Display panel, display device and preparation method of display panel

Abstract

According to the display panel, the display device and the preparation method of the display panel, the display panel comprises a first electrode layer and a first pixel definition layer, the first pixel definition layer is located on the side, away from a substrate, of the first electrode layer, the first pixel definition layer comprises a plurality of first openings and second openings, and the first openings and first electrodes are at least partially overlapped; the second opening is not overlapped with the first electrode. The first pixel definition layer comprises the shading material, the minimum included angle between the side wall of the first opening and the plane where the substrate is located is the first included angle theta 11, the minimum included angle between the side wall of the second opening and the plane where the substrate is located is the second included angle theta 12, theta 11-theta 12 is smaller than or equal to 10 degrees, the structure difference between the first opening and the second opening can be reduced, and the display effect is improved. Based on the setting mode, the first opening and the second opening can be formed in the same patterning process, so that the process complexity when the opening is prepared in the first pixel definition layer can be reduced, and the preparation precision when different types of openings are formed in the same patterning process can be improved; and the structural reliability of the first pixel definition layer is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a display panel, a display device and a preparation method of the display panel. BACKGROUND

[0002] In the pixel definition layer of the OLED (Organic Light-Emitting Diode) display panel, multiple openings are included, such as pixel openings that can be used to prepare light-emitting devices, or partition openings that can be used to block the flow between adjacent light-emitting devices. It is found that in the process of preparing multiple openings in the pixel definition layer, the process procedure is complex when multiple openings are prepared, and problems such as discoloration of the pixel definition layer caused by etching to prepare the openings exist, and the performance of the OLED display panel still needs to be improved. SUMMARY

[0003] Therefore, the present application provides a display panel, a display device and a preparation method of the display panel to solve the above problems.

[0004] In a first aspect, an embodiment of the present application provides a display panel, which comprises:

[0005] a substrate;

[0006] a first electrode layer, which is located on one side of the substrate in a direction perpendicular to the plane where the substrate is located, and comprises a plurality of first electrodes;

[0007] a first pixel definition layer, which is located on a side of the first electrode layer away from the substrate, and comprises a plurality of first openings and a plurality of second openings, the first openings at least partially overlap the first electrodes, and the second openings do not overlap the first electrodes;

[0008] wherein the first pixel definition layer comprises a light shielding material, the smallest angle between the sidewall of the first opening and the plane where the substrate is located is a first angle θ11, and the smallest angle between the sidewall of the second opening and the plane where the substrate is located is a second angle θ12;

[0009] wherein |θ11-θ12|≤10°.

[0010] In a second aspect, an embodiment of the present application provides a preparation method of a display panel, which comprises:

[0011] providing a substrate;

[0012] forming a plurality of first electrodes on one side of the substrate;

[0013] forming a first initial pixel definition layer on a side of the first electrode away from the substrate;

[0014] Form a first opening and a second opening in the first initial pixel definition layer through the first full gray mask, to obtain a first pixel definition layer including the first opening and the second opening; the first opening at least partially overlaps the first electrode, and the second opening does not overlap the first electrode; the first opening and the second opening both penetrate the first pixel definition layer;

[0015] The first pixel definition layer includes light shielding material.

[0016] The first pixel definition layer includes light shielding material, a smallest included angle between a sidewall of the first opening and a plane where the substrate is located is a first included angle θ11, and a smallest included angle between a sidewall of the second opening and the plane where the substrate is located is a second included angle θ12.

[0017] |θ11-θ12|≤10°.

[0018] In a third aspect, an embodiment of the present application provides a display device, which includes the display panel provided in the first aspect.

[0019] In the embodiment of the present application, the smallest included angle between the sidewall of the first opening and the plane where the substrate is located is the first included angle θ11, and the smallest included angle between the sidewall of the second opening and the plane where the substrate is located is the second included angle θ12, so that |θ11-θ12|≤10°, which is conducive to reducing the structural difference between the first opening and the second opening. Based on this setting mode, the first opening and the second opening can be formed in the same patterning process, which is conducive to reducing the process complexity when the openings are prepared in the first pixel definition layer, and is conducive to improving the preparation accuracy when different types of openings are formed in the same patterning process, and improving the structural reliability of the first pixel definition layer. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0021] Figure 1 A plane schematic view of a display panel provided by an embodiment of the present application;

[0022] Figure 2 A plane schematic view of a display panel provided by an embodiment of the present application; Figure 1 A partial schematic view of a region E1 in the display panel;

[0023] Figure 3 A plane schematic view of a display panel provided by an embodiment of the present application; Figure 1 A cross-sectional schematic view of the display panel along the direction of A-A';

[0024] Figure 4Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0025] Figure 5 An embodiment provided by the present application Figure 4 A cross-sectional view along the direction of B-B' in the embodiment provided by the present application

[0026] Figure 6 Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0027] Figure 7 Yet another embodiment provided by the present application Figure 6 A cross-sectional view along the direction of C-C' in the embodiment provided by the present application

[0028] Figure 8 Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0029] Figure 9 An embodiment provided by the present application Figure 8 A cross-sectional view along the direction of D-D' in the embodiment provided by the present application

[0030] Figure 10 Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0031] Figure 11 An embodiment provided by the present application Figure 10 A cross-sectional view along the direction of E-E' in the embodiment provided by the present application

[0032] Figure 12 Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0033] Figure 13 Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0034] Figure 14 An embodiment provided by the present application Figure 13 A cross-sectional view along the direction of F-F' in the embodiment provided by the present application

[0035] Figure 15 Yet another embodiment provided by the present application Figure 1 A partial view of the region E1 in the embodiment provided by the present application

[0036] Figure 16 An embodiment provided by the present application Figure 15 A cross-sectional view along the direction of G-G' in the embodiment provided by the present application

[0037] Figure 17 Yet another embodiment provided in the present application Figure 15 A schematic view of a cross section along G-G' in the embodiment provided in the present application;

[0038] Figure 18 Yet another embodiment provided in the present application Figure 15 A schematic view of a cross section along G-G' in the embodiment provided in the present application;

[0039] Figure 19 A flow chart of a preparation method of a display panel provided in the embodiment of the present application;

[0040] Figure 20 A flow chart of a preparation method of a display panel provided in the embodiment of the present application;

[0041] Figure 21 A flow chart of a preparation method of a display panel provided in the embodiment of the present application;

[0042] Figure 22 A flow chart of a preparation method of a display panel provided in the embodiment of the present application;

[0043] Figure 23 A flow chart of a preparation method of a display panel provided in the embodiment of the present application;

[0044] Figure 24 A schematic view of a display device provided in the embodiment of the present application. DETAILED DESCRIPTION

[0045] In order to better understand the technical solutions of the present application, the embodiments of the present application are described in detail below in combination with the drawings.

[0046] It should be clear that the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor, including new embodiments obtained by combining each embodiment mentioned in the present application in the absence of technical conflicts, all belong to the scope of protection of the present application.

[0047] The terms used in the embodiments of the present application are only for the purpose of describing specific embodiments, and are not intended to limit the present application. The singular forms "a", "an" and "the" used in the embodiments of the present application and the appended claims are also intended to include the plural forms, unless the context clearly indicates otherwise.

[0048] It should be understood that the term "and / or" used in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.

[0049] In the description of this specification, it should be understood that the terms "substantially", "approximately", "about", "about", "generally", "largely" used in the claims and embodiments of this application refer to values ​​that can be generally agreed upon within a reasonable range of process operations or tolerances, rather than a precise value.

[0050] It should be understood that although terms such as "first," "second," etc., may be used to describe openings, electrodes, included angles, etc., in the embodiments of this application, these should not be limited to these terms. These terms are only used to distinguish openings, electrodes, included angles, etc., from one another. For example, without departing from the scope of the embodiments of this application, a first opening may also be referred to as a second opening, and similarly, a second opening may also be referred to as a first opening. Through meticulous and in-depth research, the applicant of this application has provided a solution to the problems existing in the prior art.

[0051] Figure 1 This is a plan view of a display panel provided in an embodiment of this application. Figure 2 An embodiment provided in this application Figure 1 A partial schematic diagram of the central region E1. Figure 3 An embodiment provided in this application Figure 1 A cross-sectional view along the A-A' direction.

[0052] This application embodiment provides a display panel 100, combined with... Figure 1 , Figure 2 As shown, the display panel 100 includes a substrate 10. In this embodiment, the display panel 100 is described as an OLED display panel including an OLED (Organic Light-Emitting Diode) light-emitting device.

[0053] Continue to refer to Figure 2 As shown, the display panel 100 further includes a first electrode layer 20. Along a direction perpendicular to the plane of the substrate 10, the first electrode layer 20 is located on one side of the substrate 10 and includes a plurality of first electrodes 201. Optionally, the first electrode 201 is the anode of the light-emitting device, and the first electrode 201 can be used to receive the light-emitting driving current required by the light-emitting device to emit light.

[0054] It should be noted that a driving substrate layer 40 is usually further included between the substrate 10 and the first electrode layer 20 including a plurality of first electrodes 201, and the driving substrate layer 40 can include a pixel circuit T therein, which can be used to generate a light-emitting driving current and is electrically connected with the first electrode 201. Figure 2 The pixel circuit T in FIG. 1 is only schematic, and in an actual pixel circuit T, a plurality of transistors and elements such as a capacitor can be included.

[0055] The display panel 100 further includes a first pixel definition layer 30 located on a side of the first electrode layer 20 away from the substrate 10, and the first pixel definition layer 30 includes a plurality of first openings K1 and second openings K2, the first openings K1 at least partially overlap the first electrodes 201, and the second openings K2 do not overlap the first electrodes 201. The first pixel definition layer 30 can be used to define the boundary of each light-emitting device, control the light-emitting area of the pixel, and ensure that light-emitting devices of different colors do not interfere with each other. Referring to Figure 3 As shown in FIG. 1, the first openings K1 and the second openings K2 both penetrate the first pixel definition layer 30 in a direction perpendicular to the plane on which the substrate 10 is located. The first openings K1 at least partially overlap the first electrodes 201, and the function of the first openings K1 can be to define the light-emitting area of the light-emitting device. The first openings K1 expose the first electrodes 201, and other film layers in the light-emitting device except the first electrodes 201 can at least partially be located in the first openings K1 and can together with the first electrodes 201 form a light-emitting device. The second openings K2 do not overlap the first electrodes 201, and from the function of the openings, the second openings K2 can be openings on the first pixel definition layer 30 for other functions.

[0056] In the preparation of the light-emitting device, if the first electrodes 201 are anodes of the light-emitting device and are used to receive the light-emitting driving current, the first electrodes 201 of the plurality of light-emitting devices can be independent of each other. The common layers of the plurality of light-emitting devices, such as a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer, are prepared by using a common mask, thereby reducing the difficulty and cost of preparation. However, the continuous design of the common layers causes the carrier to migrate laterally between adjacent light-emitting devices, that is, the commonly known problem of leakage current between light-emitting devices, which affects the display effect.

