Multi-stage chemical etching liquid circulating filtering device

By using multi-stage filtration filters and a chemical etching solution circulation filtration device with online backwashing function, the problem of frequent filter element replacement required by traditional filters has been solved, thus improving production efficiency.

CN223696991UActive Publication Date: 2025-12-23DONGJIANG NUCLEAR TECHNOLOGY APPLICATION (GUANGDONG) CO LTD
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Patent Information

Application Number
CN202520008226.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-01-03
Publication Date
2025-12-23
Estimated Expiration
2035-01-03

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Abstract

The utility model belongs to the technical field of chemical reagent filtration, and particularly relates to a multi-stage chemical etching liquid circulating filtration device which comprises a filtration assembly, comprising an etching liquid tank body, a filtrate shunting pipe arranged in the etching liquid tank body, a first connecting pipe arranged at one end of the filtrate shunting pipe, a multi-stage filter arranged at one end of the first connecting pipe, a filter screen arranged in the multi-stage filter, and a second connecting pipe arranged at the other end of the multi-stage filter and communicated with the filtrate shunting pipe, the filter circulating pump is arranged on the first connecting pipe, the liquid inlet valve is arranged on the first connecting pipe, and the reflux valve is arranged on the second connecting pipe; the backwashing assembly comprises a third connecting pipe arranged on the other side of the multi-stage filter; the filter is reasonable in structure, in the using process, the filter screens with different filter precisions are used for achieving the functions of multi-stage filtering, online backflushing and the like, long-term use is achieved, the filter elements and the filter screens do not need to be replaced, and the online production efficiency is improved.
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Description

TECHNICAL FIELD

[0001] The utility model relates to chemical reagent filtration technical field, concretely is a kind of multistage chemical etching liquid circulating filter device. BACKGROUND

[0002] Etching liquid is a kind of liquid by the characteristics of erosion material to carve. In theory, all reagents that can oxidize steel to generate soluble copper salt can be used for etching copper foil plate, but the damage to the resist layer, etching speed, etching coefficient, copper dissolution capacity, solution regeneration and copper recovery, environmental protection and economic effect are weighed.

[0003] Chemical etching liquid has strong corrosive, high temperature, impurity particle composition is complex, and size is not one etc., traditional filter exists some deficiencies in the process of using, such as needing to frequently replace filter element, filter element is easily corroded, and replacement process needs to stop etc., based on above problem, we propose a new multistage chemical etching liquid circulating filter device. SUMMARY

[0004] This part is to outline some aspects of the embodiments of the utility model and briefly introduce some preferred embodiments. Some simplifications or omissions may be made in this part and the abstract of the specification and the utility model name to avoid obscuring the purpose of this part, the abstract of the specification and the utility model name, and such simplifications or omissions cannot be used to limit the scope of the utility model.

[0005] In view of the problems existing in the prior art, the utility model is proposed.

[0006] Therefore, the purpose of the utility model is to provide a multistage chemical etching liquid circulating filter device, in the process of using, multistage filtration is realized by using filter screen of different filtration accuracy, and the functions such as online backflush realize long-term use without replacing filter element and filter screen, improve online production efficiency.

[0007] To solve the above technical problems, according to one aspect of the utility model, the utility model provides the following technical scheme:

[0008] A multistage chemical etching liquid circulating filter device comprises:

[0009] The filter assembly comprises an etching liquid tank body, a filtrate shunt pipe arranged in the etching liquid tank body, a first connecting pipe arranged at one end of the filtrate shunt pipe, a multistage filter arranged at one end of the first connecting pipe, a filter screen arranged in the multistage filter, a second connecting pipe arranged at the other end of the multistage filter and connected with the filtrate shunt pipe, a filtration circulating pump arranged on the first connecting pipe, an inlet valve arranged on the first connecting pipe, and a backflow valve arranged on the second connecting pipe.

[0010] The backwashing assembly comprises a third connecting pipe arranged on the other side of the multi-stage filter, a backwashing pump arranged at one end of the third connecting pipe, a backwashing liquid inlet valve arranged in the middle of the third connecting pipe, and a backwashing sewage valve arranged on one side of the multi-stage filter.

[0011] As a preferred scheme of the multi-stage chemical etching liquid circulating filter device, the number of the filter screens is three, the first filter screen has a pore size of 500-1000 μm, the second filter screen has a pore size of 300-500 μm, and the third filter screen has a pore size of 100-300 μm.

[0012] As a preferred scheme of the multi-stage chemical etching liquid circulating filter device, the first connecting pipe is further provided with a pressure gauge.

[0013] Compared with the prior art, the multi-stage filter device has the advantages that: different filter screens with different filtering accuracies are used to realize multi-stage filtering, and the functions of online backwashing and the like are realized, so that the filter device can be used for a long time without replacement of filter cores and filter screens, and the online production efficiency is improved. BRIEF DESCRIPTION OF DRAWINGS

[0014] In order to more clearly illustrate the technical schemes of the embodiments of the present application, the present application will be described in detail below in combination with the drawings and detailed embodiments. Obviously, the drawings described below are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor. Among them:

[0015] Fig. 1 It is a structural schematic diagram of the present application;

[0016] Fig. 2 It is a structural schematic diagram of the filter screen of the present application.

[0017] In the figure; 100 is a filter assembly, 1 is an etching liquid tank body, 2 is a filtrate shunt pipe, 201 is a first connecting pipe, 202 is a second connecting pipe, 3 is a filter circulating pump, 4 is a multi-stage filter, 401 is a filter screen, 5 is a liquid inlet valve, 6 is a backflow valve, 200 is a backwashing assembly, 7 is a backwashing pump, 701 is a third connecting pipe, 8 is a backwashing liquid inlet valve, 9 is a backwashing sewage valve, and 10 is a pressure gauge. DETAILED DESCRIPTION

[0018] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific embodiments of the present application will be described in detail below in combination with the drawings.

