Display device

Abstract

A display device includes: first and second pixel electrodes spaced apart from each other and disposed on a substrate; a pixel defining layer formed on the substrate and including a first inner surface defining a first opening exposing a portion of the first pixel electrode and a second inner surface defining a second opening exposing a portion of the second pixel electrode; a first lyophobic pattern covering the first inner surface and a portion of an upper surface of the pixel defining layer adjacent to the first inner surface; and a counter electrode disposed on the first pixel electrode and the second pixel electrode. The first lyophobic pattern partially surrounds the first opening in a plan view.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0039202 filed on March 24, 2023, in the Korean Intellectual Property Office (KIPO), and claims priority to and the benefit of Korean Patent Application No. 10-2023-0077713 filed on June 16, 2023, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The embodiment relates to a display device and a method of manufacturing the same, and the possibility of occurrence of defects in the manufacturing process of the display device is reduced. Background Art

[0004] Generally, an emission layer included in an organic light-emitting display device is formed by a solution process, which is performed by mixing an organic material constituting the emission layer with a solvent to generate a solution and dropping the solution into an opening of a pixel defining layer.

[0005] In this process, in the case where the pixel defining layer is lyophilic, a portion of the solution containing the organic material constituting the emission layer is widely dispersed on the upper surface of the pixel defining layer. In the process of drying the solution containing the organic material constituting the emission layer, a portion of the solution containing the organic material constituting the emission layer may remain on the upper surface of the pixel defining layer, and the thickness of the formed emission layer may be uneven. In order to overcome this limitation, a pixel defining layer including a fluorine compound is used or a plasma treatment is performed on the pixel defining layer.

[0006] However, in such a display device of the related art, in the case of using a pixel defining layer including a fluorine-based compound or performing a plasma treatment on the pixel defining layer, adhesion between the pixel defining layer and a layer disposed on the pixel defining layer may be reduced. Utility Model Content

[0007] The present disclosure provides a display device and a method for manufacturing the same, and the possibility of defects occurring in the manufacturing process of the display device is reduced. However, these issues are merely examples, and the scope of the present disclosure is not limited thereto.

[0008] Additional aspects will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of embodiments of the disclosure.

[0009] According to an embodiment, a display device may include: a first pixel electrode and a second pixel electrode, which are spaced apart from each other and disposed on a substrate; a pixel defining layer, which is formed on the substrate and includes a first inner surface defining a first opening exposing a portion of the first pixel electrode and a second inner surface defining a second opening exposing a portion of the second pixel electrode; a first liquid-repellent pattern, which covers the first inner surface and a portion of an upper surface of the pixel defining layer adjacent to the first inner surface and includes a liquid-repellent material; and a counter electrode, which is disposed on the first pixel electrode and the second pixel electrode. The first liquid-repellent pattern may partially surround the first opening in a plan view.

[0010] The first lyophobic pattern may include a first first lyophobic pattern and a first second lyophobic pattern spaced apart from each other.

[0011] Each of the first lyophobic pattern and the first second lyophobic pattern may surround a portion of the first opening in a plan view.

[0012] A portion of the upper surface of the pixel defining layer between the first lyophobic pattern and the first second lyophobic pattern may directly contact the counter electrode.

[0013] The display device may further include a second lyophobic pattern covering the second inner surface and a portion of the upper surface of the pixel defining layer adjacent to the second inner surface and including a lyophobic material.

[0014] A portion of the upper surface of the pixel defining layer between the first lyophobic pattern and the second lyophobic pattern may directly contact the counter electrode.

[0015] The second lyophobic pattern may include a second first lyophobic pattern and a second second lyophobic pattern spaced apart from each other, and a portion of an upper surface of the pixel defining layer between the second first lyophobic pattern and the second second lyophobic pattern may directly contact the counter electrode.

[0016] The display device may further include a first emission layer between the first pixel electrode and the counter electrode, and a second emission layer between the second pixel electrode and the counter electrode.

[0017] The lyophobic material may comprise a self-assembled monolayer.

[0018] The first lyophobic pattern may be spaced apart from the first pixel electrode.

[0019] According to an embodiment, a method for manufacturing a display device may include: forming a first pixel electrode and a second pixel electrode spaced apart from each other on a substrate; forming a pixel defining layer on the substrate, the pixel defining layer including a first inner surface defining a first opening exposing a portion of the first pixel electrode and a second inner surface defining a second opening exposing a portion of the second pixel electrode; forming a preliminary liquid-repellent pattern layer including a liquid-repellent material on the first pixel electrode, the second pixel electrode, and the pixel defining layer; forming a first liquid-repellent pattern by removing a portion of the preliminary liquid-repellent pattern layer, covering the first inner surface and a portion of an upper surface of the pixel defining layer adjacent to the first inner surface, including a liquid-repellent material, and partially surrounding the first opening in a plan view; and forming a counter electrode on the first pixel electrode and the second pixel electrode.

[0020] The first lyophobic pattern may include a first first lyophobic pattern and a first second lyophobic pattern spaced apart from each other.

[0021] The forming of the first lyophobic pattern may include forming the first lyophobic pattern such that each of the first lyophobic pattern and the first second lyophobic pattern surrounds a portion of the first opening in a plan view.

[0022] The forming of the counter electrode may include forming the counter electrode such that a portion of an upper surface of the pixel defining layer between the first lyophobic pattern and the first second lyophobic pattern directly contacts the counter electrode.

[0023] The method may further include forming a second lyophobic pattern by removing a portion of the preliminary lyophobic pattern layer, the second lyophobic pattern covering the second inner surface and a portion of an upper surface of the pixel defining layer adjacent to the second inner surface.

[0024] The forming of the counter electrode may include forming the counter electrode such that a portion of an upper surface of the pixel defining layer between the first lyophobic pattern and the second lyophobic pattern directly contacts the counter electrode.

[0025] The second lyophobic pattern may include a second first lyophobic pattern and a second second lyophobic pattern spaced apart from each other, and forming the counter electrode may include forming the counter electrode so that a portion of the upper surface of the pixel defining layer between the second first lyophobic pattern and the second second lyophobic pattern directly contacts the counter electrode.

[0026] The method may further include forming a first emission layer in the first opening and forming a second emission layer in the second opening. The forming of the first emission layer and the forming of the second emission layer may be performed between the forming of the first lyophobic pattern and the forming of the counter electrode.

[0027] The lyophobic material may comprise a self-assembled monolayer.

[0028] The forming of the first lyophobic pattern may include forming the first lyophobic pattern such that the first lyophobic pattern is spaced apart from the first pixel electrode.

[0029]

[0011] Other aspects, features and advantages in addition to those described above will become apparent from the following detailed description, the claims and the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The above and other aspects, features and advantages of the embodiments of the present disclosure will become more apparent from the following description in conjunction with the accompanying drawings, in which:

[0031] Figure 1 is a schematic plan view illustrating a portion of a display device according to an embodiment;

[0032] Figure 2 is a schematic diagram of an equivalent circuit of a pixel circuit included in a display device according to an embodiment;

[0033] Figure 3 As an example Figure 1 A schematic enlarged plan view of area A of a display device;

[0034] Figure 4 As an example, follow Figure 3 A schematic cross-sectional view of a cross section of the display device taken along line II';

[0035] Figure 5 Schematic diagram of an example self-assembled monolayer material;

[0036] Figure 6 As an example, follow Figure 3 A schematic cross-sectional view of a cross section of the display device taken along line II-II';

[0037] Figure 7 As an example, according to an embodiment Figure 3 A schematic cross-sectional view of a cross section of the display device taken along line II';

[0038] Figure 8 is a schematic plan view illustrating a display device according to an embodiment;

[0039] Figures 9 to 11 is a schematic plan view illustrating a display device according to an embodiment;

[0040] Figures 12 to 19 As an example manufacturing Figure 4 A schematic cross-sectional view of a process for manufacturing a display device of the present invention; and

[0041] Fig. 20 is a schematic cross-sectional view illustrating a method for manufacturing a display device according to an embodiment. DETAILED DESCRIPTION

[0042] In the following description, for the purpose of explanation, many specific details are stated to provide a thorough understanding of various embodiments or implementations of the present disclosure. As used herein, "embodiment" and "implementation" are interchangeable words, which are non-limiting examples of the devices or methods disclosed herein. However, it is apparent that various embodiments can be practiced without these specific details or in the case of one or more equivalent arrangements. Here, various embodiments do not have to be exclusive, nor do they have to limit the present disclosure. For example, the specific shape, configuration, and characteristics of an embodiment may be used or implemented in another embodiment.

[0043] Now will be referred to in detail embodiment, its example is illustrated in the attached drawings, wherein the same reference numerals refer to the same elements from beginning to end.In this regard, embodiment can have different forms and should not be interpreted as being limited to the description stated in this article.Therefore, embodiment is described below only by reference to the drawings to explain the various aspects of description.As used in this article, term "and / or" includes any and all combinations of one or more related enumerated items.For example, "A and / or B" can be understood to mean "A, B or A and B". The term "and" and "or" can be used for connecting meaning or separating meaning and can be understood to be equivalent to "and / or".Throughout this disclosure, the expression "at least one of a, b and c" and "at least one of the group consisting of a, b and c" indicates only a, only b, only c, a and b both, a and c both, b and c both, a, b and c all or its variant.

[0044] The present disclosure may include various embodiments and modifications, and its embodiments are illustrated in the accompanying drawings and will be described in detail herein. From the embodiments described in detail below with reference to the accompanying drawings, the advantages and features of the present disclosure and methods for implementing the same will become apparent. However, the present disclosure is not limited to the embodiments described below and may be embodied in various modes.

[0045] The terminology used herein is for the purpose of describing particular embodiments and is not intended to be limiting. It should also be noted that, as used herein, the terms "substantially," "about," and other similar terms are used as terms of approximation rather than terms of degree, and, as such, are used to account for the inherent deviations in measured, calculated, and / or provided values ​​that one of ordinary skill in the art would recognize.

[0046] It will be understood that although terms such as "first" and "second" may be used herein to describe various elements, these elements should not be limited by these terms, and these terms are only used to distinguish one element from another element. Therefore, without departing from the teachings of the present disclosure, the first element discussed below may be referred to as the second element.

[0047] As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0048] Furthermore, it will be understood that the terms “comprises,” “including,” and “having” used herein indicate the presence of stated features, components, elements, integers, steps, operations, and / or groups thereof, but do not preclude the presence or addition of one or more other features, components, elements, integers, steps, operations, and / or groups thereof.

