Display panel, preparation method thereof and display device

Abstract

The application belongs to the technical field of display, and relates to a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, a plurality of pixel barriers arranged along a first direction are arranged at intervals on the substrate, the plurality of pixel barriers divide the substrate into a plurality of pixel units, a plurality of light emitting units are arranged in one pixel unit, and a common functional layer is arranged between the substrate and the light emitting units; wherein, in the direction from the substrate to the light emitting units, the common functional layer comprises at least two layers of a first electrode, a first carrier functional layer, a light emitting layer and a second carrier functional layer which are arranged in sequence. The display panel provided in the application has good display effect.

Description

Technical Field

[0001] This application relates to the field of display technology, and more specifically, to a display panel, a method for manufacturing the same, and a display device. Background Technology

[0002] Flat panel displays have become the mainstream display panel due to their advantages such as high image quality, energy saving, thin body, and wide range of applications, and are widely used in various consumer electronics products such as mobile phones, televisions, laptops, and desktop computers. However, there are still some problems with display panels that need to be solved. Summary of the Invention

[0003] To address the aforementioned technical problems, this application provides a display panel that employs the following technical solution:

[0004] A display panel includes a substrate, on which a plurality of pixel partitions are spaced apart and arranged along a first direction, the plurality of pixel partitions dividing the substrate into a plurality of pixel units, a plurality of light-emitting units are provided in a pixel unit, and a common functional layer is provided between the substrate and the light-emitting units.

[0005] In the direction from the substrate to the light-emitting unit, the common functional layer includes at least two of the following layers stacked sequentially: a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer.

[0006] Accordingly, this application also provides a method for manufacturing a display panel, the method comprising:

[0007] A substrate is provided, wherein a plurality of pixel partitions are spaced apart on the substrate and arranged along a first direction to divide the substrate into a plurality of pixel units;

[0008] A common functional layer is formed on the substrate within the pixel unit;

[0009] A plurality of light-emitting units are formed on the common functional layer;

[0010] In the direction from the substrate to the light-emitting unit, the common functional layer includes at least two of the following layers stacked sequentially: a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer.

[0011] Accordingly, this application also provides a display device, which includes the display panel described in any one of the above embodiments, or a display panel prepared using the preparation method of the display panel described in any one of the above embodiments.

[0012] The display panel provided in this application has a good display effect. Attached Figure Description

[0013] To more clearly illustrate the solutions in this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0014] Figure 1 This is a schematic diagram of the structure of a display panel in the prior art;

[0015] Figure 2 This is another structural diagram of a display panel in the prior art;

[0016] Figure 3 This is a schematic diagram of the morphological uniformity of functional layers in pixels of a display panel in the prior art;

[0017] Figure 4 This is a schematic diagram of the structure of the display panel according to an embodiment of this application;

[0018] Figure 5 This is another structural schematic diagram of the display panel according to an embodiment of this application;

[0019] Figure 6 This is a schematic diagram of the morphological uniformity of the functional layer in the pixels of the display panel according to an embodiment of this application;

[0020] Figure 7 This is a flowchart of a method for manufacturing a display panel according to an embodiment of this application.

[0021] Figure label:

[0022] Substrate 10, pixel unit 20, sub-pixel unit 30, first barrier 11, second barrier 12, pixel partition 100, insulating unit 200. Detailed Implementation

[0023] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. Furthermore, it should be understood that the specific embodiments described herein are only for illustration and explanation of this application and are not intended to limit this application.

[0024] In this application, unless otherwise stated, directional terms such as "upper" and "lower" generally refer to the upper and lower positions of the device in its actual use or operating state, specifically the orientation shown in the accompanying drawings; while "inner" and "outer" refer to the outline of the device. Furthermore, in the description of this application, the term "comprising" means "including but not limited to". The terms first, second, third, etc., are used merely as illustrative purposes and do not impose numerical requirements or establish a numerical order.

[0025] In this application, "and / or" describes the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. A and B can be singular or plural.

[0026] In this application, "at least one" means one or more, and "more than one" means two or more. "At least one," "at least one of the following," or similar expressions refer to any combination of these items, including any combination of single or multiple items. For example, "at least one of a, b, or c," or "at least one of a, b, and c," can both mean: a, b, c, a-b (i.e., a and b), a-c, b-c, or a-b-c, where a, b, and c can be single or multiple.

[0027] Various embodiments of this application may exist in the form of a range; it should be understood that the description in the form of a range is merely for convenience and brevity and should not be construed as a hard limitation on the scope of this application; therefore, it should be considered that the range description has specifically disclosed all possible sub-ranges and single numerical values ​​within that range. For example, it should be considered that the range description from 1 to 6 has specifically disclosed sub-ranges such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6, etc., and single numbers within the range, such as 1, 2, 3, 4, 5, and 6, regardless of the range. Furthermore, whenever a numerical range is referred to herein, it means including any referenced number (fraction or integer) within the referred range.

[0028] In existing display panels, please refer to Figure 1 and Figure 2 In the prior art display panel, a plurality of first baffles 11 extending along the A direction and a plurality of second baffles 12 extending along the B direction are spaced apart on the substrate 10.

[0029] Multiple pixel units 20 extending in the X direction are formed between multiple first barrier walls 11 and substrate 10. At this time, different light-emitting unit groups can be set in different pixel units 20. Each light-emitting unit group includes multiple light-emitting units. Usually, different light-emitting unit groups emit different colors of light (the light-emitting units do not include substrate 10 and electrodes on substrate 10). For example, red quantum dot light-emitting unit groups, green quantum dot light-emitting unit groups, and blue quantum dot light-emitting unit groups can be accommodated in three adjacent pixel units 20, thereby realizing the mixed light emission of the display panel.

[0030] The second barrier 12 can divide the pixel unit 20 into multiple closed sub-pixel units 30 (the area where a single light-emitting unit is located), so that the light-emitting units in each light-emitting unit group can be controlled independently.

