Glass cover plate gradient AG etching method
Through the bivariate adjustment of the horizontally moving platform and the etching liquid spray device, combined with positioning protrusions and hydrophobic coating, the high cost and visual corrugation problems of gradient AG etching of glass cover plates under the control of the robotic arm are solved, linear changes in haze and process simplification are achieved, and etching accuracy and consistency are improved.
Patent Information
- Application Number
- CN202510767203.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-10
- Publication Date
- 2025-08-19
AI Technical Summary
In the prior art, the gradient AG etching method of glass cover plate controlled by the robotic arm is expensive, the process control is cumbersome, and there are ripples in the haze transition area, affecting the visual effect.
Using a horizontal moving platform and an etching liquid spray device, a continuous etching liquid curtain is formed by adjusting the movement speed and etching liquid flow. Combining the positioning protrusions and the camera opening positioning, the gradual change of the surface haze of the glass cover plate is controlled, and a hydrophobic nanocoating is used to reduce droplet residue.
A linear continuous change in haze value is achieved, avoiding ripples in haze transition area, simplifying the process flow, reducing costs, and improving the accuracy and consistency of glass cover etching.
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Figure CN120504500A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of glass surface treatment, and in particular to a method for gradually etching a glass cover plate. Background Art
[0002] AG glass cover etching is a process of treating the glass surface through chemical or physical methods to form a specific microstructure. Its main effects are reflected in multiple dimensions such as functionality, user experience and appearance.
[0003] At present, the realization of the gradient AG effect mainly relies on a robotic arm to lift the glass cover plate workpiece in a chemical polishing tank. This method controls the movement trajectory of the robotic arm to make different areas of the glass stay in the etching solution for different times, thereby forming a haze gradient effect. However, this process has obvious shortcomings: the robotic arm is expensive, the process control is cumbersome, and the yield rate is low; at the same time, due to the discontinuous mechanical movement trajectory, ripples will appear in the haze transition area, seriously affecting the visual effect. Therefore, further improvement of the existing etching method is needed. Summary of the Invention
[0004] In order to solve the technical problems existing in the above background technology, the present invention proposes a gradual AG etching method for a glass cover.
[0005] To achieve the above object, the present invention provides the following technical solutions:
[0006] A method for gradually etching a glass cover plate, comprising:
[0007] Place the glass cover in the receiving groove of the jig, and fit the camera opening of the glass cover onto the positioning protrusion of the jig to achieve positioning;
[0008] The jig carrying the glass cover is placed on a horizontal movable platform, and an etching liquid spraying device is arranged above the horizontal movable platform;
[0009] The jig is driven to move horizontally by the horizontal moving platform, and the etching liquid spraying device is started at the same time to continuously spray the etching liquid onto the surface of the glass cover plate below, forming a continuous etching liquid curtain that vertically covers the surface of the glass cover plate downward;
[0010] The etching liquid flows along the inclined surface of the glass cover under the action of gravity, and is guided to the edge of the fixture through the guide surface of the fixture and discharged;
[0011] By adjusting the driving parameters of the horizontal moving platform and the etching liquid flow rate of the etching liquid spray device, the instantaneous speed of different areas on the glass cover plate when they come into contact with the etching liquid curtain along the moving direction is controlled, thereby forming a gradient etching layer with a haze value from high to low on the surface of the glass cover plate.
[0012] Preferably, the bottom surface of the accommodating groove is an inclined surface, the angle between the inclined surface and the horizontal plane is 10°-30°, and the inclination direction is consistent with the moving direction of the horizontal movable platform.
[0013] Preferably, the etching liquid spraying device includes a plurality of independent spraying units arranged along the moving direction of the horizontal movable platform, and the etching liquid flow rate of each independent spraying unit can be adjusted individually to provide differentiated etching liquid flow density to different areas of the glass cover surface along the moving direction.
