Magnetron sputtering coating equipment

Abstract

The utility model relates to magnetron sputtering coating equipment which comprises a vacuum chamber and an air extractor arranged in the vacuum chamber, and the air extractor comprises a condensing coil and an air extraction box; the inner wall of the vacuum chamber is provided with at least one first extraction opening and at least two second extraction openings, and the first extraction opening and the second extraction openings are respectively communicated with an external extraction pipeline; the condensing coil is located in an inner cavity of the vacuum cavity, and the two ends of the condensing coil penetrate through the vacuum cavity and extend to be connected with an external cold trap device. The air exhaust boxes are mounted on the inner wall of the vacuum chamber on the rear side of the condensing coil, and an inner cavity of each air exhaust box is communicated with at least one second air exhaust opening; according to the device, water vapor is extracted to the periphery of the condensing coil through the condensing coil to be condensed into ice, the water vapor changed from ice in the defrosting stage of the condensing coil is captured and extracted in time through the air extraction boxes evenly distributed on the rear side of the condensing coil, capture, extraction and discharge of the water vapor are achieved, and the purpose of preventing the water vapor from diffusing is achieved.

Description

Technical Field

[0001] This application relates to the field of vacuum coating technology, specifically to a magnetron sputtering coating device. Background Technology

[0002] In the production process of heterojunction (HJT) cells, magnetron sputtering coating equipment is often used to prepare transparent conductive oxide (TCO) films. For example, horizontal continuous coating equipment can complete double-sided coating in one go by arranging sputtering stations on the front and back of the silicon wafer and combining them with a carrier plate with a hollow design. The silicon wafer is placed in the hollow unit of the carrier plate.

[0003] Currently, magnetron sputtering coating equipment typically includes a vacuum chamber and multiple process modules located inside the vacuum chamber. The atmospheric environment for magnetron sputtering coating equipment generally requires a temperature of 23±0.5℃ and a humidity of 30%–40% RH. Each time the carrier plate enters the vacuum chamber from the atmospheric environment, it brings moisture adsorbed on the carrier plate into the vacuum chamber. Because this moisture evaporates into water vapor under the heating system and vacuum conditions, it affects the transmittance and sheet resistance of the indium tin oxide (ITO) film, significantly degrading the film's electrical properties and impacting the photoelectric conversion efficiency of the solar cells. Therefore, it is necessary to remove the water vapor from the vacuum chamber. However, existing magnetron sputtering coating equipment cannot stably and effectively control the removal of water vapor from the vacuum modules. Utility Model Content

[0004] To overcome the shortcomings of the prior art, this application provides a magnetron sputtering coating apparatus, specifically adopting the following technical solution:

[0005] A magnetron sputtering coating apparatus includes a vacuum chamber and an air extraction device disposed in at least one vacuum chamber;

[0006] The extraction device includes at least one condenser coil with built-in refrigerant and at least two extraction boxes distributed along the refrigerant flow direction of the condenser coil.

[0007] The inner wall of the vacuum chamber is provided with at least one first air extraction port and at least two second air extraction ports. The first air extraction port and the second air extraction port are respectively connected to the external air extraction pipe, and water vapor in the vacuum chamber is extracted through the first air extraction port and the second air extraction port.

[0008] The condenser coil is located inside the vacuum chamber, and both ends of the condenser coil pass through the vacuum chamber and extend to connect to the external cold trap device.

[0009] The vacuum box is installed on the inner wall of the vacuum chamber behind the condenser coil, and the inner cavity of each vacuum box is connected to at least one second vacuum port; at least one vent hole is evenly distributed on the surface of the vacuum box, and the vent hole is connected to the inner cavity of the vacuum box.

[0010] In this application, condensing coils distributed within the vacuum chamber are used to adsorb water vapor in the vacuum chamber and condense it into ice around the condensing coils. Subsequently, the condensing coils are defrosted, and the water vapor that turns from the ice during the defrosting stage is captured and extracted in a timely manner by the evenly distributed air extraction boxes behind the condensing coils, thereby realizing the capture, extraction and discharge of water vapor in the vacuum chamber.

[0011] Optionally: At least two coil support blocks are provided between the condensing coil and the inner wall of the vacuum chamber. The coil support blocks fix the condensing coil in the vacuum chamber and keep the condensing coil in a fixed position in the vacuum chamber, providing effective support for the condensing coil.

[0012] Optionally: The condenser coil has a continuous reciprocating S-shaped structure, which can effectively increase the contact area between the condenser coil and the surrounding environment and improve the condensation efficiency; in order to improve the firmness of the condenser coil installed on the inner wall of the vacuum chamber, the coil support block is distributed on the rear side of the condenser coil between adjacent bends.

