Method for manufacturing display device

Abstract

Disclosed is a method for manufacturing a display device, the method including: disposing a first electrode on a display module, disposing a light transmitting film on the first electrode, and disposing a light blocking material layer on the light transmitting film; forming a plurality of light blocking films by removing a residual film of the light blocking material layer on an upper surface of the light transmitting film; and forming a second electrode on the light-transmitting film and the plurality of light-blocking films, wherein the residual film is removed using an air knife.

Description

[0001] Cross - reference to related applications

[0002] This application claims the priority and benefit of Korean Patent Application No. 10 - 2023 - 0192071, filed with the Korean Intellectual Property Office on December 27, 2023, the entire disclosure of which is incorporated herein by reference. Technical field

[0003] Aspects of some embodiments of the present disclosure relate to a method for manufacturing a display device. Background art

[0004] With the development of the information society, consumers' demands for display devices for displaying images are increasing in various forms. The display device may be a display such as a liquid crystal display (LCD), a field emission display (FED), or a light - emitting display (LED). The light - emitting display may include an organic light - emitting display device including an organic light - emitting diode element as a light - emitting element and an inorganic light - emitting display device including an inorganic light - emitting diode element as a light - emitting element.

[0005] In the case of a vehicle display device, when an image displayed on the vehicle display device located in front of a driver or a passenger is reflected on the windshield at night, the image may interfere with the driver's driving, and thus, it may be desirable to control the viewing angle of the image displayed on the vehicle display device. In addition, for privacy protection, it may be desirable to control the viewing angle of the image displayed on the vehicle display device so that the image displayed on the vehicle display device located in front of the driver is not provided to the passenger.

[0006] The above information disclosed in this background art section is only for enhancing the understanding of the background art, and thus the information discussed in this background art section does not necessarily constitute the prior art. Summary of the invention

[0007] Aspects of some embodiments of the present disclosure provide a method for manufacturing a display device that can remove a residual film on a light - transmissive film.

[0008] However, the aspects according to the embodiments of the present disclosure are not limited to the aspects set forth herein. Through reference to the detailed description of the embodiments of the present disclosure given below, the above and other aspects of the embodiments of the present disclosure will become more apparent to those of ordinary skill in the art to which the present disclosure pertains.

[0009] According to some embodiments of the present disclosure, a method for manufacturing a display device is provided. The method includes: disposing a first electrode (also referred to as a "first light control electrode") on a display module, disposing a light-transmissive film on the first electrode, and disposing a light-blocking material layer on the light-transmissive film; forming a plurality of light-blocking films by removing a residual film of the light-blocking material layer positioned on the upper surface of the light-transmissive film; and forming a second electrode (also referred to as a "second light control electrode") on the light-transmissive film and the plurality of light-blocking films, wherein the residual film is removed using an air knife.

[0010] According to some embodiments, the light-transmissive film includes a plurality of receiving portions, and each of the plurality of light-blocking films is within the plurality of receiving portions.

[0011] According to some embodiments, the air knife jets an air flow onto the light-blocking material layer.

[0012] According to some embodiments, the plurality of receiving portions include a first receiving portion and a second receiving portion spaced apart from each other. The air knife includes an air nozzle through which the air flow is jetted. When one end of the air nozzle is on and coincides with the right end of the first receiving portion, the air flow is jetted toward the right end of the second receiving portion.

[0013] According to some embodiments, a first angle formed between an extending direction of the upper surface of the light-transmissive film and a jetting direction of the air flow is θ1, a first distance between the plurality of light-blocking films is D1, a first width of each of the plurality of light-blocking films is W1, a first height between the upper surface of the light-transmissive film and the air nozzle is H1, and θ1 = tan -1 {H1 / (W1 + D1)}.

[0014] According to some embodiments, the first angle is from 5 degrees to 30 degrees.

[0015] According to some embodiments, the first height is from 10 μm to 15 μm.

[0016] According to some embodiments, an air flow rate of the air flow is 100 CFM or greater.

[0017] According to some embodiments, the light-blocking film includes electrophoretic particles.

[0018] According to some embodiments, the electrophoretic particles have a charge.

[0019] According to some embodiments, the light-blocking film includes a charge control agent.

[0020] According to some embodiments, the first electrode and the second electrode include a transparent conductive material.

[0021] According to some embodiments of the present disclosure, a method for manufacturing a display device is provided, the method including: disposing an object including a first electrode, a light-transmissive film on the first electrode, and a light-blocking material layer on the light-transmissive film on a display module; forming a plurality of light-blocking films by removing a residual film of the light-blocking material layer positioned on an upper surface of the light-transmissive film; and forming a second electrode on the light-transmissive film and the plurality of light-blocking films, wherein the light-transmissive film includes a plurality of receiving portions extending in a first direction and arranged in a second direction different from the first direction, and removing the residual film using an air knife.

[0022] According to some embodiments, at least one of the air knife and the object moves in the second direction.

[0023] According to some embodiments, the plurality of receiving portions include a first receiving portion and a second receiving portion spaced apart from each other, the air knife includes an air nozzle through which an air flow is ejected, and when one end of the air nozzle is positioned on and coincides with a right end of the first receiving portion, the air flow is ejected toward a right end of the second receiving portion.

[0024] According to some embodiments, a first angle, which is an angle formed between an extending direction of an upper surface of the light-transmissive film and an ejection direction of the air flow, is θ1, a first distance, which is a distance between the plurality of light-blocking films, is D1, a first width, which is a width of each of the plurality of light-blocking films, is W1, a first height, which is a distance between the upper surface of the light-transmissive film and the air nozzle, is H1, and θ1 = tan -1 {H1 / (W1 + D1)}.

[0025] According to some embodiments, at least one of the air knife and the object moves in the first direction.

[0026] According to some embodiments, the air knife includes an air nozzle through which an air flow is ejected.

[0027] According to some embodiments, the air nozzle extends in the second direction and overlaps with the plurality of receiving portions.

[0028] According to some embodiments, the air nozzle includes a plurality of air nozzles, and each of the plurality of air nozzles overlaps with a portion of the light-transmissive film other than the plurality of receiving portions.

[0029] In a method for manufacturing a display device according to some embodiments of the present disclosure, a residual film on the light-transmissive film can be removed.

[0030] However, the features of the embodiments are not limited to the features set forth herein. By referring to the claims, the above and other effects of the embodiments will become more apparent to those of ordinary skill in the art to which the embodiments pertain. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Aspects in accordance with some embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings, and the above and other aspects and features of embodiments in accordance with the present disclosure will become more apparent, in which:

[0032] Figure 1 is a perspective view showing a display device according to some embodiments;

[0033] Figure 2 is a plan view showing a display device according to some embodiments;

[0034] Figure 3 is a schematic cross-sectional view taken along line X1-X1' of the display device; Figure 2 of;

[0035] Figure 4 is a schematic view when the display device according to some embodiments is applied to a vehicle;

[0036] Figure 5 is a cross-sectional view showing an example of a display module according to some embodiments;

[0037] Figure 6 is a cross-sectional view showing a perspective-limited mode state of a display panel according to some embodiments;

[0038] Figure 7 is a cross-sectional view showing a wide-view mode state of a display panel according to some embodiments;

[0039] Figure 8 is a flowchart showing a method for manufacturing a display device according to some embodiments;

[0040] Figure 9 is showing Figure 8 aspect of operation S100 of;

[0041] Figure 10 and Figure 11 is showing Figure 8 aspect of operation S200 of;

[0042] Figure 12 is showing Figure 8 aspect of operation S300 of;

[0043] Figure 13 is showing Figure 8 aspect of operation S400 of;

[0044] Figure 14 is along Figure 13 line X2-X2' of the cross-sectional view taken;

[0045] Figure 15 isFigure 14 An enlarged view of region A;

[0046] Figure 16 shows Figure 8 a perspective view of aspects of operation S500;

[0047] Figure 17 is a photograph showing the upper surface of a light-blocking film and the upper surface of a light-transmitting film according to a comparative example;

[0048] Figure 18 is a photograph showing the upper surface of a light-blocking film and the upper surface of a light-transmitting film according to some embodiments;

[0049] Figure 19 shows as Figure 8 a perspective view of aspects of operation S400_1, which is another example of operation S400;

[0050] Figure 20 shows as Figure 8 a perspective view of aspects of operation S400_2, which is yet another example of operation S400; and

[0051] Figure 21 is a cross-sectional view taken along line X3-X3' of Figure 20 Specific embodiments

[0052] Aspects of some embodiments of the present disclosure will now be described more fully hereinafter with reference to the accompanying drawings, in which aspects of some embodiments of the invention are shown. However, the present invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.

[0053] It will also be understood that when a layer is referred to as being "on" another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may also be present. Throughout the specification, the same reference numerals refer to the same components.

[0054] Hereinafter, aspects of some embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings.

[0055] Figure 1 is a perspective view of a display device according to some embodiments. Figure 2 is a plan view of a display device according to some embodiments.

