A reflection module and periscope camera module thereof

Abstract

The present invention discloses a reflection module and a periscope camera module thereof, wherein the reflection module comprises: a reflection component, which is used to reflect light incident along a first axis to a second axis, wherein the first axis and the second axis intersect; a rotating assembly, which is used to carry the reflection component; a base, which has an internal space, which is used to accommodate the rotation component; a rotation support part, which is located between the bottom of the rotation component and the top of the base along a direction parallel to the first axis, and the rotation support part provides a rotation axis, which passes through the rotation support part and is parallel to the second axis; and a rotation drive part, which is used to drive the rotation component and the reflection component to rotate around the rotation axis. The rotation support part is able to carry the rotation component and drive the reflection component to rotate around the rotation axis, so that the image on the photosensitive surface of the photosensitive module produces an effect of rotating around the rotation axis, thereby compensating for the rotational jitter and tilting jitter of the periscope camera module during use.

Description

Technical Field

[0001] The present invention relates to the field of optical imaging, and in particular to a reflection module and a periscope camera module thereof. Background Art

[0002] Camera modules are an indispensable part of mobile electronic devices. With the further development of camera module technology, users' demands for camera modules are becoming more and more sophisticated. The development of camera products not only needs to meet the requirements of high performance such as background blur, night shooting, dual-camera zoom, etc., but also needs to meet the requirements of miniaturization, lightness, and compactness. In particular, the periscope camera module has a longer focal length based on the folded optical path through the optical path turning part and the lens part, which can meet the requirements of high zoom and lightness at the same time, and has broad market prospects.

[0003] At present, the reflective module of the periscope camera module usually rotates around a rotation axis parallel to the incident light axis, and around a rotation axis perpendicular to the incident light axis and parallel to the imaging plane, which makes it difficult to correct image blur caused by rotational jitter. Summary of the invention

[0004] One object of the present invention is to provide a reflection module, which is conducive to correcting image blur caused by rotational jitter, thereby reducing phase difference and improving imaging quality.

[0005] Another object of the present invention is to provide a camera module having the above-mentioned reflection module.

[0006] In order to achieve at least one of the above purposes, the technical solution adopted by the present invention is: a reflection module, comprising: a reflection component, used to reflect light incident along a first axis to a second axis, wherein the first axis and the second axis intersect; a rotating assembly, used to carry the reflection component; a base, having an internal space, used to accommodate the rotating assembly; a rotating support portion, wherein the rotating support portion is located between the bottom of the rotating assembly and the top of the base along a direction parallel to the first axis, and the rotating support portion provides a rotating axis, which passes through the rotating support portion and is parallel to the second axis; a rotating drive portion, used to drive the rotating assembly and the reflection component to rotate around the rotating axis.

[0007] Preferably, the rotating support portion includes at least two rotating support members spaced apart in a direction parallel to the second axis, the at least two rotating support members are crimped between the rotating assembly and the base, and the at least two rotating support members form a rotating axis, wherein the rotating axis and the second axis are parallel to each other but not colinear.

[0008] Preferably, the reflection module also includes a rotating holder and a pitch support portion, the rotating assembly, the rotating holder, the rotating support portion and the base are stacked in a direction parallel to the first axis, and the rotating support portion is capable of supporting the rotating holder and the rotating assembly to perform rotational movement around the rotating axis relative to the base; the pitch support portion is located between the rotating assembly and the rotating holder, and the pitch support portion provides a pitch axis, which is parallel to the third axis and not colinear with the third axis, and the rotating assembly is capable of performing pitch movement around the pitch axis relative to the rotating holder, wherein the third axis intersects the first axis and the second axis.

[0009] Preferably, at least part of the projection area of ​​the rotating holder along the first axis overlaps with the projection area of ​​the rotating component along the first axis, and at least part of the projection area of ​​the rotating holder along the second axis overlaps with the projection area of ​​the rotating component along the second axis.

[0010] Preferably, the reflection module also includes a pitch driving unit, the pitch driving unit is located at the bottom of the rotating component, the rotation driving unit is located at the back of the rotating component, and the pitch driving unit and the rotation driving unit are arranged on opposite sides of the rotating component; the pitch driving unit includes at least one pitch magnet and at least one pitch coil, the pitch magnet and the pitch coil are arranged relative to each other in a direction parallel to the first axis, and are suitable for cooperating in driving the rotating component to perform pitch movement around the pitch axis relative to the rotating retaining member; the rotation driving unit includes at least one rotating magnet and at least one rotating coil, the rotating magnet and the rotating coil are arranged relative to each other in a direction parallel to the second axis, and are suitable for cooperating in driving the rotating component to perform rotational movement around the rotation axis relative to the base.

[0011] As a preference, the rotating magnet is curved in a plane perpendicular to the second axis, and the center of curvature of the rotating magnet is close to the second axis.

[0012] Preferably, the rotating support portion includes at least two supporting bosses, which protrude from one of the rotating retaining member and the base in a direction parallel to the first axis, and the at least two supporting bosses are crimped between the rotating retaining member and the base, and an imaginary line extending from the rotating axis passes through the at least two supporting bosses.

[0013] Preferably, the rotating support portion includes at least two supporting balls spaced apart in a direction parallel to the second axis, the rotating retaining member is provided with at least two upper ball grooves, the base is provided with at least two lower ball grooves, the upper ball grooves and the lower ball grooves are arranged opposite to each other in a direction parallel to the first axis, the at least two supporting balls are movably clamped between the upper ball grooves and the lower ball grooves, and an imaginary line extending from the rotating axis passes through the at least two supporting balls.

[0014] Preferably, the pitch support portion includes a pivot member extending in a direction parallel to the third axis, and the pivot member enables the rotating assembly to be hinged to the rotating retaining member so that the rotating assembly can perform a pitch movement around the pitch axis relative to the rotating retaining member.

[0015] Preferably, the projection of the pivot member along a direction parallel to the first axis falls between the projections of the at least two rotation support members along a direction parallel to the first axis.

[0016] Preferably, among the at least two rotating supports, one of the rotating supports is arranged close to the reflecting component along a direction parallel to the second axis, and the other rotating support is arranged away from the reflecting component along a direction parallel to the second axis, the distance between the projection of the pivot member and the projection of the rotating support member away from the reflecting component is denoted as L1, and the distance between the projection of the pivot member and the projection of the rotating support member close to the reflecting component is denoted as L2, satisfying: L1≤L2.

[0017] Preferably, an imaginary line where the projection of the pivot member along a direction parallel to the first axis lies is perpendicular to an imaginary line where the projection of a line connecting the at least two rotation supports along a direction parallel to the first axis lies.

[0018] Preferably, the reflection module further comprises a magnetic magnet and a yoke, wherein the magnetic magnet is arranged at one of the rotating component and the base, and the yoke is arranged at the other of the rotating component and the base, and a magnetic force is generated between the magnetic magnet and the yoke in a direction parallel to the first axis, and under the action of the magnetic force, the pitch support portion is crimped between the rotating component and the rotating retaining member, and the rotating support portion is crimped between the rotating retaining member and the base.

[0019] Preferably, the reflection module also includes a sensing component, which includes at least one rotation sensing element and at least one pitch sensing element arranged on the base, the rotation sensing element and the rotating magnet are arranged relative to each other in a direction parallel to the second axis, so that the rotation sensing element obtains the rotating magnetic field information of the rotating magnet, and the pitch sensing element and the pitch magnet are arranged relative to each other in a direction parallel to the first axis, so that the pitch sensing element obtains the pitch magnetic field information of the pitch magnet.

[0020] As a preference, the magnetic poles of the rotating magnet are distributed along the bending direction of the rotating magnet. Under the condition that the rotating magnet rotates around the rotating axis relative to the rotating sensing element, along the direction of the second axis OA2, the overlapping area between the magnetic poles of the rotating magnet and the rotating sensing element changes with the rotation angle of the rotating magnet.

[0021] As a preference, the rotating magnet includes a first rotating magnet and a second rotating magnet arranged at intervals in a direction parallel to a third axis, the rotating sensing element includes a first rotating sensing element and a second rotating sensing element, and the first rotating sensing element and the first rotating magnet are arranged relatively to each other in a direction parallel to the second axis, the second rotating sensing element and the second rotating magnet are arranged relatively to each other in a direction parallel to the second axis, the first rotating sensing element obtains first rotating magnetic field information of the first rotating magnet, and the second rotating sensing element obtains second rotating magnetic field information of the second rotating magnet, so that the stroke of the rotating component rotating around the rotating axis can be calculated by using the first rotating magnetic field information and the second rotating magnetic field information.

[0022] As a preference, the pitch magnet includes a first pitch magnet and a second pitch magnet spaced apart in a direction parallel to the third axis, the pitch sensing element includes a first pitch sensing element and a second pitch sensing element, and the first pitch sensing element and the first pitch magnet are relatively arranged in a direction parallel to the first axis, the second pitch sensing element and the second pitch magnet are relatively arranged in a direction parallel to the first axis, the first pitch sensing element obtains first pitch magnetic field information of the first pitch magnet, and the second pitch sensing element obtains second pitch magnetic field information of the second pitch magnet, so that the rotation stroke of the rotating component around the pitch axis can be calculated through the first pitch magnetic field information and the second pitch magnetic field information.

[0023] In order to achieve at least one of the above purposes, the technical solution adopted by the present invention is: a periscope camera module, comprising: a reflection module as described above, the reflection module is configured to reflect light incident from a first axis to a second axis, wherein the first axis and the second axis intersect; a lens module, the lens module is configured to receive light from the reflection module and continue to propagate the light along the second axis; a photosensitive module, the photosensitive module is configured to receive light and perform imaging; a base, the base having a accommodating cavity, the reflection module and the lens module being arranged in the accommodating cavity, the base of the reflection module being integrally or separately arranged on the base; and a shell, the shell cover being arranged on the base.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] The rotating support part carries the rotating retaining part and the rotating assembly, and drives the reflecting component to rotate around the rotating axis, so that the image on the photosensitive surface of the photosensitive module produces the effect of rotating around the rotating axis, thereby compensating for the rotational jitter and tilt jitter of the periscope camera module during use, thereby reducing the phase difference and improving the imaging quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the three-dimensional structure of a periscope camera module according to some embodiments of the present invention.

[0027] Figure 2 It is a schematic diagram of image plane compensation of a camera module according to the prior art.

[0028] Figure 3 is a schematic diagram of image plane compensation of a periscope camera module according to some embodiments of the present invention.

[0029] Figure 4 is a cross-sectional view of a periscope camera module according to some embodiments of the present invention.

[0030] Figure 5 is an exploded diagram of a reflection module according to some embodiments of the present invention.

[0031] Figure 6 is a schematic diagram of the back three-dimensional structure of a reflection module according to some embodiments of the present invention.

[0032] Figure 7 4 is a schematic diagram of the bottom three-dimensional structure of a reflection module according to some embodiments of the present invention.

[0033] Figure 8 It is a schematic diagram of the back three-dimensional structure of a rotating bracket according to some embodiments of the present invention.

[0034] Fig. 9It is a schematic diagram of the front three-dimensional structure of a rotating bracket according to some embodiments of the present invention.

[0035] Fig.10 It is a schematic diagram of the three-dimensional structure of a base according to some embodiments of the present invention.

[0036] Fig.11 3D is a schematic diagram of the three-dimensional structure of a rotating retainer according to some embodiments of the present invention.

[0037] Fig.12 is a top view of a base according to some embodiments of the present invention.

[0038] Fig.13 Schematic diagram of the three-dimensional structure of the rotating retainer according to some other embodiments of the present invention.

[0039] Fig.14 is a top view of a base according to some other embodiments of the present invention.

[0040] Fig.15 is a schematic diagram of the forces acting on a rotating retainer according to some embodiments of the present invention.

[0041] Fig.16 2 is a schematic diagram of a three-dimensional structure of a fixing frame according to some embodiments of the present invention.

[0042] Fig.17 is a stereoscopic schematic diagram of a second lens group installed on a lens carrier according to some embodiments of the present invention.

[0043] In the figure: 1, reflection module; 11, reflection member; 111, reflection surface; 112, fixing surface; 12, first lens; 13, second lens; 20, rotation assembly; 21, bottom; 22, back; 23, side wall; 231, slot; 24, hollow area; 31, rotation bracket; 311, mounting surface; 32, fixing bracket; 321, first fixing part; 3211, first gap; 322, second fixing part; 3221, second gap; 40, rotation holder; 41, ball upper groove; 42, Avoidance groove; 50, rotation support part; 51, rotation support member; 511, support boss; 512, support ball; 52, support groove; 60, pitch support part; 61, pivot member; 70, rotation drive part; 71, rotation magnet; 711, first magnetic area; 712, second magnetic area; 713, first rotation magnet; 714, second rotation magnet; 72, rotation coil; 721, first rotation coil; 722, second rotation coil; 80, pitch drive part; 81, pitch magnet; 811, The third magnetic area; 812, the fourth magnetic area; 813, the first pitch magnet; 814, the second pitch magnet; 82, the pitch coil; 821, the first pitch coil; 822, the second pitch coil; 90, the sensing component; 91, the rotation sensing element; 911, the first rotation sensing element; 912, the second rotation sensing element; 92, the pitch sensing element; 921, the first pitch sensing element; 922, the second pitch sensing element; 101, the base; 1011, the internal space; 1012, the ball lower groove ; 102, buffer part; 1021, first buffer member; 1022, second buffer member; 1023, third buffer member; 2, periscope camera module; 103, shell; 104, lens module; 1041, first lens group; 1042, second lens group; 105, lens carrier; 1051, guide groove; 1052, ball groove; 106, support member; 1061, guide rod; 1062, lens ball; 107, focus drive unit; 108, photosensitive module; 109, base; 1091, accommodating cavity. DETAILED DESCRIPTION

[0044] The present invention is further described below in conjunction with specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form a new embodiment.

