Display device and method of manufacturing same

Abstract

The invention relates to a display device and a method of manufacturing the same. The display device includes: a first light emitting element disposed in a first pixel area; a second light emitting element disposed in a second pixel region spaced apart from the first pixel region; a first color conversion layer disposed on the first light emitting element; a second color conversion layer disposed on the second light emitting element; a first color filter layer covering the first color conversion layer; a second color filter layer covering the second color conversion layer; and a third color filter layer disposed in the first non-emission region between the first pixel region and the second pixel region. The third color filter layer is configured to selectively transmit color light different from color light selectively transmitted by the first color conversion layer and the second color conversion layer.

Description

Technical Field

[0001] The embodiments relate to a display device and a method of manufacturing the display device. More specifically, the embodiments relate to a display device including a color filter layer and a method of manufacturing the display device. Background Art

[0002] A display device is a device that displays an image to provide visual information to a user. Among display devices, organic light-emitting diode displays have recently attracted attention.

[0003] In order to improve display quality, display devices including a display unit including a plurality of pixels and a color filter unit including a color filter layer and a color conversion layer have been proposed. The color conversion layer may convert the wavelength of light provided from the display unit. For example, the color conversion layer may include wavelength conversion particles such as quantum dots.

[0004] The color filter unit and the display unit may be manufactured separately and combined with each other. In this case, excessive manufacturing cost and manufacturing time of the display device may be required. Accordingly, many studies have been conducted to reduce the manufacturing cost and manufacturing time of the display device. Summary of the Invention

[0005] The embodiments provide a display device having improved quality.

[0006] The embodiments provide a method of manufacturing a display device.

[0007] A display device according to an embodiment includes: a first light-emitting element disposed in a first pixel region; a second light-emitting element disposed in a second pixel region spaced apart from the first pixel region; a first color conversion layer disposed on the first light-emitting element; a second color conversion layer disposed on the second light-emitting element; a first color filter layer covering the first color conversion layer; a second color filter layer covering the second color conversion layer; and a third color filter layer disposed in a first non-light-emitting region between the first pixel region and the second pixel region. The third color filter layer is configured to selectively transmit color light different from the color light selectively transmitted by the first color conversion layer and the second color conversion layer.

[0008] In an embodiment, the first color filter layer may cover an upper surface and a side surface of the first color conversion layer.

[0009] In an embodiment, the second color filter layer may cover an upper surface of the second color conversion layer and may extend to at least a part of the first non-light-emitting region between the first pixel region and the second pixel region.

[0010] In an embodiment, the display device may further include: a third light-emitting element disposed in a third pixel region spaced apart from the first pixel region and the second pixel region; and a light-transmitting layer disposed on the third light-emitting element. The third color filter layer may cover the light-transmitting layer.

[0011] In an embodiment, a portion of the first color filter layer may cover a side surface of the light-transmitting layer.

[0012] In an embodiment, the third color filter layer may be disposed in a portion of a first non-light-emitting region between the first pixel region and the second pixel region.

[0013] In an embodiment, the third color filter layer may be disposed in at least a portion of a second non-light-emitting region between the second pixel region and the third pixel region.

[0014] In an embodiment, the third color filter layer may be in contact with a side surface of the first color filter layer.

[0015] In an embodiment, the third color filter layer may cover an upper surface of a portion of the side surface of the first color filter layer covering the light-transmitting layer.

[0016] In an embodiment, the second color filter layer may cover at least a portion of an upper surface of the third color filter layer.

[0017] In an embodiment, the first color filter layer may be disposed in an entirety of the first non-light-emitting region.

[0018] In an embodiment, the first color filter layer may be disposed in an entirety of the second non-light-emitting region.

[0019] In an embodiment, the first color filter layer may be in contact with a side surface of the second color conversion layer.

[0020] In an embodiment, the display device may further include: a first low-refractive-index layer disposed between the first color conversion layer and the first color filter layer; and a second low-refractive-index layer disposed between the second color conversion layer and the second color filter layer.

[0021] The display device according to an embodiment includes: a first light-emitting element disposed in a first pixel region; a second light-emitting element disposed in a second pixel region spaced apart from the first pixel region; a third light-emitting element disposed in a third pixel region spaced apart from the first pixel region and the second pixel region; a first color conversion layer disposed on the first light-emitting element; a second color conversion layer disposed on the second light-emitting element; a light-transmitting layer disposed on the third light-emitting element; a first color filter layer covering an upper surface of the first color conversion layer, a side surface of the second color conversion layer, and a side surface of the light-transmitting layer; a second color filter layer covering a side surface of the first color conversion layer, an upper surface of the second color conversion layer, and a side surface of the light-transmitting layer; and a third color filter layer covering an upper surface of the light-transmitting layer.

[0022] In an embodiment, the third color filter layer may be further disposed in a first non-light-emitting region between the first pixel region and the second pixel region.

[0023] In an embodiment, the third color filter layer may cover a portion of the second color filter layer covering a side surface of the first color conversion layer.

[0024] In an embodiment, the third color filter layer may be further disposed in a second non-light-emitting region between the second pixel region and the third pixel region.

[0025] In an embodiment, the third color filter layer may cover a portion of the first color filter layer covering a side surface of the second color conversion layer.

[0026] In an embodiment, the third color filter layer may cover a side surface of a portion of the first color filter layer covering an upper surface of the first color conversion layer and a side surface of a portion of the second color filter layer covering an upper surface of the second color conversion layer.

[0027] In an embodiment, the third color filter layer may cover an upper surface of a portion of the first color filter layer covering a side surface of the light-transmitting layer and an upper surface of a portion of the second color filter layer covering a side surface of the light-transmitting layer.

[0028] The method of manufacturing a display device according to an embodiment includes: forming a first light-emitting element in a first pixel region; forming a second light-emitting element in a second pixel region spaced apart from the first pixel region; forming a third light-emitting element in a third pixel region spaced apart from the first pixel region and the second pixel region; forming a first color conversion layer on the first light-emitting element; forming a second color conversion layer on the second light-emitting element; forming a light-transmitting layer on the third light-emitting element; forming a first color filter layer covering the first color conversion layer; forming a second color filter layer covering the second color conversion layer; and forming a third color filter layer covering the light-transmitting layer and disposed in a first non-light-emitting region between the first pixel region and the second pixel region.

[0029] In an embodiment, the formation of the first color filter layer may include: forming a first preliminary color filter layer covering the first color conversion layer, the second color conversion layer, and the light-transmissive layer; and removing a part of the first preliminary color filter layer to form the first color filter layer covering the side surface of the light-transmissive layer, the upper surface of the first color conversion layer, and the side surface of the first color conversion layer.

[0030] In an embodiment, the formation of the second color filter layer may include: forming a second preliminary color filter layer covering the first color conversion layer, the second color conversion layer, and the light-transmissive layer; and removing a part of the second preliminary color filter layer to form the second color filter layer covering the upper surface of the second color conversion layer.

[0031] In an embodiment, the formation of the third color filter layer may include: forming a third preliminary color filter layer covering the first color conversion layer, the second color conversion layer, and the light-transmissive layer; and removing a part of the third preliminary color filter layer to form the third color filter layer covering the light-transmissive layer and disposed in a first non-light-emitting region between the first pixel region and the second pixel region and a second non-light-emitting region between the second pixel region and the third pixel region.

[0032] In an embodiment, the formation of the third color filter layer may be performed before the formation of the second color filter layer.

[0033] A display device according to an embodiment may include: a first light-emitting element disposed in a first pixel region; a second light-emitting element disposed in a second pixel region spaced apart from the first pixel region; a first color conversion layer disposed on the first light-emitting element; a second color conversion layer disposed on the second light-emitting element; a first color filter layer covering the first color conversion layer; and a second color filter layer covering the second color conversion layer.

[0034] Accordingly, color mixing between adjacent pixel regions can be effectively prevented. In addition, since a separate bank layer is not provided between adjacent pixel regions, the pixel regions may have a sufficient size. In addition, the manufacturing cost and manufacturing time of the display device can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Exemplary, non-limiting embodiments will be more clearly understood from the following detailed description in conjunction with the accompanying drawings.

[0036] Figure 1 is a plan view illustrating a display device according to an embodiment.

[0037] Figure 2 is along Figure 1 a cross-sectional view of the display device taken along line I-I'.

[0038] Figure 3 is illustrated Figure 2Cross-sectional view of an example of the X-Y portion.

[0039] Figure 4 is illustrated Figure 2 Cross-sectional view of another example of the X-Y portion.

[0040] Figure 5 is illustrated Figure 2 Cross-sectional view of yet another example of the X-Y portion.

[0041] Figure 6 , Figure 7 , Figure 8 , Figure 9 , Figure 10 , Figure 11 , Figure 12 , Figure 13 and Figure 14 are cross-sectional views of a method of manufacturing a Figure 2 display device.

[0042] Figure 15 is a cross-sectional view of a display device according to another embodiment.

[0043] Figure 16 is illustrated Figure 15 cross-sectional view of the X'-Y' portion.

[0044] Figure 17 , Figure 18 , Figure 19 , Figure 20 , Figure 21 , Figure 22 and Figure 23 are cross-sectional views of a method of manufacturing a Figure 15 display device. DETAILED DESCRIPTION

[0045] It will be understood that when an element is referred to as being "on" another element, it can be directly on the other element or there can be intervening elements between the element and the other element. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements.

