Three-stage clean separation self-balancing water tank structure for filtering silicon slag slurry
By adopting a three-stage clean separation self-balancing water tank structure, the problem that traditional water tank structure cannot effectively separate silicon slag in silicon slurry is solved, efficient silicon slag filtration and multi-equipment sharing is achieved, and product quality and processing efficiency are improved.
Patent Information
- Application Number
- CN202411800101.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-09
- Publication Date
- 2025-03-14
AI Technical Summary
The traditional centrifugal supporting water tank structure has problems such as independent water tanks, multiple pipelines, and large land occupation. It is impossible to effectively separate the silicon slag from the silicon slurry, affecting the product surface quality and processing cost.
The three-stage clean separation self-balancing water tank structure is adopted, and the water tank box is separated into a dirty liquid chamber, a primary filter liquid chamber, a self-sagging chamber and a secondary filter liquid chamber through three partitions to achieve one-way overflow and multiple filtration of the liquid, supporting centrifugal filtration operations of one-to-multiple equipment.
Effectively separate and reduce the silicon slag content in the silicon slurry, improve product surface quality, reduce the proportion and footprint of centrifugal equipment, reduce the demand for cutting fluid, and improve reliability and processing efficiency.
Smart Images

Figure CN119607707A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to a three-stage clean separation self-balancing water tank structure for silicon slag slurry filtering, belonging to the technical field of semiconductor silicon material processing. Background Art
[0002] Single crystal silicon is a key semiconductor material for integrated circuits, and silicon components for etching are key consumables for integrated circuit etching equipment. With the rise of emerging industries such as 5G communications, artificial intelligence, big data, the Internet of Things, and industrial automation, integrated circuits are developing rapidly, driving the development of semiconductor silicon materials. As a result, integrated circuit chips not only have higher and higher requirements for the performance of silicon wafers, but also have increasingly stringent requirements for the precision processing of silicon components on etching machines.
[0003] During the processing, the silicon slag content of the cutting fluid directly affects the surface quality of the product, and also directly affects the frequency of cutting fluid replacement. The slag removal effect of the water tank directly affects the processing cost and processing quality of the product. Most traditional centrifugal supporting water tanks are single-function states, such as: clean water tanks, transfer water tanks, sewage tanks, etc. are all independent water tank structures, connected and overflowed through liquid pipes. In addition, traditional water tanks can only be configured with one processing equipment, and cannot achieve multiple processing. It requires one-to-one configuration of water tanks, centrifuges, bag machines and other equipment, resulting in redundant on-site water tanks, too many pipelines, large occupied space and poor pipeline overflow effect. Summary of the invention
[0004] The purpose of the present invention is to provide a three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration. The water tank structure can effectively separate the silicon slag in the cutting fluid of silicon material processing, reduce the product scratch rate and improve the surface quality. The water tank structure can realize the centrifugal filtration operation of one to multiple devices, reduce the centrifugal equipment ratio, floor space and cutting fluid demand, and improve reliability.
[0005] To achieve the above object, the present invention adopts the following technical solutions: A three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration, wherein the water tank body of the water tank structure is sequentially separated into a dirty liquid chamber, a primary filtration clear liquid chamber, a clear liquid self-sedimentation chamber and a secondary filtration clear liquid chamber by three partitions; The three partitions are arranged to allow only one-way overflow of liquid between two adjacent chambers in the direction from the secondary filtration clear liquid chamber to the dirty liquid chamber; A gap is provided between the lower end of the partition between the primary filtration clear liquid chamber and the clear liquid self-sedimentation chamber and the bottom of the box body, so that liquid can overflow from the primary filtration clear liquid chamber to the clear liquid self-sedimentation chamber; A centrifuge is connected between the liquid outlet of the dirty liquid chamber and the liquid inlet of the primary filtration clear liquid chamber, and a bag filter is connected between the liquid outlet of the clear liquid self-sedimentation chamber and the liquid inlet of the secondary filtration clear liquid chamber; the lower layer of slag-containing liquid in the dirty liquid chamber is output to the centrifuge for primary filtration; the primary filtered clear liquid enters the primary filtration clear liquid chamber and overflows into the clear liquid self-sedimentation chamber, and the clear liquid after self-sedimentation is output to the bag filter for secondary filtration to obtain secondary filtration clear liquid, and the secondary filtration clear liquid is transported to the secondary filtration clear liquid chamber for standby use.
