Texturing apparatus for solar cells

Abstract

The application discloses a texturing equipment for solar cell pieces and relates to the technical field of solar cell piece processing. The texturing equipment for solar cell pieces comprises a processing bin and a silicon piece, a purification pipe is fixed on the processing bin, one end of the purification pipe extends into the processing bin, the other end of the purification pipe is connected with an air inlet end of a waste gas purification device, an air exchange pipe is fixed on the processing bin, one end of the air exchange pipe extends into the processing bin, the other end of the air exchange pipe is connected with an air supply device, the air supply device is used for supplementing fresh air into the processing bin, a preheating pipe is fixed on the air exchange pipe, an air outlet end of the preheating pipe extends into the air exchange pipe, an air inlet end of the preheating pipe is connected with an air outlet end of the waste gas purification device, and a heat exchanger is fixed on the preheating pipe.

Description

Technical Field

[0001] This invention belongs to the field of solar cell processing technology, specifically relating to texturing equipment for solar cells. Background Technology

[0002] Texturing equipment uses precise wet chemical or dry physical processes to construct a micro-textured structure with a light-trapping effect on the surface of silicon wafers, significantly improving light absorption efficiency. During this process, especially in the alkaline texturing stage of monocrystalline silicon, toxic and harmful gases such as hydrogen, hydrogen fluoride, and nitrogen oxides are released. If these exhaust gases are emitted directly without treatment, they will cause continuous harm to the local atmospheric environment and ecosystem. Wet scrubbing towers are typically used to neutralize and purify the exhaust gases. During operation, the exhaust gas treatment system continuously discharges gases from the chamber, requiring the replenishment of fresh air to maintain pressure balance. However, the temperature of the newly introduced air is usually lower than the process requirements, significantly disrupting the thermal balance of the texturing tank, increasing the load and energy consumption of the temperature control system, and consequently affecting the uniformity of the texturing surface and the stability of the process.

[0003] Therefore, in order to address the aforementioned technical problems, it is necessary to provide texturing equipment for solar cells.

[0004] The information disclosed in this background section is intended only to enhance the understanding of the overall background of the invention and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Summary of the Invention

[0005] The purpose of this invention is to provide a texturing device for solar cells that can solve the problem that the temperature of newly introduced air is usually lower than the process requirements, which will cause significant disturbance to the thermal balance of the texturing tank and increase the load and energy consumption of the temperature control system.

[0006] To achieve the above objectives, a specific embodiment of the present invention provides the following technical solution:

[0007] Texturing equipment for solar cells includes a processing chamber and a silicon wafer. A purification pipe is fixed on the processing chamber. One end of the purification pipe extends into the processing chamber, and the other end of the purification pipe is connected to the air inlet of an exhaust gas purification device.

[0008] The processing chamber is fixed with a ventilation pipe. One end of the ventilation pipe extends into the processing chamber, and the other end of the ventilation pipe is connected to an air supply device, which is used to replenish fresh air into the processing chamber.

[0009] A preheating pipe is fixed on the ventilation pipe. The air outlet end of the preheating pipe extends into the ventilation pipe, and the air inlet end of the preheating pipe is connected to the air outlet end of the exhaust gas purification device. A heat exchanger is fixed on the preheating pipe.

[0010] In one or more embodiments of the present invention, a water tank seat is fixed at the bottom of the processing chamber, and a flocking tank and multiple washing tanks are opened on the water tank seat;

[0011] The processing chamber is equipped with multiple ventilation pipes, one of which is located above the flocking tank and the other is located above the washing tank.

[0012] The purification pipe is fixed with multiple branch pipes, and each branch pipe draws air from one ventilation pipe.

[0013] In one or more embodiments of the present invention, a plurality of branch pipes are fixed on the ventilation pipe, and the unused end of one branch pipe extends into a ventilation pipe.

