Image forming apparatus

Abstract

An image forming apparatus includes: an image holder; a developing device that attaches a developer to the image holding body; a mounted portion for mounting a cylindrical developer collection container in which the developer is collected; and a supply device that supplies the developer from the developer collection container to the developing device, and that has an opening that communicates the inside and the outside of the supply device, the opening being located at a position facing the outer peripheral surface of the developer collection container attached to the portion to be attached.

Description

Technical Field

[0001] This invention relates to an image forming apparatus. Background Technology

[0002] Japanese Patent No. 4633419 discloses a structure in which a developer collection section of a developing apparatus is provided with a partition plate disposed between a first screw and a second screw, which divides the developer collection section into two parts, and openings provided at both ends of the partition plate. Summary of the Invention

[0003] In image forming apparatuses, there are cases where a developing device is provided to allow developer to adhere to an image holder. In image forming apparatuses, a supply device is sometimes further used to supply developer discharged from a cylindrical developer collection container to the developing device.

[0004] Here, when an opening is provided in the supply device that connects the inside and outside of the supply device, gas inside the supply device can be discharged to the outside. Furthermore, the outer peripheral surface of the developer collection container in the image forming apparatus tends to have a large area. In this case, objects positioned relative to this outer peripheral surface can be easily made larger.

[0005] The first objective of this invention is to make it easier to enlarge the opening that connects the inside and outside of the supply device for supplying developer to the developing apparatus, compared to the case where an opening is provided at the opposite part of the end face of the developer collection container where the developer is collected.

[0006] Furthermore, consider a structure where gas discharged from the developing apparatus is fed into the supply device and then discharged to the outside of the supply device through an opening provided in the supply device. In this structure, when the gas inside the supply device, i.e., the gas facing the opening, contains a large amount of developer, it is easier for the developer to be discharged to the outside of the supply device.

[0007] A second objective of the present invention is to reduce the amount of developer contained in the gas flowing from the inside of the supply device toward the opening of the supply device, compared to a structure in which gas flows from the inside of the supply device toward the higher of the regions with high and low concentrations of developer.

[0008] According to a first aspect of the present invention, an image forming apparatus is provided, comprising: an image holder; a developing apparatus for attaching developer to the image holder; a mounting portion for mounting a cylindrical developer collection container containing developer; and a supplying device for supplying developer from the developer collection container to the developing apparatus, and having an opening communicating between the interior and exterior of the supplying device, the opening being located at a portion opposite to the outer peripheral surface of the developer collection container mounted on the mounting portion.

[0009] According to a second aspect of the invention, in the image forming apparatus based on the first aspect, the opening is provided in a form that extends axially along the developer collection container mounted on the mounted portion.

[0010] According to a third aspect of the invention, in the image forming apparatus based on the second aspect, the opening is provided from a relative position at one end of the developer collection container mounted on the mounted portion along the axial direction to a relative position at the other end of the developer collection container along the axial direction.

[0011] According to a fourth aspect of the invention, in the image forming apparatus based on any one of the first to third aspects, the openings are provided in a plurality of manner.

[0012] According to a fifth aspect of the present invention, in the image forming apparatus based on the fourth aspect, a plurality of openings are provided in such a manner that the developer collection container mounted on the mounted portion is positioned differently in the circumferential direction.

[0013] According to a sixth aspect of the invention, in the image forming apparatus based on any one of the first to fifth aspects, the opening is provided in a manner facing the side opposite to the side on which the developer collection container is set.

[0014] According to a seventh aspect of the present invention, an image forming apparatus is provided, comprising: an image holder; a developing apparatus for attaching developer to the image holder; and a supplying apparatus for supplying developer to the developing apparatus, and comprising an outlet for discharging developer, a circulation path, a connecting path, and an opening, wherein the circulation path is a path for circulating developer and for supplying new developer to a supplied portion therein; the connecting path is a path connected to the circulation path, extending from a connected portion (i.e., a connected portion) in the circulation path toward the outlet; the opening is for discharging gas from the supplying apparatus and is connected to the circulation path, being located downstream of the connected portion in the circulation path in the developer movement direction, and connected to a portion located upstream of the supplied portion in the developer movement direction.

[0015] According to an eighth aspect of the present invention, in the image forming apparatus based on the seventh aspect, the circulating flow path has a first straight section formed in a straight line for passing through developer toward the side where the connected portion is disposed, and a second straight section formed in a straight line for passing through developer toward the side opposite to the side where the connected portion is disposed, the supply portion being disposed in the first straight section, and the opening being connected to the second straight section of the circulating flow path.

[0016] According to a ninth aspect of the present invention, in the image forming apparatus based on the eighth aspect, the second linear portion of the circulation path has an end located on the side where the connected portion is provided, and an opposite end located on the side opposite to the side where the connected portion is provided, and the opening is connected to a portion of the second linear portion of the circulation path that is located upstream of the opposite end in the direction of development of the developer passing through the second linear portion.

[0017] According to a tenth aspect of the invention, in the image forming apparatus based on any one of the seventh to ninth aspects, the opening is disposed above the circulation path.

[0018] According to an eleventh aspect of the present invention, in the image forming apparatus based on the tenth aspect, a flow path is further provided that extends upward from the circulation flow path and is connected to the opening, and allows gas from the circulation flow path toward the opening to pass through.

[0019] According to a twelfth aspect of the present invention, an image forming apparatus is provided, comprising: an image holder; a developing apparatus that attaches a developer to the image holder; and a supplying apparatus that supplies a developer to the developing apparatus, and having a supply space, wherein a gas is supplied from the developing apparatus, a circulation path disposed around the supply space for circulating movement of the developer, and an opening for discharging the gas supplied to the supply space and connecting the interior and exterior of the supplying apparatus, wherein the gas in the supply space is discharged toward the opening and toward the exterior of the supplying apparatus without passing through the circulation path.

[0020] (Effect)

[0021] According to the first aspect, compared to the case where an opening is provided at the opposite position of the end face of the developer collection container where the developer is collected, it is easier to make the opening of the supply device for supplying developer to the developing apparatus larger, allowing the inside and outside to communicate.

[0022] According to the second aspect, compared to the case where the opening is not arranged in a manner that extends along the axial direction of the developer collection container, it is easier to achieve a larger opening.

[0023] According to the third aspect, the opening can be made larger compared to the case where the size of the axial opening of the developer collection container is smaller than the distance between one end and the other end in that axial direction.

[0024] According to the fourth aspect, the total area of ​​the openings can be larger compared to the case where the number of openings is odd.

[0025] According to the fifth aspect, multiple openings can be arranged in a staggered manner in the circumferential direction of the developer collection container.

[0026] According to the sixth aspect, compared to the case where the opening is arranged facing the side of the developer collection container, gas can be discharged from the opening more smoothly.

[0027] According to the seventh aspect, compared to a structure in which gas passing through the higher of a high concentration region and a low concentration region of developer from the inside of the supply device for supplying developer to the opening of the supply device, it is possible to reduce the amount of developer contained in the gas passing through the inside of the supply device to the opening of the supply device.

[0028] According to the eighth aspect, compared with the case where the opening and the first straight section of the circulation path are connected, it is possible to reduce the amount of developer contained in the gas toward the opening.

[0029] According to the ninth aspect, compared with the structure that connects the opposite ends of the opening and the second straight portion, it is possible to reduce the amount of developer contained in the gas toward the opening.

[0030] According to the tenth aspect, compared to the case where the opening is located below the annular flow path, it is possible to reduce the amount of developer contained in the gas flowing toward the opening.

[0031] According to the eleventh aspect, the gas can be moved toward an opening located above the annular flow path.

[0032] According to the twelfth aspect, compared to a structure in which gas passing through an opening in a developing apparatus from the inside of a supply device for supplying developer to the developing apparatus passes through a higher of the regions with high and low concentrations of developer, it is possible to reduce the amount of developer contained in the gas passing through the opening in the supply device from the inside of the supply device. Attached Figure Description

[0033] Figure 1This is a diagram showing an image forming apparatus;

[0034] Figure 2 This is a diagram showing the developing apparatus viewed from above.

[0035] Figure 3 yes Figure 2 A cross-sectional view of the developing apparatus at line III-III;

[0036] Figure 4 yes Figure 2 A cross-sectional view of the developing apparatus at line IV-IV;

[0037] Figure 5 yes Figure 2 A cross-sectional view of the developing apparatus at the VV line;

[0038] Figure 6 yes Figure 5 A cross-sectional view of the developing apparatus at line VI-VI;

[0039] Figure 7 This is a perspective view of the supply device as seen from the rear side of the image forming apparatus;

[0040] Figure 8 This is a diagram illustrating the developer accumulation zone;

[0041] Figure 9 (A) and (B) are diagrams showing the filling section and the gas flow path;

[0042] Figure 10 This is a three-dimensional view of the developer accumulation area observed from above.

[0043] Figure 11 This is an enlarged view of end A of the developer accumulation section;

[0044] Figure 12 This diagram shows the state where the upper component is installed on the lower container;

[0045] Figure 13 yes Figure 7 A cross-sectional view of the supply device at line XIII-XIII;

[0046] Figure 14 It is a cross-sectional view of the supply device at a plane orthogonal to the long side of the developer collection container;

[0047] Figure 15 It is a diagram showing the flow of gas when viewed from above the supply device;

[0048] Figure 16 This is a diagram showing another structural example of a supply device;

[0049] Figure 17This is a diagram illustrating the supply device according to the second embodiment;

[0050] Figure 18 (A) and (B) are diagrams illustrating the lower flow path;

[0051] Figure 19 This is a view of the developer accumulation section of the second embodiment from above;

[0052] Figure 20 yes Figure 17 A cross-sectional view of the supply device at line XX-XX;

[0053] Figure 21 (A) and (B) are diagrams representing the state of the cross-section;

[0054] Figure 22 This is a diagram showing the delivery status of the developer in the lower flow path;

[0055] Figure 23 yes Figure 22 A cross-sectional view of the lower flow path at XXIII-XXIII;

[0056] Figure 24 This is a diagram showing another structural example of the lower flow path;

[0057] Figure 25 This is a diagram showing another structural example of the lower flow path and the lower conveying component;

[0058] Figure 26 This is a diagram showing another structural example of the lower conveying component;

[0059] Figure 27 This is a diagram showing another structural example of a supply device;

[0060] Figure 28 This is a diagram showing another structural example of a supply device;

[0061] Figure 29 This is a diagram showing another structural example of a supply device;

[0062] Figure 30 This is a diagram showing another structural example of a supply device;

[0063] Figure 31 This is a diagram showing another structural example of a supply device;

[0064] Figure 32 This is a diagram showing another structural example of a supply device. Detailed Implementation

[0065] The embodiments of the present invention will now be described with reference to the accompanying drawings.

[0066] Figure 1 This is a diagram illustrating the image forming apparatus 100 of this embodiment. Figure 1 This indicates the state of the image forming apparatus 100 when viewed from the front side.

[0067] The image forming apparatus 100 is an image forming apparatus of the in-line transfer method.

[0068] The image forming apparatus 100 is provided with a plurality of image forming units 200. Each of the image forming units 200 forms an image that is transferred to a piece of paper P, which is a recording medium.

[0069] Each of the image forming units 200 has a photosensitive drum 11, which is an example of an image holder.

[0070] Each of the image forming units 200 uses a developer containing toner to form an image, i.e., a toner image, on the photosensitive drum 11 for transfer to the paper P. In other words, each of the image forming units 200 uses a powder-like developer to form a toner image on the photosensitive drum 11.

[0071] The developer in this embodiment consists of a dry carrier and a dry toner. Each of the image forming units 200 uses the carrier and the toner to form a toner image on the photosensitive drum 11.

[0072] Six image forming units 200 use different types of developers to form toner images on the photosensitive drum 11.

[0073] Four of the six image forming units 200 use developers of basic colors to form toner images. More specifically, the four image forming units 200 use yellow, magenta, cyan, and black developers to form toner images.

[0074] The remaining two image forming units 200 use developers other than the primary color to form toner images.

[0075] The remaining two image forming units 200 form a toner image, for example, using a developer such as transparent, white, gold, or silver. Alternatively, the remaining two image forming units 200 form a toner image, for example, using a developer such as pink, green, or orange.

[0076] In addition to the basic color developer, an example of a developer containing a magnetic toner can be given. Furthermore, an example of a developer containing a conductive toner can be given. Additionally, an example of a developer containing a toner that emits light upon exposure to ultraviolet or infrared light can be given.

[0077] Furthermore, in this embodiment, a so-called two-component developer, which is a mixture of a carrier and a toner, is used as the developer. Alternatively, a so-called one-component developer, consisting only of a toner, can also be used as the developer.

[0078] In addition, an intermediate transfer belt 15 is provided in the image forming apparatus 100. Furthermore, a primary transfer unit 10 is provided in the image forming apparatus 100. The toner image formed by each individual image in the image forming unit 200 is transferred onto the intermediate transfer belt 15 in the primary transfer unit 10.

[0079] Furthermore, a secondary transfer unit 20 is provided in the image forming apparatus 100. The toner image transferred on the intermediate transfer belt 15 is transferred onto the paper P in the secondary transfer unit 20.

[0080] In addition, the image forming apparatus 100 is provided with a fixing device 60 for fixing the toner image transferred onto the paper P onto the paper P.

[0081] Furthermore, the image forming apparatus 100 is equipped with a control unit 40 that has a CPU capable of executing programs. The control unit 40 controls various parts within the image forming apparatus 100.

[0082] Furthermore, a UI (User Interface) 45 is provided in the image forming apparatus 100. The UI 45 is composed of a display panel or the like. The UI 45 receives instructions from the user. In addition, the UI 45 displays information to the user.

[0083] Each of the image forming units 200 is provided with a developing device 14. In addition, each of the image forming units 200 is provided with a supply device 70.

[0084] The developing apparatus 14 causes the developer to adhere to the photosensitive drum 11. The supply device 70 supplies the developer to the developing apparatus 14.

[0085] When the developing apparatus 14 applies developer to the photosensitive drum 11, the electrostatic latent image on the photosensitive drum 11 becomes visible as an image through the toner. The developing apparatus 14 then develops the photosensitive drum 11, which serves as an image holder. As a result, an image composed of toner is formed on the photosensitive drum 11.

[0086] The supply unit 70 supplies new developer to the developing unit 14.

[0087] A developer collection container 80 is installed in the image forming apparatus 100. A supply device 70 delivers developer from the developer collection container 80 to the developing apparatus 14. Thus, developer is supplied to the developing apparatus 14.

[0088] As described above, the developer consists of a carrier and a toner. The supply device 70 supplies the carrier and toner to the developing device 14 as a developer. Furthermore, in this embodiment, the carrier has a positive polarity, and the toner has a negative polarity.

[0089] In each of the image forming units 200, the photosensitive drum 11, which is an example of an image holder, rotates in the direction of arrow A.

[0090] In addition, a charger 12 is provided in each of the image forming units 200. Furthermore, an exposure device 13 is provided in each of the image forming units 200.

[0091] Charger 12 charges photosensitive drum 11. Exposure device 13 forms an electrostatic latent image on photosensitive drum 11.

[0092] The exposure apparatus 13 is equipped with a light source such as an LED. The exposure apparatus 13 illuminates the photosensitive drum 11, forming an electrostatic latent image on the photosensitive drum 11.

[0093] In addition, a primary transfer roller 16 is provided in each of the image forming units 200. The primary transfer roller 16 is provided in the primary transfer unit 10. The primary transfer roller 16 is used for transferring the toner image from the photosensitive drum 11 to the intermediate transfer belt 15.

[0094] In addition, each of the image forming units 200 is provided with a drum cleaner 17 for removing developer residue on the photosensitive drum 11.

[0095] The intermediate transfer belt 15 is driven by the drive roller 31 to... Figure 1 Arrow B indicates that the movement is cyclical at a preset speed. The drive roller 31 is driven by a motor (not shown) and rotates counterclockwise in the figure.

[0096] The primary transfer section 10 is configured to include a primary transfer roller 16 that is positioned opposite to the photosensitive drum 11 while sandwiching an intermediate transfer belt 15. The toner image on the photosensitive drum 11 moves toward the intermediate transfer belt 15 in the primary transfer section 10. As a result, a toner image is formed on the intermediate transfer belt 15.

[0097] In the secondary transfer section 20, which is an example of a transfer section, a secondary transfer roller 22 is provided on the outer surface side of the intermediate transfer belt 15. In addition, a support roller 25 is provided on the inner surface side of the intermediate transfer belt 15 in the secondary transfer section 20.

[0098] In the secondary transfer section 20, the toner image formed on the intermediate transfer belt 15 is transferred to the paper P conveyed to the secondary transfer section 20.

[0099] In addition, a flipping mechanism 900 is provided to flip the paper P.

[0100] The flipping mechanism 900 flips the back of the paper P on which the toner image has been transferred on one side by the secondary transfer unit 20. Then, the flipping mechanism 900 supplies the secondary transfer unit 20 with the paper P that has been flipped back again.

[0101] Thus, the toner is formed on both sides of the paper P.

[0102] The flipping mechanism 900 feeds the paper P, which has passed through the fixing device 60, into the branch path R2, which branches off from the paper transport path R1.

[0103] After the paper P passes through the branch BP, the flipping mechanism 900 conveys the paper P in the opposite direction. Then, the flipping mechanism 900 feeds the paper P into the branch path R2.

[0104] Branch path R2 is upstream of the secondary transfer section 20 and merges with paper transport path R1. Therefore, the paper P fed into branch path R2 is re-supplyed to the secondary transfer section 20. The secondary transfer section 20 is then supplied with paper P again in a flipped-back state.

[0105] In this case, the toner image is formed not only on one side of paper P, but also on the other side. Thus, the toner image is formed on both sides of paper P.

[0106] The process of processing performed by the image forming apparatus 100 will be described.

[0107] The image forming apparatus 100 receives image data from, for example, an image reading device (not shown) or a computer. Then, image processing is performed on the image data within the image forming apparatus 100. This generates image data corresponding to each of the plurality of image forming units 200 provided.

[0108] Specifically, it generates image data corresponding to the four primary colors: yellow, magenta, cyan, and black. Additionally, it generates image data corresponding to colors other than the primary colors.

[0109] The generated image data is output to the exposure device 13 provided in the image forming unit 200.

[0110] The exposure device 13 illuminates the photosensitive drum 11 with light emitted from the light source based on the input image data.

[0111] Before being illuminated by light from the exposure apparatus 13, the surface of each photosensitive drum 11 is charged by the charger 12. After charging, the exposure apparatus 13 illuminates the surface with light. As a result, an electrostatic latent image is formed on the surface of the photosensitive drum 11.

[0112] Next, development is performed using the developing apparatus 14, where the toner contained in the developer adheres to the photosensitive drum 11. This forms a toner image on the photosensitive drum 11. This toner image is then transferred to the intermediate transfer belt 15 in the primary transfer section 10.

[0113] After the toner image is transferred onto the intermediate transfer belt 15, it moves toward the secondary transfer section 20 as the intermediate transfer belt 15 moves.

[0114] At this time, the paper P from the first paper receiving section 53 or the second paper receiving section 54 is conveyed to the secondary transfer section 20 by the conveyor roller 52, etc. Then, the toner image on the intermediate transfer belt 15 is electrostatically transferred onto the paper P in the secondary transfer section 20.

[0115] Subsequently, the paper P, with the toner image transferred onto it, is peeled off from the intermediate transfer belt 15 and conveyed to the conveyor belt 55. The conveyor belt 55 then conveys the paper P to the fixing device 60.

[0116] The paper P conveyed to the fixing unit 60 is heated and pressurized within the fixing unit 60. As a result, the toner image on the paper P is fixed onto the paper P. Then, the paper P is discharged from the image forming apparatus 100.

