Organic light emitting display and electronic device thereof

Abstract

The invention relates to an organic light emitting display and an electronic device thereof. The invention discloses an organic light emitting display device, a method of manufacturing the same, and an electronic device thereof. The organic light emitting display device includes a first electrode, a pixel defining layer disposed on the first electrode and exposing a portion of the first electrode through an opening, an organic material layer disposed in the opening of the pixel defining layer, and a second electrode disposed on the organic material layer. In this case, the pixel defining layer includes a halftone layer composed of a photosensitive composition, a trench formed in the halftone layer, and a full-tone layer protruding from the halftone layer.

Description

[0001] Cross-references to related applications This application claims priority to Korean Patent Application No. 10-2024-0165417, filed on November 19, 2024, the entire contents of which are incorporated herein by reference as if fully set forth herein. Technical Field

[0002] This disclosure relates to an organic light-emitting display device and an electronic device thereof, the organic light-emitting display device including a pixel defining layer made using a photosensitive composition. Background Technology

[0003] Flat panel display devices such as liquid crystal displays (LCDs) and organic light-emitting displays (OLEDs) are widely used. Among them, organic light-emitting displays have the following advantages: for example, low power consumption, fast response speed, high color reproduction, high brightness, and wide viewing angle.

[0004] For organic light-emitting display devices, polarizing films are used to block light incident from the outside and reflected from the panel. However, due to their insufficient bending properties, polarizing films are not suitable for use in flexible devices.

[0005] As one approach to addressing this problem, methods have been proposed for forming inorganic films to block light on an upper substrate, as well as for forming color filters and black matrices. However, these methods have limitations in achieving the desired level of anti-reflection performance and have not specifically proposed alternative methods to polarizing films.

[0006] At the same time, color patterns are used not only as red, green, and blue filters in liquid crystal displays, but also as pixel delimiting layers that separate each pixel (red, green, and blue) in organic light-emitting displays.

[0007] In fabricating the pixel-defining layer, various organic pigments, as well as carbon black and inorganic pigments, are used as colorants. Pigment dispersions containing these pigments are mixed with other compositions to form a pattern. In this case, a photolithography process is added to support the metal mask used for deposition before the organic light-emitting layer is deposited, followed by the deposition process.

[0008] Organic light-emitting displays (OLEDs) consisting of pixel-bound layers can achieve sharper colors. However, when driving such a display, lateral current can flow into the pixels through the pixel-bound layer, which can cause problems with color accuracy, reliability, and lifespan. Summary of the Invention

[0009] This embodiment provides an organic light-emitting display device and its manufacturing method, which uses high lateral resistance to prevent lateral current from flowing into the pixels, thereby not only making the display colors clear, but also enhancing reliability and service life.

[0010] This embodiment provides an electronic device including the above-described organic light-emitting display device.

[0011] In one aspect, an organic light-emitting display device according to an embodiment includes: a first electrode; a pixel defining layer disposed on the first electrode and exposing a portion of the first electrode through an opening; an organic material layer disposed in the opening of the pixel defining layer; and a second electrode disposed on the organic material layer. In this case, the pixel defining layer includes a halftone layer composed of a photosensitive composition, trenches formed in the halftone layer, and a fulltone layer protruding from the halftone layer.

[0012] In another aspect, a method for manufacturing an organic light-emitting display device according to another embodiment includes: preparing a first electrode on a substrate; forming a pixel defining layer on the first electrode that exposes a portion of the first electrode through an opening; forming an organic material layer disposed in the opening of the pixel defining layer; and forming a second electrode disposed on the organic material layer.

[0013] The step of forming the pixel defining layer includes: exposing a photosensitive composition applied to a first electrode using a photomask to form a trench, a halftone layer and a fulltone layer, respectively, the photomask including a first region having 0% transmittance, a second region having 5% to 20% transmittance, a third region having 25% to 50% transmittance and a fourth region having 100% transmittance.

[0014] In another aspect, an electronic device according to another embodiment includes the above-described organic light-emitting display device and a controller for driving the organic light-emitting display device.

[0015] According to the organic light-emitting display device, its manufacturing method and its electronic equipment disclosed herein, lateral current can be prevented from flowing into the pixels by increasing the lateral resistance, thereby not only making the colors clearer, but also enhancing the reliability and lifespan of the display. Attached Figure Description

[0016] The above and other objects, features and advantages of this disclosure will become clearer from the following detailed description taken in conjunction with the accompanying drawings: Figure 1 This is a partial plan view of an organic light-emitting display device according to an embodiment; Figure 2 This is a cross-sectional view of an organic light-emitting display device according to an embodiment; Figure 3 It is along Figure 1 A cross-sectional view of the pixel-defining layer along line A-A'; Figure 4A and Figure 4B This is a cross-sectional view illustrating an example of an organic material layer; Figures 5 to 7 This illustrates the relationship between the cone angle of each layer of the pixel-defining layer and the lateral current in an organic light-emitting display device according to an embodiment; Figure 8 This is a flowchart illustrating a method for manufacturing an organic light-emitting display device according to another embodiment; and Figure 9A and Figure 9B It shows in Figure 8 The process of forming a pixel boundary layer in the manufacturing method uses a multi-tone photomask to form the pixel boundary layer. Detailed Implementation

[0017] Certain embodiments of the present invention will now be described in detail with reference to the exemplary accompanying drawings. When assigning reference numerals to components in the various drawings, the same components may be assigned the same numerals even if they are shown in different drawings.

[0018] Detailed descriptions of known configurations or functions may be omitted when it is determined that this would obscure the subject matter of the invention. As used herein, when a component “comprises,” “has,” or “is composed of another component,” the component may include other components unless the component “only” includes, has, or is composed of that other component. As used herein, the singular forms “a,” “an,” and “the” are intended to include the plural forms.

[0019] Furthermore, in describing the components of the present invention, terms such as first, second, A, B, (a), and (b) may be used. These designations are provided only to distinguish one component from another, and the nature, order, or number of the components is not limited by these designations.

[0020] When describing the positional relationship between components, if two or more components are described as "connected," "coupled," or "linked," these two or more components may be directly "connected," "coupled," or "linked," or another component may be involved. Here, the other component may be included in one or more of the two or more components that are "connected," "coupled," or "linked" to each other.

[0021] When a component is "on" or "above" another component, it should be understood that the component may be directly on or above the other component, or there may be other components in between. Conversely, when a component is "directly on" another component, it should be understood that there are no intervening components in between.

[0022] When using words such as “after,” “next,” and “before” to describe time-flow relationships related to components, operating methods, and manufacturing methods, non-continuous relationships may be included unless the words “immediately” or “directly” are used.

[0023] When a value or its corresponding information is specified for a component, the value or corresponding information may be interpreted as including tolerances that may arise due to various factors, such as process factors, internal or external influences, or noise.

[0024] Unless otherwise stated, without departing from the spirit of this disclosure, the terminology used in this specification and the appended claims is as follows.

[0025] Unless otherwise stated, the term "halo" as used in this application includes fluorine (F), chlorine (Cl), bromine (Br), and iodine (I).

[0026] Unless otherwise stated, "alkyl (alkyl or alkyl group)" as used in this application refers to a free radical having saturated aliphatic functional groups of 1 to 60 carbon atoms linked by a single bond, including straight-chain alkyl, branched-chain alkyl, cycloalkyl (alicycloyl), alkyl-substituted cycloalkyl, and cycloalkyl-substituted alkyl.

[0027] Unless otherwise stated, the term "haloalkyl group" as used in this application refers to an alkyl group that has been substituted with a halogen.

[0028] Unless otherwise stated, the terms "alkenyl" or "alkynyl" as used in this application have double or triple bonds, include straight or branched groups, and have 2 to 60 carbon atoms, but this disclosure is not limited thereto.

[0029] Unless otherwise stated, “cycloalkyl” as used in this application refers to an alkyl group that forms a ring having 3 to 60 carbon atoms, but this disclosure is not limited thereto.

[0030] Unless otherwise stated, "alkoxy group" as used in this application means an alkyl group bonded with an oxygen radical and having 1 to 60 carbon atoms, but this disclosure is not limited thereto.

[0031] Unless otherwise stated, "alkenoxyl group (alkenoxyl group, alkenoxyl group, alkenyloxyl group, or alkenyloxy group)" as used in this application refers to an alkenyl group bonded with an oxygen radical and having 2 to 60 carbon atoms, but this disclosure is not limited thereto.

[0032] Unless otherwise stated, the terms "aryl group" and "arylene group" as used in this application each have 6 to 60 carbon atoms, but this disclosure is not limited thereto. In this application, aryl or arylene groups include monocyclic forms, ring assemblies, fused polycyclic compounds, etc. For example, aryl groups may include monovalent functional groups of phenyl, biphenyl, naphthalene, fluorenyl, and substituted fluorenyl groups, while arylene groups may include fluoreneyl and substituted fluoreneyl groups.

[0033] As used in this application, "ring assembly" refers to two or more ring systems (monocyclic or fused-ring systems) directly interconnected by single or double bonds, and the number of such direct connections between rings is one less than the total number of ring systems contained in the compound. In a ring assembly, identical or different ring systems can be directly interconnected by single or double bonds.

[0034] Since the aryl group in this application comprises a ring assembly, it includes biphenyls and terphenyls in which a benzene ring (i.e., a monoaromatic ring) is linked by a single bond. Furthermore, since the aryl group also includes compounds in which aromatic monocyclic rings and fused aromatic ring systems are linked by single bonds, it includes, for example, compounds in which a benzene ring (i.e., an aromatic monocyclic ring) and fluorene (i.e., a fused aromatic ring system) are linked by single bonds.

[0035] As used in this application, "fused polycyclic system" refers to a fused ring form sharing at least two atoms, and includes forms of fused two or more hydrocarbon ring systems and forms of fused at least one heterocyclic system containing at least one heteroatom. Such fused polycyclic systems can be aromatic rings, heteroaromatic rings, alicyclic rings, or combinations of these rings. For example, for aryl, naphthyl, phenanthryl, or fluorenel can be fused polycyclic systems, but are not limited thereto.

[0036] The term "spirocyclic compound" as used in this application refers to a "spiro-linked" compound, where a spiro-linked compound is a connection formed by two rings sharing only one atom. In this case, the atom shared by the two rings is called a "spiro atom," and based on the number of spiro atoms contained in a compound, they are respectively called "single-spiro," "two-spiro," and "triple-spiro" compounds.

[0037] Unless otherwise stated, as used herein, "fluorenyl," "fluoreneyl," and "trifluoreneyl" refer to structures in which R, R', R" and R'" are monovalent, divalent, or trivalent functional groups of hydrogen. "Substituted fluorenyl," "substituted fluoreneyl," or "substituted trifluoreneyl" refers to a substituent R, R', R" and R'" being at least one substituent other than hydrogen, including cases where R and R' are bonded to each other to form a spirocyclic compound with the carbon atoms they are bonded to. In this specification, regardless of valence (e.g., monovalent, divalent, trivalent, etc.), fluorenyl, fluoreneyl, and trifluoreneyl can all be referred to as fluorene groups.

