Immersion lithography machine immersion head inspection device and lithography system

Abstract

The application provides an immersion head inspection device of an immersion lithography machine and a lithography system, and belongs to the technical field of lithography equipment maintenance. The inspection device comprises a microscope head, a first frame and a walking part. The plane where the first frame is located is parallel to the plane where the immersion head is located. The outline of the first frame coincides with the projection of the outer outline of the immersion head in the exposure direction of the lithography machine. The microscope head is connected to the walking part, and the microscope head faces the immersion head. The walking part is movably connected to the first frame. The detection point of the microscope head is calibrated in position through the walking part and the first frame. When the microscope head moves, the walking part moves along the first frame. The position of the detection point of the microscope head on the immersion head can be determined through the position of the walking part on the first frame. The inspection device can standardize the stroke of the microscope head, prevent the microscope head from tilting and touching the lens, reduce the operation risk, and avoid the problem of misjudgment of the cleaning position by the cleaning personnel.

Description

Technical Field

[0001] This invention belongs to the field of photolithography equipment maintenance technology, and more specifically, relates to an immersion head inspection device and photolithography system for an immersion photolithography machine. Background Technology

[0002] Immersion lithography machines employ a combination of refraction and reflection in their optical path design, with water filling the space between the exposure area and the lithography lens. Compared to air, using water as the medium in immersion lithography shortens the wavelength of the light source, thereby improving resolution. The immersion head is one of the most crucial components of an immersion lithography machine, maintaining the flow field of the immersion liquid.

[0003] Current immersion lithography machines typically use ultrapure water as the medium. Although this ultrapure water undergoes high-precision filtration, it still comes into direct contact with the wafer and lenses. After a certain period, impurities from the wafer and lenses will remain on the immersion head. On one hand, these residues directly contact the wafer, potentially scratching it and affecting the exposure pattern. On the other hand, these residues can clog the recovery port during the process of being drawn back along with the ultrapure water, causing changes in the ultrapure water flow field and affecting the quality of the exposure pattern. Therefore, regular inspection and cleaning of the immersion head is a crucial aspect of preventative maintenance for lithography machines.

[0004] Periodic inspections of the immersion head typically employ specialized observation tools. However, existing tools rely heavily on operator skill and lack a fixed balancing device. The tools may tilt or tip over, potentially triggering alarms by touching the lens or other components. After the observation tool detects residual impurities on the immersion head, the immersion head of the immersion lithography machine needs to be cleaned. During cleaning, the location of any remaining impurities must be determined based on the cleaner's experience, leading to potential misjudgments (for example, the observer and cleaner are often different personnel; the observer must inform the cleaner of the location when they observe residual impurities, and the cleaner then relies on experience to determine the location and perform the cleaning). Summary of the Invention

[0005] The purpose of this invention is to provide an immersion lithography machine immersion head inspection device and lithography system. This immersion lithography machine immersion head inspection device can standardize the observation of tool travel, reduce operational risks, and avoid the problem of misjudging the cleaning position.

[0006] To achieve the above objectives, the technical solution adopted by the present invention is as follows: The first aspect of the present invention provides an immersion head inspection device for an immersion lithography machine, comprising a microscope head, a first frame, and a traveling part; The plane containing the first frame is parallel to the plane containing the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure direction of the lithography machine. The microscope head is connected to the traveling part and faces the immersion head. The traveling part is movably connected to the first frame, and the detection point of the microscope head is positioned by the traveling part and the first frame.

[0007] In one embodiment, a second frame is further included, which is connected to the first frame and is used to fix the position of the first frame.

[0008] In one embodiment, the second frame is fixed to the immersion head mounting plate, or the second frame is fixed to the ground.

[0009] In one embodiment, the second frame includes four first rods connected end to end, the four first rods being located on the same plane, and each first rod being fixed to the immersion head mounting plate by a connecting screw; or, the second frame is fixed to the ground by a suction cup or a directional wheel.

[0010] In one embodiment, the first frame includes second members corresponding to the four first members respectively. The four second members are connected end to end. The second members are arranged parallel to the corresponding first members. The middle part of each second member is connected to the middle part of each first member through a third member.

[0011] In one embodiment, the walking part includes a moving part and a connecting rod, the moving part being disposed at one end of the connecting rod, and the microscope head being disposed at the other end of the connecting rod; The first frame includes a hollow track for accommodating the movable part and a notch for avoiding the connecting rod.

