Method, device and system for monitoring bipolar plate flow resistance in fuel cells

Abstract

This disclosure relates to a method, apparatus, and system for monitoring the flow resistance of a fuel cell bipolar plate. The method includes: acquiring the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; the pressure sensor is connected via a pressure-sensing tube to a pressure-sensing hole located at the bottom of the measuring point in the bipolar plate; acquiring the calibration pressure drop value of each target flow channel; for each target flow channel, determining the flow channel pressure drop value based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area; for each target flow channel, determining whether the flow resistance of the target flow channel meets a first preset condition based on the flow channel pressure drop value and the calibration pressure drop value; if the flow resistance of the target flow channel does not meet the first preset condition, determining that the flow resistance of the target flow channel is abnormal. This solution improves the accuracy of bipolar plate flow resistance monitoring.

Description

Technical Field

[0001] This disclosure relates to the field of fuel cell technology, and in particular to a method, apparatus and system for monitoring the flow resistance of fuel cell bipolar plates. Background Technology

[0002] In related technologies, bipolar plates, as one of the key components of fuel cells, guide gas flow to the electrodes, help expel water produced in the reaction, and also provide support and heat dissipation. Their flow channel design directly affects gas distribution, water management, and heat transfer efficiency. Among these factors, the resistance characteristics of the flow field are an important indicator for evaluating the rationality of the flow field design.

[0003] Currently, the flow resistance of bipolar plates is typically obtained through simulation analysis and theoretical calculations. However, simulation models often require simplification and differ from actual bipolar plate structures. Furthermore, the assumptions and boundary conditions used in simulations are often idealized. Therefore, the data obtained through simulation calculations cannot fully and accurately reflect the actual operating conditions of the bipolar plate. In addition, traditional flow resistance monitoring devices are overly complex, inconvenient to operate, and have limited monitoring locations. They can only monitor the entire plate at the single-cell level, failing to reflect the true changes in flow resistance in different regions of the fuel cell stack during actual operation. Summary of the Invention

[0004] To overcome the problems existing in related technologies, this disclosure provides a method, device and system for monitoring the flow resistance of bipolar plates in fuel cells.

[0005] According to a first aspect of the present disclosure, a method for monitoring the flow resistance of a fuel cell bipolar plate is provided, comprising:

[0006] The actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test are obtained; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; the pressure sensor is connected to a pressure-sensing hole located at the bottom of the measuring point in the bipolar plate via a pressure-sensing tube;

[0007] Obtain the calibrated pressure drop value for each target flow channel;

[0008] For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area;

[0009] For each target flow channel, based on the flow channel pressure drop value and the calibrated pressure drop value, it is determined whether the flow resistance of the target flow channel meets the first preset condition. If the flow resistance of the target flow channel does not meet the first preset condition, it is determined that the flow resistance of the target flow channel is abnormal.

[0010] In some embodiments of this disclosure, the method further includes:

[0011] For each target flow channel, the flow rate of the target flow channel is determined based on the pressure drop value of the target flow channel;

[0012] Obtain the total flow rate of the bipolar plate under test;

[0013] Based on the total flow rate of the plate and the flow channel flow rate, determine whether the flow rate of the target flow channel meets the second preset condition;

[0014] If the flow rate of at least one target channel does not meet the second preset condition, it is determined that the flow field distribution of the bipolar plate is non-uniform.

[0015] In some embodiments of this disclosure, the target flow channel includes a first flow channel, a second flow channel, a third flow channel, and a fourth flow channel. The first flow channel is the first flow channel of the gas inlet distribution area of ​​the bipolar plate under test, the second flow channel is the last flow channel of the gas inlet distribution area of ​​the bipolar plate under test, the third flow channel is the first flow channel of the gas outlet distribution area of ​​the bipolar plate under test, and the fourth flow channel is the last flow channel of the gas outlet distribution area of ​​the bipolar plate under test.

[0016] The process of obtaining the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test includes:

[0017] Obtain the pressure values ​​of the first measuring point and the second measuring point on each target flow channel in the first, second, third, and fourth flow channels; the first measuring point is the starting point of the target flow channel, and the second measuring point is the ending point of the target flow channel;

[0018] For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel, including:

[0019] For each target flow channel among the first, second, third, and fourth flow channels, the pressure difference between the pressure value at the first measuring point and the pressure value at the second measuring point on the target flow channel is calculated to obtain the flow channel pressure drop value of the target flow channel.

[0020] In some embodiments of this disclosure, the target flow channel includes a fifth flow channel, and there are multiple fifth flow channels. The fifth flow channel is a flow channel disposed in the mainstream reaction zone of the bipolar plate under test; the multiple fifth flow channels are evenly distributed.

[0021] The process of obtaining the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test includes:

[0022] Obtain the pressure values ​​at the third, fourth, and fifth measuring points on each of the multiple fifth flow channels; the third measuring point is the starting point of the fifth flow channel, the fourth measuring point is the midpoint of the fifth flow channel, and the fifth measuring point is the ending point of the fifth flow channel.

[0023] For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel, including:

[0024] For each of the multiple fifth flow channels, the flow channel pressure drop value of the target flow channel is calculated using the following formula:

[0025] △Pi = Pi start point - Pi end point / Pi start point - Pi middle / Pi middle - Pi end point

[0026] Where △Pi is the pressure drop value of the i-th target flow channel, Pi starts at the pressure value of the third measuring point, Pi in the middle is the pressure value of the fourth measuring point, and Pi ends at the pressure value of the fifth measuring point.

