Flushing method for flushing coating product coating device and related device

Abstract

A rinsing method for rinsing a coating product coating device and a related device. The invention relates to a method for flushing a coating product coating device (12), comprising a dosing device (10) and a coating product applicator (13). The dosing device (10) comprises a dosing pump (14) having an inlet (26) connected to the gas supply channel (20) and the solvent supply channel (22) and an outlet (28) connected to the spreader (13). Each supply channel is provided with a respective valve (40, 42). The method comprises at least one pumping step of pumping a quantity by the metering pump (4) during at least one pumping phase of the metering pump (14); the valves (40, 42) are alternately in an open configuration during the at least one suction phase so that the amount inhaled during the at least one suction phase alternately includes gas and solvent. The invention also relates to a related coating device.

Description

Technical Field

[0001] The invention relates to a flushing method and a related device for flushing a coating product coating device including a metering and dosing device. Background Art

[0002] To flush the coating product application device, for example, a solvent is injected into the application device.

[0003] However, this method uses a large amount of solvent. Summary of the invention

[0004] The object of the present invention is to provide a more ecological method for flushing a coating product application device.

[0005] To this end, the present invention relates to a flushing method for flushing a coating product coating device, the coating product coating device comprising a metering device and a coating product applicator, the metering device comprising a metering pump, the metering pump having an inlet and an outlet, the inlet being connected to a gas supply channel and a solvent supply channel, the outlet being connected to the coating product applicator, the gas supply channel being provided with an air valve, the solvent supply channel being provided with a solvent valve, each of the air valve and the solvent valve having at least one closed configuration and at least one open configuration, in the closed configuration, the valve respectively prevents gas and solvent from passing to the inlet, and in the open configuration, the valve respectively allows gas and solvent to pass to the inlet, the flushing method comprising at least one suction step as follows: during at least one suction stage of the metering pump, a certain amount is sucked by the metering pump; the air valve and the solvent valve are alternately in an open configuration during at least one suction stage, so that the amount sucked in during the at least one suction stage alternately includes gas and solvent.

[0006] The gas is thus injected into the solvent. This produces an emulsion which is used to flush the coating device. As a result, the amount of solvent used for flushing is reduced.

[0007] According to further advantageous aspects of the invention, the flushing method comprises one or more of the following features, taken alone or in all technically possible combinations:

[0008] - the at least one suction step comprises the following steps in the following order: opening a first valve of the gas valve and the solvent valve, sucking a first amount of gas or solvent by a metering pump, closing the first valve, opening a second valve of the gas valve and the solvent valve that is different from the first valve, sucking a second amount of gas or solvent by a metering pump, and closing the second valve, and the aforementioned steps are repeated throughout the at least one suction stage;

[0009] - the suction comprises a suction cycle, the suction cycle comprises suction of gas and suction of solvent by a metering pump, the suction cycle being repeated during the entire suction phase;

[0010] - the metering method comprises detecting the amount sucked in by the metering pump during suction, more specifically, detecting the amount sucked in by means of a sensor for the amount sucked in or a sensor for the displacement of the metering pump;

[0011] - the metering device further comprises at least two supply channels for the respective component products;

[0012] - the metering pump is a piston pump;

[0013] - the gas supply channel is provided with a compressor, the compressor is suitable for compressing the gas to the inlet of the metering pump upstream of the gas valve, the solvent supply channel is provided with a secondary solvent pump, the secondary solvent valve is suitable for pumping the solvent to the inlet of the metering pump, and the secondary solvent pump is arranged upstream of the solvent valve; and / or

[0014] The metering device comprises a mixer located downstream of the metering pump outlet, more specifically arranged in the vicinity of the metering pump outlet.

[0015] The present invention also relates to a coating product coating device, which includes a metering and dosing device and a coating product applicator. The metering and dosing device includes a metering pump, a gas supply channel and a solvent supply channel, and a control module. The metering pump has an inlet and an outlet, the inlet is connected to the gas supply channel and the solvent supply channel, and the outlet is connected to the coating product applicator. The gas supply channel is provided with an air valve, and the solvent supply channel is provided with a solvent valve. Each of the air valve and the solvent valve has at least one closed configuration and at least one open configuration. In the closed configuration, the valve respectively prevents gas and solvent from passing through the inlet, and in the open configuration, the valve respectively allows gas and solvent to pass through the inlet. The control module is capable of controlling the air valve and the solvent valve, and the control module is constructed to perform suction according to at least one suction step of the above method. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The invention will become more apparent by reading the following description which is given by way of example only and not by way of limitation, and by referring to the accompanying drawings, in which:

[0017] Figure 1 is a schematic diagram of an example of a coating device during flushing according to a first embodiment of the present invention,

[0018] Figure 2 is a schematic diagram of an example of a coating device during flushing according to an embodiment of the present invention,

[0019] Figure 3 is an example of a metering pump used in the coating device according to the present invention. DETAILED DESCRIPTION

[0020] Now refer to Figure 1 A first example of the paint product applying device 12 is described.