[0057] Therefore, the second opening K2 in this embodiment can be described as a function to reduce leakage current between adjacent light-emitting devices. The function of the second opening K2 in reducing leakage current is reflected in the fact that the second opening K2 does not overlap with the first electrode 201. Therefore, the second opening K2 is an opening distributed among multiple first openings K1. When fabricating the film layer in the light-emitting device other than the first electrode 201, it will pass through the second opening K2. At least part of the film layer in the light-emitting device other than the first electrode 201 is included in the second opening K2. In this way, when the film layer extends, passing through the second opening K2 will lengthen its extension path, thereby reducing the film extension length between adjacent light-emitting devices, reducing the film impedance and leakage current path between adjacent light-emitting devices, and thus reducing the degree of leakage current between adjacent light-emitting devices.

[0058] The first pixel definition layer 30 includes a light-shielding material, which means that the light-emitting devices include structures with low or no light transmittance. The first pixel definition layer 30 can be used to block the metal material between the first pixel definition layer 30 and the substrate 10, reducing the reflectivity of ambient light or other light on the display panel 100. This makes it possible to save on the use of polarizers on the display panel 100. Furthermore, saving on polarizers helps to increase the light transmittance when the light-emitting devices emit light towards the light-emitting surface of the display panel 100, thereby improving the display effect of the display panel 100.

[0059] When different types of openings are prepared on the first pixel definition layer 30, in order to ensure the accuracy of the opening preparation and avoid crosstalk between pixels, different types of openings are prepared separately. However, preparing different types of openings separately on the first pixel definition layer 30, such as preparing the first opening K1 and the second opening K2 separately, increases the process preparation steps and is not conducive to improving the manufacturing efficiency of the display panel.

[0060] In the embodiments of this application, such as Figure 2 As shown, the minimum angle between the sidewall of the first opening K1 and the plane of the substrate 10 is proposed to be the first angle θ11, and the minimum angle between the sidewall of the second opening K2 and the plane of the substrate 10 is proposed to be the second angle θ12, such that |θ11-θ12|≤10°. This is beneficial to reduce the structural difference between the first opening K1 and the second opening K2. Based on this setting, the first opening K1 and the second opening K2 can be formed in the same patterning process, which is beneficial to reduce the process complexity when preparing openings in the first pixel definition layer 30, and also beneficial to improve the preparation accuracy when forming different types of openings in the same patterning process, thereby improving the structural reliability of the first pixel definition layer 30.

[0061] For example, the first pixel definition layer 30 comprises a light-sensitive material, and the patterning process comprises the steps of exposing, developing and curing the initial film layer forming the first pixel definition layer 30. In combination with the above-mentioned first pixel definition layer 30 comprising a light-blocking material, the first pixel definition layer 30 can be a black pixel definition layer. When the patterning process comprising the steps of exposing, developing and curing is used to prepare the first opening K1 and the second opening K2 in the first pixel definition layer 30, if the first pixel definition layer 30 is a light-sensitive material, the corresponding positions of the first pixel definition layer 30 can be directly exposed, and then the first opening K1 and the second opening K2 can be obtained through the subsequent developing and curing technology, which is beneficial to avoid using etching process to prepare the opening in the first pixel definition layer 30, reduce the frequency of using stripping solution to strip the resist protection layer on the surface of the first pixel definition layer 30 in the etching process, and thus avoid the stripping solution for stripping the resist protection layer from contacting the black first pixel definition layer 30, thereby avoiding the aspect of discoloration of the first pixel definition layer 30. In summary, using the exposure process to obtain the opening in the first pixel definition layer 30 is beneficial to avoid damaging the performance of the first pixel definition layer 30 and improve the light-blocking reliability of the first pixel definition layer 30.

[0062] In an embodiment of the present application, |θ11-θ12|≤5° is set, so that the difference between the minimum angle between the sidewall of the first opening K1 and the plane of the substrate 10, which is the first angle θ11, and the minimum angle between the sidewall of the second opening K2 and the plane of the substrate 10, which is the second angle θ12, is further reduced, which is beneficial to further improve the realizability of preparing the first opening K1 and the second opening K2 in the same patterning process and ensure the process precision when the openings are prepared.

[0063] In an embodiment of the present application, the minimum angle between the sidewall of the first opening K1 and the plane of the substrate 10, which is the first angle θ11, is set to be equal to the minimum angle between the sidewall of the second opening K2 and the plane of the substrate 10, which is the second angle θ12, that is, θ11=θ12. This can make the inclination degrees of the sidewalls of the first opening K1 and the second opening K2 be the same, which is beneficial to prepare the first opening K1 and the second opening K2 in the same patterning process and ensure the process precision when the openings are prepared.

[0064] In an embodiment of the present application, θ11=θ12=70° is set.

[0065] In the embodiments of the present application, the first opening K1 is a pixel opening for preparing the light emitting device, and the second opening K2 can be used to block the leakage current between adjacent light emitting devices. In the first opening K1, in the direction perpendicular to the plane where the substrate 10 is located, the light emitting device includes an electron transport layer, a light emitting layer, and a hole transport layer, and the light emitting layer is located between the electron transport layer and the hole transport layer. Electrons generated by the electron transport layer and holes generated by the hole transport layer move towards the light emitting layer, and the electrons and the holes meet in the light emitting layer to excite and generate photons, thereby realizing the light emission of the light emitting device. From the above simple introduction of the light emission process of the light emitting device, the movement of the electrons and the holes in the direction perpendicular to the plane where the substrate 10 is located is the main procedure for realizing the light emission, and the movement of the carriers such as the electrons and the holes in the horizontal direction of the film layer is the main reason for causing the leakage current.

[0066] When the first included angle θ11 between the sidewall of the first opening K1 and the plane where the substrate 10 is located is equal to 70°, on the one hand, the sidewall of the first opening K1 can have a certain slope away from the outer expansion of the first opening K1, so that the sidewall of the first opening K1 is not close to vertical, that is, close to 90°, which is beneficial to increase the opening size of the first opening K1 towards the side of the light emitting surface of the display panel 100, reduce the light shielding degree of the light emitting device, and thereby increase the light emitting area of the light emitting device. It is also beneficial to make the film layer prepared by the whole layer preparation during the preparation of the light emitting device can be prepared on the sidewall of the first opening K1 without being completely accumulated in the first opening K1 due to the too steep slope of the sidewall, thereby avoiding the situation that some film layers which need to be continuously prepared cannot be continuously prepared. For example, the cathode layer of the plurality of light emitting devices can be continuously prepared by the whole layer preparation, which is beneficial to the uniform access of the cathode potential and avoids the complicated procedure when the plurality of cathodes which can use the same potential corresponding to the plurality of light emitting devices are respectively electrically connected by using a plurality of signal ends. On the other hand, when the first included angle θ11 between the sidewall of the first opening K1 and the plane where the substrate 10 is located is equal to 70°, it is beneficial to ensure that the thickness of the film layer prepared on the sidewall with a certain inclination in the first opening K1 is thinner than the thickness of the film layer prepared on the horizontal plane, thereby being beneficial to increase the structural impedance of the film layer between the adjacent light emitting devices, thereby increasing the difficulty of the carrier flow between the adjacent light emitting devices to other light emitting devices and reducing the leakage current.

[0067] Similarly, the second included angle θ12 between the sidewall of the second opening K2 and the plane of the substrate 10 is also equal to 70°, which is conducive to making the second opening K2 as a partition opening in the first pixel definition layer 30 to reduce the leakage current, on the one hand, the sidewall of the first opening K1 is not close to vertical, that is, close to 90°, which is conducive to making the continuous film layer prepared between the adjacent light emitting devices can extend in the second opening K2, thereby extending the extension length of the continuous film layer between the adjacent light emitting devices, thereby reducing the leakage current path of the carrier and reducing the leakage current. And, it is also conducive to preparing a continuous film layer on the sidewall of the second opening K2 without all accumulating in the second opening K2 due to the too steep slope of the sidewall, causing some continuous film layers such as the cathode layer, the electron generation layer, and the hole generation layer to be unable to be continuous. On the other hand, when the second included angle θ12 between the sidewall of the second opening K2 and the plane of the substrate 10 is equal to 70°, it is conducive to ensuring that the thickness of the film layer prepared on the sidewall with a certain inclination in the second opening K2 is thinner than the thickness of the film layer prepared on the horizontal plane, thereby facilitating to increase the structural impedance of the film layer between the adjacent light emitting devices, thereby increasing the difficulty of the carrier flowing to other light emitting devices between the adjacent light emitting devices, and further reducing the leakage current. Therefore, setting the first opening K1 and the second opening K2 with appropriate sizes in the first pixel definition layer 30 is conducive to improving the anti-leakage reliability between the adjacent light emitting devices, avoiding the adjacent light emitting devices from being bright, and improving the light emitting accuracy of the light emitting device. Especially when preparing a series structure light emitting device in the first opening K1 to improve the service life and use efficiency of the light emitting device, the leakage current problem of the series structure light emitting device is particularly obvious, and setting the second opening K2 and the proposed reference structure parameters are conducive to better improving the leakage current.

[0068] It can be understood that the first included angle θ11 and the second included angle θ12 can also be other values according to actual process conditions or product requirements, such as θ11=θ12=60°, 65°, 75°, 80°, and the like, which will not be repeated here.

[0069] Figure 4 Another structure provided by the embodiment of the present application Figure 1 a partial schematic view of the region E1, Figure 5 a structure provided by the embodiment of the present application Figure 4 a schematic view of the cross section along the direction of B-B'.

[0070] In an embodiment of the present application, in combination with Figure 4 , Figure 5 As shown in FIG. 1, the display panel 100 further includes a second pixel definition layer 50 located away from the substrate 10 on the side of the first pixel definition layer 30. The second pixel definition layer 50 includes a plurality of third openings K3 and fourth openings K4.

[0071] Along a direction perpendicular to the plane of substrate 10, the third opening K3 is located within the first opening K1, and the second opening K2 is located within the fourth opening K4. Both the third opening K3 and the fourth opening K4 penetrate the second pixel definition layer 50. Figure 4 As shown, the second pixel defining layer 50 includes at least a portion formed within the first opening K1. The second pixel defining layer 50 is formed within the first opening K1, and its third opening K3 is located within the first opening K1, thus reducing the opening degree of the first opening K1. Optionally, the second pixel defining layer 50 comprises a transparent organic material. Although the second pixel defining layer 50 is formed within the first opening K1, it does not affect the area of ​​the light-emitting device that emits light from the first opening K1. This allows for more flexible setting of the opening structure and size of the first opening K1, reducing the stringency required for forming the first opening K1 in the first pixel defining layer 30. When the first pixel defining layer 30 is a light-shielding material, it can optionally include a black color resist material, making it a black pixel defining layer.

[0072] On the one hand, in related technologies, when fabricating the first opening in the first pixel definition layer, the fabrication precision of the first opening structure is required due to the need to fabricate the light-emitting device. For example, the taper of the first opening can also be expressed as the degree of inclination of the sidewall of the first opening. In order to more accurately modify the taper of the first opening in the first pixel definition layer, a flexible material is added to the black first pixel definition layer to reduce the modification difficulty. However, research has found that after adding a flexible material to the first pixel definition layer, the first pixel definition layer cannot pass the stringent reliability tests such as high temperature and high humidity and sunlight exposure. Furthermore, after thermosetting the first pixel definition layer with added flexible material, the taper of the first opening is still relatively large, which cannot meet the stringent characteristic requirements of the subsequent display panel.

