Supporting table and printing device

Abstract

The embodiment of the utility model provides a supporting table and a printing device, and relates to the technical field of silk-screen printing. The supporting table comprises a base, a first supporting part and a second supporting part. At least one of the first supporting part and the second supporting part is movably arranged on the base, and the first supporting part and the second supporting part are close to each other or away from each other; when the supporting table is in the first state, the first supporting part and the second supporting part are far away from each other, and a first gap for containing the transmission assembly is formed between the first supporting part and the second supporting part; when the supporting table is in the second state, the first supporting part and the second supporting part are close to each other, a second gap is formed between the first supporting part and the second supporting part, and the second gap is smaller than the first gap. According to the supporting table provided by the embodiment of the invention, the supporting effect on the silicon wafer in the silk-screen printing process is improved, and the problems that the silicon wafer is uneven in stress and poor in printing quality can be solved.

Description

Technical Field

[0001] This application relates to the field of screen printing technology, and more particularly to a support platform and printing apparatus. Background Technology

[0002] Screen printing is an important step in the fabrication process of crystalline silicon solar cells, enabling precise and orderly printing of metal grid lines on silicon wafers.

[0003] During the screen printing process on silicon wafers using a printing apparatus, the support platform of the printing apparatus serves to support and transport the silicon wafers. The support platform includes multiple support sections arranged sequentially to support the silicon wafers, and a transmission assembly is installed between the support sections to move the silicon wafers.

[0004] However, during the screen printing process on the silicon wafers on the support platform, uneven stress on the silicon wafers and poor printing quality are common problems. Utility Model Content

[0005] This application provides a support platform and a printing apparatus to solve the problem of uneven force on the silicon wafer on the support platform and poor printing quality during the screen printing process.

[0006] In a first aspect, this application provides a support platform, which includes a base, a first support portion, and a second support portion;

[0007] At least one of the first support portion and the second support portion is movably disposed on the base, and the first support portion and the second support portion are close to or far from each other;

[0008] When the support platform is in the first state, the first support part and the second support part are far apart from each other, and a first gap for accommodating the transmission component is formed between the first support part and the second support part.

[0009] When the support platform is in the second state, the first support part and the second support part are close to each other, and a second gap is formed between the first support part and the second support part, which is smaller than the first gap.

[0010] As an optional implementation, the support platform provided in this application embodiment has the first support portion and the second support portion movably disposed on the base;

[0011] Alternatively, the first support portion is fixedly disposed on the base, and the second support portion is movably disposed on the base in a direction close to or away from the first support portion.

[0012] As an optional implementation, the support platform provided in this application embodiment has a base provided with a guide rail, the extension direction of which is parallel to the arrangement direction of the first support part and the second support part;

[0013] The second support portion is provided with a sliding structure, which can move relative to the guide rail along the extension direction of the guide rail.

[0014] As an optional implementation, the support platform provided in this application embodiment has a limiting part provided on the guide rail; when the support platform is in the first state, the limiting part abuts against the sliding structure.

[0015] As an optional implementation, the support platform provided in this application embodiment has two second support parts;

[0016] Two second support portions are disposed on both sides of the first support portion, and the second support portions can move in a direction closer to or further away from the first support portion.

[0017] As an optional implementation, the support platform provided in this application embodiment has a first support portion provided with a transmission gear and a second support portion provided with a transmission rack;

[0018] The two transmission racks mesh with the transmission gear, and the two transmission racks move closer to or further away from each other through the transmission gear.

[0019] As an optional implementation, the support platform provided in this application embodiment has an elastic element disposed between the first support part and the second support part;

[0020] The elastic element is at least used to apply a force to the first support portion and the second support portion, causing the first support portion and the second support portion to move away from each other.

[0021] As an optional implementation, the support platform provided in this application embodiment further includes a driving structure, which connects at least one of the first support portion and the second support portion, and the driving structure drives the first support portion and the second support portion to move closer to or further away from each other.

[0022] As an optional implementation, the support platform provided in this application embodiment includes a driving structure comprising a driving member, a first connecting rod, and a second connecting rod;

[0023] The driving component is disposed on the base;

[0024] The first end of the first connecting rod is fixedly connected to the output shaft of the drive component, the second end of the first connecting rod is rotatably connected to the first end of the second connecting rod, and the second end of the second connecting rod is connected to the first support or the second support.

