Shotpoint ovt domain uniformity evaluation method, device, equipment and storage medium
The OVT domain uniformity evaluation method solves the problems of low calculation efficiency and unrigorous results in the existing technology for shot point uniformity evaluation, and realizes rapid and effective shot point uniformity evaluation and layout. It is applicable to the three-dimensional shot point layout in the Loess Mountain area in the southern Ordos Basin.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHINA NAT PETROLEUM CORP
- Filing Date
- 2024-12-05
- Publication Date
- 2026-06-05
Smart Images
Figure CN122156520A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of petroleum geophysical exploration technology, specifically to a method, apparatus, computer equipment, and storage medium for evaluating the uniformity of the shot point OVT domain. Background Technology
[0002] The Ordos Basin receives nearly 4,500 km of water annually. 2 More than 550,000 3D data acquisitions were conducted in the southern Loess Mountain region; as geological exploration targets become increasingly difficult, acquisition methods have been strengthened year by year, with the density of blasts reaching nearly 2 million per km. 2 As a result, the distance between blast lines is getting smaller and smaller; at the same time, the loess mountain terrain is full of gullies and dense obstacles, and the safe construction distance poses a great challenge to the uniform layout of blast points; in the actual layout of blast points, due to the influence of terrain and obstacles, blast points can only be offset, irregular and unevenly laid out, and the concept of blast line distance is basically absent in the final three-dimensional layout of blast points.
[0003] To ensure uniform shot point distribution, the Changqing exploration area formulated "Specifications and Requirements for Uniform Distribution of Excitation Points in Loess Mountains," and adopted techniques such as shortening safety distances, placing shot points in trenches, and strategically placing seismic sources in gaps, which greatly improved the uniformity of shot points. However, the client evaluated the uniformity of shot points using the accuracy rate, i.e., the on-time rate, which is neither reasonable nor scientific. In evaluating the uniformity of shot points, the KLSeis software, a professional acquisition and design software from BGP Inc., mainly uses the surface element evaluation method. This method is based on the shot-receiver distance difference, sorting the shot-receiver distances within the surface element from smallest to largest, calculating the difference between adjacent shot-receiver distances, and finally calculating the root mean square error of the shot-receiver distance difference as the uniformity. The smaller this value, the better the uniformity. This evaluation method works well for comparing observation attributes in 3D design, using the uniformity of a sub-region to represent the entire work area. However, in actual 3D shot point distribution, facing the irregular and uneven nature of shot points, it is necessary to calculate all surface elements in the entire area, resulting in an extremely large data volume, extremely low computational efficiency, and even incomplete execution.
[0004] In related technologies, shot points are divided into unit grids, the number of shot points in each unit grid is counted, and the standard deviation of the number of shot points in each grid is calculated. The smaller the standard deviation, the better the uniformity. This is considered a fast and efficient method suitable for evaluating the uniformity of shot points in large areas of 3D. However, the calculation results differ depending on the grid size parameter, and the evaluation method is not rigorous. Summary of the Invention
[0005] This application provides a method, apparatus, computer equipment, and storage medium for evaluating the uniformity of the shot point OVT domain.
[0006] The first aspect of this application provides a method for evaluating the uniformity of the shot point OVT domain, including:
[0007] Using the CMP element closest to the intermediate shot point of the target work area as the center, the shot domain of the target work area is divided into OVT meshes;
[0008] The number of shot points in the OVT grid of the shot domain is counted, and the OVT domain uniformity of the shot points in the target work area is evaluated based on the number of shot points in the OVT grid.
[0009] In an optional embodiment of this application, the method further includes:
[0010] For each shot point under the preset theoretical shot distance in the target work area, the actual shot distance of the current shot point is determined according to the distance between the current shot point and its adjacent shot points in the Inline direction.
[0011] The gun points with the same actual gun line distance are grouped together, and the proportion of gun points corresponding to each actual gun line distance is determined according to the number of gun points in each group.
