Display substrate, preparation method thereof and display device

Abstract

The invention discloses a display substrate, a preparation method thereof and a display device. A frame area of the display substrate comprises a substrate; the signal wire is arranged on the substrate; the isolation layer surrounds at least part of the display area, the isolation layer is arranged on the side, away from the substrate, of the signal wire, the orthographic projection of the isolation layer on the substrate and at least part of the orthographic projection of the signal wire on the substrate are overlapped, and the isolation layer is configured to isolate a mask used for forming a common layer; the common layer is arranged on the side, away from the substrate, of the isolation layer, and at least part of the orthographic projection, on the substrate, of the edge of the common layer is overlapped with the orthographic projection, on the substrate, of the isolation layer; the distance between the edge of the opening pattern of the mask and the signal line in the direction perpendicular to the substrate is increased.

Description

Technical Field

[0001] The present disclosure relates to, but is not limited to, the field of display technology, and in particular to a display substrate and a preparation method thereof, and a display device. Background Art

[0002] Organic Light Emitting Diodes (OLEDs) and Quantum-dot Light Emitting Diodes (QLEDs) are active light-emitting display devices with advantages such as self-luminescence, wide viewing angles, high contrast, low power consumption, extremely fast response times, thinness, flexibility, and low cost. With the continuous advancement of display technology, displays using OLEDs or QLEDs as light-emitting devices and thin film transistors (TFTs) for signal control have become mainstream products in the display field. Summary of the Invention

[0003] The embodiments of the present application provide a display substrate, a method for manufacturing the same, and a display device, which increase the distance between the edge of the opening pattern of the mask and the signal trace in a direction perpendicular to the substrate.

[0004] An embodiment of the present application provides a display substrate, comprising a display area and a frame area located on at least one side of the display area. The frame area of ​​the display substrate comprises:

[0005] substrate;

[0006] A signal trace is arranged on the substrate;

[0007] an isolation layer surrounding at least a portion of the display area, the isolation layer being disposed on a side of the signal trace away from the substrate, the orthographic projection of the isolation layer on the substrate overlapping at least a portion of the orthographic projection of the signal trace on the substrate, the isolation layer being configured to isolate a mask used to form a common layer;

[0008] The common layer is arranged on a side of the isolation layer away from the substrate, and at least a portion of an orthographic projection of an edge of the common layer on the substrate overlaps with an orthographic projection of the isolation layer on the substrate.

[0009] In an exemplary embodiment, the isolation layer is an integrally formed strip-shaped structure.

[0010] In an exemplary embodiment, the isolation layer includes at least one linear pattern and at least one curved pattern, the at least one linear pattern is arranged corresponding to the edge of the display area, and the at least one curved pattern is arranged corresponding to the corner of the display area. The at least one linear pattern and the at least one curved pattern are arranged at intervals to form a strip structure that surrounds at least part of the display area.

[0011] In an exemplary embodiment, the isolation layer includes at least two block patterns, and the at least two block patterns are arranged at intervals to form a stripe structure surrounding at least a portion of the display area.

[0012] In an exemplary embodiment, the isolation layer has an inverted U-shape.

[0013] In an exemplary embodiment, an orthographic projection of the isolation layer on the substrate overlaps at least partially with an inner contour of an orthographic projection of the signal trace on the substrate.

[0014] In an exemplary embodiment, an orthographic projection of the isolation layer on the substrate is located between an inner contour and an outer contour of an orthographic projection of the signal trace on the substrate.

[0015] In an exemplary embodiment, an orthographic projection of the common layer on the substrate does not overlap with an orthographic projection of the signal trace on the substrate.

[0016] In an exemplary embodiment, at least a portion of an orthographic projection of the common layer on the substrate overlaps with an orthographic projection of the signal trace on the substrate.

[0017] In an exemplary embodiment, the frame region of the display substrate further includes an inorganic insulating layer, and the inorganic insulating layer is disposed between the signal trace and the isolation layer.

[0018] In an exemplary embodiment, the isolation layer is in direct contact with the inorganic insulating layer on one side perpendicular to the substrate direction, and the isolation layer is in direct contact with the common layer on the other side perpendicular to the substrate direction.

[0019] In an exemplary embodiment, the signal trace includes a low-level signal trace.

[0020] An embodiment of the present application further provides a display device, comprising the aforementioned display substrate.

[0021] An embodiment of the present application further provides a method for preparing a display substrate, wherein the display substrate includes a display area and a frame area located on at least one side of the display area. The method for preparing the display substrate includes:

[0022] forming signal traces on the substrate;

[0023] forming an isolation layer on a side of the signal trace away from the substrate, wherein an orthographic projection of the isolation layer on the substrate overlaps at least partially with an orthographic projection of the signal trace on the substrate, and the isolation layer is configured to isolate a mask used to form a common layer;

[0024] A common layer is formed on a side of the isolation layer away from the substrate, and at least a portion of an orthographic projection of an edge of the common layer on the substrate overlaps with an orthographic projection of the isolation layer on the substrate.