[0025] Secondly, this application provides a printing apparatus, which includes any of the above-mentioned support platform and transmission components;

[0026] When the support platform is in the first state, the transmission component is located within the first gap, and the transmission component is at least used to drive the silicon wafer to move along the extension direction of the first gap;

[0027] When the support platform is in the second state, the first support portion and the second support portion are used to support the silicon wafer.

[0028] The support platform and printing apparatus provided in this application embodiment include a base, a first support portion, and a second support portion. At least one of the first and second support portions is movably disposed on the base, and the first and second support portions are close to or far apart from each other. When the support platform is in a first state, the first and second support portions are far apart from each other, and a first gap is formed between the first and second support portions. The first gap can be used to accommodate a transmission component, facilitating the smooth rise of the support platform to support the silicon wafer. When the support platform is in a second state, the first and second support portions are close to each other, and a second gap is formed between the first and second support portions. The second gap is smaller than the first gap. By reducing or even eliminating the gap between the first and second support portions, a more complete support platform can be provided for the silicon wafer, making the silicon wafer subjected to uniform force during the screen printing process and improving the printing quality of the silicon wafer. Attached Figure Description

[0029] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0030] Figure 1 Schematic diagram of the support platform provided in the embodiments of this application Figure 1 ;

[0031] Figure 2 Schematic diagram of the support platform provided in the embodiments of this application Figure 2 ;

[0032] Figure 3 for Figure 2 A schematic diagram showing the positional relationship between the central support platform and the transmission components and silicon wafers;

[0033] Figure 4 for Figure 2 Another structural diagram of the central support platform without its base;

[0034] Figure 5 for Figure 2 A schematic diagram of the connection structure between the central drive structure and the second support section.

[0035] Explanation of reference numerals in the attached figures:

[0036] 100-Base;

[0037] 110 - Guide rail; 111 - Limiting part;

[0038] 200 - First Support Section;

[0039] 210 - Transmission gear;

[0040] 300 - Second Support Section;

[0041] 310 - Sliding structure;

[0042] 320-Transmission rack;

[0043] 400 - First gap;

[0044] 500 - Elastic component;

[0045] 600-Drive Structure;

[0046] 610 - Driver component; 611 - Mounting plate;

[0047] 620 - First Link;

[0048] 630 - Second link; 631 - Connector;

[0049] 10-Transmission components;

[0050] 20-Silicon wafer.

[0051] The accompanying drawings illustrate specific embodiments of this application, which will be described in more detail below. These drawings and descriptions are not intended to limit the scope of the concept in any way, but rather to illustrate the concept of this application to those skilled in the art through reference to particular embodiments. Detailed Implementation

[0052] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0053] The terms "first," "second," "third," "fourth," etc. (if present) in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a particular order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented, for example, in orders other than those illustrated or described herein.

[0054] In this application, the terms "exemplary" or "for example" are used to indicate examples, illustrations, or descriptions. Any embodiment or design described as "exemplary" or "for example" in this application should not be construed as being more preferred or advantageous than other embodiments or designs. Specifically, the use of terms such as "exemplary" or "for example" is intended to present the relevant concepts in a specific manner.

[0055] Furthermore, the terms "set up," "connect," and "fix" should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this disclosure according to the specific circumstances.

[0056] Unless otherwise stated, the term "multiple" means two or more.

[0057] A planar conveyor screen printing machine is a common type of screen printing equipment, and the support table is one of the core components of the machine. In actual operation, silicon wafers are fed into the printing machine via the conveyor track. When the wafers reach the support table, the support table rises to lift the wafers, transferring them onto the support table. The support table then continues to move, conveying the wafers to the printing area of ​​the printing machine.

[0058] The support platform of a planar conveyor screen printing machine typically consists of two or more support sections with a gap between them. This gap allows the silicon wafer to pass over the transport track when the support platform rises. However, due to the presence of the gap, the force on the silicon wafer becomes uneven at the gap, causing slight deformation or displacement of the silicon wafer during the printing process, thus affecting the printing accuracy and uniformity.

