Substrate processing apparatus and substrate processing method

Abstract

The invention provides a substrate processing apparatus and a substrate processing method which can determine a processing liquid in a processing liquid supply part with high precision. A substrate processing apparatus (100) includes a nozzle (136), a processing liquid supply unit (200), a near-infrared light source (140), a near-infrared imaging unit (150), and a control unit (102). The nozzle supplies a processing liquid to an upper surface (Wa) of a substrate (W). The processing liquid supply unit supplies a plurality of processing liquids to the nozzle. The near-infrared light source irradiates a region including at least a portion of the processing liquid supply unit with near-infrared light. The near-infrared imaging unit generates a captured image obtained by capturing an image of the processing liquid irradiated with the near-infrared ray. The control unit controls the processing liquid supply unit and the near-infrared imaging unit. The control unit determines the type of the processing liquid in a region including at least a part of the processing liquid supply unit on the basis of the captured image.

Description

Technical Field

[0001] The invention relates to a substrate processing device and a substrate processing method. Background Art

[0002] A substrate processing apparatus that supplies processing liquid to a substrate and processes the substrate is known (for example, see Patent Document 1). Patent Document 1 describes a substrate processing apparatus including a multivalve that supplies a plurality of processing liquids and a processing liquid nozzle that supplies the processing liquid from the multivalve to the substrate.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2023-4684 Summary of the invention

[0006] In the substrate processing device described in Patent Document 1, for example, when the type of processing liquid supplied from the multi-valve to the processing liquid nozzle is switched, the open and closed state of the valve of the multi-valve connected to the processing liquid supply source is changed. In this case, it is difficult to confirm whether the processing liquid in the flow path of the multi-valve has been switched. Specifically, usually, since the processing liquid used in substrate processing is transparent, the processing liquid cannot be detected using a conventional CCD camera. Therefore, it is sometimes impossible to determine the processing liquid in the multi-valve with high precision.

[0007] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of accurately determining a processing liquid in a processing liquid supply unit.

[0008] According to one aspect of the present invention, a substrate processing device includes a substrate holding portion, a processing liquid nozzle, a processing liquid supply portion, at least one near-infrared light source, a near-infrared camera portion, and a control portion. The substrate holding portion holds a substrate. The processing liquid nozzle supplies processing liquid to the upper surface of the substrate. The processing liquid supply portion supplies a plurality of processing liquids to the processing liquid nozzle. The at least one near-infrared light source irradiates an area including at least a portion of the processing liquid supply portion with near-infrared rays. The near-infrared camera portion generates a captured image of the processing liquid irradiated with the near-infrared rays from the near-infrared light source. The control portion controls the processing liquid supply portion and the near-infrared camera portion. The control portion determines the type of the processing liquid in the area including at least a portion of the processing liquid supply portion based on the captured image.

[0009] In one embodiment, the control unit controls the processing liquid supply unit to switch the type of the processing liquid and supply the processing liquid to the processing liquid nozzle.

[0010] In one embodiment, the control unit controls the processing liquid supply unit based on a result of determining the type of the processing liquid.

[0011] In one embodiment, the treatment liquid supply unit has a plurality of upstream pipes, a common pipe and a downstream pipe. The plurality of upstream pipes are used to circulate the plurality of treatment liquids respectively. The common pipe is connected to the downstream ends of the plurality of upstream pipes. The upstream end of the downstream pipe is connected to the common pipe, and the treatment liquid nozzle supplies the treatment liquid.

[0012] In one embodiment, the near-infrared light source irradiates a region including the common pipe with near-infrared rays. The control unit specifies the type of the processing liquid in the region including the common pipe based on the captured image.

[0013] In one embodiment, the common pipe is composed of a multi-valve.

[0014] In one embodiment, the processing liquid supply unit includes a discharge pipe having an upstream end connected to the common pipe and discharging the processing liquid.

[0015] In one embodiment, the near-infrared light source irradiates a region including the discharge pipe with near-infrared rays. The control unit specifies the type of the processing liquid in the region including the discharge pipe based on the captured image.

[0016] In one embodiment, the control unit controls the processing liquid supply unit to supply the first processing liquid to the processing liquid nozzle via the common piping, and then supplies the first processing liquid to the discharge piping via the common piping. Thereafter, the second processing liquid is supplied to the discharge piping via the common piping, and when it is detected based on the captured image that the processing liquid in the common piping or the discharge piping is switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common piping.

[0017] In one embodiment, the at least one near-infrared light source is provided in plurality. The plurality of near-infrared light sources have near-infrared rays emitted with different peak wavelengths. The control unit acquires type information indicating the type of the treatment liquid, and changes the near-infrared light source that irradiates an area including at least a portion of the treatment liquid supply unit based on the acquired type information.

[0018] According to another aspect of the present invention, a substrate processing method includes the following steps: a step of holding a substrate and rotating the substrate; and a step of supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to the upper surface of the substrate. The step of supplying the processing liquid includes the following steps: a step of irradiating an area including at least a portion of the processing liquid supply unit with near-infrared rays; a step of generating a captured image obtained by capturing the processing liquid irradiated with the near-infrared rays; and a step of determining the type of the processing liquid in the area including at least a portion of the processing liquid supply unit based on the captured image.

[0019] In one embodiment, in the step of supplying the processing liquid, the type of the processing liquid is switched and supplied to the processing liquid nozzle.

[0020] In one embodiment, in the step of supplying the processing liquid, the processing liquid supply unit is controlled based on a result of identifying the type of the processing liquid.

[0021] In one embodiment, the treatment liquid supply unit has a plurality of upstream pipes, a common pipe and a downstream pipe. The plurality of upstream pipes are used to circulate the plurality of treatment liquids respectively. The common pipe is connected to the downstream ends of the plurality of upstream pipes. The upstream end of the downstream pipe is connected to the common pipe to supply the treatment liquid to the treatment liquid nozzle.

[0022] In one embodiment, in the step of irradiating with near infrared rays, a region including the common pipe is irradiated with near infrared rays. In the step of determining, a type of the processing liquid in the region including the common pipe is determined based on the captured image.

[0023] In one embodiment, the common pipe is composed of a multi-valve.

[0024] In one embodiment, the processing liquid supply unit includes a discharge pipe having an upstream end connected to the common pipe and discharging the processing liquid.

[0025] In one embodiment, in the step of irradiating with near infrared rays, a region including the discharge pipe is irradiated with near infrared rays. In the step of specifying, the type of the processing liquid in the region including the discharge pipe is specified based on the captured image.

[0026] In one embodiment, in the process of supplying the processing liquid, after the first processing liquid is supplied to the processing liquid nozzle via the common piping, the first processing liquid is supplied to the exhaust pipe via the common piping, and then the second processing liquid is supplied to the exhaust pipe via the common piping. When it is detected based on the captured image that the processing liquid in the common piping or the exhaust pipe is switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common piping.

[0027] In one embodiment, the process of supplying the processing liquid includes the following steps: a process of acquiring type information indicating the type of the processing liquid; and a process of changing the peak wavelength of near-infrared light irradiated to an area including at least a portion of the processing liquid supply part based on the acquired type information.

[0028] Effects of the Invention

[0029] According to the present invention, it is possible to provide a substrate processing apparatus and a substrate processing method capable of accurately determining the processing liquid in a processing liquid supply unit. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a schematic cross-sectional view of the substrate processing apparatus according to this embodiment.

[0031] Figure 2 It is a schematic diagram of a substrate processing unit in a substrate processing apparatus.

[0032] Figure 3 is a block diagram of a substrate processing apparatus.

[0033] Figure 4 It is a flowchart of the substrate processing method of this embodiment.

[0034] Figure 5 It is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment.

[0035] Figure 6 Detailed description of the process of substrate processing is given in FIG.

[0036] Figure 7 It is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment.

[0037] Figure 8 It is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment.

[0038] Fig. 9 It is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment.

[0039] Fig.10 It is a schematic diagram showing the structure of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment.

[0040] Fig.11 It is a schematic diagram of a substrate processing unit in a substrate processing apparatus having a plurality of near-infrared light sources.

[0041] The reference numerals are described as follows:

[0042] 100: Substrate processing device

[0043] 102: Control Department

[0044] 120: Substrate holding part

[0045] 136: Nozzle (treatment liquid nozzle)

[0046] 140, 140a, 140b: Near infrared light source

[0047] 150: Near infrared camera unit

[0048] 200: Processing liquid supply unit

[0049] 210a, 210b: Upstream piping

[0050] 220: Shared piping

[0051] 230: Downstream piping

[0052] 240: Discharge piping

[0053] 300: Multi-valve

[0054] L1: First treatment liquid

[0055] L2: Second treatment liquid

[0056] S15: Step (Process of Acquiring Type Information)

[0057] S16: Step (Step of irradiating with near infrared rays, step of changing the peak wavelength of near infrared rays)

[0058] S17: Step (Process of Generating Photographed Image)

[0059] S18: Step (Process of Determining the Type of Treatment Liquid)

[0060] SB: Step (process of rotating the substrate)

[0061] SC: Step (process of supplying multiple treatment liquids)

[0062] W: substrate

[0063] Wa: upper surface DETAILED DESCRIPTION

[0064] Hereinafter, embodiments of the substrate processing device and the substrate processing method of the present invention are described with reference to the accompanying drawings. It should be noted that in the drawings, the same or equivalent parts are marked with the same reference numerals and no repeated description is made. It should be noted that in the specification of this application, in order to facilitate the understanding of the invention, mutually orthogonal X-axis, Y-axis and Z-axis are sometimes recorded. Typically, the X-axis and the Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0065] First, refer to Figure 1 A substrate processing apparatus 100 according to this embodiment will be described. Figure 1 1 is a schematic top view of the substrate processing apparatus 100 .

[0066] like Figure 1 As shown, the substrate processing apparatus 100 processes the substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of etching, surface processing, imparting characteristics, forming a process film, removing at least a portion of a film, and cleaning.