[0014] In one or more embodiments of the present invention, a clamping component is also included;

[0015] The clamping assembly includes a movable base, a storage basket, an air jet pipe, and a clamping part;

[0016] Multiple sets of silicon wafers are inserted inside the storage basket. The clamping part is used to grab the storage basket. A slide rail is provided on the top of the processing chamber. The movable base is slidably installed on the slide rail for moving and transporting the storage basket.

[0017] An air supply pipe is fixedly connected to the jet pipe, and the empty end of the air supply pipe is connected to the air exchange pipe. Multiple jet nozzles are fixedly fixed at even intervals on the jet pipe near the storage basket.

[0018] In one or more embodiments of the present invention, the plurality of air nozzles are all inclined, and their inclination direction is all towards the inside of the storage basket.

[0019] In one or more embodiments of the present invention, a telescopic part is fixedly connected to the lower part of the movable base, a fixed disc is fixedly connected to the telescopic end of the telescopic part, the jet pipe is fixedly connected to the outside of the fixed disc, and multiple sets of clamping parts are fixedly connected to the lower part of the fixed disc.

[0020] In one or more embodiments of the present invention, the clamping part includes a fixing plate, a cylinder and a clamping plate;

[0021] The fixing plate is fixedly connected to the bottom of the fixing disc, the cylinder is fixedly mounted on the fixing plate, and the clamping plate is fixed to the telescopic end of the cylinder;

[0022] A limit plate is provided on the clamping plate.

[0023] In one or more embodiments of the present invention, an air guide pipe is connected to the side of the air supply pipe, a flow divider ring is fixedly connected to the fixed disc, and the end of the air guide pipe away from the air supply pipe is connected to the flow divider ring.

[0024] A purge plate is provided on the clamping plate, and a distribution pipe is connected between the clamping plate and the diversion ring. A channel for connecting the distribution pipe and the purge plate is provided inside the clamping plate.

[0025] In one or more embodiments of the present invention, multiple sets of the purge plates are provided on the clamping plate, and all sets of purge plates are designed to be inclined downwards, with different inclination angles.

[0026] In one or more embodiments of the present invention, the storage basket includes a first frame, multiple sets of connecting rods, and a second frame;

[0027] The first frame and the second frame are fixedly connected by multiple sets of connecting rods. The second frame is provided with multiple sets of placement slots, one placement slot for placing one silicon wafer.

[0028] Compared with the prior art, the texturing equipment for solar cells of the present invention can reduce heat loss in the chamber and preheat the incoming fresh air. This not only effectively reduces heat loss in the processing chamber, but also significantly reduces the thermal shock to the process environment temperature in the chamber after exhaust gas is extracted by preheating the fresh air, saving the energy required for heating the fresh air, thereby ensuring the uniformity of silicon wafer texturing and the overall process stability. Attached Figure Description

[0029] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0030] Figure 1 This is a schematic diagram of a three-dimensional cross-sectional structure in one embodiment of the present invention;

[0031] Figure 2 This is a schematic diagram showing the positional relationship between the vent pipe and each slot in one embodiment of the present invention;

[0032] Figure 3 This is a rear-view stereoscopic structural diagram of one embodiment of the present invention;

[0033] Figure 4 This is a three-dimensional structural diagram of the clamping part in one embodiment of the present invention;

[0034] Figure 5 This is a structural schematic diagram showing the positional relationship between the clamping plate and the first frame in one embodiment of the present invention;

[0035] Figure 6 This is a schematic diagram illustrating the positional relationship between the storage basket and the silicon wafer in one embodiment of the present invention;

[0036] Figure 7 This is a schematic diagram of the connection relationship between the jet pipe and the air delivery pipe in one embodiment of the present invention;

[0037] Figure 8 This is a schematic diagram of the connection relationship between the air supply pipe and the air guide pipe in one embodiment of the present invention;

[0038] Figure 9 This is a structural schematic diagram showing the positional relationship between the limiting plate and the blowing plate in one embodiment of the present invention.

