A method and system for automatically adjusting a constant temperature zone of a vertical furnace heat treatment device

Abstract

The present application relates to the technical field of semiconductor equipment reaction furnace temperature control, and more particularly to a vertical furnace heat treatment equipment constant temperature zone automatic adjustment method and system. The method includes establishing an initial model for representing the correlation between the constant temperature zone discrete unit temperature of the furnace tube and the temperature of each temperature zone, taking the initial model as the current model; calculating the temperature target value of each temperature zone temperature so that the constant temperature zone temperature distribution meets the predetermined condition; controlling the temperature of each temperature zone according to the temperature target value and obtaining the actual temperature data of the constant temperature zone; judging whether the actual temperature of the constant temperature zone converges within the allowable deviation, if yes, ending the adjustment; if not, updating the model parameters of the current model based on the actual temperature data, taking the updated model as the new current model, and repeating the above steps. The present application realizes automatic, rapid and accurate adjustment of the constant temperature zone temperature distribution by establishing the correlation model of the constant temperature zone discrete unit and the temperature zone temperature and combining closed loop iteration.

Description

Technical Field

[0001] This invention relates to the field of temperature control technology for semiconductor equipment reactors, and more specifically, to a method and system for automatic adjustment of the constant temperature zone in a vertical furnace heat treatment equipment. Background Technology

[0002] Vertical furnace heat treatment equipment is a key process equipment in semiconductor manufacturing, widely used in low-pressure chemical vapor deposition (LPCVD), oxidation, diffusion, and other processes. The core component of vertical furnace heat treatment equipment is the main reactor. The furnace tubes must create a temperature environment that meets the process requirements. The accuracy of temperature control in the main reactor has a decisive impact on wafer processing quality and the consistency of mass production.

[0003] A key indicator for evaluating the temperature control performance of vertical furnace heat treatment equipment is the uniformity of temperature distribution in the flat zone. The flat zone refers to the area within the furnace tube where temperature fluctuations are strictly controlled within a very small range. The flatness of its temperature curve directly determines the consistency of batch wafer processing and product yield. In practical applications, before each reactor is put into use or after periodic maintenance, a dedicated, vertically movable temperature measuring fixture (FlatZone testing fixture) is used to measure the temperature change curve inside the furnace tube reaction chamber (hereinafter referred to as the flat zone curve) from top to bottom. Based on the measured flat zone curve, the equipment manufacturer adjusts the temperature setpoint correction values ​​for each temperature zone, ultimately ensuring that the flat zone curve varies within a certain range above and below the target temperature value to meet process requirements.

[0004] The adjustment process of the isothermal zone curve in existing vertical furnace heat treatment equipment generally relies on experienced engineers on-site to manually adjust it based on their past operating experience. This method has the following problems: First, manual adjustment is highly dependent on the engineer's experience, and the varying skill levels and experience of different engineers can easily lead to unstable adjustment accuracy, making it difficult to ensure that the temperature uniformity of the isothermal zone consistently meets process standards. Second, the manual adjustment process is cumbersome, typically taking 2 to 3 days, which is time-consuming and labor-intensive, severely impacting the equipment's production efficiency and the flexibility of process switching. Furthermore, manual adjustment is ill-suited to addressing thermal field drift caused by equipment aging, environmental changes, and other factors, making it difficult to maintain the stability of the isothermal zone in the long term.

[0005] Therefore, there is an urgent need for a new method for automatic adjustment of the constant temperature zone in vertical furnace heat treatment equipment to improve the accuracy and stability of temperature adjustment in the constant temperature zone and meet the process requirements of semiconductor mass production. Summary of the Invention

[0006] The purpose of this invention is to provide an automatic adjustment method and system for the constant temperature zone of a vertical furnace heat treatment equipment, which solves the problems of existing methods for adjusting the constant temperature zone of vertical furnace heat treatment equipment, such as reliance on manual experience, long time consumption, low accuracy, and difficulty in adapting to changes in equipment status.

[0007] To achieve the above objectives, the present invention provides a method for automatically adjusting the constant temperature zone of a vertical furnace heat treatment equipment, comprising the following steps: Step S1: Establish an initial model, which is used to characterize the relationship between the discrete unit temperature of the furnace tube constant temperature zone and the temperature of each temperature zone. The initial model is used as the current model. Step S2: Calculate the target temperature value of each temperature zone based on the current model, so that the temperature distribution of the constant temperature zone meets the predetermined condition, wherein the predetermined condition is that the deviation of the discrete unit temperature of the constant temperature zone from the preset target temperature is minimized overall. Step S3: Control the temperature of each temperature zone according to the target temperature value, and obtain the actual temperature data of the constant temperature zone; Step S4: Determine whether the actual temperature of the constant temperature zone has converged to within the allowable deviation. If so, then end the adjustment; If not, update the model parameters of the current model based on the actual temperature data, and use the updated model as the new current model, then repeat steps S2 to S4.

[0008] In some embodiments, in step S1, the constant temperature zone of the furnace tube is uniformly divided into several discrete units along the vertical direction, and the temperature of each discrete unit is equal to the sum of the temperatures of each temperature zone multiplied by the corresponding weighting coefficient.

[0009] In some embodiments, in step S1, the number of discrete units is a preset value, and the discrete units are divided at equal intervals along the vertical height direction of the furnace tube constant temperature zone.

[0010] In some embodiments, in step S1, the initial weighting coefficients of each discrete unit corresponding to each temperature zone are obtained through experiments to form an initial weighting coefficient matrix.

[0011] In some embodiments, in step S1, the temperature of each temperature zone is adjusted individually in sequence, and the temperature distribution of the constant temperature zone is measured to calculate the initial weighting coefficient matrix.

[0012] In some embodiments, the specific process of calculating the initial weight coefficient matrix includes: Establish a baseline state and collect the baseline temperature of each discrete unit; Each temperature zone was individually and temperature excitation was applied sequentially, and the corresponding response temperature was collected. Based on the temperature change before and after excitation in each temperature zone, the weight coefficients of each discrete unit corresponding to each temperature zone are calculated, and then the initial weight coefficient matrix is ​​formed.

[0013] In some embodiments, the vertical furnace heat treatment equipment includes a heat exchange system; The heat exchange system includes a furnace tube reaction chamber, a wafer placement area, a heater, a temperature acquisition component, a temperature control flange, and thermal insulation components. The furnace tube reaction chamber is provided with an internal space for accommodating the wafer placement area; The heater is arranged around the outer wall of the furnace tube reaction chamber to provide heat to each temperature zone; The temperature acquisition component is installed at a corresponding position in the furnace tube reaction chamber and is used to acquire temperature data. The temperature control flange is located at the bottom of the furnace tube reaction chamber and is used to maintain a constant bottom temperature through heat exchange with a cooling medium. The heat insulation and isolation components are installed between the heater and the furnace tube reaction chamber, and between the wafer placement area and the external environment, to reduce heat loss and isolate thermal radiation.

