Aoi device light intensity curve generation method, system, device and storage medium
By generating a universal light intensity curve in the AOI device, the problem of low efficiency in the existing technology is solved, and efficient detection of objects with different reflectivities is achieved, avoiding redundant operations of repeatedly drawing curves.
Patent Information
- Application Number
- CN202610165489.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-02-05
- Publication Date
- 2026-05-12
- Estimated Expiration
- 2046-02-05
AI Technical Summary
Existing AOI equipment is inefficient in generating light intensity curves and cannot meet the detection requirements of objects with different reflectivities. In particular, for objects with low reflectivity, the peak of the light intensity curve may not capture enough grayscale signal, while objects with high reflectivity may be overexposed.
By determining the baseline curve and target baseline curve under different optical scenarios, and combining the image grayscale value of the reference silicon wafer with preset coefficients, a highly universal light intensity curve is generated, avoiding the need to repeatedly draw curves for each objective lens and wavelength combination, and establishing a unified calibration benchmark.
It improves the efficiency of light intensity curve generation, ensuring that the light intensity curve is adapted to the test objects with different reflectivities, eliminating the need to redraw the curve, and achieving compatible detection of test objects with low and high reflectivities.
Smart Images
Figure CN121632329B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of light intensity curve generation technology, specifically to a method, system, device, and storage medium for generating light intensity curves for AOI equipment. Background Technology
[0002] AOI (Auto Optical Inspection) equipment typically requires the use of multiple sets of objectives and various wavelengths of light for inspection. Even for the same object under the same output light intensity in the lighting box, the light intensity received by the imaging camera will vary significantly after passing through different objectives and different wavelength filters. Therefore, existing solutions establish separate light intensity curves for various wavelengths of light under each set of objectives.
[0003] However, existing methods that require the creation of separate intensity curves for different wavelengths of light under each objective lens result in significantly low curve generation efficiency. In addition, the reflectivity of different test objects varies greatly, and the intensity curves generated by existing methods often cannot meet the detection requirements of all test objects. Specifically, for test objects with low reflectivity, the peak of the intensity curve may not be able to capture sufficient grayscale signal; while for test objects with high reflectivity, overexposure may occur at the starting point of the intensity curve, resulting in signal submersion and loss.
[0004] Therefore, how to efficiently generate universal light intensity curves is an urgent problem to be solved. Summary of the Invention
[0005] This application provides a method, system, device, and storage medium for generating light intensity curves for AOI devices, which can efficiently generate highly versatile light intensity curves.
[0006] In a first aspect, embodiments of this application provide a method for generating an AOI (Automated Optical Inspection) device light intensity curve, the method comprising:
[0007] In the first optical scenario, a first reference curve corresponding to the first level and a second reference curve corresponding to the second level are determined based on all optical power values under different lighting source output power. The first optical scenario includes a randomly selected wavelength filter, an optical attenuator placed in the first and second levels, and a lighting source output power that increases with a first preset step size. The attenuation degree of the first level is lower than that of the second level.
[0008] The target reference curve is determined based on the first and second reference curves;
[0009] In the second optical scenario, the peak value of the light intensity curve is determined based on the image gray value of the reference silicon wafer, the target reference curve and the preset coefficient. The second optical scenario includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed in the first or second position, and an illumination source output power that increases with a second preset step size.
[0010] The target light intensity curve is determined based on the peak value of the light intensity curve and the target reference curve.
[0011] In conjunction with the first aspect, in one embodiment, determining the target reference curve based on the first reference curve and the second reference curve includes:
[0012] A first optical power value is selected on the first reference curve, and the first optical power value is greater than the optical power value corresponding to the vertex of the second reference curve.
[0013] The target reference curve is determined based on the curves in the second reference curve that are lower than the first optical power value and the curves in the first reference curve that are higher than the first optical power value.
[0014] In conjunction with the first aspect, in one embodiment, determining the vertex value of the light intensity curve based on the image grayscale value of the reference silicon wafer, the target reference curve, and a preset coefficient includes:
[0015] The output power of the first illumination source corresponding to the preset calibration value of the grayscale value of the image of the reference silicon wafer is obtained.
[0016] Find the target optical power value corresponding to the output power of the first illumination source in the target reference curve;
[0017] The peak value of the light intensity curve is determined based on the target light power value and the preset coefficient.
[0018] In conjunction with the first aspect, in one embodiment, determining the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve includes:
[0019] The curve corresponding to the peak value of the light intensity curve in the target reference curve is taken as the target light intensity curve.
[0020] In conjunction with the first aspect, in one embodiment, after the step of determining the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve, the method further includes:
[0021] If light intensity attenuation of the lighting source is detected, the step of determining the first reference curve corresponding to the first level and the second reference curve corresponding to the second level based on all light power values under different lighting source output power in the first optical scenario is repeated to determine a new target reference curve.
