A method for producing a DLC film

Abstract

The application discloses a preparation method of a DLC film, which comprises the following steps: cleaning a glass substrate and placing the glass substrate in a reaction chamber; introducing a fluorine-containing gas and an alcohol solution into the reaction chamber; forming a DLC film on the surface of the glass substrate by using a plasma enhanced chemical vapor deposition technology under the condition that the temperature in the reaction chamber is a first preset temperature; and removing hydrogen atoms in the DLC film by using the alcohol solution under the condition that the temperature in the reaction chamber is a second preset temperature. The technical scheme of the application can prepare a DLC film without hydrogen by using a plasma enhanced chemical vapor deposition technology and an alcohol solution, so as to meet the application requirements in different fields.

Description

Technical Field

[0001] This invention relates to the field of thin film preparation technology, and in particular to a method for preparing a DLC film. Background Technology

[0002] DLC (Diamond-like Carbon) film is a thin film made of amorphous carbon material. It has excellent friction properties, chemical inertness, wear resistance and corrosion resistance. Therefore, DLC film has been widely used in many fields.

[0003] However, most DLC film materials on the market contain a certain amount of hydrogen atoms. Due to the influence of their hydrogen content, they often exhibit significant expansion and contraction, which is unacceptable for some applications. Therefore, a hydrogen-free DLC film preparation technology is needed to meet the application requirements of different fields. Summary of the Invention

[0004] The purpose of this invention is to provide a method for preparing DLC ​​films, which can use plasma-enhanced chemical vapor deposition technology and alcohol solutions to prepare hydrogen-free DLC films, thereby meeting the application needs of different fields.

[0005] To achieve the above objectives, embodiments of the present invention provide a method for preparing a DLC film, comprising:

[0006] After cleaning, the glass substrate is placed in the reaction chamber;

[0007] A fluorine-containing gas and an alcohol solution are introduced into the reaction chamber;

[0008] Under the condition that the temperature in the reaction chamber is a first preset temperature, a DLC film is formed on the surface of the glass substrate using plasma-enhanced chemical vapor deposition technology;

[0009] Under the condition that the temperature in the reaction chamber is a second preset temperature, hydrogen atoms in the DLC membrane are removed using the alcohol solution.

[0010] Furthermore, the fluorine-containing gas is sulfur hexafluoride or tetrafluoroethylene.

[0011] Furthermore, the first preset temperature is 120–130°C.

[0012] Furthermore, the alcohol solution is hydrool, isopropanol, or n-propanol.

[0013] Furthermore, the second preset temperature is room temperature to 80°C.

[0014] Compared with existing technologies, this invention provides a method for preparing a DLC film. First, a glass substrate is cleaned and placed in a reaction chamber. Next, a fluorine-containing gas and an alcohol solution are introduced into the reaction chamber. Then, under a first preset temperature within the reaction chamber, a DLC film is formed on the surface of the glass substrate using plasma-enhanced chemical vapor deposition (PECVD). Finally, under a second preset temperature within the reaction chamber, hydrogen atoms in the DLC film are removed using the alcohol solution. This invention can prepare hydrogen-free DLC films using PECVD and alcohol solutions, thereby meeting the application needs of various fields. Attached Figure Description

[0015] Figure 1 This is a flowchart of a preferred embodiment of a method for preparing a DLC film provided by the present invention. Detailed Implementation

[0016] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0017] This invention provides a method for preparing a DLC film, see [link to relevant documentation]. Figure 1 The diagram shown is a flowchart of a preferred embodiment of a method for preparing a DLC film provided by the present invention, the method comprising steps S11 to S14:

[0018] Step S11: After cleaning the glass substrate, place it in the reaction chamber;

[0019] Step S12: Introduce fluorine-containing gas and alcohol solution into the reaction chamber;

[0020] Step S13: Under the condition that the temperature in the reaction chamber is a first preset temperature, a DLC film is formed on the surface of the glass substrate using plasma-enhanced chemical vapor deposition technology.

[0021] Step S14: Under the condition that the temperature in the reaction chamber is a second preset temperature, the hydrogen atoms in the DLC film are removed by the alcohol solution.