[0012] In one embodiment, the outer contour of the moving part is spherical.

[0013] In one embodiment, a first projection device is provided on the first frame. The first projection device is used to acquire the projection of the first frame and the moving part on a preset surface along the exposure direction of the lithography machine, so as to display the position of the moving part on the first frame on the preset surface.

[0014] In one embodiment, a first projection device is provided on the first frame, and the first projection device is used to obtain the projection of the first frame on a preset surface along the exposure direction of the lithography machine. A second projection device is provided on the side of the moving part away from the immersion head. The second projection device is used to acquire the projection of the moving part on a preset surface along the exposure direction of the lithography machine, so as to display the position of the moving part on the first frame on the preset surface.

[0015] In one embodiment, the first frame is a transparent structure, and the first projection device and the second projection device are parallel light emitting devices.

[0016] In one embodiment, a sensor is also included, wherein the sensor is triggered when the first frame is connected to the immersion head mounting plate.

[0017] In one embodiment, the sensor is a trigger sensor or a reference sensor.

[0018] In one embodiment, an alarm is also included, which is electrically connected to the sensor, and the alarm sounds when the sensor is triggered.

[0019] A second aspect of the present invention provides a lithography system, including the immersion head inspection device for an immersion lithography machine as described above.

[0020] The immersion head inspection device for an immersion lithography machine provided by this invention includes a microscope head, a first frame, and a traveling part. The plane of the first frame is parallel to the plane of the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure direction of the lithography machine. The microscope head is connected to the traveling part and faces the immersion head. The traveling part is movably connected to the first frame, and the detection point of the microscope head is positioned by the traveling part and the first frame. In this inspection device, the plane of the first frame is parallel to the plane of the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure path of the lithography machine. When the microscope head moves, the traveling part moves along the first frame. The position of the detection point of the microscope head on the immersion head can be determined by the position of the traveling part on the first frame. This inspection device can standardize the travel of the microscope head, prevent the microscope head from tilting or tipping over and touching the lens, reduce operational risks, and avoid misjudging the cleaning position. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1This is a schematic diagram of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention during use. Figure 2 This is a schematic diagram showing the connection between the walking part of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention and the first frame and microscope head. Figure 3 This is a partial structural diagram of the first frame of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention; Figure 4 A top view of the first frame of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention; Figure 5 This is a schematic projection of the first frame and the moving part on the preset surface provided in an embodiment of the present invention; Figure 6 A schematic diagram of the sensor and the structure after the sensor is triggered in the immersion head inspection device of the immersion lithography machine provided in an embodiment of the present invention. Figure 7 This is a schematic diagram of the sensor and the structure of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention.

[0023] The following are the labeling elements in the figure: 1-Microscope lens; 2-First frame; 3-Traveling part; 4-Second frame; 5-Immersion head mounting plate; 6-Immersion head; 7-Sensor; 8-Lens; 21-Second rod; 22-Hollow track; 23-First notch; 24-First projection device; 31-Moving part; 32-Connecting rod; 41-First rod; 42-Third rod; 43-Connecting screw; 71-Copper sheet; 72-Button; 73-Transmitter; 74-Receiver; 75-Spring copper sheet. Detailed Implementation

[0024] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] In the description of this invention, it should be understood that the terms “comprising” and “having” as used herein, and any variations thereof, are intended to cover non-exclusive inclusion, for example, a process, method, system, product, or device that includes a series of steps or units is not necessarily limited to those steps or units that are explicitly listed, but may include other steps or units that are not explicitly listed or that are inherent to such process, method, product, or device.

[0026] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0027] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. It should be understood that the term "and / or" as used herein is merely a description of the relationship between related objects, indicating that three relationships may exist; for example, A and / or B can represent: A alone, A and B simultaneously, and B alone. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0028] After a certain number of operating cycles, or when the immersion lithography machine suffers immersion etching damage, it is necessary to clean the immersion head. Current cleaning processes require specialized observation tools, but these tools rely heavily on manual skill, lack a fixed balancing device, and are prone to tilting or falling, potentially triggering alarms by touching the lens or other components. Furthermore, the location of residual impurities on the immersion head relies on the cleaning personnel's experience, leading to potential misjudgments. For example, the observer and the cleaner are often not the same person. When the observer finds residual impurities using the observation tool, they must inform the cleaning personnel of the location, who then relies on experience to determine the location and proceed with cleaning. This inherent human-based coordinate system introduces the possibility of misjudgment during the cleaning process. This application addresses these problems by providing an immersion lithography machine immersion head inspection device and method.