[0021] Coating products are, for example, multi-component products.

[0022] A coating product is, for example, paint.

[0023] The viscosity of the coating product is, for example, between 1100 Cps and 10000 Cps.

[0024] The coating product applying device 12 comprises a metering device 10 .

[0025] The coating device 12 further comprises a coating product applicator 13 .

[0026] The coater 13 is, for example, one or more spray guns, or one or more rotating spray bowls, or one or more deposition valves.

[0027] The metering device 10 comprises a metering pump 14 .

[0028] The metering device 10 here comprises a gas supply channel 20 and a solvent supply channel 22 .

[0029] The metering device 10 here also comprises a plurality of supply channels 16 , 18 for the respective component products.

[0030] The metering device 10 here also comprises an electronic system 24 .

[0031] The metering pump 14 includes an inlet 26 and an outlet 28 .

[0032] Metering pumps are capable of pumping a fixed amount of fluid, either liquid or gas.

[0033] The metering pump has, for example, a cylinder capacity of between 10 cc and 500 cc.

[0034] The metering pump has at least one suction phase.

[0035] In one embodiment, the metering pump has a pumping phase and a non-pumping phase.

[0036] During the suction phase, a fluid quantity corresponding to the cylinder capacity of the metering pump enters the metering pump at the inlet. In addition, during the suction phase, a fluid quantity corresponding to a first part (here half) of the cylinder capacity of the pump is discharged from the pump at the outlet.

[0037] During the non-pumping phase, no fluid enters the metering pump at the inlet. An amount of fluid corresponding to the second part (the complement of the first part, here half) of the cylinder capacity of the pump is discharged from the pump at the outlet.

[0038] In the example, the metering pump 14 is a piston pump.

[0039] As mentioned above, piston pumps operate with a suction phase and a non-suction phase.

[0040] Figure 3 , for example, shows an example of a piston pump used as metering pump 14 during the suction phase.

[0041] The metering pump comprises, for example, a cylinder 70 and a piston head 72 which defines two chambers of variable volume in the cylinder, which are referred to as an upstream chamber 74 and a downstream chamber 76 .

[0042] The inlet 26 is arranged opposite the outlet 28 .

[0043] The inlet 26 opens into the upstream chamber 74 opposite to the downstream chamber 76 , and the outlet 28 opens into the downstream chamber 76 opposite to the upstream chamber 74 .

[0044] The piston head 72 is provided with a discharge valve 78 .

[0045] The piston head defines an opening 80 for fluid to flow from the upstream chamber 74 to the downstream chamber 76 , and the drain valve 78 prevents fluid from flowing from the downstream chamber 76 to the upstream chamber 74 .

[0046] The discharge valve 78 includes, for example, a valve seat 82 which is defined by a piston head and surrounds an opening, and a valve ball 84 which can rest on the valve seat 82 .

[0047] The piston pump is further provided with a suction valve 86 arranged at the inlet 26 of the metering pump.

[0048] The suction valve prevents fluid from leaving the metering pump at the inlet 26 .

[0049] The intake valve comprises, for example, a valve seat 88 surrounding the inlet 26 and a valve ball 90 which can rest on the valve seat.

[0050] During the suction phase of the metering pump, the piston head 72 moves towards the outlet 28. The amount of fluid contained in the downstream chamber 76 is discharged via the outlet 28. Furthermore, a vacuum is created in the upstream chamber 74 and fluid is sucked in at the inlet 26, more specifically, fluid corresponding to the cylinder capacity of the pump.

[0051] More specifically, the valve ball 90 of the suction valve 86 moves away from the valve seat 88 due to the negative pressure generated in the upstream chamber 74 , and the moved-away valve ball 84 of the discharge valve 78 rests on the valve seat 82 due to the overpressure in the downstream chamber.

