Cleaning device for chuck workbench

Abstract

The invention relates to a cleaning device for a chuck workbench, and relates to the technical field of cleaning devices for chuck workbenches of semiconductor equipment. Comprising a stand column, a rotary actuator, a cleaning swing arm, a swing arm connecting piece and a liftable cleaning assembly. The rotary actuator is installed above the stand column, the cleaning swing arm is installed above the rotary actuator, the swing arm connecting piece is fixed to one side of the cleaning swing arm, and the liftable cleaning assembly is installed on the swing arm connecting piece and used for cleaning the chuck workbench. The device is high in automation degree and small in occupied area, the cleanliness of the chuck workbench can be improved, the machining efficiency is improved, and the machining quality is guaranteed.

Description

Technical Field

[0001] This invention relates to the technical field of cleaning devices for semiconductor equipment chuck stages, specifically a cleaning device for chuck stages. Background Technology

[0002] In the integrated circuit manufacturing process, the chuck stages of semiconductor equipment in various processes perform different functions such as fixed support, temperature control, and zoned alignment and positioning, thus requiring extremely high cleanliness. During material grinding, a large amount of debris, metal particles, and chemical residues are generated, which may transfer to the next wafer, affecting subsequent processing and easily leading to cross-contamination, thus degrading the overall processing quality. If impurities on the stage are not cleaned in a timely manner, the vacuum adsorption effect of the stage will be affected, consequently impacting processing accuracy and the overall processing quality and lifespan of the equipment. To address these issues, there is an urgent need for a highly automated, space-saving cleaning device for chuck stages that can ensure the processing quality of ultra-thin materials and the stability of the equipment. Summary of the Invention

[0003] To address at least one of the technical problems in the background art, the present invention provides a cleaning device for chuck worktables, which is highly automated, occupies a small area, and can improve the cleanliness of the chuck worktable, increase processing efficiency, and ensure processing quality.

[0004] To achieve the above objectives, the present invention provides a cleaning device for a chuck worktable, comprising: a column, a rotary actuator, a cleaning swing arm, a swing arm connector, and a liftable cleaning assembly; the rotary actuator is mounted above the column, the cleaning swing arm is mounted above the rotary actuator, the swing arm connector is fixed to one side of the cleaning swing arm, and the liftable cleaning assembly is mounted on the swing arm connector for cleaning the chuck worktable.

[0005] Furthermore, limit block one and limit block two are installed on the column to limit the start and end positions of the cleaning swing arm.

[0006] Furthermore, a protective cover for the cleaning structure is installed on the outside of the liftable cleaning assembly.

[0007] Furthermore, the liftable cleaning assembly includes a first lifting unit, a rotary drive unit, a second lifting unit, a cleaning brush disc, a brush, and an oilstone; the first lifting unit is installed inside the protective cover of the cleaning structure, the rotary drive unit is installed at the output end of the first lifting unit, the cleaning brush disc is installed at the bottom end of the rotary drive unit, the brush is fixed at the bottom end of the cleaning brush disc, the second lifting unit is installed at the bottom end of the rotary drive unit, and the oilstone is connected to the bottom end of the second lifting unit and slides through the cleaning brush disc.

[0008] Furthermore, the first lifting unit includes a cleaning structure adapter plate, a cylinder, and a cable chain; the cleaning structure adapter plate is installed inside the cleaning structure protective cover, the cylinder is fixedly connected to the cleaning structure adapter plate, and its output end is connected to the rotary drive unit via the cable chain, and the rotary drive unit is slidably disposed on one side of the cleaning structure adapter plate.

[0009] Furthermore, the rotary drive unit includes a motor, which is slidably mounted on the cleaning structure adapter plate and connected to the cable chain. A coupling, a slip ring, and a shaft structure are sequentially fixed below the motor, and a cleaning brush is connected to the center of the bottom end of the shaft structure.

[0010] Furthermore, the second lifting unit includes a second cylinder, which is connected to the shaft structure around the shaft structure via a bracket, and each second cylinder is connected to an oilstone at its bottom.