[0006] Preferably, the three partitions are respectively a dirty liquid separation partition, a primary filtration clear liquid partition and a secondary filtration clear liquid partition, wherein the dirty liquid separation partition separates the dirty liquid chamber and the primary filtration clear liquid chamber, and its lower end is sealedly connected to the bottom of the box body, and there is a gap between its upper end and the top of the box body; the primary filtration clear liquid partition separates the primary filtration clear liquid chamber and the clear liquid self-sedimentation chamber, and there are gaps between its upper and lower ends and the top and bottom of the box body, and its upper end is higher than the upper end of the dirty liquid separation partition; the secondary filtration clear liquid partition separates the clear liquid self-sedimentation chamber and the secondary filtration clear liquid chamber, and its lower end is sealedly connected to the bottom of the box body, there is a gap between its upper end and the top of the box body, and its upper end is higher than the upper end of the primary filtration clear liquid partition.
[0007] Preferably, the liquid outlet of the dirty liquid chamber is a sewage extraction port arranged at the bottom of the box body corresponding to the dirty liquid chamber, which is used to extract the lower layer of slag-containing liquid to the centrifuge for filtration.
[0008] Preferably, a sewage drain port is provided at the bottom of the water tank body corresponding to the dirty liquid chamber, which is used to clean the drain valve port of the water tank when changing the liquid.
[0009] Preferably, the bottom of the dirty liquid chamber, the primary filtration clear liquid chamber, and the clear liquid self-sedimentation chamber located on the front side of the water tank body are inclined surfaces, and the inclined surfaces gradually rise from the dirty liquid chamber to the clear liquid self-sedimentation chamber; the bottom of the secondary filtration clear liquid chamber located on the rear side of the water tank body is a horizontal plane and the upper liquid level is high.
[0010] Preferably, the partition is connected and fixed to the inner wall of the box body and is integral with the box body.
[0011] The advantages of the present invention are: The three-stage clean separation self-balancing water tank of the present invention ensures the separation of dirty liquid, primary filtered clear liquid and secondary filtered clear liquid inside the water tank and the self-balancing of the liquid level. Overflow is achieved through the water tank structure partition, and the water tank structure can process silicon slag slurry of multiple devices at the same time, with better slag discharge effect and higher filtration efficiency. Compared with the traditional water tank structure, it reduces the floor space and has a lower construction cost. BRIEF DESCRIPTION OF THE DRAWINGS
[0012] Figure 1 It is a stereoscopic diagram of the three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration of the present invention.
[0013] Figure 2 It is a cross-sectional view of the three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration of the present invention.
[0014] Reference numerals 1 first cover plate, 2 second cover plate, 3 third cover plate, 4 fourth cover plate, 5 water tank body, 6 dirty liquid chamber, 7 dirty liquid separation partition plate, 8 primary filtration clear liquid chamber, 9 primary filtration clear liquid partition plate, 10 clear liquid self-sedimentation chamber, 11 secondary filtration clear liquid partition plate, 12 secondary filtration clear liquid chamber, 13 observation port, 14 centrifuge clear liquid inlet, 15 primary filtration clear liquid outlet, 16 secondary filtration clear liquid outlet, 17 sewage inlet, 18 centrifuge clear liquid reflux hole, 19 reserved inlet hole, 20 secondary filtration clear liquid inlet, 21 sewage discharge port, 22 sewage extraction port. DETAILED DESCRIPTION
[0015] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but this does not mean to limit the protection scope of the present invention.
[0016] like Figure 1 As shown, the three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration of the present invention includes a water tank body 5, a first cover plate 1, a second cover plate 2, a third cover plate 3, and a fourth cover plate 4. Each cover plate is fixed to the tank body by screws, and each inlet and outlet pipeline is connected to the top and a corresponding vertical water pump is placed. Specifically, the first cover plate 1 is provided with an observation port 13 for observing the liquid level; the second cover plate 2 is provided with a centrifuge clear liquid inlet 14, which is connected to the primary filtration clear liquid inlet pipeline; the third cover plate 3 is provided with a primary filtration clear liquid outlet 15, which is connected to a vertical pump, and the clear liquid is transported to the bag filter; the fourth cover plate is provided with a secondary filtration clear liquid outlet 16, which is connected to a vertical pump to extract the final clear liquid for use.