[0059] To improve the problem of uneven stress at the grooves, the wet weight and line shape can usually be controlled by adjusting the pressure of the print head. However, too low a pressure may cause the paste to not adhere well to the silicon wafer surface, resulting in problems such as incomplete printing or poor printing; while too high a pressure may cause the silicon wafer to crack or develop microcracks at the grooves, especially when the silicon wafer is thin or has low strength.

[0060] It is evident that during the screen printing process on silicon wafers on the support platform, uneven stress on the silicon wafers and poor printing quality are common problems.

[0061] Therefore, this application provides a support platform and a printing apparatus, wherein the support platform includes a base, a first support portion, and a second support portion; at least one of the first support portion and the second support portion is movably disposed on the base, and the first support portion and the second support portion are close to or far from each other; when the support platform is in a first state, the first support portion and the second support portion are far from each other, and a first gap is formed between the first support portion and the second support portion, which can be used to accommodate a transmission component, facilitating the smooth rise of the support platform to support the silicon wafer; when the support platform is in a second state, the first support portion and the second support portion are close to each other, and a second gap is formed between the first support portion and the second support portion, which is smaller than the first gap; by reducing or even eliminating the gap between the first support portion and the second support portion, a complete support platform can be provided for the silicon wafer, making the silicon wafer subjected to uniform force during the screen printing process and improving the printing quality of the silicon wafer.

[0062] The technical solution of this application will be described in detail below with reference to the accompanying drawings and specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments.

[0063] Combination Figure 1 and Figure 3 As shown, one embodiment of this application provides a support platform, which includes a base 100, a first support portion 200, and a second support portion 300; at least one of the first support portion 200 and the second support portion 300 is movably disposed on the base 100, and the first support portion 200 and the second support portion 300 are close to or far from each other; when the support platform is in a first state, the first support portion 200 and the second support portion 300 are far from each other, and a first gap 400 for accommodating a transmission component 10 is formed between the first support portion 200 and the second support portion 300; when the support platform is in a second state, the first support portion 200 and the second support portion 300 are close to each other, and a second gap is formed between the first support portion 200 and the second support portion 300, the second gap being smaller than the first gap 400.

[0064] During the transfer and printing of the silicon wafer 20, the support platform needs to operate in different states. For example, during the transfer of the silicon wafer 20, the support platform needs to avoid the transfer assembly 10; while during printing, the support platform needs to provide uniform support. By configuring at least one of the first support portion 200 and the second support portion 300 to be movably disposed on the base 100, the distance between the first support portion 200 and the second support portion 300 can be adjusted.

[0065] During silicon wafer 20 transfer, the support platform is in a first state, and a first gap 400 is formed between the first support portion 200 and the second support portion 300 to avoid the transfer assembly 10; during silicon wafer 20 printing, the support platform is in a second state, and the first support portion 200 and the second support portion 300 move closer to each other to reduce or eliminate the first gap 400 and provide a complete support surface for silicon wafer 20.

[0066] The minimum width of the second gap can be zero. When the width of the second gap is zero, the first support 200 and the second support 300 abut against each other to form a complete platform, which can provide a stable and continuous support effect for the silicon wafer 20.

[0067] Understandably, the transport component 10 is the conveyor track of the printing press. The silicon wafer 20 enters the printing press through the conveyor track, and the silicon wafer 20 extends along the direction of the conveyor track (i.e., Figure 3 The X-axis moves within the printing press.

[0068] In the initial state, the support platform is located below the transmission component 10. When the silicon wafer 20 moves to a position corresponding to the support platform, the support platform can rise so that the transmission component 10 enters the first gap 400 between the first support portion 200 and the second support portion 300, until the support platform lifts the silicon wafer 20 to support it. At this time, the support platform is in the first state.

[0069] After the support platform carries the silicon wafer 20, it can move along the extension direction of the transfer assembly 10 to transport the silicon wafer 20 to the printing area in the printer. During the process of the support platform transporting the silicon wafer 20, the transfer assembly 10 gradually moves away from the first gap 400 along its extension direction. When the transfer assembly 10 is completely away from the first gap 400, the support platform can switch to a second state so that the first support part 200 and the second support part 300 move closer together to form a complete support surface under the silicon wafer 20, so as to provide continuous and uniform support force for the silicon wafer 20 during the screen printing process, thereby improving the printing quality of the silicon wafer 20.