[0031] However, in the prior art, even if the second barrier 12 is a hydrophilic material, it will still affect the flow of the functional layer solution in the left-right direction during the flow of the functional layer solution, thus affecting the flow of the functional layer solution from one sub-pixel unit 30 to another. Therefore, by detecting the morphological uniformity of the functional layer of each light-emitting unit within a single sub-pixel unit 30 in the prior art display panel, its morphological uniformity can be obtained as follows: Figure 3 As shown in the figure, the green part is the part with good film uniformity, the thickness of the blue part is significantly lower than that of the green part (the part with uniform morphology), and it accounts for 22% of the total area. The thickness of the red part is significantly greater than that of the green part, and it accounts for 11.7%.

[0032] Therefore, the poor morphological uniformity of the functional layers within a single light-emitting unit in existing display panels leads to low external quantum efficiency and lifespan.

[0033] To address the aforementioned problems, this application provides a display panel, please refer to the following embodiments. Figures 4 to 6 The display panel includes a substrate 10, on which a plurality of pixel partitions 100 are spaced apart and arranged along a first direction. The plurality of pixel partitions 100 divide the substrate 10 into a plurality of pixel units 20. A plurality of light-emitting units (not shown in the figure) are provided in a pixel unit 20. A common functional layer (not shown in the figure) is provided between the substrate 10 and the light-emitting units.

[0034] In the direction from the substrate 10 to the light-emitting unit, the common functional layer includes at least two of the following layers stacked sequentially: a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer.

[0035] In some embodiments of this application, the first direction is Figure 4In the X direction, the pixel partition 100 extends along the X direction, the length direction of the pixel unit 20 is the X direction, and multiple pixel units 20 are distributed at intervals along the Z direction in the figure. Because a common functional layer is provided between the light-emitting units of this application (at least a common functional layer is provided between the light-emitting units within the same pixel unit 20), the solution of the common functional layer will not contact other structures when flowing within the pixel unit 20 during the formation process, thereby avoiding being blocked by other structures (such as the second barrier 12), so as to improve the morphological uniformity of the finally formed common functional layer and the other functional layers between the common functional layer and the substrate 10.

[0036] In some embodiments of this application, when the common functional layer includes a first electrode and a first carrier functional layer stacked sequentially, the light-emitting unit includes a light-emitting layer, a second carrier functional layer, and a cathode; or,

[0037] When the common functional layer includes a first electrode, a first charge carrier functional layer, and a light-emitting layer stacked sequentially, the light-emitting unit includes a second charge carrier functional layer and a cathode; or,

[0038] When the common functional layer includes a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer stacked in sequence, the light-emitting unit includes a cathode.

[0039] In this embodiment, when the common functional layer includes a first electrode and a first carrier functional layer stacked sequentially, the light-emitting unit includes a light-emitting layer, a second carrier functional layer, and a cathode; in this case, the thin film morphology uniformity of the first carrier functional layer is good. When the common functional layer includes a first electrode, a first carrier functional layer, and a light-emitting layer stacked sequentially, the light-emitting unit includes a second carrier functional layer and a cathode; in this case, the thin film morphology uniformity of the first carrier functional layer and the light-emitting layer is good. When the common functional layer includes a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer stacked sequentially, the light-emitting unit includes a cathode. In this case, the thin film morphology uniformity of the first carrier functional layer, the light-emitting layer, and the second carrier functional layer is good. The first carrier functional layer and the second carrier functional layer are selected from either a hole functional layer or an electron functional layer, and they are different. The light-emitting unit should be perpendicular to... Figure 4 The XZ plane is set in the middle, that is, each film layer in the light-emitting unit is perpendicular to the XZ plane. Figure 4 The XZ planes are stacked sequentially on the substrate 10.

[0040] In some embodiments of this application, two light-emitting units are separated by an insulating unit 200, which is disposed on the side of the common functional layer away from the substrate 10.

[0041] In this embodiment, the insulating unit 200 can divide the pixel unit 20 into multiple sub-pixel units 30 arranged along the length direction of the pixel unit 20, thereby dividing the light-emitting unit group arranged within the pixel unit 20 into multiple light-emitting units. Because the insulating unit 200 is not located on the substrate 10, but rather on the common functional layer within the pixel unit 20, the solution of the common functional layer will not contact the insulating unit 200 during the fabrication process as it flows within the pixel unit 20. Therefore, the resulting common functional layer and the remaining functional layers between the common functional layer and the substrate 10 exhibit good morphological uniformity, such as... Figure 6 As shown, the blue part accounts for only 0.29% and the red part accounts for only 5.40%; at the same time, the insulating unit 200 can separate different light-emitting units within the same pixel unit 20, thereby allowing different light-emitting units to emit light individually.

[0042] Please refer to some embodiments of this application. Figure 4 and Figure 5 Pixel dam 100 is selected from hydrophobic materials; and / or,

[0043] The material of the insulating unit 200 includes insulating material.

[0044] In this embodiment, the pixel barrier 100 is made of a hydrophobic material to further isolate the solution communication within adjacent pixel units 20, and the insulating unit 200 is made of an insulating material to separate the common functional layer from the film layer (e.g., cathode) located thereon, thereby separating the light-emitting unit group and forming multiple individual light-emitting units, thus making the display panel pixelated.

[0045] Please refer to some embodiments of this application. Figure 4 and Figure 5 The hydrophobic material is selected from at least one of polyamide, polyimide, polysiloxane, polymethyl methacrylate, polybutyl methacrylate, polycyclohexyl methacrylate, polystyrene, polyisoprene, polyhexafluoropropylene, fluorinated poly(p-xylene), fluorinated polysiloxane, fluorinated polyimide, and fluorinated polyamide; and / or,

[0046] The insulating material is selected from at least one of polyimide, polytetrafluoroethylene, polyvinylidene fluoride, poly(4-vinylphenol), polyvinylpyrrolidone, and perfluoroalkoxyethylene.

[0047] In this embodiment, when the hydrophobic material is selected from the aforementioned materials, the material has strong insulation properties, which can effectively improve the hydrophobicity of the pixel barrier 100 and further prevent the functional layer connection of adjacent pixel units 20. The insulating material selected from the aforementioned materials enables the insulating unit 200 to effectively separate the common functional layer and the film layer located thereon.