[0017] like Figure 2As shown, three partitions are arranged in the water tank body of the present invention, which sequentially separate the water tank body from the front to the back into a dirty liquid chamber 6, a primary filtration clear liquid chamber 8, a clear liquid self-sedimentation chamber 10 and a secondary filtration clear liquid chamber 12. Among them, the dirty liquid separation partition 7 separates the dirty liquid chamber 6 and the primary filtration clear liquid chamber 8, the lower end of the dirty liquid separation partition 7 is sealedly connected to the bottom of the box body, and there is a gap between the upper end and the top of the box body, so that the overflow of liquid from the primary filtration clear liquid chamber 8 to the dirty liquid chamber 6 is realized above the dirty liquid separation partition 7, and most of the silicon slag is blocked. The primary filtration clear liquid partition 9 separates the primary filtration clear liquid chamber 8 and the clear liquid self-sedimentation chamber 10. There is a gap between the upper end of the primary filtration clear liquid partition 9 and the top of the box body, and its upper end is higher than the upper end of the dirty liquid separation partition 7, so that the liquid can overflow from the clear liquid self-sedimentation chamber 10 to the primary filtration clear liquid chamber 8; and there is also a gap between the lower end of the primary filtration clear liquid partition 9 and the bottom of the box body, so that the liquid can overflow from the bottom of the primary filtration clear liquid chamber 8 to the clear liquid self-sedimentation chamber 10 to settle the silicon slag again. The secondary filtration clear liquid partition 11 separates the clear liquid self-sedimentation chamber 10 and the secondary filtration clear liquid chamber 12. The lower end of the secondary filtration clear liquid partition 11 is sealed and connected to the bottom of the box body, and there is a gap between the upper end and the top of the box body, and its upper end is higher than the upper end of the primary filtration clear liquid partition 9, so that the liquid can overflow from the secondary filtration clear liquid chamber 12 to the clear liquid self-sedimentation chamber 10 in one direction.
[0018] Combination Figure 1 , 2 As shown, the first cover plate 1, the second cover plate 2, the third cover plate 3, and the fourth cover plate 4 correspond to the dirty liquid chamber 6, the primary filtered clear liquid chamber 8, the clear liquid self-sedimentation chamber 10, and the secondary filtered clear liquid chamber 12 in sequence. On the two side walls of the water tank body, a sewage discharge port 21, a sewage extraction port 22, and several sewage inlets 17 are provided corresponding to the dirty liquid chamber 6; several centrifuge clear liquid return holes 18 are provided corresponding to the primary filtered clear liquid chamber 8. During the operation of the machine tool, if the centrifuge performs operations such as scraping residue, the primary filtered clear liquid inlet 14 will stop inletting liquid, and the centrifuge will automatically switch to inletting liquid from the centrifuge clear liquid return hole 18 through the pneumatic valve to ensure that the liquid in the clear liquid chamber 8 continues to flow; several reserved inlet holes 19 are provided corresponding to the clear liquid self-sedimentation chamber 10; and several secondary filtered clear liquid inlets 20 are provided corresponding to the secondary filtered clear liquid chamber 12.
[0019] The water tank structure of the present invention needs to be used in conjunction with an automatic centrifuge and a bag filter. The primary filtration is completed by connecting the centrifuge, the primary clear liquid overflows and self-sedimentation is completed by the water tank structure, and the secondary filtration is completed by the bag filter. The liquids are all transferred and circulated through the centralized water tank. Specifically, the machine tool dirty liquid enters the dirty liquid chamber 6 from the dirty liquid inlet 17 for sedimentation, and the lower layer of slag-containing liquid (sewage) is output from the sewage extraction port 22 to the centrifuge for centrifugal separation. The separated primary filtered clear liquid enters the primary filtered clear liquid chamber 8 from the primary filtered clear liquid inlet 14 on the second cover plate 2. The liquid fills the primary filtered clear liquid chamber 8 and the clear liquid self-sedimentation chamber 10. After the clear liquid in the clear liquid self-sedimentation chamber 10 is self-sedimented, it is output from the primary filtered clear liquid outlet 15 to the bag filter for filtration to obtain the secondary filtered clear liquid (final clear liquid), which is transported to the secondary filtered clear liquid chamber 12 through the secondary filtered clear liquid inlet 20. Therefore, through the water tank structure of the present invention, the cutting fluid is separated into three liquids with different cleanliness levels: the first level of cleanliness is the sewage in the dirty liquid chamber, the second level of cleanliness is the clear liquid after the first filtration, and the third level of cleanliness is the secondary filtered clear liquid (final clear liquid) after the second filtration. The final clear liquid is used by the machine.
[0020] A sewage drain port 21 is provided at the bottom of the water tank body corresponding to the dirty liquid chamber 6, which is used to clean the drain valve port of the water tank when changing the liquid. The dirty liquid chamber 6, the primary filtration clear liquid chamber 8, and the clear liquid self-sedimentation chamber 10 located at the front side of the water tank body are inclined surfaces at the bottom, which gradually rise from the dirty liquid chamber 6 to the clear liquid self-sedimentation chamber 10, so as to facilitate the extraction and filtration of more silicon slag deposition; the bottom of the secondary filtration clear liquid chamber 12 located at the rear side of the water tank body is a horizontal plane with a high upper liquid level, which can ensure the placement stability and realize the full load overflow to achieve the self-balancing function.
