Battery state control during cross-sectional beam milling

Abstract

During and after ion beam milling, the sample stage is operable to electrically contact and hold the sample. During sample processing by incident an ion beam onto a first sample surface along a first direction, sample electrical characteristics, such as voltage or impedance, are measured. Based on the measurements, the sample electrical characteristics are adjusted by applying voltage or current, causing the sample stage to rotate to allow sample milling from a second direction. A non-conductive mask can be positioned to reduce material re-deposition from the stage surface onto the sample.

Description

Technical Field

[0001] This disclosure relates to the electrical control and evaluation of samples during ion beam milling. Background Technology

[0002] A broad ion beam (BIB) milling system has been developed for preparing samples for electron microscopy. BIB milling can replace traditional cutting, grinding, and polishing operations, which are either impractical or difficult to perform for some types of samples. Traditional methods can lead to sample preparation-related defects on the surface, making the determination of the actual sample condition challenging. Furthermore, BIB milling has been implemented using systems that hold the sample in a controlled environment to avoid exposing the milled surface to air or other environments that could damage or otherwise alter the sample surface. Combining a controlled environment with BIB milling enables the preparation and examination of high-quality surfaces for difficult-to-handle samples, such as soft or reactive materials.

[0003] Unfortunately, for some samples of interest, redeposition of material removed by BIB can damage the samples. Furthermore, it can be difficult to simultaneously monitor the condition of the samples and properly fix them during BIB milling. For some samples, such as certain types of batteries, neglecting to monitor the battery's state of charge can lead to battery damage, rendering further processing and evaluation meaningless. For these reasons, improvements to the BIB milling method are needed. Summary of the Invention

[0004] This document discloses a stage for holding a cell or other sample during cross-sectional preparation in a broad ion beam (BIB) polishing system. The disclosed stage provides an electrical connection to the sample mounted on the stage, allowing for the measurement of current, voltage, and impedance, or the application of voltage or current to the sample using, for example, a galvanometer, potentiostat, or other electronic equipment, during milling or other machining operations using an ion beam (such as a broad ion beam (BIB)). In addition to providing electrical connection, the disclosed stage allows for the compression of the sample held in the stage using stage jaws, and the transport of the sample held in the stage for other evaluation and processing procedures, such as imaging in an electron microscope or optical microscope. Furthermore, a processing system is provided in which the stage and the sample held in the stage are maintained in a controlled environment, such as an argon atmosphere. When BIB or other operations are applied to the sample cell, the cell voltage can be maintained during milling, and the cell voltage can be established or re-established using the stage before the cell is transferred out of the BIB system. While the cell is in the stage, the cell discharge time can be measured, and the cell can be recharged as needed before or after transfer based on the measured discharge time. The stage holding the battery can be rotated or otherwise repositioned so that the battery can undergo cross-sectional milling and / or planar milling, thereby removing debris generated by cross-sectional milling via planar milling, and vice versa. In some examples, an insulating shield is provided so that the milling bundle does not generate conductive debris from the stage assembly that deposits on the sample or other workpiece.

[0005] The foregoing and other features and advantages of this disclosure will become more apparent from the following detailed description with reference to the accompanying drawings. Attached Figure Description

[0006] Figure 1A shows a representative stage that allows electrical connection to the battery held in the sample volume.

[0007] Figure 1B shows a portion of the stage shown in Figure 1A.

[0008] Figure 1C is a perspective view of the battery in Figure 1A.

[0009] Figure 1D shows the platforms of Figures 1A to 1B fixed to the base.

[0010] Figure 2 shows another representative stage.

[0011] Figure 3A illustrates a processing system in which samples are fixed to a stage for transport between a BIB milling system and a SEM in a controlled environment, wherein the samples are positioned for cross-sectional milling.

[0012] Figure 3B shows the BIB milling system of Figure 3A, where the sample is positioned for top surface milling.

[0013] Figure 4 shows the platform fixed to the movable base.

