System and method for detecting faults in a gas distribution system

By using an automated monitoring system to detect the pressure and flow data of the gas distribution system in real time, the problem of time-consuming and error-prone fault detection in existing technologies has been solved, enabling rapid and accurate fault location and ensuring system stability.

CN122122335APending Publication Date: 2026-05-29APPLIED MATERIALS INC

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
APPLIED MATERIALS INC
Filing Date
2024-08-28
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

Existing fault detection methods for gas distribution systems are time-consuming and error-prone, relying on manual inspection and making it difficult to quickly and accurately identify component deterioration and fault locations.

Method used

The automated monitoring system detects pressure and flow data of the gas distribution system in real time, uses sensors and controllers to determine if there are faults in the flow path, locates the fault location, and provides automated reports.

Benefits of technology

It enables rapid and accurate fault detection, reduces system maintenance time, avoids unnecessary maintenance and replacement, and ensures the correctness of gas flow and system stability.

✦ Generated by Eureka AI based on patent content.

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Abstract

Systems and methods for monitoring and detecting faults within a gas distribution system are provided. A system can first enable, by a controller, a flow of gas through a flow path of the gas distribution system. Thereafter, the system can receive data comprising pressure data and / or flow rate data associated with the flow path of the gas distribution system at the time the flow of gas through the flow path is enabled. The system can process the data to determine whether the first flow path of the gas distribution system includes a fault. In response to determining that the flow path includes a fault, the system can determine a relative location of the fault within the flow path relative to a mass flow controller (MFC) or a sensor within the flow path. The system can generate a report indicating whether the flow path includes a fault and the relative location of any determined fault.
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Description

Technical Field

[0001] Embodiments of this disclosure generally relate to systems and methods for monitoring the integrity of components within a gas distribution system (GDS). Background Technology

[0002] Modern gas distribution systems (GDS) are tools used to deliver, manage, and utilize gases and gas applications in modern manufacturing systems and designs. Such modern GDS systems are systems and associated components designed to handle both inert and toxic gases in a variety of applications involving processing chambers or manufacturing spaces, such as cleanrooms, ventilation, or reaction applications. For example, in some manufacturing applications, GDS can be used to remove or dilute hazardous substances, maintain appropriate environmental conditions, deliver process gases (e.g., for etching, physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), etc.), or ensure that various processes are carried out under controlled and stable pressure conditions. In other cases, GDS may include functions such as decontamination (e.g., decontaminating oxygen to prevent unwanted oxidation reactions) and / or the use of specialized vacuum systems to remove contaminants from the working environment. This functionality can be used to maintain the integrity and quality of products and processes, and GDS can facilitate this functionality while simultaneously promoting safe practices, stability, and repeatability of the process.

[0003] Modern gas distribution systems (GDS) can include a wide variety of components, ranging from various types, functions, and methodologies to the efficient distribution and discharge of gases. Common components found within a GDS include gas panels, gas sources, gas rod assemblies, flow lines, gas valves, flow regulators, mass flow controllers (MFCs), pressure transducers, and sensors (to name just a few), which collectively serve to manage and deliver gas in and out of chambers and spaces in a controlled manner. In an example combining several components, the gas source of the GDS can provide raw gas (e.g., toxic ammonia, inert nitrogen, or other similar gases) to be passed through a gas rod assembly, which may include valves, sensors, and regulators to start, stop, reduce, increase, and otherwise regulate and measure the flow rate and pressure of the gas passing through the assembly.

[0004] Such assembly of components can be complex and depends on a considerable degree of complexity in the associated control mechanisms. Traditionally, once the gas distribution system is assembled, lengthy manual tests are performed to determine if the gas distribution system is incorrectly assembled and / or if there are any malfunctions. Such manual testing is prone to error and can consume a significant amount of technicians' time. Summary of the Invention

[0005] The following is a brief overview of this disclosure in order to provide a basic understanding of some aspects of this disclosure. This overview is not an exhaustive summary of this disclosure. It is not intended to identify any important or key elements of this disclosure, nor is it intended to depict any category of particular embodiments of this disclosure or any category of the claims. Its sole purpose is to present some concepts of this disclosure in a concise form as a prelude to the more detailed description that follows.

[0006] In some embodiments of this disclosure, a method for detecting a fault within a gas distribution system is provided. The method includes enabling a gas flow through a first flow path of the gas distribution system via a controller. The method further includes receiving first data, the first data including at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when the gas flow through the first flow path is enabled. The system further includes processing the first data to determine whether the first flow path of the gas distribution system contains a fault. The system further includes, in response to determining that the first flow path contains a fault, determining the relative position of the fault within the first flow path relative to at least one of a pressure sensor or a flow sensor within the first flow path. The system further includes generating a report indicating whether the first flow path contains a fault and the relative position of any determined fault.

[0007] In some embodiments of this disclosure, a non-transitory computer-readable storage medium is provided. The non-transitory computer-readable storage medium includes instructions that, when executed by a processing device, cause the processing device to perform operations. These operations include enabling a gas flow through a first flow path of a gas distribution system by a controller. These operations further include receiving first data, the first data including at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when enabling the gas flow through the first flow path. These operations further include processing the first data to determine whether the first flow path of the gas distribution system contains a fault. These operations further include, in response to determining that the first flow path contains a fault, determining the relative position of the fault within the first flow path relative to at least one of a pressure sensor or a flow sensor within the first flow path. These operations further include generating a report indicating whether the first flow path contains a fault and the relative position of any determined fault.

[0008] In some embodiments of this disclosure, a system is provided. The system includes a memory device and a processing device communicatively coupled to the memory device. The processing device is configured to enable a gas flow through a first flow path of a gas distribution system by a controller. The processing device is further configured to receive first data, the first data including at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when the gas flow through the first flow path is enabled; and to process the first data to determine whether the first flow path of the gas distribution system contains a fault. The processing device is further configured to, in response to determining that the first flow path contains a fault, determine the relative position of the fault within the first flow path relative to at least one of a pressure sensor or a flow sensor within the first flow path. The processing device is further configured to generate a report indicating whether the first flow path contains a fault and the relative position of any determined fault. Attached Figure Description

[0009] This disclosure is illustrated by way of example in the accompanying drawings and is not intended to be limiting, in which like references designate similar elements. It should be noted that in this disclosure, different references to “an” or “one” embodiments are not necessarily the same embodiments, and such references imply at least one.

[0010] The accompanying drawings described below are for illustrative purposes only and are not necessarily drawn to scale. The drawings are not intended to limit the scope of this disclosure in any way.

[0011] Figure 1 The illustration shows a system capable of detecting faults within a gas distribution system according to some embodiments of the present disclosure.

[0012] Figure 2A The illustration shows a first exemplary flow path of a gas distribution system according to some embodiments of the present disclosure.

[0013] Figure 2B The illustration shows a second exemplary flow path of a gas distribution system according to some embodiments of the present disclosure.

[0014] Figure 2C The illustration shows a third exemplary flow path of a gas distribution system according to some embodiments of the present disclosure.

[0015] Figure 2D The illustration shows a fourth exemplary flow path of a gas distribution system according to some embodiments of the present disclosure.

[0016] Figure 2E The illustration shows a fifth exemplary flow path of a gas distribution system according to some embodiments of the present disclosure.

[0017] Figure 2FAn exemplary gas rod assembly of a gas distribution system according to some embodiments of the present disclosure is illustrated.

[0018] Figure 3 The illustration shows an exemplary process for detecting faults in a gas distribution system according to some embodiments of the present disclosure.

[0019] Figure 4A The illustration shows a flowchart of a method for detecting faults in a gas distribution system according to some embodiments of the present disclosure.

[0020] Figure 4B The illustration shows a flowchart of a method for detecting faults in the flow path of a gas distribution system according to some embodiments of the present disclosure.

[0021] Figure 4C An exemplary flowchart of a method for determining the relative location of a fault within the flow path of a gas distribution system, according to some embodiments of the present disclosure, is illustrated.

[0022] Figure 4D The illustration shows a flowchart of a method for determining the relative location of a fault within the flow path of a gas distribution system according to some embodiments of the present disclosure.

[0023] Figure 5 The illustrations show some embodiments of the present disclosure. Figure 1 A graphical representation of an implementation of a computing device associated with a system. Detailed Implementation

[0024] Modern gas distribution systems (GDS) face several challenges in implementation. First, they utilize numerous mechanical and electrical components (e.g., valves, regulators, piping, gas rods, etc.). Improper installation of one or more components can easily lead to deviations from the GDS's intended behavior. For example, incorrect valves or valve types may be installed, or gas piping may be improperly wired. Furthermore, GDS components may wear out, deteriorate, or malfunction. Therefore, technicians must routinely monitor, maintain, and / or replace parts of the GDS manually.

[0025] The causes and consequences of malfunctions and degradation within GDS components can vary and can lead to several serious impacts on specific manufacturing processes and the entire system. In some cases, gas valves may stick, become clogged, or otherwise improperly open, close, or regulate, which can compromise the precision of manufacturing processes and the consistency and safety of flow control required for these processes. Furthermore, valves may be improperly installed.

[0026] In some cases, the root causes of GDS failures can be several and / or varied. Furthermore, given the complexity and number of components in modern GDS systems, identifying the source of failure can be difficult and time-consuming, even once a failure is identified. From one perspective, component wear (e.g., through routine or excessive use) can reduce the effectiveness of GDS components. In other cases, electronic or software failures can disrupt automation and cause permanent damage to GDS components. Beyond the physical damage mentioned above, disruptions resulting from maintenance and remedial work can increase operating costs, impact throughput, reduce product quality, and, in some cases, introduce safety issues.

[0027] Current methods for inspecting and maintaining GDS components often involve a mix of manual inspection, scheduled maintenance programs, and specialized diagnostic tools and techniques. These traditional methods for inspecting, diagnosing, and maintaining GDS components have several drawbacks. While thorough, manual inspection can be extremely time-consuming and expensive, and may miss subtle or hidden problems that could develop into significant downstream issues. Scheduled maintenance programs can rely on extensive training of personnel and operators, expensive diagnostic tools, and significant downtime for manufacturing systems. Furthermore, the inherent reliance on human judgment in these methods introduces a long-standing risk of human error, potentially leading to overlooked problems or misdiagnosis.

