Atmosphere maintaining device of vacuum crystal growing furnace

Abstract

The utility model discloses an atmosphere maintaining device for a vacuum crystal growing furnace, which relates to the technical field of crystal growing furnaces, and comprises a crystal growing furnace body, a reaction cavity is arranged in the crystal growing furnace body, and the outer side wall of the crystal growing furnace body is fixedly connected with a mounting frame. A gas control unit is arranged at the upper end of the mounting frame, a gas extraction unit is arranged at the upper end of the crystal growth furnace body, the gas control unit comprises two gas storage tanks fixedly connected to the upper end of the mounting frame, and first gas extraction pumps are fixedly connected to the upper ends of the two gas storage tanks; the output ends of the two first sucking pumps are fixedly connected with conveying pipes correspondingly, and adjusting sleeves are installed on the outer side walls of the two conveying pipes correspondingly. The air exhaust unit is arranged, so that the air pressure in the reaction cavity can be adjusted, and the air pressure in the reaction cavity is kept stable; and by arranging the gas control unit, different gases can be injected into the reaction cavity, so that the atmosphere in the reaction cavity is kept stable.

Description

TECHNICAL FIELD

[0001] The utility model relates to a crystal growth furnace technical field especially relates to a vacuum crystal growth furnace atmosphere maintaining device. BACKGROUND

[0002] Crystal growth furnace is a kind of process test instrument for electronic and communication technical field, the highest temperature 3000 degrees, maximum power 12000 watts, maximum can grow single crystal length 190mm, diameter 2-25mm, growth rate 0.02-20mm / hr, rotation rate 5-60rpm, suitable for preparing oxide, photonic crystal metal, alloy, compound and various single crystal samples, can adjust atmosphere in the growth process.

[0003] Crystal in the process of growth, atmosphere condition (such as gas type, pressure) have significant influence on crystal quality, traditional crystal growth furnace is difficult to realize the accurate control of atmosphere, lead to impurity into crystal structure, affect its performance, in addition, the crystal growth furnace currently used adopts the method of manually adjusting atmosphere, this not only increases the operation complexity, and it is difficult to achieve fast response and high-precision control requirements. UTILITARIAN CONTENT

[0004] In view of the deficiencies of prior art, the utility model provides a kind of vacuum crystal growth furnace atmosphere maintaining device, solve the above-mentioned problems.

[0005] The utility model also provides with the above-mentioned one kind of vacuum crystal growth furnace atmosphere maintaining device, including: crystal growth furnace body, the inside of the crystal growth furnace body is provided with reaction cavity, the outer side wall of the crystal growth furnace body is fixedly connected with mounting bracket, the upper end of the mounting bracket is provided with gas control unit, the upper end of the crystal growth furnace body is provided with suction unit;

[0006] The gas control unit includes two gas storage tanks fixedly connected to the upper end of mounting bracket, the upper end of two gas storage tanks is fixedly connected with suction pump one, the output end of two suction pump one is fixedly connected with conveying pipe, the outer side wall of two conveying pipes is equipped with adjusting sleeve, the one side of two adjusting sleeves is rotatably connected with rotating rod, the one end of two rotating rods is fixedly connected with adjusting valve plate, the end, away from adjusting valve plate of two rotating rods is fixedly connected with adjusting knob.

[0007] According to the vacuum crystal growth furnace atmosphere maintaining device, the suction unit includes the filter shell fixedly connected to the upper end of the crystal growth furnace body, the inner bottom wall of the filter shell is equipped with suction pump two, the inner wall of the filter shell is equipped with filter screen plate and activated carbon plate, the upper end of the filter shell is provided with exhaust pipe.

[0008] According to the vacuum crystal growth furnace atmosphere maintaining device, the suction end of the second air pump penetrates the crystal growth furnace body and is connected with the reaction cavity.

[0009] According to the vacuum crystal growth furnace atmosphere maintaining device, the adjusting valve plate is adapted to the inner wall of the delivery pipe, and the outer side wall of the adjusting valve plate is provided with a sealing ring.

[0010] According to the vacuum crystal growth furnace atmosphere maintaining device, the two delivery pipes are connected with the reaction cavity and penetrate the crystal growth furnace body away from the one end of the first air pump.

[0011] According to the vacuum crystal growth furnace atmosphere maintaining device, the outer side wall of the crystal growth furnace body is provided with a controller, and the controller is electrically connected with the first air pump and the second air pump.

