Label distribution determination method and device, medium, electronic equipment and product

Abstract

This disclosure relates to a method, apparatus, medium, electronic device, and product for determining a mark distribution; determining a target mark distribution from multiple mark distributions of a photolithographic object; the target mark distribution includes multiple measurement points; the target mark distribution is any one of the multiple mark distributions; for each measurement point, determining the combined uncertainty of the measurement point based on its position information in the target mark distribution; the combined uncertainty characterizes the deviation of the measurement point in the target mark distribution; when the combined uncertainties of the multiple measurement points all meet preset distribution conditions, setting the multiple measurement points on the photolithographic object according to the target mark distribution; through the above technical solution, the combined uncertainty of a measurement point can be determined based on the position information of the measurement points in the mark distribution of the photolithographic object, thereby evaluating the deviation of the measurement point in the overall distribution, and realizing the pre-evaluation and adjustment of the mark distribution of the photolithographic object.

Description

Technical Field

[0001] This disclosure relates to the field of semiconductor technology, and more specifically, to a method, apparatus, medium, electronic device, and product for determining a marker distribution. Background Technology

[0002] Overlay error refers to the offset between the current layer and the previous layer of a photolithographic object during the photolithography process. With the development of integrated circuit manufacturing processes, the requirements for overlay error have become increasingly stringent. Excessive overlay error can lead to short circuits and open circuits in devices, affecting product quality. In related technologies, the overlay error can be measured at some points within the mark distribution within the exposure area, and error compensation can be performed to overcome the impact of overlay error and obtain better critical dimension (CD) performance. Summary of the Invention

[0003] The purpose of this disclosure is to provide a method, apparatus, medium, electronic device, and product for determining a marker distribution.

[0004] To achieve the above objectives, in a first aspect, this disclosure provides a method for determining a marker distribution, the method comprising: A target marker distribution is determined from multiple marker distributions of a photolithographic object; the photolithographic object is the object to be subjected to the photolithography process; the target marker distribution includes multiple measurement points; the target marker distribution is any one of the multiple marker distributions. For each measuring point, the combined uncertainty of the measuring point is determined based on its position information in the target mark distribution; the combined uncertainty characterizes the deviation of the measuring point in the target mark distribution. When the combined uncertainty of the multiple measurement points all meets the preset distribution conditions, the multiple measurement points are set on the photolithographic object according to the target marking distribution.

[0005] Optionally, determining the combined uncertainty of the measuring point based on its position information in the target marker distribution includes: Based on the location information, the spatial uncertainty of the measuring point is determined; the spatial uncertainty characterizes the deviation of the measuring point in different directions in the distribution of the target markers; The combined uncertainty is determined based on the spatial uncertainty.

[0006] Optionally, the spatial uncertainty includes a first spatial uncertainty and a second spatial uncertainty; determining the spatial uncertainty of the measuring point based on the location information includes: Based on the first position information along the first direction in the position information, determine the first spatial uncertainty of the first position information; Based on the second position information along the second direction in the position information, determine the second spatial uncertainty of the second position information.

[0007] Optionally, determining the combined uncertainty based on the spatial uncertainty includes: The combined uncertainty is determined based on the first spatial uncertainty and the second spatial uncertainty.

[0008] Optionally, the preset distribution condition includes: the synthesis uncertainty is less than or equal to a preset evaluation threshold.

[0009] Optionally, the method further includes: If the combined uncertainty does not meet the preset distribution conditions, the arrangement of the target marker distribution is adjusted until the combined uncertainty of the measurement points in the target marker distribution meets the preset distribution conditions.

[0010] Optionally, adjusting the arrangement of the target marker distribution includes: Adjust the number of measurement points in the target marker distribution; and / or, Adjust the number of rows and columns of the measurement points in the target marker distribution.

[0011] Secondly, this disclosure provides an apparatus for determining a marker distribution, the apparatus comprising: A first determining module is used to determine a target mark distribution from multiple mark distributions of a photolithography object; the photolithography object is an object to be subjected to a photolithography process; the target mark distribution includes multiple measurement points; the target mark distribution is any one of the multiple mark distributions. The second determining module is used to determine the combined uncertainty of each measuring point based on its position information in the target mark distribution; the combined uncertainty characterizes the deviation of the measuring point in the target mark distribution. The setting module is used to set the multiple measurement points on the photolithography object according to the target mark distribution, provided that the combined uncertainty of the multiple measurement points meets the preset distribution conditions.