[0025] In an exemplary embodiment, forming a common layer on a side of the isolation layer away from the substrate includes:

[0026] Disposing a mask on the isolation layer, wherein the mask is provided with an opening pattern, the opening pattern exposing at least a portion of the display area, and an edge of the opening pattern extending to a side of the isolation layer away from the substrate;

[0027] The common layer is formed on the area exposed by the opening pattern.

[0028] The disclosed embodiment shows that the substrate increases the distance between the edge of the common layer and the signal line in a direction perpendicular to the substrate by setting an isolation layer between the edge of the common layer and the signal line. Therefore, in the process of forming the common layer through the mask, the isolation layer can separate the edge of the opening pattern of the mask from the signal line, increase the distance between the edge of the opening pattern of the mask and the signal line in a direction perpendicular to the substrate, reduce the risk of static electricity generated between the edge of the opening pattern of the mask and the signal line, and prevent the inorganic insulating layer on the signal line from cracking due to static electricity.

[0029] Other features and advantages of the present application will be described in the following description, and in part will become apparent from the description, or will be understood by practicing the present application. Other advantages of the present application can be realized and obtained by the solutions described in the description and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The accompanying drawings are used to provide an understanding of the technical solution of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the technical solution of the present application and do not constitute a limitation on the technical solution of the present application.

[0031] Figure 1 A schematic diagram of a planar structure of a display substrate in the related art;

[0032] Figure 2 A partial enlarged view of a display substrate in the related art;

[0033] Figure 3 A schematic diagram of a cross-sectional structure of a display substrate in the related art;

[0034] Figure 4 A schematic diagram of the planar structure of a display substrate;

[0035] Figure 5 This is a schematic diagram of a planar structure of a display substrate according to an exemplary embodiment of the present disclosure;

[0036] Figure 6 A partially enlarged view of a display substrate according to an exemplary embodiment of the present disclosure;

[0037] Figure 7 A schematic cross-sectional structure diagram of a display substrate according to an exemplary embodiment of the present disclosure;

[0038] Figure 8 This is a schematic diagram of an exemplary embodiment of the present disclosure after forming an isolation layer pattern in a preparation process of a display substrate;

[0039] Figure 9 This is a schematic planar structural diagram of an isolation layer of a display substrate according to an exemplary embodiment of the present disclosure;

[0040] Figure 10 This is a schematic diagram of a display substrate after a mask is set in a preparation process according to an exemplary embodiment of the present disclosure;

[0041] Figure 11 This is a partial enlarged view of a display substrate after a mask is set during the preparation process of an exemplary embodiment of the present disclosure;

[0042] Figure 12 This is a schematic cross-sectional view of a display substrate after a mask is provided in a manufacturing process of the exemplary embodiment of the present disclosure;

[0043] Figure 13 This is a schematic diagram of a planar structure of another display substrate according to an exemplary embodiment of the present disclosure;

[0044] Figure 14 This is a schematic planar structural diagram of an isolation layer of another display substrate according to an exemplary embodiment of the present disclosure;

[0045] Figure 15 This is a schematic diagram of a planar structure of another display substrate according to an exemplary embodiment of the present disclosure;

[0046] Figure 16 This is a schematic diagram of a planar structure of another display substrate according to an exemplary embodiment of the present disclosure;

[0047] Figure 17 A partially enlarged view of another display substrate according to an exemplary embodiment of the present disclosure;

[0048] Figure 18 FIG2 is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure. DETAILED DESCRIPTION

[0049] This application describes multiple embodiments, but this description is exemplary rather than restrictive, and it is obvious to those skilled in the art that there may be more embodiments and implementations within the scope of the embodiments described in this application. Although many possible feature combinations are shown in the drawings and discussed in the detailed description, many other combinations of the disclosed features are also possible. Unless specifically limited, any feature or element of any embodiment may be used in combination with any other feature or element in any other embodiment, or may replace any other feature or element in any other embodiment.

[0050] The present application includes and contemplates combinations of features and elements known to those of ordinary skill in the art. The embodiments, features, and elements disclosed in this application may also be combined with any conventional features or elements to form a unique inventive solution. Any features or elements of any embodiment may also be combined with features or elements from other inventive solutions to form another unique inventive solution. Therefore, it should be understood that any feature shown and / or discussed in this application may be implemented individually or in any appropriate combination. Therefore, except for the limitations made according to the appended claims and their equivalents, the embodiments are not subject to other limitations. In addition, various modifications and changes may be made within the scope of protection of the appended claims.