[0027] In some embodiments of this disclosure, the calibration pressure drop value is the first average value of the target flow channel pressure drop value of the bipolar plate under test in an offline dry gas state within a first preset time period;

[0028] The step of determining whether the flow resistance of the target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibrated pressure drop value includes:

[0029] Calculate the second average value of the flow channel pressure drop value of the target flow channel within the second preset interval;

[0030] Calculate the difference between the first average value and the second average value to obtain the first difference value;

[0031] Determine the proportion of the first difference in the second average value;

[0032] If the percentage value is greater than the first preset percentage value, it is determined that the flow resistance of the target flow channel does not meet the first preset condition.

[0033] In some embodiments of this disclosure, determining whether the flow rate of the target channel meets a second preset condition based on the overall board flow rate and the channel flow rate includes:

[0034] Obtain the first relationship between flow rate and pressure drop; the first relationship is obtained by fitting the relationship between the overall flow rate and pressure drop of the bipolar plate under offline dry gas conditions;

[0035] The flow rate of the target flow channel is calculated using the flow rate of the channel and the first relationship.

[0036] The standard flow rate is obtained by calculating the first proportion of the total plate flow rate in the number of flow channels of the bipolar plate under test.

[0037] Calculate the second percentage of the flow rate of the target flow channel in the standard flow rate. If the second percentage is greater than a preset threshold, determine that the flow rate of the target flow channel does not meet the second preset condition.

[0038] According to a second aspect of the present disclosure, a fuel cell bipolar plate flow resistance monitoring device is provided, comprising:

[0039] The first acquisition unit is used to acquire the actual gas pressure values ​​of multiple measuring points on each target flow channel in the bipolar plate under test; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; the pressure sensor is connected to a pressure-sensing hole located at the bottom of the measuring point in the bipolar plate through a pressure-sensing tube;

[0040] The second acquisition unit is used to acquire the calibrated pressure drop value of each target flow channel;

[0041] The first determining unit is used to determine the flow channel pressure drop value of each target flow channel based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area;

[0042] The second determining unit is used to determine, for each target flow channel, whether the flow resistance of the target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibration pressure drop value, and to determine that the flow resistance of the target flow channel is abnormal if the flow resistance of the target flow channel does not meet the first preset condition.

[0043] According to a third aspect of the present disclosure, an electronic device includes: a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor, when executing the computer program, implements the method as described in any one of the first aspects.

[0044] According to a fourth aspect of the present disclosure, a computer-readable storage medium is provided having a computer program stored thereon, which, when executed by a processor, implements the method as described in any one of the first aspects.

[0045] According to a fifth aspect of the present disclosure, a computer program product is provided, including a computer program that, when executed by a processor, implements the method as described in any one of the first aspects.

[0046] The technical solutions provided by the embodiments of this disclosure may include the following beneficial effects: obtaining the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; the pressure sensor is connected to a pressure-sensing hole located at the bottom of the target flow channel in the bipolar plate via a pressure-sensing tube; obtaining the calibration pressure drop value of each target flow channel; for each target flow channel, determining the flow channel pressure drop value of the target flow channel based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area; for each target flow channel, determining whether the flow resistance of the target flow channel meets a first preset condition based on the flow channel pressure drop value and the calibration pressure drop value; if the flow resistance of the target flow channel does not meet the first preset condition, determining that the flow resistance of the target flow channel is abnormal. By setting pressure taps at multiple measuring points at the bottom of the bipolar plate's flow channel, pressure values ​​at different locations on the bipolar plate can be obtained using only pressure sensors. This allows for the determination of pressure drops in different flow channels, and enables convenient and quick identification of abnormal flow resistance in different areas of the bipolar plate, thus improving the accuracy of bipolar plate flow resistance monitoring.

[0047] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit this disclosure. Attached Figure Description

[0048] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0049] Figure 1 This is a flowchart illustrating a method for monitoring the flow resistance of a fuel cell bipolar plate according to an exemplary embodiment.

[0050] Figure 2 This is a schematic diagram of the measuring points and pressure taps proposed in this application.

[0051] Figure 3 This is a schematic diagram of the bipolar plate to be tested as proposed in this application.

[0052] Figure 4 This is a block diagram illustrating a fuel cell bipolar plate flow resistance monitoring device according to an exemplary embodiment.

[0053] Figure 5 This is a block diagram illustrating an apparatus for a method of monitoring bipolar plate flow resistance in a fuel cell, according to an exemplary embodiment.

[0054] Figure Labels

[0055] 1-Measuring point; 2-Target flow channel; 3-Pressure tapping hole; 31-Threaded part; 4-Gas inlet distribution zone; 41-First flow channel; 42-; 5-Gas outlet distribution zone; 51-Third flow channel; 52-Fourth flow channel; 6-First measuring point; 7-Second measuring point; 8-Main flow reaction zone; 81-Fifth flow channel; 9-Gas inlet; 10-Gas outlet. Detailed Implementation

[0056] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numerals in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present invention. Rather, they are merely examples of apparatuses and methods consistent with some aspects of the invention as detailed in the appended claims.

[0057] The terminology used in this disclosure is for the purpose of describing particular embodiments only and is not intended to be limiting of the present disclosure. The singular forms “a” and “the” as used in this disclosure and the appended claims are also intended to include the plural forms, unless the context clearly indicates otherwise.

[0058] It should be understood that although the terms first, second, third, etc., may be used to describe various information in embodiments of this disclosure, such information should not be limited to these terms. These terms are only used to distinguish information of the same type from one another. For example, first information may also be referred to as second information without departing from the scope of embodiments of this disclosure, and similarly, second information may also be referred to as first information. Depending on the context, the words “if” and “suppose” as used herein may be interpreted as “when”, “when”, or “in response to a determination”.