[0048] Please refer to some embodiments of this application. Figure 4 and Figure 5 Along the arrangement direction of each pixel unit 20 ( Figure 4 In the Z-direction, the width of the pixel gap 100 is 10μm to 50μm; and / or,

[0049] Along the length direction of pixel unit 20 ( Figure 4 In the X direction), the width of the insulating unit 200 is 10μm to 50μm; and / or,

[0050] Along the direction from the substrate 10 to the light-emitting unit, the thickness of the pixel partition 100 is 0.2 μm to 2 μm; and / or,

[0051] Along the direction from the substrate 10 to the light-emitting unit, the thickness of the insulating unit 200 is 0.2μm to 2μm.

[0052] In this embodiment, the width of the pixel barrier 100 and the width of the insulating unit 200 enable them to have strong structural strength, while ensuring that the final pixel opening size is moderate, thereby resulting in a high aperture ratio and low manufacturing difficulty for the display panel. The thickness range of the pixel barrier 100 prevents the functional layer solution of adjacent pixel units 20 from overflowing and mixing during leveling. The thickness range of the insulating unit 200 isolates the common functional layer and the cathode, achieving the pixelation purpose.

[0053] It should be understood that the width of the pixel barrier 100 and the width of the insulating unit 200 can be any value or any two of 10μm, 20μm, 30μm, 40μm, and 50μm. The thickness of the pixel barrier 100 and the insulating unit 200 can be any value or any two of 0.2μm, 0.4μm, 0.6μm, 0.8μm, 1μm, 1.2μm, 1.4μm, 1.6μm, 1.8μm, and 2μm.

[0054] Please refer to some embodiments of this application. Figure 4 and Figure 5 The spacing between two adjacent pixel gaps 100 is 50μm to 200μm; and / or,

[0055] The spacing between two adjacent insulating units 200 is 200μm to 400μm.

[0056] In this embodiment, the spacing range between the pixel barriers 100 and the insulating units 200 can both result in a high pixel aperture ratio (sub-pixel unit 30) for the light-emitting unit and a simple fabrication process. Preferably, the spacing between the pixel barriers 100 is 100 μm and the spacing between the insulating units 200 is 300 μm. It should be understood that the spacing between the pixel barriers 100 can be any value or a range formed by any two of the following: 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 30 μm, 140 μm, 150 μm, 160 μm, 170 μm, 180 μm, 190 μm, and 200 μm. The spacing of the insulating units 200 can be any value or a range formed by any two of the following: 200μm, 210μm, 220μm, 230μm, 240μm, 250μm, 260μm, 270μm, 280μm, 290μm, 300μm, 310μm, 320μm, 330μm, 340μm, 350μm, 360μm, 370μm, 380μm, 390μm, and 400μm. The spacing between two adjacent pixel partitions 100 is shown in Figure A, and the spacing between two adjacent insulating units 200 is shown in Figure B.

[0057] Please refer to some embodiments of this application. Figure 4 and Figure 5 When the first electrode is the anode and the second electrode is the cathode, the first carrier functional layer includes a hole functional layer and the second carrier functional layer includes an electron functional layer; in the direction from the substrate 10 to the light-emitting unit, the common functional layer and the light-emitting unit sequentially include an anode, a hole functional layer, a light-emitting layer, an electron functional layer and a cathode stacked together.

[0058] When the first electrode is a cathode and the second electrode is an anode, the first carrier functional layer includes an electron functional layer and the second carrier functional layer includes a hole functional layer; in the direction from the substrate 10 to the light-emitting unit, the common functional layer and the light-emitting unit sequentially include a cathode, an electron functional layer, a light-emitting layer, a hole functional layer and an anode stacked together.

[0059] In this embodiment, the display panel can be used as an upright display panel or an inverted display panel depending on whether the first electrode is an anode or a cathode.

[0060] In some embodiments of this application, the anode and cathode are each selected from one or more of a metal electrode, a silicon-carbon electrode, a doped or undoped metal oxide electrode, and a composite electrode; wherein, the material of the metal electrode is selected from at least one of Al, Ag, Cu, Mo, Au, Ba, Ca, and Mg; the material of the silicon-carbon electrode is selected from at least one of silicon, graphite, carbon nanotubes, graphene, and carbon fiber; the material of the doped or undoped metal oxide electrode is selected from at least one of I2O, FTO, ATO, AZO, GZO, IZO, MZO, and AMO; the material of the composite electrode is selected from at least one of AZO / Ag / AZO, AZO / Al / AZO, I2O / Ag / ITO, I2O / Al / I2O, ZnO / Ag / ZnO, ZnO / Al / ZnO, TiO2 / Ag / TiO2, TiO2 / Al / TiO2, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2, and TiO2 / Al / TiO2; and / or

[0061] The materials of the light-emitting layers in different light-emitting units or in the common functional layer may be the same or different. The materials of the light-emitting layers include one or more of organic light-emitting materials and quantum dots. The organic light-emitting materials are selected from 4,4'-bis(N-carbazole)-1,1'-biphenyl:tris[2-(p-tolyl)pyridinium(III), 4,4',4”-tris(carbazole-9-yl)triphenylamine:tris[2-(p-tolyl)pyridinium, diaromatic anthracene derivatives, stilbene aromatic derivatives, pyrene derivatives, fluorene derivatives, TBPe fluorescent materials, TTPX fluorescent materials, TBRb fluorescent materials, DBP fluorescent materials, and delayed fluorescence materials. The materials include TTA materials, thermally activated delayed materials, polymers containing BN covalent bonds, hybrid localized charge transfer excited-state materials, excitopolymer luminescent materials, polyacetylene and its derivatives, poly(p-phenylene) and its derivatives, polythiophene and its derivatives, and polyfluorene and its derivatives; quantum dots include one or more of single-component quantum dots, core-shell quantum dots, inorganic perovskite quantum dots, organic perovskite quantum dots, and organic-inorganic hybrid perovskite quantum dots. Core-shell quantum dots include one or more shells. The materials of single-component quantum dots, the core of core-shell quantum dots, and the shell of core-shell quantum dots are each independently selected from I Group I-VI compounds, Group II-VI compounds, Group III-IV compounds, Group IV-VI compounds, or Group III-VI compounds, wherein the Group III-VI compounds are selected from one or more of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, and HgZnSTe.Group II-IV compounds are selected from one or more of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb. Group III-VI compounds are selected from In2S3, In2Se3, InGaS3, and InAlPSb. One or more of nGaSe3, and group IV-VI compounds are selected from SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, and SnPbSTe; group III-VI compounds are selected from AgI nS, AgI nS2, Cu I nS, Cu I nS2, AgGaS2, CuGaS2, CuGaO2, AgGaO2, AgAlO2, AgI nGaS2, and CuI One or more of nGaS2, the general structural formula of inorganic perovskite quantum dots is QJT3, the general structural formula of organic-inorganic hybrid perovskite quantum dots is GJT3, the general structural formula of organic perovskite quantum dots is LJT3, J is a divalent metal cation, and each occurrence of J is independently selected from one or more of Pb2+, Sn2+, Cu2+, Ni2+, Cd2+, Cr2+, Mn2+, Co2+, Fe2+, Ge2+, Yb2+, and Eu2+, each occurrence of T is independently selected from one or more of Cl-, Br-, and I-, Q is Cs+, G is selected from CH3(CH2)n-2NH3+ or [NH3(CH2)nNH3]2+, n≥2, and L is selected from formamidinyl. ; and / or,