[0012] Based on the proportion of firing points corresponding to each actual firing line distance, firing points in the target work area whose actual firing line distance is less than the preset firing line distance are eliminated proportionally to obtain the work area after elimination.
[0013] Repeat the step of dividing the gun domain of the removed work area into OVT meshes, using the CMP element closest to the intermediate shot point of the target work area as the center, until the OVT domain uniformity evaluation result of the removed work area meets the preset conditions.
[0014] In an optional embodiment of this application, determining the actual shot distance of the current shot point based on the distance between the current shot point and its adjacent shot points in the inline direction includes:
[0015] The maximum distance between the current firing point and its adjacent firing points in the Inline direction is taken as the actual firing line distance of the current firing point.
[0016] In an optional embodiment of this application, the step of proportionally eliminating firing points within the target work area whose actual firing line distance is less than a preset firing line distance based on the proportion of firing points corresponding to each actual firing line distance, to obtain the work area after elimination, includes:
[0017] Plot a distribution map of the percentage of shot points with the actual shot distance as the x-axis and the percentage of shot points corresponding to the actual shot distance as the y-axis.
[0018] For each group of firing points corresponding to each actual firing line distance that is less than the preset firing line distance, the firing points in the current group are removed according to the corresponding ratio, wherein the ratio is determined by the firing point proportion distribution map.
[0019] In an optional embodiment of this application, the step of dividing the target work area into an OVT mesh by taking the CMP surface element closest to the intermediate shot point of the target work area as the center includes:
[0020] Using the CMP element closest to the intermediate shot point of the target work area as the center, the shot domain of the target work area is divided into OVT meshes according to the preset mesh size.
[0021] The preset grid size is obtained through the following steps:
[0022] Using the CMP element closest to the intermediate shot point of the target work area as the center, the OVT domain of the target work area is divided into multiple OVT vector patches according to a cross arrangement. Each OVT vector patch has different azimuth and offset information. The size of the OVT vector patch is defined as follows:
[0023] Offset bin size =Offset bin x-size ×Offset bin y-size = (2×SLI)×(2×RLI)
[0024] Among them, Offset bin size For the size of the OVT vector slice, Offset bin x-size Offset bin is the x-axis offset of the OVT vector slice. y-size The offset of the OVT vector sheet along the y-axis is given by SLI and RLI, which represent the theoretical shot distance and receiver distance, respectively.
[0025] The sum of the distances between the shot and receiver on both sides of the CMP element point is:
[0026] Offset sum = n1*(2*SLI) or n1*(2*RLI), n1 = 1, 3, 5…
[0027] The distance increment between the shot and receiver on the same side of the CMP element point is:
[0028] Offset inc = n*SLI or n*RLI, n = 1, 2, 3…
[0029] When the OVT is split into the gun domain, the gun domain OVT mesh is obtained and used as the preset mesh:
[0030] SP bin size =SP bin x-size ×SP bin y-size = (1×SLI)×(1×RLI)
[0031] Among them, SP binsize For the size of the gun domain OVT mesh, SP bin x-size SPbin represents the x-axis dimension of the gun domain OVT mesh. y-size The size of the y-axis of the OVT grid in the gun domain is given by the preset grid size, which is the theoretical shot distance multiplied by the detector distance.
[0032] In an optional embodiment of this application, the step of evaluating the OVT domain uniformity of the target work area based on the number of shot points in the OVT grid includes:
[0033] Determine the ratio between the OVT grid with 1 shot point and all OVT grids based on the number of shot points in the OVT grid of the gun domain;
[0034] The ratio is used as an index for evaluating the uniformity of the OVT domain.
[0035] In an optional embodiment of this application, the method further includes:
[0036] Determine the ratios corresponding to multiple preset theoretical shot distances, and take the preset theoretical shot distance corresponding to the largest ratio as the target shot distance of the target work area.