[0046] It will be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers, and / or sections, these elements, components, regions, layers, and / or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer, or section from another element, component, region, layer, or section. Thus, the first element, component, region, layer, or section discussed below could be referred to as the second element, component, region, layer, or section without departing from the teachings herein.

[0047] The terms used herein are for the purpose of describing particular embodiments only and are not intended to be limiting. As used herein, "a," "the," and "at least one" do not denote a limitation of quantity and are intended to include both the singular and the plural, unless the context clearly indicates otherwise. For example, "element" and "at least one element" have the same meaning unless the context clearly indicates otherwise. "At least one" should not be construed as being limited to "one." "Or" means "and / or." As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. It will be further understood that when used in this specification, the terms "comprises" or "comprising" specify the presence of the stated features, regions, wholes, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, regions, wholes, steps, operations, elements, components, and / or groups thereof.

[0048] Hereinafter, a display device according to an embodiment will be described in more detail with reference to the accompanying drawings. In the drawings, the same reference numerals are used for the same components, and redundant descriptions of the same components will be omitted.

[0049] Figure 1 is a plan view illustrating a display device according to an embodiment.

[0050] Refer to Figure 1 , a display device DD according to an embodiment may include a display area DA and a non-display area NDA.

[0051] A plurality of pixel regions may be provided in the display area DA. For example, a first pixel region PX1, a second pixel region PX2, and a third pixel region PX3 may be provided in the display area DA. Each of the plurality of pixel regions may emit light. For example, the first pixel region PX1 may emit first color light, the second pixel region PX2 may emit second color light, and the third pixel region PX3 may emit third color light. For example, the first color light may be red light, the second color light may be green light, and the third color light may be blue light. However, the present disclosure is not limited thereto. For another example, the first color light may be green light, the second color light may be red light, and the third color light may be blue light.

[0052] The plurality of pixel regions may be repeatedly arranged in a first direction DR1 and a second direction DR2 intersecting the first direction DR1. For example, the second pixel region PX2 may be spaced apart from the first pixel region PX1 in the first direction DR1. In addition, the third pixel region PX3 may be spaced apart from the second pixel region PX2 in the first direction DR1.

[0053] A non-display area NDA can be provided around a display area DA. For example, the non-display area NDA can surround at least a part of the display area DA. A driver can be provided in the non-display area NDA. The driver can supply signals or voltages to a plurality of pixel areas. For example, the driver can include a data driver and / or a gate driver, etc. The non-display area NDA can not display an image.

[0054] In this specification, a first direction DR1 and a second direction DR2 intersecting the first direction DR1 can be defined. For example, the second direction DR2 can be perpendicular to the first direction DR1. However, the present disclosure is not limited thereto, and the second direction DR2 can form an acute angle or an obtuse angle with the first direction DR1. In addition, a third direction DR3 intersecting the plane formed by the first direction DR1 and the second direction DR2 can be defined. For example, the third direction DR3 can be perpendicular to the plane formed by the first direction DR1 and the second direction DR2. However, the present disclosure is not limited thereto, and the third direction DR3 can form an acute angle or an obtuse angle with the plane formed by the first direction DR1 and the second direction DR2.

[0055] Figure 2 is a cross-sectional view of the display device taken along the line I-I’ Figure 1 of.

[0056] Referring to Figure 2 , a display device DD according to an embodiment can include a substrate SUB, a buffer layer BUF, an insulating layer IL, a first transistor TR1, a second transistor TR2, a third transistor TR3, a first light-emitting element LED1, a second light-emitting element LED2, a third light-emitting element LED3, a pixel defining layer PDL, a encapsulation layer TFE, a color filter layer CF, a first color conversion layer CT1, a second color conversion layer CT2, a light-transmitting layer TL, and a cover layer CPL.

[0057] The first light-emitting element LED1 can include a first pixel electrode PE1, a first light-emitting layer EML1, and a first common electrode CE1. The second light-emitting element LED2 can include a second pixel electrode PE2, a second light-emitting layer EML2, and a second common electrode CE2. The third light-emitting element LED3 can include a third pixel electrode PE3, a third light-emitting layer EML3, and a third common electrode CE3.

[0058] The first transistor TR1 can include a first active pattern, a first gate electrode, a first source electrode, and a first drain electrode. The second transistor TR2 can include a second active pattern, a second gate electrode, a second source electrode, and a second drain electrode. The third transistor TR3 can include a third active pattern, a third gate electrode, a third source electrode, and a third drain electrode.

[0059] The substrate SUB may include a transparent material or an opaque material. The substrate SUB may be formed of a transparent resin substrate. Examples of the transparent resin substrate may include a polyimide substrate. In this case, the polyimide substrate may include a first organic layer, a first barrier layer, and / or a second organic layer, etc.

[0060] Alternatively, the substrate SUB may include a quartz substrate (e.g., a synthetic quartz substrate, a fluorine-doped quartz substrate), a calcium fluoride substrate, a soda-lime glass substrate, or an alkali-free glass substrate, etc. These materials may be used alone or in combination with each other.

[0061] The buffer layer BUF may be disposed on the substrate SUB. The buffer layer BUF may prevent metal atoms or impurities from diffusing from the substrate SUB to the first transistor TR1, the second transistor TR2, and the third transistor TR3. In addition, when the surface of the substrate SUB is uneven, the buffer layer BUF may improve the flatness of the surface of the substrate SUB.

[0062] For example, the buffer layer BUF may include an inorganic material such as silicon oxide, silicon nitride, or silicon oxynitride. These materials may be used alone or in combination with each other.

[0063] For example, the buffer layer BUF may include an inorganic material such as silicon oxide, silicon nitride, silicon carbide, silicon oxynitride, or silicon carbonitride. These materials may be used alone or in combination with each other.

[0064] The first transistor TR1, the second transistor TR2, and the third transistor TR3 may be disposed on the buffer layer BUF. For example, the first transistor TR1 may be disposed in at least a part of the first pixel region PX1, the second transistor TR2 may be disposed in at least a part of the second pixel region PX2, and the third transistor TR3 may be disposed in at least a part of the third pixel region PX3.

[0065] For example, each of the first transistor TR1, the second transistor TR2, and the third transistor TR3 may include polysilicon or a metal oxide semiconductor.

[0066] The metal oxide semiconductor may include a binary compound (“AB x ”) containing indium (“In”), zinc (“Zn”), gallium (“Ga”), tin (“Sn”), titanium (“Ti”), aluminum (“Al”), hafnium (“Hf”), zirconium (“Zr”), or magnesium (“Mg”), etc., a ternary compound (“AB x C y ”), or a quaternary compound (“AB x C y D z ”), etc. These materials may be used alone or in combination with each other.

[0067] For example, the metal oxide semiconductor may include zinc oxide (“ZnO x ”), gallium oxide (“GaO x ”), tin oxide (“SnO x ”), indium oxide (“InO x ”), indium gallium oxide (“IGO”), indium zinc oxide (“IZO”), indium tin oxide (“ITO”), indium zinc tin oxide (“IZTO”), and indium gallium zinc oxide (“IGZO”). These materials may be used alone or in combination with each other.

[0068] The insulating layer IL may be disposed on the buffer layer BUF. The insulating layer IL may cover the first transistor TR1, the second transistor TR2, and the third transistor TR3. For example, the insulating layer IL may include at least one inorganic insulating layer and at least one organic insulating layer.

[0069] For example, the inorganic insulating layer may include silicon oxide, silicon nitride, silicon carbide, silicon oxynitride, or silicon carbonitride, etc. These materials may be used alone or in combination with each other.

[0070] In addition, the organic insulating layer may include photoresist, polypropylene resin, polyimide resin, polyamide resin, silicone resin, acrylic resin, or epoxy resin, etc. These materials may be used alone or in combination with each other.

[0071] The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be disposed on the insulating layer IL. The first pixel electrode PE1 may be disposed in the first pixel region PX1, the second pixel electrode PE2 may be disposed in the second pixel region PX2, and the third pixel electrode PE3 may be disposed in the third pixel region PX3.

[0072] The first pixel electrode PE1 may be connected to the first transistor TR1 via a first contact hole formed by removing a part of the insulating layer IL. The second pixel electrode PE2 may be connected to the second transistor TR2 via a second contact hole formed by removing a part of the insulating layer IL. The third pixel electrode PE3 may be connected to the third transistor TR3 via a third contact hole formed by removing a part of the insulating layer IL.

[0073] For example, each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may include a metal, an alloy, a metal nitride, a conductive metal oxide, or a transparent conductive material, etc. These materials may be used alone or in combination with each other.

[0074] For example, the first pixel electrode PE1 can be used as the anode of the first light-emitting element LED1. The second pixel electrode PE2 can be used as the anode of the second light-emitting element LED2. The third pixel electrode PE3 can be used as the anode of the third light-emitting element LED3.

[0075] The pixel defining layer PDL can be disposed on the insulating layer IL, the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. For example, the pixel defining layer PDL can be disposed in the first non-light-emitting region BM1, the second non-light-emitting region BM2, the third non-light-emitting region BM3, and the fourth non-light-emitting region BM4.

[0076] The pixel defining layer PDL can cover the sides of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. In addition, the pixel defining layer PDL can expose the upper surfaces of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3.