[0051] In addition, when describing representative embodiments, the specification may have presented the method and / or process as a specific sequence of steps. However, to the extent that the method or process does not rely on the specific order of the steps described herein, the method or process should not be limited to the steps in the specific order described. As will be understood by those skilled in the art, other orders of steps are also possible. Therefore, the specific order of the steps set forth in the specification should not be interpreted as a limitation to the claims. In addition, the claims for the method and / or process should not be limited to performing their steps in the order written, and those skilled in the art can readily understand that these orders can be changed and still remain within the spirit and scope of the embodiments of the present application.

[0052] Figure 1 A schematic diagram of a planar structure of a display substrate in the related art; Figure 2 A partial enlarged view of a display substrate in the related art; Figure 3 Schematic diagram of the cross-sectional structure of the display substrate in the related art. Figure 2 Can be Figure 1 The enlarged image of point a in the middle. Figure 3 Can be Figure 2 A-A' direction cross-sectional view. Figure 1 、 Figure 2 and Figure 3 As shown, the inventors of the present application have discovered through research that, in the preparation process of a display substrate in the related art, a large-area common layer, such as a hole transport layer (HTL), an electron injection layer (EIL) and other light-emitting functional layers, is generally formed on the display area 100' of the display substrate through an open mask (Open Mask) 30'. The edge 30-1' of the opening pattern of the open mask 30' is located in the frame area 200' of the display substrate, thereby ensuring that the opening pattern of the open mask 30' can expose the entire display area 100', so that the formed common layer can cover the entire display area 100'.

[0053] However, due to the narrow frame design of the display substrate, the distance between the edge 30-1' of the opening pattern of the open mask 30' and the inner contour of the signal trace 20' in the frame area 200' is reduced. When the open mask 30' is placed on the display substrate, static electricity will occur between the edge 30-1' of the opening pattern of the open mask 30' and the signal trace 20', causing cracks in the inorganic insulating layer 40' between the edge 30-1' of the opening pattern of the open mask 30' and the signal trace 20', resulting in a GDS short circuit.

[0054] An exemplary embodiment of the present disclosure provides a display substrate, comprising a display area and a frame area located on at least one side of the display area. The display substrate comprises:

[0055] substrate;

[0056] A signal trace is arranged on the substrate;

[0057] an isolation layer surrounding at least a portion of the display area, the isolation layer being disposed on a side of the signal trace away from the substrate, the orthographic projection of the isolation layer on the substrate overlapping at least a portion of the orthographic projection of the signal trace on the substrate, the isolation layer being configured to isolate a mask used to form a common layer;

[0058] The common layer is arranged on a side of the isolation layer away from the substrate, and at least a portion of an orthographic projection of an edge of the common layer on the substrate overlaps with an orthographic projection of the isolation layer on the substrate.

[0059] In an exemplary embodiment, the isolation layer is an integrally formed strip-shaped structure.

[0060] In an exemplary embodiment, the isolation layer includes at least one linear pattern and at least one curved pattern, the at least one linear pattern is located on one side of the edge of the display area, and the at least one curved pattern is located on one side of the corner of the display area. The at least one linear pattern and the at least one curved pattern are arranged at intervals to form a strip structure that surrounds at least part of the display area.

[0061] In an exemplary embodiment, the isolation layer includes at least two block patterns, and the at least two block patterns are arranged at intervals to form a stripe structure surrounding at least a portion of the display area.

[0062] In an exemplary embodiment, the isolation layer has an inverted U-shape.

[0063] Figure 4 FIG. 1 is a schematic diagram of a planar structure of a display substrate. Figure 4 As shown, in a plane parallel to the display substrate, the display substrate may include a display area 100, a binding area 200 located on one side of the display area 100, and a frame area 300 located on the other side of the display area 100. The display area 100 may be a flat area, including a plurality of pixel units arranged in a matrix manner. The pixel unit may include a plurality of sub-pixels Pxij, and the plurality of sub-pixels Pxij may be configured to display dynamic pictures or still images. In a plane perpendicular to the display substrate, each sub-pixel Pxij may include a pixel driving circuit and a light-emitting device. The pixel driving circuit is configured to output a corresponding current to the connected light-emitting device. The light-emitting device is connected to the corresponding pixel driving circuit, and the light-emitting device is configured to emit light of corresponding brightness in response to the current output by the connected pixel driving circuit. Among them, the display area 100 may be referred to as an active area (AA).