[0049] It will be understood that when an element such as a layer, region or panel is referred to as being “on” another element, it can be “directly on” the other element or can be “indirectly on” the other element with one or more intervening elements therebetween.

[0050] It will be understood that where a layer, region, or component is referred to as being “connected to” another layer, region, or component, it may be “directly connected to” the other layer, region, or component, or may be “indirectly connected to” the other layer, region, or component with one or more intervening layers, regions, or components. However, when an element or layer is referred to as being “directly on” or “directly connected to” another element or layer, there are no intervening elements or layers. For example, it will be understood that where a layer, region, or component is referred to as being “electrically connected to” another layer, region, or component, it may be “directly electrically connected to” the other layer, region, or component and / or may be “indirectly electrically connected to” the other layer, region, or component with one or more intervening layers, regions, or components.

[0051] When a component is described herein as being “connected” to another component or being “connected” to another component, the components may be connected to each other as separate elements, or the components may be integral with each other.

[0052] Throughout the specification, when an element is referred to as being "connected" to another element, the element may be "directly connected" to the other element, or "electrically connected" to the other element with one or more intervening elements interposed therebetween. Also, when an element is referred to as being "in contact with" another element, the element may be "electrically in contact with" or "physically in contact with" the other element; or "indirectly in contact with" the other element.

[0053] Spatially relative terms, such as "below," "down," "above," "higher," and "side," may be used herein for descriptive purposes and thereby describe the relationship of one element to another, as illustrated in the accompanying drawings. Spatially relative terms are intended to encompass different orientations of the device in use, operation, and / or manufacture, in addition to the orientation depicted in the accompanying drawings. For example, if the device in the accompanying drawings is turned over, an element or feature described as being "below" or "beneath" other elements or features would be oriented "above" the other elements or features. Thus, the example term "below" may encompass both above and below orientations. In addition, the device may be oriented in other ways (e.g., rotated 90 degrees or in other orientations), and as such, the spatially relative descriptors used herein should be interpreted accordingly.

[0054] As used herein, the x-direction, y-direction, and z-direction are not limited to directions corresponding to the three axes of a rectangular coordinate system and may be interpreted in a broader sense. For example, the x-direction, y-direction, and z-direction may be perpendicular to each other or may represent different directions that are not perpendicular to each other.

[0055] In the case where the embodiment can be implemented in different ways, the specific process order can be performed in a different way from the described order. For example, two processes described in succession can be performed substantially at the same time or can be performed in the reverse order of the described order.

[0056] Hereinafter, the embodiments will be described in detail with reference to the attached drawings. In the following description, the same reference numerals will represent the same elements, and their redundant descriptions will be omitted for the sake of brevity. For the convenience of description, the sizes of the components in the drawings may be enlarged. For example, because the sizes and shapes of the components in the drawings are arbitrarily illustrated for the convenience of description, the present disclosure is not limited thereto.

[0057] Unless otherwise indicated, the illustrated embodiments should be understood to provide exemplary features of the present disclosure. Therefore, unless otherwise indicated, the features, components, modules, layers, films, panels, regions and / or aspects of the various embodiments (hereinafter individually or collectively referred to as "elements") can be combined, separated, interchanged and / or rearranged in other ways without departing from the present disclosure.

[0058] The use of cross hatching and / or shading in the accompanying drawings is generally provided to clarify the boundaries between adjacent elements. As such, the presence or absence of cross hatching or shading does not convey or indicate a preference or requirement for a particular material, material properties, dimensions, ratios, commonality between illustrative elements, and / or any other characteristics, attributes, characteristics, etc. of an element, unless explicitly stated. Further, in the accompanying drawings, the size and relative size of the element may be enlarged for the purpose of clarity and / or description. When an embodiment can be implemented in different ways, a specific process sequence may be performed in a different way from the described sequence. For example, two processes described in succession may be performed substantially simultaneously or in an order opposite to the described order. Moreover, the same reference numerals represent the same elements.

[0059] Various embodiments are described herein with reference to cross-sections and / or exploded illustrations that are schematic illustrations of embodiments and / or intermediate structures. As such, variations in the shapes illustrated are to be expected due to, for example, manufacturing techniques and / or tolerances. Thus, the embodiments disclosed herein should not be construed as limited to the shapes of the particular illustrated regions, but rather include deviations in shape that result, for example, from manufacturing. In this manner, the regions illustrated in the drawings may be schematic in nature, and the shapes of these regions may not reflect the actual shapes of the regions of the device, and as such, are not necessarily intended to be limiting.

[0060] The display surface may be parallel to a surface defined by a first direction (e.g., an x ​​direction or a -x direction) and a second direction (e.g., a y direction or a -y direction). The normal direction of the display surface, i.e., the thickness direction of the display device 1, may indicate a third direction (e.g., a z direction or a -z direction). In this specification, the expression "when viewed from the top or in a plan view" may indicate the situation when viewed in a third direction. Hereinafter, the front surface (or top surface) and the rear surface (or bottom surface) of each of the layers or units may be distinguished by a third direction. However, the directions indicated by the first, second, and third directions may be relative concepts and may be converted relative to each other, such as converted to opposite directions.

[0061] Unless otherwise defined or implied herein, all terms (including technical and scientific terms) used have the same meaning as commonly understood by those skilled in the art to which the present disclosure belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with their meaning in the context of the relevant art, and should not be interpreted in an ideal or overly formal sense unless clearly defined in the specification.

[0062] Figure 1 FIG. 1 is a schematic plan view illustrating a portion of a display device 1 according to an embodiment. Figure 1, the display device 1 may include a display area DA in which a plurality of pixels PX are arranged and a peripheral area PA located near the display area DA. For example, the peripheral area PA may surround at least a portion of the display area DA. For example, the peripheral area PA may completely surround the display area DA. The display device 1 may include a substrate (e.g., see Figure 4 100). The substrate included in the display device 1 (for example, see Figure 4 100) may include a display area DA and a peripheral area PA.

[0063] Each pixel PX of the display device 1 may be a region capable of emitting light of a certain color (eg, a specific or selectable color), and the display device 1 may provide an image by using the light emitted from the pixel PX. For example, each pixel PX may emit red light, green light, or blue light.

[0064] refer to Figure 1 , the display area DA may have a polygonal shape such as a quadrilateral in a plan view. In one embodiment, the display area DA may have a rectangular shape in which the horizontal length is greater than the vertical length. In another embodiment, the display area DA may have a rectangular shape in which the horizontal length is less than the vertical length. In another embodiment, the display area DA may have a square shape. In another embodiment, the display area DA may have various shapes such as an elliptical shape or a circular shape.

[0065] The peripheral area PA may be a non-display area in which no pixels PX are arranged. A driver or the like for providing an electrical signal or power to the pixels PX may be arranged in the peripheral area PA. The peripheral area PA may include pads (not illustrated) electrically connected to various electronic components or a printed circuit board or the like. The pads may be spaced apart from each other in the peripheral area PA and may be electrically connected to a printed circuit board or an integrated circuit element or the like.

[0066] Figure 2 2 is a schematic diagram of an equivalent circuit of a pixel circuit PC included in a display device 1 according to an embodiment. The pixel circuit PC may be electrically connected to an organic light emitting diode OLED, and one organic light emitting diode OLED may correspond to one pixel PX.

[0067] The pixel circuit PC may include a first transistor T1, a second transistor T2, and a storage capacitor Cst. The second transistor T2 may be a switching transistor. As a switching transistor, the second transistor T2 may be electrically connected to a scan line SL and a data line DL, may be turned on by a switching signal input from the scan line SL, and may transmit a data signal input from the data line DL to the first transistor T1. One end of the storage capacitor Cst may be electrically connected to the second transistor T2, the other end of the storage capacitor Cst may be electrically connected to a driving voltage line PL, and the storage capacitor Cst may store a voltage corresponding to a difference between a voltage received from the second transistor T2 and a driving power supply voltage ELVDD supplied to the driving voltage line PL.

[0068] The first transistor T1 may be a driving transistor. As a driving transistor, the first transistor T1 may be electrically connected to the driving voltage line PL and the storage capacitor Cst, and may control the level of the driving current flowing from the driving voltage line PL to the organic light emitting diode OLED in response to the voltage value stored in the storage capacitor Cst. The organic light emitting diode OLED may emit light having a certain brightness (specific or selectable brightness) according to the driving current. The counter electrode of the organic light emitting diode OLED may be supplied with an electrode power supply voltage ELVSS.

[0069] although Figure 2 The illustrated pixel circuit PC includes two transistors and one storage capacitor, but the present disclosure is not limited thereto. The number of transistors and the number of storage capacitors may be modified in various ways according to the design of the pixel circuit PC.

[0070] Figure 3 As an example Figure 1 Schematic enlarged plan view of area A of display device 1. For convenience, Figure 3 2. A plan view of the pixel defining layer 215 is shown. For the convenience of description, Figure 3 The lyophobic (or liquid-repellent) patterns LP1 , LP2 , and LP3 disposed (eg, disposed together) on the pixel defining layer 215 are illustrated.

[0071] refer to Figure 3 , a plurality of pixels PX may be arranged on a substrate (eg, see Figure 4 100) display area (for example, see Figure 1 Each of the pixels PX may be a sub-pixel and may include, for example, an organic light emitting diode (eg, see Figure 2For example, the pixel PX may emit red light, green light, or blue light. For example, the pixel PX may be a first pixel PX1 that emits red light, a second pixel PX2 that emits green light, or a third pixel PX3 that emits blue light. The red light may be light belonging to a wavelength band in the range of about 580 nm to about 780 nm, the green light may be light belonging to a wavelength band in the range of about 495 nm to about 580 nm, and the blue light may be light belonging to a wavelength band in the range of about 400 nm to about 495 nm.

[0072] The first pixel electrode 211 included in the first pixel PX1, the second pixel electrode 212 included in the second pixel PX2, and the third pixel electrode 213 included in the third pixel PX3 may be arranged in a display area (eg, see FIG. 2 ). Figure 1 For example, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be spaced apart from each other in a first direction (eg, x direction or -x direction) in a plan view. Figure 3 , the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may have the same size in a plan view. In another embodiment, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may have different sizes in a plan view.

