A dimming cadmium telluride power generation glass and a preparation method thereof

Abstract

The application discloses a kind of dimming cadmium telluride power generation glass and preparation method thereof, belong to adjustable light photovoltaic module production technical field.The preparation method includes: on FTO conductive substrate, CdSe / CdTe power generation layer and ZnTe doped composite back contact / complex back electrode layer are prepared in sequence, single time perforating is carried out using laser, the discrete micropore array with aperture 1 μm~5 μm, hole spacing 5 μm~15 μm, optical opening rate 10%~60% is formed, then solid-state electrolyte layer, electrochromic layer and transparent top electrode are deposited, and the product is obtained by laser scribing electrode isolation and glass packaging.Product is divided into high efficiency HP, balanced type ST and high light HT three series according to opening rate.The application realizes the effect of light path self-alignment, process simplification and no moire interference, and the power generation efficiency loss is small, the light transmittance and power generation efficiency matching can be flexibly customized, suitable for building photovoltaic integrated scene, with high efficiency power generation, dynamic dimming and excellent visual effect.

Description

Technical Field

[0001] This application belongs to the field of dimmable photovoltaic module manufacturing technology, specifically, it relates to a dimmable cadmium telluride power-generating glass and its preparation method. Background Technology

[0002] Existing tunable cadmium telluride (CdT) power generation modules generally employ a structure where the power generation layer and electrochromic layer are stacked separately. This requires fabricating light-transmitting channels and electrodes in each of the two film systems, resulting in cumbersome processes, poor optical path alignment accuracy, and low yield rates. Furthermore, traditional modules have fixed or limited transmittance, making it difficult to customize power generation efficiency and light-gathering performance to meet specific needs. Moreover, the light-transmitting channels often use linear or grid-like structures, which are prone to optical interference with building frames and regular light sources, producing moiré patterns that affect the building's appearance and visual appeal. In addition, the conventional transparent conductive film has poor work function matching with the p-type CdT power generation layer, resulting in high contact resistance and a significant decrease in power generation efficiency.

[0003] Therefore, there is an urgent need for a cadmium telluride photovoltaic glass that is self-aligned, customizable for dimming, and free of moiré patterns, in order to meet the application requirements of building-integrated photovoltaics (BIPV) for high efficiency, aesthetics, and flexibility. Summary of the Invention

[0004] The purpose of this application is to provide a dimming cadmium telluride power generation glass and its preparation method, which can solve the problems of complex process, difficult optical path alignment, difficulty in customizing the balance between transmittance and power generation efficiency, easy generation of moiré patterns and poor work function matching in the existing technology.

[0005] To achieve the above objectives, this application provides a method for preparing dimming cadmium telluride photovoltaic glass, comprising the following steps: A power generation functional substrate is fabricated by sequentially depositing an FTO front electrode layer, a CdSe / CdTe power generation layer, and a ZnTe-doped composite back contact / composite back electrode layer on the substrate surface. Based on the specifications of the target product, the micropore distribution density and pore size are calculated, and through-hole drilling is performed on the power generation functional substrate to form a micropore array. A solid dielectric layer, an electrochromic layer, and a transparent top electrode layer are sequentially deposited on the drilled power generation functional substrate to fabricate a photovoltaic module. The photovoltaic module is then subjected to laser scribing and glass encapsulation to produce a dimming cadmium telluride power generation glass.

[0006] Furthermore, the through-hole drilling method includes: using laser technology to perform single-pass through-hole laser drilling on the power generation functional substrate, passing through the CdSe / CdTe power generation layer, the ZnTe doped composite back contact layer and the composite back electrode layer in one pass to form a micro-hole array; wherein, the optical aperture ratio of the micro-hole array is 10%~60%.

[0007] Furthermore, the micropores obtained after laser processing have a diameter of 1μm to 5μm and a spacing of 5μm to 15μm; the laser technology used is green picosecond laser technology, femtosecond laser technology, or ultraviolet nanosecond laser technology.

[0008] Furthermore, during the through-hole drilling process, the micro-hole diameter, hole spacing, and hole distribution density are controlled to adjust the optical aperture ratio of the micro-hole array to 10%~60%; the formula for calculating the optical aperture ratio is as follows: Where A is the optical aperture ratio (%), D is the micropore diameter (μm), and P is the pore spacing (μm).

[0009] Furthermore, when the optical aperture ratio is in the range of 10% to 30%, the type of dimming cadmium telluride power generation glass is the high-efficiency HP series; when the optical aperture ratio is in the range of 30% to 40%, the type of dimming cadmium telluride power generation glass is the balanced ST series; and when the optical aperture ratio is in the range of 40% to 60%, the type of dimming cadmium telluride power generation glass is the high-transmittance HT series.

[0010] Furthermore, the micropore array can be circular, hexagonal, or rectangular in shape.

[0011] Furthermore, the ZnTe-doped composite back contact / composite back electrode layer includes a ZnTe-doped composite back contact layer and a composite back electrode layer, wherein the thickness of the ZnTe-doped composite back contact layer is 10 nm to 30 nm, and the thickness of the composite back electrode layer is 50 nm to 100 nm.

[0012] Furthermore, the CdSe / CdTe power generation layer includes a CdSe layer with a thickness of 100nm~200nm and a CdTe layer with a thickness of 3μm~4μm. The CdSe layer is connected to the FTO front electrode, and the CdTe layer is connected to the ZnTe doped composite back contact layer. The solid dielectric layer is made of LiPON or Li-Al-PO and has a thickness of 0.5μm~1μm. The electrochromic layer is made of WO3, NiO or WO3:Mo and has a thickness of 300nm~500nm. The transmittance modulation range of the electrochromic layer meets ΔT≥50%. The transparent top electrode layer is made of ITO or AZO and has a thickness of 100nm~150nm.

[0013] Furthermore, the laser scribing process includes: isolating the FTO front electrode, composite back electrode, and transparent top electrode from each other through laser scribing, and independently leading each of them to the busbar at the edge to achieve electrode isolation.

[0014] This application also provides a dimming cadmium telluride power generation glass prepared by the above-described method, comprising, from the outdoor side to the indoor side: an outdoor protective layer, a substrate, an FTO front electrode layer, a CdSe / CdTe power generation layer, a ZnTe-doped composite back contact / composite back electrode layer, a solid electrolyte layer, an electrochromic layer, a transparent top electrode, and an indoor protective layer; wherein, the FTO front electrode layer to the ZnTe-doped composite back contact / composite back electrode layer are provided with a through-hole micropore array, the micropore diameter of the micropore array is 1μm~5μm, the pore spacing is 5μm~15μm, and the optical aperture is 10%~60%.

[0015] In summary, this application has the following beneficial effects: This application proposes a method for fabricating dimming cadmium telluride (CdTe) photovoltaic glass. This method employs a one-step through-laser aperture forming process, replacing the multi-step photolithography and multi-layer alignment processes of traditional methods. This reduces the number of processes and equipment required, is compatible with existing CdTe module production lines, and results in a simpler overall fabrication process with lower modification and production costs. Furthermore, by adjusting the laser processing parameters, the effective optical aperture ratio can be flexibly set, enabling rapid customization of products with different transmittance and power generation efficiency levels during production. This meets the diverse application needs of building-integrated photovoltaics (BIPV) in terms of lighting, privacy, and power generation.