[0059] Furthermore, various forms of processes shown in the embodiments of this disclosure can be used to reorder, add, or delete steps. For example, the steps described in this application can be executed in parallel, sequentially, or in different orders, as long as the desired result of the technical solution disclosed in this disclosure can be achieved, and no limitation is imposed herein.

[0060] In related technologies, fuel cells are devices that directly convert chemical energy into electrical energy, characterized by high efficiency and environmental friendliness. Among them, proton exchange membrane fuel cells are widely used in transportation and stationary power generation due to their high power density and rapid start-up characteristics. Bipolar plates, as one of the key components of fuel cells, guide gas flow to the electrodes, help expel water produced in the reaction, and also provide support and heat dissipation. Their flow channel design directly affects gas distribution, water management, and heat conduction efficiency.

[0061] Among these factors, the resistance characteristics of the flow field are a crucial indicator for evaluating the rationality of the flow field design. Hydrogen, air, and water are all affected by flow field resistance when flowing within the fuel cell stack. The flow resistance of the anode and cathode flow fields affects the uniform distribution of gases, ensuring that all parts of the fuel cell can effectively carry out chemical reactions and improve energy conversion efficiency. Furthermore, it influences water formation and removal; excessive water can clog flow channels or electrodes, affecting battery performance. The flow resistance of the coolant flow field affects the heat dissipation of the fuel cell stack. A reasonable coolant flow field resistance helps manage the battery temperature, ensuring that the battery operates within a suitable temperature range and preventing overheating or overcooling. The flow field resistance directly affects the efficiency and lifespan of the fuel cell.

[0062] Currently, the flow resistance of bipolar plates is typically obtained through simulation analysis and theoretical calculations. However, simulation models often require simplification and differ from actual bipolar plate structures. Furthermore, the assumptions and boundary conditions used in simulations are often idealized. Therefore, the data obtained through simulation calculations cannot fully and accurately reflect the actual operating conditions of the bipolar plate. In addition, traditional flow resistance monitoring devices are overly complex, inconvenient to operate, and have limited monitoring locations. They can only monitor the entire plate at the single-cell level, failing to reflect the true changes in flow resistance in different regions of the fuel cell stack during actual operation.

[0063] To address the aforementioned issues, this disclosure provides a method, apparatus, and system for monitoring the flow resistance of a fuel cell bipolar plate. The method involves acquiring the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test. These actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor. The pressure sensor is connected via a pressure-sensing tube to a pressure-sensing hole located at the bottom of the target flow channel within the bipolar plate, near the measuring point. The method also acquires the calibrated pressure drop value for each target flow channel. For each target flow channel, the method determines the flow channel pressure drop value based on the actual gas pressure values ​​at multiple measuring points within the target flow channel. The pressure drop information includes the pressure drop value of each target flow channel within the target area. For each target flow channel, the method determines whether the flow resistance meets a first preset condition based on the flow channel pressure drop value and the calibrated pressure drop value. If the flow resistance of the target flow channel does not meet the first preset condition, the method determines that the flow resistance of the target flow channel is abnormal. By setting pressure taps at multiple measuring points at the bottom of the bipolar plate's flow channel, pressure values ​​at different locations on the bipolar plate can be obtained using only pressure sensors. This allows for the determination of pressure drops in different flow channels, and enables convenient and quick identification of abnormal flow resistance in different areas of the bipolar plate, thus improving the accuracy of bipolar plate flow resistance monitoring.

[0064] Figure 1 This is a flowchart illustrating a method for monitoring the flow resistance of a fuel cell bipolar plate according to an exemplary embodiment, such as... Figure 1As shown, it should be noted that the fuel cell bipolar plate flow resistance monitoring method of this disclosure is applied in a fuel cell bipolar plate flow resistance monitoring device. Figure 1 As shown, the method may include the following steps:

[0065] Step 101: Obtain the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test; the actual gas pressure values ​​are obtained by detecting the measuring points using pressure sensors.

[0066] The pressure sensor is connected to a pressure-sensing hole located at the bottom of the target flow channel in the bipolar plate via a pressure-sensing tube.

[0067] In some embodiments of this application, in order to eliminate the influence of end effect on monitoring results, a 5-section short stack can be used for testing and verification.

[0068] In one embodiment, such as Figure 2 As shown, the thickness of the bipolar plate to be tested can be 18mm, and the width of the flow channel can be 1mm. At different test points 1 of different target flow channels to be tested, a pressure-sensing hole 3 with a diameter of 1mm can be opened at the bottom of the target flow channel 2 along the long side of the bipolar plate. The pressure-sensing hole 3 is a through hole. The end of the pressure-sensing hole 3 near the outer side of the bipolar plate is provided with a threaded part 31 for fixing the pressure-sensing tube. The pressure-sensing tube passes through the pressure-sensing hole 3 and is threadedly connected to the pressure-sensing hole 3 through the threaded part 31. One end of the pressure-sensing tube is connected to the pressure sensor, and the other end is connected to the target flow channel 2.

[0069] As one possible implementation method, the pressure sensor can be controlled to collect the actual gas pressure value at the measuring point at a preset frequency according to actual needs.

[0070] Step 102: Obtain the calibrated pressure drop value for each target flow channel.

[0071] In some embodiments of this application, the pressure drop value of the target flow channel of the bipolar plate under test in offline dry gas state can be calculated, and the average of multiple pressure drop values ​​within a preset time period can be obtained to obtain the calibrated pressure drop value of the target flow channel.

[0072] It is understandable that the offline dry gas state is the state in which the bipolar plate is not under load and the gas is dry. Determining the calibration pressure drop value when the bipolar plate under test is in the offline dry gas state can eliminate the influence of water on the pressure drop.

[0073] Step 103: For each target flow channel, determine the flow channel pressure drop value based on the actual gas pressure values ​​at multiple measuring points within the target flow channel.