[0062] The material of the hole functional layer includes one or more of a first organic material, a first inorganic material, and a second inorganic material; the organic material includes poly(3,4-vinyldioxythiophene):poly(styrene sulfonic acid), copper phthalocyanine, titanium phthalocyanine, 2,3,5,6-tetrafluoro-7,7',8,8'-tetracyanodimethyl-p-benzoquinone, 2,3,6,7,10,11-hexacyano-1,4,5,8,9,12-hexaazabenzophenanthrene, polypyrrole, polyaniline, 3-hexyl-substituted polythiophene, poly(9-vinylcarbazole), 4,4'-bis(9-carbazole)biphenyl, poly[bis(4-phenyl)(4-butylphenyl)amine], 4,4'-cyclohexylbis[N,N-bis(4-phenyl)biphenyl], and poly[[4-phenyl)(4-butylphenyl)amine]. [-methylphenyl)aniline], poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-(4,4'-(N-(4-sec-butylphenyl)diphenylamine)], poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-ALT-(9,9-di-n-octylfluorenyl-2,7-diyl)], 4,4',4'-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, 4,4',4”-tris(carbazole-9-yl)triphenylamine, 4,4',4'-tris(2-naphthylphenylamino)triphenylamine, N,N'-diphenyl-N,N'-(1-naphthyl)-1,1'-biphenyl-4,4'-di Amines, N,N'-diphenyl-N,N'-di(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine, N,N'-bis[4-(diphenylamino)phenyl]-N,N'-diphenylbenzidine, N,N'-bis(3-methylphenyl)-N,N'-diphenyl-9,9-spirodifluorene-2,7-diamine, N2,N7-di-1-naphthyl-N2,N7-diphenyl-9,9'-spirodi[9H-fluorene]-2,7-diamine, poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine], 2,2',7,7'-tetratetra[N,N-di(4-methoxyphenyl)amino]-9,9'-spirodifluorene, N,N,N' The first inorganic material includes one or more of the following: N'-tetraarylbenzidine, 4,4',4”-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, N,N'-diphenyl-N,N'-di-[4-(N,N-diphenylamino)phenyl]benzidine, poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene], and poly[2-methoxy-5-[(3,7-dimethyloctyloxy)-1,4-phenyl]-1,2-vinyldiyl]; and C60, nickel oxide, molybdenum oxide, tungsten oxide, vanadium oxide, p-type gallium nitride, chromium oxide, copper oxide, hafnium oxide, copper sulfide, molybdenum sulfide, and tungsten sulfide.The second inorganic material includes one or more doped first compounds, the main compound of which includes graphene, C60, nickel oxide, molybdenum oxide, tungsten oxide, vanadium oxide, p-type gallium nitride, chromium oxide, copper oxide, hafnium oxide, copper sulfide, molybdenum sulfide, or tungsten sulfide. The doping element of the doped first compound is selected from one or more of boron, nickel, molybdenum, tungsten, vanadium, chromium, copper, and platinum group metals. The molar amount of the doping element in the doped first compound accounts for no more than 50% of the total molar amount of the doped first compound; and / or,

[0063] The electronic functional layer material includes one or more of a second organic material, a third inorganic material, and a fourth inorganic material; the second organic material is selected from one or more of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds; the third inorganic material includes one or more of an undoped first metal oxide and a group IIB-VIA semiconductor material, the undoped second metal oxide is selected from one or more of ZnO, TiO2, and SnO2, and the group IIB-VIA semiconductor material is selected from one or more of ZnS, ZnSe, and CdS; the fourth inorganic material includes one or more doped second compounds, the general formula of which is A(1-x)MxO, where 0 < x ≤ 0.5, A and M are not the same, and A and M are independently selected from one or more of Zn, Ti, Sn, Ba, Ta, Al, Zr, Mg, Ga, Li, Ga, In, and Y.

[0064] It should be understood that when the display panel also includes an electron injection layer located between the electron transport layer and the substrate 10 / cathode, the display panel can be an OLED display device.

[0065] Accordingly, please refer to Figures 4-7 This application also provides a method for manufacturing a display panel, the method comprising:

[0066] S100, a substrate is provided, on which a plurality of pixel partitions 100 disposed along a first direction are spaced apart to divide the substrate 10 into a plurality of pixel units 20.

[0067] S200, a common functional layer is formed on the substrate 10 within the pixel unit 20;

[0068] S300 forms several light-emitting units on a common functional layer;

[0069] In the direction from the substrate 10 to the light-emitting unit, the common functional layer includes at least two of the following layers stacked sequentially: a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer.

[0070] In this embodiment, during the fabrication process, the solution of the common functional layer and the other functional layers located between the common functional layer and the substrate 10 does not come into contact with the other structures when it flows within the pixel unit 20. Therefore, the morphological uniformity of the final common functional layer and the other functional layers between the common functional layer and the substrate 10 is good, resulting in high external quantum efficiency and long service life of the display panel.