[0117] Furthermore, with toner images formed on both sides of the paper P, the paper P, after passing through the fixing device 60, is conveyed to the branch path R2. At this point, the paper P is in a state where a toner image is formed on one side. Afterward, the paper P passes through the secondary transfer unit 20 again.

[0118] In the secondary transfer section 20, a toner image is transferred to the other side of the paper P. Then, the paper P passes through the fixing device 60 again, where the toner image on the other side is transferred and fixed onto the paper P.

[0119] The developing apparatus 14 will be described.

[0120] Figure 2 This is a view of the developing apparatus 14 from above.

[0121] When the developing apparatus 14 is installed in the image forming apparatus 100, it is arranged along the depth direction of the image forming apparatus 100. The developing apparatus 14 has an end 141 and another end 142 that are located at different positions along its long side.

[0122] When the developing apparatus 14 is installed in the image forming apparatus 100, one end 141 is located on the rear side of the image forming apparatus 100. The other end 142 is located on the front side of the image forming apparatus 100.

[0123] A drive force receiving part 143 is provided at one end 141 of the developing apparatus 14 to receive drive force. Drive force from a drive source (not shown) such as an electric motor provided on the main body side of the image forming apparatus 100 is transmitted to the drive force receiving part 143.

[0124] The driving force receiving unit 143 is linked with a transfer member (described later) installed inside the developing apparatus 14. When a driving force from a driving source is transmitted to the driving force receiving unit 143, the transfer member rotates.

[0125] Figure 3 yes Figure 2 A cross-sectional view of the developing apparatus 14 at line III-III. Figure 3 The image shows the state of the cross-section of the central portion of the developing apparatus 14 along its long side.

[0126] The developing apparatus 14 is provided with a directional movement path 191 through which the developer moves in one direction.

[0127] Furthermore, the developing apparatus 14 is provided with a reverse direction movement path 192 through which the developer moves when it moves to the side opposite to the first direction. The reverse direction movement path 192 is positioned below the first direction movement path 191.

[0128] In one direction of the movement path 191, the developer moves towards... Figure 3 The developer moves in a direction perpendicular to the paper surface and towards the inside of the paper surface. Additionally, in the opposite direction movement path 192, the developer moves towards... Figure 3 It moves in a direction perpendicular to the paper and towards the front of the paper.

[0129] A directional conveying component 410 for conveying developer is provided in a directional movement path 191.

[0130] The unidirectional transport member 410 rotates about a rotation axis 411 extending along a unidirectional movement path 191. Through this rotation of the unidirectional transport member 410, the developer is directed towards... Figure 3 The paper moves in the inward direction.

[0131] A reverse-direction conveying component 420 for conveying developer is provided in the reverse-direction movement path 192. The reverse-direction conveying component 420 is positioned below the first-direction conveying component 410.

[0132] The opposite-direction conveying member 420 rotates around a rotating axis 421 extending along the opposite-direction movement path 192. As a result, the developer conveyed by the opposite-direction conveying member 420... Figure 3 The paper moves in the direction of the front side.

[0133] The developer is conveyed in the opposite direction to the one described above via the opposite direction conveying component 420.

[0134] Furthermore, a rotating body 430 is provided on the left side of the unidirectional conveying member 410. The rotating body 430 is used for supplying developer to the photosensitive drum 11, which is an example of an image holder.

[0135] Furthermore, a relative opening 480 is provided in the developing apparatus 14. The relative opening 480 is positioned relative to the photosensitive drum 11.

[0136] A rotating body 430 is provided in the relative opening 480. In this embodiment, a portion of the rotating body 430 is exposed through the relative opening 480.

[0137] The rotating body 430 supplies developer from the unidirectional conveying member 410 to the photosensitive drum 11. The rotating body 430 receives the developer from the unidirectional conveying member 410 and supplies the developer to the photosensitive drum 11.

[0138] The rotating body 430 is composed of a cylindrical body. The rotating body 430 is made of metal such as SUS.

[0139] The rotating body 430 rotates counterclockwise around the axis center 431. The rotating body 430 moves the developer supplied from the conveying component 410 and attached to its own outer peripheral surface to the photosensitive drum 11.

[0140] Therefore, a developer is supplied to the photosensitive drum 11, and the toner contained in the developer adheres to the surface of the photosensitive drum 11.

[0141] Furthermore, a first movement restriction portion 450 is provided between the rotating body 430 and the directional conveying member 410. The first movement restriction portion 450 restricts the movement of a portion of the developer that is to move from the directional conveying member 410 to the rotating body 430.

[0142] In this embodiment, a portion of the developer on the directional movement path 191 crosses the first movement restriction 450. In this embodiment, the developer that crosses the first movement restriction 450 is supplied to the rotating body 430.

[0143] In addition, a lower conveying component 440 is provided below the rotating body 430.

[0144] The lower conveying component 440 is a rotating component that rotates around an axis center 440A along the aforementioned direction. The lower conveying component 440 is positioned closer to the photosensitive drum 11 than the opposite-direction conveying component 420.

[0145] The lower conveyor 440 directs the developer that has detached from the rotating body 430 toward the... Figure 3 The paper is conveyed in a direction perpendicular to the paper surface and inwards.

[0146] The lower conveying member 440 conveys the developer that has detached from the rotating body 430 in one of the aforementioned directions. Thereby, the developer is supplied to one end of the conveying member 420 in the opposite direction (details to follow).

[0147] Furthermore, a second movement restriction part 452 is provided between the lower conveying member 440 and the opposite-direction conveying member 420. The second movement restriction part 452 restricts the movement of developer from the opposite-direction conveying member 420 to the lower conveying member 440.

[0148] Furthermore, a third movement restriction part 453 is provided between the rotating body 430 and the opposite-direction conveying member 420. The third movement restriction part 453 restricts the movement of developer from the opposite-direction conveying member 420 to the rotating body 430.

[0149] Furthermore, a fourth movement restriction part 454 is provided between the one-direction transmission member 410 and the opposite-direction transmission member 420.

[0150] The fourth movement restriction unit 454 restricts the movement of developer from the one-direction conveying member 410 to the opposite-direction conveying member 420. Additionally, the fourth movement restriction unit 454 restricts the movement of developer from the opposite-direction conveying member 420 to the one-direction conveying member 410.

[0151] Furthermore, a fifth movement restriction part 455 is provided between the rotating body 430 and the lower conveying member 440. The fifth movement restriction part 455 restricts the movement of developer from the lower conveying member 440 to the rotating body 430.

[0152] A magnetic roller 145B is provided inside the rotating body 430.

[0153] Five magnetic poles 121 to 125 are arranged circumferentially on the magnetic roller 145B.

[0154] Magnetic pole 121 is a pickup pole that attracts developer supplied from a moving path 191 in one direction. As a result, the developer adheres to the surface of the rotating body 430.

[0155] Magnetic poles 122-124 function as transfer poles. Magnetic poles 122-124 cause the developer on the surface of the rotating body 430 to move downstream in the rotation direction of the rotating body 430.

[0156] In the rotational direction of the rotating body 430, a relative limiting part 127 is provided on the downstream side of the magnetic pole 122 and the upstream side of the magnetic pole 123. The relative limiting part 127 is positioned relative to the outer peripheral surface of the rotating body 430.

[0157] The relative limiting part 127 is configured with a gap between it and the rotating body 430. The relative limiting part 127 restricts the movement of a portion of the developer adhering to the surface of the rotating body 430. As a result, the thickness of the developer adhering to the surface of the rotating body 430 becomes a predetermined thickness.

[0158] The developer on the surface of the rotating body 430 moves downstream in the rotation direction of the rotating body 430. Then, the developer moves toward the surface of the photosensitive drum 11, and the toner contained in the developer adheres to the photosensitive drum 11.

[0159] Thus, development is performed, forming a toner image on the surface of the photosensitive drum 11.

[0160] The toner image is temporarily held by the photosensitive drum 11. Then, the toner image is moved to the primary transfer section 10 (see reference 10) by the rotating photosensitive drum 11. Figure 1 Then, the toner is transferred onto the intermediate transfer belt 15.

[0161] Magnetic pole 125 (reference) Figure 3 It serves to remove magnetic poles. Magnetic pole 125 forms a repulsive magnetic field, causing the developer adhering to the surface of the rotating body 430 to detach from the rotating body 430.

[0162] The magnetic pole 125 causes the developer that has not been transferred onto the photosensitive drum 11 to detach from the rotating body 430.

[0163] The developer that detaches from the rotating body 430 moves downwards and reaches the lower movement path 193.

[0164] The developer that has reached the lower moving path 193 is conveyed by the lower conveying member 440 to one end 141 of the developing device 14 (see reference). Figure 2 The developer then moves to the opposite side. Next, it moves along path 192 in the opposite direction (details to follow).

[0165] Figure 4 yes Figure 2 A cross-sectional view of the developing device 14 at the IV-IV line.

[0166] exist Figure 4 The image shows the state of the cross-section at the other end 142 of the developing apparatus 14.

[0167] At the other end 142 of the developing apparatus 14, there is an upward movement path 196 arranged in the vertical direction. The developer that has moved along the opposite direction movement path 192 moves along the upward movement path 196 toward a direction movement path 191.

[0168] In this embodiment, the developer accumulates at the downstream end of the opposite-direction movement path 192, in the direction of developer movement. Furthermore, in this embodiment, the developer accumulated at this end is compressed by developer sequentially conveyed from the upstream side. Thus, the developer accumulated at this end moves upward through the upward movement path 196.

[0169] As a result, the developer moving along the opposite direction path 192 moves along the upper moving path 196 towards the one-way moving path 191.

[0170] Figure 5 yes Figure 2 A cross-sectional view of the developing device 14 at the VV line. Figure 6 yes Figure 5 A cross-sectional view of the developing apparatus 14 at line VI-VI.

[0171] exist Figure 5 The image shows the state of a cross-section at one end 141 of the developing apparatus 14.

[0172] like Figure 5 As shown, a downward movement path 197 is provided at one end 141 of the developing apparatus 14, which is arranged in the vertical direction.

[0173] The developer, which has moved along one direction path 191, moves along the lower path 197 and then moves in the opposite direction path 192.

[0174] Furthermore, in this embodiment, such as Figure 5 , Figure 6 As shown, a connection path 190 is provided. The connection path 190 extends horizontally, connecting the lower moving path 193 and the opposite moving path 192.

[0175] In this embodiment, the developer moves along the lower moving path 193 via the lower conveying member 440. Then, the developer moving along the lower moving path 193 moves in the opposite direction along the connecting path 190 to the moving path 192.

[0176] In this embodiment, the developer is stored in the downstream end of the lower movement path 193 in the direction of developer movement.

[0177] Furthermore, in this embodiment, the developer accumulated at this end is squeezed by the developer sequentially conveyed from the upstream side. As a result, the developer accumulated at this end moves in the opposite direction to the moving path 192 via the connecting path 190.

[0178] In this embodiment, the developer moves along a directional path 191 (see reference). Figure 3 The developer moves along a path 192 in the opposite direction. Thus, in this embodiment, the developer is cyclically moved.

[0179] Furthermore, in this embodiment, a portion of the developer moving in the directional movement path 191 is supplied to the rotating body 430. The developer is then supplied to the photosensitive drum 11 via the rotating body 430.

[0180] Developer residue remaining on the surface of the rotating body 430 that was not supplied to the photosensitive drum 11 detaches from the rotating body 430 and moves downward along the moving path 193. Then, the developer moves in the opposite direction along the moving path 192 after passing through the lower moving path 193.

[0181] Furthermore, in this embodiment, such as Figure 2 As shown, the developing apparatus 14 is provided with a first receiving port 151 for receiving developer. The developing apparatus 14 receives developer supplied from the supply device 70 through the first receiving port 151.

[0182] like Figure 5 As shown, the developer supplied from the supply device 70 enters the interior of the developing device 14 through the first receiving port 151.

[0183] In addition, in this embodiment, Figure 2 The portion indicated by reference numeral 2A in the attached drawing is provided with a second receiving port 152. This second receiving port 152 is blocked by a blocking member 153.

[0184] In this embodiment, the user can manually supply new developer to the developing apparatus 14 using a fixture (not shown).

[0185] When the user manually supplies new developer, the user first removes the blockage component 153. Then, the user supplies developer to the developing apparatus 14 through the second receiving port 152, which is made available by removing the blockage component 153.

[0186] Furthermore, in the developing apparatus 14 of this embodiment, such as Figure 3 As shown, a relative opening 480 is provided, and a rotating body 430 is provided in the relative opening 480.

[0187] In this embodiment, a first receiving port 151, a second receiving port 152, and a relative opening 480 are provided as openings.

[0188] In this embodiment, apart from the first receiving port 151, the second receiving port 152, and the opposing opening 480, no other openings are provided on the developing apparatus 14.

[0189] In the developing apparatus 14 of this embodiment, it is provided with an opening, namely a connection opening, that allows the interior and exterior of the developing apparatus 14 to communicate. In this embodiment, the connection opening is not provided on the developing apparatus 14 except for the first receiving port 151, the second receiving port 152, and the opposing opening 480.

[0190] In this embodiment, the internal pressure of the developing apparatus 14 is released from the opening provided in the supply device 70, rather than from the connection opening provided in the developing apparatus 14.

[0191] In this embodiment, the developer adhering to the surface of the rotating body 430 is not transferred to the photosensitive drum 11, but returns to the developing apparatus 14. At this time, air from outside the developing apparatus 14 is drawn into its interior. Consequently, the internal pressure of the developing apparatus 14 increases.

[0192] As the internal pressure of the developing apparatus 14 increases, gas tends to move from the inside of the developing apparatus 14 to the outside. In this embodiment, the gas tending to move from the inside of the developing apparatus 14 to the outside is directed toward the supply device 70 (see reference). Figure 1 ).

[0193] Furthermore, the gas passes through an opening provided in the supply device 70 (in Figure 1 (Not shown in the figure), it is discharged to the outside of the supply device 70. As a gas, for example, air can be discharged.

[0194] When the gas is discharged only through the connection opening provided in the developing device 14, it is easy to discharge the gas under high pressure.

[0195] In contrast, in this embodiment, gas is discharged through an opening provided in the supply device 70, which is separated from the developing apparatus 14. In this case, the gas, in a state of reduced pressure, is discharged through the opening.

[0196] When the gas pressure is relieved during discharge, the amount of developer that needs to move to the outside through the opening provided in the supply device 70 is reduced. In this case, the filter provided in the opening is less likely to be contaminated, thus extending the filter's lifespan.

[0197] Furthermore, providing a connection opening on the developing apparatus 14 is not excluded. It is also possible to provide a structure in which a connection opening is provided on the developing apparatus 14, and a further opening is provided on the supply device 70.

[0198] In this case, the gas inside the developing apparatus 14 is discharged to the outside of the developing apparatus 14 through the connection opening.

[0199] In addition, in this case, the gas inside the developing apparatus 14 is discharged to the outside of the developing apparatus 14 through the opening provided in the supply device 70.

[0200] Figure 7 This is a perspective view of the supply device 70 as seen from the rear side of the image forming apparatus 100. Figure 7 The image shows the state in which the developer collection container 80 is installed.

[0201] Unused developer is collected, for example, in the developer collection container 80. In this embodiment, the developer collection container 80 is relative to the image forming apparatus 100 (see reference 100). Figure 1 It is detachable. The developer collection container 80 is installed on the mounting part 701 of the supply device 70.

[0202] When the developer collection container 80 is installed into the image forming apparatus 100, the developer collection container 80 discharges into the image forming apparatus 100. Figure 7 Move in the direction indicated by arrow 7A.

[0203] The developer collection container 80 is formed in a cylindrical shape. Specifically, the developer collection container 80 is formed in a cylindrical shape. However, the shape of the developer collection container 80 is not limited to a cylindrical shape. The developer collection container 80 may also be formed in a prismatic shape.

[0204] When the developer collection container 80 is mounted on the image forming apparatus 100, the supply device 70 is located below the developer collection container 80. In this embodiment, the supply device 70 supplies developer to the developing apparatus 14 (in...) Figure 7 (Not shown in the figure) Developer is supplied from developer collection container 80.

[0205] The developer collection container 80 has one end 81 located at the front end when the developer collection container 80 is mounted on the image forming apparatus 100. In addition, the developer collection container 80 has another end 82 located on the opposite side of the first end 81.

[0206] A developer outlet is provided at one end 81 of the developer collection container 80 and below it. The developer in the developer collection container 80 moves through this outlet to the supply device 70 located below it.

[0207] The supply device 70 has one end 71 and the other end 72.

[0208] One end 71 of the supply device 70 is located on the rear side of the image forming apparatus 100. The other end 72 of the supply device 70 is located on the front side of the image forming apparatus 100.

[0209] A receiving port for receiving developer from the developer collection container 80 is provided at one end 71 of the supply device 70. Figure 7 (Not shown in the image).

[0210] In this embodiment, developer is delivered to the supply device 70 from an upstream side in the developer delivery direction. The supply device 70 is provided with a receiving port for receiving developer delivered from its upstream side.

[0211] The developer collection container 80 has the function of discharging the developer inside to the outside. Inside the developer collection container 80 is a component for discharging the developer to the outside.

[0212] In the developer delivery direction, the developer collection container 80 is located upstream of the supply device 70. The receiving port of the supply device 70 receives developer supplied from the developer collection container 80 located upstream.

[0213] In addition, a developer accumulation section 500 is provided on the supply device 70 to accumulate developer that enters the supply device 70 through the receiving port.

[0214] The developer supplied from the developer collection container 80 to the supply device 70 is temporarily collected in the developer accumulation section 500.

[0215] Developer is temporarily accumulated in developer accumulation section 500.

[0216] After the developer passes through the interior of the developer accumulation section 500 and moves, it is discharged from the outlet 74 provided at one end 71 of the supply device 70.

[0217] The supply device 70 is provided with a discharge port 74 for discharging developer received by the receiving port. The developer discharged from the discharge port 74 flows to the developing device 14 located below the discharge port 74. Figure 7 (Not shown in the diagram) Supply.

[0218] In this embodiment, a first receiving port 151 (see reference) is provided directly below the discharge port 74 of the supply device 70 and located in the developing device 14. Figure 2 ).

[0219] The developer discharged from the outlet 74 moves into the interior of the developing apparatus 14 through the first receiving port 151. This allows for the supply of developer from the supply device 70 to the developing apparatus 14.

[0220] The developer is temporarily collected in the developer accumulation section 500.

[0221] Therefore, even if the developer collection container 80 is removed, the developer can still be supplied from the supply device 70 to the developing device 14.

[0222] As the developer collection container 80 becomes empty, it is removed.

[0223] In this embodiment, even if the developer collection container 80 is removed, the developer in the developer accumulation section 500 is still supplied to the developing apparatus 14.

[0224] Therefore, even if the developer collection container 80 is removed, the developer can still be supplied from the supply device 70 to the developing device 14.

[0225] In this case, even if the developer collection container 80 is removed, the image forming operation can be prevented from stopping immediately. In this case, image forming can continue until a new developer collection container 80 is installed.

[0226] An opening 505 is provided on the supply device 70 to communicate between the inside and the outside of the supply device 70. The opening 505 is located at the opposite position to the outer peripheral surface 81A of the developer collection container 80 installed in the mounting part 701.

[0227] "Located in a relative position" refers to the state in which the opening 505 is located in a space relative to the outer peripheral surface 81A.

[0228] Even if there is a component between the opening 505 and the outer peripheral surface 81A, it conforms to the "located in opposite positions" rule. In addition, even if the opening 505 faces the opposite side to the side where the outer peripheral surface 81A is located, it conforms to the "located in opposite positions" rule.

[0229] Figure 8 This diagram illustrates the developer accumulation section 500.