[0064] In an exemplary embodiment, the binding area 200 may include a fan-out area, a bending area, a driver chip area, and a binding pin area arranged in sequence along a direction away from the display area 100. The fan-out area is connected to the display area 100 and includes at least a data fan-out line, and a plurality of data fan-out lines are configured to connect the data signal lines of the display area 100 in a fan-out routing manner. The bending area is connected to the fan-out area and is configured to bend the driver chip area and the binding pin area to the back of the display area 100. An integrated circuit (IC) can be set in the driver chip area, and the integrated circuit can be configured to be connected to the plurality of data fan-out lines. The binding pin area may include a binding pad (Bonding Pad), and the binding pad can be configured to be bound and connected to an external flexible printed circuit (FPC).

[0065] The display substrate of this embodiment is described below with reference to some examples.

[0066] Figure 5 This is a schematic diagram of a planar structure of a display substrate according to an exemplary embodiment of the present disclosure; Figure 6 This is a partial enlarged view of a display substrate according to an exemplary embodiment of the present disclosure. Figure 6 Can be Figure 5 The enlarged view of point b in the middle. Figure 5 and Figure 6 As shown, in a direction parallel to the plane of the display substrate, the display substrate of the embodiment of the present disclosure includes a display area 100 and a frame area 300 located on at least one side of the display area 100. In a direction perpendicular to the plane of the display substrate, the display substrate of the embodiment of the present disclosure includes a signal trace 20, an isolation layer 50, and a common layer 60 provided on a substrate. The signal trace 20 is located in the frame area 300, surrounding at least a portion of the display area 100; the common layer 60 is located in the display area 100, and at least a portion of the edge of the common layer 60 extends to the frame area 300. The orthographic projection of the common layer 60 on the substrate does not overlap with the orthographic projection of the signal trace 20 on the substrate, and the signal trace 20 is located on the edge of the common layer 60 away from the display area 100; the isolation layer 50 is a strip-shaped structure, located in the frame area 300, and the isolation layer 50 surrounds at least a portion of the display area 100. Among them, the isolation layer 50 is located between the common layer 60 and the signal trace 20, and the orthographic projection of the isolation layer 50 on the substrate overlaps with the orthographic projections of the signal trace 20 and the common layer 60 on the substrate respectively. The isolation layer 50 separates the common layer 60 from the signal trace 20, and the isolation layer 50 is configured to isolate the mask used to form the common layer 60.

[0067] Figure 7 Schematic diagram of the cross-sectional structure of a display substrate according to an exemplary embodiment of the present disclosure. Figure 7 Can be Figure 6 Cross-sectional view along the B-B' direction. Figure 7As shown, in a direction perpendicular to the plane of the display substrate, the border region of the display substrate of the embodiment of the present disclosure includes a substrate 101, an organic dielectric layer 102 disposed on the substrate 101, a signal trace 20 disposed on the side of the organic dielectric layer 102 away from the substrate 101, an inorganic insulating layer 40 disposed on the side of the signal trace 20 away from the substrate 101, an isolation layer 50 disposed on the side of the inorganic insulating layer 40 away from the substrate 101, and a common layer 60 disposed on the side of the isolation layer 50 away from the substrate 101. The orthographic projection of the portion of the isolation layer 50 away from the display area on the substrate 101 overlaps with the orthographic projection of the signal trace 20 on the substrate 101, the orthographic projection of the portion of the isolation layer 50 close to the display area on the substrate 101 overlaps with the orthographic projection of the common layer 60 on the substrate 101, and the orthographic projection of the edge of the common layer 60 on the substrate 101 overlaps with the orthographic projection of the isolation layer 50 on the substrate 101.

[0068] The disclosed embodiment shows that the substrate increases the distance between the edge of the common layer 60 and the signal trace 20 in a direction perpendicular to the substrate by setting the isolation layer 50 between the edge of the common layer 60 and the signal trace 20. Therefore, in the process of forming the common layer 60 through the mask, the isolation layer 50 can separate the edge of the opening pattern of the mask from the signal trace 20, increase the distance between the edge of the opening pattern of the mask and the signal trace 20 in a direction perpendicular to the substrate, reduce the risk of static electricity generated between the edge of the opening pattern of the mask and the signal trace 20, and prevent the inorganic insulating layer 40 on the signal trace 20 from cracking due to static electricity.

