Display screen, preparation method thereof and head-mounted display equipment

Abstract

The invention discloses a display screen and a preparation method thereof, and a head-mounted display device. The display screen comprises a substrate; the pixel definition layer is formed on one side of the substrate and defines a pixel area, the pixel definition layer comprises a first pixel definition layer, a second pixel definition layer and a third pixel definition layer which are sequentially stacked in the direction away from the substrate, and the second pixel definition layer has conductivity; the light-emitting unit is formed in the pixel area and at least comprises an anode, a light-emitting layer and a cathode which are sequentially stacked in the direction away from the substrate, and the cathode is connected with the second pixel definition layer. According to the invention, the pixel definition layer is formed on one side of the substrate, the pixel definition layer defines the pixel area, the anode, the light-emitting layer and the cathode can be formed in the pixel area through a graphical process, and a light-emitting unit for emitting primary light can be formed in the pixel area of the pixel definition layer without using a fine metal mask so as to realize color display; a color display scheme adopting an optical filter can be avoided, and the brightness of the display screen can be improved.

Description

Technical Field

[0001] The present invention relates to the field of display technologies, and particularly to a display screen and a preparation method thereof. The present invention also relates to a head-mounted display device. Background Art

[0002] The organic light emitting diode (OLED) display technology has been widely applied in fields such as mobile phones, televisions, and vehicles due to its advantages of self-luminescence, wide color gamut, and flexible display.

[0003] Due to the special application scenarios of virtual reality (VR) and augmented reality (AR) technologies, the display screen is required to have higher resolution and smaller size. In order to achieve high resolution, the existing micro-OLED technology uses white organic light emitting diodes with color filters to achieve color display. This technology can avoid using a fine metal mask (FMM) when depositing the organic light emitting layer, and the cost of preparing the display screen using a fine metal mask is relatively high. However, using color filters will result in a large loss of light energy, leading to a low brightness of the display screen. Summary of the Invention

[0004] The purpose of the present invention is to provide a display screen and a preparation method thereof, such that a fine metal mask can be avoided and the brightness of the display screen can be improved. The present invention also provides a head-mounted display device.

[0005] To achieve the above purpose, the present invention provides the following technical solutions:

[0006] A display screen, comprising:

[0007] A substrate;

[0008] A pixel definition layer, formed on one side of the substrate, which defines a pixel region. The pixel definition layer includes a first pixel definition layer, a second pixel definition layer, and a third pixel definition layer stacked in sequence along a direction away from the substrate, and the second pixel definition layer has conductivity;

[0009] A light emitting unit, formed in the pixel region, which at least includes an anode, a light emitting layer, and a cathode stacked in sequence along a direction away from the substrate, and the cathode is connected to the second pixel definition layer.

[0010] Optionally, along a direction close to the substrate, the distance between the third pixel definition layers on both sides of the pixel region gradually increases.

[0011] Optionally, the distance between the second pixel definition layers on both sides of the pixel region is greater than the distance between the first pixel definition layers on both sides of the pixel region.

[0012] Optionally, the thickness of the first pixel definition layer is greater than or equal to the sum of the thicknesses of the anode and the light-emitting layer, and / or the thickness of the second pixel definition layer is greater than the thickness of the cathode.

[0013] Optionally, the light-emitting unit further includes a first encapsulation layer formed on the side of the cathode away from the substrate, and the thickness of the third pixel definition layer is greater than or equal to the thickness of the first encapsulation layer.

[0014] Optionally, the pixel definition layer forms the pixel regions arranged in an array form, and the second pixel definition layer is in a grid shape.

[0015] Optionally, the pixel definition layer defines a first pixel region, a second pixel region, and a third pixel region;

[0016] The light-emitting unit includes:

[0017] An anode, a first primary-color light-emitting layer, and the cathode formed in the first pixel region;

[0018] An anode, a second primary-color light-emitting layer, and the cathode formed in the second pixel region;

[0019] An anode, a third primary-color light-emitting layer, and the cathode formed in the third pixel region.

[0020] A method for manufacturing a display screen includes:

[0021] Forming an anode and a pixel definition layer on one side of a substrate, the pixel definition layer defining a pixel region, the pixel definition layer including a first pixel definition layer, a second pixel definition layer, and a third pixel definition layer stacked in sequence along a direction away from the substrate, and the second pixel definition layer having conductivity;

[0022] Forming a light-emitting layer and a cathode layer in sequence on the side of the substrate where the anode and the pixel definition layer are formed, such that the cathode layer in the pixel region is connected to the second pixel definition layer, and patterning the light-emitting layer and the cathode layer.

[0023] Optionally, forming the pixel definition layer on one side of the substrate includes:

[0024] Forming a first film layer on one side of the substrate and patterning the first film layer to form the first pixel definition layer;

[0025] Forming a second film layer on the side of the first pixel definition layer away from the substrate and patterning the second film layer to form the second pixel definition layer;

[0026] A third film layer is formed on a side of the second pixel defining layer away from the substrate and patterned to form the third pixel defining layer.