[0013] Optionally, at least one of the aforementioned vacuum boxes is disposed on the rear side of the condensing coil located between adjacent coil support blocks, and the vacuum box has vent holes distributed on its end face close to the coil support block. When the condensing coil is defrosted, the ice on the surface of the condensing coil re-evaporates or sublimates into water vapor. The water vapor can be drawn out through the vent holes of the nearby vacuum box, and further water vapor at the location of the coil support block can be extracted through the vent holes on the end face of the vacuum box, thereby improving the water vapor extraction efficiency and extraction quality.

[0014] Optionally: The inner wall of the vacuum chamber is provided with a pipe outlet, and a sealing flange is provided on the pipe outlet. Both ends of the condensing coil extend out of the vacuum chamber through the sealing flange. The sealing flange allows the ends of the condensing coil to extend out of the vacuum chamber while ensuring the airtightness of the vacuum chamber.

[0015] Optionally: The surface of the extraction box is provided with a groove to accommodate the condenser coil. By providing the groove, the contact area between the extraction box and water vapor can be increased, thereby improving the extraction efficiency of the extraction box. Furthermore, a first gap is provided between the groove and the condenser coil. The first gap serves as the condensation space for the condenser coil. When water vapor condenses on the surface of the condenser coil, the diameter of the condenser coil will increase. By reserving the first gap, the flow space between the extraction box and the condenser coil can be prevented from being blocked when water vapor condenses, thereby ensuring that the extraction box can stably extract water vapor.

[0016] Optionally, the distance of the first gap is 3 to 4 mm.

[0017] Optionally, the surface of the groove may be either an arc-shaped surface or a polygonal surface.

[0018] Optionally, the extraction pipe includes a first extraction pipe, and the first extraction port is connected to the first extraction pipe. The first extraction pipe serves as the main extraction pipe for the vacuum chamber. Each time the carrier plate enters the vacuum chamber from the atmospheric environment, most of the water vapor in the chamber can be extracted and discharged through the first extraction pipe.

[0019] Optionally, the extraction pipe includes a second extraction pipe, with each second extraction port connected to one end of a second extraction pipe, and the other end of each second extraction pipe connected to a first extraction pipe. The second extraction pipe serves as a branch extraction pipe connecting each extraction box to the main extraction pipe, through which water vapor extracted by the extraction box can be discharged to the main extraction pipe and then discharged to the outside.

[0020] Beneficial effects

[0021] The technical solution of this application achieves the following beneficial effects:

[0022] (1) The magnetron sputtering coating equipment of this application draws water vapor into the surrounding area of ​​the condensing coil distributed in the vacuum chamber and condenses it into ice. The pump box evenly distributed behind the condensing coil captures and extracts the water vapor that turns from ice into water vapor in the defrosting stage of the condensing coil in a timely manner. This achieves the capture, extraction and discharge of water vapor, thereby preventing the diffusion of water vapor and avoiding the diffusion of water vapor inside the vacuum chamber, which would affect the magnetron sputtering coating equipment.

[0023] (2) The magnetron sputtering coating equipment of this application uses a vacuum box distributed behind the condenser coil to extract water vapor during the defrosting stage. This process can prevent water vapor from diffusing into the vacuum chamber and avoid water vapor adsorbing on the anti-sputtering plate inside the chamber. The water vapor removal process of this device is short and the extraction process is simple. It can more thoroughly remove water vapor from the vacuum chamber, thereby reducing the impact on the production process of the magnetron sputtering coating equipment, reducing the equipment maintenance frequency, and improving the service life. Attached Figure Description

[0024] Figure 1 This is a front structural diagram of the magnetron sputtering coating equipment in the embodiments of this application.

[0025] Figure 2 for Figure 1 A schematic diagram of the cross-sectional structure along the AA direction.

[0026] Figure 3 for Figure 1 Schematic diagram of the cross-sectional structure in the middle BB direction.

[0027] Figure 4This is a schematic diagram of the assembly structure of the air extraction pipe in an embodiment of this application.

[0028] Figure 5 This is a schematic diagram of the arrangement of the condenser coil and the vacuum box in an embodiment of this application.

[0029] Figure 6 This is a schematic diagram of the condenser coil structure in an embodiment of this application.

[0030] Figure 7 This is a schematic diagram of the air extraction pipe in an embodiment of this application.

[0031] Figure 8 This is a schematic diagram of the structure of the coil support block in an embodiment of this application.

