Highly shielding diffusion plate master batch and diffusion plate preparation method using the same

Abstract

The application relates to the technical field of diffusion plate preparation, in particular to a high-shading diffusion plate master batch and a diffusion plate preparation method using the master batch, the master batch comprises the following components in parts by mass: 40-60 parts of polybutylene terephthalate, 20-30 parts of polyethylene terephthalate-1,4-cyclohexane dimethanol, 10-20 parts of unsaturated polyester, 8-10 parts of rutile TiO2, 3-5 parts of nano barium sulfate, 2-4 parts of modified porous silicon microspheres, 0.2-0.5 parts of a light stabilizer, 0.3-0.8 parts of a processing aid, 0.5-1 part of a dispersing agent, and 1-3 parts of a compatilizer. The high-shading diffusion plate master batch provided by the application takes polyester resin as a matrix, combines a multi-scale shading system, can realize accurate regulation and control on the light transmittance of the diffusion plate prepared according to the master batch, and simultaneously, the diffusion plate has excellent mechanical properties. In addition, the master batch is produced by using general equipment, has the advantages of low production cost, high batch stability and the like, and is suitable for the fields of LED lighting, display screens, automobile optical components and the like.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of diffusion plate preparation, in particular to a high-shielding diffusion plate master batch and a diffusion plate preparation method using the master batch. BACKGROUND

[0002] The backlight module of a display device is usually composed of core components such as a light source, a light guide plate, a light reflection plate, a diffusion plate, and a brightness enhancement film. Among them, the light diffusion plate mainly undertakes the functions of light uniformization, shielding of light source bright lines, and supporting of optical film components. The light source layout of the backlight module is mainly divided into two technical routes: direct type and side type. The direct type uses cold cathode tubes or LEDs as light sources arranged in an array on the bottom surface of the light guide plate to achieve direct lighting. The side type arranges the light source along the edge of the light guide plate to achieve overall light emission through side incident light. Although the direct type design has advantages in light source brightness performance, with the evolution of liquid crystal displays and LED televisions towards ultra-thin, the market share of the side type structure is gradually increasing. This development trend has promoted the technical demand for light diffusion plates with high transmittance and high shielding performance.

[0003] In terms of material selection, polystyrene (GPPS) has long been the mainstream substrate for diffusion plates due to its good dimensional stability, thermal stability, light transmittance, and low moisture absorption characteristics. However, its unmodified state has a high transmittance, which can easily lead to the problem of exposed LED light source glare. In recent years, polyester materials have been considered as potential substrates to replace polystyrene due to their excellent comprehensive performance. For example, polybutylene terephthalate (PBT) has a linear molecular chain structure formed by ester bonds, high melting point, low water absorption, strong chemical corrosion resistance, and stress cracking resistance, and shows significant stability during long-term thermal aging. However, the existing technical system has not yet broken through the key bottleneck of PBT resin in the industrialization application of light diffusion plates, and its optical regulation ability and processing adaptability still need to be deeply optimized.

[0004] Therefore, it is necessary to make a diffusion plate that can solve the above-mentioned shortcomings of the diffusion plate, which not only has great environmental significance, but also has high economic value.

[0005] PURPOSE OF THE INVENTION

[0006] In order to overcome the deficiencies in the prior art, the purpose of the present application is to provide a high-shading diffusion plate master batch and a diffusion plate preparation method using the master batch, the master batch comprises the following components by mass fraction: 40-60 parts of polybutylene terephthalate, 20-30 parts of polyethylene terephthalate-1,4-cyclohexane dimethanol, 10-20 parts of unsaturated polyester, 8-10 parts of rutile TiO2, 3-5 parts of nano barium sulfate, 2-4 parts of modified porous silicon microspheres, 0.2-0.5 parts of light stabilizer, 0.3-0.8 parts of processing aid, 0.5-1 parts of dispersant, and 1-3 parts of compatibilizer. The high-shading diffusion plate master batch provided by the present application uses polyester resin as the matrix and combines a multi-scale shading system, which can precisely control the light transmittance of the diffusion plate prepared according to the master batch, and the diffusion plate also has excellent mechanical properties. In addition, the master batch is produced by general equipment, which has the advantages of low production cost, high batch stability, etc., and is suitable for LED lighting, display screens, automotive optical components and other fields.

