Anti-reflection glass, preparation method thereof and glass cover plate

Abstract

The invention relates to anti-reflection glass, a preparation method thereof and a glass cover plate. The preparation method of the anti-reflection glass comprises the following steps: carrying out a liquid phase deposition reaction on the surface of a glass substrate by using a reaction liquid to form an organic anti-reflection film; wherein the reaction liquid contains polar organic matters with the mass ratio of 1%-50%; the polar organic matter contains hydroxyl and / or carboxyl; the refractive index of the polar organic matter is lower than that of the glass substrate and higher than that of air; the temperature of the liquid phase deposition reaction is 55-135 DEG C, and the time of the liquid phase deposition reaction is greater than or equal to 2 minutes. The selected polar organic matter can be connected with silicon hydroxyl on the surface of the glass substrate through hydrogen-bond interaction in the liquid phase deposition reaction process, so that the organic antireflection film attached to the surface of the glass substrate is formed, the incident angle of incident light is reduced through the destructive interference principle, the reflectivity is reduced, and the transmittance of the antireflection glass is improved.

Description

Technical Field

[0001] This application relates to the technical field of display panels, and in particular to an anti-reflective glass, a method for preparing the same, and a glass cover plate. Background Technology

[0002] Glass covers, characterized by high transmittance and high hardness, are widely used in display covers for various electronic devices. With the continuous updates and iterations in the mobile phone industry, the raw materials for glass covers have also been continuously optimized. However, the optimization has mainly focused on the mechanical strength of the raw materials, and the transmittance of glass covers has not seen significant improvement, remaining around 91% for a long time.

[0003] In the glass deep processing industry, vacuum coating is typically used to form an anti-reflective coating (AR film) on a glass substrate to improve the transmittance of glass products. However, the vacuum coating process is cumbersome and complex, with high production costs, and extremely strict requirements on the thickness of the anti-reflective film. Even slight fluctuations in the thickness can lead to color abnormalities, thereby reducing product yield. Summary of the Invention

[0004] Therefore, it is necessary to provide an antireflective glass, its preparation method, and a glass cover plate to overcome the problems of cumbersome and complex processes, high preparation costs, and low product yield of vacuum coating technology.

[0005] The above-mentioned objective of this application is achieved through the following technical solution:

[0006] In a first aspect, this application provides a method for preparing antireflective glass, comprising the following steps:

[0007] An organic antireflective film is formed by liquid-phase deposition of a reaction solution on the surface of a glass substrate.

[0008] The reaction solution contains polar organic matter at a mass ratio of 1% to 50%.

[0009] The polar organic compound contains hydroxyl and / or carboxyl groups;

[0010] The refractive index of the polar organic material is lower than that of the glass substrate, and the refractive index of the polar organic material is higher than that of air.

[0011] The temperature of the liquid phase deposition reaction is 55℃~135℃, and the time of the liquid phase deposition reaction is ≥2min.

[0012] In one embodiment, the polar organic compound includes one or more of ethylene glycol, glycerol, acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, fumaric acid, citric acid, and acrylic acid.

[0013] In one embodiment, the polar organic compound includes one or more of acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, and citric acid.

[0014] In one embodiment, the polar organic compound includes one or more of acetic acid, itaconic acid, maleic acid, and fumaric acid.

[0015] In one embodiment, the reaction solution further includes the following components in the indicated mass percentages:

[0016] .

[0017] In one embodiment, the chelating agent includes one or more of ethylenediaminetetraacetic acid, sodium gluconate, and sodium citrate.

[0018] In one embodiment, the organic solvent includes one or more of ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, and ethyl acetate.

[0019] In a second aspect, this application provides an antireflective glass, which is prepared using the antireflective glass preparation method described above.

[0020] In one embodiment, the antireflective glass has a transmittance of ≥93% at 550 nm.

[0021] In a third aspect, this application provides a glass cover comprising the anti-reflective glass described above.