[0012] Optionally, the second determining module is used to determine the spatial uncertainty of the measuring point based on the location information; the spatial uncertainty characterizes the deviation of the measuring point in different directions in the target mark distribution; and to determine the combined uncertainty based on the spatial uncertainty.

[0013] Optionally, the spatial uncertainty includes a first spatial uncertainty and a second spatial uncertainty; the second determining module is used to determine the first spatial uncertainty of the first position information based on the first position information along a first direction in the position information; and to determine the second spatial uncertainty of the second position information based on the second position information along a second direction in the position information.

[0014] Optionally, the second determining module is configured to determine the combined uncertainty based on the first spatial uncertainty and the second spatial uncertainty.

[0015] Optionally, the preset distribution condition includes: the synthesis uncertainty is less than or equal to a preset evaluation threshold.

[0016] Optionally, the device further includes: an adjustment module; The adjustment module is used to adjust the arrangement of the target marker distribution when the combined uncertainty does not meet the preset distribution conditions, until the combined uncertainty of the measurement points in the target marker distribution meets the preset distribution conditions.

[0017] Optionally, the adjustment module is used to adjust the number of measurement points in the target marker distribution; and / or to adjust the number of rows and columns of measurement points in the target marker distribution.

[0018] Thirdly, this disclosure provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the steps of the method for determining the label distribution described in the first aspect.

[0019] Fourthly, this disclosure provides an electronic device, comprising: A memory on which computer programs are stored; A processor for executing the computer program in the memory to implement the steps of the method for determining the label distribution described in the first aspect above.

[0020] Fifthly, this disclosure provides a computer program product, including a computer program that, when executed by a processor, implements the steps of the method for determining the label distribution described in the first aspect.

[0021] The above technical solution can determine the combined uncertainty of a measurement point based on the position information of the measurement point in the mark distribution of the photolithographic object, thereby assessing the deviation of the measurement point in the overall distribution. This enables the pre-evaluation and adjustment of the mark distribution of the photolithographic object, avoids the influence of the mark distribution on the overlay error measurement value, and thus improves the accuracy of the overlay error measurement.

[0022] Other features and advantages of this disclosure will be described in detail in the following detailed description section. Attached Figure Description

[0023] The accompanying drawings are provided to further illustrate the present disclosure and form part of the specification. They are used together with the following detailed description to explain the present disclosure, but do not constitute a limitation thereof. The drawings are as follows.

[0024] Figure 1 This is a flowchart illustrating a method for determining a marker distribution according to an exemplary embodiment.

[0025] Figure 2 This is a flowchart illustrating another method for determining a marker distribution according to an exemplary embodiment.

[0026] Figure 3 This is a schematic diagram illustrating a marker distribution according to an exemplary embodiment.

[0027] Figure 4 This is a flowchart illustrating another method for determining a marker distribution according to an exemplary embodiment.

[0028] Figure 5 This is a flowchart illustrating another method for determining a marker distribution according to an exemplary embodiment.

[0029] Figure 6 This is a block diagram illustrating a device for determining a marker distribution according to an exemplary embodiment.

[0030] Figure 7 This is a block diagram illustrating another device for determining the distribution of markers according to an exemplary embodiment.

[0031] Figure 8 This is a block diagram illustrating an electronic device according to an exemplary embodiment. Detailed Implementation

[0032] The specific embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit this disclosure.

[0033] First, the application scenario of this disclosure is introduced. This disclosure is applied in the scenario of measuring the overlay error of a photolithographic object based on the mark distribution of the object during the photolithography process. Here, the mark distribution refers to the distribution of measurement points on the surface of the photolithographic object. Overlay error refers to the offset between the current layer and the previous layer of the photolithographic object during the photolithography process. With the development of integrated circuit manufacturing processes, the requirements for overlay error are becoming increasingly stringent. Excessive overlay error can lead to short circuits and open circuits in devices, affecting product quality. In related technologies, the overlay error of some measurement points in the mark distribution can be measured within the exposure area, and error compensation can be performed to overcome the impact of overlay error and obtain better feature size performance. Therefore, the number and distribution of measurement points in the mark distribution will affect the accuracy of the overlay error measurement results.