[0007] In order to achieve the above-mentioned purpose, the present application provides the following technical scheme:

[0008] A high-shading diffusion plate master batch comprises the following components by mass fraction: 40-60 parts of polybutylene terephthalate, 20-30 parts of polyethylene terephthalate-1,4-cyclohexane dimethanol, 10-20 parts of unsaturated polyester, 8-10 parts of rutile TiO2, 3-5 parts of nano barium sulfate, 2-4 parts of modified porous silicon microspheres, 0.2-0.5 parts of light stabilizer, 0.3-0.8 parts of processing aid, 0.5-1 parts of dispersant, and 1-3 parts of compatibilizer.

[0009] Preferably, the modified porous silicon microspheres are prepared by the following steps:

[0010] S11. The silicon powder is sequentially cleaned with acetone, ethanol and deionized water for 15-20 min to remove organic matter and metal impurities on the surface of the silicon powder, and then the silicon powder is immersed in a hydrofluoric acid solution with a concentration of 5-10% at room temperature for 2-3 min and washed with deionized water until neutral;

[0011] S12. The silicon powder treated in step S11 is immersed in an etching solution, and after 30-60 min of water bath reaction at 35-40°C, it is centrifuged, sequentially washed with ethanol and deionized water, and vacuum dried at 60-80°C for 12-15 h to obtain porous silicon powder;

[0012] S13. The porous silicon powder is dispersed in ethanol, 1-3% of polyvinylpyrrolidone is added as a dispersant, and after ultrasonic treatment for 30-40 min, spray drying is performed to obtain porous silicon microspheres;

[0013] S14. The porous silicon microspheres are immersed in a reaction solution, and are stirred magnetically at 60-70℃ for 4-5h. The product is collected by centrifugation, washed with ethanol for 3-4 times, and dried at 80-85℃ under vacuum for 6-7h to obtain the modified porous silicon microspheres.

[0014] Preferably, in step S12, the etching solution is a mixture of hydrofluoric acid with a concentration of 30-40%, nitric acid with a concentration of 50-65%, and deionized water with a mass ratio of 3-4:1-2:6-8.

[0015] In step S13, the working parameters of the spray drying are set as follows: the inlet temperature is 200-220℃, the outlet temperature is 80-100℃, the feeding rate is 5-6 mL / min, and the atomization pressure is 0.3-0.5 MPa.

[0016] In step S14, the reaction solution is a mixture of hydrogen-containing silicone oil and ethanol with a mass ratio of 1-2:9-10.

[0017] Preferably, the particle size of the rutile TiO2 is in the range of 0.2-0.5μm, and the particle size of the nano-barium sulfate is in the range of 50-80nm.

[0018] Preferably, the light stabilizer is further defined as a hindered amine light stabilizer, the processing aid is further defined as a polytetrafluoroethylene processing aid, the dispersing agent is further defined as an organic silicon dispersing agent, and the compatibilizer is further defined as an acrylic acid grafted copolymer.

[0019] Preferably, the high-shielding diffusion plate master batch is prepared by the following steps:

[0020] S21. Raw material premixing: the raw materials are sequentially put into a high-speed mixer and mixed and stirred for 10-20min to obtain a raw material premix;

[0021] S22. Extrusion granulation: the raw material premix is subjected to extrusion granulation by a twin-screw extruder to obtain a high-shielding diffusion plate master batch.

[0022] Preferably, in step S22, the temperature of each zone of the twin-screw extruder is as follows: the first zone is 160-170℃, the second zone is 175-185℃, the third zone is 190-200℃, the fourth zone is 205-215℃, the fifth zone is 200-210℃, the sixth zone is 220-230℃, and the seventh zone is 235-245℃.

[0023] A preparation method of a diffusion plate using the high-shielding diffusion plate master batch, comprising the following steps:

[0024] The high-shielding diffusion plate master batch is put into a twin-screw extruder, and is subjected to melt blending, extrusion, and compression molding to obtain a diffusion plate.

[0025] Preferably, the temperature of each zone of the twin-screw extruder is as follows: the first zone is 170-180 DEG C, the second zone is 185-195 DEG C, the third zone is 200-210 DEG C, the fourth zone is 215-225 DEG C, the fifth zone is 220-230 DEG C, the sixth zone is 235-245 DEG C, and the seventh zone is 240-250 DEG C.