[0016] In the production of dimming cadmium telluride photovoltaic glass, this application employs an ultra-thin ZnTe-doped composite back contact / back electrode layer, forming a good ohmic contact with the CdTe power generation layer, effectively reducing contact resistance and improving the stability of photoelectric conversion output. With an aperture ratio A=30%, the power generation efficiency can remain above 70% of that of standard modules, with minimal efficiency loss. Furthermore, the use of a discrete point micropore array breaks the periodic optical interference of traditional linear or grid-like light transmission channels, structurally avoiding moiré patterns caused by superposition with building frames and regular artificial light sources, thereby improving the overall visual uniformity and applicability of the glass. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the structure of the dimming cadmium telluride power-generating glass proposed in the embodiments of this application.

[0019] Figure 2 This is a schematic diagram of the planar distribution of the micropore array (hexagonal close-packed) proposed in the embodiments of this application.

[0020] Figure 3 This is the curve showing the relationship between light transmittance and power generation efficiency as proposed in this application. Detailed Implementation

[0021] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0022] Currently, standard transparent cadmium telluride thin-film photovoltaic modules have a mature structure, typically consisting of FTO conductive glass, a CdSe / CdTe power generation layer, a ZnTe doped composite back contact layer, and a composite back electrode layer, which can achieve stable photoelectric conversion. Electrochromic technology can drive redox reactions in materials such as WO3 and NiO through voltage, achieving switching between colored and faded states and dynamically adjusting the light transmittance. Laser micromachining technology is often used to prepare micropores or microstructures on the thin film surface, providing a technological basis for the processing of light-transmitting channels.

[0023] The closest existing tunable photovoltaic modules generally adopt a double-layer stacked structure of "power generation layer + independent electrochromic layer". This structure requires first opening holes or etching to form light transmission channels in the power generation layer, and then preparing transparent electrodes at the corresponding positions in the electrochromic layer. The two film systems are processed independently and then aligned and bonded. At present, this technical solution has the following significant defects: (1) Complex process and difficulty in precise alignment of light path: The traditional solution requires the preparation of micropores, electrodes and light transmission channels in the power generation layer and electrochromic layer respectively. It not only has the disadvantages of many processes, long process and high cost, but also the two light paths rely on manual or equipment alignment, which makes it difficult to achieve complete coaxial alignment. It is easy to have offset and misalignment, which directly affects the visual uniformity and photoelectric performance stability. (2) Transmittance and power generation efficiency cannot be flexibly customized and are prone to moiré patterns: The transmittance of existing modules is mostly a fixed value or has a narrow adjustment range, which cannot be dynamically adjusted according to the needs of building lighting, privacy protection and power generation. Meanwhile, the light-transmitting channels generally adopt periodic line structures such as long slits and grids. When superimposed with building curtain wall keel, indoor regular LED light source or louvers, optical interference is very likely to occur to form moiré patterns, causing visual discomfort and seriously limiting its application in high-end building facades. (3) Mismatch between the work function of the transparent back contact layer and the power generation layer, resulting in a decrease in power generation performance: When a transparent electrode is introduced on the back side of the power generation layer to be compatible with the dimming function, the work function of the conventional high-transmittance conductive film (such as ITO) is mismatched with that of the p-type CdTe power generation layer, which will form a high potential barrier, resulting in increased contact resistance, reduced open circuit voltage, and decreased fill factor, ultimately causing a significant loss in the power generation efficiency of the module.

[0024] Based on this, this application provides a dimming cadmium telluride power-generating glass with simplified process, self-aligned optical path, customizable transmittance-power generation efficiency, no moiré pattern, and high power generation efficiency, as well as its preparation method. Through integrated through-laser hole forming, electrode function reuse, and electrochromic system integration, the core problems of traditional processes, such as process, optics, and electricity are solved, thereby improving product stability and applicability.

[0025] In a first aspect, this application provides a method for preparing dimming cadmium telluride photovoltaic glass, comprising the following steps: S1. An FTO front electrode layer, a CdSe / CdTe power generation layer, and a ZnTe-doped composite back contact / composite back electrode layer are sequentially deposited on the substrate surface to obtain a power generation functional substrate.

[0026] In a specific implementation, the ZnTe-doped composite back contact / composite back electrode layer is prepared using high-power pulsed magnetron sputtering, ensuring high doping concentration and excellent lateral conductivity (sheet resistance ≤100Ω / sq). It can serve as a highly efficient back contact / back electrode layer for the power generation layer, forming an ohmic contact with CdTe. It can also serve as the lower electrode in an electrochromic system. The moderate work function (~5.2eV) of the ZnTe-doped composite back contact layer can match the band structure of the subsequently deposited electrochromic layer (such as WO3), while its nanoscale thickness provides high transmittance (≥85%) in the visible light band, meeting the transmittance requirements of the electrochromic system for the lower electrode.

[0027] In a specific embodiment, the ZnTe-doped composite back contact / composite back electrode layer includes a ZnTe-doped composite back contact layer and a composite back electrode layer. The thickness of the ZnTe-doped composite back contact layer is 10nm~30nm, the thickness of the composite back electrode layer is 50nm~100nm, the work function is about 5.2eV, it forms an ohmic contact with CdTe, and the visible light transmittance is ≥85%.

[0028] In the ZnTe-doped composite back contact / composite back electrode layer structure of this application, by precisely controlling the thickness and doping concentration, it has dual functions: on the one hand, as the back electrode of the power generation layer, it forms a good ohmic contact with p-type CdTe, reducing contact resistance, improving carrier collection efficiency, and ensuring stable power generation performance; on the other hand, as the lower electrode of the electrochromic system, its moderate work function of about 5.2 eV can achieve good band matching with the electrochromic layer, and its nanoscale thickness enables it to have a high transmittance of ≥85% in the visible light band, meeting the light transmission and conductivity requirements required for electrochromic operation; this electrode reuse structure eliminates the need for an independent intermediate electrode layer, simplifies the film structure and fabrication process, and simultaneously achieves the unity of electrical matching, optical transmission and functional integration, improving the overall stability and reliability of the component.

[0029] S2. Based on the specifications of the target product, calculate the micropore distribution density and pore size, and perform through-hole drilling on the power generation functional substrate to form a micropore array on the power generation functional substrate.

[0030] In a specific implementation, the through-hole drilling method includes: using laser technology to perform single-pass laser drilling on the power generation functional substrate, passing through the CdSe / CdTe power generation layer, the ZnTe doped composite back contact layer and the composite back electrode layer in one pass to form a micro-hole array; wherein, the optical aperture ratio of the micro-hole array is 10%~60%.

[0031] In a specific embodiment, the laser wavelength is 532nm, and the resulting micropore diameter is 1μm~5μm, with a spacing of 5μm~15μm. The laser technology used is either a green picosecond laser or a femtosecond laser. This application allows for the direct fabrication of micropore arrays on substrates with pre-deposited power generation layers (including CdSe, CdTe, and ZnTe doped composite back contact / back electrode layers) through single or multiple scans. Furthermore, the laser parameters are programmable: by controlling the laser power, pulse frequency, scanning speed, and path, the diameter (1μm~5μm), depth (ensuring penetration through all functional layers), and distribution density of the micropores can be precisely controlled, thereby directly achieving a customized effective optical aperture ratio A within the range of 10%~60%. Optimized laser parameters ensure smooth, crack-free hole walls and a heat-affected zone (HAZ) of less than 10μm, avoiding damage to the electrical performance of the CdTe power generation layer. This application, through the design of a microporous array, fundamentally avoids the moiré patterns caused by the interference between the periodic arrangement of traditional parallel lines or grid lines and external regular structures, ensuring the purity and sophistication of the indoor and outdoor visual effects.

