Electrode processing control method and device, computer device and storage medium

Abstract

This invention relates to the field of mold processing technology, and discloses an electrode processing control method, apparatus, computer equipment, and storage medium. The method acquires the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information, initial design angle, and detection reference angle parameters of multiple electrode processing positioning points. Based on the processing sequence information, a starting processing positioning point and at least one path processing positioning point are determined. The starting processing positioning point determines its rotation angle based on the initial design angle. Furthermore, based on the discharge reference angle parameters, the initial design angle of the starting processing positioning point, the initial design angle of the path processing positioning points, and the detection reference angle parameters, the rotation angle of each path processing positioning point is determined. Based on the rotation angles of the starting processing positioning point and all path processing positioning points, the target electrode is controlled to complete workpiece processing. This invention improves processing efficiency and the accuracy of electrode processing control.

Description

Technical Field

[0001] This invention relates to the field of mold processing technology, and in particular to an electrode processing control method, device, computer equipment, and storage medium. Background Technology

[0002] In the mold manufacturing and machining industries, electrical discharge machining (EDM) is a process that uses pulsed discharges between a discharge electrode and the workpiece to perform machining. When multiple surfaces of the workpiece have areas to be machined, side EDM is required. In existing technologies, before side EDM, the electrode machining angles at three-dimensional points need to be manually calculated, leading to low machining efficiency. This is especially problematic when the discharge electrode needs to be positioned at multiple machining locations, as subjective experience can easily cause deviations in the positioning angles, reducing the precision of electrode machining control and resulting in quality issues with the machined workpiece. Summary of the Invention

[0003] Therefore, it is necessary to provide an electrode processing control method, device, computer equipment, and storage medium to address the above-mentioned technical problems, so as to solve the problems of low efficiency and insufficient accuracy of manual calculation of processing angles in existing electrode processing control.

[0004] An electrode processing control method, comprising: Obtain the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. Based on the processing sequence information, determine the starting processing location and at least one path processing location among all the electrode processing locations; Based on the initial design angle of the starting point processing running point, determine the running rotation angle of the starting point processing running point; Based on the discharge reference angle parameter, the initial design angle of the starting point processing running point, the initial design angle of the path processing running point, and the detection reference angle parameter, the running rotation angle of each of the path processing running points is determined. Based on the rotation angle of the starting processing point and the rotation angle of all the path processing points, the target electrode is controlled to complete the workpiece processing according to the processing sequence information.

[0005] An electrode processing control device, comprising: The information acquisition module is used to acquire the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. The machining point division module is used to determine the starting machining point and at least one path machining point among all the electrode machining points based on the processing sequence information. The starting point positioning analysis module is used to determine the positioning rotation angle of the starting point processing point based on the initial design angle of the starting point processing point. The path point positioning analysis module is used to determine the positioning rotation angle of each of the path processing points based on the discharge reference angle parameters, the initial design angle of the starting point processing point, the initial design angle of the path processing point, and the detection reference angle parameters. The electrode control module is used to control the target electrode to complete the workpiece processing according to the processing sequence information based on the rotation angle of the starting processing point and the rotation angle of all the path processing points.

[0006] A computer device includes a memory, a processor, and computer-readable instructions stored in the memory and executable on the processor, wherein the processor implements the above-described electrode processing control method when executing the computer-readable instructions.

[0007] A computer-readable storage medium storing computer-readable instructions that, when executed by one or more processors, cause the one or more processors to perform the electrode processing control method described above.

[0008] In the aforementioned electrode processing control method, apparatus, computer equipment, and storage medium, the electrode processing control method acquires the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information, initial design angles, and detection reference angle parameters of multiple electrode processing positioning points. Based on the processing sequence information, the method determines the starting processing positioning point and at least one path processing positioning point among all electrode processing positioning points. Based on the initial design angle of the starting processing positioning point, the method determines the positioning rotation angle of the starting processing positioning point. Based on the discharge reference angle parameters, the initial design angle of the starting processing positioning point, and the initial design angles and detection reference angle parameters of the path processing positioning points, the method determines the positioning rotation angle of each path processing positioning point. Based on the positioning rotation angle of the starting processing positioning point and the positioning rotation angles of all path processing positioning points, the method controls the target electrode to complete workpiece processing according to the processing sequence information. This invention determines the starting processing positioning point and path processing positioning points based on the processing sequence information, and automatically calculates the corresponding positioning rotation angles using different methods according to the characteristics of different processing positioning points. The rotation angle calculation of the path processing positioning points is based on the same starting processing positioning point, improving computational efficiency. Meanwhile, this invention can accurately calculate the deviation between the design parameters and the detection parameters of the relative positional relationship between the target electrode and the workpiece, thereby ensuring the accuracy of the angle adjustment of the target electrode at each processing point and improving the processing efficiency and the accuracy of electrode processing control. Attached Figure Description