[0034] To address the aforementioned problems, this disclosure provides a method, apparatus, medium, electronic device, and product for determining a mark distribution. The method involves determining a target mark distribution from multiple mark distributions of a photolithographic object. The photolithographic object is the object to be processed using a photolithography process. The target mark distribution includes multiple measurement points. The target mark distribution is any one of the multiple mark distributions. For each measurement point, the combined uncertainty of that measurement point is determined based on its position information within the target mark distribution. This combined uncertainty characterizes the deviation of the measurement point within the target mark distribution. When the combined uncertainties of the multiple measurement points all satisfy preset distribution conditions, the multiple measurement points are set on the photolithographic object according to the target mark distribution. Through this technical solution, the combined uncertainty of a measurement point can be determined based on its position information within the mark distribution of the photolithographic object, thereby assessing the deviation of the measurement point in the overall distribution. This achieves pre-assessment and adjustment of the mark distribution of the photolithographic object, avoiding the influence of the mark distribution on the overlay error measurement value, and thus improving the accuracy of the overlay error measurement.

[0035] Figure 1 This is a flowchart illustrating a method for determining a marker distribution according to an exemplary embodiment. Figure 1 As shown, the method may include the following steps.

[0036] S101. Determine the target marker distribution from multiple marker distributions of the photolithography object.

[0037] Wherein, the photolithography object is the object to be subjected to the photolithography process; the target mark distribution includes multiple measurement points; and the target mark distribution is any one of the multiple mark distributions.

[0038] For example, the photolithographic object can be a wafer, a metal layer, or a dielectric layer, etc., and is not limited here. The multiple mark distributions can be pre-set mark distributions used to determine overlay errors, and the distribution of measurement points in the multiple mark distributions can be different.

[0039] For example, the target tag distribution can be determined from multiple tag distributions in response to a user's control command.

[0040] S102. For each measuring point, determine the combined uncertainty of the measuring point based on its position information in the target mark distribution.

[0041] The combined uncertainty can characterize the deviation of the measuring point in the target mark distribution.

[0042] For example, the measuring point can be any one of multiple measuring points. The location information can be the coordinates of the measuring point within the target marker distribution. The combined uncertainty can refer to the deviation between the fitted value and the actual value of the measuring point within the target marker distribution. The larger the combined uncertainty value, the larger the deviation; the smaller the combined uncertainty value, the smaller the deviation.

[0043] S103. When the combined uncertainty of the multiple measurement points meets the preset distribution conditions, the multiple measurement points are set on the photolithographic object according to the target mark distribution.

[0044] In some embodiments, the preset distribution condition may include: the synthesis uncertainty is less than or equal to a preset evaluation threshold. For example, the preset evaluation threshold may be set by the user, and is not limited here.

[0045] In other embodiments, a target combined uncertainty can be obtained based on the combined uncertainty of multiple measurement points; if the target combined uncertainty is less than or equal to a preset measurement point evaluation threshold, the multiple measurement points are set on the photolithographic object according to the target marking distribution.

[0046] For example, the combined uncertainty of the multiple measuring points can be averaged to obtain the target combined uncertainty. This pre-processing of the combined uncertainty of multiple measuring points improves the accuracy of the data.

[0047] The above technical solution can determine the combined uncertainty of a measurement point based on the position information of the measurement point in the mark distribution of the photolithographic object, thereby assessing the deviation of the measurement point in the overall distribution. This enables the pre-evaluation and adjustment of the mark distribution of the photolithographic object, avoids the influence of the mark distribution on the overlay error measurement value, and thus improves the accuracy of the overlay error measurement.

[0048] Figure 2This is a flowchart illustrating another method for determining a marker distribution according to an exemplary embodiment. Figure 2 As shown, step S102 above may include the following steps.

[0049] S1021. Based on the location information, determine the spatial uncertainty of the measuring point.

[0050] The spatial uncertainty characterizes the deviation of the measuring point in different directions within the target mark distribution.

[0051] S1022. Determine the combined uncertainty based on the spatial uncertainty.