[0070] It should be noted that the sides of the first support portion 200 and the second support portion 300 that are away from the base 100 are located in the same plane. In this way, after the first support portion 200 and the second support portion 300 abut against each other, a continuous and flat surface can be formed, which improves the support effect on the silicon wafer 20.

[0071] In some embodiments, the first support portion 200 is fixedly disposed on the base 100, and the second support portion 300 is movably disposed on the base 100 in a direction close to or away from the first support portion 200.

[0072] By configuring the second support 300 to be movable relative to the base 100, sufficient adjustability can be provided to adapt to different operational needs; furthermore, the number of moving parts is reduced, the structure is simplified, and the complexity and cost of manufacturing and maintenance are reduced.

[0073] In other embodiments, the first support portion 200 and the second support portion 300 are movably disposed on the base 100.

[0074] By configuring the first support portion 200 and the second support portion 300 to both be movable relative to the base 100, the support platform can adjust the first gap 400 between the first support portion 200 and the second support portion 300 under a wider range of operating conditions, providing greater flexibility.

[0075] Combination Figure 2 and Figure 3 As shown, in some embodiments, the number of second support portions 300 is set to two; the two second support portions 300 are disposed on both sides of the first support portion 200, and the second support portions 300 can move in the direction of approaching or moving away from the first support portion 200.

[0076] By setting two second support parts 300, which cooperate with the first support part 200, the support area of ​​the silicon wafer 20 is increased, providing a more stable and uniform support structure that can adapt to silicon wafers 20 of different specifications.

[0077] Two second support portions 300 are disposed on both sides of the first support portion 200, and the second support portions 300 can move in the direction of approaching or moving away from the first support portion 200, so as to achieve consistency of the first gap 400 between the first support portion 200 and the second support portion 300, so as to adapt to the transmission component 10; and only by moving the second support portions 300 located on both sides, the first state of the support platform can be adjusted to the second state, which is simple to operate and easy to adapt to different operating needs.

[0078] Combination Figure 1 and Figure 2 As shown, in some embodiments, the base 100 is provided with a guide rail 110, the extension direction of the guide rail 110 is parallel to the arrangement direction of the first support portion 200 and the second support portion 300; the second support portion 300 is provided with a sliding structure 310, the sliding structure 310 can move relative to the guide rail 110 along the extension direction of the guide rail 110.

[0079] Understandably, when the second support 300 moves in a direction close to or away from the first support 200, ensuring the accuracy and stability of the movement of the second support 300 is crucial.

[0080] By providing a guide rail 110 on the base 100, a precise movement path is provided, allowing the second support 300 to move smoothly along a predetermined direction. This effectively prevents the second support 300 from shifting or tilting during adjustment, ensuring that when the support platform is in the first state, the first gap 400 between the first support 200 and the second support 300 can accommodate the transmission component 10. When the support platform is in the second state, the first support 200 and the second support 300 can abut tightly to form a continuous and flat platform, providing a continuous and uniform support effect for the silicon wafer 20.

[0081] Among them, the first support part 200 and the second support part 300 are along Figure 2 The Y-axis arrangement in the middle, the extension direction of guide rail 110 is the same as Figure 2 The Y-axis is consistent.

[0082] By providing a sliding structure 310 in the second support 300, which cooperates with the guide rail 110, a low-friction, high-precision movement capability can be provided, ensuring that the second support 300 can be adjusted in position quickly and accurately.

[0083] For example, the sliding structure 310 can be a slider, and the slider can be provided with a through groove whose cross-sectional shape is adapted to the guide rail 110, and the guide rail 110 is embedded in the through groove.

[0084] Combination Figure 1 , Figure 2 and Figure 4 As shown, in some embodiments, the guide rail 110 is provided with a limiting part 111; when the support platform is in the first state, the limiting part 111 abuts against the sliding structure 310.

[0085] By setting the limiting part 111, the range of movement of the sliding structure 310 along the guide rail 110 can be limited, ensuring that the second support part 300 does not exceed the predetermined range of movement, so as to prevent the second support part 300 from moving excessively during the adjustment process.