[0032] In a specific implementation, during the through-hole drilling process, the micro-hole diameter, hole spacing, and hole distribution density are controlled to adjust the optical aperture ratio of the micro-hole array to 10%~60%; wherein, the formula for calculating the optical aperture ratio is: Where A is the optical aperture ratio (%), D is the micropore diameter (μm), and P is the pore spacing (μm).

[0033] In the through-hole drilling process of this application, 532nm green picosecond laser technology (wavelength 532nm, pulse width 10ps~50ps), femtosecond laser technology (wavelength 1064nm, pulse width 100fs~500fs), or ultraviolet nanosecond laser technology (wavelength 355nm, pulse width 10ns~100ns) is used to perform single through-hole drilling on the deposited power generation functional substrate. The CdSe / CdTe power generation layer, ZnTe doped composite back contact layer, and composite back electrode layer are penetrated in one go. By programmably adjusting the laser power, pulse frequency, scanning speed, and path, the micro-hole diameter, hole spacing, and distribution density are precisely controlled, thereby achieving a customized effective optical aperture ratio of 10%~60%.

[0034] The core process parameters for through-hole drilling are defined as follows: (1) Laser power: For 532nm green picosecond laser, the power is controlled at 5W~20W; for 1064nm femtosecond laser, the power is controlled at 3W~15W; for 355nm ultraviolet nanosecond laser, the power is controlled at 2W~10W. (2) Pulse frequency: 532nm green picosecond laser frequency is 100kHz~1MHz, 1064nm femtosecond laser frequency is 1MHz~10MHz, and 355nm ultraviolet nanosecond laser frequency is 50kHz~500kHz. (3) Scanning speed: uniformly controlled at 500mm / s~5000mm / s, which can be dynamically adjusted according to the requirements of aperture and opening ratio; (4) Scanning path: A discrete random dot matrix path is adopted to avoid periodic line arrangement and eliminate moiré patterns in principle; (5) Distribution density: The effective optical aperture ratio is 10%~60%, and the micropore distribution density is controlled at 100 pores / cm. 2 ~1000 pieces / cm 2 The aperture is controlled between 10μm and 100μm, and the spacing between pores is controlled between 50μm and 500μm. The three factors work together to achieve precise control of the aperture ratio.

[0035] The preferred laser process in this application is: a combination of 532nm green picosecond laser technology, using 10W laser power, 500kHz pulse frequency, 2000mm / s scanning speed, and discrete random dot matrix path. This optimized process can make the hole wall smooth and crack-free, and the heat-affected zone (HAZ) of the surrounding film layer is less than 10μm, which can avoid damaging the electrical performance of the CdTe power generation layer. At the same time, the discrete micro-hole array structure breaks the periodic line arrangement, eliminating moiré patterns caused by interference with the building frame and regular light source in principle, achieving optical path self-alignment, simplified process, flexible and adjustable aperture ratio, and pure and unified visual effect.

[0036] This application allows for the customization of the performance of dimming cadmium telluride power-generating glass, with its light transmittance and power generation efficiency dynamically adjustable. Specifically, the indoor visibility transmittance (T...) can be customized. view Follow the formula: T view =A×T tr ×T EC Where: A is the effective aperture ratio, which is directly determined by the laser process and can be customized within the range of 10% to 60%; T tr The overall transmittance of the intermediate layer mainly includes the overall transmittance of the non-active dimming layers such as the ZnTe composite back contact / back electrode layer, electrolyte layer, and top electrode. Because the ZnTe composite back contact / back electrode layer used in this application is ultra-thin and both the electrolyte layer and top electrode are highly transparent materials, the overall TT... tr It can reach 88%~92%; T EC To determine the transmittance of the electrochromic layer, this application employs a high-performance electrochromic material, capable of adjusting from 25% (colored state) to 75% (faded state), i.e., ΔT = 75%. 25% = 50%.

[0037] Based on this, the performance range of different optical aperture ratios A in this application is shown in Table 1.

[0038] Table 1. Properties of Glasses with Different Optical Aperture Ratios

[0039] In specific implementations, when the optical aperture ratio ranges from 10% to 30%, the dimming cadmium telluride (CdTe) power-generating glass is of the high-efficiency HP (High Power / High Performance) series, with high power generation efficiency as the primary design goal; when the optical aperture ratio ranges from 30% to 40%, the dimming CdTe power-generating glass is of the balanced ST (Standard / Balanced Standard Type) series, balancing power generation efficiency and light transmission performance; when the optical aperture ratio ranges from 40% to 60%, the dimming CdTe power-generating glass is of the high-transmittance HT (High Transmittance) series, with high light transmission as the primary design goal. The HP series is suitable for BIPV curtain walls / roofs with high power generation requirements and low light transmission requirements; the ST series is suitable for mainstream commercial building curtain walls and general-purpose BIPV components; and the HT series is suitable for high-light-transmitting buildings, interior partitions, and high-end aesthetic curtain walls.

[0040] In specific embodiments, the micropore array is circular, hexagonal, or rectangular in shape, and employs a discrete point structure to structurally eliminate optical interference moiré patterns generated by traditional linear light-transmitting channels. Preferably, the micropore array is hexagonally closely packed with a spacing of 5 μm to 15 μm, resulting in smooth, crack-free pore walls and a heat-affected zone of less than 10 μm on the surrounding film. Visible light passes through the micropores to form a continuous light channel, achieving self-alignment of the optical path.

[0041] S3. A solid dielectric layer, an electrochromic layer, and a transparent top electrode layer are sequentially deposited on the perforated power generation functional substrate to obtain a photovoltaic module.

[0042] In a specific implementation, the electrochromic layer can dynamically adjust the light transmittance between the colored state and the faded state, with a light transmittance of ≥25% in the colored state and ≤75% in the faded state. Combined with a customized design with an effective optical aperture ratio of 10%~60%, the products can be divided into high-efficiency HP series, balanced ST series and high-transmittance HT series according to the aperture ratio. This allows for precise matching of light transmittance performance and power generation efficiency according to the needs of building lighting, privacy protection and power generation, meeting the usage requirements of diverse building-integrated photovoltaic (BIPV) scenarios and improving product versatility and engineering adaptability.

[0043] In a specific implementation, the CdSe / CdTe power-generating layer comprises a CdSe layer with a thickness of 100nm~200nm and a CdTe layer with a thickness of 3μm~4μm. The CdSe layer is connected to the FTO front electrode, and the CdTe layer is connected to the ZnTe-doped composite back contact layer. The solid dielectric layer is made of LiPON or Li-Al-PO with a thickness of 0.5μm~1μm, deposited by radio frequency sputtering to completely cover the inner wall of the micropores. The electrochromic layer is made of WO3, NiO, or WO3:Mo with a thickness of 300nm~500nm, and the transmittance modulation range of the electrochromic layer meets ΔT≥50%. The transparent top electrode layer is made of ITO or AZO with a thickness of 100nm~150nm. Due to the presence of micropores, the electrochromic material will be partially deposited on the inner wall of the pores, but this does not affect its overall function. The area of ​​the inner wall of the pores is relatively small (or the micropores can be filled by photoresist before this step). Here, ΔT = transmittance of the electrochromic fading state. Colored state transmittance.