[0230] The developer accumulation section 500 is provided with a developer flow path 510 for the developer to pass through towards the developing apparatus 14. The developer flow path 510 is provided in a form that extends from the inside of the developer accumulation section 500 to the outside.

[0231] A filling portion 511 is present in the developer flow path 510. In the filling portion 511, the entire cross-section of the developer flow path 510 is filled with developer.

[0232] In this specification, the “cross section” of the developer flow path 510 refers to the cross section of the developer flow path 510 in a plane orthogonal to the extending direction of the developer flow path 510.

[0233] A cylindrical portion 512 is provided around the filling portion 511. In this embodiment, the inner side of the cylindrical portion 512 is the filling portion 511.

[0234] In a cross section orthogonal to the axial direction of the cylindrical portion 512, the entire inner side of the cylindrical portion 512 is filled with developer.

[0235] As a result, the developer becomes dense in the cross section orthogonal to the axial direction of the cylindrical portion 512.

[0236] Therefore, in this embodiment, a filling portion 511 is formed inside the cylindrical portion 512, which is filled with developer.

[0237] In the structure that generates the filling portion 511, the amount of developer supplied from the supply device 70 to the developing device 14 per unit time is stabilized.

[0238] Without the filling portion 511, uneven distribution of developer towards the developing apparatus 14 is likely to occur. In this case, the amount of developer supplied from the supply device 70 to the developing apparatus 14 per unit time is prone to variation.

[0239] In the developer delivery direction, downstream of the filling portion 511, the developer changes direction via the flow path 510, moving downwards.

[0240] The developer flow path 510 is provided with a transverse flow path 513 extending in the transverse direction and a vertical flow path 514 extending in the vertical direction.

[0241] The developer that has passed through the filling portion 511 moves away from the filling portion 511 through the transverse flow path 513. Then, the developer moves downwards through the vertical flow path 514. The developer falls within the vertical flow path 514.

[0242] Below the vertical flow path 514, there is a discharge port 74 of the supply device 70 and a first receiving port 151 of the developing device 14. Developer is supplied to the developing device 14 through the vertical flow path 514.

[0243] In addition, a gas flow path 530 is provided for the gas flowing from the developing apparatus 14 to the supply apparatus 70. This gas flow path 530 is separate from the developer flow path 510.

[0244] In this embodiment, as described above, as the internal pressure of the developing apparatus 14 increases, gas flows from the developing apparatus 14 toward the supply device 70.

[0245] The gas flowing from the developing apparatus 14 to the supply apparatus 70 enters the interior of the supply apparatus 70 through the outlet 74.

[0246] The gas then flows upward through a vertical flow path 514, which is an example of a falling section. Next, the gas enters a gas flow path 530, which is branched from the developer flow path 510.

[0247] Gas entering the gas flow path 530 is directed toward an opening 505 provided in the supply device 70 and discharged from this opening 505. A filter 506 is provided in the opening 505. Figure 8 In the middle, an opening 505 is provided behind the filter 506.

[0248] Figure 9 (A) and (B) are diagrams representing the filling section 511 and the gas flow path 530.

[0249] Figure 9 (A) is a three-dimensional view of the filling section 511 and the gas flow path 530. Figure 9 (B) is from Figure 9 The diagram shows the direction indicated by arrow IXB in (A) when observing the filling section 511 and the gas flow path 530.

[0250] In this embodiment, as described above, and as... Figure 9 As shown in (A), a developer flow path 510 is provided. This developer flow path 510 extends from the inside of the developer accumulation section 500 toward the outside.

[0251] A filling portion 511 is present inside the cylindrical portion 512 on the developer flow path 510. Furthermore, a gas flow path 530 is provided above the cylindrical portion 512 in the figure. The gas flow path 530 is provided above the filling portion 511.

[0252] like Figure 8 As shown, the gas flow path 530 is arranged in the form of a branch from the developer flow path 510.

[0253] There is a branch 98, which is an example of a branch portion of the gas flow path 530 that branches off from the developer flow path 510. This branch 98 is located downstream of the filling portion 511 in the developer transport direction.

[0254] Downstream of the filling section 511 in the direction of developer transport, the gas flow path 530 branches off from the developer flow path 510.

[0255] After the gas flow path 530 branches off from the developer flow path 510, as follows: Figure 9 As shown in (A), above the filling portion 511.

[0256] Gas passing through gas flow path 530 passes above filling section 511. Gas passing through gas flow path 530 passes through the portion other than filling section 511 and moves upstream in the direction of developer movement.

[0257] In the filling portion 511, the developer becomes dense, making it difficult for gas to pass through. Therefore, in this embodiment, a gas flow path 530 for allowing gas to pass through is provided in a location other than the filling portion 511.

[0258] like Figure 8 As shown, the gas flow path 530 extends from the branch 98 toward the side where the cylindrical portion 512 is provided. The gas flow path 530 further passes above the cylindrical portion 512, toward the upstream side in the direction of developer movement.

[0259] Furthermore, as described later, the gas flow path 530 is reconnected to the internal space of the supply device 70. In other words, the gas flow path 530 enters the internal space of the supply device 70.

[0260] The gas flow path 530 is reconnected to the internal space of the supply device 70 on the upstream side of the filling section 511 in the direction of developer movement.

[0261] The gas flow path 530 is reconnected to the internal space of the supply device 70 at a location different from the branch 98.

[0262] In this embodiment, there is a branch 98 where the gas flow path 530 branches off from the developer flow path 510. The gas flow path 530 is reconnected to the interior space of the supply device 70 at a location different from this branch 98.

[0263] like Figure 9 As shown in (B), the gas from the developing apparatus 14 first passes through the vertical flow path 514, which is part of the developer flow path 510. The vertical flow path 514, which is part of the developer flow path 510, becomes a falling section for the developer to fall and move.

[0264] Gas from the developing apparatus 14 flows through the vertical flow path 514, which is an example of a falling section. The gas flows through the vertical flow path 514 towards the upstream side in the direction of developer movement.

[0265] The gas flowing from the developing apparatus 14 to the supply apparatus 70 passes through the developer flow path 510. Furthermore, the gas passing through the developer flow path 510 is directed upstream in the direction of developer movement.

[0266] A filling portion 511 is provided on the developer flow path 510. As described above, the filling portion 511 is filled with developer throughout the cross-section of the developer flow path 510.

[0267] Furthermore, the developer flow path 510 is provided with an up-down flow path 514, which is one example of a falling section.

[0268] The vertical flow path 514 is located downstream of the filling portion 511 in the direction of developer movement.

[0269] In this specification, the direction intersecting the perpendicular direction will sometimes be referred to as the "intersecting direction".

[0270] The filling portion 511 and the vertical flow path 514 are configured to have different positions in the intersection direction.

[0271] The developer that has passed through the filling portion 511 travels along the intersecting direction and reaches the vertical flow path 514. In the vertical flow path 514, the developer falls downwards.

[0272] The gas flowing from the developing unit 14 to the supply unit 70 first passes through Figure 9 The vertical flow path 514 shown in (B) faces upward.

[0273] Afterwards, the gas temporarily enters the transverse flow path 513 and then enters the gas flow path 530 located above the transverse flow path 513. Then, the gas moves to the left in the figure through the gas flow path 530.

[0274] like Figure 9 As shown in (B), the gas flow path 530 extends laterally. In other words, the gas flow path 530 extends in a cross direction. A laterally extending portion, namely a lateral portion 531, is provided in the gas flow path 530.

[0275] On the bottom surface of the horizontal portion 531, as Figure 9 As shown in (A), an inclination 532 is given relative to the horizontal direction. This inclination 532 is an inclination that rises in the upstream direction of the movement of gas through the gas flow path 530.

[0276] By applying an inclination 532 to the bottom surface, it becomes difficult for developer to accumulate there. The developer, placed at the inclination 532 portion of the bottom surface of the gas flow path 530, slides and moves. Thus, the developer... Figure 9Move (A) to the lower right.

[0277] The transverse flow path 513 is located on the downstream side in the lower right direction. The developer placed on the bottom surface of the gas flow path 530 moves into this transverse flow path 513.

[0278] In this embodiment, the cross-sectional area of ​​the vertical flow path 514, which is an example of the falling portion, is greater than [missing information]. Figure 9 The cross-sectional area of ​​the filling portion 511 shown in (B). In this embodiment, the cross-sectional area of ​​the vertical flow path 514 is more than 1.1 times the cross-sectional area of ​​the filling portion 511.

[0279] Therefore, the gas from the developing apparatus 14 can easily pass through the vertical flow path 514.

[0280] When the cross-sectional area of ​​the vertical flow path 514 is greater than the cross-sectional area of ​​the filling portion 511, the area occupied by the developer in the cross-section of the vertical flow path 514 becomes smaller.

[0281] In this case, compared to the case with the same cross-sectional area, the area occupied by the developer in the vertical flow path 514 becomes smaller. In this case, the gas from the developing apparatus 14 can easily pass through the vertical flow path 514.

[0282] like Figure 9 As shown in (B), in the direction intersecting the vertical direction, there is a space 571 between the filling portion 511 and the vertical flow path 514. This space 571 serves as a space for both the developer and the gas to pass through.

[0283] Developer moving from the filling portion 511 through the vertical flow path 514 passes through the space 571. Additionally, gas moving from the vertical flow path 514 towards the filling portion 511 also passes through the space 571.

[0284] In this embodiment, the cross-sectional area of ​​the space 571 is larger than the cross-sectional area of ​​the filling portion 511. Furthermore, the cross-sectional area of ​​the space 571 is larger than the cross-sectional area of ​​the vertical flow path 514.

[0285] The cross-sectional area of ​​space 571 refers to the cross-sectional area in an imaginary plane 9H along the vertical direction.

[0286] Furthermore, the cross-sectional area of ​​the filling portion 511 refers to the cross-sectional area of ​​the region located inside the inner circumferential surface of the cylindrical portion 512, i.e., the inner region. The cross-sectional area of ​​the filling portion 511 refers to the cross-sectional area of ​​the inner region in an imaginary plane orthogonal to the axial direction of the cylindrical portion 512.

[0287] Furthermore, in this embodiment, a central conveying component 526 having a rotating shaft 526A is provided in the filling portion 511.

[0288] In this case, the value obtained by subtracting the cross-sectional area of ​​the rotation shaft 526A is set as the cross-sectional area of ​​the filling portion 511. The value obtained by subtracting the cross-sectional area of ​​the rotation shaft 526A from the cross-sectional area of ​​the inner region is set as the cross-sectional area of ​​the filling portion 511.

[0289] Furthermore, details of the central transmission component 526 will be described later.

[0290] Figure 21 (A) and (B) are diagrams representing the state of the cross section.

[0291] Figure 21 (A) indicates the state of the cross-section of the filled portion 511. Furthermore, in Figure 21 In (A), the protrusion 526B of the central transmission component 526 is omitted.

[0292] Figure 21 (B) indicates the state of the cross section when the central transmission component 526 is not installed.

[0293] It is not necessary to provide a central conveying member 526 in the filling section 511. Without the central conveying member 526 in the filling section 511, the cross-sectional state of the filling section 511 becomes... Figure 21 The state shown in (B).

[0294] like Figure 21 As shown in (B), "the cross-sectional area of ​​the filling portion 511" basically refers to the cross-sectional area of ​​the inner region 572. More specifically, it refers to the cross-sectional area of ​​the inner region 572 in an imaginary plane orthogonal to the axis of the cylindrical portion 512.

[0295] The inner region 572 is the region located inside the inner circumferential surface 512A of the cylindrical portion 512 and surrounded by the inner circumferential surface 512A.

[0296] In contrast, such as Figure 21 As shown in (A), when a central conveying component 526 is provided, the cross-sectional area of ​​the rotating shaft 526A must also be considered.

[0297] With the central conveyor 526 provided, from the inner region 572 (see reference) Figure 21 The area of ​​(B) is subtracted from the cross-sectional area of ​​the rotation shaft 526A. Then, the value obtained by subtracting the cross-sectional area of ​​the rotation shaft 526A is set as the cross-sectional area of ​​the filling portion 511.

[0298] In this embodiment, the cross-sectional area of ​​the vertical flow path 514 is larger than the cross-sectional area of ​​the filling portion 511 obtained as described above.

[0299] Up-and-down flow path 514 (refer to Figure 9The cross-sectional area of ​​(B) refers to the cross-sectional area in an imaginary plane orthogonal to the extension direction of the vertical flow path 514. In this embodiment, the imaginary plane orthogonal to the extension direction of the vertical flow path 514 is called a horizontal plane. In this embodiment, the cross-sectional area of ​​the vertical flow path 514 refers to the cross-sectional area in the horizontal plane.

[0300] In other words, the cross-sectional area of ​​the vertical flow path 514 refers to the cross-sectional area in an imaginary plane orthogonal to the direction of developer movement. Here, "direction of movement" refers to the direction of developer movement through the vertical flow path 514.

[0301] In this embodiment, the vertical flow path 514 is a flow path along the vertical direction. However, it is not limited to this; the vertical flow path 514 may also be inclined relative to the vertical direction. The vertical flow path 514 also includes a flow path configured in an inclined state relative to the vertical direction.

[0302] Figure 10 This is a three-dimensional view of the developer accumulation zone at 500° from above. Figure 11 This is an enlarged view of one end 500A of the developer accumulation section 500.

[0303] exist Figure 10 The image shows the state of the developer accumulation section 500 when viewed from the other end 500B side of the developer accumulation section 500.

[0304] like Figure 10 As shown, a cuboid-shaped lower container 518 is provided in the developer accumulation section 500. The developer collection container 80 (in...) Figure 10 The developer supplied (not shown in the diagram) is first collected in the lower container 518.

[0305] Inside the lower container 518, there is a one-way conveying member 521 that conveys developer in one direction. In addition, inside the lower container 518, there is a reverse-direction conveying member 522 that conveys developer in the opposite direction.

[0306] The directional conveying component 521 and the opposite-directional conveying component 522 are arranged parallel to each other. In addition, the directional conveying component 521 and the opposite-directional conveying component 522 are arranged along the long side of the lower container 518.

[0307] In addition, a drive source (not shown) such as an electric motor is provided to drive the one-way conveying member 521. Furthermore, a drive source (not shown) such as an electric motor is provided to drive the opposite-way conveying member 522.

[0308] The unidirectional transmission component 521 is composed of a coil. In other words, the unidirectional transmission component 521 is constructed by bending a wire into a spiral shape.

[0309] A rod-shaped rotating shaft (not shown) is provided in the opposite direction conveying component 522. This rotating shaft is arranged in the form of a direction along the long side of the lower container 518.

[0310] Additionally, a protrusion 522A protruding from the outer peripheral surface of the rotating shaft is provided on the opposite direction conveying member 522. The protrusion 522A is arranged around the rotating shaft and is configured in a spiral shape.

[0311] Furthermore, the opposite direction transmission component 522 can also be configured as a transmission component made of coils, similar to the one-direction transmission component 521.

[0312] Alternatively, the one-way conveying member 521 can also be configured as a conveying member having a rotating shaft and a spiral protrusion, similar to the opposite-way conveying member 522.

[0313] Alternatively, both the one-way transmission component 521 and the opposite-way transmission component 522 can be configured as transmission components made of coils.

[0314] Alternatively, both the one-way conveying component 521 and the opposite-way conveying component 522 can be configured as conveying components having a rotating shaft and a spiral protrusion.

[0315] In this embodiment, the coil-shaped directional conveying member 521 rotates about a rotation axis along the axial direction of the directional conveying member 521. As a result, the developer gradually moves axially towards the directional conveying member 521.

[0316] More specifically, the developer moves toward one end 521A of the axial direction of the conveying member 521.

[0317] In addition, in this embodiment, the opposite direction conveying member 522 rotates around the rotation axis.

[0318] Thus, the developer is extruded through the protrusion 522A of the opposite-direction conveying member 522. Correspondingly, the developer moves axially toward the opposite-direction conveying member 522.

[0319] More specifically, the developer moves axially toward the other end 522B of the opposite-direction delivery component 522.

[0320] In addition, a flow path 541 is provided inside the lower container 518 for the developer to pass through when it moves in one direction.

[0321] In addition, the lower container 518 is provided with a flow path 542 for the developer to pass through when it moves in the opposite direction to the first direction.

[0322] One-way flow path 541 and opposite-way flow path 542 are arranged in a parallel manner. In addition, one-way flow path 541 and opposite-way flow path 542 are arranged along the long side of the lower container 518.

[0323] A directional conveying component 521 is disposed within a directional flow path 541. The developer conveyed by the directional conveying component 521 moves within the directional flow path 541.

[0324] An opposite-direction conveying member 522 is disposed within the opposite-direction flow path 542. The developer conveyed by the opposite-direction conveying member 522 moves within the opposite-direction flow path 542.

[0325] In addition, an end-side connection flow path 543 is provided.

[0326] An end-side connection flow path 543 is disposed inside an end 500A of the developer accumulation section 500 and the lower container 518. The end-side connection flow path 543 connects an end 541A of a directional flow path 541 and an end 542A of an opposite directional flow path 542.

[0327] In addition, a flow path 544 is provided on the other end side.

[0328] The other end side connection flow path 544 is disposed inside the other end 500B of the developer accumulation section 500 and the lower container 518. The other end side connection flow path 544 connects the other end 541B of the one-direction flow path 541 and the other end 542B of the opposite-direction flow path 542.

[0329] Moreover, such as Figure 10 As shown, an annular wall portion 550 is provided inside the lower container 518.

[0330] When viewed from above, the lower container 518 appears annular. Conversely, when viewed from above, the lower container 518 appears rectangular.

[0331] An annular wall portion 550 is disposed between a flow path 541 in one direction and a flow path 542 in the opposite direction. In addition, an annular wall portion 550 is disposed between a flow path 543 connected at one end and a flow path 544 connected at the other end.

[0332] like Figure 10 As shown, the annular wall portion 550 is provided in a form that protrudes upward from the bottom surface of the lower container 518. Furthermore, the annular wall portion 550 is provided in a form that runs along the long side of the lower container 518.

[0333] A directional flow path 541 and an opposite directional flow path 542 are provided around the annular wall portion 550. In addition, an end-side connecting flow path 543 and another end-side connecting flow path 544 are provided around the annular wall portion 550.

[0334] In this embodiment, the developer is conveyed by a directional conveying member 521 and an opposite-directional conveying member 522. The conveyed developer moves through the space surrounding the annular wall portion 550 within the lower container 518.

[0335] The developer, after passing through a directional flow path 541, reaches an end-side connection flow path 543. Then, the developer moves from the end-side connection flow path 543 to the opposite directional flow path 542. Next, the developer moves through the opposite directional flow path 542 to the other end-side connection flow path 544. Finally, the developer moves through the other end-side connection flow path 544 back to a directional flow path 541.

[0336] The developer is transported and moves around the annular wall portion 550 and circulates. In this embodiment, an annular circulation path 590 for the developer to circulate is provided around the annular wall portion 550.

[0337] As an example of a ring-shaped flow path, the circulating flow path 590 is composed of a directional flow path 541, an end-side connecting flow path 543, an opposite-directional flow path 542, and another end-side connecting flow path 544.

[0338] The developer conveyed by the directional conveying component 521 is directed toward one end 541A of the directional flow path 541.

[0339] Furthermore, the developer reaches one end 541A. Then, the developer is sequentially conveyed from the upstream side to the one end 541A via a directional conveying member 521.

[0340] The developer that reaches one end 541A is squeezed by the developer delivered from the upstream side. As a result, the developer that reaches one end 541A moves toward the one end side connecting flow path 543.

[0341] Then, the developer moves through one end side connection flow path 543 to the opposite flow path 542.

[0342] The developer that has moved to the opposite flow path 542 moves toward the other end 542B of the opposite flow path 542.