[0009] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments of the present invention will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0010] Figure 1 This is a schematic flowchart of an electrode processing control method according to an embodiment of the present invention; Figure 2 This is a schematic diagram of the electrode reference angle in an embodiment of the electrode processing control method of the present invention; Figure 3 This is a schematic diagram of the electrode processing control device in one embodiment of the present invention; Figure 4 This is a schematic diagram of a computer device according to an embodiment of the present invention. Detailed Implementation

[0011] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0012] The electrode processing control method provided in this embodiment is executed by a server, such as an electrical discharge machining control server used to control the electrodes to process the workpiece. It should be noted that the server can be hardware or software. When the server is hardware, it can be implemented as a distributed server cluster consisting of multiple servers, or it can be implemented using a single server.

[0013] In one embodiment, such as Figure 1 As shown, an electrode processing control method is provided. Taking the application of this method on the server as an example, it includes the following steps S10-S50.

[0014] S10. Obtain the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters.

[0015] Understandably, the target electrode is a specific electrode that needs to be subjected to electrical discharge machining (EDM). In this embodiment, the machining assembly for performing EDM includes a machining spindle, an adapter fixture, an electrode fixture, and a target electrode connected in sequence. The machining spindle and the adapter fixture are located in the longitudinal direction, while the electrode fixture and the target electrode are located in the transverse direction. One end of the adapter fixture is connected to the machining spindle in the longitudinal direction, and the other end is connected to the electrode fixture in the transverse direction. The electrode fixture and the target electrode are also connected in the transverse direction. In this case, the server-side control of the machining assembly can perform lateral EDM on the workpiece located below.

[0016] The discharge reference angle parameter refers to the quadrant position parameter of the electrode reference angle when the target electrode begins discharge machining. The electrode reference angle refers to the geometric markings of the electrode (such as chamfers or fillets), used to calibrate the relative orientation of the electrode and the workpiece (such as a mold) before machining. The design of the electrode reference angle must be consistent with the reference angle of the mold. For example, if the reference angle of the mold is a chamfer in a certain quadrant, the reference angle of the electrode should also be located in the same quadrant and in the same direction to ensure machining accuracy. Figure 2 As shown, the electrode is a rectangle with a chamfered angle. The electrode reference angle is designed with a chamfered angle. A rectangular coordinate system is established with the geometric center of the rectangle as the origin and the first to fourth quadrants are divided. At this time, the electrode reference angle is located in the fourth quadrant and the discharge reference angle parameter is 4.

[0017] During the machining process, the server needs to control the electrode to move in a pre-set direction for multi-point machining to shape the workpiece into the required form. Machining positioning design information refers to the pre-set angle requirements for each machining point during the electrode movement. Electrode machining positioning points refer to the machining points during the electrode movement. The target electrode will have multiple electrode machining positioning points, each corresponding to its own machining sequence information, initial design angle, and detection reference angle parameters. The machining sequence information refers to the order in which each machining point is processed during the electrode movement. The initial design angle refers to the expected angle of rotation required by the electrode based on the electrode reference angle. When uploading the detection and marking program to the UG CNC system (Unigraphics NX), the detection reference angle parameters for each electrode machining positioning point are specified. The detection reference angle parameters refer to the quadrant position parameters of the electrode reference angle at each electrode machining positioning point, as specified in the detection and marking program. The detection reference angle parameters can be consistent with or inconsistent with the discharge reference angle parameters. For example, for an electrode machining location, if the detection reference angle parameter is 1 and the initial design angle is 45°, then it is necessary to first control the electrode reference angle of the target electrode to be in the first quadrant (e.g., by...). Figure 2 After the electrode is rotated 90° counterclockwise, the electrode reference angle is in the first quadrant. Then, the target electrode needs to be rotated 45° counterclockwise to achieve the angle processing requirements of the electrode processing running point.

[0018] S20. Based on the processing sequence information, determine the starting processing location and at least one path processing location among all the electrode processing locations.

[0019] In one embodiment, step S20, namely determining the starting processing location and at least one path processing location among all the electrode processing locations based on the processing sequence information, includes: S201. Based on the processing sequence information, find the first electrode processing running point from all the electrode processing running points, and determine the first electrode processing running point as the starting processing running point. S202. The electrode processing locations excluding the first electrode processing location from all the electrode processing locations are determined as path processing locations.

[0020] Understandably, the server divides all electrode processing points according to the processing sequence information, resulting in one starting processing point and at least one path processing point. The starting processing point is the first processing point during electrode movement, and the path processing point is any processing point other than the first one. When the target electrode has two or more processing points, it is divided into one starting processing point and at least one path processing point. In a special case, after determining the first electrode processing point as the starting processing point, the server obtains the number of remaining processing points excluding the first one and checks if the number of remaining points is greater than zero. If the number of remaining points is greater than zero, the server determines all electrode processing points excluding the first one as path processing points. If the number of remaining points is zero, it indicates that the target electrode in the processing layout design information has only one electrode processing point. In this case, the number of path processing points is zero, and the server only needs to determine the rotation angle of the starting processing point in subsequent processes, without needing to determine the rotation angle of each path processing point.

