Roll-to-sheet nanoimprint planar lens mass production method and device

Abstract

This invention discloses a roll-to-roll nanoimprint planar lens mass production method and apparatus for the manufacturing and mass production of micro-nano optical devices. It centers on the principle that "a silicon master mold is used only for replication, while a transparent, replaceable working mold is rotated across the production line." The mass production chain is constructed around working mold replication, roll-to-roll imprint curing, demolding monitoring, lifespan management, and traceability output. By limiting the silicon master mold to a replication source, the risk of damage caused by directly using the master mold on the production line is reduced. The transparent, replaceable working mold adapts to UV curing through the mold and the roll-to-roll assembly method, improving the continuous forming efficiency of rigid lens substrates. A complete mass production closed loop is formed through working mold health H_m, QC gating, and traceability data packets. This invention focuses on working mold replication and mass production imprinting organization methods, and is suitable for high-consistency forming of rigid lens substrates in continuous workstations.

Description

Technical Field

[0001] This invention relates to the field of micro-nano optical device manufacturing and mass production engineering, and particularly to a method and apparatus for mass production of roll-to-roll nanoimprinted planar lenses. Background Technology

[0002] Currently, the mass production of planar prescription microstructure lenses typically requires combining high-precision master mold capabilities with high-cycle imprinting capabilities. However, in actual production lines, although silicon master molds offer high precision and good wear resistance, they are not suitable for repeated imprinting on the production line over extended periods. Specifically:

[0003] On the one hand, silicon master molds lack transparency in UV curing scenarios through the mold side. Directly using silicon master molds for continuous imprinting would lead to complex workstation organization, increased demolding risk, and excessively high costs due to master mold damage. On the other hand, rigid lens substrates cannot simply be processed using flexible roll-to-roll technology. They must be supported by a carrier plate, organized at the roll-to-film workstation, monitored online demolding force, and subject to first-piece gate acceptance, while simultaneously ensuring continuous cycle time and consistency of the prescription-level microstructure. Furthermore, existing technologies often treat working mold replication, mass production imprinting, lifespan management, and traceability output as separate processes, lacking a closed-loop mass production system encompassing working mold replication, imprinting, monitoring, and maintenance.

[0004] Therefore, it is necessary to propose a method and apparatus specifically for the mass production of planar lenses using the process of "silicon master mold - transparent replaceable working mold - roll-to-roll imprinting" to reduce master mold risk, improve mass production consistency and enhance traceability. Summary of the Invention

[0005] The core of this invention is to limit the silicon master mold to a replication source and use it only for manufacturing transparent and replaceable working molds; the transparent and replaceable working molds are rotated into the roll-to-roll nanoimprint station for service, and lifespan is managed by demolding peak force, roughness, scattering and number of cycles.

[0006] To solve the above problems, the present invention adopts the following technical solution.

[0007] A method for mass production of roll-to-roll nanoimprinted flat lenses includes the following steps:

[0008] Step A: Provide a silicon master mold with a negative shape of planar prescription microstructure, a working mold substrate, a lens substrate, and the imprinting task parameters for the corresponding batch;

[0009] Step B: Replicate the transparent replaceable working mold based on the silicon master mold, and establish the master mold number, working mold number, and initial lifetime count. This includes the following:

[0010] Step B1: Clean the silicon master mold, check its surface condition, and calibrate the alignment reference.

[0011] Step B2: Replicate the transparent replaceable working mold on the silicon master mold, and perform initial acceptance testing on replication deviation and alignment deviation;

[0012] Step C: Load the working mold into the roll-to-film nanoimprinting station, and perform adhesive supply, bonding, imprinting, UV curing, and demolding on the lens substrate, while monitoring the imprinting process, specifically including the following:

[0013] Step C1: Control the linear speed, imprinting pressure and ultraviolet dose at the film rolling station to form a microstructure on the lens substrate;

[0014] Step C2: Collect peak demolding force, defect density, roughness or scattering index, and determine whether to trigger cleaning, re-anti-sticking or replace the working mold based on the index;

[0015] Step C3: Perform post-processing and batch traceability information writing on the gated lenses to form mass-producible microstructure lenses;

[0016] Step D: Output the finished product, acceptance report, and traceability data package.