[0022] A new target light intensity curve is determined based on the vertex value of the light intensity curve and the new target reference curve.
[0023] In conjunction with the first aspect, in one embodiment, prior to the step of determining the vertex value of the light intensity curve based on the image grayscale value of the reference silicon wafer, the target reference curve, and a preset coefficient in the second optical scene, the method further includes:
[0024] If the maximum value of the target reference curve is less than the peak value of the light intensity curve, then replace the lighting source.
[0025] Secondly, embodiments of this application provide an AOI device light intensity curve generation system, the AOI device light intensity curve generation system comprising:
[0026] The first processing module is used to determine, in a first optical scene, a first reference curve corresponding to the first level and a second reference curve corresponding to the second level based on all optical power values under different lighting source output power. The first optical scene includes a randomly selected wavelength filter, an optical attenuator placed at the first level and the second level, and an lighting source output power that increases with a first preset step size. The attenuation degree of the first level is lower than that of the second level.
[0027] The second processing module is used to determine the target reference curve based on the first reference curve and the second reference curve.
[0028] The third processing module is used to determine the peak value of the light intensity curve based on the image gray value of the reference silicon wafer, the target reference curve and the preset coefficient in the second optical scene. The second optical scene includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed in the first or second position, and the output power of the illumination source increased by a second preset step.
[0029] The fourth processing module is used to determine the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve.
[0030] In conjunction with the second aspect, in one implementation, the second processing module is specifically used for:
[0031] A first optical power value is selected on the first reference curve, and the first optical power value is greater than the optical power value corresponding to the vertex of the second reference curve.
[0032] The target reference curve is determined based on the curves in the second reference curve that are lower than the first optical power value and the curves in the first reference curve that are higher than the first optical power value.
[0033] Thirdly, embodiments of this application provide an AOI device light intensity curve generation device, the AOI device light intensity curve generation device includes a processor, a memory, and an AOI device light intensity curve generation program stored in the memory and executable by the processor, wherein when the AOI device light intensity curve generation program is executed by the processor, it implements the steps of the AOI device light intensity curve generation method as described in any of the preceding claims.
[0034] Fourthly, embodiments of this application provide a computer-readable storage medium storing an AOI device light intensity curve generation program, wherein when the AOI device light intensity curve generation program is executed by a processor, it implements the steps of the AOI device light intensity curve generation method as described in any of the preceding claims.
[0035] The beneficial effects of the technical solutions provided in this application include:
[0036] In a first optical scenario including randomly selected wavelength filters, optical attenuators placed at first and second positions, and an illumination source output power increased by a first preset step size, a first reference curve corresponding to the first position and a second reference curve corresponding to the second position are determined based on all optical power values under different illumination source output power levels. A target reference curve is determined based on the first and second reference curves to avoid repeatedly plotting curves for each objective lens and its corresponding wavelength when subsequently determining the target light intensity curve. A reference silicon wafer with different preset target objectives and their corresponding target wavelength filters, an optical attenuator placed at the first or second position, and an illumination source output power increased by a first preset step size are used. In the second optical scenario with an increased output power of the illumination source using a preset step size, the vertex value of the light intensity curve is determined based on the image grayscale value of the reference silicon wafer, the target reference curve, and preset coefficients. A unified calibration reference (target reference curve) is established to ensure that the calibration starting point is consistent for all scenarios (different target lenses and their corresponding target wavelength filters), thereby eliminating the influence of reflectivity differences on the reference. The target light intensity curve is determined based on the vertex value of the light intensity curve and the target reference curve. That is, for different target lenses and target wavelength filters, it is not necessary to redraw the curve. The target light intensity curve only needs to be extracted from the target reference curve based on the vertex value of the light intensity curve, which greatly improves the efficiency of light intensity curve generation of AOI equipment. Attached Figure Description
[0037] Figure 1 This is a schematic flowchart illustrating an embodiment of the AOI device light intensity curve generation method of this application;
[0038] Figure 2 This is a schematic diagram of the optical experimental system in the embodiment of the AOI equipment light intensity curve generation method of this application;
[0039] Figure 3This is a schematic diagram of the process for generating the target reference curve in an embodiment of the AOI equipment light intensity curve generation method of this application;
[0040] Figure 4 This is a schematic diagram of the first reference curve in an embodiment of the AOI device light intensity curve generation method of this application;
[0041] Figure 5 This is a schematic diagram of the second reference curve in an embodiment of the AOI device light intensity curve generation method of this application;
[0042] Figure 6 This is a schematic diagram of the process for generating a target light intensity curve in an embodiment of the AOI device light intensity curve generation method of this application;
[0043] Figure 7 This is a schematic diagram of the target reference curve merging in an embodiment of the AOI equipment light intensity curve generation method of this application;
[0044] Figure 8 This is a schematic diagram of the target reference curve in an embodiment of the AOI equipment light intensity curve generation method of this application;
[0045] Figure 9 This is a schematic diagram of the target light intensity curve in an embodiment of the AOI equipment light intensity curve generation method of this application;
[0046] Figure 10 This is a schematic diagram of the functional modules of an embodiment of the AOI equipment light intensity curve generation system of this application;
[0047] Figure 11 This is a schematic diagram of the hardware structure of the AOI device light intensity curve generation device involved in the embodiments of this application. Detailed Implementation
[0048] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present application.