[0343] The developer that has moved to the opposite flow path 542 moves toward the other end 542B via the opposite direction conveying member 522. Thus, the developer reaches the other end 542B.

[0344] Then, the developer that reaches the other end 542B of the flow path 542 in the opposite direction connects to the other end side of the flow path 544.

[0345] In this embodiment, developer is sequentially conveyed from the upstream side to the other end 542B via the opposite-direction conveying member 522. The developer arriving at the other end 542B is compressed by the developer sequentially conveyed from the upstream side to the other end 542B.

[0346] Thus, the developer enters the other end side connection flow path 544. Afterwards, the developer reaches one direction flow path 541.

[0347] Therefore, in this embodiment, the developer moves around the annular wall portion 550. In other words, the developer moves along the circulation path 590. As a result, in this embodiment, the developer circulates.

[0348] The annular wall portion 550 is composed of four wall portions.

[0349] Two axial wall portions 551 are provided in the annular wall portion 550.

[0350] Two axial wall portions 551 are axially aligned with the axial direction of the conveying member 521. Additionally, the two axial wall portions 551 are axially aligned with the axial direction of the conveying member 522 in opposite directions.

[0351] Furthermore, the two axial wall portions 551 are arranged opposite to each other. Additionally, the two axial wall portions 551 are arranged in a parallel configuration.

[0352] In addition, such as Figure 11 As shown, an end sidewall portion 552 is provided in the annular wall portion 550. The end sidewall portion 552 is located at one end in the long side direction of the annular wall portion 550. The end sidewall portion 552 connects the two axial wall portions 551.

[0353] In addition, such as Figure 10 As shown, an annular wall portion 550 is provided with another end side wall portion 553. The other end side wall portion 553 is located at the other end in the long side direction of the annular wall portion 550. The other end side wall portion 553 connects the two axial wall portions 551.

[0354] In addition, such as Figure 11 As shown, an opening 507 for a gas flow path 530 is provided at one end 500A of the developer accumulation section 500. Gas from the developing apparatus 14 and gas that passes through the gas flow path 530 passes through this opening 507.

[0355] In addition, such as Figure 10 As shown, a wall portion 519 extending upwards is provided.

[0356] The wall portion 519 is disposed above a side wall 518A that extends along the long side of the lower container 518.

[0357] As one of the four side walls of the lower container 518, a side wall 518A is provided that extends along the long side of the lower container 518. A wall portion 519 is provided above this side wall 518A that extends along the long side of the lower container 518.

[0358] The wall portion 519 is provided in a form that extends along the long side of the lower container 518.

[0359] An opening 505 is provided in the wall portion 519 for discharging gas flowing from the developing apparatus 14. The opening 505 communicates the interior and exterior of the supply device 70.

[0360] Multiple openings 505 are provided. These multiple openings 505 are arranged along the long side of the lower container 518.

[0361] In addition, each opening 505 is mounted along the mounting portion 701 (see reference). Figure 7 The developer collection container 80 is arranged in the form of an axially extending portion.

[0362] Gas flow path 530 (reference) passed through Figure 11 The gas is eventually discharged from the opening 505 to the outside of the supply device 70.

[0363] like Figure 11 As shown, an inner space 556 is provided on the inner side of the annular wall portion 550.

[0364] In this embodiment, the gas flowing through the gas flow path 530 enters the inner space 556 of the wall as shown by arrow 11A.

[0365] Then, the gas passes through the space 556 within the wall and moves toward the developer accumulation section 500 (see reference). Figure 10 The other end, 500B side.

[0366] After that, as Figure 10 As indicated by arrow 10E, the gas flows in one direction towards path 541.

[0367] Next, as indicated by arrow 10F, the gas moves along the wall portion 519 toward the opening 505 formed in the wall portion 519. Then, the gas moves through the opening 505 toward the outside of the supply device 70.

[0368] like Figure 11 As shown, a filling portion 511, as described above, is provided at one end 500A of the developer accumulation portion 500.

[0369] Furthermore, a central conveying member 526 is provided through the filling portion 511. The central conveying member 526 is provided in the center of the lower container 518 in the direction of the short side of the lower container 518.

[0370] A central conveying component 526 is disposed between a directional conveying component 521 and a reverse directional conveying component 522. Furthermore, the central conveying component 526 is arranged along the long side of the lower container 518.

[0371] In addition, a drive source (not shown) such as an electric motor is provided to drive the central transmission component 526.

[0372] The central transmission component 526 has a rod-shaped rotating shaft 526A and a protrusion 526B.

[0373] The protrusion 526B is arranged around the rotation axis 526A and is configured in a spiral shape. In addition, the protrusion 526B is provided in a form that protrudes from the outer peripheral surface of the rotation axis 526A.

[0374] In this embodiment, the central conveying member 526 rotates around the rotation axis 526A via a drive source. As a result, developer is extruded through the protrusion 526B, and the developer moves axially toward the central conveying member 526.

[0375] In this embodiment, the developer in the flow path 543 at one end is fed into the filling portion 511 by the central conveying component 526.

[0376] The developer delivered by the directional conveying member 521 is stored in the flow path 543 connected at one end.

[0377] A space 94 (hereinafter referred to as "pre-filling space 94") is provided between the filling portion 511 and one end sidewall portion 552.

[0378] One end-side connection flow path 543 passes through the pre-fill space 94. The pre-fill space 94 stores the developer delivered by the one-way conveying member 521.

[0379] In this embodiment, the developer stored in the pre-filling space 94 is pressed into the filling portion 511 by the central conveying member 526.

[0380] Therefore, after the developer is filled in the filling section 511, the developer is supplied to the downstream side.

[0381] The developer that has passed through the filling portion 511 flows towards the transverse flow path 513 located downstream of the filling portion 511 (see reference). Figure 9 (B)). Then, the developer flows through the vertical flow path 514 toward the developing apparatus 14.

[0382] like Figure 10 As shown, the central conveying component 526 is disposed from one end to the other end in the long side direction of the lower container 518.

[0383] Furthermore, the central conveying component 526 is arranged to pass through the annular wall portion 550. In other words, the central conveying component 526 is arranged such that a portion of it is located within the space 556 of the wall portion.

[0384] like Figure 11 As shown, a groove 552A is formed on one end sidewall 552 of the annular wall portion 550. The central conveying component 526 passes through this groove 552A.

[0385] By providing an end sidewall portion 552, developer is prevented from entering the inner space 556 of the wall portion. More specifically, developer within the pre-fill space 94 is prevented from entering the inner space 556 of the wall portion.

[0386] In addition, such as Figure 10 As shown, an opening 553A is provided on the side wall portion 553 at the other end of the annular wall portion 550. The central conveying member 526 is provided to pass through this opening 553A.

[0387] In this embodiment, by providing another end sidewall portion 553, developer is prevented from entering the inner space 556 of the wall portion. More specifically, developer within the other end side connecting flow path 544 is prevented from entering the inner space 556 of the wall portion.

[0388] Figure 12 This diagram shows the state in which the upper component 561 is installed on the lower container 518.

[0389] In the supply device 70, an upper component 561 is mounted on the lower container 518.

[0390] The upper component 561 has a blocking portion 562. The blocking portion 562 is provided in a horizontally extending manner. The blocking portion 562 blocks a portion of the opening 518X located in the upper part of the lower container 518.

[0391] The upper component 561 also has a wall portion 563.

[0392] The wall portion 563 is connected to the blocking portion 562. The wall portion 563 is provided to extend upward from the blocking portion 562.

[0393] The wall portion 563 is provided opposite to the wall portion 519 provided on the lower container 518. A gap for gas to pass through is provided between the wall portion 563 and the wall portion 519.

[0394] In other words, a space for gas to pass through is provided between wall portion 563 and wall portion 519 (described later).

[0395] Gas passes through the developer accumulation section 500 (reference) Figure 11 ) has an opening 507 at one end 500A.

[0396] The gas that passed through opening 507, such as Figure 12 Move as shown by arrow 12A.

[0397] As indicated by arrow 12A, the gas passing through opening 507 passes through the gap between the lower container 518 and the upper component 561. Furthermore, the gas flows towards the other end 500B of the developer accumulation section 500.

[0398] Gas flow path 530 (reference) Figure 11 ) is located in the lower container 518 and the upper component 561 (in Figure 11 (Not shown in the diagram)

[0399] Gas passing through opening 507 flows through gas flow path 530 located between lower container 518 and upper component 561. Then, as... Figure 12 As indicated by arrow 12A, the gas is directed toward the other end 500B of the developer accumulation section 500.

[0400] After that, as Figure 11 As indicated by arrow 11A, gas enters the wall cavity 556. Then, the gas passes through the wall cavity 556 and moves towards the other end 500B of the developer accumulation section 500 (see reference). Figure 12 )side.

[0401] Then, the gas passes through the upper component 561 (see reference). Figure 12 The recess 561C on the lower surface of the ) is directed toward a flow path 541 in one direction.

[0402] Then, the gas moves through the space between the wall portion 563 and the wall portion 519 above the flow path 541.

[0403] Then, the gas flows upward through this space. Next, the gas flows through the opening 505 formed in the wall 519 (see reference). Figure 10 ), and move to the outside of the supply device 70.

[0404] Figure 13 yes Figure 7 A cross-sectional view of the supply device 70 at line XIII-XIII. Furthermore, in Figure 13 In the middle, the following was omitted. Figure 7 The diagram shows the developer collection container 80.

[0405] Reference Figure 13 The flow of gas in the supply device 70 will be further explained.

[0406] In this embodiment, firstly, from the developing apparatus 14 (in Figure 13 Gas (not shown) enters the supply device 70. Then, the gas flows upward through the vertical flow path 514, which forms part of the developer flow path 510.

[0407] Then, the gas flows through the gas flow path 530, which is provided in the form of a branch from the developer flow path 510, toward the other end 72 of the supply device 70.

[0408] The gas flow path 530 is reconnected to the internal space of the supply device 70 at the location shown by reference numeral 13A in the attached drawing.

[0409] Below the portion indicated by reference numeral 13A, there exists a portion located in the annular wall portion 550 (in Figure 13 The inner wall space 556 (not shown in the figure).

[0410] The gas flow path 530 is connected at the location indicated by reference numeral 13A to the inner space 556 of the wall portion located inside the annular wall portion 550. This inner space 556 is a space located inside the supply device 70.

[0411] The gas flows through the inner space 556 of the wall after passing through the flow path 530.

[0412] The wall space 556 is a space not located on the developer flow path 510. The wall space 556 is a space located at the part that is separated from the developer flow path 510.

[0413] The gas flow path 530 is connected to the portion of the internal space of the supply device 70 that is not the developer flow path 510, namely the inner wall space 556. Moreover, the gas flow path 530 passes through this inner wall space 556.

[0414] The space 556 inside the wall can be understood as the part that is not the developer flow path 510, i.e., the non-flow path part.

[0415] The gas flow path 530 is connected to the portion of the supply device 70 that is not the developer flow path 510, i.e., the non-flow path portion. Furthermore, the gas flow path 530 passes through this non-flow path portion.

[0416] In this embodiment, as part of the developer flow path 510, such as Figure 10 As shown, a circulating flow path 590 is provided.

[0417] In this embodiment, the gas flow path 530 can also be described as being connected to the surrounding space. In this embodiment, the gas flow path 530 passes through the surrounding space.

[0418] "Surrounded space" refers to the space within the supply device 70 that is surrounded by the circulation path 590. In this embodiment, the space within the wall 556 corresponds to this surrounded space.

[0419] The gas flow path 530 is connected to the internal space of the supply device 70, namely the internal space 556 of the wall.

[0420] The circulating flow path 590 is configured in an imaginary plane 850 extending along an intersecting direction that intersects the vertical direction (see reference). Figure 13 )superior.

[0421] like Figure 11 As shown by arrow 11A, the gas is connected to the inner space 556 from the upper side of the inner space 556 via a flow path 530.

[0422] The gas that enters the inner space 556 of the wall moves along the long side of the inner space 556 of the wall.

[0423] The gas flow path 530 passes through the inner space 556 of the wall. The gas flow path 530 is provided in a form that extends along the long side of the inner space 556. Therefore, the gas entering the inner space 556 moves along the long side of the inner space 556.

[0424] After passing through the inner space 556 of the wall via the gas flow path 530, the gas flows toward the recess 561C (see reference). Figure 12 Gas flows through gas path 530 toward the recess 561C.

[0425] Then, the gas flows through the upper part of the flow path 541 via the flow path 530, towards the opening 505 (see reference). Figure 10 After passing through the upper part of the directional flow path 541, the gas flows through the space between the wall portion 563 and the wall portion 519 and toward the opening 505.

[0426] The gas in the inner space 556 of the wall passes through the recess 561C (refer to) Figure 12 The gas then reaches the upper part of the directional flow path 541. Afterwards, the gas reaches the portion formed in the wall 519 (see reference). Figure 10 The gas then moves to the outside of the supply device 70 through the opening 505.

[0427] Figure 14 This is a cross-sectional view of the supply device 70 on a plane orthogonal to the long side of the developer collection container 80. Figure 14 In the diagram, the developer collection container 80 is represented by a dashed line.

[0428] The supply device 70 is provided with a protrusion 76 that extends obliquely upward and has an internal cavity. In this embodiment, the protrusion 76 is provided with an opening 505.

[0429] In this embodiment, a wall portion 519 is provided in the lower container 518. Additionally, a wall portion 563 is provided in the upper component 561.

[0430] In this embodiment, a protrusion 76 is formed by wall portion 519 and wall portion 563. Wall portion 563 and wall portion 519 protrude upwards. Furthermore, wall portion 563 and wall portion 519 are arranged in a mutually opposing relationship.

[0431] In this embodiment, a portion of the upwardly extending protrusion 76 is located next to the developer collection container 80.

[0432] The protrusion 76 has a facing surface 761 opposite to the developer collection container 80. In addition, the protrusion 76 has a facing surface 762 located on the opposite side of the facing surface 761.

[0433] An opening 505 is provided on the opposite side 762 of the multiple faces of the protrusion 76. The opening 505 is provided facing the side opposite to the side where the developer collection container 80 is located.

[0434] In this case, compared to the case where the opening 505 faces the setting side of the developer collection container 80, it is easier to discharge gas from the opening 505.

[0435] In addition, as described above, a filter 506 is provided at a position opposite to the opening 505.

[0436] The supply device 70 is provided with a receiving port 79A for receiving developer from the developer collection container 80. In addition, the supply device 70 is provided with a discharge port 74 for discharging developer.

[0437] The opening 505 provided on the protrusion 76 is positioned above the receiving port 79A. Furthermore, the opening 505 is positioned above the discharge port 74, which is positioned below the receiving port 79A.

[0438] Furthermore, the opening 505 is provided at a location where it separates from the developer flow path 510. A developer flow path 510 is provided within the developer accumulation section 500. The opening 505 is provided at a location where it separates from the developer flow path 510 within the developer accumulation section 500.

[0439] In addition, the filling portion 511 (in) Figure 14(Not shown in the figure) also constitutes part of the developer flow path 510. In addition, in the direction of developer movement, the portion located downstream of the filling portion 511 also constitutes part of the developer flow path 510.

[0440] The opening 505 is located at the part that is disconnected from the developer flow path 510.

[0441] Furthermore, the opening 505 is located above the uppermost portion of the developer flow path 510.

[0442] In this embodiment, the directional flow path 541 is the uppermost portion of the developer flow path 510. Additionally, the opposite directional flow path 542 is also the uppermost portion of the developer flow path 510. Furthermore, the filling portion 511 (in...) Figure 14 (Not shown in the diagram) also forms the uppermost part of the developer flow path 510. Furthermore, the transverse flow path 513 (in...) Figure 14 (Not shown in the diagram) This also forms the uppermost part of the developer flow path 510.

[0443] The opening 505 is located above the uppermost portion of the developer flow path 510.

[0444] The opening 505 provided on the protrusion 76 is an opening that allows the interior and exterior of the supply device 70 to communicate.

[0445] In the supply device 70, an opening 505 is provided separately from the receiving port 79A and the discharge port 74. Gas flowing from the developing device 14 is discharged to the outside of the supply device 70 through this opening 505.

[0446] Figure 15 This is a diagram showing the gas flow when viewed from above through the supply device 70. Figure 15 The illustration of the upper component 561, etc., is omitted in the text.

[0447] Gas flowing from the developing apparatus 14 enters the interior of the supply apparatus 70 through the outlet 74 provided in the supply apparatus 70. After entering the interior of the supply apparatus 70, the gas flows through the vertical flow path 514 and then enters the gas flow path 530.

[0448] Then, the gas flows through the gas flow path 530 toward the inner space 556 of the wall. Then, the gas flows through the inner space 556 of the wall toward the other end 72 of the supply device 70.

[0449] The gas flow path 530 is provided in the form of passing through the inner space 556 of the wall. Therefore, the gas passes through the inner space 556 of the wall and moves toward the other end 72 of the supply device 70.

[0450] No developer is transferred within the wall space 556. Therefore, the amount of developer within the wall space 556 is small.

[0451] Next, the gas flows from the inner space 556 of the wall toward a directional flow path 541. More specifically, the gas flows toward a portion of the directional flow path 541 other than one end 541A.

[0452] The gas flowing toward a directional flow path 541 is directed toward a portion of the directional flow path 541 located upstream of an end 541A. This "upstream side" refers to the upstream side in the direction of developer movement within the directional flow path 541.

[0453] In this embodiment, such as Figure 12 As shown, a recess 561C is provided on the lower surface of the upper component 561.

[0454] like Figure 15 As shown, a connecting flow path 594, which forms part of the gas flow path 530, is provided at the location where the recess 561C is provided. The connecting flow path 594 is a flow path that connects the inner space 556 of the wall and a one-way flow path 541.

[0455] like Figure 15 As shown, the connecting flow path 594 is connected to the central part 541C in the long side direction of a directional flow path 541.

[0456] In addition, such as Figure 15 As shown, the connecting flow path 594 is also connected to the other end portion 541T of the directional flow path 541. The other end portion 541T is the portion located on the other end 541B side, which is closer to the central portion 541C.

[0457] Therefore, the gas passing through the wall space 556 flows toward the central portion 541C when it flows toward one direction path 541. Additionally, the gas passing through the wall space 556 flows toward the other end portion 541T when it flows toward one direction path 541.

[0458] Then, the gas passes through protrusion 76 (see reference). Figure 14 The interior space of the protrusion 76 faces the opening 505 provided in the protrusion 76.

[0459] In one direction, flow path 541 (refer to) Figure 15 One end 541A stores the developer delivered by the directional conveying member 521. As a result, at this end 541A, the height of the upper surface of the developer increases.

[0460] It is also considered to allow the gas in the space 556 within the wall to pass over the opening 505 from the top of the end 541A. However, in this case, it is not easy for the gas to pass over the top of the end 541A.

[0461] In contrast, gas flows easily when it passes above the central portion 541C or above the other end portion 541T. In this case, gas flows easily when it passes through the lower part of the upper surface of the developer.

[0462] The central transmission component 526 is also located in the wall space 556.

[0463] As an example of a moving component, the central conveying component 526 moves the developer stored in the wall space 556.

[0464] Gas is supplied into the wall space 556 through the gas flow path 530. In this case, the developer contained in the gas is stored in the wall space 556.

[0465] The developer stored in the wall cavity 556 is transferred by the central conveying member 526 to the pre-filling space 94. The developer in the wall cavity 556 is discharged from the wall cavity 556.

[0466] The central conveying unit 526 conveys the developer within the inner space 556 of the wall section toward the pre-filling space 94 located on the developer flow path 510.

[0467] An end sidewall portion 552 is provided at one end of the long side of the inner space 556 of the wall (see reference). Figure 11 A groove 552A is provided on the side wall portion 552 at one end.

[0468] The developer, conveyed by the central conveyor 526, moves through the tank 552A into the pre-fill space 94.