[0037] A second aspect of this application provides a device for evaluating the uniformity of the shot point OVT domain, comprising:
[0038] The meshing module is used to divide the gun domain of the target work area into OVT meshes, using the CMP surface element point closest to the intermediate gun point of the target work area as the center.
[0039] The evaluation module is used to count the number of shot points in the OVT grid of the shot domain and to evaluate the OVT uniformity of shot points in the target work area based on the number of shot points in the OVT grid.
[0040] A third aspect of this application provides a computer device, including a memory and a processor. The memory stores a computer program, and the processor executes the computer program to implement the steps of any of the above-mentioned shot point OVT domain uniformity evaluation methods.
[0041] A fourth aspect of the present application provides a computer-readable storage medium having a computer program stored thereon, characterized in that, when the computer program is executed by a processor, it implements the steps of the shot point OVT domain uniformity evaluation method as described in any of the preceding claims.
[0042] Compared with the prior art, the technical solutions provided in this application have at least some or all of the following advantages:
[0043] The OVT domain uniformity evaluation method for shot points described in this application involves determining the actual shot distance of each shot point under a preset theoretical shot distance in the target work area based on the distance between the current shot point and its adjacent shot points in the inline direction. Shot points with the same actual shot distance are grouped together, and the proportion of shot points corresponding to each actual shot distance is determined based on the number of shot points in each group. Based on the proportion of shot points corresponding to each actual shot distance, shot points in the target work area are removed to obtain the work area after removal. The CMP element point closest to the middle shot point of the target work area is used as the center to divide the shot domain of the removed work area into OVT grids. The number of shot points in the OVT grid of the shot domain is counted, and the OVT domain uniformity of the shot points in the target work area is evaluated based on the number of shot points in the OVT grid of the shot domain. This method can quickly evaluate the uniformity of shot points in the field, thereby guiding the uniform deployment of shot points and meeting the requirements of pre-stack migration processing of the OVT domain. Attached Figure Description
[0044] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:
[0045] Figure 1 A flowchart illustrating a method for evaluating the uniformity of the shot point OVT domain according to an embodiment of this application;
[0046] Figure 2 A bar chart showing the percentage of actual shot distances per shot in one embodiment of this application;
[0047] Figure 3 A three-dimensional actual shot distance distribution diagram provided for one embodiment of this application;
[0048] Figure 4 A layout diagram of the design of the shot point and shot line distance provided in one embodiment of this application;
[0049] Figure 5 A diagram illustrating the calculation of actual shot distance in loess hills, provided as an embodiment of this application;
[0050] Figure 6 This is a schematic diagram of the three-dimensional actual shot point OVT mesh division provided in one embodiment of this application;
[0051] Figure 7 This is a schematic diagram of the OVT (Out-of-Video) mesh generation for a design shot point, provided as an embodiment of this application.
[0052] Figure 8 This is a schematic diagram illustrating the number of times the OVT domain is covered by different simulated shot distances in three dimensions, according to one embodiment of this application.
[0053] Figure 9This is a schematic diagram illustrating the percentage of times the OVT domain is covered by different simulated shot distances, as provided in one embodiment of this application.
[0054] Figure 10 A bar chart showing the percentages of OVT domain coverage missing, OVT domain coverage of 1, and OVT domain coverage greater than 1 provided in one embodiment of this application;
[0055] Figure 11 A schematic diagram of the structure of a shot point OVT domain uniformity evaluation device provided in one embodiment of this application;
[0056] Figure 12 This is a schematic diagram of a computer device structure provided in one embodiment of this application. Detailed Implementation
[0057] To make the technical solutions and advantages of the embodiments of this application clearer, the exemplary embodiments of this application will be described in further detail below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not an exhaustive list of all embodiments. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.