[0049] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.
[0050] In a first aspect, embodiments of this application provide a method for generating light intensity curves for AOI devices.
[0051] In one embodiment, reference is made to Figure 1 , Figure 1This is a schematic flowchart illustrating an embodiment of the AOI device light intensity curve generation method of this application. Figure 1 As shown, the method for generating the light intensity curve of AOI equipment includes:
[0052] Step S10: In the first optical scenario, based on all optical power values under different lighting source output power, determine the first reference curve corresponding to the first level and the second reference curve corresponding to the second level. The first optical scenario includes a randomly selected wavelength filter, an optical attenuator placed in the first and second levels, and a lighting source output power that increases with a first preset step size. The attenuation degree of the first level is lower than that of the second level.
[0053] In this embodiment, as an example, the wavelength filter refers to a filter with a specific wavelength used to define the calibration wavelength; the first setting of the optical attenuator (OD filter) refers to the setting with a low attenuation degree, used to capture low light intensity data, and the second setting of the optical attenuator refers to the setting with a high attenuation degree, used to capture high light intensity data; the first preset step size refers to a fixed output power increment used to ensure uniformity of measurement points and facilitate fitting of light intensity curves, and its specific value can be determined according to actual needs and is not limited here.
[0054] It should be noted that, Figure 2 The optical experimental system shown is the core tool of the AOI equipment light intensity curve generation method of this application. Its optical path design (such as OD group graded adjustment and synchronous measurement by optical power meter) directly serves the implementation of the first optical scene or the second optical scene in subsequent embodiments. The system includes an illumination source, a filter group, an OD group, a beam splitter, an imaging camera, an optical power meter, and an objective lens group. The optical path connection relationship is as follows: the light emitted by the illumination source is filtered to select a specific wavelength, and then the light intensity is adjusted by the OD group; the beam is split by the beam splitter, one path is reflected to the imaging camera for real-time image capture, and the other path is transmitted to the optical power meter to measure the light power; at the same time, the adjusted light is focused onto the sample (such as a reference silicon wafer) by the objective lens group, and the reflected light is split again by the same beam splitter, with part of it entering the imaging camera and the optical power meter.
[0055] Specifically, the first optical scene includes a randomly selected wavelength filter, optical attenuators positioned at the first and second stops, and an illumination source output power that increases with a first preset step size, as shown in the reference. Figure 3As shown, in the first optical scenario, a certain wavelength filter is randomly selected, and the OD filter is set to the lowest attenuation level, OD1. The output power of the white light source starts from 1 and gradually increases based on a first preset step size. An optical power meter is placed behind the filter to measure the actual optical power value of the light source at each first preset step size. Based on the scattered data, a first reference curve (i.e., ...) corresponding to the first setting is plotted. Figure 4 The first-level mother curve is shown); then switch the OD film to the second level (OD2), which has a higher attenuation level, and repeat the above steps. Based on the scattered data, plot the second reference curve corresponding to the second level (i.e., Figure 5 The two parent curves shown lay the data foundation for the subsequent merging to generate the final parent curve (i.e., the target baseline curve) with a wide dynamic range.
[0056] Step S20: Determine the target reference curve based on the first reference curve and the second reference curve.
[0057] In an exemplary embodiment of this application, a target reference curve is determined by merging the values of the second reference curve in the overlapping region of the two curves, based on a first reference curve (i.e., fitted with light intensity response data obtained by an optical attenuator at a low attenuation level in the first position, covering the low light intensity range to adapt to high reflectivity test objects) and a second reference curve (i.e., fitted with light intensity response data obtained by an optical attenuator at a high attenuation level in the second position, covering the high light intensity range to adapt to low reflectivity test objects). It should be understood that the target reference curve effectively expands the dynamic range of light intensity and ensures a smooth transition of light power values at the boundary, providing a general data basis for the rapid generation of subsequent target light intensity curves.
[0058] Step S30: In the second optical scene, the peak value of the light intensity curve is determined based on the image gray value of the reference silicon wafer, the target reference curve and the preset coefficient. The second optical scene includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed in the first or second position, and an illumination source output power that increases with a second preset step size.