[0469] In addition, the developer within the wall space 556 can also be directed to the space provided with Figure 10 The developer is conveyed to one side of the other end sidewall portion 553 shown. In this case, the developer moves to the other end side connection flow path 544 through the opening 553A provided in the other end sidewall portion 553.

[0470] Alternatively, the developer in the other wall space 556 can be transferred to both sides, one end side wall 552 and the other end side wall 553.

[0471] In this case, the central conveying component 526 is provided with two protrusions 526B that rotate in different directions.

[0472] The two types of protrusions 526B are described.

[0473] When two types of protrusions 526B are provided, firstly, one type of protrusion 526B is provided. One type of protrusion 526B is a protrusion that faces clockwise in one direction along the axial direction toward the central conveying member 526.

[0474] In addition, another type of protrusion 526B is provided. This other type of protrusion 526B is a protrusion that faces counterclockwise in one direction along the axial direction toward the central conveying member 526.

[0475] Additionally, a protrusion 526B is provided on the other end sidewall portion 553. Furthermore, on one end sidewall portion 552 (see reference...) Figure 11 Another protrusion 526B is provided on the side.

[0476] In this case, the developer passes through another protrusion 526B to an end sidewall portion 552 (see reference). Figure 11 ) lateral movement.

[0477] The developer located at the portion where another protrusion 526B is provided moves toward an end sidewall portion 552. Then, the developer moves toward the developer flow path 510.

[0478] Additionally, the developer passes through a protrusion 526B to the other end sidewall portion 553 (see reference). Figure 10 The developer located at the portion where a protrusion 526B is provided moves toward the other end sidewall portion 553. Then, the developer moves toward the developer flow path 510.

[0479] As an example of a moving component, the central conveying component 526 moves the developer within the wall space 556 toward the developer flow path 510. In other words, the central conveying component 526 moves the developer within the gas flow path 530 toward the developer flow path 510.

[0480] like Figure 13 As shown, the gas flow path 530 passes over the filling portion 511 and connects to the inner space 556 of the wall. Furthermore, the gas flow path 530 passes through the inner space 556 of the wall.

[0481] In this case, the gas containing the developer passes through the inner space 556 of the wall and stores the developer within the inner space 556.

[0482] The developer stored in the wall space 556 moves to the developer flow path 510 via the central conveying component 526.

[0483] The central conveying unit 526 is disposed not only in the developer flow path 510, but also in the gas flow path 530. As a result, the developer in the gas flow path 530 also moves.

[0484] like Figure 11 As shown, a portion of the central conveying component 526 is disposed within an end-side connection flow path 543 that constitutes part of the developer flow path 510.

[0485] In other words, a portion of the central delivery component 526 is disposed in the pre-fill space 94 located on the developer flow path 510.

[0486] In this embodiment, the developer in the developer flow path 510 is also moved through this part of the central conveying member 526.

[0487] A central conveying component 526 is provided from the wall interior space 556 to the developer flow path 510. The central conveying component 526 is configured to extend into the developer flow path 510.

[0488] In this embodiment, the developer within the developer flow path 510 is moved by the central conveying member 526. The central conveying member 526 moves the developer within the developer flow path 510 toward the filling portion 511.

[0489] In this embodiment, the developer located at two separate positions is moved by a central conveying unit 526.

[0490] In this embodiment, the developer within the wall space 556 is moved via a central conveying member 526. Additionally, the same central conveying member 526 is used to move the developer within the pre-filling space 94.

[0491] Furthermore, the way the developer moves is not limited to this.

[0492] For example, a dedicated moving component for moving the developer within the wall space 556 may be provided. Furthermore, a dedicated moving component for moving the developer within the pre-fill space 94 may be provided separately from this moving component.

[0493] In this embodiment, as part of the developer flow path 510, such as Figure 10 As shown, a loop flow path 590 is provided, which is formed in a ring shape.

[0494] The gas flow path 530 passes through the space inside the supply device 70 surrounded by the circulation flow path 590, which is called the surrounded space. As described above, the surrounded space corresponds to the inner space 556 of the wall.

[0495] The gas flow path 530 passes through the portion where the wall inner space 556 is provided. Furthermore, in this embodiment, the central conveying member 526 is provided in the wall inner space 556, which is an example of an enclosed space.

[0496] Reference Figure 9 (B) provides a further explanation of the central transmission component 526.

[0497] The central conveying member 526 has an inner cylindrical portion 526E located within the cylindrical portion 512. Additionally, the central conveying member 526 has an outer portion 526F located outside the cylindrical portion 512.

[0498] In the developer delivery direction, the outer portion 526F is located downstream of the inner portion 526E of the cylindrical portion. The outer portion 526F is located within the transverse flow path 513, which forms part of the developer flow path 510.

[0499] In this embodiment, the developer delivery capacity based on the outer portion 526F is greater than the developer delivery capacity based on the inner portion 526E of the cylindrical portion.

[0500] An upstream conveying section is provided in the filling portion 511, which conveys developer toward the side where the vertical flow path 514 is located. In this embodiment, the inner portion 526E of the cylindrical portion corresponds to this upstream conveying section.

[0501] Additionally, a downstream conveying section is provided on the downstream side of the filling portion 511 to convey the developer that has passed through the filling portion 511 towards the vertical flow path 514. In this embodiment, the outer portion 526F corresponds to this downstream conveying section.

[0502] In this embodiment, the developer delivery capacity of the outer portion 526F is greater than that of the developer delivery capacity of the inner portion 526E of the cylindrical portion.

[0503] In other words, in this embodiment, the developer conveying capacity of the downstream conveying unit is greater than that of the developer conveying unit of the upstream conveying unit.

[0504] A protrusion 526B is provided in the inner portion 526E of the cylindrical section that functions as an upstream conveying section. Additionally, a protrusion 526B is also provided in the outer portion 526F that functions as a downstream conveying section.

[0505] Hereinafter, the protrusion 526B provided in the inner portion 526E of the cylindrical portion will be referred to as the "inner protrusion". In addition, the protrusion 526B provided in the outer portion 526F will be referred to as the "outer protrusion".

[0506] In this embodiment, when comparing the outer diameter of the protrusion 526B, the outer diameter of the outer protrusion is larger than the outer diameter of the inner protrusion.

[0507] The inner portion 526E and the outer portion 526F of the cylindrical section are respectively provided with a rotating shaft 526A along the developer flow path 510.

[0508] In addition, extrusion sections for extruding developer are provided in the inner portion 526E and the outer portion 526F of the cylindrical section.

[0509] The extrusion section located in the inner portion 526E of the cylindrical section is composed of the aforementioned inner protrusion. The extrusion section located in the outer portion 526F is composed of the aforementioned outer protrusion.

[0510] The extrusion section is located around the rotating shaft 526A and is configured in a spiral shape.

[0511] The inner portion 526E and the outer portion 526F of the cylindrical section each use a protrusion 526B, which is an example of an extrusion section, to extrude developer. Through this extrusion, the developer is delivered.

[0512] Here, the size of the spacing between the internal protrusions provided in the inner portion 526E of the cylindrical section is defined as the spacing P1. Additionally, the size of the spacing between the external protrusions provided in the outer portion 526F is defined as the spacing P2.

[0513] In this specification, "configuration spacing" refers to the distance between protrusions that are adjacent to each other.

[0514] In this embodiment, the configuration spacing P2 is greater than the configuration spacing P1. More specifically, in this embodiment, the configuration spacing P2 is more than 1.1 times the configuration spacing P1.

[0515] Furthermore, in this embodiment, two adjacent internal protrusions are not provided in the inner portion 526E of the cylindrical portion.

[0516] In this case, the configuration spacing P1 is determined using an upstream protrusion 526B of an internal protrusion located in the inner portion 526E of the cylindrical portion.

[0517] In this case, the distance between the internal protrusion and one of the protrusions 526B located on the upstream side of the internal protrusion is set as the configuration spacing P1.

[0518] In this embodiment, the configuration spacing P2 is greater than the configuration spacing P1.

[0519] In this case, the developer transport speed in the transverse flow path 513 is greater than the developer transport speed in the cylindrical portion 512.

[0520] Here, the developer transport speed within the cylindrical portion 512 is defined as the "internal transport speed." Conversely, the developer transport speed within the transverse flow path 513 is defined as the "external transport speed." In this embodiment, the external transport speed is greater than the internal transport speed.

[0521] Additionally, the height of the upper surface of the developer located within the cylindrical portion 512 is defined as the "internal height". Furthermore, the height of the upper surface of the developer located in the transverse flow path 513 is defined as the "external height".

[0522] In this embodiment, the external height is smaller than the internal height.

[0523] As in this embodiment, when the external transmission speed is greater than the internal transmission speed, the external height is less than the internal height.

[0524] When the external height is less than the internal height, the height of the upper surface of the developer decreases compared to the case where the external height is not less than the internal height. Specifically, in the area where the external portion 526F is provided, the height of the upper surface of the developer decreases.

[0525] In this case, the developer located below the gas flow path 530 is less likely to enter the gas flow path 530. Moreover, in this case, the cross-sectional area of ​​the gas flow path 530 becomes larger.

[0526] In addition, when the external height is less than the internal height, the gas flows more easily in the vertical flow path 514 compared to the case where the external height is not less than the internal height.

[0527] When the external height is less than the internal height, the area occupied by the developer is reduced compared to the case where the external height is not less than the internal height. Specifically, the area occupied by the developer is reduced in the cross-section of the vertical flow path 514.

[0528] In this case, the gas flowing upwards through the vertical flow path 514 can flow easily.

[0529] Reference Figure 9 (B) provides a further explanation of the structure surrounding the gas flow path 530.

[0530] The gas flow path 530 has an upstream end 530C at its right end in the figure. The upstream end 530C is the end located at the upstream side in the direction of gas movement in the gas flow path 530.

[0531] The vertical flow path 514 has an upstream end 514D and a downstream end 514C.

[0532] The upstream end 514D and the downstream end 514C are located at different positions. The upstream end 514D and the downstream end 514C are located in different directions of gas movement in the gas flow path 530.

[0533] The upstream end 514D and the downstream end 514C are located at different radial positions in the vertical flow path 514.

[0534] In the direction of gas movement in the gas flow path 530, the upstream end 530C is located upstream of the downstream end 514C.

[0535] Here, the positions of the upstream end 530C of the gas flow path 530 and the downstream end 514C of the vertical flow path 514 are compared.

[0536] In this embodiment, the upstream end 530C is located upstream of the downstream end 514C. In the direction of gas movement in the gas flow path 530, the upstream end 530C is located upstream of the downstream end 514C.

[0537] exist Figure 9 In (B), the direction of gas movement in the gas flow path 530 is from... Figure 9 (B) is in the direction of right to left.

[0538] When the upstream end 530C is located upstream of the downstream end 514C, the gas flows more easily. This is in contrast to the case where the upstream end 530C is located downstream of the downstream end 514C.

[0539] For example, assume that the upstream end 530C of the gas flow path 530 is located at the position indicated by reference numeral 9X. That is, assume that the upstream end 530C is located downstream of the downstream end 514C of the vertical flow path 514.

[0540] In this situation, the flow path for gas becomes narrower, making it difficult for the gas to flow.

[0541] Conversely, when the upstream end 530C is located upstream of the downstream end 514C, the flow path for gas flow is expanded. In this case, the gas flows more easily.

[0542] Furthermore, the above description takes the case where the inner part 526E and the outer part 526F of the cylindrical section are composed of a common component as an example.

[0543] Specifically, an example is given where the inner portion 526E and the outer portion 526F of the cylindrical section are composed of a central transmission component 526.

[0544] However, it is not limited to this; the inner portion 526E and the outer portion 526F of the cylindrical section may also be provided separately. Components that perform the function of the inner portion 526E and the outer portion 526F may also be provided separately.

[0545] The size of the arrangement spacing P1 of the protrusions 526B provided in the inner portion 526E of the cylindrical section is compared with the size 9L of the inlet portion 514E. In other words, the size of the arrangement spacing P1 of the inner protrusions is compared with the size 9L of the inlet portion 514E.

[0546] "Inlet 514E" refers to the inlet of the vertical flow path 514. In addition, "size 9L of inlet 514E" refers to the size of the developer in the direction of movement when the developer from the filling portion 511 reaches the inlet 514E.

[0547] In this embodiment, the size 9L of the entrance portion 514E is greater than the size of the arrangement spacing P1 of the internal protrusions.

[0548] In this embodiment, the size 9L of the entrance portion 514E is more than 1.1 times the size of the arrangement spacing P1 of the internal protrusions.

[0549] Furthermore, in this embodiment, the separation distance between the downstream end 514C and the upstream end 514D is the same as that between size 9L.

[0550] As described above, there is a space 571 between the filling portion 511 and the vertical flow path 514, which is an example of a falling flow path. In the direction that intersects the vertical direction, i.e., the intersection direction, the space 571 is located between the filling portion 511 and the vertical flow path 514.

[0551] In this embodiment, both the developer and the gas pass through the space 571.

[0552] Developer moving from the filling portion 511 through the vertical flow path 514 passes through the space 571. Additionally, gas moving from the vertical flow path 514 towards the filling portion 511 passes through the space 571.

[0553] Let the cross-sectional area of ​​the space 571 and the cross-sectional area in the plane 9H along the vertical direction be defined as the cross-sectional area S1.

[0554] The cross-sectional area S1 is larger than the cross-sectional area of ​​the filling portion 511. In addition, the cross-sectional area S1 of the space 571 is larger than the cross-sectional area of ​​the vertical flow path 514.

[0555] In addition, the cross-sectional area S1 of space 571 is greater than the sum of the cross-sectional area of ​​filling portion 511 and the cross-sectional area of ​​vertical flow path 514.

[0556] Figure 16 This is a diagram showing another structural example of the supply device 70.

[0557] exist Figure 16 In the structural example shown, a moving component 800 is provided to move the developer stored in the gas flow path 530.

[0558] like Figure 16 As shown, in this embodiment, a portion of the gas flow path 530 is located above the filling portion 511 and above the transverse flow path 513. The gas flow path 530 has an upper portion located above the filling portion 511 and above the transverse flow path 513.

[0559] The moving component 800 moves the developer stored in the upper part of the gas flow path 530.

[0560] The movable component 800 is disposed in the upper portion of the gas flow path 530.

[0561] The movable component 800 includes a rotating shaft 801 that rotates via a drive source (not shown) such as an electric motor. Furthermore, the movable component 800 includes a protrusion 802. The protrusion 802 protrudes from the outer peripheral surface of the rotating shaft 801 and is configured in a spiral shape.

[0562] The gas passing through the upper portion of the gas flow path 530 contains developer. Therefore, the developer is stored in this upper portion of the gas flow path 530.

[0563] exist Figure 16 In the illustrated structural example, the moving component 800 rotates. As a result, the developer stored in the upper portion of the gas flow path 530 moves to the right in the figure. The developer moving to the right falls downwards and is supplied to the lower transverse flow path 513.

[0564] The moving component 800 moves the developer in the upper part to the transverse flow path 513, which is part of the developer flow path 510.

[0565] Refer again Figure 11 The structure of one end 500A of the developer accumulation section 500 will be further explained.

[0566] A limiting part 95 is provided above one end 541A of the directional flow path 541. The limiting part 95 is composed of a plate-shaped component. The limiting part 95 restricts the developer in the directional flow path 541 to face upward.

[0567] Developer is stored at one end 541A of the directional flow path 541. Accordingly, the height of the upper surface of the developer increases in this end 541A or in the pre-fill space 94.

[0568] In this situation, the developer can easily enter the gas flow path 530 located above the pre-fill space 94. In this situation, the gas may not flow easily in the gas flow path 530.

[0569] In contrast, when the limiting part 95 is provided, the upper surface of the developer in the pre-filling space 94 is less likely to face upwards. In this case, the developer is prevented from entering the gas flow path 530. As a result, gas can flow more easily in the gas flow path 530.

[0570] Furthermore, the restricting part 95 can be provided not only above one end 541A of the directional flow path 541, but also above the pre-filling space 94. In this case, a gas flow path 530 is provided above the restricting part 95.

[0571] [Second Implementation]

[0572] Figure 17 This figure illustrates the supply device 70 according to the second embodiment.

[0573] Below, with Figures 7 to 16 The implementation method shown is described focusing on the different parts of the first implementation method.

[0574] exist Figure 17 In the supply device 70 shown, the filling portion 511 is located at the other end 72 side of the supply device 70. In other words, the filling portion 511 is located on the front side of the image forming apparatus 100.

[0575] Furthermore, in this supply device 70, an intermediate flow path 581, which forms part of the developer flow path 510, is provided below the developer accumulation section 500.

[0576] In addition, a lower flow path 582, which constitutes another part of the developer flow path 510, is provided below the intermediate flow path 581.

[0577] An intermediate conveying component 631 for conveying developer within the intermediate flow path 581 is provided therein. A lower conveying component 632 for conveying developer within the lower flow path 582 is provided therein.

[0578] The intermediate conveying component 631 and the lower conveying component 632 each have a rotating shaft 633A. In addition, the intermediate conveying component 631 and the lower conveying component 632 each have a protrusion 633B.

[0579] The protrusion 633B protrudes from the outer peripheral surface of the rotating shaft 633A and is configured in a spiral shape. The protrusion 633B functions as an extrusion section for extruding developer.

[0580] Furthermore, the supply device 70 is provided with a drive source (not shown) for driving the intermediate conveying member 631 to rotate. Additionally, a drive source (not shown) is provided for driving the lower conveying member 632 to rotate.

[0581] In the second embodiment, the developer that has passed through the filling portion 511 flows toward the transverse flow path 513. Then, the developer reaches the intermediate flow path 581 located below the developer accumulation portion 500. Next, the developer passes through the intermediate flow path 581 and flows toward the lower flow path 582 located below the intermediate flow path 581.

[0582] Then, the developer flows through the lower flow path 582 toward one end 582A of the lower flow path 582.

[0583] Subsequently, the developer flows downward through a vertical flow path 514 extending downward from one end 582A of the lower flow path 582 toward the outlet 74.

[0584] In the second embodiment, a gas flow path 530 is provided at the location indicated by reference numeral 17A in the figure.

[0585] The gas flow path 530 is arranged in the same manner as described above, branching from the developer flow path 510.

[0586] Specifically, the gas flow path 530 is provided in the form of a branch from the intermediate flow path 581. The gas flow path 530 extends from the branch portion 581X that branches from the intermediate flow path 581 toward the developer accumulation portion 500 located above.

[0587] In the second embodiment, a portion extending in the vertical direction is provided in the gas flow path 530. In other words, a portion extending in the up-down direction is provided in the gas flow path 530.

[0588] Furthermore, the gas flow path 530 can also be configured in an inclined state relative to the vertical direction.

[0589] In the second embodiment, gas also enters the supply device 70 from the outlet 74.

[0590] Then, the gas passes through the downstream portion 586 of the developer flow path 510 and moves upstream in the direction of developer movement.

[0591] The gas flowing from the developing device 14 to the supply device 70 passes through the developer flow path 510 towards the upstream side in the direction of developer movement.

[0592] Here, "downstream portion 586" refers to the portion of the developer flow path 510 located downstream of the filling portion 511.

[0593] Here, we assume the direction of movement of the developer moving in the developer flow path 510.

[0594] "Downstream portion 586" refers to the portion located downstream of the filling portion 511 in the direction of movement.

[0595] In the second embodiment, the downstream portion 586 is composed of a transverse flow path 513 and a middle flow path 581. Additionally, the downstream portion 586 is composed of a lower flow path 582 and a vertical flow path 514.

[0596] The gas entering the supply device 70 from the outlet 74 is directed upstream in the direction of developer movement. The gas passes through the downstream portion 586 and is directed upstream in the direction of developer movement.