[0017] Furthermore, after cleaning the silicon master mold and calibrating the alignment reference in step B1, a transparent support substrate is attached to the negative surface of the silicon master mold and the replication resin is cured in step B2. After peeling, a transparent replaceable working mold is obtained, and the replication depth deviation δh_rep and the alignment deviation δr_rep are used as release conditions.

[0018] Furthermore, in step C1, the lens substrate is fixed on the carrier plate that moves with the roll material station, and the linear speed v_line, imprinting pressure P_nip and ultraviolet dose E_uv are controlled to complete the imprinting and curing, and the peak demolding force F_peak is collected online.

[0019] Furthermore, between step C1 and step C2, the roughness R_q and scattering index S_scatter of the first piece or sampled piece are measured. Batch imprinting continues only if R_q≤τ_R and S_scatter≤τ_S. Here, τ_R represents the upper limit threshold of the surface roughness allowed for the first piece or sampled piece, and τ_S represents the upper limit threshold of the scattering index allowed for the first piece or sampled piece. The two correspond to surface morphology quality gating and scattering risk gating, respectively.

[0020] Furthermore, step C2 calculates the working mold health status H_m based on the cumulative number of imprints N_imp, peak demolding force F_peak, defect density ρ_def, roughness R_q, and scattering index S_scatter, and triggers cleaning, re-anti-sticking, or replacement of the working mold when H_m < τ_H.

[0021] Furthermore, step D outputs a traceability data packet containing the master mold number, working mold number, imprint batch, cumulative imprint count of the working mold N_imp, peak demolding force F_peak, acceptance result, and cause code.

[0022] A roll-to-film nanoimprint flat lens mass production device for performing the above method includes an input module, a working mold replication module, a roll-to-film imprinting and curing module, an online monitoring and gated acceptance module, a life management module, and an output module.

[0023] The input module is used to obtain the silicon master mold number, working mold substrate information, lens substrate information, and batch task parameters;

[0024] The working mold replication module is used to perform silicone master mold cleaning, replication resin bonding, transparent support substrate curing, and replication deviation acceptance.

[0025] The roll-to-roll imprinting and curing module is used to perform adhesive supply, bonding, imprinting, UV curing, and demolding.

[0026] The online monitoring and gated acceptance module is used to collect F_peak, R_q, S_scatter and ρ_def, and generate release / rework reason codes;

[0027] The lifespan management module is used to trigger cleaning, re-anti-sticking, or replacement of the working mold based on N_imp and health level H_m.

[0028] The output module is used to output finished products, acceptance reports, and traceability data packages.

[0029] Furthermore, the working mold replication module includes a master mold surface cleaning unit, an alignment reference reading unit, a replication curing unit, and a replication deviation acceptance unit.

[0030] Furthermore, the roll-to-roll imprinting and curing module includes a carrier plate conveying unit, an adhesive supply unit, an imprinting unit, an ultraviolet irradiation unit, and a demolding unit.

[0031] Compared with the prior art, the advantages of this invention are:

[0032] (1) Limit the silicon master mold to a replication source to reduce the risk of damage caused by directly putting the master mold on the production line;

[0033] (2) By using a transparent and replaceable working mold to adapt to the UV curing and roll-to-roll assembly method of the mold, the continuous forming efficiency of rigid lens substrate is improved.

[0034] (3) A complete mass production closed loop is formed by working mode health H_m, QC gating and traceability data packets. Attached Figure Description

[0035] Figure 1This is a schematic diagram of the mass production system architecture of the present invention;

[0036] Figure 2 This is a cross-sectional view of the silicon master mold—transparent replaceable working mold—lens substrate laminate of the present invention;

[0037] Figure 3 This is a schematic diagram of the method flow of the present invention;

[0038] Figure 4 This is a schematic diagram of the working module replication and alignment sequence of the present invention;

[0039] Figure 5 This is a schematic diagram of the roll-to-sheet imprinting, curing, and demolding stations of the present invention;

[0040] Figure 6 This is a schematic diagram illustrating the relationship between peak demolding force and working mold health in this invention.