[0052] During the non-suction phase of the metering pump, the piston head moves towards the inlet 26. No fluid enters through the inlet 26. The amount contained in the downstream chamber 76 is discharged via the outlet 28. A portion of the amount contained in the upstream chamber 74, here half of the amount, moves into the downstream chamber 76.

[0053] More specifically, due to the overpressure generated in the upstream chamber 74 , the valve ball 90 of the suction valve 86 rests on the valve seat 88 , while the valve ball 84 of the discharge valve 78 moves away from the valve seat 82 and releases the opening 80 due to the negative pressure in the downstream chamber 76 .

[0054] Alternatively, during the suction phase, an amount corresponding to the cylinder capacity of the metering pump enters the metering pump at the inlet and no fluid leaves the pump at the outlet, and during the non-suction phase, an amount corresponding to the cylinder capacity of the metering pump leaves the pump at the outlet and no fluid enters the metering pump at the inlet.

[0055] Alternatively, the metering pump comprises a piston comprising a head without an opening and defining two non-communicating chambers, including a pumping chamber. The inlet and outlet of the metering pump are arranged in the same pumping chamber. The inlet and outlet more specifically open into a pumping chamber opposite to another chamber defined by the head. For example, both the inlet and the outlet are equipped with non-return valves. The metering pump then has a suction phase and a non-suction phase, in which the pump sucks in a fluid amount equal to, for example, the cylinder capacity of the pump and does not discharge any fluid, and in the non-suction phase, the pump discharges said fluid amount.

[0056] As an alternative to piston pumps, metering pumps are diaphragm pumps or ball pumps.

[0057] The outlet 28 is adapted to be connected to the coating product applicator 13 so that the metering pump 14 supplies the coating product applicator.

[0058] The inlet is connected to a gas supply channel 20 and / or a solvent supply channel 22 and further to the respective plurality of component product supply channels 16 , 18 as appropriate.

[0059] In the example, the connector is arranged at the inlet 26 .

[0060] The connector is, for example, a distribution unit.

[0061] A connector is connected to each supply channel.

[0062] Each component product supply channel 16 , 18 is capable of supplying the inlet of the metering pump 14 with a corresponding component product, for example from a respective tank 30 , 32 containing the corresponding component product specific to the supply channel.

[0063] The component product supply channels 16, 18 merge at a connection point, for example upstream of the inlet, which is connected to the inlet.

[0064] The connection point is, for example, adjacent to the inlet 26 .

[0065] Alternatively, each component product supply channel 16 , 18 is connected to the inlet 26 separately from the others.

[0066] Each component product supply passage 16 , 18 is provided with a respective valve 34 , 36 .

[0067] The respective valve 34 , 36 is arranged upstream of the inlet 26 , more specifically, where appropriate, upstream of the connection point.

[0068] The respective valve 34 , 36 is arranged here downstream of the respective tank 30 , 32 .

[0069] Each valve 34, 36 has at least one closed configuration and at least one open configuration. In the closed configuration, the valve prevents the corresponding component product from passing through the valve, that is, it prevents the corresponding component product from passing through the inlet 26. In the open configuration, the valve allows the corresponding component product to pass through the valve, that is, it allows the corresponding component product to pass through the inlet 26.

[0070] Each valve 34, 36 has a closed configuration and a plurality of open configurations. The flow rate of the respective component product through the valve differs depending on the open configuration.

[0071] Alternatively, each valve 34 , 36 here has only one closed configuration and one open configuration.

[0072] The flow rates of the respective component products in the supply channel can then be adjusted, for example, at another location outside the supply channel, for example using a flow control valve, for example at the applicator 13 or on the outlet line 44 .

[0073] The gas supply channel 20 is capable of supplying gas, more particularly air, such as compressed air, to the inlet 26 .

[0074] The solvent supply passage 22 can supply solvent to the inlet 26 , for example, from a solvent tank 38 containing the solvent.

[0075] In one embodiment, the solvent supply channel is also regarded as a component supply channel as described above, and the multi-component product contains a solvent.

[0076] The gas supply channel 20 and the solvent supply channel 22 meet at a connection point upstream of the inlet, for example, which is connected to the inlet. The connection point is, for example, the same as the connection point of the component product supply channels 16, 18, where all supply channels meet.

[0077] Alternatively, each supply channel 16 , 18 , 20 , 22 is connected to the inlet 26 separately from each other.