[0021] This embodiment starts with a defined starting point and determines the path of the machining points according to the machining sequence. This ensures the accuracy of the machining parameters of the electrode at each position and facilitates the automatic calculation of the corresponding rotation angle based on the characteristics of different machining points. This helps to reduce machining errors and improve the quality stability of the workpiece.

[0022] S30. Determine the rotation angle of the starting point processing running point based on the initial design angle of the starting point processing running point.

[0023] Understandably, the server needs to determine the rotation angle of the current machining point to control the electrode's movement from the previous machining point to the next (to change the electrode's machining position and angle). The rotation angle refers to the actual angle the electrode rotates within the current machining point. For the starting machining point, if the target electrode's reference angle is consistent with the discharge reference angle parameter (e.g., the electrode's reference angle is in the fourth quadrant, and the discharge reference angle parameter is 4), the server directly determines the initial design angle of the starting machining point as the rotation angle of the starting machining point.

[0024] In one embodiment, step S30, namely determining the rotation angle of the starting point processing running point based on the initial design angle of the starting point processing running point, includes: S301. When the target electrode is in the posture corresponding to the discharge reference angle parameter, obtain the included angle between the target electrode and the processing axis. S302. If the included angle of the electrode axis is less than the preset included angle threshold, then the target electrode is determined to meet the zero-position calibration condition, and the initial design angle of the starting point processing running point is determined as the running rotation angle of the starting point processing running point.

[0025] Understandably, when the electrode machining run-off point is the starting machining run-off point, it indicates that the target electrode is in the posture corresponding to the discharge reference angle parameter, that is, the electrode reference angle of the target electrode is consistent with the discharge reference angle parameter (e.g., the electrode reference angle of the target electrode is in the fourth quadrant, and the discharge reference angle parameter is 4). At this time, the server obtains the electrode axis angle between the target electrode and the machining axis and compares the electrode axis angle with a preset angle threshold. The preset angle threshold is a pre-set critical value for the electrode axis angle used to determine whether the target electrode meets the zero-position calibration condition. In actual electrode discharge machining scenarios, RFID tags are used as reference points to assist C-axis zero-position calibration. The C-axis zero position is the reference reference point of the C-axis (rotational axis) in the machine tool coordinate system. The RFID tag is an identification tag on the electrode / workpiece fixture, used to record the current electrode / workpiece's own attribute information. If the electrode axis angle is less than the preset angle threshold, it indicates that the electrode is in an ideal posture at the machining start position, and the relative position between the RFID tag and the C-axis zero position remains unchanged during the rotation of the C-axis. At this point, the server determines that the target electrode meets the zero-position calibration conditions and sets the initial design angle of the starting point machining running point as the running rotation angle of the starting point machining running point.

[0026] This embodiment compares the included angle of the electrode axis with a preset included angle threshold to accurately determine whether the electrode's posture during zero-position calibration meets the requirements. This ensures that the electrode is in an ideal posture at the start of processing, laying the foundation for subsequent precise machining. Provided the electrode meets the zero-position calibration conditions, it can be guaranteed that the electrode moves according to the designed trajectory and angle during subsequent processing, thereby effectively improving machining accuracy and reducing machining errors.

[0027] S40. Determine the rotation angle of each of the path processing points based on the discharge reference angle parameters, the initial design angle of the starting point processing point, the initial design angle of the path processing point, and the detection reference angle parameters.

[0028] Understandably, the starting processing point is the first electrode processing point. For each path processing point starting from the second electrode processing point, the server needs to determine the rotation angle of each path processing point by combining the discharge reference angle parameter, the initial design angle of the starting processing point, and the initial design angle and detection reference angle parameter of the path processing point. That is, the rotation angle of each path processing point requires the discharge reference angle parameter and the initial design angle of the starting processing point. Since the initial design angle of the starting processing point is consistent with the rotation angle, the rotation angle of each path processing point is based on the relative change angle of the rotation angle of the starting processing point.

[0029] In one embodiment, step S40, namely determining the rotation angle of each of the path processing points based on the discharge reference angle parameter, the initial design angle of the starting point processing point, the initial design angle of the path processing point, and the detection reference angle parameter, includes: S401. Determine the positioning deviation parameter of each of the path processing points based on the discharge reference angle parameter and the detection reference angle parameter of each of the path processing points. S402. Based on the initial design angle of the starting point processing running point and the initial design angle and running deviation parameters of each of the path processing running points, determine the running rotation angle of each of the path processing running points.