[0086] Understandably, when the support platform is in the first state, the second support part 300 is furthest away from the first support part 200, and a first gap 400 can be formed between the first support part 200 and the second support part 300. At this time, the limiting part 111 abuts against the sliding structure 310, so the second support part 300 cannot move further away from the first support part 200, thereby keeping the width of the first gap 400 stable to effectively accommodate the transmission component 10.

[0087] For example, the limiting part 111 may be a baffle connected to the end of the guide rail 110 in the extending direction. The baffle may be mounted on the guide rail 110 by bolts, screws or other fasteners and protrude from the surface of the guide rail 110; when the sliding structure 310 moves along the guide rail 110 to the end of the guide rail 110 in the extending direction, it abuts against the baffle, and the baffle may limit the further movement of the sliding structure 310.

[0088] Combination Figure 4 As shown, in some embodiments, the first support portion 200 is provided with a transmission gear 210, and the second support portion 300 is provided with a transmission rack 320; the two transmission racks 320 mesh with the transmission gear 210, and the two transmission racks 320 move closer or further away from each other through the transmission gear 210.

[0089] The transmission gear 210 is rotatably connected to the bottom of the first support portion 200, that is, the transmission gear 210 is disposed on the side of the first support portion 200 opposite to the silicon wafer 20, and the axis of the transmission gear 210 is parallel to... Figure 2 The Z-axis is parallel to it.

[0090] Two transmission racks 320 are arranged in parallel on opposite sides of the transmission gear 210. One end of the transmission rack 320 is fixedly connected to the side of the second support 300 away from the silicon wafer 20, and the other end of the transmission rack 320 extends to the bottom of the first support 200 and meshes with the transmission gear 210.

[0091] Specifically, when one of the second support portions 300 moves toward the first support portion 200, the transmission rack 320 mounted on the second support portion 300 moves toward the first support portion 200. Due to the meshing action of the transmission rack 320 and the transmission gear 210, the transmission rack 320 drives the transmission gear 210 to rotate, thereby driving the transmission rack 320 mounted on the other second support portion 300 to also move toward the first support portion 200, thus causing the other second support portion 300 to move toward the first support portion 200. This achieves the effect of two second support portions 300 moving simultaneously toward the first support portion 200 from opposite sides.

[0092] In other embodiments, a ball screw can be provided on the base 100, and the sliding structure 310 of the second support 300 can be installed on the ball screw. By driving the ball screw with a motor, the second support 300 can be driven to move closer to or away from the first support 200. The ball screw driving method is more stable and effective, and it is easier to achieve synchronous movement of the two second support 300s.

[0093] Combination Figure 4As shown, in some embodiments, an elastic member 500 is provided between the first support portion 200 and the second support portion 300; the elastic member 500 is at least used to apply a force to the first support portion 200 and the second support portion 300 to move the first support portion 200 and the second support portion 300 away from each other.

[0094] By setting an elastic element 500 between the support components, when the support platform needs to switch from the second state to the first state, the elastic characteristics of the elastic element 500 can be used to realize the automatic separation or position adjustment of the first support part 200 and the second support part 300, thereby improving the convenience and efficiency of state switching.

[0095] Specifically, when the support platform is in the first state, the elastic member 500 can apply a force to the first support 200 and the second support 300 to make the first support 200 and the second support 300 move away from each other, so that the first support 200 and the second support 300 always maintain a tendency to move away from each other, ensuring the width of the first gap 400 to effectively accommodate the transmission component 10.

[0096] When the support platform is in the second state, the elastic element 500 is in a compressed state. At this time, an external force is needed to drive the second support part 300 to maintain a tendency to move closer to the first support part 200, so as to maintain stable contact between the first support part 200 and the second support part 300, so as to form a continuous and flat platform, and provide a continuous and uniform support effect for the silicon wafer 20 during the screen printing process.

[0097] Combination Figures 1 to 5 As shown, in some embodiments, a drive structure 600 is also included, which is connected to at least one of the first support portion 200 and the second support portion 300. The drive structure 600 drives the first support portion 200 and the second support portion 300 to move closer to or further away from each other.