[0073] The pixel defining layer 215 may be disposed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. For example, the pixel defining layer 215 may be disposed on a portion of the first to third pixel electrodes 211, 212, and 213 (eg, see Figure 4 ). The pixel defining layer 215 may include a first opening OP1, a second opening OP2, and a third opening OP3. The first opening OP1 and the second opening OP2 may be positioned adjacent to each other in a first direction (e.g., an x ​​direction or a -x direction), and the third opening OP3 may be positioned in a direction opposite to the first opening OP1, with the second opening OP2 being between the first opening OP1 and the third opening OP3. The first opening OP1 may expose a portion (e.g., a central portion) of the first pixel electrode 211, the second opening OP2 may expose a portion (e.g., a central portion) of the second pixel electrode 212, and the third opening OP3 may expose a portion (e.g., a central portion) of the third pixel electrode 213. In one embodiment, reference is made to Figure 3 , the first opening OP1 , the second opening OP2 , and the third opening OP3 may have the same size. In another embodiment, the first opening OP1 , the second opening OP2 , and the third opening OP3 may have different sizes.

[0074] although Figure 3The emission layer that emits light may be located in the first opening OP1, the second opening OP2, and the third opening OP3 of the pixel defining layer 215. The counter electrode may be disposed on the emission layer. The stacked structure of the pixel electrode, the emission layer, and the counter electrode may form an organic light emitting diode (e.g., see Figure 2 One opening of the pixel defining layer 215 may correspond to one organic light emitting diode (eg, Figure 2 OLED) and can define an emission area.

[0075] For example, an emission layer emitting red light may be arranged in the first opening OP1, and an emission area defined by the first opening OP1 may be defined as a first pixel PX1. An emission layer emitting green light may be arranged in the second opening OP2, and an emission area defined by the second opening OP2 may be defined as a second pixel PX2. An emission layer emitting blue light may be arranged in the third opening OP3, and an emission area defined by the third opening OP3 may be defined as a third pixel PX3. However, the present disclosure is not limited thereto. In another embodiment, an emission layer emitting blue light or green light may be arranged in the first opening OP1, the second opening OP2, and the third opening OP3. The display device 1 may include a light emitting panel and a color panel stacked in a thickness direction (e.g., a z direction or a -z direction), and blue light or green light emitted from the emission layer of the light emitting panel may be transmitted through the emission layer, or may be converted into red light, green light, and blue light when passing through the color panel.

[0076] The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be disposed on the pixel defining layer 215. Figure 4 The lyophobic patterns LP1, LP2, and LP3 may be disposed on the pixel defining layer 215 and surround the opening defined by the pixel defining layer 215. For example, in a plan view, the first lyophobic pattern LP1 may surround the first opening OP1, the second lyophobic pattern LP2 may surround the second opening OP2, and the third lyophobic pattern LP3 may surround the third opening OP3. In this document, “in a plan view” may mean in a direction perpendicular to the substrate (e.g., see FIG. 100 ). Figure 4 For example, “B around A in a plan view” may mean “when viewed in a direction perpendicular to the substrate (e.g., Figure 4 B” around A when viewed in the direction of 100).

[0077] Therefore, the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be spaced apart from each other in the first direction (e.g., the x direction or the -x direction). For example, the first lyophobic pattern LP1 and the second lyophobic pattern LP2 may be positioned adjacent to each other in the first direction (e.g., the x direction or the -x direction), and the third lyophobic pattern LP3 may be positioned in a direction opposite to the first lyophobic pattern LP1, with the second lyophobic pattern LP2 being interposed between the first lyophobic pattern LP1 and the third lyophobic pattern LP3.

[0078] In one embodiment, the first lyophobic pattern LP1 may include a first lyophobic pattern LP11 and a first lyophobic pattern LP12. For example, the first lyophobic pattern LP11 and the first lyophobic pattern LP12 may be sub-lyophobic patterns of the first lyophobic pattern LP1. Each of the first lyophobic pattern LP11 and the first lyophobic pattern LP12 may surround a portion of the first opening OP1 in a plan view. For example, referring to Figure 3 , in a plan view, the first lyophobic pattern LP11 may surround a left side of the first opening OP1 , and the first second lyophobic pattern LP12 may surround a right side of the first opening OP1 .

[0079] The first first lyophobic pattern LP11 and the first second lyophobic pattern LP12 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). For example, one end of the first first lyophobic pattern LP11 disposed adjacent to the first second lyophobic pattern LP12 may be spaced apart from one end of the first second lyophobic pattern LP12 disposed adjacent to the first first lyophobic pattern LP11, and the other end of the first first lyophobic pattern LP11 disposed adjacent to the first second lyophobic pattern LP12 may be spaced apart from the other end of the first second lyophobic pattern LP12 disposed adjacent to the first first lyophobic pattern LP11. For example, the first lyophobic pattern LP1 may partially surround the first opening OP1 in a plan view.

[0080] The second lyophobic pattern LP2 may include a second first lyophobic pattern LP21 and a second second lyophobic pattern LP22, and the third lyophobic pattern LP3 may include a third first lyophobic pattern LP31 and a third second lyophobic pattern LP32. For example, the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22 may be sub-lyophobic patterns of the second lyophobic pattern LP2, and the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 may be sub-lyophobic patterns of the third lyophobic pattern LP3.

[0081] Each of the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22 may surround a portion of the second opening OP2 in a plan view. Figure 3, in a plan view, the second first liquid-repellent pattern LP21 may surround the left side of the second opening OP2, and the second second liquid-repellent pattern LP22 may surround the right side of the second opening OP2. The second first liquid-repellent pattern LP21 and the second second liquid-repellent pattern LP22 may be spaced apart from each other in a first direction (e.g., the x direction or the -x direction). For example, one end of the second first liquid-repellent pattern LP21 disposed adjacent to the second second liquid-repellent pattern LP22 may be spaced apart from one end of the second second liquid-repellent pattern LP22 disposed adjacent to the second first liquid-repellent pattern LP21, and the other end of the second first liquid-repellent pattern LP21 disposed adjacent to the second second liquid-repellent pattern LP22 may be spaced apart from the other end of the second second liquid-repellent pattern LP22 disposed adjacent to the second first liquid-repellent pattern LP21. For example, the second liquid-repellent pattern LP2 may partially surround the second opening OP2 in a plan view.

[0082] Each of the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 may surround a portion of the third opening OP3 in a plan view. Figure 3 , in a plan view, the third first liquid-repellent pattern LP31 may surround the left side of the third opening OP3, and the third second liquid-repellent pattern LP32 may surround the right side of the third opening OP3. The third first liquid-repellent pattern LP31 and the third second liquid-repellent pattern LP32 may be spaced apart from each other in a first direction (e.g., the x direction or the -x direction). For example, one end of the third first liquid-repellent pattern LP31 disposed adjacent to the third second liquid-repellent pattern LP32 may be spaced apart from one end of the third second liquid-repellent pattern LP32 disposed adjacent to the third first liquid-repellent pattern LP31, and the other end of the third first liquid-repellent pattern LP31 disposed adjacent to the third second liquid-repellent pattern LP32 may be spaced apart from the other end of the third second liquid-repellent pattern LP32 disposed adjacent to the third first liquid-repellent pattern LP31. For example, the third liquid-repellent pattern LP3 may partially surround the third opening OP3 in a plan view.

[0083] Figure 4 As an example, follow Figure 3 Schematic cross-sectional view of a cross section of the display device 1 taken along line II'. Figure 4According to an embodiment, the display device 1 may include a substrate 100. The substrate 100 may include various flexible or bendable materials. For example, the substrate 100 may include glass, metal, or a polymer resin, etc. The substrate 100 may include a polymer resin including polyethersulfone, polyacrylate, polyetherimide, polyethylene naphthalate, polyethylene terephthalate, polyphenylene sulfide, polyarylate, polyimide, polycarbonate, cellulose acetate propionate, etc., or a combination thereof. However, the substrate 100 may be modified in various ways, such as having a multilayer structure including two layers, the two layers including a polymer resin and an inorganic material (e.g., silicon oxide (SiO x ), silicon nitride (SiN x ) or silicon oxynitride (SiO x N y ))'s isolation layer.

[0084] A display element included in the pixel PX and a pixel circuit PC electrically connected to the display element may be disposed on the substrate 100 . Figure 4 The exemplary pixel PX includes an organic light emitting diode OLED as a display element. For example, the organic light emitting diode OLED may be a first organic light emitting diode OLED1, a second organic light emitting diode OLED2, and / or a third organic light emitting diode OLED3. For example, the first pixel PX1 may include the first organic light emitting diode OLED1, the second pixel PX2 may include the second organic light emitting diode OLED2, and the third pixel PX3 may include the third organic light emitting diode OLED3.

[0085] The pixel circuit PC may be disposed on the substrate 100. The structures of the pixel circuits PC of the pixels PX may be identical to each other, and one pixel circuit PC will be described. The pixel circuit PC may include a plurality of thin film transistors TFT and a storage capacitor Cst. For the convenience of illustration, Figure 4 A thin film transistor TFT is exemplified, and the thin film transistor TFT may correspond to the above-mentioned first transistor (for example, see Figure 2 of T1).

[0086] Including silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ) or a combination thereof may be interposed between the thin film transistor TFT and the substrate 100. The buffer layer 201 may increase the smoothness of the upper surface of the substrate 100 or prevent impurities from penetrating from the substrate 100 or the like into the semiconductor layer Act of the thin film transistor TFT or minimize such penetration.

[0087] refer to Figure 4The thin film transistor TFT may include a semiconductor layer Act, and the semiconductor layer Act includes amorphous silicon, polycrystalline silicon, an organic semiconductor material, or an oxide semiconductor material. The thin film transistor TFT may include a gate electrode GE, a source electrode SE, and / or a drain electrode DE. The gate electrode GE may include various conductive materials and may have various layered structures, for example, a Mo layer and an Al layer. In another embodiment, the gate electrode GE may include a TiN x The source electrode SE and the drain electrode DE may include various conductive materials and may have various layered structures, for example, may include a Ti layer, an Al layer, and / or a Cu layer.

[0088] In order to ensure insulation between the semiconductor layer Act and the gate electrode GE, a silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ) or a combination thereof may be interposed between the semiconductor layer Act and the gate electrode GE. Figure 4 The gate insulating layer 203 is illustrated to have a shape corresponding to a surface (eg, entire surface) of the substrate 100 and has a structure in which a contact hole is formed in a portion, however, the disclosure is not limited thereto. In another embodiment, the gate insulating layer 203 and the gate electrode GE may be patterned in the same shape.