[0078] The gas supply passage 20 is provided with a gas valve 40 .

[0079] More specifically, in the example, the gas valve 40 is arranged at the upstream end of the gas supply passage 20 .

[0080] The gas valve 40 can, for example, take in gas, more particularly air, from the atmosphere surrounding the metering device 10 .

[0081] Where appropriate, the gas valve 40 is arranged upstream of the inlet 26, more specifically upstream of the connection point.

[0082] The gas valve 40 has at least one closed configuration in which the gas valve prevents gas from passing through the gas valve 40 to the inlet 26 and at least one open configuration in which the gas valve allows gas to pass through the gas valve 40 to the inlet 26 .

[0083] As described above with respect to valves 34 , 36 , the gas valve 40 has, for example, one closed configuration and multiple open configurations, or alternatively has only one closed configuration and one open configuration.

[0084] The solvent supply passage 22 is provided with a solvent valve 42 .

[0085] The solvent valve 42 is arranged upstream of the inlet 26 , more specifically, where appropriate, upstream of the connection point.

[0086] The solvent valve 42 is arranged here downstream of the solvent tank 38 .

[0087] The solvent valve 42 has at least one closed configuration in which the solvent valve prevents solvent from passing through the valve 42 to the inlet and at least one open configuration in which the solvent valve allows solvent to pass through the valve 42 to the inlet 26 .

[0088] As described above with respect to valves 34, 36, solvent valve 42 has, for example, one closed configuration and multiple open configurations, or alternatively has only one closed configuration and one open configuration.

[0089] The coating device 12 also includes an outlet line 44 .

[0090] The outlet line 44 here extends between an upstream end and a downstream end.

[0091] The outlet line 44 , more specifically its upstream end, is connected to the outlet 28 of the metering pump 14 .

[0092] The downstream end is connected to the coater 13 .

[0093] More specifically, the metering pump 14 discharges the product contained in the metering pump into the outlet line 44 .

[0094] The metering device 10 further comprises a mixer 45 , here a mechanical mixer, more particularly a static mixer, which is situated downstream of the outlet 28 of the metering pump, more particularly arranged in the vicinity of the outlet 28 of the metering pump.

[0095] The mixer 45 is here arranged in the outlet line 44 , more specifically at the upstream end of the outlet line 44 .

[0096] The metering device 10 is here also provided with a sensor 46 for the amount of fluid entering the metering pump 14 or a sensor for the displacement of the metering pump 14 .

[0097] In the example, the sensor 46 is capable and arranged to measure a displacement of a piston of the metering pump 14 .

[0098] Alternatively, the sensor 46 can detect a parameter related to the metering pump that is directly dependent on the amount of fluid entering the metering pump 14 .

[0099] For example, in the case of a pump having a grooved gear, the sensor can for example detect the groove of the engaging gear.

[0100] Additionally or alternatively, a sensor 46 is disposed at the inlet 26 and measures the amount of fluid entering the metering pump 14 via the inlet 26 .

[0101] The sensor 46 provides, for example, an analog signal such as the amount of entry or the displacement of the piston.

[0102] Alternatively, the sensor 46 provides a digital signal, such as a gear groove or a threshold value corresponding to the amount of ingress or piston displacement.

[0103] The electronic device 24 includes an information processing unit including, for example, a memory and a processor associated with the memory.

[0104] The electronic device 24 includes a control module 48 .

[0105] As described more specifically below, the control module 48 is capable of controlling the respective valves 34 , 36 of the supply passages.

[0106] For example, the control module 48 is connected to the valves 34 , 36 , such as by a wired or remote connection.

[0107] The control module 48 is also capable of controlling the gas valve 40 and the solvent valve 42 as appropriate.

[0108] For example, the control module 48 is connected to the valves 40 , 42 , such as by a wired or remote connection.

[0109] The response time of each valve 34 , 36 , 40 , 42 to the commands of the control module 48 is between 100 and 250 milliseconds.

[0110] The control module 48 is configured to implement the aspiration as described in the metering method described below.

[0111] The control device 24 further comprises a monitoring module 50 .

[0112] The monitoring module 50 is connected to the control module 48 .

[0113] The monitoring module 50 is also connected to the sensor 46 , such as by a wired or remote connection.