[0059] In an exemplary embodiment of this application, during the generation of the light intensity curve in the AOI device, different preset target lenses refer to multiple pre-selected sets of lenses (such as 5x, 10x, 20x, etc.), whose optical characteristics (such as focal length, numerical aperture) directly affect the optical path transmission efficiency and imaging resolution; target wavelength filters refer to specific wavelength filters (such as 550nm, 650nm, etc.) matched with each target lens, used to accurately screen the required spectral range to ensure that the reflection characteristics of different wavelengths of light to the inspected object are consistent; the reference silicon wafer is used as a standardized reflectivity benchmark, and its stable and known reflectivity characteristics (such as the standard reflectivity of silicon wafer 0.35) ensure that the grayscale value of the imaging camera image can be stably calibrated to the preset value under the combination of lens and wavelength (the specific value can be determined according to actual needs, and is not limited here, for example, the preset value can preferably be 180DN), thereby providing accurate and reusable calibration input for the subsequent calculation of the peak value of the light intensity curve.
[0060] Specifically, the second optical scene includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed at the first or second setting, and an illumination source output power increased by a second preset step size; reference Figure 6 As shown, in the second optical scene, a reference silicon wafer is placed under a target objective lens. A target wavelength filter corresponding to that objective lens is selected, and the Z-axis position of the reference silicon wafer is adjusted to the current objective lens focal length. First, the output power of the illumination source is gradually increased at the OD2 setting, and the image grayscale value of the imaging camera is observed at any time until the image grayscale is at the calibrated value (e.g., 180DN). The output value of the illumination source at this time is recorded. If the image grayscale cannot reach 180DN even at the maximum output of the illumination source at the OD2 setting, the above operation is repeated at the OD1 setting. Based on the illumination source output value that makes the image grayscale around 180DN in the above steps, the corresponding optical power value A is found in the final master curve (target reference curve). To improve the compatibility with test objects with different reflectivities, the optical power value A can be amplified by a preset coefficient C as the vertex value D of the light intensity curve used by the current magnification objective lens and the target wavelength illumination light in actual equipment use, thereby efficiently generating light intensity curves that adapt to each objective lens and wavelength combination. The specific value of the preset coefficient can be determined according to actual needs and is not limited here.
[0061] Step S40: Determine the target light intensity curve based on the peak value of the light intensity curve and the target reference curve.
[0062] In this embodiment, as an example, the target light intensity curve (i.e., a sub-curve) is determined by extracting all data points on the target reference curve whose light power value is less than the peak value D of the light intensity curve, based on the peak value D of the light intensity curve (calculated from the light power value A obtained at the calibration gray value of the target reference curve and a preset coefficient C) and the target reference curve. This sub-curve inherits the wide dynamic range of the target reference curve (covering the low to high light intensity range), ensuring that it can simultaneously adapt to both low reflectivity (requiring a high light intensity peak) and high reflectivity (requiring a low light intensity starting point). At the same time, the preset coefficient C accurately compensates for the optical attenuation differences of different objective lens and wavelength combinations, enabling the peak value D of the light intensity curve to dynamically match the current optical detection scenario, thereby achieving rapid generation of the light intensity curve. This avoids the redundant operation of repeatedly measuring each objective lens and wavelength combination in traditional methods, significantly improving the efficiency of light intensity curve generation.
[0063] This application, under a first optical scenario including randomly selected wavelength filters, optical attenuators placed at first and second gears, and an illumination source output power increased by a first preset step size, determines a first reference curve corresponding to the first gear and a second reference curve corresponding to the second gear based on all optical power values under different illumination source output power levels. A target reference curve is determined based on the first and second reference curves to avoid repeatedly plotting curves for each objective lens and its corresponding wavelength when subsequently determining the target light intensity curve. The application also includes a reference silicon wafer with different preset target objectives and their corresponding target wavelength filters, an optical attenuator placed at the first or second gear, and an illumination source output power increased by a first preset step size. In the second optical scenario with an increased output power of the illumination source at the second preset step size, the vertex value of the light intensity curve is determined based on the image grayscale value of the reference silicon wafer, the target reference curve, and preset coefficients. A unified calibration reference (target reference curve) is established to ensure that the calibration starting point of all scenarios (different target lenses and their corresponding target wavelength filters) is consistent, thereby eliminating the influence of reflectivity differences on the reference. The target light intensity curve is determined based on the vertex value of the light intensity curve and the target reference curve. That is, for different target lenses and target wavelength filters, it is not necessary to redraw the curve. It is only necessary to extract the target light intensity curve from the target reference curve based on the vertex value of the light intensity curve, which greatly improves the efficiency of light intensity curve generation of AOI equipment.
[0064] Further, in one embodiment, determining the target reference curve based on the first reference curve and the second reference curve includes:
[0065] A first optical power value is selected on the first reference curve, and the first optical power value is greater than the optical power value corresponding to the vertex of the second reference curve.
[0066] The target reference curve is determined based on the curves in the second reference curve that are lower than the first optical power value and the curves in the first reference curve that are higher than the first optical power value.