[0038]

[0039] Furthermore, R, R', R" and R'" can each independently be an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or a heterocyclic group having 2 to 30 carbon atoms. For example, the aryl group can be phenyl, biphenyl, naphthyl, anthracene, or phenanthryl, and the heterocyclic group can be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyrazine, pyrazine, triazine, indole, benzofuran, quinazoline, or quinoxaline. For example, the substituted fluorene and fluoreneyl groups can each be monovalent or divalent functional groups of 9,9-dimethylfluorene, 9,9-diphenylfluorene, and 9,9'-spirodi[9H-fluorene].

[0040] The term "heterocyclic group" as used in this application includes not only aromatic rings such as "heteroaryl" or "heteroarylene," but also non-aromatic rings, and unless otherwise stated, it refers to a ring comprising one or more heteroatoms and having 2 to 60 carbon atoms, but this disclosure is not limited thereto. Unless otherwise stated, the term "heteroatom" as used in this application represents N, O, S, P, or Si, and "heterocyclic group" refers to a monocyclic form, ring assembly, fused polycyclic system, spirocyclic compound, etc., comprising heteroatoms.

[0041] For example, "heterocyclic group" can also include compounds containing heteroatom groups (such as SO2, P=O, etc.) to replace the carbons that make up the ring, such as the following compounds.

[0042]

[0043] The term "ring" as used in this application includes monocyclic and polycyclic rings, including not only hydrocarbon rings but also heterocycles containing at least one heteroatom, and including aromatic and non-aromatic rings.

[0044] The term "polycycle" as used in this application includes cyclic assemblies (such as biphenyl and terphenyl), fused polycyclic systems, and spirocyclic compounds, including not only aromatic rings but also non-aromatic rings, and not only hydrocarbon rings but also heterocycles containing at least one heteroatom.

[0045] As used in this application, the term "aliphatic cyclic group" refers to cyclic hydrocarbons excluding aromatic hydrocarbons, including monocyclic forms, ring assemblies, fused polycyclic systems, spirocyclic compounds, etc., and unless otherwise stated, it refers to a ring having 3 to 60 carbon atoms, but this disclosure is not limited thereto. For example, even if aromatic cyclic benzene and non-aromatic cyclic cyclohexane are fused, it corresponds to an alicyclic ring.

[0046] Furthermore, when prefixes are named consecutively, it indicates that substituents are listed in the order they are first written. For example, arylalkoxy refers to an alkoxy group substituted with an aryl group, alkoxycarbonyl refers to a carbonyl group substituted with an alkoxy group, and arylcarbonylalkenyl refers to an alkenyl group substituted with an arylcarbonyl group, where arylcarbonyl is a carbonyl group substituted with an aryl group.

[0047] Unless otherwise expressly stated, in the terms “substituted” or “unsubstituted” as used herein, “substituted” may mean substituted by one or more substituents selected from the group consisting of: deuterium, halogen, amino, nitrile, nitro, C1-C 30 Alkyl, C1-C 30 Alkoxy, C1-C 30 Alkylamine group, C1-C 30 Alkyl thiogroup, C6-C 30 Arylthioyl, C2-C 30 alkenyl, C2-C 30 alkynyl group, C3-C 30 cycloalkyl, C6-C 30 Aryl, deuterium-substituted C6-C 30 Aryl, C8-C 30 Aryl, silyl, boron, germanium, and C2-C 30 Heterocyclic groups (including at least one heteroatom selected from the group consisting of O, N, S, Si and P), but not limited to these substituents.

[0048] In this application, when aryl, arylene, heterocyclic, etc., listed as examples of various symbols and their substituents correspond to the 'functional group name', it can be described as the 'functional group name reflecting the valence state', but it can also be described as the 'parent compound name'. For example, for 'phenanthrene', which is a type of aryl, the monovalent 'group' can be described as 'phenanthryl(group)', the divalent group can be described as 'phenanthrylene(group)', etc., distinguishing the group name by valence state, but it can also be described as the parent compound name 'phenanthrene' without considering the valence state.

[0049] Similarly, for pyrimidines, the description can be 'pyrimidine' regardless of valence, or in the case of monovalent pyrimidinyl (group) and in the case of divalent pyrimidinyl (group) the name of the corresponding valence group. Therefore, in this disclosure, when the type of substituent is specified by the name of the parent compound, it can refer to an n-valent 'group' formed by hydrogen atoms bonded to carbon atoms and / or heteroatoms of the parent compound.

[0050] Furthermore, in this specification, numbers or letters indicating positions may be omitted when describing compound names or substituent names. For example, pyrido[4,3-d]pyrimidine may be abbreviated as pyridopyrimidine, benzofurano[2,3-d]pyrimidine may be abbreviated as benzofuranopyrimidine, and 9,9-dimethyl-9H-fluorene may be abbreviated as dimethylfluorene. Therefore, both benzo[g]quinoxaline and benzo[f]quinoxaline can be described as benzo[g]quinoxaline.

[0051] Furthermore, unless otherwise stated, the chemical formulas used in this application apply the same substituent definitions as those defined in the index of the following chemical formulas.

[0052]

[0053] Here, when a is an integer 0, it represents the substituent R. 1 The statement that "a" does not exist, meaning it is 0, indicates that hydrogen is bonded to all carbons forming the benzene ring. In this case, the chemical formula or compound can be described by omitting the hydrogens bonded to carbons. Furthermore, when a is an integer of 1, a substituent R... 1 It bonds to any one of the carbons forming the benzene ring, and when a is an integer of 2 or 3, for example, it can bond as follows, and when a is an integer of 4 to 6, it bonds to the carbons of the benzene ring in a similar manner, and when a is an integer of 2 or greater, R 1 They can be the same as or different from each other.

[0054]

[0055] Unless otherwise stated in this application, forming a ring means that adjacent groups are bonded to each other to form a monocyclic or fused polycyclic ring, and the monocyclic and fused polycyclic rings include not only hydrocarbon rings but also heterocycles containing at least one heteroatom, and may include aromatic and non-aromatic rings.

[0056] Furthermore, unless otherwise stated in this specification, when indicating fused rings, the number in 'numerical-fused ring' indicates the number of fused rings. For example, a form in which three rings are fused together, such as anthracene, phenanthrene, and benzoquinazoline, can be represented as a 3-fused ring.

[0057] Furthermore, unless otherwise stated, the term "bridged bicyclic compound" as used in this application refers to a compound in which two rings share three or more atoms to form a ring. In this case, the shared atoms may include carbon or heteroatoms.

[0058] In this application, organic electronic device may refer to one or more components located between an anode and a cathode, or an organic light-emitting diode or organic light-emitting display device including an anode and a cathode and one or more components located therebetween.

[0059] Furthermore, in some cases, the display device in this application may refer to organic electronic devices, organic light-emitting diodes, and panels including them, or electronic devices including panels and circuitry. Here, for example, electronic devices may include, but are not limited to, all devices such as lighting devices, solar cells, portable or mobile terminals (e.g., smartphones, tablets, PDAs, electronic dictionaries, PMPs, etc.), navigation terminals, game consoles, various televisions, various computer monitors, etc., and may be any type of device including one or more components.

[0060] The embodiments of this disclosure are described in detail below. However, the scope of this disclosure is not limited to the embodiments disclosed herein, but is defined by the appended claims.

[0061] Figure 1 This is a partial plan view of an organic light-emitting display device according to an embodiment.

[0062] See Figure 1 According to an embodiment, the organic light-emitting display device 20 includes different organic light-emitting elements SP1, SP2, and SP3 disposed on a substrate 1. These different organic light-emitting elements SP1, SP2, and SP3 can be RGB sub-pixels, and they can constitute a pixel.

[0063] Different organic light-emitting elements SP1, SP2, and SP3 can have different areas, or they can have the same area.

[0064] The organic light-emitting display device 20 may include a pixel-defining layer or pixel-defining film, dam (hereinafter referred to as pixel-defining layer 6), wherein an organic material layer is disposed between two electrodes and exposes a portion of one of the electrodes through an opening 6d. As described above, different organic light-emitting elements SP1, SP2, and SP3 may have different areas due to the different areas of the opening 6d in the pixel-defining layer 6.

[0065] The pixel defining layer 6 includes the photosensitive composition described below, and includes a halftone layer 6b, a trench 6a formed in the halftone layer 6b, and a fulltone layer 6c protruding from the halftone layer 6b. The trench 6a is disposed around the organic light-emitting elements SP1, SP2, and SP3. The fulltone layer 6c is disposed only in some of the organic light-emitting elements. The halftone layer 6b is disposed on the entire substrate 1, except for the areas where the trench 6a and the fulltone layer 6c are located.

[0066] According to the embodiment, the organic light-emitting display device 20 can arrange trenches 6a in the pixel defining layer 6, and the trenches 6a have high lateral resistance to prevent lateral current from flowing into the organic light-emitting elements SP1, SP2, SP3, thereby not only making the display colors clear, but also improving reliability and service life.

[0067] Furthermore, the organic light-emitting display device 20 according to the embodiment can prevent display damage by providing a full-tone layer 6c in the pixel defining layer 6, the full-tone layer 6c acting as a spacer to withstand pressure applied to other components (e.g., a touchpad) disposed on the upper surface.

[0068] Figure 2 This is a cross-sectional view of an organic light-emitting display device according to an embodiment. Figure 3 It is along Figure 1 A cross-sectional view of the pixel-defining layer line A-A'.

[0069] See Figure 2 and Figure 3 According to an embodiment, the organic light-emitting display device 20 includes a substrate 1, a TFT layer 2 on the substrate, a planarization layer 3 on the TFT layer 2, a first electrode or pixel electrode 4 on the planarization layer 3, an organic material layer 5 on the first electrode, and a second electrode or counter electrode 7 disposed on the organic material layer 5.

[0070] Furthermore, the organic light-emitting display device 20 according to the embodiment may include a sealing layer 8 disposed on the second electrode 7, a touch panel 9 disposed on the sealing layer 8, a color filter 10 disposed on the touch panel 9, an OCA layer 11 disposed on the color filter 10, and a cover glass layer 12 disposed on the OCA layer.

[0071] Figure 4A and Figure 4B This is a cross-sectional view illustrating an example of an organic material layer.

[0072] Organic material layer 5 can be as follows Figure 4A As shown, it consists of a single layer 5 between the first electrode 4 and the second electrode 7, or it can be as follows: Figure 4B As shown, it consists of a tandem structure including a first organic material layer 5A, a charge generation layer 5B on the first organic material layer 5A, and a second organic material layer 5C on the charge generation layer 5B.