[0044] S4. The photovoltaic module is subjected to laser scribing and glass encapsulation to produce dimming cadmium telluride power generation glass.

[0045] In a specific implementation, the laser scribing process includes: isolating the FTO front electrode layer, the ZnTe-doped composite back contact / composite back electrode layer, and the transparent top electrode layer from each other using laser scribing, and independently leading each of them to the edge busbar to achieve electrode isolation. By isolating and independently leading out the FTO front electrode layer, the ZnTe-doped composite back contact / composite back electrode layer, and the transparent top electrode layer through laser scribing, the power generation circuit and the electrochromic light path can operate independently without interference, avoiding interlayer short circuits and crosstalk, ensuring stable operation of power generation and dimming functions. Simultaneously, the orderly leading of the three electrodes to the edge busbar facilitates subsequent wiring and packaging, improving component reliability and mass production adaptability.

[0046] Secondly, based on a general inventive concept, this application also provides a dimming cadmium telluride power generation glass, which includes, from the outdoor side to the indoor side, the following components in sequence: an outdoor protective layer, a substrate, an FTO front electrode layer, a CdSe / CdTe power generation layer, a ZnTe-doped composite back contact / composite back electrode layer, a solid electrolyte layer, an electrochromic layer, a transparent top electrode, and an indoor protective layer; wherein, the FTO front electrode layer to the ZnTe-doped composite back contact / composite back electrode layer are provided with a through-hole micropore array, the micropore diameter of the micropore array is 1μm~5μm, the pore spacing is 5μm~15μm, and the optical aperture is 10%~60%.

[0047] The thickness range of each functional layer in this application includes: Outdoor protective layer: The thickness is 50μm~200μm, preferably 80μm~150μm, and it adopts high-transparency low-iron tempered glass or anti-reflective coating to balance impact resistance and light transmittance. Substrate: The thickness is 2mm~6mm, preferably 3.2mm~4mm, and high-transparency low-iron float glass is used to provide structural support for each functional layer; FTO front electrode layer: thickness is 500nm~900nm, preferably 600nm~700nm, sheet resistance is 8Ω / sq~15Ω / sq, ensuring high light transmittance and low series resistance; CdSe / CdTe power generation layer: The CdSe layer has a thickness of 100nm~200nm, preferably 120nm~180nm; the CdTe layer has a thickness of 3μm~4μm, preferably 3.2μm~3.8μm, forming a high-efficiency heterojunction absorption structure; ZnTe-doped composite back contact / composite back electrode layer: The total thickness is 60nm~130nm, of which the thickness of the ZnTe-doped composite back contact layer is 10nm~30nm, and the thickness of the composite back electrode layer (Mo / Al / Cr composite structure) is 50nm~100nm, optimizing the back contact barrier and ohmic contact performance. Solid electrolyte layer: The thickness is 0.4μm~1.3μm, preferably 0.5μm~1μm, and it adopts lithium-ion conductive polymer or inorganic solid electrolyte to ensure ion transport efficiency and structural stability. Electrochromic layer: The thickness is 300nm~500nm, preferably 350nm~450nm, and electrochromic materials such as WO3 and NiO are used to achieve reversible control of light transmittance; Transparent top electrode layer: The thickness is 80nm~200nm, preferably 100nm~150nm, and it adopts transparent conductive oxides such as ITO and AZO to balance high light transmittance and conductivity; Indoor protective layer: The thickness is 50μm~200μm, preferably 80μm~150μm, and it adopts high-transparency tempered glass or anti-glare coating to improve indoor safety and visual comfort.

[0048] The technical solutions described above in this application will be explained in detail below with reference to specific embodiments.

[0049] The terms used in the embodiments of this application include: FTO: Fluorine-doped tin oxide transparent conductive film, used as the front electrode.

[0050] CdSe / CdTe power generation layer: cadmium selenide / cadmium telluride semiconductor photovoltaic functional layer.

[0051] ZnTe doped composite back contact layer: a zinc telluride-based highly doped thin film used to reduce the contact barrier.

[0052] Through-hole micropore array: a visible light channel that is laser-processed in one go and runs through the entire functional film.

[0053] Effective optical aperture ratio A: The ratio of the total area of ​​the micropores to the total area of ​​the component.

[0054] Hexagonal close-packed: honeycomb distribution, with optimal optical uniformity and mechanical strength.

[0055] Electrochromic system: solid electrolyte + electrochromic layer + transparent top electrode, with voltage-controlled light transmittance.

[0056] BIPV: Building-integrated photovoltaics, where photovoltaic glass combines building materials and power generation functions.

[0057] Heat-affected zone (HAZ): The region where laser processing causes changes in the properties of the film.

[0058] Self-aligned optical path: The micro-aperture is penetrated in one go, and the optical channel is naturally coaxial, requiring no alignment.

[0059] Example 1 This embodiment provides a dimming cadmium telluride power-generating glass with dimensions of 1200mm × 1600mm, model HP-25 (A=25%), and structure as follows. Figure 1 As shown. Figure 1 The dimming cadmium telluride power generation glass consists of the following layers from the outdoor side to the indoor side: outdoor protective layer (80 μm thick), glass substrate (3.2 mm thick), FTO front electrode layer (650 nm thick), CdSe / CdTe power generation layer (150 nm / 3.5 μm thick), ZnTe doped composite back contact layer / back electrode layer (20 nm / 110 nm thick), solid electrolyte layer (0.8 μm thick), electrochromic layer (400 nm thick), transparent top electrode (120 nm thick), and indoor protective layer (100 μm thick). Figure 1 The red dashed cylinder represents the micropores that penetrate the glass substrate, the FTO front electrode layer, the CdSe / CdTe power generation layer, and the ZnTe-doped composite back contact / back electrode layer. The blue dashed line represents the path through which visible light is transmitted from the outside to the inside through the micropores. The ZnTe-doped composite back contact / back electrode layer serves as both the back contact of the power generation layer and the lower electrode of the electrochromic system.

[0060] It is prepared by the following method (unless otherwise specifically mentioned in all the following embodiments of this application, the deposition process is described from bottom to top based on the structure of the dimming cadmium telluride power generation glass): (1) Outdoor protective layer + glass base The outdoor protective layer is made of high-transparency, low-iron tempered glass (supplier: Nanbo Group, model: UltraClear® ultra-clear tempered glass, glass composition mainly includes: SiO2 72wt%~75wt%, Na2O 13wt%~15wt%, CaO 8wt%~10wt%, MgO 3wt%~4wt%, Al2O3 1wt%~2wt%, K2O 0~1wt%, Fe2O3 content ≤0.015wt%, subject to manufacturer's specifications) and an anti-reflective coating on its surface, with a thickness of 80μm; the anti-reflective coating uses a SiO2-TiO2 composite dielectric film, with a single SiO2 film thickness of 90nm and a single TiO2 film thickness of 55nm, for a total thickness of 145nm. The process includes physical vapor deposition (PVD) anti-reflective coating and tempering treatment. Physical vapor deposition (PVD) antireflective coating process parameters: Magnetron sputtering (PVD) process, background vacuum ≤ 5 × 10⁻⁶ - 4Pa, working gas is Ar (purity 99.999%), sputtering power is 120W, substrate temperature is 250℃, sputtering pressure is 0.3Pa, sputtering rate of SiO2 target is 0.6nm / s, sputtering rate of TiO2 target is 0.4nm / s, film uniformity deviation is ≤±3%, and the average transmittance of visible light is improved by ≥5%; Tempering and strengthening process parameters: Chemical tempering process is adopted, the tempering salt bath is KNO3 molten salt (purity 99.9%), the salt bath temperature is 420℃, the ion exchange time is 4h, the compressive stress on the tempered glass surface is ≥690MPa, the stress layer depth is ≥40μm, and the drop ball impact performance meets the GB 15763.2-2005 standard.