[0041] Figure 7 This is a schematic diagram of the traceability data packet structure of the present invention;

[0042] Figure 8 This is a schematic diagram illustrating typical defects, roughness, and scattering risks of the present invention;

[0043] Figure 9 This is a schematic diagram of the working module life management and replacement strategy of the present invention;

[0044] Figure 10 This is a schematic diagram of the QC gating and rework strategy process of the present invention;

[0045] Figure 11 This is a schematic diagram of the optional structure and alignment reference of the present invention;

[0046] Figure 12 This is a schematic diagram illustrating the manufacturing constraints and tolerance budget of the present invention;

[0047] Figure 13 This is a schematic diagram illustrating the closed-loop process of delivery, clamping, alignment, and maintenance of the present invention.

[0048] Figure 14 This is a schematic diagram of the audit log, hash signature, and consistency verification of the present invention. Detailed Implementation

[0049] The technical solutions will now be clearly and completely described with reference to the accompanying drawings in the embodiments of the present invention.

[0050] First implementation method:

[0051] Please see Figures 1-14 The method for mass production of roll-to-roll nanoimprinted flat lenses includes the following steps:

[0052] Step A: Provide a silicon master mold with a negative shape of planar prescription microstructure, a working mold substrate, a lens substrate, and imprinting task parameters for the corresponding batch. The batch task parameters include at least the linear velocity v_line, imprinting pressure P_nip, ultraviolet dose E_uv, first article gate threshold (including τ_R and τ_S), and lifetime gate threshold τ_H.

[0053] Among them, τ_R is the roughness gate threshold of the first piece or sampled piece, which is used to limit the root mean square roughness R_q of the microstructure surface to not exceed the allowable upper limit; τ_S is the scattering gate threshold of the first piece or sampled piece, which is used to limit the normalized scattering index S_scatter to not exceed the allowable upper limit; τ_H is the working mode health threshold, which requires cleaning, re-anti-sticking, or replacement when the health is lower than this threshold.

[0054] Step B involves replicating a transparent, replaceable working mold based on the silicon master mold (some accompanying drawings use the term "transparent working mold," but both refer to the same structure), and establishing the master mold number, working mold number, and initial lifetime count. Step B is the working mold preparation stage, which specifically includes the following:

[0055] Step B1: Solvent cleaning, surface condition confirmation, and alignment benchmark calibration of the silicon master mold;

[0056] Specifically: First, the silicon master mold is solvent-cleaned and its surface condition is confirmed, and then the alignment reference on the master mold is read; the purpose of this operation is to ensure the contour fidelity when replicating the transparent replaceable working mold and the consistency of subsequent station clamping.

[0057] Step B2: Replicate the transparent replaceable working mold on the silicon master mold, and perform initial acceptance testing on replication deviation and alignment deviation;

[0058] Specifically, such as Figure 2 and Figure 4 As shown, the replication resin is placed on the negative surface of the silicone master mold, a transparent support substrate is attached and cured, and after peeling, a transparent replaceable working mold is obtained. The transparent replaceable working mold is used for mold UV curing, and the silicone master mold is only used for replication and is not directly and repeatedly put on the production line. Then the replication depth deviation δh_rep and the alignment deviation δr_rep are measured, and δh_rep≤τ_h,rep and δr_rep≤τ_r,rep are used as the release conditions for entering the mass production imprinting station.

[0059] δh_rep can be defined as the absolute or normalized deviation between the depth of the key microstructure after the working mold is copied and the corresponding depth of the master mold. τ_h,rep is the depth deviation threshold (i.e., the upper limit) for releasing the working mold after copying, used for release judgment after the working mold is copied. Only when δh_rep does not exceed τ_h,rep is the copying depth fidelity considered to meet the requirements for entering the mass production imprinting station. δr_rep can be defined as the planar position deviation of the working mold alignment reference relative to the master mold alignment reference after copying; τ_r,rep is the alignment deviation threshold (i.e., the upper limit) for releasing the working mold after copying, used to judge whether the copied working mold maintains acceptable alignment accuracy. δh_rep controls the contour depth fidelity, and δr_rep controls the planar position / reference consistency after copying. The two together constitute the working mold copying release conditions.