[0028] The embodiments described herein relate to gas distribution systems (GDS) and methods for performing diagnostics on GDSs, including automated diagnostic capabilities for monitoring component integrity and identifying when and where irregularities (e.g., component degradation, failure, valve sticking, etc.) occur. In some embodiments, the methods and systems of this disclosure provide proactive, real-time feedback during and / or between runs of the manufacturing process, which can be used to quickly (e.g., within minutes) determine whether system irregularities associated with gas rod assemblies, valves, or flow lines occur within a specific flow path. In embodiments, the techniques described herein can be applied after the installation or modification of the GDS to ensure that the GDS has been correctly installed. In embodiments, the techniques described herein can be applied periodically (e.g., according to a maintenance schedule) to determine whether the functionality of any part of the GDS has deteriorated over time. The methods and systems described herein reduce system maintenance time by providing early and automated detection of such irregularities indicating component degradation, improper assembly, and / or failure. This early detection allows for the avoidance of unnecessary parts maintenance or replacement. Furthermore, the embodiments implement automated techniques for determining whether all gas flows are correct, which ensures consistent membrane properties, etc. This automation technology reduces the amount of time that technicians typically spend manually determining whether the gas flow is correct in a more accurate manner.

[0029] In some embodiments, this document describes a monitoring system that includes methods for selectively isolating flow paths and monitoring gas pressures and flow rates at multiple locations (e.g., manufacturing chambers, semiconductor processing chambers, exhaust pre-flues, etc.) to compare with “basic measurements” indicating the theoretical normal performance of the system. Based on the deviation or level of deviation between the real-time measurements and the basic measurements, such a monitoring system can automatically determine whether an irregularity (e.g., a malfunction) has occurred.

[0030] Furthermore, once such irregularity has been identified within the flow path, the monitoring system can perform further processing to pinpoint the location of the irregularity within the flow path. This can be achieved by selectively opening and closing valve assemblies downstream and / or upstream of one or more pressure and / or flow sensors (e.g., mass flow controllers (MFCs), one or more pressure transducers, and / or other sensors), and the measurement system can process this information to estimate the pressure change and / or flow rate at the general location of the detected irregularity.

[0031] In some embodiments, the manufacturing chamber may include one or more inputs that allow gas to flow into the processing chamber and / or one or more outputs that allow gas to flow out of the processing chamber (also referred to as the manufacturing chamber). In embodiments, one or more gas rod assemblies may be connected to the manufacturing chamber, each of which may deliver one or more different gases into the manufacturing chamber. The system may include a controller or handling device that automatically implements the gas leak techniques described herein.

[0032] The method disclosed herein is superior to existing methods for inspecting, troubleshooting, and / or maintaining gas flow paths on the processing chamber, gas panel, and / or gas rod assemblies because, in this embodiment, gas flow path inspection and troubleshooting can be performed without shutting down the processing chamber. In fact, in this embodiment, the method for troubleshooting gas flow paths can be performed between processes running in the processing chamber (e.g., to deposit and / or etch layers on a substrate) without having to pump out the gas inside the gas rods and / or without disturbing the vacuum environment within the processing chamber. Another advantage of this method in this embodiment is that each gas rod assembly can be inspected simultaneously or in parallel. In contrast, conventional techniques for troubleshooting gas flow paths are performed manually and cannot identify which gas rod assembly in the gas panel is faulty or incorrectly installed, or which possible valves or other components in the gas rod assembly may otherwise fail.

[0033] Compared to conventional solutions, aspects of this disclosure lead to technical advantages. In embodiments, this disclosure results in a more efficient substrate manufacturing process, wherein gas flow paths can prevent and / or be detected earlier. In embodiments, this disclosure provides improved and automated techniques for identifying faults in the GDS and for identifying the location of faults. If incorrect or erroneous gas flow paths are detected in the manufacturing chamber, material waste, exposure to toxic / non-toxic gases, wear of manufacturing chamber components, etc., can be prevented.

[0034] Figure 1 The illustration shows a system capable of detecting faults within a gas distribution system according to some embodiments of the present disclosure.

[0035] In some implementations... Figure 1 The system may include a gas distribution system platform 130 for hosting modules and typically controlling aspects of the gas distribution system (GDS) 140. The GDS 140 may include a gas panel 142, a processing chamber 146, and / or a vacuum system 150. In some embodiments, a client device 110 may be associated with the system. The client device 110 may enable user input for controlling aspects of the GDS, receiving reports and / or diagnostic information about the GDS, etc. In some embodiments, the client device 110, the GDS platform 130, and / or the GDS system 140 may be connected and interfaced with each other via a network 101.

[0036] In some embodiments, system 100 may include a client device 110 for providing and receiving input and output to and from an agent using the system (e.g., an agent performing maintenance, system checks, etc.). In some embodiments, client device 110 may include a user interface (UI) 112 for displaying information to a user, a client application 114 for interfacing with a gas distribution system platform, and input features 116, which may be any standard input features associated with the client device (e.g., a mouse and keyboard).

[0037] In some implementations, the GDS platform 130 may include a platform control module 132 for interacting with, sending data to, or receiving data from, and / or controlling other modules of the platform. The platform control module 132 may also be used to interact with, send data to, or receive data from, and / or control other modules and platforms of the system 100 (or external to the system). The platform control module 132 may manage the GDS control module 134, which may control, engage, disengage, or typically distribute output to components of the GDS system (e.g., valves, regulators, heaters, fans, pumps, vents, etc.). The GDS control module 134 may additionally send and receive information to and from the sensor module 136 and the screening module 138, the sensor module receiving data from system sensors, and the screening module implementing automated monitoring processes for checking the health of GDS components and detecting irregularities (e.g., regarding...). Figures 2A to 3 (Further discussion).

[0038] Exemplary GDS 140 in Figure 1 This document presents a simplified implementation of a GDS that can be controlled via platform 130 and associated modules, as well as associated gas flow components and systems. In some embodiments, GDS 140 may include a gas panel 142, a processing chamber 146, a diversion conduit 148, and a vacuum system 150. The gas panel includes one or more source gases 142A to 142N and gas rods 144A to 144N, which will be described in further detail below. Those skilled in the art who benefit from this disclosure will understand that many configurations of such a GDS, including GDS components, sensors, valves, chambers, etc., can be controlled by platform 130.

[0039] Gas panel 142 may be a source of various gases within the GDS and may include gas sources 142A to 142N and gas rods 144A to 144N. Gas rods 144A to 144N may connect gas sources 142A to 142N to chamber 146 and / or diversion conduit 148. In some embodiments, any configuration of gas rods 144A to 144N may be attached to any number of gas sources 142A to 142N. For example, gas rod 144A may be fluidly coupled to one, two, or any number of gas sources 142A to 142N, and thus introduce any of these gases into the GDS.

[0040] In some embodiments, gas sources 142A to 142N of the GDS can hold various gas types and deliver them to the GDS. In some embodiments, depending on the application, the gas source may include a compressed gas cylinder, a gas generator, a main liquid system, or any other such or similar means of containing gases usable within the GDS. In some embodiments, such sources may contain and provide feedstock for the entire gas distribution system. Such sources may include sensors, monitors, and regulators for maintaining the integrity of the containment system and the gas.

[0041] The types of gases derived from gas sources 142A to 142N and used in the GDS can vary widely. In some embodiments, the gas source may contain an inert gas (e.g., nitrogen, argon, or other gases with similar composition or function), which can be employed due to their non-reactive properties. For example, nitrogen may be contained within the gas source and used to purify other gases or materials (e.g., oxygen, and moisture or organic matter) in the processing chamber. In another example, argon, which is heavier than air, may be used to provide an inert blanket covering within the chamber or space, thereby preventing oxidation and other chemical reactions during manufacturing processes within the chamber. In some embodiments, gas source 142N may contain a reactive gas (e.g., oxygen, fluorine, or other gases with similar composition or function), which can be deployed by the system to carry out chemical reactions. In the example of oxygen, this gas can be used to facilitate combustion processes, oxidation processes, etc., within the processing chamber. Another reactive gas, chlorine, may be used for etching. Fluorine, ammonia, or other reactive gases including halogen-containing gases (such as C₂F₆, SF₆, SiCl₄, HBr, NF₃, CF₄, CHF₃, F₂, Cl₂, CCl₄, BCl₃, and SiF₄, etc.), and other gases (such as O₂ or N₂O) may be contained in gas sources 142A to 142N and deployed via GDS. Examples of carrier gases include N₂, He, Ar, and other gases inert to the process gas (e.g., non-reactive gases). In some embodiments, other gases, such as dopant gases or other special gases, may also be included.

[0042] Those skilled in the art who benefit from this disclosure will appreciate the breadth and quantity of such inert, reactive, processing, and / or special gases, and understand that the above enumeration is not exhaustive. Therefore, the gases used in the GDS provide means for performing a wide variety of operations (ranging from purification, cleaning, deposition, and other treatments) within a chamber (or other similar space) in chamber 146. Gases can also be used to perform operations that do not involve a processing chamber. For example, some gases may not flow into a chamber. In embodiments, gas flow paths for such gases that do not include a processing chamber in the gas flow path can also be tested.

[0043] In some embodiments, gas rods 144A to 144N may be an assembly including multiple control and sensor components that introduce, measure, and / or regulate the flow rate of gas in the GDS. Such an assembly will relate to... Figures 2A to 2E Further description, now only stating that gas rods 144 to 144N introduce gas from gas sources 142A to 142N into the GDS and control the flow rate of the gas to one or more downstream components (such as chamber 146 and / or diversion conduit 148). In embodiments, gas rods 144A to 144N may include one or more pressure sensors and / or flow sensors (e.g., mass flow controllers (MFCs), and one or more pressure transducers and / or other one or more other sensors) to measure the flow rate of gas passing through gas rods 144A to 144N.