[0074] The pressure drop information includes the pressure drop value of each target flow channel within the target area.

[0075] In some embodiments of this application, such as Figure 3 As shown, the target flow channels include a first flow channel 41, a second flow channel 42, a third flow channel 51, and a fourth flow channel 52. The first flow channel 41 is the first flow channel of the gas inlet distribution area 4 of the bipolar plate under test. The second flow channel 42 is the last flow channel of the gas inlet distribution area 4 of the bipolar plate under test. The third flow channel 51 is the first flow channel of the gas outlet distribution area 5 of the bipolar plate under test. The fourth flow channel 52 is the last flow channel of the gas outlet distribution area 5 of the bipolar plate under test. Step 101 may specifically include:

[0076] Obtain the pressure value of the first measuring point 6 and the pressure value of the second measuring point 7 on each target flow channel in the first flow channel 41, the second flow channel 42, the third flow channel 51 and the fourth flow channel 52; the first measuring point 6 is the starting point of the target flow channel and the second measuring point 7 is the ending point of the target flow channel;

[0077] Step 103 may specifically include:

[0078] For each target flow channel among the first flow channel 41, second flow channel 42, third flow channel 51, and fourth flow channel 52, the pressure difference between the pressure value at the first measuring point 6 and the pressure value at the second measuring point 7 on the target flow channel is calculated to obtain the flow channel pressure drop value. In one embodiment, such as Figure 3 As shown, in order to verify the pressure loss of the bipolar plate and the true pressure drop of the entire bipolar plate, points can be set up in the first channel of the gas inlet distribution area 4 of the bipolar plate under test, the last channel of the gas inlet distribution area 4 of the bipolar plate under test, the first channel of the gas outlet distribution area 5 of the bipolar plate under test, and the last channel of the gas outlet distribution area 5 of the bipolar plate under test. A measuring point is set at the beginning and end of each channel to determine the channel pressure drop value of the target channel each time.

[0079] As an example of a possible implementation, the difference between the pressure drop values ​​of the first and last channels of the gas inlet distribution zone can be calculated to obtain a second difference. If the second difference is greater than or equal to a preset threshold, it indicates that the pressure distribution in the gas inlet distribution zone is uneven, and it is determined that there is an abnormal flow resistance in the gas inlet distribution zone, that is, there is a risk of water blockage in the gas inlet distribution zone.

[0080] In one embodiment, when the target flow channel is any one of the first, second, third, and fourth flow channels, the rated pressure drop of the target flow channel can be calculated using the following formula: [Formula omitted for brevity].

[0081] △P 离 =P 起点 -P 终点

[0082] △P avg离 =△P 离 / k

[0083] Among them, △P 离 For, P 起点 P represents the pressure value at the first measuring point under offline dry gas conditions. 终点 The pressure value at the second measuring point under offline dry gas conditions, ΔP avg离 To calibrate the voltage drop value, k is the duration of the preset time period, which can be 5 minutes.

[0084] In other embodiments of this application, the target flow channel includes a fifth flow channel, and there are multiple fifth flow channels. The fifth flow channel is a flow channel disposed in the mainstream reaction region of the bipolar plate under test; the multiple fifth flow channels are evenly distributed, and step 101 may specifically include:

[0085] Obtain the pressure values ​​at the third, fourth, and fifth measuring points on each of the multiple fifth flow channels; the third measuring point is the starting point of the fifth flow channel, the fourth measuring point is the midpoint of the fifth flow channel, and the fifth measuring point is the ending point of the fifth flow channel.

[0086] Step 103 may specifically include:

[0087] For each of the multiple fifth flow channels, the flow channel pressure drop value of the target flow channel is calculated using the following formula:

[0088] △P i在 =P i起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点

[0089] Among them, △P i在 Let P be the pressure drop value of the i-th target flow channel. i起点 The pressure value at the third measuring point, P i中间 The pressure value at the fourth measuring point, P i终点 This is the pressure value at the fifth measuring point.

[0090] Understandably, in order to reduce the difficulty of machining the measuring points, a portion of the mainstream reaction zone can be selected as the fifth flow channel according to actual needs.

[0091] It should be noted that setting measuring points at the start, midpoint, and end of the fifth flow channel can shorten the distance between measuring points, thereby enabling more accurate calculation of the flow resistance and drainage capacity of the fifth flow channel.

[0092] In one embodiment, when the target flow channel is the fifth flow channel, the rated pressure drop of the target flow channel can be calculated using the following formula:

[0093] △P i离 =Pi起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点

[0094] △P avg离 =△P i离 / k

[0095] Among them, △P i离 Let P be the pressure drop value under offline dry gas conditions in the i-th target flow channel. i起点 P represents the pressure value at the third measuring point under offline dry gas conditions. i中间 The pressure value at the fourth measuring point under offline dry gas conditions, P i终点 The pressure value at the fifth measuring point under offline dry gas conditions, ΔP avg离 To calibrate the voltage drop value, k is the duration of the preset time period, which can be 5 minutes.

[0096] In some embodiments of this application, the pressure drop value of the target flow channel of the bipolar plate under test in offline dry gas state can be calculated, and the average of multiple pressure drop values ​​within a preset time period can be obtained to obtain the calibrated pressure drop value of the target flow channel.

[0097] It is understandable that the offline dry gas state is the state in which the bipolar plate is not under load and the gas is dry. Determining the calibration pressure drop value when the bipolar plate under test is in the offline dry gas state can eliminate the influence of water on the pressure drop.

