Glass ceramic cover plate and display screen and terminal comprising same
By forming an acid and alkali resistant dielectric film layer and a silica layer on the microcrystalline glass cover, the surface roughness problem caused by the poor acid and alkali resistance of the microcrystalline glass cover during the cleaning process is solved, the dynamic friction and wear resistance are improved, and the user experience is enhanced.
Patent Information
- Application Number
- CN202423298039.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-27
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2034-12-27
AI Technical Summary
Existing microcrystalline glass covers have poor acid and alkali resistance during cleaning, which leads to a decrease in surface roughness, affecting the performance of the anti-fingerprint film and silicon oxide film, resulting in unstable dynamic friction and wear resistance.
An acid and alkali resistant dielectric film layer with a thickness of 5nm to 30nm is formed on the surface of the microcrystalline glass body as a protective layer. In addition, a silicon dioxide layer and an anti-fingerprint film layer are formed through sputtering and evaporation processes to ensure that the glass is not corroded by acids and alkalis during cleaning and to improve surface smoothness and film adhesion.
It effectively protects the surface of the microcrystalline glass, ensuring that the cleaning process does not affect the surface quality, improves the wear resistance and dynamic friction characteristics of the microcrystalline glass cover, and enhances the user experience.
Smart Images

Figure CN223866543U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of microcrystalline glass products technology, and in particular to a microcrystalline glass cover plate and a display screen and terminal including the microcrystalline glass cover plate. Background Technology
[0002] Microcrystalline glass is a glass material with a micron-scale crystal structure. Its surface possesses excellent optical, mechanical, and thermal properties, making it widely used in various fields. Furthermore, due to its significantly increased drop resistance compared to ordinary glass, the market demand for microcrystalline glass has been growing rapidly in recent years. For example, its superior physical properties, durability, and aesthetics have made it the preferred material for the front and back covers of many high-end mobile phones. To improve the user experience, mobile phone and tablet panels typically have an anti-fingerprint (AF) coating applied to enhance their resistance to dirt and improve their lubrication properties.
[0003] In existing technologies, a silicon oxide film is typically coated onto a microcrystalline glass substrate, followed by electroplating of an anti-fingerprint (AF) film. A common characteristic of existing microcrystalline glass substrates is that they cannot withstand excessively strong acids or alkalis during cleaning. Strong acids or alkalis will corrode the microcrystalline glass, altering its surface microstructure and significantly worsening its surface roughness. Once the surface roughness deteriorates, the dynamic friction and abrasion resistance of the electroplated silicon oxide film and AF film will decrease and eventually fail, exceeding product specifications. Given this characteristic of microcrystalline glass, existing technologies primarily use neutral cleaning agents. However, neutral solutions are difficult to thoroughly clean stubborn stains left after screen printing and baking. In contrast, standard glass covers are typically soaked in an alkaline solution (or stripping solution) after screen printing and before electroplating. This removes stubborn stains left after ink baking before applying the fingerprint coating, resulting in stable performance. Microcrystalline products, however, can only be cleaned with neutral solutions. The actual electroplating results are significantly inferior in performance, and the wear resistance is highly inconsistent. Strong acids and alkalis damage the surface of microcrystalline glass, while neutral solutions are insufficient for thorough cleaning, posing a major challenge to the processing of microcrystalline products.
[0004] Therefore, a new solution is needed. Utility Model Content
[0005] The main objective of this invention is to address the problem of poor dynamic friction and abrasion resistance of existing microcrystalline glass covers containing anti-fingerprint films, and to provide a microcrystalline glass cover and a display screen and terminal containing the microcrystalline glass cover.
[0006] To achieve the above objectives, this utility model provides a microcrystalline glass body, an acid and alkali resistant dielectric film layer, a silicon dioxide layer, and an anti-fingerprint film layer. The acid and alkali resistant dielectric film layer is disposed on the surface of the microcrystalline glass body, the silicon dioxide layer is disposed on the surface of the acid and alkali resistant dielectric film layer away from the microcrystalline glass body, and the anti-fingerprint film layer is formed on the surface of the silicon dioxide layer away from the acid and alkali resistant dielectric film layer.