[0077] For example, the pixel defining layer PDL can include an organic material and / or an inorganic material. In an embodiment, the pixel defining layer PDL can include an organic material. For example, the pixel defining layer PDL can include a photoresist, a polypropylene resin, a polyimide resin, a polyamide resin, a silicone resin, an acrylic resin, or an epoxy resin, etc. These materials can be used alone or in combination with each other.

[0078] The second non-light-emitting region BM2 can be disposed between the first pixel region PX1 and the second pixel region PX2. The second non-light-emitting region BM2 can be spaced apart from the first non-light-emitting region BM1, and the first pixel region PX1 is between the second non-light-emitting region BM2 and the first non-light-emitting region BM1. The third non-light-emitting region BM3 can be disposed between the second pixel region PX2 and the third pixel region PX3. The third non-light-emitting region BM3 can be spaced apart from the second non-light-emitting region BM2, and the second pixel region PX2 is between the third non-light-emitting region BM3 and the second non-light-emitting region BM2. In addition, the third non-light-emitting region BM3 can be spaced apart from the fourth non-light-emitting region BM4, and the third pixel region PX3 is between the third non-light-emitting region BM3 and the fourth non-light-emitting region BM4. The non-light-emitting regions BM1, BM2, and BM3 do not include the color conversion layers CT1 and CT2 and the light-transmitting layer TL.

[0079] The first emission layer EML1 may be disposed on the first pixel electrode PE1. For example, the first emission layer EML1 may be disposed in the first pixel region PX1. The second emission layer EML2 may be disposed on the second pixel electrode PE2. For example, the second emission layer EML2 may be disposed in the second pixel region PX2. The third emission layer EML3 may be disposed on the third pixel electrode PE3. For example, the third emission layer EML3 may be disposed in the third pixel region PX3.

[0080] The holes provided in the first pixel electrode PE1 and the electrons provided in the first common electrode CE1 may form first excitons in the first emission layer EML1. When the first excitons change from the excited state to the ground state, the first emission layer EML1 may emit light.

[0081] The holes provided in the second pixel electrode PE2 and the electrons provided in the second common electrode CE2 may form second excitons in the second emission layer EML2. When the second excitons change from the excited state to the ground state, the second emission layer EML2 may emit light.

[0082] The holes provided in the third pixel electrode PE3 and the electrons provided in the third common electrode CE3 may form third excitons in the third emission layer EML3. When the third excitons change from the excited state to the ground state, the third emission layer EML3 may emit light.

[0083] The first common electrode CE1 may be disposed on the first emission layer EML1. For example, the first common electrode CE1 may be disposed in the first pixel region PX1. The second common electrode CE2 may be disposed on the second emission layer EML2. For example, the second common electrode CE2 may be disposed in the second pixel region PX2. The third common electrode CE3 may be disposed on the third emission layer EML3. For example, the third common electrode CE3 may be disposed in the third pixel region PX3.

[0084] In an embodiment, the first common electrode CE1 may be connected to the second common electrode CE2, and the second common electrode CE2 may be connected to the third common electrode CE3. That is, the first common electrode CE1, the second common electrode CE2, and the third common electrode CE3 may be integrally formed.

[0085] However, the present disclosure is not limited thereto, and in another embodiment, the first common electrode CE1 may be separated from the second common electrode CE2, and the second common electrode CE2 may be separated from the third common electrode CE3.

[0086] For example, each of the first common electrode CE1, the second common electrode CE2, and the third common electrode CE3 may include a metal, an alloy, a metal nitride, a conductive metal oxide, or a transparent conductive material, etc. These materials may be used alone or in combination with each other.

[0087] For example, the first common electrode CE1 may be used as the cathode of the first light-emitting element LED1. The second common electrode CE2 may be used as the cathode of the second light-emitting element LED2. The third common electrode CE3 may be used as the cathode of the third light-emitting element LED3.

[0088] The encapsulation layer TFE may be disposed on the first common electrode CE1, the second common electrode CE2, and the third common electrode CE3. The encapsulation layer TFE may prevent impurities, moisture, etc. from penetrating into the first light-emitting element LED1, the second light-emitting element LED2, and the third light-emitting element LED3.

[0089] For example, the encapsulation layer TFE may include at least one inorganic encapsulation layer and at least one organic encapsulation layer. The inorganic encapsulation layer may include silicon oxide, silicon nitride, or silicon oxynitride, etc. These materials may be used alone or in combination with each other. The organic encapsulation layer may include a polymer curing material such as polyacrylate.

[0090] Figure 3 is a diagram Figure 2 of a cross-sectional view of an example of the X-Y portion. Figure 4 is a diagram Figure 2 of a cross-sectional view of another example of the X-Y portion. Figure 5 is a diagram Figure 2 of a cross-sectional view of yet another example of the X-Y portion.

[0091] Reference Figure 2 and Figure 3 and, a first color conversion layer CT1 may be disposed on the first light-emitting element LED1. For example, the first color conversion layer CT1 may be disposed on the encapsulation layer TFE, within the first pixel region PX1. The first color conversion layer CT1 may include a first resin portion RS1, a first scatterer SP1, and first wavelength conversion particles QD1.

[0092] The first resin portion RS1 may include an epoxy resin, an acrylic resin, a phenolic resin, a melamine resin, a cardo resin, or an imide resin, etc. These materials may be used alone or in combination with each other.

[0093] The first scatterer SP1 can increase the optical path by scattering the first incident light L1, and basically does not convert the wavelength of the first incident light L1 incident on the first color conversion layer CT1. For example, the first scatterer SP1 can include a metal oxide or an organic material, etc. These materials can be used alone or in combination with each other. For example, the first scatterer SP1 can include titanium dioxide ("TiO2"), silicon dioxide ("SiO2"), barium sulfate ("BaSO4"), zinc oxide ("ZnO"), aluminum oxide ("Al2O3"), or calcium carbonate ("CaCO3"), etc. These materials can be used alone or in combination with each other.

[0094] The first wavelength conversion particle QD1 can include a first quantum dot. The first wavelength conversion particle QD1 can absorb the first incident light L1 to emit light having a wavelength different from that of the first incident light L1. For example, the first wavelength conversion particle QD1 can absorb the first incident light L1 to emit red light. However, the present disclosure is not limited thereto. For another example, the first wavelength conversion particle QD1 can absorb the first incident light L1 to emit green light.

[0095] For example, the first wavelength conversion particle QD1 can include a II-VI group compound, a III-V group compound, a IV-VI group compound, a group IV element, or a group IV compound, etc. These materials can be used alone or in combination with each other. For example, the II-VI group compound can include CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, or HgSe, etc. The III-V group compound can include GaN, GaP, GaAs, GaSb, AlN, or AlP, etc. The IV-VI group compound can include SnS, SnSe, SnTe, PbS, or PbSe, etc. The group IV element can include Si or Ge, etc. The group IV compound can include SiC or SiGe, etc.

[0096] The second color conversion layer CT2 can be disposed on the second light-emitting element LED2. For example, the second color conversion layer CT2 can be disposed on the encapsulation layer TFE, in the second pixel region PX2. The second color conversion layer CT2 can include a second resin portion RS2, a second scatterer SP2, and a second wavelength conversion particle QD2.

[0097] The second resin portion RS2 can include an epoxy resin, an acrylic resin, a phenolic resin, a melamine resin, a cardo resin, or an imide resin, etc. These materials can be used alone or in combination with each other.

[0098] In an embodiment, the first resin portion RS1 and the second resin portion RS2 can include substantially the same material. However, the present disclosure is not limited thereto, and in another embodiment, the first resin portion RS1 and the second resin portion RS2 can include different materials.

[0099] The second scatterer SP2 can increase the optical path by scattering the second incident light L2 while substantially not converting the wavelength of the second incident light L2 incident on the second color conversion layer CT2. For example, the second scatterer SP2 can include a metal oxide, an organic material, or the like. These materials can be used alone or in combination with each other. For example, the second scatterer SP2 can include titanium dioxide (“TiO2”), silicon dioxide (“SiO2”), barium sulfate (“BaSO4”), zinc oxide (“ZnO”), aluminum oxide (“Al2O3”), or calcium carbonate (“CaCO3”), etc. These materials can be used alone or in combination with each other.

[0100] In an embodiment, the first scatterer SP1 and the second scatterer SP2 can include substantially the same material. However, the present disclosure is not limited thereto, and in another embodiment, the first scatterer SP1 and the second scatterer SP2 can include different materials.

[0101] The second wavelength conversion particles QD2 can include second quantum dots. The second wavelength conversion particles QD2 can absorb the second incident light L2 to emit light having a wavelength different from the wavelength of the second incident light L2. For example, the second wavelength conversion particles QD2 can absorb the second incident light L2 to emit green light. However, the present disclosure is not limited thereto. Again for example, the second wavelength conversion particles QD2 can absorb the second incident light L2 to emit red light.

[0102] For example, the second wavelength conversion particles QD2 can include II-VI group compounds, III-V group compounds, IV-VI group compounds, group IV elements, or group IV compounds, etc. These materials can be used alone or in combination with each other. For example, II-VI group compounds can include CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, or HgSe, etc. III-V group compounds can include GaN, GaP, GaAs, GaSb, AlN, or AlP, etc. IV-VI group compounds can include SnS, SnSe, SnTe, PbS, or PbSe, etc. Group IV elements can include Si or Ge, etc. Group IV compounds can include SiC or SiGe, etc.