[0045] In the description of the present invention, it should be noted that directional words, such as the terms "center", "lateral", "longitudinal", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating directions and positional relationships are based on the directions or positional relationships shown in the accompanying drawings, which are only for the convenience of narrating the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and cannot be understood as limiting the specific scope of protection of the present invention.

[0046] It should be noted that the terms "first", "second", etc. in the description and claims of the present application are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence.

[0047] The terms "including" and "having" and any variations thereof in the specification and claims of this application are intended to cover non-exclusive inclusions. For example, a process, method, system, product or apparatus comprising a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to these processes, methods, products or apparatuses.

[0048] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, a contact connection, or an indirect connection through an intermediate medium, and it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0049] A reflection module 1, such as Figure 1-Figure 16 As shown, it includes: a reflective component 11, used for reflecting light incident along the first axis OA1 to the second axis OA2, wherein the first axis OA1 and the second axis OA2 intersect; a rotating component 20, used for carrying the reflective component 11; a base 101, having an internal space 1011, used for accommodating the rotating component 20; a rotating support portion 50, the rotating support portion 50 is located between the bottom 21 of the rotating component 20 and the top of the base 101 along a direction parallel to the first axis OA1, and the rotating support portion 50 provides a rotating axis C1, which passes through the rotating support portion 50 and is parallel to the second axis OA2; a rotating driving portion 70, used for driving the rotating component 20 and the reflective component 11 to rotate around the rotating axis C1.

[0050] It should be understood that the shaking of the periscope camera module 2 is an unexpected movement of the periscope camera module 2. For example, when a mobile phone, tablet or other electronic device is handheld, the shaking or tilting of the hand is very likely to cause the shaking of the periscope camera module 2. In order to reduce the impact of unexpected movement on the final imaging of the periscope camera module 2, the up and down pitch and left and right swing are usually compensated. However, during the use of the periscope camera module 2, the rotation and tilt of the device or the shaking of the user's hand are mostly parallel to the imaging surface of the photosensitive chip of the photosensitive module 108. Therefore, compensation for rotational shaking is particularly important for the periscope camera module 2.

[0051] In the present application, the rotating component 20 is able to carry the reflective component 11 and drive the reflective component 11 to rotate around the rotation axis C1 parallel to the second axis OA2, so that the image on the imaging surface of the photosensitive chip of the photosensitive module 108 produces an effect of rotating around an imaginary line parallel to the second axis OA2, thereby compensating for the rotational jitter and tilt jitter of the periscope camera module 2 during use, thereby reducing the phase difference and improving the imaging quality.

[0052] It should be understandable that Figure 2 As shown, if the reflective component 11 is driven to swing around an imaginary line parallel to the first axis OA1, since the imaging surface of the photosensitive chip is located in a plane perpendicular to the second axis OA2, the image after the swinging movement of the reflective component 11 is projected onto the original plane perpendicular to the second axis OA2, and part of the imaging information will be lost. Furthermore, since the plane where the aperture is located is also perpendicular to the second axis OA2, the swinging movement of the reflective component 11 will cause a part of the light originally involved in the imaging to be blocked, so that the MTF axis value of the reflective component 11 during the rotational movement around the rotation axis C1 is less than the MTF axis value when the object distance is infinite (INF state), that is, the swinging movement of the reflective component 11 around the imaginary line parallel to the first axis OA1 will cause the performance of the periscope camera module 2 to decrease, affecting the final imaging quality.

[0053] In this application, if Figure 3As shown, the rotational movement of the reflective component 11 around the rotation axis C1 can achieve compensation of the rotation direction. Specifically, since the imaging surface of the photosensitive chip is located in a plane perpendicular to the second axis OA2, and the plane where the aperture is located is also a plane perpendicular to the second axis OA2, the image after the reflective component 11 rotates around the rotation axis C1 is projected onto the original plane perpendicular to the second axis OA2 and does not affect the size of the image. At the same time, it is helpful to avoid the loss of light participating in the imaging at the aperture, thereby making the MTF axis value of the reflective component 11 during the rotational movement around the rotation axis C1 consistent with or close to the MTF axis value when the object distance is infinite (INF state). In other words, the rotational movement of the reflective component 11 around the rotation axis C1 only plays the role of rotating the angle of the image in the imaging surface of the photosensitive chip, and there is no offset in the height position of the imaging surface, which is helpful to avoid the influence on the MTF axis value of the periscope camera module 2. Among them, MTF (Modulation Transfer Function) is a modulation transfer function, which can intuitively and accurately quantify the resolution capability of the periscope camera module 2.

[0054] It is worth mentioning that because the aperture of the periscope camera module 2 is smaller, jitter occurs during night scene or video shooting, resulting in relatively poor imaging effects. The rotation assembly 20 carries the reflective member 11 to rotate around the rotation axis C1, which is conducive to compensating for the rotation and jitter generated by the device in a dim environment and during video shooting, thereby improving the night scene shooting and video shooting performance of the periscope camera module 2.

[0055] In some embodiments, Figure 4-Figure 7 As shown, the rotating support part 50 includes at least two rotating support members 51 spaced apart in a direction parallel to the second axis OA2, at least two rotating support members 51 are crimped between the rotating assembly 20 and the base 101, and at least two rotating support members 51 form a rotating axis C1, wherein the rotating axis C1 and the second axis OA2 are parallel to each other but not colinear. In other words, the rotating assembly 20 and the base 101 are respectively located on opposite sides of the rotating support member 51 in a direction parallel to the first axis OA1, and the rotating support member 51 is able to support the rotating assembly 20 so that the rotating assembly 20 and the base 101 are spaced apart in a direction parallel to the first axis OA1, which is conducive to avoiding interference between the rotating assembly 20 and the base 101 during the rotating movement around the rotating axis C1.

[0056] It should be understood that compared to the direct contact between the rotating component 20 and the base 101, in this embodiment, the rotating support portion 50 is crimped between the rotating component 20 and the base 101, so that the rotating support portion 50 can support the rotating component 20 in a direction parallel to the first axis OA1 to reduce the contact area between the rotating component 20, the rotating support portion 50 and the base 101, which is beneficial to reduce friction, so that the rotating component 20 can rotate more smoothly around the rotating axis C1, and also reduce the power consumption required for the rotating component 20 to rotate.

[0057] In some embodiments, Figure 4-Figure 7 As shown, the reflection module 1 further includes a rotating holder 40 and a pitch support portion 60, and the rotating assembly 20, the rotating holder 40, the rotating support portion 50 and the base 101 are stacked in a direction parallel to the first axis OA1. That is, the rotating support portion 50 is crimped between the rotating holder 40 and the base 101, so as to support the rotating holder 40 and the rotating assembly 20 to perform rotational motion around the rotation axis C1 relative to the base 101. The pitch support portion 60 is located between the rotating assembly 20 and the rotating holder 40, and the pitch support portion 60 provides a pitch axis C2, which passes through the rotating holder 40, and the pitch axis C2 is parallel to the third axis A3 and is not colinear with the third axis A3, so that the rotating assembly 20 can perform a pitch motion around the pitch axis C2 relative to the rotating holder 40, wherein the third axis A3 intersects the first axis OA1 and the second axis OA2.

[0058] It is worth mentioning that the rotational movement of the rotating component 20 around the rotation axis C1 combined with the pitching movement of the rotating component 20 around the pitch axis C2 is conducive to making the jitter compensation of the periscope camera module 2 more omnidirectional, thereby better compensating for image blur caused by device rotation or user hand shaking.

[0059] Specifically, the rotating assembly 20 and the rotating holder 40 synchronously rotate relative to the base 101 around the rotating axis C1, so that the reflecting member 11 rotates around the rotating axis C1, and then the imaging surface on the photosensitive chip rotates around the imaginary line extending along the rotating axis C1 to compensate for the image blur caused by the rotation of the device or the hand shaking of the user. Further, the rotating assembly 20 performs a pitch motion around the pitch axis C2 relative to the rotating holder 40, so that the reflecting member 11 rotates around the pitch axis C2, and then the imaging surface on the photosensitive chip rotates around the imaginary line extending along the pitch axis C2, so as to further improve the anti-shake effect of the camera module, which is conducive to reducing aberrations and improving image quality.

[0060] In some embodiments, Figure 5-Figure 7As shown, the reflection module 1 further includes a pitch driving unit 80, the pitch driving unit 80 is located at the bottom 21 of the rotating assembly 20, and the rotating driving unit 70 is located at the back 22 of the rotating assembly 20. The pitch driving unit 80 and the rotating driving unit 70 are arranged on different sides relative to the rotating assembly 20, which is conducive to avoiding interference between the magnetic field between the rotating driving unit 70 and the pitch driving unit 80, thereby improving the driving reliability of the reflection module 1. Specifically, the pitch driving unit 80 includes at least one pitch magnet 81 and at least one pitch coil 82, the pitch magnet 81 and the pitch coil 82 are arranged relative to each other along a direction parallel to the first axis OA1, and are suitable for driving the rotating assembly 20 to perform pitch motion relative to the rotating holder 40 around the pitch axis C2; the rotating driving unit 70 includes at least one rotating magnet 71 and at least one rotating coil 72, the rotating magnet 71 and the rotating coil 72 are arranged relative to each other along a direction parallel to the second axis OA2, and are suitable for driving the rotating assembly 20 to perform rotational motion relative to the base 101 around the rotation axis C1.

[0061] Furthermore, the reflection module 1 further includes a driving circuit, which is electrically connected to the rotating coil 72 and the pitch coil 82 and provides current, so that the rotating coil 72 and the rotating magnet 71 cooperate with each other to drive the rotating component 20 to rotate around the rotation axis C1, and the pitch coil 82 and the pitch magnet 81 cooperate with each other to drive the rotating component 20 to pitch around the pitch axis C2. It is worth mentioning that the driving circuit can be implemented as a conductive metal insert embedded in the base 101, or as a flexible circuit board attached to the base 101, and the present application does not make specific restrictions on this.

[0062] In some embodiments, Figure 5 As shown, the rotating magnet 71 is curved in a plane perpendicular to the second axis OA2, and the center of curvature of the rotating magnet 71 is close to the second axis OA2. It should be understood that, compared with the long strip magnet, the rotating magnet 71 in this embodiment is implemented as a curved magnet with a center of curvature close to the second axis OA2, so that the magnetic lines of force can be more effectively concentrated, and thus a strong magnetic field can be generated in a preset designated area, such as an area near the second axis OA2, or in an area near the rotation axis C1, so as to improve the stability and reliability of the force between the rotating magnet 71 and the rotating coil 72, so as to smoothly drive the rotating component 20 to rotate around the rotation axis C1. It is worth mentioning that the center of curvature of the rotating magnet 71 is close to the second axis OA2, including: the center of curvature of the rotating magnet 71 is located on the second axis OA2, and the center of curvature of the rotating magnet 71 is close to the second axis OA2.

[0063] In at least one embodiment, Figure 5As shown, the rotating magnet 71 includes a first rotating magnet 713 and a second rotating magnet 714 spaced apart in a direction parallel to the third axis A3, wherein the curved shapes of the first rotating magnet 713 and the second rotating magnet 714 are both arc-shaped, and the center of the arc is located on the second axis OA2 or close to the second axis OA2, which is beneficial to enhancing the magnetic field strength between the rotating magnet 71 and the rotating coil 72, and improving the force between the rotating magnet 71 and the rotating coil 72.

[0064] In at least one embodiment, the rotating magnet 71 adopts high-performance permanent magnet materials, including but not limited to: neodymium iron boron permanent magnet materials, ferrite permanent magnet materials, etc., so that the rotating magnet 71 has a higher magnetic energy product and coercive force, so that the rotating magnet 71 can have a smaller volume while ensuring that the rotating magnet 71 has a stronger magnetic force, which is beneficial to improving the driving force between the rotating magnet 71 and the rotating coil 72, and making the structure of the reflection module 1 more compact, which is beneficial to reducing the overall size of the reflection module 1.

[0065] In some embodiments, Figure 5-Figure 7 As shown, the rotating magnet 71 is disposed on the back 22 of the rotating component 20, and the rotating magnet 71 includes a first rotating magnet 713 and a second rotating magnet 714 spaced apart in a direction parallel to the third axis A3, and the first rotating magnet 713 and the second rotating magnet 714 both include a first magnetic region 711 and a second magnetic region 712 arranged in a curved direction, wherein the magnetic poles of the first magnetic region 711 and the second magnetic region 712 are arranged oppositely, and the magnetic poles of the first rotating magnet 713 and the second rotating magnet 714 are symmetrically arranged relative to the second axis OA2. For example, the first magnetic region 711 and the second magnetic region 712 of the first rotating magnet 713 are stacked in the direction of the first axis OA1, and the first magnetic region 711 and the second magnetic region 712 of the second rotating magnet 714 are stacked in the direction of the first axis OA1. Furthermore, the rotating coil 72 is disposed on a side surface of the base 101 facing the back 22 of the rotating component 20, and the rotating coil 72 includes a first rotating coil 721 and a second rotating coil 722. The first rotating coil 721 and the first rotating magnet 713 are disposed opposite to each other in a direction parallel to the second axis OA2, and the second rotating coil 722 and the second rotating magnet 714 are disposed opposite to each other in a direction parallel to the second axis OA2. Thus, through the cooperation between the first rotating coil 721 and the first rotating magnet 713, and the cooperation between the second rotating coil 722 and the second rotating magnet 714, the rotating component 20 and the rotating holder 40 can be driven to rotate around the rotating axis C1 relative to the base 101 more reliably and smoothly. It is worth mentioning that the rotating magnet 71 also includes a neutral zone located between the first magnetic zone 711 and the second magnetic zone 712.