[0597] Then, the gas enters the gas flow path 530, which is branched from the downstream portion 586, and flows upward.

[0598] The gas flow path 530 is provided in the form of a branch from the intermediate flow path 581, which constitutes part of the downstream portion 586. Gas enters the gas flow path 530, which is provided in the form of a branch from the intermediate flow path 581, and flows upward.

[0599] Then, the gas enters the inner space 556 of the wall portion provided in the developer accumulation section 500.

[0600] Gas flow path 530 connects to the inner wall space 556 from the bottom side of one example of the surrounded space, namely the inner wall space 556. In other words, gas flow path 530 enters the inner wall space 556 from the bottom side.

[0601] After the gas enters the inner space 556 of the wall via the flow path 530, it flows to the left in the figure. Alternatively, after entering the inner space 556 of the wall via the flow path 530, it flows to the right in the figure.

[0602] In the second embodiment, the developer delivery capacity in the downstream portion 586 is greater than the developer delivery capacity in the filling portion 511.

[0603] A central conveying component 526 is provided in the filling section 511.

[0604] In the second embodiment, the developer transport capacity based on the intermediate transport member 631 is greater than the developer transport capacity based on the central transport member 526. Furthermore, the developer transport capacity based on the lower transport member 632 is greater than the developer transport capacity based on the central transport member 526.

[0605] Hereinafter, the protrusion 526B located within the filling portion 511 in the central conveying component 526 will be referred to as the "internal protrusion".

[0606] In the second embodiment, the outer diameter of the protrusion 633B provided in the intermediate conveying member 631 is larger than the outer diameter of the inner protrusion. Furthermore, the outer diameter of the protrusion 633B provided in the lower conveying member 632 is larger than the outer diameter of the inner protrusion.

[0607] Furthermore, the spacing between the protrusions 633B provided in the intermediate conveying member 631 is greater than the spacing between the internal protrusions. Additionally, the spacing between the protrusions 633B provided in the lower conveying member 632 is greater than the spacing between the internal protrusions.

[0608] Furthermore, the speed at which the developer moves in the filling portion 511 is referred to as the "filling portion moving speed". Additionally, the speed at which the developer moves in the downstream portion 586 is referred to as the "passage moving speed". In the downstream portion 586, the developer that has passed through the filling portion 511 moves at this passage moving speed.

[0609] In addition, in this specification, the speed at which the developer moves in the intermediate flow path 581 is referred to as the "intermediate section moving speed". Furthermore, the speed at which the developer moves in the lower flow path 582 is referred to as the "downstream section moving speed".

[0610] In the second embodiment, the moving speed after passing through is greater than the moving speed of the filling portion.

[0611] In the second embodiment, the moving speed of the middle section is greater than the moving speed of the filling section. Additionally, the moving speed of the downstream section is greater than the moving speed of the filling section.

[0612] Therefore, in the second embodiment, the height of the upper surface of the developer is reduced in the downstream portion 586. This allows gas to flow more easily from the downstream portion 586 towards the upstream side. The entire cross-section of the downstream portion 586 is filled with developer, without extending throughout the entire cross-section.

[0613] Furthermore, in the second embodiment, the transmission capacity based on the lower transmission member 632 is greater than the transmission capacity based on the middle transmission member 631.

[0614] Here, we compare the outer diameter of the protrusion 633B of the lower conveying member 632 with the outer diameter of the protrusion 633B of the middle conveying member 631.

[0615] In the second embodiment, the outer diameter of the protrusion 633B of the lower conveying member 632 is larger than the outer diameter of the protrusion 633B of the middle conveying member 631.

[0616] In addition, the arrangement spacing of the protrusions 633B of the lower conveying member 632 and the arrangement spacing of the protrusions 633B of the middle conveying member 631 are compared.

[0617] In the second embodiment, the arrangement spacing in the lower conveying member 632 is greater than the arrangement spacing in the middle conveying member 631.

[0618] In this case, the downstream section moves at a faster speed than the middle section. In this case, the height of the upper surface of the developer in the lower flow path 582 is further reduced. In this case, gas flows more easily towards the upstream side through the lower flow path 582.

[0619] In the second embodiment, the developer moving in the lower flow path 582 moves at a faster speed than the developer moving in the intermediate flow path 581. Furthermore, the developer moving in the intermediate flow path 581 moves at a faster speed than the developer moving in the filling portion 511.

[0620] In addition, the rotational speed of the intermediate conveying component 631 and the lower conveying component 632 can be greater than the rotational speed of the central conveying component 526.

[0621] Alternatively, the rotational speed of the lower conveying component 632 can be greater than that of the middle conveying component 631.

[0622] Alternatively, both the first and second settings can be configured as follows.

[0623] • First setting... to make the rotational speed of the lower conveyor 632 greater than the rotational speed of the middle conveyor 631.

[0624] • Second setting... to make the rotational speed of the intermediate transmission component 631 greater than the rotational speed of the central transmission component 526.

[0625] In the second embodiment, the gas entering the supply device 70 passes through the developer flow path 510 and moves upstream in the direction of developer movement. Then, the gas enters the gas flow path 530, which branches off from the developer flow path 510.

[0626] More specifically, the gas entering the supply device 70 passes through the downstream portion 586 and moves upstream in the direction of developer movement. Then, the gas enters the gas flow path 530, which branches off from the downstream portion 586.

[0627] Subsequently, the gas flows through the wall space 556 and a directional flow path 541 in the same manner as described above. Figure 17 (Not shown in the diagram) The upper part. Furthermore, gas passes through the protrusion 76 (in...) Figure 17The space inside (not shown in the diagram). Then, the gas reaches the opening 505 (in... Figure 17 (Not shown in the figure), it is discharged to the outside of the supply device 70.

[0628] Alternatively, it can be said that the supply device 70 is provided with a conveying section that conveys the developer in the flow path 510 to the downstream side.

[0629] As part of the conveying unit, a cylindrical inner portion 526E is provided, which is an example of an upstream conveying unit. As described above, the cylindrical inner portion 526E refers to the portion of the central conveying member 526 located inside the cylindrical portion 512.

[0630] In addition, as another part of the conveying unit, a lower conveying component 632 is provided, which is an example of a downstream conveying unit.

[0631] The inner portion 526E of the cylindrical section is located upstream in the developer transport direction. The lower transport member 632 is located downstream in the developer transport direction from the inner portion 526E of the cylindrical section.

[0632] The developer delivery capacity based on the inner portion 526E of the cylindrical section and the developer delivery capacity based on the lower delivery member 632 will be explained.

[0633] Hereinafter, the developer transport speed based on the inner portion 526E of the cylindrical section will be referred to as the "upstream transport speed". In addition, the developer transport speed based on the lower transport member 632 will be referred to as the "downstream transport speed".

[0634] In this embodiment, the developer conveying capacity based on the lower conveying member 632 is greater than the developer conveying capacity based on the inner portion 526E of the cylindrical section. In other words, in this embodiment, the downstream conveying speed is greater than the upstream conveying speed.

[0635] The inner part 526E of the cylindrical section and the lower conveying member 632 rotate around the rotation axis along the developer flow path 510 to convey the developer.

[0636] In this embodiment, the rotational speed of the lower conveying member 632 is greater than the rotational speed of the inner portion 526E of the cylindrical section. Therefore, in this embodiment, the downstream conveying speed is greater than the upstream conveying speed.

[0637] The inner portion 526E of the cylindrical section has a rotating shaft 526A. The rotating shaft 526A located within the filling portion 511 serves as a rotating shaft along the developer flow path 510.

[0638] The rotating shaft 526A, located within the filling portion 511, is arranged along the filling portion 511. Additionally, the inner portion 526E of the cylindrical section has a spiral protrusion 526B disposed around the rotating shaft 526A.

[0639] The inner portion 526E of the cylindrical section uses the protrusion 526B, which is an example of an extrusion section, to extrude and deliver developer. The inner portion 526E of the cylindrical section uses the protrusion 526B to deliver developer within the filling portion 511.

[0640] The lower conveying member 632 also has a rotation axis along the developer flow path 510. Specifically, the lower conveying member 632 has a rotation axis 633A along the lower flow path 582.

[0641] In addition, the lower conveying member 632 has a spiral protrusion 633B disposed around the rotating shaft 633A.

[0642] The lower conveying member 632 also uses the protrusion 633B, which is an example of an extrusion section, to extrude developer and convey developer.

[0643] The spacing between the protrusions 526B in the inner part 526E of the cylindrical portion is set as the spacing P3.

[0644] In addition, the arrangement spacing of the protrusions 633B of the lower conveying member 632 is set as the arrangement spacing P4.

[0645] In this embodiment, the size of the configuration spacing P4 is greater than the size of the configuration spacing P3.

[0646] Furthermore, in this embodiment, the rotational speed of the lower conveying member 632 is greater than the rotational speed of the inner portion 526E of the cylindrical section.

[0647] Furthermore, the outer diameter of the protrusion 526B in the inner portion 526E of the cylindrical section is set as outer diameter G1. Additionally, the outer diameter of the protrusion 633B in the lower conveying member 632 is set as outer diameter G2.

[0648] In this embodiment, the outer diameter G2 is larger than the outer diameter G1.

[0649] As a result, in this embodiment, the developer delivery capability based on the lower delivery member 632 is increased.

[0650] Here, the developer delivery capability based on the inner portion 526E of the cylindrical section is referred to as the filling portion delivery capability.

[0651] In this embodiment, the developer delivery capacity based on the lower delivery member 632 is greater than the filling portion delivery capacity.

[0652] In this embodiment, the developer delivery capability based on the lower delivery member 632 is more than 3.4 times the delivery capability of the filling portion.

[0653] When the ratio is set to 3.4 times or higher, it is easier to form a space for gas to pass through in the lower flow path 582 compared to the case where it is lower than 3.4 times. In this embodiment, when the ratio is set to 3.4 times or higher, the area occupied by the developer in the cross-sectional area of ​​the lower flow path 582 becomes less than 60%. In this case, gas can easily pass through the lower flow path 582.

[0654] "3.4 times or more" refers to the ratio of the amount of developer delivered per unit time.

[0655] Here, the amount of developer conveyed per unit time in the inner portion 526E of the cylindrical section is set to 1. In this embodiment, the amount of developer conveyed per unit time by the lower conveying member 632 is 3.4 or more.

[0656] In this embodiment, a branch portion 581X is provided downstream of the portion 526E located within the cylindrical section. "Downstream" refers to the side downstream of the developer transport direction.

[0657] Downstream of the location of the inner portion 526E of the cylindrical section, the gas flow path 530 branches off from the developer flow path 510.

[0658] In this embodiment, gas enters the supply device 70 through the outlet 74. Then, the gas flows upstream in the developer transport direction through the developer flow path 510. Afterward, the gas flows through the gas flow path 530.

[0659] The lower conveying member 632 has a downstream end 632G located in the developer conveying direction. The gas flow path 530 branches off from the developer flow path 510 on the upstream side in the developer conveying direction, which is closer to the downstream end 632G than the downstream end 632G.

[0660] In the area where the inner portion 526E of the cylindrical section is provided, developer is filled throughout the cross-section of the developer flow path 510. Developer is also filled in the filling portion 511 where the inner portion 526E of the cylindrical section is provided.

[0661] In this embodiment, the gas flow path 530 branches off from the developer flow path 510 on the downstream side of the portion containing the inner part 526E of the cylindrical section.

[0662] In this case, the gas entering the supply device 70 moves around the filling section 511, which is difficult for gas to pass through.

[0663] In the above description, the components constituting the upstream conveyor section and the downstream conveyor section are different. The component constituting the upstream conveyor section, i.e., the inner part 526E of the cylindrical section, is the central conveyor component 526. The component constituting the downstream conveyor section is the lower conveyor component 632.

[0664] In this embodiment, the central conveying component 526 and the lower conveying component 632 are different components.

[0665] Furthermore, not limited to this, we also consider making the components that constitute the upstream and downstream conveying sections into a single component.

[0666] It is also assumed that the downstream conveyor is provided on the extension line of the upstream conveyor. In this case, the components constituting the upstream and downstream conveyors can also be combined into one component.

[0667] When configured as a single component, the spacing between the protrusions of the downstream conveyor section is greater than the spacing between the protrusions of the upstream conveyor section. And / or, the outer diameter of the protrusions of the downstream conveyor section is greater than the outer diameter of the protrusions of the upstream conveyor section.

[0668] In this case, the developer delivery capacity of the downstream conveyor is improved. Furthermore, gas can also pass through the downstream conveyor more easily.

[0669] Here, Figure 9 The first embodiment shown in (B) can also be described as having an upstream conveying unit and a downstream conveying unit. Alternatively, the first embodiment can be described as having the components constituting the upstream and downstream conveying units as a single component.

[0670] exist Figure 9 In the first embodiment shown in (B), the inner portion 526E of the cylindrical section corresponds to the upstream conveying section. The outer portion 526F corresponds to the downstream conveying section.

[0671] exist Figure 9 In the first embodiment shown in (B), the developer conveying capacity of the downstream conveying unit is also greater than that of the developer conveying capacity of the upstream conveying unit.

[0672] exist Figure 9 In the first embodiment shown in (B), the components constituting the upstream conveying section and the downstream conveying section are combined into one component.

[0673] exist Figure 9 In the first embodiment shown in (B), a central conveying component 526 is provided as a component.

[0674] A portion of the central conveying component 526 becomes the inner cylindrical portion 526E, which functions as an upstream conveying section. Another portion of the central conveying component 526 becomes the outer portion 526F, which functions as a downstream conveying section.

[0675] exist Figure 17 In the second embodiment shown, as described above, a downstream portion 586 is provided. As described above, the downstream portion 586 refers to the portion of the developer flow path 510 located downstream of the filling portion 511.

[0676] Here, Figure 9 The first embodiment shown in (B) can also be said to have a downstream side portion 586.

[0677] In the first embodiment, the gas also passes through the downstream portion 586. The gas passes through this downstream portion 586 and moves upstream in the direction of developer movement.

[0678] In the first embodiment, as described above, gas first enters the supply device 70 from the outlet 74. Then, the gas passes through the downstream portion 586 and moves upstream in the direction of developer movement.

[0679] exist Figure 9 In the first embodiment shown in (B), the downstream portion 586 is composed of a transverse flow path 513 and a vertical flow path 514.

[0680] exist Figure 9 In the first embodiment shown in (B), the gas entering the supply device 70 from the outlet 74 also passes through the downstream portion 586. The gas passes through the downstream portion 586 and moves upstream in the direction of developer movement.

[0681] Then, the gas enters the gas flow path 530, which is set in the form of a branch from the downstream portion 586, and moves to the left in the figure.

[0682] Then, as described above, the gas reaches the inner space 556 of the wall (in Figure 9 (Not shown in (B)). Next, the gas reaches a directional flow path 541, and then reaches the space within the protrusion 76. After that, the gas flows toward the opening 505.

[0683] In the first embodiment, as described above, the components constituting the upstream conveying section and the downstream conveying section are combined into a single component. In the first embodiment, the upstream conveying section is the inner portion 526E of the cylindrical section. Furthermore, the downstream conveying section is the outer portion 526F.

[0684] In the first embodiment, as described above, the configuration spacing P2 is greater than the configuration spacing P1.

[0685] Configuration spacing P1 is the size of the configuration spacing of the internal protrusions provided in the inner portion 526E of the cylindrical part. Configuration spacing P2 is the size of the configuration spacing of the external protrusions provided in the outer portion 526F.

[0686] In the first embodiment, the conveying capacity of the downstream conveyor is also greater than that of the upstream conveyor. In the first embodiment, gas also easily passes through the location of the downstream conveyor.

[0687] right Figure 9 The first embodiment shown in (B) will be further described.

[0688] Hereinafter, the developer delivery capability based on the portion of the central delivery unit 526 located in the filling portion 511 will be referred to as the "filling portion delivery capability". In other words, the developer delivery capability based on the inner portion 526E of the cylindrical section will be referred to as the "filling portion delivery capability".

[0689] Furthermore, the developer delivery capability based on the downstream portion 586 of the central delivery unit 526 is referred to as "post-delivery capability". In other words, the developer delivery capability based on the external portion 526F is referred to as "post-delivery capability".

[0690] In the first embodiment, the transmission capacity after passing through is greater than the transmission capacity of the filling portion.

[0691] In addition, in the first embodiment, the moving speed after passing through is greater than the moving speed of the filling portion.

[0692] In this case, the height of the upper surface of the developer becomes lower in the transverse flow path 513 that forms part of the downstream side portion 586.

[0693] In this case, the cross-sectional area of ​​the gas flow path 530 located above the transverse flow path 513 becomes larger.

[0694] In the cross section of the transverse flow path 513, which forms part of the downstream side portion 586, developer is not filled throughout the entire cross section.

[0695] Furthermore, when the conveying capacity after passing through is greater than the conveying capacity of the filling section, the area occupied by the developer in the cross-section of the vertical flow path 514 becomes smaller. In this case, gas flows more easily in the vertical flow path 514.

[0696] Figure 18 (A) and (B) are diagrams illustrating the lower flow path 582.

[0697] Figure 18 (A) represents Figure 17A cross-sectional view of the lower flow path 582 of the XVIII-XVIII line. In other words, Figure 18 (A) is a diagram showing a cross-section of the downstream portion 586 of the developer flow path 510.

[0698] Figure 18 (B) is a diagram showing a cross-section of the lower flow path 582 with the lower conveying component 632 omitted.

[0699] like Figure 18 As shown in (A), a lower conveying member 632, which is another example of a moving member, is provided in the lower flow path 582.

[0700] The lower conveying member 632 rotates about a rotation axis 633A along the lower flow path 582. As a result, the developer in the lower flow path 582 moves downstream.

[0701] In this embodiment, such as Figure 18 As shown, the cross-sectional shape of the lower flow path 582 is non-circular.

[0702] like Figure 17 As shown, the lower flow path 582 extends laterally. In other words, the lower flow path 582 extends in a horizontal direction. In other words, the lower flow path 582 is arranged to extend in a direction intersecting the vertical direction.

[0703] The cross-section of the lower flow path 582 extending laterally becomes Figure 18 The state shown in (A).

[0704] In this embodiment, the upper left portion 582G protrudes in a direction away from the rotation axis 633A of the lower conveying member 632. The upper left portion 582G is located in the upper left of the outer periphery 582F of the lower flow path 582 in the figure.

[0705] When this part is configured as a raised section, it is easier to ensure the gas passage compared to when it is not configured as a raised section. In this case, the gas can move more easily in the lower flow path 582.

[0706] Furthermore, the protruding portion is not limited to the upper left portion 582G located on the upper left side of the outer periphery 582F of the lower flow path 582. The upper right portion 582H located on the upper right side may also be a protrusion in a direction away from the rotation axis 633A.

[0707] In addition, the upper left portion 582G and the upper right portion 582H can also be protrusions. In other words, these two portions can also be protrusions in a direction away from the rotation axis 633A of the lower conveying member 632.

[0708] Alternatively, the cross-sectional shape of the lower flow path 582 can be set to a U-shape. In this case, both the upper left portion 582G and the upper right portion 582H become protrusions.

[0709] exist Figure 18 In (B), a cross-section of the lower flow path 582 is shown with the lower conveying member 632 omitted from the illustration.

[0710] In the cross-section of the lower flow path 582, there is a region, namely the inner region 752, that is, the region inside the inner peripheral surface 582E of the lower flow path 582. The inner region 752 is the region located inside the inner peripheral surface 582E of the lower flow path 582 and surrounded by the inner peripheral surface 582E.

[0711] Here, we assume that the horizontal line 584H extends along the cross-section of the lower flow path 582 and passes through the rotation center 632C of the lower conveying member 632.