[0032] Figure 9 This is a schematic diagram of the top structure of the air extraction box in an embodiment of this application.

[0033] Figure 10 This is a schematic diagram of the bottom structure of the air extraction box in an embodiment of this application.

[0034] The specific meanings of the reference numerals in the attached figures are as follows:

[0035] 1-Vacuum chamber; 101-Inner wall of vacuum chamber; 102-First extraction port; 103-Second extraction port; 104-Pipe outlet; 2-Condensing coil; 201-Bend; 202-Straight section; 3-Coil support block; 4-Evacuation box; 401-Groove; 402-Vent hole; 403-End face of the extraction box; 404-Inner cavity of the extraction box; 5-First extraction pipe; 6-Second extraction pipe; 7-Sealing flange. Detailed Implementation

[0036] The present application will be further described below with reference to the accompanying drawings. In this document, terms such as "upper," "lower," "inner," and "outer" are established based on the positional relationships shown in the accompanying drawings. Depending on the drawings, the corresponding positional relationships may change; therefore, they should not be construed as absolute limitations on the scope of protection. Furthermore, relational terms such as "first" and "second" are merely used to distinguish one component from another with the same name, and do not necessarily require or imply any actual relationship or order between these components. The following embodiments are only used to more clearly illustrate the technical solutions of this application and should not be used to limit the scope of protection of this application. It should be noted that the following detailed descriptions are exemplary and intended to provide further explanation of this application.

[0037] Combination Figure 1-4As shown in the illustration, this application specifically discloses a magnetron sputtering coating apparatus, which includes a vacuum chamber 1 and a vacuum pumping device disposed within at least one vacuum chamber 1. The vacuum pumping device is used to adsorb water vapor in the vacuum chamber 1. Specifically, the vacuum pumping device includes at least one condenser coil 2 with built-in refrigerant and at least two vacuum boxes 4 distributed along the refrigerant flow direction of the condenser coil 2. The condenser coil 2 is used to condense water vapor in the vacuum chamber 1 into ice and attach it to the surface. The vacuum boxes 4 are used to adsorb evaporated or sublimated water vapor during defrosting operations on the surface of the condenser coil 2, preventing water vapor from diffusing back into the vacuum chamber 1.

[0038] Specifically, in combination Figure 1 and Figure 4 As shown in the embodiment of this application, the inner wall 101 of the vacuum chamber is provided with a first exhaust port 102 and a second exhaust port 103. The first exhaust port 102 and the second exhaust port 103 are respectively connected to external exhaust pipes, and water vapor in the vacuum chamber 1 is extracted through the first exhaust port 102 and the second exhaust port 103. It should be noted that in this embodiment, the first exhaust port 102 is the main exhaust channel for water vapor in the vacuum chamber 1, and most of the water vapor in the vacuum chamber 1 can be discharged through the first exhaust port 102. The remaining water vapor can condense and accumulate on the surface of the condensing coil 2, and the second exhaust port 103 is the main exhaust channel for water vapor on the condensing coil 2. The remaining water vapor is accumulated on the surface of the condensing coil 2 through condensation. Subsequently, the condensing coil 2 is defrosted, which allows the remaining water vapor in the vacuum chamber 1 to accumulate near the condensing coil 2, making it easier for the second exhaust port 103 to discharge it. In this embodiment, the inner wall 101 of the vacuum chamber is provided with at least one first exhaust port 102. The number of first exhaust ports 102 can be appropriately increased as the volume of the vacuum chamber 1 increases, thereby improving the efficiency of water vapor removal from the vacuum chamber 1. Secondly, the inner wall 101 of the vacuum chamber in this embodiment is provided with multiple second exhaust ports 103. Generally, each exhaust box 4 corresponds to at least one second exhaust port 103. The number of second exhaust ports 103 can be appropriately increased as the length of the exhaust box 4 increases, thereby improving the efficiency of water vapor removal from the condenser coil 2.

[0039] Furthermore, in combination Figure 1 and Figure 3 As shown, the condenser coil 2 described in this application is located inside the vacuum chamber 1, and both ends of the condenser coil 2 pass through the vacuum chamber 1 and extend to connect to an external cold trap device. The cold trap device is used to cool the refrigerant in the condenser coil 2. The condenser coils 2 distributed within the vacuum chamber 1 can adsorb residual water vapor in the vacuum chamber 1 and condense it into ice around the condenser coils 2, thus achieving the adsorption of water vapor in the vacuum chamber 1. Further, as... Figure 6As shown in the embodiments of this application, the condenser coil 2 preferably adopts a continuously reciprocating S-shaped structure, which can effectively increase the contact area between the condenser coil 2 and the surrounding environment, thereby improving the condensation efficiency of the condenser coil 2 in the cavity.

