Systems and methods for exhaust-free gas chromatography mass spectrometry interface
The exhaust-free GC-MS interface system solves the problems of time-consuming maintenance and high gas consumption in GC-MS systems by setting a sealing surface and a gas purging flow path upstream of the mass spectrometer flow path, achieving rapid maintenance and efficient operation, and reducing costs and pollution risks.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- AGILENT TECHNOLOGIES INC
- Filing Date
- 2024-07-31
- Publication Date
- 2026-04-10
AI Technical Summary
Existing gas chromatography-mass spectrometry (GC-MS) systems require venting during maintenance, which is time-consuming and may damage system components. The additional gas consumption also increases costs and the risk of contamination.
The system employs a non-venting GC-MS interface. By setting a sealed surface and a gas purging flow path upstream of the mass spectrometer flow path, it allows for maintaining a vacuum state during maintenance, avoiding communication with the mass spectrometer flow path, and using gases other than helium for purging, thus enabling rapid maintenance and reducing gas consumption.
It enables rapid maintenance and efficient operation, reduces the risk of damage to system components, lowers gas consumption and costs, while maintaining system performance and vacuum status.
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Figure CN121844206A_ABST
Abstract
Description
Cross Reference to Related Applications
[0001] This application claims the benefit of and priority to U.S. Patent Application No. 18 / 369,773, filed September 18, 2023, the entire contents of which are incorporated herein by reference. TECHNICAL FIELD
[0002] The present application relates generally to mass spectrometry, including mass spectrometry coupled with gas chromatography. BACKGROUND
[0003] A mass spectrometry (MS) system typically includes an ion source for ionizing components (in particular molecules) of a sample under study, followed by one or more ion handling devices providing various functions, followed by a mass analyzer for separating ions based on their different mass-to-charge ratios (or m / z ratios, or more simply “mass”), followed by an ion detector to which mass-sorted ions arrive and are detected (e.g., counted) therefrom. The MS system further includes electronics for processing the output signal from the ion detector as needed in order to produce user- interpretable data in formats such as chromatograms or mass spectra, which typically appear as a series of peaks indicating the relative abundance (e.g., ion signal intensity, such as the number of ion counts detected for each ion) of detected ions as a function of their m / z ratios. Mass spectra (e.g., MS spectra, MS fragmentation spectra) can be used to determine the molecular structure of components of a sample, thereby enabling qualitative and quantitative characterization of the sample, including identification and abundance of chemical compounds of the sample (and possibly also isotopologues and / or isotopes of each compound found in the analysis).
[0004] Mass spectrometry techniques can be enhanced by coupling them with another analytical separation technique that precedes the MS analysis stage, thus serving as a first stage of analytical separation. Examples include chromatography techniques, such as liquid chromatography (LC) or gas chromatography (GC). Gas chromatography (GC) is used to analyze and detect the presence of many different substances in a sample. The function of a gas chromatograph is to separate the components of a chemical sample, known as analytes, and to detect the identity and / or concentration of those components. Separation is typically achieved using a capillary GC column. In some cases, such a column is essentially a piece of fused silica tubing with an inner coating of stationary phase that interacts with the sample to separate the components. A pressurized gas, known as the mobile phase, is used to push the sample through the column. The GC column can be kept isothermal throughout the analysis, or temperature ramped. SUMMARY
[0005] Maintenance of a flow path of a gas chromatograph mass spectrometer (GC-MS) system can involve purging the vacuum of the MS system. This process can be time consuming to implement and can require additional time to allow the system to return to a state in which analysis can be performed. Damage to system components can occur if the system is not purged in a proper manner. The solution described herein can provide a GC-MS interface that does not require purging of the MS system when certain GC flow path components are being maintained.
[0006] At least one aspect of the present disclosure relates to a gas chromatograph mass spectrometer (GC-MS) system. The system can include a gas chromatograph. The system can include a mass spectrometer connected to the gas chromatograph by a mass spectrometer flow path. The system can include a fitting. The fitting can include a sealing surface and one or more gas purge flow paths. The fitting can be fluidically connected to the mass spectrometer. The system can include a column disposed in a ferrule. The one or more gas purge flow paths can be connected to the fitting upstream of the sealing surface. The one or more gas purge flow paths are not in fluid communication with the mass spectrometer flow path when the column is fluidically connected to the mass spectrometer flow path and there is a fluid-tight seal between the ferrule, the column, and the fitting. The one or more gas purge flow paths are in fluid communication with the mass spectrometer flow path when there is not a fluid-tight seal between the ferrule, the column, and the fitting.
[0007] Another aspect of the present disclosure relates to a method. The method can include providing a mass spectrometer flow path. The method can include disposing a sealing surface upstream of and adjacent to the mass spectrometer flow path. The method can include disposing one or more gas purge flow paths upstream of the sealing surface. In a first state, the method can include decoupling the sealing surface from a ferrule to place the one or more gas purge flow paths in fluid communication with the mass spectrometer flow path. The ferrule can be configured to be coupled with a column. In the first state, the method can include flowing a purge gas through the one or more gas purge flow paths. In a second state, the method can include coupling the sealing surface with the ferrule to (1) remove the fluid communication between the one or more gas purge flow paths and the mass spectrometer flow path and (2) place the column in fluid communication with the mass spectrometer flow path. In the second state, the method can include stopping the flow of the purge gas through the one or more gas purge flow paths. In the second state, the method can include flowing a sample through the column.
[0008] Those skilled in the art will understand that the invention summary is illustrative only and is not intended to be limiting in any way. Other aspects, inventive features, and advantages of the apparatus and / or process described herein, as defined solely by the claims, will become clear in the detailed description set forth herein and taken in conjunction with the accompanying drawings. Attached Figure Description
[0009] Details of one or more implementations of the subject matter described in this specification are set forth in the accompanying drawings and the following description. Further features, aspects, and advantages of the subject matter will become clear from the description, drawings, and claims.
[0010] Figure 1 This is a schematic diagram of a gas chromatography-mass spectrometry system according to the implementation plan.
[0011] Figure 2 This is a cross-sectional view of a portion of the gas chromatography-mass spectrometry system according to the implementation plan.
[0012] Figure 3 This is a cross-sectional view of a portion of the gas chromatography-mass spectrometry system according to the implementation plan.
[0013] Figure 4 This is a cross-sectional view of a portion of the gas chromatography-mass spectrometry system according to the implementation plan.
[0014] Figure 5 This is a cross-sectional view of a portion of the computational fluid dynamics simulation of the gas chromatography-mass spectrometry system according to the implementation plan.
[0015] Figure 6 This is a cross-sectional view of a portion of the gas chromatography-mass spectrometry system according to the implementation plan.
[0016] Figure 7 This is a cross-sectional view of a portion of the gas chromatography-mass spectrometry system according to the implementation plan.
[0017] Figure 8 This is a cross-sectional view of a portion of the gas chromatography-mass spectrometry system according to the implementation plan.
[0018] Figure 9 This is a schematic flowchart illustrating a method for providing an exhaust-free gas chromatography-mass spectrometry interface, based on the implementation plan.
[0019] In the various figures, the same reference numerals and symbols indicate the same elements. Detailed Implementation
[0020] The following is a more detailed description of the various concepts and their implementations related to methods, devices, and systems for ventless GC-MS interfaces. The various concepts introduced above and discussed in more detail below can be implemented in any of many ways, as the described concepts are not limited to any particular implementation. Examples of specific implementations and applications are provided primarily for illustrative purposes.