[0069] The following is an illustrative explanation of the preparation process of the common layer of the display substrate. The "patterning process" mentioned in the present disclosure includes deposition of film layers, coating of photoresist on the film layers, mask exposure, development, etching, stripping of photoresist and other processes for metal materials, inorganic materials or transparent conductive materials, and includes coating of organic materials, mask exposure and development and other processes for organic materials. Deposition can be carried out by any one or more of sputtering, evaporation, and chemical vapor deposition, coating can be carried out by any one or more of spraying, spin coating and inkjet printing, and etching can be carried out by any one or more of dry etching and wet etching, and the present disclosure does not limit this. "Thin film" refers to a thin film made by deposition, coating or other processes on a substrate of a certain material. If the "thin film" does not require a patterning process during the entire production process, the "thin film" can also be called a "layer". If the "thin film" requires a patterning process during the entire production process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process contains at least one "pattern". As used in this disclosure, "A and B are disposed in the same layer" means that A and B are formed simultaneously through the same patterning process, and the "thickness" of the film layer refers to the dimension of the film layer in a direction perpendicular to the display substrate. In exemplary embodiments of this disclosure, "the orthographic projection of B is within the range of the orthographic projection of A" or "the orthographic projection of A contains the orthographic projection of B" means that the boundary of the orthographic projection of B falls within the boundary of the orthographic projection of A, or that the boundary of the orthographic projection of A overlaps with the boundary of the orthographic projection of B.

[0070] In an exemplary embodiment, the process of preparing the common layer of the display substrate of this embodiment may include the following operations.

[0071] (1) Forming an isolation layer pattern. In an exemplary embodiment, forming the isolation layer pattern may include: depositing an insulating film on the substrate 101, patterning the insulating film through a patterning process, and forming an isolation layer 50 pattern on the side of the signal trace 20 away from the substrate, such as Figure 8 shown.

[0072] In an exemplary embodiment, the signal traces 20 surround the display area 100 on two opposite sides in a first direction X and on one side in a direction opposite to a second direction Y. The signal traces 20 may include low-level signal traces (VSS) configured to provide low-level signals to sub-pixels of the display area 100. The first direction X intersects the second direction Y, and illustratively, the first direction X is perpendicular to the second direction Y.

[0073] Figure 9 FIG. 1 is a schematic diagram of a planar structure of an isolation layer of a display substrate according to an exemplary embodiment of the present disclosure. Figure 8 and Figure 9As shown, the isolation layer 50 is an integrally formed strip-shaped structure with an inverted U-shaped profile. The isolation layer 50 surrounds the display area 100 on two opposite sides in the first direction X and on one side opposite to the second direction Y. The orthographic projection of the portion of the isolation layer 50 away from the display area 100 on the substrate 101 overlaps with the orthographic projection of the portion of the signal trace 20 on the substrate near the display area 100. The orthographic projection of the isolation layer 50 on the substrate overlaps with the inner contour of the orthographic projection of the signal trace 20 on the substrate. The orthographic projection of the portion of the isolation layer 50 on the side near the display area 100 on the substrate 101 does not overlap with the orthographic projection of the signal trace 20 on the substrate 101. A gap is provided between the edge of the isolation layer 50 on the side near the display area 100 and the edge of the display area 100. Among them, the inner contour of the orthographic projection of the signal trace 20 on the substrate refers to the orthographic projection of the edge of the signal trace 20 on the substrate close to the display area, and the outer contour of the orthographic projection of the signal trace 20 on the substrate refers to the orthographic projection of the edge of the signal trace 20 on the substrate away from the display area.

[0074] In an exemplary embodiment, the isolation layer 50 can be provided on the same layer as the support layer (PS) in the display area 100 and made of the same material and through the same manufacturing process, thereby simplifying the process and reducing costs. The support layer (PS) in the display area 100 is used to support the mask.

[0075] (2) Setting a mask. In an exemplary embodiment, setting a mask may include: on the substrate on which the aforementioned pattern is formed, setting a mask 30 on the side of the isolation layer 50 away from the substrate, the mask 30 being in direct contact with the surface of the isolation layer 50 away from the substrate, and the mask 30 being configured to form a common layer by an evaporation process, such as Figure 10 、 Figure 11 and Figure 12 As shown. Among them, Figure 11 Can be Figure 10 The enlarged image of point c in the middle, Figure 12 Can be Figure 11 Cross-sectional view along the C-C' direction.

[0076] In an exemplary embodiment, the mask 30 may be an open mask. The mask 30 is provided with an opening pattern 30-1, which exposes the display area 100 of the display substrate. The edge of the opening pattern 30-1 extends to the frame area. The edge of the opening pattern 30-1 is located on the side of the isolation layer 50 away from the substrate. At least a portion of the orthographic projection of the edge of the opening pattern 30-1 on the substrate overlaps with the orthographic projection of the isolation layer 50 on the substrate. The orthographic projection of the edge of the opening pattern 30-1 on the substrate is located between the inner and outer contours of the orthographic projection of the isolation layer 50 on the substrate. The orthographic projection of the opening pattern 30-1 on the substrate does not overlap with the orthographic projection of the signal trace 20 on the substrate, and the orthographic projection of the edge of the opening pattern 30-1 on the substrate is located on the side of the orthographic projection of the signal trace 20 on the substrate that is closer to the display area 100. Among them, the inner contour of the orthographic projection of the isolation layer 50 on the substrate refers to the orthographic projection of the edge of the isolation layer 50 on the substrate close to the display area, and the outer contour of the orthographic projection of the isolation layer 50 on the substrate refers to the orthographic projection of the edge of the isolation layer 50 on the substrate away from the display area.

