Polycrystalline silicon water quenching device and silicon material water explosion equipment
By setting up a heat exchanger and isolation box in the silicon material water quenching device, the problems of pollution and low efficiency during the water quenching process are solved, and more efficient cooling and cooling of silicon material is achieved, reducing oxidative pollution of silicon material and waste of water resources is reduced. .
Patent Information
- Application Number
- CN202420579297.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-22
- Publication Date
- 2024-12-10
- Estimated Expiration
- 2034-03-22
AI Technical Summary
The existing silicon material water quenching device has problems such as high pollution, long service time, wasted water resources and poor water quenching effect during the water quenching process.
A polycrystalline silicon water quenching device is designed, including a water tank, a heat exchanger and an isolation box. A heat exchanger is installed in the water tank to cool the liquid, an isolation box is used to reduce contact between silicon material and air and reduce oxidative pollution, and a spray head is used to clean the silicon material.
It effectively reduces the risk of oxidative pollution of silicon materials, improves the water quenching effect, and increases the cooling rate through heat exchangers, reducing water resource waste.
Smart Images
Figure CN222132133U_ABST
Abstract
Description
Technical Field
[0001] The embodiments of the present application relate to the technical field of silicon material crushing and processing, and in particular to a polysilicon water quenching device and a silicon material water explosion device. Background Art
[0002] In the photovoltaic and semiconductor industries, single crystal silicon is widely used. At present, most single crystal silicon is prepared by the CZ method. When pulling single crystal silicon materials, polycrystalline silicon materials are generally used as raw materials. In order to improve the pulling efficiency, the polycrystalline silicon materials need to be broken into suitable sizes before adding them to the crucible tongs. At present, mechanical crushing is mostly used, including manual knocking, mechanical extrusion crushing or roller crushing. However, the above physical methods are inefficient and easy to pollute. Moreover, the block materials are uneven, there are many powder materials, and the waste is serious.
[0003] Recently, some manufacturers have adopted silicon material water explosion equipment to heat silicon materials, and then used water quenching to rapidly cool down the heated silicon materials. The stress generated by the different expansion degrees caused by the temperature difference between the surface and the interior of the silicon materials is used to form micro cracks from the surface to the inside of the silicon materials, making the silicon materials easy to break, greatly reducing the powder materials, and at the same time reducing the pollution during the crushing process.
[0004] However, in the process of implementing the embodiments of the present application, the inventors found that when the water quenching device currently on the market performs water quenching, the silicon material block that has been heated at high temperature is placed in a water tank, and then tap water is continuously added to the water tank. After the cold water is heated, it is discharged in time until the silicon material is completely cooled. This water quenching device is highly polluting when used, requires a long time, wastes water resources, and the water quenching effect is not good. Utility Model Content
[0005] The embodiments of the present application provide a pollution-free polysilicon water quenching device and a silicon material water explosion device.
[0006] In order to solve the above technical problems, a technical solution adopted in the present application is to provide a polysilicon water quenching device, which is applied to a silicon material water explosion device. The silicon material water explosion device includes a discharge port, including:
[0007] A water tank, one side of which is provided with an opening, and the water tank is used to contain liquid;
[0008] a heat exchanger, at least partially disposed in the water tank, the heat exchanger being used to cool the liquid in the water tank;
[0009] An isolation box is fixed at the opening of the water tank. The interior of the isolation box is used to contain inert gas. The isolation box has a first opening and a second opening. The first opening is used for silicon material to enter, and the second opening is connected to the interior of the water tank.
[0010] In some embodiments, the water tank includes an annular side wall and a bottom wall connected to each other, the opening is provided on a side of the annular side wall facing away from the bottom wall, and the isolation box is installed on the annular side wall.
[0011] In some embodiments, the bottom wall includes a first end and a second end that are oppositely disposed, and the distance between the bottom wall and the opening increases sequentially from the first end to the second end;
[0012] The isolation box is arranged close to the first end of the bottom wall, and a drainage structure is arranged at the second end of the bottom wall.
[0013] In some embodiments, the drainage structure includes a drainage groove and a first filter element. The drainage groove extends from the bottom wall in a direction away from the annular side wall, and the first filter element is installed in the drainage groove.