[0044] In some embodiments, gas rods 144A to 144N and gas sources 142A to 142N can be fluidly connected via various valves and conduits. For example, flow control and shut-off valves within the GDS (e.g., within gas rods 144A to 144N) can include any type of valve usable within the GDS, including at least ball valves, gate valves, spherical valves, butterfly valves, diaphragm valves, plug valves, pressure reducing valves, solenoid valves, quick-switching valves, or any such or similar valves commonly used within the GDS. For example, conduit connections to the GDS can include metal conduits (e.g., steel or ductile iron conduits), polymer conduits (e.g., polyvinyl chloride (PVC) pipes, polyethylene (PE) pipes, etc.), or any combination of such or similar types of conduits capable of delivering gas flow within the GDS.

[0045] As described above, gas panel 142 supplies processing and / or cleaning gases to other components and / or chambers of the GDS system. In some embodiments, the gas from gas panel 142 may be deployed to processing chambers 146A to 146N, or diversion ducts 148A to 148N, or any other type of processing component (not shown) that may be used within the GDS. In some embodiments, gas panel 142 includes a plurality of gas rods 144A to 144N.

[0046] In some embodiments, processing chambers 146A to 146N can be used to perform decontamination, cleaning, reactive processes (e.g., etching or deposition processes), or any other type of manufacturing process associated with the processing chamber. For example, in some embodiments, processing chambers 146A to 146N may include chambers for chemical vapor deposition (CVD), etching chambers, epitaxial chambers, furnace chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) chambers, sputtering deposition chambers, oxidation chambers, annealing chambers, vacuum chambers, chambers for plasma processing, or any other type of such or similar processing chamber utilizing GDS.

[0047] In some embodiments, the chambers 146A to 146N may deploy treatment or cleaning gases into the internal volume of the chamber through a spray head (or, in some cases, through a cover and nozzle, etc.). In some embodiments, additional chamber components of the chambers 146A to 146N may include a substrate support assembly, an electrostatic chuck, a ring (e.g., a treatment sleeve ring), a chamber wall, a substrate, a spray head, a gas distribution plate, a liner, a liner sleeve, a shield, a plasma screen, a flow equalizer, a cooling substrate, a chamber viewing port, a chamber cover, a nozzle, etc.

[0048] In some embodiments, chambers 146A to 146N may further include discharge ports to connect the internal volumetric fluid of the chambers to a vacuum system 150, which may include fore-stage conduits 152A to 152N and / or one or more vacuum sources 152A to 152N.

[0049] In some implementations, GDS 140 may include a series of diversion channels 148A to 148N for bypassing (e.g., avoiding) processing chambers 146A to 146N and for delivering gas directly from the gas panel to the vacuum system 150.

[0050] In some embodiments, chambers 146A to 146N and diversion conduits 148A to 148N may be connected to a vacuum system 150. The vacuum system 150 may include a series of fore-stage conduits 152A to 152N that collect and deliver pressure from one or more chambers and diversion conduits. For example, both the chambers and diversion conduits may be connected to a single fore-stage conduit and used for venting or pumping gas from the GDS.

[0051] GDS 140 may include one or more vacuum sources 152A to 152N (e.g., gas pumps) to discharge gases and regulate the pressure in the system's chambers and components. In some embodiments, different types of vacuum sources (e.g., pumps), such as diaphragm pumps, vane pumps, etc., or any combination of such or similar pumps commonly used in GDS, may be used. Vacuum system 150 may pump the discharged gases to an emission reduction system that can neutralize the gases, burn them off, etc.

[0052] Now turn to what will be described together Figures 2A to 2F , Figures 2A to 2E The illustration shows an exemplary flow path of a gas distribution system according to some embodiments of the present disclosure. Figure 2F An exemplary gas rod assembly of a gas distribution system according to some embodiments of the present disclosure is illustrated.

[0053] Figures 2A to 2E Flow paths 240A to 240E are shown, representing five distinct flow paths through a single exemplary flow network (e.g., a portion of a gas distribution system). In some embodiments, the flow network is associated with a gas rod assembly of the gas distribution system. In some embodiments, each gas rod assembly of the GDS may be associated with a unique flow network. In other embodiments, a single gas rod assembly may be associated with more than one flow network.

[0054] Figures 2A to 2E An exemplary flow network may include one or more pipes, valves, and / or components associated with all possible flow paths, which are associated with the gas rod assembly 214. For example... Figures 2A to 2E As seen in the diagram, the exemplary flow network may include valves 201 to 210, component group 215, sensors 218 and 222, processing chamber 216, diversion conduit 224, and fore-flow conduit 220. Fore-flow conduit 220 may be connected to a system vacuum source (not shown). In a given example, individual flow paths (e.g., ...) traverse the exemplary flow network. Figure 2A Flow path 240A Figure 2B Flow path 240B Figure 2C Flow path 240C Figure 2D Flow path 240D, and Figure 2E The flow path 240E can begin from gas source 212A or 212B, pass through gas rod assembly 214, and continue downstream to chamber 216 or diversion pipe 224, and pre-pipeline 220. In one embodiment, gas source 212A is a gas source for purifying gas, and gas source 212B is a gas source for processing gas.

[0055] about Figure 2F The exemplary gas rod assembly portion 200F illustrates an example portion of a gas rod assembly in a gas distribution system. Portion 200F may correspond to or be similar to... Figures 2A to 2E The gas rod assembly 214. The gas rod assembly 214 may be included in... Figures 2A to 2E The components described herein are not shown in the text.

[0056] The gas rod assembly portion 200F may include a group of components mounted to the body of the gas rod (e.g., gas rod body 250), including a mass flow controller 252B, and additional sensors 252A and 252C (e.g., pressure transducers), valves (not shown), etc. In some embodiments, the gas rod assembly portion 200F may be part of a larger gas rod assembly that may include more components (e.g., sensors, controllers, valves, etc.) and facilitate gas flow in the direction of arrow 254.

[0057] In some embodiments, this larger gas rod assembly may extend in either direction to accommodate more components. For example, part 200F may be part of a larger gas rod assembly that may include a mixing manual / automatic valve, a purification valve for introducing purified gas into the gas rod, one or more flow regulators, one or more filters or purifiers, or one or more mass flow controllers, one or more other valves, or any other type of component commonly used within the gas rod assembly.

[0058] In some embodiments, the gas rod assembly portion 200F may correspond to or resemble a portion of the gas rod assembly 214, which includes component group 215. In some embodiments, the MFC 252B and sensors 252A and 252C may correspond to or resemble components within component group 215. In some embodiments, components of both the gas rod assembly 214 and the gas rod assembly portion 200F may be similar to or analogous to those previously described. Figure 1 Similar components described and recorded. In some embodiments, Figures 2A to 2F Other components (e.g., including gas sources, sensors, valves, pipes, chambers, fore-pipelines, vacuum sources, etc.) may also be similar to or analogous to those previously described. Figure 1 Components. In some implementations, Figures 2A to 2F Such similar components can be incorporated and expanded at least regarding Figure 1 The publicly available content and implementation methods.

[0059] Return to Figures 2A to 2E , Figures 2A to 2E The illustration shows four flow paths 240A to 240E through an exemplary flow network. The exemplary flow network may include two gas sources 212A and 212B that can be coupled to a gas rod assembly 214. In one embodiment, the gas rod assembly 214 may include two inlet flow paths, one corresponding to each gas source, and include valves 201 to 203 for controlling the input flow from the gas sources. In other embodiments, the gas rod assembly 214 may include other numbers of valves and / or other components, may be connected to more or fewer gas sources, may be connected to additional processing chambers and / or diversion conduits, etc.

[0060] In some embodiments, source 212A may be a purge gas source, and valve 202 may be referred to as a "purge valve". In some embodiments, source 212B may be an inert gas source or a process gas source. In some embodiments, valves 201 to 203 (or valves 201 to 204) may be included in the upstream portion (or first portion) of the gas rod assembly 214 upstream of component group 215, and may be referred to as an "upstream valve" or "input valve".

[0061] Downstream of the gas inlet, the gas rod assembly 214 may include valves 204, 205, 206, and component group 215. In some embodiments, a downstream or second portion of the gas rod assembly may include valves (e.g., valves 205, 206, 207, 208, 209, etc.) downstream of component group 215. In some embodiments, valves 201 to 206 of the gas rod assembly (and additional valves 207 to 210 of the flow network) may be any type of valve capable of being opened and closed to enable or disable flow (e.g., as previously discussed). Figure 1 (Any valve of this type described). In some embodiments, the described valve can be partially opened or closed to partially enable and partially restrict flow. In some embodiments, the valve has an open or closed position. In some embodiments, the valve includes a number of different open positions (e.g., a baffle position between 0 degrees and 90 degrees), each of which provides different conductivity for the gas flow.

[0062] In some embodiments, component group 215 may be one or more pressure sensors and / or flow sensors or controllers (e.g., mass flow controllers (MFCs), one or more pressure transducers and / or other one or more other sensors), and includes any type of MFC capable of measuring and controlling the gas flow rate. In some embodiments, component group 215 may further measure the pressure within a portion of the gas rod to which the component group is attached. Component group 215 of this disclosure may include pressure sensors, heating elements, temperature sensors, controllers (e.g., processing devices), and / or variable valves or proportional valves that can control the amount of gas flowing through the mass flow controller based on instructions from the controller of the component group.

[0063] In some embodiments, the gas rod assembly (e.g., gas rod assembly 214 and gas rod assembly portion 200F) may include a rigid portion of a conduit on which valves, regulators, and / or other control mechanisms are mounted. This configuration or rod assembly facilitates the measurement and control of gas flow, pressure, and direction, and provides accuracy and precision due to the proximity of the components. Such a gas rod assembly can be a part of any of the system components. Such a gas rod assembly can be modularly designed, allowing for adaptability, maintenance, and parts replacement according to system specifications.

[0064] In some embodiments, this gas rod assembly can introduce gas from gas sources 212A and 212B into downstream components, such as chamber 216, diversion conduit 224, pre-stage conduit 220, and vacuum source 230. This assembly can be as previously described... Figure 1 Any type of component described.