[0014] In some embodiments, the heater is matched with the outer wall surface of the sidewall of the furnace tube reaction chamber and corresponds to each temperature zone inside the furnace tube; The temperature acquisition component includes: The internal sensor is located on the inner wall of the furnace tube reaction chamber, near the wafer side; An external sensor is installed on the outer wall surface of the heater, near the heater side; A movable temperature sensor is installed inside a quartz sleeve extending from the bottom of the furnace tube reaction chamber and moves vertically to collect temperature curve data in the constant temperature zone.

[0015] In some embodiments, the thermal insulation component includes: An insulation layer, installed on the outer wall of the heater, is used to prevent heat loss to the external environment; A transparent isolation cover is installed outside the furnace tube reaction chamber to isolate external air from the wafer placement area; A radiation shielding plate is placed below the wafer placement area to isolate the wafer and heater from radiative heat transfer to the bottom temperature control flange.

[0016] In some embodiments, in step S2, the predetermined condition is that the sum of squares of temperature deviations of discrete units in the isothermal zone is minimized; Step S2 includes: Step S21: Write the current model in incremental form; Step S22: Set a cost function, which is used to quantify the non-uniformity of temperature in the discrete unit of the isothermal zone; Step S23: Simultaneously solve the incremental model equations and the cost function, and calculate the adjustment amount of the temperature target value for each temperature zone to minimize the cost function. Step S24: Add the original target temperature values ​​for each temperature zone to the corresponding adjustment amounts to obtain new target temperature values ​​for each temperature zone.

[0017] In some embodiments, in step S23, a quadratic programming method is used to calculate the adjustment amount of the target temperature value for each temperature zone.

[0018] In some embodiments, in step S3, the actual temperature of each temperature zone is stabilized within ±0.3 degrees Celsius of the corresponding temperature target value.

[0019] In some embodiments, in step S4, the model parameters are the weight coefficient matrix in the initial model, and the weight coefficient matrix is ​​updated based on the actual temperature data of the isothermal zone using the recursive least squares method.

[0020] To achieve the above objectives, the present invention provides an automatic adjustment system for the constant temperature zone of a vertical furnace heat treatment equipment, comprising: The furnace tube reaction chamber has a wafer placement area inside for supporting the wafers; Multiple heaters, each corresponding to a temperature zone inside the furnace tube, are arranged around the outer wall of the furnace tube reaction chamber. A temperature acquisition component is installed at a corresponding position in the reaction chamber of the furnace tube for acquiring temperature data; A temperature control flange is located at the bottom of the furnace tube reaction chamber and is used to maintain a constant bottom temperature through heat exchange with a cooling medium. Thermal insulation components are disposed between the heater and the furnace tube reaction chamber, and between the wafer placement area and the external environment, to reduce heat loss and isolate thermal radiation; The controller is connected to the heater, the temperature acquisition component and the temperature control flange respectively, and the controller is configured to execute the automatic adjustment method of the constant temperature zone of the vertical furnace heat treatment equipment as described above.

[0021] In some embodiments, the temperature acquisition component includes: The internal sensor is located on the inner wall of the furnace tube reaction chamber, near the wafer side; An external sensor is installed on the outer wall surface of the heater, near the heater side; A movable temperature sensor is installed inside a quartz sleeve extending from the bottom of the furnace tube reaction chamber and moves vertically to collect temperature curve data in the constant temperature zone.

[0022] This invention provides an automatic adjustment method and system for the constant temperature zone of a vertical furnace heat treatment equipment. By establishing a correlation model between the discrete units of the constant temperature zone and the temperature of the zone, and combining it with closed-loop iteration, the automatic, rapid and accurate adjustment of the temperature distribution in the constant temperature zone is achieved. This results in significantly shortening the adjustment cycle, improving the temperature uniformity of the constant temperature zone, reducing reliance on manual labor, and ensuring the consistency and stability of batch wafer heat treatment processes. Attached Figure Description

[0023] The above and other features, properties and advantages of the present invention will become more apparent from the following description taken in conjunction with the accompanying drawings and embodiments, in which the same reference numerals always denote the same features, wherein: Figure 1 A flowchart of an automatic adjustment method for the constant temperature zone of a vertical furnace heat treatment equipment according to an embodiment of the present invention is disclosed; Figure 2 A schematic block diagram of the heat exchange system of a vertical furnace heat treatment device according to an embodiment of the present invention is disclosed. Figure 3 An installation schematic diagram of a temperature acquisition component according to an embodiment of the present invention is disclosed; Figure 4 A flowchart for obtaining the initial weight coefficient matrix according to an embodiment of the present invention is disclosed.

[0024] The meanings of the labels in the figures are as follows: 1. Furnace tube reaction chamber; 21. First heater; 22. Second heater; 23. The third heater; 24. Fourth heater; 25. The fifth heater; 311 First internal sensor; 312 Second internal sensor; 313 Third internal sensor; 314 Fourth Internal Sensor; 315 Fifth Internal Sensor; 321 First external sensor; 322 Second external sensor; 323 Third external sensor; 324 Fourth external sensor; 325 Fifth External Sensor; 33. Portable temperature sensor; 4. Temperature control flange; 51. Insulation layer; 52 transparent isolation shields; 53 Radiation shielding plate; 6. Wafer placement area; 61 wafers; 7. Controller. Detailed Implementation

[0025] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the invention.

[0026] To address the problems of low automation, poor adjustment efficiency, unstable accuracy, and reliance on manual experience in the constant temperature zone adjustment process of existing vertical furnace heat treatment equipment, this invention provides an automatic adjustment method for the constant temperature zone of vertical furnace heat treatment equipment. Based on data-driven and closed-loop iterative control principles, this method achieves automatic, rapid, and precise adjustment of the constant temperature zone. The method involves a closed-loop control process: establishing an initial model, optimizing and calculating the target temperature value, executing control and collecting feedback data, and iteratively optimizing the model parameters based on the feedback data, until the temperature distribution in the constant temperature zone meets the requirements of semiconductor processes.

[0027] It should be noted that the vertical furnace heat treatment equipment described in this invention can be an ALD furnace tube device, or other types of semiconductor heat treatment equipment such as LPCVD equipment, oxidation furnace, diffusion furnace, etc. This invention does not limit it.

[0028] Figure 1 A flowchart illustrating the steps of an automatic adjustment method for the constant temperature zone of a vertical furnace heat treatment device according to an embodiment of the present invention is disclosed, as follows: Figure 1 As shown, the overall process of the automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment proposed in this invention is as follows: First, step S1 is executed to establish an initial model. This initial model is used to characterize the relationship between the temperature of the discrete unit in the furnace tube isothermal zone and the temperature of each temperature zone. This model is the basis for all subsequent calculations and optimizations, and its accuracy directly determines the efficiency and effectiveness of the isothermal zone adjustment.