[0056] Referring to Figure 1 and Figure 2, the display device 10 is a device that displays moving images or still images and can be used as a display screen for each of various products such as vehicles, televisions, laptop computers, monitors, billboards, and Internet of Things (IoT) devices, as well as portable electronic devices (such as mobile phones, smartphones, tablet personal computers (PCs), smartwatches, watch phones, mobile communication terminals, electronic notebooks, e-books, portable multimedia players (PMPs), navigation devices, and ultra-mobile PCs (UMPCs)).

[0057] In some embodiments, when the display device 10 is used as a display screen for a vehicle, the display device 10 may be a vehicle display. The vehicle display may provide various service information such as convenience functions and media information to the user, as well as information on vehicle operation information and status information. When the display device 10 includes an input device such as a touch panel, the user can manipulate various functions such as the driving mode and convenience functions of the vehicle through the display device 10.

[0058] The display device 10 may be any one of an organic light-emitting display device, a liquid crystal display device, a plasma display device, a field emission display device, an electrophoretic display device, an electro-wetting display device, a quantum dot light-emitting display device, and a micro LED display device. Hereinafter, it is mainly described that the display device 10 is an organic light-emitting display device, but the present disclosure is not limited thereto.

[0059] The display device 10 according to some embodiments may include a display panel 100, a display driving circuit 250, a circuit board 300, and a touch driving circuit 400.

[0060] The display panel 100 may include a plurality of pixels PX arranged in a first direction DR1 and a second direction DR2. Each of the pixels PX may have a planar shape such as a rectangle, a square, or a rhombus. For example, as shown in the drawings, each of the pixels PX may have a planar shape such as a square. However, each of the pixels PX is not limited thereto and may have various shapes such as a polygon, a circle, and an ellipse in a plan view.

[0061] In the illustrated drawings, the first direction DR1 and the second direction DR2 are each a horizontal direction and intersect each other. For example, the first direction DR1 and the second direction DR2 may be orthogonal to each other. In addition, a third direction DR3 may be a vertical direction that intersects (e.g., is orthogonal to) the first direction DR1 and the second direction DR2. In the present specification, the directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3 in the drawings may be referred to as one side, and the opposite direction may be referred to as the other side, and may include both sides unless otherwise specified.

[0062] The display panel 100 may include a main area MA and a protruding area PA protruding from one side of the main area MA.

[0063] The main area MA may be formed in a rectangular shape having a short side in a first direction DR1 and a long side in a second direction DR2 intersecting the first direction DR1. The corners where the short side in the first direction DR1 and the long side in the second direction DR2 meet may be rounded to have a certain curvature (e.g., a set curvature or a predetermined curvature), or may be formed at right angles. The planar shape of the display device 10 is not limited to a quadrilateral shape and may be formed in other polygonal shapes, circular shapes, or elliptical shapes. The main area MA may be formed flat, but is not limited thereto, and may include curved portions formed at the left and right ends. In this case, the curved portions may have a constant curvature or a varying curvature.

[0064] The main area MA may include a display area DA in which pixels PX are formed to display an image and a non-display area NDA that is a peripheral area of the display area DA (e.g., in the periphery of the display area DA or outside the occupied space of the display area DA).

[0065] In the display area DA, not only the pixels PX but also scan lines, data lines, and power lines connected to the pixels PX may be located. When the main area MA includes curved portions, the display area DA may be located on the curved portions. In this case, the image displayed on the display panel 100 may even be viewed on the curved portions.

[0066] The non-display area NDA may be defined as the area from the boundary of the display area DA to the edge of the display panel 100. A scan driver for applying a scan signal to the scan lines and connection lines connecting the data lines and the display driving circuit 250 may be located in the non-display area NDA.

[0067] The protruding area PA may protrude from one side of the main area MA. For example, as Figure 2 shown, the protruding area PA may protrude from the lower side of the main area MA. The length of the protruding area PA in the first direction DR1 may be less than the length of the main area MA in the first direction DR1.

[0068] The protruding area PA may include a bending area BA and a pad area PDA. In this case, the pad area PDA may be located on one side of the bending area BA, and the main area MA may be located on the other side of the bending area BA. For example, the pad area PDA may be located on the lower side of the bending area BA, and the main area MA may be located on the upper side of the bending area BA.

[0069] The display panel 100 can be flexibly formed into a curved, bent, folded, or rolled shape. Thus, the display panel 100 can be bent in the thickness direction (i.e., in the third direction DR3) in the bending region BA. In this case, before the display panel 100 is bent, one surface of the pad region PDA of the display panel 100 faces upward, but after the display panel 100 is bent, this one surface of the pad region PDA of the display panel 100 faces downward. As a result, since the pad region PDA is located on the lower side of the main region MA, the pad region PDA can overlap with the main region MA.

[0070] The pads electrically connected to the display driving circuit 250 and the circuit board 300 can be located in the pad region PDA of the display panel 100.

[0071] The display driving circuit 250 outputs signals and voltages for driving the display panel 100. For example, the display driving circuit 250 can supply data voltages to data lines. In addition, the display driving circuit 250 can supply power voltages to power lines and supply scan control signals to the scan driver. The display driving circuit 250 can be formed as an integrated circuit (IC) and can be attached to the display panel 100 in the pad region PDA using a chip on glass (COG) method, a chip on plastic (COP) method, or an ultrasonic welding method, but is not limited thereto. For example, the display driving circuit 250 can be mounted on the circuit board 300.

[0072] The pads can include display pads electrically connected to the display driving circuit 250 and touch pads electrically connected to touch lines.

[0073] The circuit board 300 can be attached to the pads using an anisotropic conductive film. Thus, the leads of the circuit board 300 can be electrically connected to the pads. The circuit board 300 can be a flexible printed circuit board, a printed circuit board, or a flexible film such as a chip on film.

[0074] The touch driving circuit 400 can be connected to the touch electrodes of the touch sensor layer TSU (see Figure 3 ) of the display panel 100. The touch driving circuit 400 applies driving signals to the touch electrodes of the touch sensor layer TSU (see Figure 3 ) and measures the capacitance values of the touch electrodes. The driving signals can be signals having a plurality of driving pulses. The touch driving circuit 400 can not only determine whether a touch is input, but also calculate the touch coordinates where the touch is input based on the capacitance values.

[0075] The touch driving circuit 400 can be located on the circuit board 300. The touch driving circuit 400 can be formed as an integrated circuit (IC) and mounted on the circuit board 300.

[0076] In the display device 10 according to some embodiments, the display panel 100 may further include a light control layer LCL.

[0077] The light control layer LCL may be directly located in the main area MA of the display panel 100. For example, the light control layer LCL may be embedded in the display panel 100 and directly located in the main area MA of the display panel 100. Since the light control layer LCL is embedded in the display panel 100, the thickness and manufacturing cost of the display device 10 may be relatively reduced compared to when a separate light control film is attached.

[0078] In some embodiments, the light control layer LCL may be located in the display area DA of the main area MA. The light control layer LCL may control the viewing angle of light emitted from the light-emitting layer 172 (see Figure 5 ) of the display panel 100.

[0079] However, the present disclosure is not limited thereto, and in a plan view, the size of the light control layer LCL may be larger than the size of the display area DA. In this case, the light control layer LCL may overlap both the display area DA and the non-display area NDA.

[0080] In some embodiments, the light control layer LCL may include a transmissive area OA and a non-transmissive area LSA.

[0081] The transmissive area OA may be an area in which no light-blocking film LS (see Figure 6 ) is positioned. The transmissive area OA as an area transmitting light may extend along the third direction DR3.

[0082] As shown in Figure 1 and Figure 2 , the transmissive area OA may have a quadrilateral shape in a plan view, but is not limited thereto. Each of the transmissive areas OA may have a circular shape, an elliptical shape, or a polygonal shape in a plan view. In some embodiments, the shape of the transmissive area OA may substantially correspond to the shape of the display panel 100.

[0083] The non-transmissive area LSA may be the remaining area of the light control layer LCL except for the transmissive area OA. The non-transmissive area LSA may be an area in which a light-blocking film LS (see Figure 6 ) is positioned.

[0084] In some embodiments, the non-transmissive area LSA may extend in the first direction DR1 or the second direction DR2. As an example, as shown in Figure 1As shown, the non-transmissive region LSA may extend in the first direction DR1 and be arranged along the second direction DR2. As another example, the non-transmissive region LSA may extend in the second direction DR2 and be arranged along the first direction DR1. As yet another example, some of the non-transmissive regions LSA may extend in the first direction DR1 and be arranged along the second direction DR2, and the remaining portions of the non-transmissive regions LSA may extend in the second direction DR2 and be arranged along the first direction DR1.

[0085] According to some embodiments, as Figure 1 shown, when the non-transmissive region LSA is arranged along the second direction DR2, the viewing angle can be controlled in the second direction DR2. According to some embodiments, when the non-transmissive region LSA is arranged along the first direction DR1, the viewing angle can be controlled in the first direction DR1. In the display device 10 according to some embodiments, the arrangement and shape of the transmissive region OA and the non-transmissive region LSA can be variously changed according to the desired control direction of the viewing angle.