[0022] This application has at least the following beneficial effects:

[0023] The polar organic compounds selected in this application contain hydroxyl (-OH) and / or carboxyl (-COOH) groups. During the liquid-phase deposition reaction, they connect with silanol groups (-Si-OH) on the glass substrate surface through hydrogen bonding, thereby forming an organic antireflective film attached to the glass substrate surface. The refractive index of the polar organic compound is between that of the glass substrate and that of air; therefore, the refractive index of the deposited organic antireflective film is also between that of the glass substrate and that of air. Furthermore, by controlling the mass ratio of the polar organic compound in the reaction solution and by regulating the temperature and time of the liquid-phase deposition reaction, an organic antireflective film of suitable thickness can be formed. This reduces the incident angle of incident light and lowers the reflectivity based on the principle of destructive interference, thereby improving the transmittance of the antireflective glass. In addition, the preparation method of this application is simple, uses inexpensive and readily available raw materials, has low equipment requirements, and produces a high product yield, which is conducive to large-scale industrial applications. Detailed Implementation

[0024] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, a detailed description of specific embodiments of this application is provided below. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0025] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0027] In this application, "at least one" means one or more, such as one, two, or more. "Multiple" or "several" means at least two, such as two, three, etc., and "multi-layered" means at least two layers, such as two layers, three layers, etc., unless otherwise explicitly specified. In the description of this application, "several" means at least one, such as one, two, etc., unless otherwise explicitly specified.

[0028] When a numerical range is disclosed herein, the range is considered continuous and includes the minimum and maximum values ​​of the range, as well as every value between the minimum and maximum values. Furthermore, when the range refers to integers, it includes every integer between the minimum and maximum values ​​of the range. Additionally, when multiple ranges are provided to describe a feature or characteristic, the ranges may be combined. In other words, unless otherwise specified, all ranges disclosed herein should be understood to include any and all subranges to which they are incorporated.

[0029] Unless otherwise specified, all steps in this application may be performed sequentially or randomly. For example, the method includes steps (a) and (b), indicating that the method may include steps (a) and (b) performed sequentially, or it may include steps (b) and (a) performed sequentially. For example, the method may also include step (c), indicating that step (c) may be added to the method in any order. For example, the method may include steps (a), (b), and (c), or it may include steps (a), (c), and (b), or it may include steps (c), (a), and (b), etc.

[0030] In this application, "above" or "below" includes the number itself. For example, "below 1" includes 1.

[0031] Unless otherwise specified, the temperature parameters in this application are permitted to be either constant-temperature treatment or variations within a certain temperature range. It should be understood that the constant-temperature treatment allows temperature fluctuations within the precision range of the instrument control, such as ±5℃, ±4℃, ±3℃, ±2℃, or ±1℃.

[0032] In this application, room temperature refers to indoor temperature, normal temperature or general temperature. Generally speaking, the range of room temperature can be any of the following temperature ranges: (1) 23℃±2℃; (2) 25℃±5℃; (3) 20℃±5℃.

[0033] Currently, in the glass deep processing industry, vacuum coating technology is commonly used to deposit an antireflective film on a glass substrate to improve the transmittance of glass products. There are reports of using magnetron sputtering coating technology to sequentially form SiN on a glass substrate. x Layers, ZnAl layers, Ag layers, NiCr layers, ZnAl layers, ZnSn layers, SiNx layers, and ZrO x Layers are used to produce coated glass with a light transmittance of 80%~86% and good oxidation resistance. Reports indicate that magnetron sputtering deposition technology is used to sequentially deposit TiO2, SiO2, TiO2, and SiO2 layers on both sides of a white glass substrate, thus producing double-sided coated glass with a transmittance of 99.6% at 550nm and an average transmittance of 97.4% in the visible light region.

[0034] However, current vacuum coating technology is cumbersome and complex, with very high requirements for the coating environment and equipment. The operation and maintenance costs of the coating equipment are high, and the coating materials are expensive, resulting in high production costs for antireflective glass. Furthermore, when using vacuum coating technology to prepare antireflective films, the thickness requirements are extremely precise; even slight fluctuations in thickness can lead to color abnormalities, thereby reducing the yield of antireflective glass.

[0035] Based on this, the first aspect of this application provides a method for preparing antireflective glass to overcome the problems of cumbersome and complex processes, high preparation costs, and low product yield of vacuum coating technology.