[0071] In some embodiments of this application, the step of forming a plurality of light-emitting units on a common functional layer specifically includes:

[0072] n insulating units are spaced apart on the common functional layer to divide the pixel unit 20 into (n+1) light-emitting regions, where n is a positive integer;

[0073] Light-emitting units are formed in each light-emitting area.

[0074] Because the insulating unit 200 is not located on the substrate 10, but rather on the common functional layer within the pixel unit 20, the solution of the common functional layer does not contact the insulating unit 200 when flowing within the pixel unit 20 during the fabrication process. Therefore, the resulting common functional layer and the remaining functional layers between the common functional layer and the substrate 10 exhibit good morphological uniformity. Simultaneously, the insulating unit 200 serves to separate the pixel unit 20 into sub-pixel units 30, thus dividing the light-emitting unit group into multiple different light-emitting units, allowing each unit to emit light independently. As the number of insulating units 200 increases, the number of light-emitting units also increases. Therefore, by changing the number of insulating units 200, the minimum number of light-emitting units and the light-emitting area of ​​the display panel can be altered.

[0075] In some embodiments of this application, the step of forming a common functional layer on the substrate 10 within the pixel unit 20 specifically includes:

[0076] In the direction from the substrate 10 to the light-emitting unit, a first electrode and a first carrier functional layer are sequentially formed on the substrate 10 within the pixel unit 20; or,

[0077] In the direction from the substrate 10 to the light-emitting unit, a first electrode, a first carrier functional layer, and a light-emitting layer are sequentially formed on the substrate 10 within the pixel unit 20; or,

[0078] In the direction from the substrate 10 to the light-emitting unit, a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer are sequentially formed on the substrate 10 within the pixel unit 20.

[0079] In this embodiment, when the common functional layer includes a first electrode and a first carrier functional layer stacked sequentially, the light-emitting unit includes a light-emitting layer, a second carrier functional layer, and a cathode; in this case, the thin film morphology uniformity of the first carrier functional layer is good. When the common functional layer includes a first electrode, a first carrier functional layer, and a light-emitting layer stacked sequentially, the light-emitting unit includes a second carrier functional layer and a cathode; in this case, the thin film morphology uniformity of the first carrier functional layer and the light-emitting layer is good. When the common functional layer includes a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer stacked sequentially, the light-emitting unit includes a cathode. In this case, the thin film morphology uniformity of the first carrier functional layer, the light-emitting layer, and the second carrier functional layer is good. The first carrier functional layer and the second carrier functional layer are selected from either a hole functional layer or an electron functional layer, and they are different.

[0080] In some embodiments of this application, when the first electrode is an anode and the second electrode is a cathode, the step of forming a common functional layer on the substrate 10 within the pixel unit 20 and forming a plurality of light-emitting units on the common functional layer specifically includes:

[0081] In the direction from the substrate 10 to the light-emitting unit, an anode and a hole functional layer are sequentially formed on the substrate 10 within the pixel unit 20, and a light-emitting layer, an electronic functional layer, and a cathode for each light-emitting unit are sequentially formed on the hole functional layer; or,

[0082] In the direction from the substrate 10 to the light-emitting unit, an anode, a hole functional layer, and a light-emitting layer are sequentially formed on the substrate 10 within the pixel unit 20, and an electronic functional layer and a cathode for each light-emitting unit are sequentially formed on the light-emitting layer; or,

[0083] In the direction from the substrate 10 to the light-emitting unit, an anode, a hole functional layer, a light-emitting layer and an electronic functional layer are sequentially formed on the substrate 10 within the pixel unit 20, and the cathodes of each light-emitting unit are sequentially formed on the electronic functional layer.

[0084] In this embodiment, at least three types of display panels can be formed, and the common functional layers in the three display panels are a hole functional layer, a light-emitting layer, and an electron functional layer. Therefore, the display panel fabrication method of this embodiment can adjust the setting of the common functional layers at any time according to actual needs, thereby specifically improving the morphological uniformity of specific film layers in the display panel.

[0085] Accordingly, this application also provides a display device, which includes a display panel of any of the above embodiments, or a display panel prepared using the preparation method of any of the above embodiments.

[0086] In this embodiment, since the display device includes a display panel of any of the above embodiments, or a display panel prepared by any of the above embodiments, the functional layer in the display device has a uniform morphology, high external quantum efficiency, and long service life.

[0087] The display panel of this application will be specifically described below through specific embodiments. The following embodiments are only some embodiments of this application and are not intended to limit this application.

[0088] Example 1

[0089] This application provides a method for manufacturing a display panel, the method being as follows:

[0090] Step 1: Provide a substrate and set an ITO anode on the substrate. Clean the ITO anode substrate under UV conditions for 15 minutes to increase its work function and wettability, thus forming the anode.

[0091] Step two: Fabrication of pixel barriers. Multiple pixel barriers are fabricated side-by-side on the anode using photolithography. The pixel barriers are made of polyimide, with a thickness of 1 μm and a width of 20 μm. The spacing between two adjacent pixel barriers is 100 μm. Two adjacent pixel barriers and the anode on the substrate define a pixel unit. A total of three pixel units are formed in the figure.

[0092] Step 3: Prepare the hole injection layer. PEDOT:PSS is injected onto the anode within the pixel unit using inkjet printing technology, and then desolventized through high-vacuum drying to form the hole injection layer. The pressure during high-vacuum drying is 10... -6 Pa;

[0093] Step four: Fabrication of the hole transport layer. TFB is injected into the hole injection layer within the pixel unit using inkjet printing technology, and then desolventized through high-vacuum drying to form the hole transport layer. The pressure of the high-vacuum drying process is 10... -6 Pa.

[0094] Step 5: Fabrication of the luminescent layer. A CdS solution is injected into the hole transport layer within the pixel unit using inkjet printing technology, and then desolventized by high-vacuum drying to form the luminescent layer. The pressure during high-vacuum drying is 10... - 6 Pa.

[0095] Step six: Prepare the electron transport layer. A zinc oxide solution is inkjet-printed onto the above active layer, and then desolventized by high-vacuum drying to form the electron transport layer. The pressure of the high-vacuum drying process is 10... -6 Pa.