[0060] The purpose of step B2 is to transfer the capabilities of the completed silicon master mold to the transparent replaceable working mold, so that the subsequent step C1 can be continuously formed by UV curing through the mold.

[0061] Step C: Load the working mold into the roll-to-film nanoimprinting station, perform adhesive supply, bonding, imprinting, UV curing, and demolding on the lens substrate, and monitor the imprinting process. Step C is the mass production imprinting stage, which specifically includes the following:

[0062] Step C1: Control the linear speed, imprinting pressure and ultraviolet dose at the film rolling station to form a microstructure on the lens substrate;

[0063] like Figure 5 As shown, in step C1, the transparent replaceable working mold is loaded into the roll-to-film nanoimprinting station, the lens substrate is fixed in the carrier plate window that moves with the roll station, the curable resin is first fed in, then bonding, imprinting and UV curing are performed, and finally demolding is performed.

[0064] Figure 5 The illustration shows the functional flow of the roll-to-roll nanoimprinting station, rather than its actual mechanical form. From left to right, the sequence is: resin supply unit, imprinting roller / mold frame area carrying a transparent, replaceable working mold, carrier plate window supporting the lens substrate, imprinting contact area, UV curing area, and separation / demolding area; its purpose is to illustrate the sequential relationship and transport direction of resin supply, bonding imprinting, curing, and demolding.

[0065] In step C1, at least the following process quantities are collected online: linear velocity v_line, imprint pressure P_nip, UV dose E_uv, and peak release force F_peak; where F_peak is used to reflect the anti-sticking state and release risk, v_line, P_nip, and E_uv are used to trace the imprinting conditions within the batch, and the linear velocity v_line, imprint pressure P_nip, and UV dose E_uv are controlled to complete the imprinting and curing.

[0066] After step C1 is completed and before step C2 begins, the roughness R_q and scattering index S_scatter are measured on the first piece or the sampled piece. Batch printing continues only if R_q≤τ_R and S_scatter≤τ_S. If R_q>τ_R or S_scatter>τ_S, a reason code is output and the working mode is prevented from continuing to enter batch printing.

[0067] Step C2: Collect peak demolding force, defect density, roughness or scattering index, and determine whether to trigger cleaning, re-anti-sticking or replace the working mold based on the index;

[0068] like Figure 8 As shown, typical defects include at least particulate contamination, scratches / edge chipping, residual thin layers, and increased roughness. These defects can lead to localized imprint voids, directional scattering, phase deviation, and increased haze, and are therefore included in the monitoring of roughness R_q, scattering index S_scatter, or defect density ρ_def. Here, R_q represents the root mean square roughness of the measured surface; S_scatter represents the normalized scattering index under preset detection band and acquisition angle conditions; ρ_def represents the defect density statistically observed per unit area; and N_imp represents the cumulative number of imprints in the current working mode.

[0069] like Figure 6 As shown, when the working health H_m is used as the core indicator for lifespan management, one embodiment can be written as:

[0070] H_m=α_F·n_F+α_ρ·n_ρ+α_R·n_R+α_S·n_S+α_N·n_N.

[0071] Wherein, η_F is the demolding force normalization term, η_ρ is the defect density normalization term, η_R is the roughness normalization term, η_S is the scattering index normalization term, and η_N is the imprinting number normalization term; α_F, α_ρ, α_R, α_S, and α_N are the corresponding weights, and the sum of each weight can be set to 1.

[0072] For example, η_F can be calculated as η_F=clip((τ_F-F_peak) / (τ_F-F_ref),0,1), where F_peak is the peak demolding force, and η_N can be calculated as η_N=clip((N_max-N_imp) / N_max,0,1); where F_ref is the reference demolding force in the initial release state, N_imp is the cumulative number of impressions of the working die, and N_max is the maximum allowed number of impressions, determined by... Figure 6 It can be concluded that as the number of times the working mode is used increases, F_peak rises while H_m falls.