[0026] Preferably, the working parameters of the compression molding are as follows: the die pressure is 5-6 MPa.

[0027] Compared with the prior art, the present application has the following beneficial effects:

[0028] 1. The present application uses a polyester resin system as a matrix, combines with multi-scale scattering particles to construct a composite optical structure, can effectively regulate the light propagation path, and realizes more uniform light distribution effect while reducing the light transmittance. The surface treatment process of the modified porous silicon microspheres enhances the interfacial bonding force with the resin matrix, and cooperates with the synergistic scattering effect of rutile titanium dioxide and nano barium sulfate, to form a multi-level light blocking network, thereby inhibiting the glare of the light source and eliminating the bright line phenomenon.

[0029] 2. The temperature gradient design of the twin-screw extrusion process takes into account the thermal stability of the polyester material and the uniformity of the filler dispersion, to ensure the formation of a stable three-dimensional scattering system inside the masterbatch. The introduction of hindered amine light stabilizer and polytetrafluoroethylene processing aid further optimizes the weather resistance and processing fluidity of the material, so that the diffuser plate maintains stable shielding performance and surface flatness in long-term use. The application of acrylic acid graft copolymer as a compatibilizer promotes the molecular-level combination between organic and inorganic phases, effectively avoids the mechanical property degradation caused by phase separation, so that the scheme can provide a reliable technical path for the development of high-shielding optical devices on the basis of maintaining the inherent heat resistance and moisture resistance of the polyester material. BRIEF DESCRIPTION OF DRAWINGS

[0030] Fig. 1 The preparation process flow chart of the high-shielding diffuser plate masterbatch of the present application is shown in the figure.

[0031] Fig. 2 The preparation process flow chart of the modified porous silicon microspheres of the present application is shown in the figure.

[0032] Fig. 3 The SEM image of the modified porous silicon microspheres of the present application is shown in the figure. DETAILED DESCRIPTION

[0033] The present application will be described in detail below with reference to the embodiments thereof, which are apparently only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all the other embodiments obtained by those skilled in the art without creative efforts fall within the scope of the present application.

[0034] Please refer to Figs. 1-3 The present application provides a technical solution:

[0035] Embodiment 1

[0036] A high-shielding diffusion plate master batch, comprising the following components by mass fraction (the weight of each mass fraction is specified as 100 g):

[0037]

[0038] The polybutylene terephthalate has a brand of Crastin® 6130NC010;

[0039] The polyethylene terephthalate-1,4-cyclohexane dimethanol has a brand of Dynacoll 7150;

[0040] The unsaturated polyester is specifically an m-phenol type unsaturated polyester, and has a brand of Wanqian Chemical TC9508;

[0041] The rutile TiO2 has a particle size of 0.2-0.5 μm, and is specifically a model of ATR312, which is purchased from Songda Chemical (Fujian) Co., Ltd.;

[0042] The nano-barium sulfate has a particle size of 50-80 nm, and is specifically a model of WT-88, which is purchased from Wufeng Weiti Mining Co., Ltd.;

[0043] The light stabilizer is specifically a hindered amine light stabilizer, and is specifically a model of HS-944;

[0044] The processing aid is specifically a polytetrafluoroethylene processing aid, and is specifically a model of DAI-EL DA-310ST;

[0045] The dispersant is specifically an organic silicon dispersant, and is specifically a model of Dowsil™ Q2-3238;

[0046] The compatilizer is an acrylic acid grafted copolymer, and is specifically a model of BYK-P104S;

[0047] The modified porous silicon microspheres are prepared by the following steps:

[0048] S11. The silicon powder is sequentially cleaned with acetone, ethanol and deionized water for 15 min by ultrasonic, and the organic matter and metal impurities on the surface of the silicon powder are removed. The silicon powder is immersed in a hydrofluoric acid solution with a concentration of 5% at room temperature for 2 min, and then washed with deionized water until neutral;

[0049] S12. The silicon powder treated in step S11 is immersed in an etching solution, and after reaction in a water bath at 35℃ for 30 min, centrifuged at 6000 rpm for 10 min, sequentially washed with ethanol and deionized water, and vacuum dried at 60℃ for 12 h to obtain a porous silicon powder;

[0050] S13. 8 parts of the porous silicon powder are dispersed in 100 parts of ethanol according to mass fraction, 1% of polyvinylpyrrolidone based on the total liquid volume is added as a dispersant, and after ultrasonic treatment for 30 min, spray drying is performed to obtain a porous silicon microsphere;

[0051] S14. The porous silicon microsphere is immersed in a reaction solution, and magnetically stirred at 60℃ for 4 h. The product is collected by centrifugation, washed with ethanol for 3 times, and vacuum dried at 80℃ for 6 h to obtain the modified porous silicon microsphere.