[0096] Step 7: Fabrication of insulating units. Insulating units are fabricated on the electron transport layer using electrohydraulic inkjet printing. Two adjacent insulating units separate a single light-emitting unit group to form a light-emitting unit. A total of 9 light-emitting units are formed in the figure. The insulating units are made of polytetrafluoroethylene (PTFE), with a thickness of 0.5 μm and a width of 20 μm. The spacing between adjacent insulating units is 300 μm.

[0097] Step 8: Fabrication of the cathode. The substrate is transferred to a vacuum evaporation machine, and silver is deposited on the electron transport layer to form a silver cathode.

[0098] Step 9, encapsulation. The above substrate is encapsulated to obtain a display panel. At this time, three red light-emitting units (R), three green light-emitting units (G), and three blue light-emitting units (B) are formed in the nine isolated sub-pixel units in the display panel.

[0099] Example 2

[0100] This embodiment is basically the same as Embodiment 1, except that the material of the pixel barrier in step two is replaced with polymethyl methacrylate.

[0101] Example 3

[0102] This embodiment is basically the same as embodiment 1, except that the material of the insulating unit in step seven is replaced with polyvinylpyrrolidone.

[0103] Example 4

[0104] This embodiment is basically the same as embodiment 1, except that the width of the insulating unit in step seven is replaced with 10μm.

[0105] Example 5

[0106] This embodiment is basically the same as embodiment 1, except that the width of the insulating unit in step seven is replaced with 50μm.

[0107] Example 6

[0108] This embodiment is basically the same as embodiment 1, except that the thickness of the insulating unit in step seven is replaced with 0.2 μm.

[0109] Example 7

[0110] This embodiment is basically the same as Embodiment 1, except that the thickness of the insulating unit in step seven is replaced with 2μm.

[0111] Example 8

[0112] This embodiment is basically the same as Embodiment 1, except that step seven is omitted, and the following step is added between steps three and four: preparing insulating units. Insulating units are prepared on the hole injection layer using electrohydraulic inkjet printing. The projection of the insulating unit onto the substrate is perpendicular to the pixel barrier. The insulating unit is made of polytetrafluoroethylene, with a thickness of 0.5 μm and a width of 20 μm. The spacing between adjacent insulating units is 300 μm.

[0113] Comparative Example

[0114] This comparative example is basically the same as Example 1, except that step seven is omitted, and the following step is added between steps two and three: preparation of insulating units. Insulating units are prepared on the first anode by photolithography. The projection of the insulating unit on the substrate is perpendicular to the pixel barrier. The insulating unit is made of polytetrafluoroethylene, with a width of 20 μm and a thickness of 0.5 μm. The spacing between adjacent insulating units is 300 μm.

[0115] The display panel performance of Examples 1 to 10 and the comparative example was tested using IVL equipment. The external quantum efficiency at a brightness of 1000 nits was used as the external quantum efficiency index, and the time taken for the brightness to decay to 95% under the initial condition of 1000 nits was used as the luminous lifetime evaluation index. The test results are shown in Table 1.

[0116] Table 1:

[0117]

[0118] As shown in Table 1:

[0119] As can be seen from Examples 1, 8, and the Comparative Example, the Comparative Example has the lowest external quantum efficiency and lifespan. In Example 1, the common functional layer is the electron transport layer, therefore the electron transport layer, light-emitting layer, hole transport layer, and hole injection layer all have good morphological uniformity, resulting in the highest external quantum efficiency and lifespan of the final display panel. In Example 8, the common functional layer is the hole injection layer, therefore only the hole injection layer has high morphological uniformity, thus improving both external quantum efficiency and lifespan, but both are lower than Example 1 but higher than the Comparative Example.

[0120] As can be seen from Examples 1, 2, and 3, the material of the pixel barrier can be replaced with other hydrophobic materials, and the material of the insulating unit can be replaced with other insulating materials, which will not have a significant impact on the external quantum efficiency and service life.

[0121] As shown in Examples 1 and 4 and 5, the width of the insulating unit can affect the pixel aperture ratio to a certain extent. An excessively narrow insulating unit increases the manufacturing difficulty of the display panel, resulting in lower visible white brightness during testing. For example, when the aperture ratio is 1, 100% of the display panel emits light; when the aperture ratio is 0.3, only 30% of the area is illuminated, while the other 70% is isolated by the insulating unit, thus neither receiving power nor emitting light. Simultaneously, the resolution of the displayed image also decreases to some extent. Therefore, the test results show that the white brightness of Example 1 is greater than that of Examples 4 and 5. The width of the insulating unit in this application can effectively increase the pixel aperture ratio of the display panel and reduce manufacturing difficulty, thereby improving the resolution and visible white brightness of the display panel and reducing production costs.

[0122] As can be seen from Examples 1 and 6 and 7, the thickness of the insulating unit enables the pixel unit to be effectively divided into multiple sub-pixel units, thereby achieving the purpose of insulation, reducing the materials required for processing, and improving the yield of the display panel packaging steps.

[0123] The display panel, its preparation method, and the display device provided in the embodiments of this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the methods and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A display panel, characterized by, The substrate includes a plurality of pixel partitions spaced apart along a first direction, the plurality of pixel partitions dividing the substrate into several pixel units, a plurality of light-emitting units being provided in each pixel unit, and a common functional layer being provided between the substrate and the light-emitting units. In the direction from the substrate to the light-emitting unit, the common functional layer includes at least two of the following layers stacked sequentially: a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer.

2. The display panel according to claim 1, characterized in that, When the common functional layer includes the first electrode and the first charge carrier functional layer stacked sequentially, the light-emitting unit includes the light layer, the second charge carrier functional layer, and the second electrode; or... When the common functional layer includes the first electrode, the first charge carrier functional layer, and the light-emitting layer stacked sequentially, the light-emitting unit includes the second charge carrier functional layer and the second electrode; or... When the common functional layer includes the first electrode, the first charge carrier functional layer, the light-emitting layer, and the second charge carrier functional layer stacked in sequence, the light-emitting unit includes the second electrode.