[0014] In some embodiments, the water tank comprises a water inlet, and the water inlet is arranged on the annular side wall; and / or
[0015] The water tank comprises a drain port, and the drain port is communicated with the drain groove.
[0016] In some embodiments, an overflow structure is provided on a side of the annular side wall facing the opening, and the overflow structure is provided at an end of the annular side wall facing away from the isolation box.
[0017] In some embodiments, the overflow structure includes an overflow trough and a second filter element, the overflow trough is connected to the interior of the water tank, and the second filter element is installed in the overflow trough.
[0018] In some embodiments, the water tank further includes a supporting bottom plate, the supporting bottom plate is connected to a side of the bottom wall facing away from the annular side wall, and the supporting bottom plate is arranged parallel to the opening.
[0019] In some embodiments, a nozzle is included, and the nozzle is disposed at the opening of the water tank, and the nozzle is spaced apart from the water tank.
[0020] The embodiment of the present application also provides a silicon material water explosion device, including the above-mentioned polysilicon water quenching device.
[0021] The beneficial effects of the embodiments of the present application are as follows: Different from the prior art, the embodiments of the present application provide a polysilicon water quenching device and a silicon material water explosion device. On the one hand, an isolation box is provided to receive the silicon material coming out of the discharge port, thereby reducing the risk of the silicon material being oxidized and contaminated. On the other hand, a heat exchanger is provided in the water tank to improve the water quenching effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments of the present application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on the drawings without paying creative work.
[0023] Figure 1 is a three-dimensional diagram of a polysilicon water quenching device provided in an embodiment of the present application;
[0024] Figure 2 yes Figure 1 A front view of the polysilicon water quenching device shown;
[0025] Figure 3 yes Figure 1 A top view of a polysilicon water quenching device is shown;
[0026] Figure 4 yes Figure 1 A schematic cross-sectional view of a polysilicon water quenching device is shown;
[0027] Figure 5 yes Figure 1 The left view of the polysilicon water quenching device is shown.
[0028] Reference numerals:
[0029] 100. Polysilicon water quenching device;
[0030] 10. Water tank; 101. Water inlet; 102. Drainage outlet;
[0031] 110. Open your mouth;
[0032] 120, annular side wall,
[0033] 130, bottom wall; 131, first end; 132, second end;
[0034] 140. drainage structure; 141. drainage trough; 142. first filter element;
[0035] 150, supporting base plate;
[0036] 20. Heat exchanger;
[0037] 30. Isolation box; 301. First opening; 302. Second opening;
[0038] 40. overflow structure; 41. overflow trough; 42. second filter element;
[0039] 50. Nozzle. DETAILED DESCRIPTION
[0040] In order to facilitate the understanding of the present application, the present application is described in more detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that when an element is described as "fixed to" another element, it can be directly on the other element, or there can be one or more centered elements therebetween. When an element is described as "connected to" another element, it can be directly connected to the other element, or there can be one or more centered elements therebetween. The terms "vertical", "horizontal", "first end", "second portion" and similar expressions used in this specification are for illustrative purposes only.
[0041] Unless otherwise defined, all technical and scientific terms used in this specification have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used in this specification and in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used in this specification includes any and all combinations of one or more of the related listed items.
[0042] The embodiment of the present application provides a silicon material water explosion equipment, including a feeding system, a heating system, a water cooling system, a transmission system and a crushing system connected in sequence, the feeding system is used to lift the silicon material to the heating system, the heating system is used to heat the silicon material, the heating system includes a discharge port, after the heated silicon material comes out of the discharge port, the water cooling system is used to water cool it, the material is water quenched, the transmission system is used to transport the water-quenched silicon material to the crushing system for crushing, the crushing system is used to crush the silicon material, which can be a conventional silicon material crushing equipment.
[0043] In order to facilitate water cooling of the silicon material heated from the heating system, the present application provides a polysilicon water quenching device, which is applied to the water cooling system of the above-mentioned silicon material water blasting equipment, and is used to water cool the silicon material after it comes out of the discharge port of the heating system.