[0073] The pixel defining layer 6 can be disposed on the first electrode 4.

[0074] The pixel-defining layer 6 includes a halftone layer 6b and a fulltone layer 6c, and a trench 6a can be disposed in the halftone layer 6b.

[0075] One or more trenches 6a may be formed in the halftone layer 6b adjacent to the organic material layer 5.

[0076] The trenches 6a formed in the halftone layer 6b can increase the lateral resistance to prevent lateral current from flowing into the organic material layer 5 through the pixel defining layer 6, thereby improving the color reproduction rate, lifespan and reliability of the organic light-emitting element.

[0077] The substrate 1 can be a flexible substrate. The substrate 1 can be formed of a plastic with excellent heat resistance and durability, such as polyimide (PI), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polyarylate (PAR), polyetherimide (PEI), and polyethersulfone (PES).

[0078] However, this disclosure is not limited to this, and various flexible materials, such as metal foil or thin glass, can be used. Meanwhile, the substrate 1 can also be a rigid substrate, in which case the substrate can be formed from a glass material with SiO2 as the main component.

[0079] For bottom-emitting types where the image is realized in the substrate direction, the substrate should be formed of a transparent material. However, for top-emitting types where the image is realized in the opposite direction of the substrate 1, the substrate 1 does not necessarily need to be formed of a transparent material. In this case, the substrate can be formed of a metal. When the substrate is formed of a metal, the substrate 1 may include one or more materials selected from the group consisting of carbon, iron, chromium, manganese, nickel, titanium, molybdenum, and stainless steel (SUS), but this disclosure is not limited thereto.

[0080] TFT layer 2 may be disposed on substrate 1. The term TFT layer 2 as used in this specification refers to a thin-film transistor (TFT) array used to drive organic light-emitting elements, and indicates the driving portion used to display images. Figure 1 Only the organic light-emitting element and the driving thin-film transistor that drives the organic light-emitting element are shown in the figure for ease of description. This disclosure is not limited to the content shown in the figure, and it will be apparent to those skilled in the art that it may also include multiple thin-film transistors, storage capacitors and various circuits.

[0081] The TFT layer 2 may be covered and protected by the planarization layer 3. The planarization layer 3 may include an inorganic insulating film and / or an organic insulating film. Examples of inorganic insulating films that may be used in the planarization layer 3 include silicon oxide (SiO2) and silicon nitride (SiN). x ), silicon oxynitride (SiON), aluminum oxide (Al2O3), titanium oxide (TiO2), tantalum oxide (Ta2O5), hafnium oxide (HfO2), zirconium oxide (ZrO2), barium strontium titanate (BST), lead zirconate titanate (PZT), etc.

[0082] Furthermore, examples of organic insulating films that can be used for planarization layer 3 may include general polymers (PMMA, PS), polymer derivatives having phenolic groups, acrylic polymers, imide polymers, aromatic ether polymers, amide polymers, fluoropolymers, p-xylene polymers, vinyl alcohol polymers, and blends thereof.

[0083] Simultaneously, the planarization layer 3 can have a composite laminate structure of an inorganic insulating film and an organic insulating film. Furthermore, the planarization layer 3 can include the photosensitive composition disclosed herein. Since matters concerning the photosensitive composition of this disclosure are the same as those described above according to the embodiments of this disclosure, they are omitted here.

[0084] An organic material layer 5 can be formed on the planarization layer 3. The organic material layer 5 may include a first electrode 4 formed on the planarization layer, a second electrode or common electrode 7 disposed opposite to the first electrode, and the organic material layer 5 disposed therebetween. When a voltage is applied between the first electrode 4 and the second electrode 7, the organic material layer 5 can emit light. The organic material layer 5 can emit red, green, blue, or white light. When the organic material layer 5 emits white light, in order to display a color image; or when the organic material layer 5 emits red, green, and blue light, in order to improve color purity and light efficiency, the organic light-emitting display device 20 may further include blue, green, and red filters.

[0085] Organic light-emitting display devices 20 can be classified into bottom-emitting, top-emitting, and double-sided-emitting types according to their light emission direction. In a bottom-emitting type organic light-emitting display device 20, the first electrode 4 is configured as a transparent electrode, while the second electrode 7 is configured as a reflective electrode. In a top-emitting type organic light-emitting display device 20, the first electrode 4 is configured as a reflective electrode, while the second electrode 7 is configured as a semi-transparent reflective electrode. In this disclosure, the organic light-emitting display device 20 is described based on the top-emitting type, which emits light in the direction of the sealing layer 8.

[0086] The first electrode 4 can be a reflective electrode. The first electrode 4 may include a laminated structure having the following layers: a reflective layer and a transparent or semi-transparent electrode layer with a high work function. The reflective layer may include Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or alloys thereof. The transparent or semi-transparent electrode layer may include at least one material selected from transparent conductive oxide materials, such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium oxide (In₂O₃), indium gallium oxide (IGO), and zinc aluminum oxide (AZO).

[0087] The first electrode can be patterned to form islands corresponding to each organic light-emitting element SP1, SP2, SP3.

[0088] In addition, the first electrode 4 can function as an anode electrode.

[0089] Simultaneously, a pixel defining layer 6 can be disposed on the first electrode 4. This pixel defining layer 6 includes a predetermined opening 6d that covers the edge of the pixel electrode and exposes the central portion of the first electrode 4. An organic material layer 5, including an organic light-emitting layer, can be disposed on the area defined by the opening 6d. The area where the organic material layer 5 is disposed can be defined as a light-emitting area.

[0090] Simultaneously, when a light-emitting region is formed in the opening 6d of the pixel defining layer 6, a region protruding from the pixel defining layer 6 is disposed between the light-emitting regions, and since no organic light-emitting layer is formed in this protruding region, it can be defined as a non-light-emitting region. The pixel defining layer 6 may include the photosensitive composition disclosed herein.

[0091] The colorant-containing composition according to the embodiments can be used to manufacture red patterns, green patterns, blue patterns or black matrices, and pixel delimiting layers 6.

[0092] In addition to the colorants included in the aforementioned colorants, the black pixel defining layer 6 according to the embodiments may also include organic black pigments or black dyes as additional colorants. For example, organic pigments may be used alone, or organic pigments and colorants may be mixed and used. In this case, since colorants with insufficient light-blocking properties are mixed in, there is an advantage that the strength of the film (layer) or its adhesion to the substrate will not decrease even if the amount of colorant is relatively increased. The pixel defining layer 6 according to the embodiments of this disclosure may include black pigments or black dyes as additional colorants to replace the colorants included in the aforementioned colorants.

[0093] Each component is described in detail below.

[0094] Ⅰ. Pixel Delimitation Layer The pixel defining layer 6 of this disclosure includes a halftone layer 6b and a fulltone layer 6c made of a photosensitive composition, and a trench 6a may be disposed in the halftone layer 6b.

[0095] The pixel defining layer 6 has high lateral resistance (due to the presence of trench 6a), which prevents lateral current from flowing into the pixels. Therefore, when applied to a display, the colors are clear and the lifespan and reliability of the display can be improved.

[0096] Figure 3 The diagram illustrates the cone angle B of the full-tone layer 6c and the cone angle A of the groove 6a.

[0097] The cone angle A of the groove 6a can be 50° to 80°, or 60° to 70°, or 63° to 67°, but this disclosure is not limited thereto.

[0098] Figures 5 to 7 The relationship between the cone angle of each layer of the pixel-defining layer and the lateral current is shown in an organic light-emitting display device according to an embodiment.

[0099] See Figure 5 Regardless of the cone angle A, the trench 6a of the pixel defining layer 6 can effectively prevent lateral current from flowing into the organic light-emitting elements SP1, SP2, and SP3, thereby improving the color reproduction rate and lifespan of the display.

[0100] Specifically, when the cone angle A of the trench 6a of the pixel defining layer 6 is contained within the range, it can effectively prevent lateral current from flowing into the organic light-emitting elements SP1, SP2, and SP3, thereby improving the color reproduction rate and lifespan of the display.

[0101] On the other hand, such as Figure 6 As shown, when the groove 6a is absent or the cone angle A of the groove 6a is less than the range described, the actual degree of formation of the groove 6a is extremely small, thus the effect of blocking lateral current is low, and the color reproduction rate and lifespan of the display may be relatively reduced.

[0102] In addition, such as Figure 7 As shown, when the cone angle A of the trench 6a exceeds the range, relatively less pixel defining layer 6 is formed, and lateral current easily flows into the organic light-emitting elements SP1, SP2, and SP3 through the electrodes. This may reduce the color reproduction rate and lifespan of the display as described above. In addition, the possibility of short circuits occurring during deposition in the encapsulation process is high, which may lead to panel defects.

[0103] The gap between the halftone layer 6b and the bottom of the trench 6a can be from 0.1 μm to 1.2 μm, and can be from 0.3 μm to 1.0 μm.

[0104] When the gap between the halftone layer 6b and the bottom of the trench 6a is contained within the range, the lateral resistance increases due to the sufficient cavity in the trench 6a. Consequently, the lateral current flowing into the organic light-emitting elements SP1, SP2, and SP3 is effectively blocked, resulting in high color reproduction rate, lifespan, and reliability of the display.

[0105] The cone angle B of the full-tone layer 6c can be 15° to 40°, or 20° to 35°, or 25° to 30°, but this disclosure is not limited thereto.

[0106] The thickness of the halftone layer 6b can be from 1.0 μm to 2.0 μm or from 1.3 μm to 1.7 μm, but this disclosure is not limited thereto.

[0107] The thickness of the full-tone layer 6c can be from 0.8 μm to 1.7 μm or from 1.0 μm to 1.5 μm, but this disclosure is not limited thereto.

[0108] The composition of the photosensitive composition constituting the pixel defining layer 6 is as follows.

[0109] (1) Patterned resin The patterning resin used as the photosensitive composition constituting the pixel defining layer 6 may include acrylic adhesive resin, carbomer adhesive resin, polyimide resin, or a combination thereof.

[0110] Acrylic adhesive resin is a copolymer of a first vinyl unsaturated monomer and a second vinyl unsaturated monomer that can be copolymerized therewith, and is a resin comprising one or more repeating acrylic units.

[0111] The first vinyl unsaturated monomer is a vinyl unsaturated monomer comprising one or more carboxyl groups, and specific examples include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or combinations thereof. Based on the total amount of the acrylic adhesive resin, the first vinyl unsaturated monomer may be included in an amount of 5% to 50% (e.g., 10% to 40% by weight) by weight.

[0112] Secondary vinyl unsaturated monomers include: aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, and vinyl benzyl methyl ether; unsaturated carboxylic acid ester compounds such as meth (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, and phenyl (meth)acrylate; unsaturated carboxylic acid aminoalkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; carboxylic acid vinyl ester compounds such as vinyl acetate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; cyano vinyl compounds such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; etc., which may be used alone or in combination of two or more.