[0067] Exemplary, in this embodiment of the application, a first optical power value P (i.e., OD1 level, low attenuation, covering the low light intensity range to adapt to high reflectivity test objects) is selected on the first reference curve (OD1 level, low attenuation, covering the low light intensity range to adapt to high reflectivity test objects). Figure 7 The optical power value corresponding to the red dashed line in the curve is greater than the optical power value P_OD2_max corresponding to the vertex P of the second reference curve (OD2 level, with high attenuation, covering the high light intensity range to adapt to low reflectivity test objects); based on this, refer to Figure 7 As shown, the process of determining the target reference curve is as follows: All curve segments in the second reference curve with optical power values lower than P_OD2_max are seamlessly spliced with the curve segments in the first reference curve with optical power values higher than P_OD2_max, ultimately obtaining the target reference curve (e.g., ...). Figure 8 (As shown).
[0068] It should be noted that the OD2 curve is used in the range at and below point P to maintain the stability of the low light intensity area, while the OD1 curve is used in the range above point P to ensure the coverage of the high light intensity area. This stitching strategy effectively eliminates the power abrupt change at the boundary, while inheriting the complementary dynamic range of the OD1 and OD2 curves, providing a general data foundation for the rapid generation of subsequent light intensity curves.
[0069] Further, in one embodiment, determining the vertex value of the light intensity curve based on the image grayscale value of the reference silicon wafer, the target reference curve, and a preset coefficient includes:
[0070] The output power of the first illumination source corresponding to the preset calibration value of the grayscale value of the image of the reference silicon wafer is obtained.
[0071] Find the target optical power value corresponding to the output power of the first illumination source in the target reference curve;
[0072] The peak value of the light intensity curve is determined based on the target light power value and the preset coefficient.
[0073] In an exemplary embodiment of this application, in the second optical scenario, the output power of the illumination source is first adjusted to stabilize the grayscale value of the image from the imaging camera on the reference silicon wafer under a specific target lens and its corresponding target wavelength filter to a preset calibration value (e.g., 180DN), thereby obtaining the output power of the first illumination source corresponding to the calibration condition. Subsequently, the optical power value A (i.e., the target optical power value) corresponding to the output power of the first illumination source is accurately found on the target reference curve. This value characterizes the actual optical power of the optical path under the calibration condition. Finally, combined with a preset coefficient C (used to dynamically compensate for the optical attenuation characteristics caused by the difference between the focal length of the target lens and the wavelength filter), the peak value D of the light intensity curve is determined by calculating D = A×C, so that the target light intensity curve can accurately adapt to the optical characteristics of the current combination of lens and wavelength, while inheriting the wide dynamic range of the target reference curve. This ensures that both low reflectivity (requiring a high light intensity peak) and high reflectivity (requiring a low light intensity starting point) are detected with no signal loss and no overexposure, thereby efficiently generating the light intensity curve.
[0074] Further, in one embodiment, determining the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve includes:
[0075] The curve corresponding to the peak value of the light intensity curve in the target reference curve is taken as the target light intensity curve.
[0076] As an example, in the embodiments of this application, reference is made to Figure 9 As shown, in the target reference curve, all curves with light power values less than D are intercepted based on the peak value D of the light intensity curve to form the target light intensity curve. This operation ensures that the dynamic range of the target light intensity curve smoothly transitions from the low light intensity starting point (corresponding to the detection requirements of high reflectivity test objects, avoiding overexposure) to the peak of the light intensity curve (corresponding to the detection peak of the current objective lens and wavelength combination). At the same time, it inherits the wide dynamic range characteristics of the target reference curve, enabling the light intensity curve to accurately adapt to test objects with different reflectivities, thereby realizing the rapid customized generation of the light intensity curve and avoiding the redundant operation of repeated measurement for each objective lens and wavelength combination in the traditional method.
[0077] Furthermore, in one embodiment, after the step of determining the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve, the method further includes:
[0078] If light intensity attenuation of the lighting source is detected, the step of determining the first reference curve corresponding to the first level and the second reference curve corresponding to the second level based on all light power values under different lighting source output power in the first optical scenario is repeated to determine a new target reference curve.
[0079] A new target light intensity curve is determined based on the vertex value of the light intensity curve and the new target reference curve.
[0080] In an exemplary embodiment of this application, when light intensity attenuation of the illumination source is detected (such as a decrease in output power due to light source aging), the first optical scene step is re-executed. That is, the step of determining the first reference curve corresponding to the first level and the second reference curve corresponding to the second level based on all light power values under different illumination source output power in the first optical scene is re-executed to determine a new target reference curve. Then, based on the pre-stored light intensity curve vertex value D and the new target reference curve, the curve segment with light power value lower than the light intensity curve vertex value D is accurately intercepted on the new curve to finally determine the new target light intensity curve. The above process effectively compensates for the light intensity change caused by light source attenuation, avoids signal insufficiency or overexposure problems caused by the decrease in light source output capability, and eliminates the need to remeasure the curves of all objective lens and wavelength combinations, significantly improving equipment maintenance efficiency.
