High-precision proportional gas micro-flow regulating device and control method thereof

Abstract

The present application relates to the technical field of flow control, in particular to a high-precision proportional gas micro-flow regulating device and a control method thereof, which comprises a plurality of components integrated on a substrate, a through hole is opened in the substrate to connect each component in series, an inlet electromagnetic valve is connected with a proportional pressure regulator, a low-pressure buffer tank is connected downstream of the pressure regulator, a controller adjusts the voltage of a piezoelectric driver in the pressure regulator to control the opening degree of a valve port, the buffer tank is connected with a thermal throttler, the controller adjusts the current of the thermal throttler to realize fine flow regulation, a low-pressure sensor monitors the pressure value at the outlet of the throttler, the thermal throttler is communicated with anode and cathode outlet electromagnetic valves, the electromagnetic valves are connected with corresponding anode and cathode throttling sheets, the anode and cathode throttling sheets are single small hole structures, and different hole diameters realize proportional flow splitting. The present application has the following advantages: the splitting ratio is constant, the anode and cathode flow is obtained by pressure interpolation; the pressure can be self-closed loop feedback to regulate and control the flow, and the present application has wide range, high precision and long service life flow regulating capacity.

Description

Technical Field

[0001] This invention relates to the field of flow control technology, and in particular to a high-precision proportional gas micro-flow regulating device and its control method. Background Technology

[0002] Electric propulsion systems, due to their significant advantages such as high specific impulse, high reliability, and precise thrust control, have been widely applied to low and medium Earth orbit satellite platforms. The gas propellant flow control system, as a crucial subsystem of electric propulsion, plays a decisive role in the range and accuracy of thrust. With the increasing diversification of space missions, satellite platforms are placing increasingly higher demands on the propulsion system for wide-range, ultra-stable, and long-life thrust adjustment.

[0003] In existing technologies, propulsion systems primarily control thrust through gas supplied by a gas supply system, and the thrust magnitude can be controlled by the gas flow rate output from the gas supply system to the propulsion system. However, existing flow regulation devices struggle to precisely and stably adjust the output flow rate of the gas supply system.

[0004] To address the aforementioned problems, there is an urgent need for a flow regulating device that can accurately and stably adjust the output flow of a gas supply system. Summary of the Invention

[0005] This invention provides a high-precision proportional gas micro-flow regulating device and its control method, which can provide a flow regulating device for accurately and stably regulating the output flow of a gas supply system.

[0006] In a first aspect, embodiments of the present invention provide a high-precision proportional gas micro-flow regulating device, including a gas pipeline and a controller. The gas pipeline is provided with a piezoelectric proportional regulator and a thermal throttling device in sequence along the gas flow direction. The controller is used to control the opening degree of the piezoelectric proportional regulator and the current of the thermal throttling device through an electrical signal.

[0007] The inlet of the gas pipeline is connected to the outlet of a storage tank containing a high-pressure gas working medium, and the outlet of the gas pipeline is connected to the gas inlet of the thrust system. A low-pressure sensor is connected downstream of the thermal throttle. The low-pressure sensor is used to collect the pressure downstream of the thermal throttle and transmit the collected pressure value to the controller. The controller is used to adjust the opening of the piezoelectric proportional pressure regulator and the current of the thermal throttle according to the pressure value.

[0008] In one possible design, a buffer tank is also provided between the piezoelectric proportional voltage regulator and the thermal throttling device.

[0009] In one possible design, the gas pipe located downstream of the thermal throttling device branches into two branch pipes, namely an anode branch pipe and a cathode branch pipe. The anode branch pipe and the cathode branch pipe are respectively equipped with an anode throttling plate and a cathode throttling plate. Both the anode throttling plate and the cathode throttling plate are single-orifice throttling structures. The inner diameter of the anode throttling plate is 2 to 5 times the inner diameter of the cathode throttling plate.

[0010] In one possible design, the anode branch pipe and the cathode branch pipe are respectively equipped with an anode outlet solenoid valve and a cathode outlet solenoid valve, and the controller is also used to control the on / off state of the anode outlet solenoid valve and the cathode outlet solenoid valve.