[0027] Optionally, the pixel defining layer defines a first pixel region, a second pixel region, and a third pixel region;

[0028] On a side of the substrate where the anode and the pixel defining layer are formed, a light emitting layer and a cathode layer are sequentially formed, such that the cathode layer in the pixel region is connected to the second pixel defining layer, and patterning the light emitting layer and the cathode layer includes:

[0029] A first primary color light emitting layer, a cathode layer, and a first encapsulation layer are sequentially formed on a side of the anode and the pixel defining layer away from the substrate, such that the cathode layer in the first pixel region is connected to the second pixel defining layer, and the first primary color light emitting layer, the cathode layer, and the first encapsulation layer in the second pixel region and the third pixel region are removed;

[0030] A second primary color light emitting layer, the cathode layer, and the first encapsulation layer are sequentially formed on a side of the anode and the pixel defining layer away from the substrate, such that the cathode layer in the second pixel region is connected to the second pixel defining layer, and the second primary color light emitting layer, the cathode layer, and the first encapsulation layer in the first pixel region and the third pixel region are removed;

[0031] A third primary color light emitting layer, the cathode layer, and the first encapsulation layer are sequentially formed on a side of the anode and the pixel defining layer away from the substrate, such that the cathode layer in the third pixel region is connected to the second pixel defining layer, and the third primary color light emitting layer, the cathode layer, and the first encapsulation layer in the first pixel region and the second pixel region are removed.

[0032] A head-mounted display device, the head-mounted display device includes an optical element and the display screen according to any one of the above, wherein the optical element is disposed on an outgoing light path of the display screen.

[0033] As can be seen from the above technical solutions, a display screen and a manufacturing method thereof provided by the present invention, the display screen includes: a substrate; a pixel definition layer formed on one side of the substrate, which defines a pixel region, and the pixel definition layer includes a first pixel definition layer, a second pixel definition layer, and a third pixel definition layer stacked in sequence along a direction away from the substrate, and the second pixel definition layer has conductivity; a light-emitting unit formed in the pixel region, which at least includes an anode, a light-emitting layer, and a cathode stacked in sequence along a direction away from the substrate, and the cathode is connected to the second pixel definition layer. For the display screen and the manufacturing method thereof of the present invention, a pixel definition layer is formed on one side of the substrate, and the pixel definition layer defines the pixel region, so that an anode, a light-emitting layer, and a cathode can be formed in the pixel region through a patterning process, and a fine metal mask plate can be not used. A light-emitting unit for emitting primary color light can be formed in the pixel region defined by the pixel definition layer, so that the display screen can achieve color display, a color display scheme using a color filter can be avoided, and the brightness of the display screen can be improved.

[0034] A head-mounted display device provided by the present invention can achieve the above beneficial effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0036] Figure 1 A longitudinal cross-sectional view of a display screen provided for an embodiment;

[0037] Figure 2 A longitudinal cross-sectional view of the pixel definition layer between adjacent pixel regions of a display screen provided for an embodiment;

[0038] Figure 3 A longitudinal cross-sectional view of an anode, a light-emitting layer, a cathode, and a first encapsulation layer formed in a pixel region of a display screen provided for an embodiment;

[0039] Figure 4 A structural diagram of a second pixel definition layer of a display screen provided for an embodiment;

[0040] Figure 5 A longitudinal cross-sectional view of forming a first pixel definition layer on a substrate in a display screen manufacturing method provided for an embodiment;

[0041] Figure 6 A longitudinal cross-sectional view of forming a second pixel definition layer on a substrate in a display screen manufacturing method provided for an embodiment;

[0042] Figure 7 Schematic longitudinal sectional view of forming a third pixel defining layer on a substrate for a display screen manufacturing method provided in an embodiment;

[0043] Figure 8 Flow chart of a display screen manufacturing method provided in an embodiment;

[0044] Figure 9 Schematic view of forming a first primary color light emitting layer, a cathode layer, and a first encapsulation layer on a substrate for a display screen manufacturing method provided in an embodiment;

[0045] Figure 10 Schematic view of forming a first primary color light emitting unit in a first pixel region on a substrate for a display screen manufacturing method provided in an embodiment;

[0046] Figure 11 Schematic view of forming corresponding primary color light emitting units in respective pixel regions for a display screen manufacturing method provided in an embodiment.