[0058] Please see Figure 1 The method for evaluating the uniformity of the shot point OVT domain provided in this application includes the following steps 100 to 500:
[0059] Step 100: Using the CMP (Common Midpoint) element closest to the intermediate shot point of the target work area as the center, perform OVT meshing on the shot domain of the target work area;
[0060] Step 200: Count the number of shot points in the OVT grid of the shot domain, and evaluate the OVT domain uniformity of the shot points in the target work area based on the number of shot points in the OVT grid.
[0061] In an optional embodiment of this application, the method further includes:
[0062] For each shot point under the preset theoretical shot distance in the target work area, the actual shot distance of the current shot point is determined according to the distance between the current shot point and its adjacent shot points in the Inline direction.
[0063] The gun points with the same actual gun line distance are grouped together, and the proportion of gun points corresponding to each actual gun line distance is determined according to the number of gun points in each group.
[0064] Based on the proportion of firing points corresponding to each actual firing line distance, firing points in the target work area whose actual firing line distance is less than the preset firing line distance are eliminated proportionally to obtain the work area after elimination.
[0065] The process of dividing the gun domain of the removed work area into OVT meshes is repeated, using the CMP element closest to the intermediate shot point of the target work area as the center, until the uniformity evaluation result of the OVT domain of the removed work area meets the preset conditions. The preset conditions are that the ratio between the OVT mesh with 1 shot point and all OVT meshes exceeds the preset threshold.
[0066] In an optional embodiment of this application, the percentage of shot points corresponding to each actual shot distance can be displayed using a bar chart, such as... Figure 2 As shown.
[0067] In an optional embodiment of this application, determining the actual shot distance of the current shot point based on the distance between the current shot point and its adjacent shot points in the inline direction includes:
[0068] The maximum distance between the current shot point and its adjacent shot points in the Inline direction is taken as the actual shot distance of the current shot point. Figure 3 As shown, since the shot point offset is mainly based on the longitudinal direction and is achieved by changing the shot line distance, only the distance between adjacent shot points in the Inline direction is considered. The specific formula is as follows:
[0069] SPI max = max(SPI1, SPI2)
[0070] Among them, SPI max SPI1 and SPI2 represent the maximum distance between adjacent shot points in the Inline direction, i.e., the actual shot line distance. SPI1 and SPI2 are the distances between the current shot point and its left and right adjacent shot points, respectively.
[0071] In an optional embodiment of this application, the step of eliminating firing points within the target work area based on the proportion of firing points corresponding to each actual firing line distance includes:
[0072] Plot a distribution map of the percentage of shot points with the actual shot distance as the x-axis and the percentage of shot points corresponding to the actual shot distance as the y-axis.
[0073] For each group of firing points corresponding to each actual firing line distance that is less than the preset firing line distance, the firing points in the current group are removed according to the corresponding ratio, wherein the ratio is determined by the firing point proportion distribution map.
[0074] This application partially eliminates clustered firing points with small actual firing line distances, thereby achieving a relatively uniform firing point layout.
[0075] In an optional embodiment of this application, step 400, which involves dividing the target work area into an OVT mesh using the CMP surface element closest to the intermediate shot point as the center, includes:
[0076] Using the CMP element closest to the intermediate shot point of the target work area as the center, the shot domain of the target work area is divided into OVT meshes according to the preset mesh size.
[0077] In an optional embodiment of this application, the preset grid size is obtained through the following steps:
[0078] Using the CMP element closest to the intermediate shot point of the target work area as the center, the OVT domain of the target work area is divided into multiple OVT vector patches according to a cross arrangement. Each OVT vector patch has different azimuth and offset information. The size of the OVT vector patch is defined as follows:
[0079] Offset bin size =Offset bin x-size ×Offset bin y-size = (2×SLI)×(2×RLI)
[0080] Among them, Offset bin size For the size of the OVT vector slice, Offset bin x-size Offset bin is the x-axis offset of the OVT vector slice. y-size The offset of the OVT vector sheet along the y-axis is given by SLI and RLI, which represent the theoretical shot distance and receiver distance, respectively.