3. The display panel according to claim 1, characterized in that, The two light-emitting units are separated by an insulating unit disposed on the side of the common functional layer away from the substrate; and / or, The pixel barrier is made of a hydrophobic material; and / or, The material of the insulating unit includes insulating material.

4. The display panel of claim 3, wherein, The hydrophobic material is selected from at least one of polyamide, polyimide, polysiloxane, polymethyl methacrylate, polybutyl methacrylate, polycyclohexyl methacrylate, polystyrene, polyisoprene, polyhexafluoropropylene, fluorinated poly(p-xylene), fluorinated polysiloxane, fluorinated polyimide, and fluorinated polyamide; and / or, The insulating material is selected from at least one of polyimide, polytetrafluoroethylene, polyvinylidene fluoride, poly(4-vinylphenol), polyvinylpyrrolidone, and perfluoroalkoxyethylene.

5. The display panel of claim 3, wherein, Along the arrangement direction of each pixel unit, the width of the pixel partition is 10μm to 50μm; and / or, Along the arrangement direction of each pixel unit, the width of the insulating unit is 10μm to 50μm; and / or, Along the direction from the substrate to the light-emitting unit, the thickness of the pixel barrier is 0.2 μm to 2 μm; and / or, Along the direction from the substrate to the light-emitting unit, the thickness of the insulating unit is 0.2 μm to 2 μm.

6. The display panel of claim 3, wherein, The spacing between two adjacent pixel partitions is 50 μm to 200 μm; and / or, The spacing between two adjacent insulating units is 200μm to 400μm.

7. The display panel of claim 2, wherein, When the first electrode is an anode and the second electrode is a cathode, the first carrier functional layer includes a hole functional layer and the second carrier functional layer includes an electron functional layer; in the direction from the substrate to the light-emitting unit, the common functional layer and the light-emitting unit sequentially include an anode, a hole functional layer, a light-emitting layer, an electron functional layer and a cathode stacked together. When the first electrode is a cathode and the second electrode is an anode, the first carrier functional layer includes an electron functional layer and the second carrier functional layer includes a hole functional layer; in the direction from the substrate to the light-emitting unit, the common functional layer and the light-emitting unit sequentially include a cathode, an electron functional layer, a light-emitting layer, a hole functional layer and an anode stacked together.

8. The display panel of claim 7, wherein, The anode and the cathode are each selected from one or more of a metal electrode, a silicon-carbon electrode, a doped or undoped metal oxide electrode, and a composite electrode; wherein, the material of the metal electrode is selected from at least one of Al, Ag, Cu, Mo, Au, Ba, Ca, and Mg; the material of the silicon-carbon electrode is selected from at least one of silicon, graphite, carbon nanotubes, graphene, and carbon fiber; the material of the doped or undoped metal oxide electrode is selected from at least one of ITO, FTO, ATO, AZO, GZO, IZO, MZO, and AMO; the material of the composite electrode is selected from at least one of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, TiO2 / Ag / TiO2, TiO2 / Al / TiO2, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2, and TiO2 / Al / TiO2; and / or The materials of the light-emitting layers in different light-emitting units or in the common functional layer may be the same or different. The materials of the light-emitting layers include one or more of organic light-emitting materials and quantum dots. The organic light-emitting materials are selected from 4,4'-bis(N-carbazole)-1,1'-biphenyl:tris[2-(p-tolyl)pyridinium(III), 4,4',4”-tris(carbazole-9-yl)triphenylamine:tris[2-(p-tolyl)pyridinium, diaromatic anthracene derivatives, stilbene aromatic derivatives, pyrene derivatives, fluorene derivatives, TBPe fluorescent materials, TTPX fluorescent materials, TBRb fluorescent materials, DBP fluorescent materials, delayed fluorescence materials, TTA materials, thermally activated delayed materials, polymers containing BN covalent bonds, and hybrid localized charges. The quantum dots include one or more of the following: transferred excited-state materials, excitopolymer luminescent materials, polyacetylene and its derivatives, poly(p-phenylene) and its derivatives, polythiophene and its derivatives, and polyfluorene and its derivatives; the quantum dots include one or more of single-component quantum dots, core-shell quantum dots, inorganic perovskite quantum dots, organic perovskite quantum dots, and organic-inorganic hybrid perovskite quantum dots, wherein the core-shell quantum dots include one or more shells, and the materials of the single-component quantum dots, the core of the core-shell quantum dots, and the shells of the core-shell quantum dots are each independently selected from at least one of group II-VI compounds, group III-VI compounds, group III-V compounds, group IV-VI compounds, or group I-III-VI compounds, wherein the group I-VI compounds are selected from at least one of the following: Group I-VI compounds are selected from one or more of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, and HgZnSTe.The group II and IV compounds are selected from one or more of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb. Group I-VI compounds are selected from one or more of In₂S₃, In₂Se₃, InGaS₃, and InGaSe₃. Group IV-VI compounds are selected from one or more of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, and SnPbSTe. Group I-III-VI compounds are selected from AgInS, AgInS₂, CuInS, CuInS₂, AgGaS₂, CuGaS₂, CuGaO₂, AgGaO₂, AgAlO₂, and AgInGaS₂. The inorganic perovskite quantum dots are selected from one or more of CuInGaS2, the general structural formula of the inorganic perovskite quantum dots is QJT3, the general structural formula of the organic-inorganic hybrid perovskite quantum dots is GJT3, the general structural formula of the organic perovskite quantum dots is LJT3, J is a divalent metal cation, and each occurrence of J is independently selected from one or more of Pb2+, Sn2+, Cu2+, Ni2+, Cd2+, Cr2+, Mn2+, Co2+, Fe2+, Ge2+, Yb2+, and Eu2+, each occurrence of T is independently selected from one or more of Cl-, Br-, and I-, Q is Cs+, G is selected from CH3(CH2)n-2NH3+ or [NH3(CH2)nNH3]2+, n≥2, L is selected from formamidinyl; and / or, The material of the hole functional layer includes one or more of a first organic material, a first inorganic material, and a second inorganic material; the organic material includes poly(3,4-vinyldioxythiophene):poly(styrene sulfonic acid), copper phthalocyanine, titanium phthalocyanine, 2,3,5,6-tetrafluoro-7,7',8,8'-tetracyanodimethyl-p-benzoquinone, 2,3,6,7,10,11-hexacryloyl-1,4,5,8,9,12-hexaazabenzophenanthrene, polypyrrole, polyaniline, 3-hexyl-substituted polythiophene, poly(9-vinylcarbazole), 4,4'-bis(9-carbazole)biphenyl, poly[bis(4-phenyl)(4-butylphenyl)amine], 4,4'-cyclohexylbis[N,N-di] [(4-methylphenyl)aniline], poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-(4,4'-(N-(4-sec-butylphenyl)diphenylamine)], poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-ALT-(9,9-di-n-octylfluorenyl-2,7-diyl)], 4,4',4'-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, 4,4',4”-tris(carbazole-9-yl)triphenylamine, 4,4',4'-tris(2-naphthylphenylamino)triphenylamine, N,N'-diphenyl-N,N'-(1-naphthyl)-1,1'-biphenyl-4,4'- Diamine, N,N'-diphenyl-N,N'-di(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine, N,N'-bis[4-(diphenylamino)phenyl]-N,N'-diphenylbenzidine, N,N'-bis(3-methylphenyl)-N,N'-diphenyl-9,9-spirodifluorene-2,7-diamine, N2,N7-di-1-naphthyl-N2,N7-diphenyl-9,9'-spirodi[9H-fluorene]-2,7-diamine, poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine], 2,2',7,7'-tetratetra[N,N-di(4-methoxyphenyl)amino]-9,9'-spirodifluorene, N,N,N', The first inorganic material comprises one or more of the following: N'-tetraarylbenzidine, 4,4',4”-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, N,N'-diphenyl-N,N'-di-[4-(N,N-diphenylamino)phenyl]benzidine, poly[2-methoxy-5-(2-ethylhexoxy)-1,4-phenylenevinylene], and poly[2-methoxy-5-[(3,7-dimethyloctoxy)-1,4-phenyl]-1,2-vinyldiyl]; and the first inorganic material comprises one or more of the following: graphene, C60, nickel oxide, molybdenum oxide, tungsten oxide, vanadium oxide, p-type gallium nitride, chromium oxide, copper oxide, hafnium oxide, copper sulfide, molybdenum sulfide, and tungsten sulfide.The second inorganic material comprises one or more doped first compounds, wherein the host compound of the doped first compound comprises graphene, C60, nickel oxide, molybdenum oxide, tungsten oxide, vanadium oxide, p-type gallium nitride, chromium oxide, copper oxide, hafnium oxide, copper sulfide, molybdenum sulfide, or tungsten sulfide; the doping element of the doped first compound is selected from one or more of boron, nickel, molybdenum, tungsten, vanadium, chromium, copper, and platinum group metals; and the molar amount of the doping element in the doped first compound accounts for no more than 50% of the total molar amount of the doped first compound; and / or, The electronic functional layer comprises one or more of a second organic material, a third inorganic material, and a fourth inorganic material; the second organic material is selected from one or more of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds; the third inorganic material comprises one or more of an undoped first metal oxide and a group IIB-VIA semiconductor material, wherein the undoped second metal oxide is selected from one or more of ZnO, TiO2, and SnO2, and the group IIB-VIA semiconductor material is selected from one or more of ZnS, ZnSe, and CdS; the fourth inorganic material comprises one or more doped second compounds, wherein the general formula of the doped second compound is A(1-x)MxO, wherein 0 < x ≤ 0.5, A and M are not the same, and A and M are independently selected from one or more of Zn, Ti, Sn, Ba, Ta, Al, Zr, Mg, Ga, Li, Ga, In, and Y.