[0044] Specifically, see Figure 1 and Figure 2 , Figure 1 FIG. 1 shows a three-dimensional schematic diagram of a polysilicon water quenching device 100 according to an embodiment of the present application. Figure 2 The figure shows a front view of a polysilicon water quenching device 100, which includes a water tank 10, a heat exchanger 20 and an isolation box 30. The water tank 10 is used to contain liquid, the heat exchanger 20 is at least partially disposed in the water tank 10, and is used to cool the liquid in the water tank 10, and the isolation box 30 is fixed to the water tank 10 and is placed above the water tank 10, and is used to receive silicon material coming out of the discharge port and immerse the silicon material in the water tank 10.
[0045] In some embodiments, the water tank 10 is substantially in the shape of a rectangular parallelepiped.
[0046] In some embodiments, an opening 110 is provided on one side of the water tank 10, and the water tank 10 includes a connected annular side wall 120 and a bottom wall 130. The above-mentioned isolation box 30 is fixed at the opening 110. The opening 110 is provided on the side of the annular side wall 120 away from the bottom wall 130, and the isolation box 30 is installed on the annular side wall 120.
[0047] In some embodiments, the bottom wall 130 includes a first end 131 and a second end 132 that are oppositely disposed, wherein the distance between the bottom wall 130 and the opening 110 gradually increases from the first end 131 to the second end 132 to facilitate the collection of debris dropped from the silicon material.
[0048] For the convenience of description, the present application takes the length direction of the water tank 10 as the x-direction, the width direction of the water tank 10 as the y-direction, and the height direction of the water tank 10 as the z-direction.
[0049] In some embodiments, the water tank 10 includes a water inlet 101 and a water outlet 102 to circulate liquid into the water tank 10. Preferably, the water inlet 101 and the water outlet 102 are both provided on the annular side wall 120, and the water inlet 101 is provided close to the opening 110, and the water outlet 102 is provided close to the bottom wall 130. It should be noted that external liquid can be input into the water tank 10 via the pipeline and the water inlet 101.
[0050] In some embodiments, Figure 3 and Figure 4 As shown, a drainage structure 140 is provided at the second end 132 of the bottom wall 130. Specifically, the drainage structure 140 includes a drainage groove 141, the drainage port 102 is connected to the drainage groove 141, and the drainage groove 141 extends from the bottom wall 130 in a direction away from the annular side wall 120, so as to facilitate the collection of the broken materials falling from the silicon material into the drainage groove 141.
[0051] In some embodiments, in order to facilitate the picking up of the debris in the drainage groove 141 and reduce the debris in the drainage groove 141 from being discharged through the drainage port 102, the drainage structure 140 includes a first filter element 142, which is installed in the drainage groove 141 to filter the liquid. It can be understood that the shape of the first filter element 142 is adapted to the shape of the drainage groove 141.
[0052] In some embodiments, the water tank 10 further includes a supporting bottom plate 150, which is connected to the side of the bottom wall 130 facing away from the annular side wall 120. The supporting bottom plate 150 is configured to support the bottom wall 130. The supporting bottom plate 150 is arranged parallel to the opening 110. Specifically, in the direction from the first end 131 to the second end 132, the distance between the bottom wall 130 and the opening 110 gradually increases along the z-direction, so that the bottom wall 130 is configured as a slope structure. To facilitate the water tank 10 to stand on the ground or other planes, the supporting bottom plate 150 is provided to make the end of the water tank 10 away from the opening a plane.
[0053] In some embodiments, the supporting bottom plate 150 is configured in a "U" shape, so that the end of the supporting bottom plate 150 facing away from the bottom wall 130 is a plane.
[0054] In some embodiments, the box body 10 is made of PP (polypropylene) material.
[0055] In some embodiments, an overflow structure 40 is provided on the side of the annular side wall 120 facing the opening 110. The overflow structure 40 is provided at the end of the annular side wall 120 facing away from the isolation box 30. The overflow structure 40 is configured to receive the liquid and debris overflowing from the water tank 10, and at the same time collect the debris scattered from the overflowing water. Specifically, the overflow structure 40 includes an overflow groove 41 and an overflow port 42 communicating with the overflow groove 41. The overflow groove 41 communicates with the inside of the water tank 10, and the overflow port 42 is used to discharge the liquid in the overflow groove 41.