[0021] During operation of a gas chromatography-mass spectrometry (GC-MS) system, the mass spectrometer may be under vacuum. When the system undergoes maintenance (such as maintenance involving flow paths, changes to the inlet diaphragm and / or liner, or pruning and / or changing the column), the system may need to be cooled and evacuated, which can take several hours (e.g., 2 hours). Subsequently, bringing the mass spectrometer chamber back to vacuum pressure (e.g., pumping) can take several hours (e.g., 8–24 hours). Opening the vacuum chamber may introduce new leaks, which need to be identified and eliminated after pumping. Furthermore, opening the vacuum chamber when it is filled with air may introduce contaminants. The evacuation and pumping processes can be time-consuming and expensive.
[0022] This disclosure relates to systems and methods for exhaust-free GC-MS interfaces. Exhaust-free GC-MS interfaces can improve GC-MS system performance (e.g., no additional gas, higher sensitivity), availability (e.g., automated operation, ease of installation and use), and sustainability (e.g., compatibility with various gases (such as nitrogen, helium, or hydrogen), and reduced total gas consumption).
[0023] The disclosed solutions offer the technical advantage of providing a ventless GC-MS interface without degrading GC-MS system performance. These solutions allow users to quickly perform GC-MS system maintenance and restore the system to operation, improve usability for ease of installation and operation, eliminate user error through fully automated control, utilize gases other than helium, and / or reduce overall laboratory gas consumption and costs. These solutions protect sensitive instrument components from oxidative damage, improve ion source performance, enhance MS sensitivity by achieving optimal ion source flow, facilitate easy installation and removal from the instrument, enable leak-free ring connections, allow retrofitting without modifying existing methods, allow fully automated control and feedback via onboard maintenance procedures, eliminate gas consumption during normal operation of the analysis, reduce overall annual gas consumption for all users, and / or support inexpensive and sustainable nitrogen in addition to helium. These solutions maintain a vacuum in the vacuum chamber. These solutions allow non-fluid connection to the mass spectrometer purge flow when the column is connected, thereby allowing the purge flow to be shut off during analysis and preventing additional flow to the mass spectrometer. Additional flow could interfere with the analysis and is unnecessary.
[0024] Figure 1This is a schematic diagram of a gas chromatography-mass spectrometry system 100. The GC-MS system 100 may include a representative GC-MS system. The GC-MS system 100 may include a gas chromatograph 135 (GC).
[0025] The gas chromatograph 135 may include one or more injection ports 105 (e.g., inlet, sample inlet). The injection port 105 may receive a sample injected into the gas chromatograph 135 for analysis. For example, a sample may be injected into the injection port 105, where, if not already in a gaseous state, the sample is evaporated into a gaseous state for analysis by the gas chromatograph 135.
[0026] The gas chromatograph 135 may include one or more pressurized gas sources 110 (e.g., pressurized gas supply, gas source, gas supply, supply gas). The pressurized gas source 110 may include a storage tank. The pressurized gas source 110 (e.g., carrier gas supply, carrier gas source, carrier gas) may be fluidly coupled (e.g., connected) to the injection port 105. The pressurized gas source 110 may supply a carrier gas, such as, but not limited to, helium, hydrogen, nitrogen, argon / methane mixtures, or other such inert gases, which delivers the injected sample from the injection port 105 through the gas chromatograph 135. The pressurized gas source 110 may include a source of pressurized gas. The pressurized gas source 110 may be a pressurized gas distribution system. The pressurized gas can be found in a laboratory. The pressurized gas source 110 may include a variety of gases. The pressurized gas source 110 may be coupled to the gas chromatograph 135 via a distribution panel.
[0027] The gas chromatograph 135 may include one or more electronic pneumatic control (EPC) modules 140 (e.g., flow control modules). The EPC module 140 may be coupled (e.g., connected) to a pressurized gas source 110. The EPC module 140 may be fluidly coupled to an injection port 105. For example, the injection port 105 may be attached to the EPC module 140. The EPC module 140 may control the flow rate and / or pressure of the injection port 105. The carrier gas may travel to the first EPC module before reaching the injection port 105. Each inlet may have its own EPC module 140. Each EPC module 140 may be coupled to the same gas supply or different gas supplies.
[0028] Gas chromatograph 135 may include one or more columns 115 (e.g., tubes, flow restrictors, separation columns). Columns 115 may be fluidly coupled to injection port 105. Columns 115 may be selected from a wide variety of columns used for separating sample components by gas chromatography. Gas chromatograph 135 configured for backflushing, detector splitting, or other pneumatic switching may include multiple columns 115. A carrier gas may deliver a sample from injection port 105 to column 115 for separation. Column 115 may separate components of a gaseous sample to produce one or more analytes of interest for analysis by gas chromatograph 135. Column 115 may include capillary columns and / or may include fused silica tubing with a coating (e.g., a stationary phase coating) on the inner portion of the tubing, the coating interacting with the sample injected into injection port 105 to separate sample components. Column 115 may be made of metal. The dimensions of column 115 may include an inner diameter ranging from 50 μm to 530 μm and a length ranging up to 200 meters. Injection port 105 can supply a sample to column 115 for separation. Column 115 may include a separation column or a column used as a flow restrictor fluidly connected to the separation column.
[0029] Gas chromatograph 135 may include one or more column heaters 125. Column heater 125 may include an oven, convection heater, conduction heater, air bath, or other such heating devices for heating certain components of gas chromatograph 135. Column heater 125 can heat or cool column 115 and other flow path components to a desired temperature. Column heater 125 may be configured to heat column 115 such that column 115 remains isothermal during sample analysis.
[0030] Gas chromatograph 135 may include one or more controllers 130. Controllers 130 may be directly or indirectly communicatively connected to column heater 125, injection port 105, one or more sensors, and / or other components of gas chromatograph 135. Controllers 130 may be electrically coupled to gas chromatograph 135. Controllers 130 may be onboard computing units physically integrated into the housing of gas chromatograph 135, which houses column 115, column heater 125, and other components of gas chromatograph 135. Controllers 130 may be one or more separate computing devices and / or other such control devices located inside and / or outside the housing of gas chromatograph 135. Controllers 130 or a portion thereof may reside within gas chromatograph 135. For example, controllers 130 or a portion thereof may be located within gas chromatograph 135. Controllers 130 may be distributed among multiple locations. Controllers 130 may be located outside gas chromatograph 135.
[0031] The controller 130 may include one or more processors configured to execute, analyze, and process data and information from the gas chromatograph 135, such as, but not limited to, a single-core processor, a multi-core processor, a logic device, or other such data processing circuitry. The controller 130 may include a non-transitory memory device communicatively connected to the processor. The memory device may be configured as a volatile memory device (e.g., SRAM and DRAM), a non-volatile memory device (e.g., flash memory, ROM, and hard disk drive), or any combination thereof. The memory device may store executable code and other such information generated and / or processed by the processor during operation of the gas chromatograph 135.