[0014] Preferably, the “controlling the instantaneous speed of different areas of the surface of the glass cover plate when in contact with the etching liquid curtain along the moving direction” is specifically achieved by:
[0015] When the jig is driven by the horizontal moving platform, the front area of the glass cover plate along the moving direction corresponds to a lower moving speed and / or a higher etching liquid flow rate, so as to obtain a longer etching liquid immersion time and a higher haze value;
[0016] The rear section of the glass cover plate along the moving direction corresponds to a gradually increasing moving speed and / or a gradually decreasing etching liquid flow rate, so as to obtain a gradually shortened etching liquid immersion time and a gradually reduced haze value.
[0017] Preferably, during the spray etching process, the spray pressure of the etching liquid spray device is dynamically adjusted along with the moving speed of the horizontal moving platform, so that the thickness of the etching liquid film acting on the unit area of the glass cover plate remains relatively uniform.
[0018] Preferably, the surface of the guide surface is provided with a hydrophobic nano-coating to reduce the flow resistance of the etching liquid and reduce the residual droplets.
[0019] Preferably, after etching is completed, the surface of the glass cover plate is cleaned in the following steps in sequence:
[0020] Ultrasonic cleaning with organic solvents to remove organic matter remaining from etching;
[0021] Spray deionized water for rinsing, with the water flow direction consistent with the etching solution flow direction;
[0022] Immerse or spray the glass with weak alkaline protective liquid to form a nano-level passivation film on the glass surface.
[0023] Compared with the prior art, the present invention has the following beneficial effects:
[0024] Compared with the existing technology, through the dual variable adjustment of moving speed and etching liquid flow rate, the haze value can be changed linearly and continuously in the moving direction, avoiding the appearance of ripples in the haze transition area due to the discontinuity of the mechanical motion trajectory, and also simplifying the process flow to a certain extent and reducing the cost of use; by matching the positioning protrusion with the camera opening, the glass cover plate can be avoided from being offset due to the impact of the etching liquid curtain; the inclined guide design combined with the hydrophobic coating eliminates the etching marks caused by droplet retention, which can not only effectively improve the service life of the fixture, but also make the surface of the guide surface uniform, so as to ensure the flow uniformity and controllability of the etching liquid on the guide surface, thereby ensuring the accuracy and consistency of the glass cover plate etching process. BRIEF DESCRIPTION OF THE DRAWINGS
[0025] Figure 1 This is a first structural schematic diagram of the glass cover plate gradient AG etching method proposed by the present invention;
[0026] Figure 2 This is a second structural schematic diagram of the glass cover plate gradient AG etching method proposed by the present invention;
[0027] Figure 3 This is a third structural schematic diagram of the glass cover plate gradient AG etching method proposed in the present invention;
[0028] Figure 4 This is a top view of the jig used in the glass cover plate gradient AG etching method proposed by the present invention.
[0029] In the figure: 1- jig, 11- receiving groove, 12- protrusion, 13- guide surface, 2- glass cover, 21- camera opening, 3- horizontal moving platform, 4- spray device, 41- etching liquid curtain, 42- spray unit. DETAILED DESCRIPTION
[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0031] like Figure 1-Figure 4 As shown, this embodiment provides a glass cover plate gradient AG etching method, comprising:
[0032] Place the glass cover plate 2 in the receiving groove 11 of the fixture 1, and fit the camera opening 21 of the glass cover plate 2 onto the positioning protrusion 12 of the fixture 1 to achieve positioning;
[0033] The jig 1 carrying the glass cover plate 2 is placed on a horizontal movable platform 3, and an etching liquid spraying device 4 is arranged above the horizontal movable platform 3;
[0034] The jig 1 is driven to move horizontally by the horizontal moving platform 3, and the etching liquid spraying device 4 is started to continuously spray the etching liquid onto the surface of the glass cover plate 2 below, forming a continuous etching liquid curtain 41 vertically covering the surface of the glass cover plate 2 downward;
[0035] The etching liquid flows along the inclined surface of the glass cover plate 2 under the action of gravity, and is guided to the edge of the jig 1 through the guide surface 13 of the jig 1 and discharged;
[0036] By adjusting the driving parameters of the horizontal moving platform 3 and the etching liquid flow rate of the etching liquid spraying device 4, the instantaneous speed of different areas on the surface of the glass cover plate 2 when contacting the etching liquid curtain 41 along the moving direction is controlled, thereby forming a gradient etching layer with a haze value from high to low on the surface of the glass cover plate 2.