[0011] In one possible design, the gas pipeline between the storage tank and the piezoelectric proportional regulator is equipped with an inlet solenoid valve and a high-pressure sensor. The controller is also used to receive pressure information collected by the high-pressure sensor and control the opening and closing of the inlet solenoid valve.

[0012] In one possible design, the system further includes a substrate, with the gas pipeline located inside the substrate. The inlet connector of the gas pipeline is connected to an inlet solenoid valve and a high-pressure sensor via a horizontal gas pipeline inside the substrate. The inlet solenoid valve is connected to the downstream piezoelectric proportional regulator via an inclined gas pipeline inside the substrate. The piezoelectric proportional regulator is connected to a downstream buffer tank via an upwardly inclined gas pipeline inside the substrate. The buffer tank is connected to the thermal throttle via a horizontal gas pipeline inside the substrate. The thermal throttle is connected to the low-pressure sensor via an inclined gas pipeline inside the substrate. The low-pressure sensor is connected to a cathode outlet solenoid valve and an anode outlet solenoid valve via a horizontal gas pipeline below the substrate. The cathode outlet solenoid valve is connected to a cathode throttling plate, and the anode outlet solenoid valve is connected to an anode throttling plate.

[0013] In one possible design, the horizontal gas pipes within the substrate have the same diameter, d, and a length ranging from 50d to 150d. The upward-sloping gas pipes and the inclined gas pipes have the same diameter, ranging from 0.5d to d.

[0014] In one possible design, the imported solenoid valve is fixed to the base plate by an axial sealing ring, an end face sealing ring, a spring washer, and a pressure ring. The high-pressure sensor, the piezoelectric proportional regulator, the thermal throttle, the low-pressure sensor, the cathode outlet solenoid valve, and the anode outlet solenoid valve all adopt the same sealing method as the imported solenoid valve.

[0015] In one possible design, both the cathode throttling plate and the anode throttling plate are fixed inside the outlet connector by rubber gaskets and straight-through connectors.

[0016] Secondly, embodiments of the present invention also provide a control method for a high-precision proportional gas micro-flow regulating device, based on any of the above-mentioned devices, the method comprising:

[0017] The target total pressure at the outlet of the gas pipeline is determined based on the calibration relationship and the flow requirement of the thrust system; wherein, the calibration relationship is the relationship between flow rate and pressure established by pressure interpolation.

[0018] The controller is used to adjust the opening of the piezoelectric proportional pressure regulator, and at the same time, the controller is used to adjust the current of the thermal throttle, so that the pressure data collected by the low-pressure sensor is the target total pressure;

[0019] or,

[0020] The controller is used to adjust the current of the thermal throttle so that the pressure data collected by the low-pressure sensor is the target total pressure.

[0021] Compared with the prior art, the present invention has at least the following beneficial effects:

[0022] Beneficial effect 1: The present invention adopts a scheme of combined control of piezoelectric proportional voltage regulator and thermal throttling device, which suppresses flow oscillation, realizes wide range adjustment and high precision control of flow, and effectively improves service life;

[0023] Benefit 2: The throttling plate adopts a single small orifice structure, and the flow rate is directly proportional to the inlet pressure. Through the characteristic relationship, the actual operating point flow rate value is obtained by pressure interpolation. When the flow rate needs to be regulated, the control value is adjusted by adjusting the piezoelectric voltage and the thermal throttling current to achieve pressure self-closed-loop regulation of the flow rate. At the same time, it also provides technical support for ground measurement of cathode and anode flow rates and satellite fault diagnosis.

[0024] Benefit 3: Pressure closed-loop feedback enables high-precision flow control, while solving the problems of dynamic creep and hysteresis in piezoelectric actuators.

[0025] Benefit 4: The cathode throttling plate and the anode throttling plate have the same structure but different apertures. The flow split ratio remains basically unchanged across the entire pressure range, effectively ensuring the safe operation of the propulsion system.

[0026] Benefit 5: All components are sealed with gaskets, which effectively avoids welding risks, reduces costs, and facilitates assembly and testing.

[0027] Benefit 6: The flow regulation device uses a base plate instead of pipelines, which realizes a high degree of integration of various components and effectively improves the space utilization of the device. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0029] Figure 1 This is a schematic diagram of the invention;

[0030] Figure 2 This is a three-dimensional structural diagram of the present invention;

[0031] Figure 3 The flow rate calibration curves for the cathode and anode throttling devices are shown.