[0089] Including silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ) or the like or a combination thereof may be disposed on the gate electrode GE. The first interlayer insulating layer 205 may have a single layer or multilayer structure including the above materials. The first interlayer insulating layer 205 may be formed by chemical vapor deposition (CVD) or atomic layer deposition (ALD), etc. This also applies to the following embodiments and modifications of the following embodiments.

[0090] The storage capacitor Cst may include a first capacitor electrode CE1 and a second capacitor electrode CE2 overlapping each other in a plan view with a first interlayer insulating layer 205 interposed therebetween. The storage capacitor Cst may overlap the thin film transistor TFT in a plan view. Figure 4The gate electrode GE of the illustrative thin film transistor TFT is the first capacitor electrode CE1 of the storage capacitor Cst, however, the present disclosure is not limited thereto. In another embodiment, the storage capacitor Cst may not overlap with the thin film transistor TFT in a plan view. The second capacitor electrode CE2 of the storage capacitor Cst may include a conductive material including molybdenum (Mo), aluminum (Al), copper (Cu), titanium (Ti), etc. or an alloy thereof, and may have a single-layer or multi-layer structure including the above materials.

[0091] Including silicon oxide (SiO x ), silicon nitride (SiN y ), silicon oxynitride (SiO x N y ) or the like or a combination thereof may be disposed on the second capacitor electrode CE2 of the storage capacitor Cst. The second interlayer insulating layer 207 may have a single layer or multi-layer structure including the above materials.

[0092] The source electrode SE and the drain electrode DE may be disposed on the second interlayer insulating layer 207. The source electrode SE and the drain electrode DE may include a material having high conductivity. The source electrode SE and the drain electrode DE may include a conductive material including molybdenum (Mo), aluminum (Al), copper (Cu), titanium (Ti), etc. or an alloy thereof, and may have a single layer or multilayer structure including the above materials. For example, the source electrode SE and the drain electrode DE may have a multilayer structure of Ti / Al / Ti.

[0093] However, the present disclosure is not limited thereto. In another embodiment, the thin film transistor TFT may include only one of the source electrode SE and the drain electrode DE, or may not include both the source electrode SE and the drain electrode DE. For example, the thin film transistor TFT may not include the drain electrode DE, another thin film transistor TFT electrically connected to the thin film transistor TFT may not include the source electrode SE, and the semiconductor layers Act of the two thin film transistors (for example, the thin film transistor TFT and the other thin film transistor TFT) may be electrically connected to each other. The connection structure can provide the same effect as the embodiment in which the thin film transistor TFT also includes the source electrode SE, the other thin film transistor TFT also includes the drain electrode DE, and the source electrode SE of the thin film transistor TFT is connected to the drain electrode DE of the other thin film transistor TFT.

[0094] refer to Figure 4, the planarization layer 208 may cover the thin film transistor TFT and the storage capacitor Cst. The planarization layer 208 may include an organic insulating material. For example, the planarization layer 208 may include a photoresist, benzocyclobutene (BCB), polyimide, hexamethyldisiloxane (HMDSO), polymethyl methacrylate (PMMA), polystyrene (PS), a polymer derivative having a phenolic group, an acrylic polymer, an imide polymer, an aromatic ether polymer, an amide polymer, a fluorine polymer, a paraxylene polymer, a vinyl alcohol polymer, etc. or any mixture thereof. Although Figure 4 Although not illustrated in the figure, a third interlayer insulating layer may be further disposed below the planarization layer 208. The third interlayer insulating layer may include, for example, silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ) or a combination thereof.

[0095] The first organic light emitting diode OLED1, the second organic light emitting diode OLED2, and the third organic light emitting diode OLED3 may be spaced apart from each other in a first direction (e.g., x direction or -x direction) on the planarization layer 208. For example, the first organic light emitting diode OLED1 and the second organic light emitting diode OLED2 disposed adjacent to each other may be arranged in the first direction (e.g., x direction or -x direction) on the planarization layer 208, and the third organic light emitting diode OLED3 may be disposed adjacent to the second organic light emitting diode OLED2 in the first direction (e.g., x direction or -x direction) on the planarization layer 208. For example, the third organic light emitting diode OLED3 may be located in a direction opposite to the first organic light emitting diode OLED1, and the second organic light emitting diode OLED2 is disposed between the first organic light emitting diode OLED1 and the third organic light emitting diode OLED3 on the planarization layer 208.

[0096] The first organic light emitting diode OLED1, the second organic light emitting diode OLED2, and the third organic light emitting diode OLED3 may emit light of different colors, respectively. For example, the first organic light emitting diode OLED1 may emit red light, the second organic light emitting diode OLED2 may emit green light, and the third organic light emitting diode OLED3 may emit blue light. The first organic light emitting diode OLED1 may include a first pixel electrode 211, a first emission layer 221, and a counter electrode 230. The second organic light emitting diode OLED2 may include a second pixel electrode 212, a second emission layer 222, and a counter electrode 230, and the third organic light emitting diode OLED3 may include a third pixel electrode 213, a third emission layer 223, and a counter electrode 230. The counter electrode 230 may be provided as a whole on an area (e.g., an entire area) of the display device 1, and thus may be provided in common in a plurality of organic light emitting diodes OLED.

[0097] The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be spaced apart from each other in a first direction (e.g., the x direction or the -x direction) on the planarization layer 208. For example, the second pixel electrode 212 may be arranged adjacent to the first pixel electrode 211 in a first direction (e.g., the x direction or the -x direction) on the planarization layer 208. The third pixel electrode 213 may be arranged adjacent to the second pixel electrode 212 in a first direction (e.g., the x direction or the -x direction) on the planarization layer 208. For example, the third pixel electrode 213 may be located in a direction opposite to the first pixel electrode 211, and the second pixel electrode 212 is between the first pixel electrode 211 and the third pixel electrode 213 on the planarization layer 208. The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may include a material such as ITO, In 2 O 3 The first pixel electrode 211, the second pixel electrode 212 and the third pixel electrode 213 may have a three-layer structure of ITO / Ag / ITO.

[0098] refer to Figure 4 The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be electrically connected to the thin film transistor TFT by contacting one of the source electrode SE and the drain electrode DE. Each of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may contact one of the source electrode SE and the drain electrode DE through a contact hole formed in the planarization layer 208.

[0099] The pixel defining layer 215 may be disposed on the planarization layer 208. As described above, the pixel defining layer 215 may define a first opening OP1, a second opening OP2, and a third opening OP3. The pixel defining layer 215 may include a first inner surface IS1, a second inner surface IS2, and a third inner surface IS3. The first inner surface IS1 may define a first opening OP1, the second inner surface IS2 may define a second opening OP2, and the third inner surface IS3 may define a third opening OP3. The first opening OP1 may correspond to the first pixel PX1, the second opening OP2 may correspond to the second pixel PX2, and the third opening OP3 may correspond to the third pixel PX3. The first opening OP1 may expose a portion (e.g., a central portion) of the first pixel electrode 211 of the first organic light emitting diode OLED1, the second opening OP2 may expose a portion (e.g., a central portion) of the second pixel electrode 212 of the second organic light emitting diode OLED2, and the third opening OP3 may expose a portion (e.g., a central portion) of the third pixel electrode 213 of the third organic light emitting diode OLED3. For example, the pixel defining layer 215 may define the first, second or third pixel (also referred to as pixel) PX1, PX2 or PX3 by including a first, second or third inner surface (also referred to as inner surface) IS1, IS2 or IS3 defining a first, second or third opening (also referred to as opening) OP1, OP2 or OP3 corresponding to the pixel PX1, PX2 or PX3, for example, at least a portion (for example, a central portion) of the first, second or third pixel electrode (also referred to as pixel electrode) 211, 212 or 213 is exposed through the opening OP1, OP2 or OP3.

[0100] The first opening OP1, the second opening OP2, and the third opening OP3 may be regions where a portion of the pixel defining layer 215 has been removed. Figure 4 , each of the first inner surface IS1 defining the first opening OP1, the second inner surface IS2 defining the second opening OP2, and the third inner surface IS3 defining the third opening OP3 may have an inclined structure. Each of the first inner surface IS1 defining the first opening OP1, the second inner surface IS2 defining the second opening OP2, and the third inner surface IS3 defining the third opening OP3 may include a front tapered inclined surface. The inner surface IS1, IS2, or IS3 defining the opening OP1, OP2, or OP3 including the front tapered inclined surface may mean that a portion of the opening OP1, OP2, or OP3 in a direction opposite to the direction of the substrate 100 (in the +z direction) has a width greater than a portion of the opening OP1, OP2, or OP3 in the direction of the substrate 100 (in the -z direction).

[0101] In one embodiment, reference Figure 4, the pixel defining layer 215 may increase the distance between the edge of the first pixel electrode 211, the edge of the second pixel electrode 212, and the edge of the third pixel electrode 213 and the counter electrode 230 on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Therefore, arcing or the like may be prevented from occurring at the edge of the first pixel electrode 211, the edge of the second pixel electrode 212, or the edge of the third pixel electrode 213. The pixel defining layer 215 may include, for example, an organic material such as polyimide, hexamethyldisiloxane (HMDSO), or the like, or a combination thereof.

[0102] A first emission layer 221 capable of emitting red light may be disposed on the first pixel electrode 211. For example, the first emission layer 221 may be between the first pixel electrode 211 and the counter electrode 230. A second emission layer 222 capable of emitting green light may be disposed on the second pixel electrode 212, and a third emission layer 223 capable of emitting blue light may be disposed on the third pixel electrode 213. For example, the second emission layer 222 may be between the second pixel electrode 212 and the counter electrode 230, and the third emission layer 223 may be between the third pixel electrode 213 and the counter electrode 230. The first emission layer 221, the second emission layer 222, and the third emission layer 223 may include, for example, an organic material. The first emission layer 221, the second emission layer 222, and the third emission layer 223 may include a high molecular weight or low molecular weight organic material capable of emitting light of a certain color (e.g., a certain or selectable color, such as red, green, or blue).