[0014] Figure 4A shows the movable base of Figure 4.

[0015] Figure 4AA is a cross-sectional view of the movable base of Figure 4A.

[0016] Figure 5 shows the platform fixed to the movable base.

[0017] Figure 5A is a cross-sectional view of the movable base of Figure 5.

[0018] Figure 6A is an elevation view of the platform fixed to a movable base located in the guide.

[0019] Figure 6B shows the movable base and guide of Figure 6A.

[0020] Figures 6C to 6D show the positioning components for moving the stage of Figure 6A along the guide.

[0021] Figure 7 shows an additional representative stage.

[0022] Figure 8 illustrates a representative method for ion beam milling of a battery held in a stage.

[0023] Figure 9A is a cross-sectional view of the stage including the non-conductive mask.

[0024] Figure 9B Figure 9C shows an additional representative example of a stage including a non-conductive mask. Detailed Implementation

[0025] The disclosed methods provide approaches, systems, and apparatuses for ion beam milling (such as wide ion beam (BIB) milling) of samples (such as batteries or other devices) while monitoring, correcting, and adjusting the electrical properties of the samples. In a particular example, the battery is fixed for BIB milling while the anode-cathode impedance or anode-cathode voltage is measured and the battery voltage is adjusted. For convenience, the sample mounting apparatus is referred to herein as a “stage.” In many cases, it is advantageous or necessary to move or “transport” the sample between an ion beam milling apparatus (such as a BIB apparatus) and a charged particle imaging apparatus (such as a scanning electron microscope). In some examples of moving or transporting the sample, the sample is held in a controlled environment, such as an inert gas environment, during the transport. However, unless otherwise stated, the stage need not provide any specific moving or transport capability, but only need to be used to fix or hold the sample. Examples of systems suitable for the round-trip transport of samples within or between processing systems (such as BIB systems) and evaluation systems (such as SEM) are described in U.S. Patent Application Publication No. 2023 / 0132874 and U.S. Patent Application Publication No. 2023 / 0420216, which are incorporated herein by reference.

[0026] General terms As used herein, a guide portion, channel, or protrusion is defined such that a channel defined on a first component can engage with a protrusion defined on a second component, wherein the channel and the protrusion define a translational axis and restrict movement to along the translational axis. Examples include rectangular grooves and corresponding rectangular protrusions, channels having a dovetail shape and corresponding protrusions, or other combinations of shapes defined by curves or straight lines. Such engageable components are referred to herein as “complementary.”

[0027] "Controlled environment" refers to an environment based on an inert gas, an inert gas mixture, or other gases or mixtures that do not typically alter the properties of the sample upon exposure, as well as a vacuum in which the sample is substantially unexposed.

[0028] "Orthogonal" refers to an angle within the range of 90 degrees ± 2 degrees, ± 5 degrees, ± 10 degrees, or ± 15 degrees with respect to the perpendicular.

[0029] Examples of this disclosure relate to ion beam milling of a battery. As used herein, the battery includes an anode and a cathode, and an electrolyte located between the anode and the cathode. The anode and cathode are typically formed of a conductive material whose thickness dimension is substantially smaller than its dimensions in other directions. As used herein, “edge” refers to the surface that terminates along the thickness of the anode or cathode, i.e., the thinnest exposed surface. “Electrode” refers to the anode or cathode.

[0030] While resistance (measured in ohms) is a convenient measure of the electrical connection between the anode and cathode of a battery, other measures, such as conductivity, conductance, or impedance, are also available.

[0031] Example 1 Referring to Figure 1A, a representative cross-sectional view of the battery stage 100 includes conductive inserts 102, 103 positioned in directions 130, 131 towards and away from volume 106, which is adapted to accommodate battery 140 or other samples. The conductive inserts 102, 103 contact insulating pads 108, 109, which contact jaws 112, 113, which can move toward and away from each other. Electrical connections to the battery disposed in volume 106 can be made using feedthroughs 126, 127, which typically include a center conductor embedded in an insulating sleeve. As shown in Figure 1A, feedthroughs 126, 127 are coupled to a galvanostat / potentialostat 129 or other suitable electrical circuitry for measuring and / or controlling one or more of the voltage, current, and impedance associated with the battery in volume 106, and / or applying current or voltage to the battery.