[0061] The glass substrate is made of high-transparency, low-iron float glass (supplier: CNHG Group, model: UltraClear® ultra-white float glass, the main glass components include: SiO2 72wt%~75wt%, Na2O 13wt%~15wt%, CaO 8wt%~10wt%, MgO 3wt%~4wt%, Al2O3 1wt%~2wt%, K2O 0~1wt%, Fe2O3 content ≤0.015wt%), with a thickness of 3.2mm, and its function is to support the entire film structure.

[0062] (2) Deposition of the electrode layer before FTO The material is fluorine-doped tin oxide (FTO) transparent conductive film, and the deposition method is atmospheric pressure chemical vapor deposition (APCVD). The deposition parameters include: deposition temperature 550℃, reaction source SnCl 450 sccm, CF3COOH 20 sccm, O2 1000 sccm, deposition rate 8 nm / s, deposition thickness 650 nm, and sheet resistance 10 Ω / sq.

[0063] (3) CdSe / CdTe power generation layer deposition The CdSe layer is made of cadmium selenide (CdSe), and the deposition method is near-space sublimation (CSS). The deposition parameters include: evaporation source temperature 580℃, substrate temperature 450℃, deposition pressure 10Pa, deposition time 120s, and thickness 150nm.

[0064] The CdTe layer was made of cadmium telluride (CdTe) and was deposited using near-space sublimation (CSS). The deposition parameters included: evaporation source temperature of 620℃, substrate temperature of 500℃, deposition pressure of 8Pa, deposition time of 600s, and thickness of 3.5μm.

[0065] (4) ZnTe doped composite back contact / composite back electrode layer The ZnTe-doped composite back contact layer is made of Cu-doped ZnTe (Cu doping concentration: 0.8 ± 0.05 wt%), and the deposition method is high-power pulsed magnetron sputtering. The deposition parameters include: sputtering power 80 W, Ar flow rate 30 sccm, deposition gas pressure 0.5 Pa, substrate temperature 200 °C, deposition time 30 s, and thickness 20 nm.

[0066] The composite back electrode layer (Mo / Al / Cr) consists of a Mo layer, an Al layer, and a Cr layer. The deposition method is DC magnetron sputtering, and the deposition parameters and thickness include: Mo layer: sputtering power 100W, Ar flow rate 30sccm, thickness 40nm; Al layer: sputtering power 120W, Ar flow rate 30sccm, thickness 40nm; Cr layer: sputtering power 90W, Ar flow rate 30sccm, thickness 10nm; total thickness of composite back electrode layer is 90nm.

[0067] (5) Calculate the micropore distribution density and pore size according to the target product specifications (aperture ratio A=25%). Use a programmed laser processing system to perform through-hole drilling on the power generation functional substrate, forming a preset micropore array (pore size D is 2μm, hole spacing P is 8μm, hexagonal arrangement, as shown in the diagram). Figure 2 (As shown).

[0068] Laser equipment: 532nm green picosecond laser processing system; Laser core parameters: laser power 10W, pulse frequency 500kHz, pulse width 30ps, scanning speed 2000mm / s; Scanning path: discrete hexagonal close-packed dot matrix, without periodic lines, avoiding moiré patterns at the source; Drilling method: Single through-scan, penetrating the full-function film layer of FTO front electrode, CdSe / CdTe power generation layer, ZnTe doped composite back contact layer, and Mo / Al / Cr composite back electrode layer in one go; Pore ​​structure parameters: pore diameter D=2μm, pore spacing P=8μm, micropore shape is circular, distribution is hexagonal close-packed, heat-affected zone <10μm, pore wall is smooth and crack-free; Online monitoring: Machine vision calibrates aperture, aperture spacing and distribution density in real time to ensure that the optical aperture ratio meets the standard, with a measured aperture ratio of 24.8%.

[0069] (6) Solid electrolyte layer deposition The solid electrolyte layer is made of LiPON (lithium phosphorus oxygen nitrogen), and the deposition method is radio frequency magnetron sputtering. The deposition parameters include: sputtering power of 60W, nitrogen flow rate of 10sccm, argon flow rate of 20sccm, working pressure of 0.4Pa, deposition time of 150s, and deposition thickness of 0.8μm, which completely covers the inner wall of the micropores.

[0070] (7) Electrochromic layer deposition The electrochromic layer is made of tungsten trioxide (WO3), and the deposition method is radio frequency magnetron sputtering. The deposition parameters include: sputtering power of 70W, argon flow rate of 25sccm, working pressure of 0.3Pa, substrate temperature of 150℃, deposition time of 200s, deposition thickness of 400nm, and transmittance modulation range ΔT=50%.

[0071] (8) Deposition of transparent top electrode layer The transparent top electrode layer is made of ITO (indium tin oxide), and the deposition method is DC magnetron sputtering. The deposition parameters include: sputtering power of 90W, argon flow rate of 30sccm, working pressure of 0.5Pa, deposition time of 120s, deposition thickness of 120nm, and sheet resistance of 15Ω / sq.

[0072] (9) Indoor protective layer The material of the indoor protective layer is anti-glare tempered glass (supplier: Nanbo Group, model: AG anti-glare ultra-clear tempered glass, glass composition: SiO2 72wt%~75wt%, Na2O 13wt%~15wt%, CaO 8wt%~10wt%, MgO 3wt%~4wt%, Al2O3 1wt%~2wt%, K2O 0~1wt%, Fe2O3 content ≤0.015wt%; the surface is chemically etched AG treatment, haze 8%~12%, gloss ≤20GU, visible light transmittance ≥89%), with a thickness of 100μm; the encapsulation process adopts double-layer glass vacuum lamination encapsulation, sealing the outdoor protective layer, functional components (all structures except the outdoor and indoor protective layers) and the indoor protective layer into a whole.

[0073] The process parameters for vacuum lamination packaging are as follows: Encapsulation structure: A 0.12mm thick PVB (polyvinyl butyral) interlayer is filled between the double-layer glass, and the total encapsulation gap after vacuum lamination is ≤0.05mm; Vacuum pretreatment: vacuum degree ≤1×10 -2 Pa, pretreatment temperature 120℃, heat preservation time 30min, to remove air bubbles between membrane layers; Lamination process: lamination temperature 140℃, lamination pressure 1.2MPa, lamination time 60min, heating and cooling rate ≤5℃ / min; Post-processing: After lamination, anneal in a 100℃ oven for 2 hours to relieve internal stress. After encapsulation, the moisture permeability of the module is ≤1×10⁻⁶. -6 g / (m 2 (24h), conforming to GB / T 29551-2013 "Solar Photovoltaic Laminated Glass for Buildings" standard.