[0052] In some embodiments, the spatial uncertainty may include a first spatial uncertainty and a second spatial uncertainty; S1021 may include: determining a first spatial uncertainty of the first position information based on the first position information along a first direction in the position information; and determining a second spatial uncertainty of the second position information based on the second position information along a second direction in the position information.

[0053] For example, the first spatial uncertainty can be the deviation between the fitted value and the actual value of the measuring point along a first direction in the target marker distribution; the second spatial uncertainty can be the deviation between the fitted value and the actual value of the measuring point along a second direction in the target marker distribution. For instance, the position information can be the coordinate information of the measuring point in a coordinate system, the first direction can be the x-axis direction, the second direction can be the y-axis direction, and the position information of the measuring point can be obtained through (x... m y m )express.

[0054] In other embodiments, determining the first spatial uncertainty of the first position information based on the first position information along the first direction in the position information may include: determining the first spatial uncertainty of the first position information using a first preset formula based on the first position information along the first direction in the position information. Similarly, determining the second spatial uncertainty of the second position information based on the second position information along the second direction in the position information may include: determining the second spatial uncertainty of the second position information using a first preset formula based on the second position information along the second direction in the position information.

[0055] For example, the first preset formula could be: Where t is the spatial uncertainty, X0 is the polynomial coefficient vector of the measurement point in the target mark distribution, i.e. the location information of the measurement point, and K is the generalized inverse matrix of the polynomial coefficient vector matrix of the measurement point, which is a multi-order matrix.

[0056] It should be noted that, in some embodiments, the first preset formula can be represented by the following system of equations:

[0057] In this system of equations, [x m y m [ ] can be the location information of the measurement points in the target marking distribution, and k is a coefficient. In this way, the spatial uncertainty in different directions can be determined by the first preset formula.

[0058] In some embodiments, determining the combined uncertainty based on the spatial uncertainty may include determining the combined uncertainty based on the first spatial uncertainty and the second spatial uncertainty. In this way, the overall combined uncertainty of the measuring point can be determined based on the spatial uncertainties in different directions.

[0059] In other embodiments, determining the combined uncertainty based on the first spatial uncertainty and the second spatial uncertainty may include: determining the combined uncertainty using a second preset formula based on the first spatial uncertainty and the second spatial uncertainty. For example, the second preset formula may be: Where T is the combined uncertainty, and t x Let t be the first spatial uncertainty. y This represents the second spatial uncertainty.

[0060] For example, Figure 3 This is a schematic diagram illustrating a marker distribution according to an exemplary embodiment. Figure 3 The diagram includes multiple marker distribution plots (1), (2), (3), and (4). The distribution patterns in these plots are identical, but the combined uncertainty values ​​are all different. The matrix order in the first preset formula used to determine the combined uncertainty in (1) to (4) increases sequentially. The corresponding T values ​​in (1) to (4) are... MEAN and T MAX The values ​​also increase sequentially (i.e., the synthesis uncertainty increases sequentially), resulting in the colors at the four corner measurement points in (1) to (4) becoming lighter sequentially. This is due to the effect of linear fitting of the measurement points in the mark distribution, where the extrapolation distortion increases with the order. For example, the colors at the four corner measurement points in (1) are darker, indicating that the synthesis uncertainty is lower and the extrapolation distortion is smaller; the colors at the four corner measurement points in (4) are lighter, indicating that the synthesis uncertainty is higher and the extrapolation distortion is larger.

[0061] Figure 4 This is a flowchart illustrating another method for determining a marker distribution according to an exemplary embodiment. Figure 4 As shown, the method may also include the following steps.

[0062] S104. If the combined uncertainty does not meet the preset distribution condition, adjust the arrangement of the target mark distribution until the combined uncertainty of the measuring points in the target mark distribution meets the preset distribution condition.

[0063] For example, the fact that the combined uncertainty does not meet the preset distribution condition can mean that the combined uncertainty is greater than the preset evaluation threshold. In this way, by adjusting the arrangement of the target mark distribution through the combined uncertainty, the target mark distribution is made to meet the preset distribution condition. Thus, multiple measurement points can be set on the photolithographic object using the adjusted target mark distribution, thereby realizing the evaluation and adjustment of the mark distribution of the photolithographic object.