[0032] Figure 1B shows the arrangement of the conductive insert 103, insulating pad 109, and jaw 113, without the electrical feedthrough 127, which is inserted into or passes through hole 127A during use. Figure 1A In Figure 1B, these holes and associated screws, alignment pins and electrical feeders are shown in a common cross section in the XY plane of coordinate system 190; in a typical embodiment, some or all of them are in different XY planes, and the arrangement of Figures 1A to 1B is for ease of illustration.

[0033] As shown in Figure 1C, the battery 140 includes a first electrode 141 and a second electrode 142, with an electrolyte 143 located therebetween. Electrodes may be referred to as plates or plate-like electrodes because their dimensions in the Y and Z directions of coordinate system 190 are typically at least 5, 10, 20, 50, or 100 times their dimensions in the X direction. For convenience, the electrode dimension along the X-axis herein refers to thickness. Electrode surfaces (such as surface 141B) are referred to herein as master surfaces in contrast to electrode thickness. Also as shown in Figure 1C (and partly as shown in Figure 1A), the stage 100 may be arranged such that an ion beam is incident on the surface along axis 150 for cross-sectional milling, or incident along axis 151 such that the ion beam is guided to surfaces 141A, 142A of electrodes 141, 142 and surface 143A of electrolyte 143 for top surface milling. Cross-sectional milling or top-surface milling is typically selected by rotating the stage relative to the ion beam source or by positioning the ion source relative to the sample. For ease of explanation, axes 150 and 151 are shown at specific angles, but various angles can be selected, and different axes are typically chosen for cross-sectional and surface milling. For example, cross-sectional milling can be performed using axes 150' and 150'', or any axis within a cone defined by a cone angle θ, where θ ≤ 5, 10, 20, 30, or 45 degrees. Similarly, top-surface milling can be performed using an axis within a cone angle φ relative to the -Z axis, as shown in Figure 1C, where φ ≤ 5, 10, 20, 30, or 45 degrees. However, other axes can be used for both cross-sectional and top-surface milling if convenient.

[0034] Figure 1D shows a battery carrier 100, in which one of the jaws 112, 113 is fixed to a base plate 160, and the other is movable to secure and contact the battery disposed in the volume 106. Electrical connections to conductive inserts 102, 103 are made via conductive pins or terminals 164, 165 fixed to the base plate 160.

[0035] Example 2 In another example shown in Figure 2, stage 202 includes insulating feeders 204, 205 that extend through stage jaws 208, 209 to corresponding insulating pressure plates 210, 211 to contact sample 201 via center conductors 214, 215.

[0036] Example 3 Referring to Figures 3A and 3B, a representative system includes a BIB processing system 300 and a transport system 301 operable to maintain the sample in a controlled environment, transporting the sample between the BIB processing system 300 and a SEM or other imaging system 302 that allows for sample observation and evaluation. The BIB system 300 includes a BIB source 310 or other ion beam source operable to guide the BIB along a sample axis 312A to a sample 314 located within a housing 308 that establishes a controlled atmosphere. The sample 314 is held by a stage 316, such as those described herein. The stage 316 is mounted to a stage 318, which is capable of providing arbitrary translation and rotation as needed so that the BIB is incident on the sample at a suitable position and angle. The sample 314 is electrically connected to an electrical measurement and control system 320 operable to measure sample voltage, current, and impedance, and to apply voltage or current before, during, and after BIB milling.