[0113] Specific examples of acrylic adhesive resins include (meth)acrylic acid / benzyl methacrylate copolymers, (meth)acrylic acid / benzyl methacrylate / styrene copolymers, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymers, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymers, etc., but this disclosure is not limited thereto. These can be used alone or in combination of two or more. The weight-average molecular weight of the acrylic adhesive resin can be from 3,000 g / mol to 150,000 g / mol, for example from 5,000 g / mol to 50,000 g / mol, for example from 20,000 g / mol to 30,000 g / mol.

[0114] Carbomer resins include repeating structures as shown in Chemical Formula 1 below.

[0115] <Chemical Formula 1>

[0116] In chemical formula 1, 1)R 1 and R 2 Each is independently hydrogen; deuterium; halogen; C6-C 30 Aryl; C2-C including at least one heteroatom of O, N, S, Si and P 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl, 2)R 1 and R 2 It can form a ring with adjacent groups. 3) m or n are each an independent integer from 0 to 4. 4) A1 and A2 are each independently chemical formula 2 or chemical formula 3 below. <Chemical Formula 2>

[0117] <Chemical Formula 3>

[0118] In chemical formulas 2 and 3, 4-1) * indicates a connection site. 4-2) R 3 To R 6 Each is independently hydrogen; deuterium; halogen; C6-C 30 Aryl; C2-C including at least one heteroatom of O, N, S, Si and P 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl, 4-3) R 3 To R 6 It can form a ring with adjacent groups. 4-4) Y 1 and Y 2 Each of them is independently represented by either chemical formula 6 or chemical formula 7 below. <Chemical Formula 6>

[0119] <Chemical Formula 7>

[0120] In chemical formulas 6 and 7, 4-4-1) * indicates the bonding position. 4-4-2) R 9 It is hydrogen or methyl. 4-4-3)R 10 To R 13Each is independently hydrogen; deuterium; halogen; C6-C 30 Aryl; C2-C including at least one heteroatom of O, N, S, Si and P 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl, 4-4-4) L 1 To L 3 Each is an independent single bond; fluorene group; C2-C 30 Alkylene; C6-C 30 Aromatic; C2-C 30 Heterocyclic ring; C1-C 30 Alkoxyalkylene; C2-C 30 alkylene oxide; C6-C 30 Aryloxy group; C2-C 30 polyethylene glycol oxide, 4-4-5) q and r are each independent integers from 0 to 3; the condition is that q + r = 3. 5) In polymer chains comprising repeating units represented by chemical formula 1, the ratio of molecular formula 2 to molecular formula 3 is from 9:1 to 1:9. 6) X 1 It is a single bond; O; CO; SO2; CR'R"; SiR'R"; the following chemical formula 4; or chemical formula 5, 6-1) R' and R" are each independently hydrogen; deuterium; halogen; C6-C 30 Aryl; C2-C including at least one heteroatom of O, N, S, Si and P 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl, 6-2) R' and R" can form rings with adjacent groups. <Chemical Formula 4>

[0121] <Chemical Formula 5>

[0122] In chemical formulas 4 and 5, 6-3) * indicates the bonding location. 6-4) R 7 To R 8 Each is independently hydrogen; deuterium; halogen; C6-C 30 Aryl; C2-C including at least one heteroatom of O, N, S, Si and P 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl, 6-5) o and p are each an independent integer from 0 to 4. 7) X 2 It is C6-C 30 Aryl; C2-C including at least one heteroatom of O, N, S, Si and P 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30 aryloxy group; fluorene group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl, 8) R', R", X 2 L 1 To L 3 R 1 To R 8 and R 10 To R 13 Each can be further substituted by one or more substituents selected from the group consisting of: deuterium; halogen; C1-C 30 Alkyl or C6-C 30 Aryl-substituted or unsubstituted silyl groups; siloxane groups; boron groups; germanium groups; cyano groups; amino groups; nitro groups; C1-C 30 Alkylthio; C1-C 30 Alkyl group; C6-C 30 arylalkoxy; C1-C 30 Alkyl; C2-C30 Alkenyl; C2-C 30 alkynyl group; C6-C 30 Aryl; C6-C substituted with deuterium 30 aryl; fluorenyl; C2-C including at least one heteroatom selected from the group consisting of O, N, S, Si and P. 30 Heterocyclic group; C3-C 30 Alicyclic group; C7-C 30 Aryl alkyl group; C8-C 30 Arylene groups; and combinations thereof, and adjacent substituents may form rings.

[0123] When R', R", X 2 L 1 To L 3 R 1 To R 8 and R 10 To R 13 When they are aryl, they are preferably C6-C. 30 Aryl, more preferably C6-C 18 Aryl groups, such as phenyl, biphenyl, naphthyl, terphenyl, etc.

[0124] When R', R", X 2 L 1 To L 3 R 1 To R 8 and R 10 To R 13 When they are heterocyclic groups, they are preferably C2-C. 30 Heterocyclic groups, more preferably C2-C 18 Heterocyclic groups, such as dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran, etc.

[0125] When R', R", R 1 To R 8 and R 10 To R 13 When the fluorene group is used, they are preferably 9,9-dimethyl-9H-fluorene, 9,9-diphenyl-9H-fluorene, 9,9'-spirodifluorene, etc.

[0126] When L 1 To L 3 When they are aryl groups, they are preferably C6-C. 30 Aromatic, more preferably C6-C 18 Aryl groups, such as phenyl, biphenyl, naphthyl, terphenyl, etc.

[0127] When R', R", X 2 R 1 To R 8 and R10 To R 13 When they are alkyl groups, they are preferably C1-C. 10 Alkyl groups, such as methyl, tert-butyl, etc.

[0128] When R', R", X 2 R 1 To R 8 and R 10 To R 13 When they are alkoxy groups, they are preferably C1-C. 20 Alkoxy groups, more preferably C1-C 10 Alkyl groups, such as methoxy and tert-butoxy groups.

[0129] R', R", X 2 L 1 To L 3 R 1 To R 8 and R 10 To R 13 The ring formed by the bonding of adjacent groups can be C6-C. 60 Aromatic ring group; fluorene group; C2-C group including at least one heteroatom of O, N, S, Si and P. 60 Heterocyclic group; or C3-C 60 Alicyclic groups, and for example, when adjacent groups bond to each other to form an aromatic ring, they preferably form C6-C... 20 Aromatic rings, more preferably C6-C 14 Aromatic rings, such as benzene, naphthalene, phenanthrene, etc.

[0130] Cardoyl resins can be prepared by mixing two or more of the following substances, such as: fluorene-containing compounds, such as 9,9-bis(4-epoxypropoxyphenyl)fluorene; acid anhydride compounds, such as phenyltetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, benzophenonetetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride, tetrahydrofurantetracarboxylic dianhydride, and tetrahydrophthalic anhydride; diol compounds, such as ethylene glycol, propylene glycol, and polyethylene glycol; alcohol compounds, such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent compounds, such as propylene glycol methyl ether acetate and N-methylpyrrolidone; phosphorus compounds, such as triphenylphosphine; and amine or ammonium salt compounds, such as tetramethylammonium chloride, tetraethylammonium bromide, benzyl diethylamine, triethylamine, tributylamine, and benzyl triethylammonium chloride.

[0131] The weight-average molecular weight of the carboxymethyl resin can be from 1,000 to 100,000 g / mol, preferably from 1,000 to 50,000 g / mol, and more preferably from 1,000 to 30,000 g / mol. When the weight-average molecular weight of the resin is within this range, patterning is well formed and there are no residues during the fabrication of the photoblocking layer, there is no loss of film thickness during development, and good patterning can be obtained. Based on the total amount of the photosensitive resin composition, it may include 1% to 30% (more preferably 3% to 20% by weight) of resin. When the resin is included in this range, excellent sensitivity, developability, and adhesion (tack) can be obtained.

[0132] Cardoyl resin and acrylic resin can be mixed.

[0133] Based on the total amount of the photosensitive composition, it may include a resin mixture in an amount of 1% to 50% (more preferably 5% to 45% by weight) on a weight basis. When the sum of the carboxymethyl resin and the acrylic resin is included in this range, the pixel defining layer 6 can achieve excellent sensitivity, developability, and adhesion (binder strength).

[0134] Furthermore, polyimide-based resins can be copolymerized with polyimide, which forms the main polymer chain, to adjust solubility and prevent the over-dissolution of polyamic acid, a precursor of polyimide, in alkaline aqueous solutions. In addition, an appropriate solubility difference between exposed and unexposed areas can be obtained during the patterning process, thereby achieving a black pixel separation layer with excellent heat resistance and patterning properties.

[0135] For example, a polyimide-based resin may comprise polyamic acid repeating units and polyimide repeating units, and the polyamic acid repeating units and polyimide repeating units may be contained in a molar ratio of 5:5 to 9:1 (e.g., 2:8 to 8:2). When the polyamic acid repeating units and polyimide repeating units are contained in a molar ratio within this range, solubility in the solvent used in the composition can be ensured, and appropriate developability is exhibited during patterning. Usable polyimide-polyamic acid copolymers have a structure comprising the following chemical formulas 1-1, 1-2, or combinations thereof.

[0136] <Chemical Formula 1-1>

[0137] <Chemical Formulas 1-2>

[0138] In chemical formulas 1-1 and 1-2, 1) * indicates the portion that is bonded together as a repeating unit. 2) At the polymer ends, the portions of chemical formulas Q-1 to Q-10 are bonded via amide or imide bonds. 3) X is the chemical formula 2 below. 4) Y is selected from the following group: C6-C 30 arylene; C2-C containing at least one heteroatom of O, N, S, Si, and P. 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkylene; C1-C 20 Cycloalkylene; C2-C 20 alkenyl group; C3-C 20 Cycloalkenyl; C2-C 20 etymynyl; C3-C 20 Cycloacetylenic group; chemical formula 2; and combinations thereof. 5) Z is selected from the group consisting of: C6-C 30 arylene; C2-C containing at least one heteroatom of O, N, S, Si, and P. 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkylene; C1-C 20 Cycloalkylene; C2-C 20 alkenyl group; C3-C 20 Cycloalkenyl; C2-C 20 etymynyl; C3-C 20 Cycloacetylenic group; chemical formula 3; and combinations thereof. 6) m and n are integers of 1 or greater. <Chemical Formulas Q-1 to Q-10>

[0139] 7) The polymer ends are bonded to chemical formulas selected from Q-1 to Q-10 or combinations thereof via amide or imide bonds. <Chemical Formula 2>