[0029] Next, step S2 is executed, which calculates a set of target values ​​for the temperature of each temperature zone based on the current (initial or updated) model, such that the temperature distribution of the isothermal zone predicted by the model under the set of target temperature values ​​can meet the predetermined conditions (e.g., the most uniform temperature distribution).

[0030] Then, step S3 is executed, sending the target temperature values ​​for each temperature zone calculated in step S2 to the temperature control system. Based on these target values, the actual temperature of each temperature zone is precisely controlled. After the temperature stabilizes, actual temperature data at each location within the constant temperature zone is acquired using movable temperature sensors and other devices, providing a basis for subsequent judgment and optimization.

[0031] Finally, step S4 is executed to determine whether the actual temperature distribution of the isothermal zone obtained in step S3 has converged to within the allowable deviation range of the process. If convergence has occurred, the adjustment process ends, and the current target temperature value for each temperature zone is the final set value. If convergence has not yet occurred, based on the actual temperature data obtained this time, the model parameters of the current model in step S2 are updated using a system identification method (such as recursive least squares method) to obtain an updated model that more closely reflects the current actual physical characteristics of the equipment as the current model. Steps S2 to S4 are then repeated until the actual temperature distribution of the isothermal zone meets the convergence condition.

[0032] The automatic adjustment method for the constant temperature zone of vertical furnace heat treatment equipment proposed in this invention transforms the manual adjustment process of the constant temperature zone, which originally relied on human experience, was time-consuming and prone to errors, into an automated and intelligent optimization process through the aforementioned closed-loop iterative adjustment strategy. This significantly reduces labor costs, shortens the time for equipment debugging and process switching, and can effectively cope with model deviations caused by factors such as equipment aging and environmental changes, ensuring the accuracy and stability of the constant temperature zone adjustment.

[0033] These steps will be described in detail below. It should be understood that, within the scope of this invention, the above-described technical features of this invention and the technical features specifically described below (such as in the embodiments) can be combined and related to each other to form preferred technical solutions.

[0034] Step S1: Establish an initial model. The initial model is used to characterize the correlation between the discrete unit temperature of the furnace tube constant temperature zone and the temperature of each temperature zone. The initial model is used as the current model.

[0035] The core of step S1 is to establish an initial model that can accurately describe the internal thermal behavior of the furnace tube, providing a reliable mathematical basis for subsequent optimization calculations.

[0036] In a preferred embodiment, the initial model is achieved by discretizing the continuous isothermal zone and establishing a linear relationship between it and the heating temperature zone.

[0037] In semiconductor thermal processing equipment (such as LPCVD, oxidation furnaces, diffusion furnaces, ALD furnace tube equipment, etc.), the flat zone refers to the area inside the furnace tube where the temperature distribution is highly uniform. Temperature fluctuations are strictly controlled within a very small range (typically ±0.5℃ to ±1℃) to ensure consistency in batch wafer processing. In actual production, semiconductor thermal processing equipment typically has multiple temperature measurement points (e.g., 5). Although these measurement points are all controlled at the target temperature (e.g., 450℃), the overall temperature curve from top to bottom inside the furnace tube still varies. The purpose of this method for adjusting the flat zone is precisely to control the variation of the entire temperature curve within the target range (e.g., ±0.5℃).

[0038] The implementation of this method relies on a vertical furnace heat treatment equipment with a specific structure. The specific structure of its heat exchange system is as follows, which provides the physical basis for the establishment of the initial model.

[0039] Figure 2 A schematic block diagram of the heat exchange system of a vertical furnace heat treatment apparatus according to an embodiment of the present invention is disclosed, such as... Figure 2 As shown, the vertical furnace heat treatment equipment of the present invention includes a heat exchange system, which includes a furnace tube reaction chamber 1, a wafer placement area 6, a heater, a temperature acquisition component, a temperature control flange 4, and a heat insulation component, etc. The specific structure and function of each component are as follows: The wafer placement area 6 is installed at the center of the furnace tube reaction chamber 1 by means of a quartz support, and includes several sub-areas distributed from top to bottom.

[0040] In this embodiment, the wafer placement area 6 includes 3 sub-areas, each of which holds a wafer 61; a temperature control zone (i.e., a temperature zone) is formed between each sub-area, the upper surface of the wafer placement area and the furnace tube reaction chamber, and the lower surface of the wafer placement area 6 and the furnace tube reaction chamber 1, for a total of 5 temperature zones.

[0041] like Figure 2 As shown, the furnace tube reaction chamber 1 is provided with an internal space for accommodating the wafer placement area 6, and the furnace tube reaction chamber 1 is a cylindrical structure.

[0042] The heaters are arranged around the outer wall of the furnace tube reaction chamber 1. In this embodiment, the heaters include a first heater 21, a second heater 22, a third heater 23, a fourth heater 24, and a fifth heater 25, which correspond one-to-one with the temperature zones in the furnace tube and are used to provide heat to each temperature zone. They are also matched with the outer wall of the side wall of the furnace tube reaction chamber 1.

[0043] The temperature acquisition component is located at a corresponding position in the furnace tube reaction chamber 1 and is used to acquire temperature data. More specifically, the temperature acquisition component includes: The inner sensor (Inner TC) is located on the inner wall of the furnace tube reaction chamber 1, near the wafer 61. It is used to measure the temperature of the area near the wafer, which serves as a representative value of the actual temperature of each temperature zone, providing temperature input data for model optimization. The external sensor (Outer TC) is installed on the outer wall of the heater, close to the heater, to measure the temperature of the heater body and help determine the heater's working status and temperature stability in the temperature zone. The movable temperature sensor (Flat-zone TC) 33 is installed inside the quartz sleeve extending from the bottom of the furnace tube reaction chamber 1. It can move vertically to collect temperature curve data of the constant temperature zone, which is used to obtain the actual temperature distribution of each discrete unit in the constant temperature zone, providing the core basis for convergence judgment and model parameter update in step S4.

[0044] Furthermore, between the heater and the wafer placement area 6, a number of temperature sensors (10 in this embodiment) are evenly arranged along five horizontal planes from top to bottom to reflect the cavity temperature. The five sensors closest to the heater are external sensors (Outer TC), namely the first external sensor 321, the second external sensor 322, the third external sensor 323, the fourth external sensor 324, and the fifth external sensor 325. Their measured values ​​are close to the temperature of the heater body. The five sensors closest to the wafer side are inner TCs, namely the first inner sensor 311, the second inner sensor 312, the third inner sensor 313, the fourth inner sensor 314, and the fifth inner sensor 315. Their measured values ​​are close to the temperature of the wafer region.