9. A method for manufacturing a display panel, characterized by, The method includes: A substrate is provided, wherein a plurality of pixel partitions are spaced apart on the substrate and arranged along a first direction to divide the substrate into a plurality of pixel units; A common functional layer is formed on the substrate within the pixel unit; A plurality of light-emitting units are formed on the common functional layer; In the direction from the substrate to the light-emitting unit, the common functional layer includes at least two of the following layers stacked sequentially: a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer.

10. The method of manufacturing a display panel according to claim 9, wherein, The step of forming a plurality of light-emitting units on the common functional layer specifically includes: n insulating units are spaced apart on the common functional layer to divide the pixel unit into (n+1) light-emitting regions, where n is a positive integer; The light-emitting unit is formed in each light-emitting region.

11. The method of manufacturing a display panel according to claim 9, wherein, The step of forming a common functional layer on the substrate within the pixel unit specifically includes: In the direction from the substrate to the light-emitting unit, a first electrode and a first carrier functional layer are sequentially formed on the substrate within the pixel unit; or, In the direction from the substrate to the light-emitting unit, a first electrode, a first carrier functional layer, and a light-emitting layer are sequentially formed on the substrate within the pixel unit; or, In the direction from the substrate to the light-emitting unit, a first electrode, a first carrier functional layer, a light-emitting layer, and a second carrier functional layer are sequentially formed on the substrate within the pixel unit.

12. The method for manufacturing a display panel according to claim 9, characterized in that, When the first electrode is an anode and the second electrode is a cathode, the step of forming a common functional layer on the substrate within the pixel unit and forming a plurality of light-emitting units on the common functional layer specifically includes: In the direction from the substrate to the light-emitting unit, an anode and a hole functional layer are sequentially formed on the substrate within the pixel unit, and a light-emitting layer, an electronic functional layer, and a cathode for each light-emitting unit are sequentially formed on the hole functional layer; or, In the direction from the substrate to the light-emitting unit, an anode, a hole functional layer, and a light-emitting layer are sequentially formed on the substrate within the pixel unit, and an electronic functional layer and a cathode for each light-emitting unit are sequentially formed on the light-emitting layer; or, In the direction from the substrate to the light-emitting unit, an anode, a hole functional layer, a light-emitting layer and an electronic functional layer are sequentially formed on the substrate within the pixel unit, and the cathodes of each light-emitting unit are sequentially formed on the electronic functional layer.

13. A display device comprising: The display device comprises a display panel according to any one of claims 1 to 8, or a display panel prepared by the method for preparing the display panel according to any one of claims 9 to 12.

Images