaning time is approximately 20 minutes.

[0061] In some embodiments, step S01 is followed by step S02, which involves pre-treating the substrate. For example, ozone can be used to pre-treat the substrate.

[0062] In some embodiments, step S02 includes: cleaning the substrate with helium gas, and then placing the substrate in an ozone environment for about 10 minutes to disinfect bacteria on the substrate.

[0063] In step S10, a precursor liquid of the metal oxide is prepared.

[0064] In some embodiments, the first metal is titanium, the second metal is silver, and the metal oxide is titanium dioxide. Step S10 may include: mixing isopropyl titanate, diethanolamine, concentrated nitric acid, and anhydrous ethanol to prepare a titanium dioxide precursor solution. The volume ratio of isopropyl titanate, diethanolamine, and anhydrous ethanol may be (1-8):1:(8-16). For example, the volume ratio of isopropyl titanate, diethanolamine, and anhydrous ethanol may be 4:1:16. The concentrated nitric acid can be determined based on the pH value. The titanium dioxide precursor solution is prepared and allowed to stand for a period of time, for example, 24 hours.

[0065] When preparing titanium dioxide precursor liquid, an appropriate amount of glacial acetic acid can be added to prevent the titanium dioxide precursor liquid from hydrolyzing.

[0066] In this embodiment, the titanium dioxide precursor liquid can be prepared in one step, which simplifies the process and improves efficiency.

[0067] In step S20, silver nitrate solution is added to the titanium dioxide precursor solution obtained in S10 to prepare a mixed solution, wherein the molar ratio of titanium to silver in the mixed solution is between 1:(0.05 and 0.1). After obtaining the mixed solution, it is allowed to stand for 24 hours. In one example, the concentration of silver nitrate solution is 1.5 mol / L.

[0068] In one example, the pH of the mixed solution is between 2 and 4, for instance, pH 2, 3, or 4. Experiments have shown that the primary film layer achieves the optimal blue light cutoff efficiency when the pH of the mixed solution is approximately 3.

[0069] In step S30, the mixed solution is coated onto the substrate.

[0070] In some embodiments, a spin coating process is used to coat the mixed solution onto the substrate. In some embodiments, the spin coating speed in the spin coating process is between 500 and 3000 r / min. By using high-speed spin coating, the uniformity of the coating can be ensured.

[0071] In some embodiments, the spin coating time can be between 30 seconds and 2 minutes.

[0072] In a specific example, step S30 may include: fixing the substrate on a spin coater, adding 200 μL of titanium dioxide / silver mixed solution, accelerating to 500 r / min at 100 r / s and holding for 5 s, and then accelerating to 2000 r / min at 100 r / s and holding for 60 s.

[0073] By adjusting the spin coating speed of the mixed solution, the uniformity of coating can be improved, and the film thickness can also be adjusted.

[0074] In step S40, the mixed solution on the substrate is dried and annealed to form the main film layer of the thin film.

[0075] In some embodiments, step S40 may include:

[0076] S41. Dry the substrate coated with the mixed solution at a temperature of 80℃~120℃ for 5~10min.

[0077] S42. Anneal the dried substrate.

[0078] In some embodiments, the annealing temperature in step S42 is 400°C to 800°C. Exemplarily, the annealing temperature is 400°C to 600°C; for example, the annealing temperature can be approximately 400°C, 500°C, or 600°C. Setting the annealing temperature to 400°C to 600°C is beneficial for improving the blue light protection effect of the main film layer and reducing the roughness of the main film layer. In one embodiment, the annealing temperature is approximately 500°C, which can ensure the crystalline state of the metal oxide, further improving the blue light protection effect of the main film layer.

[0079] In some embodiments, the annealing time is between 1.5 and 2 hours.

[0080] It should be noted that, in this embodiment, the number of times steps S30 and S40 are performed is not limited. For example, steps S30 and S40 can each be performed once. Alternatively, steps S30 and S40 can each be performed N times, where N is an integer greater than 1. In this case, each time steps S30 and S40 are performed, a sub-film layer is formed, thus forming a main film layer with a relatively large thickness and uniform thickness. In one example, the main film layer includes three stacked sub-film layers.

[0081] In some embodiments, the preparation method further includes: S50, forming an antireflection film stacked with the main film layer on the side of the main film layer away from the substrate.

[0082] In some embodiments, the antireflection film may be formed using a deposition process such as magnetron sputtering. The antireflection film is made of silicon dioxide and has a thickness of approximately 200 nm.

[0083] Figure 4 The UV-Vis transmittance spectra of the main film layers ATO1, ATO2, and ATO3; Figure 5 The UV-Vis transmission spectra of the main film layers ATO2 and ATO4; Figure 6 The UV-Vis transmittance spectra of the main films ATO2 and ATO5 are shown.

[0084] ATO1: Annealing temperature is 400℃, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 3;

[0085] ATO2: Annealing temperature is 500℃, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 3;

[0086] ATO3: Annealing temperature is 600℃, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 3;

[0087] ATO4: Annealing temperature is 500℃, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is 2;

[0088] ATO5: Annealing temperature is 500℃, the molar ratio of Ti to Ag in the mixed solution is 1:0.06, and the pH value of the mixed solution is 3.

[0089] from Figure 4 As can be seen, ATO2 and ATO3 produce obvious troughs in the short-wavelength blue light region. Compared with ATO1, the increased annealing temperature of ATO2 and ATO3 leads to improved crystallinity of TiO2 crystals in the main film layer. The precipitation of silver nanoparticles at high temperatures, combined with plasmon resonance with TiO2, achieves the cutoff of short-wavelength blue light. Experiments have shown that excessively high annealing temperatures, such as 600℃, can cause brittle cracking on the surface of the main film layer. Therefore, the annealing temperature can be selected from approximately 450℃ to 500℃; for example, approximately 500℃.