[0047] Reference numerals in the accompanying drawings of the specification include:

[0048] 101 - Substrate, 102 - Display area, 103 - Cathode ring, 501 - First pixel defining layer, 601 - Second pixel defining layer, 701 - Third pixel defining layer, 801 - First encapsulation layer, 901 - Second encapsulation layer;

[0049] 200 - Anode, 300 - Light emitting layer, 400 - Cathode, 201 - Anode of the first pixel region, 202 - Anode of the second pixel region, 203 - Anode of the third pixel region, 301 - First primary color light emitting layer, 302 - Second primary color light emitting layer, 303 - Third primary color light emitting layer, 401 - Cathode of the first pixel region, 402 - Cathode of the second pixel region, 403 - Cathode of the third pixel region. Detailed implementation manners

[0050] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0051] This embodiment provides a display screen, including:

[0052] Substrate 101;

[0053] A pixel definition layer is formed on one side of the substrate 101, which defines a pixel region. The pixel definition layer includes a first pixel definition layer 501, a second pixel definition layer 601, and a third pixel definition layer 701 that are sequentially stacked along a direction away from the substrate 101. The second pixel definition layer 601 has conductivity.

[0054] A light-emitting unit is formed in the pixel region, and at least includes an anode 200, a light-emitting layer 300, and a cathode 400 that are sequentially stacked along a direction away from the substrate 101. The cathode 400 is connected to the second pixel definition layer 601.

[0055] The pixel region corresponds to a primary color light-emitting pixel of the display screen. The cathode 400 in the pixel region is connected to the second pixel definition layer 601, and the second pixel definition layer 601 has conductivity, so that the cathodes 400 of each pixel region can be connected to the cathode ring 103 of the display screen through the second pixel definition layer 601.

[0056] In the display screen of this embodiment, a pixel definition layer is formed on one side of the substrate, and the pixel definition layer defines a pixel region. When manufacturing and forming the light-emitting unit, the light-emitting layer can be etched according to the pixel region defined by the pixel definition layer, so that the light-emitting layer can be formed in the pixel region through a patterning process, and a fine metal mask can be not used. A light-emitting unit for emitting primary color light can be formed in the pixel region defined by the pixel definition layer, so that the display screen can achieve color display, the color display scheme using a color filter can be avoided, and the brightness of the display screen can be improved.

[0057] In some embodiments, the distance between the second pixel definition layers 601 on both sides of the pixel region is greater than the distance between the first pixel definition layers 501 on both sides. In the pixel region, the cathode 400 can be formed between the second pixel definition layers 601 on both sides, and the light-emitting layer 300 and the anode 200 are on the side of the cathode 400 close to the substrate 101. Then, the distance between the second pixel definition layers 601 on both sides is greater than the distance between the first pixel definition layers 501 on both sides, which helps the cathode 400 to comprehensively cover the light-emitting layer 300 and ensure the light-emitting efficiency of the light-emitting layer 300. Exemplarily, reference can be made to Figure 1 , Figure 1 FIG. is a schematic longitudinal cross-sectional view of a display screen provided in an embodiment. As shown in the figure, the display screen includes a substrate 101 and a first pixel definition layer 501, a second pixel definition layer 601, and a third pixel definition layer 701 that are sequentially stacked on one side of the substrate 101. The pixel definition layer defines a pixel region. In any pixel region, the distance d2 between the second pixel definition layers 601 on both sides is greater than the distance d1 between the first pixel definition layers 501 on both sides.

[0058] In some embodiments, the thickness of the first pixel defining layer 501 is greater than or equal to the sum of the thicknesses of the anode 200 and the light-emitting layer 300. The anode 200 and the light-emitting layer 300 can be formed between the first pixel defining layers 501 on both sides of the pixel region, and the cathode 400 can be formed between the second pixel defining layers 601 on both sides. The thickness of the first pixel defining layer 501 being greater than or equal to the sum of the thicknesses of the anode 200 and the light-emitting layer 300 helps to better limit the position of the light-emitting layer 300 through the first pixel defining layer 501 when the light-emitting layer 300 is fabricated.

[0059] In some embodiments, the thickness of the second pixel defining layer 601 is greater than the thickness of the cathode 400, such that the cathode 400 is formed between the second pixel defining layers 601 on both sides of the pixel region, ensuring that the cathode 400 can be well-connected to the second pixel defining layer 601.

[0060] Exemplarily, reference can be made in conjunction with Figure 2 and Figure 3 , Figure 2 which is a schematic longitudinal cross-sectional view of the pixel defining layer between adjacent pixel regions of a display screen provided in an embodiment. Figure 3 which is a schematic longitudinal cross-sectional view of the anode, light-emitting layer, cathode, and first encapsulation layer formed in the pixel region of a display screen provided in an embodiment. The thickness of the first pixel defining layer 501 can satisfy: H0 + H1 + first deviation value ≤ h1 ≤ H0 + H1 + second deviation value, where h1 represents the thickness of the first pixel defining layer 501, H0 represents the thickness of the anode 200, and H1 represents the thickness of the light-emitting layer 300. The thickness of the second pixel defining layer 601 satisfies: H2 + third deviation value ≤ h2 ≤ H2 + fourth deviation value, where h2 represents the thickness of the second pixel defining layer 601 and H2 represents the thickness of the cathode 400. The first deviation value and the second deviation value can be greater than zero respectively, and the third deviation value and the fourth deviation value can be greater than zero respectively.