[0067] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W is substantially disk-shaped. Here, the substrate processing apparatus 100 processes the substrates W one by one.

[0068] like Figure 1 As shown, the substrate processing apparatus 100 includes a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid box 10B, a plurality of loading ports LP, an indexer robot IR, a central robot CR and a control device 101. The control device 101 controls the loading ports LP, the indexer robot IR, the central robot CR and the substrate processing units 110.

[0069] Each loading port LP accommodates a plurality of substrates W in a stacked manner. The indexer robot IR transports the substrates W between the loading port LP and the central robot CR. It should be noted that the device may also be configured as follows: a setting table (transfer unit) for temporarily placing the substrates W is provided between the indexer robot IR and the central robot CR, and the substrates W are indirectly transferred between the indexer robot IR and the central robot CR via the setting table. The central robot CR transports the substrates W between the indexer robot IR and the substrate processing unit 110. Each substrate processing unit 110 sprays a processing liquid onto the substrate W to process the substrate W. The fluid cabinet 10A accommodates the processing liquid. It should be noted that the fluid cabinet 10A may also accommodate gas.

[0070] The plurality of substrate processing units 110 form a plurality of towers TW (in a plan view) arranged so as to surround the central robot CR. Figure 1Each tower TW includes a substrate processing unit 110 stacked up and down (in Figure 1 There are three substrate processing units 110 in the figure. The fluid boxes 10B correspond to the multiple towers TW respectively. The processing liquid in the fluid cabinet 10A is supplied to all the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via a certain fluid box 10B. In addition, the gas in the fluid cabinet 10A is supplied to all the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via a certain fluid box 10B.

[0071] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose computing unit.

[0072] The storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may also include a removable medium. The control unit 102 executes a computer program stored in the storage unit 104 to perform substrate processing operations.

[0073] The storage unit 104 stores data. The data includes process data. The process data includes information indicating a plurality of processes. The plurality of processes respectively define the processing contents and processing steps of the substrate W.

[0074] In addition, the storage unit 104 may store the brightness value or lightness of the reference processing liquid. Alternatively, the storage unit 104 may store a reference image obtained by photographing the reference processing liquid.

[0075] Next, refer to Figure 2 The substrate processing unit 110 in the substrate processing apparatus 100 according to the present embodiment will be described. Figure 2 2 is a schematic diagram of a substrate processing unit 110 in the substrate processing apparatus 100 .

[0076] The substrate processing unit 110 includes a chamber 112, a substrate holding portion 120, a nozzle 136, a processing liquid supply portion 200, a near-infrared light source 140, and a near-infrared imaging portion 150. The chamber 112 accommodates at least a portion of the substrate holding portion 120, the nozzle 136, the processing liquid supply portion 200, the near-infrared light source 140, and the near-infrared imaging portion 150. It should be noted that the nozzle 136 is an example of a "processing liquid nozzle" of the present invention.

[0077] The chamber 112 is substantially box-shaped with an internal space. The chamber 112 accommodates the substrate W. Here, the substrate processing unit 110 is a single-wafer type that processes the substrates W one by one, and accommodates one substrate W in the chamber 112 at a time. The substrate W is accommodated in the chamber 112 and processed in the chamber 112 .

[0078] The substrate holding part 120 holds the substrate W. The substrate holding part 120 holds the substrate W horizontally in such a manner that the upper surface (front surface) Wa of the substrate W faces upward and the lower surface (back surface) Wb of the substrate W faces vertically downward. In addition, the substrate holding part 120 rotates the substrate W while holding the substrate W. The upper surface Wa of the substrate W may also be flattened. Alternatively, a device surface or a columnar stack with grooves may be provided on the upper surface Wa of the substrate W. The substrate holding part 120 rotates the substrate W while holding the substrate W.

[0079] For example, the substrate holding portion 120 may also adopt a clamping type that clamps the end of the substrate W. Alternatively, the substrate holding portion 120 may also have an arbitrary mechanism that holds the substrate W from the lower surface Wb of the substrate W. For example, the substrate holding portion 120 may also adopt a vacuum type. In this case, the substrate holding portion 120 holds the substrate W horizontally by adsorbing the central portion of the lower surface Wb of the substrate W, which is a non-device forming surface, to the upper surface. Alternatively, the substrate holding portion 120 may also use a combination of a vacuum type and a clamping type that makes a plurality of chuck pins contact the peripheral end surface of the substrate W.

[0080] For example, the substrate holding unit 120 includes a rotating base 121, a chuck member 122, a shaft 123, an electric motor 124, and a housing 125. The chuck member 122 is provided on the rotating base 121. The chuck member 122 clamps the substrate W. Typically, a plurality of chuck members 122 are provided on the rotating base 121.

[0081] The shaft 123 is a hollow shaft and extends in the vertical direction along the rotation axis Ax. The spin base 121 is coupled to the upper end of the shaft 123 . The substrate W is placed on the spin base 121 .

[0082] The rotating base 121 is in the shape of a disk. The chuck member 122 horizontally supports the substrate W. The shaft 123 extends downward from the center of the rotating base 121. The electric motor 124 imparts a rotational force to the shaft 123. The electric motor 124 rotates the shaft 123 in a rotation direction, thereby rotating the substrate W and the rotating base 121 around the rotation axis Ax. The housing 125 surrounds the shaft 123 and the electric motor 124.

[0083] The nozzle 136 discharges the processing liquid onto the upper surface Wa of the substrate W. Specifically, the nozzle 136 supplies the processing liquid to the upper surface Wa of the substrate W held and rotated by the substrate holding portion 120. In addition, the nozzle 136 supplies a plurality of processing liquids to the substrate W. In the present embodiment, the nozzle 136 switches the type of processing liquid and supplies it. The nozzle 136 is preferably configured to be movable relative to the substrate W. The nozzle 136 is made of resin. The nozzle 136 is not particularly limited, and is, for example, formed of PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0084] The processing liquid may also be an etching liquid for etching the substrate W. Examples of the etching liquid include nitric acid fluoride (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3)), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of etching liquid is not particularly limited, and for example, it may be acidic or alkaline.

[0085] Alternatively, the treatment liquid may include hydrogen peroxide solution. Alternatively, the treatment liquid may include SC1 (a mixture of ammonia and hydrogen peroxide solution), SC2 (a mixture of hydrochloric acid and hydrogen peroxide solution), or aqua regia (a mixture of concentrated hydrochloric acid and concentrated nitric acid).

[0086] Alternatively, the treatment liquid may be a rinse liquid. Examples of the rinse liquid include deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water, and reduced water (hydrogen water).

[0087] Alternatively, the treatment liquid may be an organic solvent. Typically, the volatility of the organic solvent is higher than that of the rinse liquid. Examples of the organic solvent include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoroether (HFE), propylene glycol ethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0088] The processing liquid supply unit 200 supplies the processing liquid to the nozzle 136. In the present embodiment, the processing liquid supply unit 200 supplies a plurality of processing liquids to the nozzle 136. In the present embodiment, the processing liquid supply unit 200 switches the type of processing liquid to the nozzle 136 and supplies the processing liquid.

[0089] The processing liquid supply unit 200 includes an upstream pipe 210a, an upstream pipe 210b, a common pipe 220, a downstream pipe 230, and a discharge pipe 240. At least a portion of the upstream pipe 210a, at least a portion of the upstream pipe 210b, the common pipe 220, a portion of the downstream pipe 230, and at least a portion of the discharge pipe 240 are disposed in the fluid box 10B.

[0090] The treatment liquid flows through the upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, and the discharge pipe 240. A plurality of treatment liquids flow through the upstream pipe 210a and the upstream pipe 210b, respectively. In other words, different types of treatment liquids flow through the upstream pipe 210a and the upstream pipe 210b, respectively. In the present embodiment, for example, carbonated water (H2CO3) from a supply source flows through the upstream pipe 210a. In addition, in the present embodiment, for example, SC2 from a supply source flows through the upstream pipe 210b.

[0091] The downstream end of the upstream pipe 210 a and the downstream end of the upstream pipe 210 b are connected to the common pipe 220 .

[0092] The processing liquids from the upstream pipe 210a and the upstream pipe 210b flow into the common pipe 220. The processing liquids from the upstream pipe 210a and the upstream pipe 210b may flow into the common pipe 220 at the same time or at different timings. In the present embodiment, after the processing liquid from the upstream pipe 210b flows into the common pipe 220, the processing liquid from the upstream pipe 210a flows into the common pipe 220.

[0093] The downstream pipe 230 is connected to the common pipe 220. Specifically, the upstream end of the downstream pipe 230 is connected to the common pipe 220. The processing liquid from the common pipe 220 flows to the downstream pipe 230. In addition, the downstream end of the downstream pipe 230 is connected to the nozzle 136. The downstream pipe 230 supplies the processing liquid from the common pipe 220 to the nozzle 136. By circulating the processing liquid in the nozzle 136, the nozzle 136 discharges the processing liquid onto the upper surface Wa of the substrate W.

[0094] The discharge pipe 240 is connected to the common pipe 220. Specifically, the upstream end of the discharge pipe 240 is connected to the common pipe 220. The processing liquid from the common pipe 220 flows into the discharge pipe 240. In addition, the downstream end of the discharge pipe 240 is connected to, for example, a processing liquid tank 290. For example, when the processing liquid supplied to the nozzle 136 is switched, the processing liquid is supplied from the common pipe 220 to the discharge pipe 240.

[0095] In addition, the processing liquid supply unit 200 has an upstream valve 251a, an upstream valve 251b, a downstream valve 252 and a discharge valve 253. The upstream valve 251a opens and closes the flow path in the upstream piping 210a. The upstream valve 251b opens and closes the flow path in the upstream piping 210b. The downstream valve 252 opens and closes the flow path in the downstream piping 230. The discharge valve 253 opens and closes the flow path in the discharge piping 240. The upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the discharge valve 253 are not particularly limited, and are, for example, air valves. It should be noted that the upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the discharge valve 253 may be valves other than air valves, and may also have a needle valve capable of changing the flow rate and / or a speed controller capable of changing the opening and closing speed.

