1601results about "Flexible article cleaning" patented technology

The present invention provides a method for efficiently and uniformly treating articles with two or more fluids without transferring the articles from one container to another container. The method comprises: providing the fluids, one at a time, to treat the articles in a treatment system, wherein the treatment system comprises one or more trays each of which has one or more baskets, each basket capable of holding one article, and wherein said trays are stacked to form a vessel or are stacked and placed within a preformed vessel, said vessel or preformed vessel comprising a first entrance/exit and a second entrance/exit for the fluids; and each time one of the fluids is provided to treat the articles, (a) flushing continuously the articles with the fluid in a first flow direction from the first entrance/exit to the second entrance/exit, (b) reversing the flow direction of the fluid, (c) flushing continuously the articles with the fluid in a second direction from the second entrance/exit to the first entrance/exit for a second period of time, and (d) if necessary, repeating steps (a) to (c) for a desired number of times.

The present invention discloses a cleaning machine, especially to an automatic cleaning machine for cleaning a mobile phone screen. The cleaning machine comprises a rack which is provided with an alcohol pressure cylinder; a conveyor belt wheel which is provided with a conveyor belt; an unreeling wheel which is rotatingly connected with the rack and provided with a non-dust cloth roller; a retrieving wheel rotatingly connected with the rack, one end of a non-dust cloth discharged by the non-dust cloth roller is wound on the retrieving wheel through a stretching wheel; a rolling wheel driving motor, a rotating shaft of which is connected with the unreeling wheel or the retrieving wheel; a cleaning motor which is arranged between the unreeling wheel and the retrieving wheel, a rotating shaft of the cleaning motor is an eccentric shaft, the eccentric shaft is connected with a friction block, the alcohol pressure cylinder is connected with a nozzle through a pipeline, and the opening direction of the nozzle is toward the unreeling wheel. By adopting the cleaning machine, problems that the mobile phone screen needs to be cleaned by people, the efficiency is low, the labor intensity is large, human body can be damaged, costs are high can be solved, and certain beneficial effects can be realized.

A support structure and method, designed to maintain a resealable plastic bag in an open position within a dishwasher through the washing and drying cycles, has at least two vertically extending support and restraining straps that may be engaged with like straps to form a resilient support framework. A plurality of mating dimples and protrusions offer controlled size adjustments, while maintaining the reliability of the structure. The structure is readily collapsible to a flat and compact structure prior to purchase and when not in use, and includes features to engage with the rack in the dishwasher to prevent the support and bag from being substantially relocated during the wash process.

A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.

This disclosure relates to an article for cleaning uneven, variable geometry surfaces of electronic devices, internal electronic assemblies, or the like. The article comprises a housing having opposing faces with a support mounted to a first of the faces and a cleaning surface mounted to a second and opposite face of the housing. The cleaning surface includes a substantially flexible material formed in multiple, alternating patterns comprising at least one row of non-continuous, relatively tall triangular-like spikes separated by a plurality of rows of continuous, relatively short triangular-like spikes. Upon grasping of the support by a user, pressing the cleaning surface into contact with a surface to be cleaned, and moving the article along and against the surface, the relatively tall triangular-like spikes engage generally low portions of the surface, whereas the relatively short triangular-like spikes engage generally higher portions of the surface so as to remove dirt and debris from the low to the high portions of the surface, respectively.

The substrate processing apparatus has substrate holding mechanisms (14) for holding the substrate (W) under a holding force which is changed according to a rotational speed of the substrate holding mechanisms (14), a substrate rotation mechanism (22) for rotating the substrate holding mechanisms (14) to rotate the substrate (W) held by the substrate holding mechanisms (14), and a treatment liquid supply mechanism (12, 15, 19) for supplying a treatment liquid to a desired portion of the substrate (W) held by the substrate holding mechanisms (14).

A system and method for processing a tubular member for producing a medical device, wherein the tubular member is oriented in a longitudinally vertical position during processing.