[0103] The light transmissive layer TL can be disposed on the third light emitting element LED3. For example, the light transmissive layer TL can be disposed on the encapsulation layer TFE, in the third pixel region PX3. The light transmissive layer TL can include a third resin portion RS3 and a third scatterer SP3. The light transmissive layer TL does not include wavelength conversion particles such as quantum dots.

[0104] The third resin portion RS3 may include an epoxy resin, an acrylic resin, a phenolic resin, a melamine resin, a cardo resin, or an imide resin, etc. These materials may be used alone or in combination with each other.

[0105] In an embodiment, the first resin portion RS1 and the third resin portion RS3 may include substantially the same materials. However, the present disclosure is not limited thereto, and in another embodiment, the first resin portion RS1 and the third resin portion RS3 may include different materials.

[0106] The third scatterer SP3 may increase the optical path by scattering the third incident light L3 while substantially not converting the wavelength of the third incident light L3 incident on the light transmissive layer TL. For example, the third scatterer SP3 may include a metal oxide or an organic material, etc. These materials may be used alone or in combination with each other. For example, the third scatterer SP3 may include titanium dioxide (“TiO2”), silicon dioxide (“SiO2”), barium sulfate (“BaSO4”), zinc oxide (“ZnO”), aluminum oxide (“Al2O3”), or calcium carbonate (“CaCO3”), etc. These materials may be used alone or in combination with each other.

[0107] In an embodiment, the first scatterer SP1 and the third scatterer SP3 may include substantially the same materials. However, the present disclosure is not limited thereto, and in another embodiment, the first scatterer SP1 and the third scatterer SP3 may include different materials.

[0108] The color filter layer CF may include a first color filter layer CF1, a second color filter layer CF2, and a third color filter layer CF3.

[0109] The first color filter layer CF1 may cover the first color conversion layer CT1. For example, the first color filter layer CF1 may cover the upper surface CT1-U and the side surface CT1-S of the first color conversion layer CT1. That is to say, the first color filter layer CF1 may be disposed in the first pixel region PX1. In addition, the first color filter layer CF1 may be disposed in at least a part of the first non-light-emitting region BM1 and at least a part of the second non-light-emitting region BM2.

[0110] In an embodiment, the first color filter layer CF1 may cover the side surface TL-S of the light transmissive layer TL. That is to say, the first color filter layer CF1 may be disposed in at least a part of the third non-light-emitting region BM3 and at least a part of the fourth non-light-emitting region BM4.

[0111] For example, the first color filter layer CF1 may selectively transmit red light. However, the present disclosure is not limited thereto. For another example, the first color filter layer CF1 may selectively transmit green light.

[0112] The second color filter layer CF2 may cover the second color conversion layer CT2. For example, the second color filter layer CF2 may cover the upper surface CT2-U of the second color conversion layer CT2. That is to say, the second color filter layer CF2 may be disposed in the second pixel region PX2.

[0113] In an embodiment, the second color filter layer CF2 may extend to at least a part of the second non-light-emitting region BM2. For example, the second color filter layer CF2 may cover at least a part of the upper surface of the third color filter layer CF3 that is disposed in the second non-light-emitting region BM2.

[0114] In an embodiment, the second color filter layer CF2 may extend to at least a part of the third non-light-emitting region BM3. For example, the second color filter layer CF2 may cover at least a part of the upper surface of the third color filter layer CF3 that is disposed in the third non-light-emitting region BM3.

[0115] For example, the second color filter layer CF2 may selectively transmit green light. However, the present disclosure is not limited thereto. For another example, the second color filter layer CF2 may selectively transmit red light.

[0116] The third color filter layer CF3 may cover the light-transmitting layer TL. For example, the third color filter layer CF3 may cover the upper surface TL-U of the light-transmitting layer TL. That is to say, the third color filter layer CF3 may be disposed in the third pixel region PX3.

[0117] In an embodiment, the third color filter layer CF3 may cover the first color filter layer CF1 that covers the light-transmitting layer TL. For example, the third color filter layer CF3 may cover the upper surface and side surfaces of the portion of the first color filter layer CF1 that covers the light-transmitting layer TL.

[0118] In an embodiment, the third color filter layer CF3 may be disposed in at least a part of the first non-light-emitting region BM1. In an embodiment, the third color filter layer CF3 may be disposed in at least a part of the fourth non-light-emitting region BM4.

[0119] In an embodiment, the third color filter layer CF3 may be disposed in at least a part of the second non-light-emitting region BM2. For example, the third color filter layer CF3 may be in contact with the side surface of the first color filter layer CF1. For example, the third color filter layer CF3 may be in contact with the side surface of the portion of the first color filter layer CF1 that covers the first color conversion layer CT1.

[0120] In an embodiment, the third color filter layer CF3 may be disposed in at least a part of the third non-light-emitting region BM3. For example, the third color filter layer CF3 may be in contact with the side surface CT2-S of the second color conversion layer CT2. In an embodiment, the third color filter layer CF3 may selectively transmit blue light.

[0121] A part of the first color filter layer CF1 and a part of the third color filter layer CF3 may be disposed in the second non-light-emitting region BM2. For example, the first color filter layer CF1 and the third color filter layer CF3 may be stacked in the first direction DR1 in the second non-light-emitting region BM2. Accordingly, color mixing between the first pixel region PX1 and the second pixel region PX2 can be effectively prevented. In addition, a partial path of the first incident light L1 to the second pixel region PX2 may be blocked so that the first incident light L1 does not reach the second color conversion layer CT2, and a partial path of the second incident light L2 to the first pixel region PX1 may be blocked so that the second incident light L2 does not reach the first color conversion layer CT1.

[0122] A part of the first color filter layer CF1 and a part of the third color filter layer CF3 may be disposed in the third non-light-emitting region BM3. For example, the first color filter layer CF1 and the third color filter layer CF3 may be stacked in the first direction DR1 in the third non-light-emitting region BM3. Accordingly, color mixing between the second pixel region PX2 and the third pixel region PX3 can be effectively prevented. In addition, a partial path of the second incident light L2 to the third pixel region PX3 may be blocked so that the second incident light L2 does not reach the light-transmitting layer TL, and a partial path of the third incident light L3 to the second pixel region PX2 may be blocked so that the third incident light L3 does not reach the second color conversion layer CT2.

[0123] The display device DD according to the embodiment may not include a bank layer. Generally, the bank layer may define openings for accommodating each of the first color conversion layer, the second color conversion layer, and the light-transmitting layer. The bank layer may prevent color mixing between adjacent pixel regions. The display device DD according to the embodiment may include a color filter layer CF disposed between the first color conversion layer CT1 and the second color conversion layer CT2. For example, the display device DD may include a first color filter layer CF1 and a third color filter layer CF3 disposed between the first color conversion layer CT1 and the second color conversion layer CT2. Accordingly, even if the display device DD does not include a bank layer, color mixing between the first pixel region PX1 and the second pixel region PX2 can be effectively prevented. In addition, the display device DD may include a color filter layer CF disposed between the second color conversion layer CT2 and the light-transmitting layer TL. For example, the display device DD may include a first color filter layer CF1 and a third color filter layer CF3 disposed between the second color conversion layer CT2 and the light-transmitting layer TL. Accordingly, even if the display device DD does not include a bank layer, color mixing between the second pixel region PX2 and the third pixel region PX3 can be effectively prevented. That is, even if the display device DD does not include a bank layer, color mixing between adjacent pixel regions can be effectively prevented. In addition, since the display device DD does not include a bank layer, the manufacturing cost and manufacturing time of the display device DD can be reduced.

[0124] In addition, since the bank layer is not provided between adjacent pixel regions, the pixel regions can have sufficient sizes. For example, since the bank layer is not provided between the first pixel region PX1 and the second pixel region PX2, the first pixel region PX1 and the second pixel region PX2 can have sufficient sizes. For example, since the bank layer is not provided between the second pixel region PX2 and the third pixel region PX3, the second pixel region PX2 and the third pixel region PX3 can have sufficient sizes.

[0125] The cover layer CPL can be provided on the color filter layer CF. For example, the cover layer CPL can cover the first color filter layer CF1, the second color filter layer CF2, and the third color filter layer CF3. In an embodiment, the cover layer CPL can include an inorganic material. Examples of inorganic materials that can be used as the cover layer CPL can include silicon oxide or silicon nitride, etc. These materials can be used alone or in combination with each other.

[0126] In an embodiment, the width W1 of the second non-light-emitting region BM2 in the first direction DR1 can be about 2 micrometers or more and about 4 micrometers or less. For example, the width W1 of the second non-light-emitting region BM2 in the first direction DR1 can be about 3 micrometers. That is, the first color conversion layer CT1 and the second color conversion layer CT2 can be spaced apart from each other by about 3 micrometers in the first direction DR1.

[0127] In an embodiment, the width W2 of the third non-light-emitting region BM3 in the first direction DR1 can be about 2 micrometers or more and about 4 micrometers or less. For example, the width W2 of the third non-light-emitting region BM3 in the first direction DR1 can be about 3 micrometers. That is, the second color conversion layer CT2 and the light-transmitting layer TL can be spaced apart from each other by about 3 micrometers in the first direction DR1.