[0066] It should be understood that, along the second axis OA2, when the rotating assembly 20 starts to rotate around the rotating axis C1 from the initial state, if the overlapping area between the first magnetic region 711 of the first rotating magnet 713 and the first rotating coil 721 decreases, and the overlapping area between the second magnetic region 712 of the first rotating magnet 713 and the first rotating coil 721 increases, then the overlapping area between the first magnetic region 711 of the second rotating magnet 714 and the second rotating coil 722 increases, and the overlapping area between the second magnetic region 712 of the second rotating magnet 714 and the second rotating coil 722 decreases. Conversely, if the overlapping area between the first magnetic region 711 of the first rotating magnet 713 and the first rotating coil 721 increases, and the overlapping area between the second magnetic region 712 of the first rotating magnet 713 and the first rotating coil 721 decreases, then the overlapping area between the first magnetic region 711 of the second rotating magnet 714 and the second rotating coil 722 decreases, and the overlapping area between the second magnetic region 712 of the second rotating magnet 714 and the second rotating coil 722 increases. That is, during the rotation of the rotating assembly 20 around the rotation axis C1, along the second axis OA2, the overlapping area between the first magnetic area 711 and the second magnetic area 712 of the rotating magnet 71 and the rotating coil 72 is variable, and further, the overlapping area between the first magnetic area 711 of the rotating magnet 71 and the rotating coil 72 is opposite to the overlapping area between the second magnetic area 712 of the rotating magnet 71 and the rotating coil 72, and further, the magnetic pole of the first rotating magnet 713 having a larger overlapping area with the first rotating coil 721 and the magnetic pole of the second rotating magnet 714 having a larger overlapping area with the second rotating coil 722 are opposite. The initial state is the state before the reflection module 1 is driven.

[0067] In some embodiments, the rotating magnet 71 is a bipolar magnet, which is conducive to reducing the manufacturing difficulty of the rotating magnet 71, thereby reducing the manufacturing cost of the rotating magnet 71. For example, the first magnetic region 711 of the rotating magnet 71 is implemented as an N pole, and the second magnetic region 712 is implemented as an S pole. For another example: the first magnetic region 711 of the rotating magnet 71 is implemented as an S pole, and the second magnetic region 712 is implemented as an N pole. This application does not make specific restrictions on this. Among them, the N pole and the S pole are overlapped along the direction of the first axis OA1.

[0068] In some other embodiments, the rotating magnet 71 is a multi-pole magnet, which is beneficial to improve the magnetic field strength of the rotating magnet 71, and is beneficial to improve the reliability and stability of the cooperation between the rotating magnet 71 and the rotating coil 72. For example, the side of the first magnetic region 711 close to the rotating coil 72 is implemented as an N pole, and the side of the first magnetic region 711 away from the rotating coil 72 is implemented as an S pole; the side of the second magnetic region 712 close to the rotating coil 72 is implemented as an S pole, and the side of the second magnetic region 712 away from the rotating coil 72 is implemented as an N pole. For another example, the side of the first magnetic region 711 close to the rotating coil 72 is implemented as an S pole, and the side of the first magnetic region 711 away from the rotating coil 72 is implemented as an N pole; the side of the second magnetic region 712 close to the rotating coil 72 is implemented as an N pole, and the side of the second magnetic region 712 away from the rotating coil 72 is implemented as an S pole. This application does not make specific restrictions on this. Among them, the N pole and the S pole are overlapped along the first axis OA1 direction and along the second axis OA2 direction.

[0069] In some embodiments, Figure 5-Figure 7 As shown, the rotating coil 72 is wound in a fan shape so as to be adapted to the above-mentioned curved rotating magnet 71, which is beneficial to increase the relative area between the rotating coil 72 and the rotating magnet 71, and further beneficial to enhance the magnetic field, increase the magnetic flux, and reduce the magnetic loss. The rotating coil 72 and the rotating magnet 71 can provide a greater driving force to the rotating component 20, which is beneficial to make the rotating component 20 rotate around the rotating axis C1 more reliably and stably.

[0070] In some embodiments, Figure 5-Figure 7As shown, the pitch magnet 81 is disposed at the bottom 21 of the rotating assembly 20, and the pitch magnet 81 includes a first pitch magnet 813 and a second pitch magnet 814 spaced apart in a direction parallel to the third axis A3, and the first pitch magnet 813 and the second pitch magnet 814 both include a third magnetic region 811 and a fourth magnetic region 812 arranged in a direction parallel to the second axis OA2, wherein the magnetic poles of the third magnetic region 811 and the fourth magnetic region 812 are arranged oppositely, and the magnetic poles of the first pitch magnet 813 and the second pitch magnet 814 are symmetrically arranged relative to the second axis OA2. For example, the third magnetic region 811 and the fourth magnetic region 812 of the first pitch magnet 813 are stacked in the direction of the second axis OA2, and the third magnetic region 811 and the fourth magnetic region 812 of the second pitch magnet 814 are stacked in the direction of the second axis OA2. Furthermore, the pitch coil 82 is disposed on a side surface of the base 101 facing the bottom 21 of the rotating assembly 20, and the pitch coil 82 includes a first pitch coil 821 and a second pitch coil 822. The first pitch coil 821 and the first pitch magnet 813 are disposed opposite to each other in a direction parallel to the first axis OA1, and the second pitch coil 822 and the second pitch magnet 814 are disposed opposite to each other in a direction parallel to the first axis OA1. Thus, through the cooperation of the first pitch coil 821 and the first pitch magnet 813, and the cooperation of the second pitch coil 822 and the second pitch magnet 814, the rotating assembly 20 can be driven to perform pitch motion around the pitch axis C2 relative to the base 101 more reliably and stably. It is worth mentioning that the pitch magnet 81 also includes a neutral area between the third magnetic area 811 and the fourth magnetic area 812.

[0071] It should be understood that, along the third axis A3, when the rotating component 20 performs pitch motion around the pitch axis C2, the distance between the third magnetic region 811 of the first pitch magnet 813 and the first pitch coil 821 along the direction parallel to the first axis OA1 decreases, and the distance between the fourth magnetic region 812 of the first pitch magnet 813 and the first pitch coil 821 along the direction parallel to the first axis OA1 increases; at the same time, the distance between the third magnetic region 811 of the second pitch magnet 814 and the second pitch coil 822 along the direction parallel to the first axis OA1 also decreases, and the distance between the fourth magnetic region 812 of the second pitch magnet 814 and the second pitch coil 822 along the direction parallel to the first axis OA1 also increases. On the contrary, the distance between the third magnetic region 811 of the first pitch magnet 813 and the first pitch coil 821 along the direction parallel to the first axis OA1 increases, and the distance between the fourth magnetic region 812 of the first pitch magnet 813 and the first pitch coil 821 along the direction parallel to the first axis OA1 decreases; at the same time, the distance between the third magnetic region 811 of the second pitch magnet 814 and the second pitch coil 822 along the direction parallel to the first axis OA1 also increases, and the distance between the fourth magnetic region 812 of the second pitch magnet 814 and the second pitch coil 822 along the direction parallel to the first axis OA1 also decreases. That is to say, during the pitch movement of the rotating component 20 around the pitch axis C2, along the direction of the third axis A3, the distance between the third magnetic region 811 and the fourth magnetic region 812 of the pitch magnet 81 and the pitch coil 82 can be changed. Furthermore, the distance between the third magnetic region 811 of the pitch magnet 81 and the pitch coil 82 and the distance between the fourth magnetic region 812 of the pitch magnet 81 and the pitch coil 82 change in the opposite direction.

[0072] In some embodiments, the pitch magnet 81 is a bipolar magnet, which is conducive to reducing the difficulty of manufacturing the pitch magnet 81, thereby reducing the manufacturing cost of the pitch magnet 81. For example, the third magnetic region 811 of the pitch magnet 81 is implemented as an N pole, and the fourth magnetic region 812 is implemented as an S pole. For another example: the third magnetic region 811 of the pitch magnet 81 is implemented as an S pole, and the fourth magnetic region 812 is implemented as an N pole. This application does not make specific restrictions on this. Among them, the N pole and the S pole are overlapped along the second axis OA2 direction.

[0073] In some other embodiments, the pitch magnet 81 is a multi-pole magnet, which is beneficial to improve the magnetic field strength of the pitch magnet 81, and is beneficial to improve the reliability and stability of the matching between the pitch magnet 81 and the pitch coil 82. For example, the side of the third magnetic region 811 close to the pitch coil 82 is implemented as an N pole, and the side of the third magnetic region 811 away from the pitch coil 82 is implemented as an S pole; the side of the fourth magnetic region 812 close to the pitch coil 82 is implemented as an S pole, and the side of the fourth magnetic region 812 away from the pitch coil 82 is implemented as an N pole. For another example, the side of the third magnetic region 811 close to the pitch coil 82 is implemented as an S pole, and the side of the third magnetic region 811 away from the pitch coil 82 is implemented as an N pole; the side of the fourth magnetic region 812 close to the pitch coil 82 is implemented as an N pole, and the side of the fourth magnetic region 812 away from the pitch coil 82 is implemented as an S pole. The present application does not make specific restrictions on this. Among them, the N pole and the S pole are overlapped along the first axis OA1 direction and along the second axis OA2 direction.

[0074] In some embodiments, Figure 5 As shown, the pitch magnet 81 is implemented as a bar magnet, which is conducive to simplifying the design of the pitch magnet 81, reducing the manufacturing difficulty, and thus reducing the production cost of the pitch magnet 81. In addition, the bar pitch magnet 81 can provide a relatively uniform magnetic field, which is conducive to improving the response speed and control accuracy of the reflection module 1.

[0075] It is worth mentioning that when the rotating assembly 20 only has a rotational motion around the rotation axis C1, the distance between the rotating magnet 71 and the rotating coil 72 along the direction parallel to the second axis OA2 remains unchanged, which is conducive to improving the stability of the force between the rotating magnet 71 and the rotating coil 72. When the rotating assembly 20 only has a pitching motion around the pitch axis C2, the distance between the pitch magnet 81 and the pitch coil 82 is variable, as described above.

[0076] In some embodiments, Figure 6 and Figure 7 As shown, at least a portion of the projection area of ​​the rotating holder 40 along the first axis OA1 overlaps with the projection area of ​​the rotating component 20 along the first axis OA1, and at least a portion of the projection area of ​​the rotating holder 40 along the second axis OA2 overlaps with the projection area of ​​the rotating component 20 along the second axis OA2, thereby making the structure of the reflection module 1 more compact, which is beneficial to reducing the overall size of the reflection module 1.

[0077] In some embodiments, Figure 6-Figure 8As shown, a hollow area 24 is provided on the surface of the rotating component 20 which is away from the reflective member 11, and at least a portion of the rotating retaining member 40 is accommodated in the hollow area 24, so that at least a portion of the rotating retaining member 40 overlaps with the rotating component 20 along the first axis OA1 direction, and at least a portion of the rotating retaining member 40 overlaps with the rotating component 20 along the second axis OA2 direction.

[0078] As mentioned above, the pitch support portion 60 is located between the rotating component 20 and the rotating retaining member 40. The pitch support portion 60 provides a pitch axis C2, which passes through the rotating retaining member 40 and is parallel to the third axis A3. It should be understood that at least a portion of the pitch support portion 60 is also accommodated in the hollow area 24, so that at least a portion of the pitch support portion 60 overlaps with the rotating component 20 along the first axis OA1 direction, and at least a portion of the pitch support portion 60 is also overlapped with the rotating component 20 along the second axis OA2 direction, so that the structure of the reflection module 1 is more compact, which is conducive to further reducing the overall size of the reflection module 1.

[0079] Further, at least a portion of the rotating support portion 50 crimped between the rotating retainer 40 and the base 101 may also be accommodated in the hollow area 24, so that at least a portion of the rotating support portion 50 overlaps with the rotating assembly 20 along the first axis OA1, and at least a portion of the rotating support portion 50 overlaps with the rotating assembly 20 along the second axis OA2, so as to improve the space utilization of the reflective module 1. Furthermore, at least a portion of the base 101 may also protrude toward the bottom 21 of the rotating assembly 20 to extend into the hollow area 24. This application does not impose specific restrictions on this.

[0080] In at least one embodiment, the two pitch magnets 81 may also be located in the hollow area 24 of the rotating assembly 20, and the rotating support 50 and the rotating retaining member 40 are located between the two pitch magnets 81. That is, at least a portion of the rotating support 50 and at least a portion of the rotating retaining member 40 overlap with the pitch magnet 81 along the third axis A3 direction, so that the structure of the reflection module 1 is more compact, the space of the reflection module 1 is reasonably utilized, and the size of the reflection module 1 is reduced.

[0081] It is worth mentioning that the rotating support part 50 and the rotating retaining member 40 are located between the two pitch magnets 81, which is also beneficial for arranging the two pairs of pitch magnets 81 and the pitch coils 82 at intervals, thereby helping to reduce the mutual interference between the magnetic fields of the two pitch magnets 81, and helping to improve the accuracy of controlling the pitch movement of the rotating assembly 20 around the pitch axis C2.