[0081] Furthermore, in one embodiment, before the step of determining the vertex value of the light intensity curve based on the image grayscale value of the reference silicon wafer, the target reference curve, and the preset coefficient in the second optical scene, the method further includes:
[0082] If the maximum value of the target reference curve is less than the peak value of the light intensity curve, then replace the lighting source.
[0083] In an exemplary embodiment of this application, before determining the peak value of the light intensity curve, the system automatically verifies whether the maximum value of the target reference curve is less than the peak value of the light intensity curve. If the maximum value of the target reference curve is not less than the peak value of the light intensity curve, there is no need to replace the illumination source. If the maximum value of the target reference curve is less than the peak value of the light intensity curve, it indicates that the attenuation of the illumination source has exceeded the compensable range, resulting in its maximum output light intensity being unable to meet the detection requirements of low reflectivity objects (i.e., the light source cannot provide sufficient high light intensity to capture the signal). In this case, the illumination source must be replaced immediately to restore the light intensity output capability, avoid detection failure or data loss due to insufficient light intensity, and thus maintain the detection accuracy and long-term reliability of the AOI equipment.
[0084] Secondly, embodiments of this application also provide an AOI device light intensity curve generation system.
[0085] In one embodiment, reference is made to Figure 10 , Figure 10 This is a functional module diagram of an embodiment of the AOI equipment light intensity curve generation system of this application. Figure 10 As shown, the AOI equipment light intensity curve generation system includes:
[0086] The first processing module is used to determine, in a first optical scene, a first reference curve corresponding to the first level and a second reference curve corresponding to the second level based on all optical power values under different lighting source output power. The first optical scene includes a randomly selected wavelength filter, an optical attenuator placed at the first level and the second level, and an lighting source output power that increases with a first preset step size. The attenuation degree of the first level is lower than that of the second level.
[0087] The second processing module is used to determine the target reference curve based on the first reference curve and the second reference curve.
[0088] The third processing module is used to determine the peak value of the light intensity curve based on the image gray value of the reference silicon wafer, the target reference curve and the preset coefficient in the second optical scene. The second optical scene includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed in the first or second position, and the output power of the illumination source increased by a second preset step.
[0089] The fourth processing module is used to determine the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve.
[0090] Furthermore, in one embodiment, the second processing module is specifically used for:
[0091] A first optical power value is selected on the first reference curve, and the first optical power value is greater than the optical power value corresponding to the vertex of the second reference curve.
[0092] The target reference curve is determined based on the curves in the second reference curve that are lower than the first optical power value and the curves in the first reference curve that are higher than the first optical power value.
[0093] Furthermore, in one embodiment, the third processing module is specifically used for:
[0094] The output power of the first illumination source corresponding to the preset calibration value of the grayscale value of the image of the reference silicon wafer is obtained.
[0095] Find the target optical power value corresponding to the output power of the first illumination source in the target reference curve;
[0096] The peak value of the light intensity curve is determined based on the target light power value and the preset coefficient.
[0097] Furthermore, in one embodiment, the fourth processing module is specifically used for:
[0098] The curve corresponding to the peak value of the light intensity curve in the target reference curve is taken as the target light intensity curve.
[0099] Furthermore, in one embodiment, the fourth processing module is specifically used for:
[0100] If light intensity attenuation of the lighting source is detected, the step of determining the first reference curve corresponding to the first level and the second reference curve corresponding to the second level based on all light power values under different lighting source output power in the first optical scenario is repeated to determine a new target reference curve.
[0101] A new target light intensity curve is determined based on the vertex value of the light intensity curve and the new target reference curve.
[0102] Furthermore, in one embodiment, the fourth processing module is specifically used for:
[0103] If the maximum value of the target reference curve is less than the peak value of the light intensity curve, then replace the lighting source.
[0104] This application, under a first optical scenario including randomly selected wavelength filters, optical attenuators placed at first and second gears, and an illumination source output power increased by a first preset step size, determines a first reference curve corresponding to the first gear and a second reference curve corresponding to the second gear based on all optical power values under different illumination source output power levels. A target reference curve is determined based on the first and second reference curves to avoid repeatedly plotting curves for each objective lens and its corresponding wavelength when subsequently determining the target light intensity curve. The application also includes a reference silicon wafer with different preset target objectives and their corresponding target wavelength filters, an optical attenuator placed at the first or second gear, and an illumination source output power increased by a first preset step size. In the second optical scenario with an increased output power of the illumination source at the second preset step size, the vertex value of the light intensity curve is determined based on the image grayscale value of the reference silicon wafer, the target reference curve, and preset coefficients. A unified calibration reference (target reference curve) is established to ensure that the calibration starting point of all scenarios (different target lenses and their corresponding target wavelength filters) is consistent, thereby eliminating the influence of reflectivity differences on the reference. The target light intensity curve is determined based on the vertex value of the light intensity curve and the target reference curve. That is, for different target lenses and target wavelength filters, it is not necessary to redraw the curve. It is only necessary to extract the target light intensity curve from the target reference curve based on the vertex value of the light intensity curve, which greatly improves the efficiency of light intensity curve generation of AOI equipment.