[0037] As a whole, take the glass cover plate 2 and place it in the receiving groove 11 of the jig 1, and make the camera opening 21 of the glass cover plate 2 be sleeved on the positioning protrusion 12 of the jig 1 to complete the positioning of the glass cover plate 2; place the jig 1 carrying the glass cover plate 2 on the horizontal moving platform 3, and drive the jig 1 to move horizontally by the horizontal moving platform 3, and at the same time start the etching liquid spraying device 4 to continuously spray the etching liquid to the surface of the glass cover plate 2 below, forming a continuous etching liquid curtain 41 covering the surface of the glass cover plate 2 vertically downward. The jig 1 moves horizontally, and the etching liquid flows downward along the inclined surface of the glass cover plate 2 under the action of gravity, and is guided to the connecting groove at the edge of the jig 1 through the guide surface 13 of the jig 1, and finally discharged from the flow groove; by adjusting the driving parameters of the horizontal moving platform 3, the horizontal movement speed of the jig 1 is adjusted, and the etching liquid flow rate of the etching liquid spray device 4 can also be adjusted to control the flow rate of the etching liquid in different areas of the surface of the glass cover plate 2, thereby forming a gradient etching layer with a haze value from high to low on the surface of the glass cover plate 2.
[0038] Compared with the existing technology, through the dual variable adjustment of the moving speed and the etching liquid flow rate, the linear and continuous change of the haze value in the moving direction can be achieved, avoiding the appearance of ripples in the haze transition area due to the discontinuity of the mechanical motion trajectory; by matching the positioning protrusion 12 with the camera opening 21, the deviation of the glass cover plate 2 due to the impact of the etching liquid curtain 41 can be avoided.
[0039] like Figure 1-Figure 3 As shown, in this embodiment, the bottom surface of the accommodating groove 11 is an inclined surface, the angle between the inclined surface and the horizontal plane is 10°-30°, and the inclination direction is consistent with the moving direction of the horizontal movable platform 3.
[0040] Specifically, the bottom surface of the accommodating groove 11 is an inclined surface and the angle with the horizontal plane is 10°-30°. The inclination direction of the inclined surface is consistent with the moving direction of the horizontal movable platform 3. A jig 1 with different inclined surface angles can be selected according to the required haze value. The selection of the jig 1 depends on the actual situation and is not limited here.
[0041] Preferably, 15°-25° is used. A jig 1 with an angle of 20° between the inclined surface and the horizontal plane is taken. The glass cover plate 2 is placed in the receiving groove 11 of the jig 1, and the camera opening 21 of the glass cover plate 2 is sleeved on the protrusion 12 of the jig 1. The jig 1 is placed on the horizontal moving platform 3, and the driving parameters of the horizontal moving platform 3 and the nozzle flow rate of the spray device 4 are set to complete the etching process on the surface of the glass cover plate 2.
[0042] like Figure 3 As shown, in this embodiment, the etching liquid spraying device 4 includes a plurality of independent spraying units 42 arranged along the moving direction of the horizontal movable platform 3. The etching liquid flow rate of each independent spraying unit 42 can be adjusted individually to provide differentiated etching liquid flow density to different areas of the surface of the glass cover plate 2 along the moving direction.