[0086] Meanwhile, in the drawings, the transmissive region OA is shown arranged to surround the non-transmissive region LSA, but the present disclosure is not limited thereto. In some embodiments, the transmissive region OA may include a plurality of transmissive regions OA, and the plurality of transmissive regions OA extend in the same direction as the non-transmissive region LSA, such that the plurality of transmissive regions OA and the plurality of non-transmissive regions LSA can be arranged to alternate with each other. For example, as Figure 1 shown, when the non-transmissive region LSA extends in the first direction DR1, the transmissive region OA may extend in the first direction DR1 and may be arranged alternately with the non-transmissive region LSA in the second direction DR2.

[0087] The light control layer LCL may include a light blocking film LS (see Figure 5 ) that blocks light emitted from the light emitting layer 172 of the display panel 100 (see Figure 6 ) and a light transmissive film LT (see Figure 6 ) that transmits light. The detailed structure of the light control layer LCL will be described later with reference to Figure 6 etc.

[0088] Figure 3 is a schematic cross-sectional view of the display device taken along the line Figure 2 X1-X1'.

[0089] Referring to Figure 3 , the display device 10 may include a display panel 100 in which the light control layer LCL is embedded. The display panel 100 may include a display module 101 and a light control module 102.

[0090] The display module 101 may include a first base substrate BS1, a thin film transistor layer TFTL, a light emitting element layer EML, a thin film encapsulation layer TFEL, and a touch sensor layer TSU.

[0091] The first base substrate BS1 may include a substrate. The substrate may be made of an insulating material such as glass, quartz, or a polymer resin. Examples of the polymer resin may include polyethersulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyacrylate, polyimide (PI), polycarbonate (PC), cellulose triacetate (CAT), cellulose acetate propionate (CAP), or a combination thereof. Alternatively, the substrate may also include a metallic material.

[0092] The substrate may be a rigid substrate or may be a flexible substrate that can be bent, folded, and curled. When the substrate is a flexible substrate, the substrate may be formed of polyimide (PI), but is not limited thereto.

[0093] The thin film transistor layer TFTL may be located on the first base substrate BS1. In the thin film transistor layer TFTL, scan lines, data lines, power lines, scan control lines, routing lines connecting pads and data lines, and thin film transistors for each pixel may be formed. Each of the thin film transistors may include a gate electrode, a semiconductor layer, a source electrode, and a drain electrode.

[0094] The thin film transistor layer TFTL may be located in a display area DA and a non-display area NDA. Specifically, the thin film transistors, scan lines, data lines, and power lines for each pixel of the thin film transistor layer TFTL may be located in the display area DA. The scan control lines and connection lines of the thin film transistor layer TFTL may be located in the non-display area NDA.

[0095] The light emitting element layer EML may be located on the thin film transistor layer TFTL. The light emitting element layer EML may include pixels each including a first electrode, a light emitting layer, and a second electrode, and a pixel defining film defining the pixels. The light emitting layer may be an organic light emitting layer including an organic material. In this case, the light emitting layer may include a hole transport layer, an organic light emitting layer, and an electron transport layer. When a voltage (e.g., a set voltage or a predetermined voltage) is applied to the first electrode through the thin film transistors of the thin film transistor layer TFTL and a cathode voltage is applied to the second electrode, holes and electrons move to the organic light emitting layer through the hole transport layer and the electron transport layer, respectively, and recombine with each other in the organic light emitting layer to emit light. The pixels of the light emitting element layer EML may be located in the display area DA.

[0096] The thin film encapsulation layer TFEL may be located on the light emitting element layer EML. The thin film encapsulation layer TFEL may be used to prevent oxygen or moisture from permeating into the light emitting element layer EML. For this purpose, the thin film encapsulation layer TFEL may include at least one inorganic film. The inorganic film may be a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer, but is not limited thereto. In addition, the thin film encapsulation layer TFEL may be used to protect the light emitting element layer EML from foreign substances such as dust. For this purpose, the thin film encapsulation layer TFEL may include at least one organic film. The organic film may be made of an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin, but is not limited thereto.

[0097] The thin film encapsulation layer TFEL may be located in both the display area DA and the non-display area NDA. Specifically, the thin film encapsulation layer TFEL may be arranged to cover the light emitting element layer EML of the display area DA and the non-display area NDA, and cover the thin film transistor layer TFTL of the non-display area NDA.

[0098] The touch sensor layer TSU may be located on the thin film encapsulation layer TFEL. When the touch sensor layer TSU is directly located on the thin film encapsulation layer TFEL, the thickness of the display device 10 may be relatively reduced compared to when a separate touch panel including the touch sensor layer TSU is attached to the thin film encapsulation layer TFEL.

[0099] The touch sensor layer TSU may include touch electrodes for sensing a user's touch by a capacitive method and touch lines connecting the pads and the touch electrodes. For example, the touch sensor layer TSU may sense a user's touch by a self-capacitance method or a mutual-capacitance method.

[0100] The touch electrodes of the touch sensor layer TSU may be located in a touch sensor area overlapping with the display area DA. The touch lines of the touch sensor layer TSU may be located in a touch peripheral area overlapping with the non-display area NDA.

[0101] The light control module 102 may be located on the display module 101. The light control module 102 may include a light control layer LCL.

[0102] The light control layer LCL may be located on the display module 101. The light control layer LCL may be arranged to overlap with the display area DA. The light control layer LCL may be used to absorb or block light among the light emitted from the light emitting element layer EML that travels at an angle exceeding a certain angle with respect to the third direction DR3. That is, the light control layer LCL may control the viewing angle.

[0103] According to some embodiments, the display device 10 may further include a cover window. The cover window may alternatively be located on the light control layer LCL. In this case, the light control layer LCL and the cover window may be attached by a transparent adhesive member such as an optically clear adhesive (OCA) film.

[0104] Figure 4 is a schematic diagram when the display device according to some embodiments is applied to a vehicle.

[0105] Reference Figure 4 , the display device 10 according to some embodiments may be, for example, a display device applied to a vehicle. The vehicle may include a main body forming the exterior of the vehicle and an interior space defined by the main body. The main body may include a windshield W that protects the driver PS1 and the passenger PS2 from external influences and provides visibility to the driver PS1. As shown in the drawings, the display device 10 may be disposed in the interior space.

[0106] In some embodiments, the display device 10 may be located on the instrument panel disposed in the interior space. As an example, as Figure 4 shown, the display device 10 may extend from the instrument panel positioned in front of the driver's seat to the instrument panel positioned in front of the passenger's seat. For example, the display device 10 may be an integrated display connected from the instrument panel positioned in front of the driver's seat to the instrument panel positioned in front of the passenger's seat.

[0107] The display device 10 may include a first display area DA1 positioned in front of the driver's seat and a second display area DA2 positioned in front of the passenger's seat. The first display area DA1 may be located on the instrument panel in front of the driver's seat and provide speed information and the like to the driver PS1, and the second display area DA2 may be located on the instrument panel in front of the passenger's seat and provide entertainment information and the like to the passenger PS2. According to some embodiments, the display device 10 may further include a third display area between the first display area DA1 and the second display area DA2.

[0108] As another example, the display devices 10 may be respectively located on the instrument panel in front of the driver's seat and the instrument panel in front of the passenger's seat. For example, the first display device may be located on the instrument panel in front of the driver's seat, and the second display device may be located on the instrument panel in front of the passenger's seat.

[0109] The driver PS1 can recognize (or visually recognize) the display screen of the display device 10 through the light LGT0_1 emitted from the display device 10 towards the driver PS1. However, some of the light LGT1 among the light emitted from the display device 10 in front of the driver's seat may be reflected on the surrounding windshield W and provided to the driver PS1. In this case, the image displayed on the windshield W may interfere with the driving of the driver PS1. On the other hand, in the case of the display device 10 according to some embodiments, it is possible to prevent some of the light LGT1 among the light emitted from the display device 10 in front of the driver's seat from being reflected on the surrounding windshield W and provided to the driver PS1 by adjusting the viewing angle (especially the vertical viewing angle) with respect to the front direction of the light emitted from the display device 10 (the direction facing the driver PS1).

[0110] The passenger PS2 can recognize (or visually recognize) the display screen of the display device 10 through the light LGT0_2 emitted from the display device 10 towards the passenger PS2. However, some of the light LGT2 among the light emitted from the display device 10 in front of the passenger's seat may be provided towards the driver PS1. In this case, when the vehicle is in motion, for reasons such as safety, the viewing of the driver PS1 may be restricted. In the case of the display device 10 according to some embodiments, it is possible to prevent some of the light LGT2 among the light emitted from the display device 10 in front of the passenger's seat from being provided to the driver PS1 by adjusting the viewing angle (especially the left and right viewing angles) with respect to the front direction of the light emitted from the display device 10 (the direction facing the passenger PS2). On the other hand, when the vehicle stops, the image of the second display area DA2 can be provided to the driver PS1.

[0111] In this way, the display device 10 can be a viewing angle adjustable switching display that can switch between a viewing angle limiting mode that limits the viewing angle and a wide viewing angle mode that does not limit the viewing angle. This will be referred to later with reference to Figure 6 and Figure 7 describe the method of switching between the viewing angle limiting mode and the wide viewing angle mode.