[0074] The STC efficiency (Standard Test Conditions, the efficiency measured under STC is called STC efficiency) of the dimming cadmium telluride power generation glass obtained in this embodiment is 14.0%, which is 81% of that of a standard conventional cadmium telluride module (standard efficiency 17.2%, size: 1600mm*12000mm); the light transmittance ranges from 5.7% (colored) to 17.1% (faded).

[0075] Example 2 This embodiment provides a dimming cadmium telluride power generation glass with specifications of 1200mm×1600mm and model ST-35 (A=35%). The dimming cadmium telluride power generation glass consists of the following layers from the outdoor side to the indoor side: outdoor protective layer (100μm thick), glass substrate (3.2mm thick), FTO front electrode layer (680nm thick), CdSe / CdTe power generation layer (160nm / 3.6μm thick), ZnTe doped composite back contact layer / back electrode layer (22nm / 100nm thick), solid electrolyte layer (0.9μm thick), electrochromic layer (420nm thick), transparent top electrode (130nm thick), and indoor protective layer (120μm thick).

[0076] It is prepared by the following method: (1) Outdoor protective layer + glass base The outdoor protective layer is made of high-transparency, low-iron tempered glass (supplier: Asahi Glass, model: Clearvue® ultra-clear tempered glass, glass composition: SiO2 73wt%~76wt%, Na2O 12wt%~14wt%, CaO 9wt%~11wt%, MgO 2wt%~3wt%, Al2O3 1wt%~1.5wt%, Fe2O3 content ≤0.012wt%) and an anti-reflective coating on its surface, with a thickness of 80μm; the anti-reflective coating adopts a ZrO2-SiO2 composite high refractive index film system, with a total of 3 layers and a total thickness of 150nm. The process includes electron beam evaporation of PVD anti-reflective film and physical tempering treatment. PVD antireflective coating process parameters: background vacuum degree ≤3×10 -4Pa, working gas is Ar / O2 mixed gas (flow ratio 9:1), evaporation rate ZrO2 is 0.3nm / s, SiO2 is 0.5nm / s, substrate temperature is 200℃, film adhesion level is ≥HB level (100 cross-cut adhesion test). Physical tempering process parameters: tempering temperature 680℃, holding time 90s, air cooling rate ≥10℃ / s, surface compressive stress after tempering ≥90MPa, impact strength conforms to GB 9962-2012 standard.

[0077] The glass substrate is made of high-transparency, low-iron float glass (supplier: Asahi Glass, model: Clearvue® ultra-white float glass, glass composition: SiO2 73wt%~76wt%, Na2O 12wt%~14wt%, CaO 9wt%~11wt%, MgO 2wt%~3wt%, Al2O3 1wt%~1.5wt%, Fe2O3 content ≤0.012wt%), with a thickness of 3.2mm.

[0078] (2) Deposition of the electrode layer before FTO The material is fluorine-doped tin oxide (FTO) transparent conductive film, and the deposition method is atmospheric pressure chemical vapor deposition (APCVD). The deposition parameters include: deposition temperature 560℃, reaction source SnCl4 55 sccm, CF3COOH 22 sccm and O2 1050 sccm, deposition rate 8.5 nm / s, deposition thickness 680 nm, and sheet resistance 9 Ω / sq.

[0079] (3) CdSe / CdTe power generation layer deposition The CdSe layer was made of cadmium selenide and was deposited using near-space sublimation (CSS). The deposition parameters included: evaporation source temperature of 585℃, substrate temperature of 455℃, deposition pressure of 10Pa, deposition time of 130s, and thickness of 160nm.

[0080] The CdTe layer was made of cadmium telluride and was deposited using near-space sublimation (CSS). The deposition parameters included: evaporation source temperature of 625°C, substrate temperature of 505°C, deposition pressure of 8 Pa, deposition time of 620 s, and thickness of 3.6 μm.

[0081] (4) ZnTe doped composite back contact / composite back electrode layer The ZnTe-doped composite back contact layer is made of Cu-doped ZnTe (Cu doping concentration: 0.7 ± 0.05 wt%), and the deposition method is high-power pulsed magnetron sputtering. The deposition parameters include: sputtering power 85 W, Ar flow rate 32 sccm, deposition gas pressure 0.5 Pa, substrate temperature 210 °C, deposition time 32 s, and thickness 22 nm.

[0082] The composite back electrode layer is composed of Mo, Al, and Cr layers, and the deposition method is DC magnetron sputtering. The deposition parameters and thickness include: Mo layer: sputtering power 100W, Ar flow rate 30sccm, thickness 40nm; Al layer: sputtering power 130W, Ar flow rate 30sccm, thickness 45nm; Cr layer: sputtering power 100W, Ar flow rate 30sccm, thickness 15nm; total thickness of composite back electrode layer is 100nm.

[0083] (5) Calculate the micropore distribution density and pore size according to the target product specifications (aperture ratio A=35%). Program the laser processing system to perform through-hole drilling on the power generation functional substrate to form a preset micropore array (pore size D is 2.5μm, hole spacing P is 7.2μm).

[0084] Laser equipment: 532nm green picosecond laser processing system; Laser core parameters: laser power 12W, pulse frequency 600kHz, pulse width 35ps, scanning speed 2200mm / s; Scanning path: discrete hexagonal close-packed dot matrix, without periodic lines, avoiding moiré patterns at the source; Drilling method: Single through-scan, penetrating the full-function film layer of FTO front electrode, CdSe / CdTe power generation layer, ZnTe doped composite back contact layer, and Mo / Al / Cr composite back electrode layer in one go; Pore ​​structure parameters: pore diameter D=2.5μm, pore spacing P=7.2μm, micropore shape is circular, distribution pattern is hexagonal close packing, heat-affected zone <10μm, pore wall is smooth and crack-free; Online monitoring: Machine vision calibrates aperture, aperture spacing and distribution density in real time to ensure that the optical aperture ratio meets the standard, with a measured aperture ratio of 34.9%.

[0085] (6) Solid electrolyte layer deposition The solid electrolyte layer is made of Li-Al-PO (lithium aluminum phosphorus oxide), and the deposition method is radio frequency magnetron sputtering. The deposition parameters include: sputtering power of 65W, argon flow rate of 22sccm, working pressure of 0.4Pa, deposition time of 160s, and deposition thickness of 0.9μm, which completely covers the inner wall of the micropores.

[0086] (7) Electrochromic layer deposition The electrochromic layer is made of molybdenum-doped tungsten trioxide (WO3:Mo), with a Mo doping amount of 2.5 at.% (atomic percentage, based on W atoms), corresponding to a MoO3 mass fraction of 3.2 wt% in the sputtering target. The deposition method is radio frequency magnetron sputtering, and the deposition parameters include: sputtering power 75 W, argon flow rate 26 sccm, working pressure 0.3 Pa, substrate temperature 160 °C, deposition time 210 s, deposition thickness 420 nm, and transmittance modulation range ΔT ≥ 50% (at a visible wavelength of 550 nm, the transmittance in the colored state is ≤ 15%, and the transmittance in the faded state is ≥ 65%).

[0087] (8) Deposition of transparent top electrode layer The transparent top electrode layer is made of AZO (aluminum-doped zinc oxide), and the deposition method is DC magnetron sputtering. The deposition parameters include: sputtering power of 95W, argon flow rate of 32sccm, working pressure of 0.5Pa, deposition time of 125s, and deposition thickness of 130nm.