[0081] The sum of the distances between the shot and receiver on both sides of the CMP element point is:
[0082] Offset sum = n1(2*SLI) or n1*(2*RLI), n1 = 1, 3, 5…
[0083] The distance increment between the shot and receiver on the same side of the CMP element point is:
[0084] Offset inc = n*SLI or n*RLI, n = 1, 2, 3…
[0085] When the OVT is split into the gun domain, the gun domain OVT mesh is obtained and used as the preset mesh:
[0086] SP bin size =SP bin x-size ×SP bin y-size = (1×SLI)×(1×RLI)
[0087] Among them, SP bin size For the size of the gun domain OVT mesh, SP bin x-size SPbin represents the x-axis dimension of the gun domain OVT mesh. y-sizeThe size of the y-axis of the OVT grid in the gun domain is given by the preset grid size, which is the theoretical shot distance multiplied by the detector distance.
[0088] In an optional embodiment of this application, step 200, which involves evaluating the OVT domain uniformity of the target work area based on the number of shot points in the OVT grid, includes:
[0089] Determine the ratio between the OVT grid with 1 shot point and all OVT grids based on the number of shot points in the OVT grid of the gun domain;
[0090] The ratio is used as an index for evaluating the uniformity of the OVT domain.
[0091] In an optional embodiment of this application, the method further includes:
[0092] Determine the ratios corresponding to multiple preset theoretical shot distances, and take the preset theoretical shot distance corresponding to the largest ratio as the target shot distance of the target work area.
[0093] In an optional embodiment of this application, the cross-shaped arrangement of the conventional OVT processing is extended to the entire work area, and OVT vector patches are used to define the uniformity of shot points; the number of shot points is calculated in the OVT grid and denoted as "OVT domain shot point number", which can be regarded as the number of coverages; when the number of coverages in the OVT grid is 1, the shot points are considered to be uniformly distributed; therefore, the proportion of "number of coverages in the OVT grid" being 1 is used as the standard for judging the uniformity of shot points in a certain 3D project.
[0094] In an optional embodiment of this application, the method further includes:
[0095] Find the CMP element closest to the central blast point in the target work area and use it as the starting point of the center element;
[0096] Starting from the center element, the entire work area is divided into an OVT (Out-of-Video) grid according to the theoretical shot distance × detector distance.
[0097] Count the number of gun points in the OVT grid. If there is only one gun point, the "OVT grid coverage count" is recorded as 1. If there is an empty segment, it is recorded as 0. When gun points are clustered together, record according to the actual number of gun points.
[0098] The number of shot points in the OVT domain is plotted on a statistical chart to evaluate the uniformity of the OVT domain of shot points in the work area.
[0099] In an optional embodiment of this application, the process of optimizing the appropriate shot distance for a specific three-dimensional project includes: after completing a preliminary evaluation of the uniformity of the actual shot distance and shot points in the work area, eliminating shot points with smaller actual shot distances according to different proportions, simulating different design shot distances; obtaining the uniformity evaluation of the OVT domain coverage times of the shot points, optimizing the appropriate design shot distance, and guiding the uniform layout of shot points.
[0100] In an optional embodiment of this application, taking a three-dimensional work area in a loess mountainous region as an example, the designed shot distance is 200m. Figure 4 As shown, the actual gun point and gun line distance distribution is as follows: Figure 5 As shown.
[0101] T1: By sorting by shot point distance and shot line distance, calculate the mutual distance between adjacent shot points in the Inline direction for each shot point, and take the maximum adjacent distance as the actual shot line distance of this shot.
[0102] T2: Group the gun points with the same gun line distance into one group;
[0103] T3: Count the number of shot points in each group and generate a statistical chart showing the percentage of shot points at different shot distances, such as... Figure 2 As shown, a preliminary evaluation of the uniformity of the shot points is achieved.