[0114] More specifically, the monitoring module 50 is adapted to receive information from the sensor 46 , more specifically, to receive signals provided by the sensor 46 including measurements made by the sensor 46 .

[0115] The monitoring module 50 is able to determine the amount of fluid entering the metering pump 14 and the nature of the fluid entering the pump 14 based on the configuration of each valve.

[0116] The monitoring module 50 is then able to determine the amount of each fluid that enters the metering pump 14 in turn.

[0117] The control module 48 and, if appropriate, the monitoring module 50 are both made in the form of software or software blocks executable by the processor. The memory of the electronic device can store the control software and the monitoring software. The processor can execute each software program in the control software and the monitoring software.

[0118] In a variant (not shown), the control module 48 and, if appropriate, the monitoring module 50 are made in the form of programmable logic components such as an FPGA (Field Programmable Gate Array) or in the form of an integrated circuit such as an ASIC (Application Specific Integrated Circuit).

[0119] When the electronic device is made in the form of one or more software programs, i.e. in the form of a computer program, it can also be recorded on a computer-readable medium (not shown). A computer-readable medium is, for example, a medium capable of storing electronic instructions and coupled to a bus of a computer system. For example, the readable medium is an optical disk, a magneto-optical disk, a ROM, a RAM, any type of non-volatile memory (e.g., FLASH or NVRAM), or a magnetic card. The computer program containing the software instructions is stored on a readable medium.

[0120] exist Figure 1 In the example shown, the metering pump 14 draws fluid during the suction phase by so-called passive suction, i.e. during the suction phase, the metering pump 4 generates a negative pressure at its inlet 26, thereby sucking fluid, more specifically fluid from the channels whose corresponding valves are in the open configuration.

[0121] This arrangement is particularly simple.

[0122] Now refer to Figure 2 A second example of the coating device 112 for coating the paint product according to the second embodiment of the present invention will be described.

[0123] Only the features of the second embodiment that are different from the first embodiment will be described in the following specification. In addition, except for these features, the coating device 112 is the same as the coating device of the first example.

[0124] The same or similar components are denoted by the same reference numerals incremented by 100.

[0125] In the second embodiment, the gas supply channel 120 is provided with a compressor 164 adapted to compress the gas towards the inlet 126 of the metering pump 114 .

[0126] Compressor 164 is arranged upstream of gas valve 140 .

[0127] More specifically, the compressor 164 is capable of taking gas, more specifically air, from the atmosphere surrounding it and compressing the gas in the gas supply passage 120 upstream of the gas valve 140 .

[0128] The solvent supply channel 122 is provided with a secondary solvent pump 166 adapted to pump the solvent to the inlet 126 of the metering pump 114 .

[0129] The secondary solvent pump 166 is arranged upstream of the solvent valve 142 .

[0130] The secondary solvent pump 166 is, for example, arranged downstream of a solvent tank (not shown).

[0131] Furthermore, each component product supply passage 116 , 118 includes a respective secondary pump 160 , 162 adapted to pump the respective component product to the inlet 126 of the metering pump 114 .

[0132] Each respective secondary pump 160 , 162 is arranged upstream of a respective valve 134 , 136 of the supply passage 116 , 118 .

[0133] Each respective secondary pump 160 , 162 is, for example, arranged downstream of a respective tank (not shown).

[0134] exist Figure 2 In the example shown, the metering pump 114 draws in the fluid during the suction phase by so-called active suction, i.e. the fluid is pushed by the corresponding secondary pump or compressor towards the inlet 126. During the suction phase, the metering pump 114 then draws in the pushed fluid, more specifically, one or more fluids from the channels whose corresponding valves are in the open configuration.

[0135] Such coating device 12 , 112 can coat the coating product quantitatively measured by the metering device 10 , and more specifically, coat the coating product by discharging the coating product at the coater 13 , 113 .

[0136] More specifically, the metering device 12, 112 is capable of metering different component products to form a single-component product or a multi-component product, preferably a multi-component product, more specifically, here, by selectively moving the valves 34, 36, 134, 136 to the open configuration during the suction phase of the metering pump 14, 114 according to the component products used to form the multi-component product.

[0137] The metering is carried out and controlled, for example, by the electronic device 24 , 124 .

[0138] In reference Figure 3 In the described pump examples, a multi-component product is premixed, for example, by moving a piston head.

[0139] The multi-component products are mixed, for example, by mixers 45 , 145 on outlet lines 44 , 144 .