[0088] (9) Indoor protective layer The material of the indoor protective layer is anti-glare tempered glass (supplier: Corning, model: Gorilla® AG anti-glare tempered glass, glass composition: SiO2 65wt%~68wt%, Al2O3 18wt%~22wt%, Na2O 10wt%~13wt%, K2O 0~1wt%, Fe2O3 content ≤0.01wt%; surface sandblasting treatment, haze 10~15%, visible light transmittance ≥88%), with a thickness of 100μm; the encapsulation process adopts double-layer glass vacuum lamination encapsulation to seal the outdoor protective layer, functional components and indoor protective layer into a whole.

[0089] The process parameters for vacuum lamination packaging are as follows: Encapsulation structure: EVA (ethylene-vinyl acetate copolymer) is used as the encapsulation film, with a film thickness of 0.5mm; Vacuum pre-packaging: Vacuum degree ≤ 5 × 10 -3 Pa, vacuuming time 15 min, preheating temperature 80℃; Vacuum lamination process: lamination temperature 150℃, lamination pressure 0.8MPa, lamination time 30min; Post-curing performance: The peel strength of the encapsulated component is ≥25N / cm, and the weather resistance passes the 2000-hour UV aging test with no yellowing or delamination.

[0090] The STC efficiency of the dimming cadmium telluride power generation glass obtained in this embodiment is 12.3%, which is 72% of that of a standard conventional cadmium telluride module (compare efficiency 17.2%, size: 1600mm*12000mm); the light transmittance ranges from 8% (colored) to 24% (faded).

[0091] Example 3 This embodiment provides a dimming cadmium telluride power generation glass with dimensions of 1200mm × 1600mm and model number HT-45 (A=45%). The dimming cadmium telluride power generation glass comprises, from the outdoor side to the indoor side: an outdoor protective layer (120μm thick), a glass substrate (4mm thick), an FTO front electrode layer (700nm thick), a CdSe / CdTe power generation layer (180nm / 3.8μm thick), a ZnTe doped composite back contact layer / back electrode layer (25nm / 80nm thick), a solid electrolyte layer (1μm thick), an electrochromic layer (450nm thick), a transparent top electrode (150nm thick), and an indoor protective layer (150μm thick).

[0092] It is prepared by the following method: (1) Outdoor protective layer + glass base The outdoor protective layer is made of high-transparency, low-iron tempered glass (supplier: NSG Sheet Glass, model: Tuff Glass® ultra-clear tempered glass, glass composition: SiO2 71wt%~74wt%, Na2O 14wt%~16wt%, CaO 7wt%~9wt%, BaO 1wt%~2wt%, Al2O3 2wt%~3wt%, Fe2O3 content ≤0.018wt%) and an anti-reflective coating on its surface, with a thickness of 80μm; the anti-reflective coating adopts a MgF2 single-layer low-refractive-index film system with a film thickness of 100nm, and the process includes magnetron sputtering PVD anti-reflective film and chemical tempering treatment. PVD antireflective coating process parameters: sputtering power 150W, working pressure 0.4Pa, substrate temperature 150℃, Ar gas flow rate 40sccm, deposition rate 0.8nm / s; Chemical tempering process parameters: molten salt ratio KNO3:NaNO3=2:1, salt bath temperature 430℃, ion exchange time 3.5h, surface compressive stress ≥700MPa, stress layer depth ≥35μm.

[0093] The glass substrate is made of high-transparency, low-iron float glass (supplier: NSG Sheet Glass, model: Tuff Glass® ultra-clear float glass, glass composition: SiO2 71wt%~74wt%, Na2O 14wt%~16wt%, CaO 7wt%~9wt%, BaO 1wt%~2wt%, Al2O3 2wt%~3wt%, Fe2O3 content ≤0.018wt%), with a thickness of 3.2mm.

[0094] (2) Deposition of the electrode layer before FTO The material is fluorine-doped tin oxide (FTO) transparent conductive thin film, and the deposition method is atmospheric pressure chemical vapor deposition (APCVD). The deposition parameters include: deposition temperature 570℃, reaction source SnCl4 60 sccm, CF3COOH 25 sccm and O2 1100 sccm, deposition rate 9 nm / s, deposition thickness 700 nm, and sheet resistance 8 Ω / sq.

[0095] (3) CdSe / CdTe power generation layer deposition The CdSe layer was made of cadmium selenide and was deposited using near-space sublimation (CSS). The deposition parameters included: evaporation source temperature of 590°C, substrate temperature of 460°C, deposition pressure of 10 Pa, deposition time of 140 s, and thickness of 180 nm.

[0096] The CdTe layer was made of cadmium telluride and was deposited using near-space sublimation (CSS). The deposition parameters included: evaporation source temperature of 630°C, substrate temperature of 510°C, deposition pressure of 8 Pa, deposition time of 640 s, and thickness of 3.8 μm.

[0097] (4) ZnTe doped composite back contact / composite back electrode layer The ZnTe-doped composite back contact layer is made of Cu-doped ZnTe (Cu doping concentration: 0.6 ± 0.05 wt%), and the deposition method is high-power pulsed magnetron sputtering. The deposition parameters include: sputtering power 90 W, Ar flow rate 35 sccm, deposition gas pressure 0.5 Pa, substrate temperature 220 °C, deposition time 35 s, and thickness 25 nm.

[0098] The composite back electrode layer is composed of Mo, Al, and Cr layers, and the deposition method is DC magnetron sputtering. The deposition parameters and thickness include: Mo layer: sputtering power 100W, Ar flow rate 30sccm, thickness 35nm; Al layer: sputtering power 120W, Ar flow rate 30sccm, thickness 35nm; Cr layer: sputtering power 90W, Ar flow rate 30sccm, thickness 10nm; total thickness of composite back electrode layer is 80nm.

[0099] (5) Calculate the micropore distribution density and pore size according to the target product specifications (aperture ratio A=45%). Program the laser processing system to perform through-hole drilling on the power generation functional substrate to form a preset micropore array (pore size D is 3μm, hole spacing P is 6.3μm).

[0100] Laser equipment: 532nm green picosecond laser processing system; Laser core parameters: laser power 15W, pulse frequency 700kHz, pulse width 40ps, scanning speed 2500mm / s; Scanning path: discrete hexagonal close-packed dot matrix, without periodic lines, avoiding moiré patterns at the source; Drilling method: Single through-scan, penetrating the full-function film layer of FTO front electrode, CdSe / CdTe power generation layer, ZnTe doped composite back contact layer, and Mo / Al / Cr composite back electrode layer in one go; Pore ​​structure parameters: pore diameter D=3μm, pore spacing P=6.3μm, micropore shape is circular, distribution pattern is hexagonal close packing, heat-affected zone <10μm, pore wall is smooth and crack-free; Online monitoring: Machine vision calibrates aperture, aperture spacing and distribution density in real time to ensure that the optical aperture ratio meets the standard, with a measured aperture ratio of 44.7%.

[0101] (6) Solid electrolyte layer deposition The solid electrolyte layer is made of LiPON (lithium phosphorus oxygen nitrogen), and the deposition method is radio frequency magnetron sputtering. The deposition parameters include: sputtering power of 70W, nitrogen flow rate of 12sccm, argon flow rate of 25sccm, working pressure of 0.4Pa, deposition time of 170s, and deposition thickness of 1μm, which completely covers the inner wall of the micropores.