[0064] For example, if the combined uncertainty of any one of the multiple measurement points is greater than the preset evaluation threshold, then the combined uncertainty of the target marker distribution measurement points does not meet the preset distribution condition.

[0065] In some embodiments, adjusting the arrangement of the target marker distribution may include: adjusting the number of measurement points in the target marker distribution; and / or, adjusting the number of rows and columns of measurement points in the target marker distribution.

[0066] For example, while keeping the number of measurement points in the target marker distribution constant, the number of rows and columns of the measurement points in the distribution can be adjusted to make the distribution of the measurement points meet the preset distribution conditions. In this way, by adjusting the arrangement of the measurement points, the combined uncertainty of the measurement points can be adjusted, thereby making the target marker distribution meet the preset distribution conditions.

[0067] For example, the number of measurement points in the target marker distribution can be increased or decreased to adjust the number of measurement points. Furthermore, after adjusting the number of measurement points in the target marker distribution, the target marker distribution can be readjusted according to the adjusted number of measurement points. In this way, by adjusting the number of measurement points, the marker distribution can be adjusted, thereby adjusting the combined uncertainty of the measurement points.

[0068] As described above, the first spatial uncertainty and the second spatial uncertainty can be determined using the first preset formula, and the combined uncertainty can be determined based on the first spatial uncertainty and the second spatial uncertainty. It is evident that the combined uncertainty can be related to the first preset formula; furthermore, the first preset formula can include a multi-order matrix, and the matrix order of the multi-order matrix can be a pre-set value. That is, the first preset formula can be related to the matrix order of the multi-order matrix, therefore the combined uncertainty can be related to the matrix order of the multi-order matrix. In other words, the combined uncertainty can be adjusted by adjusting the matrix order of the multi-order matrix.

[0069] Therefore, in some embodiments, the above method may further include: if the combined uncertainty does not meet the preset distribution condition, adjusting the matrix order of the multi-order matrix in the first preset formula until the combined uncertainty of the measurement points in the target mark distribution meets the preset distribution condition. For example, adjusting the matrix order of the multi-order matrix in the first preset formula may include: increasing the matrix order of the multi-order matrix, or decreasing the matrix order of the multi-order matrix. In this way, by adjusting the matrix order, the combined uncertainty can be adjusted, thereby ensuring that the target mark distribution meets the preset distribution condition.

[0070] Figure 5 This is a flowchart illustrating another method for determining a marker distribution according to an exemplary embodiment.

[0071] S501. Determine the target marker distribution from multiple marker distributions of the photolithography object.

[0072] S502. For each measuring point, determine the spatial uncertainty of the measuring point based on its position information in the target mark distribution.

[0073] This spatial uncertainty may include a first spatial uncertainty and a second spatial uncertainty.

[0074] S503. Determine the combined uncertainty based on the first spatial uncertainty and the second spatial uncertainty.

[0075] S504. When the combined uncertainty of the multiple measurement points meets the preset distribution conditions, the multiple measurement points are set on the photolithographic object according to the target mark distribution.

[0076] S505. If the combined uncertainty does not meet the preset distribution condition, adjust the arrangement of the target mark distribution until the combined uncertainty of the measurement points in the target mark distribution meets the preset distribution condition.

[0077] The above technical solution can determine the combined uncertainty of a measurement point based on the position information of the measurement point in the mark distribution of the photolithographic object, thereby assessing the deviation of the measurement point in the overall distribution. This enables the pre-evaluation and adjustment of the mark distribution of the photolithographic object, avoids the influence of the mark distribution on the overlay error measurement value, and thus improves the accuracy of the overlay error measurement.

[0078] Figure 6 This is a block diagram illustrating a device for determining a marker distribution according to an exemplary embodiment. Figure 6 As shown, the marker distribution determination device 600 includes: a first determination module 610, a second determination module 620, and a setting module 630; The first determining module 610 is used to determine a target mark distribution from multiple mark distributions of a photolithography object; the photolithography object is an object to be subjected to a photolithography process; the target mark distribution includes multiple measurement points; the target mark distribution is any one of the multiple mark distributions. The second determining module 620 is used to determine the combined uncertainty of each measuring point based on its position information in the target mark distribution; the combined uncertainty characterizes the deviation of the measuring point in the target mark distribution. The setting module 630 is used to set the multiple measurement points on the photolithographic object according to the target mark distribution when the combined uncertainty of the multiple measurement points all meet the preset distribution conditions.