[0065] Downstream of the gas rod assembly 214, the flow network may include valves 207 to 210. As will be discussed below, valves 207 to 210 may be actuated to change the flow path through the flow network. In some embodiments, one or more of valves 207 to 210 are valves of the gas rod assembly 214. Valves 207 to 210 may be any type of valve capable of being fully or partially opened and closed to enable or disable flow (e.g., as previously discussed above regarding...). Figure 1 (Any valve of this type described). In some embodiments, valves 209 and 210 may be referred to as “isolation valves”. In some embodiments, valve 208 may be referred to as a “cap-turning” valve.

[0066] In some embodiments, chamber 216 and fore-pipe 220 may further include sensors 218 and 222. In some embodiments, such sensors may be pressure sensors capable of measuring pressure levels within chamber 216 and fore-pipe 220. In some embodiments, sensors 218 and 222 may be gauge pressure sensors, Bolton tube pressure sensors, diaphragm pressure sensors, capacitive pressure sensors, optical pressure sensors, thermal pressure sensors, or any other such or similar pressure sensors commonly used in GDS, or combinations of such pressure sensors.

[0067] In some implementations (such as regarding) Figure 3 (As discussed further), pressure sensors 218 and 222 (and component group 215) are capable of measuring pressure (and flow rate) during a period of time before gas flow is initiated, during a transition period when gas flow is initiated, and during a period of time after gas flow has stabilized or been initiated. In embodiments, such sensors can generate data regardless of whether the gas flow is flowing through a flow path in the flow network that includes the pressure sensors (e.g., in the case of sensor 218, sensor 218 can continue to generate pressure data even when valve 208 is closed, and / or when gas flows through diversion conduit 224 and not through chamber 216).

[0068] In some embodiments, the components and systems of the gas rod assembly 214, as well as the associated flow network, can vary. For example, in some embodiments, more than two gas sources (including any number of gas sources, including only one source) can supply gas to the gas rod assembly. In some embodiments, the gas rod assembly 214 may include more (or fewer) valves, sensors, or regulators, or any other configuration, flow path, and such sequence. In some embodiments, additional chambers, diversion lines, fore-flow lines, and necessary valves and sensors may be added.

[0069] In some embodiments, the flow network associated with the gas rod assembly 214 may include any number of unique flow paths that can be opened or closed. In some embodiments, when one flow path is open, all other flow paths can be closed.

[0070] exist Figures 2A to 2E In the embodiment shown, five distinct flow paths 240A to 240E can be observed. Flow path 240A may include a flow path for gas to flow from gas source 212A to valve 201, to valve 202, to valve 204, through component group 215, through valves 205 and 206, through valve 207, through chamber 216, through valve 210, and through fore-pipe 220, and to a vacuum source. Flow path 240B may include a flow path for gas to flow from gas source 212A to valve 201, to valve 202, to valve 204, through component group 215, through valves 205 and 206, through valve 208, through diversion pipe 224, through valve 209, fore-pipe 220, and to a vacuum source. Flow path 240C may include a flow path for gas to flow from gas source 212B to valves 203 and 204, through component group 215, through valves 205 and 206, through valve 207, through chamber 216, through valve 210, and through forepump 220 to a vacuum source. Flow path 240D may include a flow path for gas to flow from gas source 212B to valves 203 and 204, through component group 215, through valves 205 and 206, through valve 208, through diversion duct 224, through valve 209, through forepump 220 to a vacuum source. The flow path 240E may include a flow path for gas to flow from gas source 212B to valves 203 and 204, through component group 215, through valves 205 and 206, through valve 228, additional processing component 226 (which may be an additional processing chamber, diversion duct, or any other component of GDS, including appropriate valves and sensors (with necessary modifications)), and through fore-feed duct 220 to the vacuum source.

[0071] In some implementations, the unique flow paths of the flow network associated with the gas rod assembly 214 can be engaged or disengaged by the operation of a specific sequence of valves. For example, valves 201 and 202 can be opened relative to the unique flow path 240A, while valve 203 can be closed, thereby enabling flow from gas source 212A through the gas rod assembly 214. Furthermore, valves 208 and 209 can be closed, and valves 208 and 210 can be opened, thereby directing gas flow through chamber 216. Similarly, for additional flow paths 240B to 240E (and as in...),... Figures 2A to 2E As seen in the diagram, all valves along the flow path can be opened (fully or partially), while all valves outside the flow path can be closed.

[0072] Therefore, the unique valve opening and closing configuration can be used to enable or disable the flow of gas through any of the unique flow paths associated with the flow network of the gas rod assembly 214. Furthermore, this configuration can be used in GDS control systems (e.g., such as...) Figure 1 The GDS control module 134 (see in the image) monitors, stores, operates, and updates data.

[0073] Although the flow network includes two distinct flow paths from the gas rod assembly 214 to the vacuum source 230 (one through chamber 216 and one through diversion duct 224) and four distinct flow paths that typically traverse the flow network (if measured from the gas source, through the gas rod, and to the vacuum source 230), those skilled in the art will understand that, with the inclusion of additional chambers, diversion ducts, etc., many more (or in some cases fewer) distinct flow paths may exist in many different implementations or configurations of the flow network that may be associated with the gas rod assembly.

[0074] Furthermore, a single GDS can include many such gas rod assemblies and associated flow networks, such as Figure 1 The diagram shows that, according to the embodiments described herein, these numerous gas rod assemblies can be tested in series or in parallel.

[0075] Turn now Figure 3 , Figure 3 The illustrations depict exemplary methods for monitoring the health status of components within a gas distribution system and / or testing the gas distribution system, according to some embodiments of the present disclosure.

[0076] Figure 3 The process 300 can be facilitated by the screening module 338 and the client device 310, which can be similar to or analogous to those described above. Figure 1 The filtering module 138 and client device 110 are described, and at least the embodiments described herein are incorporated herein. Furthermore, reference will be made specifically to the following disclosure. Figures 2A to 2F The components, systems, and descriptions are provided to aid in the explanation of process 300. This description is intended solely for clarity and understanding, and process 300 should not be construed as applicable only to… Figures 2A to 2F The implementation of GDS seen in the document. Furthermore, process 300 should be understood as applicable to any version or implementation of different systems, components, and configurations associated with GDS.

[0077] Process 300 can begin at operation 3.1, where the client device can be used to select which parts of the GDS (e.g., which gas rod assemblies 302A) are used for screening or monitoring by the process. In some embodiments, operation 3.1 can be skipped, and automated test sequences can be applied via the screening module 338 without input from the client device 310. In some embodiments (as previously discussed) Figure 1 and Figures 2A to 2F In the description of the implementation of GDS (as seen in the previous section), GDS may include multiple gas rod assemblies, and each gas rod assembly may introduce one or more gases into a flow network associated with the gas rod assembly. Therefore, client device 310 can be used to select which components (and associated flow networks) of the GDS to filter.

[0078] At operation 3.2, the screening module 338 can generate a list of flow paths 304 including all unique flow paths 304A to 304N associated with the flow network of each gas rod assembly to be tested. (See also: Regarding...) Figures 2A to 2F The discussion suggests that the screening module 338, or other associated modules of the associated control system, may store the number of unique flow paths associated with each flow network of each gas rod assembly. Furthermore, such a control system may include specific valve configurations (and capabilities) to enable or disable gas flow through any of these unique flow paths.

[0079] Reference Figures 2A to 2D In a specific instance, if the client device needs to send a list of gas rod assemblies 302A that include gas rod assembly 214, operation 3.2 can generate four unique flow paths (e.g., flow paths 240A to 240D) that will be included in flow path lists 304A to 304N. Similarly, all unique flow paths of all indicated flow networks for all indicated gas rod assemblies can be compiled into flow path list 304 by filtering module 338.

[0080] At operation 3.3, analysis of each flow path can be performed. Analysis 3.3 may include two parts, irregularity detection 3.3A and path segmentation 3.3B, which can be performed for each flow path in the flow path list 304. Irregularity detection 3.3A may include processing a unique flow path to detect any irregularities in that unique flow path. Irregularities may include various characteristics, including valve failure, flow channel failure, software configuration errors, etc. Path segmentation 3.3B may include further processing to determine the location of irregularities within a unique flow path. In some embodiments, path segmentation 3.3B may be performed if or in response to irregularity detection 3.3A detecting an irregularity in a given flow path.

[0081] Reference Figures 2A to 2D In a specific instance, if the flow path list includes unique flow paths 240A to 240D, the filtering module 338 will sequentially perform irregularity detection for each flow path 240A to 240D. If an irregularity is detected in any flow path 240A to 240D, the filtering module 338 will perform path segmentation on that flow path.

[0082] To perform irregularity detection on a given flow path, the screening module 338 can enable the gas flow through the given flow path of the flow network, collect data from sensors and modules associated with the flow network, and compare this data with pre-established "baseline" data. Variations and deviations from the collected data and the baseline data can then be used to determine whether the flow path includes irregularities.

[0083] Reference Figures 2A to 2D In a specific example, if the flow path list includes a unique flow path 240A, the screening module 338 can begin by enabling the gas flow through the unique flow path 240A. Before, during, and / or after enabling the gas flow through the unique flow path 240A, the screening module 338 can capture pressure data from sensors 218 and 222, as well as flow rate and / or pressure data through component group 215. Therefore, data indicating pressure and / or flow rate within chamber 216, fore-line 220, and / or gas rod assembly 214 can be captured for each unique flow path at three distinct time intervals: one interval before gas activation, one interval during the transition period when the gas flow reaches equilibrium, and one interval after the gas flow or pressure has reached equilibrium (e.g., after the gas flow has been activated or after the gas flow has stopped).

[0084] In some implementations, any such collected data can be compared to a pre-established baseline. In some implementations, deviations from the baseline can be determined, and these deviations can be compared to a deviation threshold to determine the presence of irregularities. In some implementations, changes in pressure or flow rate from one, two, or more different time intervals (sometimes referred to herein as “increments”) can be compared to a threshold. In some implementations, such thresholds can be user-set or machine-generated.