[0022] In practice, firstly, a glass substrate is selected, cleaned, and then placed in a reaction chamber. Next, fluorine-containing gas and a certain amount of alcohol solution are simultaneously introduced into the reaction chamber. Then, the temperature in the reaction chamber is adjusted to a first preset temperature. Under this temperature condition, plasma-enhanced chemical vapor deposition (PECVD) is used to form a DLC film containing fluoride and hydrogen atoms on the surface of the glass substrate. Finally, the temperature in the reaction chamber is lowered from the first preset temperature to a second preset temperature. Under this temperature condition, the alcohol solution is used to remove hydrogen atoms from the DLC film, thereby generating a hydrogen-free (fluoride-containing) DLC film.

[0023] It should be noted that during the process of forming a DLC film on the surface of the glass substrate and removing hydrogen atoms from the DLC film, only the temperature inside the reaction chamber is adjusted to decrease, while the pressure inside the reaction chamber remains unchanged.

[0024] It should be noted that by introducing an alcohol solution into the reaction chamber and creating a temperature change within the chamber, the alcohol solution is ionized, generating atomic states, thereby releasing hydrogen atoms from the DLC film.

[0025] In one alternative embodiment, the fluorine-containing gas is sulfur hexafluoride or tetrafluoroethylene.

[0026] Specifically, in conjunction with the above embodiments, the fluorine-containing gas introduced into the reaction chamber in the embodiments of the present invention can be sulfur hexafluoride (SF6) or tetrafluoroethylene (C2F4).

[0027] It is understood that, in addition to sulfur hexafluoride (SF6) and tetrafluoroethylene (C2F4), other suitable fluorine-containing gases may be used, and the embodiments of the present invention are not specifically limited thereto.

[0028] In one optional embodiment, the first preset temperature is 120–130°C.

[0029] Specifically, in conjunction with the above embodiments, when forming a DLC film on the surface of a glass substrate in this embodiment of the invention, it is necessary to maintain the temperature in the reaction chamber at a first preset temperature, and the first preset temperature can be selected between 120°C and 130°C. That is, under the condition that the temperature in the reaction chamber is between 120°C and 130°C, plasma-enhanced chemical vapor deposition technology is used to carry out the reaction in order to form a DLC film containing fluoride and hydrogen atoms on the surface of the glass substrate.

[0030] For example, the first preset temperature can be 120℃, 121℃, 122℃, 123℃, 124℃, 125℃, 126℃, 127℃, 128℃, 129℃ or 130℃, and can also be set according to actual needs. This embodiment of the invention does not make specific limitations.

[0031] In one alternative embodiment, the alcohol solution is hydroethanol, isopropanol, or n-propanol.

[0032] Specifically, in conjunction with the above embodiments, the alcohol solution introduced into the reaction chamber in the embodiments of the present invention can be hydroethanol, isopropanol, or n-propanol.

[0033] It is understood that, in addition to hydrools, isopropanols, and n-propanols, other suitable alcohol solutions may also be used, and the embodiments of the present invention do not specifically limit them.

[0034] In one optional embodiment, the second preset temperature is room temperature to 80°C.

[0035] Specifically, in conjunction with the above embodiments, when removing hydrogen atoms from the DLC film using an alcohol solution, the temperature inside the reaction chamber needs to be maintained at a second preset temperature, and the second preset temperature can be selected between room temperature and 80°C. That is, under the condition that the temperature inside the reaction chamber is between room temperature and 80°C, hydrogen atoms in the DLC film are removed using an alcohol solution, thereby generating a DLC film that does not contain hydrogen (containing fluoride).

[0036] For example, the second preset temperature can be 25℃, 30℃, 35℃, 40℃, 45℃, 50℃, 55℃, 60℃, 65℃, 70℃, 75℃ or 80℃, and can also be set according to actual needs. This embodiment of the invention does not make specific limitations.

[0037] Based on all the above embodiments, the implementation process of this solution is described below through the first specific embodiment, including: (1) selecting a glass substrate, cleaning the glass substrate, and placing the glass substrate in the reaction chamber after cleaning; (2) simultaneously introducing a fluorine-containing gas and a certain amount of alcohol solution into the reaction chamber; wherein, the fluorine-containing gas is sulfur hexafluoride (SF6) or tetrafluoroethylene (C2F4), and the alcohol solution is hydroethanol, isopropanol or n-propanol; (3) adjusting the temperature in the reaction chamber to 120°C, and using plasma-enhanced chemical vapor deposition technology to react under the condition of 120°C in the reaction chamber, so as to form a DLC film containing fluoride and hydrogen atoms on the surface of the glass substrate; (4) after a period of time, reducing the temperature in the reaction chamber from 120°C to room temperature, and using the alcohol solution to remove hydrogen atoms in the DLC film under the condition of room temperature in the reaction chamber, thereby generating a DLC film without hydrogen (containing fluoride).