[0029] The immersion head inspection device and lithography system of the immersion lithography machine provided by the present invention will be described in detail below with reference to specific embodiments.

[0030] Figure 1 This is a schematic diagram illustrating the structure of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention during use. Figure 2 Please refer to the schematic diagram showing the connection between the walking part of the immersion head inspection device for an immersion lithography machine provided in this embodiment of the invention and the first frame and microscope head. Figure 1 and Figure 2The first aspect of this embodiment provides an immersion lithography machine immersion head inspection device, including a microscope head 1, a first frame 2 and a traveling part 3.

[0031] The inspection device in this embodiment further includes a second frame 4, which is used to fix the position of the first frame 2. In this embodiment, as shown... Figure 1 As shown, the second frame 4 is connected to the immersion head mounting plate 5. Of course, in other embodiments, the second frame 4 can also be fixed to the ground, for example, the second frame 4 can be fixed to the ground by suction cups or directional wheels.

[0032] In this embodiment, the first frame 2 is connected to the second frame 4. The plane of the first frame 2 is parallel to the plane of the immersion head 6. The outline of the first frame 2 and the projection of the outer outline of the immersion head 6 in the exposure direction of the lithography machine coincide.

[0033] The microscope head 1 is connected to the walking part 3, and the microscope head 1 faces the head 6. The walking part 3 is movably connected to the first frame 2. The detection point of the microscope head 1 is marked by the walking part 3 and the first frame 2.

[0034] The immersion head 6 of an immersion lithography machine is typically equipped with a liquid injection port, a gas vent port, and a liquid return port. The liquid injection port injects a high-refractive-index liquid, usually ultrapure water, into the immersion head to replace the air gap between the projection lens and the wafer, thereby improving lithography resolution. The gas vent port is used to release gas from inside the immersion head, ensuring that the liquid is uniformly filled between the projection lens and the wafer, preventing air bubbles or residual air from affecting the lithography effect. The liquid return port ensures that excess liquid can flow back to the liquid storage tank during liquid circulation, maintaining the stability and cleanliness of the system.

[0035] Existing immersion lithography machines generally use ultrapure water as the medium. Although the ultrapure water undergoes high-precision filtration, it is in direct contact with the wafer and lens. After a certain period, impurities from the wafer and lens will remain on the immersion head 6. On the one hand, these residues will directly contact the wafer, scratching it and affecting the quality of the exposure pattern. On the other hand, these residues will clog the liquid return holes, causing changes in the liquid flow field and affecting the quality of the exposure pattern. The microscope lens 1 in this embodiment is a high-resolution lens specifically designed for close-up photography, capable of providing high-resolution images. The microscope lens 1 in this embodiment is used to acquire high-resolution images of the surface of the immersion head 6, thereby detecting and promptly removing impurities remaining on the immersion head 6, improving the wafer lithography yield.

[0036] In this embodiment, the second frame 4 is used to connect to the immersion head mounting plate 5. Exemplarily, the second frame 4 includes four first rods 41 connected end-to-end, all located on the same plane. Each first rod 41 is fixedly connected to the immersion head mounting plate 5 via a connecting screw 43. The second frame 4 is positioned and installed using the immersion head mounting plate 5 of the immersion lithography machine. The fixed connection between the second frame 4 and the immersion head mounting plate 5 via four connecting screws 43 improves the stability of the second frame 4. The second frame 4 and the immersion head mounting plate 5 are detachably connected via the connecting screws 43, making the connection method simple and easy to operate.

[0037] In this embodiment, the first frame 2 is connected to the second frame 4. The plane of the second frame 2 is parallel to the plane of the immersion head 6, and the outline of the second frame 2 coincides with the projection of the outer outline of the immersion head 6 onto the exposure path of the lithography machine. Exemplarily, the first frame 2 includes second rods 21 corresponding to the four first rods 41 respectively. The four second rods 21 are connected end-to-end to form a closed frame. The second rods 21 are parallel to the first rods 41, and the middle of each second rod 21 is connected to the middle of each first rod 41 via a third rod 42. The first frame 2 is positioned by the second frame 4, and the first frame 2 is connected to the second frame 4 via four third rods 42, improving the stability of the first frame 2. This embodiment does not impose any particular limitation on the specific materials of the first rods 41, second rods 21, and third rods 42. In this embodiment, the walking part 3 is movably connected to the first frame 2, giving the microscope head a fixed running trajectory.