[0098] In some embodiments of this application, when using a test bench to monitor the bipolar plate under test, measuring points can be arranged at the gas inlet 9 and gas outlet 10 of the bipolar plate under test. Pressure sensors are used to test the actual pressure of gas entering and exiting the stack. If the difference between the gas inlet pressure and the gas outlet pressure is greater than a preset threshold, it is determined that the pressure loss of the verification test bench is large. The gas inlet pressure can be increased so that the gas outlet pressure reaches the desired pressure value, thereby correcting the test verification conditions.

[0099] Step 104: For each target flow channel, determine whether the flow resistance of the target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibrated pressure drop value. If the flow resistance of the target flow channel does not meet the first preset condition, determine that the flow resistance of the target flow channel is abnormal.

[0100] In one embodiment, the flow resistance of the target flow channel can be determined based on the degree of difference between the flow channel pressure drop value and the calibrated pressure drop value. If the flow resistance of the target flow channel does not meet the first preset condition, it indicates that the difference between the flow channel pressure drop value and the calibrated pressure drop value is too large, and the flow resistance of the target flow channel is in an abnormal state.

[0101] In some embodiments of this application, the calibration pressure drop value is the first average value of the target flow channel pressure drop value within a first preset time period under offline dry gas conditions. Step 104, which determines whether the flow resistance of the target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibration pressure drop value, may specifically include the following steps:

[0102] Calculate the second average value of the flow channel pressure drop within the second preset interval of the target flow channel;

[0103] Calculate the difference between the first average and the second average to obtain the first difference value;

[0104] Determine the proportion of the first difference in the second average;

[0105] If the proportion value is greater than the first preset proportion value, it is determined that the flow resistance of the target flow channel does not meet the first preset condition.

[0106] In one embodiment, the first preset condition may be (△P) avg在 -△P avg离 ) / △P avg离 *100%≤10%, where, △P avg在 The second average value, △P avg离 This is the first average value.

[0107] In some embodiments of this application, the method may further include the following steps:

[0108] For each target flow channel, the flow rate of the target flow channel is determined based on the pressure drop value of the target flow channel;

[0109] Obtain the total flow rate of the bipolar plate under test;

[0110] Based on the total flow rate and the flow channel flow rate, determine whether the flow rate of the target flow channel meets the second preset condition;

[0111] If the flow rate of at least one target channel does not meet the second preset condition, the flow field distribution of the bipolar plate is determined to be non-uniform.

[0112] In some embodiments of this application, determining whether the flow rate of the target channel meets the second preset condition based on the overall board flow rate and the channel flow rate may specifically include the following steps:

[0113] Obtain the first relationship between flow rate and pressure drop; the first relationship is obtained by fitting the relationship between the whole plate flow rate and pressure drop of the bipolar plate under offline dry gas conditions;

[0114] Calculate the flow rate of the target channel using the flow channel flow rate and the first relational expression;

[0115] Calculate the first proportion of the total flow rate in the number of flow channels of the bipolar plate under test to obtain the standard flow rate;

[0116] Calculate the second proportion of the target flow channel's flow rate in the standard flow rate. If the second proportion is greater than a preset threshold, determine that the target flow channel's flow rate does not meet the second preset condition.

[0117] In one embodiment, the relationship between the overall plate flow rate and pressure drop under offline dry gas conditions can be calibrated, and a first relationship between flow rate and pressure drop can be fitted based on the data:

[0118] Q i =2.27△P i +0.34△P i 2 +16.07

[0119] Among them, Q i Let ΔP be the flow rate of the i-th target channel. i Let be the pressure drop value of the i-th target flow channel. Based on the first relationship above, the flow rate of the target flow channel can be determined based on the pressure drop value of the target flow channel.

[0120] As an example, the standard flow rate Q of a single channel in a whole plate under theoretical conditions can be calculated using the following formula. i理 :

[0121] Q i理 =Q / n

[0122] Where Q is the total plate flow rate, n is the number of flow channels, and n≥1.

[0123] In one embodiment, the second preset condition can be |Q i / Q i理 -1|*100%≤10%.

[0124] According to the fuel cell bipolar plate flow resistance monitoring method proposed in this disclosure, the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test are obtained. The actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor. The pressure sensor is connected via a pressure-sensing tube to a pressure-sensing hole located at the bottom of the target flow channel in the bipolar plate at the measuring point position. The calibrated pressure drop value of each target flow channel is obtained. For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel. The pressure drop information includes the pressure drop value of each target flow channel within the target area. For each target flow channel, based on the flow channel pressure drop value and the calibrated pressure drop value, it is determined whether the flow resistance of the target flow channel meets a first preset condition. If the flow resistance of the target flow channel does not meet the first preset condition, the flow resistance of the target flow channel is determined to be abnormal. By setting pressure taps at multiple measuring points at the bottom of the bipolar plate's flow channel, pressure values ​​at different locations on the bipolar plate can be obtained using only pressure sensors. This allows for the determination of pressure drops in different flow channels, and enables convenient and quick identification of abnormal flow resistance in different areas of the bipolar plate, thus improving the accuracy of bipolar plate flow resistance monitoring.

[0125] Figure 4 This is a block diagram illustrating a fuel cell bipolar plate flow resistance monitoring device according to an exemplary embodiment. (Refer to...) Figure 4 The device includes a first acquisition unit 401, a second acquisition unit 402, a first determination unit 403, and a second determination unit 404.

[0126] The first acquisition unit 401 is used to acquire the actual gas pressure values ​​of multiple measuring points on each target flow channel in the bipolar plate under test. The actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor. The pressure sensor is connected to a pressure-sensing hole located at the bottom of the measuring point in the bipolar plate through a pressure-sensing tube.