[0045] Figure 3 A schematic diagram of the installation of a temperature acquisition component according to an embodiment of the present invention is disclosed, taking the first external sensor 321, the first internal sensor 311, and the first heater 21 as examples for illustration: the movable temperature sensor 33 has a hollow long tube as its movement space, and the movable temperature sensor 33 is placed in it. The temperature curve measured by its movement from top to bottom is the temperature distribution curve of the constant temperature zone. The first internal sensor 311 is installed on the outside of the temperature zone through a quartz capillary tube extending from the bottom of the furnace tube reaction chamber 1. The first internal sensor 311 is close to the wafer 61. On the same radial circle as the first internal sensor 311, the movable temperature sensor 33 has a movement space reserved through the quartz capillary tube extending from the bottom of the furnace tube reaction chamber 1. The first external sensor 321 is installed on the inside of the first heater 21 through a small hole opened in its middle.

[0046] like Figure 2 As shown, the temperature control flange 4 is located at the bottom of the furnace tube reaction chamber 1. It is a flange with cooling water temperature control and is equipped with a cooling control system on the outside to regulate its temperature. It is used to maintain a constant bottom temperature by exchanging heat through the cooling medium.

[0047] The heat insulation and isolation components are installed between the heater and the furnace tube reaction chamber 1, and between the wafer placement area 6 and the external environment, to reduce heat loss and isolate heat radiation.

[0048] like Figure 2 As shown, the thermal insulation component includes: a thermal insulation layer 51, a transparent isolation cover 52, and a radiation shielding plate 53.

[0049] The heat insulation layer 51 is disposed on the outer wall of the heater to prevent heat from being lost to the external environment.

[0050] The transparent isolation cover 52 is disposed outside the furnace tube reaction chamber 1 to isolate external air from the wafer placement area 6.

[0051] like Figure 3 As shown, the transparent isolation cover 52 is made of glass (i.e., transparent glass) and is mounted above the wafer placement area 6 via a quartz support. It is fixed between the wafer placement area 6 and the outer wall of the furnace tube reaction chamber 1 by bottom bolts to isolate heat loss from the wafer 61. The transparent isolation cover 52 forms the outer side of the temperature zone with the wafer placement area 6 and the heater side with the outer wall of the furnace tube reaction chamber 1. Its interior is close to a vacuum state to achieve good thermal insulation.

[0052] The radiation shielding plate 53 is disposed below the wafer placement area 6 to isolate the radiative heat transfer from the wafer 61 and the heater to the bottom temperature control flange 4. In this embodiment, the radiation shielding plate 53 is made of frosted glass (or frosted quartz glass), which is installed below the wafer placement area 6 by means of a quartz support. By utilizing the diffuse scattering and absorption characteristics of frosted glass for infrared radiation, the thermal radiation impact on the bottom temperature control flange 4 is effectively reduced.

[0053] A controller 7 is installed outside the furnace tube reaction chamber 1, which is connected to the internal and external sensors and each heater, for temperature control and data processing. Figure 2 For example, controller 7 receives temperature data from the first internal sensor 311 and the first external sensor 321, and controls the temperature of the first heater 21 (as shown by the dashed arrow). It should be noted that... Figure 2 The dashed arrows in the diagram only indicate the data flow and control relationship between controller 7 and each component, and do not represent the actual physical installation location of each component. Please refer to [link to documentation] for the actual relative positions of each component. Figure 3 The installation diagram is shown.

[0054] Step S1 further includes the following sub-steps to establish the initial model: S11: Discretized isothermal zone. The isothermal zone inside the furnace tube (i.e., the main area where the wafer is placed) is uniformly divided into N discrete units along the vertical direction. The temperature of each discrete unit represents the average temperature of that tiny region.

[0055] In this embodiment, N discrete units are equally spaced along the vertical height of the constant temperature zone to ensure uniform characterization of the temperature distribution in the constant temperature zone.

[0056] The number of discrete units, N, is a preset value that can be flexibly adjusted according to the actual furnace tube size, constant temperature zone length, and temperature control accuracy requirements.

[0057] The choice of the number of discrete units needs to balance model accuracy and computational complexity: if the value of N is too small, the discretized model cannot accurately describe the details of temperature distribution, resulting in insufficient model accuracy and affecting the subsequent adjustment effect; if the value of N is too large, there will be too many model parameters, which will easily lead to overfitting in the subsequent model update process, while also prolonging the calculation time and affecting the adjustment efficiency.

[0058] Optionally, the value of N can range from 200 to 400. For example... Figure 2 In the example shown, N is 300.

[0059] S12: Establish the model expression. According to the physical laws of heat conduction, in the vertical furnace heat treatment equipment structure described in this embodiment, the temperature of the discrete unit in the constant temperature zone is linearly related to the temperature of each heating zone. That is, the temperature of each discrete unit is equal to the linear weighted sum of the temperatures of each heating zone multiplied by their corresponding weight coefficients.

[0060] In this embodiment, the constant temperature zone of the furnace tube is uniformly divided into 300 discrete units. The temperature of each discrete unit is equal to the sum of the temperatures of the five temperature zones multiplied by their corresponding weighting coefficients. k Temperature of discrete unit The expression is as follows: ; in, Indicates the first The weighting coefficients of each discrete unit corresponding to the temperature target of the first temperature zone. This represents the temperature measurement value for the first temperature zone, and so on. Indicates the first The weighting coefficients for each discrete unit corresponding to the temperature target of the fifth temperature zone. This indicates the temperature measurement value for the fifth temperature zone. k The maximum value is 300 (i.e., the total number of discrete units).

[0061] The temperature expressions for 300 discrete elements are written in matrix form, and the temperature matrix representation of all discrete elements is as follows:

[0062] The expression for the weight coefficient matrix A is as follows: .

[0063] S13: Obtain the initial weight coefficient matrix.

[0064] In this embodiment, the initial weighting coefficients for each discrete unit corresponding to each temperature zone are obtained through experiments, forming an initial weighting coefficient matrix. To determine each element in the weighting coefficient matrix A, a series of experimental calibrations need to be performed. This is done by sequentially and individually adjusting the temperature of each temperature zone and measuring the resulting changes in the temperature distribution in the isothermal zone, thereby calculating the initial weighting coefficient matrix.

[0065] The specific process of obtaining the initial weight coefficient matrix includes: establishing a baseline state and collecting the baseline temperature of each discrete unit; applying temperature excitation to each temperature zone individually and collecting the corresponding response temperature; calculating the weight coefficients of each discrete unit for each temperature zone based on the temperature change before and after excitation of each temperature zone, and thus forming the initial weight coefficient matrix.

[0066] Figure 4 A flowchart for obtaining the initial weight coefficient matrix according to an embodiment of the present invention is disclosed, such as... Figure 4 In the illustrated embodiment, the method includes the following steps: S131 Establish a reference state: Control the temperature measurement values ​​of all internal sensors to the preset target temperature point (500℃ in this embodiment), so that the temperature of all 5 temperature zones is stable at the reference value.