[0007] In the microcrystalline glass cover provided by this utility model, the acid and alkali resistant dielectric film layer is selected from one of silicon oxide, silicon nitride or silicon carbide.
[0008] In the microcrystalline glass cover provided by this utility model, the thickness of the acid and alkali resistant medium film layer is in the range of 5nm to 30nm.
[0009] In the microcrystalline glass cover provided by this utility model, the thickness of the silicon dioxide layer is in the range of 10nm to 20nm.
[0010] In the microcrystalline glass cover provided by this utility model, the thickness of the anti-fingerprint film layer is greater than 15nm.
[0011] This utility model also provides a display screen, including a display screen module and a microcrystalline glass cover plate as described above covering the display screen module.
[0012] This utility model also provides a terminal including the microcrystalline glass cover plate as described above.
[0013] The glass panel provided by this utility model has the following beneficial effects: In the microcrystalline glass cover provided by this utility model, an acid and alkali resistant dielectric film layer is first formed on the microcrystalline glass body by sputtering. This acid and alkali resistant dielectric film layer serves as both the underlayer and the protective layer for the electroplated surface of the microcrystalline glass body. After the acid and alkali resistant dielectric film layer is electroplated, the product is fed to the next process normally. After the blanking and screen printing are completed, the second layer of material, silicon dioxide, is electroplated on the vapor deposition machine, and finally an anti-fingerprint film layer is electroplated. The acid and alkali resistant dielectric film layer protects the processed surface of the microcrystalline glass body, allowing the microcrystalline glass to be cleaned normally during the blanking, screen printing, and AF film plating processes, avoiding the need for a re-polishing process due to roughness deterioration. Thus, the flatness of the surface of the microcrystalline glass cover is guaranteed, and the full hydrolysis of the AF film and silicon dioxide is enhanced, greatly improving the wear resistance and dynamic friction characteristics of the microcrystalline glass cover. Attached Figure Description
[0014] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.
[0015] Figure 1 The diagram shown is a structural schematic of a microcrystalline glass cover plate provided in an embodiment of this utility model. Detailed Implementation
[0016] To facilitate understanding of this utility model, a more complete description will be given below with reference to the accompanying drawings. The drawings illustrate typical embodiments of this utility model. However, this utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to make the disclosure of this utility model more thorough and complete.
[0017] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
[0018] Figure 1 The diagram shown is a structural schematic of a glass panel provided in an embodiment of this utility model. Figure 1As shown, the microcrystalline glass cover plate design provided by this utility model is specifically designed for the screen protection needs of electronic products (such as mobile phones, tablets, etc.). It adopts a multi-layer composite structure to improve its durability, stain resistance, and tactile quality. The structure of the microcrystalline glass cover plate includes a microcrystalline glass body 100, an acid and alkali resistant dielectric film layer 200, a silica layer 300, and an anti-fingerprint film layer 400. Among them, the microcrystalline glass body 100 serves as the base material, providing sufficient hardness and transparency, and is the main supporting structure of the cover plate. The acid and alkali resistant dielectric film layer 200 is deposited on the surface of the microcrystalline glass body using sputtering coating technology. Its main function is to provide protection against acid and alkali corrosion during subsequent processing, especially damage during the cleaning process. It not only acts as a base layer but also protects the surface of the microcrystalline glass body from damage, improves surface cleanliness, and avoids the need for polishing or reprocessing in subsequent processes due to excessive surface roughness. The silicon dioxide layer 300, formed on top of the acid and alkali resistant dielectric film layer 200, is created through a vapor deposition process. Silicon dioxide itself possesses excellent hardness and wear resistance, further enhancing the scratch resistance and overall durability of the microcrystalline glass cover. The anti-fingerprint film layer 400 is typically formed using coating technology. This film effectively reduces the adhesion of fingerprints and smudges, keeping the screen surface cleaner and improving the user experience.