[0112] In the drawings, it is shown that the display device 10 in front of the driver's seat adjusts the vertical viewing angle, and the display device 10 in front of the passenger's seat adjusts the left and right viewing angles, but the present disclosure is not limited thereto. As an example, the display device 10 in front of the driver's seat may also adjust the left and right viewing angles, and the display device 10 in front of the passenger's seat may also adjust the vertical viewing angle. As another example, the display device 10 in front of the driver's seat and the display device 10 in front of the passenger's seat may also adjust both the vertical viewing angle and the left and right viewing angles respectively.

[0113] The viewing angle can be adjusted by the light control layer LCL. The viewing angle can be restricted to a certain angular range (e.g., a set angular range or a predetermined angular range) by the light control layer LCL. As an example, when facing the driver PS1 or the passenger PS2 in the forward direction and the dotted line extending in the direction perpendicular to the display surface of the display device 10 is used as the normal line, the viewing angle can be an angle within 35° with respect to the normal line. In some embodiments, the angle within 35° with respect to the normal line can be defined as the effective viewing angle, but it is not limited thereto.

[0114] Figure 5 is a cross-sectional view showing an example of a display module according to some embodiments.

[0115] Reference Figure 5 , the display module 101 may include a display layer DU and a touch sensor layer TSU. The display layer DU may include a first base substrate BS1, a thin film transistor layer TFTL, a light emitting element layer EML, and a thin film encapsulation layer TFEL.

[0116] The first base substrate BS1 may include a first substrate SUB1, a first buffer film BF1 located on the first substrate SUB1, and a second substrate SUB2 located on the first buffer film BF1.

[0117] The first substrate SUB1 and the second substrate SUB2 may be made of an insulating material such as glass, quartz, or a polymer resin. Examples of the polymer resin may include polyethersulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyacrylate, polyimide (PI), polycarbonate (PC), cellulose triacetate (CAT), cellulose acetate propionate (CAP), or a combination thereof. Alternatively, the substrate may also include a metal material.

[0118] The first substrate SUB1 and the second substrate SUB2 may be a rigid substrate, or may be a flexible substrate that can be bent, folded, and curled. When the substrate is a flexible substrate, the substrate may be formed of polyimide (PI), but it is not limited thereto.

[0119] The first buffer film BF1 is a film for protecting the first thin film transistor ST1 and the light emitting layer 172 from the influence of moisture that penetrates through the first substrate SUB1 and the second substrate SUB2 that are vulnerable to moisture penetration. The first buffer film BF1 may be formed of a plurality of inorganic films stacked alternately. For example, the first buffer film BF1 may be formed of a multi-film in which one or more inorganic films such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are stacked alternately.

[0120] The thin film transistor layer TFTL may include a bottom metal layer BML, a second buffer film BF2, a first thin film transistor ST1, a first gate insulating film GI1, a first interlayer insulating film 141, a first capacitor electrode CAE1, a second interlayer insulating film 142, a first anode connection electrode ANDE1, a first organic film 160, a second anode connection electrode ANDE2, and a second organic film 180.

[0121] The bottom metal layer BML may be located on the second substrate SUB2. The bottom metal layer BML may be arranged to overlap with the first active layer ACT1 of the first thin film transistor ST1 in a third direction DR3 to prevent leakage current when light is incident on the first active layer ACT1 of the first thin film transistor ST1. The bottom metal layer BML may be formed as a single layer or a multi-layer made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or an alloy thereof. The bottom metal layer BML may be omitted.

[0122] The second buffer film BF2 may be located on the bottom metal layer BML. The second buffer film BF2 is a film for protecting the first thin film transistor ST1 and the light emitting layer 172 from the influence of moisture that penetrates through the first substrate SUB1 and the second substrate SUB2 that are vulnerable to moisture penetration. The second buffer film BF2 may be formed of a plurality of inorganic films stacked alternately. For example, the second buffer film BF2 may be formed of a multi-film in which one or more inorganic films among a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are stacked alternately.

[0123] The first active layer ACT1 of the first thin film transistor ST1 may be located on the second buffer film BF2. The first active layer ACT1 of the first thin film transistor ST1 includes polycrystalline silicon, single crystal silicon, low temperature polycrystalline silicon, amorphous silicon, or an oxide semiconductor. The first active layer ACT1 of the first thin film transistor ST1 that is not covered by the first gate insulating film GI1 and is exposed by the first gate insulating film GI1 may be doped with impurities or ions to have conductivity. Accordingly, a first source electrode TS1 and a first drain electrode TD1 of the first active layer ACT1 of the first thin film transistor ST1 may be formed.

[0124] The first gate insulating film GI1 may be located on the first active layer ACT1 of the first thin film transistor ST1. Figure 6It is shown that the first gate insulating film GI1 is located between the first gate electrode TG1 and the first active layer ACT1 of the first thin film transistor ST1, but the present disclosure is not limited thereto. The first gate insulating film GI1 may also be located between the first interlayer insulating film 141 and the first active layer ACT1 and between the first interlayer insulating film 141 and the second buffer film BF2. The first gate insulating film GI1 may be formed as an inorganic film such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer.

[0125] The first gate electrode TG1 of the first thin film transistor ST1 may be located on the first gate insulating film GI1. The first gate electrode TG1 of the first thin film transistor ST1 may overlap the first active layer ACT1 in the third direction DR3. The first gate electrode TG1 of the first thin film transistor ST1 may be formed as a single layer or a multilayer made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or an alloy thereof.

[0126] The first interlayer insulating film 141 may be located on the first gate electrode TG1 of the first thin film transistor ST1. The first interlayer insulating film 141 may be formed of an inorganic film such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer. The first interlayer insulating film 141 may include a plurality of inorganic films.

[0127] The first capacitor electrode CAE1 may be located on the first interlayer insulating film 141. The first capacitor electrode CAE1 may overlap the first gate electrode TG1 of the first thin film transistor ST1 in the third direction DR3. Since the first interlayer insulating film 141 has a dielectric constant (e.g., a set dielectric constant or a predetermined dielectric constant), a capacitor may be formed by the first capacitor electrode CAE1, the first gate electrode TG1, and the first interlayer insulating film 141 located between the first capacitor electrode CAE1 and the first gate electrode TG1. The first capacitor electrode CAE1 may be formed as a single layer or a multilayer made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or an alloy thereof.

[0128] The second interlayer insulating film 142 may be located on the first capacitor electrode CAE1. The second interlayer insulating film 142 may be formed of an inorganic film such as a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer. The second interlayer insulating film 142 may include a plurality of inorganic films.

[0129] The first anode connection electrode ANDE1 may be located on the second interlayer insulating film 142. The first anode connection electrode ANDE1 may be connected to the first drain electrode TD1 of the first thin film transistor ST1 through the first anode contact hole ANCT1, and the first anode contact hole ANCT1 passes through the first interlayer insulating film 141 and the second interlayer insulating film 142 to expose the first drain electrode TD1 of the first thin film transistor ST1. The first anode connection electrode ANDE1 may be formed of a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or an alloy thereof.

[0130] The first organic film 160 for planarization may be located on the first anode connection electrode ANDE1. The first organic film 160 may be formed of an organic film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0131] The second anode connection electrode ANDE2 may be located on the first organic film 160. The second anode connection electrode ANDE2 may be connected to the first anode connection electrode ANDE1 through the second anode contact hole ANCT2, and the second anode contact hole ANCT2 passes through the first organic film 160 to expose the first anode connection electrode ANDE1. The second anode connection electrode ANDE2 may be formed as a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or an alloy thereof.

[0132] The second organic film 180 may be located on the second anode connection electrode ANDE2. The second organic film 180 may be formed of an organic film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0133] In Figure 5 it is shown that the first thin film transistor ST1 is formed as a top-gate type in which the first gate electrode TG1 is positioned above the first active layer ACT1, but the present disclosure is not limited thereto. The first thin film transistor ST1 may be formed as a bottom-gate type in which the first gate electrode TG1 is positioned below the first active layer ACT1, or a double-gate type in which the first gate electrode TG1 is positioned both above and below the first active layer ACT1.

[0134] The light-emitting element layer EML may be located on the second organic film 180. The light-emitting element layer EML may include a light-emitting element 170 and a bank 190. Each of the light-emitting elements 170 may include a first light-emitting electrode 171, a light-emitting layer 172, and a second light-emitting electrode 173.

[0135] The first light-emitting electrode 171 may be formed on the second organic film 180. The first light-emitting electrode 171 may be connected to the second anode connection electrode ANDE2 through a third anode contact hole ANCT3 that penetrates the second organic film 180 to expose the second anode connection electrode ANDE2.

[0136] In a top-emission structure in which light is emitted from the light-emitting layer 172 toward the second light-emitting electrode 173, the first light-emitting electrode 171 may be formed of a metal material having a high reflectivity, such as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and indium tin oxide (ITO) (ITO / Al / ITO), an APC alloy, and a stacked structure of an APC alloy and ITO (ITO / APC / ITO). The APC alloy is an alloy of silver (Ag), palladium (Pd), and copper (Cu).