[0052] In step S12, the etching solution is a mixture of hydrofluoric acid with a concentration of 30%, nitric acid with a concentration of 50%, and deionized water with a mass ratio of 3.5:1.2:6.3;

[0053] In step S13, the working parameters of the spray drying are set as follows: the inlet temperature is 210℃, the outlet temperature is 80℃, the feeding rate is 5 mL / min, and the atomization pressure is 0.3 MPa;

[0054] In step S14, the reaction solution is a mixture of hydrogen-containing silicone oil and ethanol with a mass ratio of 1.5:9.3;

[0055] The high-shielding diffusion plate master batch is prepared by the following steps:

[0056] S21. Raw material premixing: the raw materials are sequentially put into a high-speed mixer according to mass fraction, and mixed and stirred at 500 rpm for 10 min for premixing to obtain a raw material premix;

[0057] S22. Extrusion granulation: the raw material premix is extruded and granulated by a double-screw extruder to obtain a high-shielding diffusion plate master batch.

[0058] In step S22, the temperature of each zone of the double-screw extruder is as follows: the first zone is 165℃, the second zone is 175℃, the third zone is 195℃, the fourth zone is 205℃, the fifth zone is 210℃, the sixth zone is 220℃, and the seventh zone is 235℃.

[0059] A preparation method of a diffusion plate using the high-shielding diffusion plate master batch, comprising the following steps:

[0060] The high-shielding diffusion plate master batch is put into a double screw extruder, and after melt blending, extrusion and compression molding, a diffusion plate is obtained.

[0061] In the preparation process of the diffusion plate, the temperature of each zone of the double screw extruder is as follows: the first zone is 170℃, the second zone is 185℃, the third zone is 205℃, the fourth zone is 215℃, the fifth zone is 220℃, the sixth zone is 240℃, and the seventh zone is 250℃.

[0062] The working parameters of the compression molding are as follows: the die pressure is 5MPa.

[0063] Example 2: Example 2 and Example 1 have the following differences, the only difference is that in Example 2, the high-shielding diffusion plate master batch comprises the following components by mass fraction:

[0064]

[0065] The remaining steps in Example 2 and Example 1 are exactly the same.

[0066] Example 3: Example 3 and Example 1 have the following differences, the only difference is that in Example 3, the high-shielding diffusion plate master batch comprises the following components by mass fraction:

[0067]

[0068] The remaining steps in Example 3 and Example 1 are exactly the same.

[0069] Example 4: Example 4 and Example 1 have the following differences, the only difference is that in Example 4, the high-shielding diffusion plate master batch comprises the following components by mass fraction:

[0070]

[0071] The remaining steps in Example 4 and Example 1 are exactly the same.

[0072] Comparative Example

[0073] Comparative Example 1: Comparative Example 1 and Example 1 have the following differences, the only difference is that in Comparative Example 1, the use of modified porous silica microspheres is cancelled, and the remaining steps in Comparative Example 1 and Example 1 are exactly the same.

[0074] Comparative Example 2: Comparative Example 2 and Example 1 have the following differences, the only difference is that in Comparative Example 2, the use of rutile TiO2 and nano barium sulfate is cancelled, and the remaining steps in Comparative Example 2 and Example 1 are exactly the same.

[0075] Comparative Example 3: Comparative Example 3 has the following differences from Example 1, the only difference is that in Comparative Example 3, the use of rutile TiO2, modified porous silica microspheres is cancelled, and the rest of the steps are exactly the same in Comparative Example 3 and Example 1.

[0076] Comparative Example 4: Comparative Example 4 has the following differences from Example 1, the only difference is that in Comparative Example 4, the use of nano-barium sulfate, modified porous silica microspheres is cancelled, and the rest of the steps are exactly the same in Comparative Example 4 and Example 1.