[0077] In an exemplary embodiment, the isolation layer 50 directly contacts the inorganic insulating layer 40 on the signal trace 20 on one side perpendicular to the substrate 101 , and directly contacts the mask 30 on the other side perpendicular to the substrate 101 .

[0078] (3) Forming a common layer pattern. In an exemplary embodiment, forming the isolation layer pattern may include: forming a common layer 60 in the area exposed by the opening pattern 30-1 of the mask 30 by using an evaporation process on the substrate on which the aforementioned pattern is formed; then, removing the mask 30, as shown in FIG. Figure 5 、 Figure 6 and Figure 7 shown.

[0079] In an exemplary embodiment, the common layer 60 is shaped as a rounded rectangle in a direction parallel to the display substrate. The common layer 60 covers the display area 100 of the display substrate, and the edge of the common layer 60 extends to the frame area 300. The edge of the common layer 60 is located on the side of the isolation layer 50 away from the substrate. At least a portion of the orthographic projection of the common layer 60 on the substrate overlaps with the orthographic projection of the isolation layer 50 on the substrate. The orthographic projection of the common layer 60 on the substrate does not overlap with the orthographic projection of the signal trace 20 on the substrate. The orthographic projection of the common layer 60 on the substrate is located on the side of the orthographic projection of the signal trace 20 on the substrate closer to the display area 100.

[0080] In an exemplary embodiment, in a direction perpendicular to the display substrate, the isolation layer 50 is in direct contact with the inorganic insulating layer 40 on the signal trace 20 on one side perpendicular to the substrate direction, and the isolation layer 50 is in direct contact with the common layer 60 on the other side perpendicular to the substrate direction.

[0081] In example embodiments, the common layer 60 may include at least one of a hole injection layer (HIL), a hole transport layer (HTL), an electron blocking layer (EBL), a hole blocking layer (HBL), an electron transport layer (ETL), an electron injection layer (EIL), and a charge generation layer (CGL).

[0082] At this point, the common layer 60 is formed on the substrate.

[0083] The disclosed embodiment shows that the substrate increases the distance between the edge of the common layer 60 and the signal trace 20 in a direction perpendicular to the substrate by setting the isolation layer 50 between the edge of the common layer 60 and the signal trace 20. Therefore, in the process of forming the common layer 60 through the mask, the isolation layer 50 can separate the edge of the opening pattern of the mask from the signal trace 20, increase the distance between the edge of the opening pattern of the mask and the signal trace 20 in a direction perpendicular to the substrate, reduce the risk of static electricity generated between the edge of the opening pattern of the mask and the signal trace 20, and prevent the inorganic insulating layer 40 on the signal trace 20 from cracking due to static electricity.

[0084] Figure 13 FIG. 1 is a schematic diagram of a planar structure of another display substrate according to an exemplary embodiment of the present disclosure. Figure 14 This is a schematic diagram of the planar structure of another isolation layer of a display substrate according to an exemplary embodiment of the present disclosure. Figure 14 The isolation layer shown can be Figure 13 The isolation layer of the display substrate is shown. Figure 13 and Figure 14 As shown, this embodiment shows the main structure of the substrate and Figure 5 The main structure of the display substrate of the illustrated embodiment can be basically the same, except that the isolation layer 50 of the display substrate includes three linear patterns 50-1 and four curved patterns 50-2 that are spaced apart from each other. The linear patterns 50-1 and the curved patterns 50-2 are alternately arranged along the circumference of the display area 100 to form a strip structure surrounding the display area 100 on two opposite sides in the first direction X and on one side of the display area 100 in the opposite direction of the second direction Y. The outline of the strip structure is an inverted U-shape.

[0085] In an exemplary embodiment, the linear pattern 50-1 is linear in shape. One of the three linear patterns 50-1 of the isolation layer 50 is disposed corresponding to an edge of the display area 100 opposite to the second direction Y. The other two of the three linear patterns 50-1 of the isolation layer 50 are disposed corresponding to opposite edges of the display area 100 in the first direction X. The curved pattern 50-2 is arc-shaped. The four curved patterns 50-2 of the isolation layer 50 are disposed corresponding to the four corners of the display area 100.