Disclosed is a liquid processing apparatus and a liquid processing method that can prevent a processing liquid from being left on a lift pin after a drying-out process of a substrate, thereby preventing the processing liquid from being attached to the back surface of the substrate after the liquid processing. The liquid processing apparatus of the present disclosure includes a holding plate that supports a substrate, a lift pin plate provided above the holding plate having a lift pin that supports the wafer from a lower side, and a processing liquid supply unit that supplies the processing liquid to the back surface of the wafer. The processing liquid supply unit is provided with a head part configured to close a penetrating hole of the lift pin plate. The processing liquid supply unit and the lift pin plate are configured to be elevated with respect to the holding plate.

An article and process for cleaning relatively inaccessible and recessed surfaces, including a shaft having a first end opposite a second end with a cleaning head assembly, including a movable strip of buffing material, at the first end of the shaft. The article has an actuator at the second end of the shaft; and a connector coupling the cleaning head assembly to the actuator to move the movable strip during positional change of the actuator. Repeated positional change of the actuator produces reciprocatory movement in the movable strip of buffing material to produce a rubbing, cleaning action of the material against a recessed surface.

A cloth accessory and methods for the use thereof are disclosed and described. In one aspect, the cloth accessory may include a cover member forming an enclosure with a cavity therein, and a cloth attached to the cover member. The cloth may have a first configuration wherein the cloth is retracted substantially into the cover member, and a second configuration wherein the cloth is extended substantially out of the cover member without becoming detached therefrom.

An optical fiber connector cleaner (1) comprises a housing (10), a winding means (32) and a delivery means (34) for a cleaning tape (T) which are disposed in the housing, a cleaning means (20) having a bar-like cleaning section (21) projecting outwardly of the housing, on the front-end of the cleaning section the cleaning tape delivered from the delivery means being movably mounted under tension in an exposed state, the front-end of the cleaning section being brought into contact with the end surface of an optical fiber connector to thereby clean the end surface, a cleaning section rotating means (23) coaxially connected to the cleaning section in the housing and rotatably supported with respect to the housing; and a transmission means (40) which rotates the winding means and the cleaning section rotating means substantially simultaneously in a predetermined direction through a predetermined angle and then reverses the cleaning section rotating means to its original position.

Cleaning and drying of semiconductor wafers is carried out in a single-chamber type cleaning/drying apparatus for flat objects such as semiconductor wafer, where cleaning is carried out by impinging both sides of the wafer which rotates at a relatively low speed with jets of a washing liquid and where subsequent drying is carried out in the same chamber by increasing the rotation speed of the wafer and supplying an isopropyl-alcohol (IPA) mist onto the wafer from the top of the chamber. After the IPA forms a solution with the residue of water on the wafer, the drying process is accelerated by supplying gaseous nitrogen through nozzles arranged on both side of the coaxial with the wafer center. As a result, the IPA-water solution quickly evaporates without leaving traces of water drops on the dried surface.

The invention discloses a photovoltaic power station cleaning robot achieving direct dust removal on the basis of a draught fan and a working method of the photovoltaic power station cleaning robot. The cleaning robot comprises a power system, a walking system, a cleaning system, a dust removing system and a control system; the power system is connected with the walking system, the cleaning system, the dust removing system and the control system separately, the walking system, the cleaning system and the dust removing system are connected to the control system through sensors respectively, and the centrifugal draught fan is adopted as the dust removing system. The robot works along the working path that the robot starts from the highest position of a solar panel, walks at equal altitude in the transverse linear direction of the solar panel, turns when the robot arrives at the edge of a solar panel array and then walks in the transverse linear direction of the solar panel again and works. The dust removing system discharges dust out of the robot through an output air duct in the longitudinal direction of the solar panel and always blows the dust to the low-terrain side of the solar panel. The cleaning robot can meet the requirement that a photovoltaic power station conducts quick and efficient cleaning work on a large-area solar panel.