[0038] Currently, periodic inspections of the immersion head 6 are generally performed using handheld lighting equipment or magnifying observation tools. These tools rely heavily on operator skill, lack a fixed balancing device, and are prone to tilting or tipping, potentially causing the alarm to sound. In this embodiment, the plane of the first frame 2 is parallel to the plane of the immersion head 6. The outline of the first frame 2 coincides with the projection of the outer outline of the immersion head 6 onto the exposure path of the lithography machine. The microscope head 1 is connected to the traveling part 3, which can move along the first frame 2. The detection point of the microscope head 1 is positioned using the traveling part 3 and the first frame 2. Compared to existing immersion lithography machine immersion head inspection tools, this inspection device, connected to the first frame 2 via the traveling part 3, regulates the travel of the microscope head, ensuring its movement within a certain range. This prevents the microscope head from tilting or tipping, potentially causing the alarm to sound, and reduces the risk of inspection operations.

[0039] In existing immersion lithography machine immersion head inspection processes, after the observation tool detects residual impurities on the immersion head 6, the immersion head needs to be cleaned. However, the observer and the cleaner are often not the same person. When the observer observes the location of the residual impurities on the immersion head, they need to inform the cleaner of the location. The cleaner then judges the location of the residual impurities based on experience and performs cleaning accordingly, which can lead to misjudgment of the cleaning location. In this embodiment, the microscope head 1 of the inspection device is connected to the traveling part 3, which can move along the first frame 2. The detection point of the microscope head 1 is calibrated by the traveling part 3 and the first frame 2. The position of the detection point of the microscope head 1 on the immersion head 6 can be obtained by the position of the traveling part 1 on the first frame 2, thus avoiding the problem of misjudging the cleaning location.

[0040] The immersion head inspection device for an immersion lithography machine in this embodiment includes a microscope head, a first frame, and a traveling unit. The plane of the first frame is parallel to the plane of the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure path of the lithography machine. The microscope head is connected to the traveling unit and faces the immersion head. The traveling unit is movably connected to the first frame, and the detection point of the microscope head is positioned by the traveling unit and the first frame. The plane of the first frame is parallel to the plane of the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure path of the lithography machine. When the microscope head moves, the traveling unit moves along the first frame. The position of the detection point of the microscope head on the immersion head can be determined by the position of the traveling unit on the first frame. This inspection device can regulate the travel of the microscope head, prevent the microscope head from tilting or tipping over and touching the lens, reduce operational risks, and avoid misjudging the cleaning position.

[0041] Figure 3 This is a partial structural diagram of the first frame of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention. Please refer to [link / reference]. Figure 2 and Figure 3As shown, in one specific embodiment, the walking part 3 includes a moving part 31 and a connecting rod 32. The moving part 31 is disposed at one end of the connecting rod 32, and the microscope head 1 is disposed at the other end of the connecting rod 32. The first frame 2 includes a hollow track 22 for accommodating the moving part 31 and a first notch 23 for avoiding the connecting rod 32. In this embodiment, the walking part 3 includes a moving part 31 and a connecting rod 32. When the microscope head 1 is moved, the microscope head 1 drives the connecting rod 32 and the moving part 31 to move. In this embodiment, the position of the detection point of the microscope head 1 can be obtained by the position of the moving part 31 in the hollow track 22 and the length of the connecting rod 32. When the moving part 31 moves in the hollow track 22 in this embodiment, the connecting rod 32 is perpendicular to the second rod 21 of the first frame 2. The first frame 2 in this embodiment has a transparent structure, which makes it easier to observe the position of the moving part 31 on the first frame 2.

[0042] In this embodiment, the outer contour of the moving part 31 is spherical, and the cross-section of the hollow track 22 is a circle that fits the spherical moving part 31. When the moving part 31 moves inside the first frame 2, it is easier for the pressure to be distributed more evenly on the hollow track 22, making it less likely to damage the first frame 2, and also reducing the friction between the moving part 31 and the hollow track 22.