[0067] S132 Reference Temperature Acquisition: After the temperature stabilizes, a movable temperature sensor (Flat-zone TC) 33 is moved at a constant speed from the top to the bottom of the constant temperature zone to acquire a complete temperature curve. The curve is linearly interpolated according to its height to obtain the temperature measurement values ​​of 300 discrete units under the reference state (i.e., the reference temperature).

[0068] In this embodiment, the temperature of the Inner TC is controlled at 500℃. After stabilizing for a period of time, the temperature data of the Flat-zone TC is acquired, and the temperature measurement values ​​of 300 evenly spaced nodes are obtained by linear interpolation according to the straight-line distance. k The temperature measurement value of each discrete unit is denoted as , k =1 to 300.

[0069] The process of acquiring Flat-zone TC temperature data is as follows: The Flat-zone TC is moved to the top of its quartz sleeve (corresponding to the horizontal position of the first inner sensor 311, denoted as zero point), and then slowly moved downwards at a uniform speed. Simultaneously, the real-time position and temperature of the Flat-zone TC are measured and recorded until it reaches the bottom of the quartz sleeve (corresponding to the horizontal position of the fifth inner sensor 315). The resulting real-time position array and real-time temperature array correspond one-to-one. The starting and ending positions are evenly divided into 300 discrete units. The temperature at the center point of each discrete unit is taken as the temperature of that discrete unit. Linear interpolation is performed on the temperature with the position as the horizontal axis to obtain the temperatures of the 300 discrete units.

[0070] S133 applies the excitation and measures the response: for the first i Temperature zone ( i From 1 to 5), increase the target temperature value by ΔT (e.g., +1℃) to T+ΔT, while keeping the target temperature value of all other temperature zones at T. After the temperature stabilizes, use Flat-zone TC to move and measure again to obtain a new temperature curve, and use linear interpolation to calculate the temperature measurements of 300 discrete units. i The first temperature zone k The temperature measurement value of each discrete unit is denoted as... .

[0071] Specifically, the temperature of the Inner TC in the first temperature zone is controlled at 501℃. After stabilizing for a period of time, the temperature data of the Flat-zone TC is acquired, and the temperature measurements of 300 evenly spaced nodes are obtained by linear interpolation using linear distances. These measurements are denoted as... .

[0072] The temperature of the Inner TC in the second temperature zone was controlled at 501℃, and the temperature of the Inner TC in the first temperature zone was restored to 500℃. After stabilizing for a period of time, the Flat-zone TC temperature data was acquired, and the temperature measurements of 300 evenly spaced nodes were obtained by linear interpolation using linear distances. These measurements are denoted as follows: This process continues until individual excitation tests are completed for each of the five temperature zones, and the results are obtained. , and .

[0073] S134 Calculates the weight coefficients: Due to the linear assumption of the model, the first... i The temperature zone for the first k The weighting coefficient of each discrete unit is calculated from the temperature change between the adjusted temperature range and the reference state (i.e., the difference between the response temperature and the reference temperature).

[0074] The initial weight coefficient matrix A is set as follows: ; in, For the first k Temperature measurement value of a discrete unit under reference conditions (reference temperature). For the first i After applying excitation (adjusting ΔT) to each temperature zone individually, the first... k Temperature measurements (response temperature) of each discrete unit. For the first i The temperature zone for the first k The weighting coefficients of each discrete unit.

[0075] This method establishes an initial model based on physical mechanisms, linear and discretized through the above sub-steps S11 to S13. This model can quantitatively describe the impact of temperature changes in each heating zone on the temperature distribution of the entire isothermal zone, providing an accurate mathematical basis for subsequent optimization calculations.

[0076] Step S1 transforms the complex furnace tube thermal field problem into a computable mathematical model, quantifying the impact on temperature distribution and making it possible to automatically calculate the optimal temperature target value through subsequent mathematical optimization methods.

[0077] Step S2: Calculate the target temperature value of each temperature zone based on the current model, so that the temperature distribution of the constant temperature zone meets the predetermined conditions. The predetermined conditions are that the deviation of the discrete unit temperature of the constant temperature zone from the preset target temperature is minimized overall.

[0078] The core of step S2 is to calculate the target temperature values ​​for each temperature zone that optimizes the temperature distribution in the constant temperature zone based on the current model (initial model or updated model) using an optimization algorithm.

[0079] In some embodiments, the predetermined condition refers to minimizing the overall deviation between the temperature of each discrete unit in the isothermal zone and the preset target temperature. In other words, by adjusting the target temperature values ​​of each temperature zone, the temperature of all discrete units in the isothermal zone is made as close as possible to the preset target temperature (e.g., 500°C as required by the process), thereby minimizing the overall uniformity deviation of the temperature distribution.

[0080] The quantification of the degree of deviation includes, but is not limited to, the sum of squares, the sum of absolute values, or the minimization of the maximum deviation of the differences between the temperatures of each discrete unit and the preset target temperature. The mathematical essence of these methods is to minimize the overall degree of deviation.

[0081] In this embodiment, the predetermined condition for step S2 is "minimum sum of squares of temperature deviation of discrete units in constant temperature zone". This means that the sum of squares of the difference between the temperature of each discrete unit in constant temperature zone and the preset target temperature reaches the minimum value. By adjusting the temperature of each temperature zone, the temperature of the 300 discrete units is made as close as possible to the preset target temperature (e.g., 500°C), thereby minimizing temperature fluctuations and ensuring the uniformity of constant temperature zone.

[0082] To avoid initial model errors causing a one-time adjustment to fail to achieve optimal results, this embodiment employs incremental iterative calculations, specifically including the following sub-steps: S21: Incremental Model Conversion. Rewrites the current model in incremental form.

[0083] Since the initial model has some errors, it is not possible to calculate the optimal temperature target value in one go. Therefore, the current model is written in incremental form, which makes it easier to iterate and optimize based on the previous adjustment, and gradually approach the optimal solution.

[0084] The corresponding predicted temperature value of the discrete element in the isothermal region The expression is as follows: ; in, For the adjusted number k The predicted temperature of each discrete unit. To adjust the previous number k The actual temperature of each discrete unit to These represent the adjustment amounts for the target temperature values ​​of the five temperature zones.

[0085] By adjusting the target temperature values ​​for each temperature zone, new target values ​​are determined, thus optimizing the temperature distribution within the new isothermal zone. This incremental adjustment method facilitates precise fine-tuning based on the current state during subsequent iterations, gradually approaching the optimal solution and continuously optimizing the temperature distribution within the isothermal zone.

[0086] S22: Define the cost function. Define the cost function J to quantify the degree of temperature non-uniformity in the discrete elements of the isothermal region.