[0127] The second acquisition unit 402 is used to acquire the calibration pressure drop value of each target flow channel;

[0128] The first determining unit 403 is used to determine the flow channel pressure drop value of each target flow channel based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area;

[0129] The second determining unit 404 is used to determine whether the flow resistance of each target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibrated pressure drop value. If the flow resistance of the target flow channel does not meet the first preset condition, the flow resistance of the target flow channel is determined to be abnormal.

[0130] In some embodiments of this application, the apparatus may further include:

[0131] The third determining unit is used to determine the flow rate of each target flow channel based on the pressure drop value of the target flow channel.

[0132] The third acquisition unit is used to acquire the total flow rate of the bipolar plate under test;

[0133] The fourth determining unit is used to determine whether the flow rate of the target flow channel meets the second preset condition based on the overall plate flow rate and the flow channel flow rate.

[0134] The fifth determining unit is used to determine that the flow field distribution of the bipolar plate is non-uniform when the flow rate of at least one target flow channel does not meet the second preset condition.

[0135] In some embodiments of this application, the target flow channel includes a first flow channel, a second flow channel, a third flow channel, and a fourth flow channel. The first flow channel is the first flow channel of the gas inlet distribution area of ​​the bipolar plate under test, the second flow channel is the last flow channel of the gas inlet distribution area of ​​the bipolar plate under test, the third flow channel is the first flow channel of the gas outlet distribution area of ​​the bipolar plate under test, and the fourth flow channel is the last flow channel of the gas outlet distribution area of ​​the bipolar plate under test. The first acquisition unit 401 can be specifically used to: acquire the pressure value of the first measuring point and the pressure value of the second measuring point on each target flow channel in the first, second, third, and fourth flow channels; the first measuring point is the starting point of the target flow channel, and the second measuring point is the ending point of the target flow channel. The first determination unit 403 can be specifically used to: for each target flow channel in the first, second, third, and fourth flow channels, calculate the difference between the pressure value of the first measuring point and the pressure value of the second measuring point on the target flow channel to obtain the flow channel pressure drop value of the target flow channel.

[0136] In some embodiments of this application, the target flow channel includes a fifth flow channel, and there are multiple fifth flow channels. Each fifth flow channel is a flow channel located in the mainstream reaction zone of the bipolar plate under test. The multiple fifth flow channels are evenly distributed. Specifically, the first acquisition unit 401 can be used to: acquire the pressure values ​​of a third measuring point, a fourth measuring point, and a fifth measuring point on each of the multiple fifth flow channels; the third measuring point is the starting point of the fifth flow channel, the fourth measuring point is the midpoint of the fifth flow channel, and the fifth measuring point is the ending point of the fifth flow channel; the first determination unit 403 can be used to:

[0137] For each of the multiple fifth flow channels, the flow channel pressure drop value of the target flow channel is calculated using the following formula:

[0138] △P i在 =P i起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点

[0139] Among them, △P i在 Let P be the pressure drop value of the i-th target flow channel. i起点 The pressure value at the third measuring point, P i中间 The pressure value at the fourth measuring point, P i终点 This is the pressure value at the fifth measuring point.

[0140] In some embodiments of this application, the calibration pressure drop value is the first average value of the target flow channel pressure drop value within a first preset time period under offline dry gas conditions;

[0141] In some embodiments of this application, the second determining unit 404 may specifically be used to: calculate the second average value of the flow channel pressure drop value of the target flow channel within the second preset interval;

[0142] Calculate the difference between the first average and the second average to obtain the first difference value;

[0143] Determine the proportion of the first difference in the second average;

[0144] If the proportion value is greater than the first preset proportion value, it is determined that the flow resistance of the target flow channel does not meet the first preset condition.

[0145] In some embodiments of this application, the fourth determining unit may specifically be used for:

[0146] Obtain the first relationship between flow rate and pressure drop; the first relationship is obtained by fitting the relationship between the whole plate flow rate and pressure drop of the bipolar plate under offline dry gas conditions;

[0147] Calculate the flow rate of the target channel using the flow channel flow rate and the first relational expression;

[0148] Calculate the first proportion of the total flow rate in the number of flow channels of the bipolar plate under test to obtain the standard flow rate;

[0149] Calculate the second proportion of the target flow channel's flow rate in the standard flow rate. If the second proportion is greater than a preset threshold, determine that the target flow channel's flow rate does not meet the second preset condition.

[0150] Regarding the apparatus in the above embodiments, the specific manner in which each module performs its operation has been described in detail in the embodiments related to the method, and will not be elaborated upon here.

[0151] According to the fuel cell bipolar plate flow resistance monitoring device proposed in this embodiment, the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test are obtained. The actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor. The pressure sensor is connected via a pressure-sensing tube to a pressure-sensing hole located at the bottom of the measuring point in the bipolar plate. The calibrated pressure drop value of each target flow channel is obtained. For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel. The pressure drop information includes the pressure drop value of each target flow channel within the target area. For each target flow channel, based on the flow channel pressure drop value and the calibrated pressure drop value, it is determined whether the flow resistance of the target flow channel meets a first preset condition. If the flow resistance of the target flow channel does not meet the first preset condition, the flow resistance of the target flow channel is determined to be abnormal. By setting pressure taps at multiple measuring points at the bottom of the bipolar plate's flow channel, pressure values ​​at different locations on the bipolar plate can be obtained using only pressure sensors. This allows for the determination of pressure drops in different flow channels, and enables convenient and quick identification of abnormal flow resistance in different areas of the bipolar plate, thus improving the accuracy of bipolar plate flow resistance monitoring.

[0152] Figure 5 This is a block diagram illustrating an apparatus for a method of monitoring the flow resistance of a fuel cell bipolar plate, according to an exemplary embodiment. For example, apparatus 500 may be an electronic device, such as a mobile phone, computer, digital broadcasting terminal, messaging device, game console, tablet device, medical device, fitness equipment, personal digital assistant, etc.