[0043] Figure 4 This is a top view of the second frame of the immersion head inspection device for an immersion lithography machine provided in an embodiment of the present invention. Figure 5 For a projection diagram of the second frame and the moving part on the preset surface provided in the embodiment of the present invention, please refer to... Figure 1-5As shown, optionally, a first projection device 24 is provided on the first frame 2. The first projection device 24 is used to project the outline of the first frame 2 and the moving part 31 along the exposure direction of the lithography machine onto a preset surface, so as to display the position of the moving part 31 on the first frame 2 on the preset surface. Exemplarily, the preset surface in this embodiment is the ground. Generally, the immersion head of the immersion lithography machine faces the ground. Since the plane where the first frame 2 is located is parallel to the plane where the immersion head 6 is located, the projection of the outline of the first frame 2 and the outer outline of the immersion head 6 on the ground coincides. In this embodiment, the projection of the outline of the first frame 2 on the ground is the projection of the outer outline of the immersion head 6 on the ground. The microscope head 1 faces the immersion head 6, and the connecting rod 32 is perpendicular to the first frame 2. The coordinates of the microscope head 1, that is, the position of the detection point of the microscope head 1, can be determined by the position of the projection of the moving part 31 on the first frame 2 on the ground and the length of the connecting rod 32. For example, in this embodiment, the projection of the first frame 2 on the preset surface, i.e. the ground, is used as the coordinate system. The coordinates of the detection point of the microscope head 1 in the coordinate system can be obtained by the position of the projection of the moving part 31 on the projection of the first frame 2 and the length of the connecting rod 32. The coordinates of the detection point of the microscope head 1 in the coordinate system are the coordinates of the detection point of the microscope head 1 on the lithography machine immersion head 6.

[0044] In one specific embodiment, please refer to Figure 1-5As shown, optionally, a first projection device 24 is provided on the first frame 2. The first projection device 24 is used to project the outline of the first frame 2 onto a preset surface along the exposure direction of the lithography machine. A second projection device is provided on the side of the moving part 31 away from the immersion head 6. The second projection device is used to project the moving part 31 onto the preset surface along the exposure direction of the lithography machine, so as to display the position of the moving part 31 on the first frame 2 on the preset surface. In this embodiment, the first projection device 24 projects the outline of the first frame 2 onto the ground along the exposure direction of the lithography machine, and the second projection device projects the moving part 31 onto the ground along the exposure direction of the lithography machine, thereby displaying the position of the moving part 31 on the first frame 2 on the ground. For example, in this embodiment, both the first projection device 24 and the second projection device are parallel light emitting devices. The first projection device 24 is a yellow light emitting device, and the second projection device is a green light emitting device. The first frame 2 is a transparent structure. Preferably, in order to ensure that the light emitted by the second projection device is better projected onto the ground, a second notch is provided on the side of the first frame 2 away from the immersion head 6. In this embodiment, the projection of the first frame 2 on the ground is yellow, and the projection of the moving part 31 on the ground is green. This makes it easy for cleaning personnel to clearly and quickly obtain the position of the moving part 31 on the first frame 2, thereby determining the coordinates of the detection point of the microscope head 1. For example, in this embodiment, the projection of the first frame 2 on the ground is used as the coordinate system. The coordinates of the detection point of the microscope head 1 in this coordinate system can be obtained by the position of the projection of the moving part 31 on the projection of the first frame 2 and the length of the connecting rod 32. The coordinates of the detection point of the microscope head 1 in this coordinate system are the same as the coordinates of the detection point of the microscope head 1 on the lithography machine immersion head 6.

[0045] In the above embodiments, the projection of the first frame 2 in the preset plane is used as the coordinate system. When the microscope head 1 moves, the positioning position of the walking part on the first frame 2 changes. The position of the projection of the walking part on the projection of the first frame 2 can be used to locate the current detection point position of the microscope head 1 in real time, and the running coordinates of the detection point of the microscope head 1 can be visualized.