[0073] On the other hand, if the first opening K1 is fabricated on the first pixel definition layer 30 using the patterning process of exposure, development, and curing provided above, a large-angle opening can be created first through the exposure process. Here, the large angle can be expressed as the degree of opening away from the substrate 10. Ensuring that the opening has a certain degree of opening is beneficial for the first opening K1 to ensure that the light-emitting device can emit light smoothly and avoid light blocking caused by the sidewalls of the opening. However, ideally, the first included angle θ11 fabricated by exposure should be 70°, but the actual first included angle θ11 is too large, which is not conducive to improving the light emission effect of the light-emitting device. Therefore, a second pixel definition layer 50 is further added to limit the opening area of ​​the pixel.

[0074] Therefore, in the embodiments of this application, as Figure 5As shown, the second pixel definition layer 50 is prepared on the side of the first pixel definition layer 30 away from the substrate 10, and the third opening K3 in the second pixel definition layer 50 including the transparent organic material can be precisely tapered, which is beneficial to avoid adding flexible material in the first pixel definition layer 30 to meet the need of the opening structure, and improve the reliability of the display panel 100 in the reliability test. The third opening K3 is arranged in the first opening K1, and the inclination of the sidewall of the third opening K3 can be adjusted according to the display requirement of the display panel 100. In addition, the third opening K3 is arranged in the first opening K1, the extension length of the second pixel definition layer 50 from the edge of the first opening K1 to the side away from the edge of the first opening K1 is greater than 2 μm, and the second pixel definition layer 50 surrounds the first opening K1, which can ensure the structural stability of the third opening K3. Thus, when the film layer of the light emitting device is prepared, the continuous film layer will pass through the third opening K3 and partially cover the second pixel definition layer 50, which is beneficial to further extend the film layer length between the adjacent light emitting devices, and the film layer thickness on the sidewall of the third opening K3 can be further reduced by adjusting the inclination of the third opening K3, which further improves the film layer impedance between the adjacent light emitting devices and reduces the leakage current between the adjacent light emitting devices.

[0075] The second opening K2 is arranged in the fourth opening K4, and the second opening K2 does not overlap with the first electrode, and the second opening K2 can not be used to prepare the square light emitting device, and the taper requirement of the second opening K2 in the first pixel definition layer 30 is low, and the second pixel definition layer 50 can not be arranged at the second opening K2. In addition, the second pixel definition layer 50 surrounds the first opening K1, and the surface of the first pixel definition layer 30 at other positions is not provided with the second pixel definition layer 50, which is beneficial to reduce the film layer thickness of the display panel 100.

[0076] In an embodiment of the present application, continuing to refer to Figure 5As shown, the smallest included angle between the sidewall of the third opening K3 and the plane where the substrate 10 is located is a third included angle θ13, θ11> θ13. In combination with the above, it can be known that when the flexible material is not added in the first pixel definition layer 30, it is difficult to adjust the taper of the first opening K1, that is, to modify the first included angle θ11 between the sidewall of the first opening K1 and the substrate 10. It can be understood that the difficulty of directly removing the material at the position of the first opening K1 in the vertical direction or the nearly vertical direction is the smallest, and if the sidewall of the first opening K1 needs to be adjusted to a preset inclination degree, it needs to be modified later. In the embodiment of the present application, since the second pixel definition layer 50 including the transparent organic material is arranged, the difficulty of accurately opening the second pixel definition layer 50 is smaller than that of accurately opening the first pixel definition layer 30. Therefore, the condition that the sidewall of the first opening K1 of the first pixel definition layer 30 can not be modified or slightly modified is provided, and at this time, the first included angle θ11 between the first opening K1 and the substrate 10 can be slightly larger than the ideal angle, which reduces the severity of preparing the first opening K1. When the second pixel definition layer 50 prepares the third opening K3, the sidewall of the third opening K3 is controlled and arranged to meet the slope required for preparing the light emitting device, so as to ensure the continuity of the film layer when preparing the light emitting device.

[0077] In the embodiment of the present application, when the first opening K1 and the third opening K3 are prepared, θ11> θ13 is arranged, which is beneficial to reduce the severity of preparing the first opening K1, and the third opening K3 meets the preparation needs of the light emitting device.

[0078] In an embodiment of the present application, the size of the third included angle θ13 between the sidewall of the third opening K3 and the substrate 10 can be selected to be in the range of 25° ≤ θ13 ≤ 35°, which is beneficial to the sidewall of the third opening K3 having a certain slope to meet the thinning of the film layer located on the sidewall of the third opening K3, improve the film layer impedance between adjacent light emitting devices, and reduce the leakage current; and it is also beneficial to avoid the sidewall of the third opening K3 being too steep, so as to ensure that the continuous film layer can be stably prepared on the sidewall when preparing the light emitting device, and ensure the film layer continuity between the light emitting devices. Preferably, the size of the third included angle θ13 between the sidewall of the third opening K3 and the substrate 10 can be 30°.

[0079] In an embodiment of the present application, continuing to refer to Figure 5 As shown, in the direction perpendicular to the plane where the substrate 10 is located, the thickness of the first pixel definition layer 30 is H1, and the thickness of the second pixel definition layer 50 is H2, H2 ≤ H1. As shown in Figure 5As shown, the thickness H1 of the first pixel definition layer 30 refers to the thickness of the position in the first pixel definition layer 30 that does not overlap with the opening included in the first pixel definition layer 30, and the thickness H2 of the second pixel definition layer 50 refers to the thickness of the position in the second pixel definition layer 50 that does not overlap with the opening included in the second pixel definition layer 50. As can be known from the above embodiment, the second pixel definition layer 50 can be set up to assist the first pixel definition layer 30, and the third opening K3 formed in the second pixel definition layer 50 is used to adjust the accuracy of the opening structure for manufacturing the light emitting device, so as to reduce the strictness in manufacturing the first opening K1. The second pixel definition layer 50 is of a transparent structure, and the thickness thereof can be appropriately reduced, so that H2≤H1, which is beneficial to reduce the degree of increasing the thickness of the display panel 100 in manufacturing the second pixel definition layer 50.

[0080] In an embodiment of the present application, the thickness H1 of the first pixel definition layer 30 and the thickness H2 of the second pixel definition layer 50 can be selected to be in the range of 0.5 μm≤H1≤2 μm and 0.3 μm≤H2≤0.5 μm.

[0081] Figure 6 In another embodiment of the present application, Figure 1 a partial schematic view of the region E1, Figure 7 In another embodiment of the present application, Figure 6 a schematic view of a cross section along the direction C-C'.

[0082] In an embodiment of the present application, in combination with Figure 6 , Figure 7 As shown, the first pixel definition layer 30 further includes a fifth opening K5. At least part of the fifth opening K5 overlaps with the light sensing device 60 in the direction perpendicular to the plane in which the substrate 10 is located, and the fifth opening K5 is located in the fourth opening K4. It should be noted that, as shown in Figure 6 In the second pixel definition layer 50, one fourth opening K4 includes one of the second opening K2 and the fifth opening K5. That is, in manufacturing the second pixel definition layer 50, in addition to retaining the material of the second pixel definition layer 50 located in the first opening K1, the materials of the second pixel definition layer 50 at the positions where the second opening K2 and the fifth opening K5 are formed are removed respectively to obtain the fourth opening K4, so that part of the fourth opening K4 exposes the second opening K2, and part of the fourth opening K4 exposes the fifth opening K5.

[0083] Figure 1The partial area in the area E1 represented by the dashed line overlaps the light sensing device 60. Optionally, the light sensing device 60 includes any one of an ambient light sensor, a fingerprint sensor, or a proximity sensor. For example, the light sensing device 60 can be used to sense the intensity of ambient light, and increase the display brightness of the display panel 100 when the ambient light is bright, so that the user can clearly see the picture; when the ambient light is weak, the display brightness of the display panel 100 is reduced, and the power consumption of the display panel is reduced. When the light sensing device 60 is a fingerprint sensor, the light sensing device 60 can cause the display panel 100 to be unlocked or other corresponding operations according to the received fingerprint reflected light intensity. The design of the fifth opening K5 can meet the photosensitive requirements of the set light sensing device 60.

[0084] Optionally, as shown in Figure 7 , the light sensing device 60 is located on the side of the substrate 10 away from the first pixel definition layer 30, and the light sensing device 60 and the substrate 10 can not be attached. In the direction perpendicular to the plane where the substrate 10 is located, the position of each film layer overlapping the light sensing device 60 needs to be transparent material or needs to be punched when encountering a non-transparent film layer, so as to ensure that the light sensing device 60 can smoothly receive light. Optionally, the substrate 10 includes a transparent material, or the substrate 10 also includes an opening at the position corresponding to the fifth opening K5, so that the fifth opening K5 coincides with the opening on the substrate 10 in the direction perpendicular to the plane where the substrate 10 is located, so as to ensure that the light can pass through the fifth opening K5 and pass through the substrate 10 to reach the light sensing device 60. In the embodiment of the present application, the first pixel definition layer 30 includes a light shielding material, and the substrate 10 includes a transparent material as an example, so the fifth opening K5 is also opened on the first pixel definition layer 30, so that at least part of the fifth opening K5 can be used to transmit the light required by the light sensing device 60.

[0085] Exemplarily, as shown in Figure 7 , the light sensing device 60 is located on the side of the substrate 10 away from the first pixel definition layer 30, and in the process of transmitting light from the fifth opening K5 to the light sensing device 60, the light also passes through the driving substrate layer 40 located between the first pixel definition layer 30 and the substrate 10. The position of the driving substrate layer 40 corresponding to at least the fifth opening K5 includes a transparent structure, and the light transmitted to the light sensing device 60 through the fifth opening K5 can pass through the substrate 10 and the driving substrate layer 40 to smoothly reach the light sensing device 60.

[0086] The minimum angle between the sidewall of the fifth opening K5 and the plane where the substrate 10 is located is a fourth angle θ14, where |θ14-θ11|≤10°, which is conducive to reducing the difference between the fifth opening K5 and the first opening K1 and the second opening K2, so that the fifth opening K5 and the first opening K1 can be prepared in the same patterning process, reducing the process complexity when preparing multiple openings on the first pixel defining layer 30. In addition, θ14>θ13 is also set, and the fifth opening K5 is mainly used for transmitting or reflecting light to the position where the light sensing device 60 is located. Therefore, the fifth opening K5 needs to provide a smooth passage for the transmission or reflection of light. The angle between the sidewall of the fifth opening K5 and the substrate 10 is large, and the minimum angle between the sidewall of the fifth opening K5 and the plane where the substrate 10 is located is the fourth angle θ14, which is closer to 90°. It is conducive to reducing the degree of inclination of the sidewall of the fifth opening K5 to the side away from the fifth opening K5 in the direction parallel to the plane where the substrate 10 is located, so that the fifth opening K5 is a structure close to a straight cylinder, thereby reducing the risk of multiple reflections of light entering the fifth opening K5 when the sidewall is inclined, thereby improving the smoothness of the light transmission in the fifth opening K5, and improving the working stability of the light sensing device 60.