The invention provides a cleaning device of a spherical camera. The problem that the outside of the spherical camera is inconvenient to clean is solved. The cleaning device of the spherical camera comprises a shell, a wiping assembly, a rotary driving assembly, a lifting driving assembly and a rotary plate, wherein the rotary plate is rotatably arranged in an inner cavity of the shell; the rotary driving assembly for driving the rotary plate to rotate is arranged above the rotary plate; the wiping assembly is arranged below the rotary plate; the lifting driving assembly which drives the wiping assembly to be close to the rotary plate or be far away from the rotary plate is arranged between the wiping assembly and the rotary plate; the wiping assembly comprises a support, a first cleaning brush and a second cleaning brush; the support is fixed on the lifting driving assembly; a first cleaning brush and a second cleaning brush are hinged to the bottom of the support; and cleaning erasers are respectively arranged at an acting end of the first cleaning brush and an acting end of the second cleaning brush. By the cleaning device of the spherical camera, the circumstance that the spherical camera is wiped manually is avoided, a monitoring effect on electrical equipment and lines is guaranteed, and dangers of workers who climb to a high position to clean the camera are avoided.

Apparatuses and methods for automatically preparing optical fibers for splicing (or for attachment to a connector or an optical component) by automatically positioning a stripping station, a cleaning station, and a cleaving station to process one or more optical fibers substantially simultaneously. The optical fiber may be held at a fixed position during processing. A vacuum system may further be used to automatically collect scrap produced by the cleaving process.

A cleaning apparatus (100) for cleaning an endface (202) of an optical fiber contained within an interface device (200) is provided. The cleaning apparatus includes a housing (110) having an interface portion (116) adapted to be received by the interface device. The cleaning apparatus also includes at least a first nozzle (126) operable to deliver a pressurized gas and a solvent upon the endface to aid in the removal of contaminants on the endface. A method for cleaning an endface of an optical fiber contained within an interface device is also provided. The method comprises the steps of inserting an interface portion within the interface device so as to position a nozzle in proximity to the endface of the interface device. The method further comprises the steps of directing a pressurized gas through the nozzle toward the endface and intermixing a solvent with the pressurized gas.

The invention relates to a fabric surface dust removal device, which belongs to the technical field of fabric dust removal facilities and comprises a machine frame, a box body of a dust removal box, a first hair brush roller, a second hair brush roller, a motive power transmission mechanism, a first dust collection bucket and a second dust collection bucket, wherein a first cloth guide roller and a second cloth guide roller are arranged on the top of the machine frame, the top of the box body of the dust removal box is provided with a dust removal fabric guide-out roller, the bottom of the box body of the dust removal box is provided with a fabric guide-in roller, in addition, a cloth guide groove is formed in the center of the box body of the dust removal box, the first hair brush roller and the second hair brush roller are arranged in a box body cavity of the box body of the dust removal box, the same ends of a first hair brush roller shaft of the first hair brush roller and a second hair brush roller shaft of the second hair brush roller extend to a position outside the box body cavity and are connected with the motive power transmission mechanism, the motive power transmission mechanism is fixed on the box body of the dust removal box, a first dust suction pipe is connected onto the first dust collection bucket, a second dust suction pipe is connected onto the second dust suction bucket, and both the first dust suction pipe and the second dust suction pipe are connected with a negative pressure dust removal mechanism. The fabric surface dust removal device has the advantages that the dust removal effects on both sides of the fabric can be ensured without generating the secondary pollution of dust, and the fabric can smoothly enter the subsequent work procedures in a stable state.

The invention relates to a cleaning device for power generation, in particular to a photovoltaic solar panel cleaning device for power generation. The technical problem to be solved by the invention is to provide the photovoltaic solar panel cleaning device for power generation with lower production cost and capable of saving both time and labors, improving the cleaning efficiency and reducing the cleaning cost. In order to solve the technical problem, the invention provides the photovoltaic solar panel cleaning device for power generation. The photovoltaic solar panel cleaning device for power generation comprises a cart, a front-back moving device and the like; the front-back moving device is arranged at the top of the cart, and is vertically connected with a support plate; and a up-down moving device is arranged on the left side surface of the support plate, and is connected with a 7-shaped rod. The front-back moving device enables a brush to continuously move front and back to clean a photovoltaic solar panel, and the up-down moving device can adjust the height of the brush, so that the effects of time and labor saving, improvement of the cleaning efficiency, lower production cost and reduction of the cleaning cost are achieved.