[0061] The third pixel defining layer 701 serves to limit the position and range of the light-emitting layer 300 when the light-emitting layer 300 is fabricated. In some embodiments, along the direction close to the substrate 101, the distance between the third pixel defining layers 701 on both sides of the pixel region gradually increases, and the distance between the bottoms of the third pixel defining layers 701 on both sides of the pixel region is greater than the distance between the tops of the third pixel defining layers 701 on both sides of the pixel region. This structural design facilitates limiting the light-emitting layer 300 to be formed within the pixel interval of the first pixel defining layer 501. Reference can be made to Figure 1As shown, the distance between the bottoms of the third pixel definition layers 701 on both sides of the pixel region is d3, and the distance between the tops of the third pixel definition layers 701 on both sides of the pixel region is d4. d3 is greater than d4. In this implementation, the longitudinal cross-section of the third pixel definition layer 701 between adjacent pixel regions can be an inverted trapezoid. In this implementation, the inclination angle θ of the side surface of the third pixel definition layer 701 on one side of the pixel region is not limited and can refer to Figure 2 As shown, the inclination angle θ of the side surface of the third pixel definition layer 701 on one side of the pixel region refers to the angle between the side surface of the third pixel definition layer 701 on one side of the pixel region and the plane where the surface of the second pixel definition layer 601 is located. In practical applications, it can be set according to the thickness of each pixel definition layer, the thickness of the light-emitting layer 300, the evaporation angle of the evaporation machine, etc.

[0062] In some implementations, the light-emitting unit may further include: a first encapsulation layer 801 formed on the side of the cathode 400 away from the substrate 101. The first encapsulation layer 801 can be formed between the third pixel definition layers 701 on both sides of the pixel region. In some implementations, the thickness of the third pixel definition layer 701 is greater than or equal to the thickness of the first encapsulation layer 801, so as to ensure that the cathode 400, the light-emitting layer 300, and the anode 200 in the pixel region can be better protected through the first encapsulation layer 801. It can be combined with reference to Figure 2 and Figure 3 , the thickness of the third pixel definition layer 701 satisfies: H3 > h3, where H3 represents the thickness of the third pixel definition layer 701, and h3 represents the thickness of the first encapsulation layer 801. In practical applications, the thickness of the third pixel definition layer 701 can be specifically determined according to the difference between the sum of the thicknesses of the first pixel definition layer 501 and the second pixel definition layer 601 and the sum of the thicknesses of the anode 200, the light-emitting layer 300, and the cathode 400.

[0063] It can be combined with reference to Figure 1 and Figure 2 As shown, the width L1 of the first pixel definition layer 501 between adjacent pixel regions can be set according to the resolution of the display product and the pixel size. In the implementation where the cross-section of the third pixel definition layer 701 in the pixel region is inclined, the long side width L3 of the third pixel definition layer 701 between adjacent pixel regions can be the same as the width L1 of the first pixel definition layer 501, and the short side width can be the same as the width L2 of the second pixel definition layer 601. The width L2 of the second pixel definition layer 601 between adjacent pixel regions can be determined according to the width L1 of the first pixel definition layer 501, the long side width L3 of the third pixel definition layer 701, and the inclination angle θ.

[0064] In some embodiments, the display screen may further include: a second encapsulation layer 901 formed on a side of the first encapsulation layer 801 away from the substrate 101. The overall structure is encapsulated again through the second encapsulation layer 901 to improve the reliability of the display screen.

[0065] In some embodiments, the pixel defining layer forms the pixel regions arranged in an array, and the second pixel defining layer 601 is in a grid shape. In this way, the second pixel defining layer 601 can connect the cathodes 400 of each pixel region. So that the cathodes 400 of each pixel region can be connected to the cathode ring 103 of the display screen through the second pixel defining layer 601, connecting the cathodes 400 of each light-emitting unit to the cathode ring 103 on the periphery of the display screen to form conduction, meeting the requirement of a common cathode. Exemplarily, reference can be made to Figure 4 , Figure 4 FIG. is a schematic structural diagram of a second pixel defining layer of a display screen provided for an embodiment. As shown in the figure, the second pixel defining layer 601 is in a grid shape, and the second pixel defining layer 601 is connected to the cathode ring 103. A light-emitting layer 300 and a cathode 400 are formed in the pixel region of the display area 102, and the cathodes 400 of each pixel region are connected to the cathode ring 103 through the second pixel defining layer 601.