[0036] In some embodiments, the method for preparing antireflective glass includes the following steps:

[0037] An organic antireflective film is formed by liquid-phase deposition of a reaction solution on the surface of a glass substrate.

[0038] The reaction solution contains polar organic matter with a mass ratio of 1% to 50%.

[0039] Polar organic compounds contain hydroxyl and / or carboxyl groups;

[0040] The refractive index of polar organic materials is lower than that of glass substrates, and the refractive index of polar organic materials is higher than that of air.

[0041] The temperature of the liquid phase deposition reaction is 55℃~135℃, and the time of the liquid phase deposition reaction is ≥2min.

[0042] The polar organic compounds selected in this application contain hydroxyl (-OH) and / or carboxyl (-COOH) groups. During the liquid-phase deposition reaction, they connect with silanol groups (-Si-OH) on the glass substrate surface through hydrogen bonding, thereby forming an organic antireflective film attached to the glass substrate surface. The refractive index of the polar organic compound is between that of the glass substrate and that of air; therefore, the refractive index of the deposited organic antireflective film is also between that of the glass substrate and that of air. Furthermore, by controlling the mass ratio of the polar organic compound in the reaction solution and by regulating the temperature and time of the liquid-phase deposition reaction, an organic antireflective film of suitable thickness can be formed. This reduces the incident angle of incident light and lowers the reflectivity based on the principle of destructive interference, thereby improving the transmittance of the antireflective glass. In addition, the preparation method of this application is simple, uses inexpensive and readily available raw materials, has low equipment requirements, and produces a high product yield, which is conducive to large-scale industrial applications.

[0043] Understandably, the thickness of an organic antireflective film is ≥λ / 4. Here, λ is the wavelength of the light to be antireflected, typically in the visible light band (λ = 380 nm ~ 760 nm). Therefore, the thickness of the organic antireflective film is at least 95 nm ~ 190 nm. Due to the difficulty in measuring the thickness of organic antireflective films, this application controls the thickness by adjusting the concentration of polar organic compounds, the temperature and time of the liquid-phase deposition reaction, and uses the transmittance in the visible light band to characterize its antireflective effect.

[0044] Understandably, if the concentration of polar organic compounds in the reaction solution is too low, the thickness of the formed organic anti-reflection membrane will be too thin, resulting in poor permeability improvement; conversely, if the concentration of polar organic compounds in the reaction solution is too high, the thickness of the formed organic anti-reflection membrane will be too high, which is also detrimental to improving permeability. Specifically, the mass percentage of polar organic compounds in the reaction solution is 1% to 50%, including but not limited to: 1%, 2%, 5%, 8%, 10%, 12%, 15%, 18%, 20%, 25%, 30%, 35%, 40%, 45%, and 50%. Further optionally, the mass percentage of polar organic compounds in the reaction solution is 2% to 20%. Even further optionally, the mass percentage of polar organic compounds in the reaction solution is 5% to 12%.

[0045] Understandably, if the liquid phase deposition temperature is too low, the resulting organic antireflective film will be too thin, resulting in poor permeability improvement. Conversely, if the liquid phase deposition temperature is too high, the reaction system will boil excessively, leading to poor reactivity and unsatisfactory thickness and uniformity of the resulting organic antireflective film, which is also detrimental to permeability improvement. Specifically, the liquid phase deposition temperature is 55℃~135℃, including but not limited to: 55℃, 60℃, 65℃, 70℃, 75℃, 80℃, 85℃, 90℃, 95℃, 100℃, 105℃, 110℃, 115℃, 120℃, 125℃, 130℃, and 135℃. Further optionally, the liquid phase deposition temperature is 60℃~110℃. Even further optionally, the liquid phase deposition temperature is 60℃~80℃.

[0046] Understandably, if the liquid phase deposition reaction time is too short, the thickness of the formed organic antireflection film will be too low, resulting in a poor improvement in permeability. Specifically, the liquid phase deposition reaction time is ≥2 min, including but not limited to: 2 min, 4 min, 6 min, 8 min, 10 min, 15 min, 20 min, 25 min, 30 min, 35 min, 40 min, 45 min, 50 min, 60 min, 70 min, 80 min, 90 min, and 100 min. Further optionally, the liquid phase deposition reaction time is 2 min to 60 min. Even further optionally, the liquid phase deposition reaction time is 20 min to 40 min.