[0056] In some embodiments, as Figure 4 shown, along the x-direction, the water tank 10 and the overflow groove 41 are arranged side by side. The water tank 10 and the overflow groove 41 have a common side wall. For the convenience of description, this common side wall is defined as a partition. That is, the partition belongs to a part of the annular side wall 120, and at the same time, this partition is also formed as a part of the side wall of the overflow groove 41. For example, the overflow groove 41 includes a peripheral wall and an inner bottom wall connected to each other, and the partition belongs to a part of the peripheral wall. Preferably, along the direction from the bottom wall to the opening, the top (the end of the annular side wall away from the bottom wall) at any position of the annular side wall 120 except the partition is higher than the top (the end of the partition away from the inner bottom wall) of the partition, so as to facilitate the overflow groove 41 to receive the liquid overflowing from the water tank 10.
[0057] In some embodiments, to facilitate picking up the debris in the overflow groove 41 and at the same time reduce the discharge of the debris in the overflow groove 41 through the overflow port 42, the overflow structure 40 includes a second filter element 43. The second filter element 43 is installed in the overflow groove 41 to filter the liquid and collect the debris. It can be understood that the shape of the second filter element 43 is adapted to the shape of the overflow groove 41.
[0058] In some embodiments, the first filter element 142 and the second filter element 43 are baskets. It is understood that the first filter element and the second filter element have relatively small pores and can filter out liquids but cannot filter out debris.
[0059] In some embodiments, the heat exchanger 20 is composed of an outer frame constructed in a roughly rectangular shape and many small-diameter thin-walled hoses. The outer frame can be made of the same material as the tank body 10, and many holes are opened on the side of the outer frame so that the hoses inside the outer frame can contact the water in the water tank 10.
[0060] It can be understood that the shape of the outer frame is adapted to the shape of the water tank body.
[0061] In some embodiments, the hose material is fluoroplastic, which has good corrosion resistance, a large thermal expansion coefficient, and greater flexibility, making the hose less prone to fouling.
[0062] In some embodiments, the water in the hose is chilled water provided by the factory, and this water is circulating water.
[0063] In some embodiments, the heat exchanger 20 is arranged on the annular side wall 120 of the water tank 10 , or the heat exchanger 20 is arranged on the bottom wall 130 of the water tank 10 , or the heat exchanger 20 is arranged on both the annular side wall 120 and the bottom wall 130 of the water tank 10 .
[0064] It should be noted that when the silicon material is immersed in the water tank 10, the temperature of the liquid in the water tank 10 will rise rapidly. By exchanging heat with a heat exchanger or adding external liquid to the water tank, the temperature of the liquid in the water tank 10 can be maintained constant, which is beneficial to cooling the silicon material.
[0065] In some embodiments, Figure 4 As shown, the isolation box 30 is arranged near the first end 131 of the bottom wall 130, and the isolation box 30 has a first opening 301 and a second opening 302, wherein the first opening 301 and the second opening 302 are oriented in different directions. Specifically, the first opening 301 is opposite to the above-mentioned discharge port, and the first opening 301 is configured to receive the silicon material coming out of the discharge port. The second opening 302 is opposite to the opening 110 of the water tank 10 and is connected to the inside of the water tank 10, for example, the second opening 302 is immersed in the liquid in the water tank 10. The second opening 302 is configured to immerse the silicon material in the liquid through the opening 110.
[0066] In some embodiments, to reduce the oxidation of the high-temperature silicon material when in contact with air, an inert gas is contained in the isolation box 30, and the inert gas includes at least one of helium, neon, argon, krypton, and xenon. By setting up the isolation box 30, the risk of oxidation contamination of the high-temperature silicon material can be reduced.
[0067] In some embodiments, the isolation box 30 is provided with a gas filling port, which is used to fill the above-mentioned inert gas.
[0068] In some embodiments, the polysilicon water quenching device 100 includes a material taking device, which is disposed outside the box body 10 or is erected above the water tank 10 along the y direction. The material taking device is configured to clamp silicon materials from the water tank 10 .
[0069] In some embodiments, the material taking device is a robotic arm.