[0087] The optimization objective of this embodiment is to make the temperature of each discrete unit in the isothermal zone as close as possible to the ideal target temperature (e.g., 500℃). To achieve this objective, the cost function is set as the sum of squares of the deviations between the predicted temperature and the target temperature of the discrete units in the isothermal zone, as expressed below: : in, For the adjusted number k The predicted temperature of each discrete unit. Substituting the incremental model expression from step S21 into the above equation, the cost function J becomes the temperature adjustment amount. The quadratic function provides a foundation for subsequent optimization solutions.

[0088] S23: Solve the optimization problem. Simultaneously solve the incremental model equations and the cost function, and calculate the adjustment amount for the target temperature value in each temperature zone. This minimizes the cost function J.

[0089] Since the cost function J is a quadratic function and the model equations are linear equations, this optimization problem is a standard quadratic programming problem. This embodiment preferably uses a quadratic programming method to solve the problem. This method is a standard and mature algorithm for solving quadratic optimization problems of linear systems, capable of quickly and accurately finding the global optimum. Compared to other optimization algorithms, it has advantages in high computational efficiency and high solution accuracy, perfectly meeting the core requirement of this invention: "rapidly optimizing the temperature distribution in a constant-temperature zone."

[0090] S24: Calculate the new target value. Solve to obtain the temperature adjustment amount for each temperature zone. Then, the original target temperature values ​​for each temperature zone were compared with the corresponding temperature adjustment amounts. Add them together to get the new target temperature values ​​for each temperature zone.

[0091] Through the above sub-steps S21 to S24, the temperature setpoints of each temperature zone that make the temperature distribution in the constant temperature zone most uniform are automatically calculated using a quadratic programming algorithm.

[0092] Step S2 replaces the traditional manual "trial and error" adjustment mode with mathematical optimization methods, avoiding the blindness and inefficiency of manual adjustment, and significantly improving the efficiency and accuracy of constant temperature zone adjustment.

[0093] Step S3: Control the temperature of each temperature zone according to the target temperature value, and obtain the actual temperature data of the constant temperature zone.

[0094] The core of step S3 is to execute the optimization results of step S2, precisely control the temperature of each temperature zone, and collect actual temperature data of the constant temperature zone to provide a reliable basis for model updates in step S4 and the next iteration. Specifically, it includes the following sub-steps: S31: Target Value Issuance. The new target temperature values ​​for each temperature zone calculated in step S2 are issued to controller 7 (e.g., PLC or PID controller). Based on these target values, controller 7 adjusts the output power of the heaters in each temperature zone to drive the actual temperature of each zone closer to the target value, thereby achieving precise temperature control.

[0095] S32: Wait for temperature stabilization. Due to the inertia and hysteresis characteristics of the thermal system, after the target value is issued, a period of time is required for the actual temperature of each temperature zone to stabilize near the target value. In this embodiment, the condition for determining temperature stability is: the actual temperature of each temperature zone stabilizes within ±0.3 degrees Celsius of the corresponding target temperature value for a preset time (e.g., 2 minutes). This stabilization range setting takes into account both the precision requirements of temperature control in semiconductor processes and avoids frequent heater start-ups and shutdowns caused by excessively high control precision, effectively extending the service life of the equipment.

[0096] S33: Acquire actual temperature data. After the temperature in each temperature zone stabilizes, the actual temperature data of the constant temperature zone is acquired through the temperature acquisition component. Preferably, a movable temperature sensor (Flat-zone TC) is used to move vertically and scan from the top to the bottom of the constant temperature zone, recording the actual temperature at each location. Then, the actual temperature measurement values ​​of 300 discrete units are calculated through linear interpolation, which serves as the basis for subsequent convergence judgment and model update.

[0097] Meanwhile, temperature data from each temperature zone is collected through internal and external sensors to help determine the stability of the temperature zone and ensure the reliability and accuracy of the collected actual temperature data of the constant temperature zone.

[0098] Through the aforementioned sub-steps S31 to S33, the optimization results were executed and key feedback data was accurately collected. Step S3 ensured the precise execution of the control action and acquired high-quality real-time temperature data, providing a reliable basis for model updates in step S4, and is a crucial step in realizing closed-loop control.

[0099] Step S4: Determine whether the actual temperature of the constant temperature zone has converged to within the allowable deviation. If so, end the adjustment; otherwise, update the model parameters of the current model based on the actual temperature data, and repeat steps S2 to S4.

[0100] The core of step S4 is to determine whether the adjustment result of the constant temperature zone meets the process requirements. If it does not meet the requirements, the model parameters are updated using the newly collected actual temperature data to form an iterative closed loop until the process requirements are met. Specifically, it includes the following sub-steps: S41: Convergence judgment. Compare the actual temperature data of the isothermal zone obtained in step S3 with the allowable deviation range required by the process.

[0101] For example, if the process requires that the temperature deviation of all temperature points in the constant temperature zone be within ±0.5℃ of the target temperature T (e.g., 500℃), and the actual temperature of all 300 discrete units in the constant temperature zone is within the range of T ±0.5℃, then the constant temperature zone is considered to have converged to within the allowable deviation, and the adjustment process ends. The current temperature target value of each temperature zone is the final set value. If the temperature deviation of any discrete unit exceeds this range, it is judged as non-convergence, and the model parameter update process begins.

[0102] S42: Model parameter update. If the judgment result of step S41 is that the model has not converged, the model parameters need to be updated based on the actual temperature data obtained in this iteration so that the model can more accurately reflect the current thermal state of the equipment.

[0103] In this embodiment, the object of model update is the weight coefficient matrix A in the initial model, and recursive least squares (RLS) is preferably used for updating.

[0104] Recursive least squares is an efficient system identification method that can recursively correct model parameters using new measurement data without reprocessing all historical data. It has the advantages of simple calculation, fast convergence speed, and high accuracy, making it a better choice for updating linear model parameters in this scenario.

[0105] The core principle of recursive least squares method is to gradually correct the weight coefficient matrix A based on the deviation between the actual temperature data of the isothermal zone and the temperature data predicted by the model, so that the corrected model can more accurately reflect the correlation between the temperature of each temperature zone and the temperature of the discrete unit of the isothermal zone.

[0106] Specifically, the actual temperatures of each temperature zone (a total of 5 values) obtained in step S3 are used as model inputs, and the actual temperatures of each discrete unit in the corresponding isothermal zone (a total of 300 values) are used as model outputs. These values ​​are then substituted into the recursive least squares algorithm to update the weight coefficient matrix A. After the update is completed, steps S2 to S4 are repeated, i.e., the target temperature values ​​of each temperature zone are recalculated, the temperature of each temperature zone is controlled, the actual temperature data is collected, and convergence is determined, until the temperature distribution in the isothermal zone converges to within the allowable deviation of the process.