[0039] Explanation of key figure labels:

[0040] 100. Processing chamber; 110. Water tank base; 111. Texturing tank; 112. Washing tank; 120. Ventilation pipe; 121. Branch pipe; 130. Preheating pipe; 140. Purification pipe; 141. Diversion pipe; 150. Exhaust gas purification device; 160. Ventilation pipe; 200. Clamping assembly; 210. Moving base; 211. Telescopic part; 220. Storage basket; 221. First frame; 222 1. Connecting rod; 223. Second frame; 2231. Placement slot; 230. Fixing disc; 240. Jet pipe; 241. Air supply pipe; 2411. Air guide pipe; 242. Jet nozzle; 250. Clamping part; 251. Fixing plate; 252. Cylinder; 253. Clamping plate; 2531. Limiting plate; 2532. Blowing plate; 2533. Distribution pipe; 260. Diverter ring; 300. Silicon wafer. Detailed Implementation

[0041] To enable those skilled in the art to better understand the technical solutions in this disclosure, the technical solutions in the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments in this disclosure, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of this disclosure.

[0042] like Figures 1 to 3 As shown, a texturing device for solar cells according to an embodiment of the present invention includes a processing chamber 100 and a silicon wafer 300. A purification pipe 140 is fixed on the processing chamber 100. One end of the purification pipe 140 extends into the processing chamber 100. The connection between the purification pipe 140 and the processing chamber 100 is airtight. The other end of the purification pipe 140 is connected to the air inlet of an exhaust gas purification device 150. An exhaust fan is fixed on the purification pipe 140. The exhaust gas extracted from the purification pipe 140 is sent into the exhaust gas purification device 150 by the exhaust fan. The exhaust gas purification device 150 is a wet scrubbing tower. The exhaust gas purification device 150 is used to remove most of the acidic pollutants and particulate matter in the gas.

[0043] A ventilation pipe 120 is fixed on the processing chamber 100. One end of the ventilation pipe 120 extends into the processing chamber 100, and the other end of the ventilation pipe 120 is connected to an air supply device. The air supply device is used to replenish fresh air into the processing chamber 100.

[0044] A preheating pipe 130 is fixed on the ventilation pipe 120. The air outlet end of the preheating pipe 130 extends into the ventilation pipe 120, that is, the preheating pipe 130 is connected to the interior of the ventilation pipe 120. The air inlet end of the preheating pipe 130 is connected to the air outlet end of the exhaust gas purification device 150. A heat exchanger is fixed on the preheating pipe 130. The heat exchanger is used to convert the waste heat after exhaust gas purification into usable preheating energy. By smoothing the temperature fluctuation of the make-up air, it provides a crucial thermal stability guarantee for the chemical process of texturing.

[0045] Specifically, such as Figures 1 to 3 As shown, a water tank seat 110 is fixed at the bottom of the processing chamber 100. The water tank seat 110 has a flocking tank 111 and multiple washing tanks 112.

[0046] Multiple ventilation pipes 160 are fixed inside the processing chamber 100. One ventilation pipe 160 is located above the flocking tank 111, and another ventilation pipe 160 is located above a washing tank 112.

[0047] Multiple branch pipes 141 are fixed on the purification pipe 140, and each branch pipe 141 draws air from one vent pipe 160.

[0048] It should be noted that by setting corresponding suction pipes at the corresponding positions of each washing tank 112 and fabrication tank 111, toxic and harmful gases can be better extracted, reducing the diffusion of toxic and harmful gases.

[0049] Specifically, such as Figures 1 to 3 As shown, multiple branch pipes 121 are fixed on the ventilation pipe 120. The unused end of one branch pipe 121 extends into a ventilation pipe 160, that is, the branch pipe 121 and the ventilation pipe 160 are connected.