[0128] In an embodiment, the width W2 of the third non-light-emitting region BM3 in the first direction DR1 and the width W1 of the second non-light-emitting region BM2 in the first direction DR1 can be substantially the same. However, the present disclosure is not limited thereto, and in another embodiment, the width W2 of the third non-light-emitting region BM3 in the first direction DR1 and the width W1 of the second non-light-emitting region BM2 in the first direction DR1 can be different from each other. For example, the width W2 of the third non-light-emitting region BM3 in the first direction DR1 can be greater than the width W1 of the second non-light-emitting region BM2 in the first direction DR1.

[0129] Reference Figure 2 and Figure 4 , the display device DD can further include a first low refractive index layer LR1, a second low refractive index layer LR2, and a third low refractive index layer LR3.

[0130] For example, the first low refractive index layer LR1 may be disposed between the first color conversion layer CT1 and the first color filter layer CF1. For example, the first low refractive index layer LR1 may cover the first color conversion layer CT1, and the first color filter layer CF1 may cover the first low refractive index layer LR1. The first low refractive index layer LR1 may be disposed in the first pixel region PX1.

[0131] For example, the second low refractive index layer LR2 may be disposed between the second color conversion layer CT2 and the second color filter layer CF2. For example, the second low refractive index layer LR2 may cover the second color conversion layer CT2, and the second color filter layer CF2 may cover the second low refractive index layer LR2. In addition, the third color filter layer CF3 may cover at least a portion of the second low refractive index layer LR2. For example, the third color filter layer CF3 may cover the side surface of the second low refractive index layer LR2.

[0132] For example, the third low refractive index layer LR3 may be disposed between the light transmissive layer TL and the third color filter layer CF3. For example, the third low refractive index layer LR3 may cover the light transmissive layer TL, and the third color filter layer CF3 may cover the third low refractive index layer LR3. In addition, the first color filter layer CF1 may cover at least a portion of the third low refractive index layer LR3. For example, the first color filter layer CF1 may cover the side surface of the third low refractive index layer LR3.

[0133] Each of the first low refractive index layer LR1, the second low refractive index layer LR2, and the third low refractive index layer LR3 may improve the light extraction efficiency, thereby increasing the brightness and lifespan of the display device DD. For example, the first low refractive index layer LR1 may improve the light extraction efficiency of the first incident light L1, the second low refractive index layer LR2 may improve the light extraction efficiency of the second incident light L2, and the third low refractive index layer LR3 may improve the light extraction efficiency of the third incident light L3.

[0134] For example, each of the first low refractive index layer LR1, the second low refractive index layer LR2, and the third low refractive index layer LR3 may include an organic material. For example, each of the first low refractive index layer LR1, the second low refractive index layer LR2, and the third low refractive index layer LR3 may include an organic polymer material containing silicon.

[0135] Reference Figure 2 and Figure 5, in another embodiment, the first color filter layer CF1' may be disposed in the entirety of the first non-light-emitting region BM1. In addition, the first color filter layer CF1' may be disposed in the entirety of the second non-light-emitting region BM2. In addition, the first color filter layer CF1' may be disposed in the entirety of the third non-light-emitting region BM3. For example, the first color filter layer CF1' may be in contact with a side surface of the second color conversion layer CT2. In addition, the first color filter layer CF1' may be disposed in the entirety of the fourth non-light-emitting region BM4.

[0136] The color filter layer CF' may include a first color filter layer CF1', a second color filter layer CF2, and a third color filter layer CF3.

[0137] Figure 6 , Figure 7 , Figure 8 , Figure 9 , Figure 10 , Figure 11 , Figure 12 , Figure 13 and Figure 14 are cross-sectional views of a method of manufacturing Figure 2 a display device.

[0138] Referring to Figure 6 , a buffer layer BUF may be formed on a substrate SUB.

[0139] For example, the substrate SUB may include a transparent material or an opaque material. The substrate SUB may be formed of a transparent resin substrate. Examples of the transparent resin substrate may include a polyimide substrate. In this case, the polyimide substrate may include a first organic layer, a first barrier layer, and / or a second organic layer, etc.

[0140] Alternatively, the substrate SUB may include a quartz substrate (e.g., a synthetic quartz substrate, a fluorine-doped quartz substrate), a calcium fluoride substrate, a soda-lime glass substrate, or an alkali-free glass substrate, etc. These materials may be used alone or in combination with each other.

[0141] For example, the buffer layer BUF may include an inorganic material such as silicon oxide, silicon nitride, or silicon oxynitride. These materials may be used alone or in combination with each other.

[0142] A first transistor TR1, a second transistor TR2, and a third transistor TR3 may be formed on the buffer layer BUF. The first transistor TR1 may be formed in at least a part of the first pixel region PX1. The second transistor TR2 may be formed in at least a part of the second pixel region PX2. The third transistor TR3 may be formed in at least a part of the third pixel region PX3.

[0143] For example, each of the first transistor TR1, the second transistor TR2, and the third transistor TR3 may include polysilicon or a metal oxide semiconductor.

[0144] The metal oxide semiconductor may include binary compounds (“AB x ”) containing indium (“In”), zinc (“Zn”), gallium (“Ga”), tin (“Sn”), titanium (“Ti”), aluminum (“Al”), hafnium (“Hf”), zirconium (“Zr”), or magnesium (“Mg”), etc., ternary compounds (“AB x C y ”), or quaternary compounds (“AB x C y D z ”), etc. These materials may be used alone or in combination with each other.

[0145] For example, the metal oxide semiconductor may include zinc oxide (“ZnO x ”), gallium oxide (“GaO x ”), tin oxide (“SnO x ”), indium oxide (“InO x ”), indium gallium oxide (“IGO”), indium zinc oxide (“IZO”), indium tin oxide (“ITO”), indium zinc tin oxide (“IZTO”), and indium gallium zinc oxide (“IGZO”). These materials may be used alone or in combination with each other.

[0146] An insulating layer IL may be formed on the buffer layer BUF. The insulating layer IL may be formed to cover the first transistor TR1, the second transistor TR2, and the third transistor TR3. For example, the insulating layer IL may include at least one inorganic insulating layer and at least one organic insulating layer.

[0147] For example, the inorganic insulating layer may include silicon oxide, silicon nitride, silicon carbide, silicon oxynitride, or silicon carbonitride, etc. These materials may be used alone or in combination with each other.

[0148] In addition, the organic insulating layer may include photoresist, polypropylene resin, polyimide resin, polyamide resin, silicone resin, acrylic resin, or epoxy resin, etc. These materials may be used alone or in combination with each other.

[0149] The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be formed on the insulating layer IL. The first pixel electrode PE1 may be formed in the first pixel region PX1. The second pixel electrode PE2 may be formed in the second pixel region PX2. The third pixel electrode PE3 may be formed in the third pixel region PX3.

[0150] The first contact hole may be formed by removing a portion of the insulating layer IL. The first pixel electrode PE1 may be connected to the first transistor TR1 through the first contact hole. The second contact hole may be formed by removing a portion of the insulating layer IL. The second pixel electrode PE2 may be connected to the second transistor TR2 through the second contact hole. The third contact hole may be formed by removing a portion of the insulating layer IL. The third pixel electrode PE3 may be connected to the third transistor TR3 through the third contact hole.

[0151] For example, each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may include a metal, an alloy, a metal nitride, a conductive metal oxide, or a transparent conductive material, etc. These materials may be used alone or in combination with each other.

[0152] The pixel defining layer PDL may be formed on the insulating layer IL, the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. For example, the pixel defining layer PDL may be formed in the first non-light emitting region BM1, the second non-light emitting region BM2, the third non-light emitting region BM3, and the fourth non-light emitting region BM4.

[0153] The pixel defining layer PDL may be formed to cover the sides of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. In addition, the pixel defining layer PDL may be formed to expose the upper surfaces of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3.

[0154] For example, the pixel defining layer PDL may include an organic material and / or an inorganic material. In an embodiment, the pixel defining layer PDL may include an organic material. For example, the pixel defining layer PDL may include a photoresist, a polypropylene resin, a polyimide resin, a polyamide resin, a silicone resin, an acrylic resin, or an epoxy resin, etc. These materials may be used alone or in combination with each other.

[0155] The first emission layer EML1 may be formed on the first pixel electrode PE1. For example, the first emission layer EML1 may be formed in the first pixel region PX1. The second emission layer EML2 may be formed on the second pixel electrode PE2. For example, the second emission layer EML2 may be formed in the second pixel region PX2. The third emission layer EML3 may be formed on the third pixel electrode PE3. For example, the third emission layer EML3 may be formed in the third pixel region PX3.

[0156] The first common electrode CE1 may be formed on the first light-emitting layer EML1. For example, the first common electrode CE1 may be formed in the first pixel region PX1. The second common electrode CE2 may be formed on the second light-emitting layer EML2. For example, the second common electrode CE2 may be formed in the second pixel region PX2. The third common electrode CE3 may be formed on the third light-emitting layer EML3. For example, the third common electrode CE3 may be formed in the third pixel region PX3.

[0157] In an embodiment, the first common electrode CE1, the second common electrode CE2, and the third common electrode CE3 may be integrally formed. However, the present disclosure is not limited thereto, and in another embodiment, the first common electrode CE1 may be separately formed from the second common electrode CE2, and the second common electrode CE2 may be separately formed from the third common electrode CE3.

[0158] For example, each of the first common electrode CE1, the second common electrode CE2, and the third common electrode CE3 may include a metal, an alloy, a metal nitride, a conductive metal oxide, or a transparent conductive material, etc. These materials may be used alone or in combination with each other.