[0032] In the diagram: 1-Inlet solenoid valve, 2-High pressure sensor, 3-Piezoelectric proportional regulator, 4-Buffer tank, 5-Thermal throttle, 6-Low pressure sensor, 7-Cathode outlet solenoid valve, 8-Anode outlet solenoid valve, 9-Cathode throttle plate, 10-Anode throttle plate, 11-Base plate, 12-Controller, 13-Inlet connector, 14-Axial sealing ring, 15-End face sealing ring, 16-Spring washer, 17-Pressure ring, 18-Rubber sealing gasket, 19-Straight connector, 20-Outlet connector. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0034] In the description of the embodiments of the present invention, unless otherwise expressly specified and limited, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance; unless otherwise specified or stated, the term "multiple" refers to two or more; the terms "connected," "fixed," etc., should be interpreted broadly. For example, "connected" can be a fixed connection, a detachable connection, an integral connection, or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in the present invention according to the specific circumstances.

[0035] In this specification, it should be understood that the directional terms such as "upper" and "lower" used in the description of the embodiments of the present invention are used to describe the angles shown in the accompanying drawings and should not be construed as limiting the embodiments of the present invention. Furthermore, in the context, it should also be understood that when it is mentioned that one element is connected "upper" or "lower" to another element, it can be directly connected to the other element "upper" or "lower," or indirectly connected to the other element "upper" or "lower" through an intermediate element.

[0036] As mentioned earlier, current gas supply systems are primarily xenon supply systems, and their flow control methods mainly combine "pressure regulation" and "throttling" technologies. Pressure regulation is primarily achieved through mechanical pressure regulators and Bang-Bang controllers. However, mechanical pressure regulators cannot achieve on-board electronic pressure regulation. Bang-Bang controllers mainly achieve pressure regulation through the coordinated control of solenoid valves and storage tanks. Their lifespan is limited by the number of times the solenoid valves are switched on and off and the usage time of the sensors. Furthermore, the outlet pressure exhibits sawtooth fluctuations, and the amplitude of these fluctuations gradually increases with increasing outlet pressure, further causing flow oscillations and reducing flow control accuracy. Therefore, the lifespan, flow control range, and control accuracy of the gas supply system are mutually constrained. In addition, the anode and cathode flow rates cannot be obtained during satellite flight; closed-loop flow regulation can only be achieved through the anode current of the thrusters. This poses significant challenges for ground-based flow measurement and satellite fault diagnosis.

[0037] To address the aforementioned problems, embodiments of the present invention provide a high-precision proportional gas micro-flow regulating device. Please refer to... Figure 1 and Figure 2 The device includes a gas pipeline and a controller 12. A piezoelectric proportional regulator 3 and a thermal throttle 5 are arranged sequentially along the gas flow direction in the gas pipeline. The controller 12 is used to control the opening degree of the piezoelectric proportional regulator 3 and the current of the thermal throttle 5 through electrical signals.

[0038] The inlet of the gas pipeline is connected to the outlet of the storage tank containing the high-pressure gas working medium, and the outlet of the gas pipeline is connected to the gas inlet of the thrust system. A low-pressure sensor 6 is connected downstream of the thermal throttle 5. The low-pressure sensor 6 is used to collect the pressure downstream of the thermal throttle 5 and transmit the collected pressure value to the controller 12. The controller 12 is used to adjust the opening degree of the piezoelectric proportional pressure regulator 3 and the current of the thermal throttle 5 according to the pressure value.