[0140] The one-component or multi-component product, preferably the multi-component product, which forms the coating product is then discharged from the applicator 13 , 113 , more specifically towards the surface to be coated.

[0141] After the coating step, the multi-component product is thus present in the coating device 12, 112. The coating device 12, 112 is then rinsed, for example.

[0142] A flushing method for flushing the paint product applying apparatus as described above will now be described.

[0143] The flushing method comprises a pumping step of pumping a certain amount by the metering pump during a pumping phase of the metering pump, during which the gas valve and the solvent valve are alternately in an open configuration one after the other so that the amount sucked in during the pumping phase alternately comprises gas and solvent.

[0144] More specifically, the flushing method comprises such a pumping step during each pumping phase of the metering pump 14 , 114 during the entire flushing duration.

[0145] The control module 48 , 148 implements the pumping step by sequentially controlling the valves, more specifically the gas valve and the solvent valve.

[0146] The minimum amount of solvent sucked in during the valve opening is, for example, greater than or equal to 0.5 cubic centimeters, more particularly greater than or equal to 1 cubic centimeter, and more particularly between 1 and 20 cubic centimeters.

[0147] The maximum amount of solvent sucked in during the valve opening is, for example, less than or equal to 1000 cubic centimeters, more particularly between 300 and 1000 cubic centimeters.

[0148] The gas valve 40, 140 moves to the open configuration for a duration of, for example, between 1 pump cycle and 100 pump cycles, more particularly between 4 pump cycles and 10 pump cycles.

[0149] At any time, no more than one valve in a gas or solvent supply channel may be open at a time.

[0150] Specifically, the suction comprises the following steps in the following order:

[0151] - Open the first valve among the gas valve and the solvent valve,

[0152] - a first amount of gas or solvent is sucked in by a metering pump,

[0153] - Close the first valve,

[0154] - opening a second valve among the gas valve and the solvent valve, the second valve being different from the first valve,

[0155] - inhaling a second amount of solvent or gas, and

[0156] - Close the second valve,

[0157] The above steps are repeated throughout the entire suction phase of the metering pump 14 , 114 .

[0158] The first amount remains constant throughout all suction phases, in particular during all suction phases of irrigation.

[0159] The second amount remains constant throughout all suction phases, in particular during all suction phases of irrigation.

[0160] More specifically here, the suction has a suction cycle comprising gas suction and solvent suction by a metering pump, which is repeated throughout the suction phase, more specifically during all suction phases of flushing.

[0161] If a puff cycle is in progress at the end of a puff phase, the puff cycle will be resumed where it left off during the following puff phase.

[0162] For example, for a pump suction volume of 100cc, if the amount of solvent to be sucked is 32cc and the amount of air is 55cc, during the first suction phase, for example, the following amounts are sucked in sequence: 32cc of solvent, 55cc of air, and then only 13cc of solvent. Therefore, the second suction phase begins with sucking in 19cc of solvent, then 55cc of air, then 26cc of solvent, and so on for the subsequent suction phases.

[0163] Here, during each suction phase of the metering pump 14 , 114 , the volume sucked in by the metering pump comprises alternating solvent and gas which repeat along the suction volume.

[0164] Alternatively, the amount of solvent and / or air to be sucked in is greater than or equal to the suction volume of the pump. Where appropriate, the amount sucked in by the metering pump 14, 114 during the suction phase may include only solvent or gas. However, during all suction phases of the metering pump 14, 114, the amount sucked in by the metering pump includes alternating solvent and gas that repeat along the suction volume.

[0165] For example, if the amount of solvent to be sucked in is 78 cc and the amount of air is 105 cc at a pump suction volume of 25 cc, a plurality of suction phases follow one another in order to pump the appropriate amount of air on the one hand and solvent on the other hand.

[0166] The flushing method advantageously comprises detecting the volume sucked in by the metering pump during the suction process, more particularly by means of the sensor 46 , 146 .

[0167] In a first embodiment, the amount of gas (here air) sucked in is detected directly at the metering pump.

[0168] In a second embodiment, the amount of compressed gas (here air) entering the metering pump is detected, for example, at the compressor 164 by starting the compressor 164 for a given period of time. Additionally or alternatively, the amount of compressed gas (here air) entering the metering pump is detected directly at the metering pump.