[0082] In some embodiments, Fig.11 and Fig.12As shown, the rotation support portion 50 includes at least two support bosses 511, and the at least two support bosses 511 protrude from one of the rotation holder 40 and the base 101 in a direction parallel to the first axis OA1, and the at least two support bosses 511 are pressed between the rotation holder 40 and the base 101, and the imaginary line extending from the rotation axis C1 passes through the at least two support bosses 511. In other words, one of the rotation holder 40 and the base 101 is provided with a support boss 511, and the support boss 511 is able to abut against the other of the rotation holder 40 and the base 101 to form a fulcrum, and the imaginary line extending from the rotation axis C1 passes through the fulcrum, so that the rotation holder 40 can support the rotation assembly 20 to synchronously rotate relative to the base 101 around the fulcrum.

[0083] Furthermore, if Fig.11 and Fig.12 As shown, the other of the rotating retainer 40 and the base 101 is provided with a supporting groove 52, and the supporting groove 52 is used to accommodate the supporting boss 511, so as to limit the supporting boss 511, so that the rotating retainer 40 can rotate around the rotating axis C1 relative to the base 101 more stably. It should be understood that by controlling the processing accuracy of the supporting boss 511 and the supporting groove 52, it is beneficial to improve the assembly accuracy of the supporting boss 511 and the supporting groove 52 after the reflective module 1 is assembled, thereby reducing the risk of the rotating retainer 40 tilting relative to the base 101, and reducing the friction between the supporting boss 511 and the supporting groove 52, thereby improving the controllability and reliability of the rotating movement of the rotating assembly 20, and extending the service life of the base 101 and the rotating retainer 40. Further, it is also possible to reduce the assembly tolerance between the rotating retainer 40, the rotating support part 50 and the base 101.

[0084] In at least one embodiment, the rotating support portion 50 includes two supporting bosses 511 spaced apart in a direction parallel to the second axis OA2. It should be understood that, compared with providing three or more supporting bosses 511, providing two supporting bosses 511 in this embodiment helps to reduce the difficulty of processing and assembly while ensuring that the rotating support portion 50 reliably supports the rotating holder 40, thereby reducing the manufacturing cost of the reflecting module 1 and improving the assembly accuracy of the reflecting module 1.

[0085] In at least one embodiment, Fig.12As shown, one of the rotating retainer 40 and the base 101 is provided with two support grooves 52 spaced apart in a direction parallel to the second axis OA2, wherein one of the support grooves 52 is implemented as a V-shaped groove, and then the V-shaped support groove 52 cooperates with one of the support bosses 511 to play the role of positioning the rotating retainer 40. Further, the other support groove 52 is implemented as a U-shaped groove to cooperate with the other support boss 511. It should be understood that the center line of the U-shaped support groove 52 is collinear or close to collinear with the center line of the V-shaped support groove 52, so that the imaginary line where the rotation axis C1 passing through the two support bosses 511 is located is parallel to the second axis OA2.

[0086] That is to say, the V-shaped support groove 52 is conducive to positioning, and the U-shaped support groove 52 is easy to adjust, which is conducive to reducing the difficulty of assembling the rotating holder 40 and the base 101, thereby improving the assembly efficiency, and is conducive to making the two support bosses 511 located on a straight line parallel to the second axis OA2 to improve the assembly accuracy. It is worth mentioning that in this embodiment, one of the support grooves 52 is implemented as a V-shaped groove and the other support groove 52 is implemented as a U-shaped groove, which is also conducive to reducing the position accuracy requirements for the two support bosses 511 and the position accuracy requirements for the two support grooves 52, thereby reducing the difficulty of processing the rotating holder 40 and the base 101 and reducing the production cost.

[0087] In at least one other embodiment, one of the rotating retaining member 40 and the base 101 is provided with two support grooves 52 spaced apart in a direction parallel to the second axis OA2, and both support grooves 52 are implemented as U-shaped grooves, which is beneficial to further reduce the processing difficulty of the rotating retaining member 40 and the base 101 and reduce the production cost.

[0088] It should be understood that the support groove 52 can also be implemented as a quadrangular pyramid groove, a cylindrical groove, a hemispherical groove, a rectangular groove, etc., and the present application does not make specific restrictions on this. The support boss 511 can be implemented as a hemispherical shape, a semi-cylindrical shape, etc., and the present application does not make specific restrictions on this.

[0089] In other embodiments, Figure 5 , Fig.13 and Fig.14As shown, the rotating support portion 50 includes at least two support balls 512 spaced apart in a direction parallel to the second axis OA2, the rotating retaining member 40 is provided with at least two upper ball grooves 41, and the base 101 is provided with at least two lower ball grooves 1012. The upper ball grooves 41 and the lower ball grooves 1012 are relatively arranged in a direction parallel to the first axis OA1 to form a movement space between the upper ball grooves 41 and the lower ball grooves 1012. At least two support balls 512 are movably clamped in the movement space between the upper ball grooves 41 and the lower ball grooves 1012. An imaginary line extending from the rotating axis C1 passes through at least two support balls 512, so that at least two support balls 512 are able to support the rotating retaining member 40 and the rotating component 20 to synchronously rotate around the rotating axis C1 relative to the base 101.

[0090] It should be understood that by controlling the machining accuracy of the upper ball groove 41 and the lower ball groove 1012, the imaginary line where the rotation axis C1 passing through the two supporting balls 512 is located is parallel or nearly parallel to the second axis OA2, which is conducive to improving the matching accuracy between the rotating holder 40, the supporting balls 512 and the base 101 after the reflection module 1 is assembled, thereby reducing the risk of the rotating holder 40 tilting relative to the base 101, and is conducive to improving the controllability and reliability of the rotation movement of the rotating assembly 20. It is worth mentioning that the balls can be standard parts, which is conducive to further reducing the manufacturing difficulty of the reflection module 1 and further reducing the manufacturing cost of the reflection module 1.

[0091] In at least one embodiment, Fig.13 and Fig.14 As shown, the bottom surface of the rotating retainer 40 is provided with two ball upper grooves 41 spaced apart in a direction parallel to the second axis OA2, and the top surface of the base 101 is provided with two ball lower grooves 1012 spaced apart in a direction parallel to the second axis OA2, wherein a pair of ball upper grooves 41 and ball lower grooves 1012 oppositely arranged in a direction parallel to the first axis OA1 are both implemented as V-shaped grooves; one of the other pair of ball upper grooves 41 and ball lower grooves 1012 oppositely arranged in a direction parallel to the first axis OA1 is implemented as a V-shaped groove, and the other is implemented as a U-shaped groove. It should be understood that clamping the support ball 512 by two oppositely arranged V-shaped grooves is conducive to positioning, and clamping the support ball 512 by one oppositely arranged V-shaped groove and one U-shaped groove is convenient for adjustment, thereby reducing the difficulty of assembling the rotating retainer 40, the support ball 512 and the base 101, thereby improving the assembly efficiency, and making the two support balls 512 located on a straight line parallel to the second axis OA2, thereby improving the assembly accuracy.

[0092] It is worth mentioning that in the present embodiment, one of the supporting balls 512 is crimped between a V-shaped groove and a U-shaped groove, which is beneficial to reduce the position accuracy requirements for the two ball upper grooves 41 and the position accuracy requirements for the two ball lower grooves 1012, thereby reducing the processing difficulty of the rotating retaining member 40 and the base 101 and reducing the production cost.

[0093] It is worth mentioning that the upper ball groove 41 and the lower ball groove 1012 can also be implemented as quadrangular pyramid grooves, cylindrical grooves, hemispherical grooves, rectangular grooves, etc., respectively, and the present application does not impose specific restrictions on this.

[0094] In some embodiments, Figure 5 and Figure 6 As shown, the pitch support part 60 includes a pivot member 61, which extends in a direction parallel to the third axis A3. The pivot member 61 enables the rotating assembly 20 to be hinged to the rotating holder 40, so that the rotating assembly 20 can perform a pitch motion relative to the rotating holder 40 around the pitch axis C2. In other words, the extending direction of the pivot member 61 is parallel to the third axis A3 but not colinear, and the imaginary line where the pitch axis C2 is located passes through the pivot member 61. It should be understood that the pivot member 61 has a high linearity, which is conducive to reducing the risk of the rotating assembly 20 tilting relative to the rotating holder 40 and the base 101, and in the process of the rotating assembly 20 performing a pitch motion around the pitch axis C2, it is conducive to reducing the motion component of the rotating assembly 20 deviating from the rotation around the imaginary line where the pitch axis C2 is located, thereby improving the accuracy of the pitch motion of the rotating assembly 20.

[0095] Specifically, Figure 5 and Figure 8 As shown, the middle section of the pivot member 61 is inserted into the rotating retaining member 40, and the two ends of the pivot member 61 extend toward the rotating assembly 20 in a direction parallel to the third axis A3. The side wall 23 of the rotating assembly 20 facing the rotating retaining member 40 is provided with a slot 231, and the slot 231 is capable of accommodating the end of the pivot member 61, so that the rotating assembly 20 is rotatably connected to the rotating retaining member 40. It should be understood that the two slots 231 on the side wall 23 of the rotating assembly 20 are symmetrically arranged relative to the second axis OA2, so that the imaginary line where the pivot member 61 is projected along the first axis OA1 and the imaginary line where the connecting line of at least two rotating support members 51 is projected along the first axis OA1 are perpendicular to each other.

[0096] It is worth mentioning that the pivot member 61 is connected to the rotating retaining member 40 and the rotating assembly 20 by plugging, which is conducive to the pivot member 61 being reliably pressed between the rotating assembly 20 and the rotating retaining member 40, thereby improving the structural reliability and stability of the reflective module 1. In addition, the pivot member 61 is connected to the rotating assembly 20 and the rotating retaining member 40 by a slot 231, which is conducive to reducing the contact area between the pivot member 61 and the rotating assembly 20, and reducing the contact area between the pivot member 61 and the rotating retaining member 40, thereby reducing the friction between the pivot member 61 and the rotating assembly 20, and reducing the friction between the pivot member 61 and the rotating retaining member 40, which is conducive to reducing the driving force required to drive the rotating assembly 20 to perform pitch motion around the pitch axis C2, thereby reducing the power consumption of the reflective module 1.

[0097] In at least one embodiment, Figure 5 , Fig.11 and Fig.13 As shown, a avoidance groove 42 is provided on the top of the rotating retaining member 40, which is conducive to reducing the matching length of the pivot member 61 and the rotating retaining member 40, and is conducive to further reducing the contact area between the pivot member 61 and the rotating retaining member 40, thereby reducing the friction between the pivot member 61 and the rotating retaining member 40. In addition, by reducing the matching length of the pivot member 61 and the rotating retaining member 40, it is conducive to reducing the assembly difficulty of the pivot member 61 and the rotating retaining member 40, improving the assembly efficiency of the reflective module 1, and is conducive to reducing the processing accuracy required for the rotating retaining member 40 and the pivot member 61, thereby reducing the manufacturing cost of the reflective module 1.

[0098] In at least one embodiment, the pivot member 61 is rotatably connected to the rotating retaining member 40, and the pivot member 61 is fixedly connected to the rotating assembly 20, which is beneficial to improve the controllability of the pitch motion of the rotating assembly 20. In at least one other embodiment, the pivot member 61 is fixedly connected to the rotating retaining member 40, and the pivot member 61 is rotatably connected to the rotating assembly 20, which is beneficial to avoid the pivot member 61 and the second axis OA2 being not parallel due to the installation gap between the pivot member 61 and the rotating retaining member 40. In at least one other embodiment, the pivot member 61 is rotatably connected to the rotating retaining member 40, and the pivot member 61 is rotatably connected to the rotating assembly 20, which is beneficial to improve the flexibility of the rotating assembly 20 rotating around the pitch axis C2. The present application does not impose specific restrictions on this.

[0099] In some embodiments, Fig.15 As shown, the projection of the pivot member 61 along the direction parallel to the first axis OA1 falls between the projections of at least two rotation support members 51 along the direction parallel to the first axis OA1, so as to prevent the rotation retaining member 40 from being tilted due to the biased support force.

[0100] It should be understood that at least two rotating supports 51 are arranged at intervals along a direction parallel to the second axis OA2, and at least two rotating supports 51 are respectively arranged close to the two ends of the rotating retaining member 40 along the direction parallel to the second axis OA2, which is beneficial for making the projection of the center of gravity of the rotating retaining member 40 along the direction parallel to the first axis OA1 fall between the projections of the at least two rotating supports 51 along the direction parallel to the first axis OA1, so that the at least two rotating supports 51 can support the rotating retaining member 40 more stably and reliably.

[0101] Looking from the third axis A3, Fig.15 As shown, if the projection of the pivot member 61 along the direction parallel to the first axis OA1 falls outside the projections of at least two rotating support members 51 along the direction parallel to the first axis OA1, as shown by the dotted line, that is, the point of action of the pivot member 61 on the rotating retaining member 40 along the direction parallel to the first axis OA1 is located outside the points of action of at least two rotating support members 51 on the rotating retaining member 40 along the direction parallel to the first axis OA1, that is, the rotating retaining member 40 is affected by the offset pivot member 61, then the distance between the point of action of the pivot member 61 on the rotating retaining member 40 and the center of gravity of the rotating retaining member 40 is far, that is, the lever arm is longer, which results in a larger torque of the pivot member 61 on the rotating retaining member 40, which may increase the risk of tilting, rotating or even overturning of the rotating retaining member 40.

[0102] In the present embodiment, as shown by the solid line, the point of action of the pivot member 61 on the rotating retaining member 40 along the direction parallel to the first axis OA1 is located between the points of action of at least two rotating support members 51 on the rotating retaining member 40 along the direction parallel to the first axis OA1. The distance between the point of action of the pivot member 61 on the rotating retaining member 40 and the center of gravity of the rotating retaining member 40 is closer, that is, the lever arm is shorter, which results in a smaller torque of the pivot member 61 on the rotating retaining member 40, which is beneficial to reducing the risk of tilting, rotating or even overturning of the rotating retaining member 40, and is beneficial to improving the structural reliability and stability of the reflection module 1.