[0011] Furthermore, an adaptation pad one and an adaptation pad two are provided between the shaft system structure and the cleaning brush disc, and the adaptation pad one and the adaptation pad two are installed vertically.

[0012] Furthermore, the rotary actuator integrates a harmonic reducer, a frameless torque motor, an absolute encoder, and an electromagnetic brake into one unit.

[0013] The beneficial effects of this invention are as follows: 1. High degree of automation: The rotary actuator can precisely control the reciprocating motion of the cleaning arm, cylinder one can realize the large-scale lifting and lowering motion of the cleaning structure, and cylinder two can finely adjust the contact area between the cleaning brush and the chuck worktable. 2. Easy to operate: Adaptation pad one and adaptation pad two can automatically and finely adjust the position of the oilstone and brush; the rotary actuator replaces the traditional motor and reducer structure, which can adjust the swing amplitude and save floor space; 3. Integrated Design: The structure of this invention can be equipped on the chuck worktable of different semiconductor equipment. The size of the cleaning brush and column can be changed according to different material sizes and worktable heights, realizing integrated modular design and ensuring the cleanliness of the chuck worktable and the processing efficiency of the equipment. Attached Figure Description

[0014] Figure 1 Front view of the chuck table cleaning device; Figure 2 Top view of the chuck table cleaning device; Figure 3 This is the main view of the cleaning structure; Figure 4 A top view of the cleaning brush.

[0015] In the diagram: 101-Column; 102-Rotary actuator; 103-Cleaning swing arm; 104-Swing arm connector; 105-Cleaning structure protective cover; 106-Cleaning brush; 107-Chuck worktable; 108-Limit block one; 109-Limit block two; 110-Cylinder one; 111-Motor; 112-Coupling; 113-Slip ring; 114-Shaft structure; 115-Cylinder two; 116-Adaptation pad one; 117-Adaptation pad two; 118-Drag chain; 119-Cleaning structure adapter plate; 120-Brush; 121-Oilstone. Detailed Implementation

[0016] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0017] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate for the embodiments of this application described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0018] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0019] Furthermore, some of the aforementioned terms, besides indicating location or positional relationships, may also have other meanings. For example, the term "above" may, in certain circumstances, indicate a dependency or connection. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0020] Furthermore, the terms "installation," "setup," "equipped with," "connection," "linking," and "socketing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0021] To achieve the above objectives, such as Figures 1 to 4 As shown, this invention provides a cleaning device for a chuck worktable, comprising: a column 101, a rotary actuator 102, a cleaning swing arm 103, a swing arm connector 104, and a liftable cleaning assembly. The rotary actuator 102 is mounted above the column 101, the cleaning swing arm 103 is mounted above the rotary actuator 102, the swing arm connector 104 is fixed to one side of the cleaning swing arm 103, and the liftable cleaning assembly is mounted on the swing arm connector 104 for cleaning the chuck worktable. The rotary actuator 102 integrates a harmonic reducer, a frameless torque motor, an absolute encoder, and an electromagnetic brake into one unit, resulting in a compact structure that greatly saves space, provides fast response, and offers flexible control.

[0022] To further optimize the technical solution, limit block 108 and limit block 209 are installed on the column 101 to limit the start and end positions of the cleaning swing arm 103. The rotary actuator 102 drives the cleaning swing arm 103 and the swing arm connector 104 to rotate, and the rotation angle is also adjustable. The limit block 108 and limit block 209 installed on the column 101 limit the start and end positions of the cleaning swing arm 103.

[0023] To further optimize the technical solution, a protective cover 105 for the cleaning structure is installed on the outside of the liftable cleaning component, which can effectively block dust and waste liquid.

[0024] The liftable cleaning assembly includes a first lifting unit, a rotary drive unit, a second lifting unit, a cleaning brush disc 106, a brush 120, and an oilstone 121. The first lifting unit is installed inside the protective cover 105 of the cleaning structure. The rotary drive unit is installed at the output end of the first lifting unit. The cleaning brush disc 106 is installed at the bottom end of the rotary drive unit. The brush 120 is fixed at the bottom end of the cleaning brush disc 106. The second lifting unit is installed at the bottom end of the rotary drive unit. The oilstone 121 is connected to the bottom end of the second lifting unit and slides through the cleaning brush disc 106.