[0140] In chemical formula 2, 8) L 1 Selected from the following groups: single bond, -CH2-, -CH2CH2-, -CH2OCH2-, -CH(CH3)-, -C(CH3)2-, -O-, -CH(CF3)-, -C(CF3)2-, -S-, -SO2-, Si(CH3)2-, -C6H4-, -CO-, -NHCO-, -COO-, 9) R 1 To R10 The two in the text are the linkage sites with the amide groups of chemical formulas 1-1 and 1-2. 10) All R except for the connection site 1 To R 10 Each of these elements is independently hydrogen; deuterium; hydroxyl group; C6-C. 30 aryl; C2-C containing at least one heteroatom of O, N, S, Si, and P. 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; carboxyl group; or C1-C 20 alkoxycarbonyl, 11) When L 1 When it is a single bond, adjacent R 1 and R 10 It is not a connection site; and R 5 and R 6 It can form a ring. <Chemical Formula 3>

[0141] In chemical formula 3, 12) L 2 Selected from the following groups: single bond, -CH2-, -CH2CH2-, -CH2OCH2-, -CH(CH3)-, -C(CH3)2-, -O-, -CH(CF3)-, -C(CF3)2-, -S-, -SO2-, Si(CH3)2-, -C6H4-, -CO-, -NHCO-, -COO-. 13) R 11 To R 20 The two in the text are the linkage sites with the amide groups of chemical formulas 1-1 and 1-2. 14) All R except for the connection site 11 To R 20 Each of these elements is independently hydrogen; deuterium; hydroxyl group; C6-C. 30 aryl; C2-C containing at least one heteroatom of O, N, S, Si, and P. 30 Heterocyclic groups; C6-C of alicyclic and aromatic rings 30 Fused ring group; C1-C 20 Alkyl; C2-C 20 Alkenyl; C2-C 20 Alkyne group; C1-C 20 Alkyl group; C6-C30 Aryloxy group; fluorenyl group; carbonyl group; ether group; carboxyl group; or C1-C 20 Alkoxycarbonyl, but only if the remaining R groups are not linked. 11 To R 20 Two of them are carboxyl groups. 15) When L 2 When it is a single bond, adjacent R 11 and R 20 It is not a connection site; and R 15 and R 16 It can form a ring.

[0142] The polyimide-based resin is preferably prepared from a diamine monomer, a diacyl chloride monomer, and a dianhydride monomer.

[0143] The diamine preferably comprises one or more monomers selected from the group consisting of: 2,2'-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, 2,2'-bis(3-amino-4-hydroxyphenyl)propane, 3,3'-dihydroxybenzidine, and combinations thereof.

[0144] Diacyl chloride preferably comprises one or more monomers selected from the group consisting of: 4,4'-oxobisbenzoyl chloride, 1,2-cyclobutanedicarboxyl chloride, 1,4-cyclohexanedicarboxyl chloride, and combinations thereof.

[0145] The dianhydride preferably comprises one or more monomers selected from the group consisting of: 4,4'-(hexafluoroisopropylidene) phthalic anhydride, bicyclooctanetetracarboxylic dianhydride, and combinations thereof.

[0146] The weight-average molecular weight of the resin is preferably between 5,000 and 40,000 g / mol.

[0147] Based on the total amount of the composition, it preferably includes 5% to 50% by weight of polyimide-based resin.

[0148] (2) Reactive unsaturated compounds The reactive unsaturated compounds required for negative patterning have vinyl unsaturated double bonds, which can induce sufficient polymerization during exposure in the patterning process, thereby forming patterns with excellent heat resistance, light resistance and chemical resistance.

[0149] Specific examples of reactive unsaturated compounds include: ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate (Miramer M600, Miwon Specialty Chemical Co.), bisphenol A epoxy acrylate, ethylene glycol monomethyl ether acrylate, trimethylolpropane triacrylate, and tripentaerythritol octaacrylate.

[0150] Examples of commercially available reactive unsaturated compounds are as follows.

[0151] Examples of (meth)acrylate bifunctional esters include: Aronix M-210, M-240, and M-6200 from Toagosei Chemical Industry Co., Ltd.; KAYARAD HDDA, HX-220, and R-604 from Nippon Kayaku Co., Ltd.; and V-260, V-312, and V-335 HP from Osaka Organic Chemical Industry Co., Ltd.

[0152] Examples of trifunctional (meth)acrylates include Aronix M-309, M-400, M-405, M-450, M-7100, M-8030, and M-8060 from Tosoh Chemical Industry Co., Ltd.; KAYARAD TMPTA, DPCA-20, DPCA-60, and DPCA-120 from Nippon Kayaku Co., Ltd.; and V-295, V-300, and V-360 from Osaka Organic Chemical Industry Co., Ltd.

[0153] These products can be used alone or in combination of two or more.

[0154] Reactive unsaturated compounds can be treated with acid anhydrides to provide better developability. Based on the total amount of the photosensitive resin composition, it may include 1% to 40% (e.g., 1% to 20% by weight) of the reactive unsaturated compound. When the reactive unsaturated compound is included within this range, sufficient curing occurs during exposure in the patterning process, resulting in excellent reliability, and the pattern exhibits excellent heat resistance, light resistance, and chemical resistance, as well as excellent resolution and adhesion.

[0155] (3) Photoinitiator To achieve negative patterns via photolithography, a photoradical initiator should be used.

[0156] Photopolymerization initiators are commonly used initiators for photosensitive resin compositions, and for example, acetophenone compounds, benzophenone compounds, thioxanone compounds, benzoin compounds, triazine compounds, oxime compounds, or mixtures thereof can be used.

[0157] Examples of acetophenone compounds may include: 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinylpropane-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butane-1-one, etc.

[0158] Examples of benzophenone compounds may include: benzophenone, benzoylbenzoic acid, methylbenzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc.

[0159] Examples of thioxanthone compounds may include: thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and 2-chlorothioxanthone.

[0160] Examples of benzoin compounds may include: benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, etc.

[0161] Examples of triazine compounds may include: 2,4,6-trichlorotriazine, 2-phenyl-4,6-bis(trichloromethyl)triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)triazine, 2-(p-tolyl)-4,6-bis( Trichloromethyl)triazine, 2-biphenyl-4,6-bis(trichloromethyl)triazine, bis(trichloromethyl)-6-styryltriazine, 2-(naphthyl-1-yl)-4,6-bis(trichloromethyl)triazine, 2-(4-methoxynaphthyl-1-yl)-4,6-bis(trichloromethyl)triazine, 2-4-trichloromethyl(piperyl)-6-triazine, 2-4-trichloromethyl(4'-methoxystyryl)-6-triazine, etc.

[0162] Examples of oxime compounds may include: 2-(o-benzoyl oxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(o-acetyl oxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl] ethyl ketone, (E)-1-(((3-cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl)propylidene)amino)oxy)ethane-1-one (PBG-304, Trony), etc.

[0163] In addition to the compounds mentioned above, photoinitiators can also include carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, imidazole compounds, and non-imidazole compounds.

[0164] Photoinitiators can be peroxide compounds, azo compounds, etc., as free radical polymerization initiators.

[0165] Examples of peroxide compounds may include: ketone peroxides, such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methyl cyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides, such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides, such as 2,4,4-trimethylpentyl-2-hydroperoxide, diisopropylbenzene hydroperoxide, isopropylbenzene hydroperoxide, and tert-butyl hydroperoxide; and dialkyl peroxides, such as diisopropylbenzene peroxide, 2,5-Dimethyl-2,5-di(tert-butylperoxy)hexane, 1,3-bis(tert-butoxyisopropyl)benzene and tert-butylperoxy valerate n-butyl ester; alkyl peresters, such as 2,4,4-trimethylpentylperoxyphenoxyacetate, α-cumylperoxyneodecanate, tert-butyl peroxybenzoate and di-tert-butylperoxytrimethyl adipate; and percarbonates, such as di-3-methoxybutylperoxydicarbonate, di-2-ethylhexylperoxydicarbonate, bis-4-tert-butylcyclohexylperoxydicarbonate, diisopropylperoxydicarbonate, acetylcyclohexylsulfonyl peroxide and tert-butylperoxyallyl carbonate.

[0166] Examples of azobis-class compounds may include: 1,1'-azobiscyclohexane-1-formonitrile, 2,2'-azobis(2,4-dimethylpentanonitrile), 2,2'-azobis(methyl isobutyrate), 2,2'-azobis(4-methoxy-2,4-dimethylpentanonitrile), α,α'-azobis(isobutyronitrile), and 4,4'-azobis(4-cyanopentanoic acid).

[0167] Photoinitiators can be used in conjunction with photosensitizers. The photosensitizer absorbs light, becomes excited, and then transfers its energy to initiate a chemical reaction. Examples of photosensitizers include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetra-3-mercaptopropionate, and dipentaerythritol tetra-3-mercaptopropionate.

[0168] Based on the total amount of the photosensitive composition, it may include 0.01% to 10% (e.g., 0.1% to 5% by weight) of a photoinitiator. When the photoinitiator is included within this range, sufficient curing occurs during exposure in the patterning process, resulting in excellent reliability, excellent heat resistance, light resistance, and chemical resistance of the pattern, as well as excellent resolution and adhesion, and preventing a decrease in light transmittance due to unreacted initiator.

[0169] (4) Coloring agents Organic pigments, inorganic pigments, and dyes can be used as colorants.

[0170] As coloring agents, red pigments, green pigments, blue pigments, yellow pigments, black pigments, etc., can be used.

[0171] Examples of red pigments may include: CI Pigment Red 254, CI Pigment Red 255, CI Pigment Red 264, CI Pigment Red 270, CI Pigment Red 272, CI Pigment Red 177, CI Pigment Red 89, etc.

[0172] Examples of green pigments can include: copper phthalocyanine halogenated pigments, such as CI Pigment Green 36, CI Pigment Green 7, etc.

[0173] Examples of blue pigments can include copper phthalocyanine pigments, such as CI Pigment Blue 15:6, CI Pigment Blue 15, CI Pigment Blue 15:1, CI Pigment Blue 15:2, CI Pigment Blue 15:3, CI Pigment Blue 15:4, CI Pigment Blue 15:5, CI Pigment Blue 16, etc.

[0174] Examples of yellow pigments can include: isoindoline pigments, such as CI Pigment Yellow 139; quinoline pigments, such as CI Pigment Yellow 138; nickel complex pigments, such as CI Pigment Yellow 150, etc.

[0175] Examples of black pigments can include: lactam black, aniline black, perylene black, titanium black, carbon black, etc.

[0176] Furthermore, the colorant in the photosensitive resin composition according to the embodiments may include pigments, dyes, or combinations thereof. For example, dyes may include phthalocyanine compounds.

[0177] Pigments and dyes can be used alone or in combination of two or more, and are not limited to these examples.

[0178] Black pigments can be used to effectively block light in light-blocking layers. When using black pigments, they can be used in conjunction with color correctors such as anthraquinone, perylene, phthalocyanine, and azo pigments.

[0179] A dispersant can be used simultaneously to disperse the pigment in the photosensitive resin composition. Specifically, the pigment can be pre-treated with a dispersant, or the dispersant can be added together with the pigment during the preparation of the photosensitive resin composition.