[0102] (7) Electrochromic layer deposition The electrochromic layer is made of nickel oxide and deposited by radio frequency magnetron sputtering. The deposition parameters include: sputtering power of 80W, argon flow rate of 30sccm, working pressure of 0.3Pa, substrate temperature of 180℃, deposition time of 220s, deposition thickness of 450nm, and transmittance modulation range ΔT≥50%.

[0103] (8) Deposition of transparent top electrode layer The transparent top electrode layer is made of ITO (indium tin oxide), and the deposition method is DC magnetron sputtering. The deposition parameters include: sputtering power of 100W, argon flow rate of 35sccm, working pressure of 0.5Pa, deposition time of 130s, and deposition thickness of 150nm.

[0104] (9) Indoor protective layer The material of the indoor protective layer is anti-glare tempered glass (supplier: Schott, model: AF32® eco glass, glass composition mainly includes (subject to manufacturer's production): SiO2 70wt%~73wt%, B2O3 10wt%~13wt%, Na2O 9wt%~11wt%, CaO 5~6wt%, Fe2O3 content ≤0.005wt%; surface coating AG treatment, gloss 15GU~20GU), with a thickness of 100μm; the encapsulation process adopts double-layer glass vacuum lamination encapsulation to seal the outdoor protective layer, functional components and indoor protective layer into a whole.

[0105] The process parameters for vacuum lamination packaging are as follows: Encapsulation structure: POE (polyolefin elastomer) encapsulation film with a thickness of 0.6mm is used; Vacuum lamination process: Vacuum degree ≤ 8×10 -3 Pa, lamination temperature 135℃, lamination pressure 1.0MPa, holding time 45min; Performance indicators: The insulation resistance of the packaged component is ≥1000MΩ, and the salt spray resistance performance passes the 168-hour test without corrosion.

[0106] The STC efficiency of the dimming cadmium telluride power generation glass obtained in this embodiment is 10.7%, which is 62% of that of a standard conventional cadmium telluride module (compare efficiency 17.2%, size: 1600mm*12000mm); the light transmittance ranges from 10.1% (colored) to 30.3% (faded).

[0107] The relationship curves between the effective optical aperture ratio A (10%~60%) and the relative power generation efficiency (relative to normal standard modules) in the glass product series of this application are as follows: Figure 3 As shown, it can be seen that as the opening ratio A increases, the relative power generation efficiency decreases from about 90% (A=10%) to about 45% (A=60%). Figure 3 The document also indicates the product series corresponding to different aperture ratios and their indoor visible light transmittance ranges (based on T). view =A×90%×T EC T EC =25%~75%).

[0108] The product series are divided into: HP series (A=10%~30%): Focuses on high power generation efficiency and prioritizes power generation. ST series (A=30%~40%): This is a balanced type, balancing power generation and lighting; HT series (A=40%~60%): Focuses on high light transmittance, prioritizing light transmission.

[0109] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0110] Although preferred embodiments of the present application have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the appended claims are limited to all changes and modifications that include the preferred embodiments and fall within the scope of the embodiments of the present application.

[0111] Finally, it should be noted that in this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or terminal device that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or terminal device. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or terminal device that includes the element.

[0112] This application uses specific examples to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A method for preparing a dimming cadmium telluride power-generating glass, characterized in that, Includes the following steps: An FTO front electrode layer, a CdSe / CdTe power generation layer and a ZnTe-doped composite back contact / composite back electrode layer are sequentially deposited on the substrate surface to obtain a power generation functional substrate. Based on the specifications of the target product, the micropore distribution density and pore size are calculated, and through-hole drilling is performed on the power generation functional substrate to form a micropore array on the power generation functional substrate. A photovoltaic module is fabricated by sequentially depositing a solid dielectric layer, an electrochromic layer, and a transparent top electrode layer on the power generation functional substrate after drilling. The photovoltaic module is subjected to laser scribing and glass encapsulation to produce dimming cadmium telluride power-generating glass.

2. The preparation method according to claim 1, characterized in that, The method of through-hole drilling includes: using laser technology to perform single-pass laser drilling on the power generation functional substrate, penetrating the CdSe / CdTe power generation layer, ZnTe doped composite back contact layer and composite back electrode layer in one pass to form a micro-hole array; wherein, the optical aperture ratio of the micro-hole array is 10%~60%.

3. The preparation method according to claim 2, characterized in that, The micropores obtained after laser processing have a pore size of 1μm~5μm and a pore spacing of 5μm~15μm; The laser technology mentioned is green picosecond laser technology, femtosecond laser technology, or ultraviolet nanosecond laser technology.

4. The preparation method according to claim 3, characterized in that, During the through-hole drilling process, the micro-hole diameter, hole spacing, and hole distribution density are controlled to adjust the optical aperture ratio of the micro-hole array to 10%~60%; wherein, the formula for calculating the optical aperture ratio is: ； Where A is the optical aperture ratio (%), D is the micropore diameter (μm), and P is the pore spacing (μm).

5. The preparation method according to claim 2, characterized in that, When the optical aperture ratio is in the range of 10% to 30%, the type of the dimming cadmium telluride power-generating glass is the high-efficiency HP series. When the optical aperture ratio is in the range of 30% to 40%, the type of the dimming cadmium telluride power-generating glass is the balanced ST series. When the optical aperture ratio is in the range of 40% to 60%, the type of the dimming cadmium telluride power-generating glass is the high-transmittance HT series.

6. The preparation method according to claim 1, characterized in that, The micropore array is circular, hexagonal, or rectangular in shape.

7. The preparation method according to claim 1, characterized in that, The ZnTe-doped composite back contact / composite back electrode layer includes a ZnTe-doped composite back contact layer and a composite back electrode layer, wherein the thickness of the ZnTe-doped composite back contact layer is 10nm~30nm, and the thickness of the composite back electrode layer is 50nm~100nm.

8. The preparation method according to claim 7, characterized in that, The CdSe / CdTe power generation layer includes a CdSe layer with a thickness of 100nm~200nm and a CdTe layer with a thickness of 3μm~4μm. The CdSe layer is connected to the FTO front electrode, and the CdTe layer is connected to the ZnTe doped composite back contact layer. The solid dielectric layer is made of LiPON or Li-Al-PO and has a thickness of 0.5μm to 1μm. The electrochromic layer is made of WO3, NiO, or WO3:Mo, with a thickness of 300nm~500nm, and the transmittance modulation range of the electrochromic layer satisfies ΔT≥50%; The transparent top electrode layer is made of ITO or AZO and has a thickness of 100nm~150nm.

9. The preparation method according to claim 1, characterized in that, The laser scribing process includes: isolating the FTO front electrode, composite back electrode, and transparent top electrode from each other by laser scribing, and independently leading each of them to the edge busbar to achieve electrode isolation.

10. The dimming cadmium telluride photovoltaic glass prepared by the preparation method according to any one of claims 1-9, characterized in that, From the outdoor side to the indoor side, it includes, in sequence: outdoor protective layer, substrate, FTO front electrode layer, CdSe / CdTe power generation layer, ZnTe doped composite back contact / composite back electrode layer, solid electrolyte layer, electrochromic layer, transparent top electrode layer and indoor protective layer; The FTO front electrode layer to the ZnTe doped composite back contact / composite back electrode layer is provided with a through-hole micropore array. The micropore diameter of the micropore array is 1μm~5μm, the spacing between the pores is 5μm~15μm, and the optical aperture ratio is 10%~60%.

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