[0087] Figure 8 Another embodiment provided by the present application Figure 1 a partial schematic view of the middle region E1, Figure 9 An embodiment provided by the present application Figure 8 a cross-sectional schematic view along the direction of D-D'.

[0088] In an embodiment of the present application, as Figure 8 shown, the display panel 100 includes a plurality of light emitting devices 70. Exemplarily, the plurality of light emitting devices 70 represented in Figure 8 include a red light emitting device 70A, a green light emitting device 70B, and a blue light emitting device 70C. In combination with Figure 9 shown, the light emitting device 70 proposed by the present application includes:

[0089] The first electrode 201 can be an anode of the light emitting device 70, which is used to receive the light emitting driving current generated by the pixel circuit T on the driving substrate layer 40. The first electrode 201 can be used to generate holes.

[0090] The first light-emitting layer 701 is located on the side of the first electrode 201 away from the substrate 10, and the first light-emitting layer 701 is at least partially located in the first opening K1. It should be noted that, in the preparation of the light-emitting device 70, if the second pixel definition layer 50 is not added, other film layers in contact with the first electrode 201 can be prepared directly in the first opening K1 after the preparation of the first pixel definition layer 30. In the present application, the third opening K3 is prepared in the first opening K1, and the first opening K1 includes the second pixel definition layer 50, so that the preparation of other film layers of the light-emitting device 70 except the first electrode 201 can be carried out after the preparation of the second pixel definition layer 50. The first light-emitting layer 701 is located in the first opening K1 and can receive holes generated from the first electrode 201. It should be noted that the first light-emitting layer 701 includes first sub-light-emitting layers 701A corresponding to the red light-emitting device 70A, the green light-emitting device 70B and the blue light-emitting device 70C, respectively. Different colors of light can be generated in different first sub-light-emitting layers 701A, and the first sub-light-emitting layers 701A in the first light-emitting layer 701 are discontinuous.

[0091] The light-emitting device 70 further includes a charge generation layer 702. In the present application, the light-emitting device 70 is taken as an example of a series light-emitting device, that is, the light-emitting device 70 includes at least two stacked light-emitting layers. The charge generation layer 702 is located on the side of the first light-emitting layer 701 away from the first electrode 201, and the charge generation layer 702 includes an electron generation layer 702A and a hole generation layer 702B. Taking the first electrode 201 as an anode that can generate holes as an example, the electron generation layer 702A in the charge generation layer 702 is located between the hole generation layer 702B and the first light-emitting layer 701. The electron generation layer 702A can be used to generate electrons. The first light-emitting layer 701 is located between the charge generation layer 702 and the first electrode 201, and the first light-emitting layer 701 can simultaneously receive holes from the first electrode 201 and electrons from the electron generation layer 702A. The electrons and holes meet in the first light-emitting layer 701, excite to generate photons, and thus complete the light emission in the first light-emitting layer 701.

[0092] The light emitting device 70 further comprises a second light emitting layer 703, which is located on the side of the charge generating layer 702 away from the first light emitting layer 701. Specifically, the second light emitting layer 703 is located on the side of the hole generating layer 702B away from the first light emitting layer 701, and the hole generating layer 702B can generate holes to provide to the second light emitting layer 703. It should be noted that, similar to the first light emitting layer 701 described above, the second light emitting layer 703 comprises second sub-light emitting layers 703A corresponding to the red light emitting device 70A, the green light emitting device 70B, and the blue light emitting device 70C, respectively. Different materials capable of generating light of different colors are included in different second sub-light emitting layers 703A, and the plurality of second sub-light emitting layers 703A in the second light emitting layer 703 are discontinuous.

[0093] The light emitting device 70 further comprises a second electrode 704, which is located on the side of the second light emitting layer 703 away from the charge generating layer 702. In the scheme proposed in the embodiments of the present application, the second electrode 704 is taken as an example of a cathode, which can be an electrode for providing electrons, and the second light emitting layer 703 can receive electrons from the second electrode 704. The second light emitting layer 703 is located between the hole generating layer 702B and the second electrode 704, and the second light emitting layer 703 can simultaneously receive electrons from the second electrode 704 and holes from the hole generating layer 702B. The electrons and holes meet in the second light emitting layer 703, excite to generate photons, thereby completing the light emission in the second light emitting layer 703.

[0094] In addition, the light emitting device 70 further comprises a first hole transport layer 705, which is located between the first electrode 201 and the first light emitting layer 701, and can be used to transport holes generated by the first electrode 201 to the first light emitting layer 701. The light emitting device 70 further comprises a first electron transport layer 706, which is located between the first light emitting layer 701 and the electron generating layer 702A, and can be used to transport electrons generated by the electron generating layer 702A to the first light emitting layer 701. The light emitting device 70 further comprises a second hole transport layer 707, which is located between the hole generating layer 702B and the second light emitting layer 703, and can be used to transport holes generated by the hole generating layer 702B to the second light emitting layer 703. The light emitting device 70 further comprises a second electron transport layer 708, which is located between the second light emitting layer 703 and the second electrode 704, and can be used to transport electrons generated by the second electrode 704 to the second light emitting layer 703.

[0095] In the embodiments of the present application, the light emitting device 70 is arranged in a series structure comprising the first light emitting layer 701 and the second light emitting layer 703 in a direction perpendicular to the plane in which the substrate 10 is located, which is beneficial to improve the light emitting efficiency of the light emitting device 70 and improve the service life of the light emitting device 70.

[0096] In an embodiment of the present application, the light transmittance of the second pixel definition layer 50 is set to be greater than the light transmittance of the first pixel definition layer 30. As described above, the second pixel definition layer 50 includes a portion located in the first opening K1, and the size of the first opening K1 is the size of the light emitting area of the light emitting device 70. The high light transmittance of the second pixel definition layer 50 is conducive to reducing the degree of light blocking of the second pixel definition layer 50 in the first opening K1, and ensuring that the light emitting area of the first opening K1 remains unchanged.

[0097] Figure 10 In another embodiment of the present application, Figure 1 a partial view of the region E1, Figure 11 In another embodiment of the present application, Figure 10 a cross-sectional view along the direction E-E'.

[0098] In an embodiment of the present application, as shown in Figure 1 The display panel 100 includes a light sensing area A1 and a non-light sensing area A2, and the non-light sensing area A2 is adjacent to the light sensing area A1. As shown in Figure 10 , Figure 11 The first pixel definition layer 30 further includes a plurality of fifth openings K5, and the fifth openings K5 do not overlap the first electrode 201 in the direction perpendicular to the plane on which the substrate 10 is located. The fifth openings K5 are located between adjacent first openings K1 and are not connected to the first openings K1.

[0099] The light sensing area A1 and the non-light sensing area A2 both include the fifth openings K5. In the direction perpendicular to the plane on which the substrate 10 is located, the fifth openings K5 in the light sensing area A1 overlap the light sensing device 60, and the non-light sensing area A2 does not overlap the light sensing device 60. The fifth openings K5 in the light sensing area A1 can be openings for transmitting light used by the light sensing device 60.

[0100] The light sensing area A1 of the display panel 100 is provided with the light sensing device 60, and the non-light sensing area A2 does not include the light sensing device 60. After the fifth openings K5 are opened in the first pixel definition layer 30, at least part of the film layers in the film layers prepared on the side of the first pixel definition layer 30 away from the substrate 10 are continuously prepared as a whole, and the first openings K1 and the fifth openings K5 are not connected. When the film layers of the light emitting device 70 are prepared, the fifth openings K5 also include continuous film layers between adjacent light emitting devices, and the presence of the fifth openings K5 also has the aspect of extending the film length between adjacent light emitting devices 70, which contributes to reducing the leakage current between the light emitting devices 70.

[0101] However, the research finds that when the display panel includes the light sensing area and the non-light sensing area, the related technology usually sets the optical transmission hole with the same function as the fifth opening in the first pixel definition layer corresponding to the light sensing area, and does not set the optical transmission hole in the non-light sensing area because there is no need for optical sensing. This results in that in the light sensing area, there are not only the same type of separation grooves as the second opening in the present application between the adjacent light emitting devices, but also the optical transmission holes for transmitting light. The above two can be used for the effect of preventing leakage. In the non-optical transmission area, there may be only the same type of separation grooves as the second opening in the present application, including the effect of preventing leakage. This results in that the separation structures with the effect of preventing leakage set in the light sensing area and the non-light sensing area are different, thereby causing the difference in the effect of preventing leakage in the light sensing area and the non-light sensing area, and further causing the difference in the display of the display panel, which is not conducive to providing the display uniformity of the display panel.

[0102] In the embodiment of the present application, the fifth opening K5 is arranged in the light sensing area A1 and the non-light sensing area A2, which is conducive to including two types of separation structures with the effect of preventing leakage in the light sensing area A1 and the non-light sensing area A2, thereby reducing the difference in the separation structure with the effect of preventing leakage in the light sensing area A1 and the non-light sensing area A2, reducing the difference in the separation leakage in the light sensing area A1 and the non-light sensing area A2, and improving the display uniformity of the display panel 100.

[0103] In an embodiment of the present application, continuing to refer to Figure 10 The second opening K2 is located between the adjacent first openings K1, and the second opening K2 is not communicated with the first opening K1, which can distinguish the first opening K1 from the second opening K2, ensure that the light emitting device 70 is prepared in the first opening K1, and better distinguish the plurality of light emitting devices 70 and define the light emitting area. The second opening K2 is between the adjacent first openings K1 in the first opening K1, which can realize that the continuous film layer prepared when the light emitting device 70 is prepared is prepared in the second opening K2, so that the film layer extension length between the adjacent first openings K1 can be prolonged, thereby improving the leakage between the light emitting devices 70 in the adjacent first openings K1.

[0104] In an embodiment of the present application, continuing to refer to Figure 10As shown, the second opening K2 includes at least a first sub-opening K21 and a second sub-opening K22 which are in communication, the first sub-opening K21 extends along the first direction X1 and is located between first openings K1 adjacent along the second direction X2, and the second sub-opening K22 extends along the second direction X2 and is located between first openings K1 adjacent along the first direction X1. The first direction X1 and the second direction X2 are crossed and both are parallel to the plane on which the substrate 10 lies. As can be seen from the positions of the first sub-opening K21 and the second sub-opening K22, the plurality of first openings K1 proposed in the embodiments of the present application includes those arranged along the first direction X1 and those arranged along the second direction X2. Adjacent two first openings K1 arranged along the first direction X1 and adjacent two first openings K1 arranged along the second direction X2 can jointly form a rhombic surrounding trend, and the position between the four first openings K1 in the rhombic surrounding trend includes the second opening K2. Thus, as viewed from the entire display panel 100, every four first openings K1 in the rhombic surrounding trend includes a first sub-opening K1 or a second sub-opening K2 which can be arranged between adjacent two first openings K1. When the light emitting device 70 is prepared in the first opening K1, adjacent two first openings K1 can also represent adjacent two light emitting devices 70, and the first sub-opening K1 and the second sub-opening K2 can both serve as a partition structure for reducing the leakage current between adjacent two light emitting devices 70.