[0039] In this embodiment, flow rate control can be converted into pressure control. The relationship between the thrust system inlet pressure and flow rate can be calibrated on the ground using pressure interpolation. Based on this calibration, the inlet pressure requirement of the thrust system can be determined according to the flow rate requirement of the thrust system. The device outlet is directly connected to the thrust system; therefore, the thrust system inlet pressure is the outlet pressure of the gas pipeline of this application. The device provided in this application can precisely adjust the outlet pressure of the gas pipeline. Specifically, the low-pressure sensor 6 can collect the pressure at the gas pipeline outlet, and the collected pressure value is fed back to the controller 12. The controller 12 adjusts the voltage of the piezoelectric proportional regulator 3 according to the pressure value to rapidly and over a wide range adjust the gas pressure at the gas pipeline outlet. The controller 12 can also control the current of the thermal throttle 5 to fine-tune the pressure value. Thus, the rapid and wide-range adjustment of the piezoelectric proportional regulator 3, combined with the precise small-range adjustment of the thermal throttle 5, enables wide-range, rapid, and accurate flow rate regulation. It should be noted that if the current pressure value and the target pressure value are not significantly different, the pressure value can be fine-tuned only through the thermal throttle 5.

[0040] Both the piezoelectric proportional regulator 3 (inverse piezoelectric effect) and the thermal throttling device 5 (heating to change viscosity) are electronic regulators and can be used on satellites. The thermal throttling device 5, through its capillary structure, can suppress high-frequency oscillations while simultaneously regulating voltage. This is due to the capillary cavity effect, where high-frequency signals are suppressed, thus achieving flow oscillation suppression. Furthermore, because the piezoelectric proportional regulator 3 has strong fatigue resistance, it effectively extends the lifespan of the flow regulation device.

[0041] In this embodiment, the thermal throttling device 5 includes a relatively long metal capillary tube, the inner diameter of which is generally between 0.1 mm and 0.3 mm. The length of the capillary tube is relatively long, between 100 mm and 200 mm. By applying current to both ends of the capillary tube, the capillary tube can be heated. As we know, it is a current-resistance device, and after the capillary tube is heated, the viscosity of the gas flowing through the capillary tube will change. The change in viscosity will further affect the flow rate, thereby changing the downstream pressure. The current is adjustable from 0A to 4A, and the current can be infinitely adjusted with a resolution of 0.01A. Fine adjustment of the current corresponds to fine adjustment of the flow rate.

[0042] In some embodiments of the present invention, a buffer tank 4 is also provided between the piezoelectric proportional voltage regulator 3 and the thermal throttling device 5.

[0043] In this embodiment, the buffer tank 4 can further reduce flow oscillation.

[0044] Please refer to Figure 3In some embodiments of the present invention, the gas pipeline downstream of the thermal throttling device 5 branches into two branch pipelines, namely an anode branch pipeline and a cathode branch pipeline. The anode branch pipeline and the cathode branch pipeline are respectively provided with an anode throttling plate 10 and a cathode throttling plate 9. Both the anode throttling plate 10 and the cathode throttling plate 9 are single-orifice throttling structures. The inner diameter of the anode throttling plate 10 is 2 to 5 times the inner diameter of the cathode throttling plate 9.

[0045] In existing technologies, the structures of the anode and cathode throttling vanes (10) differ significantly. Especially when the inlet pressure of the throttling vane is low, the flow rate ratio exhibits severe nonlinearity with pressure changes, causing the thruster to deviate from its design operating point. This application uses a single-orifice structure for the throttling vane, where the flow rate is directly proportional to the inlet pressure. Through characteristic equations and pressure interpolation, the true operating point flow rate value is obtained. When flow rate regulation is required, the control value is adjusted by regulating the piezoelectric voltage and the thermal throttling current to achieve pressure self-closed-loop flow regulation. This also provides technical support for ground-based measurement of anode and cathode flow rates and satellite fault diagnosis.

[0046] Furthermore, the cathode throttling plate 9 and the anode throttling plate 10 have the same structure but different apertures, and the flow split ratio remains basically unchanged across the entire pressure range, effectively ensuring the safe operation of the propulsion system.

[0047] In some embodiments of the present invention, the anode branch pipe and the cathode branch pipe are respectively provided with an anode outlet solenoid valve 8 and a cathode outlet solenoid valve 7, and the controller 12 is also used to control the on / off state of the anode outlet solenoid valve 8 and the cathode outlet solenoid valve 7.

[0048] In some embodiments of the present invention, the gas pipeline between the storage tank and the piezoelectric proportional regulator 3 is equipped with an inlet solenoid valve 1 and a high-pressure sensor 2. The controller 12 is also used to receive pressure information collected by the high-pressure sensor and control the opening and closing of the inlet solenoid valve 1.