[0086] The display substrate provided by the embodiment of the present disclosure not only has Figure 5 The technical effect of the embodiment shown is achieved, and the occupied area of ​​the isolation layer 50 is reduced, material is saved, and cost is reduced.

[0087] Figure 15 FIG. 1 is a schematic diagram of another planar structure of a display substrate according to an exemplary embodiment of the present disclosure. Figure 15 As shown, this embodiment shows the main structure of the substrate and Figure 5 The main structure of the display substrate in the illustrated embodiment can be substantially the same, differing in that the isolation layer 50 of the display substrate includes at least two spaced-apart block patterns 50-3. The at least two block patterns 50-3 are spaced apart along the periphery of the display area 100, forming a stripe structure surrounding opposite sides of the display area 100 in the first direction X and one side of the display area 100 opposite to the second direction Y. The stripe structure has an inverted U-shape. The block patterns 50-3 are rectangular in shape.

[0088] The display substrate provided by the embodiment of the present disclosure not only has Figure 5 The technical effect of the embodiment shown is achieved, and the occupied area of ​​the isolation layer 50 is reduced, material is saved, and cost is reduced.

[0089] Figure 16 FIG. 1 is a schematic diagram of another planar structure of a display substrate according to an exemplary embodiment of the present disclosure. Figure 16 As shown, this embodiment shows the main structure of the substrate and Figure 5 The main structure of the display substrate in the illustrated embodiment may be substantially the same, except that the orthographic projection of the isolation layer 50 of the display substrate on the substrate is located between the inner and outer contours of the orthographic projection of the signal trace 20 on the substrate.

[0090] Figure 17 This is a partial enlarged view of another display substrate of an exemplary embodiment of the present disclosure. Figure 18 FIG. 1 is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure. Figure 17 Can be Figure 16 The enlarged image at point d in the middle, Figure 18 Can be Figure 17In the exemplary embodiment, as shown in FIG. Figure 16 、 Figure 17 and Figure 18 As shown, the orthographic projection of the common layer 60 on the substrate overlaps with the orthographic projection of the signal trace 20 on the substrate, and the orthographic projections of the edges of the common layer 60 on the substrate overlap with the orthographic projections of the isolation layer 50 and the signal trace 20 on the substrate, and the orthographic projections of the edges of the common layer 60 on the substrate are located between the outer contour and inner contour of the orthographic projections of the isolation layer 50 and the signal trace 20 on the substrate. The inner contour of the orthographic projection of the isolation layer 50 on the substrate is located within the orthographic projection of the common layer 60 on the substrate, and the outer contour of the orthographic projection of the isolation layer 50 on the substrate is located on the side of the orthographic projection of the edge of the common layer 60 on the substrate away from the display area; the inner contour of the orthographic projection of the signal trace 20 on the substrate is located within the orthographic projection of the common layer 60 on the substrate, and the outer contour of the orthographic projection of the signal trace 20 on the substrate is located on the side of the orthographic projection of the edge of the common layer 60 on the substrate away from the display area, and the outer contour of the orthographic projection of the isolation layer 50 on the substrate is located on the side away from the display area.

[0091] The display substrate provided by the embodiment of the present disclosure not only has Figure 5 The technical effect of the embodiment shown can also reduce the space occupied by the isolation layer 50 between the signal trace 20 and the display area, further reduce the size of the frame area, and achieve a narrow frame.

[0092] The present disclosure also provides a method for preparing a display substrate, for preparing the aforementioned display substrate. The display substrate includes a display area and a frame area located on at least one side of the display area. The method for preparing the display substrate includes:

[0093] forming signal traces on the substrate;

[0094] forming an isolation layer on a side of the signal trace away from the substrate, wherein an orthographic projection of the isolation layer on the substrate overlaps at least partially with an orthographic projection of the signal trace on the substrate, and the isolation layer is configured to isolate a mask used to form a common layer;

[0095] A common layer is formed on a side of the isolation layer away from the substrate, and at least a portion of an orthographic projection of an edge of the common layer on the substrate overlaps with an orthographic projection of the isolation layer on the substrate.

[0096] In an exemplary embodiment, forming a common layer on a side of the isolation layer away from the substrate includes:

[0097] Disposing a mask on the isolation layer, wherein the mask is provided with an opening pattern, the opening pattern exposing at least a portion of the display area, and an edge of the opening pattern extending to a side of the isolation layer away from the substrate;

[0098] The common layer is formed on the area exposed by the opening pattern.

[0099] The present disclosure also provides a display device comprising the display substrate of the aforementioned embodiment. The display device can be any product or component with a display function, such as a mobile phone, tablet computer, television, monitor, laptop computer, digital photo frame, or navigation system.

[0100] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0101] Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be understood to indicate or imply relative importance or to implicitly specify the quantity of the technical features being referred to. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include at least one of the features.