[0085] Reference Figures 2A to 2D In specific instances of the unique flow paths 240A to 240D, irregularity detection can be performed on each unique flow path and data comparisons can be made. For example, given unique flow paths 240A to 240D for irregularity detection, the screening module 338 can sequentially activate the unique flow paths 240A to 240D and capture data reflecting the pressure for each of the flow paths 240A to 240D within the chamber 216, the pre-flue 220, and the gas rod assembly portion (e.g., which may include an MFC, one or more pressure transducers, etc.) including one or more pressure sensors and / or flow sensors in group 215. In some embodiments, the screening module 338 can also capture gas flow rate data from one or more pressure sensors and / or flow sensors in group 215.

[0086] In some embodiments, such data may include data from three or four time intervals or time periods discussed above: a first interval or time period before gas flow through flow path 240A is activated, an intermediate interval or time period when gas flow reaches equilibrium, a third interval or time period after gas flow and / or pressure has reached equilibrium, and / or a fourth interval or time period after gas flow has stopped. In some embodiments, the increment between the data from the first and third intervals or time periods may be calculated by the filtering module 338 to determine changes in gas rod flow rate, chamber pressure, and fore-feed pressure before and after gas flow is activated. In some embodiments, data from a single interval or period may be compared with one or more criteria (e.g., thresholds) to determine whether one or more criteria are met.

[0087] In some implementations, similar processes for gas flow activation and data capture can be repeated for each unique flow path. In some implementations, data can be collected from a pressure sensor, even though the pressure sensor is not in the flow path. For example, in the specific case of flow path 240B, gas flows through a guide pipe 224 instead of chamber 216, and data can be collected and processed. In some implementations, the increment can then be compared with a threshold (e.g., a pre-established increment) to indicate and detect irregularities associated with that flow path. Similar tests can be performed for each flow path 240A through 240D.

[0088] The set of thresholds will now be described. Those skilled in the art will understand that in some embodiments, such thresholds may be applied at the system level or may be unique to each flow path. In some embodiments, such thresholds may be “standard” thresholds for the system or flow path. In some embodiments, such thresholds may correspond to a specific state of the system or flow path (e.g., such as flow conditions). Thresholds for changes or increments in pressure, or flow rate, etc., may be described in absolute terms (e.g., a change or increment of 30 PSI may indicate a change of -30 PSI or +30 PSI) or as a percentage.

[0089] In the case of flow path 240A, for example, when a gas flow through the flow path is enabled, a change in chamber pressure in the range of 0 mT to 200 mT may indicate that flow path 240A includes irregularities. In other embodiments, when a gas flow is enabled, a change in chamber pressure in the range of 5 mT to 70 T or less may indicate that flow path 240A includes irregularities.

[0090] In some embodiments, when gas flow is enabled, a change in upstream piping pressure between 0 mT and 100 mT may indicate that the flow path 240A includes irregularities. In other embodiments, when gas flow is enabled, a change in upstream piping pressure between 5 mT and 70 T may indicate that the flow path 240A includes irregularities.

[0091] In the case of flow path 240B, for example, when gas flow is enabled, a chamber pressure change greater than 200 mT may indicate that flow path 240B includes irregularities. In other embodiments, when gas flow is enabled, a chamber pressure change greater than the range of 5 mT to 70 T may indicate that flow path 240B includes irregularities.

[0092] In some embodiments, when gas flow is enabled, a foreline pressure change of less than 100 mT (e.g., between 0 mT and 100 mT) may indicate that the flow path 240B includes irregularities. In other embodiments, when gas flow is enabled, a foreline pressure change between 5 mT and 70 T may indicate that the flow path 240B includes irregularities.

[0093] In the case of flow path 240C, for example, when gas flow is enabled, a change in chamber pressure between 0 mT and 200 mT may indicate that flow path 240C includes irregularities. In other embodiments, when gas flow is enabled, a change in chamber pressure between 5 mT and 70 T may indicate that flow path 240C includes irregularities.

[0094] In some embodiments, when gas flow is enabled, a change in upstream piping pressure between 0 mT and 100 mT may indicate that the flow path 240C includes irregularities. In other embodiments, when gas flow is enabled, a change in upstream piping pressure between 5 mT and 70 T may indicate that the flow path 240C includes irregularities.

[0095] In the case of flow path 240D, for example, when gas flow is enabled, a chamber pressure change greater than 200 mT may indicate that flow path 240D includes irregularities. In other embodiments, when gas flow is enabled, a chamber pressure change greater than the range of 5 mT to 70 T may indicate that flow path 240D includes irregularities.

[0096] In some embodiments, when gas flow is enabled, a change in upstream piping pressure between 0 mT and 100 mT may indicate that the flow path 240D includes irregularities. In other embodiments, when gas flow is enabled, a change in upstream piping pressure between 5 mT and 70 T may indicate that the flow path 240D includes irregularities.

[0097] In some implementations, the threshold described above can be applied when the flow rate is high or above a flow rate threshold, and this threshold can be modified if the flow rate decreases. Therefore, in some implementations, the system (or screening module) can first determine whether the flow rate is high (e.g., above a flow rate threshold) or in some other state (e.g., decreasing or below a flow rate threshold) before comparing chamber pressure and upstream piping pressure thresholds. In some implementations, different test criteria or thresholds can be associated with different flow rates.

[0098] In some implementations, the gas flow rate through the flow path can correspond to three flow rate states: a fully open state (e.g., when the throttle valve of the flow path is fully open), a partially open state (e.g., when the throttle valve of the flow path is partially open), and a low flow rate state (e.g., when the throttle valve of the flow path is partially open and the gas flow rate is less than a defined threshold), corresponding to the thresholds described above. If a partially open state or a low flow rate state is detected, the above thresholds can be modified.

[0099] For example, in some embodiments of flow paths 240A to 240D, after the gas flow has been activated, if the flow rate is higher than 200 standard cubic centimeters per minute (sccm), a fully open state can be identified and the thresholds described above can be applied. In other embodiments of flow paths 240A to 240D, after the gas flow has been activated, if the flow rate is in the range of 200 sccm to 50 standard liters per minute (SLM), a fully open state can be identified and the thresholds described above can be applied.

[0100] In another example, in some embodiments relating to flow paths 240A to 240D, after the gas flow has been activated, if the flow rate is in the range of 100 sccm to 200 sccm, a partially open state can be identified and the threshold described above can be applied. In other embodiments relating to flow paths 240A to 240D, after the gas flow has been activated, if the flow rate is in the range of 1 sccm to 10 SLM, a partially open state can be identified and the threshold described above can be applied.

[0101] In another example, in some embodiments relating to flow paths 240A to 240D, after the gas flow has been enabled, if the flow rate is in the range of 0 sccm to 100 sccm, a low flow rate condition can be identified and the threshold described above can be modified. In other embodiments relating to flow paths 240A to 240D, after the gas flow has been enabled, if the flow rate is in the range of 1 sccm to 10 SLM, a low flow rate condition can be identified and the threshold described above can be modified.

[0102] In some implementations, when a low-flow state has been identified, the thresholds described above can be modified by scaling each of the above thresholds and / or threshold range endpoints to 10% of its original value. In some implementations, when a low-flow state has been identified, the thresholds described above can be modified by scaling each of the above thresholds and / or threshold range endpoints from any value between 0.1% and 80% of its original value.

[0103] In a non-limiting example derived from the thresholds described above, regarding flow path 240A, the flow state can first be identified. If the flow path is fully open, the thresholds described above can be applied. If the upstream pipeline pressure changes between 5 mT and 70 T when gas is activated, irregularities can be detected within flow path 240A. However, if a low flow state is detected in flow path 240A, the threshold endpoint can be scaled down to 10% of its original value. Therefore, when a low flow state is identified, if the upstream pipeline pressure changes between 0.5 mT and 7 T when gas is activated, irregularities can be detected within flow path 240. In this way, when the system is in a low flow state, the scaling factor can be applied to any of the thresholds described above.

[0104] In some embodiments, a fully open state, a partially open state, and a low flow state may correspond to the degree of opening of a throttle valve in the flow path. In some embodiments, a fully open state may correspond to a fully open throttle valve. In some embodiments, a fully open state may correspond to a throttle valve with the baffle position between 5 degrees and 90 degrees (where 90 degrees is fully open). In some embodiments, a fully open state may correspond to a throttle valve in any position from 5% to 100% open.

[0105] In some embodiments, a partially open state may correspond to a partially open throttle valve. In some embodiments, a partially open state may correspond to a throttle valve with the baffle position ranging from 0 degrees to 50 degrees (where 0 degrees is fully closed). In some embodiments, a partially open state may correspond to a throttle valve in any position from 0% to 55% open.

[0106] In some embodiments, a low flow state may correspond to a throttle valve that is partially open or mostly closed. In some embodiments, a low flow state may correspond to a throttle valve with the baffle position between 0 and 50 degrees (where 0 degrees is fully closed). In some embodiments, a low flow state may correspond to a throttle valve in any position from 0% to 55% open.

[0107] In some embodiments, the unstable gas flow rate after the gas flow has been activated may indicate that the flow path 240A includes irregularity. In some embodiments, the unstable gas flow rate after the gas flow has been activated may indicate that the flow path 240B includes irregularity. In some embodiments, the unstable gas flow rate after the gas flow has been activated may indicate that the flow path 240C includes irregularity. In some embodiments, the unstable gas flow rate after the gas flow has been activated may indicate that the flow path 240D includes irregularity. In any of the above embodiments or flow states, the unstable gas flow rate can be identified by a gas flow rate with a coefficient of variation (CV) greater than 0.5 (i.e., a relative standard deviation (%RSD) greater than 50%).

[0108] In some implementations, this or a similar threshold (as discussed above with respect to flow paths 240A to 240D) may be applied during irregularity detection for other flow paths. In other implementations, the threshold may be unique for each flow path.

[0109] In some implementations, when an irregularity is detected, the screening module 338 may perform path segmentation to determine the relative position of the irregularity within a specific flow path. In some implementations, the relative position of the irregularity with respect to a group of components of a given gas rod assembly (e.g., an MFC or pressure transducer of the group of components) may be determined.

[0110] As an example of this process, (return to) Figures 2A to 2D The unique flow paths 240A to 240D), in order to provide an example of this process, in which each flow path 240A to 240D is processed by irregularity detection and only path 240D is detected as including irregularity, the system may subsequently perform path segmentation only on path 240D.