[0073] Wherein, τ_F represents the peak demolding force safety threshold, used to gate F_peak. When F_peak exceeds τ_F, it indicates increased interface adhesion, degradation of the anti-stick layer, or increased demolding risk, and cleaning, re-anti-sticking, or replacement of the working mold should be triggered; F_ref represents the reference demolding force in the new working mold or first piece release state, used to calculate the normalization term η_F; clip(x,0,1) means limiting x to the range of 0 to 1 to avoid abnormal amplification of the health calculation result by a single indicator.

[0074] When H_m < τ_H, or F_peak > τ_F, or N_imp ≥ N_max, step C2 triggers a maintenance operation; the maintenance operation includes cleaning, re-anti-sticking treatment, or replacement of the working mold, the selection of which is determined by the cause code and the current working mold state.

[0075] like Figure 9 As shown, the life management of the working module includes at least the following states: new working module, service, early warning, reprocessing, replacement and reacceptance; the working module after reprocessing needs to be returned to the first piece gating before step C1.

[0076] In one embodiment, the cleaning operation in step C2 includes solvent rinsing and low-power surface cleaning, and the anti-sticking treatment includes reforming a low surface energy layer; if the working mode exhibits replication distortion, continuous high F_peak, or H_m remains below the threshold after multiple reprocessing, it directly enters the replacement state.

[0077] like Figure 10 As shown, the QC gating process is executed in the order of "measurement - rule judgment - release / rework / replacement - output reason code"; the reason code may include RC_FORCE, RC_RQ, RC_SCAT and RC_LIFE.

[0078] In one embodiment, the reason code is used to identify the dominant triggering factor in the QC gating that leads to the current judgment result, which includes release, rework, and replacement. The reason code is generated by the online monitoring and gating acceptance module after completing the measurement and rule judgment, and is written into the acceptance report, traceability data package, or audit log for subsequent batch review, maintenance scheduling, and traceability analysis.

[0079] Among them, RC_FORCE represents the abnormal demolding force cause code, which can correspond to the situation where the peak demolding force F_peak exceeds the safe threshold τ_F, or F_peak continues to rise and indicates increased interface adhesion and increased demolding risk; RC_RQ represents the abnormal roughness cause code, which can correspond to the situation where the roughness R_q exceeds the roughness gate threshold τ_R; RC_SCAT represents the abnormal scattering cause code, which can correspond to the situation where the scattering index S_scatter exceeds the scattering gate threshold τ_S; RC_LIFE represents the abnormal lifespan cause code, which can correspond to the situation where the cumulative number of imprints N_imp of the working die reaches the allowable upper limit N_max, the working die health H_m is lower than the lifespan threshold τ_H, or the conditions for continued service are still not met after cleaning and re-anti-sticking.

[0080] When multiple anomalies are triggered simultaneously, the main cause code can be output according to the preset priority, or multiple cause codes can be recorded at the same time. Preferably, the cause code is written into the traceability data package in step D as part of the QC result field along with the master mold information, working mold information, process parameters and maintenance records, so as to realize the structured record of the basis for release, rework or replacement.

[0081] like Figure 11 As shown, different alignment reference forms can be used on different devices, including edge cross reference, through reference hole or edge coding; their function is to maintain repeatable positioning during the copying and clamping stages of the working mold.

[0082] like Figure 12 As shown, manufacturing constraints and tolerance budgets can incorporate replication deviations, alignment deviations, roughness, scattering parameters, and release force fluctuations into a unified gating framework; from Figure 12 It can be seen that the release force fluctuation and replication deviation are usually closer to the gate boundary, so they should be monitored first.

[0083] like Figure 13 As shown, delivery, clamping, batch execution, and maintenance form a closed loop; the working module after maintenance needs to be re-clamped and aligned and the first piece gate is not allowed to skip the acceptance and return directly to the mass production station.