[0066] In some embodiments, the pixel defining layer defines a first pixel region, a second pixel region, and a third pixel region; the light-emitting unit includes: the anode, a first primary color light-emitting layer 301, and the cathode formed in the first pixel region; the anode, a second primary color light-emitting layer 302, and the cathode formed in the second pixel region; the anode, a third primary color light-emitting layer 303, and the cathode formed in the third pixel region. Reference can be made to Figure 1 As shown, the anode 201, the first primary color light-emitting layer 301, and the cathode 401 of the first pixel region form a first primary color light-emitting unit, the anode 202, the second primary color light-emitting layer 302, and the cathode 402 of the second pixel region form a second primary color light-emitting unit, and the anode 203, the third primary color light-emitting layer 303, and the cathode 403 of the third pixel region form a third primary color light-emitting unit.

[0067] The substrate 101 may be a substrate provided with a driving circuit. Exemplarily, it may be a patterned semiconductor substrate, such as a silicon-based substrate with a complementary metal oxide semiconductor (CMOS) circuit. In this embodiment, the material of the first pixel defining layer 501 is not limited, and an inorganic material may be used, which may include but is not limited to silicon dioxide SiO2 or SiN xThere is no specific limitation on the material of the second pixel definition layer 601, as long as it can be electrically connected to the cathode 400. Metals or metal oxides can be used, including but not limited to aluminum (Al), silver (Ag), indium tin oxide (ITO), or indium zinc oxide (IZO). There is no limitation on the material of the third pixel definition layer 701, and organic materials can be used, including but not limited to negative photoresist.

[0068] There is no limitation on the structure of the anode 200. The anode 200 can include multiple film layers, which can be, but are not limited to, the film layer structure of Al / Ti / ITO. There is no limitation on the structure of the first encapsulation layer 801. The first encapsulation layer 801 can include multiple film layers, which can be, but are not limited to, Al2O3 / SiN x double-layer film structure.

[0069] In a specific example, the range of L1 is 2um - 10um, the range of L2 is 1um - 8um, the range of L3 is 2um - 10um, H0 + H1 + 5nm ≤ h1 ≤ H0 + H1 + 10nm, H2 + 10nm ≤ h2 ≤ H2 + 20nm, 45° ≤ θ ≤ 60°. The film layer structure of the anode from bottom to top is Al / Ti / ITO, and the thickness ranges are 80nm - 100nm, 5 - 10nm, and 10 - 20nm respectively.

[0070] This embodiment also provides a method for manufacturing a display screen, including the following steps:

[0071] S1: Form an anode 200 and a pixel definition layer on one side of the substrate 101. The pixel definition layer defines a pixel region. The pixel definition layer includes a first pixel definition layer 501, a second pixel definition layer 601, and a third pixel definition layer 701 that are sequentially stacked along the direction away from the substrate 101. The second pixel definition layer 601 has conductivity;

[0072] S2: Form a light-emitting layer and a cathode layer sequentially on the side of the substrate 101 where the anode 200 and the pixel definition layer are formed, so that the cathode layer in the pixel region is connected to the second pixel definition layer 601, and pattern the light-emitting layer and the cathode layer.

[0073] The pixel region corresponds to the base-color light-emitting pixels of the display screen. The cathode layer formed in the pixel region is connected to the second pixel definition layer 601, so that the cathode 400 of the light-emitting unit formed in the pixel region can be connected to the second pixel definition layer 601. Since the second pixel definition layer 601 has conductivity, the cathodes 400 of the light-emitting units in each pixel region can be connected to the cathode ring 103 of the display screen through the second pixel definition layer 601.

[0074] The method for manufacturing a display screen according to this embodiment forms a pixel definition layer on one side of a substrate. The pixel definition layer defines pixel regions, and the light-emitting layer can be etched according to the pixel regions defined by the pixel definition layer to pattern the light-emitting layer, so that the light-emitting layer can be formed in the pixel regions through a patterning process, and a fine metal mask plate can be not used. A light-emitting layer for emitting primary color light can be formed in the pixel regions defined by the pixel definition layer, enabling the display screen to achieve color display, avoiding a color display scheme using color filters, and capable of improving the brightness of the display screen.

[0075] In some embodiments, forming an anode on one side of the substrate 101 may include the following process: forming an anode layer on one side of the substrate 101 and patterning the anode layer to form the anode 200. The anode layer can be formed on one side of the substrate 101 by a deposition method, and physical vapor deposition (PVD) method can be used but is not limited to. The anode layer can be patterned by an etching method, and an exposure and development etching process can be used but is not limited to.

[0076] In some embodiments, forming a pixel definition layer on one side of the substrate 101 can be carried out through the following process, including the following steps:

[0077] S111: Form a first film layer on one side of the substrate 101 and pattern the first film layer to form the first pixel definition layer 501;

[0078] S112: Form a second film layer on the side of the first pixel definition layer 501 away from the substrate 101 and pattern the second film layer to form the second pixel definition layer 601;

[0079] S113: Form a third film layer on the side of the second pixel definition layer 601 away from the substrate 101 and pattern the third film layer to form the third pixel definition layer 701.