[0180] As dispersants, nonionic dispersants, anionic dispersants, cationic dispersants, etc., can be used. Specific examples of dispersants may include: polyalkylene glycols and their esters, polyoxyalkylene glycols, polyol ester epoxide adducts, alcohol epoxide adducts, sulfonates, sulfonates, carboxylic esters, carboxylates, alkylamide epoxide adducts, alkylamines, etc., which can be used alone or in combination of two or more.

[0181] Examples of commercially available dispersants may include: DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc. from BYK; and from EFKA... Chemical's EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc.; Zeneka's Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc.; or Ajinomoto's PB711, PB821, etc.

[0182] Based on the total amount of the photosensitive resin composition, a dispersant may be included in an amount of 0.1% to 15% by weight. When the dispersant is included within this range, the composition exhibits excellent dispersibility, and therefore excellent stability, developability, and patternability when manufacturing a light-blocking layer.

[0183] Pigments can be pretreated using water-soluble inorganic salts and wetting agents. When pigments are pretreated and used, their average particle size can be refined.

[0184] Pretreatment can be carried out by the following steps: kneading the pigment with water-soluble inorganic salts and wetting agents, and filtering and washing the pigment obtained from the kneading step.

[0185] Kneading can be carried out at temperatures ranging from 40°C to 100°C, and filtration and washing can be performed by washing the inorganic salts with water and then filtering.

[0186] Examples of water-soluble inorganic salts include sodium chloride, potassium chloride, etc., but this disclosure is not limited thereto.

[0187] Wetting agents act as a medium, allowing pigments and water-soluble inorganic salts to mix uniformly, thus facilitating pigment pulverization. Examples include alkylene glycol monoalkyl ethers, such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and diethylene glycol monomethyl ether; alcohols, such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, and glycerol polyethylene glycol; these can be used alone or in combination of two or more.

[0188] The average particle size of the pigment after the kneading step can be between 20 nm and 110 nm. When the average particle size of the pigment is within this range, fine patterns can be effectively formed while exhibiting excellent heat resistance and lightfastness.

[0189] Based on the total amount of the photosensitive resin composition, it may include 1% to 40% (more specifically, 2% to 30% by weight) of pigment. When pigment is included within this range, color reproduction is excellent, and the curing and adhesion of the pattern are also excellent.

[0190] (5) Solvent As a solvent, materials that are compatible with but do not react with carboxylated resins, reactive unsaturated compounds, pigments, carboxylated compounds, and initiators can be used.

[0191] Examples of solvents may include: alcohols, such as methanol and ethanol; ethers, such as dichloroethyl ether, n-butyl ether, diisopentyl ether, methyl phenyl ether, and tetrahydrofuran; glycol ethers, such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellolytic acetates, such as methyl cellolytic acetate, ethyl cellolytic acetate, and diethyl cellolytic acetate; carbitols, such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; and propylene glycol alkyl ether acetates, such as propylene glycol alkyl ether acetates. Glycol methyl ether acetate and propylene glycol propyl ether acetate; aromatic hydrocarbons, such as toluene and xylene; ketones, such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-pentanone and 2-heptanone; saturated aliphatic monocarboxylic acid alkyl esters, such as ethyl acetate, ethyl butyrate and ethyl isobutyrate; lactate esters, such as methyl lactate and ethyl lactate; oxoacetic acid alkyl esters, such as methyl oxoacetate, ethyl oxoacetate and butyl oxoacetate; alkoxyacetic acid alkyl esters, such as methyl methoxyacetate, methyl... Ethyl oxyacetate, methoxybutyl acetate, ethoxymethyl acetate, and ethoxyethyl acetate; alkyl 3-oxopropionic acid esters, such as methyl 3-oxopropionic acid and ethyl 3-oxopropionic acid; alkyl 3-alkoxypropionic acid esters, such as methyl 3-methoxypropionic acid, ethyl 3-methoxypropionic acid, ethyl 3-ethoxypropionic acid, and methyl 3-ethoxypropionic acid; alkyl 2-oxopropionic acid esters, such as methyl 2-oxopropionic acid, ethyl 2-oxopropionic acid, and propyl 2-oxopropionic acid; alkyl 2-alkoxypropionic acid esters, such as methyl 2-methoxypropionic acid, propyl 2-methoxypropionic acid... Ethyl esters, ethyl 2-ethoxypropionate, and methyl 2-ethoxypropionate; 2-oxo-2-methylpropionates, such as methyl 2-oxo-2-methylpropionate and ethyl 2-oxo-2-methylpropionate; alkyl monooxocarboxylic acid esters of alkyl 2-alkoxy-2-methylpropionates, such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; esters, such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, and methyl 2-hydroxy-3-methylbutyrate; keto esters, such as ethyl pyruvate, etc.

[0192] In addition, high-boiling-point solvents can also be used, such as N-methylformamide, N,N-dimethylformamide, N-methylformaniline, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, etc.

[0193] In solvents, considering compatibility and reactivity, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; and propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate can be used.

[0194] Based on the total amount of the photosensitive resin composition, the solvent may be included in the remaining amount, specifically in an amount of 40% to 90% by weight. When the solvent is included within this range, the photosensitive resin composition has a suitable viscosity, thereby exhibiting excellent processability during the patterning layer manufacturing process.

[0195] (6) Other additives The photosensitive composition may further include additives such as malonic acid; 3-amino-1,2-propanediol; silyl coupling agents containing vinyl or (meth)acryloyloxy groups; leveling agents; fluoro-based surfactants; silicone-based surfactants; free radical polymerization initiators, etc., to prevent stains or spots during the coating process, enhance leveling properties, and prevent residues from being generated due to undeveloped material.

[0196] For example, the photosensitive resin composition may further include a silane coupling agent having reactive substituents (such as vinyl, carboxyl, methacryloyloxy, isocyanate, and epoxy groups) to enhance adhesion to the substrate.

[0197] Examples of silyl coupling agents may include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanate propyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-epoxycyclohexylethyltrimethoxysilane, etc., which may be used alone or in combination of two or more.

[0198] Based on 100 parts by weight of the photosensitive resin composition, it may include 0.01 to 10 parts by weight of a silane coupling agent. When the silane coupling agent is included in this range, excellent adhesion, storage performance, etc., are observed.

[0199] In addition, the photosensitive resin composition may further include surfactants, such as fluoro-based surfactants or silicone-based surfactants, as needed to achieve coating enhancement and defect prevention effects.

[0200] As fluorinated surfactants, commercially available fluorinated surfactants can be found in the following brands: BM-1000 and BM-1100 from BM Chemie; Megafac F 142D, F 172, F173, and F 183 from Dainippon Ink and Chemicals; Fluorad FC-135, FC-170C, FC-430, and FC-431 from Sumitomo 3M; Surflon S-112, S-113, S-131, S-141, and S145 from Asahi Glass; and SH-28PA, SH-190, SH-193, SZ-6032, and SF-8428 from Toray Silicone.

[0201] As silicone-based surfactants, commercially available silicone-based surfactants from BASF under names such as EFKA 3030, EFKA 3034, and EFKA 3886 can be used; AFCONA surfactants such as 3030, 3085, and 3236 can be used; and BYK surfactants such as BYK-379, BYK-3550, BYK-3751, and BYK-3754 can be used.

[0202] Based on 100 parts by weight of the photosensitive resin composition, a surfactant can be used in an amount of 0.001 to 5 parts by weight. When the surfactant is included within this range, coating uniformity is guaranteed, no stains are generated, and excellent wettability to the glass substrate is achieved. Furthermore, other additives, such as antioxidants and stabilizers, can be added to the photosensitive resin composition in predetermined amounts, within the range that does not impair the physical properties.

[0203] II. Manufacturing method of organic light-emitting display device Figure 8 This is a flowchart illustrating a method for manufacturing an organic light-emitting display device according to another embodiment. Figure 9A and Figure 9B It shows in Figure 8 The process of forming a pixel boundary layer using a multi-tone photomask in the manufacturing method.

[0204] See Figure 1 and Figure 8According to another embodiment, a method 30 for manufacturing an organic light-emitting display device 20 includes preparing a first electrode 4 on a substrate 1 (S32), forming a pixel defining layer 6 on the first electrode 4 that exposes a portion of the first electrode 4 through an opening 6d (S34), forming an organic material layer 5 disposed in the opening 6d of the pixel defining layer 6 (S36), and forming a second electrode 7 disposed on the organic material layer 5 (S38).

[0205] See Figure 9A and Figure 9B The step of forming the pixel defining layer 6 (S34) includes: exposing the photosensitive composition 42 applied to the first electrode 4 using a photomask 40 to form a trench 6a, a halftone layer 6b and a fulltone layer 6c, respectively, wherein the photomask 40 includes a first region x having 0% transmittance, a second region y having 5% to 20% transmittance, a third region z having 25% to 50% transmittance and a fourth region w having 100% transmittance.

[0206] As described above, the cone angle A of the trench 6a can be 50° to 80°, or 60° to 70°, or 63° to 67°, and the appropriate cone angle A of the trench 6a can be formed by adjusting the transmittance of the second region y and the exposure time.

[0207] The gap between the halftone layer 6b and the bottom of the trench 6a can be 0.1 μm to 1.2 μm, and can be 0.3 μm to 1.0 μm. The appropriate bottom gap can be formed by adjusting the transmittance and exposure time of the first to third regions x, y, z.

[0208] The cone angle B of the full-tone layer 6c can be 15° to 40°, or 20° to 35°, or 25° to 30°, and the appropriate cone angle B of the full-tone layer 6c can be formed by adjusting the transmittance and exposure time of the fourth region w.

[0209] The thickness of the halftone layer 6b can be from 1.0 μm to 2.0 μm or from 1.3 μm to 1.7 μm, and the appropriate thickness of the halftone layer 6b can be formed by adjusting the transmittance of the second region y and the exposure time.

[0210] The thickness of the full-tone layer 6c can be from 0.8 μm to 1.7 μm or from 1.0 μm to 1.5 μm, and can be determined according to the thickness of the photosensitive composition itself.

[0211] In addition to the transmittance or exposure time of the aforementioned regions, the above characteristics can also be adjusted through the application and coating steps, exposure steps, molding steps, etc., described below.

[0212] In this example, a negative photoresist is exemplarily described as being used as the photosensitive composition 42 to form the trench 6a, halftone layer 6b, and fulltone layer 6c, but a positive photoresist can also be used. In this case, the first to fourth regions could have the opposite transmittance to that in this example.

[0213] The step of forming the pixel defining layer 6 (S34) may include: an application and coating step of applying and coating the photosensitive composition 42, an exposure step of exposing the photosensitive composition 42 using a photomask 40, and a development step of developing the exposed photosensitive composition 42 at a temperature of 19°C to 27°C for 30 to 120 seconds.