[0712] The horizontal line 584H is perpendicular to the extending direction of the lower flow path 582. Additionally, the horizontal line 584H is radially aligned with the lower flow path 582.

[0713] Furthermore, it is assumed that the portion of the inner region 752 located above the horizontal line 584H is the upper portion 752A. Additionally, it is assumed that the portion of the inner region 752 located below the horizontal line 584H is the lower portion 752B.

[0714] In this embodiment, the area of ​​the upper portion 752A is larger than the area of ​​the lower portion 752B.

[0715] In the cross-section of the lower flow path 582, a portion of the inner circumferential surface 582E of the lower flow path 582 protrudes in a direction away from the rotation center 632C. Specifically, a portion of the inner circumferential surface 582E located above the horizontal line 584H protrudes.

[0716] In this embodiment, the upper left portion 582G protrudes in a direction away from the rotation center 632C. At the location of the upper left portion 582G, a portion of the inner circumferential surface 582E protrudes in a direction away from the rotation center 632C.

[0717] In this embodiment, the area of ​​the upper portion 752A is larger than the area of ​​the lower portion 752B due to the protrusion of a portion of the inner peripheral surface 582E.

[0718] Figure 22 This is a diagram showing the delivery status of the developer in the lower flow path 582.

[0719] In the lower flow path 582, the developer is conveyed to one side in the width direction of the lower flow path 582. The width direction of the lower flow path 582 is synonymous with a direction orthogonal to the extension direction of the lower flow path 582 and parallel to the horizontal direction.

[0720] In this embodiment, the developer is conveyed to one side of the lower flow path 582 in the width direction. In this case, the upper surface of the developer is inclined in the cross-section of the lower flow path 582.

[0721] Figure 23 yes Figure 22 A cross-sectional view of the lower flow path 582 at XXIII-XXIII.

[0722] exist Figure 23 The image shows the portion of the protrusion 633B located below the rotation axis 633A in the lower conveying member 632. Hereinafter, the portion of the protrusion 633B located below it will be referred to as the "lower portion 633C".

[0723] The lower portion 633C is configured to be inclined axially and radially relative to the lower conveying member 632.

[0724] Additionally, the lower portion 633C, as it approaches the other side, is tilted in a manner that faces the downstream side in the direction of developer transport.

[0725] Furthermore, in this embodiment, the portion 633E located on the other side of the lower portion 633C is moved closer to one side via the lower part of the rotation axis 633A. In this embodiment, when the lower conveying member 632 rotates, the portion 633E located on the other side moves closer to one side.

[0726] In this case, the developer is delivered in a state on one side of the width direction of the lower flow path 582.

[0727] Refer again Figure 18 (B) continues the explanation.

[0728] The aforementioned protruding portion in the inner circumferential surface 582E of the lower flow path 582 is located on the other side in the width direction of the lower flow path 582. Furthermore, this portion is located above the horizontal line 584H.

[0729] in other words, Figure 18 The upper left portion 582G shown in (A) is located on the other side of the width direction of the lower flow path 582. In addition, the upper left portion 582G is located above the horizontal line 584H.

[0730] In this embodiment, the upper left portion 582G located on the other side protrudes in a direction away from the rotation center 632C.

[0731] like Figure 18 As shown in (A), a first gap 591 and a second gap 592 are further provided.

[0732] The first gap 591 is located between the outer periphery 632H of the lower conveying component 632 and the inner periphery 582E of the lower flow path 582. The second gap 592 is also located between the outer periphery 632H of the lower conveying component 632 and the inner periphery 582E of the lower flow path 582.

[0733] Here, as Figure 23 As shown, the projected surface 632X is assumed to be orthogonal to the axis of the lower conveying component 632.

[0734] Furthermore, assuming the lower conveyor member 632 and the lower flow path 582 are projected toward the projected surface 632X. In this case, the projection is performed axially toward the lower conveyor member 632 and toward the projected surface 632X.

[0735] In this embodiment, the projected surface 632X is in a state where the first gap 591 and the second gap 592 described above are generated.

[0736] like Figure 18 As shown in (A), the second gap 592 is larger than the first gap 591.

[0737] In the rotational direction of the lower conveying component 632, the positions of the first gap 591 and the second gap 592 are different.

[0738] The larger gap, the second gap 592, is located above the rotation center 632C of the lower conveying component 632. Furthermore, this second gap 592 is located above the horizontal line 584H (see reference). Figure 18 (B) is located at the top.

[0739] In contrast, Figure 18 The first gap 591, indicated by reference numeral 18A in (A), is located below the rotation center 632C of the lower conveying component 632.

[0740] Additionally, as indicated by reference numeral 18B, the first gap 591 is located below the rotation center 632C. The first gap 591, indicated by reference numeral 18B, is located above the rotation center 632C of the lower conveying member 632.

[0741] In contrast, the second gap 592 is located only above the rotation center 632C of the lower conveying component 632. In other words, the second gap 592 is located only above the horizontal line 584H.

[0742] exist Figure 18 In the structural example shown, as described above, the cross-sectional shape of the lower flow path 582 is non-circular. In other words, the shape of the inner circumferential surface 582E is non-circular.

[0743] In this embodiment, such as Figure 22 As shown, a portion of the inner peripheral surface 582E is in contact with the developer being transported. Hereinafter, the portion of the inner peripheral surface 582E in contact with the developer will be referred to as the contact portion 58X.

[0744] The developer does not cover the entire circumferential area of ​​the inner circumferential surface 582E. The developer only contacts a portion of the circumferential area of ​​the inner circumferential surface 582E, namely the contact portion 58X.

[0745] In this structural example, the contact portion 58X is given a shape that mimics the outer periphery 632H of the lower conveying member 632.

[0746] This prevents untransmitted developer from remaining between the contact portion 58X on the inner circumferential surface 582E and the outer circumferential portion 632H of the lower conveying member 632.

[0747] Assume that the contact portion 58X has a protrusion protruding in a direction away from the rotation center 632C. In this case, unconverted developer will remain at the location where the protrusion is provided.

[0748] In contrast, in this embodiment, the contact portion 58X is given a shape that mimics the outer periphery 632H of the lower conveying member 632. More specifically, the contact portion 58X of the inner peripheral surface 582E is given an arc shape.

[0749] This prevents the gap between the contact portion 58X and the outer periphery 632H of the lower conveying member 632 from widening. Consequently, it is less likely that developer will remain continuously between the contact portion 58X and the outer periphery 632H of the lower conveying member 632.

[0750] Figure 24 This is a diagram showing another structural example of the lower flow path 582.

[0751] In this structural example, the inner circumferential surface 582E of the lower flow path 582 is U-shaped.

[0752] In this structural example, with Figure 22 Compared to the conveying method shown, the upper surface of the conveyed developer is lower. In this case, another portion of the inner circumferential surface 582E located in the upper right of the figure can also protrude.

[0753] exist Figure 24In the structural example shown, it takes the form of having two protruding parts on the inner circumferential surface 582E. In this case, with Figure 22 Compared to the structural example shown, the area of ​​the flow path through which the gas passes is larger.

[0754] Figure 25 This is a diagram showing another structural example of the lower flow path 582 and the lower conveying component 632.

[0755] In this structural example, the diameter of the inner circumferential surface 582E is greater than... Figure 22 The diameter of the inner circumferential surface 582E shown.

[0756] Furthermore, in this structural example, the rotation center 632C of the lower conveying member 632 is located below the central portion 582C. In this structural example, the central portion 582C and the rotation center 632C are not arranged on a concentric axis.

[0757] "Central part 582C" refers to the central part in the radial direction of the inner circumferential surface 582E.

[0758] In this structural example, as described above, the area of ​​the upper portion 752A is larger than the area of ​​the lower portion 752B.

[0759] In this structural example, the developer located below the lower flow path 582 is conveyed downstream by the lower conveying member 632. Additionally, a space for gas passage is created above the lower flow path 582.

[0760] exist Figure 18 and Figure 24 The text describes a structural example where the shape of the inner circumferential surface 582E was studied. Additionally, in... Figure 25 The example illustrates a structure in which the positional relationship between the inner circumferential surface 582E and the lower conveying component 632 was studied.

[0761] In addition, research can be conducted on the lower conveying component 632 to ensure space for gas to pass through.

[0762] Figure 26 This is a diagram showing another structural example of the lower conveying component 632.

[0763] In this structural example, a flow path 633U for allowing gas to pass through is provided in the lower conveying member 632. The flow path 633U is located at the center of the radial direction of the rotation axis 633A of the lower conveying member 632. Furthermore, the flow path 633U is provided to extend axially along the rotation axis 633A.

[0764] In this structural example, gas from the developing apparatus 14 moves through the flow path 633U formed on the rotating shaft 633A. The gas flows through the flow path 633U towards the upstream side in the direction of developer transport.

[0765] Alternatively, a through hole or notch may be formed in the protrusion 633B provided on the lower conveying member 632. More specifically, a through hole or notch may be formed to connect the surface and back surface of the protrusion 633B.

[0766] In this case, the gas passes through the through hole or notch and moves upstream in the direction of developer delivery.

[0767] Figure 19 This is a view of the developer accumulation section 500 of the second embodiment from above.

[0768] In the second embodiment, the gas flow path 530 extends from below the inner space 556 of the wall towards the inner space 556. Furthermore, the gas flow path 530 is connected to the bottom 556A of the inner space 556.

[0769] An opening 556B is provided at the bottom 556A for allowing gas to pass through the flow path 530.

[0770] Gas flow path 530 enters the inner space 556 from the bottom 556A side of the inner space 556. Specifically, gas flow path 530 enters the inner space 556 through opening 556B. Moreover, gas flow path 530 faces the long side of the inner space 556.

[0771] Gas enters the inner space 556 of the wall through gas flow path 530. Gas enters the inner space 556 from the bottom 556A of the inner space 556. Gas enters the inner space 556 through opening 556B.

[0772] Then, the gas moves along the long side of the inner space 556 of the wall.

[0773] Then, the gas, in the same manner as described above, flows above the directional flow path 541 towards the protrusion 76 (in... Figure 19 The interior space (not shown in the diagram).

[0774] Then, after the gas passes through the internal space, it is discharged from the opening 505 provided on the side of the protrusion 76 to the outside of the supply device 70.

[0775] As described above, the gas flow path 530 from below the wall interior space 556 toward the wall interior space 556 passes through the opening 556B. The gas flow path 530 passes from below the opening 556B toward the opening 556B and through the opening 556B.

[0776] Gas enters the inner space 556 from the bottom 556A of the inner space 556 via the flow path 530.

[0777] After passing through opening 556B, the gas flow path 530 flows in the left-right direction shown in the figure. The portion of the gas flow path 530 flowing in this left-right direction passes through the inner space 556 of the wall.

[0778] The developer is gradually stored in the portion of the gas flow path 530 within the wall space 556. The developer is moved away from the opening 556B by a central conveying member 526, which is an example of a moving member.

[0779] exist Figure 19 In the structural example shown, the developer stored on the right side of opening 556B moves to the right in the diagram. Additionally, the developer stored on the left side of opening 556B moves to the left in the diagram.

[0780] The central conveying component 526 is provided with two protrusions 526B that rotate in different directions.

[0781] One of the two types of protrusions 526B is provided on the left side of the opening 556B in the figure. The other type of protrusion 526B is provided on the right side of the opening 556B in the figure.

[0782] As a result, the developer located on the right side of the diagram compared to aperture 556B and the developer located on the left side of the diagram compared to aperture 556B move in opposite directions.

[0783] In this structural example, the developer located on the right side of the diagram, relative to opening 556B, faces to the right. Conversely, the developer located on the left side of the diagram, relative to opening 556B, faces to the left, opposite to the right direction.

[0784] The developer moving towards the right in the diagram moves outward from the inner space 556 of the wall. Specifically, the developer moving towards the right in the diagram moves towards the circulation path 590.

[0785] Additionally, the developer directed to the left in the diagram also moves outward from the inner space 556 of the wall. Specifically, the developer directed to the left in the diagram also moves towards the circulation path 590.

[0786] Furthermore, in this embodiment, the central conveying member 526 is also positioned relative to the opening 556B. Consequently, the developer stored in the opening 556B also moves to the right and left of the opening 556B.

[0787] Figure 20 yes Figure 17A cross-sectional view of the supply device 70 at line XX-XX. Figure 20 The image shows one end 71 of the supply device 70 (see reference). Figure 17 )Observe the status of the supply device at 70.

[0788] In the second embodiment, a developer flow path 510 is also provided below the developer collection container 80. Developer from the developer collection container 80 flows through this developer flow path 510.

[0789] In the second embodiment, a portion of the developer flow path 510 is located at a point directly below the developer collection container 80. Specifically, a portion of the directional flow path 541, indicated by reference numeral 20A, is located at a point directly below the developer collection container 80.

[0790] Furthermore, in this structural example, an upwardly extending protrusion 76 is provided above the flow path 541 in one direction.

[0791] and Figures 7 to 16 The first embodiment shown is the same. Figure 20 The space inside the protrusion 76 shown is connected to a directional flow path 541.

[0792] In the second embodiment, a portion of the developer flow path 510 is located at a point directly below the developer collection container 80. In the second embodiment, an upwardly extending protrusion 76 is provided above this portion.

[0793] This part is the portion of the directional flow path 541 that separates from the developer collection container 80 directly below.

[0794] Similarly, the interior of the protrusion 76 is a cavity. There is space inside the protrusion 76 for gas to pass through.

[0795] Gas reaching the upper part of the directional flow path 541 passes through the space inside the protrusion 76. Furthermore, the gas flows towards the opening 505 located on the side of the protrusion 76. And, the gas is discharged from this opening 505 to the outside of the supply device 70.

[0796] In this embodiment, the gas flow path 530 eventually reaches the opening 505. The gas that has passed through the gas flow path 530 is finally discharged from the opening 505.

[0797] The opening 505 provided on the protrusion 76 is provided on the opposite side 762 in the same manner as described above.

[0798] The protrusion 76 has a facing surface 761 opposite to the developer collection container 80 and a facing surface 762 located on the opposite side of the facing surface 761. An opening 505 is provided on the facing surface 762 of the protrusion 76.

[0799] The opening 505 is located above the wall space 556, which is an example of a non-flow path portion.

[0800] The supply device 70 is provided with an opening 505 for discharging gas supplied to the inner space 556 of the wall via a gas flow path 530. In this embodiment, gas is discharged to the outside of the supply device 70 through this opening 505.

[0801] Figure 27 , Figure 28 This is a diagram showing another structural example of the supply device 70. Figure 28 From Figure 27 The diagram shows the supply device at position 70, with arrow XXVIII pointing in the direction indicated.

[0802] In this structural example, such as Figure 27 As shown, multiple openings 505 are provided.

[0803] Multiple openings 505 are arranged in the same manner as described above on the opposite side of the outer peripheral surface 81A of the developer collection container 80 mounted on the mounting part 701.

[0804] Multiple openings 505 are arranged in a manner in which the positions of the developer collection container 80 in the circumferential direction are different from each other.

[0805] In addition, such as Figure 28 As shown, multiple openings 505 are respectively arranged in a manner that extends along the axial direction of the developer collection container 80.

[0806] In addition, such as Figure 28 As shown, the openings 505 are respectively set from the relative position of one end 81 to the relative position of the other end 82.

[0807] Here, one end 81 refers to one end of the developer collection container 80 in the axial direction. In addition, the other end 82 refers to the other end of the developer collection container 80 in the axial direction.

[0808] In this case, the area of ​​the opening 505 becomes larger compared to the case where the length of the opening 505 is less than the distance between one end 81 and the other end 82.

[0809] Alternatively, the openings 505 can be configured such that a portion of the openings 505 are positioned relative to each other from one end 81 to the other end 82. Furthermore, the length of the other openings 505 can be shorter than the length of the portion of openings 505.

[0810] Similarly, as mentioned above, Figure 27 As shown, the openings 505 are respectively oriented to the opposite side from the side where the developer collection container 80 is located. In addition, filters 506 are respectively provided in the openings 505.

[0811] Alternatively, it can be configured to have multiple openings 505 all facing the opposite side of the developer collection container 80, other than a configuration where such openings are not present.

[0812] For example, it can also be configured such that only a portion of the multiple openings 505 face the opposite side. Furthermore, the other openings 505 can also face the side where the developer collection container 80 is located.

[0813] Furthermore, the number of openings 505 is not limited to three; it can also be one or two. Alternatively, it can be set to four or more.

[0814] In this embodiment, as described above, the opening 505 is configured as follows: "The opening 505 is positioned relative to one end 81 and relative to the other end 82."

[0815] This configuration also includes a configuration in which multiple openings 505 are arranged side by side from the relative position of one end 81 to the relative position of the other end 82.

[0816] It is not limited to the way in which a single opening 505 is set from the relative position of one end 81 to the relative position of the other end 82.

[0817] like Figure 7 As shown, sometimes multiple openings 505 are arranged side by side along the axial direction of the developer collection container 80. It is also possible to configure the multiple openings 505 in such a way that their relative positions at one end 81 are set to their relative positions at the other end 82.

[0818] In addition, Figure 27 In the structural example shown, a plurality of openings 505 are provided between one end 70C and the other end 70D.

[0819] One end 70C and the other end 70D are the ends of the supply device 70. In the width direction of the supply device 70, the positions of one end 70C and the other end 70D are different from each other.

[0820] With this structure, it is easy to miniaturize the supply device 70.

[0821] Consider the case where some or all of the multiple openings 505 are located at a point detached from one end 70C and the other end 70D. Compared to this case, Figure 27The structure shown makes it easy to miniaturize the supply device 70.

[0822] Here, the positions of the supply device 70 in the width direction are compared. Figure 27 In the illustrated structural example, a plurality of openings 505 are located on the side of the other end 70D closer to the first end 70C. Furthermore, a plurality of openings 505 are located on the side of the first end 70C closer to the second end 70D.

[0823] exist Figure 27 In the structural example shown, all openings 505 are located on the side closer to the other end 70D than one end 70C. Additionally, all openings 505 are located on the side closer to one end 70C than the other end 70D.

[0824] Here, one end 70C refers to the portion furthest from the other end 70D in the width direction of the supply device 70. Conversely, the other end 70D refers to the portion furthest from one end 70C in the width direction of the supply device 70.

[0825] In addition, the width direction of the supply device 70 is orthogonal to the axis of the developer collection container 80, and is the same as the direction along the horizontal direction.

[0826] like Figure 27 As shown, a cover member 901 is provided on the upper part of the inner space 556 of the wall, which is an example of an enclosed space. An opening 901A is provided on the cover member 901.

[0827] In addition, a flow path 901B is provided that is connected to the opening 901A.

[0828] The flow path 901B is connected to the opening 505 located on the upper side of the developer collection container 80. Additionally, the flow path 901B is connected to the opening 505 located on the right side of the developer collection container 80.

[0829] Flow path 901B passes through developer collection container 80 (refer to) Figure 17 The relative position of the end face 89A is set in the form of the form.

[0830] Below, in this instruction manual, the developer collection container 80 (refer to...) will be... Figure 27 The opening 505 on the upper side of the developer collection container 80 is called the upper opening 505. The opening 505 located on the right side of the developer collection container 80 is called the right opening 505. The opening 505 located on the left side of the developer collection container 80 is called the left opening 505.

[0831] exist Figure 27 In the structural example shown, gas moves from the inner space 556 of the wall to the outside of the inner space 556 through the opening 901A.

[0832] Gas moving to the outside of the wall space 556 flows through the flow path 901B toward the upper opening 505 and the right opening 505.

[0833] Gas flowing toward the upper opening 505 does not pass through the circulation path 590, but flows toward the upper opening 505. Similarly, gas flowing toward the right opening 505 also does not pass through the circulation path 590, but flows toward the right opening 505.

[0834] Then, the gas is discharged to the outside of the supply device 70 through the upper opening 505 and the right opening 505.