[0153] Reference Figure 5 The device 500 may include one or more of the following components: a processing component 502, a memory 504, a power component 506, a multimedia component 508, an audio component 510, an input / output (I / O) interface 512, a sensor component 514, and a communication component 516.

[0154] Processing component 502 typically controls the overall operation of device 500, such as operations associated with display, telephone calls, data communication, camera operation, and recording. Processing component 502 may include one or more processors 520 to execute instructions to complete all or part of the steps of the methods described above. Furthermore, processing component 502 may include one or more modules to facilitate interaction between processing component 502 and other components. For example, processing component 502 may include a multimedia module to facilitate interaction between multimedia component 508 and processing component 502.

[0155] Memory 504 is configured to store various types of data to support the operation of device 500. Examples of this data include instructions for any application or method operating on device 500, contact data, phonebook data, messages, pictures, videos, etc. Memory 504 can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as static random access memory (SRAM), electrically erasable programmable read-only memory (EEPROM), erasable programmable read-only memory (EPROM), programmable read-only memory (PROM), read-only memory (ROM), magnetic storage, flash memory, magnetic disk, or optical disk.

[0156] The power supply component 506 provides power to the various components of the device 500. The power supply component 506 may include a power management system, one or more power sources, and other components associated with generating, managing, and distributing power to the device 500.

[0157] Multimedia component 508 includes a screen that provides an output interface between the device 500 and the user. In some embodiments, the screen may include a liquid crystal display (LCD) and a touch panel (TP). If the screen includes a touch panel, the screen may be implemented as a touchscreen to receive input signals from the user. The touch panel includes one or more touch sensors to sense touches, swipes, and gestures on the touch panel. The touch sensors may sense not only the boundaries of the touch or swipe action but also the duration and pressure associated with the touch or swipe operation. In some embodiments, multimedia component 508 includes a front-facing camera and / or a rear-facing camera. When the device 500 is in an operating mode, such as a shooting mode or a video mode, the front-facing camera and / or the rear-facing camera may receive external multimedia data. Each front-facing camera and rear-facing camera may be a fixed optical lens system or have focal length and optical zoom capabilities.

[0158] Audio component 510 is configured to output and / or input audio signals. For example, audio component 510 includes a microphone (MIC) configured to receive external audio signals when device 500 is in an operating mode, such as call mode, recording mode, and voice recognition mode. The received audio signals may be further stored in memory 504 or transmitted via communication component 516. In some embodiments, audio component 510 also includes a speaker for outputting audio signals.

[0159] I / O interface 512 provides an interface between processing component 502 and peripheral interface modules, such as keyboards, click wheels, buttons, etc. These buttons may include, but are not limited to, home buttons, volume buttons, power buttons, and lock buttons.

[0160] Sensor assembly 514 includes one or more sensors for providing status assessments of various aspects of device 500. For example, sensor assembly 514 may detect the on / off state of device 500, the relative positioning of components such as the display and keypad of device 500, changes in the position of device 500 or a component of device 500, the presence or absence of user contact with device 500, the orientation or acceleration / deceleration of device 500, and temperature changes of device 500. Sensor assembly 514 may include a proximity sensor configured to detect the presence of nearby objects without any physical contact. Sensor assembly 514 may also include a light sensor, such as a CMOS or CCD image sensor, for use in imaging applications. In some embodiments, sensor assembly 514 may also include an accelerometer, a gyroscope, a magnetometer, a pressure sensor, or a temperature sensor.

[0161] Communication component 516 is configured to facilitate wired or wireless communication between device 500 and other devices. Device 500 can access wireless networks based on communication standards, such as WiFi, 2G, or 3G, or combinations thereof. In one exemplary embodiment, communication component 516 receives broadcast signals or broadcast-related information from an external broadcast management system via a broadcast channel. In one exemplary embodiment, communication component 516 also includes a near-field communication (NFC) module to facilitate short-range communication. For example, the NFC module may be implemented based on radio frequency identification (RFID) technology, Infrared Data Association (IrDA) technology, ultra-wideband (UWB) technology, Bluetooth (BT) technology, and other technologies.

[0162] In an exemplary embodiment, the apparatus 500 may be implemented by one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), controllers, microcontrollers, microprocessors, or other electronic components to perform the methods described above.

[0163] In an exemplary embodiment, a non-transitory computer-readable storage medium including instructions is also provided, such as a memory 504 including instructions, which can be executed by a processor 520 of the device 500 to perform the above-described method. For example, the non-transitory computer-readable storage medium may be a ROM, random access memory (RAM), CD-ROM, magnetic tape, floppy disk, and optical data storage device, etc.

[0164] In an exemplary embodiment, a computer program product is also provided, including a computer program that implements the above-described method when executed by the processor 520 of the device 500.

[0165] Other embodiments of the invention will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This disclosure is intended to cover any variations, uses, or adaptations of the invention that follow the general principles of the invention and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of the invention are indicated by the following claims.

[0166] It should be understood that the present invention is not limited to the precise structure described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of the invention is limited only by the appended claims.