[0105] The functions of each module in the above-mentioned AOI equipment light intensity curve generation system correspond to the steps in the above-mentioned AOI equipment light intensity curve generation method embodiment, and their functions and implementation processes will not be described in detail here.
[0106] Thirdly, embodiments of this application provide an AOI device light intensity curve generation device, which can be a personal computer (PC), laptop computer, server or other device with data processing capabilities.
[0107] Reference Figure 11 , Figure 11 This is a schematic diagram of the hardware structure of the AOI device light intensity curve generation device involved in the embodiments of this application. In the embodiments of this application, the AOI device light intensity curve generation device may include a processor, a memory, a communication interface, and a communication bus.
[0108] The communication bus can be of any type and is used to interconnect the processor, memory, and communication interface.
[0109] The communication interface includes input / output (I / O) interfaces, physical interfaces, and logical interfaces used for interconnecting internal components of the AOI (Optical Image Quality Injection) light intensity curve generation device, as well as interfaces used for interconnecting the AOI light intensity curve generation device with other devices (such as other computing devices or user equipment). Physical interfaces can be Ethernet interfaces, fiber optic interfaces, ATM interfaces, etc.; user equipment can be displays, keyboards, etc.
[0110] Memory can be various types of storage media, such as random access memory (RAM), read-only memory (ROM), non-volatile RAM (NVRAM), flash memory, optical storage, hard disk, programmable ROM (PROM), erasable PROM (EPROM), electrically erasable PROM (EEPROM), etc.
[0111] The processor can be a general-purpose processor, which can call the AOI device light intensity curve generation program stored in the memory and execute the AOI device light intensity curve generation method provided in the embodiments of this application. For example, the general-purpose processor can be a central processing unit (CPU). The method executed when the AOI device light intensity curve generation program is called can be referred to the various embodiments of the AOI device light intensity curve generation method of this application, and will not be repeated here.
[0112] Those skilled in the art will understand that Figure 11The hardware structure shown does not constitute a limitation of this application and may include more or fewer components than shown, or combine certain components, or have different component arrangements.
[0113] Fourthly, embodiments of this application also provide a readable storage medium.
[0114] The present application stores an AOI device light intensity curve generation program on a readable storage medium, wherein when the AOI device light intensity curve generation program is executed by a processor, it implements the steps of the AOI device light intensity curve generation method described above.
[0115] The method implemented when the AOI device light intensity curve generation program is executed can be referred to in various embodiments of the AOI device light intensity curve generation method of this application, and will not be repeated here.
[0116] The terms "comprising" and "having," and any variations thereof, in the specification, claims, and accompanying drawings of this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to such process, method, product, or apparatus. The terms "first," "second," and "third," etc., are used to distinguish different objects, etc., and do not indicate a sequence, nor do they limit "first," "second," and "third" to different types.
[0117] In the description of the embodiments of this application, terms such as "exemplary," "for example," or "for instance" are used to indicate examples, illustrations, or explanations. Any embodiment or design described as "exemplary," "for example," or "for instance" in the embodiments of this application should not be construed as being more preferred or advantageous than other embodiments or designs. Specifically, the use of terms such as "exemplary," "for example," or "for instance" is intended to present the relevant concepts in a concrete manner.
[0118] In the description of the embodiments of this application, unless otherwise stated, " / " means "or". For example, A / B can mean A or B. The "and / or" in the text is merely a description of the relationship between related objects, indicating that there can be three relationships. For example, A and / or B can mean: A exists alone, A and B exist simultaneously, and B exists alone. In addition, in the description of the embodiments of this application, "multiple" means two or more.
[0119] In some processes described in the embodiments of this application, multiple operations or steps are included in a specific order. However, it should be understood that these operations or steps may not be executed in the order they appear in the embodiments of this application, or they may be executed in parallel. The sequence number of the operation is only used to distinguish different operations, and the sequence number itself does not represent any execution order. In addition, these processes may include more or fewer operations, and these operations or steps may be executed sequentially or in parallel, and these operations or steps may be combined.
[0120] It should be noted that the sequence numbers of the embodiments in this application are for descriptive purposes only and do not represent the superiority or inferiority of the embodiments.
[0121] Through the above description of the embodiments, those skilled in the art can clearly understand that the methods of the above embodiments can be implemented by means of software plus necessary general-purpose hardware platforms. Of course, they can also be implemented by hardware, but in many cases the former is a better implementation method. Based on this understanding, the technical solution of this application, in essence, or the part that contributes to the prior art, can be embodied in the form of a software product. This computer software product is stored in a storage medium (such as ROM / RAM, magnetic disk, optical disk) as described above, and includes several instructions to cause a terminal device to execute the methods described in the various embodiments of this application.