[0079] The above technical solution can determine the combined uncertainty of a measurement point based on the position information of the measurement point in the mark distribution of the photolithographic object, thereby assessing the deviation of the measurement point in the overall distribution. This enables the pre-evaluation and adjustment of the mark distribution of the photolithographic object, avoids the influence of the mark distribution on the overlay error measurement value, and thus improves the accuracy of the overlay error measurement.

[0080] Optionally, the second determining module is used to determine the spatial uncertainty of the measuring point based on the location information; the spatial uncertainty characterizes the deviation of the measuring point in different directions in the target mark distribution; and to determine the combined uncertainty based on the spatial uncertainty.

[0081] Optionally, the spatial uncertainty includes a first spatial uncertainty and a second spatial uncertainty; the second determining module 620 is used to determine the first spatial uncertainty of the first position information based on the first position information along the first direction in the position information; and to determine the second spatial uncertainty of the second position information based on the second position information along the second direction in the position information.

[0082] Optionally, the second determining module 620 is used to determine the combined uncertainty based on the first spatial uncertainty and the second spatial uncertainty.

[0083] Optionally, the preset distribution condition includes: the synthesis uncertainty is less than or equal to a preset evaluation threshold.

[0084] Figure 7 This is a block diagram illustrating another apparatus for determining a marker distribution according to an exemplary embodiment. Figure 7 As shown, the device 600 for determining the marker distribution may further include: an adjustment module 640; The adjustment module 640 is used to adjust the arrangement of the target marker distribution when the combined uncertainty does not meet the preset distribution condition, until the combined uncertainty of the measurement points in the target marker distribution meets the preset distribution condition.

[0085] Optionally, the adjustment module 640 is used to adjust the number of measurement points in the target mark distribution; and / or, to adjust the number of rows and columns of measurement points in the target mark distribution.

[0086] Regarding the apparatus in the above embodiments, the specific manner in which each module performs its operation has been described in detail in the embodiments related to the method, and will not be elaborated upon here.

[0087] In summary, this disclosure provides a method, apparatus, medium, electronic device, and product for determining a mark distribution; determining a target mark distribution from multiple mark distributions of a photolithographic object; the photolithographic object being the object to be processed by photolithography; the target mark distribution including multiple measurement points; the target mark distribution being any one of the multiple mark distributions; for each measurement point, determining the combined uncertainty of the measurement point based on its position information in the target mark distribution; the combined uncertainty characterizing the deviation of the measurement point in the target mark distribution; when the combined uncertainties of the multiple measurement points all meet preset distribution conditions, setting the multiple measurement points on the photolithographic object according to the target mark distribution; through the above technical solution, the combined uncertainty of a measurement point can be determined based on the position information of the measurement points in the mark distribution of the photolithographic object, thereby evaluating the deviation of the measurement point in the overall distribution, realizing the pre-evaluation and adjustment of the mark distribution of the photolithographic object, avoiding the influence of the mark distribution on the overlay error measurement value, and thus improving the accuracy of the overlay error measurement.

[0088] Figure 8 This is a block diagram illustrating an electronic device 800 according to an exemplary embodiment. For example, the electronic device 800 may be provided as a server. (Refer to...) Figure 8 The electronic device 800 includes a processor 822, which may be one or more, and a memory 832 for storing computer programs executable by the processor 822. The computer program stored in the memory 832 may include one or more modules, each corresponding to a set of instructions. Furthermore, the processor 822 may be configured to execute the computer program to perform the aforementioned method for determining the tag distribution.

[0089] Additionally, the electronic device 800 may also include a power supply component 826 and a communication component 850. The power supply component 826 can be configured to perform power management of the electronic device 800, and the communication component 850 can be configured to enable communication of the electronic device 800, such as wired or wireless communication. Furthermore, the electronic device 800 may also include an input / output interface 858. The electronic device 800 can operate on an operating system, such as Windows Server, stored in the memory 832. TM Mac OS XTM Unix TM Linux TM etc.