[0047] Understandably, different types of glass have different refractive indices. Ordinary glass (silicate glass) has a refractive index of approximately 1.5; low-refractive-index glass typically has a refractive index below 1.4, while high-refractive-index glass typically has a refractive index above 2.0; optical glass has a refractive index ranging from 1.45 to 1.90. The refractive index of air is approximately 1. Therefore, the refractive index of polar organic materials is greater than 1 and less than that of the glass substrate. When the glass substrate is ordinary glass, the refractive index of polar organic materials is between 1 and 1.5.

[0048] The glass substrate material includes one or more of the following: quartz glass, soda-lime glass, lead-barium glass, borosilicate glass, aluminosilicate glass, lithium aluminum-silicon glass, and microcrystalline glass. Furthermore, the glass substrate can be selected from glass processed at different stages, including but not limited to: CNC-processed glass, polished glass, tempered glass, and screen-printed glass.

[0049] Optionally, before performing the liquid phase deposition reaction, the following steps are also included: activating the glass substrate using an alkaline activation method or a plasma bombardment method to increase the silanol content on the surface of the glass substrate, thereby increasing the film-substrate adhesion between the organic antireflective film and the glass substrate.

[0050] Optionally, the polar organic compound includes one or more of ethylene glycol, glycerol, acetic acid, fumaric acid (fumaric acid), itaconic acid, oxaloacetic acid, maleic acid, citric acid, and acrylic acid. Further optionally, the polar organic compound includes one or more of acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, and citric acid. Still further optionally, the polar organic compound includes one or more of acetic acid, fumaric acid, itaconic acid, and maleic acid.

[0051] The refractive indices of the following organic compounds are approximately 1.42–1.43: ethylene glycol, glycerol, acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, citric acid, and acrylic acid. Appropriate polar organic compounds can be selected based on the material and refractive index of the glass substrate to prepare organic antireflective films.

[0052] Acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, and citric acid are all organic acids containing carboxyl groups (-COOH). They not only have hydrogen bonding with -Si-OH, but can also undergo condensation reactions with -Si-OH to generate organic acid silicates, such as silica fumarate, silica itaconic acid, and silica maleate. This is beneficial for enhancing the adhesion between the organic antireflective membrane and the glass substrate.

[0053] Optionally, the reaction solution may also include the following components in the indicated mass percentages:

[0054] .

[0055] Understandably, the chelating agent comprises 1% to 5% by mass in the reaction solution, including but not limited to: 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, and 5%, and further optionally 3% to 5%. The organic solvent comprises 2% to 5% by mass in the reaction solution, including but not limited to: 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, and 5%, and further optionally 2% to 3%. The water comprises 40% to 90% by mass in the reaction solution, including but not limited to: 40%, 45%, 50%, 55%, 60%, 65%, 70%, 75%, 80%, 85%, and 90%, and further optionally 72% to 90%, and even further optionally 80% to 90%.

[0056] Optionally, the chelating agent includes one or more of ethylenediaminetetraacetic acid (EDTA), sodium gluconate, and sodium citrate, and is further optionally sodium gluconate.

[0057] In this process, the chelating agent undergoes a chelation reaction with impurity metal ions that may be present in the reaction solution, effectively reducing the hardness of the water, thereby reducing the impact of water quality on the film formation process, improving the membrane quality of the organic antireflective membrane, and reducing the product defect rate after liquid phase deposition.

[0058] Optionally, the organic solvent includes one or more of ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, and ethyl acetate, and is further optionally ethylene glycol monomethyl ether.

[0059] Organic solvents promote the complete dissolution of polar organic compounds that are insoluble or slightly soluble in water into the reaction solution, thereby providing a uniform and stable reaction environment and avoiding uneven film formation caused by incomplete dissolution of polar organic compounds.

[0060] Optionally, the water includes one or more of tap water, deionized water, pure water, ultrapure water, distilled water, and reverse osmosis water, and may further be pure water.