[0040] like Figure 1 As shown, the vacuum box 4 is installed on the inner wall of the vacuum chamber 1 behind the condenser coil 2, and the inner cavity of each vacuum box 4 is connected to at least one second vacuum port 103; in addition, at least one vent hole 402 is evenly distributed on the surface of the vacuum box 4, and the vent hole 402 is connected to the inner cavity 404 of the vacuum box 4, such as... Figure 9 and Figure 10 As shown. When defrosting the ice condensed on the condenser coil 2, the ice on the surface of the condenser coil 2 evaporates or sublimates into water vapor. At this time, the newly generated water vapor accumulates around the condenser coil 2. The water vapor around the condenser coil 2 is captured and extracted in time by the uniformly distributed vacuum box 4 behind the condenser coil 2. The residual water vapor in the vacuum chamber 1 can be captured, extracted and discharged.

[0041] More specifically, in combination Figure 5 and Figure 8 As shown, in this embodiment, at least two coil support blocks 3 are provided between the condensing coil 2 and the inner wall of the vacuum chamber 1. The coil support blocks 3 can fix the condensing coil 2 in the vacuum chamber 1, and the coil support blocks 3 can keep the condensing coil 2 and the vacuum chamber 1 in a fixed position, providing effective support for the condensing coil 2. Furthermore, in order to improve the firmness of the condensing coil 2 installed on the inner wall of the vacuum chamber 1, in this embodiment, it is preferable to distribute the coil support blocks 3 on the rear side of the condensing coil 2 between adjacent bends 201, combined with Figure 6 As shown, since the condenser coil 2 has a continuously reciprocating S-shaped structure, two coil support blocks 3 can be installed for support and fixation of the longer straight section 202 in the condenser coil 2. As the length of the straight section 202 in the condenser coil 2 increases, the number of coil support blocks 3 at this position can be appropriately increased to prevent deformation of the condenser coil 2.

[0042] Furthermore, in this embodiment, at least one of the vacuum boxes 4 is disposed on the rear side of the condensing coil 2 located between adjacent coil support blocks 3, such as... Figure 5As shown, two coil support blocks 3 are arranged on the straight section 202 of the condenser coil 2. A longer suction box 4 is provided in the middle of the two coil support blocks 3, and a shorter suction box 4 is provided at each end near the straight section 202. In this embodiment, the suction boxes 4 should cover the entire condenser coil 2 as much as possible to improve the suction efficiency of water vapor around the condenser coil 2. When the condenser coil 2 is defrosted, the ice on the surface of the condenser coil 2 will re-evaporate or sublimate into water vapor, which can be sucked out through the vent holes 402 of the nearby suction boxes 4. In addition, the vent holes 402 are distributed on the end face 403 of the suction box 4 close to the coil support block 3. Water vapor at the location of the coil support block 3 can be further extracted through the vent holes 402 of the end face 403 of the suction box, avoiding water vapor residue near the coil support block 3, thereby improving the water vapor extraction efficiency and extraction quality.

[0043] Combination Figure 3 As shown, the inner wall 101 of the vacuum chamber is provided with a pipe outlet 104, and a sealing flange 7 is provided on the pipe outlet 104. Both ends of the condenser coil 2 extend out of the vacuum chamber 1 through the sealing flange 7. The sealing flange 7 allows the ends of the condenser coil 2 to extend out of the vacuum chamber 1, while ensuring the airtightness of the vacuum chamber 1.

[0044] Furthermore, such as Figure 9 As shown, to improve the extraction efficiency of water vapor by the extraction box 4, this embodiment provides a groove 401 on the surface of the extraction box 4 to accommodate the condenser coil 2. The groove 401 increases the contact area between the extraction box 4 and the water vapor. A first gap is provided between the groove 401 and the condenser coil 2, serving as a condensation space for the condenser coil 2. In this embodiment, the distance of the first gap is preferably 3-4 mm. When water vapor condenses on the surface of the condenser coil 2, the diameter of the condenser coil 2 increases. By reserving the first gap, the flow space between the extraction box 4 and the condenser coil 2 can be prevented from being blocked during water vapor condensation, thereby ensuring stable extraction of water vapor by the extraction box 4.