[0049] In some embodiments of the present invention, a substrate 11 is also included. A gas pipeline is located inside the substrate 11. The inlet connector 13 of the gas pipeline is connected to an inlet solenoid valve 1 and a high-pressure sensor 2 through a horizontal gas pipeline inside the substrate 11. The inlet solenoid valve 1 is connected to a downstream piezoelectric proportional regulator 3 through an inclined gas pipeline inside the substrate 11. The piezoelectric proportional regulator 3 is connected to a downstream buffer tank 4 through an upwardly inclined gas pipeline inside the substrate 11. The buffer tank 4 is connected to a thermal throttle 5 through a horizontal gas pipeline inside the substrate 11. The thermal throttle 5 is connected to a low-pressure sensor 6 through an inclined gas pipeline inside the substrate 11. The low-pressure sensor 6 is connected to a cathode outlet solenoid valve 7 and an anode outlet solenoid valve 8 through a lower horizontal gas pipeline below the substrate 11. The cathode outlet solenoid valve 7 is connected to a cathode throttling plate 9, and the anode outlet solenoid valve 8 is connected to an anode throttling plate 10.

[0050] The flow regulation device adopts a scheme of setting multiple gas pipes in the base plate 11 instead of traditional pipelines, realizing a high degree of integration of various components and effectively improving the space utilization of the device.

[0051] In some embodiments of the present invention, the horizontal gas pipes in the substrate 11 have the same diameter, which is d, and the length is 50d to 150d. The upward-sloping gas pipes and the inclined gas pipes have the same diameter, which ranges from 0.5d to d.

[0052] In some embodiments of the present invention, the imported solenoid valve 1 is fixed on the base plate 11 by an axial sealing ring 14, an end face sealing ring 15, a spring washer 16 and a pressure ring 17. The high-pressure sensor 2, the piezoelectric proportional regulator 3, the thermal throttle 5, the low-pressure sensor 6, the cathode outlet solenoid valve 7, and the anode outlet solenoid valve 8 all adopt the same sealing method as the imported solenoid valve 1.

[0053] In some embodiments of the present invention, both the cathode throttling plate 9 and the anode throttling plate 10 are fixed inside the outlet connector 20 by a rubber sealing gasket 18 and a straight connector 19.

[0054] In existing technologies, most electric propulsion working fluid flow regulating devices adopt welded structures, which increases processing costs and is inconvenient for assembly and testing. In contrast, all components in this application are sealed with gaskets, effectively avoiding welding risks, reducing costs, and facilitating assembly and testing.

[0055] This invention also provides a control method for a high-precision proportional gas micro-flow regulating device. Based on any of the above-mentioned devices, the method includes:

[0056] The target total pressure at the gas pipeline outlet is determined based on the calibration relationship and the flow requirements of the thrust system; whereby the calibration relationship is the relationship between flow rate and pressure established by pressure interpolation.

[0057] The controller 12 is used to adjust the opening of the piezoelectric proportional pressure regulator 3, and at the same time, the controller 12 is used to adjust the current of the thermal throttle 5 so that the pressure data collected by the low pressure sensor 6 is the target total pressure.

[0058] or,

[0059] The current of the thermal throttle 5 is adjusted by the controller 12 so that the pressure data collected by the low-pressure sensor 6 is the target total pressure.

[0060] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A high-precision proportional gas micro-flow regulating device, characterized in that, It includes a gas pipeline and a controller (12). The gas pipeline is provided with a piezoelectric proportional regulator (3) and a thermal throttle (5) in sequence along the gas flow direction. The controller (12) is used to control the opening degree of the piezoelectric proportional regulator (3) and the current of the thermal throttle (5) through electrical signals. The inlet of the gas pipeline is connected to the outlet of the storage tank containing the high-pressure gas working medium, and the outlet of the gas pipeline is connected to the gas inlet of the thrust system. A low-pressure sensor (6) is connected downstream of the thermal throttle (5). The low-pressure sensor (6) is used to collect the pressure downstream of the thermal throttle (5) and transmit the collected pressure value to the controller (12). The controller (12) is used to adjust the opening of the piezoelectric proportional regulator (3) and the current of the thermal throttle (5) according to the pressure value.