[0019] Specifically, in one embodiment of this invention, the thickness of the acid and alkali resistant dielectric film layer 200 is controlled between 5 nm and 30 nm to ensure optimal functionality. The thickness of this film layer needs to balance several factors: if the film layer is too thick, it may affect the adhesion of subsequent film layers, thereby reducing the stability of the entire composite film structure; while if the film layer is too thin, the microcrystalline glass may be damaged during acid and alkali cleaning, affecting the performance and quality of the cover plate. In this embodiment, the acid and alkali resistant dielectric film layer 200 can be selected from silicon oxide, silicon nitride, or silicon carbide as the material. The specific material selection depends on the end-use requirements of the cover plate, such as different requirements for hardness, scratch resistance, corrosion resistance, or cost. Each material improves durability while ensuring the adhesion and chemical stability of the film layer, thereby avoiding problems during the production process.
[0020] In this invention, after the microcrystalline glass body is strengthened, an acid- and alkali-resistant dielectric film is electroplated using a sputtering machine before acid and alkali cleaning. This increases the film's density, hardness, and corrosion resistance, improving the adhesion and smoothness of the final processed film. By using the acid- and alkali-resistant dielectric film to protect the surface of the microcrystalline glass body, subsequent processing difficulties caused by roughness issues during production are avoided, while also improving the surface smoothness of the microcrystalline glass. The thickness of the acid- and alkali-resistant dielectric film 200 is designed between 5nm and 30nm to ensure sufficient protection without affecting the adhesion of subsequent films. Furthermore, the use of materials such as silicon oxide, silicon nitride, or silicon carbide effectively improves the durability, corrosion resistance, and surface stability of the microcrystalline glass cover, making the cover more durable and resistant to contamination in actual use.
[0021] Furthermore, in one embodiment of this utility model, after electroplating the first acid and alkali resistant dielectric film layer 200, the product normally enters the next process for processing such as white film and screen printing. After completing these steps, the next step is the evaporation of silicon oxide. Before evaporating silicon oxide, an ion source surface treatment is performed for 5-10 minutes to remove surface impurities and oxides, ensuring that silicon oxide can be uniformly deposited and has good adhesion during the evaporation process. Before starting the evaporation, the vacuum degree inside the evaporation machine must be ensured to reach the preset value. The thickness of the evaporated silicon oxide should be controlled between 10 nanometers and 20 nanometers. Within this thickness range, the silicon oxide film layer can effectively provide protection and ensure the required corrosion resistance and mechanical strength. If the film layer is too thick, it will lead to a decrease in the abrasion resistance of the film layer, increase the internal stress between the film layer and the substrate, and may cause the film layer to peel or crack, reducing the service life and reliability of the product. If the film layer is too thin, the hydrolysis reaction of the silicon oxide film in subsequent use will be insufficient, which may reduce its corrosion resistance and scratch resistance, thereby affecting the long-term durability of the product.
[0022] In this embodiment, after the acid and alkali resistant dielectric film layer 200 is electroplated, the product is fed to the next process as usual. After the white film and screen printing are completed, it is transferred to the evaporation machine for silicon oxide electroplating. Before silicon oxide evaporation, an ion source surface treatment is required for 5-10 minutes. Once the vacuum degree reaches the preset value, evaporation begins. The thickness of the evaporated silicon oxide is controlled between 10 nanometers and 20 nanometers. If it is too thick, the abrasion resistance will decrease; if it is too thin, the hydrolysis reaction of AF will not be sufficient.
[0023] This utility model also provides a display screen, which includes... Figure 1 The diagram shows a microcrystalline glass cover plate and a display module, with the microcrystalline glass cover plate covering the display module. Specifically, in this embodiment of the invention, the display screen can be a touch display screen.
[0024] This utility model also provides a terminal, which includes Figure 1The microcrystalline glass cover shown is applicable to devices including, but not limited to, mobile phones, tablets, smart wearable products, and other products that require the use of microcrystalline glass covers.