[0025] The first lifting unit includes a cleaning structure adapter plate 119, a cylinder 110, and a cable chain 118. The cleaning structure adapter plate 119 is installed inside the cleaning structure protective cover 105. The cylinder 110 is fixedly connected to the cleaning structure adapter plate 119, and its output end is connected to a rotary drive unit via the cable chain 118. The rotary drive unit is slidably disposed on one side of the cleaning structure adapter plate 119. The cylinder 110 enables a large-stroke lifting motion of the lifting cleaning component.

[0026] The rotary drive unit includes a motor 111, which is slidably mounted on the cleaning structure adapter plate 119 and connected to the cable chain 118. A coupling 112, a slip ring 113, and a shaft structure 114 are sequentially fixed below the motor 111. The bottom center of the shaft structure 114 is connected to the cleaning brush disc 106. The activation of the cylinder 110 drives the cable chain 118, thereby raising and lowering the cleaning brush disc 106. When the motor 111 starts, the shaft structure 114 drives the cleaning brush disc 106 to rotate. The slip ring 113 is equipped with gas and liquid interfaces; when the cleaning brush disc 106 rotates, the slip ring 113 can spray cleaning fluid to enhance the cleaning effect.

[0027] The second lifting unit includes a second cylinder 115, which is connected to the shaft structure 114 via a bracket, and each cylinder 115 has an oilstone 121 connected to its bottom end. The second cylinder 115 enables a small-stroke lifting movement of the cleaning brush 106. (Reference) Figure 4 The distribution of the brush 120 and the oilstone 121 almost fills the area of ​​the cleaning brush 106, ensuring the cleaning area.

[0028] Furthermore, an adaptation pad 116 and an adaptation pad 2 117 are provided between the shaft structure 114 and the cleaning brush disc 106, and the adaptation pad 116 and the adaptation pad 2 117 are installed vertically. The adaptation pad 116 and the adaptation pad 2 117 can control the parallelism and contact area between the brush 120 and the chuck worktable 107, ensuring uniform contact between the cleaning brush disc 106 and the chuck worktable 107, and ensuring the cleaning quality of the cleaning device.

[0029] A rotary actuator and cylinder one drive the cleaning arm to bring the cleaning structure to the designated cleaning position. The motor lowers the cleaning brush, ensuring full contact between the brush and the chuck table. During cleaning, the brush automatically adjusts to the optimal contact area with the chuck table surface via adaptation pads one and two. After cleaning, cylinder two lowers the oilstone to polish the chuck table surface, removing impurities and ensuring a smooth surface that meets the cleanliness requirements for material processing. This invention features a small footprint, simple operation, and high integration. Through automation, it ensures the flatness of the chuck table after material processing, improving overall processing accuracy and efficiency.

[0030] The working principle of this invention is as follows: When the material processing above the chuck table 107 is completed, the rotary actuator 102 controls the cleaning swing arm 103 to swing from the starting position to the designated position. After reaching this position, the motor 110 starts, and the cleaning structure adapter plate 119 drives the cleaning structure to descend. At this time, the bottom surface of the cleaning brush 106 completely covers the center of the chuck table 107, so that the brush 120 is in complete contact with the surface of the chuck table 107. When the motor 111 is working, the coupling 112, slip ring 113 and shaft structure 114 drive the cleaning brush 106 to rotate, so that the rotation direction of the cleaning brush 106 is opposite to the rotation direction of the chuck table 107, which increases the cleaning friction. The slip ring 113 sprays cleaning liquid onto the surface of the chuck table 107. During the cleaning process, the first adaptation pad 116 and the second adaptation pad 117 can adaptively adjust the contact area between the brush 120 and the surface of the chuck table 107, ensuring complete contact while avoiding excessive friction that could damage the surface of the chuck table 107. After cleaning, the slip ring 113 sprays gas to blow away the cleaning fluid from the surface of the chuck table 107. The activation of cylinder two 115 controls the oilstone 121 to descend until it contacts the surface of the chuck table 107. At this point, the surface of the chuck table 107 is polished. This step removes embedded debris and releases internal stress, restoring the flatness of the chuck table 107 and ensuring the quality of subsequent processing. After the oilstone 121 finishes its work, cylinder one 110 raises the cleaning structure, and the rotary actuator 102 swings the cleaning arm 103 back to its initial position. Thus, a complete cleaning process for the chuck table 107 is completed. This invention is easy to operate, has a small footprint, and the cleaning structure can adaptively adjust its contact area with the table surface. It is highly automated, and the arm angle and brush distribution can be adjusted according to actual working conditions. The overall device can improve material processing efficiency and increase equipment lifespan.