[0103] For example, the first emission layer 221 may include a high molecular weight or low molecular weight organic material capable of emitting red light, the second emission layer 222 may include a high molecular weight or low molecular weight organic material capable of emitting green light, and the third emission layer 223 may include a high molecular weight or low molecular weight organic material capable of emitting blue light. For example, the first emission layer 221, the second emission layer 222, and the third emission layer 223 may include a polymer material such as polyphenylene vinylene (PPV), polyfluorene, etc. or a combination thereof. The first emission layer 221, the second emission layer 222, and the third emission layer 223 may be formed by screen printing, inkjet printing, laser induced thermal imaging (LITI), etc. However, the present disclosure is not limited thereto.

[0104] In one embodiment, a functional layer (not shown) may be disposed below and above the first emission layer 221, the second emission layer 222, and the third emission layer 223. The functional layer may include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and / or an electron injection layer (EIL). The functional layer may be integrally formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, or may be patterned to correspond to the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, respectively.

[0105] The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be disposed on the pixel defining layer 215. For example, the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may cover a portion of the pixel defining layer 215. The first lyophobic pattern LP1 may cover the first inner surface IS1 defining the first opening OP1 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1. The second lyophobic pattern LP2 may cover the second inner surface IS2 defining the second opening OP2 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the second inner surface IS2. The third lyophobic pattern LP3 may cover the third inner surface IS3 defining the third opening OP3 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the third inner surface IS3.

[0106] The first liquid-repellent pattern LP1 may cover the first inner surface IS1 defining the first opening OP1 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1, and the first emission layer 221 may not be formed on the pixel defining layer 215 (e.g., the upper surface of the pixel defining layer 215). The second liquid-repellent pattern LP2 may cover the second inner surface IS2 defining the second opening OP2 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the second inner surface IS2, and the second emission layer 222 may not be formed on the pixel defining layer 215 (e.g., the upper surface of the pixel defining layer 215). The third liquid-repellent pattern LP3 may cover the third inner surface IS3 defining the third opening OP3 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the third inner surface IS3, and the third emission layer 223 may not be formed on the pixel defining layer 215 (e.g., the upper surface of the pixel defining layer 215). This will be described below.

[0107] The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may have lyophobicity (or liquid repellency). The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include a lyophobic material having a surface energy equal to or less than about 20 dyne / cm. For example, each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include a self-assembled monolayer. The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include the same material. The self-assembled monolayer may be an organic assembly formed by adsorbing a molecular structure from a solution or a gas phase, and may include a self-assembled monolayer material (e.g., see Figure 5 of SAM).

[0108] Figure 5 As a schematic diagram of a self-assembled monolayer material. Figure 5As illustrated in FIG. 1 , the self-assembled monolayer material SAM may include a head portion HP, an end portion EP, and a spacer portion SP between the head portion HP and the end portion EP.

[0109] The head portion HP may contact the pixel defining layer 215. The head portion HP may include a substituted or unsubstituted silyl group. In this article, "substituted or unsubstituted" may mean that at least one hydrogen atom of the silyl group is substituted or unsubstituted by at least one substituent such as a deuterium atom, a halogen atom, a cyano group, a nitro group, an amino group, a silyl group, an oxy group, a sulfenyl group, a sulfonyl group, a carbonyl group, a boron group, a phosphine oxide group, a phosphine sulfide group, an alkyl group, an alkenyl group, an alkoxy group, a hydrocarbon ring group, an aryl group, and a heterocyclic group. For example, the alkoxy group may be a methoxy group.

[0110] The end portion EP may be located in the opposite direction to the pixel defining layer 215. For example, the end portion EP may contact a layer located on the pixel defining layer 215. The spacer portion SP may be located between (or between) the head portion HP and the end portion EP. The spacer portion SP and the end portion EP may include a fluorine-based functional group or a hydrocarbon-based functional group and have water resistance. For example, the spacer portion SP may include 4 to 60 CF 2 group, and the end portion EP may include CF 3 The spacer portion SP may have (CF 2 ) 21 For example, each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include a self-assembled monolayer material SAM, the self-assembled monolayer material SAM including the SAM described below. 1 ~S 6 In another embodiment, the spacer portion SP may include oxygen (O). However, the present disclosure is not limited thereto.

[0111]

[0112]

[0113] refer to Figure 3 , the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be spaced apart from each other in the first direction (e.g., the x direction or the -x direction). The first first lyophobic pattern LP11 and the first second lyophobic pattern LP12 included in the first lyophobic pattern LP1 may be spaced apart from each other in the first direction (e.g., the x direction or the -x direction). The second first lyophobic pattern LP21 and the second second lyophobic pattern LP22 included in the second lyophobic pattern LP2 may be spaced apart from each other, and the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 included in the third lyophobic pattern LP3 may be spaced apart from each other.

[0114] refer to Figure 4, the counter electrode 230 may be integrally formed in the first organic light emitting diode OLED1, the second organic light emitting diode OLED2, and the third organic light emitting diode OLED3 to correspond to the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. For example, the counter electrode 230 may overlap all of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 in a plan view. The counter electrode 230 may include a substrate including ITO, In 2 O 3 , IZO, etc., or a combination thereof, and may also include a semi-transparent layer containing a metal such as Al, Ag, etc., or an alloy thereof. For example, the counter electrode 230 may be a semi-transparent layer containing Mg, Ag, etc., or an alloy thereof. The counter electrode 230 may be integrally formed on each of the emission layers, the lyophobic patterns LP1, LP2, and LP3, and the display area (for example, see FIG. 1 ) on the pixel defining layer 215. Figure 1 DA) in an area (e.g., the entire area).

[0115] Figure 6 As an example, follow Figure 3 Schematic cross-sectional view of a cross section of the display device 1 taken along line II-II'. Figure 6 , the upper surface of the pixel defining layer 215 between the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may contact (e.g., directly contact) the counter electrode 230. For example, the first, second, and third lyophobic patterns (also referred to as lyophobic patterns) LP1, LP2, and LP3 may surround the corresponding openings (e.g., see Figure 4 The first opening OP1, the second opening OP2, or the third opening OP3 of the substrate 100 may be formed, the lyophobic patterns LP1, LP2, and LP3 may not have a shape corresponding to the surface (e.g., the entire surface) of the substrate 100, and the lyophobic patterns LP1, LP2, and LP3 may be spaced apart from each other in the first direction (e.g., the x direction or the -x direction). The upper surface of the pixel defining layer 215 between the lyophobic patterns LP1, LP2, and LP3 may contact (e.g., directly contact) the counter electrode 230. The upper surface of the pixel defining layer 215 between the first lyophobic pattern LP1 and the second lyophobic pattern LP2 and the upper surface of the pixel defining layer 215 between the second lyophobic pattern LP2 and the third lyophobic pattern LP3 may contact (e.g., directly contact) the counter electrode 230.

[0116] refer to Figure 6 , including around the opening (see, for example Figure 4The upper surface of the pixel defining layer 215 between the sub-lyophobic patterns (e.g., the first first lyophobic pattern LP11 and the first second lyophobic pattern LP12, the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22, or the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32) in the first, second, or third lyophobic pattern (also referred to as lyophobic pattern) LP1, LP2, or LP3 of the embodiment of the present invention may contact (e.g., directly contact) the counter electrode 230. For example, the lyophobic pattern LP1, LP2, or LP3 may partially surround the opening (e.g., see Figure 4 The sub-lyophobic patterns LP11 and LP12, LP21 and LP22, or LP31 and LP32 included in the lyophobic pattern LP1, LP2, or LP3 may be spaced apart from each other in the first direction (e.g., the x direction or the −x direction). The upper surface of the pixel defining layer 215 between the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, or LP31 and LP32 may contact (e.g., directly contact) the counter electrode 230. The opening corresponding to the pixel defining layer 215 (e.g., the opening corresponding to the pixel defining layer 215) may be spaced apart from each other in the first direction (e.g., the x direction or the −x direction). Figure 4 An upper surface of the pixel defining layer 215 at a periphery of the pixel defining layer 215 (not surrounded by the lyophobic pattern LP1, LP2, or LP3) that is not surrounded by the lyophobic pattern LP1, LP2, or LP3 may contact (e.g., directly contact) the counter electrode 230. An upper surface of the pixel defining layer 215 between the first first lyophobic pattern LP11 and the first second lyophobic pattern LP12, an upper surface of the pixel defining layer 215 between the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22, and an upper surface of the pixel defining layer 215 between the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 may contact (e.g., directly contact) the counter electrode 230.

[0117] In one embodiment, although not illustrated, a first inner surface IS1 of a portion of the pixel defining layer 215 between the first first lyophobic pattern LP11 and the first second lyophobic pattern LP12 may contact (e.g., directly contact) the counter electrode 230. A second inner surface IS2 of a portion of the pixel defining layer 215 between the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22 may contact (e.g., directly contact) the counter electrode 230, and a third inner surface IS3 of a portion of the pixel defining layer 215 between the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 may contact (e.g., directly contact) the counter electrode 230.

[0118] Figure 4 The lyophobic pattern LP1, LP2, or LP3 surrounding the opening OP1, OP2, or OP3 is shown to contact the pixel electrode 211, 212, or 213 exposed by the opening OP1, OP2, or OP3. Figure 4The first lyophobic pattern LP1 is shown to contact the first pixel electrode 211, the second lyophobic pattern LP2 is shown to contact the second pixel electrode 212, and the third lyophobic pattern LP3 is shown to contact the third pixel electrode 213. However, the present disclosure is not limited thereto. In another embodiment, the lyophobic pattern LP1, LP2, or LP3 surrounding the opening OP1, OP2, or OP3 may be spaced apart from the pixel electrode 211, 212, or 213 exposed by the opening OP1, OP2, or OP3.

[0119] Figure 7 As an example, according to an embodiment Figure 3 A schematic cross-sectional view of a cross section of a display device taken along line II'. Figure 7 , the lyophobic pattern LP1, LP2, or LP3 surrounding the opening OP1, OP2, or OP3 may not contact the pixel electrode 211, 212, or 213 exposed by the opening OP1, OP2, or OP3. The lyophobic pattern LP1, LP2, or LP3 may not cover a portion of the inner surface IS1, IS2, or IS3 disposed adjacent to the pixel electrode 211, 212, or 213. For example, each of the lyophobic patterns LP1, LP2, and LP3 may cover only a portion of the inner surface IS1, IS2, or IS3 disposed adjacent to the upper surface of the pixel defining layer 215. Therefore, the lyophobic pattern LP1, LP2, or LP3 surrounding the opening OP1, OP2, or OP3 may be spaced apart from the pixel electrode 211, 212, or 213 exposed by the opening OP1, OP2, or OP3.