[0835] Furthermore, the gas from the wall interior space 556 toward the left opening 505 follows the same path as described above. That is, the gas toward the left opening 505 passes above the flow path that forms part of the circulation flow path 590 and then toward the left opening 505.

[0836] Figure 29 This is a diagram showing another structural example of the supply device 70.

[0837] In this structural example, multiple openings 505 are provided only at relative positions on the small-diameter portion of the developer collection container 80. The diameter of one end 81 of the developer collection container 80 is smaller than the diameter of the other end 82.

[0838] exist Figure 29 In the structural example shown, multiple openings 505 are provided only at the relative positions of the small diameter portion, i.e., one end 81, of the developer collection container 80.

[0839] When the opening 505 is positioned relative to one end 81, which is the smaller diameter portion, the opening 505 is located close to the axis of the developer collection container 80. In this case, compared to the case where the opening 505 is positioned relative to the other end 82, which is the larger diameter portion, it is easier to miniaturize the supply device 70.

[0840] Furthermore, when multiple openings 505 are provided, all openings 505 may be provided only at the relative position of one end 81, which is the small diameter portion.

[0841] Alternatively, only a portion of the multiple openings 505 may be provided at a relative position on one end 81. Regarding other openings 505, for example, as described above, they may be provided from a relative position on one end 81 to a relative position on the other end 82. Furthermore, regarding other openings 505, for example, they may be provided at a relative position on the other end 82, which is a large-diameter portion.

[0842] Figure 30 This is a diagram showing another structural example of the supply device 70.

[0843] Figure 30 This shows the state of the cross-section of the supply device 70 in the horizontal plane. More specifically, it shows the state of the cross-section of the supply device 70 in the horizontal plane that cuts through the wall space 556.

[0844] exist Figure 30 The supply device 70 shown also has a discharge port 74 for discharging developer.

[0845] Furthermore, a circulation path 590, which forms part of the developer flow path 510, is provided similarly to the above. In this structural example, the developer also circulates along the circulation path 590.

[0846] In this structural example, the portion indicated by reference numeral 30A in the circulation path 590 is designated as the supply portion 626. Above the supply portion 626 is a receiving port (not shown) for receiving developer from the developer collection container 80.

[0847] New developer from developer collection container 80 is supplied to the supply section 626 in circulation flow path 590.

[0848] In addition, Figure 30 In the structural example shown, the position of the supply part 626 is different from that in the embodiment described above.

[0849] In the embodiments described above, for example, by Figure 10 The part indicated by reference numeral 10X in the attached drawing is called the supplied part 626.

[0850] exist Figure 10 In the embodiment shown, a supply section 626 is provided in the flow path on the left side of the figure.

[0851] From the image forming apparatus 100 (reference) Figure 1 In the case of viewing from the front and side, Figure 10 In the flow path on the left, a supply section 626 is provided. Specifically, the supply section 626 is provided in the flow path 542 located on the left in the opposite direction.

[0852] In contrast, Figure 30 In the structural example shown, a supply portion 626 is provided in the flow path located on the right side. When viewed from the front side of the image forming apparatus 100, the supply portion 626 is provided in the flow path located on the right side.

[0853] There are no particular restrictions on the location of the supplied part 626. The supplied part 626 can be located in the flow path on the left or in the flow path on the right.

[0854] exist Figure 30 In the structural example shown, a flow path 628 is provided that is connected to the circulating flow path 590.

[0855] The connecting flow path 628 is connected to the circulating flow path 590 in the connected part 629.

[0856] The connecting flow path 628 extends from the connected portion 629 of the circulating flow path 590 to the outlet 74.

[0857] The connecting flow path 628 consists of a filling portion 511, a transverse flow path 513, and an intermediate flow path 581 (in Figure 30 (Not shown in the diagram). In addition, the connecting flow path 628 is composed of the lower flow path 582 and the vertical flow path 514.

[0858] The developer in the circulation path 590 flows toward the outlet 74 through the connecting path 628.

[0859] In addition, an opening 505 for discharging gas from the supply device 70 is provided in the same manner as described above. This opening 505 is connected to the circulation path 590 in the same manner as described above.

[0860] In the circulation path 590, there is a portion, namely the first portion 596, where a large amount of developer is delivered. Additionally, in the circulation path 590, there is a portion, namely the second portion 597, where a small amount of developer is delivered.

[0861] The first part 596 is located downstream of the supplied part 626 and upstream of the connected part 629 in the direction of developer movement.

[0862] The second part 597 is located upstream of the supplied part 626 and downstream of the connected part 629 in the direction of developer movement.

[0863] The "direction of developer movement" here refers to the direction of developer movement in the circulation path 590.

[0864] The developer supplied to the supply portion 626 must pass through the first portion 596. Furthermore, a portion of the developer that has passed through the first portion 596 flows toward the connecting flow path 628. The remaining developer that does not flow toward the connecting flow path 628 is supplied to the second portion 597.

[0865] In this case, in the first part 596, the amount of developer delivered increases. In the second part 597, compared to the first part 596, the amount of developer delivered decreases.

[0866] Opening 505 is connected to the second portion 597 in the circulation path 590. Opening 505 is connected to the second portion 597 in the circulation path 590 where a small amount of developer is delivered.

[0867] In this embodiment, the gas entering the second part 597 through the opening 556B does not pass through the first part 596 but is directed toward the opening 505.

[0868] "The connection between opening 505 and second part 597" can also be described as the way in which the gas in second part 597 moves toward opening 505 without passing through first part 596.

[0869] A first linear portion 691 is provided in the circulation path 590. Developer flowing toward the side where the connection portion 629 is provided passes through this first linear portion 691.

[0870] Additionally, a second linear portion 692 is provided in the circulation path 590. Developer flowing toward the side opposite to the side where the connected portion 629 is located passes through this second linear portion 692.

[0871] The supply portion 626 is provided in the first straight section 691. The opening 505 is connected to the second straight section 692.

[0872] The second straight section 692 constitutes a part of the second part 597 described above.

[0873] The second straight portion 692 has an end portion 692A located on the side where the connected portion 629 is provided. In addition, the second straight portion 692 has an end portion 692B located on the opposite side from the side where the connected portion 629 is provided.

[0874] The opening 505 is connected to the portion of the second straight section 692 that is detached from the opposite end 692B.

[0875] Here, it is assumed that the direction of developer movement through the second linear portion 692 is the developer movement direction.

[0876] The second straight portion 692 has an upstream portion 692C located upstream of the opposite end portion 692B in the direction of developer movement.

[0877] The opening 505 is connected to the upstream portion 692C of the second straight section 692. In this embodiment, the gas flow path 530 is provided in a manner that extends from the upstream portion 692C toward the opening 505.

[0878] The developer can be easily stored at the opposite end 692B of the second straight portion 692. The height of the upper surface of the developer can easily increase in the opposite end 692B of the second straight portion 692.

[0879] In contrast, developer does not easily accumulate in the upstream portion 692C of the second linear portion 692.

[0880] The opening 505 is connected to the upstream portion 692C of the second straight portion 692, which is less prone to developer accumulation.

[0881] exist Figure 30 In the structural example shown, it is also similar to Figure 10 Similarly, in the structural example shown, the opening 505 is located above the circulation path 590.

[0882] In addition, Figure 30 In the structural example shown, a protrusion 76 is also provided in the same manner as described above. Figure 30 In the structural example shown, it is also similar to Figure 14 The structural example shown also has a protrusion 76.

[0883] exist Figure 30 In the structural example shown, the gas flow path 530 also passes through the interior of the protrusion 76.

[0884] Gas from circulation path 590 toward opening 505 passes through gas path 530 toward opening 505. Gas from upstream portion 692C toward opening 505 passes through gas path 530 toward opening 505.

[0885] In this structural example, the gas flow path 530 also reaches the opening 505. The gas flow path 530 extends upward from the upstream portion 692C and connects to the opening 505.

[0886] Figure 31 This is a diagram showing another structural example of the supply device 70.

[0887] exist Figure 31 In the structural example shown, a supply portion 626 is provided in the second straight portion 692, which is a straight section. Furthermore, in this structural example, an opening 505 is connected to the second straight portion 692, which is a straight section.

[0888] In this structural example, the straight portion of the supply part 626 is the same as the straight portion of the connecting opening 505.

[0889] In this structural example, an opening 505 is connected to the second straight section 692 of the circulation path 590, similar to the one described above. Furthermore, in this structural example, a supply portion 626 is provided in the second straight section 692.

[0890] Hereinafter, the portion of the second straight section 692 connected to the opening 505 will be referred to as the "opening connection portion 631A".

[0891] In this structural example, the supply portion 626 is located downstream of the opening connection portion 631A in the developer movement direction. Here, "developer movement direction" refers to the development direction within the second linear portion 692.

[0892] Furthermore, in this structural example, similarly to the above, opening 505 is connected to a second portion 597 where a smaller amount of developer is conveyed in the circulation path 590. Also similarly to the above, the amount of developer directed toward opening 505 is reduced.

[0893] Figure 32 This is a diagram showing another structural example of the supply device 70.

[0894] In this structural example, except for the location of opening 505, the basic structure is the same as... Figure 20 The structures shown are the same.

[0895] In this structural example, as described above, the gas delivered from the developing apparatus 14 is supplied to the wall space 556, which serves as a supply space.

[0896] In this structural example, an opening 505 is provided at the upper part of the inner space 556 of the wall. The opening 505 is provided in the wall 792 that forms the inner space 556. A filter 506 is provided in the opening 505.

[0897] The gas supplied to the inner space 556 of the wall is discharged to the outside of the supply device 70 through the opening 505.

[0898] Similarly, opening 505 is an opening connecting the interior and exterior of the supply device 70. Gas supplied to the interior space 556 of the wall moves to the exterior of the supply device 70 through this opening 505.

[0899] The opening 505 is set along the long side of the inner space 556 of the wall.

[0900] In this structural example, the gas in the inner space 556 of the wall does not pass through the circulation path 590 but flows towards the opening 505. In other words, the gas in the inner space 556 of the wall does not pass through the circulation path 590 but flows towards the opening 505.

[0901] Then, the gas is discharged to the outside of the supply device 70 through the opening 505. The gas in the wall space 556 is discharged to the outside of the supply device 70 without passing through the circulation path 590.

[0902] The gas within the wall space 556 does not pass through the circulation path 590. In this case, the developer within the circulation path 590 is contained in the gas.

[0903] When the gas in the space 556 within the wall leaves the opening 505, it enters the gap 756 located between the wall 792 and the developer collection container 80. Then, the gas moves axially toward the developer collection container 80 through this gap 756.

[0904] The developer collection container 80 in gap 756 is open at its axial end. Gas moving through gap 756 moves to the end of gap 756.

[0905] In this structural example, a space 556, which is the inner wall space, is also provided in the same way as described above, to supply gas flowing from the developing apparatus 14.

[0906] Furthermore, in this structural example, similarly to the above, a circulation path 590 for the developer to circulate is provided around the space 556 within the wall portion.

[0907] In this structural example, the gas in the inner space 556 of the wall does not pass through the circulation path 590 located around the inner space 556 of the wall, but moves toward the opening 505.

[0908] (Postscript) (((1)))

[0910] An image forming apparatus, comprising:

[0911] Like a retainer;

[0912] A developing apparatus that causes a developer to adhere to the image holder;

[0913] The mounting section is used to mount a cylindrical developer collection container containing developer; and

[0914] A supply device that supplies developer from the developer collection container to the developing apparatus, and having an opening that communicates between the interior and exterior of the supply device, the opening being located at a location opposite to the outer peripheral surface of the developer collection container mounted on the mounting portion. (((2)))

[0916] According to the image forming apparatus described in ((1)), wherein,

[0917] The opening is provided in such a way that it extends axially along the developer collection container mounted on the mounting portion. (((3)))

[0919] According to the image forming apparatus described in ((2)), wherein,

[0920] The opening is positioned relative to one end of the developer collection container mounted on the mounting portion along the axial direction to the other end of the developer collection container along the axial direction. (((4)))

[0922] The image forming apparatus according to any one of ((1))) to ((3))) wherein,

[0923] The opening is provided in multiple ways. (((5)))

[0925] According to the image forming apparatus described in (4), wherein,

[0926] The plurality of openings are provided in a manner in which the developer collection container is installed on the mounting part at different circumferential positions. (((6)))

[0928] The image forming apparatus according to any one of ((1))) to ((5))) wherein,

[0929] The opening is positioned opposite to the side where the developer collection container is located. (((7)))

[0931] An image forming apparatus, comprising:

[0932] Like a retainer;

[0933] A developing apparatus that causes a developer to adhere to the image holder; and

[0934] A supply device supplies developer to a developing apparatus and includes an outlet for discharging developer, a circulation path, a connecting path, and an opening. The circulation path is a path for the developer to circulate and for supplying new developer to a supplied portion within the circulation path. The connecting path is a path connected to the circulation path, extending from the connected portion (i.e., the connected portion) of the circulation path toward the outlet. The opening is used to discharge gas from the supply device and is connected to the circulation path. It is located downstream of the connected portion in the developer movement direction and connected to a portion located upstream of the supplied portion in the developer movement direction. (((8)))

[0936] According to the image forming apparatus described in ((7)), wherein,

[0937] The circulating flow path includes a first straight section formed in a straight line for developer to pass through toward the side where the connected portion is located, and a second straight section formed in a straight line for developer to pass through toward the side opposite to the side where the connected portion is located.

[0938] The supply portion is located in the first linear section.

[0939] The opening is connected to the second straight section of the circulating flow path. ((9)))

[0941] According to the image forming apparatus described in (8), wherein,

[0942] The second straight section of the circulating flow path has one end located on the side where the connected portion is provided, and an end located on the opposite side from the side where the connected portion is provided.

[0943] The opening is connected to the portion of the second straight section of the circulation path that is located upstream of the opposite end in the direction of developer movement through the second straight section. (((10)))

[0945] The image forming apparatus according to any one of (7) to (9) is wherein,

[0946] The opening is located above the circulation path. (((11)))

[0948] According to the image forming apparatus described in ((10)), wherein,

[0949] It also includes a flow path that extends upward from the circulation path and connects to the opening, allowing gas from the circulation path to pass through the opening. (((12)))

[0951] An image forming apparatus, comprising:

[0952] Like a retainer;

[0953] A developing apparatus that causes a developer to adhere to the image holder; and

[0954] A supply device supplies developer to the developing apparatus and includes a supply space for gas flowing from the developing apparatus, a circulation path surrounding the supply space for the developer to circulate, and an opening for discharging the gas supplied to the supply space and connecting the interior and exterior of the supply device.

[0955] The gas in the supply space flows toward the opening without passing through the circulation path and is discharged to the outside of the supply device.

[0956] According to (((1)), compared to the case where an opening is provided at the opposite position of the end face of the developer collection container that collects the developer, it is easier to make the opening that connects the inside and outside of the supply device for supplying the developer to the developing apparatus larger.

[0957] According to ((2)), it is easier to make the opening larger than in the case where the opening is not set in the form of extending along the axis of the developer collection container.

[0958] According to ((3)), the opening in the axial direction of the developer collection container can be made larger compared to the case where the size of the opening in the axial direction is smaller than the distance between one end and the other end in that direction.

[0959] According to ((4)), the total area of ​​the openings can be larger compared to the case where the number of openings is odd.

[0960] According to ((5)), multiple openings can be arranged in a staggered manner in the circumferential direction of the developer collection container.

[0961] According to ((6)), compared to the case where the opening is set to face the side of the developer collection container, gas can be discharged from the opening more smoothly.

[0962] According to ((7)), compared to the structure in which the gas passing through the opening of the supply device for supplying developer to the developing apparatus passes through a higher of the regions with high and low concentrations of developer, it is possible to reduce the amount of developer contained in the gas passing through the opening of the supply device from the inside of the supply device to the opening of the supply device.

[0963] According to ((8)), compared with the case where the opening and the first straight section of the circulation path are connected, it is possible to reduce the amount of developer contained in the gas toward the opening.

[0964] According to (9), compared with the structure that connects the opposite ends of the opening and the second straight section, it is possible to reduce the amount of developer contained in the gas toward the opening.

[0965] According to ((10)), compared to the case where the opening is located below the annular flow path, it is possible to reduce the amount of developer contained in the gas toward the opening.

[0966] According to (((11)), the gas can be moved toward the opening located above the annular flow path.

[0967] According to ((12)), compared to the structure in which the gas from the inside of the supply device that supplies developer to the developing apparatus passes through the higher of the regions with high and low concentrations of developer towards the opening of the supply device, it is possible to reduce the amount of developer contained in the gas from the inside of the supply device towards the opening of the supply device.

Claims

1. An image forming apparatus, characterized in that, have: Like a retainer; A developing apparatus that causes a developer to adhere to the image holder; The mounting part is used to mount a cylindrical developer collection container containing developer. as well as A supply device that supplies developer from the developer collection container to the developing apparatus, and having an opening that communicates between the interior and exterior of the supply device, the opening being located at a location opposite to the outer peripheral surface of the developer collection container mounted on the mounting part.

2. The image forming apparatus according to claim 1, wherein, The opening is provided in such a way that it extends axially along the developer collection container mounted on the mounting portion.

3. The image forming apparatus according to claim 2, wherein, The opening is positioned relative to one end of the developer collection container mounted on the mounting portion along the axial direction to the other end of the developer collection container along the axial direction.

4. The image forming apparatus according to any one of claims 1 to 3, wherein, The opening is provided in multiple ways.

5. The image forming apparatus according to claim 4, wherein, The plurality of openings are provided in a manner in which the developer collection container is installed on the mounting part at different circumferential positions.

6. The image forming apparatus according to any one of claims 1 to 5, wherein, The opening is positioned opposite to the side where the developer collection container is located.

7. An image forming apparatus, characterized in that, have: Like a retainer; A developing apparatus that causes a developer to adhere to the image holder; and A supply device supplies developer to a developing apparatus and includes an outlet for discharging developer, a circulation path, a connecting path, and an opening. The circulation path is a path for the developer to circulate and for supplying new developer to a supplied portion within the circulation path. The connecting path is a path connected to the circulation path, extending from the connected portion (i.e., the connected portion) of the circulation path toward the outlet. The opening is used to discharge gas from the supply device and is connected to the circulation path. It is located downstream of the connected portion in the developer movement direction and connected to a portion located upstream of the supplied portion in the developer movement direction.

8. The image forming apparatus according to claim 7, wherein, The circulating flow path includes a first straight section formed in a straight line for developer to pass toward the side where the connected portion is located, and a second straight section formed in a straight line for developer to pass toward the side opposite to the side where the connected portion is located. The supply portion is located in the first linear section. The opening is connected to the second straight section of the circulating flow path.

9. The image forming apparatus according to claim 8, wherein, The second straight section of the circulating flow path has one end located on the side where the connected portion is provided, and an end located on the opposite side from the side where the connected portion is provided. The opening is connected to the portion of the second straight section of the circulation path that is located upstream of the opposite end in the direction of developer movement through the second straight section.

10. The image forming apparatus according to any one of claims 7 to 9, wherein, The opening is located above the circulation path.

11. The image forming apparatus according to claim 10, wherein, It also includes a flow path that extends upward from the circulation path and connects to the opening, allowing gas from the circulation path to pass through the opening.

12. An image forming apparatus, characterized in that, have: Like a retainer; A developing apparatus that causes a developer to adhere to the image holder; and A supply device supplies developer to the developing apparatus and includes a supply space for gas flowing from the developing apparatus, a circulation path surrounding the supply space for the developer to circulate, and an opening for discharging the gas supplied to the supply space and connecting the interior and exterior of the supply device. The gas in the supply space flows toward the opening without passing through the circulation path and is discharged to the outside of the supply device.

Images