[0096] The processing liquid supply unit 200 is made of resin. The processing liquid supply unit 200 transmits near infrared rays emitted from the near infrared light source 140. Specifically, the upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230, and the discharge piping 240 are made of resin, and transmit near infrared rays emitted from the near infrared light source 140. In the present embodiment, the upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230, the discharge piping 240, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 are made of resin, and transmit near infrared rays emitted from the near infrared light source 140. The upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, the discharge pipe 240, the upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the discharge valve 253 are not particularly limited and are formed of, for example, PFA or PTFE.

[0097] The processing liquid supply unit 200 has a moving mechanism 138. The moving mechanism 138 moves the nozzle 136 in the horizontal direction and the vertical direction. Specifically, the moving mechanism 138 moves the nozzle 136 in a circumferential direction around a rotation axis extending in the vertical direction. In addition, the moving mechanism 138 moves the nozzle 136 up and down in the vertical direction.

[0098] The moving mechanism 138 includes an arm 138a, a shaft 138b, and a driving portion 138c. The arm 138a extends in the horizontal direction. The nozzle 136 is arranged at the front end of the arm 138a. The nozzle 136 is arranged at the front end of the arm 138a in a posture and form that can supply a processing liquid toward the upper surface Wa of the substrate W held by the chuck component 122. In detail, the nozzle 136 is connected to the front end of the arm 138a and protrudes downward from the arm 138a. The base end of the arm 138a is connected to the shaft 138b. The shaft 138b extends in the vertical direction.

[0099] The driving part 138c has a rotation driving mechanism and a lifting driving mechanism. The rotation driving mechanism of the driving part 138c rotates the shaft part 138b around the rotation axis, and rotates the arm part 138a along the horizontal plane around the shaft part 138b. As a result, the nozzle 136 moves along the horizontal plane. In detail, the nozzle 136 moves in the circumferential direction around the shaft part 138b. The rotation driving mechanism of the driving part 138c includes, for example, a motor capable of forward and reverse rotation.

[0100] The lifting drive mechanism of the driving unit 138c lifts the shaft 138b in the vertical direction. The lifting drive mechanism of the driving unit 138c lifts the shaft 138b, so that the nozzle 136 is lifted in the vertical direction. The lifting drive mechanism of the driving unit 138c includes a driving source such as a motor and a lifting mechanism, and the lifting mechanism is driven by the driving source to lift or lower the shaft 138b. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

[0101] The near-infrared light source 140 emits at least near-infrared rays. The near-infrared light source 140 irradiates an area including at least a portion of the processing liquid supply unit 200 with near-infrared rays. In the present embodiment, the near-infrared light source 140 irradiates an area outside the chamber 112 and including at least a portion of the processing liquid supply unit 200 with near-infrared rays. For example, the near-infrared light source 140 may also irradiate an area including all or a portion of the common piping 220 with near-infrared rays. In addition, for example, the near-infrared light source 140 may also irradiate an area including a portion of the downstream piping 230 with near-infrared rays. In addition, for example, the near-infrared light source 140 may also irradiate an area including all of the common piping 220 and a portion of the downstream piping 230 with near-infrared rays.

[0102] For example, the near-infrared light source 140 emits near-infrared light with a wavelength of 800 nm to 2.5 μm. Typically, the near-infrared light source 140 emits at least near-infrared light with a wavelength of 800 nm to 1.5 μm. It should be noted that the near-infrared light source 140 may also emit visible light while emitting near-infrared light.

[0103] For example, the near infrared light emitted from the near infrared light source 140 travels in a straight line along the optical axis. Alternatively, the near infrared light emitted from the near infrared light source 140 travels while diffusing around the optical axis. The near infrared light source 140 is preferably configured so that the optical axis of the near infrared light source 140 passes through the processing liquid supply unit 200. In the present embodiment, the near infrared light source 140 is configured so that the optical axis of the near infrared light source 140 passes through the common piping 220 or the downstream piping 230.

[0104] The near-infrared imaging unit 150 has a plurality of pixels. The near-infrared imaging unit 150 has sensitivity at least to near-infrared rays. The near-infrared imaging unit 150 captures an area including at least a portion of the processing liquid supply unit 200 and generates a captured image by receiving a light component of the near-infrared rays emitted from the near-infrared light source 140 that is transmitted through the processing liquid supply unit 200 and / or is reflected. Therefore, the near-infrared imaging unit 150 can capture the processing liquid irradiated with the near-infrared rays emitted from the near-infrared light source 140 and generate a captured image.

[0105] The near-infrared camera unit 150 captures an area including at least a portion of the processing liquid supply unit 200. In the present embodiment, the near-infrared camera unit 150 captures an area outside the chamber 112 and including at least a portion of the processing liquid supply unit 200. For example, the near-infrared camera unit 150 may also capture an area including all or a portion of the common piping 220. In addition, for example, the near-infrared camera unit 150 may also capture an area including a portion of the downstream piping 230. In addition, for example, the near-infrared camera unit 150 may also capture an area including all of the common piping 220 and a portion of the downstream piping 230. It should be noted that the near-infrared camera unit 150 may also capture an area including the entire chamber 112. The area captured by the near-infrared camera unit 150 may not be consistent with the area irradiated by the near-infrared light source 140.

[0106] In the near-infrared imaging unit 150 , the frame rate may be 30 fps or 60 fps. Alternatively, the frame rate may be 120 fps.

[0107] The near-infrared imaging unit 150 may include a SWIR (Short Wavelength Infra-Red) image sensor. In this case, the near-infrared imaging unit 150 detects near-infrared rays within a wavelength range of, for example, 800 nm to 2.5 μm.

[0108] It should be noted that the near-infrared imaging unit 150 may have sensitivity not only to near-infrared rays but also to visible light. Alternatively, the near-infrared imaging unit 150 may switch between near-infrared rays and visible light to receive them.

[0109] The near-infrared imaging unit 150 captures the surroundings centered on the imaging optical axis. Typically, the imaging optical axis is located at the center of the captured image. For example, the center of the captured image of the near-infrared imaging unit 150 is located at the processing liquid supply unit 200. In addition, for example, the center of the captured image of the near-infrared imaging unit 150 is located at the common piping 220. In this case, the imaging optical axis of the near-infrared imaging unit 150 is located at the common piping 220. Alternatively, the center of the captured image of the near-infrared imaging unit 150 may also be located at the downstream piping 230.

[0110] The near-infrared imaging unit 150 generates a captured image obtained by capturing at least a portion of the processing liquid supply unit 200. It is preferable that the processing liquid in at least a portion of the processing liquid supply unit 200 can be identified by the captured image. For example, it is preferable that the types of a plurality of processing liquids in at least a portion of the processing liquid supply unit 200 can be identified by the captured image. In addition, for example, it is preferable that the position of the outer edge of the processing liquid in at least a portion of the processing liquid supply unit 200 can be identified by the captured image.

[0111] When the fluid box 10B is observed vertically from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 pass through at least a portion of the processing liquid supply unit 200. In addition, when the fluid box 10B is observed vertically from above, the near-infrared light source 140 and the near-infrared imaging unit 150 may be arranged on opposite sides across the processing liquid supply unit 200. In addition, when the fluid box 10B is observed vertically from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may be consistent or parallel. In addition, when the fluid box 10B is observed vertically from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may not be parallel.

[0112] Here, the near-infrared light source 140 and the near-infrared imaging unit 150 are disposed inside the fluid tank 10B. The near-infrared light source 140 and the near-infrared imaging unit 150 may be disposed so as to be fixed to each other.

[0113] The near-infrared light source 140 and the near-infrared camera unit 150 may also be movable relative to the substrate W. For example, it is preferred that the near-infrared light source 140 and the near-infrared camera unit 150 can be moved in the horizontal direction and / or the vertical direction accompanied by a moving mechanism controlled by the control unit 102. When the near-infrared light source 140 and the near-infrared camera unit 150 move, the near-infrared light source 140 and the near-infrared camera unit 150 may also be able to move independently of each other. Alternatively, the near-infrared light source 140 and the near-infrared camera unit 150 may also be able to move as a whole.

[0114] The processing liquid may also contain organic matter. For example, among organic matter, the bonding of CH, CO, CN, CF, etc. absorbs a specific wavelength included in near-infrared rays. The absorption amount of a specific wavelength of near-infrared rays is proportional to the amount of a component having a specific bonding group, so the amount of a specific component of the substrate W can be measured based on the near-infrared rays reflected from the substrate W.

[0115] The substrate processing apparatus 100 further includes a cup body 180. The cup body 180 recovers the processing liquid scattered from the substrate W. The cup body 180 rises and falls. For example, the cup body 180 rises vertically upward to the side of the substrate W during the entire period in which the nozzle 136 supplies the processing liquid to the substrate W. In this case, the cup body 180 recovers the processing liquid scattered from the substrate W due to the rotation of the substrate W. In addition, when the period in which the nozzle 136 supplies the processing liquid to the substrate W ends, the cup body 180 descends vertically downward from the side of the substrate W.

[0116] As described above, the control device 101 includes the control unit 102 and the storage unit 104. The control unit 102 controls the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared imaging unit 150, and / or the cup 180. In one example, the control unit 102 controls the electric motor 124, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, the exhaust valve 253, the moving mechanism 138, the near-infrared light source 140, the near-infrared imaging unit 150, and / or the cup 180.