[0012] According to the vacuum crystal growth furnace atmosphere maintaining device, the bottom end of the crystal growth furnace body is fixedly connected with four symmetrically arranged supporting columns, and the lower end of the four supporting columns is fixedly connected with a bottom plate.

[0013] The utility model has the advantages of the following beneficial effects:

[0014] 1、The utility model discloses a vacuum crystal growth furnace atmosphere maintaining device, which comprises a crystal growth furnace body, a reaction cavity, a first air pump, a second air pump, a delivery pipe, a gas control unit and an adjusting valve plate.

[0015] Additional aspects and advantages of the utility model will be partially given in the following description, partially become obvious from the following description, or be understood through the practice of the utility model. BRIEF DESCRIPTION OF DRAWINGS

[0016] The utility model will be further explained in connection with the drawings and examples;

[0017] Figure 1 It is the front perspective view of the utility model vacuum crystal growth furnace atmosphere maintaining device's stereogram;

[0018] Figure 2 It is the front view structure diagram of the utility model vacuum crystal growth furnace atmosphere maintaining device;

[0019] Figure 3 It is Figure 2 The structure enlarged view of A in the middle;

[0020] Figure 4 It is Figure 2 The structure enlarged view of B in the middle.

[0021] LEGEND:

[0022] 1, crystal growth furnace body; 2, reaction cavity; 3, mounting frame; 4, gas control unit; 5, exhaust unit; 401, gas storage tank; 402, exhaust pump one; 403, delivery pipe; 404, adjusting sleeve; 405, rotating rod; 406, adjusting valve plate; 407, adjusting knob; 501, filter shell; 502, exhaust pump two; 503, filter screen; 504, activated carbon plate; 505, exhaust pipe; 101, controller; 6, support column; 7, bottom plate. DETAILED DESCRIPTION

[0023] This part will describe the specific embodiments of the utility model in detail, the preferred embodiment of the utility model is shown in the drawings, the role of the drawings is to supplement the description of the text part with graphics, so that people can intuitively and visually understand each technical feature and the overall technical scheme of the utility model, but it cannot be understood as the limitation of the protection scope of the utility model.

[0024] Referring to Figures 1-4 , the utility model embodiment a vacuum crystal growth furnace atmosphere maintaining device, it includes: crystal growth furnace body 1, the inside of crystal growth furnace body 1 is provided with reaction cavity 2, and reaction cavity 2 is installed with barometric pressure monitor in the inside, the outer side wall of crystal growth furnace body 1 is fixedly connected with mounting frame 3, and the upper end of mounting frame 3 is provided with gas control unit 4, and the upper end of crystal growth furnace body 1 is provided with exhaust unit 5;

[0025] Gas control unit 4 includes two gas storage tanks 401 fixedly connected to the upper end of mounting frame 3, the upper end of two gas storage tanks 401 is fixedly connected with exhaust pump one 402, the output end of two exhaust pump one 402 is fixedly connected with delivery pipe 403, the outer side wall of two delivery pipes 403 is installed with adjusting sleeve 404, one side of two adjusting sleeves 404 is rotatably connected with rotating rod 405, one end of two rotating rods 405 is fixedly connected with adjusting valve plate 406, and the end, away from adjusting valve plate 406, of two rotating rods 405 is fixedly connected with adjusting knob 407. Through gas control unit 4, gas can be injected into the inside of reaction cavity 2.

[0026] Exhaust unit 5 includes filter shell 501 fixedly connected to the upper end of crystal growth furnace body 1, and the inner bottom wall of filter shell 501 is installed with exhaust pump two 502, and the inner wall of filter shell 501 is installed with filter screen 503 and activated carbon plate 504, and the upper end of filter shell 501 is provided with exhaust pipe 505. Through exhaust unit 5, the internal pressure of reaction cavity 2 can be kept stable.

[0027] The suction end of exhaust pump two 502 penetrates through crystal growth furnace body 1 and is connected with reaction cavity 2. Through exhaust pump two 502, the gas in reaction cavity 2 can be easily exhausted, so that the internal pressure of reaction cavity 2 can be kept stable.

[0028] The adjusting valve plate 406 is adapted to the inner wall of the conveying pipe 403, and a sealing ring is mounted on the outer wall of the adjusting valve plate 406. The adjusting valve plate 406 is used to adjust the gas flow in the conveying pipe 403.