[0105] Exemplarily, the arrangement mode of the plurality of first openings K1 in the display panel 100 is as shown in Figure 10 As shown, the plurality of first openings K1 are arranged in an array along the first direction X1 and the second direction X2. In the embodiments of the present application, the first direction X1 is taken as a direction pointing to 45°, and the second direction X2 is taken as a direction pointing to 135°, for example, so that two first openings K1 adjacent along the first direction X1 and two first openings K1 adjacent along the second direction X2 jointly form a rhombic surrounding trend. Continuing to refer to Figure 11 As shown, the four first openings K1 in the rhombic surrounding trend form a first opening group K1A, and in the first opening group K1A: two pairs of first openings K1 adjacent along the first direction X1 can be divided, and then one second sub-opening K22 extending along the second direction X2 can be arranged between the two pairs of first openings K1 adjacent along the first direction X1; two pairs of first openings K1 adjacent along the second direction X2 can also be divided, and then one first sub-opening K21 extending along the first direction X1 can be arranged between the two pairs of first openings K1 adjacent along the second direction X2. Thus, four sub-openings can be arranged between the first opening group K1A, and the four sub-openings are in communication at the intersection of the extending directions and jointly form a second opening K2.

[0106] The light emitting device 70 needs to be prepared in the first opening K1 of the display panel 100. Taking the display panel 100 including the red light emitting device 70A, the green light emitting device 70B and the blue light emitting device 70C as an example, the arrangement of the light emitting device 70 is described with reference to Figure 10 As shown in the figure, an arrangement of the light emitting device 70 of different colors is exemplarily proposed, and the arrangement of the light emitting device 70 in the region E1 is used to show the arrangement of the light emitting device 70 in the display panel 100. The light emitting device 70 includes a first group of light emitting device 70AA including the red light emitting device 70A and the green light emitting device 70B arranged alternately along the first direction X1, and a second group of light emitting device 70AB including the blue light emitting device 70C and the green light emitting device 70B arranged alternately along the first direction X1. The first group of light emitting device 70AA and the second group of light emitting device 70AB are arranged alternately along the second direction X2 on the display panel 100. It should be noted that the region E1 is a rectangular region, and the red light emitting device 70A is arranged at the four corners of the region E1 according to the arrangement sequence of the light emitting device 70.

[0107] Figure 12 Another arrangement of the light emitting device 70 is provided in the embodiment of the present application. Figure 1 A partial view of the region E1 is shown in the figure.

[0108] In one embodiment of the present application, as shown in the figure, the fifth opening K5 is located at the intersection of the first sub-opening K21 and the second sub-opening K22 in the second opening K2, and the fifth opening K5 is in communication with the second opening K2. Figure 12

[0109] The second opening K2 is arranged between the first group of openings K1A, and the second opening K2 includes a cross-shaped structure composed of the first sub-opening K21 and the second sub-opening K22. The four sub-openings are arranged to intersect at a position close to the center between the first group of openings K1A.

[0110] ​In this embodiment, the fifth opening K5 is located at the intersection of the first sub-opening K21 and the second sub-opening K22 in the second opening K2, and is connected to the second opening K2. That is, within the photosensitive area A1, the intersection of the second opening K2 can be reused as the fifth opening K5 for transmitting the light required by the photosensitive device 60. During the fabrication of the second opening K2 and the fifth opening K5, at least a portion of the fifth opening K5 can be fabricated simultaneously with the second opening K2, which helps reduce the complexity of opening fabrication. Furthermore, positioning the fifth opening K5 at the intersection of the first sub-opening K21 and the second sub-opening K22 allows it to be located relatively close to the center among a group of first openings K1A. This location has sufficient space and is a certain distance from multiple light-emitting devices 70, which helps improve the stability and anti-interference capability of light transmission within the fifth opening K5.

[0111] In one embodiment of this application, the orthographic projection shape of the fifth opening K5 onto the substrate 10 is one of a square, a circle, or a polygon. For example, continuing to refer to... Figure 12 As shown, the orthographic projection of the fifth opening K5 onto the substrate 10 is circular. And... Figure 12 The diagram also illustrates the light-emitting device 70 fabricated in the first opening K1. Figure 12 The arrangement of the different colored light-emitting devices 70 shown in the figure is similar to... Figure 10 The different colored light-emitting devices 70 shown in the figure are arranged in the same way.

[0112] It should be noted that in the embodiments of this application, the second opening K2 and the fifth opening K5 in the light-sensing area A1 and the non-light-sensing area A2 have the same shape and structure and are in the same relative position, which is beneficial to improve the difference in the partition structure in the light-sensing area A1 and the non-light-sensing area A2 and improve the display uniformity of the display panel 100.

[0113] In one embodiment of this application, reference continues to be made to... Figure 10 As shown, the fifth opening K5 is not connected to the second opening K2. In this embodiment, the preparation method of the first sub-opening K21 and the second sub-opening K22 in the second opening K2 remains unchanged. When preparing the fifth opening K5, the fifth opening K5 and the second opening K2 can be prepared separately. The fifth opening K5 can be flexibly prepared at a position that is not connected to the second opening K2 as needed. For example, as... Figure 10 As shown, the fifth opening K5 can be fabricated in the region between adjacent light-emitting devices 70.

[0114] In one embodiment of this application, reference continues to be made to... Figure 10As shown, in the plane parallel to the plane where the substrate 10 is located, the width of the first sub-opening K21 in the direction perpendicular to the first direction X1 is W1; in the direction parallel to the plane where the substrate 10 is located, the width of the second sub-opening K22 in the direction perpendicular to the second direction X2 is also W1, and the width W1 can be set in the range of 5 μm≤W1≤10 μm. The size of the first sub-opening K21 and the second sub-opening K22 can be guaranteed to have the effect of preventing flow leakage, and a certain width is conducive to realizing the flow leveling when the encapsulation layer far away from the substrate 10 of the light emitting device 70 is prepared subsequently, especially for the relatively thick IJP (Ink Jet Printing) encapsulation layer prepared by using the inkjet printing process in the encapsulation layer. If the IJP encapsulation layer is easy to realize flow leveling, it is conducive to reducing the film thickness of the IJP encapsulation layer that needs to be prepared, and overall, it is conducive to reducing the thickness of the entire encapsulation layer. Further, when the black matrix layer BM layer is prepared on the surface of the encapsulation layer far away from the substrate 10, it is conducive to reducing the distance between the black matrix layer BM and the first opening K1 as the pixel opening. The closer the black matrix layer BM is to the first opening K1, the smaller the opening size of the black matrix layer BM that needs to be prepared, which is conducive to using the black matrix layer BM to better shield the position between adjacent light emitting devices 70, thereby improving the effect of the black matrix layer BM on reducing light reflection. Moreover, the closer the black matrix layer BM is to the first opening K1, the greater the angle of the emitted light that can be shielded by the black matrix layer BM, which is conducive to reducing the angle range of the black matrix layer BM on the shielding of the emitted light, and further conducive to improving the viewing angle range when viewing the display panel 100.

[0115] Figure 13 Yet another embodiment provided by the present application Figure 1 a partial schematic view of the region E1, Figure 14 An embodiment provided by the present application Figure 13 a cross-sectional schematic view along F-F'.

[0116] In an embodiment of the present application, in combination with Figure 13 , Figure 14 As shown, the display panel 100 further includes a second pixel definition layer 50, and the second pixel definition layer 50 is located on the side of the first pixel definition layer 30 far away from the substrate 10. Among them, the first opening K1, the second opening K2 and the fifth opening K5 all include the second pixel definition layer 50, and the second pixel definition layer 50 includes a transparent material.

[0117] It should be noted that, similar to the embodiment where the display panel 100 includes a second pixel definition layer 50, the second pixel definition layer 50 proposed in this application embodiment also includes a third opening K3, which is located within the first opening K1. The sidewall of the third opening K3 can be used to modify the taper of the first opening K1. Unlike the above embodiment, the second pixel definition layer 50 in this application embodiment also includes portions formed within the second opening K2 and the fifth opening K5. Optionally, the portion of the second pixel definition layer 50 within the second opening K2 is a continuous planar structure, and the portion of the second pixel definition layer 50 within the fifth opening K5 is also a continuous planar structure.

[0118] The first pixel definition layer 30 has a certain thickness to distinguish multiple light-emitting devices 70, therefore the openings penetrating through the first pixel definition layer 30 have a certain depth. For example... Figure 14 As shown, the display panel 100 also includes an encapsulation layer F1, which is located on the side of the light-emitting device 70 away from the substrate 10. This application embodiment... Figure 14 The diagram further illustrates the encapsulation layer F1 and the black matrix layer BM. After the light-emitting device 70 is fabricated, a certain indentation exists at the location including the opening. An encapsulation layer is needed to planarize the surface of the light-emitting device 70 away from the substrate 10, and the encapsulation layer F1 can protect the light-emitting device 70. When fabricating the encapsulation layer F1, if the encapsulation layer F1 can be easily leveled, the required thickness of the encapsulation layer F1 can be reduced, especially for the relatively thick IJP (Ink Jet Printing) encapsulation layer fabricated using inkjet printing. The IJP encapsulation layer has a large thickness in the entire encapsulation layer; if the IJP encapsulation layer can be easily leveled, it is beneficial to reduce the required film thickness of the IJP encapsulation layer, which overall helps to reduce the thickness of the entire encapsulation layer F1. Furthermore, when fabricating the black matrix layer BM on the surface of the encapsulation layer away from the substrate 10, it is beneficial to reduce the distance between the black matrix layer BM and the first opening K1, which serves as the pixel opening. The closer the black matrix layer BM is to the first opening K1, the smaller the opening size of the black matrix layer BM needs to be. This is beneficial for the black matrix layer BM to better block the position between adjacent light-emitting devices 70, thereby improving the effect of the black matrix layer BM in reducing light reflection. Moreover, the closer the black matrix layer BM is to the first opening K1, the larger the angle of the emitted light that the black matrix layer BM can block. This is beneficial for reducing the angle range of the emitted light blocked by the black matrix layer BM, and thus improving the viewing angle range when viewing the display panel 100.

[0119] In the embodiment of the present application, the taper of the first opening K1 is modified by the second pixel definition layer 50, and the second pixel definition layer 50 is also prepared in the second opening K2 and the fifth opening K5, so that the second opening K2 and the fifth opening K5 are pre-filled by the second pixel definition layer 50, which is beneficial to appropriately reduce the degree of concave on the side of the light-emitting device 70 away from the substrate 10 after the preparation of the light-emitting device 70, so that the horizontal flow is more easily realized when the IJP encapsulation layer is prepared, the thickness of the IJP encapsulation layer to be prepared is reduced, the need of the IJP encapsulation layer to be thinned by the black matrix layer BM is met, and the reflectivity of the display panel 100 is reduced and the viewing angle range of the display panel 100 is improved.

[0120] In one embodiment of the present application, continuing to refer to Figure 13 As shown in the figure, the two adjacent second openings K2 on the display panel 100 are not connected, which is beneficial to avoid forming a continuous partition structure between the first openings K1, so that the continuous film layer prepared when the light-emitting device 70 is prepared includes a part extending along the horizontal plane between adjacent first openings K1. In terms of the second electrode 704 of the light-emitting device 70, the film layer can be a continuous common film layer and can serve as a common cathode of multiple light-emitting devices 70. The electrical signal to which the second electrode 704 is electrically connected can have a smooth transmission channel by the fact that the two adjacent second openings K2 on the display panel 100 are not connected, which ensures the potential uniformity of multiple positions on the film layer where the second electrode 704 is located.