[0159] The encapsulation layer TFE may be formed on the first common electrode CE1, the second common electrode CE2, and the third common electrode CE3. For example, the encapsulation layer TFE may include at least one inorganic encapsulation layer and at least one organic encapsulation layer. For example, the inorganic encapsulation layer may include silicon oxide, silicon nitride, or silicon oxynitride, etc. These materials may be used alone or in combination with each other. The organic encapsulation layer may include a polymer curing material such as polyacrylate.

[0160] Reference Figure 7 , the first color conversion layer CT1 may be formed on the encapsulation layer TFE. The first color conversion layer CT1 may be formed in the first pixel region PX1. For example, the first preliminary color conversion layer may be formed on the encapsulation layer TFE, the first photoresist layer may be formed on the first preliminary color conversion layer, and the first mask may be formed on the first photoresist layer.

[0161] The first mask may include a transmissive region and a light-shielding region. In the transmissive region, light may pass through the first mask to the first photoresist layer. In the light-shielding region, light may not pass through the first mask to the first photoresist layer.

[0162] For example, the first photoresist layer may be a negative photoresist or a positive photoresist. In the following description, for the sake of convenience of description, all photoresist layers will be described based on the case of a negative photoresist.

[0163] A portion of the first photoresist layer that overlaps with the light-shielding region may be dissolved after the exposure process and the development process. Even after the exposure process and the development process, a portion of the first photoresist layer that overlaps with the transmissive region may not be dissolved.

[0164] In a plan view, the transmissive region of the first mask may overlap with the first pixel region PX1. In a plan view, the light-shielding region of the first mask may overlap with the first non-light-emitting region BM1, the second non-light-emitting region BM2, the second pixel region PX2, the third non-light-emitting region BM3, the third pixel region PX3, and the fourth non-light-emitting region BM4.

[0165] The first photoresist layer may be subjected to an exposure process and a development process using the first mask. Thus, a first photoresist pattern may be formed. The first preliminary color conversion layer may be etched using the first photoresist pattern. Thus, a first color conversion layer CT1 may be formed.

[0166] The first color conversion layer CT1 may include a first resin portion RS1, a first scatterer SP1, and a first wavelength conversion particle QD1.

[0167] For example, the first resin portion RS1 may include an epoxy resin, an acrylic resin, a phenolic resin, a melamine resin, a cardo resin, or an imide resin, etc. These materials may be used alone or in combination with each other.

[0168] For example, the first scatterer SP1 may include titanium dioxide ("TiO2"), silicon dioxide ("SiO2"), barium sulfate ("BaSO4"), zinc oxide ("ZnO"), aluminum oxide ("Al2O3"), or calcium carbonate ("CaCO3"), etc. These materials may be used alone or in combination with each other.

[0169] For example, the first wavelength conversion particle QD1 may include II-VI group compounds, III-V group compounds, IV-VI group compounds, group IV elements, or group IV compounds, etc. These materials may be used alone or in combination with each other. For example, II-VI group compounds may include CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, or HgSe, etc. III-V group compounds may include GaN, GaP, GaAs, GaSb, AlN, or AlP, etc. IV-VI group compounds may include SnS, SnSe, SnTe, PbS, or PbSe, etc. Group IV elements may include Si or Ge, etc. Group IV compounds may include SiC or SiGe, etc.

[0170] The second color conversion layer CT2 may be formed on the encapsulation layer TFE. The second color conversion layer CT2 may be formed in the second pixel region PX2. For example, a second preliminary color conversion layer may be formed on the encapsulation layer TFE, a second photoresist layer may be formed on the second preliminary color conversion layer, and a second mask may be formed on the second photoresist layer. The second mask may include a transmissive region and a light-blocking region.

[0171] In a plan view, the transmissive region of the second mask may overlap with the second pixel region PX2. In a plan view, the light-blocking region of the second mask may overlap with the first non-light-emitting region BM1, the first pixel region PX1, the second non-light-emitting region BM2, the third non-light-emitting region BM3, the third pixel region PX3, and the fourth non-light-emitting region BM4.

[0172] The second photoresist layer may be subjected to an exposure process and a development process using the second mask. Thus, a second photoresist pattern may be formed. The second preliminary color conversion layer may be etched using the second photoresist pattern. Thus, the second color conversion layer CT2 may be formed.

[0173] The second color conversion layer CT2 may include a second resin portion RS2, a second scatterer SP2, and second wavelength conversion particles QD2.

[0174] For example, the second resin portion RS2 may include an epoxy resin, an acrylic resin, a phenolic resin, a melamine resin, a cardo resin, or an imide resin, etc. These materials may be used alone or in combination with each other.

[0175] For example, the second scatterer SP2 may include titanium dioxide (“TiO2”), silicon dioxide (“SiO2”), barium sulfate (“BaSO4”), zinc oxide (“ZnO”), aluminum oxide (“Al2O3”), or calcium carbonate (“CaCO3”), etc. These materials may be used alone or in combination with each other.

[0176] For example, the second wavelength conversion particles QD2 may include II-VI group compounds, III-V group compounds, IV-VI group compounds, group IV elements, or group IV compounds, etc. These materials may be used alone or in combination with each other. For example, II-VI group compounds may include CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, or HgSe, etc. III-V group compounds may include GaN, GaP, GaAs, GaSb, AlN, or AlP, etc. IV-VI group compounds may include SnS, SnSe, SnTe, PbS, or PbSe, etc. Group IV elements may include Si or Ge, etc. Group IV compounds may include SiC or SiGe, etc.

[0177] The light-transmitting layer TL can be formed on the encapsulation layer TFE. The light-transmitting layer TL can be formed in the third pixel region PX3. For example, a preliminary light-transmitting layer can be formed on the encapsulation layer TFE, a third photoresist layer can be formed on the preliminary light-transmitting layer, and a third mask can be formed on the third photoresist layer. The third mask can include a transmissive region and a light-blocking region.

[0178] In a plan view, the transmissive region of the third mask can overlap with the third pixel region PX3. In a plan view, the light-blocking region of the third mask can overlap with the first non-light-emitting region BM1, the first pixel region PX1, the second non-light-emitting region BM2, the second pixel region PX2, the third non-light-emitting region BM3, and the fourth non-light-emitting region BM4.

[0179] The third photoresist layer can be subjected to an exposure process and a development process using the third mask. Thus, a third photoresist pattern can be formed. The preliminary light-transmitting layer can be etched using the third photoresist pattern. Thus, the light-transmitting layer TL can be formed.

[0180] For example, the light-transmitting layer TL can include a third resin portion RS3 and a third scatterer SP3.

[0181] For example, the third resin portion RS3 can include an epoxy resin, an acrylic resin, a phenolic resin, a melamine resin, a cardo resin, or an imide resin, etc. These materials can be used alone or in combination with each other.

[0182] For example, the third scatterer SP3 can include titanium dioxide (“TiO2”), silicon dioxide (“SiO2”), barium sulfate (“BaSO4”), zinc oxide (“ZnO”), aluminum oxide (“Al2O3”), or calcium carbonate (“CaCO3”), etc. These materials can be used alone or in combination with each other.

[0183] Reference Figure 8 , the first preliminary color filter layer PCF1 can be formed on the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE. For example, the first preliminary color filter layer PCF1 can be formed to cover the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE.

[0184] Reference Figure 8 and Figure 9, the first color filter layer CF1 can be formed by removing a part of the first preliminary color filter layer PCF1. For example, the first color filter layer CF1 can be formed to cover the first color conversion layer CT1. For example, the first color filter layer CF1 can be formed to cover the upper surface CT1-U and the side surface CT1-S of the first color conversion layer CT1. In addition, the first color filter layer CF1 can be formed to cover the side surface TL-S of the light-transmitting layer TL.

[0185] Reference Figure 10 , the third preliminary color filter layer PCF3 can be formed on the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE. For example, the third preliminary color filter layer PCF3 can be formed to cover the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE. For example, the third preliminary color filter layer PCF3 can be formed to cover the first color filter layer CF1 covering the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, the first color filter layer CF1 covering the side surface TL-S of the light-transmitting layer TL, and the encapsulation layer TFE.

[0186] Reference Figure 10 and Figure 11 , the third color filter layer CF3 can be formed by removing a part of the third preliminary color filter layer PCF3. For example, the third color filter layer CF3 can be formed to cover the light-transmitting layer TL, and can be formed to be disposed in the third non-light-emitting region BM3 and the fourth non-light-emitting region BM4. For example, the third color filter layer CF3 can be formed to cover the upper surface and the side surface of the part of the first color filter layer CF1 covering the side surface TL-S of the light-transmitting layer TL.

[0187] In addition, the third color filter layer CF3 can be formed to be disposed in the first non-light-emitting region BM1 and the second non-light-emitting region BM2. For example, the third color filter layer CF3 can be formed to cover the side surface of the part of the first color filter layer CF1 covering the first color conversion layer CT1.

[0188] For example, a part of the third preliminary color filter layer PCF3 can be removed using a photoresist layer and a mask, similar to the method of forming the first color conversion layer CT1, the second color conversion layer CT2, and the light-transmitting layer TL. Thus, the third color filter layer CF3 can be formed.