[0029] The two conveying pipes 403 are connected to the reaction cavity 2 through the crystal growth furnace body 1 at the end away from the air pump 402. The two conveying pipes 403 are used to convey the gas in the gas storage tank 401 to the inside of the reaction cavity 2.

[0030] The controller 101 is mounted on the outer wall of the crystal growth furnace body 1 and is electrically connected to the air pump 402 and the air pump 502. The controller 101 is used to facilitate the operation and control of the staff.

[0031] The crystal growth furnace body 1 is fixedly connected to four symmetrical supporting columns 6 at the bottom end, and the lower end of the four supporting columns 6 is fixedly connected to a bottom plate 7. The four supporting columns 6 and the bottom plate 7 are used to improve the stability of the crystal growth furnace body 1.

[0032] Working principle: During the use of the crystal growth furnace body 1, the air pressure in the reaction cavity 2 is monitored by the air pressure monitor. If the air pressure is too high, the air pump 502 is started to extract the air in the reaction cavity 2 and discharge it into the filter shell 501. The filter screen 503 and the activated carbon plate 504 in the filter shell 501 are used to filter out impurities and harmful components, and then the exhaust pipe 505 is used to discharge the air. In addition, the two gas storage tanks 401 store different gases (such as inert gas, hydrogen, etc.), which are extracted by the air pump 402 and conveyed to the reaction cavity 2 through the conveying pipe 403, so as to maintain the atmosphere of the reaction cavity 2. In addition, the adjusting knob 407 can be rotated to drive the adjusting valve plate 406 at one end of the rotating rod 405 to rotate, so as to control the gas flow in the conveying pipe 403.

[0033] The above embodiments of the present application are described in detail in combination with the drawings, but the present application is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present application.

Claims

1. A vacuum crystal growth furnace atmosphere maintenance apparatus comprising: The crystal growth furnace body (1) is characterized in that the inside of the crystal growth furnace body (1) is provided with a reaction cavity (2), the outer side wall of the crystal growth furnace body (1) is fixedly connected with a mounting rack (3), the upper end of the mounting rack (3) is provided with a gas control unit (4), and the upper end of the crystal growth furnace body (1) is provided with an air exhaust unit (5). The gas control unit (4) comprises two gas storage tanks (401) fixedly connected to the upper end of the mounting rack (3), the upper end of each of the two gas storage tanks (401) is fixedly connected with an air exhaust pump (402), the output end of each of the two air exhaust pumps (402) is fixedly connected with a conveying pipe (403), the outer side wall of each of the two conveying pipes (403) is provided with an adjusting sleeve (404), one side of each of the two adjusting sleeves (404) is rotatably connected with a rotating rod (405), one end of each of the two rotating rods (405) is fixedly connected with an adjusting valve plate (406), and the end of each of the two rotating rods (405) away from the adjusting valve plate (406) is fixedly connected with an adjusting knob (407).

2. The atmosphere maintaining device for a vacuum crystal growing furnace according to claim 1, wherein The air exhaust unit (5) comprises a filter shell (501) fixedly connected to the upper end of the crystal growth furnace body (1), the inner bottom wall of the filter shell (501) is provided with an air exhaust pump (502), the inner wall of the filter shell (501) is provided with a filter screen plate (503) and an activated carbon plate (504), and the upper end of the filter shell (501) is provided with an exhaust pipe (505).

3. The apparatus according to claim 2, wherein The suction end of the air exhaust pump (502) penetrates the crystal growth furnace body (1) and is connected with the reaction cavity (2).

4. The atmosphere maintaining device for a vacuum crystal growing furnace according to claim 1, wherein The adjusting valve plate (406) is adapted to the inner wall of the conveying pipe (403), and the outer side wall of the adjusting valve plate (406) is provided with a sealing ring.

5. The atmosphere maintaining device for a vacuum crystal growing furnace according to claim 1, wherein The end of each of the two conveying pipes (403) away from the air exhaust pump (402) penetrates the crystal growth furnace body (1) and is connected with the reaction cavity (2).

6. The atmosphere maintaining device for a vacuum crystal growing furnace according to claim 1, wherein The outer side wall of the crystal growth furnace body (1) is provided with a controller (101), and the controller (101) is electrically connected with the air exhaust pump (402) and the air exhaust pump (502).

7. The apparatus according to claim 1, wherein The bottom end of the crystal growth furnace body (1) is fixedly connected with four symmetrically arranged supporting columns (6), and the lower end of each of the four supporting columns (6) is fixedly connected with a bottom plate (7).

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