[0070] In some embodiments, the polysilicon water quenching device 100 further includes a nozzle 50, which is disposed at the opening 110 of the water tank 10. Along the z direction, the nozzles 50 are arranged above the water tank 10 at intervals, and the nozzles 50 are configured to spray the silicon material clamped by the material taking device to clean the stains on the silicon material.
[0071] In some embodiments, Figure 3 and Figure 5 As shown, the nozzle of the spray head 50 is opposite to the opening 110 of the water tank 10 , so that the liquid sprayed from the nozzle can fall into the water tank 10 .
[0072] In some embodiments, the spray head 50 includes a plurality of nozzles, and the plurality of nozzles are arranged at intervals.
[0073] It should be noted that the nozzle is connected to external liquid via a water pipe to clean the silicon material. The external liquid is pure water provided by the factory.
[0074] The polysilicon water quenching device and silicon material water blasting equipment provided in the embodiment of the present application reduce the risk of silicon material contamination by setting an isolation box to receive the silicon material discharged from the discharge port. In addition, a heat exchanger is set in the water tank to increase the cooling rate of the silicon material, thereby improving the water quenching effect.
[0075] It should be noted that the preferred embodiments of the present application are given in the specification and drawings of the present application. However, the present application can be implemented in many different forms and is not limited to the embodiments described in the specification. These embodiments are not used as additional limitations on the content of the present application. The purpose of providing these embodiments is to make the understanding of the disclosure of the present application more thorough and comprehensive. In addition, the above-mentioned technical features continue to be combined with each other to form various embodiments not listed above, which are all regarded as the scope of the description of the present application; further, for ordinary technicians in this field, they can be improved or transformed according to the above description, and all these improvements and transformations should belong to the scope of protection of the claims attached to the present application.
Claims
1. A polysilicon water quenching device, applied to silicon material water explosion equipment, characterized in that: include: A water tank, one side of which is provided with an opening, and the water tank is used to contain liquid; a heat exchanger, at least partially disposed in the water tank, the heat exchanger being used to cool the liquid in the water tank; An isolation box is fixed at the opening of the water tank. The interior of the isolation box is used to contain inert gas. The isolation box has a first opening and a second opening. The first opening is used for silicon material to enter, and the second opening is connected to the interior of the water tank.
2. The polysilicon water quenching device according to claim 1, characterized in that: The water tank comprises an annular side wall and a bottom wall connected to each other, the opening is arranged on a side of the annular side wall away from the bottom wall, and the isolation box is installed on the annular side wall.
3. The polysilicon water quenching device according to claim 2, characterized in that: The bottom wall comprises a first end and a second end which are arranged opposite to each other, and the distance between the bottom wall and the opening increases in sequence from the first end to the second end; The isolation box is arranged close to the first end of the bottom wall, and a drainage structure is arranged at the second end of the bottom wall.
4. The polysilicon water quenching device according to claim 3, characterized in that: The drainage structure includes a drainage groove and a first filter element. The drainage groove extends from the bottom wall toward a direction away from the annular side wall, and the first filter element is installed in the drainage groove.
5. The polysilicon water quenching device according to claim 4, characterized in that: The water tank comprises a water inlet, and the water inlet is arranged on the annular side wall; and / or The water tank comprises a drain port, and the drain port is communicated with the drain groove.
6. The polysilicon water quenching device according to claim 2, characterized in that: An overflow structure is provided on a side of the annular side wall facing the opening, and the overflow structure is provided at an end of the annular side wall away from the isolation box.
7. The polysilicon water quenching device according to claim 6, characterized in that: The overflow structure includes an overflow groove and a second filter element, the overflow groove is communicated with the interior of the water tank, and the second filter element is installed in the overflow groove.
8. The polysilicon water quenching device according to any one of claims 2 to 7, characterized in that: The water tank further comprises a supporting bottom plate, wherein the supporting bottom plate is connected to a side of the bottom wall facing away from the annular side wall, and the supporting bottom plate is arranged parallel to the opening.
9. The polysilicon water quenching device according to any one of claims 1 to 7, characterized in that: It comprises a nozzle, which is arranged at the opening of the water tank, and the nozzle is spaced apart from the water tank.
10. A silicon material water explosion device, characterized in that: It comprises the polysilicon water quenching device as described in any one of claims 1 to 9.