[0030] Understandably, when the electrode processing running point is a path processing running point, the server determines the running deviation parameter of each path processing running point based on the discharge reference angle parameter and the detection reference angle parameter of each path processing running point. The discharge reference angle parameter is the quadrant position parameter (value 1, 2, 3, or 4) of the target electrode's electrode reference angle before rotation at the starting processing running point. The detection reference angle parameter needs to be converted before it can be used for data analysis with the discharge reference angle parameter. The converted detection reference angle parameter is the quadrant position parameter (value 1, 2, 3, or 4) of the target electrode's electrode reference angle before rotation at each electrode processing running point. The running deviation parameter refers to the quadrant deviation value (value ±1, ±2, ±3, or 0) calculated by the difference between the discharge reference angle parameter and the converted detection reference angle parameter. The server determines the running rotation angle of each path processing running point based on the initial design angle of the starting processing running point and the initial design angle and running deviation parameter of each path processing running point. Specifically, for each path processing running point, the server calculates the initial design angle difference between the initial design angle of the starting processing running point and the initial design angle of the path processing running point, and calculates the sum of the initial design angle difference and the angle after quadrant difference conversion of the running deviation parameter of the path processing running point to obtain the running rotation angle of the path processing running point.

[0031] This embodiment can accurately calculate the reference angle deviation of each processing point relative to the starting position by using the discharge reference angle and the detection reference angle, providing an accurate basis for subsequent angle rotation adjustments. Simultaneously, this embodiment determines the rotation angle based on the initial design angle of the starting processing point, the initial design angle of each processing point along the path, and the position deviation parameters, ensuring precise angle rotation adjustments for each processing point.

[0032] In one embodiment, step S401, namely determining the positioning deviation parameter of each of the path processing points based on the discharge reference angle parameter and the detection reference angle parameter of each of the path processing points, includes: S4011. Obtain the electrode reference quadrant value corresponding to the discharge reference angle parameter; S4012. The detection reference angle parameters of each of the path processing points are converted to obtain the electrode detection quadrant values ​​of each of the path processing points. S4013. Determine the positioning deviation parameter of each of the path processing points based on the quadrant deviation value between the electrode reference quadrant value and the electrode detection quadrant value of each of the path processing points.

[0033] Understandably, the server obtains the electrode reference quadrant value corresponding to the discharge reference angle parameter. The electrode reference quadrant value is the quadrant value corresponding to the discharge reference angle, such as... Figure 2 The electrode reference angle shown corresponds to the fourth quadrant, so both the discharge reference angle parameter and the electrode reference quadrant value are 4. Next, the server converts the detection reference angle parameter for each processing point along the path to obtain the electrode detection quadrant value for each processing point. The electrode detection quadrant value is the quadrant value corresponding to the converted detection reference angle. Finally, for each processing point along the path, the server determines the quadrant deviation between the electrode reference quadrant value and the electrode detection quadrant value for that processing point as the positioning deviation parameter.

[0034] This embodiment calculates the quadrant deviation between the electrode reference quadrant value and the electrode detection quadrant value, which can accurately determine the deviation of each path processing point relative to the starting processing point. This helps the electrode to accurately adjust its angle during processing, meeting the requirements of high-precision processing.

[0035] In one embodiment, step S4012, namely, converting the detection reference angle parameters of each of the path processing points to obtain the electrode detection quadrant value of each of the path processing points, includes: S40121. For each of the path processing points, obtain the initial detection quadrant value corresponding to the detection reference angle parameter; S40122. Find the electrode detection quadrant value corresponding to the initial detection quadrant value according to the preset conversion relationship table.

[0036] Understandably, for each path processing running point, the server obtains the initial detection quadrant value corresponding to the detection reference angle parameter. This initial detection quadrant value is the quadrant value of the detection reference angle parameter. The reference quadrant division between the discharge reference angle parameter and the detection reference angle parameter in the detection marking program may be inconsistent. For example, the reference quadrant corresponding to the discharge reference angle parameter might be the fourth quadrant (the electrode processing running point needs to start the running rotation angle calculation based on the fourth quadrant), while the reference quadrant corresponding to the detection reference angle parameter might be the first quadrant (the electrode processing running point needs to start the running rotation angle calculation based on the first quadrant). Therefore, the initial detection quadrant value of the path processing running point and the electrode reference quadrant value cannot be directly mathematically calculated. Thus, the server needs to convert the detection reference angle parameter so that the reference quadrant corresponding to the converted detection reference angle parameter is consistent with the reference quadrant corresponding to the discharge reference angle parameter (at this point, the electrode processing running point needs to start the running rotation angle calculation based on the fourth quadrant). The converted electrode detection quadrant value of the path processing running point can then be directly mathematically calculated with the electrode reference quadrant value. The server uses a pre-defined conversion table to find the electrode detection quadrant value corresponding to the initial detection quadrant value. This pre-defined conversion table is a data table that characterizes the mapping relationship between the detection reference angle parameter and the discharge reference angle parameter. Based on a large amount of experimental data, it accurately reflects the correspondence between the initial detection quadrant value and the electrode detection quadrant value. The value before conversion corresponds to the initial detection quadrant value, and the value after conversion corresponds to the electrode detection quadrant value. The electrode detection quadrant value refers to the quadrant position parameter (values ​​of 1, 2, 3, or 4) of the target electrode's reference angle before rotation at each electrode processing offset point.