[0169] During the suction process, when the metering pumps 14, 114 inhale the solvent, when the amount of solvent inhaled monitored by the monitoring modules 50, 150 reaches the required amount, the control modules 48, 148 send an instruction to the solvent valve to switch the solvent valve to a closed configuration, and then send an instruction to the gas valve to switch the gas valve to an open configuration.

[0170] Then, for example, when the amount of inhaled gas monitored by the monitoring modules 50, 150 reaches the required amount, more specifically, in the first embodiment, the control modules 48, 148 send an instruction to the gas valve to switch the gas valve to a closed configuration, and then send an instruction to the solvent valve to switch the solvent valve to an open configuration, and so on.

[0171] Alternatively, in a second embodiment, when the gas valve 140 and the compressor 164 are respectively kept open and started for a given period of time, the control modules 48, 148 send a command to the gas valve to switch the gas valve to a closed configuration, and then send a command to the solvent valve to switch the solvent valve to an open configuration, and so on.

[0172] In the example, during the suction process, the metering pump 14 , 114 also discharges a portion of the fluid at the outlet 28 , which portion of the fluid here is half the cylinder capacity of the metering pump.

[0173] The fluid includes a solvent and a gas, and the gas here is air, such as compressed air.

[0174] For example, in reference Figure 3 In the described pump example, the fluids are premixed by movement of the piston head.

[0175] The fluids are mixed, for example, by a mixer 45 , 145 located on the outlet line 44 , 144 .

[0176] Produces an emulsion.

[0177] The emulsion flows along outlet line 44 , 144 to applicator 13 , 113 .

[0178] The applicator 13, 113 is therefore also flushed with the emulsion.

[0179] When the metering pump comprises a suction phase and a non-suction phase, during the non-suction phase all valves are, for example, in a closed configuration.

[0180] Alternatively, if during a suction phase the intake volume of the last aspirated fluid is not reached, the corresponding valve remains in an open configuration during the non-suction phase and will close during the next suction phase when the intake volume is reached.

[0181] Therefore, the flushing method alternately comprises steps with suction and steps without suction.

[0182] In the above example, during the non-suction step, the metering pump discharges at the outlet 28 a supplementary portion of the fluid portion that has been discharged during suction, here half the cylinder capacity of the metering pump.

[0183] As mentioned above, the fluid includes a solvent and a gas, and the gas here is air, such as compressed air.

[0184] In reference Figure 3 In the described pump examples, the fluids are premixed, for example, by movement of the piston head.

[0185] The fluids are mixed, for example, by a mixer 45 , 145 located on the outlet line 44 , 144 .

[0186] Produces an emulsion.

[0187] The emulsion flows along outlet line 44 , 144 to applicator 13 , 113 .

[0188] The applicator 13, 113 is therefore also flushed with the emulsion.

[0189] The flushing method is carried out directly by the electronics 24 , 124 of the coating device 12 , 112 .

[0190] More specifically, the control module 48 , 148 implements the suction by sequentially controlling the gas valve 40 , 140 and the solvent valve 42 , 142 .

[0191] Advantageously, the monitoring module 50 , 150 is capable of monitoring the amount (volume and / or time) of solvent and gas sucked by the metering pump 14 , 114 .

[0192] Therefore, flushing can be performed without any human intervention.

[0193] In addition, the solvent and gas are alternately introduced into the inlet space of the metering pump, which produces an emulsion for flushing the coating device. Therefore, the amount of solvent used for flushing is reduced.