[0021] By adopting the water tank structure of the present invention, the liquid level in each cavity is self-balanced through the water tank structure design, and multiple filtering effects of the cutting fluid can be achieved through overflow, etc. Without completely relying on the centrifuge and bag filter, multiple overflows and sedimentation separations of the water tank can further improve the filtering effect of the silicon slag slurry.
[0022] The water tank structure of the present invention can ensure the efficiency and quality of the silicon-based product processing process, reduce the processing and raw and auxiliary materials and equipment costs, and improve the processing economy and yield rate of silicon products. The water tank of the present invention is easy to splice in structure, and can be put into use by connecting the corresponding pipelines and equipment, which is simple and feasible.
[0023] The three-stage clean separation self-balancing water tank structure of the present invention can achieve perfect separation and liquid level overflow balance of dirty liquid, primary filtered clear liquid and final clear liquid. The overflow is only in a single direction, from the cavity with higher cleanliness to the cavity with lower cleanliness. The water tank structure can simultaneously connect multiple devices to realize the function of filtering silicon slag from cutting fluid, improve processing efficiency and quality, save the number and cost of centrifugal equipment, various liquid level sensors and auxiliary consumables, and reduce space occupation area.
Claims
1. A three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration, characterized in that: The water tank structure has three partitions in the tank body to sequentially separate the dirty liquid chamber, the primary filtration clear liquid chamber, the clear liquid self-sedimentation chamber and the secondary filtration clear liquid chamber; The three partitions are arranged to allow only one-way overflow of liquid between two adjacent chambers in the direction from the secondary filtration clear liquid chamber to the dirty liquid chamber; A gap is provided between the lower end of the partition between the primary filtration clear liquid chamber and the clear liquid self-sedimentation chamber and the bottom of the box body, so that liquid can overflow from the primary filtration clear liquid chamber to the clear liquid self-sedimentation chamber; A centrifuge is connected between the liquid outlet of the dirty liquid chamber and the liquid inlet of the primary filtration clear liquid chamber, and a bag filter is connected between the liquid outlet of the clear liquid self-sedimentation chamber and the liquid inlet of the secondary filtration clear liquid chamber; the lower layer of slag-containing liquid in the dirty liquid chamber is output to the centrifuge for primary filtration; the primary filtered clear liquid enters the primary filtration clear liquid chamber and overflows into the clear liquid self-sedimentation chamber, and the clear liquid after self-sedimentation is output to the bag filter for secondary filtration to obtain secondary filtration clear liquid, and the secondary filtration clear liquid is transported to the secondary filtration clear liquid chamber for standby use.
2. The three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration according to claim 1 is characterized in that: The three partitions are respectively a dirty liquid separation partition, a primary filtration clear liquid partition and a secondary filtration clear liquid partition, wherein the dirty liquid separation partition separates the dirty liquid chamber and the primary filtration clear liquid chamber, and its lower end is sealedly connected to the bottom of the box body, and there is a gap between its upper end and the top of the box body; the primary filtration clear liquid partition separates the primary filtration clear liquid chamber and the clear liquid self-sedimentation chamber, and there are gaps between its upper and lower ends and the top and bottom of the box body, and its upper end is higher than the upper end of the dirty liquid separation partition; the secondary filtration clear liquid partition separates the clear liquid self-sedimentation chamber and the secondary filtration clear liquid chamber, and its lower end is sealedly connected to the bottom of the box body, there is a gap between its upper end and the top of the box body, and its upper end is higher than the upper end of the primary filtration clear liquid partition.
3. The three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration according to claim 1 or 2 is characterized in that: The liquid outlet of the dirty liquid cavity is a sewage liquid extraction port arranged at the bottom of the box body corresponding to the dirty liquid cavity, which is used to extract the lower layer of slag-containing liquid to the centrifuge for filtration.
4. The three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration according to claim 1 or 2 is characterized in that: A sewage discharge port is also provided at the bottom of the water tank body corresponding to the dirty liquid cavity, which is used to clean the drainage valve port of the water tank when changing the liquid.
5. The three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration according to claim 1 or 2, characterized in that: The bottom of the dirty liquid chamber, the primary filtration clear liquid chamber, and the clear liquid self-sedimentation chamber located on the front side of the water tank body are inclined surfaces, and the inclined surfaces gradually rise from the dirty liquid chamber to the clear liquid self-sedimentation chamber; the bottom of the secondary filtration clear liquid chamber located on the rear side of the water tank body is a horizontal plane and the upper liquid level is high.
6. The three-stage clean separation self-balancing water tank structure for silicon slag slurry filtration according to claim 1 or 2, characterized in that: The partition is connected and fixed to the inner wall of the box body and is integrated with the box body.