[0121] Figure 15 In one embodiment of the present application, the display panel 100 further includes a plurality of light-emitting devices 70, which can be prepared in the first openings K1. Figure 1 A partial schematic view of the region E1, Figure 16 A partial schematic view of the region E1, Figure 15 A partial schematic view of the region E1,

[0122] In one embodiment of the present application, the display panel 100 further includes a plurality of light-emitting devices 70, which can be prepared in the first openings K1. Figure 15 、 Figure 16 As shown in the figure, the display panel 100 further includes a plurality of light-emitting devices 70, which can be prepared in the first openings K1. The display panel 100 further includes a black matrix layer BM, which is located on the side of the light-emitting device 70 away from the substrate 10. The first pixel definition layer 30 provided in the embodiment of the present application includes a light-blocking material, which can replace the use of a polarizer in combination with the black matrix layer BM and the color filter layer CF, thereby reducing the reflectivity of the display panel 100 and improving the light transmittance of the display panel 100, and improving the working effect of the light-sensing area A1.

[0123] The black matrix layer BM includes a first cutout region BM1 and a second cutout region BM2. Along a direction perpendicular to the plane of the substrate 10, the first cutout region BM1 at least partially overlaps with the first opening K1, and the second cutout region BM2 at least partially overlaps with the fifth opening K5. Typically, the black matrix layer BM is used to block the positions between adjacent light-emitting devices 70. The first cutout region BM1 allows light emitted from the light-emitting device 70 through the first opening K1 to be emitted normally. In this embodiment, the photosensitive device 60, including the photosensitive area A1, needs to receive light to perform its corresponding function. Therefore, a second cutout region BM2 is created in the black matrix layer BM to ensure that light can be transmitted within the fifth opening K5.

[0124] In this embodiment, the black matrix layer BM in the light-sensing area A1 includes a first hollow area BM1 and a second hollow area BM2, while the black matrix layer BM in the non-light-sensing area A2 includes the first hollow area BM1 but does not include the second hollow area BM2. Both the light-sensing area A1 and the non-light-sensing area A2 in this application have a fifth opening K5, which reduces the difference in spacing between adjacent first openings K1 in the light-sensing area A1 and the non-light-sensing area A2, thereby improving the display uniformity of the display panel 100. However, the fifth opening K5 in the non-light-sensing area A2 does not overlap with the light-sensing device 60, so there is no need for light transmission. Therefore, the black matrix layer BM in the non-light-sensing area A2 does not need to have a second hollow area BM2; that is, the black matrix layer BM blocks the fifth opening K5 in the non-light-sensing area A2, which helps to prevent ambient light from entering through the fifth opening K5 in the non-light-sensing area A2, avoiding any impact on the display panel 100 in terms of increasing reflectivity and preventing crosstalk between light rays.

[0125] Figure 17 Another embodiment provided in this application Figure 15 A schematic diagram of the cross section along line G-G'.

[0126] In one embodiment of this application, combined with Figure 15 , Figure 16 , Figure 17 As shown, the display panel 100 also includes a color filter layer CF, which fills the first hollow area BM1. The first hollow area BM1 corresponds to the first opening K1 of the light-emitting device 70. The color filter layer CF includes color resists CF1 corresponding to different light-emitting devices 70. The color resists CF1 corresponding to different light-emitting devices 70 can selectively allow light of corresponding wavelengths to pass through, thereby filtering the light emitted from the first hollow area BM1 and improving the purity and transmittance of the emitted light color of the display panel 100.

[0127] Figure 18 Another embodiment provided in this application Figure 15 A schematic diagram of the cross section along line G-G'.

[0128] In an embodiment of the present application, as shown in Figure 15 , Figure 18 , the display panel 100 further comprises a planar layer PLN located on the side of the first pixel definition layer 30 facing the substrate 10. The planar layer PLN is located between the light emitting device 70 and the driving substrate layer 40, and can be used to flatten the surface of the driving substrate layer 40 away from the substrate 10, ensuring the structural flatness during the preparation of the light emitting device 70.

[0129] The planar layer PLN comprises a first sub-planar layer PLN1 and a second sub-planar layer PLN2, and the first sub-planar layer PLN1 is located on the side of the second sub-planar layer PLN2 away from the substrate 10.

[0130] The first sub-planar layer PLN1 comprises a light shielding material, and the second sub-planar layer PLN2 comprises a transparent material. When the light emitting device 70 emits light, part of the light will be reflected towards the side of the driving substrate layer 40, which contains metal traces and is prone to reflection. The first sub-planar layer PLN1 is closer to the light emitting device 70, and the first sub-planar layer PLN1 comprising a light shielding material helps to avoid the reflection of light generated by the light emitting device 70 into the driving substrate 40, thereby reducing the reflectivity of the display panel 100, and also providing conditions for saving the use of polarizing sheets and improving the transmittance of the display panel 100.

[0131] In an embodiment of the present application, continuing to refer to Figure 18 , the first sub-planar layer PLN1 comprises a third hollow area PLN3, and the third hollow area PLN3 at least partially overlaps the fifth opening K5 in the direction perpendicular to the plane on which the substrate 10 is located. In the light sensing area A1, the fifth opening K5 overlaps the light sensing device 60, and the fifth opening K5 can be used to transmit the light required by the light sensing device 60. Optionally, the light sensing device 60 is prepared between the substrate 10 and the planar layer PLN, and the light sensing device 60 can be in the same layer as part of the film layer in the driving substrate layer 40, facilitating electrical connection with the traces in the driving substrate layer 40. It is necessary to ensure that the light can pass through the fifth opening K5 to reach the light sensing device 60 between the light emitting side of the display panel 100 and the light sensing device 60. Therefore, in the embodiment of the present application, the first sub-planar layer PLN1 having a light shielding effect is provided with a third hollow area PLN3, and the third hollow area PLN3 can transmit the light transmitted by the fifth opening K5, which is conducive to ensuring the functional stability of the light sensing device 60. Optionally, the third hollow area PLN3 is filled with a transparent material.

[0132] In an embodiment of the present application, continuing to refer to Figure 2 , the first opening K1 has a circular or square shape in the orthographic projection of the substrate 10.

[0133] Figure 19 A flow chart of a method for manufacturing a display panel is provided in embodiments of the present application.

[0134] A method for manufacturing a display panel 100 is provided in embodiments of the present application, as shown in FIG. 1, the method comprises: Figure 19

[0135] S1: providing a substrate 10.

[0136] S2: forming a plurality of first electrodes 201 on one side of the substrate 10. Optionally, a driving substrate layer 40 is prepared on the display panel 100 before the first electrodes 201 are formed, and pixel circuits T on the driving substrate layer 40 are electrically connected to the first electrodes 201.

[0137] S3: forming a first initial pixel definition layer 30' on the side of the first electrodes 201 away from the substrate 10. The first initial pixel definition layer 30' can be a planar structure that is laid on the side of the first electrodes 201 away from the substrate 10.

[0138] S4: forming a first opening K1 and a second opening K2 in the first initial pixel definition layer 30' by using a first full gray mask M1 to obtain a first pixel definition layer 30 comprising the first opening K1 and the second opening K2. The first full gray mask M1 can protect the material of the first initial pixel definition layer 30' outside the positions corresponding to the first opening K1 and the second opening K2 from being removed during the patterning process to obtain the first opening K1 and the second opening K2. The first opening K1 at least partially overlaps the first electrodes 201, and the second opening K2 does not overlap the first electrodes 201. Both the first opening K1 and the second opening K2 penetrate the first pixel definition layer 30. Optionally, the first opening K1 is a pixel opening for manufacturing a light emitting device 70, and the second opening K2 can be a partition opening for reducing the leakage current between adjacent light emitting devices 70.

[0139] The first pixel definition layer 30 comprises a light shielding material. The use of the light shielding material in the first pixel definition layer 30 can reduce the reflection of the display panel 100 and provide conditions for not using a polarizer in the display panel 100.

[0140] The smallest angle between the sidewall of the first opening K1 and the plane of the substrate 10 is a first angle θ11, and the smallest angle between the sidewall of the second opening K2 and the plane of the substrate 10 is a second angle θ12. |θ11-θ12|≤10°. The small difference between the first angle θ11 and the second angle θ12 is conducive to the preparation of the first opening K1 and the second opening K2 in the same patterning process, thereby improving the preparation efficiency of the various openings in the first pixel definition layer 30.

[0141] ​Figure 20 FIG. 4 is a flowchart of another method for manufacturing a display panel according to an embodiment of the present application.

[0142] In one embodiment of the present application, in combination with Figure 19 、 Figure 20 As shown in FIG. 4, in step S4, the method for forming the first pixel definition layer 30 includes:

[0143] S41: exposing G1, developing G2, and curing G3 the first initial pixel definition layer 30', and removing the portions of the first initial pixel definition layer 30' located in the first area 301' and the portions located in the second area 302', to obtain the first pixel definition layer 30. The first pixel definition layer 30 includes the first opening K1 located in the first area 301' and the second opening K2 located in the second area 302'.

[0144] Optionally, the first pixel definition layer 30 is a black pixel definition layer, and a pigment is added in the first pixel definition layer 30. In this case, the surface of the first pixel definition layer 30 is rough. In the related art, when the pixel definition layer in the display panel is manufactured, an etching process is usually used. However, in the etching process, a chemical solution for removing the etching protection layer is introduced, and the chemical solution is generally acidic. The black pixel definition layer is strongly alkaline, and after the chemical solution contacts the pixel definition layer, a reaction occurs between the black pixel definition layer and the chemical solution, which easily causes the black pixel definition layer to fade. Furthermore, the roughness of the surface of the pixel definition layer increases after the surface of the pixel definition layer is further damaged and recessed, which easily causes a short circuit between the electrodes included in the light-emitting device, such as a short circuit between the charge generation layer 702 and the second electrode 704.

[0145] Therefore, in the embodiment of the present application, the first opening K1 and the second opening K2 are formed on the first initial pixel definition layer 30' by using an exposure process. Avoiding forming the first opening K1 and the second opening K2 by using an etching process reduces the frequency of using the chemical solution to remove the etching protection layer on the surface of the first pixel definition layer 30, thereby protecting the first pixel definition layer 30 from being damaged. Furthermore, in the technical solution of the present application, the first initial pixel definition layer 30' can include a photosensitive material, so that the first initial pixel definition layer 30' itself can receive exposure, and the first area 301' and the second area 302' are directly removed by using a developing process. This is beneficial to further avoid using a photoresist layer in the exposure process, thereby avoiding the process of using the chemical solution to remove the photoresist layer, and protecting the first initial pixel definition layer 30' from being damaged by the chemical solution for removing the photoresist layer.