[0025] The microcrystalline glass cover plate of this invention is prepared by the following method:
[0026] After the microcrystalline glass body is strengthened and re-polished, and before the white sheet and screen-printed glass are alkaline washed, it should be cleaned with neutral chemical solution. If the original material is still difficult to clean due to dirt, it should first be cleaned with alkaline QX003 (pH 11-12, temperature 60±5℃, cleaning time within 60 seconds). Then, it should be cleaned again with neutral chemical solution using ultrasonic or flatbed cleaning. After ensuring the glass is clean, an acid and alkali resistant dielectric film layer should be electroplated, with a thickness controlled between 5-30nm. During electroplating, taking a magnetron sputtering machine as an example, the vacuum coating machine should first be evacuated to a vacuum degree of 1.0-10. -3 Pa, initiate RF oxygenation 180 for ion cleaning for 2 minutes, then continue vacuuming and wait until the vacuum level reaches 7.0*10. -4 At Pa, the coating process begins with a silicon target power of 7KW, target gas, and argon gas at 250, depositing a 5-30 nm acid and alkali resistant dielectric film. After the first acid and alkali resistant dielectric film is applied, the glass undergoes normal whitening, screen printing, cleaning, inspection, and printing. After printing, it is normally passed through a flatbed or ultrasonic cleaning system, during which normal acid and alkali cleaning is possible without affecting the flatness of the microcrystalline glass surface. After cleaning, the product undergoes full inspection in a Class 1000 cleanroom, is arranged, and placed in a coating pan onto the coating machine. Sputtering or evaporation machines can be used, but a machine with excellent vacuum performance and the ability to vaporize both the silicon oxide underlayer and the AF layer in a single pass is required to ensure adhesion between the silicon oxide and AF layers. Taking the Han 2050 evaporation machine as an example, during electroplating, the machine first undergoes 5-8 minutes of ion source cleaning to achieve an initial vacuum of 3.0*10. -5 When the torque is below Torr, begin evaporating the silicon oxide coating agent. The thickness of the evaporated silicon oxide film is controlled at 10-20 nm. Then apply the AF coating agent. The thickness of the AF film is controlled at 15 nm or more. Depending on the customer's requirements for the friction effect, the dosage and film thickness of the long-lasting AF agent need to be appropriately increased to ultimately achieve the performance required by the customer's drawings.
[0027] The dynamic friction coefficient was tested using a friction coefficient peel tester. The experimental method was as follows: (1) Load 200g + / - 20g (original load solid weight + cashmere felt + 2cm*2cm thin glass sheet + 2cm*2cm double-sided tape + 2cm*2cm test paper); (2) Test instrument (MX D-02); (3) Fix the test sample, and after the instrument is started, the load solid moves to generate a value (test speed: 100mm / min, test distance: 50mm); (4) After the protective film of the sample is removed, wipe the surface with a lint-free cloth dipped in alcohol, and test after the surface moisture dries; (5) Each product is tested 3 times, and the qualification criterion is: Excellent Good. Table 1 shows the dynamic friction test results of 10 microcrystalline glass covers cleaned with a special neutral plate for microcrystalline glass; Table 2 shows the dynamic friction test results of 10 microcrystalline glass covers cleaned with a conventional alkaline plate. As shown in Tables 1 and 2, the coefficient of dynamic friction of the microcrystalline glass cover plates prepared by cleaning with a special neutral plate for microcrystalline glass or by cleaning with an alkaline plate made of conventional materials both meet the judgment criteria.