[0107] There is no fixed limit to the number of iterations, but convergence is usually achieved in 3-5 iterations. The specific number of iterations depends on the accuracy of the initial model and the preset tolerance.

[0108] This method, through the aforementioned sub-steps S41 and S42, achieves automatic judgment of the adjustment results and adaptive correction of the model. Step S4, by iteratively updating the model, effectively overcomes the influence of uncertainties such as inaccurate initial models, equipment state drift, and environmental changes, gradually converging the temperature distribution in the isothermal zone to the required range, thus ensuring the final success rate and robustness of the adjustment. This adaptive closed-loop control strategy is one of the core advantages of this invention in achieving high-precision and high-reliability automatic adjustment of the isothermal zone.

[0109] Although the methods described above are illustrated and depicted as a series of actions for the sake of simplicity, it should be understood and appreciated that these methods are not limited by the order of the actions, as some actions may occur in a different order and / or concurrently with other actions from the illustrations and descriptions herein or not illustrated and described herein but which may be understood by those skilled in the art, according to one or more embodiments.

[0110] Corresponding to the above-described automatic adjustment method for the constant temperature zone of a vertical furnace heat treatment equipment, this invention also provides an automatic adjustment system for the constant temperature zone of a vertical furnace heat treatment equipment. This system is used to execute the steps in the above method embodiments to achieve automatic, rapid, and precise adjustment of the constant temperature zone.

[0111] In one specific embodiment, the automatic adjustment system for the constant temperature zone of the vertical furnace heat treatment equipment includes: The furnace tube reaction chamber has a wafer placement area inside for supporting wafers. The wafer placement area is installed at the center of the furnace tube reaction chamber by a quartz support and includes several sub-regions distributed from top to bottom, each sub-region supporting one wafer.

[0112] Multiple heaters, each corresponding to a different temperature zone within the furnace tube, are arranged around the outer wall of the furnace tube's reaction chamber. The heaters are fitted to the outer wall of the furnace tube's reaction chamber sidewall to provide heat to each temperature zone.

[0113] A temperature acquisition component is installed at a corresponding position in the furnace tube reaction chamber to collect temperature data.

[0114] A temperature-controlled flange is located at the bottom of the furnace tube reaction chamber and is used to maintain a constant bottom temperature through heat exchange with a cooling medium. The temperature-controlled flange is a flange with cooling water temperature control, and a cooling control system is provided on its periphery to regulate its temperature.

[0115] A thermal insulation and isolation component is disposed between the heater and the furnace tube reaction chamber, and between the wafer placement area and the external environment, to reduce heat loss and isolate thermal radiation.

[0116] The controller is connected to the heater, the temperature acquisition component, and the temperature control flange, respectively. The controller is configured to execute the automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment as described in any of the preceding embodiments. Specifically, the controller is used to establish an initial model, calculate the target temperature values ​​for each temperature zone based on the current model, issue the target temperature values ​​and acquire the actual temperature data of the constant temperature zone, determine convergence, and update the model parameters, thereby achieving fully automated control of the constant temperature zone adjustment process. The controller can be a PLC, a microcontroller, an industrial computer, or other control device with data storage and computing capabilities.

[0117] Furthermore, the temperature acquisition component includes: The inner TC sensor is located on the inner wall of the furnace tube reaction chamber, near the wafer side, and is used to measure the temperature of the area near the wafer. Its measured value serves as a representative of the actual temperature of each temperature zone. The external sensor (Outer TC) is installed on the outer wall surface of the heater, close to the heater, to measure the temperature of the heater body and help determine the working status of the heater. A movable temperature sensor (Flat-zone TC) is installed inside a quartz sleeve extending from the bottom of the furnace tube reaction chamber. It moves vertically to collect temperature curve data in the isothermal zone. The temperature curve measured by this movable temperature sensor as it moves from top to bottom is the temperature distribution curve of the isothermal zone. It is the main source of the actual temperature data of the isothermal zone in step S3, and also the core basis for convergence judgment and model parameter update in step S4.

[0118] The thermal insulation and isolation components include: a thermal insulation layer disposed on the outer wall of the heater to prevent heat loss to the external environment; a transparent isolation cover disposed outside the furnace tube reaction chamber to isolate external air from the wafer placement area; and a radiation shielding plate disposed below the wafer placement area to isolate radiative heat transfer from the wafer and the heater to the bottom temperature control flange.

[0119] The specific structure and interconnections of the furnace tube reaction chamber, heater, temperature acquisition component, temperature control flange, insulation component, and controller have been described in the method embodiments. Figure 2 and Figure 3 The details have been elaborated upon, and will not be repeated here, but may be cited accordingly.

[0120] This system embodiment corresponds to the aforementioned method embodiment. By automatically executing the constant temperature zone adjustment method through the controller, it can achieve closed-loop iterative optimization of the constant temperature zone temperature, thereby reducing labor costs, shortening adjustment time, and improving adjustment accuracy and consistency.

[0121] The present invention provides an automatic adjustment method and system for the constant temperature zone of a vertical furnace heat treatment equipment, which has the following beneficial effects: 1) By establishing an initial model, optimizing the target value, and iteratively updating the closed-loop feedback process, the traditional adjustment process that relies on repeated trial and error based on human experience is transformed into an intelligent and automated optimization process. No manual intervention from on-site engineers is required, which significantly reduces labor costs and human error. 2) The model-based optimization algorithm is used to quickly calculate the optimal temperature target value of each temperature zone, and the recursive least squares method is combined to update the model parameters online, so that the temperature distribution in the constant temperature zone can quickly converge to the process requirement range within a few iterations, reducing the time required for traditional manual adjustment from 2-3 days to a few hours or even less, effectively improving the utilization rate of equipment and the flexibility of process switching. 3) By performing refined discretization modeling of the isothermal zone and taking the minimum sum of squares of temperature deviations of discrete units in the isothermal zone as the optimization objective, precise control of temperature distribution in the isothermal zone is achieved. Closed-loop iteration is used to overcome the effects of model error and equipment aging, ensuring that the temperature converges to within the allowable deviation, thereby ensuring the consistency of batch wafer process and product yield. 4) The heat exchange system of the vertical furnace heat treatment equipment involved comprehensively collects temperature data by setting up a combination of internal sensors, external sensors and movable temperature sensors. With the help of temperature control flanges and heat insulation components, it reduces heat radiation and heat loss, avoids frequent start-up and shutdown of the heater, and extends the service life of the equipment.

[0122] As indicated in this invention and the claims, unless the context clearly indicates otherwise, the words "a," "an," "an," and / or "the" do not specifically refer to the singular and may also include the plural. Generally speaking, the terms "comprising" and "including" only indicate the inclusion of explicitly identified steps and elements, which do not constitute an exclusive list, and the method or apparatus may also include other steps or elements.