[0080] The first film layer can be formed on one side of the substrate 101 by a deposition method. The deposition method can be selected according to the material used for the first film layer, and chemical vapor deposition (CVD) method can be used but is not limited to. The first film layer can be patterned by an etching method, and an exposure and development etching process can be used but is not limited to. Exemplarily, reference can be made to Figure 5 as shown, Figure 5 is a longitudinal cross-sectional schematic diagram of a method for manufacturing a display screen according to an embodiment to form a first pixel definition layer on a substrate.

[0081] A second film layer can be formed on one side of the substrate 101 by a deposition method, and the deposition method can be selected according to the material used for the second film layer. Physical Vapor Deposition (PVD) method can be used but is not limited to. The second film layer can be patterned by an etching method, and exposure development etching process can be used but is not limited to. Exemplarily, reference can be made to Figure 6 as shown Figure 6 FIG. is a longitudinal cross-sectional view of a method for preparing a display screen provided in an embodiment for forming a second pixel definition layer on a substrate.

[0082] A third film layer can be formed on one side of the substrate 101 by a deposition method, and the deposition method can be selected according to the material used for the third film layer. Coating process can be used but is not limited to. The third film layer can be patterned by an etching method, and exposure development etching process can be used but is not limited to. Exemplarily, reference can be made to Figure 7 as shown Figure 7 FIG. is a longitudinal cross-sectional view of a method for preparing a display screen provided in an embodiment for forming a third pixel definition layer on a substrate.

[0083] In this embodiment, the anode 200 is formed on the substrate 101 first and then the pixel definition layer is formed. This is because if the pixel definition layer is formed first and then the anode 200 is formed, the patterning process of the anode 200 may have an adverse effect on the pixel definition layer. In other embodiments, if the manufacturing process permits, the pixel definition layer can be formed on the substrate 101 first and then the anode 200 is formed, which is also within the protection scope of the present invention.

[0084] In some embodiments, the pixel definition layer defines a first pixel region, a second pixel region, and a third pixel region. Correspondingly, reference can be made to Figure 8 , Figure 8 FIG. is a flowchart of a method for preparing a display screen provided in an embodiment. As shown in the figure, the method for preparing this display screen includes the following steps:

[0085] S11: Form an anode and a pixel definition layer on one side of the substrate 101. The pixel definition layer defines a pixel region. The pixel definition layer includes a first pixel definition layer 501, a second pixel definition layer 601, and a third pixel definition layer 701 that are sequentially stacked along a direction away from the substrate 101. The second pixel definition layer 601 has conductivity;

[0086] S12: Form a first primary color light-emitting layer 301, a cathode layer, and a first encapsulation layer in sequence on a side of the anode and the pixel definition layer away from the substrate 101, such that the cathode layer in the first pixel region is connected to the second pixel definition layer 601, and remove the first primary color light-emitting layer 301, the cathode layer, and the first encapsulation layer in the second pixel region and the third pixel region;

[0087] S13: Form a second primary color light-emitting layer 302, the cathode layer, and the first encapsulation layer in sequence on the side of the anode and the pixel definition layer away from the substrate 101, such that the cathode layer in the second pixel region is connected to the second pixel definition layer 601, and remove the second primary color light-emitting layer 302, the cathode layer, and the first encapsulation layer in the first pixel region and the third pixel region;

[0088] S14: Form a third primary color light-emitting layer 303, the cathode layer, and the first encapsulation layer in sequence on the side of the anode and the pixel definition layer away from the substrate 101, such that the cathode layer in the third pixel region is connected to the second pixel definition layer 601, and remove the third primary color light-emitting layer 303, the cathode layer, and the first encapsulation layer in the first pixel region and the second pixel region.

[0089] The cathode layer formed in the first pixel region forms the cathode 401 of the first pixel region, the cathode layer formed in the second pixel region forms the cathode 402 of the second pixel region, and the cathode layer formed in the third pixel region forms the cathode 403 of the third pixel region.

[0090] The manufacturing processes of forming the first primary color light-emitting unit in the first pixel region, the second primary color light-emitting unit in the second pixel region, and the third primary color light-emitting unit in the third pixel region will be described in detail below with reference to the accompanying drawings. Specifically, step S12 may include the following steps:

[0091] S121: Form a first primary color light-emitting layer 301 on the side of the anode and the pixel definition layer away from the substrate 101.

[0092] S122: Form a cathode layer on the side of the first primary color light-emitting layer 301 away from the substrate 101.

[0093] S123: Form a first encapsulation layer 801 on the side of the cathode layer away from the substrate 101.

[0094] S124: Remove the first primary color light-emitting layer 301, the cathode layer, and the first encapsulation layer 801 in the second pixel region and the third pixel region.