A camera system includes a lens that directs light onto an image sensor, an actuator that vibrates the lens, and a charge generator that charges a surface of the lens. The camera system further includes a controller that can determine a change in transparency of the lens and selectively activate the actuator based at least in part on the change in transparency. A method includes electrically charging a surface of a camera lens, determining a change in transparency of the camera lens, comparing the change in transparency to a predetermined threshold, and selectively activating an actuator to vibrate the camera lens if the change in transparency is above a predetermined threshold.

A cleaning device comprising an enclosure, a cover allowing it to be opened in order to place an object to be cleaned within the enclosure, a supply of cleaning fluid, the enclosure comprising a piston that can move thanks to a motor, a geometry allowing a contact with an external fluid reservoir when the piston occupies a certain position within the enclosure in order to generate a sudden release of pressure, the device comprising an outlet valve remaining closed when the piston increases the volume of the enclosure so as to cause the pressure reduction within the enclosures.

The invention discloses a fully-automatic optical element cleaning device with an ultrasonic-megasonic composite frequency. The ultrasonic-megasonic composite frequency covers low/intermediate/high ultrasonic frequencies and low/intermediate/high megasonic frequencies. Particularly, an appropriate program and process parameters are selected to aim at super-clean washing requirements for an optical element, and pollutants from a micron scale to a nanometer scale on the surface of the optical element can be effectively removed. The fully-automatic optical element cleaning device with the ultrasonic-megasonic composite frequency has the main characteristics that an ultrasonic solution soaking cleaning tank, a megasonic cleaning tank and a spraying tank are designed; different frequency ultrasonic and megasonic waves are adopted, and cleaning requirements from a micron size to a nanometer size are covered; a workpiece is driven by a cylinder to reciprocate up and down in a tank body, a wave node of a standing wave field is prevented from being generated in a fixed area of the surface of the workpiece by virtue of a frequency sweeping function of an ultrasonic-megasonic generator, and the surface damage is avoided; the tank body adopts overflow cycle heating filtration; the total length of an overflow front edge is increased by using a trapezoidal saw-tooth type overflow edge design to obtain uniform and stable overflow; an inclined workpiece clamping device cooperates with an air knife and a slow lifting mechanism to dry the workpiece.

The invention relates to an apparatus for the cleaning of thin wafers (6), wherein the wafers (6) are fixed with one side to a carrier device (2), and wherein an interspace (7) is formed between two adjacent substrates, wherein the apparatus substantially consists of a shower device (15) by which fluid is injected into the respective interspaces (7), and a basin (14) that can be filled with fluid and that is dimensioned such that it houses the carrier device (2).

According to the invention, optionally either the shower device (15) can be moved in relation to the immobile carrier device (2), or the carrier device (2) can be moved in relation to the immobile shower device (15), or both the carrier device (2) as well as the shower device (15) can be moved in relation to each other.

The method stands out by the fact that in a preferred cleaning process, a shower with warm fluid takes place at first with the carrier device (2) being moved within the basin, followed by an ultrasonic cleaning in cold fluid and another shower with warm fluid.

In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the monitored torque to regulate the pressure applied to the wafer by the brush. Open loop positioning or closed loop control may be employed.

The invention discloses automatic glass cleaning equipment which is used for cleaning a glass piece automatically. The automatic glass cleaning equipment comprises a feeding assembly, a pre-spraying assembly, at least one rolling brush assembly, a water spraying assembly, an air drying assembly, a drying assembly and a discharging assembly. The automatic glass cleaning equipment has the advantages of being good in cleaning effect and the like which are not possessed by existing equipment.