[0104] T4: Based on the actual shot distance, clustered shots are eliminated at different ratios to simulate different shot distances in the work area. Figure 2 It can be seen that the proportion of shots fired at 20m and 40m shot distances reached more than 16%, the proportion of shots fired at shot distances below 80m reached more than 20%, and the proportion of shots fired at the designed shot distance was the highest, reaching 10.4%. By uniformly eliminating the shot points with clustered shot distances of 20m and 40m according to different proportions, observation systems with different shot distances were obtained.
[0105] T5: Find the CMP surface element near the middle blast point in the work area as the starting point of the center surface element;
[0106] T6: Starting from the center element, the entire work area is divided into OVT (Out-of-Video) meshes according to the theoretical shot distance × detector distance, resulting in the shot point OVT mesh division as follows: Figure 6 As shown, Figure 6 Some OVTs had only one firing point, meaning one coverage; some OVTs had no firing points, meaning zero coverage; some OVTs had several firing points, meaning 2-3 coverages, with firing points clustered together. Figure 7 The uniformity of the OVT grid at the design point is significantly different;
[0107] T7: The number of shot points within the OVT domain grid is recorded as the OVT number shot point, which yields a statistical chart of OVT number coverage times;
[0108] T8: Repeat step T7 to obtain a statistical chart of OVT domain coverage times for different simulated gun line distances. The simulated gun line distance is the distance obtained after removing a portion of the gun points from the gun domain under the designed gun line distance. The simulated gun line distance is determined by the number of gun points in the gun domain after removing some gun points. For example, if the number of gun points corresponding to the designed gun line distance is A, the number of gun points corresponding to different simulated gun line distances are B, C, D, ..., N, respectively. Figure 8 and Figure 9 As shown, with the removal of clustered shots, the number of grids with an OVT coverage count of 1 increases; when the simulated shot distance reaches 280-320m, the number of grids with an OVT coverage count of 1 reaches its maximum. The percentage of OVT coverage counts for different simulated shot distances is shown in the bar chart below. Figure 10 As shown, when the shot distance is less than 280m, the proportion of missing OVT (Output Trace) patches continuously increases; as the simulated shot distance increases, the number of OVT patches with an OVT coverage count approaching 1 continuously increases; when the shot distance is greater than or equal to 280m, the proportion of OVT patches tends to stabilize; when the simulated shot distance is greater than 240m, the proportion of OVT patches with an OVT domain coverage count greater than 1 decreases and stabilizes. When the shot density reaches approximately 240 or 280m of simulated shot distance, the uniformity of shot points in the OVT domain is optimal. An appropriate shot distance will result in a more uniform OVT coverage count for shot points. Under specific conditions, a shot distance of 240 or 280m is the most suitable shot distance for a certain three-dimensional work area in the Loess Mountains.
[0109] The shot point OVT domain uniformity evaluation method of this application addresses the issue of irregular shot spacing and uneven shot points during shot point offset, which can easily lead to shot clustering and similar ray paths. A high proportion of these clustering issues hinders noise reduction in indoor OVT domain pre-stack migration processing. Related techniques struggle to quickly and efficiently evaluate irregular and uneven shot points. This application addresses this by sorting shot point and shot line spacings, calculating the distance between adjacent shot points in the inline direction, and taking the maximum adjacent distance as the actual shot line spacing. By statistically analyzing the proportion of shots with different actual shot line spacings across the entire work area, the uniformity of shot points in the loess hills is preliminarily evaluated. This method is unaffected by grid size parameters or the number of grids, resulting in higher efficiency. Furthermore, in subsequent processing, clustered shot points can be partially eliminated based on the actual shot line spacing, achieving relatively uniform shot points, which is more beneficial for pre-stack migration processing in the OVT (offset vector tile) domain.
[0110] The method for evaluating the uniformity of shot points in the OVT domain proposed in this application evaluates the uniformity of shot points in the field, thereby guiding the appropriate shot spacing, achieving uniform shot point distribution, and ensuring the acquisition of high-quality data.