[0095] The first primary color light-emitting layer 301 can be formed on the side of the anode and the pixel definition layer away from the substrate 101 by evaporation. In some embodiments, the first primary color light-emitting layer 301 includes a hole injection layer (HIL), a hole transport layer (HTL), a light-emitting layer (EML), an electron transport layer (ETL), and an electron injection layer (EIL), and the hole injection layer (HIL), the hole transport layer (HTL), the light-emitting layer (EML), the electron transport layer (ETL), and the electron injection layer (EIL) can be evaporated in sequence.

[0096] The cathode layer can be formed on the side of the first primary color light-emitting layer 301 away from the substrate 101 through a coating method, and a low-damage sputtering coating process can be used but is not limited to.

[0097] The first encapsulation layer 801 can be formed through a deposition method, and the atomic layer deposition (ALD) method or chemical vapor deposition method can be used but is not limited to for forming the first encapsulation layer 801. Exemplarily, reference can be made to Figure 9 , Figure 9 FIG. is a schematic diagram of a method for preparing a display screen provided for an embodiment, showing the formation of the first primary color light-emitting layer, the cathode layer, and the first encapsulation layer on the substrate. In this embodiment, after the first primary color light-emitting layer 301 and the cathode layer are formed, the first encapsulation layer 801 is fabricated. The first encapsulation layer 801 can protect the first primary color light-emitting layer 301 from being damaged during subsequent etching processes. Additionally, the third pixel definition layer 701 facilitates the peeling of the light-emitting layer, the cathode layer, and the first encapsulation layer 801 during the patterning process.

[0098] For the substrate 101 on which the first primary color light-emitting layer 301, the cathode layer, and the first encapsulation layer 801 are formed, through patterning, the first primary color light-emitting layer 301, the cathode layer, and the first encapsulation layer 801 in the second pixel region and the third pixel region can be removed, and the first primary color light-emitting layer 301, the cathode layer, and the first encapsulation layer 801 in the first pixel region are retained. Patterning can be performed through an etching method, including but not limited to an exposure, development, and etching process. Exemplarily, reference can be made to Figure 10 , Figure 10 FIG. is a schematic diagram of a method for preparing a display screen provided for an embodiment, showing the formation of the first primary color light-emitting unit in the first pixel region on the substrate.

[0099] After the first primary color light-emitting unit is fabricated in the first pixel region on the substrate 101, following the process of fabricating the first primary color light-emitting unit in the first pixel region as described above, the second primary color light-emitting unit is fabricated in the second pixel region on the substrate 101, and then the third primary color light-emitting unit is fabricated in the third pixel region on the substrate 101. Exemplarily, reference can be made to Figure 11 , Figure 11 FIG. is a schematic diagram of a method for preparing a display screen provided for an embodiment, showing the formation of corresponding primary color light-emitting units in each pixel region. As shown, the anode 201, the first primary color light-emitting layer 301, and the cathode 401 in the first pixel region form the first primary color light-emitting unit, the anode 202, the second primary color light-emitting layer 302, and the cathode 402 in the second pixel region form the second primary color light-emitting unit, and the anode 203, the third primary color light-emitting layer 303, and the cathode 403 in the third pixel region form the third primary color light-emitting unit.

[0100] In some embodiments, the method for manufacturing a display screen may further include the following steps:

[0101] Step S15: Form a second encapsulation layer 901 on the side of the first encapsulation layer 801 away from the substrate 101.

[0102] Exemplarily, reference may be made to Figure 1 , and the whole is encapsulated again through the second encapsulation layer 901 to improve the reliability of the display screen. The second encapsulation layer 901 can be formed by a deposition method, and the atomic layer deposition method or the chemical vapor deposition method can be used but is not limited to form the second encapsulation layer 901. In this embodiment, the layer structure of the second encapsulation layer 901 is not limited. Exemplarily, the second encapsulation layer 901 can adopt a three-layer film structure, such as Al2O3 / SiN x / Al2O3 three-layer film structure.

[0103] This embodiment also provides a head-mounted display device, which includes an optical element and the display screen according to any one of the above embodiments, wherein the optical element is disposed on the light-emitting path of the display screen.

[0104] For the head-mounted display device of this embodiment, the pixel definition layer is formed on one side of the substrate of the adopted display screen, and the pixel definition layer defines the pixel region, so that the anode, the light-emitting layer and the cathode can be formed in the pixel region through a patterning process, and a fine metal mask plate can be not used. Light-emitting units for emitting primary color light can be formed in the pixel region defined by the pixel definition layer, so that the display screen can achieve color display, and the color display scheme using a color filter can be avoided, so that the display screen can improve the brightness, and the head-mounted display device can improve the brightness.

[0105] The head-mounted display device of this embodiment can be a virtual reality head-mounted display device or an augmented reality head-mounted display device.