[0019] Many specific details are set forth in the following description in order to provide a thorough understanding of the present application. However, the present application can be practiced according to other embodiments that can not be described in detail herein, and the skilled in the art will appreciate that the present application can be practiced in a variety of ways, all of which are intended to be encompassed by the present application. Therefore, the present application is not limited to the specific embodiments described herein, but only by the claims that follow.

[0020] Secondly, the present application is described in detail in combination with the schematic diagram, and in the detailed description of the embodiments of the present application, for the convenience of description, the sectional view of the device structure can be partially enlarged without the general proportion, and the schematic diagram is only an example, which should not limit the scope of protection of the present application herein. In addition, the three-dimensional spatial dimensions of length, width and depth should be included in the actual manufacture.

[0021] In order to make the purpose, technical scheme and advantages of the present application more clear, the embodiments of the present application will be further described in detail below in combination with the drawings.

[0022] The present application provides the following technical scheme: a multi-stage chemical etching liquid circulating filtration device, in the process of use, multi-stage filtration is realized by using filter screens with different filtration precision, and the functions of online backflushing and the like are realized, so that the multi-stage chemical etching liquid circulating filtration device can be used for a long time without replacing filter elements and filter screens, and the online production efficiency is improved;

[0023] Figs. 1-2 The present application provides the following technical scheme: a multi-stage chemical etching liquid circulating filtration device, in the process of use, multi-stage filtration is realized by using filter screens with different filtration precision, and the functions of online backflushing and the like are realized, so that the multi-stage chemical etching liquid circulating filtration device can be used for a long time without replacing filter elements and filter screens, and the online production efficiency is improved;

[0024] The filter assembly 100 comprises an etching liquid tank body 1, a filtrate shunt pipe 2 installed in the inside of the etching liquid tank body 1, a first connecting pipe 201 installed at one end of the filtrate shunt pipe 2, a multi-stage filter 4 installed at one end of the first connecting pipe 201, a filter screen 401 installed in the inside of the multi-stage filter 4, a second connecting pipe 202 installed at the other end of the multi-stage filter 4 and connected with the filtrate shunt pipe 2, a filtration circulating pump 3 installed on the first connecting pipe 201, an inlet valve 5 installed on the first connecting pipe 201, a backflow valve 6 installed on the second connecting pipe 202, the number of the filter screens 401 is three layers, the pore diameter of the first-stage filter screen 401 is 500-1000 microns, the pore diameter of the second-stage filter screen 401 is 300-500 microns, the pore diameter of the third-stage filter screen 401 is 100-300 microns, and a pressure gauge 10 is further arranged on the first connecting pipe 201, and further, the filter assembly 100 is used for etching liquid filtration;

[0025] The backwashing assembly 200 comprises a third connecting pipe 701 installed on the other side of the multi-stage filter 4, a backwashing pump 7 installed on one end of the third connecting pipe 701, a backwashing liquid inlet valve 85 installed in the middle of the third connecting pipe, a backwashing sewage valve 9 installed on one side of the multi-stage filter 4, and further, the backwashing assembly 200 is used for cleaning the multi-stage filter 4.

[0026] In combination Figs. 1-2 The multi-stage chemical etching liquid circulating filter device of the embodiment specifically acts as follows: the etching liquid is pumped to the multi-stage filter 4 by the circulating filter pump, the etching liquid flows back to the etching liquid tank 1 through the first-stage filter screen 401, the second-stage filter screen 401 and the third-stage filter screen 401 in sequence, and the filtered residues are adsorbed on the surfaces of the filter screens 401; when the filtering pressure rises to a certain degree, the backwashing pump 7 is automatically opened to perform clean water backwashing, and the process lasts for 10-30 seconds.

[0027] Although the utility model has been described above with reference to the embodiments, various improvements can be made and equivalent parts can be replaced without departing from the scope of the utility model. In particular, as long as there is no structural conflict, the features in the disclosed embodiments of the utility model can be combined in any way, and the combinations are not exhaustively described in the specification only for the purpose of saving space and resources. Therefore, the utility model is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A multi-stage chemical etching solution circulating filtration device, characterized in that, include: The filter assembly (100) includes an etching solution tank (1), a filtrate distribution pipe (2) disposed inside the etching solution tank (1), a first connecting pipe (201) disposed at one end of the filtrate distribution pipe (2), a multi-stage filter (4) disposed at one end of the first connecting pipe (201), a filter screen (401) disposed inside the multi-stage filter (4), a second connecting pipe (202) disposed at the other end of the multi-stage filter (4) and connected to the filtrate distribution pipe (2), a filter circulation pump (3) disposed on the first connecting pipe (201), an inlet valve (5) disposed on the first connecting pipe (201), and a return valve (6) disposed on the second connecting pipe (202). The backwash assembly (200) includes a third connecting pipe (701) disposed on the other side of the multi-stage filter (4), a backwash pump (7) disposed at one end of the third connecting pipe (701), a backwash inlet valve (8)(5) disposed in the middle of the third connecting pipe, and a backwash drain valve (9) disposed on one side of the multi-stage filter (4).

2. The multi-stage chemical etching solution circulating filtration device according to claim 1, characterized in that: The filter (401) consists of three layers: the first-stage filter (401) has a pore size of 500-1000μm, the second-stage filter (401) has a pore size of 300-500μm, and the third-stage filter (401) has a pore size of 100-300μm.

3. The multi-stage chemical etching solution circulating filtration device according to claim 1, characterized in that: A pressure gauge (10) is also provided on the first connecting pipe (201).