[0037] During battery BIB milling, electrical system 320 can be operated to measure battery impedance and voltage during BIB milling. For certain types of batteries, electrical system 320 can charge the battery as required to prevent battery damage when the battery voltage drops below a predetermined limit. Electrical system 320 can also measure battery impedance. In some cases, debris generated during BIB milling can reduce the resistance between battery electrodes, and the determination of low or decreased impedance and / or voltage can be used to indicate the need for milling to remove this debris. In this case, sample stage 318 is operated to rotate stage 316 such that the BIB is incident on sample 314 along sample axis 312B, which is different from sample axis 312A, to remove debris, as shown in Figure 3B.

[0038] The electrical characteristics of sample 314 are detected, and voltage or current is applied using sample electronics 320, which may include voltage, current, and impedance measurement electronics, as well as current and voltage sources. System controller 322 is coupled to BIB source 310l, stage 318, and sample electronics 320 to operate each of them as needed.

[0039] The transport system 301 can be arranged such that sample 314 and samples transported back and forth can be transferred to chamber 328 of imaging system 302 in a controlled environment. Imaging system 302 includes a charged particle optical column 330 (charged particle source, lens, deflector, detector, etc.) positioned to image sample 314, which is operable in response to system controller 322.

[0040] Example 4 Referring to Figure 4, the sample stage 402 includes a first jaw 404 and a second jaw 405, wherein the second jaw 405 is secured to a translational base 410 by one or more screws or other fasteners. Corresponding first insulators 412 and second insulators 413 are shown pressed against corresponding conductive plates 414, 415 defining a sample volume 418. The sample located in the sample volume 418 can be electrically coupled to an electronic measurement system or a current and voltage source without electrical contact with the translational base 410 or the first jaw 404 and second jaw 405. In operation, when the screw 428 or other mechanism is engaged to push the first jaw 404 toward the second jaw 405, the jaw faces remain substantially parallel.

[0041] The translatable base 410 includes a first tapered edge 430 and a second tapered edge 431, selected to fit into corresponding recesses for stable translation of the stage 402 in the Z-axis direction within a guide rail (not shown). Figure 4A shows the translatable base 410 to which contact pins 451 to 453 are secured. A member 434 is secured to the translatable base 410 and defines a threaded hole 435 adapted to mate with a screw 428. Figure 4AA is a cross-sectional view of the translatable base showing the tapered edges 430, 431.

[0042] Example 5 Figure 5 Figure 5A illustrates a sample stage 500 located on a translational base 504 and defining a sample cavity 506. In this example, as shown in the cross-sectional view of Figure 5A, the translational base 504 includes a protrusion 508 positioned to restrict jaws 510 of the sample stage 500. One or more electrical contacts (such as representative contacts 520) are attached to the translational base 504 and electrically coupled to the sample cavity 506.

[0043] Example 6 Figure 6A Figure 6B shows a stage 602 including a first jaw 604 and a second jaw 605. The first and second jaws are provided with corresponding insulators 608, 609 and conductive pressure plates 612, 613, which are operable to electrically contact and secure a sample, such as a battery located in a sample volume 616. The first jaw 608 can be pushed toward the second jaw 609 to secure and contact the sample.

[0044] A stage 602 is fixed to a base 630, which is held in a channel 637 defined in a guide 636 to allow translation along the axis of the guide 636. A bore 632 is defined in the guide 636 to allow access to a cavity 640. Refer to Figures 6C to... Figure 6D The end 642 of the positioning member 644 can be inserted into the cavity 640 through the hole 632 and is rotatable, such that the positioning member 644 can translate the base 630 along the axis of the base 630. In a typical example, the positioning member 640 includes a rod 646 coupled to the end 642.

[0045] Example 7 Figure 7 illustrates a stage 702 including a first jaw 704 and a second jaw 705, the first and second jaws being provided with corresponding insulators 708, 709 and conductive pressure plates 712, 713, which are operable to electrically contact and secure a sample, such as a battery located in a sample volume 716. Screws or other mechanisms may be positioned to push the first jaw 704 and the second jaw 705 toward each other to secure and contact the sample. The stage 702 is secured to a base 730, which can be held in a channel to allow translation along the axis of the guide.