[0061] In a second aspect, this application provides an antireflective glass, which is prepared using the antireflective glass preparation method described above.

[0062] Optionally, the antireflective glass includes a glass substrate and an organic antireflective film stacked sequentially.

[0063] Optionally, the glass substrate may be made of one or more of the following materials: quartz glass, soda-lime glass, lead-barium glass, borosilicate glass, aluminosilicate glass, lithium aluminosilicate glass, and microcrystalline glass.

[0064] Optionally, the thickness of the organic antireflective membrane is ≥λ / 4, and λ = 380nm~760nm.

[0065] Optionally, the transmittance of the anti-reflective glass at 550 nm is ≥93%, including but not limited to: 93%, 93.5%, 94%, 94.5%, 95%, 95.5%, 96%, 96.5%, 97%, 97.5%, 98%, 98.5%, 99%, and 99.5%, further optionally 93%~96%, and even further optionally 93.5%~95.3%.

[0066] In a third aspect, this application provides a glass cover comprising the anti-reflective glass described above.

[0067] The present application will be further described in detail below with reference to specific embodiments.

[0068] Unless otherwise specified, all raw materials, instruments, and processes used in the following specific embodiments and comparative examples are commercially available products. The glass substrate is Corning's lithium-containing high-alumina-silicon glass with dimensions of 80mm × 74mm.

[0069] Example 1

[0070] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0071] Example 2

[0072] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: 10% fumaric acid, 5% sodium gluconate, 2% ethylene glycol monomethyl ether, and 83% pure water. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0073] Example 3

[0074] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: maleic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0075] Example 4

[0076] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 5%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 88%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0077] Example 5

[0078] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 20%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 73%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0079] Example 6

[0080] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 85°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0081] Example 7

[0082] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 100°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0083] Example 8

[0084] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 4 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0085] Example 9

[0086] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 10 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0087] Example 10

[0088] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 20 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0089] Example 11

[0090] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 60 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0091] Example 12

[0092] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, ethylene glycol monomethyl ether 2%, and pure water 88%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0093] Comparative Example 1

[0094] Comparative Example 1 serves as a blank control group, meaning that the glass substrate does not undergo liquid phase deposition.

[0095] Comparative Example 2

[0096] Please refer to Table 1. The reaction solution for this comparative example comprises the following components by mass fraction: sodium gluconate, 2% ethylene glycol monomethyl ether, and 93% pure water. The glass substrate was immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction was completed, the substrate was removed, washed, and dried to obtain the antireflective glass.

[0097] Comparative Example 3

[0098] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 0.5%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 92.5%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0099] Comparative Example 4

[0100] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 55%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 38%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0101] Comparative Example 5

[0102] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 50°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0103] Comparative Example 6

[0104] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 140°C for 30 minutes to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0105] Comparative Example 7

[0106] Please refer to Table 1. The reaction solution in this embodiment comprises the following components by mass fraction: itaconic acid 10%, sodium gluconate 5%, ethylene glycol monomethyl ether 2%, and pure water 83%. The glass substrate is immersed in the reaction solution and reacted at 70°C for 1 minute to form an organic antireflective film on the glass substrate. After the reaction is complete, the substrate is removed, washed, and dried to obtain the antireflective glass.

[0107] Test case

[0108] The transmittance of the above-mentioned glass substrate and antireflective glass at 550nm wavelength was tested using a Shimadzu UV3700 transmittance tester. 10 pieces were tested for each embodiment or each comparative example, and the average transmittance of 10 pieces at 550nm was taken as the final test value. The results are shown in Table 1.

[0109] As shown in Table 1, Comparative Example 1 is a glass substrate that did not undergo liquid phase deposition, and its transmittance at 550 nm is only 91.2%. Examples 1-3 used itaconic acid, fumaric acid, and maleic acid as polar organic compounds, respectively, and carried out liquid phase deposition reactions under the same reaction conditions. The transmittance of the resulting antireflective glass was increased to 94.2%-94.7%, indicating that polar organic compounds of organic acids can improve the transmittance of glass through liquid phase deposition reactions.