A system cleans a set of optical connectors. The system includes a fluid source, a vacuum source, a support member which defines a cleaning device edge, and a set of cleaning devices. Each cleaning device includes (i) a fluid intake member which connects to the fluid source, (ii) a fluid output member which connects to the vacuum source, and (iii) a cleaning head which connects to the fluid intake member and the fluid output member. Each cleaning device is disposed along the cleaning device edge of the support member. The set of cleaning devices is configured to (a) align over a set of optical interfaces of the set of optical connectors, (b) direct fluid (e.g., gas, gaseous snow, etc.) from the fluid source toward the set of optical interfaces, and (c) draw the directed fluid away from the set of optical interfaces and toward the vacuum source.

The invention discloses a fully-automatic LCD (Liquid Crystal Display) terminal cleaning machine. The fully-automatic LCD terminal cleaning machine comprises a table plate, a charging belt line device, a charging manipulator, a material transmission unit, a CCD (Charge Coupled Device) image pickup mechanism, a dustproof cloth cleaning mechanism, a plasma cleaning mechanism and a discharging manipulator, wherein the charging belt line device, the charging manipulator, the material transmission unit, the CCD image pickup mechanism, the dustproof cloth cleaning mechanism, the plasma cleaning mechanism and the discharging manipulator are sequentially mounted on the table plate. The fully-automatic LCD terminal cleaning machine has higher LCD terminal cleaning efficiency and accuracy, and increase of the production cost caused by manual operation and harm to the human health caused by chemicals are avoided.

A cleaning system comprises a chamber and a particle-removing device. The particle-removing device, arranged outside the chamber, including an ionizer ionizing surrounding gas and spouting the ionized gas and a vacuum unit. Whereby, before an substrate is sent into the chamber, the ionized gas spouted from the ionizer neutralizes electrostatic charges and blowing up particles accumulate on the substrate and the particles are drawn away by the vacuum unit so that the object can be transmitted into the chamber much cleaner.

Aspects of the invention generally provide methods and apparatus for cleaning adhesive residual on a photomask substrate. In one embodiment, the apparatus includes a processing cell, a support assembly configured to receive a photomask substrate disposed thereon disposed in the processing cell, a protection head assembly disposed above and facing the support assembly, and a head actuator configured to control the elevation of the protection head assembly relative to an upper surface of the support assembly. A cleaning device is provided and positioned to interact with the photomask substrate disposed on the support assembly. In another embodiment, a method of cleaning a periphery region of a photomask substrate includes providing a photomask substrate having a periphery portion and a center portion disposed on a support assembly in a processing cell, lowering a protection cover disposed in the processing cell to cover the center portion of the photomask substrate, providing a brush in the processing cell to clean the periphery portion of the photomask substrate.

The invention relates to a kind of plaque surface cleaning device, which can shorten time for pipeline process though used for big plaque, and have few spoors on it. The invention consists of device for bracing and carrying the plaque, and device for cleaning the plaque. The former includes many rollers, which are below the liquid crystal panel and supports it, sending the panel in and out in Y direction. The latter includes track cleaning-band that is fixed above center of the supporting and carrying device, drive gear and driven gear that both enwind the cleaning band and give it set force, and drive motor which connects the drive gear and turns the cleaning band to clean. The cleaning band moves on the glass board that used for the liquid crystal panel. The direction in which the cleaning band moves crosses that in which the liquid crystal panel is carried.

The invention discloses a two-phase-flow atomized-spray washing device and a two-phase-flow atomized-spray washing method. A plurality of liquid branching pipelines provided with liquid guide outlets with a preset angle, and an air discharging screen plate provided with a vertical air guide outlet are arranged inside a nozzle main body, so that ejected high-speed liquid flow and high-speed air flow interact fully to form ultra-micro atomized liquid drops which are uniform and adjustable in particle size; under the acceleration and guidance effect of an atomized particle guide outlet, the ultra-micro atomized liquid drops are downwards ejected towards a wafer surface to realize mobile atomization washing. The device and the method disclosed by the invention are capable of greatly reducing the size of atomized particles and reducing energy of the atomized particles, so that damages of a graphic structure of the wafer surface can be prevented, the washing quality and washing efficiency can be improved, and the washing cost can be lowered.