[0106] The above has introduced in detail the display screen, its manufacturing method, and the head-mounted display device provided by the present invention. Specific examples are used herein to elaborate on the principle and implementation manner of the present invention. The description of the above embodiments is only used to help understand the method and its core idea of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and modifications can be made to the present invention, and these improvements and modifications also fall within the protection scope of the claims of the present invention.

Claims

1. A display screen, characterized in that, Comprising: A substrate; A pixel defining layer formed on one side of the substrate, which defines a pixel region. The pixel defining layer includes a first pixel defining layer, a second pixel defining layer, and a third pixel defining layer stacked in sequence along a direction away from the substrate. The second pixel defining layer has conductivity; A light-emitting unit formed in the pixel region, which at least includes an anode, a light-emitting layer, and a cathode stacked in sequence along a direction away from the substrate. The cathode is connected to the second pixel defining layer.

2. The display screen according to claim 1, wherein Along a direction close to the substrate, the distance between the third pixel defining layers on both sides of the pixel region gradually increases.

3. The display screen according to claim 1, wherein The distance between the second pixel defining layers on both sides of the pixel region is greater than the distance between the first pixel defining layers on both sides of the pixel region.

4. The display screen according to claim 1, characterized in that, The thickness of the first pixel defining layer is greater than or equal to the sum of the thicknesses of the anode and the light-emitting layer, and / or the thickness of the second pixel defining layer is greater than the thickness of the cathode.

5. The display screen according to claim 4, wherein The light-emitting unit further includes a first encapsulation layer formed on the side of the cathode away from the substrate. The thickness of the third pixel defining layer is greater than or equal to the thickness of the first encapsulation layer.

6. The display screen according to claim 1, characterized in that The pixel defining layer forms the pixel regions arranged in an array form, and the second pixel defining layer is in a grid shape.

7. The display screen according to claim 1, characterized in that, The pixel defining layer defines a first pixel region, a second pixel region, and a third pixel region; The light-emitting unit includes: The anode, a first primary color light-emitting layer, and the cathode formed in the first pixel region; The anode, a second primary color light-emitting layer, and the cathode formed in the second pixel region; The anode, a third primary color light-emitting layer, and the cathode formed in the third pixel region.

8. A method for preparing a display screen, characterized in that, Comprising: Forming an anode and a pixel defining layer on one side of the substrate. The pixel defining layer defines a pixel region. The pixel defining layer includes a first pixel defining layer, a second pixel defining layer, and a third pixel defining layer stacked in sequence along a direction away from the substrate. The second pixel defining layer has conductivity; Sequentially forming a light-emitting layer and a cathode layer on the side of the substrate where the anode and the pixel defining layer are formed, such that the cathode layer in the pixel region is connected to the second pixel defining layer, and patterning the light-emitting layer and the cathode layer.

9. The method for manufacturing a display screen according to claim 8, wherein The forming the pixel defining layer on one side of the substrate includes: Forming a first film layer on one side of the substrate and patterning the first film layer to form the first pixel defining layer; Forming a second film layer on the side of the first pixel defining layer away from the substrate and patterning the second film layer to form the second pixel defining layer; Forming a third film layer on the side of the second pixel defining layer away from the substrate and patterning the third film layer to form the third pixel defining layer.

10. The method for preparing a display screen according to claim 8, wherein, The pixel defining layer defines a first pixel region, a second pixel region, and a third pixel region; The sequentially forming a light-emitting layer and a cathode layer on the side of the substrate where the anode and the pixel defining layer are formed, such that the cathode layer in the pixel region is connected to the second pixel defining layer, and patterning the light-emitting layer and the cathode layer includes: A first primary color light-emitting layer, a cathode layer, and a first encapsulation layer are sequentially formed on a side of the anode and the pixel definition layer away from the substrate, such that the cathode layer in the first pixel region is connected to the second pixel definition layer, and the first primary color light-emitting layer, the cathode layer, and the first encapsulation layer in the second pixel region and the third pixel region are removed; A second primary color light-emitting layer, the cathode layer, and the first encapsulation layer are sequentially formed on a side of the anode and the pixel definition layer away from the substrate, such that the cathode layer in the second pixel region is connected to the second pixel definition layer, and the second primary color light-emitting layer, the cathode layer, and the first encapsulation layer in the first pixel region and the third pixel region are removed; A third primary color light-emitting layer, the cathode layer, and the first encapsulation layer are sequentially formed on a side of the anode and the pixel definition layer away from the substrate, such that the cathode layer in the third pixel region is connected to the second pixel definition layer, and the third primary color light-emitting layer, the cathode layer, and the first encapsulation layer in the first pixel region and the second pixel region are removed.

11. A head-mounted display device, characterized in that, The head-mounted display device includes an optical element and the display screen according to any one of claims 1 to 7, wherein the optical element is disposed on an outgoing light path of the display screen.

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