[0111] It should be understood that although the steps in the flowchart are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order constraint on the execution of these steps, and they can be executed in other orders. Moreover, at least some steps in the diagram may include multiple sub-steps or multiple stages. These sub-steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these sub-steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least some of the sub-steps or stages of other steps.
[0112] Please see Figure 11 One embodiment of this application provides a shot point OVT domain uniformity evaluation device 1100, comprising:
[0113] The partitioning module 1110 is used to partition the gun domain of the target work area into an OVT mesh, taking the CMP surface element point closest to the intermediate gun point of the target work area as the center.
[0114] Evaluation module 1120 is used to count the number of shot points in the OVT grid of the shot domain and to evaluate the OVT uniformity of shot points in the target work area based on the number of shot points in the OVT grid.
[0115] For specific limitations regarding the aforementioned device 1100, please refer to the limitations of the shot point OVT domain uniformity evaluation method described above, which will not be repeated here. Each module in the aforementioned device 1100 can be implemented entirely or partially through software, hardware, or a combination thereof. These modules can be embedded in or independent of the processor in a computer device in hardware form, or stored in the memory of a computer device in software form, so that the processor can call and execute the operations corresponding to each module.
[0116] In one embodiment, a computer device is provided, the internal structure of which can be as follows: Figure 12As shown. The computer device includes a processor, memory, network interface, and database connected via a system bus. The processor provides computational and control capabilities. The memory includes a non-volatile storage medium and internal memory. The non-volatile storage medium stores the operating system, computer programs, and the database. The internal memory provides an environment for the operation of the operating system and computer programs in the non-volatile storage medium. The database stores data. The network interface communicates with external terminals via a network connection. When the computer program is executed by the processor, it implements the above-described method for evaluating the uniformity of the shot point OVT domain. It includes: memory and a processor; the memory stores the computer program; and the processor executes the computer program to implement any step in the above-described method for evaluating the uniformity of the shot point OVT domain.
[0117] In one embodiment, a computer-readable storage medium is provided having a computer program stored thereon, which, when executed by a processor, can perform any step of the above-described method for evaluating the uniformity of the shot point OVT domain.
[0118] Those skilled in the art will understand that embodiments of this application can be provided as methods, systems, or computer program products. Therefore, this application can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, this application can take the form of a computer program product embodied on one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.
[0119] This application is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of this application. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart... Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.
[0120] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.
[0121] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.
[0122] Although preferred embodiments of this application have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of this application.
[0123] Obviously, those skilled in the art can make various modifications and variations to this application without departing from the spirit and scope of this application. Therefore, if such modifications and variations fall within the scope of the claims of this application and their equivalents, this application also intends to include such modifications and variations.
Claims
1. A method for evaluating the uniformity of the shot point OVT domain, characterized in that, include: Using the CMP element closest to the intermediate shot point of the target work area as the center, the shot domain of the target work area is divided into OVT meshes; The number of shot points in the OVT grid of the shot domain is counted, and the OVT domain uniformity of the shot points in the target work area is evaluated based on the number of shot points in the OVT grid.
2. The method according to claim 1, characterized in that, The method further includes: For each shot point under the preset theoretical shot distance in the target work area, the actual shot distance of the current shot point is determined according to the distance between the current shot point and its adjacent shot points in the Inline direction. The gun points with the same actual gun line distance are grouped together, and the proportion of gun points corresponding to each actual gun line distance is determined according to the number of gun points in each group. Based on the proportion of firing points corresponding to each actual firing line distance, firing points in the target work area whose actual firing line distance is less than the preset firing line distance are eliminated proportionally to obtain the work area after elimination. Repeat the step of dividing the gun domain of the removed work area into OVT meshes, using the CMP element closest to the intermediate shot point of the target work area as the center, until the OVT domain uniformity evaluation result of the removed work area meets the preset conditions.