[0110] In Example 4, the mass fraction of itaconic acid was reduced from 10% to 5%, and the transmittance decreased by only 0.1%; in Example 5, the mass fraction of itaconic acid was increased from 10% to 20%, and the transmittance increased to 95%, indicating that increasing the mass fraction of polar organic matter is beneficial to improving the transmittance of antireflective glass.

[0111] In Examples 6 and 7, increasing the temperature of the liquid phase deposition reaction accelerates the reaction rate, thereby increasing the thickness of the organic antireflective film and consequently increasing the transmittance. In Examples 8-11, the liquid phase deposition reaction time gradually increases, and the thickness of the organic antireflective film also gradually increases, similarly improving the transmittance of the antireflective glass.

[0112] In Example 12, no chelating agent sodium gluconate was added, and the transmittance of the resulting antireflective glass was basically the same as that in Example 1, indicating that the chelating agent did not participate in the liquid phase deposition reaction, but was used to improve water quality and enhance the quality of the membrane.

[0113] Comparative Example 2, without the addition of itaconic acid, could not deposit an organic antireflection membrane, and its transmittance was the same as that of Comparative Example 1. Comparative Example 3, with the addition of only 0.5% itaconic acid, was difficult to prepare an organic antireflection membrane of suitable thickness under the same reaction conditions, and its effect on improving transmittance was negligible. Comparative Example 4, with the addition of 55% itaconic acid, had an excessively high reaction concentration, resulting in uneven film formation and a decrease in transmittance.

[0114] In Comparative Example 5, the reaction temperature was reduced to 50°C, resulting in a lower reaction rate and a thinner organic anti-reflective membrane, thus leading to a poor improvement in transmittance. In Comparative Example 6, the reaction temperature was increased to 140°C. Due to the presence of a large amount of water in the reaction solution, the excessively high temperature caused the reaction solution to boil excessively, resulting in a poorer reactivity and thus hindering the improvement of transmittance. In Comparative Example 7, the reaction time was shortened to 1 minute, and the thickness of the organic anti-reflective membrane was small, resulting in a weaker effect on improving transmittance.

[0115] Table 1. Process parameters of liquid phase deposition reaction and transmittance of antireflective glass

[0116]

[0117] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0118] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of protection of this application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the appended claims, and the specification can be used to interpret the content of the claims.

Claims

1. A method for preparing antireflective glass, characterized in that, Includes the following steps: An organic antireflective film is formed by liquid-phase deposition of a reaction solution on the surface of a glass substrate. The reaction solution contains polar organic matter at a mass ratio of 1% to 50%. The polar organic compound contains hydroxyl and / or carboxyl groups; The refractive index of the polar organic material is lower than that of the glass substrate, and the refractive index of the polar organic material is higher than that of air. The temperature of the liquid phase deposition reaction is 55℃~135℃, and the time of the liquid phase deposition reaction is ≥2min.

2. The method for preparing antireflective glass as described in claim 1, characterized in that, The polar organic compounds include one or more of ethylene glycol, glycerol, acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, citric acid, and acrylic acid.

3. The method for preparing antireflective glass as described in claim 2, characterized in that, The polar organic compounds include one or more of acetic acid, fumaric acid, itaconic acid, oxaloacetic acid, maleic acid, and citric acid.

4. The method for preparing antireflective glass as described in claim 2, characterized in that, The polar organic compounds include one or more of acetic acid, itaconic acid, maleic acid, and fumaric acid.

5. The method for preparing antireflective glass according to any one of claims 1 to 4, characterized in that, The reaction solution also includes the following components in the indicated mass percentages: 。 6. The method for preparing antireflective glass as described in claim 5, characterized in that, The chelating agent includes one or more of ethylenediaminetetraacetic acid, sodium gluconate, and sodium citrate.

7. The method for preparing antireflective glass as described in claim 5, characterized in that, The organic solvent includes one or more of ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, and ethyl acetate.

8. An anti-reflective glass, characterized in that, It is prepared by the method for preparing antireflective glass as described in any one of claims 1 to 7.

9. The antireflective glass as described in claim 8, characterized in that, The antireflective glass has a transmittance of ≥93% at 550nm.

10. A glass cover plate, characterized in that, Including the anti-reflective glass as described in claim 8 or 9.

Images