[0077] Performance test:

[0078] According to the requirements of GB / T 2410-2008 standard, the light transmittance and haze of the prepared diffusion plate are tested; according to the requirements of GB / T 1040.2-2006 standard, the tensile strength of the prepared diffusion plate is tested; according to the requirements of GB / T 1634.2-2004 standard, the heat deformation temperature of the prepared diffusion plate is tested; according to the requirements of GB / T 2410-2008 standard, the masking uniformity of the prepared diffusion plate is tested, and the test results are as follows:

[0079]

[0080] According to the performance test data of Examples 1-4 and Comparative Example 4, in the performance test of the light diffusion plate, in Examples 1-4, with the gradual increase of the amount of rutile TiO2 (8 parts to 10 parts), nano-barium sulfate (3.5 parts to 5 parts) and modified porous silica microspheres (2 parts to 4 parts), the synergistic effect of micron-level reflection, nano-level filling and porous structure secondary scattering of scattering particles significantly enhances the blocking and diffusion ability of light. The light transmittance gradually decreases from 12.5% to 6.2%, and the haze increases from 98.2% to 99.3%, indicating that the masking performance is continuously optimized with the increase of the proportion of fillers. In contrast, Comparative Example 1 lacks secondary scattering structure due to the absence of porous silica microspheres, and the light transmittance increases to 18.7% and the haze decreases to 92.5%; Comparative Example 2 completely lacks two core scatterers of TiO2 and barium sulfate, and the light transmittance increases to 45.3% and the haze is only 78.0%, fully verifying the necessity of multi-component synergistic scattering. Comparative Examples 3-4 significantly deteriorate the masking performance due to the absence of part of the fillers, which further demonstrates the importance of the integrity of the scattering system.

[0081] The test results of mechanical properties and thermal stability show that the increase of the proportion of fillers has different effects on the material properties. In Example 1 to Example 4, although the increase of the proportion of fillers makes the tensile strength gradually decrease from 68.5 MPa to 64.0 MPa, the thermal stability of the fillers (such as the high-temperature resistance of TiO2 and silica microspheres) significantly improves the heat distortion temperature of the material from 130°C to 138°C. This trend shows that the introduction of fillers significantly enhances the high-temperature applicability of the material while sacrificing part of the mechanical strength. Comparative Example 2 does not add TiO2 and barium sulfate, and the proportion of the resin matrix increases, and the tensile strength reaches a maximum of 72.1 MPa, but its heat distortion temperature is only 125°C, highlighting the key role of fillers in thermal stability. The balance between mechanical and thermal properties provides a basis for the selection of actual application scenarios.

[0082] The test data of shading uniformity (CV value) further reveals the importance of interface optimization process. In Example 1 to Example 4, with the amount of dispersant and compatibilizer increasing from 0.5 parts, 1.1 parts to 1 part, 3 parts respectively, the dispersion uniformity of fillers is significantly improved, and the CV value decreases from 3.2% to 1.8%. This optimization is due to the synergistic effect of acrylic acid grafted copolymer and silicone dispersant: the former enhances the interface bonding between fillers and resin matrix through chemical bonding, and the latter inhibits filler aggregation through physical anchoring, thereby ensuring the consistency of light scattering path. While Comparative Examples 1-4 have incomplete dispersant systems, the CV value increases to 8.7%-15.4%, resulting in uneven light spot distribution.

[0083] The above performance test data strongly prove that the high-shading diffusion plate master batch provided by the present application uses polyester resin as the matrix and combines a multi-scale shading system, which can precisely control the light transmittance of the diffusion plate made according to the master batch, and the diffusion plate also has excellent mechanical properties. In addition, the master batch is produced by general-purpose equipment, has the advantages of low production cost and high batch stability, and is suitable for LED lighting, display screens, automotive optical components and other fields.