[0043] Specifically, the spray device 4 includes a plurality of independent spray units 42 arranged along the moving direction. Each independent spray unit 42 can be individually adjusted to obtain a higher flow density at the front section of the glass cover plate 2, and the flow density at the rear section of the glass cover plate 2 can be gradually reduced or increased according to actual conditions. By adjusting the etching liquid spray flow rate, the instantaneous speed of different areas of the surface of the glass cover plate 2 when contacting the etching liquid curtain 41 along the moving direction is controlled, thereby realizing dual variable adjustment of the moving speed and flow rate, thereby changing the contact time of different areas of the surface of the glass cover plate 2 with the etching liquid, and achieving the effect of controlling the haze gradient.
[0044] like Figure 1-Figure 2 As shown, in this embodiment, the “controlling of the instantaneous speed of different areas of the surface of the glass cover plate 2 when in contact with the etching liquid curtain 41 along the moving direction” is specifically achieved by the following methods:
[0045] When the horizontal moving platform 3 drives the jig 1 to move, the front section of the glass cover plate 2 along the moving direction corresponds to a lower moving speed and / or a higher etching liquid flow rate, so as to obtain a longer etching liquid immersion time and a higher haze value;
[0046] The rear section of the glass cover plate 2 along the moving direction corresponds to a gradually increasing moving speed and / or a gradually decreasing etching liquid flow rate, so as to obtain a gradually shortened etching liquid immersion time and a gradually reduced haze value.
[0047] The instantaneous speed is specifically controlled as follows: the front section of the glass cover plate 2 in the moving direction adopts low-speed movement and / or high-flow spraying, so that the front section of the glass cover plate 2 is in contact with the etching liquid for a longer time to obtain high haze; the speed of the rear section gradually increases and / or the flow rate gradually decreases, so that the rear section of the glass cover plate 2 is in contact with the etching liquid for a shorter time to obtain low haze, thereby achieving the effect of controlling the haze gradient.
[0048] like Figure 1-Figure 3 As shown, in this embodiment, during the spray etching process, the spray pressure of the etching liquid spray device 4 is dynamically adjusted with the moving speed of the horizontal moving platform 3 so that the thickness of the etching liquid film acting on the unit area of the glass cover plate 2 remains relatively uniform.
[0049] Specifically, the pressure of the spray device 4 is dynamically adjusted according to the driving parameters of the horizontal moving platform 3, such as increasing the pressure when the speed increases, so as to ensure the uniformity of the etching liquid film thickness per unit area of the glass cover plate 2, avoid the film thickness deviation per unit area, and improve the yield of the glass cover plate 2.
[0050] like Figure 4 As shown, in this embodiment, the surface of the guide surface 13 is provided with a hydrophobic nano-coating to reduce the flow resistance of the etching liquid and reduce the residual droplets.
[0051] By providing a hydrophobic nano-coating on the surface of the guide surface 13, the etching liquid remaining on the surface of the guide surface 13 can be reduced to eliminate etching marks caused by droplet retention, which can not only effectively improve the service life of the fixture 1, but also make the surface of the guide surface 13 uniform, so as to ensure the uniformity and controllability of the flow of the etching liquid on the guide surface 13, thereby ensuring the accuracy and consistency of the etching process of the glass cover plate 2.
[0052] like Figure 1-Figure 3 As shown, in this embodiment, after etching is completed, the surface of the glass cover plate 2 is sequentially cleaned by the following steps:
[0053] Ultrasonic cleaning with organic solvents to remove organic matter remaining from etching;
[0054] Spray deionized water for rinsing, with the water flow direction consistent with the etching solution flow direction;
[0055] Immerse or spray the glass with weak alkaline protective liquid to form a nano-level passivation film on the glass surface.
[0056] By cleaning the surface of the glass cover plate 2 , organic matter on the surface can be efficiently stripped off to ensure the integrity of the gradient structure.
[0057] Of course, it will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, but also encompasses the same or similar structures that can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the invention is defined by the appended claims, not the foregoing description, and it is intended that all variations that fall within the meaning and range of equivalents of the claims be encompassed within the present invention. Any reference signs in the claims should not be construed as limiting the claim to which they relate.