[0032] The gas chromatograph 135 may include one or more input / output devices communicatively connected to the controller 130. The input / output devices enable an operator and / or user to receive information from the controller 130 and input information and parameters into the controller 130. Such information and parameters may be stored in a memory device, accessed by a processor, and output to the input / output devices. For example, the input / output devices may include a monitor, display device, touchscreen device, keyboard, microphone, joystick, dial, button, or other such devices to enable the input and output of information and parameters. The input / output devices may be used to input information into the controller 130 and output or otherwise display information and data generated by the processor of the gas chromatograph 135.
[0033] Gas chromatograph 135 may include one or more accessories 150 (e.g., interfaces, connectors, ventless interfaces, ventless GC-MS interfaces). Accessory 150 may be made of stainless steel. Accessory 150 may be disposed within gas chromatograph 135. For example, accessory 150 may be partially disposed within gas chromatograph 135. Accessory 150 may be fluidly connected to mass spectrometer 145 (MS). Accessory 150 may be fluidly connected to column 115. Column 115 may be disposed within accessory 150.
[0034] GC-MS system 100 may include a mass spectrometer 145. Mass spectrometer 145 may be connected to gas chromatograph 135 via mass spectrometer flow path 155. Mass spectrometer flow path 155 may be downstream of column 115. Column 115 may be upstream of mass spectrometer flow path 155. Column 115 may include a fitting that delivers flow moving from gas chromatograph 135 toward mass spectrometer 145. Fitting 150 may be fluidly connected to mass spectrometer flow path 155. Mass spectrometer flow path 155 may include tubing. The interior of mass spectrometer 145 may include a chamber. Mass spectrometer flow path 155 may provide confinement.
[0035] The mass spectrometer flow path 155 can have an inner diameter ranging from 50 μm to 150 μm. For example, the inner diameter of the mass spectrometer flow path 155 can be in the range of 50 μm to 75 μm, 50 μm to 100 μm, 50 μm to 125 μm, 50 μm to 150 μm, 75 μm to 100 μm, 75 μm to 125 μm, 75 μm to 150 μm, 100 μm to 125 μm, 100 μm to 150 μm, or 125 μm to 150 μm. The inner diameter of the mass spectrometer flow path 155 can be less than 50 µm. The inner diameter of the mass spectrometer flow path 155 can be greater than 150 µm.
[0036] The mass spectrometer flow path 155 can be made of molten silica or metal (e.g., passivated metal). The mass spectrometer flow path 155 can have a length ranging from 10 cm to 30 cm. For example, the length of the mass spectrometer flow path 155 can be in the range of 10 cm to 15 cm, 10 cm to 20 cm, 10 cm to 25 cm, 10 cm to 30 cm, 15 cm to 20 cm, 15 cm to 25 cm, 15 cm to 30 cm, 20 cm to 25 cm, 20 cm to 30 cm, or 25 cm to 30 cm. The length of the mass spectrometer flow path 155 can be less than 10 cm. The length of the mass spectrometer flow path 155 can be greater than 30 cm.
[0037] Mass spectrometer 145 may include ion source 160 (e.g., ionization device). The output of gas chromatograph 135 may be provided to ion source 160. Ion source 160 may be fluidly connected to accessory 150 via (e.g., through) mass spectrometer flow path 155 and may be downstream of mass spectrometer flow path 155. Ion source 160 may generate analyte ions from a sample stream received from gas chromatograph 135. Ion source 160 may include electron collision device or chemical ionization device.
[0038] Mass spectrometer 145 may include mass analyzer 165. Ion source 160 may direct analyte ions into mass analyzer 165. Mass analyzer 165 may include means configured to separate, sort, or filter analyte ions based on their respective mass (e.g., mass-to-charge ratio or m / z ratio). Examples of mass analyzer 165 may include multi-electrode structures (e.g., mass filters, ion traps), time-of-flight (TOF) components, electrostatic analyzers (ESA), or magnetic sectors. Mass analyzer 165 may include a system with more than one mass analyzer. Mass analyzer 165 may be fluidly coupled to ion source 160.
[0039] Mass spectrometer 145 may include ion detector 120. Ion detector 120 may include means configured to collect and measure the flux (or current) of mass-discriminate ions output from mass analyzer 165. Examples of ion detector 120 may include electron multipliers, photomultipliers, and Faraday cups. Ion detector 120 may be fluidly coupled to mass analyzer 165.
[0040] Mass spectrometer 145 may include a vacuum system 170. Vacuum system 170 can maintain ion source 160 at a desired low pressure or vacuum level. Vacuum system 170 can maintain mass analyzer 165 and ion detector 120 at desired vacuum levels. Vacuum system 170 may include one or more vacuum pumps. Vacuum system 170 can maintain one or more components of mass spectrometer 145 (e.g., chambers) at desired vacuum levels.
[0041] Figure 2 This is a schematic diagram of a portion of a GC-MS system 100. The GC-MS system 100 may include a mass spectrometer flow path 155 and a column 115. The mass spectrometer flow path 155 may be fluidly connected to the column 115.
[0042] The GC-MS system 100 may include a transport line 250 (e.g., an MS transport line, a mass spectrometer transport line). A fitting 150 may be screwed into the transport line 250 or clamped using an alternative device. A mass spectrometer flow path 155 may be coupled to the transport line 250. The transport line 250 may include a tube having an inner diameter large enough to accommodate the mass spectrometer flow path 155 within the tube. The transport line 250 may include a tube with a flange. The flange may seal to one side of the mass spectrometer 145. The transport line 250 may accommodate the mass spectrometer flow path 155. The mass spectrometer flow path 155 may be inserted into the transport line 250. The transport line 250 may be made of metal (e.g., stainless steel). The fitting 150 may be welded or brazed to the transport line 250. The fitting 150 may be securely attached to the transport line 250. The fitting 150 may be machined from an end of the transport line 250. Fitting 150 may be permanently or non-permanently attached to transmission line 250. Fitting 150 and transmission line 250 may be coupled to form a gas-proof seal.
[0043] The GC-MS system 100 may include an accessory 150. Accessory 150 may be fluidly connected to a mass spectrometer 145. For example, accessory 150 may be fluidly connected to the mass spectrometer 145 via a mass spectrometer flow path 155. Accessory 150 may be fluidly connected to a gas chromatograph 135. For example, accessory 150 may be fluidly connected to the gas chromatograph 135 via a column 115. Accessory 150 may be made of a metal (e.g., stainless steel).
[0044] Fitting 150 may include a sealing surface 210 (e.g., a fitting sealing surface). Sealing surface 210 may include a tapered sealing surface. Sealing surface 210 may be configured to seal against a collar (e.g., forming a gas-impermeable connection with the collar). The tapered sealing surface may be configured to seal with the collar. Sealing surface 210 may be coupled to the collar. For example, sealing surface 210 may receive the collar. Sealing surface 210 may be less rough than non-sealing surfaces. Sealing surface 210 may be free of scratches in the same direction as post 115. Sealing surface 210 may be sufficiently rigid to avoid deformation and damage.
[0045] Accessory 150 may include one or more gas purge flow paths 220. For example, the one or more gas purge flow paths 220 may include one gas purge flow path, two gas purge flow paths, three gas purge flow paths, four gas purge flow paths, or five gas purge flow paths. The one or more gas purge flow paths 220 may include more than five gas purge flow paths.