[0117] According to the substrate processing apparatus 100 of the present embodiment, the processing liquid irradiated with near infrared rays from the near infrared light source 140 is photographed by the near infrared camera unit 150. In detail, the processing liquid in at least a portion of the processing liquid supply unit 200 is photographed by the near infrared camera unit 150. Typically, the processing liquid supply unit 200 is transparent and transmits visible light and near infrared rays. The processing liquid is transparent and transmits visible light. On the other hand, in most cases, the processing liquid shows strong absorption in the near infrared region. Therefore, the outer edge of the processing liquid can be determined in the captured image obtained by photographing the area including at least a portion of the processing liquid supply unit 200 by the near infrared camera unit 150. Specifically, the brightness or lightness of the portion showing the upstream piping 210a, the upstream piping 210b, the common piping 220, the downstream piping 230 and the discharge piping 240 in the captured image becomes higher. On the other hand, the brightness or lightness of the portion showing the processing liquid in the captured image becomes lower. Therefore, the outer edge of the processing liquid can be determined in the captured image.

[0118] In addition, in most cases, the processing liquid shows a unique absorption in the near-infrared region depending on the type. Therefore, in the captured image obtained by capturing the processing liquid in at least a portion of the processing liquid supply unit 200 using the near-infrared imaging unit 150, the brightness or lightness of the processing liquid varies depending on the type of the processing liquid. Thus, the type of the processing liquid can be determined based on the brightness or lightness of the processing liquid in the captured image.

[0119] Alternatively, since the wavelength showing strong absorption varies depending on the processing liquid, the near-infrared light source 140 may change the wavelength of the emitted near-infrared light. This makes it possible to easily identify the outer edge and type of the processing liquid.

[0120] The substrate processing apparatus 100 of the present embodiment is suitable for manufacturing a semiconductor element provided with a semiconductor. Typically, in a semiconductor element, a conductive layer and an insulating layer are stacked on a substrate. When manufacturing a semiconductor element, the substrate processing apparatus 100 is suitable for cleaning and / or processing (e.g., etching, property change, etc.) the conductive layer and / or the insulating layer.

[0121] Next, refer to Figure 1 to Figure 3 A substrate processing apparatus 100 according to this embodiment will be described. Figure 3 2 is a block diagram of the substrate processing apparatus 100 .

[0122] like Figure 3 As shown, the control device 101 controls various actions of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, the central robot CR, the substrate holding part 120, the processing liquid supply part 200, the near-infrared light source 140, the near-infrared camera part 150, and the cup body 180. Specifically, the control device 101 controls the indexer robot IR, the central robot CR, the substrate holding part 120, the processing liquid supply part 200, the near-infrared light source 140, the near-infrared camera part 150, and the cup body 180 by sending control signals to the indexer robot IR, the central robot CR, the substrate holding part 120, the processing liquid supply part 200, the near-infrared light source 140, the near-infrared camera part 150, and the cup body 180.

[0123] In addition, the storage unit 104 stores computer programs and data. The data includes process data. The process data includes information indicating a plurality of processes. The plurality of processes respectively specify the processing content, processing steps, and substrate processing conditions of the substrate W. The control unit 102 executes the computer program stored in the storage unit 104 to perform substrate processing operations.

[0124] The recipe data also includes type information indicating the type of the processing liquid supplied from the supply source to the common pipe 220. The storage unit 104 also stores in advance data associating the type of the processing liquid with the brightness or lightness of the processing liquid in the reference image.

[0125] The control unit 102 controls the indexer robot IR so that the substrate W is transferred by the indexer robot IR.

[0126] The control unit 102 controls the central robot CR to transfer the substrates W. For example, the central robot CR receives an unprocessed substrate W and carries the substrate W into one of the plurality of chambers 112. Also, the central robot CR receives a processed substrate W from the chamber 112 and carries the substrate W out.

[0127] The control unit 102 controls the substrate holding unit 120 to control the start of rotation of the substrate W, change of the rotation speed, and stop of the rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0128] The control unit 102 can control the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 of the treatment liquid supply unit 200, and switch the states of the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 between the open state and the closed state. For example, the control unit 102 can control the upstream valve 251a to set the upstream valve 251a to the open state, so that the treatment liquid flowing in the upstream pipe 210a toward the common pipe 220 passes. In addition, for example, the control unit 102 can stop the supply of the treatment liquid flowing in the upstream pipe 210a toward the common pipe 220 by controlling the upstream valve 251a to set the upstream valve 251a to the closed state.

[0129] The control unit 102 can control the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 to change the treatment liquid supplied to the nozzle 136. Specifically, when the treatment liquid supplied to the nozzle 136 is changed from SC2 to carbonated water, the control unit 102 sets the upstream valve 251b to an open state to supply SC2 to the common pipe 220, and sets the downstream valve 252 to an open state to supply SC2 from the common pipe 220 to the downstream pipe 230. Furthermore, the control unit 102 sets the downstream valve 252 to a closed state and sets the discharge valve 253 to an open state, thereby supplying SC2 from the common pipe 220 to the discharge pipe 240. Then, the control unit 102 sets the upstream valve 251b to a closed state and sets the upstream valve 251a to an open state, thereby supplying carbonated water to the common pipe 220. Moreover, when the control unit 102 detects that the treatment liquid in the common piping 220 or the discharge piping 240 is switched from SC2 to carbonated water, it supplies carbonated water to the nozzle 136 via the common piping 220 and the downstream piping 230 by setting the discharge valve 253 to a closed state and setting the downstream valve 252 to an open state.

[0130] The control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136. Specifically, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136 above the upper surface Wa of the substrate W. In addition, the control unit 102 can control the moving mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136 to a retreat position away from above the upper surface Wa of the substrate W.

[0131] The control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 to capture an area including at least a portion of the processing liquid supply unit 200 and generate a captured image. The control unit 102 controls the near-infrared light source 140 to irradiate the area including at least a portion of the processing liquid supply unit 200 with near-infrared rays. In addition, the control unit 102 controls the near-infrared imaging unit 150 to capture an area including at least a portion of the processing liquid supply unit 200 and generate a captured image.

[0132] For example, the control unit 102 controls the near-infrared light source 140 and the near-infrared camera unit 150 to emit near-infrared light from the near-infrared light source 140 toward a region including at least a portion of the processing liquid supply unit 200, and receives near-infrared light that has passed through each component or has been reflected in the near-infrared camera unit 150 to measure the brightness value or lightness. It should be noted that the control unit 102 may also control the near-infrared light source 140 and the near-infrared camera unit 150 to move the near-infrared light source 140 and the near-infrared camera unit 150 relative to the processing liquid supply unit 200.

[0133] The control unit 102 determines the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image. The type of the processing liquid in the captured image is determined based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the type of the processing liquid in the captured image based on the captured image and the reference image.

[0134] In addition, the control unit 102 determines the outer edge of the processing liquid in the captured image. For example, the control unit 102 determines the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image. In one example, the control unit 102 determines the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the outer edge of the processing liquid in the captured image based on the captured image and the reference image.

[0135] The control unit 102 may also control the cup body 180 to move the cup body 180 relative to the substrate W. Specifically, the control unit 102 causes the cup body 180 to rise vertically upward to the side of the substrate W during the entire period in which the processing liquid supply unit 200 supplies the processing liquid to the substrate W. In addition, the control unit 102 causes the cup body 180 to fall vertically downward from the side of the substrate W when the processing liquid supply unit 200 ends supplying the processing liquid to the substrate W.

[0136] The substrate processing apparatus 100 of this embodiment is suitable for forming a semiconductor element. For example, the substrate processing apparatus 100 is suitable for processing a substrate W used as a semiconductor element of a stacked structure. The semiconductor element is a so-called 3D structure memory (storage device). As an example, the substrate W is suitable for use as a NAND flash memory.

[0137] Next, refer to Figure 1 to Figure 4 A substrate processing method according to this embodiment will be described. Figure 4 It is a flow chart of the substrate processing method of this embodiment. It should be noted that step SB is an example of the "process of rotating the substrate" of the present invention. Step SC is an example of the "process of supplying a plurality of processing liquids" of the present invention.

[0138] like Figure 4 As shown, in step SA, the substrate W is carried into the substrate processing apparatus 100. Specifically, the substrate W is carried into the chamber 112 of the substrate processing unit 110 via the indexer robot IR and the central robot CR.

[0139] In step SB, the substrate holding unit 120 holds the substrate W. Specifically, the substrate W is held by the substrate holding unit 120 when being carried into the chamber 112 .

[0140] In step SC, the control unit 102 processes the substrate W. The substrate W is processed in the substrate processing unit 110. Typically, the substrate holding unit 120 rotates while holding the substrate W, the processing liquid supply unit 200 supplies the processing liquid to the nozzle 136, and the nozzle 136 supplies the processing liquid to the substrate W. The control unit 102 stops supplying the processing liquid to the substrate W when a predetermined time has passed after the processing liquid is supplied to the substrate W.

[0141] In the present embodiment, in step SC, the control unit 102 supplies the plurality of processing liquids from the processing liquid supply unit 200 to the nozzle 136 while switching the types of the processing liquids. Specifically, the control unit 102 processes the substrate W using the first processing liquid (here, SC2). Then, the control unit 102 switches the processing liquid from the first processing liquid to the second processing liquid (carbonated water), and processes the substrate W using the second processing liquid.

[0142] In addition, in the present embodiment, in step SC, the near-infrared light source 140 emits near-infrared rays. At least a portion of the processing liquid supply unit 200 is irradiated with the near-infrared rays emitted from the near-infrared light source 140. For example, the common piping 220 of the processing liquid supply unit 200 is irradiated with the near-infrared rays emitted from the near-infrared light source 140. The near-infrared camera unit 150 photographs the area including at least a portion of the processing liquid supply unit 200 irradiated with the near-infrared rays. For example, the near-infrared camera unit 150 photographs the common piping 220 irradiated with the near-infrared rays. By photographing the area including at least a portion of the processing liquid supply unit 200 irradiated with the near-infrared rays from the near-infrared camera unit 150, the processing liquid can be photographed with high precision even if the processing liquid in at least a portion of the processing liquid supply unit 200 is substantially transparent.

