Electrolytic copper foil and roughening treatment method thereof
By forming a nanoscale nodular structure on the surface of electrolytic copper foil using an organic-inorganic composite additive system, the technical challenges of low roughness, high peel strength, and uniform density in high-end HVLP copper foil have been solved. This achieves an environmentally friendly and efficient roughening process with strong adaptability and ease of industrialization.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 江西铜博科技股份有限公司
- Filing Date
- 2026-02-14
- Publication Date
- 2026-05-29
AI Technical Summary
Existing technologies struggle to simultaneously achieve the comprehensive performance goals of low roughness, high peel strength, and uniform density in high-end HVLP copper foils. Traditional additive systems also present environmental challenges and insufficient control precision.
An organic-inorganic composite additive system, including sodium molybdate, sodium tungstate, and hydroxyethyl cellulose, is used to form a uniform and dense nanoscale nodular structure through cathodic electrolytic roughening treatment. Combined with curing, ashing, and passivation treatments, the microscopic morphology and macroscopic properties of the copper foil surface are synergistically optimized.
While maintaining low roughness, the peel strength reaches over 0.80 N/mm, meeting the performance requirements of high-end HVLP copper foil. It is also completely free of toxic substances, meets environmental protection requirements, has strong adaptability to process conditions, and is easy to industrialize.
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Figure CN122105552A_ABST