[0111] To perform path segmentation, the filtering module 338 can divide the flow path into a first half upstream of one or more pressure sensors and / or flow sensors (e.g., MFCs and / or pressure transducers) within the gas rod, and a second half downstream of one or more pressure sensors and / or flow sensors within the gas rod. The module can then perform a two-part gas flow process comprising a first (upstream open) phase and a second (downstream open) phase. In the first phase, the module can open all upstream valves associated with the first half of the flow path and close all downstream valves in the second half of the flow path, while collecting pressure data at one or more pressure sensors and / or flow sensors within the gas rod. Subsequently, in the second phase, the process is reversed, with the module closing all upstream valves associated with the first half of the flow path and opening all downstream valves in the second half of the flow path, while collecting pressure data at one or more pressure sensors and / or flow sensors within the gas rod.

[0112] As discussed above, the collected data for the two parts of the gas flow process can include a first time period when the gas flow is not yet activated, a second time period when the gas flow is activated but has not yet reached equilibrium, a third time period after the gas flow has reached equilibrium, and / or a fourth time period after the gas flow has stopped. For each stage, and in a manner similar to irregularity detection, the module can compare the data increment with a threshold to determine whether an irregularity exists in the upstream or downstream half of the flow path. In some implementations, this threshold can be user-set or machine-generated.

[0113] In some implementations, similar processes for processing and data capture may be repeated for each unique flow path identified as including irregularities. In some implementations, the increment may then be compared with a threshold (e.g., a pre-established increment) to determine the relative location of the irregularity.

[0114] Reference Figures 2A to 2D In a specific instance of the unique flow path 240B, path segmentation and data comparison can be performed. For example, if an irregularity is detected within the unique flow path 240B during irregularity detection, path segmentation can divide the path 240B into upstream and downstream halves based on the location of component group 215, and selectively perform a two-stage gas flow process by: firstly, opening all upstream valves (e.g., valves 201, 202, and 204) and closing all downstream valves (e.g., valves 205, 206, 208, 209, and 210) in the first stage, and then reversing the process in the second stage (closing the upstream valves and opening the downstream valves). In some embodiments, only one stage of the two-part process can be performed.

[0115] To determine which stage of the two-stage gas flow process to activate, the screening module may sample the pressure at component group 215. If the pressure is below 20 PSI, or in other embodiments, within the range of 0 to 40 PSI, the first stage may be activated. In some embodiments, if the sampled pressure is above 20 PSI, or within the range of 15 to 120 PSI or above, the second stage may be activated. During either stage, the screening module 338 may capture data reflecting the pressure within the gas rod assembly portion including component group 215. In some embodiments, the screening module 338 may also capture gas flow rate data from component group 215. In some embodiments, such data may include data from the four time intervals discussed above: a first interval before gas flow through flow path 240B has been activated, a second intermediate interval when the gas flow reaches equilibrium, a third interval after the gas flow has reached equilibrium, and a fourth interval after the gas flow has stopped. In some implementations, the increment between data from the first and third (or fourth) intervals can be calculated by a filtering module to determine changes in gas rod flow rate, chamber pressure, and fore-stream pressure before and after gas flow has been activated.

[0116] For example, in the case of flow path 240B, a pressure change greater than 10 PSI at component group 215 during the first stage may indicate that the irregularity is located in the downstream half of the flow path. In other embodiments, a pressure change at component group 215 above the range of 0 PSI to 80 PSI during the first stage may indicate that the irregularity is located in the downstream half of the flow path. In some embodiments, a pressure change less than 10 PSI at component group 215 during the first stage may indicate that the irregularity is located in the upstream half of the flow path. In other embodiments, a pressure change at component group 215 at any location between 0 PSI and 80 PSI during the first stage may indicate that the irregularity is located in the upstream half of the flow path.

[0117] For example, in the case of flow path 240B, a pressure change between 0 PSI and 10 PSI at component group 215 during the second phase may indicate that irregularities are located in the downstream half of the flow path. In other embodiments, a pressure change at any location between 0 PSI and 80 PSI at component group 215 during the second phase may indicate that irregularities are located in the downstream half of the flow path.

[0118] In some embodiments, in response to a pressure change greater than 10 PSI at component group 215 during the second phase, the system may repeat the first phase as described above (in conjunction with multiple implementations of the threshold). In some embodiments, in response to a pressure change at component group 215 above the range of 0 PSI to 80 PSI during the second phase, the system may repeat the first phase as described above (in conjunction with multiple implementations of the threshold).

[0119] In some implementations, this or a similar threshold (as discussed above with respect to flow path 240B) may be applied during path segmentation of other flow paths. In other implementations, the threshold may be unique for each flow path.

[0120] In this manner, and for multiple flow paths in the flow path list 304, path segmentation can be performed in response to detected irregularities.

[0121] At the end of process 300, screening module 338 can output report 306, which indicates any irregularities found with respect to the gas rod assembly and any of the associated flow networks and flow paths. The report may further include the relative location of irregularities within a given flow path. Further maintenance and inspection can then be performed as needed.

[0122] Figure 4A The illustration shows a flowchart of a method 400 for detecting faults in a gas distribution system according to some embodiments of the present disclosure.

[0123] Method 400 can be executed by processing logic, which may include hardware (circuit systems, special-purpose logic, etc.), software (e.g., instructions that run on a processing device), or a combination thereof. In one embodiment, some or all of the operations of method 400 can be performed by... Figure 1 The system 100 is executed by one or more components.

[0124] At block 402, the processing logic can enable the gas flow through the flow path. In some implementations, the processing logic can enable the gas flow through a first flow path of the gas distribution system via a controller.

[0125] At block 404, the processing logic may receive data when gas flow is enabled. In some embodiments, the processing logic may receive first data, which includes at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when gas flow through the first flow path is enabled. Pressure data and / or flow rate data may also be collected during gas flow and / or after gas flow has stopped.

[0126] At block 406, the processing logic can process the data to determine whether the flow path includes a fault. In some implementations, the processing logic can process the data to determine whether the flow path of the gas distribution system includes a fault.

[0127] At box 408, the processing logic can determine the relative location of the fault. In some embodiments, the processing logic can (in response to determining that the first flow path contains a fault) determine the relative location of the fault within the first flow path with respect to at least one of the pressure sensor or flow sensor within the first flow path.

[0128] At block 410, the processing logic may generate a report. In some implementations, the processing logic may generate a report indicating whether the first flow path contains a fault and the relative location of any identified faults.

[0129] Figure 4B The illustration shows a flowchart of a method 430 for detecting faults in the flow path of a gas distribution system according to some embodiments of the present disclosure.

[0130] Method 430 can be executed by processing logic, which may include hardware (circuit systems, special-purpose logic, etc.), software (e.g., instructions running on a processing device), or a combination thereof. In one embodiment, some or all of the operations of method 430 can be performed by... Figure 1 The system 100 is executed by one or more components.

[0131] At block 432, the processing logic can determine the increment of chamber pressure. In some embodiments, the processing logic can determine the increment of chamber pressure data between a first time before gas flow through the flow path is enabled, a second time after gas flow through the flow path is enabled, and / or a third time after gas flow has stopped.

[0132] At box 434, the processing logic can determine the increment of the discharge line pressure. In some implementations, the processing logic can determine the increment of the discharge line pressure data between a first time and a second time, between a first time and a third time, and / or between a second time and a third time.

[0133] At box 436, the processing logic can determine the stability level of the gas flow. In some implementations, the processing logic can determine the stability level of the gas flow rate through the first flow path.

[0134] At box 438, the processing logic can determine whether the increment and stability levels are within acceptable ranges. In some implementations, the processing logic can determine whether the increment of chamber pressure data, the increment of exhaust pipe pressure data, and the stability level of gas flow rate are within the corresponding acceptable ranges.

[0135] At box 440, the processing logic can determine whether the flow path includes a fault. In some implementations, the processing logic can identify a fault in response to any one of the following: an increment in chamber pressure data, an increment in exhaust pipe pressure data, or a stability level of gas flow rate falling outside a corresponding acceptable range.

[0136] Figure 4C The illustration shows a flowchart of a method 460 for determining the relative location of a fault within the flow path of a gas distribution system according to some embodiments of the present disclosure.

[0137] Method 460 can be executed by processing logic, which may include hardware (circuit systems, special-purpose logic, etc.), software (e.g., instructions that run on a processing device), or a combination thereof. In one embodiment, some or all of the operations of method 460 can be performed by... Figure 1 The system 100 is executed by one or more components.

[0138] At block 462, the processing logic may open a valve on the upstream portion of the gas rod. In some embodiments, the processing logic may open one or more valves on the upstream portion of the gas rod associated with the flow path, upstream of at least one pressure sensor or flow sensor, allowing gas flow to proceed through the upstream portion of the gas rod.

[0139] At block 464, the processing logic may close a valve on the downstream portion of the gas rod. In some embodiments, the processing logic may close one or more valves on the downstream portion of the gas rod associated with the first flow path, downstream of at least one pressure sensor or flow sensor.

[0140] At block 466, the processing logic may receive pressure data within the upstream portion. In some embodiments, when the downstream portion of the gas rod is isolated, the processing logic may receive data indicating a first pressure change within the upstream portion of the gas rod.

[0141] At box 468, the processing logic can determine whether the upstream portion includes a fault. In some implementations, the processing logic can determine that the upstream portion of the gas rod includes a fault in response to determining that a first pressure change exceeds a first pressure change threshold.

[0142] Figure 4D The illustration shows a flowchart of a method 480 for determining the relative location of a fault within the flow path of a gas distribution system according to some embodiments of the present disclosure.

[0143] Method 480 can be executed by processing logic, which may include hardware (circuit systems, special-purpose logic, etc.), software (e.g., instructions that run on a processing device), or a combination thereof. In one embodiment, some or all of the operations of method 480 can be performed by... Figure 1 The system 100 is executed by one or more components.

[0144] At block 482, the processing logic may close a valve on the upstream portion of the gas rod. In some embodiments, the processing logic may close one or more valves on the upstream portion of the gas rod associated with a first flow path, downstream of at least one pressure sensor or flow sensor.