[0090] from Figure 5 As can be seen, compared with ATO4, ATO2 produces a significant trough in the short-wavelength blue light region. This indicates that increasing the pH of the mixed solution can improve the cutoff rate of the main film layer for short-wavelength blue light.

[0091] from Figure 6 As can be seen, compared to ATO5, ATO2 produces a significant trough in the short-wavelength blue light region. This indicates that appropriately reducing the molar ratio of Ti to Ag in the mixed solution can improve the cutoff rate of the main film for short-wavelength blue light. By adjusting the molar ratio of Ti to Ag, the blue light blocking effect of the film can be improved, and the transmittance of the film in wavelengths other than blue light can be increased.

[0092] Table 1 shows the blue light protection performance data for the five main film layers of ATO1-ATO5.

[0093]

[0094] from Figures 4-6 As shown in Table 1, the annealing temperature can be selected at approximately 500℃, the molar ratio of Ti to Ag in the mixed solution is 1:0.05, and the pH value of the mixed solution is approximately 3. The prepared ATO2 exhibits the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 53.86%. The average transmittance of ATO2 for light in the wavelength range of 500nm to 800nm ​​reaches 93.92%.

[0095] This disclosure also provides a display device, including a display panel and a thin film as described in any embodiment of this disclosure, wherein the thin film may be disposed on the light-emitting side of the display panel.

[0096] By providing the thin film in this embodiment on the light-emitting side of the display panel, the harmful blue light in the wavelength range of 415nm to 455nm in the display panel is improved or avoided from damaging the human eye, while ensuring the high transmittance requirements of other remaining visible light wavelengths.

[0097] The display device can be any product or component with a display function, such as a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, or navigator.

[0098] This disclosure also provides a protective device, including a sheet-like light-transmitting body and a film as described in any embodiment of this disclosure. The film may be disposed on one side surface of the light-transmitting body. It should be noted that the term "light-transmitting body" should be interpreted broadly, referring to a sheet-like body that can transmit light. The material of the light-transmitting body may include inorganic materials (such as silicon dioxide) or organic materials (such as acrylic), as long as the light-transmitting body is a sheet-like light-transmitting body.

[0099] The protective device provided in this disclosure can be the glass of a vehicle window or door, or it can be protective eyewear, especially the lens in protective eyewear. Using this protective device improves or avoids the damage to the human body or eyes caused by harmful blue light in the wavelength range of 415nm to 455nm in the external environment, while ensuring high transmittance requirements for other remaining visible light wavelengths.

[0100] In the description of this specification, it should be understood that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this disclosure.

[0101] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this disclosure, "multiple" means two or more, unless otherwise explicitly specified.

[0102] In this disclosure, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0103] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0104] The foregoing disclosure provides many different implementations or examples for carrying out different structures of this disclosure. To simplify this disclosure, the components and arrangements of specific examples are described above. Of course, these are merely examples and are not intended to limit this disclosure. Furthermore, reference numerals and / or reference letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various implementations and / or arrangements discussed.

[0105] The above are merely specific embodiments of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any person skilled in the art can easily conceive of various variations or substitutions within the technical scope disclosed in this disclosure, and these should all be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A thin film, characterized in that, The film includes a main film layer comprising a metal oxide and a second metal. The metal oxide contains a first metal, and both the first and second metals are transition elements. The molar ratio of the first metal to the second metal is 1:(0.05-0.1). The first and second metals have different atomic numbers. The metal oxide is in a crystalline state. The first metal includes titanium, and the second metal includes silver.

2. The thin film according to claim 1, characterized in that, The average surface roughness of the main film layer is between Ra0.1μm and Ra0.3μm.

3. The thin film according to claim 1, characterized in that, The thin film has the highest absorption rate for blue light in the wavelength range of 415nm to 455nm, with an average cutoff rate of 50% to 56%; the main film layer has an average transmittance of 90% to 96% for light in the wavelength range of 500nm to 800nm.

4. The film according to any one of claims 1 to 3, characterized in that, The thin film also includes an antireflective film stacked on top of the main film layer, the antireflective film being made of silicon oxide.

5. A method for preparing a thin film as described in any one of claims 1-4, characterized in that, The thin film includes a main film layer, which comprises a metal oxide and a second metal, wherein the metal oxide contains a first metal, and the method for preparing the main film layer includes: Precursor liquid for preparing the metal oxide; The second metal is added to the precursor liquid of the metal oxide to obtain a mixed solution, wherein the molar ratio of the first metal to the second metal in the mixed solution is 1:(0.05-0.1); The mixed solution is coated onto the substrate; After drying and annealing the mixed solution on the substrate, the main film layer is obtained; The precursor solution for preparing the metal oxide comprises: mixing the first metal ester metal salt, diethanolamine, concentrated nitric acid and anhydrous ethanol to prepare the precursor solution for the metal oxide, wherein the volume ratio of the first metal ester metal salt, diethanolamine and anhydrous ethanol is (1-8):1:(8-16).

6. The method according to claim 5, characterized in that, When annealing the mixed solution on the substrate, the annealing temperature is 400°C to 600°C.

7. The method according to claim 5, characterized in that, The pH value of the mixed solution is 2 to 4.

8. A display device, characterized in that, It includes a display panel and a thin film according to any one of claims 1-4, wherein the thin film is located on the light-emitting side of the display panel.

9. A protective device, characterized in that, It includes a sheet-like light-transmitting body and a film according to any one of claims 1-4, wherein the film is disposed on one side surface of the light-transmitting body.

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