[0028] Table 1
[0029]
[0030] Table 2
[0031]
[0032] Wear resistance performance was tested using an abrasion testing machine. The experimental method was as follows: (1) Initial water droplet angle test of the Cover glass coating surface, five test points were evenly selected; (2) Rub with an eraser, with a force of 1000g, a speed of 40cycle / min, a test stroke of 3000 cycles, and repeated test; (3) Three points were selected in the area after the eraser was rubbed (the friction area was divided into 5 parts, and one point was tested in each of the middle three parts); (4) Test point selection (starting point) test process (vertical pressure of 1000g) water droplet angle test, judgment criteria: initial water droplet angle ≥110°, 5 test points were selected for the sample. Table 3 shows the dynamic friction test results of 6 microcrystalline glass covers cleaned with a microcrystalline special neutral plate; Table 4 shows the dynamic friction test results of 6 microcrystalline glass covers cleaned with a conventional material alkaline plate. As shown in Tables 3 and 4, the wear resistance performance of microcrystalline glass covers prepared by cleaning with a microcrystalline special neutral plate or by cleaning with a conventional material alkaline plate met the judgment criteria.
[0033] Table 3
[0034]
[0035] Table 4
[0036]
[0037] Numerous specific details are set forth in the specification provided herein. However, it will be understood that embodiments of the present invention may be practiced without these specific details. In some instances, well-known methods, structures, and techniques have not been shown in detail so as not to obscure the understanding of this specification.
[0038] Similarly, it should be understood that, in order to simplify this disclosure and aid in understanding one or more of the various aspects of the invention, in the above description of exemplary embodiments of the invention, various features of the invention are sometimes grouped together in a single embodiment, figure, or description thereof. However, this method of disclosure should not be interpreted as reflecting an intention that the claimed invention requires more features than are expressly recited in each claim. Rather, as reflected in the following claims, the inventive aspect lies in fewer than all features of a single foregoing disclosed embodiment. Therefore, the claims following the detailed description are hereby expressly incorporated into that detailed description, wherein each claim itself is a separate embodiment of the invention.
[0039] Furthermore, those skilled in the art will understand that although some embodiments herein include certain features included in other embodiments but not others, combinations of features from different embodiments are intended to be within the scope of this invention and form different embodiments. For example, in the following claims, any of the claimed embodiments can be used in any combination.
[0040] It should be noted that the above embodiments are illustrative of the present invention and not restrictive, and that those skilled in the art can devise alternative embodiments without departing from the scope of the appended claims. In the claims, any reference signs placed between parentheses should not be construed as limiting the claims. The word "comprising" does not exclude the presence of elements or steps not listed in the claims. The word "a" or "an" preceding an element does not exclude the presence of a plurality of such elements. The present invention can be implemented by means of hardware comprising several different elements and by means of a suitably programmed computer. In the unit claims enumerating several means, several of these means may be embodied by the same item of hardware. The use of the words first, second, and third, etc., does not indicate any order. These words can be interpreted as names.
Claims
1. A microcrystalline glass cover, characterized in that, The device includes a microcrystalline glass body, an acid and alkali resistant dielectric film layer, a silicon dioxide layer, and an anti-fingerprint film layer. The acid and alkali resistant dielectric film layer is disposed on the surface of the microcrystalline glass body, the silicon dioxide layer is disposed on the surface of the acid and alkali resistant dielectric film layer away from the microcrystalline glass body, and the anti-fingerprint film layer is formed on the surface of the silicon dioxide layer away from the acid and alkali resistant dielectric film layer.
2. The microcrystalline glass cover plate as described in claim 1, characterized in that, The acid and alkali resistant dielectric film is selected from one of silicon oxide, silicon nitride, or silicon carbide.
3. The microcrystalline glass cover plate as described in claim 1, characterized in that, The thickness of the acid and alkali resistant dielectric film is in the range of 5 nm to 30 nm.
4. The microcrystalline glass cover plate as described in claim 1, characterized in that, The thickness of the silicon dioxide layer is in the range of 10 nm to 20 nm.
5. The microcrystalline glass cover plate as described in claim 1, characterized in that, The thickness of the anti-fingerprint film is greater than 15 nm.
6. A display screen, characterized in that, It includes a display module and a microcrystalline glass cover plate as described in any one of claims 1-5 covering the display module.
7. A terminal comprising a microcrystalline glass cover as described in any one of claims 1-5.