[0143] In addition, in the present embodiment, in step SC, the control unit 102 controls the near-infrared camera unit 150 to generate an image obtained by photographing the area including at least a portion of the processing liquid supply unit 200. In the present embodiment, when switching the processing liquid supplied to the processing liquid supply unit 200, the control unit 102 photographs the area including at least a portion of the processing liquid supply unit 200 through the near-infrared camera unit 150. Specifically, the control unit 102 controls the near-infrared light source 140 to emit near-infrared rays. The area including at least a portion of the processing liquid supply unit 200 is irradiated with the near-infrared rays emitted from the near-infrared light source 140. In addition, the control unit 102 controls the near-infrared camera unit 150 to photograph at least a portion of the area irradiated with the near-infrared rays. Specifically, the control unit 102 photographs the area including at least a portion of the processing liquid supply unit 200. By photographing the area including at least a portion of the processing liquid supply unit 200 irradiated with near infrared rays from the near infrared camera unit 150, the processing liquid can be photographed with high precision even if the processing liquid in at least a portion of the processing liquid supply unit 200 is substantially transparent.

[0144] In addition, in the present embodiment, in step SC, the control unit 102 determines the position of the outer edge of the processing liquid in at least a portion of the processing liquid supply unit 200 based on the captured image. In addition, the control unit 102 determines the type of the processing liquid in at least a portion of the processing liquid supply unit 200 based on the captured image. Thus, it is possible to detect whether the type of the processing liquid has been switched in the processing liquid supply unit 200.

[0145] In step SD, the control unit 102 stops the rotation of the substrate W by the substrate holding unit 120 and releases the substrate W from being held by the substrate holding unit 120 .

[0146] In step SE, the substrate W is unloaded from the substrate processing apparatus 100. Specifically, the substrate W is unloaded from the chamber 112 of the substrate processing unit 110 via the central robot CR and the indexer robot IR.

[0147] According to the present embodiment, the control unit 102 controls the near-infrared imaging unit 150 to capture an image of a region including at least a portion of the processing liquid supply unit 200. In other words, the near-infrared imaging unit 150 captures an image of the processing liquid irradiated with near-infrared rays from the near-infrared light source 140. The processing liquid can strongly absorb near-infrared rays, so the outer edge of the processing liquid can be determined with high accuracy.

[0148] In addition, the control unit 102 uses the near-infrared imaging unit 150 to capture the processing liquid in at least a portion of the processing liquid supply unit 200. Therefore, the captured image can be used to identify the type of processing liquid in at least a portion of the processing liquid supply unit 200. Therefore, for example, when the type of processing liquid supplied to the nozzle 136 is switched, it can be confirmed whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0149] Next, refer to Figure 5 , the processing liquid supply unit 200 of the substrate processing apparatus 100 according to this embodiment is further described. Figure 5 1 is a schematic diagram showing the structure of the processing liquid supply unit 200 of the substrate processing apparatus 100 according to the present embodiment.

[0150] like Figure 5 As shown, the processing liquid supply unit 200 includes a multi-valve 300. The multi-valve 300 includes a base 310, an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253.

[0151] The base 310 has a common flow path 311, an upstream flow path 312a, an upstream flow path 312b, a downstream flow path 312c and a discharge flow path 312d. The common flow path 311 extends in a substantially straight line. Both ends of the common flow path 311 are closed. The upstream flow path 312a, the upstream flow path 312b, the downstream flow path 312c and the discharge flow path 312d are respectively connected to the common flow path 311. The upstream flow path 312a, the upstream flow path 312b, the downstream flow path 312c and the discharge flow path 312d extend in directions intersecting with the direction in which the common flow path 311 extends. The upstream flow path 312a, the upstream flow path 312b, the downstream flow path 312c and the discharge flow path 312d are sequentially connected from one end of the common flow path 311 toward the other end. The upstream flow path 312a is connected to one end of the common flow path 311, and the discharge flow path 312d is connected to the other end of the common flow path 311.

[0152] The base 310 is made of resin and transmits the near infrared rays emitted from the near infrared light source 140. The base 310 is not particularly limited, and is made of, for example, PFA or PTFE.

[0153] Here, in this embodiment, the processing liquid supply unit 200 includes an upstream pipe 211a, an upstream pipe 211b, a downstream pipe 231, and a discharge pipe 241. The upstream pipe 211a constitutes the upstream pipe 210a. The upstream pipe 211b constitutes the upstream pipe 210b. The downstream pipe 231 constitutes the downstream pipe 230. The discharge pipe 241 constitutes the discharge pipe 240.

[0154] The upstream pipe 211a, the upstream pipe 211b, the downstream pipe 231 and the exhaust pipe 241 are made of resin and transmit near infrared rays emitted from the near infrared light source 140. The upstream pipe 211a, the upstream pipe 211b, the downstream pipe 231 and the exhaust pipe 241 are not particularly limited and are made of, for example, PFA or PTFE.

[0155] One end (downstream end) of the upstream flow path 312a is connected to the common flow path 311. One end (downstream end) of the upstream pipe 211a is connected to the other end (upstream end) of the upstream flow path 312a, and the other end (upstream end) of the upstream pipe 211a is connected to the supply source. The flow path of the upstream pipe 211a is connected to the upstream flow path 312a.

[0156] One end (downstream end) of the upstream flow path 312b is connected to the common flow path 311. One end (downstream end) of the upstream pipe 211b is connected to the other end (upstream end) of the upstream flow path 312b, and the other end (upstream end) of the upstream pipe 211b is connected to the supply source. The flow path of the upstream pipe 211b is connected to the upstream flow path 312b.

[0157] One end (upstream end) of the downstream flow path 312c is connected to the common flow path 311. One end (upstream end) of the downstream pipe 231 is connected to the other end (downstream end) of the downstream flow path 312c, and the other end (downstream end) of the downstream pipe 231 is connected to the nozzle 136. The flow path of the downstream pipe 231 is connected to the downstream flow path 312c.

[0158] One end (upstream end) of the discharge flow path 312d is connected to the common flow path 311. One end (upstream end) of the discharge pipe 241 is connected to the other end (downstream end) of the discharge flow path 312d, and the other end (downstream end) of the discharge pipe 241 is connected to the treatment liquid tank 290. The flow path of the discharge pipe 241 is connected to the discharge flow path 312d.

[0159] The base 310 includes a common piping portion 321, an upstream piping portion 322a, an upstream piping portion 322b, a downstream piping portion 322c, and a discharge piping portion 322d. Figure 5 In FIG. 1 , for ease of understanding, the common piping portion 321 , the upstream piping portion 322 a , the upstream piping portion 322 b , the downstream piping portion 322 c , and the discharge piping portion 322 d are indicated by dotted lines.

[0160] The common pipe portion 321 constitutes the common flow path 311 and extends in the direction in which the common flow path 311 extends. The common pipe portion 321 is a portion of the base 310 that surrounds the common flow path 311. In the present embodiment, the common pipe 220 is constituted by the common pipe portion 321.

[0161] The upstream piping portion 322a constitutes the upstream flow path 312a and extends in the direction in which the upstream flow path 312a extends. The upstream piping portion 322a is a portion surrounding the upstream flow path 312a in the base 310. In the present embodiment, the upstream piping portion 322a and the upstream pipe 211a constitute the upstream piping 210a.

[0162] The upstream piping portion 322b constitutes the upstream flow path 312b and extends in the direction in which the upstream flow path 312b extends. The upstream piping portion 322b is a portion surrounding the upstream flow path 312b in the base 310. In the present embodiment, the upstream piping portion 322b and the upstream pipe 211b constitute the upstream piping 210b.

[0163] The downstream piping portion 322c constitutes the downstream flow path 312c and extends in the direction in which the downstream flow path 312c extends. The downstream piping portion 322c is a portion surrounding the downstream flow path 312c in the base 310. In the present embodiment, the downstream piping portion 322c and the downstream pipe 231 constitute the downstream piping 230.

[0164] The discharge piping portion 322d constitutes the discharge flow path 312d and extends in the direction in which the discharge flow path 312d extends. The discharge piping portion 322d is a portion surrounding the discharge flow path 312d in the base 310. In the present embodiment, the discharge piping portion 322d and the discharge pipe 241 constitute the discharge piping 240.

[0165] The upstream valve 251a can move between a closed position and an open position. The closed position of the upstream valve 251a indicates a position where the upstream valve 251a closes one end of the upstream flow path 312a. The open position of the upstream valve 251a indicates a position where the upstream valve 251a opens one end of the upstream flow path 312a to connect the upstream flow path 312a with the common flow path 311.

[0166] When the upstream valve 251a moves from the open position to the closed position, one end of the upstream flow path 312a is closed, and the upstream flow path 312a is not connected to the common flow path 311. That is, when the upstream valve 251a moves from the open position to the closed position, the upstream piping 210a is not connected to the common piping 220. On the other hand, when the upstream valve 251a moves from the closed position to the open position, one end of the upstream flow path 312a is opened, and the upstream flow path 312a is connected to the common flow path 311. That is, when the upstream valve 251a moves from the closed position to the open position, the upstream piping 210a is connected to the common piping 220.

[0167] The upstream valve 251b can move between a closed position and an open position. The closed position of the upstream valve 251b indicates a position where the upstream valve 251b closes one end of the upstream flow path 312b. The open position of the upstream valve 251b indicates a position where the upstream valve 251b opens one end of the upstream flow path 312b and connects the upstream flow path 312b with the common flow path 311.

[0168] When the upstream valve 251b moves from the open position to the closed position, one end of the upstream flow path 312b is closed, and the upstream flow path 312b is not connected to the common flow path 311. That is, when the upstream valve 251b moves from the open position to the closed position, the upstream piping 210b is not connected to the common piping 220. On the other hand, when the upstream valve 251b moves from the closed position to the open position, one end of the upstream flow path 312b is opened, and the upstream flow path 312b is connected to the common flow path 311. That is, when the upstream valve 251b moves from the closed position to the open position, the upstream piping 210b is connected to the common piping 220.

[0169] The downstream valve 252 can move between a closed position and an open position. The closed position of the downstream valve 252 indicates a position where the downstream valve 252 closes one end of the downstream flow path 312c. The open position of the downstream valve 252 indicates a position where the downstream valve 252 opens one end of the downstream flow path 312c and connects the downstream flow path 312c to the common flow path 311.