[0046] In the example of Figure 7, the electrical connection to sample volume 716 is provided by electrical feeders 727 and 728 extending through insulators 708 and 709 and conductive plates 712 and 713. They are electrically connected to connection terminals 750 and 751 via wires or conductive strips.

[0047] Example 8 A representative method 800 for ion beam milling of a battery (such as BIB milling) includes: loading the battery into a stage at 802, and transferring the stage to a BIB apparatus, preferably in a controlled atmosphere, at 804. At 806, milling is performed on the exposed battery surface along the battery edge. At 808, battery impedance, conductivity, or other parameters associated with the battery's electrical impedance are measured. For measurements indicating a relatively lower impedance than preferred, the milling ion beam is guided at 810 for top-surface milling, wherein the axis of the ion beam is parallel to the main surface of the anode or cathode. After top-surface milling at 810, the ion beam is again guided at 806 for cross-sectional milling at the battery edge. In most practical applications, the axis of the milling ion beam remains substantially the same, and the stage is rotated to change the direction of the ion beam milling.

[0048] For batteries of the same type, a selected battery voltage needs to be maintained to avoid battery failure or other changes that render further processing meaningless. For this reason, at 812, the battery voltage is checked, and in some cases, such as for a battery voltage that has become too low, the battery is recharged at 814 to reach the appropriate voltage. If the battery voltage and the battery anode-cathode impedance are acceptable, at 816, it is determined whether to continue milling and return to 806, or to stop milling at 816. While performing method 800, the battery is held in a controlled environment and can be transported back and forth to the SEM or other charged particle imaging system in the same or different controlled environments. Battery impedance and voltage are typically monitored continuously or periodically during milling so that the milling direction can be changed at 810 or the battery can be recharged at 814.

[0049] Example 9 In some cases, BIB milling can result in the milling and redeposition of conductive inserts, jaws, or other portions of the stage onto the workpiece surface. This is particularly problematic in BIB milling of batteries, where the deposition of conductive material on the battery surface can lead to electrical short circuits. Problems associated with redeposition can be reduced or avoided by providing a suitable mask, preferably a non-conductive mask. Referring to Figure 9A, a representative cross-sectional view of the battery stage 900 includes conductive inserts 902, 903 positioned in directions 930, 931 and pushed toward and away from a volume 906 adapted to accommodate a battery or other sample or workpiece. Conductive inserts 902, 903 contact insulating pads 908, 909, which in turn contact jaws 912, 913, which can move toward and away from each other. As described above, an electrical connection to the battery disposed in the volume 906 can be made using a feedthrough or other means.

[0050] As shown in Figure 9, the BIB 950 is guided toward the stage 900 across the upper surfaces of conductive inserts 902, 903, insulating pads 908, 909, and jaws 912, 913, but the insulating mask 940 is positioned to at least cover the upper portion of the conductive insert 902. In this arrangement, the BIB 950 does not mill the conductive insert 902, and BIB milling does not cause material to be redeposited from the conductive insert 902 onto the sample in volume 906. In the example of Figure 9, the mask 940 also covers the upper portion of the insulating pad 908. In other examples, the mask 940 is positioned to cover the surfaces of the conductive insert 902, insulating pad 908, and jaws 912. It is generally more important to cover the surface upstream of the sample relative to the BIB 950, across which the BIB is guided to reduce redeposition (i.e., the upstream surface shown at 942), but a mask can also be positioned for downstream surfaces. The mask 940 is preferably non-conductive, such as glass, alumina, polyetheretherketone (PEEK), polytetrafluoroethylene (PTFE), or poly(methyl methacrylate) (PMMA), so that any redeposited material will not introduce undesirable changes in the sample. For example, redeposition of glass or other non-conductive materials will not create electrical short circuits in cells that have undergone BIB milling.