[0189] Reference Figure 12, the second preliminary color filter layer PCF2 may be formed on the first color conversion layer CT1, the second color conversion layer CT2, and the light-transmissive layer TL. For example, the second preliminary color filter layer PCF2 may be formed to cover the first color conversion layer CT1, the second color conversion layer CT2, and the light-transmissive layer TL. For example, the second preliminary color filter layer PCF2 may be formed to cover the third color filter layer CF3, the first color filter layer CF1 that covers the first color conversion layer CT1, and the second color conversion layer CT2.

[0190] Reference Figure 12 and Figure 13 , the second color filter layer CF2 may be formed by removing a part of the second preliminary color filter layer PCF2. For example, the second color filter layer CF2 may be formed to cover the upper surface CT2-U of the second color conversion layer CT2. In addition, the second color filter layer CF2 may be formed to extend to a part of the upper surface of the part of the side surface TL-S of the third color filter layer CF3 that covers the light-transmissive layer TL.

[0191] For example, a part of the second preliminary color filter layer PCF2 may be removed by using a photoresist layer and a mask, as in the method of forming the first color conversion layer CT1, the second color conversion layer CT2, and the light-transmissive layer TL. Thus, the second color filter layer CF2 may be formed.

[0192] In an embodiment, forming the third color filter layer CF3 may be performed before forming the second color filter layer CF2.

[0193] Reference Figure 14 , the cover layer CPL may be formed on the color filter layer CF. For example, the cover layer CPL may be formed to cover the first color filter layer CF1, the second color filter layer CF2, and the third color filter layer CF3.

[0194] For example, the cover layer CPL may include an inorganic material. Examples of inorganic materials that may be used as the cover layer CPL may include silicon oxide or silicon nitride, etc. These materials may be used alone or in combination with each other.

[0195] The method of manufacturing the display device DD according to an embodiment may not include the process of manufacturing each of the display unit and the color filter unit and combining the display unit and the color filter unit. Thus, the manufacturing process of the display device DD may be simplified, and thus the manufacturing cost and manufacturing time of the display device DD may be reduced. The display unit may include a light-emitting element, and the color filter unit may include a color conversion layer and a color filter layer.

[0196] Figure 15 is a cross-sectional view illustrating a display device according to another embodiment. Specifically, Figure 15 is along Figure 1Cross-sectional view of a display device according to another embodiment taken along line I-I'. Figure 16 is illustrated Figure 15 Cross-sectional view of the X'-Y' portion of.

[0197] In the description Figure 15 of the display device DD', elements that are substantially the same as those of Figure 2 the display device DD are denoted by the same reference numerals, and their detailed description may be omitted. Except for the configuration of the color filter layer CF", Figure 15 the display device DD' can be Figure 2 substantially the same as or similar to the display device DD.

[0198] Referring to Figure 15 and Figure 16 a display device DD' according to another embodiment may include a substrate SUB, a buffer layer BUF, an insulating layer IL, a first transistor TR1, a second transistor TR2, a third transistor TR3, a first light-emitting element LED1, a second light-emitting element LED2, a third light-emitting element LED3, a pixel defining layer PDL, a packaging layer TFE, a color filter layer CF", a first color conversion layer CT1, a second color conversion layer CT2, a light-transmitting layer TL, and a cover layer CPL.

[0199] The color filter layer CF" may include a first color filter layer CF1", a second color filter layer CF2', and a third color filter layer CF3'.

[0200] The first color filter layer CF1" may cover the first color conversion layer CT1. For example, the first color filter layer CF1" may cover the upper surface CT1-U of the first color conversion layer CT1. In addition, the first color filter layer CF1" may cover the second color conversion layer CT2. For example, the first color filter layer CF1" may cover the side surface CT2-S of the second color conversion layer CT2. In addition, the first color filter layer CF1" may cover the light-transmitting layer TL. For example, the first color filter layer CF1" may cover the side surface TL-S of the light-transmitting layer TL.

[0201] For example, the first color filter layer CF1" may selectively transmit red light. However, the present disclosure is not limited thereto. For another example, the first color filter layer CF1" may selectively transmit green light.

[0202] The second color filter layer CF2' may cover the second color conversion layer CT2. For example, the second color filter layer CF2' may cover the upper surface CT2-U of the second color conversion layer CT2. In addition, the second color filter layer CF2' may cover the upper surface of the portion of the side surface CT2-S of the first color filter layer CF1" that covers the second color conversion layer CT2.

[0203] In addition, the second color filter layer CF2' may cover the first color conversion layer CT1. For example, the second color filter layer CF2' may cover the side surface CT1-S of the first color conversion layer CT1.

[0204] In addition, the second color filter layer CF2' may cover the side surface TL-S of the light-transmitting layer TL. For example, the second color filter layer CF2' may cover the side surface of the portion of the first color filter layer CF1'' that covers the side surface TL-S of the light-transmitting layer TL.

[0205] For example, the second color filter layer CF2' may selectively transmit green light. However, the present disclosure is not limited thereto. For another example, the second color filter layer CF2' may selectively transmit red light.

[0206] The third color filter layer CF3' may cover the light-transmitting layer TL. For example, the third color filter layer CF3' may cover the upper surface TL-U of the light-transmitting layer TL. In addition, the third color filter layer CF3' may cover the upper surface of the portion of the first color filter layer CF1'' that covers the side surface TL-S of the light-transmitting layer TL. In addition, the third color filter layer CF3' may cover the upper surface of the portion of the second color filter layer CF2' that covers the side surface of the first color filter layer CF1''.

[0207] The third color filter layer CF3' may be disposed in at least a part of the first non-light-emitting region BM1. For example, the third color filter layer CF3' may be disposed in the whole of the first non-light-emitting region BM1. The third color filter layer CF3' may be disposed in at least a part of the fourth non-light-emitting region BM4. For example, the third color filter layer CF3' may be disposed in the whole of the fourth non-light-emitting region BM4.

[0208] The third color filter layer CF3' may be disposed in at least a part of the second non-light-emitting region BM2. For example, the third color filter layer CF3' may be disposed in the whole of the second non-light-emitting region BM2. For example, the third color filter layer CF3' may cover the second color filter layer CF2' that covers the side surface CT1-S of the first color conversion layer CT1. In addition, the third color filter layer CF3' may cover the side surface of the portion of the first color filter layer CF1'' that covers the upper surface CT1-U of the first color conversion layer CT1.

[0209] The third color filter layer CF3' may be disposed in at least a portion of the third non-luminescent region BM3. For example, the third color filter layer CF3' may be disposed in the entire third non-luminescent region BM3. For example, the third color filter layer CF3' may cover the side surface of the portion of the first color filter layer CF1" that covers the side surface CT2-S of the second color conversion layer CT2. Furthermore, the third color filter layer CF3' may cover the side surface of the portion of the second color filter layer CF2' that covers the upper surface CT2-U of the second color conversion layer CT2.

[0210] Figure 17 、 Figure 18 、 Figure 19 、 Figure 20 、 Figure 21 、 Figure 22 and Figure 23 It is manufactured as shown in the picture Figure 15 A cross-sectional view of a method for displaying a device.

[0211] In addition to forming the color filter layer CF", according to Figure 17 、 Figure 18 、 Figure 19 、 Figure 20 、 Figure 21 、 Figure 22 and Figure 23 Another embodiment of the method for manufacturing a display device DD' can be the same as that of the reference Figure 6 、 Figure 7 、 Figure 8 、 Figure 9 、 Figure 10 、 Figure 11 、 Figure 12 、 Figure 13 and Figure 14 The method of manufacturing the display device DD described is substantially the same or similar, and therefore, repeated description may be omitted.

[0212] refer to Figure 17 The first preliminary color filter layer PCF1 may be formed on the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE. For example, the first preliminary color filter layer PCF1 may be formed to cover the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE.

[0213] refer to Figure 17 and Figure 18 , the first color filter layer CF1″ may be formed by removing a portion of the first preliminary color filter layer PCF1. For example, the first color filter layer CF1″ may be formed to cover the first color conversion layer CT1. For example, the first color filter layer CF1″ may be formed to cover the upper surface CT1-U of the first color conversion layer CT1.

[0214] In addition, the first color filter layer CF1” may be formed to cover the second color conversion layer CT2. For example, the first color filter layer CF1” may be formed to cover the side surface CT2-S of the second color conversion layer CT2. In addition, the first color filter layer CF1” may be formed to cover the light-transmitting layer TL. For example, the first color filter layer CF1” may be formed to cover the side surface TL-S of the light-transmitting layer TL.

[0215] Reference Figure 19 , the second preliminary color filter layer PCF2 may be formed on the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE. For example, the second preliminary color filter layer PCF2 may be formed to cover the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, the encapsulation layer TFE, and the first color filter layer CF1”.

[0216] Reference Figure 19 and Figure 20 , the second color filter layer CF2’ may be formed by removing a part of the second preliminary color filter layer PCF2. The second color filter layer CF2’ may be formed to cover the second color conversion layer CT2. For example, the second color filter layer CF2’ may be formed to cover the upper surface CT2-U of the second color conversion layer CT2. For example, the second color filter layer CF2’ may be formed to cover the upper surface of the portion of the first color filter layer CF1” that covers the side surface CT2-S of the second color conversion layer CT2. In addition, the second color filter layer CF2’ may be formed to cover the first color conversion layer CT1. For example, the second color filter layer CF2’ may be formed to cover the side surface CT1-S of the first color conversion layer CT1. In addition, the second color filter layer CF2’ may cover the side surface of the portion of the first color filter layer CF1” that covers the side surface TL-S of the light-transmitting layer TL.