[0170] When the downstream valve 252 moves from the open position to the closed position, one end of the downstream flow path 312c is closed, and the downstream flow path 312c is not connected to the common flow path 311. That is, when the downstream valve 252 moves from the open position to the closed position, the downstream piping 230 is not connected to the common piping 220. On the other hand, when the downstream valve 252 moves from the closed position to the open position, one end of the downstream flow path 312c is opened, and the downstream flow path 312c is connected to the common flow path 311. That is, when the downstream valve 252 moves from the closed position to the open position, the downstream piping 230 is connected to the common piping 220.

[0171] The discharge valve 253 can move between a closed position and an open position. The closed position of the discharge valve 253 indicates a position where the discharge valve 253 closes one end of the discharge flow path 312d. The open position of the discharge valve 253 indicates a position where the discharge valve 253 opens one end of the discharge flow path 312d so that the discharge flow path 312d is connected to the common flow path 311.

[0172] When the discharge valve 253 moves from the open position to the closed position, one end of the discharge flow path 312d is closed, and the discharge flow path 312d is not connected to the common flow path 311. That is, when the discharge valve 253 moves from the open position to the closed position, the discharge piping 240 is not connected to the common piping 220. On the other hand, when the discharge valve 253 moves from the closed position to the open position, one end of the discharge flow path 312d is opened, and the discharge flow path 312d is connected to the common flow path 311. That is, when the discharge valve 253 moves from the open position to the closed position, the discharge piping 240 is connected to the common piping 220.

[0173] Next, refer to Figures 1 to 10 The substrate processing step ( Figure 4 Step SC). Figure 6 Detailed description of the process of substrate processing is given in FIG.

[0174] Figure 7 to Figure 10 Schematic diagram showing the structure of the processing liquid supply unit 200 of the substrate processing apparatus 100 of the present embodiment. It should be noted that step S15 is an example of the "process of acquiring type information" of the present invention. Step S16 is an example of the "process of utilizing near-infrared irradiation" of the present invention. Step S17 is an example of the "process of generating a captured image" of the present invention. Step S18 is an example of the "process of determining the type of processing liquid" of the present invention.

[0175] like Figure 6 As shown, step SC includes steps S11 to S21. It should be noted that in this embodiment, at the time when step S11 starts, the upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the discharge valve 253 are in a closed state.

[0176] In step S11, the first processing liquid (SC2 in this case) is supplied to the nozzle 136. Specifically, Figure 5 As shown in FIG. 1 , the control unit 102 changes the upstream valve 251b and the downstream valve 252 from the closed state to the open state, and maintains the upstream valve 251a and the discharge valve 253 in the closed state. As a result, the first processing liquid is supplied from the upstream pipe 210b to the nozzle 136 via the common pipe 220 and the downstream pipe 230. Therefore, the first processing liquid starts to be supplied from the nozzle 136 to the substrate W. When a predetermined time (for example, several tens of seconds) has passed since the upstream valve 251b and the downstream valve 252 were set to the open state, the process proceeds to step S12.

[0177] Next, in step S12, the first processing liquid (here, SC2) is supplied to the discharge pipe 240. Specifically, Figure 7As shown in FIG. 1 , the control unit 102 sets the downstream valve 252 from the open state to the closed state, and sets the discharge valve 253 from the closed state to the open state. As a result, the first processing liquid is supplied from the upstream pipe 210b to the discharge pipe 240 via the common pipe 220. Therefore, the supply of the first processing liquid from the nozzle 136 to the substrate W is stopped. In addition, the first processing liquid is discharged from the discharge pipe 240 to the processing liquid tank 290. When a predetermined time (e.g., less than 1 second) has passed since the discharge valve 253 was set to the open state, the process proceeds to step S13.

[0178] Next, in step S13 , the supply of the first processing liquid is stopped. Specifically, the control unit 102 switches the upstream valve 251 b from an open state to a closed state. As a result, the first processing liquid is no longer supplied to the common pipe 220 .

[0179] Next, in step S14, the second treatment liquid (here, carbonated water) is supplied to the discharge pipe 240. Specifically, Figure 8 As shown in FIG. 1 , the control unit 102 changes the upstream valve 251 a from a closed state to an open state. As a result, the second processing liquid is supplied from the upstream pipe 210 a to the discharge pipe 240 via the common pipe 220 .

[0180] It should be noted that even if the second processing liquid starts to be supplied from the upstream pipe 210a to the common pipe 220, the processing liquid in the common pipe 220 will not be immediately switched from the first processing liquid to the second processing liquid. Fig. 9 As shown in FIG. 1 , since the common pipe 220 is provided with, for example, an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253, and is connected to the upstream pipe 210b and the downstream pipe 230, a portion of the first processing liquid L1 is retained in the common pipe 220. Fig. 9 In the figure, for the sake of easy understanding, the first processing liquid is denoted by reference numeral “L1”, and the second processing liquid is denoted by reference numeral “L2”. In addition, for the sake of easy understanding, only the first processing liquid L1 and the second processing liquid L2 are hatched.

[0181] Next, in step S15 , type information indicating the type of the processing liquid is acquired. Specifically, the control unit 102 acquires type information indicating the type of the processing liquid supplied to the common pipe 220 from, for example, the recipe data.

[0182] Next, in step S16, the near-infrared light source 140 irradiates the area including at least a portion of the processing liquid supply unit 200 with near-infrared rays. Specifically, the control unit 102 irradiates the area including at least a portion of the processing liquid supply unit 200 with near-infrared rays through the near-infrared light source 140. In the present embodiment, the control unit 102 irradiates the area including the common pipe 220 with near-infrared rays through the near-infrared light source 140. It should be noted that the control unit 102 may also irradiate the area including a portion of the discharge pipe 240 (for example, the upstream portion of the discharge pipe 240) with near-infrared rays through the near-infrared light source 140.

[0183] Next, in step S17, the near-infrared camera unit 150 photographs the area including at least a portion of the processing liquid supply unit 200 irradiated with near-infrared rays. Specifically, the control unit 102 photographs the area including at least a portion of the processing liquid supply unit 200 irradiated with near-infrared rays through the near-infrared camera unit 150. In the present embodiment, the control unit 102 photographs the area including the common pipe 220 irradiated with near-infrared rays through the near-infrared camera unit 150. It should be noted that the control unit 102 may also photograph the area including a portion of the exhaust pipe 240 irradiated with near-infrared rays through the near-infrared camera unit 150.

[0184] In step S17, the near-infrared camera unit 150 captures the area including at least a portion of the processing liquid supply unit 200 irradiated with near-infrared rays and generates a captured image. It should be noted that the timing at which the near-infrared light source 140 starts emitting near-infrared rays may be the same as or different from the timing at which the near-infrared camera unit 150 starts imaging. In addition, the timing at which the near-infrared light source 140 starts emitting near-infrared rays may be earlier or later than the timing at which the near-infrared camera unit 150 starts imaging. In addition, the timing at which the near-infrared light source 140 starts emitting near-infrared rays may be the same as or different from the timing at which the second processing liquid is started to be supplied to the discharge pipe 240 in step S14. In addition, the timing at which the near-infrared light source 140 starts emitting near-infrared rays may be earlier or later than the timing at which the second processing liquid is started to be supplied to the discharge pipe 240 in step S14.

[0185] Next, in step S18, the type of the processing liquid is determined based on the captured image. Specifically, the control unit 102 determines the type of the processing liquid in the area including at least a portion of the processing liquid supply unit 200 based on the captured image. In this embodiment, the control unit 102 determines the type of the processing liquid in the common piping 220 based on the captured image. It should be noted that the control unit 102 may also determine the type of the processing liquid in the discharge piping 240 based on the captured image.

[0186] More specifically, the control unit 102 determines the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image generated by the near-infrared imaging unit 150. Alternatively, the control unit 102 determines the type of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the type of the processing liquid in the captured image based on the captured image and the reference image.

[0187] In addition, the control unit 102 determines the position of the outer edge of the processing liquid in the captured image based on the captured image generated by the near-infrared camera unit 150. For example, the control unit 102 determines the position of the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image. For example, the control unit 102 determines the position of the outer edge of the processing liquid in the captured image based on the brightness value or brightness in the captured image and the brightness value or brightness of the reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 determines the position of the outer edge of the processing liquid in the captured image based on the captured image and the reference image. Alternatively, for example, the control unit 102 may also determine an area in the captured image whose brightness value or brightness is within a specified range as the processing liquid, and determine the outer edge of the area whose brightness value or brightness is within a specified range as the outer edge of the processing liquid.

[0188] In addition, the control unit 102 determines the position of the second processing liquid in the captured image based on the brightness value or brightness and the type information in the captured image. In addition, the control unit 102 may also identify the area where the first processing liquid is located and the area where the second processing liquid is located in a specified area of ​​the captured image (for example, the area corresponding to the common piping 220) based on the brightness value or brightness in the captured image, the brightness value or brightness of the reference processing liquid stored in the storage unit 104, and the type information. In addition, for example, the control unit 102 may also calculate the ratio of the number of pixels having the brightness value or brightness corresponding to the second processing liquid to the total number of pixels in the specified area in the specified area (for example, the area corresponding to the common piping 220). It should be noted that the control unit 102 may also calculate the total brightness value or brightness of all pixels in the specified area.

[0189] Next, in step S19, it is determined whether the brightness value or lightness in the captured image satisfies a specified condition. Specifically, the control unit 102 determines whether the value calculated in step S18 satisfies a specified condition. For example, the control unit 102 determines whether the area where the second processing liquid is located is greater than a specified value (for example, 99%) of a specified area of ​​the captured image (for example, an area corresponding to the common piping 220). In addition, for example, the control unit 102 may also determine whether the above-mentioned calculated ratio is greater than a specified value (for example, 99%). It should be noted that the control unit 102 may also determine whether the above-mentioned calculated total is greater than a specified value.