[0050] In the above embodiment, the exhaust gas in the processing chamber 100 is sent to the exhaust gas purification device 150 through the purification pipe 140. After being purified by the exhaust gas purification device 150, the exhaust gas temperature is still relatively high and the humidity is saturated, and the corrosiveness is greatly reduced. The purified exhaust gas is introduced into the heat exchanger and sent to the ventilation pipe 120 through the preheating pipe 130 to preheat the incoming fresh air. The preheated fresh air is distributed to each ventilation pipe 160 through the branch pipe 121 and transported to each process slot through the ventilation pipe 160. This can reduce the heat loss in the chamber and preheat the incoming fresh air. This not only effectively reduces the heat loss in the processing chamber 100, but also significantly reduces the thermal shock to the process environment temperature in the chamber after the exhaust gas is extracted. This saves the energy required for heating the fresh air, thereby ensuring the uniformity of silicon wafer 300 texturing and the overall process stability.

[0051] In some embodiments of this application, such as Figures 1 to 9 As shown, it also includes a clamping assembly 200, which is used to clamp the silicon wafer 300 and move it between the texturing tank 111 and the washing tank 112.

[0052] The clamping assembly 200 includes a movable base 210, a storage basket 220, an air jet pipe 240, and a clamping part 250;

[0053] Multiple sets of silicon wafers 300 are inserted inside the storage basket 220. The clamping part 250 is used to grab the storage basket 220. The top of the processing chamber 100 is provided with a slide rail. The movable base 210 is slidably installed on the slide rail for moving and transporting the storage basket 220.

[0054] An air supply pipe 241 is fixedly connected to the jet pipe 240. The unused end of the air supply pipe 241 is connected to the air exchange pipe 120. Multiple jet nozzles 242 are evenly spaced on the jet pipe 240 near the storage basket 220. The air supply pipe 241 is a flexible hose that can extend and retract as the mobile base 210 moves.

[0055] Specifically, such as Figures 4 to 7 As shown, multiple air nozzles 242 are all inclined, and their inclination direction is towards the inside of the storage basket 220. That is to say, the airflow ejected by multiple air nozzles 242 can converge towards the silicon wafer 300 and concentrate on blowing the silicon wafer 300, so that water can fall into the slot, reducing contamination between the slots, and drying the removed silicon wafer 300 at the same time.

[0056] Specifically, such as Figures 4 to 9As shown, a telescopic part 211 is fixedly connected to the lower part of the movable base 210. The telescopic part 211 is a hydraulic cylinder. A fixed disc 230 is fixedly connected to the telescopic end of the telescopic part 211. An air jet pipe 240 is fixedly connected to the outside of the fixed disc 230. Multiple sets of clamping parts 250 are fixedly connected to the lower part of the fixed disc 230. By setting multiple sets of clamping parts 250, the stability of clamping can be increased and the safety of operation can be improved.

[0057] It should be noted that the telescopic part 211 can control the speed at which the storage basket 220 is lifted out of the liquid surface through programming. During the most critical separation stage near the liquid surface, it operates at an extremely slow speed, using the surface tension of water to allow the water film to be smoothly "peeled off", reducing the water stains brought up when lifted out.

[0058] Specifically, such as Figures 4 to 9 As shown, the clamping part 250 includes a fixing plate 251, a cylinder 252 and a clamping plate 253;

[0059] The fixing plate 251 is fixedly connected to the bottom of the fixing disc 230, the cylinder 252 is fixedly installed on the fixing plate 251, and the clamping plate 253 is fixed to the telescopic end of the cylinder 252.

[0060] A limit plate 2531 is provided on the clamping plate 253.

[0061] It should be noted that the clamping plate 253 is preferably made of polyvinylidene fluoride, which can be used at a temperature of 140℃-150℃ for a long time, fully meeting the requirements of the texturing tank 111 for a temperature greater than 90℃ and the drying temperature. The material is pure and does not easily release metal ions or organic matter in high temperature and chemical environment, thus avoiding contamination of silicon wafer 300. It can also be made of polypropylene, polyethylene or other materials that can meet the requirements of the texturing process.