[0098] Understandably, when the first support 200 is fixed to the base 100 and the second support 300 is movably connected to the base 100, the drive structure 600 is connected to the second support 300 to drive the second support 300 to move closer to or away from the first support 200.

[0099] When both the first support part 200 and the second support part 300 are movably connected to the base 100, the drive structure 600 can be connected to both the first support part 200 and the second support part 300 to drive the first support part 200 and the second support part 300 to move closer to or further away from each other.

[0100] When the first support part 200 is movably connected to the base 100 and the second support part 300 is fixed to the base 100, the drive structure 600 is connected to the first support part 200 to drive the first support part 200 to move closer to or further away from the second support part 300.

[0101] By setting the drive structure 600, the support platform gains the ability to actively adjust the position of the first support part 200 or the second support part 300, ensuring that the support platform can quickly adjust the position of the first support part 200 or the second support part 300 under different operating conditions. This not only improves the flexibility and adaptability of the support platform, but also enhances the precise control of the position of the first support part 200 or the second support part 300, thereby promoting the improvement of screen printing operation efficiency and printing quality.

[0102] Combination Figure 5 As shown, in some embodiments, the drive structure 600 includes a drive member 610, a first connecting rod 620, and a second connecting rod 630; the drive member 610 is disposed on the base 100; the first end of the first connecting rod 620 is fixedly connected to the output shaft of the drive member 610, the second end of the first connecting rod 620 is rotatably connected to the first end of the second connecting rod 630, and the second end of the second connecting rod 630 is connected to the first support portion 200 or the second support portion 300.

[0103] For example, the first support 200 is fixed to the base 100, the second support 300 is movably connected to the base 100, and the second end of the second connecting rod 630 is connected to the second support 300.

[0104] The drive component 610 can be fixed to the side of the base 100 away from the first support part 200 and the second support part 300 by the mounting plate 611, so as not to occupy the space above the base 100 and improve the rationality of the support platform layout.

[0105] The second end of the second connecting rod 630 can be hinged to the second support portion 300 via a connector 631. The connector 631 is installed on the side of the second support portion 300 opposite to the first support portion 200, and the second support portion 300 is along... Figure 1 If the thickness in the Z-direction is thinner, the connector 631 can provide a more stable mounting area to achieve an effective connection between the second link 630 and the second support 300.

[0106] When the support platform needs to switch from the first state to the second state, the drive unit 610 operates, and the output shaft of the drive unit 610 can drive the first connecting rod 620 along... Figure 5 When the first link 620 swings in the direction indicated by the middle arrow A, it will drive the second link 630 to move, so that the second link 630 pushes the second support 300 closer to the first support 200, thereby realizing the mutual approach of the first support 200 and the second support 300.

[0107] When the support platform needs to switch from the second state to the first state, the drive unit 610 reverses its direction, and the output shaft of the drive unit 610 can drive the first connecting rod 620 to move away from the first state. Figure 5When the first link 620 swings in the direction indicated by the middle arrow A, it will drive the second link 630 to move, so that the second link 630 pulls the second support 300 away from the first support 200, thereby realizing the mutual separation of the first support 200 and the second support 300.

[0108] Another aspect of this application provides a printing apparatus, including a support platform and a transmission component 10 provided in any of the above embodiments; when the support platform is in a first state, the transmission component 10 is located within a first gap 400, and the transmission component 10 is at least used to drive the silicon wafer 20 to move along the extension direction of the first gap 400; when the support platform is in a second state, the first support portion 200 and the second support portion 300 are used to support the silicon wafer 20.

[0109] The support platform and transmission component 10 have been described in detail in the above embodiments and will not be repeated here.

[0110] Specifically, in the printing apparatus provided in this application embodiment, when the silicon wafer 20 is located in the transmission component 10, the support platform is in a first state, with the first support portion 200 and the second support portion 300 being far apart from each other, forming a first gap 400 between the first support portion 200 and the second support portion 300. When the support platform rises to support the silicon wafer 20, the first gap 400 can accommodate the transmission component 10. After the support platform supports the silicon wafer 20, it moves along the extension direction of the first gap 400 to move the silicon wafer 20 to the printing area for screen printing. During the process of the support platform moving the silicon wafer 20 along the extension direction of the first gap 400 to the printing area, the driving structure 600 drives the first support portion 200 and the second support portion 300 to move closer to each other, causing the support platform to switch to a second state. This can reduce or even eliminate the gap between the first support portion 200 and the second support portion 300, providing a more complete support surface for the silicon wafer 20 during the screen printing process, resulting in uniform force on the silicon wafer 20 and improved printing quality.

