Diamond polishing liquid and preparation method thereof
By constructing a polymer shell-branch structure on the surface of diamond abrasive grains, and combining chemical and physical processes, the problem of easy agglomeration of nanodiamond particles is solved, achieving a high-efficiency, low-defect polishing effect, which is suitable for processing hard and brittle materials.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HENAN LUNAR NEW MATERIALS CO LTD
- Filing Date
- 2026-05-07
- Publication Date
- 2026-07-07
AI Technical Summary
Existing diamond polishing slurries tend to agglomerate on the surface of nanodiamond particles, leading to scratches, and traditional methods are difficult to achieve high-quality polishing with nanoscale surface roughness and low defects.
By constructing polymer shell-branch structures on the surface of abrasive particles to improve hydrophilicity and dispersion stability, and combining the synergistic effects of physical and mechanical actions with chemical actions, oxidants, dispersants, lubricants, chelating agents, and surfactants are used to achieve polishing with high removal rate, low surface roughness, and low defects.
It achieves stable dispersion of nanodiamond particles, reduces the risk of scratches, improves polishing quality and removal rate, and adapts to the needs of different materials and processes.
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