[0137] The bank 190 may be formed on the second organic film 180 to partition the first light-emitting electrode 171 to define a light-emitting area EA. The bank 190 may include an opening that exposes at least a part of the upper surface of the first light-emitting electrode 171. The bank 190 may be formed to cover the edge of the first light-emitting electrode 171. The bank 190 may be formed of an organic film such as an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, or a polyimide resin.

[0138] The light-emitting area EA refers to an area in which the first light-emitting electrode 171, the light-emitting layer 172, and the second light-emitting electrode 173 are sequentially stacked, and holes from the first light-emitting electrode 171 and electrons from the second light-emitting electrode 173 recombine with each other in the light-emitting layer 172 to emit light. The light-emitting area EA may be defined by the opening of the bank 190.

[0139] The light-emitting layer 172 is formed on the first light-emitting electrode 171 and the bank 190. The light-emitting layer 172 may be located within the opening of the bank 190, but is not limited thereto. The light-emitting layer 172 may include an organic material to emit light of a certain color (e.g., a set color or a predetermined color). For example, the light-emitting layer 172 may include a hole transport layer, an organic material layer, and an electron transport layer.

[0140] The second light-emitting electrode 173 may be located on the light-emitting layer 172. The second light-emitting electrode 173 may be formed to cover the light-emitting layer 172. The second light-emitting electrode 173 may be a common layer commonly formed in all light-emitting areas EA. According to some embodiments, a capping layer may be formed on the second light-emitting electrode 173.

[0141] In a top emission structure, the second light-emitting electrode 173 can be formed of a transparent conductive oxide (TCO) capable of transmitting light (such as indium tin oxide (ITO) or indium zinc oxide (IZO)), or a semi-transmissive conductive material (such as magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag)). When the second light-emitting electrode 173 is formed of a semi-transmissive conductive material, the light-emitting efficiency can be improved by a microcavity.

[0142] The thin film encapsulation layer TFEL can be located on the second light-emitting electrode 173. The thin film encapsulation layer TFEL can include at least one inorganic film to prevent or reduce the penetration of contaminants such as oxygen or moisture into the light-emitting element layer EML. In addition, the thin film encapsulation layer TFEL can include at least one organic film to protect the light-emitting element layer EML from foreign substances such as dust. For example, the thin film encapsulation layer TFEL can include a first encapsulation film TFE1, a second encapsulation film TFE2, and a third encapsulation film TFE3.

[0143] The first encapsulation film TFE1 (for example, the first inorganic encapsulation film) can be located on the second light-emitting electrode 173. The first encapsulation film TFE1 can be a single-layer or multi-layer inorganic film. The first encapsulation film TFE1 can be formed of a single film or a multi-film in which one or more inorganic films among a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are alternately stacked.

[0144] The second encapsulation film TFE2 (for example, the first organic encapsulation film) can be located on the first encapsulation film TFE1. The second encapsulation film TFE2 can be a single-layer or multi-layer organic film. The second encapsulation film TFE2 can include a polymer-based material. Examples of the polymer-based material can include polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyimide, polyethylene sulfonate, polyoxymethylene, polyarylate, hexamethyldisiloxane, acrylic resin (such as polymethyl methacrylate, polyacrylic acid, etc.), or any combination thereof.

[0145] The third encapsulation film TFE3 (for example, the second inorganic encapsulation film) can be located on the second encapsulation film TFE2. The third encapsulation film TFE3 can be a single-layer or multi-layer inorganic film. The third encapsulation film TFE3 can include the same material as the first encapsulation film TFE1. For example, the third encapsulation film TFE3 can be formed of a single film or a multi-film in which one or more inorganic films among a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer are alternately stacked.

[0146] The touch sensor layer TSU may be located on the thin film encapsulation layer TFEL. The touch sensor layer TSU may include a plurality of touch electrodes for sensing a user's touch by a capacitive method and touch lines connecting the plurality of touch electrodes and a touch driver. For example, the touch sensor layer TSU may sense a user's touch by a mutual capacitance method or a self-capacitance method.

[0147] According to some embodiments, the touch sensor layer TSU may be located on a separate substrate over the display layer DU. In this case, the substrate supporting the touch sensor layer TSU may be an encapsulation member that encapsulates the display layer DU.

[0148] The plurality of touch electrodes of the touch sensor layer TSU may be located in a touch sensor area overlapping with the display area. The touch lines of the touch sensor layer TSU may be located in a touch peripheral area overlapping with the non-display area.

[0149] The touch sensor layer TSU may include a first touch insulating film SIL1, a first touch electrode REL, a second touch insulating film SIL2, a second touch electrode TEL, and a third touch insulating film SIL3.

[0150] The first touch insulating film SIL1 may be located on the thin film encapsulation layer TFEL. The first touch insulating film SIL1 may have an insulating function and an optical function. The first touch insulating film SIL1 may include at least one inorganic film. For example, the first touch insulating film SIL1 may be an inorganic film including at least one of a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, and an aluminum oxide layer. Optionally, the first touch insulating film SIL1 may be omitted.

[0151] The first touch electrode REL may be located on the first touch insulating film SIL1. The first touch electrode REL may not overlap with the light emitting element 170. The first touch electrode REL may be formed as a single layer made of molybdenum (Mo), titanium (Ti), copper (Cu), aluminum (Al), or indium tin oxide (ITO), or formed as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an APC alloy, and a stacked structure of an APC alloy and ITO (ITO / APC / ITO).

[0152] The second touch insulating film SIL2 may cover the first touch electrode REL and the first touch insulating film SIL1. The second touch insulating film SIL2 may have an insulating function and an optical function. For example, the second touch insulating film SIL2 may be made of the materials shown in the first touch insulating film SIL1.

[0153] The second touch electrode TEL may be located on the second touch insulating film SIL2. The second touch electrode TEL may not overlap with the light-emitting element 170. The second touch electrode TEL may be formed as a single layer made of molybdenum (Mo), titanium (Ti), copper (Cu), aluminum (Al), or indium tin oxide (ITO), or may be formed as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an APC alloy, and a stacked structure of an APC alloy and ITO (ITO / APC / ITO).

[0154] The third touch insulating film SIL3 may cover the second touch electrode TEL and the second touch insulating film SIL2. The third touch insulating film SIL3 may have an insulating function and an optical function. The third touch insulating film SIL3 may be made of the materials shown in the second touch insulating film SIL2.

[0155] In some embodiments, the first touch insulating film SIL1, the second touch insulating film SIL2, and the third touch insulating film SIL3 may be organic films. For example, the first touch insulating film SIL1, the second touch insulating film SIL2, and the third touch insulating film SIL3 may be organic films made of acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0156] The touch sensor layer TSU may further include a planarization film PAS for planarization. The planarization film PAS may be formed of an organic film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0157] Figure 6 is a cross-sectional view showing a viewing angle limiting mode state of a display panel according to some embodiments. Figure 7 is a cross-sectional view showing a wide viewing angle mode state of a display panel according to some embodiments.

[0158] In addition to referring to Figures 1 to 3 also referring to Figure 6 and Figure 7 , the display area DA of the display device 10 may include a plurality of light-emitting areas EA. The light-emitting area EA may be an area where the light emitted by the light-emitting element 170 is emitted. The light-emitting area EA may be defined by the bank 190. For example, the plurality of light-emitting areas EA may be areas overlapping with the light-emitting layer 172 located within the opening of the bank 190. The light-emitting area EA may be an area where the first light-emitting electrode 171, the light-emitting layer 172, and the second light-emitting electrode 173 are stacked in sequence while overlapping each other.

[0159] In some embodiments, the plurality of light-emitting regions EA may include a first light-emitting region EA1, a second light-emitting region EA2, and a third light-emitting region EA3. Three types of light-emitting regions EA are shown in the drawing in the display region DA, but the present disclosure is not limited thereto, and more or fewer than three types of light-emitting regions EA may be included in the display region DA.

[0160] The first light-emitting region EA1 may emit light of a first color, the second light-emitting region EA2 may emit light of a second color, and the third light-emitting region EA3 may emit light of a third color. The light of the first color may be light in the red wavelength band, the light of the second color may be light in the green wavelength band, and the light of the third color may be light in the blue wavelength band. The red wavelength band may be a band of approximately 600 nm to 750 nm, the green wavelength band may be a band of approximately 480 nm to 560 nm, and the blue wavelength band may be a band of approximately 370 nm to 460 nm, but the present disclosure is not limited thereto.

[0161] The light-emitting regions EA of the display region DA may overlap with the transmissive region OA and the non-transmissive region LSA in the third direction DR3. For example, the first light-emitting region EA1, the second light-emitting region EA2, and the third light-emitting region EA3 may overlap with the transmissive region OA and the non-transmissive region LSA in the third direction DR3.

[0162] The transmissive region OA may be a region of the light-blocking film LS where the light control layer LCL is not located. The non-transmissive region LSA may be a region of the light-blocking film LS where the light control layer LCL is located.