[0111] Finally, it should be noted that those skilled in the art, upon considering the specification and practicing the application disclosed herein, will readily conceive of other embodiments of the present application. The embodiments of this application are intended to cover any variations, uses, or adaptations of the embodiments of this application that follow the general principles of the embodiments of this application and include common knowledge or customary technical means in the art not disclosed in the embodiments of this application. The specification and embodiments are to be considered exemplary only, and the true scope and spirit of the embodiments of this application are indicated by the following claims.

[0112] It should be understood that the embodiments of this application are not limited to the precise structures described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from their scope. The scope of the embodiments of this application is limited only by the appended claims.

Claims

1. A support table, characterized by, The support table comprises a base (100), a first support part (200) and a second support part (300); At least one of the first support part (200) and the second support part (300) is movably arranged on the base (100), and the first support part (200) and the second support part (300) are close to or away from each other; When the support table is in the first state, the first support part (200) and the second support part (300) are away from each other, and a first gap (400) for accommodating a transmission assembly (10) is formed between the first support part (200) and the second support part (300); When the support table is in the second state, the first support part (200) and the second support part (300) are close to each other, and a second gap is formed between the first support part (200) and the second support part (300), the second gap being smaller than the first gap (400).

2. The support table according to claim 1, characterized in that The first support part (200) and the second support part (300) are movably arranged on the base (100); Alternatively, the first support part (200) is fixedly arranged on the base (100), and the second support part (300) is movably arranged on the base (100) in a direction close to or away from the first support part (200).

3. The support table according to claim 2, characterized in that The base (100) is provided with a guide rail (110), and the extension direction of the guide rail (110) is parallel to the arrangement direction of the first support part (200) and the second support part (300); The second support part (300) is provided with a sliding structure (310), and the sliding structure (310) can move relative to the guide rail (110) in the extension direction of the guide rail (110).

4. The support table according to claim 3, characterized in that The guide rail (110) is provided with a limiting part (111), and when the support table is in the first state, the limiting part (111) abuts against the sliding structure (310).

5. The support table of claim 1, wherein The number of the second support parts (300) is two; The two second support parts (300) are arranged on both sides of the first support part (200), and the second support parts (300) can move in a direction close to or away from the first support part (200).

6. The support table of claim 5, wherein, The first support part (200) is provided with a transmission gear (210), and the second support part (300) is provided with a transmission rack (320); The two transmission racks (320) are engaged with the transmission gear (210), and the two transmission racks (320) are close to or away from each other through the transmission gear (210).

7. The support table of claim 1, wherein An elastic member (500) is arranged between the first support part (200) and the second support part (300); The elastic member (500) is used at least for applying an action force to the first support part (200) and the second support part (300) to make the first support part (200) and the second support part (300) away from each other.

8. Support table according to any of claims 1-7, characterized in that The driving structure (600) is connected to at least one of the first support part (200) and the second support part (300), and drives the first support part (200) and the second support part (300) to move close to or away from each other.

9. The support table of claim 8, wherein, The driving structure (600) comprises a driving member (610), a first connecting rod (620) and a second connecting rod (630). The driving member (610) is arranged on the base (100). The first end of the first connecting rod (620) is fixedly connected to the output shaft of the driving member (610), the second end of the first connecting rod (620) is rotatably connected to the first end of the second connecting rod (630), and the second end of the second connecting rod (630) is connected to the first support part (200) or the second support part (300).

10. A printing device characterized by comprising: The support table and the conveying assembly (10) according to any one of claims 1-9 are provided. When the support table is in the first state, the conveying assembly (10) is located in the first gap (400), and the conveying assembly (10) is used at least for driving the silicon wafer (20) to move along the extension direction of the first gap (400). When the support table is in the second state, the first support part (200) and the second support part (300) are used for carrying the silicon wafer (20).

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