[0120] The first lyophobic pattern LP1 may cover a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1 and a portion of the first inner surface IS1 disposed adjacent to the upper surface of the pixel defining layer 215. The second lyophobic pattern LP2 may cover a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the second inner surface IS2 and a portion of the second inner surface IS2 disposed adjacent to the upper surface of the pixel defining layer 215. The third lyophobic pattern LP3 may cover a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the third inner surface IS3 and a portion of the third inner surface IS3 disposed adjacent to the upper surface of the pixel defining layer 215.

[0121] For example, the first lyophobic pattern LP1 may be spaced apart from the first pixel electrode 211, the second lyophobic pattern LP2 may be spaced apart from the second pixel electrode 212, and the third lyophobic pattern LP3 may be spaced apart from the third pixel electrode 213, and each of the emission layers may cover a portion of the inner surface IS1, IS2, or IS3 disposed adjacent to the pixel electrode 211, 212, or 213. The first emission layer 221 may cover a portion of the first inner surface IS1 disposed adjacent to the first pixel electrode 211. The second emission layer 222 may cover a portion of the second inner surface IS2 disposed adjacent to the second pixel electrode 212, and the third emission layer 223 may cover a portion of the third inner surface IS3 disposed adjacent to the third pixel electrode 213.

[0122] Figure 3 For example, in a plan view, one of the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, and LP31 and LP32 included in each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 surrounds the left side of the openings OP1, OP2, and OP3, and another of the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, and LP31 and LP32 of the lyophobic patterns LP1, LP2, and LP3 surrounds the right side of the openings OP1, OP2, and OP3. However, the present disclosure is not limited thereto. In another embodiment, in a plan view, one of the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, and LP31 and LP32 included in the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may surround the lower side of the openings OP1, OP2, and OP3, and another one of the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, and LP31 and LP32 of the lyophobic patterns LP1, LP2, and LP3 may surround the upper side of the openings OP1, OP2, and OP3.

[0123] Figure 8 FIG. 1 is a schematic plan view illustrating a display device 1 according to an embodiment. Figure 8 , in a plan view, the first first lyophobic pattern LP11 may surround the lower side of the first opening OP1, and the first second lyophobic pattern LP12 may surround the upper side of the first opening OP1. In a plan view, the second first lyophobic pattern LP21 may surround the lower side of the second opening OP2, and the second second lyophobic pattern LP22 may surround the upper side of the second opening OP2. In a plan view, the third first lyophobic pattern LP31 may surround the lower side of the third opening OP3, and the third second lyophobic pattern LP32 may surround the upper side of the third opening OP3.

[0124] Figure 3 and Figure 8The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 are illustrated to include two sub-lyophobic patterns LP11 and LP12, LP21 and LP22, and LP31 and LP32, respectively. However, the present disclosure is not limited thereto. In another embodiment, each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include at least two sub-lyophobic patterns.

[0125] Figures 9 to 11 FIG. 1 is a schematic plan view illustrating a display device 1 according to an embodiment. Fig. 9 , each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include four sub-lyophobic patterns. Fig.10 , each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may include eight sub-lyophobic patterns. However, the number of sub-lyophobic patterns included in each of the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be modified in various ways according to the design of the display device 1. In one embodiment, referring to Fig.11 , each of the first lyophobic pattern LP1 , the second lyophobic pattern LP2 , and the third lyophobic pattern LP3 may include a plurality of sub-lyophobic patterns.

[0126] Because organic light-emitting diodes (e.g., Figure 2 OLED) may be damaged by moisture or oxygen from the outside, and an encapsulation layer (not shown) may cover and protect the organic light emitting diode (e.g., see Figure 2 The encapsulation layer may include a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer, and may cover the display area (eg, see Figure 1 DA) and extends to the display area (see, for example, Figure 1 of DA).

[0127] Although the display device 1 has been described above, the present disclosure is not limited thereto. A method of manufacturing the display device 1 will also fall within the scope of the present disclosure. Hereinafter, the method of manufacturing the display device 1 will be described.

[0128] Figures 12 to 19 As an example manufacturing Figure 4 Schematic cross-sectional view of a process for manufacturing the display device 1 . Figures 12 to 19 For example, a display device (see Figure 4 1) is a schematic cross-sectional view of a process of forming pixel electrodes 211, 212 and 213, a pixel defining layer 215, liquid-repellent patterns LP1, LP2 and LP3, an emission layer and a counter electrode 230.

[0129] refer to Fig.12, a first pixel electrode 211, a second pixel electrode 212, and a third pixel electrode 213 may be formed on the substrate 100. The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be spaced apart from each other in a first direction (eg, x direction or -x direction).

[0130] The pixel circuit PC may be formed on the substrate 100. Before forming the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 on the substrate 100, the buffer layer 201 may be formed on the substrate 100, the semiconductor layer Act may be formed on the buffer layer 201, the gate insulating layer 203 may be formed on the semiconductor layer Act, and the gate electrode GE may be formed on the gate insulating layer 203. The gate electrode GE may be a first capacitor electrode CE1 of the storage capacitor Cst. The first interlayer insulating layer 205 may be formed on the gate electrode GE, and the second capacitor electrode CE2 may be formed on the first interlayer insulating layer 205. The second interlayer insulating layer 207 may be formed on the second capacitor electrode CE2. The source electrode SE and the drain electrode DE may be formed on the second interlayer insulating layer 207, and the planarization layer 208 may be formed on the source electrode SE and the drain electrode DE. The pixel circuit PC may be formed by an optical process or the like, and a detailed description thereof will be omitted.

[0131] The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be formed on the planarization layer 208. After a contact hole is formed in the planarization layer 208 so that each of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may contact one of the source electrode SE and the drain electrode DE, a preliminary pixel electrode layer (not illustrated) corresponding to the surface (e.g., the entire surface) of the substrate 100 may be formed on the planarization layer 208. The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be formed by patterning the preliminary pixel electrode layer. For example, that is, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be formed on the substrate 100.

[0132] The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may include a material such as ITO, In 2 O 3 , IZO, etc., or a combination thereof, and a reflective layer including a metal such as Al, Ag, etc., or an alloy thereof. For example, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may have a three-layer structure of ITO / Ag / ITO.

[0133] refer to Fig.13, the pixel defining layer 215 may be formed on the first pixel electrode 211, the second pixel electrode 212, the third pixel electrode 213, and the planarization layer 208. The pixel defining layer 215 may include a first inner surface IS1, a second inner surface IS2, and a third inner surface IS3. The first inner surface IS1 may define a first opening OP1, the second inner surface IS2 may define a second opening OP2, and the third inner surface IS3 may define a third opening OP3. The first opening OP1 may expose a portion (e.g., a central portion) of the first pixel electrode 211, the second opening OP2 may expose a portion (e.g., a central portion) of the second pixel electrode 212, and the third opening OP3 may expose a portion (e.g., a central portion) of the third pixel electrode 213. For example, the pixel defining layer 215 formed on the substrate 100 may include a first inner surface IS1 defining a first opening OP1 exposing a portion of the first pixel electrode 211, a second inner surface IS2 defining a second opening OP2 exposing a portion of the second pixel electrode 212, and a third inner surface IS3 defining a third opening OP3 exposing a portion of the third pixel electrode 213.

[0134] A preliminary pixel defining layer (not illustrated) may be formed to cover the first pixel electrode 211, the second pixel electrode 212, the third pixel electrode 213, and the planarization layer 208. The pixel defining layer 215 may be formed by patterning the preliminary pixel defining layer. For example, the pixel defining layer 215 may be formed by removing a portion of the preliminary pixel defining layer. For example, the pixel defining layer 215 may be formed on the substrate 100. The preliminary pixel defining layer and the pixel defining layer 215 may include, for example, an organic material such as polyimide, hexamethyldisiloxane (HMDSO), etc., or a combination thereof.

[0135] refer to Fig.14 , a preliminary lyophobic pattern layer PLP may be formed on the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. The preliminary lyophobic pattern layer PLP may include a self-assembled monolayer. The preliminary lyophobic pattern layer PLP may include a self-assembled monolayer containing a self-assembled monolayer material SAM. For example, a preliminary lyophobic pattern layer PLP including a lyophobic material may be formed to cover the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. The self-assembled monolayer and the self-assembled monolayer material (e.g., see Figure 5 SAM) and Fig.14 The descriptions of the self-assembled monolayer of the preliminary lyophobic pattern layer PLP and the self-assembled monolayer material SAM may be the same, and redundant descriptions thereof will be omitted for the sake of brevity.

[0136] The preliminary liquid-repellent pattern layer PLP may be formed by depositing a self-assembled monolayer material SAM on the substrate 100 by thermal evaporation, CVD, or electron beam evaporation. For example, in a thermal evaporation process, the formation of the preliminary liquid-repellent pattern layer PLP may be performed in a vacuum chamber. The self-assembled monolayer material SAM may be placed on a material providing portion, and the material providing portion may be heated. Therefore, the self-assembled monolayer material SAM may be heated and evaporated, and the self-assembled monolayer material SAM may be deposited on the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.

[0137] In another embodiment, in the CVD process, the self-assembled monolayer material SAM may undergo thermal decomposition, photodecomposition, or redox reaction, and the self-assembled monolayer material SAM may be deposited on the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. In another embodiment, in the electron beam deposition process, the self-assembled monolayer material SAM may be heated and evaporated by an electron beam, and the self-assembled monolayer material SAM may be deposited on the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. The preliminary lyophobic pattern layer PLP may be formed of the self-assembled monolayer material SAM deposited on the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.