[0103] In some embodiments, Fig.15 As shown, among the at least two rotating support members 51, one rotating support member 51 is arranged close to the reflective component 11 along a direction parallel to the second axis OA2, and the other rotating support member 51 is arranged away from the reflective component 11 along a direction parallel to the second axis OA2, the distance between the projection of the pivot member 61 along the first axis OA1 direction and the projection of the rotating support member 51 away from the reflective component 11 along the first axis OA1 direction is recorded as L1, and the distance between the projection of the pivot member 61 along the first axis OA1 direction and the projection of the rotating support member 51 close to the reflective component 11 along the first axis OA1 direction is recorded as L2, satisfying: L1≤L2.

[0104] It should be understood that since the mounting surface 311 of the rotating assembly 20 for supporting the reflecting member 11 is tilted, the distance between the rotating assembly 20 and the base 101 along the direction parallel to the first axis OA1 gradually increases from the side close to the reflecting member 11 along the direction parallel to the second axis OA2 to the side away from the reflecting member 11. That is to say, on the side away from the reflecting member 11 along the direction parallel to the second axis OA2, there is a larger space along the direction parallel to the first axis OA1 between the rotating assembly 20 and the base 101, so as to accommodate the rotating retaining member 40 and the pivot member 61, which is beneficial to make the structure of the reflecting module 1 more compact, reduce the size of the reflecting module 1, reduce the risk of interference between the rotating assembly 20 and the rotating retaining member 40 during the pitch movement around the pitch axis C2, and improve the movement reliability of the reflecting module 1.

[0105] In some embodiments, Figure 6 and Figure 7 As shown, the imaginary line where the projection of the pivot member 61 in the direction parallel to the first axis OA1 is located is perpendicular to the imaginary line where the projection of the line connecting at least two rotating support members 51 in the direction parallel to the first axis OA1 is located. It should be understood that the first axis OA1, the second axis OA2 and the third axis A3 are perpendicular to each other, and the imaginary line extending along the pivot member 61 is parallel to the third axis A3 but not colinear, so that the pitch axis C2 passing through the pivot member 61 is perpendicular to the first axis OA1 and the second axis OA2 respectively, which is conducive to preventing the rotating assembly 20 from tilting relative to the first axis OA1 and the second axis OA2, thereby facilitating the improvement of the pitch motion accuracy of the rotating assembly 20; the imaginary line passing through at least two rotating support members 51 is parallel to the second axis OA2 but not colinear, so that the rotating axis C1 passing through the two rotating support members 51 is perpendicular to the first axis OA1 and the third axis A3 respectively, which is conducive to preventing the rotating assembly 20 and the rotating retaining member 40 from tilting relative to the first axis OA1 and the third axis A3, thereby facilitating the improvement of the rotation motion accuracy of the rotating assembly 20.

[0106] It should be understood that the imaginary line where the projection of the pivot member 61 along the direction parallel to the first axis OA1 lies is perpendicular to the imaginary line where the projection of the line connecting at least two rotating support members 51 along the direction parallel to the first axis OA1 lies, which is beneficial for decomposing the movement of the rotating component 20 into rotations around two mutually perpendicular directions, thereby reducing the component of the movement of the rotating component 20 in other directions, thereby improving the control accuracy of the rotational movement and pitch motion of the rotating component 20, and reducing the risk of tilting of the rotating carrier and the rotating support part 50.

[0107] In some embodiments, the reflection module 1 also includes a magnetic magnet and a yoke. The magnetic magnet is arranged at one of the rotating component 20 and the base 101, and the yoke is arranged at the other of the rotating component 20 and the base 101. A magnetic attraction force is generated between the magnetic magnet and the yoke in a direction parallel to the first axis OA1. Under the action of the magnetic attraction force, the pitch support part 60 can be crimped between the rotating component 20 and the rotating retaining member 40, and the rotating support part 50 can be crimped between the rotating retaining member 40 and the base 101.

[0108] That is to say, through the interaction between the magnetic magnet and the magnetic yoke, a magnetic attraction force is provided to the rotating component 20 toward the base 101 along the first axis OA1 parallel to the first axis OA1. Under the action of the magnetic attraction force, the pitch support part 60, the rotating retaining member 40 and the rotating support member 51 are stacked and crimped between the rotating component 20 and the base 101.

[0109] It should be understood that, as mentioned above, the rotating support member 51 is reliably clamped between the rotating retaining member 40 and the base 101 under the action of magnetic attraction, thereby helping to improve the reliability of the attachment between the rotating assembly 20, the rotating retaining member 40 and the base 101 when the periscope camera module 2 is subjected to external forces such as falling or impact, thereby reducing the risk of separation of the rotating assembly 20, the rotating retaining member 40 and the base 101.

[0110] In at least one embodiment, the yoke is embedded in the base 101, and the pitch magnet 81 and the magnetic attraction magnet are implemented as a common magnet, that is, the pitch magnet 81 can cooperate with the pitch coil 82 to drive the rotating assembly 20 to pitch around the pitch axis C2, and the pitch magnet 81 can cooperate with the yoke to provide magnetic attraction, so that the pitch support part 60, the rotating retainer 40 and the rotating support part 51 can be stacked and crimped between the rotating assembly 20 and the base 101. It should be understood that by implementing the pitch magnet 81 and the magnetic attraction magnet as a common magnet, the number of parts of the reflection module 1 can be reduced, which is conducive to making the structure of the reflection module 1 more compact, and reducing the installation steps and manufacturing costs.

[0111] In at least one embodiment, the yoke is embedded in the base 101, and the magnetic magnet is independently disposed on the bottom 21 of the rotating assembly 20 from the pitch magnet 81, and the magnetic magnet cooperates with the yoke to provide magnetic attraction, so that the pitch support part 60, the rotation retainer 40 and the rotation support part 51 are laminated and crimped between the rotating assembly 20 and the base 101. It should be understood that the magnetic magnet is independently disposed from the pitch magnet 81, which is conducive to more flexible adjustment of the setting position of the magnetic magnet, thereby improving the reliability of the cooperation between the magnetic magnet and the yoke.

[0112] In some embodiments, Figure 5-Figure 7 and Fig.10As shown, the reflection module 1 also includes a sensing component 90, and the sensing component 90 includes at least one rotation sensing element 91 and at least one pitch sensing element 92 arranged on the base 101. The rotation sensing element 91 and the rotating magnet 71 are relatively arranged in a direction parallel to the second axis OA2, so that the rotation sensing element 91 obtains the rotational magnetic field information of the rotating magnet 71 to sense the travel of the rotation component 20 performing rotational movement around the rotation axis C1, and the pitch sensing element 92 and the pitch magnet 81 are relatively arranged in a direction parallel to the first axis OA1, so that the pitch sensing element 92 obtains the pitch magnetic field information of the pitch magnet 81 to sense the travel of the pitch movement of the rotating component 20 around the pitch axis C2.

[0113] In some embodiments, the total number of the rotation sensing elements 91 and the pitch sensing elements 92 is at least three.

[0114] In at least one embodiment, the number of the rotation sensing elements 91 is two, and the two rotation sensing elements 91 are arranged opposite to the two rotating magnets 71 in a direction parallel to the second axis OA2. By calculating the rotating magnetic field information obtained by the two rotation sensing elements 91, it is helpful to eliminate the interference of the pitch motion information in the rotation motion, thereby improving the control accuracy of the rotation sensing element 91. Further, the number of the pitch sensing element 92 is one, and it is helpful to improve the control accuracy of the pitch sensing element 92 by increasing the magnetic field coverage area of ​​the pitch magnet 81, or by using an element with higher sensing accuracy as the pitch sensing element 92 to improve the control accuracy.

[0115] In at least one embodiment, the number of pitch sensing elements 92 is two, and the two pitch sensing elements 92 are arranged opposite to the two pitch magnets 81 in a direction parallel to the first axis OA1. By calculating the pitch magnetic field information obtained by the two pitch sensing elements 92, it is helpful to eliminate the interference of the rotation motion information in the pitch motion, thereby improving the control accuracy of the pitch sensing element 92. Further, the number of the rotation sensing element 91 is one, and it is helpful to improve the control accuracy of the rotation sensing element 91 by increasing the magnetic field coverage area of ​​the rotating magnet 71, or by using an element with higher sensing accuracy as the rotation sensing element 91 to improve the control accuracy.

[0116] It should be understood that when the total number of the rotation sensing elements 91 and the pitch sensing elements 92 is three, it is possible to improve the sensing accuracy of the sensing component 90 of the reflection module 1, thereby facilitating the miniaturization of the reflection module 1 and reducing the manufacturing cost of the reflection module 1.

[0117] It is worth mentioning that the rotation sensing element 91 and the pitch sensing element 92 may use the same element or different elements, such as a Hall sensor, a driver IC, a TMR sensor, or a rotating gyroscope.

[0118] In some embodiments, Figure 6 and Figure 7 As shown, the magnetic poles of the rotating magnet 71 are distributed along the bending direction of the rotating magnet 71. Under the condition that the rotating magnet 71 rotates around the rotating axis C1 relative to the rotating sensing element 91, along the second axis OA2 direction, the overlapping area between the magnetic poles of the rotating magnet 71 and the rotating sensing element 91 changes with the rotation angle of the rotating magnet 71. Specifically, as described above, the rotating magnet 71 includes a first magnetic region 711 and a second magnetic region 712 arranged along a bending direction, and the magnetic poles of the first magnetic region 711 and the second magnetic region 712 are arranged oppositely. Further, during the process of the rotating component 20 rotating around the rotating axis C1, the rotating magnet 71 is able to move relative to the rotating sensing element 91, so that the overlapping area of ​​the first magnetic region 711 and the rotating sensing element 91 along the direction parallel to the second axis OA2 is increased, and the overlapping area of ​​the second magnetic region 712 and the rotating sensing element 91 along the direction parallel to the second axis OA2 is reduced; or the overlapping area of ​​the first magnetic region 711 and the rotating sensing element 91 along the direction parallel to the second axis OA2 is reduced, and the overlapping area of ​​the second magnetic region 712 and the rotating sensing element 91 along the direction parallel to the second axis OA2 is increased, so that the rotating sensing element 91 is able to obtain the rotating magnetic field information of the rotating magnet 71 to sense the stroke of the rotating component 20 rotating around the rotating axis C1.

[0119] It should be understood that if the rotating assembly 20 simultaneously has a rotational motion around the rotation axis C1 and a pitching motion around the pitch axis C2, it will affect the sensing accuracy of the rotational motion of the rotating assembly 20 or the pitching motion of the rotating assembly 20. Therefore, in order to improve the sensing accuracy of the rotation sensing element 91 for the stroke of the rotational motion of the rotating assembly 20 around the rotation axis C1, it is necessary to reduce the influence of the pitching motion of the rotating assembly 20 around the pitch axis C2 on the rotation sensing element 91; similarly, in order to improve the sensing accuracy of the pitching motion of the rotating assembly 20 around the pitch axis C2, it is necessary to reduce the influence of the rotational motion of the rotating assembly 20 during rotation on the pitching sensing element 92.

[0120] In some embodiments, as described above, the rotating magnet 71 includes a first rotating magnet 713 and a second rotating magnet 714 spaced apart in a direction parallel to the third axis A3. Further, as described above, the number of rotating sensing elements 91 is two, and the rotating sensing element 91 includes a first rotating sensing element 911 and a second rotating sensing element 912. Moreover, the first rotating sensing element 911 and the first rotating magnet 713 are relatively arranged in a direction parallel to the second axis OA2, and the second rotating sensing element 912 and the second rotating magnet 714 are relatively arranged in a direction parallel to the second axis OA2. The first rotating sensing element 911 obtains the first rotating magnetic field information T1 of the first rotating magnet 713, and the second rotating magnetic field information T2 of the second rotating magnet 714 is obtained, so that the stroke of the rotating component 20 rotating around the rotation axis C1 can be calculated by the first rotating magnetic field information T1 and the second rotating magnetic field information T2.

[0121] It should be understood that when there is a pitch motion around the pitch axis C2 during the rotational motion of the rotating component 20 around the rotation axis C1, there is a certain inclination angle between the first rotating sensing element 911 and the first rotating magnet 713, and there is a certain inclination angle between the second rotating sensing element 912 and the second rotating magnet 714. That is, the center line of the first rotating sensing element 911 is not parallel to the center line of the two magnetic poles of the first rotating magnet 713, and the center line of the second rotating sensing element 912 is not parallel to the center line of the two magnetic poles of the second rotating magnet 714, resulting in that the sensing results of the first rotating sensing element 911 and the second rotating sensing element 912 are easily affected by the pitch motion of the rotating component 20 around the pitch axis C2.

[0122] In the present application, by setting the first rotation sensing element 911 and the second rotation sensing element 912 on the side surface of the base 101 facing the back 22 of the rotating component 20, and then by the cooperation of the first rotation sensing element 911 and the first rotating magnet 713, and the cooperation of the second rotation sensing element 912 and the second rotating magnet 714, the influence caused by the pitch movement around the pitch axis C2 during the rotation movement of the sensing rotating component 20 around the rotation axis C1 can be reduced.