Claims

1. A method for monitoring the flow resistance of a fuel cell bipolar plate, characterized in that, include: The actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test are obtained; the actual gas pressure values ​​are obtained by detecting the measuring points using pressure sensors. The pressure sensor is connected to a pressure-sensing hole located at the measuring point at the bottom of the target flow channel in the bipolar plate via a pressure-sensing tube. Obtain the calibrated pressure drop value for each target flow channel; For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area; For each target flow channel, based on the flow channel pressure drop value and the calibrated pressure drop value, it is determined whether the flow resistance of the target flow channel meets the first preset condition. If the flow resistance of the target flow channel does not meet the first preset condition, it is determined that the flow resistance of the target flow channel is abnormal. Wherein, the calibration pressure drop value is the first average value of the target flow channel pressure drop value of the bipolar plate under test in the first preset time period under offline dry gas condition; The step of determining whether the flow resistance of the target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibrated pressure drop value includes: Calculate the second average value of the flow channel pressure drop value of the target flow channel within the second preset interval; Calculate the difference between the first average value and the second average value to obtain the first difference value; Determine the proportion of the first difference in the second average value; If the percentage value is greater than the first preset percentage value, it is determined that the flow resistance of the target flow channel does not meet the first preset condition.

2. The fuel cell bipolar plate flow resistance monitoring method according to claim 1, characterized in that, Also includes: For each target flow channel, the flow rate of the target flow channel is determined based on the pressure drop value of the target flow channel; Obtain the total flow rate of the bipolar plate under test; Based on the total flow rate of the plate and the flow channel flow rate, determine whether the flow rate of the target flow channel meets the second preset condition; If the flow rate of at least one target channel does not meet the second preset condition, it is determined that the flow field distribution of the bipolar plate is non-uniform.

3. The fuel cell bipolar plate flow resistance monitoring method according to claim 1, characterized in that, The target flow channel includes a first flow channel, a second flow channel, a third flow channel, and a fourth flow channel. The first flow channel is the first flow channel of the gas inlet distribution area of ​​the bipolar plate under test. The second flow channel is the last flow channel of the gas inlet distribution area of ​​the bipolar plate under test. The third flow channel is the first flow channel of the gas outlet distribution area of ​​the bipolar plate under test. The fourth flow channel is the last flow channel of the gas outlet distribution area of ​​the bipolar plate under test. The process of obtaining the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test includes: Obtain the pressure values ​​of the first measuring point and the second measuring point on each target flow channel in the first, second, third, and fourth flow channels; the first measuring point is the starting point of the target flow channel, and the second measuring point is the ending point of the target flow channel; For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel, including: For each target flow channel among the first, second, third, and fourth flow channels, the pressure difference between the pressure value at the first measuring point and the pressure value at the second measuring point on the target flow channel is calculated to obtain the flow channel pressure drop value of the target flow channel.

4. The fuel cell bipolar plate flow resistance monitoring method according to claim 1, characterized in that, The target flow channel includes a fifth flow channel, and there are multiple fifth flow channels. The fifth flow channel is a flow channel set in the mainstream reaction zone of the bipolar plate under test; the multiple fifth flow channels are evenly distributed. The process of obtaining the actual gas pressure values ​​at multiple measuring points on each target flow channel in the bipolar plate under test includes: Obtain the pressure values ​​at the third, fourth, and fifth measuring points on each of the multiple fifth flow channels; the third measuring point is the starting point of the fifth flow channel, the fourth measuring point is the midpoint of the fifth flow channel, and the fifth measuring point is the ending point of the fifth flow channel. For each target flow channel, the flow channel pressure drop value is determined based on the actual gas pressure values ​​at multiple measuring points within the target flow channel, including: For each of the multiple fifth flow channels, the flow channel pressure drop value of the target flow channel is calculated using the following formula: △P i在 =P i起点 -P i终点 / P i起点 -P i中间 / P i中间 -P i终点 Among them, △P i在 Let P be the pressure drop value of the i-th target flow channel. i起点 The pressure value at the third measuring point, P i中间 The pressure value at the fourth measuring point, P i终点 This is the pressure value at the fifth measuring point.

5. The fuel cell bipolar plate flow resistance monitoring method according to claim 2, characterized in that, The step of determining whether the flow rate of the target channel meets the second preset condition based on the overall board flow rate and the channel flow rate includes: Obtain the first relationship between flow rate and pressure drop; the first relationship is obtained by fitting the relationship between the overall flow rate and pressure drop of the bipolar plate under offline dry gas conditions; The flow rate of the target flow channel is calculated using the flow rate of the channel and the first relationship. The standard flow rate is obtained by calculating the first proportion of the total plate flow rate in the number of flow channels of the bipolar plate under test. Calculate the second percentage of the flow rate of the target flow channel in the standard flow rate. If the second percentage is greater than a preset threshold, determine that the flow rate of the target flow channel does not meet the second preset condition.

6. A fuel cell bipolar plate flow resistance monitoring device, characterized in that, The method described by any one of claims 1-5 includes: The first acquisition unit is used to acquire the actual gas pressure values ​​of multiple measuring points on each target flow channel in the bipolar plate under test; the actual gas pressure values ​​are obtained by detecting the measuring points using a pressure sensor; the pressure sensor is connected to a pressure-sensing hole located at the bottom of the measuring point in the bipolar plate through a pressure-sensing tube; The second acquisition unit is used to acquire the calibrated pressure drop value of each target flow channel; The first determining unit is used to determine the pressure drop value of each target flow channel based on the actual gas pressure values ​​at multiple measuring points within the target flow channel; the pressure drop information includes the pressure drop value of each target flow channel within the target area; The second determining unit is used to determine, for each target flow channel, whether the flow resistance of the target flow channel meets the first preset condition based on the flow channel pressure drop value and the calibration pressure drop value, and to determine that the flow resistance of the target flow channel is abnormal if the flow resistance of the target flow channel does not meet the first preset condition.

7. An electronic device, characterized in that, include: A memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor, when executing the computer program, implements the method as described in any one of claims 1 to 5.

8. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by a processor, it implements the method as described in any one of claims 1 to 5.

9. A computer program product, comprising a computer program, characterized in that, The computer program, when executed by a processor, implements the method as described in any one of claims 1 to 5.

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