[0138] refer to Fig.15 , the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be formed by removing a portion of the preliminary lyophobic pattern layer PLP. This portion of the preliminary lyophobic pattern layer PLP may be removed by UV treatment or the like. For example, in the UV treatment process, a portion of the preliminary lyophobic pattern layer PLP may be decomposed and removed by irradiating a portion of the preliminary lyophobic pattern layer PLP with UV in a wavelength band equal to or less than about 200 nm under vacuum conditions. In another embodiment, the preliminary lyophobic pattern layer PLP may be formed by removing a portion of the preliminary lyophobic pattern layer PLP in a nitrogen (N 2) atmosphere with UV in a wavelength band equal to or less than about 200 nm to decompose and remove a portion of the preliminary liquid-repellent pattern layer PLP. Another portion of the preliminary liquid-repellent pattern layer PLP that is not UV-treated may remain on the substrate 100. For example, the first liquid-repellent pattern LP1, the second liquid-repellent pattern LP2, and the third liquid-repellent pattern LP3 may be another portion of the preliminary liquid-repellent pattern layer PLP that is not UV-treated. The UV treatment for removing a portion of the preliminary liquid-repellent pattern layer PLP may be performed by using a mask. For example, a mask including an open area and a shielding area may be placed on the substrate 100, and UV may be irradiated to the substrate 100. A portion of the preliminary liquid-repellent pattern layer PLP corresponding to the open area of ​​the mask may be removed by UV treatment, and a portion of the preliminary liquid-repellent pattern layer PLP corresponding to the shielding area of ​​the mask may be retained by not performing UV treatment.

[0139] The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may cover a portion of the pixel defining layer 215. The first lyophobic pattern LP1 may cover the first inner surface IS1 defining the first opening OP1 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1. The second lyophobic pattern LP2 may cover the second inner surface IS2 defining the second opening OP2 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the second inner surface IS2. The third lyophobic pattern LP3 may cover the third inner surface IS3 defining the third opening OP3 and a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the third inner surface IS3.

[0140] The first lyophobic pattern LP1 may include a first first lyophobic pattern LP11 and a first second lyophobic pattern LP12, the second lyophobic pattern LP2 may include a second first lyophobic pattern LP21 and a second second lyophobic pattern LP22, and the third lyophobic pattern LP3 may include a third first lyophobic pattern LP31 and a third second lyophobic pattern LP32. Figure 3 , in a plan view, each of the first first lyophobic pattern LP11 and the first second lyophobic pattern LP12 may surround a portion of the first opening OP1, each of the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22 may surround a portion of the second opening OP2, and each of the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 may surround a portion of the third opening OP3. For example, in a plan view, the first lyophobic pattern LP1 may partially surround the first opening OP1, the second lyophobic pattern LP2 may partially surround the second opening OP2, and the third lyophobic pattern LP3 may partially surround the third opening OP3.

[0141] refer to Fig.16, the first emission layer 221 may be formed in the first opening OP1. The first emission layer forming material may be sprayed to the first opening OP1 by inkjet printing or the like. The first emission layer forming material may be a solution produced by mixing an organic material constituting the first emission layer 221 with a solvent. The first emission layer 221 may be formed in the first opening OP1 by drying the first emission layer forming material sprayed to the first opening OP1 to remove the solvent.

[0142] By considering the thickness of the first emission layer 221 finally formed in the process of forming the first emission layer 221, a larger amount of the first emission layer forming material than the amount that can fill the first opening OP1 may be sprayed to the first opening OP1. For example, the highest point of the first emission layer forming material sprayed to the first opening OP1 may be higher than the upper surface of the pixel defining layer 215. For example, in the case where the height of the first opening OP1 in the thickness direction (e.g., the z direction or the -z direction) (e.g., the thickness of the pixel defining layer 215) is about 1.2 μm, the height of the droplet of the sprayed first emission layer forming material may be about 6 μm.

[0143] Generally, in the case where the pixel defining layer 215 has lyophilicity, a portion of the droplets of the emission layer forming material may be widely dispersed on the upper surface of the pixel defining layer 215. For example, the emission layer forming material may overflow from the opening OP1, OP2, or OP3. In the process of drying the emission layer forming material sprayed to the opening OP1, OP2, or OP3, a portion of the droplets of the emission layer forming material may remain on the upper surface of the pixel defining layer 215. Therefore, the thickness of the formed emission layer may be uneven.

[0144] However, according to one embodiment, the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1 defining the first opening OP1 may be covered by the first lyophobic pattern LP1, and the first lyophobic pattern LP1 may have lyophobicity. A portion of the droplets of the sprayed first emission layer forming material located on the first lyophobic pattern LP1 may not be widely dispersed on the upper surface of the pixel defining layer 215. For example, the first emission layer forming material may not overflow from the first opening OP1, or the amount of overflow from the first opening OP1 may be minimized. In the process of drying the first emission layer forming material sprayed to the first opening OP1, the point at which the first lyophobic pattern LP1 having lyophobicity and the first pixel electrode 211 having lyophilicity contact each other may be a pinning point. Therefore, in the process of drying the first emission layer forming material sprayed to the first opening OP1, the droplets of the first emission layer forming material may not remain on the upper surface of the pixel defining layer 215. The thickness of the formed first emission layer 221 may be uniform.

[0145] The first emission layer forming material and the first emission layer 221 may include a high molecular weight or low molecular weight organic material capable of emitting red light. For example, the first emission layer forming material and the first emission layer 221 may include a polymer material such as polyphenylene vinylene (PPV), polyfluorene, etc., or a combination thereof.

[0146] refer to Fig.17 , the second emission layer 222 may be formed in the second opening OP2. The second emission layer forming material may be sprayed to the second opening OP2 by inkjet printing or the like. The second emission layer forming material may be a solution produced by mixing an organic material constituting the second emission layer 222 with a solvent. The second emission layer 222 may be formed in the second opening OP2 by drying the second emission layer forming material sprayed to the second opening OP2 to remove the solvent.

[0147] By considering the thickness of the second emission layer 222 finally formed in the process of forming the second emission layer 222, a larger amount of second emission layer forming material than the amount that can fill the second opening OP2 may be sprayed to the second opening OP2. For example, the highest point of the second emission layer forming material sprayed to the second opening OP2 may be higher than the upper surface of the pixel defining layer 215. For example, when the height of the second opening OP2 in the thickness direction (e.g., the z direction or the -z direction) (e.g., the thickness of the pixel defining layer 215) is about 1.2 μm, the height of the droplet of the sprayed second emission layer forming material may be about 6 μm.

[0148] Because the effect that occurs when the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1 defining the first opening OP1 is covered by the first liquid-repellent pattern LP1 also occurs when the upper surface of the pixel defining layer 215 disposed adjacent to the second inner surface IS2 defining the second opening OP2 is covered by the second liquid-repellent pattern LP2, its redundant description will be omitted. The second emission layer forming material may not overflow from the second opening OP2, or the amount overflowing from the second opening OP2 may be minimized. In the process of drying the second emission layer forming material sprayed to the second opening OP2, the point at which the second liquid-repellent pattern LP2 having liquid repellency and the second pixel electrode 212 having lyophilicity contact each other may be a pinning point. Therefore, in the process of drying the second emission layer forming material sprayed to the second opening OP2, droplets of the second emission layer forming material may not remain on the upper surface of the pixel defining layer 215. The thickness of the formed second emission layer 222 may be uniform.

[0149] The second emission layer forming material and the second emission layer 222 may include a high molecular weight or low molecular weight organic material capable of emitting green light. For example, the second emission layer forming material and the second emission layer 222 may include a polymer material such as polystyrene (PPV), polyfluorene, etc., or a combination thereof.

[0150] refer to Fig.18 , the third emission layer 223 may be formed in the third opening OP3. The third emission layer forming material may be sprayed to the third opening OP3 by inkjet printing or the like. The third emission layer forming material may be a solution produced by mixing an organic material constituting the third emission layer 223 with a solvent. The third emission layer 223 may be formed in the third opening OP3 by drying the third emission layer forming material sprayed to the third opening OP3 to remove the solvent.

[0151] By considering the thickness of the third emission layer 223 finally formed in the process of forming the third emission layer 223, a larger amount of the third emission layer forming material than the amount that can fill the third opening OP3 may be sprayed to the third opening OP3. For example, the highest point of the third emission layer forming material sprayed to the third opening OP3 may be higher than the upper surface of the pixel defining layer 215. For example, in the case where the height of the third opening OP3 in the thickness direction (e.g., the z direction or the -z direction) (e.g., the thickness of the pixel defining layer 215) is about 1.2 μm, the height of the droplet of the sprayed third emission layer forming material may be about 6 μm.

[0152] Because the effect that occurs when the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1 defining the first opening OP1 is covered by the first liquid-repellent pattern LP1 also occurs when the upper surface disposed adjacent to the third inner surface IS3 defining the third opening OP3 of the pixel defining layer 215 is covered by the third liquid-repellent pattern LP3, its redundant description will be omitted for simplicity. The third emission layer forming material may not overflow from the third opening OP3, or the amount overflowing from the third opening OP3 may be minimized. In the process of drying the third emission layer forming material sprayed to the third opening OP3, the point at which the third liquid-repellent pattern LP3 having liquid repellency and the third pixel electrode 213 having lyophilicity contact each other may be a pinning point. Therefore, in the process of drying the third emission layer forming material sprayed to the third opening OP3, droplets of the third emission layer forming material may not remain on the upper surface of the pixel defining layer 215. The thickness of the formed third emission layer 223 may be uniform.

[0153] The third emission layer forming material and the third emission layer 223 may include a high molecular weight or low molecular weight organic material capable of emitting green light. For example, the third emission layer forming material and the third emission layer 223 may include a polymer material such as polystyrene (PPV), polyfluorene, etc., or a combination thereof.

[0154] refer to Fig.19, the counter electrode 230 may be formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. The counter electrode 230 may be integrally formed corresponding to the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Therefore, the counter electrode 230 may overlap all of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 in a plan view. The counter electrode 230 may include a material including ITO, In 2 O 3 The counter electrode 230 may be a transparent conductive layer of Mg or Ag or a combination thereof, and may also include a semi-transparent layer including a metal such as Al, Ag or an alloy thereof. For example, the counter electrode 230 may be a semi-transparent layer including Mg or Ag or an alloy thereof.

[0155] Generally, it may not be easy to form a layer including an organic material or a metal material on a layer including a material having a low surface energy. Even in the case where a layer including an organic material or a metal material is formed on a layer including a material having a low surface energy, the adhesion between the layers may be low. Because the lyophobic pattern LP1, LP2, or LP3 includes a lyophobic material having lyophobicity and low surface energy, the adhesion between the lyophobic pattern LP1, LP2, or LP3 and the counter electrode 230 may be low. In the case where the entire upper surface of the pixel defining layer 215 is covered by the lyophobic pattern, the adhesion between the pixel defining layer 215 and the counter electrode 230 may be low.