[0046] The one or more gas purge flow paths 220 may allow purge gas flow. For example, the one or more gas purge flow paths 220 may allow at least one of nitrogen, helium, or hydrogen to flow. The one or more gas purge flow paths 220 may be connected to (e.g., welded to, brazed to) fitting 150. For example, the one or more gas purge flow paths 220 may be connected to fitting 150 upstream of sealing surface 210. The one or more gas purge flow paths 220 may be connected to fitting 150 upstream of the seal between the collar and sealing surface 210. The one or more gas purge flow paths 220 may be welded to or brazed to fitting 150. The one or more gas purge flow paths 220 may be fluidly connected to fitting 150. The one or more gas purge flow paths 220 may be mechanically or physically connected to (e.g., coupled to, attached to) fitting 150. The one or more gas purge flow paths 220 may allow gas flow that will not damage the hot components (e.g., components above 100°C) of the mass spectrometer 145 under vacuum.
[0047] The one or more gas purge flow paths 220 may include multiple gas purge flow paths. For example, the one or more gas purge flow paths 220 may include a first gas purge flow path. The one or more gas purge flow paths 220 may include a second gas purge flow path. The first gas purge flow path may be configured opposite to the second gas purge flow path. The first gas purge flow path and the second gas purge flow path may be located on the same side. The one or more gas purge flow paths 220 may be spaced equidistantly or unequally around the accessory 150.
[0048] The one or more gas purge flow paths 220 may include a first side 225. The one or more gas purge flow paths 220 may include a second side 230. Purge gas can flow from the second side 230 to the first side 225 of the one or more gas purge flow paths 220. The first side 225 of the one or more gas purge flow paths 220 may be connected to the fitting 150 upstream of the sealing surface 210. The first side 225 of the one or more gas purge flow paths 220 may be fluidly connected to the fitting 150 upstream of the sealing surface 210. The first side 225 of the one or more gas purge flow paths 220 may be mechanically or physically connected to the fitting 150 upstream of the sealing surface 210.
[0049] The one or more gas purging flow paths 220 may include one or more tubes. For example, the one or more tubes may include one tube, two tubes, three tubes, four tubes, or five tubes. The one or more tubes may include more than five tubes. The one or more tubes may be made of stainless steel. For example, the one or more tubes may be made of austenitic stainless steel. The one or more tubes may be corrosion resistant. The one or more tubes may be welded or brazed to fitting 150. The one or more tubes may be attached to fitting 150 by forming an impermeable gas seal and being able to withstand elevated temperatures. The one or more tubes may be connected to fitting 150. For example, the one or more tubes may be connected to fitting 150 at a distance ranging from 0.5 mm to 10 mm upstream of sealing surface 210. The distance between the one or more tubes and sealing surface 210 may be in the range of 0.5 mm to 1 mm, 0.5 mm to 2 mm, 0.5 mm to 5 mm, 0.5 mm to 10 mm, 1 mm to 2 mm, 1 mm to 5 mm, 1 mm to 10 mm, 2 mm to 5 mm, 2 mm to 10 mm, or 5 mm to 10 mm. The distance can be less than 0.5 mm or greater than 10 mm.
[0050] The diameter 305 (e.g., inner diameter) of the one or more tubes can be in the range of 300 µm to 1000 µm. For example, the diameter 305 of the one or more tubes can be 300 μm, 350 μm, 400 μm, 450 μm, 500 μm, 550 μm, 600 μm, 650 μm, 700 μm, 750 μm, 800 μm, 850 μm, 900 μm, 950 μm, or 1000 μm. The diameter 305 of the one or more tubes can be from 300 μm to 400 μm, 300 μm to 500 μm, 300 μm to 600 μm, 300 μm to 700 μm, 300 μm to 800 μm, 300 μm to 900 μm, 300 μm to 1000 μm, 400 μm to 500 μm, 400 μm to 600 μm, 400 μm to 700 μm, 400 μm to 800 μm, 400 μm to 900 μm, 400 μm to 1000 μm, 500 μm to 600 μm, 500 μm to 700 μm, 500 μm to 800 μm, 500 μm to 900 μm, 500 μm to 1000 μm, 600 μm to 700 μm, 600 μm to 700 μm. The diameter can be within the range of 800 μm to 800 μm, 600 μm to 900 μm, 600 μm to 1000 μm, 700 μm to 800 μm, 700 μm to 900 μm, 700 μm to 1000 μm, 800 μm to 900 μm, 800 μm to 1000 μm, or 900 μm to 1000 μm. The diameter can be less than 300 μm or greater than 1000 μm.
[0051] The gas flowing through the one or more gas purging flow paths 220 can be controlled by a dedicated electro-pneumatic control module 140. The electro-pneumatic control module 140 can direct the gas (e.g., an inert gas) toward the sealing surface 210. For example, the electro-pneumatic control module 140 can direct the gas toward the sealing surface 210 to prevent oxygen from entering the mass spectrometer 145. The oxygen can be from ambient air (e.g., room air). The electro-pneumatic control module 140 can direct the gas toward the sealing surface 210 to prevent oxygen from entering the vacuum of the mass spectrometer 145. The electro-pneumatic control module 140 can direct the gas toward the sealing surface 210 to completely purge oxygen from the cavity or volume defined by the conical sealing surface.
[0052] The electro-pneumatic control module 140 can initiate flow or pressure before (e.g., immediately before) the seal between the sealing surface 210 of fitting 150 and the raceway is broken. This allows the gas to be purged in the one or more gas purging flow paths 220, which is defined by the tapered sealing surface, when the column 115 is removed.
[0053] The electro-pneumatic control module 140 can automatically initiate gas flow through the one or more gas purging flow paths 220. For example, the electro-pneumatic control module 140 can allow gas to flow through the one or more gas purging flow paths 220 in response to the disconnection of the flow path. The electro-pneumatic control module 140 can allow gas to flow through the one or more gas purging flow paths 220 in response to the removal of the column 115. The electro-pneumatic control module 140 can allow gas to flow through the one or more gas purging flow paths 220 in response to the disconnection of a fluid-impermeable seal.
[0054] When a user runs a maintenance procedure involving disconnecting the flow path, the electro-pneumatic control module 140 can automatically initiate the flow of purge gas through the one or more gas purge flow paths 220. The electro-pneumatic control module 140 can control at least one of the flow rate or pressure of the purge gas in the one or more gas purge flow paths 220. The flow through each of the one or more gas purge flow paths 220 can be the same or different. A single electro-pneumatic control module 140 can provide flow to all of the one or more gas purge flow paths 220. Each of the one or more gas purge flow paths 220 can have a separate electro-pneumatic control module 140.
[0055] Accessory 150 may include one or more first chambers 205. A mass spectrometer flow path 155 may be coupled to a first chamber 205. A first chamber 205 may include the volume of the gap between a bridging column 115 and the mass spectrometer flow path 155. The first chamber 205 may be fluidly connected to the column 115. The first chamber 205 may include a first side 235. The first chamber 205 may include a second side 240. The first chamber 205 may be coupled to a sealing surface 210. For example, the first side 235 of the first chamber 205 may be coupled to the sealing surface 210. A first side 225 of the one or more gas purge flow paths 220 may be connected upstream of the first chamber 205 to accessory 150. The first chamber 205 may couple a gas chromatograph 135 to a mass spectrometer 145. An electronic pneumatic control module 140 may direct gas toward the sealing surface 210 to prevent oxygen from entering the first chamber 205. The first cavity 205 can be fluidly coupled to the vacuum system 170. The distance between the first cavity 205 and the one or more gas purge flow paths 220 can be up to 1 cm. The distance between the first cavity 205 and the one or more gas purge flow paths 220 can be in the range of 0.5 mm to 10 mm. The distance between the first cavity 205 and the one or more gas purge flow paths 220 can be greater than 1 cm. The inner diameter of the first cavity 205 can be greater than the outer diameter of the column 115.