[0163] The display panel 100 may include a display module 101 and a light control module 102. Since the display module 101 has been described, the description of the display module 101 will be omitted. The light control module 102 may be located on the display layer DU or the touch sensor layer TSU. The light control module 102 may include a light control layer LCL. Figure 5 The light control layer LCL may control the viewing angle of the light emitted from the light-emitting layer 172. For example, when the light emitted from the light-emitting layer 172 travels at an angle (e.g., a set angle or a predetermined angle) or less relative to the third direction DR3, the light may be emitted to the outside. On the other hand, when the light emitted from the light-emitting layer 172 travels at an angle greater than a certain angle (e.g., a set angle or a predetermined angle) relative to the third direction DR3, the light may be absorbed or blocked by the light-blocking film LS and not be emitted to the outside.

[0164] The light control layer LCL may be a viewing angle adjustment switching control structure that can switch between a viewing angle limiting mode and a wide viewing angle mode by the movement of electrophoretic particles that move according to whether a voltage is applied.

[0165] The light control layer LCL may be a viewing angle adjustment switching control structure that can switch between a viewing angle limiting mode and a wide viewing angle mode by the movement of electrophoretic particles that move according to whether a voltage is applied.

[0166] The light control layer LCL may include a first light control electrode LE1, a light transmissive film LT, a light blocking film LS, an adhesive layer ADH, a second light control electrode LE2, and a second base substrate BS2.

[0167] The first light control electrode LE1 may be located on the display module 101. In some embodiments, the first light control electrode LE1 may be entirely disposed on the upper surface of the display module 101. For example, the first light control electrode LE1 may be located on the upper surface of the display module 101 as a surface-type electrode. However, the first light control electrode LE1 is not limited thereto, and the first light control electrode LE1 may be formed as a plurality of patterned electrodes having a certain pattern (such as a grid shape or a bar shape).

[0168] The first light control electrode LE1 may include a transparent conductive material. For example, the first light control electrode LE1 may include a metal oxide such as indium tin oxide, indium zinc oxide, copper oxide, tin oxide, zinc oxide, and titanium oxide.

[0169] The first light control electrode LE1 may include a metal material to increase conductivity. For example, the first light control electrode LE1 may include at least one metal of chromium (Cr), nickel (Ni), copper (Cu), aluminum (Al), silver (Ag), molybdenum (Mo), gold (Au), titanium (Ti), and their alloys.

[0170] The light transmissive film LT may transmit the light emitted from the light emitting layer 172. The light transmissive film LT may include a transparent organic material. For example, the light transmissive film LT may include an organic film made of an acrylic resin, an epoxy resin, a phenolic resin, a polyamide resin, a polyimide resin, etc.

[0171] The light transmissive film LT may be located on the first light control electrode LE1. The light transmissive film LT may be located in the transmission region OA and the non-transmission region LSA. For example, the light transmissive film LT may include a first portion located between the light blocking films LS and a second portion located below the first portion.

[0172] The first portion of the light transmissive film LT may be arranged to alternate with the light blocking film LS in a horizontal direction intersecting the third direction DR3. The first portion of the light transmissive film LT may be located in the transmission region OA. The second portion of the light transmissive film LT may be located on the entire surface of the upper surface of the first light control electrode LE1. The second portion of the light transmissive film LT may be disposed throughout the transmission region OA and the non-transmission region LSA.

[0173] In some embodiments, the light-transmissive film LT may include a plurality of receiving portions located in the non-transmissive region LSA. The light-blocking film LS may be located within the receiving portions of the light-transmissive film LT. The receiving portions of the light-transmissive film LT may be grooves recessed from the upper surface of the light-transmissive film LT toward the lower surface of the light-transmissive film LT.

[0174] The light-blocking film LS may absorb or block the light emitted from the light-emitting layer 172. The light-blocking film LS may include a light-blocking organic material. For example, the light-blocking film LS may include an organic material containing an organic black pigment such as carbon black as a photosensitive resin capable of absorbing or blocking light. The light-blocking film LS may be located within the receiving portions of the light-transmissive film LT.

[0175] The width W1 of the light-blocking film LS may be approximately 5 μm to 20 μm. The distance D1 between the light-blocking films LS may be approximately 20 μm to 60 μm. The thickness TH1 of the light-blocking film LS may be approximately 150 μm or less. Preferably, the thickness TH1 of the light-blocking film LS may be approximately 60 μm to 80 μm.

[0176] Similar to the first base substrate BS1, the second base substrate BS2 may include a first substrate SUB1, a first buffer film BF1, and a second substrate SUB2. However, the second base substrate BS2 is not limited thereto and may also include only the first substrate SUB1. In some embodiments, the light transmittance of the second base substrate BS2 may be higher than that of the first base substrate BS1, but it is not limited thereto.

[0177] The second light control electrode LE2 may be located on one surface of the second base substrate BS2. For example, as shown in the drawings, the second light control electrode LE2 may be located on the lower surface of the second base substrate BS2. The second light control electrode LE2 may be arranged to face the first light control electrode LE1 between the first base substrate BS1 and the second base substrate BS2.

[0178] In some embodiments, the second light control electrode LE2 may be entirely located on the lower surface of the second base substrate BS2. For example, the second light control electrode LE2 may be a surface-type electrode located on the lower surface of the second base substrate BS2. However, the second light control electrode LE2 is not limited thereto, and the second light control electrode LE2 may be formed as a plurality of patterned electrodes having a certain pattern (such as a grid shape or a stripe shape).

[0179] The second light control electrode LE2 may include a transparent conductive material. For example, the second light control electrode LE2 may include metal oxides such as indium tin oxide, indium zinc oxide, copper oxide, tin oxide, zinc oxide, and titanium oxide.

[0180] The second light control electrode LE2 may include a metallic material to increase electrical conductivity. For example, the second light control electrode LE2 may include at least one metal among chromium (Cr), nickel (Ni), copper (Cu), aluminum (Al), silver (Ag), molybdenum (Mo), gold (Au), titanium (Ti), and alloys thereof.

[0181] In some embodiments, the second light control electrode LE2 may include the same material as the first light control electrode LE1, but is not limited thereto.

[0182] The adhesive layer ADH may be located on the second light control electrode LE2. For example, as shown in the drawings, the adhesive layer ADH may be located on the lower surface of the second light control electrode LE2. The adhesive layer ADH may be located on the light transmissive film LT and the light blocking film LS. The adhesive layer ADH may be located between the light transmissive film LT and the light blocking film LS and the second light control electrode LE2 in the third direction DR3. The adhesive layer ADH may attach the second base substrate BS2 on which the second light control electrode LE2 is mounted to the first light control electrode LE1, the light transmissive film LT, and the light blocking film LS. In some embodiments, the adhesive layer ADH may be omitted.

[0183] In the display device 10 according to some embodiments, the light control layer LCL may be a viewing angle adjustment switching control structure capable of switching between a viewing angle limitation mode and a wide viewing angle mode by the movement of electrophoretic particles that move according to whether a voltage is applied.

[0184] For example, the light blocking film LS may include an ink solvent EPR and ink particles EPI.

[0185] The ink particles EPI may be electrophoretic particles. For example, the ink particles EPI may include carbon black nanoparticles. As Figure 6 shown, when the light LGT generated from the light emitting layer 172 is incident on the ink particles EPI, the light LGT may be absorbed or blocked by the ink particles EPI and may not be emitted to the outside.

[0186] In some embodiments, the ink particles EPI may have a charge. For example, the ink particles EPI may have a positive charge or a negative charge. Hereinafter, the case where the ink particles EPI have a negative charge will be described as an example.

[0187] The ink solvent EPR may be a substance that dissolves the ink particles EPI. For example, the ink solvent EPR may be paraffin oil, but is not limited to paraffin oil. The ink solvent EPR may include a transparent material and may transmit the light LGT generated from the light emitting layer 172.

[0188] In some embodiments, the ink solvent EPR may further include a charge control agent (CCA). By including the charge control agent, the ink solvent EPR can achieve a charge storage (or charge retention) effect of the ink particles EPI, and achieve charge dispersion and stabilization of the ink particles EPI.

[0189] As Figure 7 shown, in the wide viewing angle mode, the first light control electrode LE1 and the second light control electrode LE2 may be respectively applied with voltages, and the first light control electrode LE1 and the second light control electrode LE2 may have different charges. As an example, the first light control electrode LE1 may have a positive charge, and the second light control electrode LE2 may have a negative charge. Accordingly, an electric field may be formed between the first light control electrode LE1 and the second light control electrode LE2. The ink particles EPI having a negative charge may move toward the first light control electrode LE1 having a positive charge. Thus, in the wide viewing angle mode, since the ink particles EPI gather at the lower part of the light blocking film LS, most of the light LGT generated from the light emitting layer 172 may be emitted to the outside.

[0190] As another example, the first light control electrode LE1 may have a negative charge, and the second light control electrode LE2 may have a positive charge. Accordingly, the ink particles EPI having a negative charge may move toward the second light control electrode LE2 having a positive charge. Thus, in the wide viewing angle mode, since the ink particles EPI gather at the upper part of the light blocking film LS, most of the light LGT generated from the light emitting layer 172 may be emitted to the outside.

[0191] Even when the ink particles EPI have a positive charge, the ink particles EPI may gather toward the electrode having a negative charge among the first light control electrode LE1 and the second light control electrode LE2.