[0145] At block 484, the processing logic may open a valve on the downstream portion of the gas rod. In some implementations, the processing logic may open one or more valves on the downstream portion of the gas rod associated with the flow path downstream of the MFC, allowing the downstream portion of the gas rod to be pressurized by gas.

[0146] At block 486, the processing logic may receive pressure data within the downstream portion. In some embodiments, the processing logic may receive second data indicating a first pressure change within the downstream portion of the gas rod.

[0147] At box 488, the processing logic can determine whether the downstream portion includes a fault. In some implementations, the processing logic can determine that the downstream portion of the gas rod includes a fault in response to determining that a first pressure change exceeds a first pressure change threshold.

[0148] Figure 5 A schematic representation of an embodiment of a computing device associated with a substrate manufacturing system is shown. In one embodiment, processing device 500 may be part of any computing device associated with any of the figures described above, or any combination thereof. Exemplary processing device 500 may be connected to other processing devices in a LAN, intranet, extranet, and / or the Internet. Processing device 500 may be a personal computer (PC), set-top box (STB), server, network router, switch, or bridge, or any machine capable of executing a set of instructions (continuously or otherwise) that specifies actions to be taken by that device. Furthermore, although only a single exemplary processing device is illustrated, the term "processing device" should also be considered to include any collection of processing devices (e.g., computers) that independently or jointly execute a set of instructions (or multiple sets of instructions) to perform any one or more methods discussed herein.

[0149] An exemplary processing device 500 may include a processor 502 (e.g., a CPU), main memory 504 (e.g., read-only memory (ROM), flash memory, dynamic random access memory (DRAM) such as synchronous DRAM (SDRAM), etc.), static memory 506 (e.g., flash memory, static random access memory (SRAM), etc.), and auxiliary memory (e.g., a data storage device 518), which communicate with each other via a bus 530.

[0150] Processor 502 represents one or more general-purpose processing devices, such as a microprocessor, a central processing unit, or the like. More specifically, processor 502 may be a complex instruction set computing (CISC) microprocessor, a reduced instruction set computing (RISC) microprocessor, a very long instruction word (VLIW) microprocessor, a processor implementing other instruction sets, or a processor implementing a combination of instruction sets. Processor 502 may also be one or more special-purpose processing devices, such as application-specific integrated circuits (ASICs), field-programmable gate arrays (FPGAs), digital signal processors (DSPs), network processors, or the like. According to one or more aspects of this disclosure, processor 502 may be configured to execute instructions (e.g., instructions 522 may include, at least in...). Figure 1 (The computing subsystem seen in the image).

[0151] The exemplary processing device 500 may further include a network interface device 508 communicatively coupled to a network 520. The exemplary processing device 500 may further include a video display 510 (e.g., a liquid crystal display, a touchscreen, or a cathode ray tube, CRT), an alphanumeric input device 512 (e.g., a keyboard), an input control device 514 (e.g., a cursor control device, a touchscreen control device, a mouse), and a signal generating device 516 (e.g., an acoustic speaker).

[0152] Data storage device 518 may include a computer-readable storage medium (or more specifically, a non-transitory computer-readable storage medium) 528 on which one or more sets of executable instructions 522 are stored. According to one or more aspects of this disclosure, the executable instructions 522 may comprise executable instructions.

[0153] Executable instructions 522 may also be, during their execution, stored wholly or at least partially within main memory 504 and / or processor 502, via example processing device 500, which also constitutes a computer-readable storage medium, and main memory 504 and processor 502. Executable instructions 522 may further be transmitted or received over a network via network interface device 508.

[0154] Despite Figure 5 The term "computer-readable storage medium" is illustrated as a single medium, and should be understood to include a single medium or multiple media that store one or more sets of operational instructions (e.g., a centralized or distributed database, and / or associated caches and servers). The term "computer-readable storage medium" should also be understood to include any medium capable of storing or encoding a set of instructions for execution by a machine and causing the machine to perform any one or more of the methods described herein. Therefore, the term "computer-readable storage medium" should be understood to include, but is not limited to, solid-state memory, and optical and magnetic media.

[0155] It should be understood that the above description is intended to be illustrative rather than restrictive. Many other embodiments will become apparent to those skilled in the art upon reading and understanding the above description. Although specific examples have been described in this disclosure, it will be appreciated that the systems and methods of this disclosure are not limited to the examples described herein, but can be modified using practices within the scope of the appended claims. Therefore, the specification and drawings are to be considered illustrative rather than restrictive. Consequently, the scope of this disclosure should be determined by referring to the entire scope of the appended claims together with their equivalents.

[0156] The methods, hardware, software, firmware, or code described above can be implemented by instructions or code stored on a machine-accessible, machine-readable, computer-accessible, or computer-readable medium executable by a processing element. "Memory" includes any mechanism that provides (i.e., stores and / or transmits) information in a form readable by a machine, such as a computer or electronic system. For example, "memory" includes random access memory (RAM), such as static RAM (SRAM) or dynamic RAM (DRAM); ROM; magnetic or optical storage media; flash memory devices; electrical storage devices; optical storage devices; acoustic storage devices; and any type of tangible machine-readable medium suitable for storing or transmitting electronic instructions or information in a form readable by a machine (e.g., a computer).

[0157] Throughout this specification, references to "one embodiment" or "an embodiment" mean that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment of this disclosure. Therefore, the phrase "in one embodiment" or "in an embodiment" appearing in various places throughout this specification does not necessarily refer to the same embodiment. Furthermore, a particular feature, structure, or characteristic may be combined in any suitable manner in one or more embodiments.

[0158] In the foregoing description, detailed description has been given with reference to specific exemplary embodiments. However, it will be appreciated that various modifications and changes can be made thereto without departing from the broader spirit and scope of this disclosure as set forth in the appended claims. The description and drawings are therefore to be regarded as illustrative rather than restrictive. Furthermore, the foregoing use of the terms "implementation," "implementation," and / or other exemplary language do not necessarily refer to the same implementation or the same instance, but may refer to different and dissimilar implementations, as well as potentially similar implementations.

[0159] The terms “example” or “exemplary” are used herein to mean as an example, instance, or illustration. Any aspect or design described herein as an “example” or “exemplary” is not necessarily to be construed as preferred or advantageous over other aspects or designs. Rather, the use of the terms “example” or “exemplary” is intended to provide a concept in a specific manner. As used in this application, the term “or” is intended to mean an inclusive “or” rather than an exclusive “or.” That is, unless otherwise stated or clear from the context, “X includes A or B” is intended to mean any naturally inclusive arrangement. That is, “X includes A or B” is satisfied in any of the foregoing cases if X includes A; X includes B; or X includes both A and B. Furthermore, the articles “a” and “an” as used in this application and the appended claims should generally be construed as meaning “one or more” unless otherwise stated or clear from the context involving the singular form. Additionally, the use of the terms “an embodiment” or “one implementation” or “one embodiment” throughout the text is not intended to mean the same implementation or implementation unless so described. Furthermore, as used herein, the terms “first,” “second,” “third,” “fourth,” etc., mean markers for distinguishing different elements and do not necessarily have ordinal meanings based on their numerical designations.

[0160] Digital computer programs (also referred to or described as programs, software, software applications, modules, software modules, scripts, or code) can be written in any form of programming language, including compiled or interpreted languages, or declarative or procedural languages; and they can be deployed in any form, including as stand-alone programs or as modules, components, subroutines, or other units suitable for use in a digital computing environment. The basic elements of a digital computer include a central processing unit (CPU) for making or executing instructions and one or more memory devices for storing instructions and digital data. The CPU and memory may be supplemented by, or incorporated into, a dedicated logic circuit system or a quantum simulator. Typically, a digital computer will also include one or more mass storage devices (e.g., magnetic disks, magneto-optical disks, optical disks, or systems suitable for storing information) for storing digital data, or operatively coupled to receive digital data from or transfer digital data to such mass storage devices, or both. However, a digital computer does not necessarily need to have such devices.

[0161] Digital computer readable media suitable for storing digital computer program instructions and digital data include all forms of non-volatile digital memory, media and memory devices, including, by way of example, semiconductor memory devices, such as EPROM, EEPROM and flash memory devices; disks, such as internal hard disks or removable disks; magneto-optical disks; CD ROM and DVD-ROM discs.

[0162] Control of the various systems or portions thereof described in this specification can be implemented in a digital computer program product, which includes instructions stored on one or more non-transitory machine-readable storage media and executable on one or more digital processing devices. The systems or portions thereof described in this specification can each be implemented as an apparatus, method, or system, which may include one or more digital processing devices and memory for storing executable instructions to perform the operations described in this specification.

[0163] Although this specification contains numerous details of specific embodiments, these should not be construed as limiting the scope of the claims, but rather as descriptions of features specific to particular embodiments. Certain features described herein in the context of separate embodiments may also be implemented in combination in a single embodiment. Conversely, individual features described in the context of a single embodiment may also be implemented separately in multiple embodiments or in any suitable sub-combination. Furthermore, although features may be described above as functioning in certain combinations and even initially claimed in this way, in some cases, one or more features from the claimed combination may be removed from that combination, and the claimed combination may be for sub-combinations or variations thereof.

[0164] Similarly, although operations are depicted in a specific order in the accompanying drawings, this should not be construed as requiring such operations to be performed in the specific or sequential order shown, or to perform all illustrated operations to achieve the desired result. In some cases, multitasking and parallel processing may be advantageous. Furthermore, the separation of the various system modules and components in the embodiments described above should not be construed as requiring such separation in all embodiments, and it should be understood that the described program components and systems can generally be integrated into a single software product or packaged into multiple software products.

[0165] Specific implementations of the objective have been described. Other implementations fall within the scope of the following claims. For example, the actions described in the claims can be performed in different orders and still achieve the desired result. As an example, the process depicted in the drawings does not necessarily require the specific or sequential order shown to achieve the desired result. In some cases, multitasking and parallel processing may be advantageous.