[0037] In one embodiment, based on a preset conversion table, it is known that when the initial detection quadrant value before the conversion of the detection reference angle parameter is 1, the converted electrode detection quadrant value is 2; when the initial detection quadrant value before the conversion of the detection reference angle parameter is 2, the converted electrode detection quadrant value is 1; when the initial detection quadrant value before the conversion of the detection reference angle parameter is 3, the converted electrode detection quadrant value is 4; and when the initial detection quadrant value before the conversion of the detection reference angle parameter is 4, the converted electrode detection quadrant value is 3. Specifically, the initial detection quadrant value corresponding to the detection reference angle parameter is represented by "num5", and the electrode detection quadrant value is represented by "num4". The preset conversion table can be represented using the following characters.

[0038] if (num5 == "1") num4 = (2); if (num5 == "2") num4 = (1); if (num5 == "3") num4 = (4); if (num5 == "4") num4 = (3).

[0039] This embodiment provides a unified reference standard for subsequent mathematical calculations between electrode detection quadrant values ​​and electrode reference quadrant values ​​by converting the initial detection quadrant values ​​corresponding to the detection reference angle parameters. The preset conversion table organizes and summarizes the correspondence between the initial detection quadrant values ​​and electrode detection quadrant values. The corresponding electrode detection quadrant value can be quickly obtained through a simple lookup operation, eliminating the need for complex calculations or reasoning and greatly saving time.

[0040] In one embodiment, step S402, namely determining the rotation angle of each path processing point based on the initial design angle of the starting point processing point and the initial design angle and positioning deviation parameter of each path processing point, includes: S4021. Determine the basic rotation angle of each of the processing points of the path based on the positioning deviation parameter of each processing point of the path. S4022. Determine the rotation angle of each of the path processing points based on the initial design angle and basic rotation angle of each processing point and the initial design angle of the starting point processing point.

[0041] Understandably, each path processing running point corresponds to a running point deviation parameter, and each running point deviation parameter corresponds to a basic running point rotation angle. The basic running point rotation angle refers to the angle required to adjust the electrode reference angle of the target electrode based on the running point deviation parameter of the path processing running point. The value of the basic running point rotation angle is 0°, 90°, 180°, or 270°. The basic running point rotation angle is the angle required to adjust the electrode reference angle of the target electrode to meet the quadrant requirements of the path processing running point, enabling quantitative analysis of the quadrant deviation between each path processing running point and the starting processing running point. The running point rotation angle is the angle required to adjust the electrode reference angle of the target electrode to simultaneously meet the quadrant requirements of the path processing running point and the initial design angle requirements.

[0042] In one embodiment, the positioning rotation angle is represented by "num3", the electrode detection quadrant value is represented by "num4", the initial detection quadrant value corresponding to the detection reference angle parameter is represented by "num5", the discharge reference angle parameter is represented by "num6", the positioning deviation parameter is represented by "num7", and the difference between the initial design angle of the path processing positioning point and the initial design angle of the starting processing positioning point is represented by "num8". There is a conversion relationship between num5 and num4 (e.g., num5 = "1" corresponds to num4 = 2); num7 refers to the difference between num6 and num4, taking a value of 0, ±1, ±2, or ±3. Different positioning deviation parameters correspond to different basic positioning rotation angles, and the positioning rotation angle is the sum of the basic positioning rotation angle and num8. Specifically, when num7 is 0, num3 = 0° + num8; when num7 is 1 or -3, num3 = 90° + num8; when num7 is 2 or -2, num3 = 180° + num8; and when num7 is 3 or -1, num3 = 270° + num8. The following characters can be used to represent this.

[0043] if (num7 == 0) num3 = (0) + num8; if(num7 == 1‖ num7 == -3) num3 = (90) + num8; if (num7 == 2 ‖ num7 == -2) num3 = (180) + num8; if (num7 == 3 ‖ num7 == -1) num3 = (270) + num8.