[0084] Step C3: Perform post-processing and batch traceability information writing on the gated lenses to form mass-producible microstructure lenses;

[0085] The post-processing may include residual resin removal, surface cleaning, and handover preparation before subsequent coating; the purpose of this step is to transform lenses that have passed mass production gates into deliverable batches of microstructured lenses.

[0086] Step D: Output the finished product, acceptance report, and traceability data package;

[0087] The traceability data package includes at least: master mold information, working mold information, process parameters (including imprint batch, N_imp, F_peak statistics, etc.), QC results, cause codes, version numbers, and signature / hash digests. The master mold information is used to determine the source of replication, the working mold information is used to determine the currently serving mold, the process parameters are used for reproducing experiments and reviewing batches, and the QC results and cause codes are used to explain the basis for release, rework, or replacement. The traceability data package is used to bind the master mold, working mold, process, QC, and cause codes to the same batch. Figure 14 As shown, the audit log can aggregate four types of log blocks—"master model copy, imprint parameters, QC results, and maintenance records"—into the same batch hash root, and then output the signature result and consistency verification conclusion; this enables mass production batches to be traced back to specific working models and maintenance actions.

[0088] Combining the above methods and Figure 1 As shown, the main system of this case consists of five links: working mold replication, roll-to-film printing, online monitoring, life management and traceability output. Its technical contribution lies in the mass production organization method after the working mold enters the production line.

[0089] Figure 1 The arrows in the diagram indicate the direction of process flow and information flow, rather than geometric positional relationships: the input module provides batch task parameters to the working module copy module and the roll-to-roll imprinting and curing module; the online monitoring and gating acceptance module outputs gating results and cause codes to the life management module; the output module aggregates process parameters, QC results, and maintenance records to form a traceability data package.

[0090] A roll-to-film nanoimprint flat lens mass production device for performing the above method includes an input module, a working mold replication module, a roll-to-film imprinting and curing module, an online monitoring and gated acceptance module, a life management module, and an output module.

[0091] The input module is used to execute step A, such as obtaining the silicon master mold number, working mold substrate information, lens substrate information (i.e., target lens substrate specifications), adhesive resin type, and batch task parameters; the working mold replication module is used to execute steps B1 and B2, such as performing operations like cleaning the silicon master mold, replicating the resin bonding, curing the transparent support substrate, and accepting replication deviations; the roll-to-roll imprinting and curing module is used to execute step C1, such as performing operations like adhesive supply, bonding, imprinting, UV curing, and demolding; the online monitoring and gating acceptance module is used to collect multiple parameters such as F_peak, R_q, S_scatter, and ρ_def, and perform acceptance operations between steps C1 and C2, generating release / rework reason codes; the lifespan management module is used to execute step C2, triggering cleaning, re-anti-sticking, or replacement of the working mold based on N_imp and health level H_m; the output module is used to execute step D.

[0092] The working mold replication module includes a master mold surface cleaning unit, an alignment reference reading unit, a replication curing unit, and a replication deviation acceptance unit.

[0093] The roll-to-roll imprinting and curing module includes a carrier plate conveying unit, an adhesive supply unit, an imprinting unit, an ultraviolet irradiation unit, and a demolding unit.

[0094] In summary, this case focuses on the construction of a mass production method and apparatus based on "replicating a transparent and replaceable working mold from a silicon master mold, rotating the transparent and replaceable working mold in a roll-to-roll nanoimprinting production line, and maintenance scheduling based on health status and cause codes".

[0095] The above description is merely a preferred embodiment of the present invention; it encompasses all the protection scope of the present invention. Any equivalent substitutions or modifications made by those skilled in the art within the technical scope disclosed in the present invention, based on the technical solutions and improved concepts of the present invention, should be covered within the protection scope of the present invention.