2. The apparatus according to claim 1, characterized in that, A buffer tank (4) is also provided between the piezoelectric proportional regulator (3) and the thermal throttling device (5).

3. The apparatus according to claim 1, characterized in that, The gas pipeline located downstream of the thermal throttling device (5) branches into two branch pipelines, namely the anode branch pipeline and the cathode branch pipeline. The anode branch pipeline and the cathode branch pipeline are respectively provided with an anode throttling plate (10) and a cathode throttling plate (9). Both the anode throttling plate (10) and the cathode throttling plate (9) are single-hole throttling structures. The inner diameter of the anode throttling plate (10) is 2 to 5 times the inner diameter of the cathode throttling plate (9).

4. The apparatus according to claim 3, characterized in that, The anode branch pipe and the cathode branch pipe are respectively equipped with an anode outlet solenoid valve (8) and a cathode outlet solenoid valve (7). The controller (12) is also used to control the opening and closing of the anode outlet solenoid valve (8) and the cathode outlet solenoid valve (7).

5. The apparatus according to claim 1, characterized in that, The gas pipeline between the storage tank and the piezoelectric proportional regulator (3) is equipped with an inlet solenoid valve (1) and a high-pressure sensor (2). The controller (12) is also used to receive the pressure information collected by the high-pressure sensor and control the opening and closing of the inlet solenoid valve (1).

6. The apparatus according to claim 1, characterized in that, It also includes a substrate (11), the gas pipeline is located inside the substrate (11), the inlet connector (13) of the gas pipeline is connected to the inlet solenoid valve (1) and the high pressure sensor (2) respectively through the horizontal gas pipeline inside the substrate (11), the inlet solenoid valve (1) is connected to the downstream piezoelectric proportional regulator (3) through the inclined gas pipeline inside the substrate (11), the piezoelectric proportional regulator (3) is connected to the downstream buffer tank (4) through the upward inclined gas pipeline inside the substrate (11), the buffer tank (4) is connected to the thermal throttle (5) through the horizontal gas pipeline inside the substrate (11), the thermal throttle (5) is connected to the low pressure sensor (6) through the inclined gas pipeline inside the substrate (11), the low pressure sensor (6) is connected to the cathode outlet solenoid valve (7) and the anode outlet solenoid valve (8) respectively through the horizontal gas pipeline below the substrate (11), the cathode outlet solenoid valve (7) is connected to the cathode throttle plate (9), and the anode outlet solenoid valve (8) is connected to the anode throttle plate (10).

7. The apparatus according to claim 6, characterized in that, The horizontal gas pipes in the substrate (11) have the same diameter, which is d, and the length is 50d to 150d. The upward-sloping gas pipes and the inclined gas pipes have the same diameter, which ranges from 0.5d to d.

8. The apparatus according to claim 6, characterized in that, The imported solenoid valve (1) is fixed on the base plate (11) by an axial sealing ring (14), an end face sealing ring (15), a spring washer (16) and a pressure ring (17). The high-pressure sensor (2), the piezoelectric proportional regulator (3), the thermal throttle (5), the low-pressure sensor (6), the cathode outlet solenoid valve (7), and the anode outlet solenoid valve (8) all adopt the same sealing method as the imported solenoid valve (1).

9. The apparatus according to claim 3 or 6, characterized in that, Both the cathode throttling plate (9) and the anode throttling plate (10) are fixed inside the outlet connector (20) by a rubber sealing gasket (18) and a straight connector (19).

10. A control method for a high-precision proportional gas micro-flow regulating device, characterized in that, Based on the apparatus of any one of claims 1-9, the method comprises: The target total pressure at the outlet of the gas pipeline is determined based on the calibration relationship and the flow requirement of the thrust system; wherein, the calibration relationship is the relationship between flow rate and pressure established by pressure interpolation. The controller (12) is used to adjust the opening of the piezoelectric proportional regulator (3), and at the same time, the controller (12) is used to adjust the current of the thermal throttle (5) so that the pressure data collected by the low pressure sensor (6) is the target total pressure; or, The current of the thermal throttle (5) is adjusted by the controller (12) so that the pressure data collected by the low-pressure sensor (6) is the target total pressure.

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