[0044] This embodiment decomposes the determination process of the machining rotation angle into two aspects: the basic machining rotation angle and the analysis combined with the initial design angle. Firstly, the basic machining rotation angle is determined based on the machining deviation parameters, allowing for direct quantitative analysis of the quadrant deviation between each path machining point and the starting machining point, and determining the angle requiring compensation. Secondly, when determining the machining rotation angle for each path machining point, not only is the quadrant deviation considered, but also the initial design angle deviation between each path machining point and the starting machining point is quantitatively analyzed to determine the angle requiring compensation. This embodiment, combining quadrant deviation and initial design angle deviation, helps improve the accuracy of the relative positional relationship between each path machining point and the starting machining point throughout the machining path, avoiding a decrease in overall machining accuracy due to the accumulation of local deviations.

[0045] S50. Based on the rotation angle of the starting point processing point and the rotation angle of all the path processing points, control the target electrode to complete the workpiece processing according to the processing sequence information.

[0046] Understandably, the server controls the target electrode to complete the processing of the first electrode processing point based on the rotation angle of the starting processing point. Then, according to the processing sequence information, the server controls the target electrode to complete the processing of the second, third, and so on electrode processing points based on the rotation angle of each path processing point. After completing the processing of all electrode processing points, the server confirms that the workpiece processing is complete.

[0047] This embodiment acquires the discharge reference angle parameters and machining positioning design information of the target electrode. The machining positioning design information includes the machining sequence information, initial design angle, and detection reference angle parameters of multiple electrode machining positioning points. Based on the machining sequence information, the starting machining positioning point and at least one path machining positioning point are determined among all electrode machining positioning points. Based on the initial design angle of the starting machining positioning point, the positioning rotation angle of the starting machining positioning point is determined. Based on the discharge reference angle parameters, the initial design angle of the starting machining positioning point, the initial design angle of the path machining positioning point, and the detection reference angle parameters, the positioning rotation angle of each path machining positioning point is determined. Based on the positioning rotation angle of the starting machining positioning point and the positioning rotation angles of all path machining positioning points, the target electrode is controlled to complete the workpiece machining according to the machining sequence information. This embodiment determines the starting machining positioning point and path machining positioning point based on the machining sequence information, and automatically calculates the corresponding positioning rotation angle using different methods according to the characteristics of different machining positioning points. The rotation angle calculation of the path machining positioning point is based on the same starting machining positioning point, which improves the calculation efficiency. Meanwhile, this embodiment can accurately calculate the deviation between the design parameters and the detection parameters of the relative positional relationship between the target electrode and the workpiece, thereby ensuring the accuracy of the angle adjustment of the target electrode at each processing point and improving the processing efficiency and the accuracy of electrode processing control.

[0048] It should be understood that the sequence number of each step in the above embodiments does not imply the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present invention.

[0049] In one embodiment, an electrode processing control device is provided, which corresponds one-to-one with the electrode processing control method described in the above embodiments. For example... Figure 3 As shown, the electrode processing control device includes an information acquisition module 10, a running point division module 20, a starting point running point analysis module 30, a path point running point analysis module 40, and an electrode control module 50. Detailed descriptions of each functional module are as follows: The information acquisition module 10 is used to acquire the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. The machining point division module 20 is used to determine the starting machining point and at least one path machining point among all the electrode machining points according to the processing sequence information. The starting point positioning analysis module 30 is used to determine the positioning rotation angle of the starting point processing point based on the initial design angle of the starting point processing point. The path point positioning analysis module 40 is used to determine the positioning rotation angle of each of the path processing points based on the discharge reference angle parameters, the initial design angle of the starting point processing point, the initial design angle of the path processing point, and the detection reference angle parameters. The electrode control module 50 is used to control the target electrode to complete the workpiece processing according to the processing sequence information based on the rotation angle of the starting point processing point and the rotation angle of all the path processing points.

[0050] In one embodiment, the path point positioning analysis module 40 includes: The positioning deviation parameter determination unit is used to determine the positioning deviation parameter of each of the path processing points based on the discharge reference angle parameter and the detection reference angle parameter of each of the path processing points. The path positioning rotation angle determination unit is used to determine the positioning rotation angle of each path processing point based on the initial design angle of the starting point processing point and the initial design angle and positioning deviation parameters of each path processing point.

[0051] In one embodiment, the path point positioning analysis module 40 further includes: An electrode reference quadrant value acquisition unit is used to acquire the electrode reference quadrant value corresponding to the discharge reference angle parameter. The conversion processing unit is used to convert the detection reference angle parameters of each of the path processing points to obtain the electrode detection quadrant values ​​of each of the path processing points. The positioning deviation parameter determination unit is used to determine the positioning deviation parameter of each of the path processing points based on the quadrant deviation value between the electrode reference quadrant value and the electrode detection quadrant value of each of the path processing points.

[0052] In one embodiment, the path point positioning analysis module 40 further includes: The initial detection quadrant value acquisition unit is used to acquire the initial detection quadrant value corresponding to the detection reference angle parameter for each of the path processing points. The electrode detection quadrant value determination unit is used to find the electrode detection quadrant value corresponding to the initial detection quadrant value according to a preset conversion relationship table.