[0190] In step S19, if the control unit 102 determines that the predetermined condition is not satisfied, the process returns to step S18. That is, if the process liquid is not sufficiently switched from the first process liquid to the second process liquid in at least a portion of the process liquid supply unit 200 (here, the common pipe 220), the process returns to step S18.

[0191] On the other hand, in step S19, when the control unit 102 determines that the predetermined condition is satisfied, the process proceeds to step S20. That is, when the control unit 102 detects that the process liquid in the common pipe 220 or the discharge pipe 240 has been switched from the first process liquid to the second process liquid, the process proceeds to step S20.

[0192] Here, step S19 is described in more detail. Usually, the time from the start of supplying the second treatment liquid to the discharge piping to the start of supplying the second treatment liquid to the downstream piping is preset. Specifically, usually, even if the second treatment liquid is started to be supplied from the upstream piping to the common piping, since a part of the first treatment liquid is retained in the common piping, the treatment liquid in the common piping will not be immediately switched from the first treatment liquid to the second treatment liquid. For example, in the case where the time required for the treatment liquid in the common piping to be switched from the first treatment liquid to the second treatment liquid is more than t1 seconds and less than t2 seconds (wherein t1<t2), after switching the treatment liquid supplied to the common piping from the first treatment liquid to the second treatment liquid for more than t2 seconds, the opening and closing states of the discharge valve and the downstream valve are switched. That is, since the time required for the treatment liquid to be switched in the common piping varies depending on the temperature, etc., in order to supply the treatment liquid to the nozzle after the treatment liquid is switched, the time from the start of supplying the second treatment liquid to the discharge piping to the supply of the second treatment liquid to the downstream piping is set to be longer. In the present embodiment, the time from when the second processing liquid is supplied to the discharge pipe 240 to when the second processing liquid is supplied to the downstream pipe 230 is also set in the process (for example, t2 seconds or more).

[0193] In the present embodiment, in step S19, when the control unit 102 determines that the prescribed condition is satisfied, the process proceeds to step S20 regardless of whether the set time (t2 seconds or more) has passed. In this case, for example, the control unit 102 may also rewrite the process so that the time from the start of supplying the second processing liquid to the discharge pipe 240 to the start of supplying the second processing liquid to the downstream pipe 230 (for example, t2 seconds or more) is shortened according to the timing when the prescribed condition is determined to be satisfied. It should be noted that, for example, the control unit 102 may also rewrite the process so that the time from the start of supplying the second processing liquid to the discharge pipe 240 to the start of supplying the second processing liquid to the downstream pipe 230 (for example, t2 seconds or more) is lengthened according to the timing when the prescribed condition is determined to be satisfied.

[0194] Next, in step S20, the second treatment liquid (here, carbonated water) is supplied to the nozzle 136. Specifically, the control unit 102 changes the discharge valve 253 from the closed state to the open state, and changes the downstream valve 252 from the closed state to the open state. Fig.10 As shown, the second processing liquid is supplied from the upstream pipe 210a to the nozzle 136 via the common pipe 220 and the downstream pipe 230. Therefore, the second processing liquid starts to be supplied from the nozzle 136 to the substrate W. When a predetermined time (for example, several seconds or more) has passed since the downstream valve 252 was opened, the process proceeds to step S21.

[0195] Next, in step S21, the supply of the second processing liquid is stopped. Specifically, the control unit 102 changes the upstream valve 251a and the downstream valve 252 from the open state to the closed state. Thus, the supply of the second processing liquid to the common pipe 220 is stopped, and the supply of the second processing liquid to the nozzle 136 is stopped.

[0196] In this embodiment, as described above, the control unit 102 specifies the type of the processing liquid in the region including at least a portion of the processing liquid supply unit 200 based on the captured image. Therefore, for example, it is possible to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0197] In addition, for example, since it is possible to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched, the downstream valve 252 is switched from the closed state to the open state at the timing of confirming that the processing liquid in the processing liquid supply unit 200 has been switched, regardless of whether the above-mentioned set time (for example, t2 seconds or more) has passed, thereby shortening the substrate processing time. In addition, since the usage amount of the second processing liquid can be reduced, the environmental burden can be reduced.

[0198] As described above, the control unit 102 controls the processing liquid supply unit 200 to switch the type of processing liquid and supply it to the nozzle 136. When the type of processing liquid is switched and supplied to the nozzle 136 as described above, the application of the present invention is particularly effective.

[0199] As described above, the control unit 102 controls the processing liquid supply unit 200 based on the result of determining the type of processing liquid. Therefore, the processing liquid can be easily supplied to the nozzle 136 and / or stopped according to the state of the processing liquid in the processing liquid supply unit 200.

[0200] In addition, as described above, the processing liquid supply unit 200 includes the upstream pipe 210a and the upstream pipe 210b through which the plurality of processing liquids flow respectively, the common pipe 220 connected to the downstream ends of the upstream pipe 210a and the upstream pipe 210b, and the downstream pipe 230. In this way, when the plurality of processing liquids flow through the common pipe 220, it is particularly effective to apply the present invention to identify the type of processing liquid.

[0201] In addition, as described above, the control unit 102 determines the type of the processing liquid in the area including the common pipe 220 based on the captured image. Therefore, it is easy to confirm the status of the processing liquid in the common pipe 220. For example, it is easy to confirm whether the processing liquid in the common pipe 220 has been switched. In other words, it is easy to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0202] In addition, as described above, the common pipe 220 is formed of a multi-valve, so that the size of the structure around the common pipe 220 can be suppressed, and the size of the substrate processing apparatus can be suppressed.

[0203] In addition, as described above, the processing liquid supply unit 200 includes the discharge pipe 240 that discharges the processing liquid and is connected to the common pipe 220 at its upstream end. Therefore, when the processing liquid supplied to the nozzle 136 is switched, the first processing liquid and the second processing liquid can be supplied to the discharge pipe 240, so that the processing liquid can be prevented from being supplied to the nozzle 136 in a state where the first processing liquid is mixed with the second processing liquid.

[0204] In addition, as described above, the control unit 102 can also determine the type of the processing liquid in the area including the discharge pipe 240 based on the captured image. Therefore, it is easy to confirm the status of the processing liquid in the discharge pipe 240. For example, it is easy to confirm whether the processing liquid in the discharge pipe 240 has been switched. In other words, it is easy to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0205] In addition, as described above, after the control unit 102 supplies the first processing liquid to the nozzle 136 via the common pipe 220, the control unit 102 supplies the first processing liquid to the discharge pipe 240 via the common pipe 220, and then supplies the second processing liquid to the discharge pipe 240 via the common pipe 220. When it is detected based on the captured image that the processing liquid in the common pipe 220 or the discharge pipe 240 is switched from the first processing liquid to the second processing liquid, the control unit 102 supplies the second processing liquid to the nozzle 136 via the common pipe 220. Therefore, the processing liquid supplied to the nozzle 136 can be easily switched from the first processing liquid to the second processing liquid.

[0206] Next, refer to Fig.11An example in which a plurality of near-infrared light sources 140 are provided will be described. Here, an example in which the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b will be described. Fig.11 1 is a schematic diagram of a substrate processing unit 110 in a substrate processing apparatus 100 including a plurality of near-infrared light sources 140 (near-infrared light sources 140 a and near-infrared light sources 140 b ).

[0207] like Fig.11 As shown, the near infrared light source 140 includes a near infrared light source 140a and a near infrared light source 140b. The near infrared light source 140a and the near infrared light source 140b emit near infrared rays having different peak wavelengths.

[0208] The control unit 102 acquires the process data from the storage unit 104, and acquires the type information indicating the type of the processing liquid supplied to the common pipe 220 from the process data. In addition, for example, the process data may also include information indicating the type of the near-infrared light source 140 corresponding to the type of the processing liquid. In addition, for example, the control unit 102 may also acquire the type information indicating the type of the processing liquid supplied to the common pipe 220 from the input information input by the user.

[0209] The control unit 102 changes the near-infrared light source 140 that irradiates the area including at least a portion of the treatment liquid supply unit 200 based on the acquired type information. For example, the control unit 102 irradiates the area using the near-infrared light source 140a when carbonated water is supplied from the upstream pipe 210a to the common pipe 220. On the other hand, the control unit 102 irradiates the area using the near-infrared light source 140b when SC2 is supplied from the upstream pipe 210b to the common pipe 220.

[0210] Specifically, for example, when the treatment liquid supplied to the common pipe 220 is switched from SC2 to carbonated water, the control unit 102 supplies the second treatment liquid (here, carbonated water) to the common pipe 220 ( Figure 6 In step S14), the near-infrared light source 140 for irradiating the area including at least a portion of the processing liquid supply unit 200 is changed from the near-infrared light source 140b to the near-infrared light source 140a, and the near-infrared light source 140a irradiates the area including at least a portion of the processing liquid supply unit 200 ( Figure 6 Step S16).

[0211] On the other hand, for example, when the treatment liquid supplied to the common pipe 220 is switched from carbonated water to SC2, the control unit 102 supplies the second treatment liquid (SC2 in this case) to the common pipe 220 ( Figure 6In step S14), the near-infrared light source 140 for irradiating the area including at least a portion of the processing liquid supply unit 200 is changed from the near-infrared light source 140a to the near-infrared light source 140b, and the near-infrared light source 140b irradiates the area including at least a portion of the processing liquid supply unit 200 ( Figure 6 Step S16).

[0212] Other structures and substrate processing flow and use in the example where multiple near-infrared light sources 140 are provided Figures 1 to 10 The configuration of the substrate processing apparatus and the substrate processing flow described above are the same. It should be noted that step S16 in the example where a plurality of near-infrared light sources 140 are provided is an example of the "step of changing the peak wavelength of near-infrared light" of the present invention.

