Diamond polishing liquid and preparation method thereof

By constructing a polymer shell-branch structure on the surface of diamond abrasive grains, and combining chemical and physical processes, the problem of easy agglomeration of nanodiamond particles is solved, achieving a high-efficiency, low-defect polishing effect, which is suitable for processing hard and brittle materials.

CN122344446APending Publication Date: 2026-07-07HENAN LUNAR NEW MATERIALS CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
HENAN LUNAR NEW MATERIALS CO LTD
Filing Date
2026-05-07
Publication Date
2026-07-07

AI Technical Summary

Technical Problem

Existing diamond polishing slurries tend to agglomerate on the surface of nanodiamond particles, leading to scratches, and traditional methods are difficult to achieve high-quality polishing with nanoscale surface roughness and low defects.

Method used

By constructing polymer shell-branch structures on the surface of abrasive particles to improve hydrophilicity and dispersion stability, and combining the synergistic effects of physical and mechanical actions with chemical actions, oxidants, dispersants, lubricants, chelating agents, and surfactants are used to achieve polishing with high removal rate, low surface roughness, and low defects.

Benefits of technology

It achieves stable dispersion of nanodiamond particles, reduces the risk of scratches, improves polishing quality and removal rate, and adapts to the needs of different materials and processes.

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Abstract

The application discloses a diamond polishing liquid and a preparation method thereof. According to 100% by mass percentage, the polishing liquid comprises the following raw materials: 4-6% of an oxidizing agent, 0.4-1.2% of abrasive grains, 0.1-0.3% of a dispersing lubricant, 0.02-0.05% of a chelating agent, 0.04-0.08% of a surfactant, and the balance of deionized water; the abrasive grains are grafted diamond micro powder. The polymer shell branch structure is constructed on the surface of the abrasive grains, the hydrophilicity and the dispersion stability are improved, the synergy of the remaining additives is matched, and the controllable material removal rate, the low surface roughness and the high-quality polishing with low defects are realized.
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