Claims

1. A method for mass production of roll-to-roll nanoimprinted flat lenses, characterized in that: Includes the following steps: Step A: Provide a silicon master mold with a negative shape of planar prescription microstructure, a working mold substrate, a lens substrate, and the imprinting task parameters for the corresponding batch; Step B: Based on the silicon master mold, replicate the transparent replaceable working mold, and establish the master mold number, working mold number, and initial lifetime count, specifically including the following: Step B1: Clean the silicon master mold, check its surface condition, and calibrate the alignment reference. Step B2: Replicate the transparent replaceable working mold on the silicon master mold, and perform initial acceptance testing on replication deviation and alignment deviation; After cleaning the silicon master mold and calibrating the alignment reference in step B1, a transparent support substrate is attached to the negative surface of the silicon master mold and the replication resin is cured in step B2. After peeling, a transparent replaceable working mold is obtained, and the replication depth deviation δh_rep and the alignment deviation δr_rep are used as release conditions. Step C: Load the working mold into the roll-to-film nanoimprinting station, and perform adhesive supply, bonding, imprinting, UV curing, and demolding on the lens substrate, while monitoring the imprinting process, specifically including the following: Step C1: Control the linear speed, imprinting pressure and ultraviolet dose at the film rolling station to form a microstructure on the lens substrate; In step C1, the lens substrate is fixed on the carrier plate that moves with the roll material station. The linear speed v_line, imprinting pressure P_nip and ultraviolet dose E_uv are controlled to complete the imprinting and curing, and the peak demolding force F_peak is collected online. Step C2: Collect peak demolding force, defect density, roughness or scattering index, and determine whether to trigger cleaning, re-anti-sticking or replace the working mold based on the index; Between step C1 and step C2, the surface roughness R_q and scattering index S_scatter of the first piece or sampled piece are measured. Batch imprinting continues only if R_q≤τ_R and S_scatter≤τ_S. Here, τ_R represents the upper limit threshold of the surface roughness allowed for the first piece or sampled piece, and τ_S represents the upper limit threshold of the scattering index allowed for the first piece or sampled piece. The two correspond to surface morphology quality gating and scattering risk gating, respectively. Step C3: Perform post-processing and batch traceability information writing on the gated lenses to form mass-producible microstructure lenses; Step D: Output the finished product, acceptance report, and traceability data package.

2. The method for mass production of roll-to-roll nanoimprinted planar lenses according to claim 1, characterized in that: Step C2 calculates the working mold health status H_m based on the cumulative number of imprints N_imp, peak demolding force F_peak, defect density ρ_def, roughness R_q, and scattering index S_scatter, and triggers cleaning, re-anti-sticking, or replacement of the working mold when H_m < τ_H.

3. The method for mass production of roll-to-roll nanoimprinted planar lenses according to claim 2, characterized in that: Step D outputs a traceability data packet containing the master mold number, working mold number, imprint batch, cumulative imprint count of the working mold N_imp, peak demolding force F_peak, acceptance result, and cause code.

4. A roll-to-roll nanoimprinted flat lens mass production apparatus, used to perform the method of claim 3, characterized in that: It includes an input module, a working template replication module, a roll-to-film imprinting and curing module, an online monitoring and gate control acceptance module, a life management module, and an output module; The input module is used to obtain the silicon master mold number, working mold substrate information, lens substrate information, and batch task parameters; The working mold replication module is used to perform silicon master mold cleaning, replication resin bonding, transparent support substrate curing, and replication deviation acceptance. The roll-to-sheet imprinting and curing module is used to perform adhesive supply, bonding, imprinting, UV curing and demolding; The online monitoring and gate control acceptance module is used to collect F_peak, R_q, S_scatter and ρ_def, and generate release / rework reason codes; The lifespan management module is used to trigger cleaning, re-anti-sticking, or replacement of the working mold based on N_imp and health level H_m. The output module is used to output finished products, acceptance reports, and traceability data packages.

5. The roll-to-roll nanoimprint flat lens mass production apparatus according to claim 4, characterized in that: The working mold replication module includes a master mold surface cleaning unit, an alignment reference reading unit, a replication curing unit, and a replication deviation acceptance unit.

6. The roll-to-roll nanoimprint planar lens mass production apparatus according to claim 4, characterized in that: The roll-to-roll imprinting and curing module includes a carrier plate conveying unit, an adhesive supply unit, an imprinting unit, an ultraviolet irradiation unit, and a demolding unit.

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