[0056] The GC-MS system 100 may include one or more collars. The collar may include a first collar 212 or a second collar 214. The collar may be of any shape. For example, the collar may be tapered. A post 115 (e.g., a tube) may be disposed in the first collar 212. The first collar 212 may be coupled to the post 115. For example, the post 115 may be inserted into the first collar 212. A first cavity 205 may terminate at the first collar 212 and / or the second collar 214. The collar may have a taper angle in the range of 30 degrees to 70 degrees. For example, the cone angle can be in the range of 30 to 40 degrees, 30 to 50 degrees, 30 to 60 degrees, 30 to 70 degrees, 30 to 80 degrees, 40 to 50 degrees, 40 to 60 degrees, 40 to 70 degrees, 40 to 80 degrees, 50 to 60 degrees, 50 to 70 degrees, 50 to 80 degrees, 60 to 70 degrees, 60 to 80 degrees, or 70 to 80 degrees. The ferrule can be made of various materials, such as polyimide-based plastics (e.g., Vespel), graphite, polytetrafluoroethylene, steel, gold-plated steel, and / or brass.
[0057] The ferrule can have an inner diameter ranging from 0.1 mm to 0.8 mm. For example, the inner diameter of the collar can be in the range of 0.1 mm to 0.2 mm, 0.1 mm to 0.25 mm, 0.1 mm to 0.3 mm, 0.1 mm to 0.4 mm, 0.1 mm to 0.5 mm, 0.1 mm to 0.6 mm, 0.1 mm to 0.7 mm, 0.1 mm to 0.8 mm, 0.2 mm to 0.25 mm, 0.2 mm to 0.3 mm, 0.2 mm to 0.4 mm, 0.2 mm to 0.5 mm, 0.2 mm to 0.6 mm, 0.2 mm to 0.7 mm, 0.2 mm to 0.8 mm, 0.25 mm to 0.3 mm, 0.25 mm to 0.4 mm, 0.25 mm to 0.5 mm, 0.25 mm to 0.6 mm, 0.25 mm to 0.7 mm, 0.25 mm to 0.8 mm, 0.3 mm to 0.4 mm, and 0.3 mm to 0.5 mm. The range is 0.3 mm to 0.6 mm, 0.3 mm to 0.7 mm, 0.3 mm to 0.8 mm, 0.4 mm to 0.5 mm, 0.4 mm to 0.6 mm, 0.4 mm to 0.7 mm, 0.4 mm to 0.8 mm, 0.5 mm to 0.6 mm, 0.5 mm to 0.7 mm, 0.5 mm to 0.8 mm, 0.6 mm to 0.7 mm, 0.6 mm to 0.8 mm, or 0.7 mm to 0.8 mm.
[0058] A first collar 212 and a second collar 214 may be disposed on opposite ends of the first cavity 205. The first collar 212 may be configured to couple with a sealing surface 210 and create a gas-impermeable seal between the column 115, the first collar 212, and the sealing surface 210. The first collar 212 may be disposed upstream of and adjacent to a first side 235 of the first cavity 205. A mass spectrometer flow path 155 may be disposed within the second collar 214. The sealing surface 210 may be disposed upstream of and adjacent to the first side 235 of the first cavity 205. The second collar 214 may be disposed downstream of and adjacent to a second side 240 of the first cavity 205. The second collar 214 may be configured to couple with a transport line 250, a mass spectrometer flow path 155, and / or a fitting 150. For example, the second collar 214 may form a gas-impermeable seal with the transport line 250, the mass spectrometer flow path 155, and the fitting 150. The transfer line 250 can be fluidly coupled to the vacuum system 170. The fitting 150 can be screwed onto the transfer line 250. This can be achieved by applying force from the end of the transfer line 250 to the back of the second collar 214, causing the second collar 214 to create a seal with the fitting 150, the mass spectrometer flow path 155, and the transfer line 250.
[0059] The first collar 212 can be coupled to a threaded nut 245. The threaded nut 245 can apply pressure to the first collar 212. For example, the threaded nut 245 can apply pressure to the first collar 212 such that the first collar 212 abuts against the sealing surface 210 to form a first seal (e.g., a fluid-impermeable seal) and against the post 115 to form a second seal. The threaded nut 245 can be pushed against the back of the first collar 212. The threaded nut 245 can be screwed into the fitting 150. Various mechanisms, such as clamping mechanisms, can be used to apply pressure to the first collar 212 to create a seal.
[0060] Figure 2 The portion of the GC-MS system 100 shown illustrates a state in which the one or more gas purge flow paths 220 are not in fluid communication with the mass spectrometer flow path 155. In this state, the column 115 can be fluidly connected to the mass spectrometer flow path 155. Additionally, in this state, a fluid-impermeable seal can exist between the first collar 212, the column 115, and the fitting 150. The column 115 can be installed in the fitting 150.
[0061] Figure 3This is a schematic diagram of a portion of a GC-MS system 100. The GC-MS system 100 may include a mass spectrometer flow path 155, a column 115, an electronic pneumatic control module 140, accessories 150, a first chamber 205, a sealing surface 210, a first collar 212, a second collar 214, one or more gas purging flow paths 220, and a threaded nut 245.
[0062] Figure 3 The portion of the GC-MS system 100 shown illustrates the state of the system in which one or more gas purge flow paths 220 are in fluid communication with the mass spectrometer flow path 155. In this state, there is no fluid-impermeable seal between the first collar 212, the column 115, and the sealing surface 210 of the fitting 150. The column 115 can be partially removed from the fitting 150.
[0063] Figure 4 This is a schematic diagram of a portion of a GC-MS system 100. The GC-MS system 100 may include a mass spectrometer flow path 155, a column 115, an electronic pneumatic control module 140, accessories 150, a first chamber 205, a sealing surface 210, a first collar 212, a second collar 214, and one or more gas purging flow paths 220.
[0064] The one or more gas purging flow paths 220 may include one or more pipes. The angle 405 between the one or more pipes and the axis of the first cavity 205 can be in the range of 0 degrees to 180 degrees. For example, the angle 405 between the one or more pipes and the axis of the first cavity 205 can be 0 degrees, 1 degree, 5 degrees, 10 degrees, 20 degrees, 30 degrees, 40 degrees, 50 degrees, 60 degrees, 70 degrees, 80 degrees, 90 degrees, 100 degrees, 110 degrees, 120 degrees, 130 degrees, 140 degrees, 150 degrees, 160 degrees, 170 degrees, or 180 degrees. The angle 405 between the one or more pipes and the axis of the first cavity 205 can be in the range of 90 degrees to 120 degrees, 90 degrees to 150 degrees, 90 degrees to 180 degrees, 120 degrees to 150 degrees, 120 degrees to 180 degrees, or 150 degrees to 180 degrees. The one or more gas purging flow paths 220 may be arranged parallel to the first cavity 205. For example, the one or more tubes of the one or more gas purging flow paths 220 may be arranged parallel to the first cavity 205.