[0122] The above are merely preferred embodiments of this application and do not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.
Claims
1. A method for generating light intensity curves for AOI equipment, characterized in that, The method for generating the light intensity curve of the AOI device includes: In the first optical scenario, a first reference curve corresponding to the first level and a second reference curve corresponding to the second level are determined based on all optical power values under different lighting source output power. The first optical scenario includes a randomly selected wavelength filter, an optical attenuator placed in the first and second levels, and a lighting source output power that increases with a first preset step size. The attenuation degree of the first level is lower than that of the second level. The target reference curve is determined based on the first and second reference curves; In the second optical scenario, the peak value of the light intensity curve is determined based on the image gray value of the reference silicon wafer, the target reference curve and the preset coefficient. The second optical scenario includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed in the first or second position, and an illumination source output power that increases with a second preset step size. The target light intensity curve is determined based on the vertex value of the light intensity curve and the target reference curve; The step of determining the target reference curve based on the first reference curve and the second reference curve includes: A first optical power value is selected on the first reference curve, and the first optical power value is greater than the optical power value corresponding to the vertex of the second reference curve. The target reference curve is determined based on the curves in the second reference curve that are lower than the first optical power value and the curves in the first reference curve that are higher than the first optical power value. The process of determining the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve includes: The curve corresponding to the peak value of the light intensity curve in the target reference curve is taken as the target light intensity curve.
2. The method for generating light intensity curves for AOI equipment as described in claim 1, characterized in that, The determination of the light intensity curve vertex value based on the image grayscale value of the reference silicon wafer, the target reference curve, and preset coefficients includes: The output power of the first illumination source corresponding to the preset calibration value of the grayscale value of the image of the reference silicon wafer is obtained. Find the target optical power value corresponding to the output power of the first illumination source in the target reference curve; The peak value of the light intensity curve is determined based on the target light power value and the preset coefficient.
3. The method for generating light intensity curves for AOI equipment as described in claim 1, characterized in that, After the step of determining the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve, the method further includes: If light intensity attenuation of the lighting source is detected, the step of determining the first reference curve corresponding to the first level and the second reference curve corresponding to the second level based on all light power values under different lighting source output power in the first optical scenario is repeated to determine a new target reference curve. A new target light intensity curve is determined based on the vertex value of the light intensity curve and the new target reference curve.
4. The method for generating light intensity curves for AOI equipment as described in claim 1, characterized in that, Before the step of determining the vertex value of the light intensity curve based on the image grayscale value of the reference silicon wafer, the target reference curve, and the preset coefficient in the second optical scene, the method further includes: If the maximum value of the target reference curve is less than the peak value of the light intensity curve, then replace the lighting source.
5. A system for generating light intensity curves for AOI (Automated Optical Inspection) equipment, characterized in that, The AOI equipment light intensity curve generation system includes: The first processing module is used to determine, in a first optical scene, a first reference curve corresponding to the first level and a second reference curve corresponding to the second level based on all optical power values under different lighting source output power. The first optical scene includes a randomly selected wavelength filter, an optical attenuator placed at the first level and the second level, and an lighting source output power that increases with a first preset step size. The attenuation degree of the first level is lower than that of the second level. The second processing module is used to determine the target reference curve based on the first reference curve and the second reference curve. The third processing module is used to determine the peak value of the light intensity curve based on the image gray value of the reference silicon wafer, the target reference curve and the preset coefficient in the second optical scene. The second optical scene includes a reference silicon wafer under different preset target lenses and their corresponding target wavelength filters, an optical attenuator placed in the first or second position, and the output power of the illumination source increased by a second preset step. The fourth processing module is used to determine the target light intensity curve based on the vertex value of the light intensity curve and the target reference curve; Specifically, the second processing module is used for: A first optical power value is selected on the first reference curve, and the first optical power value is greater than the optical power value corresponding to the vertex of the second reference curve. The target reference curve is determined based on the curves in the second reference curve that are lower than the first optical power value and the curves in the first reference curve that are higher than the first optical power value. The fourth processing module is specifically used for: The curve corresponding to the peak value of the light intensity curve in the target reference curve is taken as the target light intensity curve.
6. An AOI (Automated Optical Inspection) equipment light intensity curve generation device, characterized in that, The AOI device light intensity curve generation device includes a processor, a memory, and an AOI device light intensity curve generation program stored in the memory and executable by the processor, wherein when the AOI device light intensity curve generation program is executed by the processor, it implements the steps of the AOI device light intensity curve generation method as described in any one of claims 1 to 4.
7. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores an AOI device light intensity curve generation program, wherein when the AOI device light intensity curve generation program is executed by a processor, it implements the steps of the AOI device light intensity curve generation method as described in any one of claims 1 to 4.