[0146] As shown in FIG. 4, in step S4, the method for forming the first pixel definition layer 30 includes: Figure 20As shown, the first region 301' and the second region 302' of the first initial pixel definition layer 30' are removed by positive development when the first initial pixel definition layer 30' is developed to remove the first region 301' and the second region 302' of the first initial pixel definition layer 30'. At this time, the photosensitive material included in the first initial pixel definition layer 30' is suitable for positive development technology.

[0147] In the exposure G1 process, the first initial pixel definition layer 30' can be exposed to light L1 of a specific wavelength to achieve exposure of the first initial pixel definition layer 30'. In the exposure G1 process, the first full gray mask M1 is used to protect the regions other than the first region 301' and the second region 302'.

[0148] In the development G2 process, the first initial pixel definition layer 30' is placed in the developing solution D1, and the exposed first region 301' and the second region 302' are dissolved in the developing solution D1 and removed, as shown in Figure 20 As shown, the removed part D2 is removed.

[0149] In the curing process G3, the first pixel definition layer 30 can be cured by light curing or heat curing.

[0150] In addition, the second region 302' is located between adjacent first regions 301', and the first region 301' and the second region 302' are not connected, which is beneficial to ensure that the boundary of the first opening K1 prepared as a pixel opening is clear, thereby ensuring that the light emitting region of the light emitting device prepared in the first opening K1 is clearly defined.

[0151] In an embodiment of the present application, continuing to refer to Figure 20 As shown, the first initial pixel definition layer 30' is exposed G1, developed G2 and cured G3, and the part in the first region 301' and the part in the second region 302' of the first initial pixel definition layer 30' are all removed to obtain the first pixel definition layer 30, including:

[0152] G1: exposing the first region 301' and the second region 302'. The first region 301' and the second region 302' in the first pixel definition layer 30 include an opening, and the first region 301' and the second region 302' are regions that need to be removed on the first initial pixel definition layer 30'.

[0153] In the process, the process of removing the part of the first initial pixel definition layer 30' located in the first area 301' and the part located in the second area 302' in the corresponding developing is positive developing. At this time, the photosensitive material included in the first initial pixel definition layer 30' is suitable for the positive developing technology. The area of the first initial pixel definition layer 30' receiving exposure of the light L1 of a specific wavelength is easy to dissolve with the developing liquid D1, and the exposed area is easy to remove. Therefore, the first full gray mask M1 used in the present process includes a third hollow area M1A which overlaps the first area 301' and the second area 302'.

[0154] G2: removing the part of the first initial pixel definition layer 30' located in the first area 301' and the part located in the second area 302' in the developing to obtain the first opening K1 and the second opening K2. The first area 301' and the second area 302' of the first initial pixel definition layer 30' which are not exposed are easy to be removed by dissolving with the developing liquid D1. The first initial pixel definition layer 30' after exposure is placed in the developing liquid D1, and the part of the first initial pixel definition layer 30' located in the first area 301' and the part located in the second area 302' are the removal part D2 which is removed by dissolving with the developing liquid D1.

[0155] G3: solidifying the first initial pixel definition layer 30' located in the first area 301' and the part located in the second area 302' to obtain the first pixel definition layer 30. Optionally, the solidification mode such as photocuring, thermal curing and the like is selected according to the material of the first initial pixel definition layer 30'.

[0156] Figure 21 Another flow chart of a method for manufacturing a display panel is provided in the embodiments of the present application.

[0157] In one embodiment of the present application, as shown in Figure 21 exposing G1, developing G2 and solidifying G3 the first initial pixel definition layer 30', and removing the part of the first initial pixel definition layer 30' located in the first area 301' and the part located in the second area 302' to obtain the first pixel definition layer 30, including:

[0158] G1: exposing the part of the first initial pixel definition layer 30' located in the third area 303'. The third area 303' in the first pixel definition layer 30 does not include an opening, and the third area 303' is the area of the first initial pixel definition layer 30' which needs to be reserved.

[0159] In this process, the process of developing and removing the portions of the first initial pixel definition layer 30' located in the first region 301' and the second region 302' is negative development. At this time, the photosensitive material included in the first initial pixel definition layer 30' is suitable for negative development technology. The regions in the first initial pixel definition layer 30' that receive exposure to a specific wavelength L1 are cross-linked and cured, making them difficult to remove with the developer D1. Therefore, the third cutout region M1A of the first full-grayscale mask M1 used in this process overlaps with the third region 303', and the third region 303' is exposed and cured.

[0160] G2: Development removes the portions of the first initial pixel definition layer 30' located in the first region 301' and the second region 302', while retaining the portion of the first initial pixel definition layer 30' located in the third region 303', resulting in the first opening K1 and the second opening K2. The first portion 301' and the second portion 302' in the first initial pixel definition layer 30' that were not exposed and cured are easily removed by the developer D1. The exposed first initial pixel definition layer 30' is placed in the developer D1, and the portions of the first initial pixel definition layer 30' located in the first region 301' and the second region 302' are the removed portions D2, which are removed by the developer D1.

[0161] G3: Curing removes the portion of the first initial pixel definition layer 30' located in the first region 301' and the portion located in the second region 302', resulting in the first pixel definition layer 30. Similarly, curing methods such as photocuring and thermal curing can be selected depending on the material of the first initial pixel definition layer 30'.

[0162] Figure 22 This is a flowchart illustrating another method for manufacturing a display panel provided in an embodiment of this application.

[0163] In one embodiment of this application, such as Figure 22 As shown, S5: A second initial pixel definition layer 50' is formed on the side of the first pixel definition layer 30 away from the substrate 10. This step is performed after the first pixel definition layer 30 is fabricated. As can be seen from the above embodiments, in this application embodiment, the first pixel definition layer 30 can be obtained by creating a first opening K1 and a second opening K2 on the first initial pixel definition layer 30' using an exposure method. The angular difference between the first included angle θ11 between the sidewall of the first opening K1 and the substrate 10 and the second included angle θ12 between the sidewall of the second opening K2 and the substrate 10 is within a limited range. The first opening K1 and the second opening K2, corresponding to large angles θ11 and θ12 respectively, can be created firstly through exposure. For example, θ11 = θ12 = 70°, which ensures the leakage prevention effect of the second opening K2.

[0164] When the first opening K1 is prepared on the first pixel definition layer 30 using the above-mentioned exposure, development and curing patterning process, a large-angle opening can be made by the exposure process first. Here, the large-angle can be represented as the opening degree of the opening away from the substrate 10. Ensuring a certain opening degree is beneficial to the light-emitting device to emit light smoothly and avoid the side wall of the opening to block the light. However, in the ideal case, the first included angle θ11 to be exposed and made is 70°, but the actual first included angle θ11 is larger, which is not conducive to improving the light-emitting effect of the light-emitting device. Therefore, the second pixel definition layer 50 is further added to limit the opening area of the pixel.

[0165] S6: Form a third opening K3 and a fourth opening K4 in the second initial pixel definition layer 50' by using the second full gray mask M2, to obtain the second pixel definition layer 50 including the third opening K3 and the fourth opening K4. In the direction perpendicular to the plane where the substrate 10 is located, the third opening K3 is located in the first opening K1, and the second opening K2 is located in the fourth opening K4. Both the third opening K3 and the fourth opening K4 penetrate the second pixel definition layer 50. Wherein, the smallest included angle between the side wall of the third opening K3 and the plane where the substrate 10 is located is the third included angle θ13, and θ11> θ13.

[0166] The third opening K3 and the fourth opening K4 are opened on the second initial pixel definition layer 50', and the third opening K3 is located in the first opening K1, which means that the material of the second initial pixel definition layer 50' is deposited in the first opening K1. Both the third opening K3 and the fourth opening K4 are openings penetrating the second initial pixel definition layer 50'. The third included angle θ13 between the side wall of the third opening K3 and the substrate 10 is small, and the third opening K3 expands outward away from the substrate 10, which is conducive to further limiting the pixel opening area of the light-emitting device 70 by using the second pixel definition layer 50, reducing the degree of blocking of the light emitted by the light-emitting device 70, and improving the light-emitting efficiency of the light-emitting device 70.

[0167] The second pixel definition layer 50 used in the embodiments of the present application includes a light-transmitting material, which is conducive to further reducing the degree of blocking of the light by the second pixel definition layer 50 and improving the light-emitting efficiency of the light-emitting device 70.

[0168] Figure 23 Another method for manufacturing a display panel is provided in the embodiments of the present application.

[0169] In one embodiment of the present application, as shown in Figure 23 The method for forming the second pixel definition layer 50 in the above-mentioned step S6 includes:

[0170] S61: exposing, developing and curing the second initial pixel definition layer 50', removing the part of the second initial pixel definition layer 50' located in the fourth region 501' and the part of the second initial pixel definition layer 50' located in the fifth region 502', to obtain a second pixel definition layer 50. The second pixel definition layer 50 includes a third opening K3 located in the fourth region 501' and a fourth opening K4 located in the fifth region 502'.

[0171] The projection of the third opening K3 in the direction perpendicular to the plane where the substrate 10 is located falls within the projection of the first opening K1, and the projection of the second opening K2 falls within the projection of the fourth opening K4. The third opening K3 includes the pixel opening region of the redefinable light emitting device 70 in the first opening K1. The second pixel definition layer 50 does not shield the second opening K2, and the fourth opening K4 in the second pixel definition layer 50 exposes the second opening K2.

[0172] In the embodiment of the present application, when the second pixel definition layer 50 is prepared, as shown in Figure 23 illustrated, taking the positive development as an example when the fourth region 501' and the fifth region 502' of the second initial pixel definition layer 50' are removed by development. At this time, the second initial pixel definition layer 50' can be selected to include a photosensitive material and be suitable for positive development technology. The exposure process can be directly performed on the second initial pixel definition layer 50' itself, avoiding the use of other protective layers, thereby avoiding the use of chemical solution to remove the protective layer, and further avoiding the damage of the chemical solution to the first pixel definition layer 30 and the second pixel definition layer 50.

[0173] In the process of exposing, developing and curing the second initial pixel definition layer 50', in detail:

[0174] G4: exposing the fourth region 501' and the fifth region 502'. In this process, the second full gray mask M2 is placed on the surface of the second initial pixel definition layer 50' away from the substrate 10, the positions corresponding to the fourth region 501' and the fifth region 502' in the second full gray mask M2 include the fourth hollow part M2A, and the other positions can be light-shielded. The fourth region 501' and the fifth region 502' of the second initial pixel definition layer 50' can be exposed to light L2 of a specific wavelength, so as to realize the exposure of the second initial pixel definition layer 50'. Optionally, the wavelength of the light L2 used for exposing the second initial pixel definition layer 50' in the embodiment of the present application is different from the wavelength of the light L1 mentioned above for exposing the first initial pixel definition layer 30'.

[0175] G5: Development removes the portions located in the fourth region 501 and the fifth region 502' of the second initial pixel definition layer 50', resulting in the third opening K3 and the fourth opening K4. The portions in the fourth region 501' and the fifth region 502' of the second initial pixel definition layer 50' undergo a photochemical reaction after exposure and become soluble in the developer D3, while the unexposed portions are insoluble in the developer D3. During this process, the exposed second initial pixel definition layer 50' can be placed in the developer D3. The portions in the fourth region 501' and the fifth region 502' of the second initial pixel definition layer 50' are the removal portions D4, which are soluble in the developer D3 and removed. Optionally, the developer D3 used in this embodiment may be different from the developer D1 used on the first initial pixel definition layer 30' described above.