[0065] The one or more gas purging flow paths 220 may be coupled to a second cavity 415. The second cavity 415 may be located upstream of the sealing surface 210. The second cavity 415 may also be located downstream of the one or more gas purging flow paths 220. The angle 410 between the one or more tubes and the surface of the second cavity 415 may be in the range of 0 degrees to 90 degrees. For example, the angle 410 between the one or more tubes and the surface of the second cavity 415 may be 0 degrees, 1 degree, 5 degrees, 10 degrees, 20 degrees, 30 degrees, 35 degrees, 40 degrees, 45 degrees, 50 degrees, 60 degrees, 70 degrees, 80 degrees, or 90 degrees. The angle 410 between the one or more tubes and the surface of the second cavity 415 may be greater than 90 degrees. The angle 410 between the one or more tubes and the surface of the second cavity 415 can be in the range of 25 to 30 degrees, 25 to 35 degrees, 25 to 40 degrees, 25 to 45 degrees, 25 to 50 degrees, 25 to 55 degrees, 30 to 35 degrees, 30 to 40 degrees, 30 to 45 degrees, 30 to 50 degrees, 30 to 55 degrees, 35 to 40 degrees, 35 to 45 degrees, 35 to 50 degrees, 35 to 55 degrees, 40 to 45 degrees, 40 to 50 degrees, 40 to 55 degrees, 45 to 50 degrees, 45 to 55 degrees, or 50 to 55 degrees.
[0066] Gas flowing through the one or more gas purge flow paths 220 can be directed toward the sealing surface 210. For example, gas flowing through the one or more gas purge flow paths 220 can be directed toward the sealing surface 210 to prevent oxygen from entering the mass spectrometer 145. Gas flowing through the one or more gas purge flow paths 220 can prevent oxygen from entering the vacuum chamber of the mass spectrometer 145. Gas flowing through the one or more gas purge flow paths 220 can prevent oxygen from entering the second chamber 415.
[0067] The first collar 212 may include a sealing surface 420. The sealing surface 420 of the first collar 212 may be a surface of the first collar 212. The sealing surface 420 of the first collar 212 may be configured to seal against the fitting sealing surface 210. The sealing surface 420 of the first collar 212 may seal with the tapered sealing surface of the fitting 150. For example, the sealing surface 420 of the first collar 212 may form a gas-impermeable connection with the fitting sealing surface 210.
[0068] The first sleeve 212 may include a sealing surface 425. The sealing surface 425 of the first sleeve 212 may be the surface of the first sleeve 212. The sealing surface 425 of the first sleeve 212 may seal with the outer diameter of the post 115. For example, the sealing surface 425 of the first sleeve 212 may form a gas-impermeable connection with the outer diameter of the post 115.
[0069] Figure 4 The portion of the GC-MS system 100 shown illustrates the state of the system in which one or more gas purge flow paths 220 are in fluid communication with the mass spectrometer flow path 155. In this state, there is no fluid-impermeable seal between the first collar 212, the column 115, and the fitting 150. The column 115 can be completely removed from the fitting 150.
[0070] Figure 5 This is a cross-sectional view of a schematic computational fluid dynamics simulation of a portion of a gas chromatography-mass spectrometry system 100. The gas chromatography-mass spectrometry system 100 may include a first chamber 205, a sealing surface 210, and one or more gas purge flow paths 220. Purge gas can flow through the one or more gas purge flow paths 220. The purge gas from the one or more gas purge flow paths 220 can prevent oxygen from entering the mass spectrometer 145. The purge gas from the one or more gas purge flow paths 220 can prevent oxygen from entering the vacuum chamber of the mass spectrometer 145. The purge gas from the one or more gas purge flow paths 220 can completely purge oxygen from a volume 505 defined by the sealing surface 210.
[0071] Figure 6 This is a schematic diagram of a portion of a GC-MS system 100. The GC-MS system 100 may include a mass spectrometer flow path 155, a column 115, an electronic pneumatic control module 140, accessories 150, a sealing surface 210, a first collar 212, one or more gas purging flow paths 220, and a threaded nut 245.
[0072] Instead of having a second collar 214, the mass spectrometer flow path 155 can be a metal tube (e.g., a flow restrictor) permanently attached to the fitting 150 by brazing or otherwise through a gas-impermeable seal. The fitting 150 can be permanently attached to the transport line 250 by brazing or otherwise through a gas-impermeable seal. The mass spectrometer flow path 155 may have an internal passivation coating to prevent interaction between the analyte and the surface of the mass spectrometer flow path 155.
[0073] Figure 6 The portion of the GC-MS system 100 shown illustrates a state in which the one or more gas purge flow paths 220 are not in fluid communication with the mass spectrometer flow path 155. In this state, the column 115 can be fluidly connected to the mass spectrometer flow path 155. Additionally, in this state, a fluid-impermeable seal can exist between the first collar 212, the column 115, and the fitting 150. The column 115 can be installed in the fitting 150.
[0074] Fitting 150 can be machined into the end of the transport line 250. For example, fitting 150 and transport line 250 can be machined from the same material. Fitting 150 and transport line 250 can be machined from the same material, and the inner diameter of transport line 250 can be made to match the inner diameter of mass spectrometer flow path 155. Mass spectrometer flow path 155 can be attached to fitting 150 by permanent or non-permanent methods. For example, a disc can be brazed to the end of mass spectrometer flow path 155. Sealing can be achieved using cutting edges or gaskets between the disc and fitting 150, and between the disc and transport line 250.
[0075] Figure 7 This is a schematic diagram of a portion of a GC-MS system 100. The GC-MS system 100 may include a mass spectrometer flow path 155, a column 115, an electro-pneumatic control module 140, fittings 150, a sealing surface 210, a first collar 212, one or more gas purge flow paths 220, and a threaded nut 245. Instead of having a second collar 214, the mass spectrometer flow path 155 may be a metal tube.
[0076] Figure 7 The portion of the GC-MS system 100 shown illustrates the state of the system in which one or more gas purge flow paths 220 are in fluid communication with the mass spectrometer flow path 155. In this state, there is no fluid-impermeable seal between the first collar 212, the column 115, and the sealing surface 210 of the fitting 150. The column 115 can be partially removed from the fitting 150.
[0077] Figure 8 This is a schematic diagram of a portion of a GC-MS system 100. The GC-MS system 100 may include a mass spectrometer flow path 155, a column 115, an electro-pneumatic control module 140, fittings 150, a sealing surface 210, a first collar 212, one or more gas purge flow paths 220, a threaded nut 245, a sealing surface 420 of the first collar 212, and a sealing surface 425 of the first collar 212. Instead of having a second collar 214, the mass spectrometer flow path 155 may be a metal tube.
[0078] Figure 8 The portion of the GC-MS system 100 shown illustrates the state of the system in which one or more gas purge flow paths 220 are in fluid communication with the mass spectrometer flow path 155. In this state, there is no fluid-impermeable seal between the first collar 212, the column 115, and the fitting 150. The column 115 can be completely removed from the fitting 150.