[0192] As Figure 6 shown, in the viewing angle limiting mode, since the first light control electrode LE1 and the second light control electrode LE2 are not applied with voltages, the first light control electrode LE1 and the second light control electrode LE2 may not have charges. Accordingly, the ink particles EPI having a negative charge may be dispersed within the light blocking film LS by the repulsive force. Thus, in the viewing angle limiting mode, since the ink particles EPI are dispersed within the light blocking film LS, the light LGT generated from the light emitting layer 172 may be emitted to the outside only at a certain angle or a smaller angle.

[0193] Hereinafter, aspects of a method for manufacturing a display device according to some embodiments will be described.

[0194] Figure 8 is a flowchart showing a method for manufacturing a display device according to some embodiments.Figure 9 is a perspective view showing aspects of operation S100 of Figure 8 . Figure 10 and Figure 11 is a perspective view showing aspects of operation S200 of Figure 8 . Figure 12 is a perspective view showing aspects of operation S300 of Figure 8 . Figure 13 is a perspective view showing aspects of operation S400 of Figure 8 . Figure 14 is a cross-sectional view taken along line X2 - X2' of Figure 13 . Figure 15 is Figure 14 an enlarged view of region A of Figure 16 is a perspective view showing aspects of operation S500 of Figure 8 .

[0195] Referring to Figures 8 to 16 , a method S1 for manufacturing a display device according to some embodiments may include: an operation S100 of forming a first light control electrode on a display module; an operation S200 of forming a light-transmissive film on the first light control electrode; an operation S300 of forming a light-blocking material layer on the light-transmissive film; an operation S400 of forming a light-blocking film by removing a residual film of the light-blocking material layer (i.e., a residual film of the light-blocking material layer on (or positioned on) the upper surface of the light-transmissive film); and an operation S500 of forming a second light control electrode on the light-transmissive film and the light-blocking film.

[0196] As Figure 9 shown, in operation S100 of forming a first light control electrode on a display module, a first light control electrode LE1 may be formed on the display module 101.

[0197] The first light control electrode LE1 may be formed by a physical vapor deposition (PVD) method such as sputtering, but is not limited thereto.

[0198] As Figure 10 and Figure 11 shown, in operation S200 of forming a light-transmissive film on the first light control electrode, a light-transmissive material layer LT_M may be formed on the first light control electrode LE1.

[0199] The light-transmissive material layer LT_M may be formed by an inkjet printing process. For example, the light-transmissive material layer LT_M may be formed by applying ink on the first light control electrode LE1 using an inkjet printing device. However, the light-transmissive material layer LT_M is not limited thereto, and the light-transmissive material layer LT_M may also be formed by a deposition process.

[0200] Next, the light-transmissive film LT can be formed by patterning the light-transmissive material layer LT_M. The light-transmissive film LT can include a plurality of receiving portions LTa. The plurality of receiving portions LTa can be grooves that are recessed from the upper surface of the light-transmissive film LT toward the lower surface of the light-transmissive film LT.

[0201] According to some embodiments, when forming the light-transmissive material layer LT_M by an inkjet printing process, the light-transmissive film LT can be formed by a molding process. The light-transmissive film LT can be formed by using a mold including protrusions to mold the light-transmissive material layer LT_M to match the shape of the receiving portion LTa.

[0202] According to some embodiments, when forming the light-transmissive material layer LT_M by a deposition process, the light-transmissive film LT can be formed by a photolithography process. The light-transmissive film LT can be formed by etching the light-transmissive material layer LT_M positioned in the receiving portion LTa.

[0203] As Figure 12 shown, in operation S300 of forming the light-blocking material layer on the light-transmissive film, the light-blocking material layer LS_M can be formed on the light-transmissive film LT.

[0204] As shown in the accompanying drawings, the light-blocking material layer LS_M can be formed by an inkjet printing process. However, the light-blocking material layer LS_M is not limited thereto and can also be formed by a dispensing process or a screen printing process.

[0205] When forming the light-blocking material layer LS_M, the first head HD1 can apply the ink I on the light-transmissive film LT. The ink I can be applied within the receiving portion LTa of the light-transmissive film LT. However, in some embodiments, residues of the ink I may also remain on the upper surface of the light-transmissive film LT (or above the upper surface of the light-transmissive film LT), that is, partially overlapping between above the upper surface of the light-transmissive film LT and the receiving portion LTa of the light-transmissive film LT and overlapping with the receiving portion LTa of the light-transmissive film LT. Therefore, a residual film may be formed on the upper surface of the light-transmissive film LT.

[0206] In some embodiments, before applying the ink I to the light-transmissive film LT, a plasma treatment process can be performed first. The plasma treatment process can be a process of performing a hydrophobic treatment on the upper surface of the light-transmissive film LT. For example, the upper surface of the light-transmissive film LT can be subjected to a hydrophobic treatment by performing an oxygen plasma treatment on the light-transmissive film LT.

[0207] As Figures 13 to 15 shown, in operation S400 of forming the light-blocking film by removing the residual film of the light-blocking material layer, the residual film of the light-blocking material layer LS_M positioned on the upper surface of the light-transmissive film LT can be removed, and the light-blocking film LS can be formed inside the receiving portion LTa of the light-transmissive film LT.

[0208] First, the second head HD2 can generate an air stream AS. The second head HD2 can be an air knife. The second head HD2 can include a nozzle HD2a for jetting the air stream AS. The second head HD2 can remove the residual film by jetting the air stream AS onto the residual film of the light-blocking material layer LS_M positioned on the light-transmitting film LT (i.e., positioned on the upper surface of the light-transmitting film LT). Since the residual film that can block or reduce the light generated from the display module 101 from being emitted to the outside is removed, the brightness of the display device 10 can be relatively improved.

[0209] The second head HD2 can extend in a first direction DR1 which is the extending direction of the light-transmitting film LT. The second head HD2 can move in a second direction DR2 which is a direction different from the extending direction of the light-transmitting film LT. However, the present disclosure is not limited thereto, and the object including the first light control electrode LE1, the light-blocking material layer LS_M, and the light-transmitting film LT can be moved in the second direction DR2 without moving the second head HD2, or both the object and the second head HD2 can be moved in the second direction DR2.

[0210] As Figure 15 shown, while moving in the second direction DR2, the second head HD2 can jet the air stream AS in an oblique direction between the second direction DR2 and the opposite direction of the third direction DR3.

[0211] The air stream AS can remove the residual film of the light-blocking material layer LS_M positioned on the upper surface of the light-transmitting film LT (i.e., remove the residual film of the light-blocking material layer LS_M that partially overlaps with the light-transmitting film LT between the receiving part LTa and the residual film of the light-blocking material layer LS_M that overlaps with the receiving part LTa) while moving in the second direction DR2. In some embodiments, the air flow rate of the air stream AS can be approximately 100 CFM (cubic feet per minute; ft 3 / min) or greater. Preferably, the air flow rate of the air stream AS can be approximately 300 CFM.

[0212] In a method S1 for manufacturing a display device according to some embodiments, a first angle θ1 which is the angle formed between the extending direction of the upper surface of the light-transmitting film LT and the jetting direction of the air stream AS can be determined by the distance D1 between the light-blocking films LS, the width W1 of the light-blocking films LS, and the height H1 of the nozzle HD2a of the second head HD2. The height H1 of the nozzle HD2a can be the distance from one end P1 of the nozzle HD2a to the upper surface of the light-transmitting film LT in the third direction DR3.

[0213] In some embodiments, when one end P1 of the nozzle HD2a coincides with the right end P2 of the first receiving portion LTa1 in the third direction DR3, the point where the extension line in the jetting direction of the air flow AS meets the upper surface of the light-transmissive film LT may be the right end P3 of the second receiving portion LTa2 adjacent to the first receiving portion LTa1. For example, the first angle θ1 may satisfy Equation 1 below.

[0214] Equation 1

[0215] θ1 = tan -1 {H1 / (W1 + D1)}

[0216] In some embodiments, the height H1 of the nozzle HD2a may be approximately 10 μm to 15 μm. As described above, the distance D1 between the light-blocking films LS may be approximately 20 μm to 60 μm, and the width W1 of the light-blocking film LS may be approximately 5 μm to 20 μm. Accordingly, the first angle θ1 may be approximately 5 degrees to 30 degrees.

[0217] In a method S1 for manufacturing a display device according to some embodiments, the ink I used when forming the light-blocking material layer LS_M may have a relatively high viscosity. Due to the high viscosity of the ink I, an air flow AS with a high air flow rate may be jetted to remove the residual film of the light-blocking material layer LS_M positioned on the light-transmissive film LT (i.e., positioned on (or above) the upper surface of the light-transmissive film LT).

[0218] Since the second head HD2 jets the air flow AS at the first angle θ1, it is possible to prevent or reduce the situation where the light-blocking material layer LS_M positioned inside the receiving portion LTa is removed together with the residual film by the air flow AS with a high air flow rate.

[0219] The operations S300 and S400 are shown in the drawings as being performed in chronological order, but the present disclosure is not limited thereto. For example, the operations S300 and S400 may be performed simultaneously. In this case, the first head HD1 may move and apply the ink I before the second head HD2, while the second head HD2 may move and remove the residual film after the first head HD1.