[0123] Specifically, the first rotating sensing element 911 can obtain the first rotating magnetic field information T1 of the first rotating magnet 713, and the second rotating sensing element 912 can obtain the second rotating magnetic field information T2 of the second rotating magnet 714, so as to calculate the center value T of the rotating component 20 rotating around the rotating axis C1. m , T m = (T1+T2) / 2; further, the stroke information about the rotation of the rotating component 20 around the rotation axis C1 obtained by the first rotation sensing element 911 is T1-Tm The stroke information about the rotation movement of the rotating component 20 around the rotation axis C1 obtained by the second rotation sensing element 912 is T2-T m Furthermore, the stroke information of the rotating assembly 20 rotating around the rotation axis C1 is (T1-T m )+(T2-T m ), that is, the sum of the stroke information of the rotation component 20 performing rotational motion around the rotation axis C1 obtained by the first rotation sensing element 911 and the second rotation sensing element 912.

[0124] It should be understood that when the rotating component 20 simultaneously has a rotational motion around the rotation axis C1 and a pitching motion around the pitch axis C2, the first rotating magnetic field information T1 and the second rotating magnetic field information T2 will include the stroke information of the pitching motion around the pitch axis C2, and the stroke information of the pitching motion included in the first rotating magnetic field information T1 is opposite to the stroke information of the pitching motion included in the second rotating magnetic field information T2, and then the stroke information of the pitching motion is offset by calculating (T1+T2) / 2, so that T m There is no longer any interference from the travel information of the pitch motion, which is beneficial to improving the accuracy of the sensing results of the first rotation sensing element 911 and the second rotation sensing element 912, and further beneficial to achieving more accurate closed-loop control of the reflection module.

[0125] In some embodiments, as described above, the first rotating magnet 713 and the second rotating magnet 714 are symmetrically arranged relative to the second axis OA2, and the magnetic poles of the first rotating magnet 713 and the second rotating magnet 714 are both distributed along the bending direction, and have an N-pole region and an S-pole region. In addition, the N-pole region and the S-pole region of the first rotating magnet 713 and the second rotating magnet 714 are symmetrically distributed relative to the second axis OA2. The first rotating sensing element 911 is opposite to at least one of the N-pole region and the S-pole region of the first rotating magnet 713 in a direction parallel to the second axis OA2 to sense the first rotating magnetic field information T1; the second rotating sensing element 912 is opposite to at least one of the N-pole region and the S-pole region of the second rotating magnet 714 in a direction parallel to the second axis OA2 to sense the second rotating magnetic field information T2. It should be understood that during the rotation of the rotating assembly 20, the first rotating sensing element 911 and the second rotating sensing element 912 are respectively opposite to different magnetic poles in a direction parallel to the second axis OA2, that is, under the condition that the first rotating sensing element 911 is opposite to one of the N-pole region and the S-pole region of the first rotating magnet 713, the second rotating sensing element 912 is opposite to the other of the N-pole region and the S-pole region of the second rotating magnet 714. Furthermore, when the rotating assembly 20 simultaneously has a rotational motion around the rotation axis C1 and a pitching motion around the pitch axis C2, the first rotating sensing element 911 moves relative to the first rotating magnet 713, and the second rotating sensing element 912 moves relative to the second rotating magnet 714 in different magnetic pole directions, so that the stroke information of the pitching motion contained in the first rotating magnetic field information T1 is opposite to the stroke information of the pitching motion contained in the second rotating magnetic field information T2.

[0126] It is worth mentioning that, under the condition that there is no interference of pitch motion in the rotational motion of the rotating component 20 around the rotation axis C1, the center line of the first rotating sensing element 911 along the direction parallel to the first axis OA1 is parallel to the center line of the two magnetic poles of the first rotating magnet 713, and the center line of the second rotating sensing element 912 along the direction parallel to the first axis OA1 is parallel to the center line of the two magnetic poles of the second rotating magnet 714, which is beneficial to improve the sensing accuracy of the first rotating sensing element 911 and the second rotating sensing element 912.

[0127] In other embodiments, the first rotating magnet 713 and the second rotating magnet 714 are both multi-pole magnets to provide a more uniform and stable magnetic field distribution. Specifically, the first rotating magnet 713 and the second rotating magnet 714 both include an N-pole region and an S-pole region along the first axis OA1 and along the second axis OA2, and a neutral region between the N-pole region and the S-pole region. Under the condition that there is no interference of pitch motion in the rotational motion of the rotating component 20 around the rotation axis C1, the neutral region of the first rotating magnet 713 is parallel to the center line of the first rotating sensing element 911 along the direction parallel to the first axis OA1, and the neutral region of the second rotating magnet 714 is parallel to the center line of the second rotating sensing element 912 along the direction parallel to the first axis OA1, which is conducive to further improving the sensing accuracy of the first rotating sensing element 911 and the second rotating sensing element 912.

[0128] In some embodiments, Figure 6 and Figure 7 As shown, as described above, the pitch magnet 81 includes a first pitch magnet 813 and a second pitch magnet 814 spaced apart in a direction parallel to the third axis A3. Further, as described above, the number of the pitch sensing elements 92 is two, and the pitch sensing element 92 includes a first pitch sensing element 921 and a second pitch sensing element 922. Moreover, the first pitch sensing element 921 and the first pitch magnet 813 are relatively arranged in a direction parallel to the first axis OA1, and the second pitch sensing element 922 and the second pitch magnet 814 are relatively arranged in a direction parallel to the first axis OA1. The first pitch sensing element 921 obtains the first pitch magnetic field information E1 of the first pitch magnet 813, and the second pitch sensing element 922 obtains the second pitch magnetic field information E2 of the second pitch magnet 814, so that the rotation stroke of the rotating component 20 around the pitch axis C2 can be calculated through the first pitch magnetic field information E1 and the second pitch magnetic field information E2.

[0129] It should be understood that when there is a rotational movement around the rotation axis C1 during the pitch movement of the rotating component 20 around the pitch axis C2, there is a certain tilt angle between the first pitch sensing element 921 and the first pitch magnet 813, and there is a certain tilt angle between the second pitch sensing element 922 and the second pitch magnet 814. That is to say, the center line of the first pitch sensing element 921 is not parallel to the center line of the two magnetic poles of the first pitch magnet 813, and the center line of the second pitch sensing element 922 is not parallel to the center line of the two magnetic poles of the second pitch magnet 814, resulting in that the sensing results of the first pitch sensing element 921 and the second pitch sensing element 922 are easily affected by the rotational movement of the rotating component 20 around the rotation axis C1.

[0130] In the present application, by setting a first pitch sensing element 921 and a second pitch sensing element 922 on a side surface of the base 101 facing the bottom 21 of the rotating component 20, and then by the cooperation of the first pitch sensing element 921 and the first pitch magnet 813, and the cooperation of the second pitch sensing element 922 and the second pitch magnet 814, the influence caused by the rotational movement around the rotation axis C1 during the pitch movement of the sensing rotating component 20 around the pitch axis C2 can be reduced.

[0131] Specifically, the first pitch sensing element 921 can obtain the first pitch magnetic field information E1 of the first pitch magnet 813, and the second pitch sensing element 922 can obtain the second pitch rotation magnetic field information E2 of the second pitch magnet 814, so as to calculate the center value E of the pitch motion of the rotating component 20 around the pitch axis C2. m , E m = (E1+E2) / 2; further, the stroke information about the pitch motion of the rotating assembly 20 around the pitch axis C2 obtained by the first pitch sensing element 921 is E1-E m The stroke information about the pitch motion of the rotating assembly 20 around the pitch axis C2 obtained by the second pitch sensing element 922 is E2-E m Furthermore, the travel information of the pitch motion of the rotating assembly 20 around the pitch axis C2 is (E1-E m )+(E2-E m ), that is, the sum of the stroke information of the pitch motion of the rotating component 20 around the pitch axis C2 obtained by the first pitch sensing element 921 and the second pitch sensing element 922.

[0132] It should be understood that when the rotating component 20 simultaneously has a rotational motion around the rotation axis C1 and a pitching motion around the pitch axis C2, the first pitching magnetic field information E1 and the second pitching magnetic field information E2 will include the stroke information of the rotational motion around the rotation axis C1, and the stroke information of the rotational motion included in the first pitching magnetic field information E1 is opposite to the stroke information of the rotational motion included in the second pitching magnetic field information E2, and then the stroke information of the rotational motion is offset by calculating (E1+E2) / 2, so that E m There is no longer any interference from the travel information of the rotational motion, which is beneficial to improving the accuracy of the sensing results of the first pitch sensing element 921 and the second pitch sensing element 922, and further beneficial to achieving more accurate closed-loop control of the reflection module.

[0133] It is worth mentioning that the (T1+T2) and (T1-T m )、(T2-T m )、(T1-T m )+(T2-T m), and (E1+E2), (E1-E m )、(E2-E m )、(E1-E m )+(E2-E m ) is not a simple direct addition and subtraction, but includes a complex algorithm processing process. Specifically, the process of calculating the rotation angle may include but is not limited to: 1. Data preprocessing steps for magnetic field information, such as converting the output signals of the first rotation sensing element 911, the second rotation sensing element 912, the first pitch sensing element 921 and the second pitch sensing element 922 into digital signals, filtering and amplifying the signals; 2. Centering or zero-meaning the data, or performing translation processing; 3. Calibrating the detection results according to the external environment in which the reflection module is located; 4. Debugging the optimization algorithm during the calculation process.

[0134] It is worth mentioning that, under the condition that there is no interference of rotational motion in the pitch motion of the rotating component 20 around the pitch axis C2, the center line of the first pitch sensing element 921 along the direction parallel to the second axis OA2 is parallel to the center line of the two magnetic poles of the first pitch magnet 813, and the center line of the second pitch sensing element 922 along the direction parallel to the second axis OA2 is parallel to the center line of the two magnetic poles of the second pitch magnet 814, which is beneficial to the sensing accuracy of the first pitch sensing element 921 and the second pitch sensing element 922.

[0135] In other embodiments, as described above, the first pitch magnet 813 and the second pitch magnet 814 are both multi-pole magnets to provide a more uniform and stable magnetic field distribution. Specifically, the first pitch magnet 813 and the second pitch magnet 814 both include an N-pole region and an S-pole region along the first axis OA1 and along the second axis OA2, and a neutral region between the N-pole region and the S-pole region. Under the condition that there is no interference of rotational motion in the pitch motion of the rotating assembly 20 around the pitch axis C2, the neutral region of the first pitch magnet 813 is parallel to the center line of the first pitch sensing element 921 along the direction parallel to the second axis OA2, and the neutral region of the second pitch magnet 814 is parallel to the center line of the second pitch sensing element 922 along the direction parallel to the second axis OA2, which is conducive to further improving the sensing accuracy of the first pitch sensing element 921 and the second pitch sensing element 922.

[0136] In other embodiments, by providing a rotation sensing magnet independent of the rotating magnet 71 and a pitch sensing magnet independent of the pitch magnet 81, the influence of the magnetic field between the rotating magnet 71 and the rotating coil 72 on the magnetic field of the rotation sensing magnet and the influence of the magnetic field between the pitch magnet 81 and the pitch coil 82 on the magnetic field of the pitch sensing magnet can be reduced, which is beneficial to improving the sensing accuracy of the rotation sensing element 91 and the pitch sensing element 92.

[0137] In some embodiments, Fig.11 and Fig.13 As shown, the reflection module 1 also includes a buffer portion 102, and the buffer portion 102 includes a first buffer 1021. The first buffer 1021 is disposed at least one of the rotating assembly 20 and the rotating retaining member 40, so that the first buffer 1021 is located between the rotating assembly 20 and the rotating retaining member 40. During the pitching movement of the rotating assembly 20 around the pitch axis C2, the first buffer 1021 first contacts the rotating assembly 20 or the rotating retaining member 40, thereby playing a buffering role, avoiding the collision between the rotating assembly 20 and the rotating retaining member 40, which is beneficial to protecting the rotating assembly 20 and the rotating retaining member 40, so as to reduce the risk of damage to the rotating assembly 20 and the rotating retaining member 40, and prolong the service life of the periscope camera module 2. In addition, the first buffer 1021 is spaced between the rotating assembly 20 and the rotating retaining member 40, so as to play a small noise effect, which is beneficial to improving user experience.

[0138] In some embodiments, Fig.11 and Fig.13 As shown, the buffer part 102 also includes a second buffer 1022, which is disposed on at least one of the rotating holder 40 and the base 101, so that the second buffer 1022 is located between the rotating holder 40 and the base 101. When the rotating holder 40 rotates around the rotation axis C1, the second buffer 1022 first contacts the rotating holder 40 or the base 101, thereby playing a buffering role, avoiding the collision between the rotating holder 40 and the base 101, which is beneficial to protecting the rotating holder 40 and the base 101, thereby reducing the risk of damage to the rotating holder 40 and the base 101 and extending the service life of the periscope camera module 2. In addition, the second buffer 1022 is spaced between the rotating holder 40 and the base 101, so as to play a small noise effect, which is beneficial to improving user experience.

[0139] In some embodiments, Fig. 9 As shown, the second buffer 1022 can also be arranged on at least one of the rotating component 20 and the base 101, so that the second buffer 1022 is located between the rotating component 20 and the base 101. During the rotational movement of the rotating component 20 around the rotation axis C1, the second buffer 1022 first contacts the rotating component 20 or the base 101, and then plays a buffering role to avoid the collision between the rotating component 20 and the base 101, which is beneficial to protecting the rotating component 20 and the base 101, so as to reduce the risk of damage to the rotating component 20 and the base 101 and extend the service life of the periscope camera module 2.