[0046] In this embodiment, the immersion head inspection device for an immersion lithography machine requires cleaning the impurities on the immersion head 6 after the microscope head 1 detects residual impurities. In existing technologies, the observer and the cleaner are often not the same person. When the observer observes the location of the residual impurities on the immersion head, they need to inform the cleaner of that location. After the observer informs the cleaner of the location, the cleaner generally judges the location of the residual impurities based on experience and then cleans accordingly, which can lead to misjudgment of the cleaning location. This embodiment uses the projection of the first frame 2 on the ground as a coordinate system. The coordinates of the detection point of the microscope head 1 within this coordinate system are obtained by using the position of the projection of the moving part 31 on the projection of the first frame 2 and the length of the connecting rod 32. The coordinates of the detection point of the microscope head 1 within this coordinate system are the coordinates of the detection point of the microscope head 1 on the lithography machine immersion head 6. This inspection device avoids the problem of incomplete cleaning caused by the cleaner misjudging the cleaning location.

[0047] Figure 6 This is a schematic diagram of the sensor and the structure after the sensor is triggered in the immersion head inspection device of the immersion lithography machine provided in an embodiment of the present invention. Figure 7 For a schematic diagram of the sensor and the structure after the sensor is triggered in the immersion head inspection device of the immersion lithography machine provided in the embodiment of the present invention, please refer to [link to relevant documentation]. Figure 6 and Figure 7 In the above embodiments, the immersion head inspection device for the immersion lithography machine further includes a sensor 7, wherein the sensor 7 is triggered when the connecting screw 43 is connected to the immersion head mounting plate 5. Specifically, in this embodiment, the sensor 7 is electrically connected to an alarm, and the alarm sounds when the sensor 7 is triggered. By setting the sensor 7, this embodiment avoids removing the immersion lithography machine for use when the inspection device and the immersion head mounting plate 5 are in the installed state, ensuring operational safety. After the immersion head inspection device in this embodiment is removed from the immersion lithography machine, the alarm stops sounding.

[0048] In one specific embodiment, please refer to Figure 6Sensor 7 is a physically triggered sensor. In this embodiment, the triggered sensor measures by sensing the mechanical pressure signal generated when an object moves. For example, when an object moves, the internal mechanical structure of the sensor is subjected to pressure, thereby triggering the circuit to switch and generate an electrical signal output. This triggered sensor includes a built-in copper plate 72 and a button 72. After the connecting screw 43 of the immersion head inspection device is installed, the copper plate 71 inside the sensor 7 rises and touches the physical button 72, triggering the sensor 7. The alarm in this embodiment is a buzzer; the buzzer sounds after the sensor 7 is triggered. The triggered sensor in this embodiment is for operational safety. After the lithography machine immersion head inspection or cleaning is completed, the connecting screw 43 is removed, the copper plate 71 inside the sensor 7 resets, and the buzzer alarm is deactivated before the machine can be restarted.

[0049] In one specific embodiment, please refer to Figure 7 Sensor 7 is a comparison sensor. In this embodiment, the comparison sensor includes a transmitter 73, a receiver 74, and a spring copper plate 75. The transmitter emits a beam of light. When the sensor is not triggered, the spring copper plate 73 blocks the beam of light emitted by the transmitter. After the connecting screw 43 of the immersion head inspection device is installed, the built-in spring copper plate 73 retracts, causing a change in the intensity of the light signal received by the receiver, triggering the comparison sensor. In this embodiment, the alarm is a buzzer. After the sensor 7 is triggered, the buzzer sounds an alarm.

[0050] The immersion head inspection device for an immersion lithography machine according to an embodiment of the present invention includes a microscope head, a first frame, and a traveling part. The plane of the first frame is parallel to the plane of the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure direction of the lithography machine. The microscope head is connected to the traveling part and faces the immersion head. The traveling part is movably connected to the first frame, and the detection point of the microscope head is positioned by the traveling part and the first frame. In this inspection device, the plane of the first frame is parallel to the plane of the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure path of the lithography machine. When the microscope head moves, the traveling part moves along the first frame. The position of the detection point of the microscope head on the immersion head can be determined by the position of the traveling part on the first frame. This inspection device can standardize the travel of the microscope head, prevent the microscope head from tilting or tipping over and touching the lens, reduce operational risks, and avoid misjudging the cleaning position.

[0051] A second aspect of this embodiment provides a lithography system, including an immersion head inspection device for an immersion lithography machine as described in the above embodiment.

[0052] For example, the immersion head inspection device for an immersion lithography machine includes a microscope head, a first frame, and a traveling mechanism; The plane containing the first frame is parallel to the plane containing the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure direction of the lithography machine. The microscope head is connected to the traveling part and faces the immersion head. The traveling part is movably connected to the first frame, and the detection point of the microscope head is positioned by the traveling part and the first frame.