[0213] In the present embodiment, as described above, the control unit 102 acquires the type information indicating the type of the processing liquid, and based on the acquired type information, changes the near-infrared light source 140 that irradiates the region including at least a portion of the processing liquid supply unit 200. Therefore, since the near-infrared light to be irradiated can be changed according to the absorbance (also referred to as absorbance) of the processing liquid, the type and the outer edge of the processing liquid can be more accurately determined even when the type of the processing liquid is changed.

[0214] Specifically, the absorbance of the treatment liquid varies depending on the type of the treatment liquid. Therefore, for example, by irradiating the second treatment liquid with light of a wavelength having a high absorbance and photographing the treatment liquid, the contrast between the brightness value or brightness of the area representing the second treatment liquid and the area other than the second treatment liquid in the photographed image can be increased. Thus, the type and position of the treatment liquid can be more accurately determined based on the photographed image.

[0215] Other effects and uses of the example in which a plurality of near-infrared light sources 140 are provided Figures 1 to 10 The effects of the substrate processing apparatus described above are the same.

[0216] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the above-mentioned embodiments and can be implemented in various ways without departing from the scope of its main purpose. In addition, a plurality of constituent elements disclosed in the above-mentioned embodiments can be appropriately combined to form a variety of inventions. For example, some constituent elements can also be deleted from all the constituent elements shown in the embodiments. In addition, the constituent elements in different embodiments can also be appropriately combined. For ease of understanding, the accompanying drawings mainly schematically illustrate the constituent elements, and for ease of drawing, the thickness, length, number, spacing, etc. of the constituent elements illustrated are sometimes different from the actual ones. In addition, the material, shape, size, etc. of the constituent elements shown in the above-mentioned embodiments are examples, and are not particularly limited, and can be subjected to various changes within the scope of the effects of the present invention.

[0217] For example, in the above-mentioned embodiment, an example of applying the present invention in a substrate processing step to shorten the substrate processing time is shown, but the present invention is not limited to this. For example, when setting the time from the start of supplying the second processing liquid to the discharge pipe 240 to the start of supplying the second processing liquid to the downstream pipe 230 (for example, t2 seconds or more) (when creating a process), the present invention can also be applied. In this case, the process creation time can be shortened. In addition, as in the above-mentioned embodiment, since the use amount of the second processing liquid can be reduced, the environmental burden can be reduced.

[0218] In addition, in the above-mentioned embodiment, as an example of supplying a plurality of treatment liquids to the nozzle 136, an example of switching the type of treatment liquid and supplying it to the nozzle 136 is shown, but the present invention is not limited to this. For example, a hydrochloric acid aqueous solution (treatment liquid) may be supplied from the upstream pipe 210a to the common pipe 220, and a hydrogen peroxide solution (treatment liquid) may be supplied from the upstream pipe 210b to the common pipe 220, and a plurality of types (here, two types) of treatment liquids may be mixed in the common pipe 220, and the plurality of treatment liquids may be supplied to the nozzle 136 in a mixed state. In this case, by applying the present invention, for example, the mixed state of the plurality of treatment liquids in the common pipe 220 can be confirmed.

[0219] In the above embodiment, an example is shown in which two upstream pipes (the upstream pipe 210 a and the upstream pipe 210 b ) are connected to the common pipe 220 , but the present invention is not limited thereto. For example, three or more upstream pipes may be connected to the common pipe 220 .

[0220] In the above embodiment, only one downstream pipe 230 is provided to supply the processing liquid from the common pipe 220 to the nozzle 136, but the present invention is not limited thereto. For example, a plurality of downstream pipes 230 may be provided to supply the processing liquid from the common pipe 220 to the plurality of nozzles 136.

[0221] In addition, in the above embodiment, an example is shown in which the processing liquid supply unit 200 includes a multi-valve, but the present invention is not limited thereto. For example, the processing liquid supply unit 200 may not include a multi-valve.

[0222] In the above embodiment, the upstream pipe 210a and the upstream pipe 210b are respectively connected to the multi-valve 300, but the present invention is not limited thereto. For example, the upstream pipe 210a and the upstream pipe 210b may be connected to the multi-valve 300 after merging with each other.

[0223] In addition, in the above embodiment, the downstream pipe 230 and the discharge pipe 240 are respectively connected to the multi-valve 300, but the present invention is not limited thereto. For example, the multi-valve 300 is connected to a common pipe, and the downstream pipe 230 and the discharge pipe 240 are branched from the pipe.

[0224] Industrial Applicability

[0225] The present invention is suitable for use in a substrate processing device and a substrate processing method.

Claims

1. A substrate processing device, characterized in that: include: a substrate holding portion that holds a substrate; a treatment liquid nozzle for supplying a treatment liquid to the upper surface of the substrate; a treatment liquid supply unit that supplies a plurality of treatment liquids to the treatment liquid nozzle; at least one near-infrared light source for irradiating a region including at least a portion of the treatment liquid supply portion with near-infrared rays; a near-infrared imaging unit that generates an image obtained by imaging the treatment liquid irradiated with the near-infrared rays from the near-infrared light source; as well as a control unit that controls the processing liquid supply unit and the near-infrared imaging unit, The control unit specifies the type of the processing liquid in a region including at least a portion of the processing liquid supply unit based on the captured image.

2. The substrate processing device according to claim 1, characterized in that: The control unit controls the processing liquid supply unit to switch the type of the processing liquid and supply the processing liquid to the processing liquid nozzle.

3. The substrate processing device according to claim 1 or 2, characterized in that: The control unit controls the processing liquid supply unit based on a result of determining the type of the processing liquid.

4. The substrate processing device according to claim 1 or 2, characterized in that: The processing liquid supply unit comprises: A plurality of upstream pipes for respectively circulating the plurality of treatment liquids; a common pipe to which downstream ends of the plurality of upstream pipes are connected; and The downstream pipe has an upstream end connected to the common pipe and supplies the processing liquid to the processing liquid nozzle.

5. The substrate processing device according to claim 4, characterized in that: The near-infrared light source irradiates a region including the common pipe with near-infrared rays. The control unit specifies the type of the processing liquid in a region including the common pipe based on the captured image.

6. The substrate processing device according to claim 4, characterized in that: The common pipe is composed of a multi-valve.

7. The substrate processing device according to claim 4, characterized in that: The processing liquid supply unit includes a discharge pipe having an upstream end connected to the common pipe and discharging the processing liquid.

8. The substrate processing device according to claim 7, characterized in that: The near-infrared light source irradiates a region including the discharge pipe with near-infrared rays. The control unit specifies the type of the processing liquid in a region including the discharge pipe based on the captured image.

9. The substrate processing device according to claim 7, characterized in that: The control unit controls the processing liquid supply unit. After the first processing liquid is supplied to the processing liquid nozzle via the common pipe, supplying the first processing liquid to the discharge pipe via the common pipe, Thereafter, the second processing liquid is supplied to the discharge pipe via the common pipe, When it is detected based on the captured image that the processing liquid in the common pipe or the discharge pipe is switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common pipe.

10. The substrate processing apparatus according to claim 1 or 2, characterized in that: The at least one near-infrared light source is provided with a plurality of The plurality of near-infrared light sources emit near-infrared rays having different peak wavelengths from each other. The control unit acquires type information indicating the type of the processing liquid. The control unit changes the near-infrared light source that irradiates a region including at least a portion of the processing liquid supply unit based on the acquired type information.

11. A substrate processing method, characterized in that: The process includes the following steps: A step of holding a substrate and rotating the substrate; and a step of supplying a plurality of processing liquids from a processing liquid supply unit to a processing liquid nozzle, and supplying the processing liquids from the processing liquid nozzle to the upper surface of the substrate, The process of supplying the treatment liquid includes the following steps: a step of irradiating a region including at least a portion of the treatment liquid supply portion with near infrared rays; a step of generating an image obtained by photographing the processing liquid irradiated with the near infrared ray; and and a step of specifying the type of the processing liquid in a region including at least a portion of the processing liquid supply unit based on the captured image.

12. The substrate processing method according to claim 11, characterized in that: In the step of supplying the processing liquid, the type of the processing liquid is switched and the processing liquid is supplied from the processing liquid supply unit to the processing liquid nozzle.

13. The substrate processing method according to claim 11 or 12, characterized in that: In the step of supplying the processing liquid, the processing liquid supply unit is controlled based on a result of identifying the type of the processing liquid.

14. The substrate processing method according to claim 11 or 12, characterized in that: The processing liquid supply unit comprises: A plurality of upstream pipes for respectively circulating the plurality of treatment liquids; a common pipe to which downstream ends of the plurality of upstream pipes are connected; and The downstream pipe has an upstream end connected to the common pipe and supplies the processing liquid to the processing liquid nozzle.

15. The substrate processing method according to claim 14, characterized in that: In the step of irradiating with near infrared rays, a region including the common pipe is irradiated with near infrared rays. In the specifying step, the type of the processing liquid in the region including the common pipe is specified based on the captured image.

16. The substrate processing method according to claim 14, characterized in that: The common pipe is composed of a multi-valve.

17. The substrate processing method according to claim 14, characterized in that: The processing liquid supply unit includes a discharge pipe having an upstream end connected to the common pipe and discharging the processing liquid.

18. The substrate processing method according to claim 17, characterized in that: In the step of irradiating with near infrared rays, a region including the discharge pipe is irradiated with near infrared rays. In the specifying step, the type of the processing liquid in the region including the discharge pipe is specified based on the captured image.

19. The substrate processing method according to claim 17, characterized in that: In the step of supplying the treatment liquid, After the first processing liquid is supplied to the processing liquid nozzle via the common pipe, supplying the first processing liquid to the discharge pipe via the common pipe, Thereafter, the second processing liquid is supplied to the discharge pipe via the common pipe, When it is detected based on the captured image that the processing liquid in the common pipe or the discharge pipe is switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common pipe.

20. The substrate processing method according to claim 11 or 12, characterized in that: The process of supplying the treatment liquid includes the following steps: a step of acquiring type information indicating the type of the processing liquid; and A step of changing a peak wavelength of near-infrared light irradiating a region including at least a portion of the processing liquid supply unit based on the acquired type information.

Images