[0031] The above description is merely a preferred embodiment of the present invention and does not constitute any limitation on the technical scope of the present invention. Therefore, any minor modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of the present invention shall still fall within the scope of the technical solution of the present invention.

Claims

1. A cleaning device for a chuck table, characterized in that include: The components include a column (101), a rotary actuator (102), a cleaning swing arm (103), a swing arm connector (104), and a liftable cleaning assembly. The rotary actuator (102) is mounted above the column (101), the cleaning swing arm (103) is mounted above the rotary actuator (102), the swing arm connector (104) is fixed to one side of the cleaning swing arm (103), and the liftable cleaning assembly is mounted on the swing arm connector (104) for cleaning the chuck worktable.

2. A cleaning device for a chuck table as claimed in claim 1, characterized in that Limiting block one (108) and limiting block two (109) are installed on the column (101) to limit the start and end positions of the cleaning swing arm (103).

3. A cleaning device for a chuck worktable as described in claim 1 or 2, characterized in that, The lifting cleaning assembly is equipped with a cleaning structure protective cover (105) on its outside.

4. The cleaning device for a chuck worktable as described in claim 3, characterized in that, The liftable cleaning assembly includes a first lifting unit, a rotary drive unit, a second lifting unit, a cleaning brush disc (106), a brush (120), and an oilstone (121). The first lifting unit is installed inside the cleaning structure protective cover (105). The rotary drive unit is installed at the output end of the first lifting unit. The cleaning brush disc (106) is installed at the bottom end of the rotary drive unit. The brush (120) is fixed at the bottom end of the cleaning brush disc (106). The second lifting unit is installed at the bottom end of the rotary drive unit. The oilstone (121) is connected to the bottom end of the second lifting unit and slides through the cleaning brush disc (106).

5. A cleaning device for a chuck worktable as described in claim 4, characterized in that, The first lifting unit includes a cleaning structure adapter plate (119), a cylinder (110), and a cable chain (118). The cleaning structure adapter plate (119) is installed inside the cleaning structure protective cover (105). The cylinder (110) is fixedly connected to the cleaning structure adapter plate (119). Its output end is connected to the rotary drive unit through the cable chain (118). The rotary drive unit is slidably arranged on one side of the cleaning structure adapter plate (119).

6. A cleaning device for a chuck worktable as described in claim 5, characterized in that, The rotary drive unit includes a motor (111), which is slidably mounted on the cleaning structure adapter plate (119) and connected to the drag chain (118). A coupling (112), a slip ring (113), and a shaft structure (114) are sequentially fixedly installed below the motor (111). The cleaning brush disc (106) is connected to the center of the bottom end of the shaft structure (114).

7. A cleaning device for a chuck worktable as described in claim 6, characterized in that, The second lifting unit includes cylinder two (115), which is connected to the shaft structure (114) around by a bracket, and each cylinder two (115) is connected to an oilstone (121) at its bottom.

8. A cleaning device for a chuck worktable as described in claim 6 or 7, characterized in that, An adaptation pad one (116) and an adaptation pad two (117) are provided between the shaft structure (114) and the cleaning brush (106), and the adaptation pad one (116) and the adaptation pad two (117) are installed vertically.

9. A cleaning device for a chuck worktable as described in claim 1, characterized in that, The rotary actuator (102) integrates a harmonic reducer, a frameless torque motor, an absolute encoder and an electromagnetic brake into one unit.

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