[0102] In the description of the present application, “a plurality of” means at least two, for example, two, three, etc., unless otherwise clearly and specifically defined.

[0103] In this application, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, "connected" can mean fixed connection, detachable connection, or integration; it can mean mechanical connection or electrical connection; it can mean direct connection or indirect connection through an intermediate medium; it can mean internal communication between two elements or interaction between two elements, unless otherwise specified. For those skilled in the art, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0104] In this application, unless otherwise expressly specified or limited, when a first feature is "above" or "below" a second feature, it may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Furthermore, when a first feature is "above," "above," or "above" a second feature, it may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is higher in level than the second feature. When a first feature is "below," "below," or "below" a second feature, it may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature is lower in level than the second feature.

[0105] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in this specification and features of different embodiments or examples without contradiction.

[0106] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application.

Claims

1. A display substrate, characterized in that: The display substrate includes a display area and a frame area located on at least one side of the display area. The frame area of ​​the display substrate includes: substrate; A signal trace is arranged on the substrate; an isolation layer surrounding at least a portion of the display area, the isolation layer being disposed on a side of the signal trace away from the substrate, the orthographic projection of the isolation layer on the substrate overlapping at least a portion of the orthographic projection of the signal trace on the substrate, the isolation layer being configured to isolate a mask used to form a common layer; The common layer is arranged on a side of the isolation layer away from the substrate, and at least a portion of an orthographic projection of an edge of the common layer on the substrate overlaps with an orthographic projection of the isolation layer on the substrate.

2. The display substrate according to claim 1, wherein: The isolation layer is an integrally formed strip structure.

3. The display substrate according to claim 1, wherein The isolation layer includes at least one linear pattern and at least one curved pattern, the at least one linear pattern is arranged corresponding to the edge of the display area, and the at least one curved pattern is arranged corresponding to the corner of the display area. The at least one linear pattern and the at least one curved pattern are arranged at intervals to form a strip structure surrounding at least part of the display area.

4. The display substrate according to claim 1, wherein: The isolation layer includes at least two block patterns, and the at least two block patterns are arranged at intervals to form a strip structure surrounding at least a portion of the display area.

5. The display substrate according to claim 1, wherein The profile of the isolation layer is an inverted U shape.

6. The display substrate according to any one of claims 1 to 5, characterized in that: The orthographic projection of the isolation layer on the substrate overlaps at least partially with the inner contour of the orthographic projection of the signal trace on the substrate.

7. The display substrate according to any one of claims 1 to 5, characterized in that: The orthographic projection of the isolation layer on the substrate is located between the inner contour and the outer contour of the orthographic projection of the signal trace on the substrate.

8. The display substrate according to any one of claims 1 to 5, characterized in that: The orthographic projection of the common layer on the substrate does not overlap with the orthographic projection of the signal trace on the substrate.

9. The display substrate according to any one of claims 1 to 5, characterized in that: At least a portion of an orthographic projection of the common layer on the substrate overlaps with an orthographic projection of the signal trace on the substrate.

10. The display substrate according to any one of claims 1 to 5, characterized in that: The frame area of ​​the display substrate further includes an inorganic insulating layer, and the inorganic insulating layer is arranged between the signal wiring and the isolation layer.

11. The display substrate according to claim 10, wherein: The isolation layer is in direct contact with the inorganic insulating layer on one side perpendicular to the substrate direction, and is in direct contact with the common layer on the other side perpendicular to the substrate direction.

12. The display substrate according to any one of claims 1 to 5, characterized in that: The signal wiring includes a low-level signal wiring.

13. A display device, characterized in that: The display substrate comprises the display substrate according to any one of claims 1 to 12.

14. A method for preparing a display substrate, characterized in that: The display substrate includes a display area and a frame area located on at least one side of the display area. The method for preparing the display substrate includes: forming signal traces on the substrate; forming an isolation layer on a side of the signal trace away from the substrate, wherein an orthographic projection of the isolation layer on the substrate overlaps at least partially with an orthographic projection of the signal trace on the substrate, and the isolation layer is configured to isolate a mask used to form a common layer; A common layer is formed on a side of the isolation layer away from the substrate, and at least a portion of an orthographic projection of an edge of the common layer on the substrate overlaps with an orthographic projection of the isolation layer on the substrate.

15. The method for preparing a display substrate according to claim 14, wherein: A common layer is formed on a side of the isolation layer away from the substrate, comprising: Disposing a mask on the isolation layer, wherein the mask is provided with an opening pattern, the opening pattern exposing at least a portion of the display area, and an edge of the opening pattern extending to a side of the isolation layer away from the substrate; The common layer is formed on the area exposed by the opening pattern.

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