[0217] Reference Figure 21 , the third preliminary color filter layer PCF3 may be formed on the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, and the encapsulation layer TFE. For example, the third preliminary color filter layer PCF3 may be formed to cover the first color conversion layer CT1, the second color conversion layer CT2, the light-transmitting layer TL, the encapsulation layer TFE, the first color filter layer CF1”, and the second color filter layer CF2’.

[0218] Reference Figure 21 and Figure 22, the third color filter layer CF3' can be formed by removing a part of the third preliminary color filter layer PCF3. For example, the third color filter layer CF3' can be formed to cover the light transmissive layer TL. For example, the third color filter layer CF3' can be formed to cover the upper surface TL-U of the light transmissive layer TL. In addition, the third color filter layer CF3' can be formed to cover the upper surface of a part of the side surface TL-S of the light transmissive layer TL that covers the first color filter layer CF1". In addition, the third color filter layer CF3' can be formed to cover the upper surface of a part of the side surface of the second color filter layer CF2' that covers the side surface of the first color filter layer CF1".

[0219] The third color filter layer CF3' can be formed in at least a part of the first non-light emitting region BM1. For example, the third color filter layer CF3' can be formed in the whole of the first non-light emitting region BM1. The third color filter layer CF3' can be formed in at least a part of the fourth non-light emitting region BM4. For example, the third color filter layer CF3' can be formed in the whole of the fourth non-light emitting region BM4.

[0220] The third color filter layer CF3' can be formed in at least a part of the second non-light emitting region BM2. For example, the third color filter layer CF3' can be formed in the whole of the second non-light emitting region BM2. For example, the third color filter layer CF3' can be formed to cover the second color filter layer CF2' that covers the side surface CT1-S of the first color conversion layer CT1. In addition, the third color filter layer CF3' can be formed to cover the side surface of a part of the upper surface CT1-U of the first color conversion layer CT1 that covers the first color filter layer CF1".

[0221] The third color filter layer CF3' can be formed in at least a part of the third non-light emitting region BM3. For example, the third color filter layer CF3' can be formed in the whole of the third non-light emitting region BM3. For example, the third color filter layer CF3' can be formed to cover the side surface of a part of the side surface CT2-S of the second color conversion layer CT2 that covers the first color filter layer CF1". In addition, the third color filter layer CF3' can be formed to cover the side surface of a part of the upper surface CT2-U of the second color conversion layer CT2 that covers the second color filter layer CF2'.

[0222] Reference Figure 23 , the cover layer CPL can be formed on the color filter layer CF". For example, the cover layer CPL can be formed to cover the first color filter layer CF1", the second color filter layer CF2' and the third color filter layer CF3'.

[0223] The present disclosure can be applied to various display devices. For example, the present disclosure is applicable to various display devices such as display devices for vehicles, ships and airplanes, portable communication devices, display devices for exhibitions or information transmission, and medical display devices.

[0224] The above content is an illustration of the embodiments and should not be construed as a limitation of the embodiments. Although several embodiments have been described, those skilled in the art will readily understand that many modifications can be made to the embodiments without substantially departing from the novel teachings and advantages of the present invention. Therefore, all such modifications are intended to be included within the scope of the present invention as defined by the claims. Accordingly, it should be understood that the above content is an illustration of various embodiments and should not be construed as being limited to the specific embodiments disclosed, and modifications to the disclosed embodiments as well as other embodiments are intended to be included within the scope of the claims.

Claims

1. A display device, comprising: A first light-emitting element disposed in a first pixel region; A second light-emitting element disposed in a second pixel region spaced apart from the first pixel region; A first color conversion layer disposed on the first light-emitting element; A second color conversion layer disposed on the second light-emitting element; A first color filter layer covering the first color conversion layer; A second color filter layer covering the second color conversion layer; And A third color filter layer disposed in a first non-light-emitting region between the first pixel region and the second pixel region, Wherein the third color filter layer is configured to selectively transmit color light different from the color light selectively transmitted by the first color conversion layer and the second color conversion layer.

2. The display device according to claim 1, wherein, The first color filter layer covers the upper surface and the side surface of the first color conversion layer.

3. The display device according to claim 1, wherein, The second color filter layer covers the upper surface of the second color conversion layer and extends to at least a part of the first non-light-emitting region.

4. The display device according to any one of claims 1 to 3, further comprising: A third light-emitting element disposed in a third pixel region spaced apart from the first pixel region and the second pixel region; And A light-transmitting layer disposed on the third light-emitting element, Wherein the third color filter layer covers the light-transmitting layer.

5. The display device according to claim 4, wherein, A part of the first color filter layer covers the side surface of the light-transmitting layer.

6. The display device according to claim 5, wherein, The third color filter layer is disposed in a part of the first non-light-emitting region.

7. The display device according to claim 6, wherein The third color filter layer is disposed in at least a part of a second non-light-emitting region between the second pixel region and the third pixel region.

8. The display device according to claim 7, wherein, The third color filter layer is in contact with the side surface of the first color filter layer.

9. The display device according to claim 8, wherein, The third color filter layer covers the upper surface of the part of the side surface of the first color filter layer covering the light-transmitting layer.

10. The display device according to claim 7, wherein, The second color filter layer covers at least a part of the upper surface of the third color filter layer.

11. The display device according to claim 7, wherein, The first color filter layer is disposed in the whole of the first non-light-emitting region.

12. The display device according to claim 11, wherein, The first color filter layer is disposed in the whole of the second non-light-emitting region.

13. The display device according to claim 12, wherein, The first color filter layer is in contact with the side surface of the second color conversion layer.

14. The display device according to claim 1, further comprising: A first low refractive index layer disposed between the first color conversion layer and the first color filter layer; And A second low refractive index layer disposed between the second color conversion layer and the second color filter layer.

15. A display device, comprising: A first light-emitting element disposed in a first pixel region; A second light-emitting element disposed in a second pixel region spaced apart from the first pixel region; A third light-emitting element disposed in a third pixel region spaced apart from the first pixel region and the second pixel region; A first color conversion layer disposed on the first light-emitting element; A second color conversion layer disposed on the second light-emitting element; A light-transmitting layer disposed on the third light-emitting element; A first color filter layer covering the upper surface of the first color conversion layer, the side surface of the second color conversion layer, and the side surface of the light-transmitting layer; A second color filter layer covering a side surface of the first color conversion layer, an upper surface of the second color conversion layer, and the side surface of the light-transmitting layer; and A third color filter layer covering an upper surface of the light-transmitting layer.

16. The display device according to claim 15, wherein, The third color filter layer is further disposed in a first non-light-emitting region between the first pixel region and the second pixel region.

17. The display device according to claim 16, wherein, The third color filter layer covers a portion of the second color filter layer that covers the side surface of the first color conversion layer.

18. The display device according to claim 16, wherein, The third color filter layer is further disposed in a second non-light-emitting region between the second pixel region and the third pixel region.

19. The display device according to claim 18, wherein, The third color filter layer covers a portion of the first color filter layer that covers the side surface of the second color conversion layer.

20. The display device according to claim 19, wherein, The third color filter layer covers a side surface of a portion of the first color filter layer that covers the upper surface of the first color conversion layer and a side surface of a portion of the second color filter layer that covers the upper surface of the second color conversion layer.

21. The display device according to claim 20, wherein, The third color filter layer covers an upper surface of a portion of the first color filter layer that covers the side surface of the light-transmitting layer and an upper surface of a portion of the second color filter layer that covers the side surface of the light-transmitting layer.

22. A method of manufacturing a display device, comprising: Forming a first light-emitting element in a first pixel region; Forming a second light-emitting element in a second pixel region spaced apart from the first pixel region; Forming a third light-emitting element in a third pixel region spaced apart from the first pixel region and the second pixel region; Forming a first color conversion layer on the first light-emitting element; Forming a second color conversion layer on the second light-emitting element; Forming a light-transmitting layer on the third light-emitting element; Forming a first color filter layer covering the first color conversion layer; Forming a second color filter layer covering the second color conversion layer; and Forming a third color filter layer covering the light-transmitting layer and disposed in a first non-light-emitting region between the first pixel region and the second pixel region.

23. The method according to claim 22, wherein The forming of the first color filter layer includes: Forming a first preliminary color filter layer covering the first color conversion layer, the second color conversion layer, and the light-transmitting layer; and Removing a portion of the first preliminary color filter layer to form the first color filter layer covering the side surface of the light-transmitting layer, the upper surface of the first color conversion layer, and the side surface of the first color conversion layer.

24. The method according to claim 22, wherein The forming of the second color filter layer includes: Forming a second preliminary color filter layer covering the first color conversion layer, the second color conversion layer, and the light-transmitting layer; and Removing a portion of the second preliminary color filter layer to form the second color filter layer covering the upper surface of the second color conversion layer.

25. The method according to claim 22, wherein The forming of the third color filter layer includes: Forming a third preliminary color filter layer covering the first color conversion layer, the second color conversion layer, and the light-transmitting layer; and Remove a part of the third preliminary color filter layer to form the third color filter layer covering the light transmissive layer and disposed in the first non-light emitting region between the first pixel region and the second pixel region and the second non-light emitting region between the second pixel region and the third pixel region.

26. The method according to any one of claims 22 to 25, wherein, Perform the formation of the third color filter layer before the formation of the second color filter layer.

Images