[0062] Specifically, such as Figures 7 to 9 As shown, an air guide pipe 2411 is connected to the side of the air supply pipe 241, and a flow divider ring 260 is fixedly connected to the fixed disc 230. The end of the air guide pipe 2411 away from the air supply pipe 241 is connected to the flow divider ring 260.

[0063] A purge plate 2532 is provided on the clamping plate 253, and a distribution pipe 2533 is connected between the clamping plate 253 and the diversion ring 260. A channel for connecting the distribution pipe 2533 and the purge plate 2532 is provided inside the clamping plate 253.

[0064] It is worth noting that the gas in the gas supply pipe 241 can enter the diversion ring 260 through the gas guide pipe 2411, and be distributed to each distribution pipe 2533 through the diversion ring 260, so that the blow plate 2532 sprays out the airflow, which can achieve simultaneous clamping and blowing of the silicon wafer 300 and the storage basket 220.

[0065] Specifically, such as Figures 7 to 9 As shown, multiple sets of purge plates 2532 are provided on the clamping plate 253. All sets of purge plates 2532 are designed to be tilted downwards, and the tilt angles of the multiple sets of purge plates 2532 are different. The purge plates 2532 are located above the limiting plate 2531. When the clamping plate 253 extends into the slot to clamp the storage basket 220, there is a distance between the purge plates 2532 and the liquid surface, and the purge plates 2532 do not directly contact the liquid surface.

[0066] It is easy to understand that multiple sets of 2532 purging plates can achieve multi-directional coordinated and three-dimensional coverage purging operations, significantly improve drying uniformity, effectively eliminate purging blind spots, shorten the process cycle, and enhance process consistency.

[0067] Specifically, such as Figures 4 to 9 As shown, the storage basket 220 includes a first frame 221, multiple sets of connecting rods 222 and a second frame 223. The limiting plate 2531 is used to be placed under the first frame 221, and there is a gap between the limiting plate 2531 and the silicon wafer 300.

[0068] The first frame 221 and the second frame 223 are fixedly connected by multiple sets of connecting rods 222. The second frame 223 is provided with multiple sets of placement slots 2231, and one placement slot 2231 is used to place a silicon wafer 300.

[0069] It should be noted that when clamping the storage basket 220, the movable base 210 moves to the top of the designated slot, and the telescopic part 211 drives the fixed disc 230 to descend, so that the limiting plate 2531 is located below the first frame 221. Then, the cylinder 252 stretches and drives the clamping plate 253 to approach the first frame 221, and the limiting plate 2531 is placed below the first frame 221. After that, the telescopic part 211 retracts to lift the storage basket 220 and the silicon wafer 300 upward. This operation is repeated to facilitate the operation of the silicon wafer 300 in multiple slots.

[0070] Based on the above embodiment, the preheated fresh air in the ventilation pipe 120 can enter the air supply pipe 241. The hot air enters the jet pipe 240 through the air supply pipe 241. When the silicon wafer 300 is lifted out of the slot, the speed at which the storage basket 220 is lifted out of the liquid surface is controlled by the telescopic part 211 using a slow lifting method. The surface tension of the water is used to smoothly peel off the water film. Then, the silicon wafer 300 is blown by multiple jet nozzles 242. At the same time, the gas in the air supply pipe 241 enters the diversion ring through the air guide pipe 2411. In 260, the airflow is distributed to each distribution pipe 2533 through the diversion ring 260, causing the blower plate 2532 to spray airflow to blow the storage basket 220 and silicon wafer 300 in all directions, forming an all-round, three-dimensional airflow network covering the storage basket 220 and silicon wafer 300. This achieves simultaneous multi-area efficient drying and cleaning, effectively reducing cross-contamination of liquids between tanks while ensuring that the silicon wafer 300 reaches the final dryness and surface cleanliness required by the process, thus improving the overall stability and continuity of the texturing process.

