A method, system, and readable storage medium for measuring a refractive index ellipsoid of a conoscopic polarimetry crystal

By employing a conical polarization interferometry method, combined with Mach-Zehnder interferometry and polarization interferometry, the problems of measurement complexity and poor stability in traditional methods are solved. This method enables accurate refractive index measurement and analysis of external force effects in birefringent crystals, and is suitable for precision measurement and optical system optimization.

CN122409581APending Publication Date: 2026-07-17BEIJING JIAOTONG UNIV

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
BEIJING JIAOTONG UNIV
Filing Date
2026-04-03
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing technologies make it difficult to easily and accurately measure the principal refractive indices of ordinary and extraordinary rays in birefringent crystals. Furthermore, traditional methods are complex to operate, have poor stability, and are difficult to simultaneously measure the refractive index of birefringent crystals.

Method used

The conical polarization interferometry method is adopted, which combines the Mach-Zehnder interferometer system and the polarization interferometer system. A diverging linearly polarized beam is generated through a conical light source to measure the refractive index of ordinary and extraordinary light in the crystal. The interference fringe image is recorded using a high-resolution camera, and the optical path difference is calculated by fitting the radius using data processing software. Finally, a refractive index ellipsoid is constructed.

Benefits of technology

It enables simple and accurate measurement of the refractive index of birefringent crystals, improves measurement accuracy, supports the analysis of external forces and environmental influences, and is suitable for precision measurement and optical system optimization.

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Abstract

本发明提供了一种锥光偏振干涉测量晶体折射率椭球的方法、系统及可读存储介质,包括:S1:通过马赫‑曾德尔干涉系统测量晶体寻常光折射率并通过偏振干涉系统结合所述寻常光折射率测量非寻常光折射率椭球,其中所述锥光为发散线偏振光束,由锥光光源产生系统生成,入射置于可调样品架的晶体,形成的干涉条纹显示于光屏;S2:记录光屏上干涉条纹图像并上传至数据处理软件拟合所述干涉条纹半径计算光程差;S3:根据所述光程差和干涉条纹的半径确定所述寻常光折射率并结合干涉条纹横向半径确定非寻常光主折射率,再结合干涉条纹纵向半径迭代确定z方向寻常光主折射率,得到折射率椭球。本发明可以用于精密测量、材料检测、器件研发、精密传感等领域。
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