[0051] Figure 9B Figures 9C and 9C illustrate other exemplary stages with insulating masks. In the example of Figure 9B, insulating mask 942A covers the top surface of jaws 912 and insulating pad 908. In the example of Figure 9C, insulating mask 942B covers the top surface of conductive insert 902, and jaws 912 are recessed at the top surface. In these examples, the stage is arranged such that the milling beam is not directed toward the conductive portion of the stage. The milling direction can also be selected to reduce or avoid interaction between the milling beam and the conductive portion of the stage, thereby reducing or eliminating re-deposition.

[0052] Disclosed Examples Example 1 is a stage for fixing a sample, comprising: a first jaw and a second jaw, the first jaw being operable to be pushed toward the second jaw, the first jaw and the second jaw defining a sample volume located between the inner surfaces of the first jaw and the second jaw; and a stage base including a first electrical contact and a second electrical contact electrically coupled to the sample volume adjacent to the first jaw and the second jaw, respectively.

[0053] Example 2 includes the subject matter according to Example 1, and further includes: a first conductive pressure plate having a first surface and a second surface, the first surface defining at least a first portion of a peripheral surface of a sample volume, the second surface being opposite to the first surface and facing a first jaw; and a second conductive pressure plate having a first surface and a second surface, the first surface defining at least a second portion of a peripheral surface of a sample volume opposite to the first portion, the second surface being opposite to the first surface and facing a second jaw, wherein the first and second conductive pressure plates are operable to be electrically connected to a sample located in the sample volume in response to the first jaw being pushed against the second jaw.

[0054] Example 3 includes the subject matter according to any one of Examples 1 to 2, and further includes: a first insulator located on the inner surface of the first jaws to electrically insulate the first jaws from the first conductive pressure plate; and a second insulator located on the inner surface of the second jaws to electrically insulate the second jaws from the second conductive pressure plate.

[0055] Example 4 includes the subject matter according to any one of Examples 1 to 3, and further illustrates that the second jaw is fixed to the stage base.

[0056] Example 5 includes the subject matter according to any one of Examples 1 to 4, and further includes: a first insulator located at the inner surface of the first jaw to electrically insulate the first jaw from the sample volume; and a second insulator located at the inner surface of the second jaw to electrically insulate the second jaw from the sample volume.

[0057] Example 6 includes the subject matter according to any one of Examples 1 to 5, and further illustrates that the second jaw is fixed to the stage base.

[0058] Example 7 includes the subject matter according to any one of Examples 1 to 6, and further includes a screw mechanism fixed to the stage base and operable to push the first conductive pressure plate toward the second conductive pressure plate.

[0059] Example 8 includes the subject matter according to any one of Examples 1 to 7, and further illustrates that: the stage base defines the stage translation axis.

[0060] Example 9 includes the subject matter according to any one of Examples 1 to 8, and further illustrates that the stage base has a dovetail-shaped cross-section in a plane perpendicular to the stage translation axis.

[0061] Example 10 includes the subject matter according to any one of Examples 1 to 9, and further illustrates that: the stage base defines a hole operable to releasably retain the positioning member.

[0062] Example 11 is a stage system comprising: a stage according to any one of Examples 1 to 10; and a stage guide capable of engaging with a stage base such that the stage, when engaged with the stage guide, can translate along a stage translation axis.

[0063] Example 12 includes the subject matter described in Example 11, and further illustrates that the stage base and stage guide have complementary engageable dovetail cross sections perpendicular to the stage translation axis.

[0064] Example 13 is a stage system comprising: a stage according to any one of Examples 1 to 9; and an electronic interface electrically coupled to a first electrical contact and a second electrical contact of a stage base, operable to establish a voltage of a sample located in the stage or to determine an impedance or voltage associated with a sample located in the stage.

[0065] Example 14 includes the subject matter described in Example 13, and further illustrates that: the stage is operable to be electrically connected to a sample during ion beam milling, and the electronic interface is operable to establish a voltage of the sample located in the stage or determine the impedance or voltage associated with the sample located in the sample during ion beam milling.