[0053] In one embodiment, the path point positioning analysis module 40 further includes: The basic positioning rotation angle determination unit is used to determine the basic positioning rotation angle of each of the path processing points based on the positioning deviation parameters of each of the path processing points. The positioning rotation angle determination unit is used to determine the positioning rotation angle of each of the path processing points based on the initial design angle and basic positioning rotation angle of each of the path processing points and the initial design angle of the starting point processing point.

[0054] In one embodiment, the running point division module 20 includes: The starting point processing location determination unit is used to find the first electrode processing location from all the electrode processing locations according to the processing sequence information, and determine the first electrode processing location as the starting point processing location. The path processing location determination unit is used to determine the electrode processing locations other than the first electrode processing location from all the electrode processing locations as path processing locations.

[0055] In one embodiment, the starting position analysis module 30 includes: Angle acquisition unit is used to acquire the angle between the target electrode and the processing axis when the target electrode is in the posture corresponding to the discharge reference angle parameter; The calibration condition analysis unit is used to determine that the target electrode meets the zero-position calibration condition if the included angle of the electrode axis is less than a preset included angle threshold, and to determine the initial design angle of the starting point processing running point as the running rotation angle of the starting point processing running point.

[0056] Specific limitations regarding the electrode processing control device can be found in the limitations of the electrode processing control method described above, and will not be repeated here. Each module in the aforementioned electrode processing control device can be implemented entirely or partially through software, hardware, or a combination thereof. These modules can be embedded in or independent of the processor in a computer device in hardware form, or stored in the memory of a computer device in software form, so that the processor can call and execute the operations corresponding to each module.

[0057] In one embodiment, a computer device is provided, which may be a server, and its internal structure diagram may be as follows: Figure 4As shown, the computer device includes a processor, memory, network interface, and database connected via a system bus. The processor provides computational and control capabilities. The memory includes a readable storage medium and internal memory. The readable storage medium stores an operating system, computer-readable instructions, and a database. The internal memory provides an environment for the operation of the operating system and computer-readable instructions in the readable storage medium. The database stores data related to the electrode processing control method. The network interface communicates with external terminals via a network connection. When the computer-readable instructions are executed by the processor, they implement an electrode processing control method. The readable storage medium provided in this embodiment includes both non-volatile and volatile readable storage media.

[0058] In one embodiment, a computer device is provided, including a memory, a processor, and computer-readable instructions stored in the memory and executable on the processor, wherein the processor performs the following steps when executing the computer-readable instructions: Obtain the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. Based on the processing sequence information, determine the starting processing location and at least one path processing location among all the electrode processing locations; Based on the initial design angle of the starting point processing running point, determine the running rotation angle of the starting point processing running point; Based on the discharge reference angle parameter, the initial design angle of the starting point processing running point, the initial design angle of the path processing running point, and the detection reference angle parameter, the running rotation angle of each of the path processing running points is determined. Based on the rotation angle of the starting processing point and the rotation angle of all the path processing points, the target electrode is controlled to complete the workpiece processing according to the processing sequence information.

[0059] In one embodiment, one or more computer-readable storage media storing computer-readable instructions are provided. The readable storage media provided in this embodiment include non-volatile readable storage media and volatile readable storage media. The readable storage media stores computer-readable instructions, which, when executed by one or more processors, perform the following steps: Obtain the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. Based on the processing sequence information, determine the starting processing location and at least one path processing location among all the electrode processing locations; Based on the initial design angle of the starting point processing running point, determine the running rotation angle of the starting point processing running point; Based on the discharge reference angle parameter, the initial design angle of the starting point processing running point, the initial design angle of the path processing running point, and the detection reference angle parameter, the running rotation angle of each of the path processing running points is determined. Based on the rotation angle of the starting processing point and the rotation angle of all the path processing points, the target electrode is controlled to complete the workpiece processing according to the processing sequence information.

[0060] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by instructing related hardware with computer-readable instructions. These computer-readable instructions can be stored in a non-volatile readable storage medium or a volatile readable storage medium. When executed, these computer-readable instructions can include the processes of the embodiments of the above methods. Any references to memory, storage, databases, or other media used in the embodiments provided by this invention can include non-volatile and / or volatile memory. Non-volatile memory may include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), or flash memory. Volatile memory may include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in a variety of forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), dual data rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous link DRAM (SLDRAM), RAMbus direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM), etc.

[0061] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the above-described division of functional units and modules is used as an example. In practical applications, the above functions can be assigned to different functional units and modules as needed, that is, the internal structure of the device can be divided into different functional units or modules to complete all or part of the functions described above.

[0062] The above-described embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention, and should all be included within the protection scope of the present invention.