[0084] Although embodiments of the present application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the present application, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A high-shielding diffuser masterbatch, characterized in that, The product comprises the following components by weight: 40-60 parts polybutylene terephthalate, 20-30 parts polyethylene terephthalate-1,4-cyclohexanediol ester, 10-20 parts unsaturated polyester, 8-10 parts rutile TiO2, 3-5 parts nano barium sulfate, 2-4 parts modified porous silica microspheres, 0.2-0.5 parts light stabilizer, 0.3-0.8 parts processing aid, 0.5-1 part dispersant, and 1-3 parts compatibilizer; The unsaturated polyester is specifically an isophthalic unsaturated polyester; The rutile TiO2 has a particle size of 0.2-0.5 μm; The nano-barium sulfate has a particle size of 50-80 nm; The modified porous silicon microspheres are prepared by the following steps: S11. Clean the silicon powder with acetone, ethanol and deionized water in sequence for 15-20 minutes to remove organic matter and metal impurities on the surface of the silicon powder. Immerse the silicon powder in a 5-10% hydrofluoric acid solution at room temperature for 2-3 minutes and rinse with deionized water until neutral. S12. Immerse the silicon powder treated in step S11 into the etching solution, react in a water bath at 35-40℃ for 30-60 min, centrifuge, wash with ethanol and deionized water in sequence, and vacuum dry at 60-80℃ for 12-15 h to obtain porous silicon powder. S13. Disperse the porous silicon powder in ethanol, add 1-3% polyvinylpyrrolidone as a dispersant, sonicate for 30-40 min and then spray dry to obtain porous silicon microspheres. S14. Immerse the porous silica microspheres in a reaction solution, wherein the reaction solution is a mixture of hydrogen-containing silicone oil and ethanol in a mass ratio of 1-2:9-10, stir magnetically at 60-70℃ for 4-5 hours, collect the product by centrifugation, wash with ethanol 3-4 times, and vacuum dry at 80-85℃ for 6-7 hours to obtain the modified porous silica microspheres.

2. The high-shielding diffuser masterbatch according to claim 1, characterized in that, In step S12, the etching solution is a mixture of hydrofluoric acid with a concentration of 30-40%, nitric acid with a concentration of 50-65%, and deionized water in a mass ratio of 3-4:1-2:6-8. In step S13, the operating parameters of the spray drying are set as follows: inlet temperature is 200-220℃, outlet temperature is 80-100℃, feed rate is 5-6 mL / min, and atomization pressure is 0.3-0.5 MPa.

3. The high-shielding diffuser masterbatch according to claim 1, characterized in that, The rutile TiO2 has a particle size range of 0.2-0.5 μm; the nano-barium sulfate has a particle size range of 50-80 nm.

4. The high-shielding diffuser masterbatch according to claim 1, characterized in that, The light stabilizer is further defined as a hindered amine light stabilizer; the processing aid is further defined as a polytetrafluoroethylene processing aid; the dispersant is further defined as an organosilicon dispersant; and the compatibilizer is further defined as an acrylic acid graft copolymer.

5. The high-shielding diffuser masterbatch according to claim 1, characterized in that, The high-shielding diffuser masterbatch is prepared through the following steps: S21. Raw material premixing: Add the raw materials in the mass fractions into a high-speed mixer and mix for 10-20 minutes to obtain the raw material premix; S22. Extrusion granulation: The raw material premix is ​​extruded and granulated through a twin-screw extruder to obtain a high-shielding diffuser masterbatch.

6. The high-shielding diffuser masterbatch according to claim 5, characterized in that, In step S22, the temperatures of each zone of the twin-screw extruder are as follows: Zone 1: 160-170℃, Zone 2: 175-185℃, Zone 3: 190-200℃, Zone 4: 205-215℃, Zone 5: 200-210℃, Zone 6: 220-230℃, and Zone 7: 235-245℃.

7. A method for preparing a diffusion plate using the high-shield diffusion plate masterbatch according to any one of claims 1-6, characterized in that, Includes the following steps: The high-shielding diffuser masterbatch is fed into a twin-screw extruder, melt-blended, extruded, and pressed to obtain the diffuser plate.

8. A method for preparing a diffusion plate using the high-shield diffusion plate masterbatch according to claim 7, characterized in that, The temperatures of each zone of the twin-screw extruder are as follows: Zone 1: 170-180℃, Zone 2: 185-195℃, Zone 3: 200-210℃, Zone 4: 215-225℃, Zone 5: 220-230℃, Zone 6: 235-245℃, and Zone 7: 240-250℃.

9. A method for preparing a diffusion plate using the high-shield diffusion plate masterbatch according to claim 7, characterized in that, The working parameters for the printing and molding process are: die head pressure of 5-6 MPa.

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