[0045] It should be noted that the surface of the groove 401 in this embodiment can be either an arc-shaped surface or a polygonal surface, so that sufficient space is reserved between the surface of the vacuum box 4 and the condenser coil 2, so as to avoid ice on the surface of the condenser coil 2 from blocking the vent hole 402 of the vacuum box 4.

[0046] More detailed, such as Figure 7As shown, the extraction pipeline in this embodiment includes a first extraction pipeline 5 and a second extraction pipeline 6. The first extraction port 102 is connected to the first extraction pipeline 5, and each second extraction port 103 is connected to one end of a second extraction pipeline 6, and the other end of each second extraction pipeline 6 is connected to the first extraction pipeline 5. The first extraction pipeline 5 serves as the main extraction pipeline of the vacuum chamber 1. When the carrier plate enters the vacuum chamber 1 from the atmospheric environment, most of the water vapor in the chamber can be extracted and discharged through the first extraction pipeline 5. The second extraction pipeline 6 serves as a branch extraction pipeline connecting each extraction box 4 to the main extraction pipeline. The water vapor extracted by the extraction box 4 can be discharged to the main extraction pipeline through the second extraction pipeline 6 and then discharged to the outside through the main extraction pipeline.

[0047] The above description is only a preferred embodiment of this application. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of this application, and these improvements and modifications should also be considered within the scope of protection of this application.

Claims

1. A magnetron sputtering coating apparatus, characterized in that, It includes a vacuum chamber (1) and an air extraction device disposed in at least one vacuum chamber (1); The air extraction device includes at least one condenser coil (2) with built-in refrigerant and at least two air extraction boxes (4) distributed along the refrigerant flow direction of the condenser coil (2); The inner wall (101) of the vacuum chamber (1) is provided with at least one first air extraction port (102) and at least two second air extraction ports (103). The first air extraction port (102) and the second air extraction port (103) are respectively connected to the external air extraction pipe, and water vapor in the vacuum chamber (1) is extracted through the first air extraction port (102) and the second air extraction port (103). The condenser coil (2) is located inside the vacuum chamber (1), and both ends of the condenser coil (2) pass through the vacuum chamber (1) and extend to connect to the external cold trap device. The vacuum box (4) is installed on the inner wall of the vacuum chamber (1) behind the condenser coil (2), and the inner cavity of each vacuum box (4) is connected to at least one second vacuum port (103); at least one vent hole (402) is evenly distributed on the surface of the vacuum box (4), and the vent hole (402) is connected to the inner cavity (404) of the vacuum box (4).

2. The magnetron sputtering coating equipment according to claim 1, characterized in that, At least two coil support blocks (3) are provided between the condenser coil (2) and the inner wall of the vacuum chamber (1), and the coil support blocks (3) fix the condenser coil (2) in the vacuum chamber (1).

3. The magnetron sputtering coating equipment according to claim 2, characterized in that, The condenser coil (2) has a continuous reciprocating S-shaped structure, and the coil support block (3) is distributed on the rear side of the condenser coil (2) between adjacent bends (201).

4. The magnetron sputtering coating equipment according to claim 2, characterized in that, At least one of the vacuum boxes (4) is arranged on the rear side of the condensing coil (2) located between adjacent coil support blocks (3), and the vent holes (402) are distributed on the end face (403) of the vacuum box (4) close to the coil support block (3).

5. The magnetron sputtering coating equipment according to claim 1, characterized in that, The inner wall (101) of the vacuum chamber (1) is provided with a pipe outlet (104), and a sealing flange (7) is provided on the pipe outlet (104). Both ends of the condenser coil (2) extend out of the vacuum chamber (1) through the sealing flange (7).

6. The magnetron sputtering coating equipment according to claim 1 or 4, characterized in that, The surface of the vacuum box (4) is provided with a groove (401) for accommodating the condenser coil (2), and a first gap is provided between the groove (401) and the condenser coil (2).

7. The magnetron sputtering coating equipment according to claim 6, characterized in that, The distance of the first gap is 3 to 4 mm.

8. The magnetron sputtering coating equipment according to claim 6, characterized in that, The surface of the groove (401) is either an arc-shaped surface or a polygonal surface.

9. The magnetron sputtering coating equipment according to claim 1, characterized in that, The air extraction pipe includes a first air extraction pipe (5), and the first air extraction port (102) is connected to the first air extraction pipe (5).

10. The magnetron sputtering coating equipment according to claim 9, characterized in that, The air extraction pipe includes a second air extraction pipe (6), each of the second air extraction ports (103) is connected to one end of a second air extraction pipe (6), and the other end of each second air extraction pipe (6) is connected to a first air extraction pipe (5).

Images