[0220] As Figure 16 shown, in an operation S500 of forming a second light control electrode on a light-transmissive film and a light-blocking film, a second base substrate BS2 on which a second light control electrode LE2 and an adhesive layer ADH are mounted may be bonded to the light-transmissive film LT and the light-blocking film LS.

[0221] Figure 17 is a photograph showing the upper surface of the light-blocking film and the upper surface of the light-transmissive film according to a comparative example. Figure 18is a photograph showing the upper surface of the light-blocking film and the upper surface of the light-transmitting film according to some embodiments.

[0222] In addition to referring to Figures 8 to 16 also refer to Figure 17 and Figure 18 , an air knife process was not performed on the light control layer LCL' according to the comparative example, and an air knife process was performed on the light control layer LCL according to some embodiments.

[0223] As Figure 17 shown, in the light control layer LCL' according to the comparative example, residues RSD may remain on the light-transmitting film LT. On the other hand, as Figure 18 shown, in the light control layer LCL according to some embodiments, no residues RSD remain and the residues RSD can be completely removed.

[0224] Hereinafter, other embodiments of a method for manufacturing a display device according to some embodiments will be described. In the following embodiments, components that are the same as those in the above-described embodiments will be denoted by the same reference numerals, and some overlapping descriptions of the same components may be omitted or simplified, and the differences will be mainly described.

[0225] Figure 19 is a perspective view showing an aspect of operation S400_1, which is another example of operation S400 Figure 8 as.

[0226] Referring to Figure 19 , the method S1 for manufacturing a display device according to an embodiment is different from the method S1 for manufacturing a display device according to an embodiment described with reference to Figure 13 and Figure 14 etc. in that the moving direction of the second head HD2 is different.

[0227] More specifically, in operation S400_1 of forming a light-blocking film by removing the residual film of the light-blocking material layer in the method S1 for manufacturing a display device according to some embodiments, the second head HD2 may extend in a second direction DR2, which is a direction different from the direction in which the light-transmitting film LT extends. The air nozzle HD2a of the second head HD2 may also extend in the second direction DR2. The second head HD2 may move in a first direction DR1, which is the direction in which the light-transmitting film LT extends. However, the present disclosure is not limited thereto, and the object including the first light control electrode LE1, the light-blocking material layer LS_M, and the light-transmitting film LT may be moved in the first direction DR1 without moving the second head HD2, or both the object and the second head HD2 may be moved in the first direction DR1.

[0228] While moving in the first direction DR1, the second head HD2 can jet the air stream AS in an oblique direction between the opposite direction of the first direction DR1 and the opposite direction of the third direction DR3.

[0229] While moving in the first direction DR1, the air stream AS can remove the residual film of the light blocking material layer LS_M positioned on the upper surface of the light transmissive film LT (i.e., remove the residual film of the light blocking material layer LS_M that partially overlaps with the light transmissive film LT above the upper surface of the light transmissive film LT and the residual film of the light blocking material layer LS_M that overlaps with the receiving portion LTa (see Figure 11 ).

[0230] Since the moving direction of the air stream AS is the same as the extending direction of the light transmissive film LT, it is possible to prevent or reduce the situation where the light blocking material layer LS_M positioned inside the receiving portion LTa is removed by the air stream AS together with the residual film.

[0231] For example, the residual film positioned on the upper surface of the light transmissive film LT may move into the receiving portion LTa due to the air stream AS. Since the air flow rate of the air stream AS is dispersed in the second direction DR2, the force received by the light blocking material layer LS_M positioned inside each of the receiving portions LTa from the air stream AS is dispersed, thereby preventing or reducing the situation where the light blocking material layer LS_M positioned inside the receiving portion LTa is removed by the air stream AS together with the residual film.

[0232] Figure 20 is a perspective view showing an aspect of the operation S400_2 which is another example of the operation S400 as Figure 8 . Figure 21 is a cross-sectional view taken along the line X3 - X3' of Figure 20 .

[0233] Refer to Figure 20 and Figure 21 , the method S1 for manufacturing a display device according to an embodiment is different from the method S1 for manufacturing a display device described above with reference to Figure 13 and Figure 14 etc. in that the moving direction of the second head HD2 is different, and is different from the method S1 for manufacturing a display device according to an embodiment described above with reference to Figure 19 etc. in that the number of the air nozzles HD2a is different.

[0234] More specifically, in the operation S400_2 of forming the light-blocking film by removing the residual film of the light-blocking material layer in the method S1 for manufacturing a display device according to some embodiments, the second head HD2 may extend in a second direction DR2 that is a direction different from the direction in which the light-transmitting film LT extends. The second head HD2 may move in a first direction DR1 that is the direction in which the light-transmitting film LT extends.

[0235] The second head HD2 may include a plurality of air nozzles HD2a. The plurality of air nozzles HD2a may be arranged to be spaced apart from each other along the second direction DR2. The plurality of air nozzles HD2a may overlap a portion of the light-transmitting film LT other than the receiving portion LTa (see Figure 11 ) in a third direction DR3. The plurality of air nozzles HD2a may not overlap the receiving portion LTa of the light-transmitting film LT in the third direction DR3. The plurality of air nozzles HD2a may be alternately arranged with the receiving portion LTa of the light-transmitting film LT in the second direction DR2.

[0236] The plurality of air nozzles HD2a may eject an air flow AS onto a portion of the light-transmitting film LT other than the receiving portion LTa. Since the air flow AS ejected by the plurality of air nozzles HD2a does not overlap the receiving portion LTa, it is possible to prevent the light-blocking material layer LS_M located inside the receiving portion LTa from being removed by the air flow AS together with the residual film.

[0237] In summarizing the specific embodiments, those skilled in the art will understand that many variations and modifications can be made to the disclosed embodiments without substantially departing from the spirit and scope of the embodiments according to the present disclosure. Therefore, the disclosed embodiments of the present invention are used only in a general and descriptive sense and not for the purpose of limitation.

Claims

1. A method for manufacturing a display device, the method comprising: Disposing a first electrode on the display module, disposing a light-transmitting film including a plurality of receiving portions on the first electrode, and disposing a light-blocking material layer on the light-transmitting film; forming a plurality of light blocking films each within the plurality of receiving portions by removing a residual film of the light blocking material layer on an upper surface of the light-transmitting film; as well as forming a second electrode on the light-transmitting film and the plurality of light-blocking films, Herein, an air knife is used to remove the residual film.

2. The method according to claim 1, wherein: The air knife sprays the air flow onto the light blocking material layer, The plurality of receiving portions include a first receiving portion and a second receiving portion that are spaced apart from each other, The air knife comprises an air nozzle through which the air flow is ejected, and When one end of the air nozzle is on and coincides with the right end of the first receiving portion, the air flow is ejected toward the right end of the second receiving portion.

3. The method according to claim 2, wherein: The first angle, which is the angle formed between the extending direction of the upper surface of the light-transmitting film and the ejection direction of the airflow, is θ1, A first distance which is a distance between the plurality of light blocking films is D1, and a first width which is a width of each of the plurality of light blocking films is W1, A first height H1 is a distance between the upper surface of the light-transmitting film and the air nozzle, and Satisfies θ1=tan -1 {H1 / (W1+D1)}.

4. The method according to claim 1, wherein: The light blocking film includes electrophoretic particles, and Wherein, the electrophoretic particles have electric charges.

5. The method according to claim 4, wherein: The light blocking film includes a charge control agent.

6. A method for manufacturing a display device, the method comprising: disposing an object including a first electrode, a light-transmitting film including a plurality of receiving portions on the first electrode, and a light-blocking material layer on the light-transmitting film on a display module; forming a plurality of light blocking films each within the plurality of receiving portions by removing a residual film of the light blocking material layer on an upper surface of the light-transmitting film; as well as forming a second electrode on the light-transmitting film and the plurality of light-blocking films, wherein the plurality of receiving portions extend in a first direction and are arranged in a second direction different from the first direction, and The residual film was removed using an air knife.

7. The method according to claim 6, wherein: At least one of the air knife and the object moves in the second direction, The plurality of receiving portions include a first receiving portion and a second receiving portion that are spaced apart from each other, The air knife includes an air nozzle through which an air flow is ejected, and When one end of the air nozzle is positioned on and coincides with the right end of the first receiving portion, the air flow is ejected toward the right end of the second receiving portion.

8. The method according to claim 7, wherein: The first angle formed between the extending direction of the upper surface of the light-transmitting film and the ejection direction of the airflow is θ1, A first distance which is a distance between the plurality of light blocking films is D1, and a first width which is a width of each of the plurality of light blocking films is W1, A first height H1 is a distance between the upper surface of the light-transmitting film and the air nozzle, and Satisfies θ1=tan -1 {H1 / (W1+D1)}.

9. The method according to claim 6, wherein: At least one of the air knife and the object moves in the first direction, Wherein, the air knife comprises an air nozzle, through which an air flow is ejected, and Wherein, the air nozzle extends in the second direction and overlaps with the plurality of receiving portions.

10. The method according to claim 9, wherein: The gas nozzle comprises a plurality of gas nozzles, and Each of the plurality of air nozzles overlaps a portion of the light-transmitting film excluding the plurality of receiving portions.

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