[0071] It will be apparent to those skilled in the art that this disclosure is not limited to the details of the exemplary embodiments described above, and that this disclosure can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of this disclosure is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within this disclosure. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0072] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A texturing apparatus for solar cells, comprising a processing chamber and a silicon wafer, characterized in that, A purification pipe is fixed on the processing chamber. One end of the purification pipe extends into the processing chamber, and the other end of the purification pipe is connected to the air inlet of the exhaust gas purification device. The processing chamber is fixed with a ventilation pipe. One end of the ventilation pipe extends into the processing chamber, and the other end of the ventilation pipe is connected to an air supply device, which is used to replenish fresh air into the processing chamber. A preheating pipe is fixed on the ventilation pipe. The air outlet end of the preheating pipe extends into the ventilation pipe, and the air inlet end of the preheating pipe is connected to the air outlet end of the exhaust gas purification device. A heat exchanger is fixed on the preheating pipe.

2. The texturing equipment for solar cells according to claim 1, characterized in that, The bottom of the processing chamber is fixed with a water tank base, and the water tank base has a flocking tank and multiple washing tanks. The processing chamber is equipped with multiple ventilation pipes, one of which is located above the flocking tank and the other is located above the washing tank. The purification pipe is fixed with multiple branch pipes, and each branch pipe draws air from one ventilation pipe.

3. The texturing equipment for solar cells according to claim 1, characterized in that, The ventilation pipe is fixed with multiple branch pipes, and the unused end of one branch pipe extends into a ventilation pipe.

4. The texturing equipment for solar cells according to claim 1, characterized in that, It also includes clamping components; The clamping assembly includes a movable base, a storage basket, an air jet pipe, and a clamping part; Multiple sets of silicon wafers are inserted inside the storage basket. The clamping part is used to grab the storage basket. A slide rail is provided on the top of the processing chamber. The movable base is slidably installed on the slide rail for moving and transporting the storage basket. An air supply pipe is fixedly connected to the jet pipe, and the empty end of the air supply pipe is connected to the air exchange pipe. Multiple jet nozzles are fixedly fixed at even intervals on the jet pipe near the storage basket.

5. The texturing equipment for solar cells according to claim 4, characterized in that, All of the aforementioned air nozzles are inclined, with their inclination direction all facing the inside of the storage basket.

6. The texturing equipment for solar cells according to claim 4, characterized in that, A telescopic part is fixedly connected to the lower part of the movable base, and a fixed disc is fixedly connected to the telescopic end of the telescopic part. The jet pipe is fixedly connected to the outside of the fixed disc, and multiple clamping parts are fixedly connected to the lower part of the fixed disc.

7. The texturing equipment for solar cells according to claim 4, characterized in that, The clamping part includes a fixing plate, a cylinder, and a clamping plate; The fixing plate is fixedly connected to the bottom of the fixing disc, the cylinder is fixedly mounted on the fixing plate, and the clamping plate is fixed to the telescopic end of the cylinder; A limit plate is provided on the clamping plate.

8. The texturing equipment for solar cells according to claim 7, characterized in that, An air guide pipe is connected to the side of the air supply pipe, and a flow divider ring is fixedly connected to the fixed disc. The end of the air guide pipe away from the air supply pipe is connected to the flow divider ring. A purge plate is provided on the clamping plate, and a distribution pipe is connected between the clamping plate and the diversion ring. A channel for connecting the distribution pipe and the purge plate is provided inside the clamping plate.

9. The texturing equipment for solar cells according to claim 8, characterized in that, The purge plate is provided in multiple sets on the clamping plate. All sets of purge plates are designed to be tilted downwards, and the tilt angles of the multiple sets of purge plates are different.

10. The texturing equipment for solar cells according to claim 4, characterized in that, The storage basket includes a first frame, multiple sets of connecting rods, and a second frame; The first frame and the second frame are fixedly connected by multiple sets of connecting rods. The second frame is provided with multiple sets of placement slots, one placement slot for placing one silicon wafer.

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