Claims

1. A method for controlling electrode processing, characterized in that, include: Obtain the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. Based on the processing sequence information, determine the starting processing location and at least one path processing location among all the electrode processing locations; Based on the initial design angle of the starting point processing running point, determine the running rotation angle of the starting point processing running point; Based on the discharge reference angle parameter, the initial design angle of the starting point processing running point, the initial design angle of the path processing running point, and the detection reference angle parameter, the running rotation angle of each of the path processing running points is determined. Based on the rotation angle of the starting processing point and the rotation angle of all the path processing points, the target electrode is controlled to complete the workpiece processing according to the processing sequence information.

2. The electrode processing control method as described in claim 1, characterized in that, The step of determining the rotation angle of each of the path processing points based on the discharge reference angle parameter, the initial design angle of the starting processing point, the initial design angle of the path processing point, and the detection reference angle parameter includes: Based on the discharge reference angle parameter and the detection reference angle parameter of each of the path processing points, the positioning deviation parameter of each of the path processing points is determined. Based on the initial design angle of the starting point processing point and the initial design angle and running position deviation parameters of each of the path processing points, the running position rotation angle of each of the path processing points is determined.

3. The electrode processing control method as described in claim 2, characterized in that, The step of determining the positioning deviation parameter of each of the path processing points based on the discharge reference angle parameter and the detection reference angle parameter of each of the path processing points includes: Obtain the electrode reference quadrant value corresponding to the discharge reference angle parameter; The detection reference angle parameters of each of the aforementioned path processing points are converted to obtain the electrode detection quadrant values ​​of each of the aforementioned path processing points. The positioning deviation parameter of each path processing point is determined based on the quadrant deviation value between the electrode reference quadrant value and the electrode detection quadrant value of each path processing point.

4. The electrode processing control method as described in claim 3, characterized in that, The conversion of the detection reference angle parameters for each of the path processing points to obtain the electrode detection quadrant values ​​for each path processing point includes: For each of the aforementioned path processing points, obtain the initial detection quadrant value corresponding to the detection reference angle parameter; The electrode detection quadrant value corresponding to the initial detection quadrant value is found according to the preset conversion table.

5. The electrode processing control method as described in claim 2, characterized in that, The step of determining the rotation angle of each path processing point based on the initial design angle of the starting processing point and the initial design angle and positioning deviation parameters of each path processing point includes: The basic rotation angle of each of the processing points along the path is determined based on the positioning deviation parameter of each processing point along the path. The rotation angle of each path processing point is determined based on the initial design angle and basic rotation angle of each path processing point, as well as the initial design angle of the starting point processing point.

6. The electrode processing control method as described in claim 1, characterized in that, The step of determining the starting processing location and at least one path processing location among all the electrode processing locations based on the processing sequence information includes: Based on the processing sequence information, the first electrode processing running point is found from all the electrode processing running points, and the first electrode processing running point is determined as the starting processing running point. The electrode processing locations excluding the first electrode processing location from all the electrode processing locations are determined as path processing locations.

7. The electrode processing control method as described in claim 1, characterized in that, The step of determining the rotation angle of the starting processing point based on the initial design angle of the starting processing point includes: When the target electrode is in the posture corresponding to the discharge reference angle parameter, the included angle between the target electrode and the processing axis is obtained; If the included angle of the electrode axis is less than the preset included angle threshold, then the target electrode is determined to meet the zero-position calibration condition, and the initial design angle of the starting point processing running point is determined as the running rotation angle of the starting point processing running point.

8. An electrode processing control device, characterized in that, include: The information acquisition module is used to acquire the discharge reference angle parameters and processing positioning design information of the target electrode. The processing positioning design information includes the processing sequence information of multiple electrode processing positioning points, the initial design angle, and the detection reference angle parameters. The machining point division module is used to determine the starting machining point and at least one path machining point among all the electrode machining points based on the processing sequence information. The starting point positioning analysis module is used to determine the positioning rotation angle of the starting point processing point based on the initial design angle of the starting point processing point. The path point positioning analysis module is used to determine the positioning rotation angle of each of the path processing points based on the discharge reference angle parameters, the initial design angle of the starting point processing point, the initial design angle of the path processing point, and the detection reference angle parameters. The electrode control module is used to control the target electrode to complete the workpiece processing according to the processing sequence information based on the rotation angle of the starting processing point and the rotation angle of all the path processing points.

9. A computer device comprising a memory, a processor, and computer-readable instructions stored in the memory and executable on the processor, characterized in that, When the processor executes the computer-readable instructions, it implements the electrode processing control method as described in any one of claims 1 to 7.

10. A computer-readable storage medium storing computer-readable instructions, characterized in that, When the computer-readable instructions are executed by one or more processors, the one or more processors cause the electrode processing control method as described in any one of claims 1 to 7 to be performed.

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