[0066] Example 15 includes the subject matter according to any one of Examples 1 to 15, and further illustrates that at least one of the first and second insulators defines a corresponding aperture, through which at least one of the first and second electrical contacts extends to make electrical contact with at least one of the first and second conductive pressure plates, respectively. In some examples, Example 15 also includes a non-conductive mask positioned to at least shield the surface of one of the first or second conductive pressure plates, across which a wide ion beam will be guided.

[0067] Example 16 is a method for ion beam milling of a battery, comprising: positioning the battery to expose it to an ion beam; guiding the ion beam to the battery along a first axis; and, while positioning the battery to expose it to the ion beam, measuring at least one of impedance, conductivity, or voltage associated with the battery.

[0068] Example 17 includes the subject matter described in Example 16, and further illustrates that the measurement of at least one of the impedance, conductivity, or voltage associated with the battery is performed during the guidance of the ion beam to the battery.

[0069] Example 18 includes the subject matter according to any one of Examples 16 to 17, and further includes: guiding the ion beam to the cell along a second axis different from the first axis based on the measured impedance.

[0070] Example 19 includes the subject matter according to any one of Examples 16 to 18, and further includes: guiding an ion beam to a cell along a second axis different from the first axis based on the measured impedance, until the impedance of the cell is measured to be within a predetermined impedance range.

[0071] Example 20 includes the subject matter according to any one of Examples 16 to 19, and further includes: applying a voltage or current to the battery based on the measured voltage or current to establish a battery voltage within a predetermined range.

[0072] Example 21 includes the subject matter according to any one of Examples 16 to 20, further wherein the voltage applied to the battery to establish a battery voltage within a predetermined range is applied during the battery exposure to an ion beam.

[0073] Example 22 includes the subject matter according to any one of Examples 16 to 21, and further illustrates that the ion beam is guided to the battery along the second axis by rotating the battery.

[0074] Example 23 includes the subject matter according to any one of Examples 16 to 22, and further illustrates that the angle between the first axis and the second axis is greater than 75 degrees.

[0075] Example 24 includes the subject matter according to any one of Examples 16 to 23, and further illustrates that the first axis is substantially orthogonal to the edges of the battery anode and the battery cathode.

[0076] Example 25 includes the subject matter according to any one of Examples 16 to 24, and further illustrates that: based on the measured impedance, conductivity or voltage associated with the battery, the exposure of the battery to the ion beam along the first axis is terminated.

[0077] Example 26 includes the subject matter according to any one of Examples 16 to 25, and further illustrates that: after terminating exposure to the ion beam, the cell is translated in a controlled environment for SEM imaging.

[0078] Given that the principles of this disclosure can be applied to many possible implementations, it should be recognized that the illustrated embodiments are merely preferred embodiments and should not be considered as limiting the scope of this disclosure.

Claims

1. A stage for fixing samples, comprising: A first jaw and a second jaw, the first jaw being operable to be pushed toward the second jaw, the first jaw and the second jaw defining a sample volume between the inner surfaces of the first jaw and the second jaw. as well as A stage base, the stage base including a first electrical contact and a second electrical contact, the first electrical contact and the second electrical contact being electrically coupled to the sample volume adjacent to the first jaw and the second jaw, respectively.

2. The stage according to claim 1, further comprising: A first conductive pressure plate has a first surface and a second surface, the first surface defining at least a first portion of the peripheral surface of the sample volume, and the second surface being opposite to the first surface and facing the first jaws; as well as A second conductive pressure plate has a first surface and a second surface. The first surface defines at least a second portion of the peripheral surface of the sample volume opposite to the first portion. The second surface faces the second jaws and is opposite to the first surface. The first and second conductive pressure plates are operable to be electrically connected to a sample located in the sample volume in response to the first jaw being pushed toward the second jaw.