[0156] However, in an embodiment of the method for manufacturing a display device, the lyophobic patterns LP1, LP2, and LP3 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). The first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). Therefore, the upper surface of the pixel defining layer 215 between the lyophobic patterns LP1, LP2, and LP3 may contact (e.g., directly contact) the counter electrode 230. The upper surface of the pixel defining layer 215 between the first lyophobic pattern LP1 and the second lyophobic pattern LP2 and the upper surface of the pixel defining layer 215 between the second lyophobic pattern LP2 and the third lyophobic pattern LP3 may contact (e.g., directly contact) the counter electrode 230. Therefore, the adhesion between the pixel defining layer 215 and the counter electrode 230 may be improved.

[0157] In an embodiment of a method for manufacturing a display device, sub-lyophobic patterns LP11 and LP12, LP21 and LP22, or LP31 and LP32 respectively included in the lyophobic pattern LP1, LP2, or LP3 surrounding the opening OP1, OP2, or OP3 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). The first lyophobic pattern LP1 surrounding the first opening OP1 may include a first first lyophobic pattern LP11 and a first second lyophobic pattern LP12 as sub-lyophobic patterns LP11 and LP12, and the first first lyophobic pattern LP11 and the first second lyophobic pattern LP12 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). Therefore, the upper surface of the pixel defining layer 215 between the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, or LP31 and LP32 may contact (e.g., directly contact) the counter electrode 230. Reference Figure 6 In the display device 1 manufactured by the manufacturing method, the upper surface of the pixel defining layer 215 between the first first lyophobic pattern LP11 and the first second lyophobic pattern LP12, the upper surface of the pixel defining layer 215 between the second first lyophobic pattern LP21 and the second second lyophobic pattern LP22, and the upper surface of the pixel defining layer 215 between the third first lyophobic pattern LP31 and the third second lyophobic pattern LP32 may contact (e.g., directly contact) the counter electrode 230. The adhesive force between the portion of the pixel defining layer 215 disposed adjacent to the opening OP1, OP2, or OP3 and the counter electrode 230 may be significantly improved. Therefore, the possibility of occurrence of defects in the manufacturing process may be reduced.

[0158] Fig. 20 Schematic cross-sectional views illustrating a method of manufacturing a display device (or a method of manufacturing a display device) according to an embodiment. Fig. 20 For example, the formation Figure 7 Schematic cross-sectional view of the process of forming the liquid-repellent patterns LP1, LP2 and LP3 of the display device 1. Fig. 20 The display device manufacturing method of the embodiment may correspond to Figures 12 to 19 A partially modified embodiment of a method for manufacturing a display device will be described with Figures 12 to 19 The difference between the display device manufacturing method. Fig. 20 In, with Figures 12 to 19 The same reference numerals will denote the same components throughout, and redundant descriptions thereof will be omitted for the sake of brevity.

[0159] In a method for manufacturing a display device according to an embodiment, a first pixel electrode 211, a second pixel electrode 212, and a third pixel electrode 213 may be formed on a substrate 100, a pixel defining layer 215 may be formed on the first pixel electrode 211, the second pixel electrode 212, the third pixel electrode 213, and a planarization layer 208, and a preliminary lyophobic pattern layer PLP may be formed on the pixel defining layer 215, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. In a method for manufacturing a display device according to an embodiment, a first emission layer 221 may be formed in the first opening OP1, a second emission layer 222 may be formed in the second opening OP2, a third emission layer 223 may be formed in the third opening OP3, and a counter electrode 230 may be formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Figure 12 to Figure 14 Process and method for manufacturing a display device Figures 16 to 19 The process in the method for manufacturing a display device can be Fig. 20 The processes in the display device manufacturing method are the same, and their redundant description will be omitted.

[0160] However, in one embodiment of the display device manufacturing method, referring to Fig. 20 In the case where the first lyophobic pattern LP1, the second lyophobic pattern LP2, and the third lyophobic pattern LP3 are formed by removing a portion of the preliminary lyophobic pattern layer PLP, a portion of the preliminary lyophobic pattern layer PLP may be removed so that each lyophobic pattern does not cover a portion of the inner surface IS1, IS2, or IS3 disposed adjacent to the pixel electrode. For example, each of the lyophobic patterns LP1, LP2, and LP3 may cover only a portion of the inner surface IS1, IS2, or IS3 disposed adjacent to the upper surface of the pixel defining layer 215.

[0161] The first lyophobic pattern LP1 may cover a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the first inner surface IS1 and a portion of the first inner surface IS1 disposed adjacent to the upper surface of the pixel defining layer 215. The second lyophobic pattern LP2 may cover a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the second inner surface IS2 and a portion of the second inner surface IS2 disposed adjacent to the upper surface of the pixel defining layer 215. The third lyophobic pattern LP3 may cover a portion of the upper surface of the pixel defining layer 215 disposed adjacent to the third inner surface IS3 and a portion of the third inner surface IS3 disposed adjacent to the upper surface of the pixel defining layer 215. For example, the first lyophobic pattern LP1 may be formed to be spaced apart from the first pixel electrode 211, the second lyophobic pattern LP2 may be formed to be spaced apart from the second pixel electrode 212, and the third lyophobic pattern LP3 may be formed to be spaced apart from the third pixel electrode 213.

[0162] In the process of drying the first emission layer forming material sprayed to the first opening OP1, the point where the first lyophobic pattern LP1 having liquid repellency and the pixel defining layer 215 having lyophilicity contact each other may be a pinning point. In the process of drying the second emission layer forming material sprayed to the second opening OP2, the point where the second lyophobic pattern LP2 having liquid repellency and the pixel defining layer 215 having lyophilicity contact each other may be a pinning point. In the process of drying the third emission layer forming material sprayed to the third opening OP3, the point where the third lyophobic pattern LP3 having liquid repellency and the pixel defining layer 215 having lyophilicity contact each other may be a pinning point.

[0163] Therefore, in a method for manufacturing a display device according to an embodiment, the first emission layer forming material may not overflow from the first opening OP1 or the amount of overflow from the first opening OP1 may be minimized. The second emission layer forming material may not overflow from the second opening OP2 or the amount of overflow from the second opening OP2 may be minimized, and the third emission layer forming material may not overflow from the third opening OP3 or the amount of overflow from the third opening OP3 may be minimized. Droplets of the first emission layer forming material, the second emission layer forming material, and the third emission layer forming material may not remain on the upper surface of the pixel defining layer 215. The thickness of the formed first emission layer 221, the thickness of the second emission layer 222, and the thickness of the third emission layer 223 may be uniform.

[0164] In one embodiment of the method for manufacturing a display device, the lyophobic patterns LP1, LP2, and LP3 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). Therefore, the upper surface of the pixel defining layer 215 between the lyophobic patterns LP1, LP2, and LP3 may contact (e.g., directly contact) the counter electrode 230. The adhesion between the pixel defining layer 215 and the counter electrode 230 may be improved. In an embodiment of the method for manufacturing a display device according to an embodiment, the sub-lyophobic patterns LP11 and LP12, LP21 and LP22, or LP31 and LP32 included in the lyophobic patterns LP1, LP2, or LP3 surrounding the openings OP1, OP2, or OP3 may be spaced apart from each other in a first direction (e.g., an x ​​direction or a -x direction). The adhesion between the portion of the pixel defining layer 215 disposed adjacent to the openings OP1, OP2, or OP3 and the counter electrode 230 may be significantly improved. Therefore, the possibility of defects occurring in the manufacturing process may be reduced.

[0165] According to the embodiment of the display device manufacturing method of the present disclosure described above, a display device 1 and a manufacturing method thereof can be provided, in which the possibility of defects occurring in the manufacturing process of the display device is reduced. However, the scope of the present disclosure is not limited to these effects.

[0166] The above description is an example of the technical features of the present disclosure, and those skilled in the art to which the present disclosure belongs will be able to make various modifications and changes.Therefore, the embodiments of the present disclosure described above may be implemented individually or in combination with each other.

[0167] Therefore, the embodiments disclosed in the present disclosure are not intended to limit the technical spirit of the present disclosure, but to describe the technical spirit of the present disclosure, and the scope of the technical spirit of the present disclosure is not limited by these embodiments. The protection scope of the present disclosure should be interpreted by the claims, and should be interpreted as all technical spirits within the equivalent scope are included in the scope of the present disclosure.

Claims

1. A display device, characterized in that: The display device comprises: A first pixel electrode and a second pixel electrode are spaced apart from each other and disposed on a substrate; A pixel defining layer is formed on the substrate and includes: a first inner surface defining a first opening exposing a portion of the first pixel electrode; and a second inner surface defining a second opening exposing a portion of the second pixel electrode; a first liquid-repellent pattern covering the first inner surface and a portion of the upper surface of the pixel defining layer adjacent to the first inner surface; and a counter electrode, disposed on the first pixel electrode and the second pixel electrode, The first liquid-repellent pattern partially surrounds the first opening in a plan view.

2. The display device according to claim 1, characterized in that The first lyophobic pattern includes a first first lyophobic pattern and a first second lyophobic pattern spaced apart from each other.

3. The display device according to claim 2, characterized in that Each of the first first lyophobic pattern and the first second lyophobic pattern surrounds a portion of the first opening in the plan view.

4. The display device according to claim 2, characterized in that A portion of the upper surface of the pixel defining layer between the first first lyophobic pattern and the first second lyophobic pattern directly contacts the counter electrode.

5. The display device according to claim 1, characterized in that The display device further comprises: The second liquid-repellent pattern covers the second inner surface and a portion of the upper surface of the pixel defining layer adjacent to the second inner surface.

6. The display device according to claim 5, characterized in that A portion of the upper surface of the pixel defining layer between the first lyophobic pattern and the second lyophobic pattern directly contacts the counter electrode.

7. The display device according to claim 5, characterized in that The second lyophobic pattern includes a second first lyophobic pattern and a second second lyophobic pattern spaced apart from each other, and A portion of the upper surface of the pixel defining layer between the second first lyophobic pattern and the second second lyophobic pattern directly contacts the counter electrode.

8. The display device according to claim 1, characterized in that The display device further comprises: a first emission layer, disposed between the first pixel electrode and the counter electrode; and The second emission layer is located between the second pixel electrode and the counter electrode.

9. The display device according to claim 5, characterized in that Each of the first lyophobic pattern and the second lyophobic pattern is composed of a lyophobic material, and the lyophobic material includes a self-assembled monolayer.

10. The display device according to claim 1, characterized in that The first lyophobic pattern is spaced apart from the first pixel electrode.

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