[0214] The step of forming the pixel definition layer (S34) may also include a pre-baking step.

[0215] The steps for forming the pixel boundary layer 6 (S34) will be described in detail below.

[0216] III. Method for manufacturing pixel boundary layers (1) Application and coating steps The photosensitive composition 42 constituting the pixel defining layer 6 of this disclosure is a low-viscosity liquid sample, and after the photosensitive composition 42 is applied to the substrate, it is coated to a predetermined thickness using a spin coater or a slot coater. The advantage of a spin coater is that the faster the rotation speed, the smaller the thickness, but the flatness deviation within the area is reduced. For coating on large-area substrates, the slot coater is superior to the spin coater. After coating, the surface exhibits fluidity due to residual solvent, which has the disadvantage of deteriorating flatness. To overcome this, a VCD (vacuum chamber drying) is used to partially remove the solvent, thereby reducing surface fluidity.

[0217] (2) Pre-baking steps This is a process of heating a coated substrate in a hot plate or oven at a predetermined temperature and time to partially remove the solvent contained in the coating film. If the surface or interior of the coating film is not dried, photomask contamination will occur during exposure in the next process, and the exposed areas will not cure properly when exposed to ultraviolet light. Furthermore, due to the lack of curing, the pattern will be removed during development without being formed.

[0218] (3) Exposure steps Following the pre-baking process, the formed film is cured by irradiating it with active rays (ultraviolet light) using a patterned photomask 40. The types of lamps that generate the active rays include LED lamps or metal (mercury) lamps, and the wavelengths include g-line (436 nm), h-line (405 nm), i-line (365 nm), and deep UV (<260 nm), which can be used individually or in combination.

[0219] (4) Development step When active rays are irradiated during the exposure step, they are separated into exposed and unexposed portions by photomask 40. In the case of a positive type, the exposed portions are dissolved by the developer, while the unexposed portions resist the developer, leaving a pattern. In the case of a negative type, the exposed portions are cured and resistant to the developer, while the unexposed portions are developed. The black pixel defining layer (Black PDL) manufactured using the colorant-containing composition of this disclosure is of the negative type and can be patterned by distinguishing between the exposed portions (cured) and the unexposed portions (developed).

[0220] In the developing step, it is preferred to use 2.38 wt% TMAH (tetramethylammonium hydroxide) as the developing agent.

[0221] The developing step is preferably performed at a temperature of 19°C to 27°C for 30 to 120 seconds, more preferably 30 to 90 seconds, and even more preferably 30 to 60 seconds.

[0222] In another embodiment, the pixel defining layer 6 manufactured using the above-described photosensitive composition 42 can be patterned on the pixel separation portion of the organic light-emitting element electrode.

[0223] The second electrode 7 can be formed as a semi-transparent reflective electrode. The second electrode 7 can be a thin semi-transparent reflective film formed of a low work function metal (such as Li, Ca, LiF / Ca, LiF / Al, Al, Mg, and Ag). To compensate for the high resistance of the thin metal semi-transparent reflective film, a transparent conductive film formed of a transparent conductive oxide can be laminated on the metal semi-transparent reflective film.

[0224] The second electrode 7 can be formed on the entire substrate as a common electrode.

[0225] In addition, this second electrode 7 can function as a cathode electrode.

[0226] The polarities of the pixel electrode and the second electrode 7, as described above, can be opposite to each other.

[0227] The organic material layer 5 includes an organic light-emitting layer, and the organic light-emitting layer can be made of low-molecular-weight organic materials or high-molecular-weight organic materials. When the organic light-emitting layer is a low-molecular-weight organic layer formed of low-molecular-weight organic materials, the hole transport layer (HTL) and the hole injection layer (HIL) can be disposed in the direction of the pixel electrode with the organic light-emitting layer as the center, and the electron transport layer (ETL) and the electron injection layer (EIL) can be disposed in the direction of the second electrode 7.

[0228] Of course, in addition to these hole injection layers, hole transport layers, electron transport layers, and electron injection layers, the organic material layer 5 can also be laminated with other functional layers. Furthermore, as mentioned above, the organic material layer 5 can be composed of… Figure 4AThe diagram shows a single layer 5 comprising functional layers, or it can be composed of... Figure 4B The structure shown consists of a first organic material layer 5A including a functional layer, a charge generation layer 5B on the first organic material layer, and a second organic material layer 5C including a functional layer on the charge generation layer, arranged in series.

[0229] A sealing layer 8 can be disposed on the organic material layer 5 to cover the organic material layer 5. The organic light-emitting element contained in the organic material layer 5 is composed of organic materials and may be easily degraded by external moisture or oxygen. Therefore, the organic material layer 5 should be sealed to protect such organic light-emitting elements. As a means of sealing the organic material layer 5, the sealing layer 8 can have a structure in which multiple inorganic films and multiple organic films are alternately laminated.

[0230] In the organic light-emitting display device of this embodiment, it is preferable to use a thin film in which multiple inorganic films and multiple organic films are alternately laminated to form the sealing layer 8 instead of the sealing substrate. Furthermore, by using a thin film as a sealing means, the flexibility and thinness of the organic light-emitting display device can be easily achieved.

[0231] The sealing layer 8 may include multiple inorganic membranes and multiple organic membranes. These inorganic and organic membranes may be laminated alternately with each other.

[0232] Inorganic films can be formed from metal oxides, metal nitrides, metal carbides, or combinations thereof. For example, inorganic films can be formed from aluminum oxide, silicon oxide, or silicon nitride. According to another example, an inorganic film can comprise a laminated structure of multiple inorganic insulating layers. Inorganic films can perform the function of inhibiting the permeation of external moisture and / or oxygen into the organic light-emitting element layer.

[0233] Organic membranes can be high molecular weight organic compounds. For example, organic membranes can include any of epoxy resins, acrylates, or urethane acrylates. Organic membranes can perform functions such as relieving internal stress in inorganic membranes, compensating for defects in inorganic membranes, and planarization.

[0234] The stacking order of the inorganic and organic films constituting the sealing layer 8 is not restricted. The organic or inorganic film can be laminated on the organic material layer 5, and the top layer of the sealing layer 8 can also be an organic or inorganic film.

[0235] The touch panel 9 may be formed on the sealing layer 8. The touch panel 9 may include a first touch electrode formed on the sealing layer 8, a second touch electrode disposed opposite to the first touch electrode, and an insulating layer disposed therebetween.

[0236] The first and second touch electrodes can be formed as a lattice pattern or a specific pattern shape. The first touch electrode can be formed to contact the upper part of the sealing layer 8, and an additional inorganic layer can be provided between the sealing layer 8 and the first touch electrode.

[0237] The first and second touch electrodes can be formed from ITO or a metal mesh, preferably from a metal mesh.

[0238] Metal mesh electrodes are manufactured by printing opaque metals (copper, silver, gold, aluminum, etc.) in a grid pattern with a thickness of 1 to 7 μm. Due to the use of highly conductive metals, the resistance is extremely low, resulting in fast touch response, ease of implementation in large screens, and lower cost compared to ITO films. Furthermore, metal mesh electrodes exhibit superior durability against repeated bending compared to ITO electrodes, making them suitable for use as touch panel electrodes in foldable displays.

[0239] The touch panel 9 is preferably a capacitive touch panel, which detects the position by using the capacitance in the human body to identify the part of the current that has changed and calculate the size when the user touches it.

[0240] The organic light-emitting display device disclosed herein is not limited to the illustrations. As will be apparent to those skilled in the art, it may also include: a control IC (which converts analog signals from a touch panel into digital signals and controls the coordinate values ​​required to determine the coordinates of the touch area), an optically transparent adhesive, a flexible printed circuit board (FPCB) on which conductive and signal line patterns are formed to transmit various signals to electronic components, and various other electronic components and various circuits.

[0241] A color filter 10 can be formed on the touch panel 9. The color filter 10 is located on the touch panel 9 and can include a colored portion that is vertically aligned with the light-emitting area of ​​the organic material layer 5, and a color separation portion that is vertically aligned with the non-light-emitting area and separates the colored portion.

[0242] The positions of the layers in the structure of the organic light-emitting display device 20 described above are not limited. It will be apparent to those skilled in the art that various functional layers with specific purposes and functions can be additionally provided between the layers. Furthermore, the organic light-emitting display device disclosed herein is not limited to the structure and figures described above.

[0243] Examples of synthesis and examples based on this disclosure will be described in detail below, but the examples of synthesis and examples based on this disclosure are not limited thereto.

[0244] I. Preparation of photosensitizing composition Synthetic Example 1: (Preparation of 9,9-bis[4-(glycidoxy)phenyl]fluorene of Formula 8) 20 g of 9,9'-biphenylfluorene (Sigma-Aldrich), 8.67 g of epichlorohydrin (Sigma-Aldrich), and 30 g of anhydrous potassium carbonate were placed in a 300 ml three-necked round-bottom flask equipped with 100 ml of N,N-dimethylformamide and a distillation tube. The mixture was heated to 80 °C and reacted for 4 hours, then cooled to 25 °C. The reaction solution was filtered, and the filtrate was added dropwise to 1000 ml of water with stirring. After the powder precipitated, it was filtered, washed with water, and dried under reduced pressure at 40 °C to obtain 25 g of 9,9-bis[4-(glycidoxy)phenyl]fluorene (Formula 8 below). HPLC purity analysis showed that the obtained powder had a purity of 98%.

[0245] <Chemical Formula 8>

[0246] Synthesis Example 2: Preparation of Carboxymethyl Adhesive Resin 25 g (54 mmol) of Compound 1 obtained in Synthesis Example 1, 8 g of acrylic acid (Daejung Chemical), 0.2 g of benzyltriethylammonium chloride (Daejung Chemical), and 0.2 g of hydroquinone (Daejung Chemical) were placed together with 52 g of propylene glycol methyl ether acetate (Sigma-Aldrich) in a 300 ml three-necked round-bottom flask equipped with a distillation tube and stirred at 110 °C for 6 hours. After the reaction was complete, 8 g of biphenyl dianhydride (Mitsubishi Gas) and 1.8 g of tetrahydrophthalic acid (Sigma-Aldrich) were added, and the mixture was stirred again at 110 °C for 6 hours. After the reaction was complete, the reaction solution was recovered and analyzed to obtain a caloyl adhesive resin with a molecular weight of 4,580 and a solids content of 45%.

[0247] Synthesis Example 3: Preparation of Polyimide-based Resins A stirrer, nitrogen injection device, dropping funnel, temperature controller, and cooler were installed in a 250 ml three-necked round-bottom flask. Nitrogen gas was introduced, and 65.7 g of N-methylpyrrolidone (NMP) was added, followed by 15 g of 2,2'-bis(3-amino-4-hydroxyphenyl)hexafluoropropane and 0.52 g of pyridine. The mixture was maintained at 40 °C with stirring. 0.910 g of phthalic anhydride was slowly added, and the mixture was stirred for a predetermined time to dissolve and react. 52.70 g of NMP was added to the flask during the reaction, and the solution was stirred at 5 °C for 30 minutes. Subsequently, 11.18 g of 4,4'-oxobisbenzoyl chloride was slowly added and dissolved, and the mixture was reacted for 12 hours with stirring.