[0176] G6: Curing removes portions of the second initial pixel definition layer 50' located in the fourth region 501' and the fifth region 502', resulting in the second pixel definition layer 50. The curing method, such as photocuring or thermal curing, can be selected based on the material of the second initial pixel definition layer 50'.

[0177] Figure 24 This is a plan view of a display device provided in an embodiment of this application.

[0178] This application provides a display device 200, such as... Figure 24 As shown, the display device 200 includes the display panel 100 as described in the above embodiments. Optionally, the display device 200 is a display device such as a computer, television, or mobile phone.

[0179] In the display device 200, the minimum angle between the sidewall of the first opening K1 and the plane of the substrate 10 is set as the first angle θ11, and the minimum angle between the sidewall of the second opening K2 and the plane of the substrate 10 is set as the second angle θ12, such that |θ11-θ12|≤10°. This is beneficial to reduce the structural difference between the first opening K1 and the second opening K2. Based on this setting, the first opening K1 and the second opening K2 can be formed in the same patterning process, which is beneficial to reduce the process complexity when preparing openings in the first pixel definition layer 30, and also beneficial to improve the preparation accuracy when forming different types of openings in the same patterning process, thereby improving the structural reliability of the first pixel definition layer 30.

[0180] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of protection of this application.

Claims

1. A display panel, characterized by, The display panel comprises: a substrate; a first electrode layer located on one side of the substrate in a direction perpendicular to a plane in which the substrate is located, and comprising a plurality of first electrodes; a first pixel definition layer located on a side of the first electrode layer away from the substrate, the first pixel definition layer comprising a plurality of first openings and second openings, the first openings at least partially overlapping the first electrodes, and the second openings not overlapping the first electrodes; wherein the first pixel definition layer comprises a light shielding material, a smallest included angle between a sidewall of the first opening and the plane in which the substrate is located is a first included angle θ11, and a smallest included angle between a sidewall of the second opening and the plane in which the substrate is located is a second included angle θ12; wherein |θ11-θ12|≤10°.

2. The display panel of claim 1, wherein, |θ11-θ12|≤5°.

3. The display panel of claim 1, wherein, θ11=θ12.

4. The display panel of claim 3, wherein, θ11=θ12=70°.

5. The display panel of claim 1, wherein, The display panel further comprises a second pixel definition layer located on a side of the first pixel definition layer away from the substrate; the second pixel definition layer comprises a plurality of third openings and fourth openings; in a direction perpendicular to the plane in which the substrate is located, the third openings are located within the first openings, and the second openings are located within the fourth openings.

6. The display panel of claim 5, wherein, a smallest included angle between a sidewall of the third opening and the plane in which the substrate is located is a third included angle θ13, and θ11>θ13.

7. The display panel of claim 6, wherein, 25°≤θ13≤35°.

8. The display panel of claim 5, wherein, a thickness of the first pixel definition layer is H1, and a thickness of the second pixel definition layer is H2; H2≤H1.

9. The display panel of claim 5, wherein: 0.5μm≤H1≤2μm and 0.3μm≤H2≤0.5μm.

10. The display panel of claim 6, wherein, The first pixel definition layer further comprises fifth openings; in a direction perpendicular to the plane in which the substrate is located, at least part of the fifth openings overlap the light sensing device, and the fifth openings are located within the fourth openings; a smallest included angle between a sidewall of the fifth opening and the plane in which the substrate is located is a fourth included angle θ14; wherein |θ14-θ11|≤10° and θ14>θ13.

11. The display panel of claim 5, wherein, The display panel comprises a plurality of light emitting devices, the light emitting device comprising: the first electrode; a first light emitting layer located on a side of the first electrode away from the substrate, the first light emitting layer being at least partially located within the first opening; a charge generation layer located on a side of the first light emitting layer away from the first electrode; a second light emitting layer located on a side of the charge generation layer away from the first light emitting layer; a second electrode located on a side of the second light emitting layer away from the charge generation layer.

12. The display panel of claim 11, wherein, The light transmittance of the second pixel definition layer is greater than the light transmittance of the first pixel definition.

13. The display panel of claim 1, wherein, The display panel comprises a light sensing region and a non-light sensing region adjacent to the light sensing region; The first pixel definition layer further comprises a plurality of fifth openings, in a direction perpendicular to the plane in which the substrate is located, the fifth openings do not overlap the first electrodes, the fifth openings are located between adjacent first openings, and the fifth openings are not in communication with the first openings. The fifth opening is located at an intersection position of the first sub-opening and the second sub-opening in the second opening, and the fifth opening is in communication with the second opening.

14. The display panel of claim 13, wherein, The second opening is located between adjacent first openings, and the second opening is not in communication with the first openings.

15. The display panel of claim 14, wherein, The second opening includes at least a first sub-opening and a second sub-opening in communication, the first sub-opening extends in a first direction and is located between the first openings adjacent in a second direction, and the second sub-opening extends in the second direction and is located between the first openings adjacent in the first direction. The first direction and the second direction intersect and are both parallel to the plane in which the substrate lies.

16. The display panel of claim 15, wherein, The fifth opening is located at an intersection position of the first sub-opening and the second sub-opening in the second opening, and the fifth opening is in communication with the second opening.

17. The display panel of claim 16, wherein, The fifth opening is in the shape of one of a square, a circle, and a polygon in the orthographic projection of the substrate.

18. The display panel of claim 15, wherein, The fifth opening is not in communication with the second opening.

19. The display panel of claim 15, wherein, The width of the first sub-opening and the second sub-opening is W1, and 5 μm≤W1≤10 μm.

20. The display panel of claim 13, wherein, The display panel includes a second pixel definition layer, which is located on a side of the first pixel definition layer away from the substrate. The first opening, the second opening, and the fifth opening all include the second pixel definition layer, and the second pixel definition layer includes a transparent material.

21. The display panel of claim 14, wherein, Two adjacent second openings are not in communication.

22. The display panel of claim 13, wherein, The display panel further includes: A plurality of light emitting devices; A black matrix layer, which is located on a side of the light emitting devices away from the substrate; the black matrix layer includes a first hollow area and a second hollow area, and in a direction perpendicular to the plane in which the substrate lies, the first hollow area at least partially overlaps the first opening, and the second hollow area at least partially overlaps the fifth opening. The black matrix layer includes the first hollow area and the second hollow area in the light sensing area, and the black matrix layer includes the first hollow area and does not include the second hollow area in the non-light sensing area.

23. The display panel of claim 22, wherein, The display panel further includes a color filter layer, which fills the first hollow area.

24. The display panel of claim 13, wherein, The display panel further includes a planar layer, which is located on a side of the first pixel definition layer toward the substrate; The planar layer includes a first sub-planar layer and a second sub-planar layer, and the first sub-planar layer is located on a side of the second sub-planar layer away from the substrate; The first sub-planar layer includes a light shielding material, and the second sub-planar layer includes a transparent material.

25. The display panel of claim 24, wherein, The first sub-planar layer includes a third hollow area, and in a direction perpendicular to the plane in which the substrate lies, the third hollow area at least partially overlaps the fifth opening.

26. The display panel of claim 1, wherein, The first opening is in the shape of one of a circle and a square in the orthographic projection of the substrate.

27. A method for manufacturing a display panel, characterized in that, The method includes: Providing a substrate; Forming a plurality of first electrodes on a side of the substrate; forming a first initial pixel definition layer on a side of the first electrode away from the substrate; forming a first opening and a second opening in the first initial pixel definition layer by a first full gray mask, to obtain a first pixel definition layer comprising the first opening and the second opening; the first opening at least partially overlaps the first electrode, and the second opening does not overlap the first electrode; the first opening and the second opening both penetrate the first pixel definition layer; wherein the first pixel definition layer comprises a light shielding material, a smallest included angle between a sidewall of the first opening and a plane in which the substrate lies is a first included angle θ11, and a smallest included angle between a sidewall of the second opening and the plane in which the substrate lies is a second included angle θ12; |θ11-θ12|≤10°.

28. The method of claim 27, wherein, The method for forming the first pixel definition layer comprises: exposing, developing, and curing the first initial pixel definition layer, and removing all of a portion of the first initial pixel definition layer located in a first region and a portion of the first initial pixel definition layer located in a second region, to obtain the first pixel definition layer; the first pixel definition layer comprises the first opening located in the first region and the second opening located in the second region; wherein the second region is located between adjacent first regions, and the first region and the second region are not in communication.

29. The method of claim 28, wherein, The method for exposing, developing, and curing the first initial pixel definition layer, and removing all of a portion of the first initial pixel definition layer located in a first region and a portion of the first initial pixel definition layer located in a second region, to obtain the first pixel definition layer, comprises: exposing the first region and the second region; developing to remove the portion of the first initial pixel definition layer located in the first region and the portion of the first initial pixel definition layer located in the second region, to obtain the first opening and the second opening; curing to remove the portion of the first initial pixel definition layer located in the first region and the portion of the first initial pixel definition layer located in the second region, to obtain the first pixel definition layer.

30. The method of claim 28, wherein, The method for exposing, developing, and curing the first initial pixel definition layer, and removing all of a portion of the first initial pixel definition layer located in a first region and a portion of the first initial pixel definition layer located in a second region, to obtain the first pixel definition layer, comprises: exposing a portion of the first initial pixel definition layer located in a third region; developing to remove the portion of the first initial pixel definition layer located in the first region and the portion of the first initial pixel definition layer located in the second region, and to retain the portion of the first initial pixel definition layer located in the third region, to obtain the first opening and the second opening; curing to remove the portion of the first initial pixel definition layer located in the first region and the portion of the first initial pixel definition layer located in the second region, to obtain the first pixel definition layer; wherein the third region in the first pixel definition layer does not comprise an opening.

31. The preparation method according to claim 27, wherein forming a second initial pixel definition layer on a side of the first pixel definition layer away from the substrate; forming a third opening and a fourth opening in the second initial pixel definition layer by a second full gray mask, to obtain a second pixel definition layer comprising the third opening and the fourth opening; The third opening is located in the first opening and the second opening is located in the fourth opening in a direction perpendicular to a plane where the substrate is located, and the third opening and the fourth opening both penetrate the second pixel definition layer; The second pixel definition layer comprises a light-transmitting material; A smallest included angle between a sidewall of the third opening and the plane where the substrate is located is a third included angle θ13, and θ11> θ13.

32. The method of claim 31, wherein, The method for forming the second pixel definition layer comprises: Exposing, developing and curing the second initial pixel definition layer, and removing all of a portion of the second initial pixel definition layer located in a fourth region and a portion of the second initial pixel definition layer located in a fifth region to obtain the second pixel definition layer; the second pixel definition layer comprises the third opening located in the fourth region and the fourth opening located in the fifth region; In a direction perpendicular to a plane where the substrate is located, a projection of the third opening falls within a projection of the first opening, and a projection of the second opening falls within a projection of the fourth opening.

33. A display device comprising: The display panel comprises the display panel as claimed in any one of claims 1-26.

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