Claims

1. A method for flushing a coating product coating device (12; 112), the coating product coating device comprising a metering device (10; 110) and a coating product applicator (13; 113), the metering device (10; 110) comprising a metering pump (14; 114), the metering pump having an inlet (26; 126) and an outlet (28; 128), the inlet (26; 126) being connected to a gas supply channel (20; 120) and a solvent supply channel (22; 122), the outlet (28; 128) being connected to the coating product applicator (13; 113), the gas supply channel (20; 120) being provided with a gas valve (40; 140), the solvent supply channel (22; 122) being provided with a solvent valve (42; 142), the gas supply channel (20; 120) being provided with a gas valve (40; 140), the solvent supply channel (22; 122) being provided with a solvent valve (42; 142), Each of the valves (40, 42; 140, 142) has at least one closed configuration and at least one open configuration, in which the valves (40, 42; 140, 142) respectively prevent gas and solvent from passing to the inlet, and in which the valves (40, 42; 140, 142) respectively allow gas and solvent to pass to the inlet, the flushing method comprising at least one suction step as follows: during at least one suction phase of the metering pump (14; 114), a certain amount is sucked by the metering pump (14; 14); the gas valve (40; 140) and the solvent valve (42; 142) are alternately in the open configuration during the at least one suction phase, so that the amount sucked in during the at least one suction phase alternately includes gas and solvent, The flushing method also includes detecting the amount sucked in by the metering pump (14; 114) during suction. During suction, when the metering pump (14; 114) sucks in the solvent, when the amount of solvent sucked in monitored by the monitoring module (50; 150) reaches the required amount, the control module (48; 148) sends an instruction to the solvent valve to switch the solvent valve to a closed configuration, and then sends an instruction to the gas valve to switch the gas valve to an open configuration. Then, when the amount of gas sucked in monitored by the monitoring module (50; 150) reaches the required amount, the control module (48; 148) sends an instruction to the gas valve to switch the gas valve to a closed configuration, and then sends an instruction to the solvent valve to switch the solvent valve to an open configuration, and so on.

2. The flushing method according to claim 1, wherein: The at least one suction step comprises the following steps in the following order: opening a first valve among the gas valve (40; 140) and the solvent valve (42; 142), sucking a first amount of gas or solvent by the metering pump (14; 114), closing the first valve, opening a second valve among the gas valve (40; 140) and the solvent valve (42; 142) different from the first valve, sucking a second amount of solvent or gas by the metering pump (14; 114), and closing the second valve, and repeating the aforementioned steps throughout the at least one suction stage.

3. The flushing method according to claim 1 or 2, wherein: The pumping includes a pumping cycle, which includes gas pumping and solvent pumping performed by a metering pump (14; 114), and the pumping cycle is repeated throughout the pumping stage.

4. The flushing method according to claim 1 or 2, wherein: The amount sucked in by the metering pump (14; 114) during suction is detected by a sensor (46; 146) for the sucked amount or a sensor for the displacement of the metering pump (14; 114).

5. The flushing method according to claim 1 or 2, wherein: The metering device further comprises at least two supply channels (16, 18; 116, 118) for the respective component products.

6. The flushing method according to claim 1 or 2, wherein: The metering pump (14; 114) is a piston pump.

7. The flushing method according to claim 1 or 2, wherein: The gas supply channel (120) is provided with a compressor (164), and the compressor (164) is suitable for compressing gas to the inlet (126) of the metering pump (114) upstream of the gas valve (140). The solvent supply channel (122) is provided with a secondary solvent pump (166), and the secondary solvent valve (166) is suitable for pumping the solvent to the inlet (126) of the metering pump (114). The secondary solvent pump (166) is arranged upstream of the solvent valve (142).

8. The flushing method according to claim 1 or 2, wherein: The metering device (12; 112) comprises a mixer (45; 145) located downstream of an outlet (28; 128) of a metering pump (14; 114).

9. The flushing method according to claim 8, wherein: The mixer (45; 145) is arranged near the outlet of the metering pump (14; 114).

10. A coating product coating device (10; 110), comprising a metering and dosing device (10; 110) and a coating product applicator (13; 113), the metering and dosing device (10; 110) comprising a metering pump (14; 114), a gas supply channel (20; 120) and a solvent supply channel (22; 122), and a control module (48; 148), the metering pump (14, 114) having an inlet (26, 126) and an outlet (28, 128), the inlet (26; 126) being connected to the gas supply channel (20; 120) and the solvent supply channel (22; 122), the outlet (28; 128) being connected to the coating product applicator (13; 113), the gas supply channel (20; 120) being provided with a gas valve (40; 140), and the solvent supply channel (2 2; 122) is provided with a solvent valve (42; 142), each of the gas valve and the solvent valve (40, 42; 140, 142) has at least one closed configuration and at least one open configuration, in the closed configuration, the valves (40, 42; 140, 142) respectively prevent the gas and the solvent from passing to the inlet, and in the open configuration, the valves (40, 42; 140, 142) respectively allow the gas and the solvent to pass to the inlet, the control module (48; 148) is capable of controlling the gas valve (40; 140) and the solvent valve (42; 142), the amount of solvent inhaled and the amount of gas inhaled are monitored by the monitoring module (50; 150), the control module (48; 148) and the monitoring module (50; 150) are constructed to implement suction according to the at least one suction step of the flushing method according to claim 1 or 2.

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