[0140] In some embodiments, Fig. 9As shown, the buffer part 102 also includes a third buffer 1023, which is disposed at least one of the rotating assembly 20 and the base 101, so that the third buffer 1023 is located between the rotating assembly 20 and the base 101. When the rotating assembly 20 moves along the first axis OA1, the third buffer 1023 first contacts the rotating assembly 20 or the base 101 to prevent the rotating assembly 20 from colliding with the base 101. It should be understood that in the case where the periscope camera module 2 falls, the impact of the fall may cause the rotating assembly 20 to separate from the base 101, thereby causing the rotating assembly 20 to collide with the base 101. The third buffer 1023 can play a buffering role, which is conducive to protecting the rotating assembly 20 and the base 101, so as to reduce the risk of damage to the rotating assembly 20 and the base 101 and extend the service life of the periscope camera module 2. In addition, the third buffer 1023 is spaced between the rotating assembly 20 and the base 101, so as to reduce the effect of noise reduction, which is conducive to improving the user experience.

[0141] In some embodiments, Figure 4 As shown, the reflection module 1 also includes a first lens 12, which is supported by a rotating assembly 20 and arranged close to the object side. The first axis OA1 passes through the reflection component 11 and the first lens 12. The rotating assembly 20 is suitable for carrying and driving the first lens 12 and the reflection component 11 to synchronously rotate around the rotation axis C1 and / or synchronously pitch around the pitch axis C2.

[0142] It should be understood that the rotating assembly 20 carries and drives the first lens 12 and the reflective member 11 to rotate synchronously around the rotation axis C1 and / or to pitch synchronously around the pitch axis C2, which is conducive to reducing the overall size of the periscope camera module 2. Specifically, if only the reflective member 11 is driven to rotate around the rotation axis C1 and / or around the pitch axis C2, and the first lens 12 is fixed, the first lens 12 needs to be fixed to the light incident side of the reflective member 11 through the base 101. In order to avoid interference between the rotating assembly 20 and the first lens 12 when rotating, a large gap needs to be reserved between the first lens 12 and the rotating assembly 20, which will inevitably lead to an increase in the height of the reflective module 1. And because the base 101 has a large size, the first lens 12 may need a large size to be adapted to be installed on the base 101, which is not conducive to achieving the miniaturization and lightweight of the periscope camera module 2.

[0143] In the present application, the first lens 12 is mounted on the rotating assembly 20. Since the size of the rotating assembly 20 is smaller than the base 101, the first lens 12 can be installed and fixed with a smaller size, which is conducive to reducing the size and weight of the first lens 12. In addition, there is no need to reserve a large gap between the first lens 12 and the reflective component 11 for the reflective component 11 to rotate alone, that is, the gap between the first lens 12 and the reflective component 11 can be smaller, which is conducive to making the structure of the reflective module 1 more compact.

[0144] In some embodiments, the first lens 12 has at least one convex surface, so that the first lens 12 has positive focal length for converging light. It is worth mentioning that the first lens 12 defines a first axis OA1. It should be understood that the light along the first axis OA1 is converged after passing through the first lens 12, so as to increase the amount of light entering without changing the physical aperture of the periscope camera module 2, that is, equivalent to increasing the effective aperture of the periscope camera module 2.

[0145] Furthermore, the light rays converged by the first lens 12 remain converged after being reflected by the reflective component 11, thereby helping to reduce the size of each optical lens in the lens module 104 of the periscope camera module 2 along a direction parallel to the first axis OA1, thereby reducing the shoulder height of the periscope camera module 2, and helping to realize the miniaturization of the periscope camera module 2.

[0146] Furthermore, after the light is focused by the first lens 12, it is incident on the reflective component 11, so that the reflection point of the focused light at the outermost position on the reflective component 11 is closer to the first axis OA1. That is to say, compared with the light being incident on the reflective component 11 in parallel, the area of ​​the reflective surface 111 of the reflective component 11 required by the present application is smaller, which is beneficial to reducing the size of the reflective component 11, thereby reducing the overall height of the periscope camera module 2.

[0147] In at least one embodiment, both the object side surface and the image side surface of the first lens 12 are convex surfaces, so that the light is refracted twice when passing through the first lens 12, which is beneficial to enhance the convergence effect of the first lens 12 on the light, thereby reducing the gap between the first lens 12 and the reflective component 11, making the structure of the reflective module 1 more compact.

[0148] In some embodiments, the first lens 12 is a non-cut lens, which is conducive to reducing the difficulty of processing the first lens 12, thereby reducing the production cost of the reflection module 1. In other embodiments, the first lens 12 is a cut lens, which is conducive to reducing the size of the reflection module 1 along the direction parallel to the first axis OA1. This application does not make specific restrictions on this.

[0149] In some embodiments, the rotating assembly 20 is suitable for carrying and driving the first lens 12 and the reflective member 11 to synchronously rotate around the rotation axis C1 and / or synchronously pitch around the pitch axis C2, so that the relative position and relative angle between the first lens 12 and the reflective member 11 are stable. In other words, when the light passes through the first lens 12 and is incident on the reflective member 11, the stability of the propagation path and propagation angle of the light can be maintained, which is not only conducive to improving the imaging clarity of the periscope camera module 2, but also conducive to enhancing the overall image quality of the periscope camera module 2.

[0150] It should be understood that if during optical image stabilization operation, the rotating assembly 20 only carries the reflecting component 11 to perform rotational movement around the rotation axis C1 and / or pitch movement around the pitch axis C2, and the first lens 12 is fixed, the propagation path and angle of the light between the first lens 12 and the reflecting component 11 will be caused. This may cause the light to produce a propagation path and angle beyond the anti-shake requirements after being converged and reflected by the first lens 12 and the reflecting component 11, which may further cause problems such as image blur, astigmatism or distortion, affecting the final imaging quality of the periscope camera module 2.

[0151] However, in the present application, the rotating assembly 20 is suitable for carrying and driving the first lens 12 and the reflective component 11 to synchronously perform rotational movement around the rotation axis C1 and / or pitch movement around the pitch axis C2, so that the propagation path and angle of the light between the first lens 12 and the reflective component 11 are stable, which is beneficial to reduce the movement of the focusing position of the light when it propagates to the photosensitive module 108, thereby improving the final imaging quality of the periscope camera module 2.

[0152] It is worth mentioning that by carrying the first lens 12 and the reflective component 11 to move synchronously through the rotating assembly 20, the variables that need to be considered during the anti-shake operation can be reduced, which is conducive to simplifying the driving structure and improving reliability, and can reduce the research and development difficulty and manufacturing difficulty of the reflective module 1 and the periscope camera module 2, which is conducive to reducing time cost and production cost.

[0153] In some embodiments, Figure 4 and Fig.16 As shown, the rotating assembly 20 includes a rotating bracket 31 and a fixing bracket 32, and the fixing bracket 32 ​​is integrally or separately arranged on the rotating bracket 31. Specifically, the rotating bracket 31 has a mounting surface 311, and the mounting surface 311 is used to fix the reflective component 11. The fixing bracket 32 ​​has a first fixing portion 321, and the first fixing portion 321 is arranged opposite to the mounting surface 311 along the first axis OA1, and is used to install the first lens 12. The rotating bracket 31 can drive the fixing bracket 32 ​​to synchronously rotate around the rotating axis C1 and / or synchronously pitch around the pitch axis C2, thereby making the first lens 12 and the reflective component 11 move synchronously.

[0154] It should be understood that the rotating bracket 31 and the fixed bracket 32 ​​are suitable for being driven to synchronously perform pitch motion around the pitch axis C2 relative to the rotating holder 40, and the rotating bracket 31, the fixed bracket 32 ​​and the rotating holder 40 are suitable for being driven to synchronously perform rotational motion around the rotation axis C1 relative to the base 101. Further, the reflective component 11 is fixed to the mounting surface 311 of the rotating bracket 31, and the first lens 12 is fixed to the first fixing portion 321 of the fixed bracket 32, so that the light is emitted from the first lens 12 to the reflective component 11 along the first axis OA1. The rotating bracket 31 and the fixed bracket 32 ​​enable the first lens 12 and the reflective component 11 to be driven as a whole to perform rotational motion around the rotation axis C1 and / or pitch motion around the pitch axis C2, which is conducive to simplifying the structure of the reflective module 1.

[0155] In a specific embodiment, the rotating bracket 31 and the fixed bracket 32 ​​are separately provided, so as to facilitate the installation of the reflective component 11 on the rotating bracket 31 and the installation of the first lens 12 on the fixed bracket 32, which is conducive to reducing the difficulty of installation, and the two processes can be carried out simultaneously, which is conducive to improving production efficiency. In another specific embodiment, the rotating bracket 31 and the fixed bracket 32 ​​are integrally formed, which is conducive to reducing the number of parts, thereby reducing the installation process and improving production efficiency. This application does not make specific restrictions on this.

[0156] In some embodiments, a first gap 3211 is defined between the first fixing portion 321 and the mounting surface 311 of the rotating bracket 31, and at least a portion of the first lens 12 extends into the first gap 3211, thereby making the arrangement of the first fixing portion 321, the first lens 12, the reflective member 11 and the rotating bracket 31 more compact in a direction parallel to the first axis OA1, which is beneficial to reducing the size of the reflective module 1 in a direction parallel to the first axis OA1, thereby reducing the height of the periscope camera module 2.

[0157] In some embodiments, Figure 4 As shown, the reflection module 1 also includes a second lens 13, which is supported by the rotating assembly 20 and arranged close to the image side. The second axis OA2 passes through the reflection component 11 and the second lens 13. The reflection component 11 is supported by the rotating assembly 20 and is located between the first lens 12 and the second lens 13 to reflect the light incident from the object side to the image side. The rotating assembly 20 is suitable for carrying and driving the first lens 12, the reflection component 11 and the second lens 13 to synchronously rotate around the rotation axis C1 and / or synchronously pitch around the pitch axis C2. Refer to the above-mentioned content of the synchronous movement of the first lens 12 and the reflection component 11, which will not be repeated.

[0158] In some embodiments, the second lens 13 has at least one concave surface, so that the second lens 13 has a negative optical power for expanding the light. It is worth mentioning that the second lens 13 defines a second axis OA2. Specifically, the second lens 13 has a negative optical power, so that the light along the second axis OA2 is expanded after passing through the second lens 13.

[0159] It should be understood that by providing the second lens 13 with a beam expansion function, the light converged by the first lens 12 can be diffused after passing through the second lens 13, increasing the coverage area of ​​the light reaching the photosensitive chip, and thus the movement stroke of the reflective component 11 has a relatively small effect on the position of the light on the photosensitive chip. The difference between the MTF design value under unit shaking angle of the periscope camera module 2 and the MTF design value under static state is small, so that the periscope camera module 2 can obtain clearer images in the use scenarios of motion, vibration or shaking.

[0160] In some embodiments, Figure 4 and Fig.16 As shown, the fixed frame 32 also has a second fixed portion 322 connected to the first fixed portion 321. The second fixed portion 322 and the mounting surface 311 of the rotating bracket 31 are arranged relatively to each other along the second axis OA2, and are used to mount the second lens 13. The rotating bracket 31 can drive the fixed frame 32 to synchronously rotate around the rotation axis C1 and / or synchronously pitch around the pitch axis C2, thereby making the first lens 12, the reflective component 11 and the second lens 13 move synchronously. Please refer to the above-mentioned content of the synchronous movement of the fixed frame 32 and the rotating bracket 31, which will not be repeated.

[0161] In some embodiments, a second gap 3221 is defined between the second fixing portion 322 and the mounting surface 311 of the rotating bracket 31, and at least a portion of the second lens 13 extends into the second gap 3221, thereby making the arrangement of the rotating bracket 31, the reflective member 11, the second fixing portion 322 and the second lens 13 more compact in a direction parallel to the second axis OA2, which is beneficial to reducing the size of the reflective module 1 in a direction parallel to the second axis OA2, thereby reducing the length of the periscope camera module 2.

[0162] In at least one embodiment, the reflective member 11 is implemented as a reflector, and the reflector includes a reflective surface 111 and a fixed surface 112, the reflective surface 111 is used to reflect light, and the fixed surface 112 is used to be fixed to the mounting surface 311 of the rotating bracket 31. It should be understood that compared with the prism, the reflector in this embodiment has a lighter weight and a smaller size, which can reduce the space occupied by the reflective module 1 in the periscope camera module 2, which is conducive to the miniaturization of the periscope camera module 2. In addition, the motor size and power required to drive the reflector are also smaller, and it is conducive to improving the anti-shake effect. It is worth mentioning that the reflective member 11 can also be implemented as a prism, and this application does not impose specific restrictions on this.

[0163] A periscope camera module 2, such as Figure 1 and Figure 4 As shown, it includes: the above-mentioned reflection module 1, the reflection module 1 is configured to reflect the light incident from the first axis OA1 to the second axis OA2, wherein the first axis OA1 and the second axis OA2 intersect; the lens module 104, the lens module 104 is configured to receive the light from the reflection module 1 and continue to propagate the light along the second axis OA2; the photosensitive module 108, the photosensitive module 108 is configured to receive the light and perform imaging; the substrate 109, the substrate 109 has a accommodating cavity 1091, the reflection module 1 and the lens module 104 are arranged in the accommodating cavity 1091, the base 101 of the reflection module 1 is integrally or separately arranged on the substrate 109; and the shell 103, the shell 103 is covered on the substrate 109.

[0164] It should be understood that the rotating support part 50 of the reflection module 1 is able to carry the rotating retaining part 40 and the rotating assembly 20, and drive the reflection component 11 to rotate around the rotation axis C1, so that the image on the photosensitive surface of the photosensitive module 108 produces an effect of rotating around the rotation axis C1, thereby compensating for the rotational jitter and tilt jitter of the periscope camera module 2 during use, which is beneficial to reduce the phase difference and improve the final imaging quality of the periscope camera module 2.