[0248] After stirring the polyhydroxyamide solution at room temperature for 1 hour, it was precipitated with 1506 g of methanol. The precipitated solid was then vacuum dried at 60 °C for 12 hours to obtain 21.13 g of copolyimide resin powder.

[0249] Preparation Example 1: Preparation of Black Pigment Dispersion 15g of Irgaphor Black S 100 CF (black pigment / BASF), 8.5g of Disperbyk 163 (BYK), and 6.5g of SR-3613 (SMS) were dispersed together with 70g of propylene glycol methyl ether acetate and 100g of 0.5mm diameter zirconia beads (Toray) using a paint shaker (Asada) for 10 hours to obtain a dispersion.

[0250] Prepare a photosensitive composition according to the composition shown in Table 1.

[0251] Specifically, after dissolving the initiator in a solvent and stirring at room temperature, a binder resin and a reactive unsaturated compound are added, and the mixture is stirred at room temperature. Subsequently, a colorant and other additives are added to the resulting reaction product, and the mixture is stirred at room temperature. The product is then filtered three times to remove impurities, thereby preparing the photosensitive resin compositions A-1 to A-4 shown in Table 1 below.

[0252] [Table 1]

[0253] The acrylic resin (polymer C-1) is SR-3100 (SMS, containing double bonds, average molecular weight 6,000 to 8,000), the reactive unsaturated compound is Miramer M600 (Miwon Specialty Chemical), the photoinitiator is PBG-304 (Trony), and the solvent is propylene glycol methyl ether acetate.

[0254] II. Manufacturing method and measurement example of pixel boundary layer (PDL) (1) Application and coating steps A photosensitive composition was applied to a cleaned 10cm x 10cm metal deposition substrate to a predetermined thickness using a spin coater, and then a thin film was formed by partially removing the solvent using a VCD (vacuum chamber drying) process. The coating thickness of the photosensitive composition after VCD was a film of 3.3 to 3.5 micrometers.

[0255] (2) Pre-baking steps To remove the solvent contained in the resulting film, it is heated on a hot plate at 80°C to 150°C (preferably 90°C to 120°C) for 50 to 200 seconds (preferably 60 to 180 seconds, more preferably 100 to 150 seconds). By removing a predetermined amount of solvent in this process, mask contamination in the form of pixels can be reduced in subsequent process (exposure) steps, and a clean pattern can be created.

[0256] (3) Exposure steps After inserting a pixel-shaped mask into the resulting thin film to obtain the desired patterning and predetermined thickness, the pattern can be formed by irradiating a metal lamp or LED light source with active rays (preferably ghi lines) of 190 nm to 600 nm using an exposure machine. The radiation exposure for patterning is 20 to 150 mJ / cm², preferably 70 mJ / cm² to 140 mJ / cm², more preferably 80 to 110 mJ / cm², and a negative photoresist material is formed. The transmittance of the photomask used during exposure has four transmittance regions for patterning: 0% (unexposed area), 5% to 20% (trench), 25% to 50% (halftone), and 100% (fulltone). In the following example, when forming the halftone layer, the exposure is set to x mJ / cm², the photomask transmittance is 35%, and the trench is formed by adjusting the photomask transmittance within the range of 5% to 20% as shown in Table 2.

[0257] (4) Development step After the exposure step, the sample is developed by immersion in 2.38wt% TMAH (tetramethylammonium hydroxide) developer at 23±2℃ for 30 to 120 seconds. Then, it is rinsed with ultrapure water (DI water) to dissolve and remove the unexposed parts, leaving only the exposed parts to form a graphic pattern.

[0258] (5) Pattern and cone angle analysis To identify the pattern and cone angle of the developed graphic, the shape and thickness of the pattern cross-section were measured using a scanning electron microscope (JEOL), and the cone angle was identified by designating the top of the highest pattern from the bottom as a full-tone layer, the middle part as a half-tone layer, and the recessed part of the middle part as a groove.

[0259] (6) Lateral resistance measurement To measure the lateral resistance, a structure was constructed as follows: Figure 3 The lateral current measurement module is shown. The comparative example is the same as the example above, but differs from the example above in that: the trench is absent, the cone angle of the trench is not within the appropriate range, or the gap between the halftone surface and the bottom of the trench is not within the appropriate range, as shown in Table 2.

[0260] right Figure 5The lateral current measurement module shown is described as follows: a pixel defining layer with the following dimensions is formed on an organic light-emitting display device consisting of a first electrode or anode and a second electrode or cathode to configure halftone, trench, and fulltone: a width of 5 μm × 5 μm (based on a photomask) and a fulltone thickness of 1.5 μm (based on actual measurements after sintering). An ITO electrode layer is applied outside the provided pixel defining layer, and a P-doped HTL layer without an ITO electrode layer is applied at the center to measure the lateral current value of the pixel defining layer.

[0261] For the lateral current values, use this module to export IV curves for each example and comparison example. Additionally, use a Keithley 2400 for precise measurements of lateral resistance to export lateral resistance values ​​based on the IV values.

[0262] [Table 2]

[0263] In Table 2, comparing the results of the examples with those of Comparative Examples 1 and 2, it can be seen that the lateral resistance value is relatively high when the cone angle value of the trench is within the range defined in this disclosure.

[0264] When the cone angle of the trench is within the range defined in this disclosure, it can be determined that the halftone trench can exist as a sufficient cavity, thereby increasing resistance and effectively blocking charge flow, thus suppressing lateral current. On the other hand, when the cone angle of the trench is less than 50°, it can be determined that because the cavity is relatively small and there is a medium through which many charges can flow sufficiently, lateral current may not be effectively blocked.

[0265] Furthermore, comparing the results of the examples with those of Comparative Examples 3 and 4, it can be seen that the lateral resistance value is relatively high even when the gap between the halftone layer and the bottom of the trench is within the range defined in this disclosure. In particular, referring to the results of Comparative Example 4, in which no trench is formed, it can be seen that the example with the trench has a relatively high lateral resistance. This is judged to be a result similar to the cone angle comparison results, i.e., when the trench exists as a sufficient cavity, the resistance increases and the lateral current is suppressed.

[0266] Furthermore, as in Comparative Example 3, when the gap is 1.2 μm or more, it can be determined that the pixel boundary layer is relatively thin, resulting in decreased physical stability and thus failing to effectively block lateral current.

[0267] Comparing the comparative examples, comparative example 4, which has no trench, has a very low lateral resistance value, while comparative examples 1 to 3 have relatively high lateral resistance values ​​compared to comparative example 4.

[0268] By comparing the above examples and comparative examples, the organic light-emitting display device, its manufacturing method and its electronic device according to the above examples can increase the lateral resistance by forming trenches in the pixel defining layer, and the lateral resistance can be further increased relatively because the trenches contain cone angle values ​​within an appropriate range.

[0269] In summary, the organic light-emitting display device, its manufacturing method, and its electronic equipment according to the above examples form trenches in the pixel defining layer, and the trenches contain cone angle values ​​within an appropriate range, thereby generating high lateral resistance that prevents lateral current from flowing into the pixels, thus not only making the display colors clearer, but also improving reliability and service life.

[0270] The above description is merely an illustrative description of the present invention, and various modifications can be made by those skilled in the art without departing from the basic characteristics of the present invention.

[0271] Therefore, the embodiments disclosed in this specification are not intended to limit this disclosure, but rather to describe it, and the spirit and scope of this disclosure are not limited by these embodiments. The scope of protection of this disclosure should be interpreted by the claims, and all techniques within the equivalent scope should be interpreted as being included within the scope of this disclosure.

Claims

1. An organic light-emitting display device, comprising: First electrode; A pixel defining layer is disposed on the first electrode and exposes a portion of the first electrode through an opening; An organic material layer is disposed in the opening of the pixel defining layer; as well as A second electrode is disposed on the organic material layer, wherein the pixel defining layer includes a photosensitive composition and includes a halftone layer and trenches formed in the halftone layer, and a fulltone layer protruding from the halftone layer.

2. The organic light-emitting display device as described in claim 1, wherein, The cone angle of the groove is 50° to 80°.

3. The organic light-emitting display device as described in claim 1, wherein, The organic material layer has a series structure comprising two light-emitting layers, and the organic light-emitting display device includes a touch panel located on the second electrode.

4. The organic light-emitting display device as described in claim 1, wherein, The gap between the halftone layer and the bottom of the trench is 0.1 μm to 1.2 μm.

5. The organic light-emitting display device as described in claim 1, wherein, The thickness of the halftone layer is 1.0 μm to 2.0 μm, and the thickness of the fulltone layer is 0.8 μm to 1.7 μm.

6. The organic light-emitting display device as described in claim 1, wherein, The photosensitive composition includes acrylic adhesive resin, carboxylic adhesive resin, polyimide resin, or a combination thereof.

7. The organic light-emitting display device as described in claim 1, wherein, The photosensitive composition includes a colorant.

8. The organic light-emitting display device as described in claim 1, wherein, The photosensitizing composition includes a reactive unsaturated compound.

9. The organic light-emitting display device as claimed in claim 1, wherein, The photosensitive composition includes a photoinitiator.

10. A method for manufacturing an organic light-emitting display device, the method comprising: The first electrode is fabricated on the substrate; A pixel defining layer is formed on the first electrode, the pixel defining layer exposing a portion of the first electrode through an opening; An organic material layer is formed in the opening of the pixel defining layer; as well as A second electrode is formed on the organic material layer, wherein forming the pixel defining layer includes: exposing a photosensitive composition applied to the first electrode using a photomask to form a trench, a halftone layer and a fulltone layer, respectively, wherein the photomask includes a first region having 0% transmittance, a second region having 5% to 20% transmittance, a third region having 25% to 50% transmittance and a fourth region having 100% transmittance.

11. The method of claim 10, wherein, The cone angle of the groove is 50° to 80°.

12. The method of claim 10, wherein, Forming the pixel defining layer includes: an application and coating step of applying and coating the photosensitive composition; an exposure step of exposing the photosensitive composition using the photomask; and a development step of developing the exposed photosensitive composition at a temperature of 19°C to 27°C for 30 to 120 seconds.

13. The method of claim 12, wherein, The formation of the pixel-defining layer also includes a pre-baking step.

14. The method of claim 10, wherein, The photosensitive composition includes acrylic adhesive resin, carboxylic adhesive resin, polyimide resin, or a combination thereof.

15. The method of claim 10, wherein, The photosensitive composition includes a colorant and a reactive unsaturated compound, and the photosensitive composition includes a photoinitiator.

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