Claims

1. A method for detecting faults in a gas distribution system, the method comprising: The controller enables the flow of gas through the first flow path of the gas distribution system; Receive first data, the first data including at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when gas flow through the first flow path is enabled; The first data is processed to determine whether the first flow path of the gas distribution system contains a fault; In response to determining that the first flow path contains a fault, the relative position of the fault within the first flow path is determined relative to at least one of the pressure sensor or flow sensor within the first flow path. as well as A report is generated indicating whether the first flow path contains a fault and the relative location of any identified faults.

2. The method of claim 1, wherein the first flow path comprises: A gas rod, the gas rod comprising a first plurality of valves upstream of the at least one pressure sensor or flow sensor and a second plurality of valves downstream of the at least one pressure sensor or flow sensor; A processing chamber, the processing chamber being fluidly coupled to the gas rod; and An exhaust duct, fluidly coupled to the processing chamber, is configured to exhaust a gas flow from the gas distribution system.

3. The method of claim 1, further comprising: The controller disables the gas flow passing through the first flow path; The controller enables the flow of gas through a second flow path in the gas distribution system; Receive second data, the second data including at least one of a second pressure data or a second flow rate data associated with the second flow path of the gas distribution system when gas flow through the second flow path is enabled; Process the second data to determine whether the second flow path of the gas distribution system contains a fault; and In response to determining that the second flow path contains a fault, the relative position of the fault within the second flow path with respect to the at least one pressure sensor or flow sensor within the second flow path is determined; The report further indicates whether the second flow path contains a fault and the relative location of any identified faults in the second flow path.

4. The method of claim 3, further comprising: The controller disables the gas flow through the second flow path; The controller enables the gas flow through a third flow path of the gas distribution system; Receive third data, the third data including at least one of third pressure data or third flow rate data associated with the third flow path of the gas distribution system when the gas flow through the third flow path is enabled; Process the third data to determine whether the third flow path of the gas distribution system contains a fault; and In response to determining that the third flow path contains a fault, the relative position of the fault within the third flow path with respect to the at least one pressure sensor or flow sensor within the third flow path is determined; The report further indicates whether the third flow path contains a fault and the relative location of any identified faults in the third flow path.

5. The method of claim 4, wherein the first flow path includes a flow path for a first gas through a gas rod, the gas rod including the at least one pressure sensor or flow sensor; and a processing chamber, wherein the second flow path includes a flow path for the first gas through the gas rod and a bypass conduit bypassing the processing chamber, and wherein the third flow path includes a flow path for a second gas through the gas rod and the processing chamber or the bypass conduit.

6. The method of claim 1, wherein the first data comprises at least one of the following: Chamber pressure data, which indicates the pressure within the processing chamber; Discharge pipeline pressure data, which indicates the pressure within the discharge pipeline; Gas rod pressure data, indicating the pressure within a portion of a gas rod containing the at least one pressure sensor or flow sensor; or Gas rod flow rate data, which indicates the flow rate within a portion of the gas rod containing at least one of a pressure sensor or a flow sensor.

7. The method of claim 1, wherein processing the first data to determine whether the first flow path of the gas distribution system contains a fault comprises: Determine the increment of chamber pressure data between a first time before the gas flow through the first flow path is activated and a second time after the gas flow through the first flow path is activated; Determine the increment of the discharge pipeline pressure data between the first time and the second time; Determine the stability level of the gas flow rate through the first flow path; as well as Determine whether the increment of the chamber pressure data, the increment of the discharge pipe pressure data, and the stability level of the gas flow rate are within a corresponding acceptable range, wherein a fault is identified in response to any one of the increment of the chamber pressure data, the increment of the discharge pipe pressure data, or the stability level of the gas flow rate being outside the corresponding acceptable range.

8. The method of claim 1, wherein processing the first data to determine whether the first flow path of the gas distribution system contains a fault comprises: Determine the increment of chamber pressure data between a first time before the gas flow through the first flow path is enabled and a second time after the gas flow through the first flow path is disabled; Determine the increment of the discharge pipeline pressure data between the first time and the second time; Determine the stability level of the gas flow rate through the first flow path; as well as Determine whether the increment of the chamber pressure data, the increment of the discharge pipe pressure data, and the stability level of the gas flow rate are within a corresponding acceptable range, wherein a fault is identified in response to any one of the increment of the chamber pressure data, the increment of the discharge pipe pressure data, or the stability level of the gas flow rate being outside the corresponding acceptable range.

9. The method of claim 1, wherein determining the relative position of the fault within the first flow path comprises: Open one or more valves on the upstream portion of a gas rod associated with the first flow path, upstream of the at least one pressure sensor or flow sensor, so that the gas flow proceeds through the upstream portion of the gas rod; Close one or more valves downstream of the gas rod associated with the first flow path, downstream of at least one pressure sensor or flow sensor; When the downstream portion of the gas rod is isolated, second data indicating a first pressure change within the upstream portion of the gas rod is received; and In response to determining that the first pressure change exceeds a first pressure change threshold, the upstream portion of the gas rod is determined to contain the fault.

10. The method of claim 1, wherein determining the relative location of the fault within the first flow path comprises: Close one or more valves on the upstream portion of the gas rod associated with the first flow path, upstream of at least one pressure sensor or flow sensor. Open one or more valves downstream of the gas rod associated with the first flow path, downstream of at least one pressure sensor or flow sensor; Receive second data indicating a first pressure change within the downstream portion of the gas rod; and In response to determining that the first pressure change exceeds a first pressure change threshold, the downstream portion of the gas rod is determined to contain the fault.

11. The method of claim 1, wherein determining the relative location of the fault within the first flow path comprises: determining that the fault is associated with one or more components of the first flow path downstream of the at least one pressure sensor or flow sensor, or determining that the fault is associated with one or more components of the first flow path upstream of the at least one pressure sensor or flow sensor.

12. A non-transitory computer-readable storage medium comprising instructions that, when executed by a processing device, cause the processing device to perform operations comprising: The controller enables the gas flow through the first flow path of the gas distribution system; Receive first data, the first data including at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when gas flow through the first flow path is enabled; The first data is processed to determine whether the first flow path of the gas distribution system contains a fault; In response to determining that the first flow path contains a fault, the relative position of the fault within the first flow path is determined relative to at least one of the pressure sensor or flow sensor within the first flow path. as well as A report is generated indicating whether the first flow path contains a fault and the relative location of any identified faults.

13. The non-transitory computer-readable storage medium of claim 12, wherein the first flow path comprises: A gas rod, the gas rod comprising a first plurality of valves upstream of the at least one pressure sensor or flow sensor and a second plurality of valves downstream of the at least one pressure sensor or flow sensor; A processing chamber, the processing chamber being fluidly coupled to the gas rod; and An exhaust duct, fluidly coupled to the processing chamber, is configured to exhaust a gas flow from the gas distribution system.

14. The non-transitory computer-readable storage medium of claim 12, wherein the operation performed by the processing device further comprises: The controller disables the gas flow passing through the first flow path; The controller enables the flow of gas through a second flow path in the gas distribution system; Receive second data, the second data including at least one of a second pressure data or a second flow rate data associated with the second flow path of the gas distribution system when gas flow through the second flow path is enabled; Process the second data to determine whether the second flow path of the gas distribution system contains a fault; and In response to determining that the second flow path contains a fault, the relative position of the fault within the second flow path with respect to at least one of the pressure sensor or flow sensor within the second flow path is determined; The report further indicates whether the second flow path contains a fault and the relative location of any identified faults in the second flow path.

15. The non-transitory computer-readable storage medium of claim 14, wherein the operation performed by the processing device further comprises: The controller disables the gas flow through the second flow path; The controller enables the gas flow through a third flow path of the gas distribution system; Receive third data, the third data including at least one of third pressure data or third flow rate data associated with the third flow path of the gas distribution system when the gas flow through the third flow path is enabled; Process the third data to determine whether the third flow path of the gas distribution system contains a fault; and In response to determining that the third flow path contains a fault, the relative position of the fault within the third flow path with respect to at least one of the pressure sensor or flow sensor within the third flow path is determined. The report further indicates whether the third flow path contains a fault and the relative location of any identified faults in the third flow path.

16. The non-transitory computer-readable storage medium of claim 15, wherein the first flow path includes a flow path for a first gas through a gas rod, the gas rod including the at least one pressure sensor or flow sensor; and a processing chamber, wherein the second flow path includes a flow path for the first gas through the gas rod and a bypass conduit bypassing the processing chamber, and wherein the third flow path includes a flow path for a second gas through the gas rod and the processing chamber or the bypass conduit.

17. A system comprising: Memory devices; and Processing device, communicatively coupled to the memory device, wherein the processing device is used for: Enable the gas flow through the first flow path of the gas distribution system; Receive first data, the first data including at least one of first pressure data or first flow rate data associated with the first flow path of the gas distribution system when gas flow through the first flow path is enabled; The first data is processed to determine whether the first flow path of the gas distribution system contains a fault; In response to determining that the first flow path contains a fault, the relative position of the fault within the first flow path is determined relative to at least one of the pressure sensor or flow sensor within the first flow path. as well as A report is generated indicating whether the first flow path contains a fault and the relative location of any identified faults.

18. The system of claim 17, wherein the first flow path comprises: A gas rod, the gas rod comprising a first plurality of valves upstream of the at least one pressure sensor or flow sensor and a second plurality of valves downstream of the at least one pressure sensor or flow sensor; A processing chamber, the processing chamber being fluidly coupled to the gas rod; and An exhaust duct, fluidly coupled to the processing chamber, is configured to exhaust a gas flow from the gas distribution system.

19. The system of claim 17, wherein the processing device is further configured to: Stop the gas flow passing through the first flow path; Enable gas flow through a second flow path of the gas distribution system; Receive second data, the second data including at least one of a second pressure data or a second flow rate data associated with the second flow path of the gas distribution system when gas flow through the second flow path is enabled; The second data is processed to determine whether the second flow path of the gas distribution system contains a fault; as well as In response to determining that the second flow path contains a fault, the relative position of the fault within the second flow path with respect to the at least one pressure sensor or flow sensor within the second flow path is determined; The report further indicates whether the second flow path contains a fault and the relative location of any identified faults in the second flow path.