3. The stage according to claim 2, further comprising: A first insulator is located on the inner surface of the first jaws to electrically insulate the first jaws from the first conductive pressure plate. And a second insulator located on the inner surface of the second jaws to electrically insulate the second jaws from the second conductive pressure plate.

4. The platform according to claim 1, wherein the second jaw is fixed to the platform base.

5. The stage according to claim 1, further comprising: A first insulator is located on the inner surface of the first jaws to electrically insulate the first jaws from the sample volume. as well as A second insulator is located on the inner surface of the second jaw to electrically insulate the second jaw from the sample volume.

6. The platform according to claim 5, wherein the second jaw is fixed to the platform base.

7. The platform according to claim 2, further comprising a screw mechanism fixed to the platform base and operable to push the first conductive pressure plate toward the second conductive pressure plate.

8. The stage according to claim 1, wherein the stage base defines a stage translation axis.

9. The stage according to claim 8, wherein the stage base has a dovetail-shaped cross-section in a plane perpendicular to the stage translation axis.

10. The stage of claim 8, wherein the stage base defines an aperture operable to releasably retain a positioning member.

11. A platform system comprising: The platform according to claim 9; as well as A platform guide that can engage with the platform base, such that when the platform is engaged with the platform guide, it can translate along the platform translation axis.

12. The stage system of claim 11, wherein the stage base and the stage guide have complementary engageable dovetail cross sections, the dovetail cross sections being perpendicular to the stage translation axis.

13. A platform system comprising: The platform according to claim 9; as well as An electronic interface electrically coupled to the first and second electrical contacts of the stage base, and operable to establish a voltage of a sample located in the stage or to determine an impedance or voltage associated with a sample located in the stage.

14. The stage system of claim 13, wherein the stage is operable to be electrically connected to the sample during ion beam milling, and the electronic interface is operable to establish the voltage of the sample located in the stage or determine the impedance or voltage associated with the sample located in the sample during the ion beam milling.

15. The platform of claim 3, wherein at least one of the first insulator and the second insulator defines a corresponding hole, and at least one of the first electrical contact and the second electrical contact extends through the corresponding hole to make electrical contact with at least one of the first conductive pressure plate and the second conductive pressure plate, respectively.

16. The stage according to claim 1, further comprising: A non-conductive mask is positioned to at least shield the surface of one of the first conductive pressure plate or the second conductive plate, across which a wide ion beam will be guided.

17. A method for ion beam milling of a battery, comprising: Position the battery to expose it to the ion beam; The ion beam is guided to the battery along the first axis; And, when the battery is positioned to be exposed to an ion beam, to measure at least one of the impedance, conductivity, or voltage associated with the battery.

18. The method of claim 17, wherein the measurement of at least one of the impedance, the conductivity, or the voltage associated with the battery is performed during the direction of the ion beam to the battery.

19. The method of claim 17, further comprising: Based on the measured impedance, the ion beam is guided to the cell along a second axis different from the first axis.

20. The method of claim 19, further comprising: Based on the measured impedance, the ion beam is guided to the cell along a second axis different from the first axis until the impedance of the cell is measured to be within a predetermined impedance range.

21. The method of claim 17, further comprising: Based on the measured voltage or current, a voltage or current is applied to the battery to establish a battery voltage within a predetermined range.

22. The method of claim 21, further wherein the voltage or current applied to the battery to establish the battery voltage within the predetermined range is applied during the exposure of the battery to the ion beam.

23. The method of claim 20, wherein the ion beam is guided to the battery along the second axis by rotating the battery.

24. The method of claim 20, wherein the angle between the first axis and the second axis is greater than 75 degrees.

25. The method of claim 17, wherein the first axis is substantially orthogonal to the edges of the battery anode and the battery cathode.

26. The method of claim 17, wherein exposing the battery to the ion beam along the first axis is terminated based on measured impedance, conductivity, or voltage associated with the battery.

27. The method of claim 26, wherein after terminating exposure to the ion beam, the cell is translated in a controlled environment for SEM imaging.

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