[0090] In another exemplary embodiment, a computer-readable storage medium including program instructions is also provided, which, when executed by a processor, implement the steps of the method for determining the tag distribution described above. For example, the computer-readable storage medium may be the memory 832 including the program instructions described above, which may be executed by the processor 822 of the electronic device 800 to complete the method for determining the tag distribution described above.

[0091] In another exemplary embodiment, a computer program product is also provided, which includes a computer program executable by a processor, which, when executed by the processor, implements the steps of the method for determining the label distribution described above.

[0092] The preferred embodiments of this disclosure have been described in detail above with reference to the accompanying drawings. However, this disclosure is not limited to the specific details of the above embodiments. Within the scope of the technical concept of this disclosure, various simple modifications can be made to the technical solutions of this disclosure, and these simple modifications all fall within the protection scope of this disclosure.

[0093] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, this disclosure will not describe the various possible combinations separately.

[0094] Furthermore, various different embodiments of this disclosure can be combined in any way, as long as they do not violate the spirit of this disclosure, they should also be regarded as the content disclosed in this disclosure.

Claims

1. A method for determining a labeled distribution, characterized in that, The method includes: A target marker distribution is determined from multiple marker distributions of a photolithographic object; the photolithographic object is the object to be subjected to the photolithography process; the target marker distribution includes multiple measurement points; the target marker distribution is any one of the multiple marker distributions. For each measuring point, the combined uncertainty of the measuring point is determined based on its position information in the target mark distribution; the combined uncertainty characterizes the deviation of the measuring point in the target mark distribution. When the combined uncertainty of the multiple measurement points all meets the preset distribution conditions, the multiple measurement points are set on the photolithographic object according to the target marking distribution.

2. The method according to claim 1, characterized in that, The step of determining the combined uncertainty of the measuring point based on its position information in the target marker distribution includes: Based on the location information, the spatial uncertainty of the measuring point is determined; the spatial uncertainty characterizes the deviation of the measuring point in different directions in the distribution of the target markers; The combined uncertainty is determined based on the spatial uncertainty.

3. The method according to claim 2, characterized in that, The spatial uncertainty includes a first spatial uncertainty and a second spatial uncertainty; determining the spatial uncertainty of the measuring point based on the location information includes: Based on the first position information along the first direction in the position information, determine the first spatial uncertainty of the first position information; Based on the second position information along the second direction in the position information, determine the second spatial uncertainty of the second position information.

4. The method according to claim 3, characterized in that, Determining the combined uncertainty based on the spatial uncertainty includes: The combined uncertainty is determined based on the first spatial uncertainty and the second spatial uncertainty.

5. The method according to claim 1, characterized in that, The preset distribution conditions include: The synthesis uncertainty is less than or equal to a preset evaluation threshold.

6. The method according to claim 1, characterized in that, The method further includes: If the combined uncertainty does not meet the preset distribution conditions, the arrangement of the target marker distribution is adjusted until the combined uncertainty of the measurement points in the target marker distribution meets the preset distribution conditions.

7. The method according to claim 6, characterized in that, The adjustment of the distribution of the target markers includes: Adjust the number of measurement points in the target marker distribution; and / or, Adjust the number of rows and columns of the measurement points in the target marker distribution.

8. A device for determining the distribution of markers, characterized in that, The device includes: A first determining module is used to determine a target mark distribution from multiple mark distributions of a photolithography object; the photolithography object is an object to be subjected to a photolithography process; the target mark distribution includes multiple measurement points; the target mark distribution is any one of the multiple mark distributions. The second determining module is used to determine the combined uncertainty of each measuring point based on its position information in the target mark distribution; the combined uncertainty characterizes the deviation of the measuring point in the target mark distribution. The setting module is used to set the multiple measurement points on the photolithography object according to the target mark distribution, provided that the combined uncertainty of the multiple measurement points meets the preset distribution conditions.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When executed by a processor, the program implements the steps of the method described in any one of claims 1-7.

10. An electronic device, characterized in that, include: A memory on which computer programs are stored; A processor for executing the computer program in the memory to implement the steps of the method according to any one of claims 1-7.

11. A computer program product, comprising a computer program, characterized in that, When executed by a processor, the computer program implements the steps of the method described in any one of claims 1-7.

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