[0058] In addition, it should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.
[0059] The technology, shape, and structure not described in detail in the present invention are all well-known technologies.
Claims
1. A glass cover plate gradient AG etching method, characterized in that: The following steps are involved: The glass cover plate (2) is placed in the receiving groove (11) of the jig (1), and the camera opening (21) of the glass cover plate (2) is sleeved on the positioning protrusion (12) of the jig (1) to achieve positioning; The jig (1) carrying the glass cover plate (2) is placed on a horizontal movable platform (3), and an etching liquid spraying device (4) is provided above the horizontal movable platform (3); The jig (1) is driven to move in a horizontal direction by a horizontal moving platform (3), and the etching liquid spraying device (4) is started at the same time to continuously spray the etching liquid onto the surface of the glass cover plate (2) below, thereby forming a continuous etching liquid curtain (41) that vertically covers the surface of the glass cover plate (2); The etching liquid flows along the inclined surface of the glass cover plate (2) under the action of gravity, and is guided to the edge of the jig (1) through the guide surface (13) of the jig (1) and discharged; By adjusting the driving parameters of the horizontal moving platform (3) and the etching liquid flow rate of the etching liquid spraying device (4), the instantaneous speed of different areas on the surface of the glass cover plate (2) when in contact with the etching liquid curtain (41) along the moving direction is controlled, thereby forming a gradient etching layer with a haze value from high to low on the surface of the glass cover plate (2).
2. The glass cover plate gradient AG etching method according to claim 1, characterized in that: The bottom surface of the accommodating groove (11) is an inclined surface, the angle between the inclined surface and the horizontal plane is 10°-30°, and the inclination direction is consistent with the moving direction of the horizontal moving platform (3).
3. The glass cover plate gradient AG etching method according to claim 1, characterized in that: The etching liquid spraying device (4) comprises a plurality of independent spraying units (42) arranged along the moving direction of the horizontal moving platform (3), and the etching liquid flow rate of each independent spraying unit (42) can be adjusted individually, so as to provide differentiated etching liquid flow density to different areas of the surface of the glass cover plate (2) along the moving direction.
4. The glass cover plate gradient AG etching method according to claim 1 or 2, characterized in that: The “controlling of the instantaneous speed of different areas of the surface of the glass cover plate (2) when in contact with the etching liquid curtain (41) along the moving direction” is specifically achieved by the following method: In the process of the jig (1) being driven to move by the horizontal moving platform (3), the front section of the glass cover plate (2) along the moving direction corresponds to a lower moving speed and / or a higher etching liquid flow rate, so as to obtain a longer etching liquid immersion time and a higher haze value; The rear section of the glass cover plate (2) along the moving direction corresponds to a gradually increasing moving speed and / or a gradually decreasing etching liquid flow rate, so as to obtain a gradually shortened etching liquid immersion time and a gradually reduced haze value.
5. The glass cover plate gradient AG etching method according to claim 1, characterized in that: During the spray etching process, the spray pressure of the etching liquid spray device (4) is dynamically adjusted along with the moving speed of the horizontal moving platform (3), so that the thickness of the etching liquid film acting on the unit area of the glass cover plate (2) remains relatively uniform.
6. The glass cover plate gradient AG etching method according to claim 1, characterized in that: The surface of the flow guide surface (13) is provided with a hydrophobic nano coating, which is used to reduce the flow resistance of the etching liquid and reduce the residual droplets.
7. The glass cover plate gradient AG etching method according to claim 1, characterized in that: After etching is completed, the surface of the glass cover plate (2) is cleaned in the following steps: Ultrasonic cleaning with organic solvents to remove organic matter remaining from etching; Spray deionized water for rinsing, with the water flow direction consistent with the etching solution flow direction; Immerse or spray the glass with weak alkaline protective liquid to form a nano-level passivation film on the glass surface.