[0079] Figure 9This is a schematic flowchart illustrating a method 900 for providing a gas chromatography-mass spectrometry interface without exhaust gas. Method 900 may include providing a mass spectrometer flow path (box 905). Method 900 may include setting a sealing surface (box 910). Method 900 may include setting one or more gas purge flow paths (box 915). In a first state, method 900 may include decoupling the sealing surface from the collar (box 920). In the first state, method 900 may include allowing purge gas to flow (box 925). In a second state, method 900 may include coupling the sealing surface (box 930). In the second state, method 900 may include stopping the flow of purge gas (box 935). In the second state, method 900 may include allowing sample flow (box 940).
[0080] Method 900 may include providing a mass spectrometer flow path (block 905). The mass spectrometer flow path may be downstream of the column. The mass spectrometer flow path may include a tube. The mass spectrometer flow path may be coupled to a transport line. The mass spectrometer flow path may be coupled to a first chamber.
[0081] Method 900 may include providing a sealing surface (block 910). For example, method 900 may include providing a sealing surface upstream of and adjacent to the mass spectrometer flow path. The sealing surface may include a tapered sealing surface.
[0082] Method 900 may include providing one or more gas purge flow paths (block 915). For example, method 900 may include providing one or more gas purge flow paths upstream of a sealing surface. The one or more gas purge flow paths may allow a purge gas to flow. For example, the one or more gas purge flow paths may allow at least one of nitrogen, helium, or hydrogen to flow. The one or more gas purge flow paths may be connected to a fitting. For example, the one or more gas purge flow paths may be connected to a fitting upstream of the sealing surface.
[0083] In a first state, method 900 may include decoupling a sealing surface (block 920). Decoupling a sealing surface (e.g., a ring seal) may include decoupling the sealing surface of the fitting from the ring. For example, decoupling a sealing surface may include separating the sealing surface from the ring. Decoupling a sealing surface from the ring may place the one or more gas purge flow paths in fluid communication with the mass spectrometer flow path. Decoupling a sealing surface may include disconnecting the flow path (e.g., eliminating a gas-impermeable seal between the ring and the sealing surface and fluidly connecting the one or more gas purge flow paths to the mass spectrometer flow path). Decoupling a sealing surface from the ring may place the gas purge flow path in fluid communication with the mass spectrometer flow path. The ring may be coupled to a column. In the first state, the column may not be in fluid communication with the mass spectrometer flow path.
[0084] In the first state, method 900 may include circulating purge gas (block 925). Circulating purge gas may include flowing purge gas through the one or more gas purge flow paths. Circulating purge gas may occur simultaneously with decoupling the sealing surface. Circulating purge gas may occur automatically. For example, circulating purge gas may occur automatically in response to decoupling the sealing surface. When a user runs a maintenance procedure involving disconnecting the flow path, the electronic pneumatic control module may automatically initiate purge gas flow through the one or more gas purge flow paths. Circulating purge gas may occur before, after, or simultaneously with decoupling the sealing surface. Circulating purge gas before decoupling the sealing surface from the raceway can prevent initial air entry into the mass spectrometer before the purge gas upflow.
[0085] Flowing purge gas through the one or more gas purge flow paths may include flowing the purge gas at a rate of at least 30 mL / min. For example, the purge gas flow rate may be greater than or equal to 30 mL / min, 40 mL / min, 50 mL / min, 60 mL / min, 70 mL / min, 80 mL / min, 90 mL / min, 100 mL / min, 125 mL / min, 150 mL / min, 175 mL / min, or 200 mL / min. Method 900 may include controlling the flow rate of the purge gas. Flowing purge gas through the one or more gas purge flow paths may include flowing the purge gas at a rate of less than 30 mL / min.
[0086] In some embodiments, method 900 may include preventing oxygen from entering the vacuum system or vacuum chamber of the mass spectrometer in a first state. For example, an electro-pneumatic control module may direct gas toward a sealed surface to prevent oxygen from entering the mass spectrometer. The oxygen may originate from ambient air (e.g., room air). The electro-pneumatic control module may direct gas toward a sealed surface to prevent oxygen from entering the vacuum of the mass spectrometer.
[0087] Method 900 may include controlling the pressure of the purge gas. For example, the purge gas pressure may be in the range of 0.1 psi to 50 psi. Specifically, the purge gas pressure may be in the ranges of 0.1 psi to 1 psi, 0.1 psi to 5 psi, 0.1 psi to 10 psi, 0.1 psi to 25 psi, 0.1 psi to 50 psi, 1 psi to 5 psi, 1 psi to 10 psi, 1 psi to 25 psi, 1 psi to 50 psi, 5 psi to 10 psi, 5 psi to 25 psi, 5 psi to 50 psi, 10 psi to 25 psi, 10 psi to 50 psi, or 25 psi to 50 psi. The purge gas pressure may be greater than 50 psi. The actual operating pressure may vary depending on the hardware configuration (e.g., gas type) and whether there are built-in limitations in the device.
[0088] After verifying that the purge gas is flowing, the user can be notified that the column can be disconnected. When the column is disconnected, a certain amount of purge gas (e.g., inert purge gas) can leak into the vacuum chamber. The remainder of the purge gas can leak into the chamber. After the new column is installed, the user can instruct the system to continue operating, and the purge gas flow can be automatically shut off. Because the vacuum is never compromised and only inert gas enters the GC-MS system, the GC-MS system can stabilize and be ready for operation within minutes, rather than several hours.
[0089] In the second state, method 900 may include a coupling sealing surface (block 930). For example, method 900 may include coupling the sealing surface to a collar. Coupling the sealing surface may include coupling the sealing surface to a collar. For example, coupling the sealing surface may include sealing the sealing surface to the collar. This may include applying force to the collar to seal the collar to the sealing surface and / or the column, and creating a gas-impermeable seal between these components. Coupling the sealing surface to the collar may remove fluid communication between the one or more gas purge flow paths and the mass spectrometer flow path. Coupling the sealing surface to the collar may allow the column to be in fluid communication with the mass spectrometer flow path. Coupling the sealing surface to the collar may create a fluid connection between the column and the mass spectrometer flow path. Coupling the sealing surface to the collar may remove (e.g., eliminate) fluid communication (e.g., connect) between the mass spectrometer flow path and the one or more gas purge flow paths. In the second state, the column may be in fluid communication with the mass spectrometer flow path.
[0090] In the second state, method 900 may include stopping the flow of purge gas (block 935). Stopping the flow of purge gas (e.g., shutting off the purge gas) may occur simultaneously with the coupling sealing surface. Stopping the flow of purge gas may occur automatically. For example, stopping the flow of purge gas may occur automatically in response to the coupling sealing surface. The electro-pneumatic control module may automatically interrupt the flow of purge gas through the one or more gas purge flow paths.
[0091] In the second state, method 900 may include flowing the sample (block 940). For example, method 900 may include flowing the sample through a column. Flowing the sample through the column may occur after the column has been attached to the fitting and fluidly connected to the mass spectrometer flow path and the purge gas has been shut off. Flowing the sample may occur before, after, or simultaneously with stopping the flow of the purge gas.