3. The method according to claim 2, characterized in that, The step of determining the actual shot distance of the current shot point based on the distance between the current shot point and its adjacent shot points in the inline direction includes: The maximum distance between the current firing point and its adjacent firing points in the Inline direction is taken as the actual firing line distance of the current firing point.
4. The method according to claim 2, characterized in that, The step involves proportionally eliminating firing points within the target work area whose actual firing line distance is less than a preset firing line distance, based on the proportion of firing points corresponding to each actual firing line distance, to obtain the work area after elimination, including: Plot a distribution map of the percentage of shot points with the actual shot distance as the x-axis and the percentage of shot points corresponding to the actual shot distance as the y-axis. For each group of firing points corresponding to each actual firing line distance that is less than the preset firing line distance, the firing points in the current group are removed according to the corresponding ratio, wherein the ratio is determined by the firing point proportion distribution map.
5. The method according to claim 1, characterized in that, The step of dividing the target work area into an OVT mesh, using the CMP surface element closest to the intermediate shot point of the target work area as the center, includes: Using the CMP element closest to the intermediate shot point of the target work area as the center, the shot domain of the target work area is divided into OVT meshes according to the preset mesh size. The preset grid size is obtained through the following steps: Using the CMP element closest to the intermediate shot point of the target work area as the center, the OVT domain of the target work area is divided into multiple OVT vector patches according to a cross arrangement. Each OVT vector patch has different azimuth and offset information. The size of the OVT vector patch is defined as follows: Offset bin size =Offset bin x-size ×Offset bin y-size =(2×SLI)×(2×RLI) Among them, Offset bin size For the size of the OVT vector slice, Offset bin x-size Offset bin is the x-axis offset of the OVT vector slice. y-size The offset of the OVT vector sheet along the y-axis is given by SLI and RLI, which represent the theoretical shot distance and receiver distance, respectively. The sum of the distances between the shot and receiver on both sides of the CMP element point is: Offset sum = n1 * (2 * SLI) or n1 * (2 * RLI), n1 = 1, 3, 5… The distance increment between the shot and receiver on the same side of the CMP element point is: Offse tnc = n*SLI or n*RLI, n = 1, 2, 3… When the OVT is split into the gun domain, the gun domain OVT mesh is obtained and used as the preset mesh: SP bin size =SP bin x-size ×SP bin y-size (1×SLI)×(1×RLI) Among them, SP bin size For the size of the gun domain OVT mesh, SP bin x-size SPbin represents the x-axis dimension of the gun domain OVT mesh. y-size The size of the y-axis of the OVT grid in the gun domain is given by the preset grid size, which is the theoretical shot distance multiplied by the detector distance.
6. The method according to claim 1, characterized in that, The evaluation of the OVT domain uniformity of the target work area based on the number of shot points in the OVT grid includes: Determine the ratio between the OVT grid with 1 shot point and all OVT grids based on the number of shot points in the OVT grid of the gun domain; The ratio is used as an index for evaluating the uniformity of the OVT domain.
7. The method according to claim 6, characterized in that, The method further includes: Determine the ratios corresponding to multiple preset theoretical shot distances, and take the preset theoretical shot distance corresponding to the largest ratio as the target shot distance of the target work area.
8. A device for evaluating the uniformity of the shot point OVT domain, characterized in that, include: The meshing module is used to divide the gun domain of the target work area into OVT meshes, using the CMP surface element point closest to the intermediate gun point of the target work area as the center. The evaluation module is used to count the number of shot points in the OVT grid of the shot domain and to evaluate the OVT uniformity of shot points in the target work area based on the number of shot points in the OVT grid.
9. A computer device, comprising: A memory and a processor, the memory storing a computer program, characterized in that the processor, when executing the computer program, implements the steps of the shot point OVT domain uniformity evaluation method according to any one of claims 1 to 7.
10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements the steps of the shot point OVT domain uniformity evaluation method according to any one of claims 1 to 7.