[0053] In this embodiment, the plane of the first frame of the immersion head inspection device for the lithography system is parallel to the plane of the immersion head. The outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure direction of the lithography machine. The microscope head is connected to the traveling part and faces the immersion head. The traveling part is movably connected to the first frame. The detection point of the microscope head is positioned by the traveling part and the first frame. When the microscope head moves, the traveling part moves along the first frame. The position of the detection point of the microscope head on the immersion head can be determined by the position of the traveling part on the first frame. This inspection device can standardize the travel of the microscope head, prevent the microscope head from tilting or tipping over and touching the lens, reduce operational risks, and avoid the problem of cleaning personnel misjudging the cleaning position.

[0054] In the above description, the terms "an embodiment," "some embodiments," "example," "specific example," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0055] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. An inspection device for the immersion head of an immersion lithography machine, characterized in that: Includes microscope lens, first frame and traveling mechanism; The plane containing the first frame is parallel to the plane containing the immersion head, and the outline of the first frame coincides with the projection of the outer outline of the immersion head onto the exposure direction of the lithography machine. The microscope head is connected to the traveling part and faces the immersion head. The traveling part is movably connected to the first frame, and the detection point of the microscope head is positioned by the traveling part and the first frame.

2. The immersion head inspection device for an immersion lithography machine according to claim 1, characterized in that: It also includes a second frame, which is connected to the first frame and is used to fix the position of the first frame.

3. The immersion head inspection device for an immersion lithography machine according to claim 2, characterized in that: The second frame is fixed to the immersion head mounting plate, or the second frame is fixed to the ground.

4. The immersion head inspection device for an immersion lithography machine according to claim 3, characterized in that: The second frame includes four first rods connected end to end, the four first rods are located on the same plane, and each first rod is fixed to the immersion head mounting plate by a connecting screw; or, the second frame is fixed to the ground by a suction cup or a directional wheel.

5. The immersion head inspection device for an immersion lithography machine according to claim 3, characterized in that: The first frame includes second members corresponding to the four first members respectively. The four second members are connected end to end. The second members are arranged parallel to the corresponding first members. The middle part of each second member is connected to the middle part of each first member through a third member.

6. The immersion head inspection device for an immersion lithography machine according to claim 1, characterized in that: The walking part includes a moving part and a connecting rod, the moving part is disposed at one end of the connecting rod, and the microscope head is disposed at the other end of the connecting rod; The first frame includes a hollow track for accommodating the movable part and a notch for avoiding the connecting rod.

7. The immersion head inspection device for an immersion lithography machine according to claim 6, characterized in that: The outer contour of the moving part is spherical.

8. The immersion head inspection device for an immersion lithography machine according to claim 6, characterized in that: A first projection device is provided on the first frame. The first projection device is used to acquire the projection of the first frame and the moving part on a preset surface along the exposure direction of the lithography machine, so as to display the position of the moving part on the first frame on the preset surface.

9. The immersion head inspection device for an immersion lithography machine according to claim 6, characterized in that: The first frame is provided with a first projection device, which is used to acquire the projection of the first frame onto a preset surface along the exposure direction of the lithography machine; A second projection device is provided on the side of the moving part away from the immersion head. The second projection device is used to acquire the projection of the moving part on a preset surface along the exposure direction of the lithography machine, so as to display the position of the moving part on the first frame on the preset surface.

10. The immersion head inspection device for an immersion lithography machine according to claim 7, characterized in that: The first frame is a transparent structure, and the first projection device and the second projection device are parallel light emitting devices.

11. The immersion head inspection device for an immersion lithography machine according to claim 4, characterized in that: It also includes sensors, among which, The sensor is triggered when the first frame is connected to the immersion head mounting plate.

12. The immersion head inspection device for an immersion lithography machine according to claim 11, characterized in that: The sensor is either a trigger-type sensor or a reference-type sensor.

13. The immersion head inspection device for an immersion lithography machine according to claim 11, characterized in that: It also includes an alarm, which is electrically connected to the sensor, and the alarm sounds when the sensor is triggered.

14. A photolithography system, characterized in that, Includes the immersion head inspection device for an immersion lithography machine as described in any one of claims 1-13.

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