[0123] The above embodiments are provided for those skilled in the art to implement or use the present invention. Those skilled in the art can make various modifications or changes to the above embodiments without departing from the inventive concept of the present invention. Therefore, the protection scope of the present invention is not limited to the above embodiments, but should be the maximum scope that conforms to the innovative features mentioned in the claims.

Claims

1. A method for automatically adjusting the constant temperature zone of a vertical furnace heat treatment equipment, characterized in that, Includes the following steps: Step S1: Establish an initial model, which is used to characterize the relationship between the discrete unit temperature of the furnace tube constant temperature zone and the temperature of each temperature zone. The initial model is used as the current model. Step S2: Calculate the target temperature value of each temperature zone based on the current model, so that the temperature distribution of the constant temperature zone meets the predetermined condition, wherein the predetermined condition is that the deviation of the discrete unit temperature of the constant temperature zone from the preset target temperature is minimized overall. Step S3: Control the temperature of each temperature zone according to the target temperature value, and obtain the actual temperature data of the constant temperature zone; Step S4: Determine whether the actual temperature of the constant temperature zone has converged to within the allowable deviation. If so, then end the adjustment; If not, update the model parameters of the current model based on the actual temperature data, and use the updated model as the new current model, then repeat steps S2 to S4.

2. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 1, characterized in that, In step S1, the constant temperature zone of the furnace tube is uniformly divided into several discrete units along the vertical direction. The temperature of each discrete unit is equal to the sum of the temperatures of each temperature zone multiplied by the corresponding weighting coefficient.

3. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 2, characterized in that, In step S1, the number of discrete units is a preset value, and the discrete units are divided at equal intervals along the vertical height direction of the furnace tube constant temperature zone.

4. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 2, characterized in that, In step S1, the initial weighting coefficients of each discrete unit corresponding to each temperature zone are obtained through experiments, forming an initial weighting coefficient matrix.

5. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 4, characterized in that, In step S1, the temperature of each temperature zone is adjusted individually in sequence, and the temperature distribution of the constant temperature zone is measured to calculate the initial weighting coefficient matrix.

6. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 5, characterized in that, The specific process of calculating the initial weight coefficient matrix includes: Establish a baseline state and collect the baseline temperature of each discrete unit; Each temperature zone was individually and temperature excitation was applied sequentially, and the corresponding response temperature was collected. Based on the temperature change before and after excitation in each temperature zone, the weight coefficients of each discrete unit corresponding to each temperature zone are calculated, and then the initial weight coefficient matrix is ​​formed.

7. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 1, characterized in that, The vertical furnace heat treatment equipment includes a heat exchange system; The heat exchange system includes a furnace tube reaction chamber, a wafer placement area, a heater, a temperature acquisition component, a temperature control flange, and thermal insulation components. The furnace tube reaction chamber is provided with an internal space for accommodating the wafer placement area; The heater is arranged around the outer wall of the furnace tube reaction chamber to provide heat to each temperature zone; The temperature acquisition component is installed at a corresponding position in the furnace tube reaction chamber and is used to acquire temperature data. The temperature control flange is located at the bottom of the furnace tube reaction chamber and is used to maintain a constant bottom temperature through heat exchange with a cooling medium. The heat insulation and isolation components are installed between the heater and the furnace tube reaction chamber, and between the wafer placement area and the external environment, to reduce heat loss and isolate thermal radiation.

8. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 7, characterized in that, The heater is matched with the outer wall surface of the reaction chamber sidewall of the furnace tube and corresponds to each temperature zone inside the furnace tube; The temperature acquisition component includes: The internal sensor is located on the inner wall of the furnace tube reaction chamber, near the wafer side; An external sensor is installed on the outer wall surface of the heater, near the heater side; A movable temperature sensor is installed inside a quartz sleeve extending from the bottom of the furnace tube reaction chamber and moves vertically to collect temperature curve data in the constant temperature zone.

9. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 7, characterized in that, The thermal insulation component includes: An insulation layer, installed on the outer wall of the heater, is used to prevent heat loss to the external environment; A transparent isolation cover is installed outside the furnace tube reaction chamber to isolate external air from the wafer placement area; A radiation shielding plate is placed below the wafer placement area to isolate the wafer and heater from radiative heat transfer to the bottom temperature control flange.

10. The method for automatic adjustment of the constant temperature zone in a vertical furnace heat treatment equipment according to claim 1, characterized in that, In step S2, the predetermined condition is that the sum of squares of temperature deviations of discrete units in the isothermal zone is minimized; Step S2 includes: Step S21: Write the current model in incremental form; Step S22: Set a cost function, which is used to quantify the non-uniformity of temperature in the discrete unit of the isothermal zone; Step S23: Simultaneously solve the incremental model equations and the cost function, and calculate the adjustment amount of the temperature target value for each temperature zone to minimize the cost function. Step S24: Add the original target temperature values ​​for each temperature zone to the corresponding adjustment amounts to obtain new target temperature values ​​for each temperature zone.

11. The automatic adjustment method for the constant temperature zone of a vertical furnace heat treatment equipment according to claim 10, characterized in that, In step S23, a quadratic programming method is used to calculate the adjustment amount of the target temperature value for each temperature zone.

12. The automatic adjustment method for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 1, characterized in that, In step S4, the model parameters are the weight coefficient matrix in the initial model, and the weight coefficient matrix is ​​updated based on the actual temperature data of the constant temperature zone using the recursive least squares method.

13. An automatic adjustment system for the constant temperature zone of a vertical furnace heat treatment equipment, characterized in that, include: The furnace tube reaction chamber has a wafer placement area inside for supporting the wafers; Multiple heaters, each corresponding to a temperature zone within the furnace tube, are arranged around the outer wall of the furnace tube reaction chamber. A temperature acquisition component is installed at a corresponding position in the reaction chamber of the furnace tube for acquiring temperature data; A temperature control flange is located at the bottom of the furnace tube reaction chamber and is used to maintain a constant bottom temperature through heat exchange with a cooling medium. Thermal insulation components are disposed between the heater and the furnace tube reaction chamber, and between the wafer placement area and the external environment, to reduce heat loss and isolate thermal radiation; The controller is connected to the heater, the temperature acquisition component and the temperature control flange respectively, and the controller is configured to perform the automatic adjustment method of the constant temperature zone of the vertical furnace heat treatment equipment as described in any one of claims 1 to 12.

14. The automatic temperature control system for the constant temperature zone of the vertical furnace heat treatment equipment according to claim 13, characterized in that, The temperature acquisition component includes: The internal sensor is located on the inner wall of the furnace tube reaction chamber, near the wafer side; An external sensor is installed on the outer wall surface of the heater, near the heater side; A movable temperature sensor is installed inside a quartz sleeve extending from the bottom of the furnace tube reaction chamber and moves vertically to collect temperature curve data in the constant temperature zone.

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