[0092] A method for providing a gas chromatography-mass spectrometry (GC-MS) interface without exhaust gas may include providing a gas chromatograph. The method may include providing a mass spectrometer connected to the gas chromatograph via a mass spectrometer flow path. The method may include providing an accessory. The accessory may include a sealing surface and one or more gas purge flow paths. The accessory may be fluidly connected to the mass spectrometer. The method may include providing a column disposed in a collar. The one or more gas purge flow paths may be connected to the accessory upstream of the sealing surface. When the column is fluidly connected to the mass spectrometer flow path and a fluid-impermeable seal exists between the collar, column, and accessory, the one or more gas purge flow paths are not in fluid communication with the mass spectrometer flow path. When no fluid-impermeable seal exists between the collar, column, and accessory, the one or more gas purge flow paths are in fluid communication with the mass spectrometer flow path.
[0093] Any reference to an implementation of a system or method, element, or action mentioned herein in the singular may include an implementation that includes multiple such elements, and any reference to an implementation, element, or action mentioned herein in the plural may include an implementation that includes only a single element. References in the singular or plural form are not intended to limit the systems or methods, their components, actions, or elements to a singular or plural configuration. A reference to any action or element based on any information, action, or element may include an implementation in which the action or element is at least in part based on any information, action, or element.
[0094] Although operations may be depicted in a specific order in the accompanying drawings, such operations do not need to be performed in the specific or sequential order shown, and none of the operations shown are required to be performed. The actions described herein can be performed in different orders.
[0095] Any implementation disclosed herein may be combined with any other implementation, and references to “implementation,” “some implementations,” “alternative implementations,” “various implementations,” “an implementation,” etc., are not necessarily mutually exclusive and are intended to indicate that a particular feature, structure, or characteristic described in connection with the implementation may be included in at least one implementation. Such terms as used herein do not necessarily all refer to the same implementation. Any implementation may be combined inclusively or exclusively with any other implementation consistent with the aspects and implementations disclosed herein.
[0096] A reference to "or" can be interpreted as inclusive, such that any term described using "or" can refer to any one, more than one, or all of the terms described. A reference to at least one of a linked list of terms can be interpreted as inclusive OR to refer to any one, more than one, or all of the terms described. For example, a reference to "at least one of 'A' and 'B'" can include only 'A', only 'B', and both 'A' and 'B'. Elements other than 'A' and 'B' can also be included.
[0097] The systems and methods described herein can be implemented in other specific forms without departing from their characteristics. The foregoing implementations are illustrative, not limiting, of the systems and methods described.
[0098] Where reference numerals follow technical features in the accompanying drawings, detailed descriptions, or any claims, these reference numerals are already included to enhance the comprehensibility of the drawings, detailed descriptions, and claims. Therefore, the presence or absence of reference numerals does not limit the scope of any claim element.
[0099] The systems and methods described herein can be implemented in other specific forms without departing from their characteristics. The foregoing implementations are illustrative, not limiting, of the systems and methods described. The scope of the systems and methods described herein is therefore indicated by the appended claims rather than the foregoing description, and variations in the meaning and scope of equivalents of the claims are included therein.
Claims
1. A gas chromatography-mass spectrometry (GC-MS) system, comprising: Gas chromatograph; A mass spectrometer, which is connected to the gas chromatograph via a mass spectrometer flow path; The accessory includes a sealing surface and one or more gas purge flow paths, and the accessory is fluidly connected to the mass spectrometer. as well as The post, which is disposed in the collar, The one or more gas purging flow paths are connected to the fitting upstream of the sealing surface. Wherein, when the column is fluidly connected to the mass spectrometer flow path and there is a fluid-impermeable seal between the collar, the column, and the fitting, the one or more gas purge flow paths are not in fluid communication with the mass spectrometer flow path, and Where there is no impermeable seal between the collar, the column and the fitting, the one or more gas purging flow paths are in fluid communication with the mass spectrometer flow path.
2. The GC-MS system according to claim 1, wherein, The one or more gas purging flow paths include a first gas purging flow path and a second gas purging flow path, wherein the first gas purging flow path and the second gas purging flow path are arranged opposite to each other.
3. The GC-MS system according to claim 1, wherein, The sealing surface includes a tapered sealing surface configured to seal with the collar.
4. The GC-MS system according to claim 1, wherein, The inner diameter of the flow path of the mass spectrometer is in the range of 50 μm to 150 μm.
5. The GC-MS system according to claim 4, wherein, The ring is a first ring, and the GC-MS system further includes: A cavity, the cavity including a first side and a second side; The sealing surface is located upstream of and adjacent to the first side of the cavity; and The second collar is disposed downstream of and adjacent to the second side of the cavity.
6. The GC-MS system according to claim 5, wherein, The second ring is configured to be coupled to the transport line, the mass spectrometer flow path, and the fitting.
7. The GC-MS system according to claim 6, wherein, The transmission line is fluidly coupled to the vacuum system.
8. The GC-MS system according to claim 4, further comprising: cavity; The gas purging flow path includes one or more pipes, and the angle between the one or more pipes and the axis of the cavity is in the range of 0 degrees to 180 degrees.
9. The GC-MS system according to claim 1, wherein, The one or more gas purging flow paths are physically connected to the fitting.
10. The GC-MS system according to claim 1, wherein, The one or more gas purging flow paths are configured to allow at least one of nitrogen, helium, or hydrogen to flow.
11. The GC-MS system according to claim 1, wherein: The collar is configured to couple with a threaded nut; and The threaded nut is configured to apply pressure to the collar.
12. The GC-MS system according to claim 1, wherein, The one or more gas purging flow paths include one or more tubes, and the one or more tubes are connected to the fitting at a distance ranging from 0.5 mm to 10 mm upstream of the sealing surface.
13. The GC-MS system according to claim 1, wherein, The one or more gas purging flow paths include one or more tubes fluidly coupled to a cavity located upstream of the sealing surface.
14. The GC-MS system according to claim 13, wherein, The angle between the one or more tubes and the surface of the cavity is in the range of 0 degrees to 90 degrees.
15. The GC-MS system according to claim 1, wherein, The electronic pneumatic control module is configured to control at least one of the flow rate or pressure of the purge gas located in one or more of the gas purge flow paths.
16. The GC-MS system according to claim 1, wherein, The one or more gas purging flow paths include one or more tubes, and the diameter of the one or more tubes is in the range of 300 μm to 1000 μm.
17. A method comprising: Provide the flow path for the mass spectrometer; A sealing surface is provided upstream of and adjacent to the flow path of the mass spectrometer; One or more gas purging flow paths are provided upstream of the sealing surface; In the first state: The sealing surface is decoupled from the collar to allow the one or more gas purge flow paths to be in fluid communication with the mass spectrometer flow path, and the collar is configured to be coupled to the column; and The purging gas is directed to flow through one or more gas purging flow paths; and In the second state: Couple the sealing surface to the collar to (1) remove fluid communication between the one or more gas purge flow paths and the mass spectrometer flow path and (2) make the column fluidly communicated with the mass spectrometer flow path; Stop the flow of the purge gas through the one or more gas purge flow paths; and The sample is then passed through the column.
18. The method according to claim 17, wherein, The mass spectrometer flow path is fluidly coupled to the vacuum system, and the method further includes preventing oxygen from entering the vacuum system in the first state.
19. The method of claim 17, wherein, Flowing the purge gas through one or more gas purge flow paths includes flowing the purge gas at a rate of at least 30 mL / min.
20. The method of claim 17, further comprising: Control at least one of the flow rate or pressure of the purging gas.