[0165] In some embodiments, Figure 1 and Figure 4 As shown, the lens module 104 includes a plurality of lenses, and the lens module 104 is used to image light on the photosensitive surface of the photosensitive module 108. Specifically, the lens module 104 includes a first lens group 1041 and a second lens group 1042, and the first lens group 1041 and the second lens group 1042 are sequentially arranged along the second axis OA2.

[0166] In a specific embodiment, Figure 1 and Figure 4As shown, the first lens group 1041 is a fixed lens group, and the second lens group 1042 is a focusing lens group, that is, the first lens group 1041 is fixed to the base 109, and the second lens group 1042 is carried on the lens carrier 105. The lens carrier 105 is driven by the focus driving unit 107 to carry the second lens group 1042 to move along the second axis OA2, thereby realizing the optical focus function of the periscope camera module 2 and switching the imaging mode of the periscope camera module 2. Among them, the focus driving unit 107 can be implemented as a VCM motor, an SMA motor or a piezoelectric motor, and this application does not make specific restrictions on this.

[0167] It should be understood that the lens module 104 may further include a third lens group and / or a fourth lens group, and the third lens group and / or the fourth lens group may move along the second axis OA2 to achieve an optical zoom function, and the present application does not impose any specific limitation on this.

[0168] In some embodiments, Fig.17 As shown, a support member 106 is provided between the bottom surface of the lens carrier 105 and the base 109 to support and guide the lens carrier 105 to move relative to the base 109 along the second axis OA2 direction, which is beneficial to improving the reliability of the relative movement between the lens carrier 105 and the base 109, and reducing the friction resistance during the relative movement. It can be understood that the support member 106 can be implemented as a guide rod 1061 or a lens ball 1062, and the present application does not make specific restrictions on this.

[0169] In a specific embodiment, the lens carrier 105 is supported by the guide rod 1061 and the lens ball 1062. Specifically, the guide rod 1061 is extended and arranged on the base 109 in a direction parallel to the second axis OA2, and the guide groove 1051 is arranged on one side of the bottom surface of the lens carrier 105. The guide rod 1061 is adapted to be installed in the guide groove 1051, and then the lens carrier 105 is guided to move relative to the base 109 along the second axis OA2 through the cooperation of the guide rod 1061 and the guide groove 1051. Further, at least one lens ball 1062 is rollably arranged on the other side of the bottom surface of the lens carrier 105, and the lens ball 1062 cooperates with the guide rod 1061 to provide a support plane, which is conducive to more stably supporting the movement of the lens carrier 105.

[0170] In another specific embodiment, the bottom surface of the lens carrier 105 is supported by two guide rods 1061. Specifically, the two guide rods 1061 are arranged on the base 109 at intervals along a direction parallel to the third axis A3, and the two guide rods 1061 extend along a direction parallel to the second axis OA2. The bottom surface of the lens carrier 105 is provided with two guide grooves 1051, and the guide rods 1061 are adapted to be installed in the guide grooves 1051 to support and guide the lens carrier 105 to move relative to the base 109 along the second axis OA2.

[0171] In another specific embodiment, the lens carrier 105 is supported by at least three non-collinear lens balls 1062. Specifically, the bottom surface of the lens carrier 105 and the surface of the base 109 facing the lens carrier 105 are respectively provided with ball grooves 1052 to limit the positions of the at least three lens balls 1062 between the lens carrier 105 and the base 109, so that the lens balls 1062 and the ball grooves 1052 can provide a support plane and guide the lens carrier 105 to move relative to the base 109 along the second axis OA2.

[0172] In some embodiments, the photosensitive module 108 includes a chip circuit board, a photosensitive chip, and a plurality of electronic components. Specifically, the photosensitive chip and the plurality of electronic components are electrically connected to the chip circuit board, and the photosensitive chip is used to receive the external light collected by the reflection module 1 for imaging, and is electrically connected to an external electronic device through the chip circuit board. It should be understood that the plurality of electronic components include but are not limited to passive electronic devices such as resistors and capacitors, and driver chips, storage chips, etc.

[0173] Furthermore, the photosensitive module 108 further includes a filter assembly, which includes a filter element, and the filter element is used to filter the incident light entering the photosensitive chip to filter out the incident light, such as infrared light, and other stray light that is not necessary for imaging. It should be understood that the filter element is maintained on the light sensing path of the photosensitive chip and is disposed between the lens module 104 and the photosensitive chip.

[0174] Furthermore, the filter assembly further includes a filter bracket, the filter bracket has a light hole, the filter element is mounted and fixed on the filter bracket, and corresponds to at least part of the photosensitive area of ​​the photosensitive chip, and the incident light passing through the lens module 104 enters the photosensitive chip through the light hole. Specifically, the filter element can be attached to the filter bracket face up or face down.

[0175] In a specific embodiment, the filter bracket is fixed to the chip circuit board. It is worth mentioning that the photosensitive module 108 is fixed to the image side of the filter element through the filter bracket; the photosensitive module 108 can also be fixed to the image side of the filter element through the chip circuit board, and this application does not make specific restrictions on this.

[0176] The above describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions only describe the principles of the present invention. The present invention may be subject to various changes and improvements without departing from the spirit and scope of the present invention. These changes and improvements fall within the scope of the present invention to be protected. The scope of protection claimed by the present invention is defined by the attached claims and their equivalents.

Claims

1. A reflection module, characterized in that: include: a reflective member for reflecting light incident along a first axis to a second axis, wherein the first axis and the second axis intersect; A rotating assembly, used for carrying the reflecting member; A base having an internal space for accommodating the rotating assembly; A rotating holder, wherein the rotating assembly, the rotating holder and the base are stacked in a direction parallel to the first axis; A rotation support portion, the rotation support portion is located between the bottom of the rotation holder and the top of the base along a direction parallel to the first axis, the rotation support portion provides a rotation axis, the rotation axis passes through the rotation support portion and is parallel to the second axis; the rotation support portion includes at least two rotation supports arranged at intervals along a direction parallel to the second axis, the at least two rotation supports are pressed between the rotation holder and the base, and the at least two rotation supports form a rotation axis, so that the rotation holder and the rotation assembly can rotate relative to the base around the rotation axis; A pivot member extending in a direction parallel to the third axis, the pivot member being located between the rotating assembly and the rotating retaining member, the pivot member providing a pitch axis so that the rotating assembly can perform a pitch motion relative to the rotating retaining member around the pitch axis; The projection of the pivot member along the direction parallel to the first axis falls between the projections of the at least two rotating supports along the direction parallel to the first axis; the imaginary line where the projection of the pivot member along the direction parallel to the first axis lies is perpendicular to the imaginary line where the projection of the connecting line of the at least two rotating supports along the direction parallel to the first axis lies; A rotation driving unit, used for driving the rotation holding member, the rotation assembly and the reflection member to perform rotational motion around a rotation axis; The pitch driving unit is used to drive the rotating assembly to perform a pitch motion around the pitch axis relative to the rotating holder.

2. The reflection module according to claim 1, characterized in that: The at least two rotating supports are pressed between the rotating assembly and the base, wherein the rotating axis and the second axis are parallel to each other but not colinear.

3. The reflection module according to claim 2, characterized in that: The reflection module also includes a pitch support portion, the rotating assembly, the rotating holder, the rotating support portion and the base are stacked in a direction parallel to the first axis, and the rotating support portion is capable of supporting the rotating holder and the rotating assembly to perform rotational movement around the rotating axis relative to the base; the pitch support portion is located between the rotating assembly and the rotating holder, and the pitch support portion provides a pitch axis, which is parallel to the third axis and not colinear with the third axis, and the rotating assembly is capable of performing a pitch movement around the pitch axis relative to the rotating holder, wherein the third axis intersects the first axis and the second axis.

4. The reflection module according to claim 3, characterized in that: At least part of the projection area of ​​the rotating holder along the first axis overlaps with the projection area of ​​the rotating assembly along the first axis, and at least part of the projection area of ​​the rotating holder along the second axis overlaps with the projection area of ​​the rotating assembly along the second axis.

5. The reflection module according to claim 3, characterized in that: The reflection module also includes a pitch driving unit, which is located at the bottom of the rotating component, and the rotation driving unit is located at the back of the rotating component, and the pitch driving unit and the rotation driving unit are arranged on opposite sides of the rotating component; the pitch driving unit includes at least one pitch magnet and at least one pitch coil, and the pitch magnet and the pitch coil are arranged relative to each other in a direction parallel to the first axis, and are suitable for cooperating to drive the rotating component to pitch relative to the rotating retaining member around the pitch axis; the rotation driving unit includes at least one rotating magnet and at least one rotating coil, and the rotating magnet and the rotating coil are arranged relative to each other in a direction parallel to the second axis, and are suitable for cooperating to drive the rotating component to rotate relative to the base around the rotation axis.

6. The reflection module according to claim 5, characterized in that: The rotating magnet is curved in a plane perpendicular to the second axis, and a center of curvature of the curved rotating magnet is close to the second axis.

7. The reflection module according to claim 3, characterized in that: The rotation support portion includes at least two support bosses, which protrude from one of the rotation retaining member and the base in a direction parallel to the first axis. The at least two support bosses are crimped between the rotation retaining member and the base, and an imaginary line extending from the rotation axis passes through the at least two support bosses.

8. The reflection module according to claim 3, characterized in that: The rotating support portion includes at least two supporting balls spaced apart in a direction parallel to the second axis, the rotating retaining member is provided with at least two upper ball grooves, the base is provided with at least two lower ball grooves, the upper ball grooves and the lower ball grooves are arranged opposite to each other in a direction parallel to the first axis, the at least two supporting balls are movably clamped between the upper ball grooves and the lower ball grooves, and an imaginary line extending from the rotating axis passes through the at least two supporting balls.

9. The reflection module according to claim 3, characterized in that: Among the at least two rotating support members, one of the rotating support members is arranged close to the reflective component along a direction parallel to the second axis, and the other rotating support member is arranged away from the reflective component along a direction parallel to the second axis. The distance between the projection of the pivot member and the projection of the rotating support member away from the reflective component is recorded as L1, and the distance between the projection of the pivot member and the projection of the rotating support member close to the reflective component is recorded as L2, satisfying: L1≤L2.

10. The reflection module according to claim 3, characterized in that: The reflection module also includes a magnetic magnet and a yoke, wherein the magnetic magnet is arranged at one of the rotating component and the base, and the yoke is arranged at the other of the rotating component and the base, and a magnetic attraction force is generated between the magnetic magnet and the yoke in a direction parallel to the first axis, and under the action of the magnetic attraction force, the pitch support portion is crimped between the rotating component and the rotating retaining member, and the rotating support portion is crimped between the rotating retaining member and the base.

11. The reflection module according to claim 5, characterized in that: The reflection module also includes a sensing component, which includes at least one rotation sensing element and at least one pitch sensing element arranged on the base, the rotation sensing element and the rotating magnet are arranged relative to each other in a direction parallel to the second axis, so that the rotation sensing element obtains the rotating magnetic field information of the rotating magnet, and the pitch sensing element and the pitch magnet are arranged relative to each other in a direction parallel to the first axis, so that the pitch sensing element obtains the pitch magnetic field information of the pitch magnet.

12. The reflection module according to claim 11, characterized in that: The magnetic poles of the rotating magnet are distributed along the bending direction of the rotating magnet. When the rotating magnet rotates around the rotating axis relative to the rotating sensing element, the overlapping area between the magnetic poles of the rotating magnet and the rotating sensing element changes with the rotation angle of the rotating magnet along the second axis OA2.

13. The reflection module according to claim 11, characterized in that: The rotating magnet includes a first rotating magnet and a second rotating magnet arranged at intervals in a direction parallel to the third axis, the rotating sensing element includes a first rotating sensing element and a second rotating sensing element, and the first rotating sensing element and the first rotating magnet are arranged opposite to each other in a direction parallel to the second axis, and the second rotating sensing element and the second rotating magnet are arranged opposite to each other in a direction parallel to the second axis, the first rotating sensing element obtains first rotating magnetic field information of the first rotating magnet, and the second rotating sensing element obtains second rotating magnetic field information of the second rotating magnet, so that the stroke of the rotating component rotating around the rotating axis can be calculated by the first rotating magnetic field information and the second rotating magnetic field information.

14. The reflection module according to claim 11, characterized in that: The pitch magnet includes a first pitch magnet and a second pitch magnet spaced apart in a direction parallel to the third axis, the pitch sensing element includes a first pitch sensing element and a second pitch sensing element, and the first pitch sensing element and the first pitch magnet are relatively arranged in a direction parallel to the first axis, the second pitch sensing element and the second pitch magnet are relatively arranged in a direction parallel to the first axis, the first pitch sensing element obtains first pitch magnetic field information of the first pitch magnet, and the second pitch sensing element obtains second pitch magnetic field information of the second pitch magnet, so that the rotation stroke of the rotating component around the pitch axis can be calculated through the first pitch magnetic field information and the second pitch magnetic field information.

15. A periscope camera module, characterized in that: include: The reflection module according to any one of claims 1 to 14, wherein the reflection module is configured to reflect light incident from a first axis to a second axis, wherein the first axis and the second axis intersect; a lens module, wherein the lens module is configured to receive the light from the reflection module and continue to propagate the light along a second axis; A photosensitive module, wherein the photosensitive module is configured to receive light and perform imaging; A base having a receiving cavity, wherein the reflection module and the lens module are disposed in the receiving cavity, and a base of the reflection module is integrally or separately disposed on the base; and A shell is disposed on the base.

Images