[0038] Based on all the above embodiments, the implementation process of this solution is described below through a second specific embodiment, including: (1) selecting a glass substrate, cleaning the glass substrate, and placing the glass substrate in the reaction chamber after cleaning; (2) simultaneously introducing a fluorine-containing gas and a certain amount of alcohol solution into the reaction chamber; wherein, the fluorine-containing gas is sulfur hexafluoride (SF6) or tetrafluoroethylene (C2F4), and the alcohol solution is hydroethanol, isopropanol, or n-propanol; (3) adjusting the temperature in the reaction chamber to 125°C, and using plasma-enhanced chemical vapor deposition technology to react under the condition of 125°C in the reaction chamber, so as to form a DLC film containing fluoride and hydrogen atoms on the surface of the glass substrate; (4) after a period of time, reducing the temperature in the reaction chamber from 125°C to 50°C, and using the alcohol solution to remove hydrogen atoms in the DLC film under the condition of 50°C in the reaction chamber, thereby generating a DLC film without hydrogen (containing fluoride).

[0039] Based on all the above embodiments, the implementation process of this solution is described below through a third specific embodiment, including: (1) selecting a glass substrate, cleaning the glass substrate, and placing the glass substrate in the reaction chamber after cleaning; (2) simultaneously introducing a fluorine-containing gas and a certain amount of alcohol solution into the reaction chamber; wherein the fluorine-containing gas is sulfur hexafluoride (SF6) or tetrafluoroethylene (C2F4), and the alcohol solution is hydroethanol, isopropanol, or n-propanol; (3) adjusting the temperature in the reaction chamber to 130°C, and using plasma-enhanced chemical vapor deposition technology to react under the condition of 130°C in the reaction chamber, so as to form a DLC film containing fluoride and hydrogen atoms on the surface of the glass substrate; (4) after a period of time, reducing the temperature in the reaction chamber from 130°C to 80°C, and using the alcohol solution to remove hydrogen atoms in the DLC film under the condition of 80°C in the reaction chamber, thereby generating a DLC film without hydrogen (containing fluoride).

[0040] In summary, the method for preparing a DLC film provided by this invention involves first cleaning a glass substrate and placing it in a reaction chamber; then, introducing a fluorine-containing gas and an alcohol solution into the reaction chamber; next, forming a DLC film on the surface of the glass substrate using plasma-enhanced chemical vapor deposition (PECVD) at a temperature of 120°C to 130°C within the reaction chamber; and finally, removing hydrogen atoms from the DLC film using an alcohol solution at a temperature of room temperature to 80°C within the reaction chamber. This invention enables the preparation of hydrogen-free DLC films at low temperatures using PECVD and alcohol solutions, thus meeting the application needs of various fields and possessing broad application prospects.

[0041] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A method for preparing a DLC film, characterized in that, include: After cleaning, the glass substrate is placed in the reaction chamber; A fluorine-containing gas and an alcohol solution are introduced into the reaction chamber; Under the condition that the temperature in the reaction chamber is a first preset temperature, a DLC film is formed on the surface of the glass substrate using plasma-enhanced chemical vapor deposition technology; Under the condition that the temperature in the reaction chamber is a second preset temperature, hydrogen atoms in the DLC membrane are removed using the alcohol solution.

2. The method for preparing the DLC film as described in claim 1, characterized in that, The fluorine-containing gas is sulfur hexafluoride or tetrafluoroethylene.

3. The method for preparing the DLC film as described in claim 1, characterized in that, The first preset temperature is 120-130℃.

4. The method for preparing the DLC film as described in claim 1, characterized in that, The alcohol solution is hydroethanol, isopropanol, or n-propanol.

5. The method for preparing the DLC film as described in claim 1, characterized in that, The second preset temperature is room temperature to 80°C.

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